JP2003318517A - Method of forming conductor layer - Google Patents

Method of forming conductor layer

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Publication number
JP2003318517A
JP2003318517A JP2002125401A JP2002125401A JP2003318517A JP 2003318517 A JP2003318517 A JP 2003318517A JP 2002125401 A JP2002125401 A JP 2002125401A JP 2002125401 A JP2002125401 A JP 2002125401A JP 2003318517 A JP2003318517 A JP 2003318517A
Authority
JP
Japan
Prior art keywords
conductor layer
fluid
paste
partition wall
conductive paste
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2002125401A
Other languages
Japanese (ja)
Inventor
Takashi O
俊 王
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taiyo Yuden Co Ltd
Original Assignee
Taiyo Yuden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiyo Yuden Co Ltd filed Critical Taiyo Yuden Co Ltd
Priority to JP2002125401A priority Critical patent/JP2003318517A/en
Publication of JP2003318517A publication Critical patent/JP2003318517A/en
Withdrawn legal-status Critical Current

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Abstract

<P>PROBLEM TO BE SOLVED: To provide a conductor layer forming method which is capable of forming a fine conductor layer with high accuracy and reducing the equipment cost and the running cost related to the formation of the conductor layer. <P>SOLUTION: Partitions 4 demarcating paste filling regions 5 are provided to an object 3, the paste filling regions 5 are filled with conductive paste 6, then baking heat is applied to the conductive paste 6 filling the paste filling regions 5 to form a conductor layer 7. The partitions 4 are dissipated by the heat to form the conductor layer 7 having a desired pattern or a desired shape corresponding to the paste filling regions 5 in the object 3. <P>COPYRIGHT: (C)2004,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、各種基板やセラミ
ックグリーンシート等の対象物に所望パターンまたは形
状の導体層を形成する方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a conductor layer having a desired pattern or shape on an object such as various substrates and ceramic green sheets.

【0002】[0002]

【従来の技術】近年、携帯電話やパソコン等の電子機器
の小型化及び高機能化に伴い、電子部品に対しては微小
化が要求され、電子部品が実装される基板に対しては高
密度実装化が要求されている。電子部品に対する微小化
の要求を満足するには部品回路を構成する内部導体の微
細化が必至であり、また、基板に対する高密度実装化の
要求を満足するには導体パターンの微細化が必至であ
る。
2. Description of the Related Art In recent years, as electronic devices such as mobile phones and personal computers have become smaller and more sophisticated, miniaturization of electronic parts has been required, and high density has been achieved for substrates on which electronic parts are mounted. Implementation is required. In order to satisfy the demand for miniaturization of electronic components, it is inevitable to miniaturize the internal conductors that make up the component circuit, and in order to satisfy the demand for high-density mounting on the substrate, miniaturization of the conductor pattern is inevitable. is there.

【0003】前記の内部導体及び導体パターンの形成に
は主として厚膜形成法と薄膜形成法が利用されており、
前者の厚膜形成法にはスクリーンを介して導電ペースト
を所定形状で印刷する方法が一般に採用され、後者の薄
膜形成法には蒸着法や陰極スパッタリング法等で成膜し
た後にフォトリソグラフィ技術等によって所定形状にパ
ターンニングする方法が一般に採用されている。
A thick film forming method and a thin film forming method are mainly used for forming the internal conductor and the conductor pattern.
In the former thick film forming method, a method of printing a conductive paste in a predetermined shape through a screen is generally adopted, and in the latter thin film forming method, a film is formed by an evaporation method or a cathode sputtering method, and then a photolithography technique is used. A method of patterning into a predetermined shape is generally adopted.

【0004】[0004]

【発明が解決しようとする課題】しかし、従来の厚膜形
成法では設備費用及びランニングコストを低く抑えられ
る反面、内部導体や導体パターン等を含む導体層を50
μm以下の厚み,直径,幅及び隣接間隔等で形成するこ
とが難しい。また、従来の薄膜形成法では導体層を20
μm以下の厚み,直径,幅及び隣接間隔等で形成するこ
とが可能であるが、設備費用及びランニングコストが厚
膜形成法を実施する場合に比べて格段高くなる。
However, in the conventional thick film forming method, the equipment cost and the running cost can be kept low, but the conductor layer including the internal conductor, the conductor pattern, and the like can be reduced to 50.
It is difficult to form with a thickness, diameter, width and adjacent spacing of less than μm. Moreover, in the conventional thin film forming method, 20
It is possible to form with a thickness, diameter, width and adjacent spacing of less than μm, but the equipment cost and running cost are much higher than when the thick film forming method is performed.

【0005】本発明は前記事情に鑑みて創作されたもの
で、その目的とするところは、微細な導体層を高精度で
形成でき、しかも、導体層形成に係る設備費用及びラン
ニングコストを低く抑えることができる導体層形成方法
を提供することにある。
The present invention was created in view of the above circumstances, and an object of the present invention is to form a fine conductor layer with high accuracy, and to keep the equipment cost and running cost for forming the conductor layer low. Another object of the present invention is to provide a method for forming a conductor layer that can be used.

