JP2003292485A - Sulfonamide derivative - Google Patents
Sulfonamide derivativeInfo
- Publication number
- JP2003292485A JP2003292485A JP2002098332A JP2002098332A JP2003292485A JP 2003292485 A JP2003292485 A JP 2003292485A JP 2002098332 A JP2002098332 A JP 2002098332A JP 2002098332 A JP2002098332 A JP 2002098332A JP 2003292485 A JP2003292485 A JP 2003292485A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- lower alkylene
- methyl
- mixture
- added
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- HFFXLYHRNRKAPM-UHFFFAOYSA-N 2,4,5-trichloro-n-(5-methyl-1,2-oxazol-3-yl)benzenesulfonamide Chemical compound O1C(C)=CC(NS(=O)(=O)C=2C(=CC(Cl)=C(Cl)C=2)Cl)=N1 HFFXLYHRNRKAPM-UHFFFAOYSA-N 0.000 title claims abstract description 9
- 150000001875 compounds Chemical class 0.000 claims abstract description 295
- -1 and R 4 is H Chemical group 0.000 claims description 127
- 125000000217 alkyl group Chemical group 0.000 claims description 113
- 125000002947 alkylene group Chemical group 0.000 claims description 49
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 46
- 229910052736 halogen Inorganic materials 0.000 claims description 28
- 150000002367 halogens Chemical group 0.000 claims description 27
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 25
- 229910052739 hydrogen Inorganic materials 0.000 claims description 19
- 150000003839 salts Chemical class 0.000 claims description 15
- 239000000126 substance Substances 0.000 claims description 15
- 125000001424 substituent group Chemical group 0.000 claims description 15
- 125000003107 substituted aryl group Chemical group 0.000 claims description 13
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 13
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 10
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 10
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 claims description 9
- 229910052717 sulfur Inorganic materials 0.000 claims description 9
- 239000002259 anti human immunodeficiency virus agent Substances 0.000 claims description 8
- 125000001072 heteroaryl group Chemical group 0.000 claims description 8
- 229940124411 anti-hiv antiviral agent Drugs 0.000 claims description 6
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 229910052794 bromium Inorganic materials 0.000 claims description 5
- 239000004480 active ingredient Substances 0.000 claims description 4
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 3
- 239000008194 pharmaceutical composition Substances 0.000 claims description 3
- 125000004800 4-bromophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Br 0.000 claims description 2
- 229910052796 boron Inorganic materials 0.000 claims description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 2
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 claims description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 2
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 claims 6
- 239000003814 drug Substances 0.000 abstract description 14
- 102100034343 Integrase Human genes 0.000 abstract description 9
- 108010092799 RNA-directed DNA polymerase Proteins 0.000 abstract description 9
- 239000003419 rna directed dna polymerase inhibitor Substances 0.000 abstract description 7
- 229940124530 sulfonamide Drugs 0.000 abstract description 6
- 150000003456 sulfonamides Chemical class 0.000 abstract description 6
- 241000725303 Human immunodeficiency virus Species 0.000 abstract description 5
- 239000002253 acid Substances 0.000 abstract description 5
- 230000002401 inhibitory effect Effects 0.000 abstract description 4
- 125000004433 nitrogen atom Chemical group N* 0.000 abstract description 2
- 125000004434 sulfur atom Chemical group 0.000 abstract description 2
- 229940124597 therapeutic agent Drugs 0.000 abstract description 2
- 125000004122 cyclic group Chemical group 0.000 abstract 2
- 208000035473 Communicable disease Diseases 0.000 abstract 1
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 233
- 239000000203 mixture Substances 0.000 description 167
- 239000000243 solution Substances 0.000 description 125
- 230000002829 reductive effect Effects 0.000 description 103
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 90
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 87
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 78
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 60
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 51
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 49
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 49
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 46
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 46
- 238000004992 fast atom bombardment mass spectroscopy Methods 0.000 description 44
- 239000012044 organic layer Substances 0.000 description 42
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 41
- 238000010898 silica gel chromatography Methods 0.000 description 41
- 239000007787 solid Substances 0.000 description 40
- 238000005160 1H NMR spectroscopy Methods 0.000 description 39
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 36
- 238000001816 cooling Methods 0.000 description 36
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 35
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 33
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 30
- 238000006243 chemical reaction Methods 0.000 description 30
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 29
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 28
- 239000011541 reaction mixture Substances 0.000 description 28
- 229920006395 saturated elastomer Polymers 0.000 description 28
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 27
- 238000010992 reflux Methods 0.000 description 27
- 235000017557 sodium bicarbonate Nutrition 0.000 description 24
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 24
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 21
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 20
- 238000001914 filtration Methods 0.000 description 18
- 239000002904 solvent Substances 0.000 description 18
- KHBQMWCZKVMBLN-UHFFFAOYSA-N Benzenesulfonamide Chemical compound NS(=O)(=O)C1=CC=CC=C1 KHBQMWCZKVMBLN-UHFFFAOYSA-N 0.000 description 16
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 16
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 15
- 239000003795 chemical substances by application Substances 0.000 description 15
- 238000004519 manufacturing process Methods 0.000 description 15
- 239000007864 aqueous solution Substances 0.000 description 14
- 238000010438 heat treatment Methods 0.000 description 14
- 125000000623 heterocyclic group Chemical group 0.000 description 14
- 238000003756 stirring Methods 0.000 description 14
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 12
- 238000000034 method Methods 0.000 description 12
- 125000005275 alkylenearyl group Chemical group 0.000 description 11
- 125000003118 aryl group Chemical group 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 9
- 235000011054 acetic acid Nutrition 0.000 description 9
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical class [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 8
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 8
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 8
- 239000005457 ice water Substances 0.000 description 8
- 239000002994 raw material Substances 0.000 description 8
- 229940125904 compound 1 Drugs 0.000 description 7
- 239000012141 concentrate Substances 0.000 description 7
- 235000008504 concentrate Nutrition 0.000 description 7
- 125000000753 cycloalkyl group Chemical group 0.000 description 7
- 238000001035 drying Methods 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 125000006239 protecting group Chemical group 0.000 description 7
- OISVCGZHLKNMSJ-UHFFFAOYSA-N 2,6-dimethylpyridine Chemical compound CC1=CC=CC(C)=N1 OISVCGZHLKNMSJ-UHFFFAOYSA-N 0.000 description 6
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 6
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 6
- 229940124158 Protease/peptidase inhibitor Drugs 0.000 description 6
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical class [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 241000700605 Viruses Species 0.000 description 6
- 125000003342 alkenyl group Chemical group 0.000 description 6
- 229940079593 drug Drugs 0.000 description 6
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 6
- 239000000137 peptide hydrolase inhibitor Substances 0.000 description 6
- CHKVPAROMQMJNQ-UHFFFAOYSA-M potassium bisulfate Chemical compound [K+].OS([O-])(=O)=O CHKVPAROMQMJNQ-UHFFFAOYSA-M 0.000 description 6
- 229910000343 potassium bisulfate Inorganic materials 0.000 description 6
- 238000000746 purification Methods 0.000 description 6
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 6
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 5
- XPOQHMRABVBWPR-UHFFFAOYSA-N Efavirenz Natural products O1C(=O)NC2=CC=C(Cl)C=C2C1(C(F)(F)F)C#CC1CC1 XPOQHMRABVBWPR-UHFFFAOYSA-N 0.000 description 5
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 5
- SMNRFWMNPDABKZ-WVALLCKVSA-N [[(2R,3S,4R,5S)-5-(2,6-dioxo-3H-pyridin-3-yl)-3,4-dihydroxyoxolan-2-yl]methoxy-hydroxyphosphoryl] [[[(2R,3S,4S,5R,6R)-4-fluoro-3,5-dihydroxy-6-(hydroxymethyl)oxan-2-yl]oxy-hydroxyphosphoryl]oxy-hydroxyphosphoryl] hydrogen phosphate Chemical compound OC[C@H]1O[C@H](OP(O)(=O)OP(O)(=O)OP(O)(=O)OP(O)(=O)OC[C@H]2O[C@H]([C@H](O)[C@@H]2O)C2C=CC(=O)NC2=O)[C@H](O)[C@@H](F)[C@@H]1O SMNRFWMNPDABKZ-WVALLCKVSA-N 0.000 description 5
- 125000000304 alkynyl group Chemical group 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- XPOQHMRABVBWPR-ZDUSSCGKSA-N efavirenz Chemical compound C([C@]1(C2=CC(Cl)=CC=C2NC(=O)O1)C(F)(F)F)#CC1CC1 XPOQHMRABVBWPR-ZDUSSCGKSA-N 0.000 description 5
- 229960003804 efavirenz Drugs 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- OAYLNYINCPYISS-UHFFFAOYSA-N ethyl acetate;hexane Chemical compound CCCCCC.CCOC(C)=O OAYLNYINCPYISS-UHFFFAOYSA-N 0.000 description 5
- 125000000524 functional group Chemical group 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 239000000651 prodrug Substances 0.000 description 5
- 229940002612 prodrug Drugs 0.000 description 5
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 5
- 239000012279 sodium borohydride Substances 0.000 description 5
