JP2003301044A - Polyimide resin containing triazine ring having chelate ligand group - Google Patents

Polyimide resin containing triazine ring having chelate ligand group

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Publication number
JP2003301044A
JP2003301044A JP2002106390A JP2002106390A JP2003301044A JP 2003301044 A JP2003301044 A JP 2003301044A JP 2002106390 A JP2002106390 A JP 2002106390A JP 2002106390 A JP2002106390 A JP 2002106390A JP 2003301044 A JP2003301044 A JP 2003301044A
Authority
JP
Japan
Prior art keywords
type
polyguanamine
plating
chemical
ligand group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002106390A
Other languages
Japanese (ja)
Inventor
Tatsuyoshi Uemitsu
達義 上光
Tsunetomo Nakano
常朝 中野
Yoshiyuki Oishi
好行 大石
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tohto Chemical Industry Co Ltd
Original Assignee
Tohto Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tohto Chemical Industry Co Ltd filed Critical Tohto Chemical Industry Co Ltd
Priority to JP2002106390A priority Critical patent/JP2003301044A/en
Publication of JP2003301044A publication Critical patent/JP2003301044A/en
Pending legal-status Critical Current

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Abstract

<P>PROBLEM TO BE SOLVED: To provide a polyguanamineimide resin which contains a chelate ligand group and on which metal plating can be directly applied. <P>SOLUTION: A heat-resistant flexible polyguanamineimide is synthesized by reacting a triazine dichloride whose triazine ring has a chelate ligand group as a pendant, with a diamine and a tetracarboxylic acid dianhydride. A polyimide copolymer allowing electroless plating can be obtained since the chelate ligand group partly projecting from the surface coated with the resin is chelated with a metal. <P>COPYRIGHT: (C)2004,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明が属する技術分野】本発明は、ポリイミドの金属
めっきに関するものであり、電子部品製造技術分野特に
高密度ポリイミドフレキシブル配線板製造技術に関する
ものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to metal plating of polyimide, and more particularly to the field of electronic component manufacturing technology, and more particularly to high density polyimide flexible wiring board manufacturing technology.

【0002】この発明のポリイミドへの金属めっきによ
る配線板の製造は、特殊に合成されたポリイミド樹脂の
表面をめっきレジストを用いてパターニングした後通常
のめっき前処理すなわち脱脂、プリディップ、キャタラ
イジング、アクセレーティングを行った後、無電解ニッ
ケルめっき、無電解銅めっき、電解銅めっきを行い、め
っきレジストを剥離することで完成する。
The production of a wiring board by metal plating on polyimide according to the present invention is carried out by subjecting the surface of a specially synthesized polyimide resin to patterning with a plating resist, followed by ordinary plating pretreatment, that is, degreasing, pre-dip, catalyzing, After accelerating, electroless nickel plating, electroless copper plating, and electrolytic copper plating are performed, and the plating resist is removed to complete the process.

【0003】[0003]

【従来の技術】ポリイミドはめっきが難しいことは周知
のことで、これまで色々の試みがなされてきたが、いま
だ実用化に至っていない。一般的には、ポリイミドをア
ルカリ等で処理することにより表面を膨潤、粗化させア
ンカー効果を持たせることが考えられている。しかし、
アルカリ濃度や処理温度が高いことや、処理時間が長い
ことなどの支障があり実用化されていない。
2. Description of the Related Art It is well known that polyimide is difficult to plate, and various attempts have been made so far, but it has not yet been put to practical use. Generally, it is considered that the surface is swollen and roughened by treating the polyimide with an alkali or the like to have an anchor effect. But,
It has not been put to practical use due to problems such as high alkali concentration and high processing temperature and long processing time.