【0006】[0006]

【課題を解決するための手段】前記目的を達成するた
め、本発明に係る導体層形成方法は、物理化学変化によ
る硬化を可能とした流動物を凹版の凹部内に充填する工
程と、凹版の凹部内に充填された流動物を対象物に転写
し、転写中または転写後の状態で流動物を物理化学変化
により硬化させてペースト充填領域を画成する隔壁部を
形成する工程と、加熱焼成を可能とした導電ペーストを
ペースト充填領域に充填する工程と、ペースト充填領域
の導電ペーストにこれを焼成するための熱を加えて導体
層を生成する工程とを備える、ことをその特徴とする。
In order to achieve the above object, the method of forming a conductor layer according to the present invention comprises a step of filling a concave portion of an intaglio plate with a fluid capable of being hardened by a physicochemical change, and Transferring the fluid filled in the recesses to the object, curing the fluid during the transfer or after transfer by physicochemical changes to form partition walls defining the paste filling area, and heating and baking And a step of filling the paste-filled area with a conductive paste capable of achieving the above, and a step of applying heat for firing the conductive paste in the paste-filled area to generate a conductor layer.

【0007】この導体層形成方法によれば、対象物にペ
ースト充填領域を画成する隔壁部を形成し、このペース
ト充填領域に導電ペーストを充填した後、ペースト充填
領域の導電ペーストにこれを焼成するための熱を加えて
導体層を生成することにより、ペースト充填領域に対応
した所望パターンまたは形状の導体層を対象物に形成す
ることができる。
According to this conductor layer forming method, the partition wall portion defining the paste filling area is formed on the object, the conductive paste is filled in the paste filling area, and then the conductive paste in the paste filling area is baked. By generating heat to generate a conductor layer, a conductor layer having a desired pattern or shape corresponding to the paste filling region can be formed on the object.

【0008】本発明の前記目的とそれ以外の目的と、構
成特徴と、作用効果は、以下の説明と添付図面によって
明らかとなる。
The above and other objects, constitutional features, and operational effects of the present invention will become apparent from the following description and the accompanying drawings.

【0009】[0009]

【発明の実施の形態】図1〜図10は、本発明を適用し
た導体層形成方法の一実施形態を示す。
1 to 10 show an embodiment of a conductor layer forming method to which the present invention is applied.

【0010】図1は導体層形成に用いられる凹版1の部
分縦断面を示すもので、その一面には、縦断面逆台形の
凹部1aによって所定パターンまたは形状の反転像が描
かれている。換言すれば、凹部1aの存しない面によっ
て導体層7に対応する所定パターンまたは形状の像が描
かれている。この凹版1はガラス,プラスチック,セラ
ミックス,金属やこれら以外の材料から成り、凹部1a
は凹版材料に適した加工方法、例えばレーザ光によるア
ブレーション加工やドライエッチング法やウェットエッ
チング法等によって形成されている。
FIG. 1 shows a partial vertical section of an intaglio 1 used for forming a conductor layer, and an inverted image of a predetermined pattern or shape is drawn on one surface thereof by a recess 1a having an inverted trapezoidal vertical section. In other words, an image of a predetermined pattern or shape corresponding to the conductor layer 7 is drawn by the surface where the recess 1a does not exist. The intaglio 1 is made of glass, plastic, ceramics, metal, or other materials,
Is formed by a processing method suitable for the intaglio material, for example, ablation processing by laser light, a dry etching method, a wet etching method, or the like.

【0011】凹版材料や凹部加工方法にもよるが、凹部
1aを構成する穴の径や溝の幅とこれらの深さ及び隣接
間隔には20μm以下の値を得ることは十分に可能であ
る。また、後述する転写工程において凹部1a内に充填
された流動物2の抜けを良好に行うには、穴から成る凹
部1aの場合にはそのアスペクト比(穴深さ/穴径)を
0.1〜10に設定すると良く、溝から成る凹部1aの
場合にはそのアスペクト比(溝深さ/溝幅)を同様の範
囲に設定すると良い。
Although it depends on the intaglio material and the method of processing the recesses, it is possible to obtain values of 20 μm or less for the diameters of the holes and the widths of the grooves forming the recesses 1a, their depths, and the adjacent intervals. Further, in the transfer step described later, in order to favorably escape the fluid 2 filled in the concave portion 1a, in the case of the concave portion 1a formed of a hole, the aspect ratio (hole depth / hole diameter) is 0.1. It is preferable to set to 10 to 10, and in the case of the concave portion 1a composed of a groove, its aspect ratio (groove depth / groove width) may be set to the same range.