- 229910000033 sodium borohydride Inorganic materials 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 125000000335 thiazolyl group Chemical group 0.000 description 5
- LVEYOSJUKRVCCF-UHFFFAOYSA-N 1,3-bis(diphenylphosphino)propane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)CCCP(C=1C=CC=CC=1)C1=CC=CC=C1 LVEYOSJUKRVCCF-UHFFFAOYSA-N 0.000 description 4
- IXSBNNRUQYYMRM-UHFFFAOYSA-N 5-bromo-2-methoxybenzenesulfonyl chloride Chemical compound COC1=CC=C(Br)C=C1S(Cl)(=O)=O IXSBNNRUQYYMRM-UHFFFAOYSA-N 0.000 description 4
- HVPQMLZLINVIHW-UHFFFAOYSA-N 6-bromo-1h-indole-2,3-dione Chemical compound BrC1=CC=C2C(=O)C(=O)NC2=C1 HVPQMLZLINVIHW-UHFFFAOYSA-N 0.000 description 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- WTDHULULXKLSOZ-UHFFFAOYSA-N Hydroxylamine hydrochloride Chemical compound Cl.ON WTDHULULXKLSOZ-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 4
- BXDZOYLPNAIDOC-UHFFFAOYSA-N N-[5-[(5-tert-butyl-1,3-oxazol-2-yl)methylsulfanyl]-1,3-thiazol-2-yl]-1-[2-[2-[2-[2-[2-[[2-(2,6-dioxopiperidin-3-yl)-1,3-dioxoisoindol-4-yl]amino]ethoxy]ethoxy]ethoxy]ethylamino]-2-oxoethyl]piperidine-4-carboxamide Chemical compound CC(C)(C)c1cnc(CSc2cnc(NC(=O)C3CCN(CC(=O)NCCOCCOCCOCCNc4cccc5C(=O)N(C6CCC(=O)NC6=O)C(=O)c45)CC3)s2)o1 BXDZOYLPNAIDOC-UHFFFAOYSA-N 0.000 description 4
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 4
- PXIPVTKHYLBLMZ-UHFFFAOYSA-N Sodium azide Chemical compound [Na+].[N-]=[N+]=[N-] PXIPVTKHYLBLMZ-UHFFFAOYSA-N 0.000 description 4
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 4
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 4
- 235000011114 ammonium hydroxide Nutrition 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 229910002091 carbon monoxide Inorganic materials 0.000 description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- 239000003153 chemical reaction reagent Substances 0.000 description 4
- 229940125782 compound 2 Drugs 0.000 description 4
- WHBIGIKBNXZKFE-UHFFFAOYSA-N delavirdine Chemical compound CC(C)NC1=CC=CN=C1N1CCN(C(=O)C=2NC3=CC=C(NS(C)(=O)=O)C=C3C=2)CC1 WHBIGIKBNXZKFE-UHFFFAOYSA-N 0.000 description 4
- 125000005056 dihydrothiazolyl group Chemical group S1C(NC=C1)* 0.000 description 4
- MVEAAGBEUOMFRX-UHFFFAOYSA-N ethyl acetate;hydrochloride Chemical compound Cl.CCOC(C)=O MVEAAGBEUOMFRX-UHFFFAOYSA-N 0.000 description 4
- OAMZXMDZZWGPMH-UHFFFAOYSA-N ethyl acetate;toluene Chemical compound CCOC(C)=O.CC1=CC=CC=C1 OAMZXMDZZWGPMH-UHFFFAOYSA-N 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 125000002971 oxazolyl group Chemical group 0.000 description 4
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 4
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- NNFCIKHAZHQZJG-UHFFFAOYSA-N potassium cyanide Chemical compound [K+].N#[C-] NNFCIKHAZHQZJG-UHFFFAOYSA-N 0.000 description 4
- 125000006413 ring segment Chemical group 0.000 description 4
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical compound [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 description 4
- 238000006467 substitution reaction Methods 0.000 description 4
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 4
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 4
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 4
- WJKHJLXJJJATHN-UHFFFAOYSA-N triflic anhydride Chemical compound FC(F)(F)S(=O)(=O)OS(=O)(=O)C(F)(F)F WJKHJLXJJJATHN-UHFFFAOYSA-N 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- ONBQEOIKXPHGMB-VBSBHUPXSA-N 1-[2-[(2s,3r,4s,5r)-3,4-dihydroxy-5-(hydroxymethyl)oxolan-2-yl]oxy-4,6-dihydroxyphenyl]-3-(4-hydroxyphenyl)propan-1-one Chemical compound O[C@@H]1[C@H](O)[C@@H](CO)O[C@H]1OC1=CC(O)=CC(O)=C1C(=O)CCC1=CC=C(O)C=C1 ONBQEOIKXPHGMB-VBSBHUPXSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N 1H-imidazole Chemical compound C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- FQMZXMVHHKXGTM-UHFFFAOYSA-N 2-(1-adamantyl)-n-[2-[2-(2-hydroxyethylamino)ethylamino]quinolin-5-yl]acetamide Chemical compound C1C(C2)CC(C3)CC2CC13CC(=O)NC1=CC=CC2=NC(NCCNCCO)=CC=C21 FQMZXMVHHKXGTM-UHFFFAOYSA-N 0.000 description 3
- FPQQSJJWHUJYPU-UHFFFAOYSA-N 3-(dimethylamino)propyliminomethylidene-ethylazanium;chloride Chemical compound Cl.CCN=C=NCCCN(C)C FPQQSJJWHUJYPU-UHFFFAOYSA-N 0.000 description 3
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 3
- TXTQURPQLVHJRE-UHFFFAOYSA-N 3-nitrobenzenesulfonamide Chemical compound NS(=O)(=O)C1=CC=CC([N+]([O-])=O)=C1 TXTQURPQLVHJRE-UHFFFAOYSA-N 0.000 description 3
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- 125000002294 quinazolinyl group Chemical group N1=C(N=CC2=CC=CC=C12)* 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 125000005493 quinolyl group Chemical group 0.000 description 1
- 206010037844 rash Diseases 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 238000005932 reductive alkylation reaction Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 235000015424 sodium Nutrition 0.000 description 1
- WBHQBSYUUJJSRZ-UHFFFAOYSA-M sodium bisulfate Chemical compound [Na+].OS([O-])(=O)=O WBHQBSYUUJJSRZ-UHFFFAOYSA-M 0.000 description 1
- 229910000342 sodium bisulfate Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- 239000012321 sodium triacetoxyborohydride Substances 0.000 description 1
- CGLWPUIBHCZEBL-UHFFFAOYSA-M sodium;5-chloro-2-nitrobenzenesulfonate Chemical compound [Na+].[O-][N+](=O)C1=CC=C(Cl)C=C1S([O-])(=O)=O CGLWPUIBHCZEBL-UHFFFAOYSA-M 0.000 description 1
- 238000003797 solvolysis reaction Methods 0.000 description 1
- 125000003003 spiro group Chemical group 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000011272 standard treatment Methods 0.000 description 1
- 229960001203 stavudine Drugs 0.000 description 1
- 239000008223 sterile water Substances 0.000 description 1
- 238000009495 sugar coating Methods 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 230000006103 sulfonylation Effects 0.000 description 1
- 239000000829 suppository Substances 0.000 description 1
- 239000000375 suspending agent Substances 0.000 description 1
- 239000003765 sweetening agent Substances 0.000 description 1
- 208000024891 symptom Diseases 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- 239000006188 syrup Substances 0.000 description 1
- 235000020357 syrup Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 238000003419 tautomerization reaction Methods 0.000 description 1
- DHHKPEUQJIEKOA-UHFFFAOYSA-N tert-butyl 2-[6-(nitromethyl)-6-bicyclo[3.2.0]hept-3-enyl]acetate Chemical compound C1C=CC2C(CC(=O)OC(C)(C)C)(C[N+]([O-])=O)CC21 DHHKPEUQJIEKOA-UHFFFAOYSA-N 0.000 description 1
- AVDYTJCAYOJDQS-UHFFFAOYSA-N tert-butyl(triethyl)silane Chemical compound CC[Si](CC)(CC)C(C)(C)C AVDYTJCAYOJDQS-UHFFFAOYSA-N 0.000 description 1
- 125000003718 tetrahydrofuranyl group Chemical group 0.000 description 1
- 125000001712 tetrahydronaphthyl group Chemical group C1(CCCC2=CC=CC=C12)* 0.000 description 1
- 125000001412 tetrahydropyranyl group Chemical group 0.000 description 1
- DDFYFBUWEBINLX-UHFFFAOYSA-M tetramethylammonium bromide Chemical compound [Br-].C[N+](C)(C)C DDFYFBUWEBINLX-UHFFFAOYSA-M 0.000 description 1
- 238000002560 therapeutic procedure Methods 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- HFFLGKNGCAIQMO-UHFFFAOYSA-N trichloroacetaldehyde Chemical compound ClC(Cl)(Cl)C=O HFFLGKNGCAIQMO-UHFFFAOYSA-N 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- GKASDNZWUGIAMG-UHFFFAOYSA-N triethyl orthoformate Chemical compound CCOC(OCC)OCC GKASDNZWUGIAMG-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- 125000004205 trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- AALUTIYNYXEFNT-UHFFFAOYSA-N trimethylsilane hydroiodide Chemical compound C[SiH](C)C.I AALUTIYNYXEFNT-UHFFFAOYSA-N 0.000 description 1
- 229960000281 trometamol Drugs 0.000 description 1
- 235000015112 vegetable and seed oil Nutrition 0.000 description 1
- 239000008158 vegetable oil Substances 0.000 description 1
- 239000000052 vinegar Substances 0.000 description 1
- 235000021419 vinegar Nutrition 0.000 description 1
- 230000003612 virological effect Effects 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、医薬、特に抗HIV
薬として有用なスルホンアミド誘導体に関する。TECHNICAL FIELD The present invention relates to a medicine, particularly anti-HIV.
It relates to a sulfonamide derivative useful as a medicine.
【0002】[0002]
【従来の技術】ヒト免疫不全ウイルス(Human Immunode
ficiency Virus: HIV)は、後天性免疫不全症候群(AID
S)の原因ウイルスであり、ヘルパーTリンパ球等のCD4
陽性細胞に感染し、その細胞を破壊し減少させる。その
結果、免疫機能が低下し、カリニ肺炎をはじめとする日
和見感染症や悪性腫瘍などが発生する。現在、臨床使用
されている抗HIV薬は、核酸系逆転写酵素阻害薬(NRT
I)、非核酸系逆転写酵素阻害薬(NNRTI)及びプロテア
ーゼ阻害薬(PI)の3種に大別され、NRTIとしては6種
類(ジドブジン(AZT)、ジダノシン(ddI)、ザルシタ
ビン(ddC)、ラミブジン(3TC)、サニルブジン(d4
T)、アバカビル(ABC))、NNRTIとしては3種類(ネ
ビラピン(NVP)、エファビレンツ(EFV)、デラビルジ
ン(DLV))、PIとしては6種類(インジナビル(ID
V)、サキナビル(SQV)、リトナビル(RTV)、ネルフ
ィナビル(NFV)、アンプレナビル(APV)、ロピナビル
・リトナビル配合剤(LPV/RTV))が使用されている。
近年、AIDSによる死亡率とAIDS関連日和見感染症の頻度
を減少させるために、これらの抗HIV薬を3剤以上用いた
多剤併用療法(highly active antiretroviraltherap
y:HAART)が標準治療とされている。HAARTは、NRTI 2
剤とPI 1剤、あるいはNRTI 2剤とNNRTI 1剤等の組合せ
で実施されており、患者のHIVウイルス量を検出限界以
下に低下させ、免疫系を再構築し、減少したCD4を再び
増加させることができる。しかし、HAARTの早期導入
は、長期的な副作用や耐性ウイルスの出現が問題となっ
ている。特に、PIは高投与量が必要で、重篤な副作用
(血糖値上昇、リポジストロフィー等)等の問題もある
ことから、最近では、NRTI 2剤とNNRTI (中でもEFV)の
組合せが初回療法には推奨されてきている。EFVは1日1
回投与(600 mg)で良く、アドヒアランスの点からもPIよ
り優れた薬剤である。しかし、EFVは、薬剤耐性ウイル
スの出現、発疹、集中力障害、不眠等の副作用があり、
長期投与に十分満足できる薬剤とは言えない。従って、
薬剤耐性ウイルスが出現し難く、副作用も少なく、アド
ヒアランスが維持できるNNRTIの開発が望まれている。
既存のNNRTI耐性株に抗ウイルス効果を示すNNRTIがいく
つか報告されている。例えば、WO96/10019には、S、S
O、SO2又はメチレンを介してフェニルと結合するイミダ
ゾール誘導体が、WO00/27825には、2位にアリールアミ
ノ基を有するピリミジン誘導体が、WO01/17982には、2
位にカルバモイルメトキシ基等を有するフェニルケトン
誘導体がそれぞれ報告されている。2. Description of the Related Art Human Immunodeficiency Virus
ficiency Virus: HIV) is an acquired immunodeficiency syndrome (AID)
S) is the causative virus and CD4 such as helper T lymphocytes.
Infects positive cells and destroys and reduces them. As a result, the immune function is reduced, and opportunistic infections such as carini pneumonia and malignant tumors occur. Currently, clinically used anti-HIV drugs are nucleic acid reverse transcriptase inhibitors (NRT
I), a non-nucleic acid reverse transcriptase inhibitor (NNRTI) and a protease inhibitor (PI), which are roughly classified into 6 types as NRTIs (zidovudine (AZT), didanosine (ddI), salcitabine (ddC), Lamivudine (3TC), Sanilvudine (d4
T), abacavir (ABC)), 3 types as NNRTI (nevirapine (NVP), efavirenz (EFV), delavirdine (DLV)), 6 types as PI (indinavir (ID
V), saquinavir (SQV), ritonavir (RTV), nelfinavir (NFV), amprenavir (APV), lopinavir / ritonavir combination (LPV / RTV)) are used.