【0004】このようなことを踏まえて、ポリイミド上
にパラジウムの蒸着層を形成した後、アルカリ処理、無
電解めっきを行いさらに電解めっきを行うことが提案さ
れている(例えば特開平7−70762)。しかし、こ
の方法はポリイミドフィルムに金属箔をめっきしたいわ
ゆる複合フィルムの製造では効果があってもビルドアッ
プ工法によりポリイミド多層配線板を製造するような場
合には、工程上や設備費用上好ましくない。
In view of the above, it has been proposed that after a palladium vapor deposition layer is formed on a polyimide, alkali treatment and electroless plating are performed, and then electrolytic plating is performed (for example, Japanese Patent Laid-Open No. 7-70762). . However, even if this method is effective in the production of a so-called composite film in which a polyimide film is plated with a metal foil, it is not preferable in terms of steps and equipment costs when a polyimide multilayer wiring board is produced by a build-up method.

【0005】[0005]

【発明が解決しようとする課題】以上のように、ポリイ
ミド上にはめっきが困難ということから、これまでこの
問題点を打開して研究開発することは行われていなかっ
た。
As described above, since it is difficult to plate on polyimide, no research and development has been conducted so far to overcome this problem.

【0006】そこで、ポリイミドに金属とキレート結合
をする配位基を持たせることにより、めっきが可能にな
るとの考えに基づいて、鋭意検討した結果、キレート配
位基を有するトリアジンジクロリドとテトラカルボン酸
二無水物、およびジアミンの共重合により得られるポリ
グアナミンイミドが金属めっき性を有していることを明
らかにし、この発明に至った。
[0006] Therefore, as a result of intensive studies based on the idea that plating can be achieved by providing a polyimide with a coordination group capable of forming a chelate bond with a metal, as a result, triazine dichloride and a tetracarboxylic acid having a chelate coordination group are obtained. It was clarified that polyguanamine imide obtained by copolymerization of dianhydride and diamine has metal plating property, and the present invention was achieved.

【課題を解決するための手段】[Means for Solving the Problems]

【0007】この発明におけるポリグアナミンイミドと
しては、トリアジン環にキレート配位基[化4]をペン
ダントとして有するトリアジンジクロリド成分と[化
5]および[化6]に示す酸二無水物およびジアミン成
分とを溶媒中で重合、イミド化して得られるポリマーで
あれば良い。
The polyguanamine imide in the present invention includes a triazine dichloride component having a chelate coordination group [Chemical Formula 4] as a pendant on a triazine ring, and an acid dianhydride and a diamine component represented by [Chemical Formula 5] and [Chemical Formula 6]. Any polymer can be used as long as it is a polymer obtained by polymerizing and imidizing the above.

【0008】この発明におけるトリアジンジクロリドと
しては、塩化シアヌルとキレート配位基含有化合物から
合成される一置換体である。
The triazine dichloride in the present invention is a monosubstituted compound synthesized from cyanuric chloride and a compound containing a chelate coordination group.

【0009】この発明におけるトリアジン環のペンダン
トとなるキレート配位基としては[化4]に一般式
(1)〜(12)で示す。
The chelate coordinating group serving as the triazine ring pendant in the present invention is represented by the general formulas (1) to (12) in [Chemical Formula 4].

【化4】 フェナントロリン系 (1) ビピリジル系 (2) ジピリジルアミン系 (3) ジカルボキシビキノリン系 (4) ヒドロキシアゾベンゼン系 (5) サリチルアルデヒドオキシアニル系 (6) ピリジルアゾアミノフェノール系 (7) ピリジルアゾナフトール系 (8) カルボキシメチルアミノ メチルウンベリフェロン系 (9) ビベンゾオキサゾリン系 (10) ジフェニルピリジルトリアジン系 (11) トリスピリジルトリアジン系 (12)[Chemical 4] Phenanthroline system (1) Bipyridyl (2) Dipyridylamine type (3) Dicarboxybiquinoline type (4) Hydroxyazobenzene type (5) Salicylaldehyde oxyanil type (6) Pyridylazoaminophenol type (7) Pyridylazonaphthol type (8) Carboxymethyl aminomethyl umbelliferone system (9) Bibenzoxazoline type (10) Diphenylpyridyltriazine type (11) Trispyridyltriazine type (12)

【0010】この発明におけるキレート配位基を有する
トリアジン環は、一種類だけでも良いが複数でも良い。
The triazine ring having a chelate coordinating group in the present invention may be one kind or plural kinds.