【0012】図1に示した凹版1を利用して導体層を形
成するときには、まず、図2に示すように、凹部1aが
上を向くように凹版1を載置し、凹部1a内に流動物2
を充填する。この流動物2の充填には、凹版1上に流動
物2を供給しながら凹版1の凹部形成面に沿ってスキー
ジを動かして流動物2を凹部1a内に押し込む方法や、
流動物2を付着させたローラを凹版1の凹部形成面に沿
って動かして流動物2を凹部1a内に押し込んだ後に余
分な流動物2を掻き取る方法等が利用できる。
When forming a conductor layer using the intaglio 1 shown in FIG. 1, first, as shown in FIG. 2, the intaglio 1 is placed so that the recess 1a faces upward, and the recess 1a flows into the recess 1a. Animal 2
To fill. For filling the fluid 2, the fluid 2 is supplied onto the intaglio 1 and a squeegee is moved along the recess forming surface of the intaglio 1 to push the fluid 2 into the recess 1a.
It is possible to use a method in which the roller to which the fluid 2 is attached is moved along the recess forming surface of the intaglio 1 to push the fluid 2 into the recess 1a and then scrape off the excess fluid 2.

【0013】前記の流動物2は、物理化学変化による硬
化を可能とし、且つ、硬化後は後述する焼成時の熱によ
る消失を可能としたもので、物理化学変化による硬化と
は熱による硬化や、光による硬化や、熱放出による硬化
や、溶媒蒸発による硬化等が挙げられる。
The fluid 2 is capable of being hardened by a physicochemical change and, after hardening, can be lost by heat during firing which will be described later. Curing by light, curing by releasing heat, curing by solvent evaporation, and the like.

【0014】ちなみに、熱硬化を可能とした流動物2と
しては、フェノール樹脂やエポキシ樹脂やアルキッド樹
脂等の熱硬化性樹脂と溶剤とを少なくとも含むものや、
熱硬化性樹脂を軟化して得たもの等が使用できる。ま
た、光硬化を可能とした流動物2としては、紫外線等に
より活性種を発生させるラジカル重合系やカチオン重合
系の光硬化開始剤と前記活性種と反応するラジカル重合
系やカチオン重合系の光反応性樹脂と溶剤とを少なくと
も含むもの等が使用できる。さらに、熱放出による硬化
を可能した流動物2としては、フッ素樹脂やアクリル樹
脂等の熱可塑性樹脂を軟化して得たもの等が使用でき
る。さらに、溶媒蒸発による硬化を可能とした流動物2
としては、熱硬化性樹脂,熱可塑性樹脂または合成ゴム
と溶媒(溶剤や水)とを少なくとも含むもの等が使用で
きる。勿論、物理化学変化による硬化と硬化後の加熱消
失を可能としたものであれば前記以外のものを流動物2
として用いても構わない。
The thermosetting fluid 2 contains at least a thermosetting resin such as phenol resin, epoxy resin or alkyd resin, and a solvent,
Those obtained by softening a thermosetting resin can be used. The photocurable fluid 2 is a radical polymerization type or cationic polymerization type photocuring initiator that generates an active species by ultraviolet rays or the like, and a radical polymerization type or cationic polymerization type light that reacts with the active species. A material containing at least a reactive resin and a solvent can be used. Further, as the fluid 2 that can be cured by releasing heat, those obtained by softening a thermoplastic resin such as a fluororesin or an acrylic resin can be used. Furthermore, a fluid 2 that can be cured by solvent evaporation
As the material, a thermosetting resin, a thermoplastic resin, or a material containing at least a synthetic rubber and a solvent (solvent or water) can be used. Of course, if it is possible to cure due to physico-chemical changes and to eliminate the heat after curing, use a fluid other than the above.
It may be used as.

【0015】次に、図3に示すように、凹版1の凹部形
成面を対象物3に近付けて、凹部1a内に充填された流
動物2の露出面を対象物2の表面に接触させ、そして、
図4に示すように、凹版1を対象物3から引き離して凹
部1a内に充填された流動物2を対象物3に転写する。
後述する焼成工程で導電ペースト6にこれを焼成するた
めの熱を加えることから、対象物3としては、この焼成
温度に対して耐熱性を有するセラミックス基板等の基板
や、導電ペースト6と同時焼成が可能なセラミックグリ
ーンシートが好ましく使用される。
Next, as shown in FIG. 3, the recess forming surface of the intaglio 1 is brought close to the object 3, and the exposed surface of the fluid 2 filled in the recess 1a is brought into contact with the surface of the object 2. And
As shown in FIG. 4, the intaglio 1 is separated from the object 3 to transfer the fluid 2 filled in the recess 1 a to the object 3.
Since heat for firing the conductive paste 6 is applied to the conductive paste 6 in the firing process described later, the target 3 is a substrate such as a ceramic substrate having heat resistance to the firing temperature, or is simultaneously fired with the conductive paste 6. A ceramic green sheet that can be used is preferably used.