Recently, in order to reduce the mortality rate due to AIDS and the frequency of AIDS-related opportunistic infections, highly active antiretroviral therapies using three or more of these anti-HIV drugs have been developed.
y: HAART) is the standard treatment. HAART is NRTI 2
Agent and PI 1 agent, or NRTI 2 agent and NNRTI 1 agent are used in combination to reduce the HIV viral load in patients to below the detection limit, reconstitute the immune system, and increase the decreased CD4 again. be able to. However, the early introduction of HAART poses problems with long-term side effects and the emergence of resistant viruses. In particular, since PI requires a high dose and has serious side effects (such as elevated blood glucose levels and lipodystrophy), recently, the combination of NRTI 2 agent and NNRTI (among others, EFV) is the first therapy. Has been recommended. EFV 1 per day
A single dose (600 mg) is sufficient, and it is a drug superior to PI in terms of adherence. However, EFV has side effects such as the emergence of drug-resistant virus, rash, concentration disorder, and insomnia.
It cannot be said that the drug is sufficiently satisfactory for long-term administration. Therefore,
The development of NNRTI, which is resistant to drug-resistant virus, has few side effects, and can maintain adherence, is desired.
Several NNRTIs showing antiviral effects on existing NNRTI resistant strains have been reported. For example, WO96 / 10019 includes S, S
Imidazole derivatives that bind to phenyl via O, SO 2 or methylene, WO00 / 27825 include pyrimidine derivatives having an arylamino group at the 2-position, and WO01 / 17982 includes 2
A phenyl ketone derivative having a carbamoylmethoxy group at the position has been reported.
【0003】スルホンアミド誘導体としては多くの化合
物が報告されているが、例えば、下記一般式(II)にお
いて、Many compounds have been reported as sulfonamide derivatives. For example, in the following general formula (II),
【化4】
1)R1が非存在、即ち、aが二重結合且つbが単結合であ
り、R3がメチルであるスルホンアミド誘導体として下記
表1に示す化合物が、2)R2が非存在、即ち、aが単結
合且つbが二重結合であり、更にR3がメチル、R4が低級
アルキル、且つAが3位又は4位のみが置換されていて
もよいフェニルであるスルホンアミド誘導体として下記
表2に示す化合物が、それぞれ報告されている。[Chemical 4] 1) R 1 is absent, that is, a is a double bond and b is a single bond, and R 3 is methyl as a sulfonamide derivative shown in Table 1 below, 2) R 2 is absent, , A is a single bond and b is a double bond, R 3 is methyl, R 4 is lower alkyl, and A is phenyl which may be substituted only at the 3 or 4 position. The compounds shown in Table 2 have been reported.
【0004】[0004]
【表1】 [Table 1]
【0005】[0005]
【表2】 [Table 2]
【0006】(表中の略号は以下の意味を有する。Cmp
d:化合物番号、Lit:出典(a〜nは下記参照)、Me:メ
チル、Et:エチル、iPr:2-プロピル、tBu:tert-ブチ
ル、Ac:アセチル、Ph:フェニル。また、置換基の前の
数字は置換位置を示し、例えば4-Cl-Phは4-クロロフェ
ニルを示す。以下同様。)
出典a〜nは次の文献等を意味する。
a:Khim. Geterotsikl. Soedin. (1967), (1), 153-4;
b:Khim. Geterotsikl. Soedin. (1967), (1), 154-7;
c:Khim. Geterotsikl. Soedin. (1969), (1), 56-8;
d:J. Am. Chem. Soc. (1974), 96(12), 3973-8;
e:J. Chem. Soc., Perkin Trans. 1 (1980), (8), 177
3-8;
f:米国特許US3097201号公報;
g:ChemDiv, Inc社(米国)試薬カタログNo.1613-0032;
h:Oak Samples Ltd社(ウクライナ)試薬カタログ:(1)N
o.CD134441、(2)No.CD134440、(3)No.CD050023、(4)No.
CD050044、(5)No.CD050039、(6)No.CD123533、(7)No.CD
050006;
j:Florida Center for Heterocyclic Compounds, Uni
v. of Florida(米国)試薬カタログ:(1)No.23765、(2)N
o.23769、(3)No.23764、(4)No.20478、(5)No.20479、
(6)No.15722、(7)No.20480;
k:The Ukrainian State Chemical-Technology Univers
ity(ウクライナ)試薬カタログ(1)No.USCTU G004846、
(2)No.USCTU GRB07005;
m:AsInEx Ltd社(ロシア)カタログ(1)No.BAS0458427、
(2)No.BAS0458426、(3)No.BAS0458431;
n:Chem. Abstr. 57, 3567g
上記の内、n (Chem. Abstr. 57, 3567g)には当該化合物
の糖尿病治療剤用途に関する報告があるが、a〜mには当
該化合物の抗HIV剤用途は勿論、その医薬用途に関する
開示はない。(The abbreviations in the table have the following meanings: Cmp
d: compound number, Lit: source (see below for a to n), Me: methyl, Et: ethyl, iPr: 2-propyl, tBu: tert-butyl, Ac: acetyl, Ph: phenyl. Further, the number before the substituent indicates the substitution position, and for example, 4-Cl-Ph indicates 4-chlorophenyl. The same applies below. ) Sources a to n mean the following documents, etc. a: Khim. Geterotsikl. Soedin. (1967), (1), 153-4; b: Khim. Geterotsikl. Soedin. (1967), (1), 154-7; c: Khim. Geterotsikl. Soedin. (1969 ), (1), 56-8; d: J. Am. Chem. Soc. (1974), 96 (12), 3973-8; e: J. Chem. Soc., Perkin Trans. 1 (1980), (8), 177
3-8; f: US Patent No. US3097201; g: ChemDiv, Inc (USA) Reagent Catalog No. 1613-0032; h: Oak Samples Ltd (Ukraine) Reagent Catalog: (1) N
o.CD134441, (2) No.CD134440, (3) No.CD050023, (4) No.
CD050044, (5) No.CD050039, (6) No.CD123533, (7) No.CD
050006; j: Florida Center for Heterocyclic Compounds, Uni
v. of Florida (USA) Reagent Catalog: (1) No.23765, (2) N
o.23769, (3) No.23764, (4) No.20478, (5) No.20479,
(6) No.15722, (7) No.20480; k: The Ukrainian State Chemical-Technology Univers
ity (Ukraine) Reagent Catalog (1) No.USCTU G004846,
(2) No.USCTU GRB07005; m: AsInEx Ltd (Russia) Catalog (1) No.BAS0458427,
(2) No.BAS0458426, (3) No.BAS0458431; n: Chem. Abstr. 57, 3567g Among the above, n (Chem. Abstr. 57, 3567g) has a report on the use of the compound as a therapeutic agent for diabetes. However, in a to m, there is no disclosure concerning the use of the compound as an anti-HIV agent and of course its pharmaceutical use.
【0007】[0007]
【発明が解決しようとする課題】上述の通り、薬剤耐性
ウイルスが出現し難く、副作用も少なく、アドヒアラン
スが維持できるNNRTIの開発が切望されている。DISCLOSURE OF THE INVENTION As described above, there is a strong demand for the development of an NNRTI in which drug-resistant viruses are less likely to appear, have fewer side effects, and can maintain adherence.
【0008】[0008]
【課題を解決するための手段】本発明者等は、逆転写酵
素を阻害する化合物につき鋭意検討した結果、2個の環
基がスルホンアミドをリンカーとして結合する化合物、
即ち、スルホンアミドのS原子及びN原子上それぞれに環
基を有する、特定のスルホンアミド誘導体が良好な逆転
写酵素阻害活性を有することを知見し、本発明を完成し
た。即ち、本発明によれば、下記一般式(I)で示され
るスルホンアミド誘導体(以下、「本発明化合物
(I)」と称する。)又はその製薬学的に許容される
塩、並びにこれらの1種又は2種以上を有効成分として
含有する医薬、特に抗HIV剤が提供される。Means for Solving the Problems The inventors of the present invention have conducted extensive studies on compounds that inhibit reverse transcriptase, and as a result, compounds in which two ring groups are bound with sulfonamide as a linker,
That is, the inventors have found that a specific sulfonamide derivative having a ring group on each of the S atom and the N atom of sulfonamide has a good reverse transcriptase inhibitory activity, and completed the present invention. That is, according to the present invention, a sulfonamide derivative represented by the following general formula (I) (hereinafter referred to as “the present compound (I)”) or a pharmaceutically acceptable salt thereof, and one of these There is provided a medicine, particularly an anti-HIV agent, containing one or more kinds as an active ingredient.
【0009】[0009]
【化5】
[式中の記号は以下の意味を有する。
a及びb:それぞれ単結合又は二重結合を意味し、少なく
とも一方は単結合であり他方は二重結合である、
R1:aが二重結合、且つ、bが単結合のとき、非存在;a
が単結合、且つ、bが二重結合のとき、-H、-低級アルキ
ル、-ハロゲンで置換された低級アルキル、-低級アルキ
レン-OH、-低級アルキレン-ヘテロ環、-低級アルキレン
-置換されていてもよいアリール、-低級アルキレン-O-
低級アルキル、-低級アルキレン-CHO、-低級アルキレン
-CO2H、-低級アルキレン-CO2-低級アルキル、-低級アル
キレン-CONH2又は-低級アルキレン-OCONH2、
R2:aが二重結合、且つ、bが単結合のとき、-H、-低級
アルキル、-ハロゲンで置換された低級アルキル、-低級
アルキレン-OH、-低級アルキレン-ヘテロ環、-低級アル
キレン-置換されていてもよいアリール、-低級アルキレ
ン-O-低級アルキル、-低級アルキレン-CHO、-低級アル
キレン-CO2H、-低級アルキレン-CO2-低級アルキル、-低
級アルキレン-CONH2又は-低級アルキレン-OCONH2;aが
単結合、且つ、bが二重結合のとき、非存在、
X:O又はS、
A:置換されていてもよいアリール又は置換されていて
もよいヘテロアリール、
B:置換されていてもよい含窒素ヘテロ環。
但し、R1がH、かつBが4-メチル-5-(2-プロピル)チアゾ
ール-2-イルのとき、Aがフェニル又は4-メチルフェニル
である化合物を除く。以下同様。][Chemical 5] [The symbols in the formula have the following meanings. a and b: each represents a single bond or a double bond, at least one is a single bond and the other is a double bond, R 1 : absent when a is a double bond and b is a single bond ; A
Is a single bond and b is a double bond, -H, -lower alkyl, -lower alkyl substituted with halogen, -lower alkylene-OH, -lower alkylene-heterocycle, -lower alkylene
-Optionally substituted aryl, -lower alkylene-O-
Lower alkyl, -lower alkylene-CHO, -lower alkylene
-CO 2 H, - lower alkylene -CO 2 - lower alkyl, - lower alkylene -CONH 2 or - lower alkylene -OCONH 2, R 2: a double bond, and, when b is a single bond, -H, -Lower alkyl, -lower alkyl substituted with halogen, -lower alkylene-OH, -lower alkylene-heterocycle, -lower alkylene-optionally substituted aryl, -lower alkylene-O-lower alkyl, -lower alkylene -CHO, - lower alkylene -CO 2 H, - lower alkylene -CO 2 - lower alkyl, - lower alkylene -CONH 2 or - lower alkylene -OCONH 2; a is a single bond, and, when b is a double bond, Absent, X: O or S, A: optionally substituted aryl or optionally substituted heteroaryl, B: optionally substituted nitrogen-containing heterocycle. However, when R 1 is H and B is 4-methyl-5- (2-propyl) thiazol-2-yl, compounds in which A is phenyl or 4-methylphenyl are excluded. The same applies below. ]
【0010】また、本発明は、式(I)に包含される下
記式(I’)で示される新規なスルホンアミド誘導体又
はその塩にも関する。The present invention also relates to a novel sulfonamide derivative represented by the following formula (I ') included in the formula (I) or a salt thereof.