【0011】この発明におけるテトラカルボン酸二無水
物成分として[化5]に示すものが使用可能であるが、
複数使用することも可能である。
As the tetracarboxylic acid dianhydride component in the present invention, the compound represented by [Chemical Formula 5] can be used.
It is also possible to use more than one.

【0012】[0012]

【化5】 [Chemical 5]

【0013】この発明におけるジアミンとして、[化
6]に示すジアミン化合物が使用可能であるが、前述の
通り複数使用も可能である。
As the diamine in the present invention, the diamine compound shown in [Chemical Formula 6] can be used, but a plurality of diamine compounds can be used as described above.

【0014】[0014]

【化6】 [Chemical 6]

【0015】この発明におけるポリグアナミンイミドの
各成分については、前述の通り一種類でも数種類でもよ
く、テトラカルボン酸無水物及びジアミンについては、
耐熱性等を重視した場合は芳香族化合物が好ましいが、
溶解性や低誘電性を重視する場合は脂環式化合物が好適
である。当然両者の併用も可能である。
Each component of the polyguanamine imide in the present invention may be one kind or several kinds as described above, and the tetracarboxylic acid anhydride and the diamine may be
Aromatic compounds are preferred when heat resistance is important,
When importance is attached to solubility and low dielectric properties, alicyclic compounds are suitable. Of course, both can be used together.

【0016】この発明において、分子量を調整するため
に無水フタル酸、無水マレイン酸、無水ナジック酸等の
ジカルボン酸無水物やアニリン、ヒドロキシアニリン、
メトキシアニリン等のアミン化合物を末端停止剤として
用いることができる。
In the present invention, in order to adjust the molecular weight, dicarboxylic acid anhydrides such as phthalic anhydride, maleic anhydride and nadic acid anhydride, aniline and hydroxyaniline,
An amine compound such as methoxyaniline can be used as a terminal stopper.

【0017】この発明におけるポリグアナミンイミドは
三成分からなるため、トリアジン環成分が限りなく少な
くなれば物性的にポリイミドに近くなり、テトラカルボ
ン酸二無水物が限りなく少なくなれば、物性的にポリグ
アナミンに近くなるため、どのような性能を樹脂に期待
するかによって分子設計が可能である。
Since the polyguanamine imide in the present invention comprises three components, if the triazine ring component is infinitely small, the physical properties are close to those of polyimide, and if the tetracarboxylic dianhydride is infinitely small, the polyguanamine imide is in physical properties. Since it is closer to guanamine, molecular design is possible depending on what kind of performance is expected of the resin.

【0018】この発明のポリグアナミンイミドから形成
される塗膜は、強靭で可とう性があるとともに耐熱性が
あるため電子部品材料、とりわけ機能的な面で従来のポ
リイミドの改良材料としての展開ができる。
Since the coating film formed from the polyguanamine imide of the present invention is tough, flexible and heat resistant, it can be developed as an improved material for electronic component materials, particularly conventional polyimides in terms of functionality. it can.

【0019】[0019]

【実施例】以下実施例により本発明を説明する。以下の
実施例で使用した酸二無水物とジアミンの化学構造とそ
の略号は[化2]および[化3]に示しているが実施例
で使用した化合物名と略号を以下に示す。
The present invention will be described with reference to the following examples. The chemical structures and abbreviations of the acid dianhydride and diamine used in the following examples are shown in [Chemical Formula 2] and [Chemical Formula 3], but the compound names and abbreviations used in the Examples are shown below.