【0016】前記の転写工程では、凹版1を対象物3か
ら引き離す前(転写中)の状態、或いは、凹版1を対象
物3から引き離した後(転写後)の状態で、流動物2を
物理化学変化により硬化させて隔壁部4を形成する。
In the transfer step, the fluid 2 is physically applied before the intaglio 1 is separated from the object 3 (during transfer) or after the intaglio 1 is separated from the object 3 (after transfer). The partition wall portion 4 is formed by being hardened by a chemical change.

【0017】具体的には、流動物2が熱硬化を可能した
ものである場合には、転写中の状態で硬化に必要な熱を
付与するか、転写後の状態で硬化に必要な熱を付与す
る。前者の場合には凹版1として硬化用の熱に耐え得る
材料から成るものを用いる。
Specifically, when the fluid 2 is heat-curable, the heat required for curing is applied during the transfer, or the heat required for curing is applied after the transfer. Give. In the former case, the intaglio 1 made of a material that can withstand heat for curing is used.

【0018】また、流動物2が光硬化を可能したもので
ある場合には、転写中の状態で硬化に必要な光を付与す
るか、転写後の状態で硬化に必要な光を付与する。前者
の場合には凹版1として硬化用の光を透過可能な材料か
ら成るものを用いる。
When the fluid 2 is photocurable, the light required for curing is applied during the transfer, or the light required for curing is applied after the transfer. In the former case, the intaglio 1 made of a material capable of transmitting light for curing is used.

【0019】さらに、流動物2が熱放出による硬化を可
能としたものである場合には、転写中の状態で放熱に必
要な時間放置するか、転写後の状態で放熱に必要な時間
放置する。前者の場合には凹版1を通じて外部に熱を放
出することは十分に可能であるし、両者の場合も送風等
により熱放出を促進する方法を採用しても構わない。
Further, when the fluid 2 can be cured by releasing heat, the fluid 2 is left for a time necessary for heat dissipation during the transfer, or left for a time necessary for heat dissipation after the transfer. . In the former case, it is possible to radiate heat to the outside through the intaglio 1, and in both cases, a method of accelerating heat release by blowing air may be adopted.

【0020】さらに、流動物2が溶媒蒸発による硬化を
可能としたものである場合には、転写中の状態で蒸発に
必要な時間放置するか、転写後の状態で蒸発に必要な時
間放置する。前者の場合には時間をかければ凹版1と対
象物3との間の微小な隙間を通じて蒸発を行うことが可
能であるし、両者の場合も送風等により蒸発を促進する
方法を採用しても構わない。
Further, when the fluid 2 is one that can be hardened by solvent evaporation, it is left in the state during transfer for the time required for evaporation, or left in the state after transfer for the time required for evaporation. . In the former case, it is possible to evaporate through a minute gap between the intaglio 1 and the object 3 if it takes time, and in both cases, a method of promoting evaporation by blowing air or the like may be adopted. I do not care.

【0021】前記の隔壁部4は、図5に示すように、対
象物3の表面にペースト充填領域5、即ち、隔壁部4の
壁面と対象物3の表面によって形成された凹部を画成す
るためのものである。転写中に硬化処理を行う場合には
前記の隔壁部4の縦断面形状は凹部1aの縦断面形状に
ほぼ一致したものとなり、転写後に硬化処理を行う場合
は隔壁部4の縦断面形状は凹部1aの縦断面形状に近似
した形状となる。使用する流動物2の粘性や硬化時間に
よっては転写後に硬化処理を行うと隔壁部4の形が大き
く崩れてしまう場合があるので、このような場合には転
写中に硬化処理を行うことが望ましい。
As shown in FIG. 5, the partition wall 4 defines a paste filling region 5 on the surface of the object 3, that is, a recess formed by the wall surface of the partition wall 4 and the surface of the object 3. It is for. When the curing process is performed during the transfer, the vertical cross-sectional shape of the partition wall portion 4 becomes substantially the same as the vertical cross-sectional shape of the recess 1a, and when the curing treatment is performed after the transfer, the vertical cross-sectional shape of the partition wall portion 4 is the recess. The shape is similar to the vertical cross-sectional shape of 1a. Depending on the viscosity of the fluid 2 to be used and the curing time, if the curing treatment is performed after the transfer, the shape of the partition wall portion 4 may be largely lost. In such a case, it is desirable to perform the curing treatment during the transfer. .

【0022】次に、図6に示すように、隔壁部4によっ
て画成されたペースト充填領域5に、隔壁部4の高さ寸
法とほぼ同じ厚み寸法となるように導電ペースト6を充
填する。この導電ペースト6の充填にはインクジェット
印刷法やスクリーン印刷法等が利用できる。
Next, as shown in FIG. 6, the paste filling region 5 defined by the partition wall portion 4 is filled with the conductive paste 6 so as to have a thickness dimension substantially the same as the height dimension of the partition wall portion 4. An ink jet printing method, a screen printing method, or the like can be used for filling the conductive paste 6.