【化6】
[式中の記号は以下の意味を有する。
a及びb:それぞれ単結合又は二重結合を意味し、少なく
とも一方は単結合であり他方は二重結合である、
R1:aが二重結合、且つ、bが単結合のとき、非存在;a
が単結合、且つ、bが二重結合のとき、-H、-低級アルキ
ル、-ハロゲンで置換された低級アルキル、-低級アルキ
レン-OH、-低級アルキレン-ヘテロ環、-低級アルキレン
-置換されていてもよいアリール、-低級アルキレン-O-
低級アルキル、-低級アルキレン-CHO、-低級アルキレン
-CO2H、-低級アルキレン-CO2-低級アルキル、-低級アル
キレン-CONH2又は-低級アルキレン-OCONH2、
R2:aが二重結合、且つ、bが単結合のとき、-H、-低級
アルキル、-ハロゲンで置換された低級アルキル、-低級
アルキレン-OH、-低級アルキレン-ヘテロ環、-低級アル
キレン-置換されていてもよいアリール、-低級アルキレ
ン-O-低級アルキル、-低級アルキレン-CHO、-低級アル
キレン-CO2H、-低級アルキレン-CO2-低級アルキル、-低
級アルキレン-CONH2又は-低級アルキレン-OCONH2;aが
単結合、且つ、bが二重結合のとき、非存在、
X:O又はS、
A:置換されていてもよいアリール又は置換されていて
もよいヘテロアリール、
B:置換されていてもよい含窒素ヘテロ環。
但し、式(I’)において、[Chemical 6] [The symbols in the formula have the following meanings. a and b: each represents a single bond or a double bond, at least one is a single bond and the other is a double bond, R 1 : absent when a is a double bond and b is a single bond ; A
Is a single bond and b is a double bond, -H, -lower alkyl, -lower alkyl substituted with halogen, -lower alkylene-OH, -lower alkylene-heterocycle, -lower alkylene
-Optionally substituted aryl, -lower alkylene-O-
Lower alkyl, -lower alkylene-CHO, -lower alkylene
-CO 2 H, - lower alkylene -CO 2 - lower alkyl, - lower alkylene -CONH 2 or - lower alkylene -OCONH 2, R 2: a double bond, and, when b is a single bond, -H, -Lower alkyl, -lower alkyl substituted with halogen, -lower alkylene-OH, -lower alkylene-heterocycle, -lower alkylene-optionally substituted aryl, -lower alkylene-O-lower alkyl, -lower alkylene -CHO, - lower alkylene -CO 2 H, - lower alkylene -CO 2 - lower alkyl, - lower alkylene -CONH 2 or - lower alkylene -OCONH 2; a is a single bond, and, when b is a double bond, Absent, X: O or S, A: optionally substituted aryl or optionally substituted heteroaryl, B: optionally substituted nitrogen-containing heterocycle. However, in the formula (I ′),
【化7】
(式中、R3及びR4は上記B「置換されていてもよい含窒
素ヘテロ環」の置換基を意味する。)で示されるとき、
以下の化合物を意味する:
1)R2が非存在、R3がメチル、且つ、Aが、4位のみが
置換されていてもよいフェニル基のとき、R4はC2-6アル
キルである化合物、
2)R2及びR3がメチル、且つ、R4がH、2-プロピル又はt
ert-ブチルのとき、Aが、4位のみがクロロ、メチル、N
H2及びNHCOCH3から選択される基で置換されていてもよ
いフェニル以外の化合物、
3)R2及びR3がメチル、且つ、R4がC5アルキルのとき、
Aが、4位のみがメチル及びNO2から選択される基で置換
されていてもよいフェニル以外の化合物、
4)R2がエチル、R3がメチル、且つ、R4がHのとき、A
が、4位のみがメチル及びNHCOCH3から選択される基で
置換されていてもよいフェニル以外の化合物、
5)R2がエチル、R3がメチル、且つ、R4が2-プロピルの
とき、Aが4-メチルフェニル以外の化合物、
6)R2がエチル、R3がメチル、且つ、R4がtert-ブチル
のとき、Aが、4位のみがメチル、クロロ及びブロムか
ら選択される基で置換されたフェニル以外の化合物、
7)R2及びR3がメチル、且つ、R4がtert-ブチルのと
き、Aが3-ニトロフェニル以外の化合物、
8)R2がCH2CH2Cl又はCH2CH2OH、R3がメチル、且つ、R4
がHのとき、Aが4-クロロフェニル以外の化合物、
9)R2がベンジル、R3がメチル、且つ、R4がH、メチル
又はジエチルアミノのとき、Aが4-メチルフェニル以外
の化合物、
10)R2がメチル、R3がtert-ブチル、且つ、R4がクロ
ロのとき、Aが4-メチルフェニル以外の化合物、
11)R1がH、R3がメチル、且つ、R4がtert-ブチルのと
き、Aがフェニル、4-メチルフェニル、4-クロロフェニ
ル、3-ニトロフェニル又は4-ブロモフェニル以外の化合
物、
12)R1がH、R3がメチル、且つ、R4が2-プロピルのと
き、Aがフェニル、4-クロロフェニル又は4-メチルフェ
ニル以外の化合物、
13)R1がエチル、R3がメチル、且つ、R4がtert-ブチ
ル又は2-プロピルのとき、Aが4-クロロフェニル以外の
化合物、及び、
14)R1がH、R3がメチル、且つ、R4がCO2Etのとき、A
が3-ニトロフェニル以外の化合物。以下同様。][Chemical 7] (In the formula, R 3 and R 4 represent the substituents of the above-mentioned “B optionally substituted nitrogen-containing heterocycle”.),
The following compounds are meant: 1) When R 2 is absent, R 3 is methyl, and A is a phenyl group which may be substituted only at the 4-position, R 4 is C 2-6 alkyl. A compound, 2) R 2 and R 3 are methyl, and R 4 is H, 2-propyl or t
When ert-butyl, A is chloro, methyl, N only at position 4
A compound other than phenyl optionally substituted with a group selected from H 2 and NHCOCH 3 , 3) when R 2 and R 3 are methyl, and R 4 is C 5 alkyl,
A is a compound other than phenyl optionally substituted with a group selected from methyl and NO 2 only at the 4-position, 4) when R 2 is ethyl, R 3 is methyl, and R 4 is H, A
Is a compound other than phenyl optionally substituted with a group selected from methyl and NHCOCH 3 only at the 4-position, 5) when R 2 is ethyl, R 3 is methyl, and R 4 is 2-propyl, A is a compound other than 4-methylphenyl, 6) a group in which when R 2 is ethyl, R 3 is methyl, and R 4 is tert-butyl, A is selected from methyl, chloro and bromine only at the 4-position. Compounds other than phenyl substituted with 7), when R 2 and R 3 are methyl, and R 4 is tert-butyl, A is a compound other than 3-nitrophenyl, 8) R 2 is CH 2 CH 2 Cl Or CH 2 CH 2 OH, R 3 is methyl, and R 4
When H is H, A is a compound other than 4-chlorophenyl, 9) R 2 is benzyl, R 3 is methyl, and when R 4 is H, methyl or diethylamino, A is a compound other than 4-methylphenyl, 10 ) R 2 is methyl, R 3 is tert-butyl, and R 4 is chloro, A is a compound other than 4-methylphenyl, 11) R 1 is H, R 3 is methyl, and R 4 is tert. -When it is butyl, A is a compound other than phenyl, 4-methylphenyl, 4-chlorophenyl, 3-nitrophenyl or 4-bromophenyl, 12) R 1 is H, R 3 is methyl, and R 4 is 2- When propyl, A is a compound other than phenyl, 4-chlorophenyl or 4-methylphenyl, 13) when R 1 is ethyl, R 3 is methyl, and R 4 is tert-butyl or 2-propyl, A is 4 -Compounds other than -chlorophenyl, and 14) when R 1 is H, R 3 is methyl, and R 4 is CO 2 Et, A
Is a compound other than 3-nitrophenyl. The same applies below. ]
【0011】尚、式(I)、(I’)及び(II)並びに
後記式(III)における点線で、「aが二重結合、且つ、
bが単結合」又は「aが単結合、且つ、bが二重結合」と
は、以下に示す部分構造を有することを意味する。The dotted lines in the formulas (I), (I ') and (II) and the formula (III) described later indicate that "a is a double bond, and
“B is a single bond” or “a is a single bond and b is a double bond” means that the compound has a partial structure shown below.
【化8】
即ち、R1が非存在のとき、aは二重結合、且つ、bは単結
合であり、R2が非存在のとき、aは単結合、且つ、bは二
重結合である。[Chemical 8] That is, when R 1 is absent, a is a double bond and b is a single bond, and when R 2 is absent, a is a single bond and b is a double bond.
【0012】[0012]
【発明の実施の形態】以下、本発明について詳細に説明
する。本明細書中、「アルキル」、「アルキレン」、
「アルケニル」、「アルケニレン」、「アルキニル」及
び「アルキニレン」とは、直鎖状又は分枝状の炭化水素
鎖を意味する。「低級アルキル」は、例えばC1-8のアル
キルであり、好ましくはC1-6のアルキル、より好ましく
はC1-5のアルキル、更に好ましくはメチル、エチル、イ
ソプロピル、2-メチル-2-ブチル及びtert-ブチル基であ
る。「低級アルキレン」は、例えばC1-8のアルキレンで
あり、好ましくはC1-6のアルキレン、より好ましくはC
1-4のアルキレン、より好ましくはエチレン、ブチレン
及び1,1-ジメチルエチレンである。「低級アルケニル」
は、例えばC2-8のアルキルの任意の位置に1個以上の2
重結合を有することを意味し、「低級アルケニレン」
は、例えばC2-8のアルキレンの任意の位置に1個以上の
二重結合を有することを意味する。「低級アルキニル」
は、例えばC2-8のアルキルの任意の位置に1個以上の三
重結合を有することを意味し、「低級アルキニレン」
は、例えばC2-8のアルキレンの任意の位置に1個以上の
三重結合を有することを意味する。「ハロゲン」は、
F、Cl、Br及びIを示し、好ましくは、F、Cl及びBrであ
る。「ハロゲンで置換された低級アルキル」とは、1個
以上のハロゲンで置換された低級アルキルであり、好ま
しくは、1〜5個のFを有するC1-2のアルキルであり、
例えば、フルオロメチル、ジフルオロメチル、トリフル
オロメチル、トリフルオロエチルが挙げられる。「シク
ロアルキル基」は、好ましくは炭素数3乃至14個のシ
クロアルキル基であり、架橋されていてもよい。より好
ましくはシクロペンチル、シクロヘキシル、シクロヘプ
チル及びアダマンチル基である。「アリール」は、好ま
しくは炭素数6乃至14個の単環乃至3環式アリール基
である。より好ましくは、フェニル及びナフチル基であ
り、更に好ましくは、フェニル基である。また、フェニ
ル基に5乃至8員のシクロアルキル環が縮環し、例え
ば、インダニル又はテトラヒドロナフチル基を形成して
いてもよい。BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described in detail below. In the present specification, "alkyl", "alkylene",
“Alkenyl”, “alkenylene”, “alkynyl” and “alkynylene” mean a straight or branched hydrocarbon chain. “Lower alkyl” is, for example, C 1-8 alkyl, preferably C 1-6 alkyl, more preferably C 1-5 alkyl, further preferably methyl, ethyl, isopropyl, 2-methyl-2- Butyl and tert-butyl groups. "Lower alkylene" is, for example, C 1-8 alkylene, preferably C 1-6 alkylene, and more preferably C 1.