【0020】PMDA:ピロメリット酸二無水物 ODPA:3,3’,4,4’−ジフェニルエーテルテ
トラカルボン酸二無水物 BPDA:3,3’,4,4’−ビフェニルテトラカル
ボン酸二無水物 BCD:ビシクロオクトエンテトラカルボン酸二無水物 DADE:ジアミノジフェニルエーテル TPE−R:1,3−ビス(4−アミノフェノキシ)ベ
ンゼン BAPP:2,2’−ビス[4−(4−アミノフェノキ
シ)フェニル]プロパン
PMDA: Pyromellitic dianhydride ODPA: 3,3 ', 4,4'-diphenyl ether tetracarboxylic dianhydride BPDA: 3,3', 4,4'-biphenyltetracarboxylic dianhydride BCD : Bicyclooctene tetracarboxylic acid dianhydride DADE: diaminodiphenyl ether TPE-R: 1,3-bis (4-aminophenoxy) benzene BAPP: 2,2'-bis [4- (4-aminophenoxy) phenyl] propane

【0021】本発明におけるポリグアナミンイミド樹脂
の塗膜表面のめっき方法及びその引き剥がし強度の測定
方法は、通常の無電解ニッケルめっき又は無電解銅めっ
き(それぞれ前処理工程を含む)を行った後、通常の電
解銅めっき(ピロリン酸銅めっき、硫酸銅めっきなど)
を行い金属層の厚さを30〜35μm程度とし、その表
面に1cm幅の切込みを入れ、その部分の金属層を引き
剥がし、90度方向に荷重を加えていき、5cm/分の
速さで剥離した時の荷重を測定する。
The method of plating the surface of the coating film of the polyguanamine imide resin and the method of measuring the peeling strength thereof in the present invention are the same as those after performing ordinary electroless nickel plating or electroless copper plating (each including a pretreatment step). , Normal electrolytic copper plating (copper pyrophosphate plating, copper sulfate plating, etc.)
The thickness of the metal layer is set to about 30 to 35 μm, a notch having a width of 1 cm is made on the surface, the metal layer at that portion is peeled off, and a load is applied in the 90 ° direction at a speed of 5 cm / min. The load when peeled off is measured.