【0023】前記の導電ペースト6は、700〜150
0℃の範囲での加熱焼成を可能とした公知のもので、具
体的には、銀,金,白金,パラジウム,ニッケル,銅,
アルミニウム,鉄等から選ばれる少なくとも1種の金属
粉末と、アクリル樹脂やフェノール樹脂やアルキッド樹
脂やロジンエステルや各種セルロース等から選ばれる少
なくとも1種の有機バインダと、アルコール系や炭化水
素系やエーテル系やエステル系等から選ばれる少なくと
も1種の有機溶剤とを必須として含み、必要に応じて各
種添加剤を含有する。
The conductive paste 6 is 700 to 150.
It is a known material that can be heated and baked in the range of 0 ° C., and specifically, silver, gold, platinum, palladium, nickel, copper,
At least one metal powder selected from aluminum, iron and the like, at least one organic binder selected from acrylic resin, phenol resin, alkyd resin, rosin ester and various celluloses, alcohol-based, hydrocarbon-based and ether-based And at least one organic solvent selected from ester type and the like as an essential component and various additives as necessary.

【0024】次に、図7に示すように、ペースト充填後
の対象物3を焼成炉(図示省略)に投入する等して、前
記ペースト充填領域5の導電ペースト6にこれを焼成す
るための熱を付与する。これにより、導電ペースト6中
の有機バインダ等が消失し且つ金属粉末が焼結して導体
層7が生成されると共に、焼成時の熱によって隔壁部4
が熱分解して消失し、導体層7のみが対象物3に残存す
る。
Next, as shown in FIG. 7, the object 3 after the paste filling is put into a firing furnace (not shown), and the conductive paste 6 in the paste filling area 5 is fired. Apply heat. As a result, the organic binder and the like in the conductive paste 6 disappears and the metal powder sinters to form the conductor layer 7, and the partition wall 4 is heated by the heat during firing.
Disappears due to thermal decomposition, and only the conductor layer 7 remains on the object 3.

【0025】前記導電ペースト6と前記隔壁部4との濡
れ性が高い場合には、図6に示したように、ペースト充
填領域に充填された導電ペースト6は隔壁部4の壁面に
密着した状態のまま焼成されるため、焼成時の収縮作用
によって図8に示すように導体層7のエッジ7aは丸み
を帯びるものの、焼成処理によって得られる導体層7の
縦断面形状は逆台形或いはその近似形となる。一方、前
記導電ペースト6と前記隔壁部4の濡れ性が低い場合に
は、図9に示すようにペースト充填領域に充填された導
電ペースト6は隔壁部4の壁面に密着しないため、図1
0に示すように焼成処理によって得られる導体層7の縦
断面形状は矩形或いはその近似形となる。
When the conductive paste 6 and the partition wall 4 have high wettability, as shown in FIG. 6, the conductive paste 6 filled in the paste filling region is in close contact with the wall surface of the partition wall 4. Since the conductor 7 is fired as it is, the edge 7a of the conductor layer 7 is rounded as shown in FIG. 8 due to the contraction effect during firing, but the vertical cross-sectional shape of the conductor layer 7 obtained by the firing process is an inverted trapezoid or an approximate shape thereof. Becomes On the other hand, when the wettability between the conductive paste 6 and the partition 4 is low, the conductive paste 6 filled in the paste filling area does not adhere to the wall surface of the partition 4 as shown in FIG.
As shown in FIG. 0, the vertical cross-sectional shape of the conductor layer 7 obtained by the firing process is rectangular or an approximate shape.

【0026】このように前述の導体層形成方法によれ
ば、対象物3にペースト充填領域5を画成する隔壁部4
を形成し、このペースト充填領域5に導電ペースト6を
充填した後、ペースト充填領域5の導電ペースト6にこ
れを焼成するための熱を加えて導体層7を生成すると共
にこの熱によって隔壁部4を消失させることにより、ペ
ースト充填領域5に対応した所望パターンまたは形状の
導体層7を対象物3に形成することができる。
As described above, according to the above-described conductor layer forming method, the partition wall portion 4 which defines the paste filling area 5 in the object 3 is formed.
After filling the paste-filled region 5 with the conductive paste 6, heat is applied to the conductive paste 6 in the paste-filled region 5 to sinter it to generate the conductor layer 7 and the heat causes the partition wall portion 4 to be formed. Is eliminated, the conductor layer 7 having a desired pattern or shape corresponding to the paste filling region 5 can be formed on the object 3.

【0027】つまり、凹版印刷を利用してペースト充填
領域5を画成する隔壁部4を対象物3に形成することに
より、所望パターンまたは形状の導体層7を対象物3に
形成できると共に、隔壁部4によって導体層7の厚み,
直径,幅及び隣接間隔等を制御して、対象物3に微細な
導体層7を高精度で形成することができる。また、隔壁
部の形成と導体ペーストの充填及び焼成を導体層形成の
基本手法としているので、導体層形成に係る設備費用及
びランニングコストを低く抑えることができる。
That is, by forming the partition wall portion 4 defining the paste filling area 5 on the object 3 by using intaglio printing, the conductor layer 7 having a desired pattern or shape can be formed on the object 3 and the partition wall. The thickness of the conductor layer 7 depends on the part 4,
The fine conductor layer 7 can be formed on the object 3 with high accuracy by controlling the diameter, the width, the adjacent space, and the like. Moreover, since the formation of the partition wall, the filling and firing of the conductor paste are the basic techniques for forming the conductor layer, the facility cost and running cost for forming the conductor layer can be kept low.