1-4 alkylene, more preferably ethylene, butylene and 1,1-dimethylethylene. "Lower alkenyl"
Is, for example, one or more 2 at any position on the C 2-8 alkyl.
"Lower alkenylene" means having a heavy bond
Means, for example, having one or more double bonds at any position of C 2-8 alkylene. "Lower alkynyl"
Means, for example, having one or more triple bonds at any position of C 2-8 alkyl, and is “lower alkynylene”.
Means having one or more triple bonds at any position of, for example, C 2-8 alkylene. "Halogen" is
F, Cl, Br and I are shown, preferably F, Cl and Br. “Halogen-substituted lower alkyl” is lower alkyl substituted with one or more halogen, preferably C 1-2 alkyl having 1 to 5 F,
Examples include fluoromethyl, difluoromethyl, trifluoromethyl and trifluoroethyl. The “cycloalkyl group” is preferably a cycloalkyl group having 3 to 14 carbon atoms, and may be crosslinked. More preferred are cyclopentyl, cyclohexyl, cycloheptyl and adamantyl groups. "Aryl" is preferably a monocyclic to tricyclic aryl group having 6 to 14 carbon atoms. More preferred are phenyl and naphthyl groups, and even more preferred are phenyl groups. Further, a 5- to 8-membered cycloalkyl ring may be condensed with the phenyl group to form, for example, an indanyl or tetrahydronaphthyl group.
【0013】「ヘテロアリール」とは、環原子として
O、S及びNから選択されるヘテロ原子を1乃至4個含有
する5乃至8員の単環式ヘテロアリールを示し、ヘテロ
環同士、又はベンゼン環と縮環して、二から三環式ヘテ
ロアリールを形成してもよい。S又はNが酸化されオキシ
ドを形成してもよい。例えば、ピリジル、ピリダジニ
ル、ピリミジニル、ピラジニル、フリル、チエニル、ピ
ロリル、オキサゾリル、イソキサゾリル、オキサジアゾ
リル、チアゾリル、チアジアゾリル、イミダゾリル、ト
リアゾリル、テトラゾリル、ベンゾフラニル、ベンゾチ
エニル、ベンゾオキサゾリル、ベンゾイミダゾリル、ベ
ンゾチアゾリル、キノリニル、キナゾリニル、キノキサ
リニル、シンノリニル等が挙げられる。「ヘテロ環」と
は、環原子としてO、S及びNから選択されるヘテロ原子
を1乃至4個含有する飽和又は不飽和の3〜8員、好ま
しくは5〜7員の単環式ヘテロ環基を示し、ヘテロ環同
士、又はシクロアルキル環やベンゼン環と縮環して、二
から三環式ヘテロ環基を形成してもよい。環原子である
任意の炭素原子がオキソ基で置換されていてもよく、S
又はNが酸化されオキシドやジオキシドを形成してもよ
い。該ヘテロ環基は、架橋されていてもよく、また、ス
ピロ環を形成してもよい(オキソ基より誘導される1,3-
ジオキソラン環等のアセタール体を含む)。好ましく
は、ピリジル、ピリダジニル、ピリミジニル、ピラジニ
ル、フリル、チエニル、ピロリル、オキサゾリル、イソ
キサゾリル、オキサジアゾリル、チアゾリル、チアジア
ゾリル、イミダゾリル、トリアゾリル、テトラゾリル、
ベンゾフラニル、ベンゾチエニル、ベンゾオキサゾリ
ル、ベンゾイミダゾリル、ベンゾチアゾリル、キノリニ
ル、キナゾリニル、キノキサリニル、シンノリニル、ピ
ロリジニル等のヘテロアリール、ジヒドロピリジル、ジ
ヒドロピロリル、ジヒドロオキサゾリル、ジヒドロチア
ゾリル、ジヒドロイミダゾリル、ピペリジル、モルホリ
ニル、ピペラジニル、ピラゾリジニル、イミダゾリジニ
ル、ホモピペラジニル、テトラヒドロフラニル、テトラ
ヒドロピラニル、クロマニル、ジオキソラニル、8-アザ
ビシクロ[3.2.1]オクタン-3-イル、9-アザビシクロ[3.
3.1]ノナン-3-イル、3-アザビシクロ[3.2.1]オクタン-6
-イル、7-アザビシクロ[2.2.1]ヘプタン-2-イル、2-ア
ザトリシクロ[3.3.1.13,7]デカン-4-イル、1-アザビシ
クロ[2.2.2]オクタン-2-イル、1-アザビシクロ[2.2.2]
オクタン-3-イル、1-アザビシクロ[2.2.2]オクタン-4-
イル、3-アザスピロ[5.5]ウンデカン-9-イル、2-アザス
ピロ[4.5]デカン-8-イル、2-アザスピロ[4.4]ノナン-7-
イル及び8-アザスピロ[4.5]デカン-2-イル等の飽和又は
一部不飽和ヘテロ環が挙げられる。更に好ましくは、ピ
リジル、キノリル、オキサゾリル、チアゾリル、ベンゾ
チアゾリルピリジル、ジヒドロオキサゾリル、ジヒドロ
チアゾリル、ジヒドロベンゾチアゾリル及びテトラヒド
ロベンゾチアゾリル基等である。"Heteroaryl" means as a ring atom
A 5- to 8-membered monocyclic heteroaryl containing 1 to 4 heteroatoms selected from O, S, and N is shown, which is a bicyclic to tricyclic heteroaryl which is condensed with heterocycles or with a benzene ring. Aryl may be formed. S or N may be oxidized to form an oxide. For example, pyridyl, pyridazinyl, pyrimidinyl, pyrazinyl, furyl, thienyl, pyrrolyl, oxazolyl, isoxazolyl, oxadiazolyl, thiazolyl, thiadiazolyl, imidazolyl, triazolyl, tetrazolyl, benzofuranyl, benzothienyl, benzoxazolyl, benzimidazolyl, benzothiazolyl, quinolinyl, quinolinyl, quinolinyl, quinolinyl. Examples include quinoxalinyl and cinnolinyl. "Heterocycle" is a saturated or unsaturated 3- to 8-membered, preferably 5- to 7-membered monocyclic heterocycle containing 1 to 4 heteroatoms selected from O, S and N as ring atoms. A group is shown, and the heterocycles may be condensed with each other or with a cycloalkyl ring or a benzene ring to form a bi- to tricyclic heterocyclic group. Any carbon atom which is a ring atom may be substituted with an oxo group, S
Alternatively, N may be oxidized to form an oxide or a dioxide. The heterocyclic group may be bridged, or may form a spiro ring (1,3-derived from an oxo group).
Including acetal such as dioxolane ring). Preferably, pyridyl, pyridazinyl, pyrimidinyl, pyrazinyl, furyl, thienyl, pyrrolyl, oxazolyl, isoxazolyl, oxadiazolyl, thiazolyl, thiadiazolyl, imidazolyl, triazolyl, tetrazolyl,
Benzofuranyl, benzothienyl, benzoxazolyl, benzimidazolyl, benzothiazolyl, quinolinyl, quinazolinyl, quinoxalinyl, cinnolinyl, heteroaryl such as pyrrolidinyl, dihydropyridyl, dihydropyrrolyl, dihydrooxazolyl, dihydrothiazolyl, dihydroimidazolyl, piperidyl, Morpholinyl, piperazinyl, pyrazolidinyl, imidazolidinyl, homopiperazinyl, tetrahydrofuranyl, tetrahydropyranyl, chromanyl, dioxolanyl, 8-azabicyclo [3.2.1] octane-3-yl, 9-azabicyclo [3.
3.1] Nonane-3-yl, 3-azabicyclo [3.2.1] octane-6
-Yl, 7-azabicyclo [2.2.1] heptan-2-yl, 2-azatricyclo [3.3.1.1 3,7 ] decane-4-yl, 1-azabicyclo [2.2.2] octane-2-yl, 1- Azabicyclo [2.2.2]
Octan-3-yl, 1-azabicyclo [2.2.2] octane-4-
Ill, 3-azaspiro [5.5] undecane-9-yl, 2-azaspiro [4.5] decane-8-yl, 2-azaspiro [4.4] nonane-7-
And saturated or partially unsaturated heterocycles such as yl and 8-azaspiro [4.5] decan-2-yl. More preferred are pyridyl, quinolyl, oxazolyl, thiazolyl, benzothiazolylpyridyl, dihydrooxazolyl, dihydrothiazolyl, dihydrobenzothiazolyl and tetrahydrobenzothiazolyl groups.
【0014】「含窒素ヘテロ環」としては、前記「ヘテ
ロ環」の内、環原子として少なくとも1つのNを有する
ヘテロ環を意味する。好ましくは、オキサゾリル、チア
ゾリル、ベンゾチアゾリルピリジル、ジヒドロオキサゾ
リル、ジヒドロチアゾリル、ジヒドロベンゾチアゾリル
及びテトラヒドロベンゾチアゾリル基等であり、更に好
ましくは、チアゾリル及びジヒドロチアゾリル基であ
る。The "nitrogen-containing heterocycle" means a heterocycle having at least one N as a ring atom among the above "heterocycle". Preferred are oxazolyl, thiazolyl, benzothiazolylpyridyl, dihydrooxazolyl, dihydrothiazolyl, dihydrobenzothiazolyl and tetrahydrobenzothiazolyl groups, and more preferred are thiazolyl and dihydrothiazolyl groups. Is.