【0022】(実施例1)6−ジピリジルアミノ−s−トリアジン−2,4−ジク
ロリドの合成 三つ口フラスコに塩化シアヌル26.9g(146mm
ol)及びテトラヒドロフラン(THF)200mlを
入れ窒素雰囲気下、氷浴中0〜5℃で溶解させた。これ
にTHF100mlに溶解させた2,2’−ジピリジル
アミン25.0g(146mmol)とトリエチルアミ
ン14.8g(146mmol)の溶液を攪拌しながら
反応温度0〜5℃の範囲で滴下し、その後2時間反応さ
せ、その後さらに30〜40℃に昇温し8時間反応させ
た。反応後、THFを除去し得られた黄色固体をトルエ
ンに溶解させ中性になるまで水洗、分液後、無水硫酸ナ
トリウムで脱水し、ろ過後トルエンを除去し、トルエン
/ヘキサンの混合溶媒で再結晶して白色の結晶35.0
gを得た。融点は177℃である。キレート配位基を有するポリグアナミンイミドの合成 100mlの三つ口フラスコに窒素雰囲気下ジアミンT
PE−R2.92g(10mmol)、1,3−ジメチ
ルイミダゾリドン(DMI)20mlを加え氷浴中で0
℃に冷却した。これに、ビストリメチルシリルアセトア
ミド(BSA)2.03g(10mmol)を注入し0
℃で30分、室温で15分反応させ、次いで6−ジピリ
ジルアミノ−s−トリアジン−2,4−ジクロリド1.
60g(5mmol)とPMDA1.09g(5mmo
l)を同時に加え20℃で1時間、80℃で24時間反
応させた。この重合溶液を250℃で加熱しイミド化す
ることにより黄色透明で柔軟なポリグアナミンイミドの
フィルムが得られた(図1)。得られたフィルムについ
ては、ガラス転移点、5%重量減少温度を測定した(表
1)。ポリグアナミンイミドフィルムのめっき 得られたポリグアナミンイミドのフィルム層をOPC−
380コンデクリーンM(奥野製薬工業(株)製、以下
同様)に65℃で5分浸漬し水洗後、OPC−SAL−
Mに室温で1分浸漬、直ちにOPC−80キャタリスト
Mに室温で5分浸漬、水洗する。次いでOPC−555
アクセレータMに室温で5分浸漬、水洗後TMP化学ニ
ッケル浴に室温で10分入れ無電解ニッケルめっきを施
す。その後、必要に応じ、銅置換剤ANCアクチ浴に室
温で1〜2分浸漬し銅置換層を形成する。次いで、25
〜30℃に調温された硫酸銅めっき浴で陽極電流密度2
A/dmで60分電解めっきをし、30μmの銅めっ
き層を形成した。この銅めっき層にカッターナイフで1
cm幅の切込みを入れてフィルム層より引き剥がし、9
0度方向に荷重を加え、5cm/分の速度で剥がれた時
の荷重を測定したところ、表1に示した結果が得られ
た。 (実施例2〜3)実施例1におけるキレート配位基含有
トリアジンジクロリドとPMDAのモル比を変えた以外
は同様に反応し、ポリグアナミンイミドのフィルムを作
成して、Tg、5%重量減少温度を測定した。また、フ
ィルムにめっき処理を施し、引き剥がし強度を測定し
た。その結果を表1に示す。 (実施例4)実施例1におけるジアミンとしてDADE
を、酸二無水物としてODPAを用いた以外は同様に反
応し、ポリグアナミンイミドのフィルムを作成して、T
g、5%重量減少温度を測定した。また、フィルムにめ
っき処理を施し、引き剥がし強度を測定した。その結果
を表1に示す。 (実施例5)実施例1におけるジアミンとしてBAPB
を、酸二無水物としてBPDAとBCDを等モルで同様
に反応し、ポリグアナミンイミドのフィルムを作成し
て、Tg、5%重量減少温度を測定した。また、フィル
ムにめっき処理を施し、引き剥がし強度を測定した。そ
の結果を表1に示す。 (実施例6)実施例1におけるジアミンとしてDADE
とTPE−Rを、酸二無水物としてODPA用いた以外
は同様に反応し、ポリグアナミンイミドのフィルムを作
成して、Tg、5%重量減少温度を測定した。また、フ
ィルムにめっき処理を施し、引き剥がし強度を測定し
た。その結果を表1に示す。 (実施例7)実施例1におけるキレート配位基である
2,2’−ジピリジルアミンの代わりに5−アミノ−
1,10−フェナントロリンを反応させた以外は同様に
反応し、ポリグアナミンイミドフィルムを作成して、T
g、5%重量減少温度を測定した。また、フィルムにめ
っき処理を施し、引き剥がし強度を測定した。その結果
を表1に示す。 (比較例1〜2)実施例1における6−ジピリジルアミ
ノ−s−トリアジン−2,4−ジクロリドとPMDAの
どちらかを除いて反応させたポリイミドないしはポリグ
アナミンのフィルムを作成し、Tg、5%重量減少温度
を測定した。また、フィルムにめっき処理を施し、引き
剥がし強度を測定した。その結果を表1に示す。
(Example 1) 6-dipyridylamino-s-triazine-2,4-dic
Synthesis of lolide 26.9 g (146 mm) of cyanuric chloride in a 3-neck flask
ol) and 200 ml of tetrahydrofuran (THF) were added and the mixture was dissolved in an ice bath at 0 to 5 ° C. under a nitrogen atmosphere. A solution of 25.0 g (146 mmol) of 2,2'-dipyridylamine and 14.8 g (146 mmol) of triethylamine dissolved in 100 ml of THF was added dropwise with stirring within a reaction temperature range of 0 to 5 ° C, and then reacted for 2 hours. Then, the temperature was further raised to 30 to 40 ° C. and the reaction was carried out for 8 hours. After the reaction, THF was removed and the obtained yellow solid was dissolved in toluene, washed with water until neutral, separated, dehydrated with anhydrous sodium sulfate, filtered, and the toluene removed to remove toluene.
Recrystallized with a mixed solvent of hexane / hexane to give white crystals 35.0
g was obtained. The melting point is 177 ° C. Synthesis of polyguanamine imide having chelate coordination group Diamine T was added to a 100 ml three-necked flask under nitrogen atmosphere.
2.92 g (10 mmol) of PE-R and 20 ml of 1,3-dimethylimidazolidone (DMI) were added and the mixture was cooled to 0 in an ice bath.
Cooled to ° C. To this, 2.03 g (10 mmol) of bistrimethylsilylacetamide (BSA) was injected and 0
C. for 30 minutes, room temperature for 15 minutes, and then 6-dipyridylamino-s-triazine-2,4-dichloride.
60 g (5 mmol) and PMDA 1.09 g (5 mmo