【0028】尚、前述の実施形態では、凹版1の凹部1
aとして縦断面逆台形のものを示したが、図11(A)
に示す縦断面矩形の凹部1bや図12(A)に示す縦断
面U字形の凹部1cを用いても前記と同じ手順にて対象
物3に所望パターンまたは形状の導体層7-1,7-2を形
成することができる。
In the above embodiment, the recess 1 of the intaglio 1 is used.
An inverted trapezoidal vertical section is shown as a, and FIG.
Even if the concave section 1b having a rectangular vertical cross section shown in FIG. 12 and the concave section 1c having a U-shaped vertical cross section shown in FIG. 12A are used, conductor layers 7-1, 7- 2 can be formed.

【0029】図11(A)に示す縦断面形状が矩形の凹
部1bを用いた場合には、図11(B)に示すように隔
壁部4-1の縦断面形状も矩形或いはその近似形となる。
導電ペースト6と隔壁部4-1の濡れ性が高い場合には、
図11(C)に示すように焼成処理によって得られる導
体層7の縦断面形状は矩形或いはその近似形となり、一
方、導電ペースト6と隔壁部4-1の濡れ性が低い場合
は、図11(D)に示すように焼成処理によって得られ
る導体層7の縦断面形状はエッジに丸みを帯びた矩形或
いはその近似形となる。
When the concave portion 1b having a rectangular vertical cross-sectional shape shown in FIG. 11A is used, the vertical cross-sectional shape of the partition wall portion 4-1 is also rectangular or its approximate shape as shown in FIG. 11B. Become.
If the conductive paste 6 and the partition wall 4-1 have high wettability,
As shown in FIG. 11C, the vertical cross-sectional shape of the conductor layer 7 obtained by the firing process is a rectangle or its approximate shape. On the other hand, when the wettability between the conductive paste 6 and the partition wall portion 4-1 is low, FIG. As shown in (D), the vertical cross-sectional shape of the conductor layer 7 obtained by the firing process is a rectangular shape with rounded edges or an approximate shape thereof.

【0030】一方、図12(A)に示す縦断面形状がU
字形の凹部1cを用いた場合には、図12(B)に示す
ように隔壁部4-2の縦断面形状も逆U字形或いはその近
似形となる。導電ペースト6と隔壁部4-2の濡れ性が高
い場合には、導電ペースト6を隔壁部4-2の高さ寸法と
ほぼ同じ厚み寸法となるように充填すると逆U字形の隔
壁部4-2上で導電ペースト6が繋がってしまう恐れがあ
るので、この場合には隔壁部4-2の高さ寸法よりも小さ
な厚み寸法となるように導電ペースト6を充填してこれ
を焼成して導体層7-2を得るようにすることが望ましい
(図12(C)参照)。一方、導電ペースト6と隔壁部
4の濡れ性が低い場合には前記のような恐れは生じず、
図12(D)に示すように焼成処理によって得られる導
体層7-2の縦断面形状はエッジに丸みを帯びた矩形或い
はその近似形となる。
On the other hand, the vertical sectional shape shown in FIG.
When the V-shaped recess 1c is used, as shown in FIG. 12 (B), the partition wall 4-2 also has an inverted U-shape or an approximate shape. If the conductive paste 6 and the partition wall 4-2 have high wettability, the conductive paste 6 may be filled so that the thickness of the partition paste is substantially the same as the height of the partition wall 4-2. Since there is a risk that the conductive paste 6 will be connected to the upper surface of the partition 2, in this case, the conductive paste 6 is filled so as to have a thickness dimension smaller than the height dimension of the partition wall 4-2, and this is fired to form a conductor. It is desirable to obtain the layer 7-2 (see FIG. 12C). On the other hand, when the wettability between the conductive paste 6 and the partition wall portion 4 is low, the above fear does not occur,
As shown in FIG. 12D, the vertical cross-sectional shape of the conductor layer 7-2 obtained by the firing process is a rectangular shape with rounded edges or an approximate shape thereof.