【0015】「置換されていてもよいアリール」又は
「置換されていてもよいヘテロアリール」における置換
基としては、医薬、殊に抗HIV剤におけるこれらの環の
置換基として使用可能な基であり、それらの置換基を1
〜5個有していてもよい。2個以上の置換基を有する場
合、それらは同一又は互いに異なっていてもよい。置換
基として好ましくは以下のG1群より選択される基であ
る。
G1:低級アルキル、低級アルケニル、低級アルキニル、
ハロゲン、ハロゲンで置換された低級アルキル、OH、O-
低級アルキル、O-ハロゲンで置換された低級アルキル、
O-低級アルキレン-アリール、SH、S-低級アルキル、N
O2、NH2、NH-低級アルキル、N(低級アルキル)2、NH-CO-
低級アルキル、N(低級アルキル)-CO-低級アルキル、NH-
CO2-低級アルキル、N(低級アルキル)-CO2-低級アルキ
ル、NHSO2-低級アルキル、N(低級アルキル)SO2-低級ア
ルキル、O-CO-低級アルキル、O-CONH2、CO2H、CO2-低級
アルキル、CN、CONH2、CONH-低級アルキル、CON(低級ア
ルキル)2、CHO、C=NOH、C=N-O-CO-低級アルキル、C=NNH
2、NHCO-低級アルキル、NHCO-低級アルキレン-アリー
ル、NHCO-低級アルキレン-ヘテロ環、NHCO-アリール、N
HCO-ヘテロ環、低級アルキレン-CO2H、低級アルキレン-
CO2-低級アルキル、低級アルキレン-CONH2、低級アルキ
レン-CN、低級アルキレン-OH、低級アルキレン-N 3、低
級アルキレン-アリール、低級アルキレン-ヘテロ環、低
級アルケニレン-CO 2H、低級アルケニレン-CO2-低級アル
キル、低級アルケニレン-CONH2、低級アルケニレン-C
N、低級アルケニレン-OH、低級アルケニレン-アリー
ル、低級アルケニレン-ヘテロ環、アリール、ヘテロ
環、CO-アリール、CO-ヘテロ環、O-アリール、O-ヘテロ
環、O-低級アルキレン-CO2H、O-低級アルキレン-CO2-低
級アルキル、O-低級アルキレン-CONH2、O-低級アルキレ
ン-CONH-低級アルキル、O-低級アルキレン-CON(低級ア
ルキル)2、O-低級アルキレン-CONH-低級アルキレン-O
H、O-低級アルキレン-CO-ヘテロ環、O-低級アルキレン-
ヘテロ環及びO-低級アルキレン-CN。ここに、アリール
及びヘテロ環は、低級アルキル、ハロゲン、OH及びO-低
級アルキルから選択される1〜5個の基で置換されていて
もよい。G1群の中で、より好ましくは、低級アルキル、
低級アルケニル、低級アルキニル、ハロゲン、ハロゲン
で置換された低級アルキル、OH、O-低級アルキル、O-低
級アルキレン-アリール、NO2、NH2、NH-低級アルキル、
O-CONH2、CN、CONH2、CONH-低級アルキル、CON(低級ア
ルキル)2、CHO、C=NOH、低級アルキレン-CN、低級アル
キレン-OH、低級アルキレン-アリール、低級アルキレン
-ヘテロ環、低級アルケニレン-CN、低級アルケニレン-O
H、低級アルケニレン-アリール、低級アルケニレン-ヘ
テロ環、アリール及びヘテロ環、更に好ましくは、低級
アルキル、低級アルケニル、ハロゲン、OH、O-低級アル
キル、NO2、NH2、O-CONH2、CN及びCONH2から選択される
基である。"Optionally substituted aryl" or
Substitution in "optionally substituted heteroaryl"
The basis is that of these rings in medicine, especially in anti-HIV agents.
A group that can be used as a substituent,
You may have ~ 5 pieces. When having two or more substituents
In that case, they may be the same or different from each other. Replacement
The group is preferably a group selected from the following G1 group.
It
G1: lower alkyl, lower alkenyl, lower alkynyl,
Halogen, lower alkyl substituted with halogen, OH, O-
Lower alkyl, lower alkyl substituted with O-halogen,
O-lower alkylene-aryl, SH, S-lower alkyl, N
O2, NH2, NH-lower alkyl, N (lower alkyl)2, NH-CO-
Lower alkyl, N (lower alkyl) -CO-lower alkyl, NH-
CO2-Lower alkyl, N (lower alkyl) -CO2-Lower Archi
Le, NHSO2-Lower alkyl, N (lower alkyl) SO2-Lower
Rutile, O-CO-lower alkyl, O-CONH2, CO2H, CO2-Low
Alkyl, CN, CONH2, CONH-lower alkyl, CON (lower alkyl
(Rukiru)2, CHO, C = NOH, C = N-O-CO-lower alkyl, C = NNH
2, NHCO-lower alkyl, NHCO-lower alkylene-aryl
Group, NHCO-lower alkylene-heterocycle, NHCO-aryl, N
HCO-heterocycle, lower alkylene-CO2H, lower alkylene-
CO2-Lower alkyl, lower alkylene-CONH2, Lower archi
Len-CN, lower alkylene-OH, lower alkylene-N 3, Low
Primary alkylene-aryl, lower alkylene-heterocycle, low
Grade alkenylene-CO 2H, lower alkenylene-CO2-Lower Al
Kill, Lower Alkenylene-CONH2, Lower alkenylene-C
N, lower alkenylene-OH, lower alkenylene-ary
Ru, lower alkenylene-heterocycle, aryl, hetero
Ring, CO-aryl, CO-heterocycle, O-aryl, O-hetero
Ring, O-lower alkylene-CO2H, O-lower alkylene-CO2-Low
Primary alkyl, O-lower alkylene-CONH2, O-lower Alkyre
-CONH-lower alkyl, O-lower alkylene-CON (lower alkyl
(Rukiru)2, O-lower alkylene-CONH-lower alkylene-O
H, O-lower alkylene-CO-heterocycle, O-lower alkylene-
Heterocycle and O-lower alkylene-CN. Where aryl
And heterocycle are lower alkyl, halogen, OH and O-low.
Substituted with 1 to 5 groups selected from primary alkyl
Good. Of the G1 group, more preferably lower alkyl,
Lower alkenyl, lower alkynyl, halogen, halogen
Lower alkyl substituted with, OH, O-lower alkyl, O-low
Alkylene-aryl, NO2, NH2, NH-lower alkyl,
O-CONH2, CN, CONH2, CONH-lower alkyl, CON (lower alkyl
(Rukiru)2, CHO, C = NOH, lower alkylene-CN, lower ar
Xylene-OH, lower alkylene-aryl, lower alkylene
-Heterocycle, lower alkenylene-CN, lower alkenylene-O
H, lower alkenylene-aryl, lower alkenylene-f
Telocycle, aryl and heterocycle, more preferably lower
Alkyl, lower alkenyl, halogen, OH, O-lower ar
Kill, no2, NH2, O-CONH2, CN and CONH2Selected from
It is a base.
【0016】「置換されていてもよい含窒素ヘテロ環」
における置換基としては、医薬、殊に抗HIV剤における
これらの環の置換基として使用可能な基であり、これら
の置換基を1〜5個有していてもよい。2個以上の置換
基を有する場合、それらは同一又は互いに異なっていて
もよい。置換基として好ましくは以下のG2群より選択さ
れる基である。
G2:低級アルキル、低級アルキレン-OH、ハロゲン、O
H、O-低級アルキル、O-低級アルキレン-アリール、CO
2H、CO2-低級アルキル、CN、CONH2、CONH-低級アルキ
ル、CON(低級アルキル)2、CONH-シクロアルキル、CONH-
低級アルキレン-アリール、低級アルキレン-CO2H、低級
アルキレン-CO2-低級アルキル、低級アルケニレン-CO
2H、低級アルケニレン-CO2-低級アルキル、低級アルケ
ニレン-OH、低級アルキレン-O-低級アルキル、低級アル
キレン-O-低級アルケニル、低級アルキレン-O-低級アル
キニル、低級アルキレン-O-低級アルキレン-アリール、
低級アルキレン-S-低級アルキレン-アリール、低級アル
キレン-NHCO-低級アルキル、低級アルキレン-O-低級ア
ルキレン-CO2-低級アルキル、低級アルキレン-NH-低級
アルキレン-CO2-低級アルキル、低級アルキレン-NH-低
級アルキレン-CO2H、低級アルキレン-N(低級アルキル)-
低級アルキレン-CO2-低級アルキル、低級アルキレン-N
(低級アルキル)-低級アルキレン-CO2H、低級アルキレン
-O-低級アルキレン-CO2H、低級アルキレン-O-低級アル
キレン-CO-ヘテロ環、低級アルキレン-O-低級アルキレ
ン-CONH2、低級アルキレン-O-低級アルキレン-CONH-低
級アルキル、低級アルキレン-O-低級アルキレン-CON(低
級アルキル)2、低級アルキレン-アリール、低級アルキ
レン-ヘテロ環、アリール、ヘテロ環、シクロアルキル
及びCO-ヘテロ環。ここに、アリール及びヘテロ環は、
低級アルキル、ハロゲン、OH及びO-低級アルキルから選
択される1〜5個の基で置換されていてもよい。G2群の中
で、より好ましくは、低級アルキル、低級アルキレン-O
H、ハロゲン、OH、O-低級アルキル、O-低級アルキレン-
アリール、CO2H、CO2-低級アルキル、CN、CONH2、アリ
ール、ヘテロ環及びシクロアルキル、更に好ましくは、
低級アルキル、低級アルキレン-OH、ハロゲン、OH、CN
及びシクロアルキルから選択される基である。“Nitrogen-containing heterocycle which may be substituted”
The substituent in is a group that can be used as a substituent of these rings in a drug, particularly an anti-HIV agent, and may have 1 to 5 of these substituents. When having two or more substituents, they may be the same or different from each other. The substituent is preferably a group selected from the following G2 group. G2: lower alkyl, lower alkylene-OH, halogen, O
H, O-lower alkyl, O-lower alkylene-aryl, CO
2 H, CO 2 -lower alkyl, CN, CONH 2 , CONH-lower alkyl, CON (lower alkyl) 2 , CONH-cycloalkyl, CONH-
Lower alkylene-aryl, lower alkylene-CO 2 H, lower alkylene-CO 2 -lower alkyl, lower alkenylene-CO
2 H, lower alkenylene-CO 2 -lower alkyl, lower alkenylene-OH, lower alkylene-O-lower alkyl, lower alkylene-O-lower alkenyl, lower alkylene-O-lower alkynyl, lower alkylene-O-lower alkylene-aryl ,
Lower alkylene-S-lower alkylene-aryl, lower alkylene-NHCO-lower alkyl, lower alkylene-O-lower alkylene-CO 2 -lower alkyl, lower alkylene-NH-lower alkylene-CO 2 -lower alkyl, lower alkylene-NH -Lower alkylene-CO 2 H, lower alkylene-N (lower alkyl)-
Lower alkylene-CO 2 -lower alkyl, lower alkylene-N
(Lower alkyl) -lower alkylene-CO 2 H, lower alkylene
-O-lower alkylene-CO 2 H, lower alkylene-O-lower alkylene-CO-heterocycle, lower alkylene-O-lower alkylene-CONH 2 , lower alkylene-O-lower alkylene-CONH-lower alkyl, lower alkylene- O-lower alkylene-CON (lower alkyl) 2 , lower alkylene-aryl, lower alkylene-heterocycle, aryl, heterocycle, cycloalkyl and CO-heterocycle. Where aryl and heterocycle are
It may be substituted with 1 to 5 groups selected from lower alkyl, halogen, OH and O-lower alkyl. Among the G2 group, more preferably lower alkyl, lower alkylene-O
H, halogen, OH, O-lower alkyl, O-lower alkylene-
Aryl, CO 2 H, CO 2 -lower alkyl, CN, CONH 2 , aryl, heterocycle and cycloalkyl, more preferably,
Lower alkyl, lower alkylene-OH, halogen, OH, CN
And a group selected from cycloalkyl.