1) was added at the same time and reacted at 20 ° C. for 1 hour and at 80 ° C. for 24 hours. A yellow transparent and flexible polyguanamine imide film was obtained by heating this polymerization solution at 250 ° C. for imidization (FIG. 1). The glass transition point and 5% weight loss temperature of the obtained film were measured (Table 1). Plating of polyguanamine imide film The resulting polyguanamine imide film layer is OPC-
OPC-SAL- after immersing in 380 Condeclean M (Okuno Pharmaceutical Co., Ltd., the same below) at 65 ° C. for 5 minutes and washing with water.
Immerse in M for 1 minute at room temperature and immediately soak in OPC-80 Catalyst M for 5 minutes at room temperature and wash with water. Then OPC-555
Immerse in accelerator M for 5 minutes at room temperature, wash with water, and place in TMP chemical nickel bath for 10 minutes at room temperature to perform electroless nickel plating. Then, if necessary, it is immersed in a copper displacement agent ANC act bath at room temperature for 1 to 2 minutes to form a copper displacement layer. Then 25
Anode current density of 2 in a copper sulfate plating bath adjusted to -30 ℃
Electroplating was performed at A / dm 2 for 60 minutes to form a 30 μm copper plating layer. 1 with a cutter knife on this copper plating layer
Make a notch of cm width and peel it off from the film layer.
When a load was applied in the 0 degree direction and the load when peeled at a speed of 5 cm / min was measured, the results shown in Table 1 were obtained. (Examples 2 to 3) A chelate coordination group-containing triazine dichloride in Example 1 was reacted in the same manner as in Example 1 except that the molar ratio of PMDA was changed to prepare a polyguanamine imide film. Was measured. In addition, the film was plated and the peel strength was measured. The results are shown in Table 1. (Example 4) DADE as the diamine in Example 1
Was reacted in the same manner except that ODPA was used as the acid dianhydride to form a polyguanamine imide film, and
g, 5% weight loss temperature was measured. In addition, the film was plated and the peel strength was measured. The results are shown in Table 1. (Example 5) BAPB as the diamine in Example 1
Was similarly reacted with BPDA as an acid dianhydride and BCD in an equimolar manner to form a polyguanamine imide film, and Tg, 5% weight loss temperature was measured. In addition, the film was plated and the peel strength was measured. The results are shown in Table 1. (Example 6) DADE as the diamine in Example 1
And TPE-R were reacted in the same manner except that ODPA was used as the acid dianhydride to form a polyguanamine imide film, and the Tg, 5% weight loss temperature was measured. In addition, the film was plated and the peel strength was measured. The results are shown in Table 1. (Example 7) Instead of the chelate coordinating group 2,2'-dipyridylamine in Example 1, 5-amino-
The reaction was conducted in the same manner except that 1,10-phenanthroline was reacted to prepare a polyguanamine imide film,
g, 5% weight loss temperature was measured. In addition, the film was plated and the peel strength was measured. The results are shown in Table 1. (Comparative Examples 1 and 2) Films of polyimide or polyguanamine reacted by removing either 6-dipyridylamino-s-triazine-2,4-dichloride and PMDA in Example 1 were prepared, and Tg was 5%. The weight loss temperature was measured. In addition, the film was plated and the peel strength was measured. The results are shown in Table 1.