【0031】また、前述の実施形態では、流動物2とし
て物理化学変化による硬化を可能とし、且つ、硬化後の
加熱によって消失可能な物性を有するものを用い、ペー
スト充填領域5の導電ペースト6を焼成するときの熱に
よって硬化後の隔壁部4を消失させるものを示したが、
流動物として物理化学変化による硬化を可能とし、且
つ、硬化後の加熱によって誘電性物質に変化可能な物性
を有するもの、例えば前記流動物2に半導体ポリイミド
等の有機誘電性物質や未焼成誘電性セラミックス等のセ
ラミックス誘電性物質を含有させたものを用いれば、図
13に示すように、ペースト充填領域5の導電ペースト
6を焼成するときの熱によって隔壁部4を硬化或いは焼
結させて誘電性隔壁部8に変化させ、これを導体層7と
一緒に対象物3に残存させることができる。このような
方法を用いた場合でも前述の実施形態と同様の作用効果
が得られることは言うまでもない。
Further, in the above-described embodiment, as the fluid 2, a material that can be hardened by a physicochemical change and has physical properties that can be eliminated by heating after hardening is used, and the conductive paste 6 in the paste filling area 5 is used. Although it is shown that the partition wall portion 4 after curing is lost by heat during firing,
A fluid that has a physical property such that it can be hardened by a physicochemical change and that it can be transformed into a dielectric substance by heating after hardening, for example, the fluid 2 is an organic dielectric substance such as a semiconductor polyimide or an unfired dielectric. If a material containing a ceramics dielectric material such as ceramics is used, as shown in FIG. 13, the partition wall portion 4 is hardened or sintered by the heat when the conductive paste 6 in the paste filling area 5 is fired, so that the dielectric property is improved. It can be changed to the partition wall portion 8 and this can be left on the object 3 together with the conductor layer 7. Needless to say, even when such a method is used, the same effects as those of the above-described embodiment can be obtained.

【0032】[0032]

【発明の効果】以上詳述したように、本発明によれば、
微細な導体層を対象物に高精度で形成することができ、
導体層形成に係る設備費用及びランニングコストを低く
抑えることができる。
As described in detail above, according to the present invention,
A fine conductor layer can be formed on a target object with high precision,
The equipment cost and running cost for forming the conductor layer can be kept low.

【図面の簡単な説明】[Brief description of drawings]

【図1】凹版の部分縦断面図FIG. 1 is a partial vertical sectional view of an intaglio plate.

【図2】凹版の凹部内に流動物を充填する工程の説明図FIG. 2 is an explanatory view of a step of filling a fluid in the recess of the intaglio plate.

【図3】凹版の凹部内に充填された流動物を対象物に転
写する工程の説明図
FIG. 3 is an explanatory view of a process of transferring a fluid filled in a concave portion of an intaglio plate to an object.

【図4】凹版の凹部内に充填された流動物を対象物に転
写する工程の説明図
FIG. 4 is an explanatory diagram of a process of transferring a fluid filled in a concave portion of an intaglio plate to an object.

【図5】ペースト充填領域を画成する隔壁部が形成され
た対象物の部分縦断面図
FIG. 5 is a partial vertical cross-sectional view of an object in which a partition wall portion defining a paste filling area is formed.

【図6】導電ペーストをペースト充填領域に充填する工
程の説明図
FIG. 6 is an explanatory view of a process of filling the paste filling area with a conductive paste.

【図7】ペースト充填領域に充填された導電ペーストを
焼成して導体層を生成し、且つ、隔壁を消失させる工程
の説明図
FIG. 7 is an explanatory diagram of a step of firing a conductive paste filled in a paste filling area to generate a conductor layer and eliminating partition walls.

【図8】図7の部分拡大図FIG. 8 is a partially enlarged view of FIG.

【図9】導電ペーストと隔壁部の濡れ性が低い場合に得
られる充填ペーストの形状を示す図
FIG. 9 is a diagram showing the shape of a filling paste obtained when the wettability between the conductive paste and the partition wall is low.

【図10】導電ペーストと隔壁部の濡れ性が低い場合に
得られる導体層の形状を示す図
FIG. 10 is a diagram showing the shape of a conductor layer obtained when the wettability of the conductive paste and the partition wall is low.

【図11】凹部の縦断面形状の変形例を示す凹版の部分
縦断面図と、この凹部によって形成された隔壁部を示す
図と、この隔壁部によって形成された導体層を示す図
FIG. 11 is a partial vertical cross-sectional view of an intaglio showing a modification of the vertical cross-sectional shape of a recess, a view showing a partition wall formed by the recess, and a view showing a conductor layer formed by the partition wall.

【図12】凹部の縦断面形状の他の変形例を示す凹版の
部分縦断面図と、この凹部によって形成された隔壁部を
示す図と、この隔壁部によって形成された導体層を示す
FIG. 12 is a partial vertical cross-sectional view of an intaglio showing another modification of the vertical cross-sectional shape of the recess, a view showing a partition wall formed by the recess, and a view showing a conductor layer formed by the partition wall.

【図13】ペースト充填領域に充填された導電ペースト
を焼成して導体層を生成し、且つ、隔壁を誘電性隔壁部
に変化させる工程の説明図
FIG. 13 is an explanatory diagram of a process of firing a conductive paste filled in a paste filling region to generate a conductor layer and changing a partition into a dielectric partition.