【0017】本発明における好ましい化合物は、下記式
(III)で示される化合物である。A preferred compound in the present invention is a compound represented by the following formula (III).
【化9】
上記式中の記号は以下の意味を有する:R1、R2、a及びb
は前記の通り。
R3及びR4:G2群から選択される基;あるいは、R3とR4が
一体となって、1〜5個の低級アルキルで置換されていて
もよいC3-6アルキレン、又は、-C(R10)=C(R11)-C(R12)=
C(R13)-で表される基、
R10、R11、R12及びR13:同一又は互いに異なって、H、
低級アルキル又はフェニル、
R5、R6、R7、R8及びR9:G1群から選択される基。
より好ましくは、R1が非存在、R2が低級アルキル、ハロ
ゲンで置換された低級アルキル又は低級アルキレン-O
H、aが二重結合、且つ、bが単結合の化合物である。ま
た、R2としては、好ましくは、C1-3アルキル、ハロゲン
で置換されたC1-2アルキル又はC1-3アルキレン-OHであ
り、より好ましくは、C1-3アルキルであり、特に好まし
くはメチルである。R3としては、好ましくは、ハロゲ
ン、CN又は低級アルキルであり、より好ましくは、ハロ
ゲン、CN又はC1-3アルキルであり、特に好ましくは、ク
ロロ、CN又はメチルである。R4としては、好ましくはC
2-6アルキル、より好ましくはC3-5アルキル、特に好ま
しくは2-プロピル、2-メチル-2-ブチル又はtert-ブチル
である。R5〜R9としては、1)好ましくは、R7がH、且
つ、R6がH以外の基であり、より好ましくは、R5、R7、R
8及びR9が共にHであり、更に好ましくはR6がハロゲン又
はNO2である、あるいは、2)好ましくは、R7がH、且つ、
R5及びR8がH以外の基、より好ましくは、R6、R7及びR9
が共にHであり、更に好ましくは、R5がCN、OH又はNH2、
且つ、R8がハロゲン又はCNである。[Chemical 9] The symbols in the above formula have the following meanings: R 1 , R 2 , a and b
As above. R 3 and R 4 : a group selected from the G2 group; or, R 3 and R 4 together form C 3-6 alkylene which may be substituted with 1 to 5 lower alkyl, or C (R 10 ) = C (R 11 ) -C (R 12 ) =
A group represented by C (R 13 )-, R 10 , R 11 , R 12 and R 13 : the same or different from each other, H,
Lower alkyl or phenyl, R 5, R 6, R 7, R 8 and R 9: a group selected from the G1 group. More preferably, R 1 is absent, R 2 is lower alkyl, halogen substituted lower alkyl or lower alkylene-O.
A compound in which H and a are double bonds and b is a single bond. Further, R 2 is preferably C 1-3 alkyl, C 1-2 alkyl substituted with halogen or C 1-3 alkylene-OH, more preferably C 1-3 alkyl, particularly Preferred is methyl. R 3 is preferably halogen, CN or lower alkyl, more preferably halogen, CN or C 1-3 alkyl, and particularly preferably chloro, CN or methyl. R 4 is preferably C
2-6 alkyl, more preferably C 3-5 alkyl, particularly preferably 2-propyl, 2-methyl-2-butyl or tert-butyl. As R 5 to R 9 , 1) preferably, R 7 is H, and R 6 is a group other than H, and more preferably R 5 , R 7 , and R.
8 and R 9 are both H, more preferably R 6 is halogen or NO 2 , or 2) preferably R 7 is H, and
R 5 and R 8 are groups other than H, more preferably R 6 , R 7 and R 9
Are both H, and more preferably, R 5 is CN, OH or NH 2 ,
And R 8 is halogen or CN.
【0018】本発明化合物(I)は、置換基の種類によ
っては幾何異性体や互変異性体(例えば、ケト−エノー
ル様の互変異性)が存在する場合があるが、本発明には
これらの異性体の分離したもの、あるいは混合物をも包
含する。また、本発明化合物は不斉炭素原子を有する場
合があり、不斉炭素原子に基づく異性体が存在しうる。
本発明にはこれら光学異性体の混合物や単離されたもの
を包含する。また、本発明には、本発明化合物を放射性
同位元素でラベル化した化合物も包含する。The compound (I) of the present invention may have geometrical isomers or tautomers (for example, keto-enol-like tautomerism) depending on the kind of the substituent. It also includes separated isomers or mixtures thereof. Further, the compound of the present invention may have an asymmetric carbon atom, and isomers based on the asymmetric carbon atom may exist.
The present invention includes a mixture of these optical isomers and an isolated one. The present invention also includes a compound obtained by labeling the compound of the present invention with a radioisotope.
【0019】本発明化合物(I)は、酸付加塩又は塩基
との塩を形成する場合もあり、かかる塩が製薬学的に許
容され得る塩である限りにおいて本発明に包含される。
具体的には、塩酸、臭化水素酸、ヨウ化水素酸、硫酸、
硝酸、リン酸等の無機酸や、ギ酸、酢酸、プロピオン
酸、シュウ酸、マロン酸、コハク酸、フマル酸、マイレ
ン酸、乳酸、リンゴ酸、酒石酸、クエン酸、メタンスル
ホン酸、エタンスルホン酸、アスパラギン酸、グルタミ
ン酸等の有機酸との酸付加塩、ナトリウム、カリウム、
マグネシウム、カルシウム、アルミニウム等の無機塩
基、メチルアミン、エチルアミン、エタノールアミン、
リジン、オルニチン等の有機塩基との塩やアンモニウム
塩等が挙げられる。更に、本発明は、本発明化合物
(I)及びその製薬学的に許容され得る塩の各種の水和
物や溶媒和物及び結晶多形の物質をも包含する。また、
本発明化合物(I)には、薬理学的に許容されるプロド
ラッグも含まれる。薬理学的に許容されるプロドラッグ
とは、加溶媒分解により又は生理学的条件下で本発明の
NH2、OH、CO2H等に変換できる基を有する化合物であ
る。プロドラッグを形成する基としては、Prog. Med.,
5, 2157-2161 (1985)や「医薬品の開発」(廣川書店、1
990年)第7巻 分子設計163-198に記載の基が挙げられ
る。The compound (I) of the present invention may form an acid addition salt or a salt with a base, and it is included in the present invention as long as such salt is a pharmaceutically acceptable salt.
Specifically, hydrochloric acid, hydrobromic acid, hydroiodic acid, sulfuric acid,
Nitric acid, inorganic acids such as phosphoric acid, formic acid, acetic acid, propionic acid, oxalic acid, malonic acid, succinic acid, fumaric acid, maleic acid, lactic acid, malic acid, tartaric acid, citric acid, methanesulfonic acid, ethanesulfonic acid, Acid addition salts with organic acids such as aspartic acid and glutamic acid, sodium, potassium,
Inorganic bases such as magnesium, calcium, aluminum, methylamine, ethylamine, ethanolamine,
Examples thereof include salts with organic bases such as lysine and ornithine, ammonium salts and the like. Furthermore, the present invention also includes various hydrates and solvates of the compound (I) of the present invention and pharmaceutically acceptable salts thereof, and crystalline polymorphic substances. Also,
The compound (I) of the present invention also includes a pharmacologically acceptable prodrug. Pharmacologically acceptable prodrug means a prodrug of the present invention by solvolysis or under physiological conditions.
It is a compound having a group that can be converted into NH 2 , OH, CO 2 H and the like. As a group forming a prodrug, Prog. Med.,
5, 2157-2161 (1985) and "Development of Pharmaceuticals" (Hirokawa Shoten, 1
990) Volume 7 Molecular design 163-198 and the like.
【0020】(製造法)本発明化合物(I)及びその製
薬学的に許容される塩は、その基本骨格あるいは置換基
の種類に基づく特徴を利用し、種々の公知の合成法を適
用して製造することができる。その際、官能基の種類に
よっては、当該官能基を原料乃至中間体の段階で適当な
保護基で保護、又は当該官能基に容易に転化可能な基に
置き換えておくことが製造技術上効果的な場合がある。
このような官能基としては例えばアミノ基、水酸基、カ
ルボキシル基等であり、それらの保護基としては例えば
グリーン(T. W. Greene)及びウッツ(P. G. M. Wut
s)著、「Protective Groupsin Organic Synthesis(第
3版、1999年)」に記載の保護基を挙げることができ、
これらを反応条件に応じて適宜選択して用いればよい。
このような方法では、当該保護基を導入して反応を行っ
た後、必要に応じて保護基を除去、あるいは所望の基に
転化することにより、所望の化合物を得ることができ
る。また、本発明化合物(I)のプロドラッグは上記保
護基と同様、原料乃至中間体の段階で特定の基を導入、
あるいは得られた本発明化合物(I)を用い反応を行う
ことで製造できる。反応は通常のエステル化、アミド
化、脱水等、当業者により公知の方法を適用することに
より行うことができる。以下、本発明化合物(I)の代
表的な製造法を説明する。(Production Method) The compound (I) of the present invention and a pharmaceutically acceptable salt thereof are produced by utilizing various known synthetic methods by utilizing the characteristics based on the basic skeleton or the kind of the substituent. It can be manufactured. At that time, depending on the kind of the functional group, it is effective in terms of manufacturing technology to protect the functional group with an appropriate protecting group at the stage of the raw material or the intermediate, or to replace it with a group which can be easily converted into the functional group. There is a case.
Examples of such a functional group include an amino group, a hydroxyl group, and a carboxyl group, and examples of protective groups thereof include Green (TW Greene) and Utz (PGM Wut).
s), “Protective Groups in Organic Synthesis (No.
3rd edition, 1999) ”,
These may be appropriately selected and used according to the reaction conditions.
In such a method, the desired compound can be obtained by introducing the protective group and carrying out the reaction, and then removing the protective group or converting it into a desired group as necessary. Further, the prodrug of the compound (I) of the present invention, like the above-mentioned protecting group, has a specific group introduced at the stage of starting material or intermediate,
Alternatively, it can be produced by carrying out a reaction using the obtained compound (I) of the present invention. The reaction can be carried out by applying a method known to those skilled in the art, such as ordinary esterification, amidation and dehydration. Hereinafter, a typical method for producing the compound (I) of the present invention will be described.
【0021】第1製法(スルホニル化)First production method (sulfonylation)
【化10】
本製法は、アミノ化合物(IV)とスルホニルクロリド化
合物(V)とを反応させることにより、本発明化合物(I
a)を得る方法である。反応は、ベンゼン、トルエン、
キシレン等の芳香族炭化水素類、ジクロロメタン、1,2-
ジクロロエタン、クロロホルム等のハロゲン化炭化水素
類、ジエチルエーテル、テトラヒドロフラン(THF)、ジ
オキサン等のエーテル類、N,N-ジメチルホルムアミド(D
MF)等の不活性溶媒中又は無溶媒下、冷却下〜加熱下、
好ましくは、−20℃〜80℃で行う。塩基(好ましくは、
トリエチルアミン、ジイソプロピルエチルアミン、N-メ
チルモルホリン、ピリジン、4-(N,N-ジメチルアミノ)ピ
リジン等)の存在下に反応させるのが、反応を円滑に進
行させる上で有利な場合がある。[Chemical 10] This production method comprises reacting an amino compound (IV) with a sulfonyl chloride compound (V) to give the compound of the present invention (I
a) is a method of obtaining. The reaction is benzene, toluene,
Aromatic hydrocarbons such as xylene, dichloromethane, 1,2-
Halogenated hydrocarbons such as dichloroethane and chloroform, diethyl ether, tetrahydrofuran (THF), ethers such as dioxane, N, N-dimethylformamide (D
(MF) in an inert solvent or without solvent, under cooling to heating,
Preferably, it is carried out at -20 ° C to 80 ° C. A base (preferably,
Reaction in the presence of (triethylamine, diisopropylethylamine, N-methylmorpholine, pyridine, 4- (N, N-dimethylamino) pyridine, etc.) may be advantageous for the smooth progress of the reaction.