【0023】ポリグアナミンイミドの合成反応式を[図
1]に示す。
The synthetic reaction formula of polyguanamine imide is shown in [Fig.
1].

【図1】 [Figure 1]

【0024】実施例1〜7及び比較例1、2で測定した
試験結果を表1にまとめて示す。
The test results measured in Examples 1 to 7 and Comparative Examples 1 and 2 are summarized in Table 1.

【表1】 [Table 1]

【発明の効果】ポリイミドワニスを塗布し乾燥した塗膜
へのめっきは、特別の表面処理をしない限りほとんど不
可能であった。しかし、キレート配位基を付与した耐熱
性化合物であるトリアジンジクロリドと共重合させたポ
リグアナミンイミドでは塗膜表面に突出したキレート配
位基にめっき触媒金属であるパラジウムイオンが吸着し
易くなり、結果として金属めっきの密着性が大幅に改良
された。
EFFECT OF THE INVENTION Plating of a coating film obtained by applying a polyimide varnish and drying it is almost impossible unless a special surface treatment is performed. However, in polyguanamine imide copolymerized with triazine dichloride, which is a heat-resistant compound with a chelate coordination group, palladium ions, which are plating catalyst metals, are easily adsorbed to the chelate coordination groups protruding on the coating surface, resulting in As a result, the adhesion of the metal plating has been greatly improved.

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4J043 PA06 PA08 PB03 PB08 PB11 PB15 PB22 PB23 PB24 PC016 PC066 PC146 PC166 QB15 QB21 QB26 QB31 QB50 QB52 RA08 RA34 RA35 RA37 SA06 SA43 SA54 SB05 TA22 TA43 TB05 UA032 UA121 UA122 UA131 UA132 UA141 UA142 UA151 UA161 UA171 UA181 UA262 UB021 UB061 UB062 UB121 UB131 UB152 UB301 UB302 UB351 VA021 VA031 VA041 VA062 WA09 XB05 XB07 XB09 ZA60 ZB50    ─────────────────────────────────────────────────── ─── Continued front page    F term (reference) 4J043 PA06 PA08 PB03 PB08 PB11                       PB15 PB22 PB23 PB24 PC016                       PC066 PC146 PC166 QB15                       QB21 QB26 QB31 QB50 QB52                       RA08 RA34 RA35 RA37 SA06                       SA43 SA54 SB05 TA22 TA43                       TB05 UA032 UA121 UA122                       UA131 UA132 UA141 UA142                       UA151 UA161 UA171 UA181                       UA262 UB021 UB061 UB062                       UB121 UB131 UB152 UB301                       UB302 UB351 VA021 VA031                       VA041 VA062 WA09 XB05                       XB07 XB09 ZA60 ZB50