【符号の説明】[Explanation of symbols]

1…凹版、1a…凹部、2…流動物、3…対象物、4,
4-1,4-2…隔壁部、5…ペースト充填領域、6…導電
ペースト、7,7-1,7-2…導体層、8…誘電性隔壁
部。
1 ... Intaglio, 1a ... Recess, 2 ... Fluid, 3 ... Object, 4,
4-1, 4-2 ... Partition portions, 5 ... Paste filling area, 6 ... Conductive paste, 7, 7-1, 7-2 ... Conductor layer, 8 ... Dielectric partition portion.

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】 物理化学変化による硬化を可能とした流
動物を凹版の凹部内に充填する工程と、 凹版の凹部内に充填された流動物を対象物に転写し、転
写中または転写後の状態で流動物を物理化学変化により
硬化させてペースト充填領域を画成する隔壁部を形成す
る工程と、 加熱焼成を可能とした導電ペーストをペースト充填領域
に充填する工程と、 ペースト充填領域の導電ペーストにこれを焼成するため
の熱を加えて導体層を生成する工程とを備える、ことを
特徴とする導体層形成方法。
1. A step of filling a fluid material capable of being hardened by a physicochemical change into a concave portion of an intaglio plate, and a step of transferring the fluid material filled in the concave portion of the intaglio plate to an object, and during or after transfer. In the state, the fluid is hardened by physicochemical change to form the partition wall that defines the paste filling area, the step of filling the paste filling area with the conductive paste capable of heating and firing, and the conductivity of the paste filling area And a step of applying heat for firing the paste to generate a conductor layer, the method for forming a conductor layer.
【請求項2】 流動物は熱硬化を可能とした材料から成
る、 ことを特徴とする請求項1に記載の導体層形成方法。
2. The method for forming a conductor layer according to claim 1, wherein the fluid is made of a thermosetting material.
【請求項3】 流動物は光硬化を可能とした材料から成
る、 ことを特徴とする請求項1に記載の導体層形成方法。
3. The conductor layer forming method according to claim 1, wherein the fluid is made of a photo-curable material.
【請求項4】 流動物は熱放出による硬化を可能とした
材料から成る、 ことを特徴とする請求項1に記載の導体層形成方法。
4. The conductor layer forming method according to claim 1, wherein the fluid is made of a material that can be cured by releasing heat.
【請求項5】 流動物は溶媒蒸発による硬化を可能とし
た材料から成る、 ことを特徴とする請求項1に記載の導体層形成方法。
5. The conductor layer forming method according to claim 1, wherein the fluid is made of a material that can be cured by solvent evaporation.
【請求項6】 流動物は硬化後の加熱によって消失可能
な物性を有していて、隔壁部は、ペースト充填領域の導
電ペーストを焼成するときの熱によって消失する、 ことを特徴とする請求項1〜5の何れか1項に記載の導
体層形成方法。
6. The liquid material has physical properties that can be eliminated by heating after curing, and the partition wall portion is eliminated by heat when firing the conductive paste in the paste filling region. The conductor layer forming method according to any one of 1 to 5.
【請求項7】 流動物は硬化後の加熱によって誘電性物
質に変化可能な物性を有していて、隔壁部は、ペースト
充填領域の導電ペーストを焼成するときの熱によって誘
電性隔壁部に変化する、 ことを特徴とする請求項1〜5の何れか1項に記載の導
体層形成方法。
7. The fluid has a physical property that can be changed to a dielectric substance by heating after curing, and the partition wall portion is changed to a dielectric partition wall portion by heat when firing the conductive paste in the paste filling region. The conductor layer forming method according to claim 1, wherein
【請求項8】 流動物は有機誘電性物質を含む、 ことを特徴とする請求項7に記載の導体層形成方法。8. The fluid comprises an organic dielectric material, The method for forming a conductor layer according to claim 7, wherein. 【請求項9】 流動物はセラミックス誘電性物質を含
む、 ことを特徴とする請求項7に記載の導体層形成方法。
9. The conductor layer forming method according to claim 7, wherein the fluid contains a ceramic dielectric material.
JP2002125401A 2002-04-26 2002-04-26 Method of forming conductor layer Withdrawn JP2003318517A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002125401A JP2003318517A (en) 2002-04-26 2002-04-26 Method of forming conductor layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002125401A JP2003318517A (en) 2002-04-26 2002-04-26 Method of forming conductor layer

Publications (1)

Publication Number Publication Date
JP2003318517A true JP2003318517A (en) 2003-11-07

Family

ID=29540137

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002125401A Withdrawn JP2003318517A (en) 2002-04-26 2002-04-26 Method of forming conductor layer

Country Status (1)

Country Link
JP (1) JP2003318517A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006351666A (en) * 2005-06-14 2006-12-28 Fujikura Ltd Light emitting device mounting board and its manufacturing method, light emitting device module, lighting device, display device, and traffic signal

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006351666A (en) * 2005-06-14 2006-12-28 Fujikura Ltd Light emitting device mounting board and its manufacturing method, light emitting device module, lighting device, display device, and traffic signal

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