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 トリアジン環に一般式(1)〜(12)
で表される[化1]の構造ないしは類似したキレート配
位基を含むトリアジンジクロリド(A)と、[化2]に
示されるテトラカルボン酸二無水物(B)及び[化3]
に示されるジアミン(C)を反応させて合成されること
を特徴とするポリグアナミンイミド樹脂。 【化1】 フェナントロリン系 (1) ビピリジル系 (2) ジピリジルアミン系 (3) ジカルボキシビキノリン系 (4) ヒドロキシアゾベンゼン系 (5) サリチルアルデヒドオキシアニル系 (6) ピリジルアゾアミノフェノール系 (7) ピリジルアゾナフトール系 (8) カルボキシメチルアミノ メチルウンベリフェロン系 (9) ビベンゾオキサゾリン系 (10) ジフェニルピリジルトリアジン系 (11) トリスピリジルトリアジン系 (12)
1. A triazine ring having general formulas (1) to (12):
And a triazine dichloride (A) having a structure of [Chemical formula 1] or a chelate coordination group similar thereto, and tetracarboxylic dianhydride (B) and [Chemical formula 3] shown in [Chemical formula 2].
A polyguanamine imide resin, which is synthesized by reacting the diamine (C) shown in 1. [Chemical 1] Phenanthroline system (1) Bipyridyl (2) Dipyridylamine type (3) Dicarboxybiquinoline type (4) Hydroxyazobenzene type (5) Salicylaldehyde oxyanil type (6) Pyridylazoaminophenol type (7) Pyridylazonaphthol type (8) Carboxymethyl aminomethyl umbelliferone system (9) Bibenzoxazoline type (10) Diphenylpyridyltriazine type (11) Trispyridyltriazine type (12)
【請求項2】ポリグアナミンイミド樹脂の原料となるキ
レート配位基含有トリアジンジクロリド(A)とテトラ
カルボン酸二無水物(B)の割合がモル比で(A)/
(A)+(B)が10〜90/100好ましくは30〜
70/100であることを特徴とするキレート配位基を
含有するポリグアナミンイミド樹脂。 【化2】 【化3】
2. A chelate coordination group-containing triazine dichloride (A), which is a raw material of a polyguanamine imide resin, and a tetracarboxylic dianhydride (B) are in a molar ratio of (A) /
(A) + (B) is 10 to 90/100, preferably 30 to
A polyguanamine imide resin containing a chelate coordination group, which is 70/100. [Chemical 2] [Chemical 3]
JP2002106390A 2002-04-09 2002-04-09 Polyimide resin containing triazine ring having chelate ligand group Pending JP2003301044A (en)

Priority Applications (1)

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Country Link
JP (1) JP2003301044A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011084637A (en) * 2009-10-15 2011-04-28 Asahi Kasei E-Materials Corp Polyimide resin composition and polyimide-metal laminated sheet
CN104370772A (en) * 2014-11-23 2015-02-25 桂林理工大学 Substituted salicylaldehyde-anil and application thereof
CN108690196A (en) * 2017-03-31 2018-10-23 长兴材料工业股份有限公司 Polyimide precursor composition, use thereof, and polyimide prepared therefrom

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011084637A (en) * 2009-10-15 2011-04-28 Asahi Kasei E-Materials Corp Polyimide resin composition and polyimide-metal laminated sheet
CN104370772A (en) * 2014-11-23 2015-02-25 桂林理工大学 Substituted salicylaldehyde-anil and application thereof
CN108690196A (en) * 2017-03-31 2018-10-23 长兴材料工业股份有限公司 Polyimide precursor composition, use thereof, and polyimide prepared therefrom
KR20190055688A (en) * 2017-03-31 2019-05-23 이터널 머티리얼스 씨오., 엘티디. Polyimide precursor composition, use thereof and polyimide made therefrom
KR102080728B1 (en) * 2017-03-31 2020-02-24 이터널 머티리얼스 씨오., 엘티디. Polyimide precursor composition, use thereof and polyimide made therefrom
US11034797B2 (en) 2017-03-31 2021-06-15 Eternal Materials Co., Ltd. Polyimide precursor composition, use thereof and polyimide made therefrom
CN108690196B (en) * 2017-03-31 2021-09-03 长兴材料工业股份有限公司 Polyimide precursor composition, use thereof, and polyimide prepared therefrom

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