【0022】第2製法(アルキル化)Second production method (alkylation)
【化11】
(式中、RはR1又はR2に対応する基を、L1は脱離基を示
す。以下同様。)
本製法は、R1がHである本発明化合物(Ib)をアルキル
化反応に付し、本発明化合物(I)を製造する方法であ
る。ここで、脱離基L1としては、例えばハロゲン、メタ
ンスルホニルオキシ、p-トルエンスルホニルオキシ等が
挙げられる。反応は、芳香族炭化水素類、エーテル類、
DMF、ジメチルスルホキシド(DMSO)、ジメチルアセトア
ミド(DMA)及びN-メチルピロリドン等の反応に不活性な
溶媒中、水素化ナトリウム、水酸化カリウム、t-ブトキ
シカリウム、リチウムジイソプロピルアミド等の塩基存
在下、冷却下〜加熱下、好ましくは、−20℃〜120℃で
行う。溶媒は2種以上混合して用いてもよい。本反応
は、臭化テトラメチルアンモニウム、塩化ベンジルトリ
エチルアンモニウム等の相間移動触媒の共存下に反応を
行うことが、反応を円滑に進行させるのに有利なことが
ある。[Chemical 11] (In the formula, R represents a group corresponding to R 1 or R 2 , and L 1 represents a leaving group. The same applies hereinafter.) In the present production method, the compound (Ib) of the present invention in which R 1 is H is alkylated And a method for producing the compound (I) of the present invention. Here, examples of the leaving group L 1 include halogen, methanesulfonyloxy, p-toluenesulfonyloxy and the like. The reaction is based on aromatic hydrocarbons, ethers,
DMF, dimethylsulfoxide (DMSO), in a solvent inert to the reaction such as dimethylacetamide (DMA) and N-methylpyrrolidone, sodium hydride, potassium hydroxide, potassium t-butoxy, in the presence of a base such as lithium diisopropylamide, It is carried out under cooling to heating, preferably at -20 ° C to 120 ° C. Two or more kinds of solvents may be mixed and used. This reaction may be advantageous in that the reaction proceeds smoothly in the presence of a phase transfer catalyst such as tetramethylammonium bromide or benzyltriethylammonium chloride.
【0023】その他の製法
本発明化合物(I)の、A環やB環上に種々の置換基を有
する化合物は、当業者に自明の種々の反応に付すことに
より、当該置換基を他の官能基へと変換することができ
る。代表的な製法としては、例えば以下に示す製法を挙
げられる:
1)OH基を有する化合物(低級アルキレン-OH等を含
む、以下同様)は、メチルエーテルやベンジルエーテル
基を有する化合物を用い、前記「Protective Groups in
Organic Synthesis(第3版)」に記載された脱保護法
(例えば、BBr3)を適宜選択し使用すること、あるい
は、エステル基を有する化合物を用い、加水分解反応に
付すことで製造できる;
2)アミド、エステル、カルバマート又はウレアを有す
る化合物は、OH、アミノ又はヒドロキシム基等を有する
化合物を用い、種々のアシル化剤と反応することで製造
できる。アシル化剤としては、混合酸無水物、対称酸無
水物、酸ハロゲン化物、イソシアナート化合物、チオイ
ソシアナート化合物、スルホニルクロリド化合物等が挙
げられる。反応は、前記スルホニル化反応とほぼ同様の
条件が適用できる;
3)アルキルハライド等のアルキル化剤と求核剤(例え
ば、アルコール、アミン、アミド、イミド、スルホンア
ミド、含窒素ヘテロ環、チオール等)による求核置換反
応、あるいは、アルデヒド等のカルボニル化合物とアミ
ンとの還元的アルキル化反応により、種々のアルキル基
を有する化合物が製造できる;
4)ニトロ基の接触還元反応によりアミノ基を有する化
合物が製造できる;
5)アルデヒド基やエステル基の還元反応により、OH基
を有する化合物が製造できる。Other Production Methods The compound (I) of the present invention having various substituents on the A ring and the B ring can be subjected to various reactions obvious to those skilled in the art to give the substituents other functional groups. It can be converted into a group. Typical production methods include, for example, the following production methods: 1) As the compound having an OH group (including lower alkylene-OH and the like, the same applies hereinafter), a compound having a methyl ether or benzyl ether group is used. `` Protective Groups in
It can be produced by appropriately selecting and using the deprotection method (for example, BBr 3 ) described in “Organic Synthesis (3rd edition)”, or by subjecting it to a hydrolysis reaction using a compound having an ester group; 2 The compound having amide, ester, carbamate or urea can be produced by using a compound having an OH, amino or hydroxy group and reacting with various acylating agents. Examples of the acylating agent include mixed acid anhydrides, symmetrical acid anhydrides, acid halides, isocyanate compounds, thioisocyanate compounds and sulfonyl chloride compounds. The reaction can be carried out under substantially the same conditions as in the sulfonylation reaction; 3) Alkylating agents such as alkyl halides and nucleophiles (eg alcohols, amines, amides, imides, sulfonamides, nitrogen-containing heterocycles, thiols, etc.) Compounds having various alkyl groups can be produced by a nucleophilic substitution reaction with) or a reductive alkylation reaction of a carbonyl compound such as an aldehyde with an amine; 4) A compound having an amino group by a catalytic reduction reaction of a nitro group. 5) A compound having an OH group can be produced by a reduction reaction of an aldehyde group or an ester group.
【0024】原料化合物は市販又は文献等で公知の化合
物が使用できる。また、新規な原料化合物は、既知の方
法により容易に製造でき、例えば、以下の方法によって
製造できる。As the raw material compound, a commercially available compound or a compound known in the literature can be used. The novel raw material compound can be easily produced by a known method, for example, the following method.
【化12】
(式中、R41、R42、R43、R44及びR45はH又は低級アルキ
ル等を示し、(R44)(R45)CH-としてR43となる基を、
(R41)(R42)(R43)C-としてR4となる基を示す。)
アミノチアゾール化合物、特にR41、R42及びR43が低級
アルキル基で示される化合物(X)は、Khim. Geterotsi
kl. Soedin. (1967), (1), 153-4、Khim. Geterotsikl.
Soedin. (1967), (1), 154-7又はKhim. Geterotsikl.
Soedin. (1969), (1), 56-8に記載の方法により製造で
きる。また、種々のスルホニルクロリド化合物(V)
は、Journal Heterocyclic Chem., (1986), 23, 1253-1
255、米国特許US5,081,275号公報、又は特開昭63-10135
9号公報等に記載の方法に従って製造できる。[Chemical 12] (In the formula, R 41 , R 42 , R 43 , R 44 and R 45 represent H or lower alkyl and the like, and a group which becomes R 43 as (R 44 ) (R 45 ) CH-,
(R 41 ) (R 42 ) (R 43 ) C-represents a group which becomes R 4 . ) Aminothiazole compounds, particularly compounds (X) in which R 41 , R 42 and R 43 are lower alkyl groups are described in Khim. Geterotsi
kl. Soedin. (1967), (1), 153-4, Khim. Geterotsikl.
Soedin. (1967), (1), 154-7 or Khim. Geterotsikl.
It can be produced by the method described in Soedin. (1969), (1), 56-8. In addition, various sulfonyl chloride compounds (V)
Is Journal Heterocyclic Chem., (1986), 23, 1253-1.
255, U.S. Pat.No. 5,081,275, or JP-A-63-10135.
It can be produced according to the method described in Japanese Patent Publication No. 9 or the like.
【0025】上記各製法により得られた反応生成物は、
遊離化合物、その塩あるいは水和物など各種の溶媒和物
として単離、精製することができる。塩は通常の造塩処
理に付すことにより製造できる。単離、精製は、抽出、
濃縮、留去、結晶化、濾過、再結晶、各種クロマトグラ
フィー等通常の化学操作を適用して行うことができる。
各種異性体は異性体間の物理化学的な差を利用して常法
により単離できる。例えば、光学異性体は一般的な光学
分割法、例えば分別結晶化又はクロマトグラフィー等に
より分離できる。また、光学異性体は、適当な光学活性
な原料化合物より製造することもできる。The reaction products obtained by the above-mentioned production methods are
It can be isolated and purified as various solvates such as free compounds, salts or hydrates thereof. The salt can be produced by subjecting it to an ordinary salt-forming treatment. Isolation, purification, extraction,
It can be carried out by applying ordinary chemical operations such as concentration, evaporation, crystallization, filtration, recrystallization and various chromatographies.
Various isomers can be isolated by a conventional method by utilizing the physicochemical difference between the isomers. For example, optical isomers can be separated by a general optical resolution method such as fractional crystallization or chromatography. The optical isomer can also be produced from a suitable optically active starting material compound.
【0026】[0026]
【発明の効果】本発明化合物は医薬製剤の活性成分とし
て有用である。特に逆転写酵素阻害活性を有することか
ら、抗HIV剤として有用である。The compound of the present invention is useful as an active ingredient of a pharmaceutical preparation. In particular, since it has reverse transcriptase inhibitory activity, it is useful as an anti-HIV agent.
【0027】本発明化合物(I)又はその製薬学的に許
容され得る塩の1種又は2種以上を有効成分として含有
する医薬組成物は、当分野において通常用いられている
薬剤用担体、賦形剤等を用いて通常使用されている方法
によって調製することができる。投与は錠剤、丸剤、カ
プセル剤、顆粒剤、散剤、液剤等による経口投与、又
は、静脈内、筋肉内等の注射剤、坐剤、点眼剤、眼軟
膏、経皮用液剤、軟膏剤、経皮用貼付剤、経粘膜液剤、
経粘膜貼付剤、吸入剤等による非経口投与のいずれの形
態であってもよい。本発明による経口投与のための固体
組成物としては、錠剤、散剤、顆粒剤等が用いられる。
このような固体組成物においては、一つ又はそれ以上の
活性物質が、少なくとも一つの不活性な賦形剤、例えば
乳糖、マンニトール、ブドウ糖、ヒドロキシプロピルセ
ルロース、微結晶セルロース、デンプン、ポリビニルピ
ロリドン、メタケイ酸アルミン酸マグネシウム等と混合
される。組成物は、常法に従って、不活性な添加剤、例
えばステアリン酸マグネシウム等の滑沢剤やカルボキシ
メチルスターチナトリウム等の崩壊剤、溶解補助剤を含
有していてもよい。錠剤又は丸剤は必要により糖衣又は
胃溶性若しくは腸溶性コーティング剤で被膜してもよ
い。The pharmaceutical composition containing, as an active ingredient, one or more of the compound (I) of the present invention or a pharmaceutically acceptable salt thereof is a carrier for pharmaceuticals which is usually used in the art. It can be prepared by a commonly used method using a shaping agent and the like. Administration is oral administration by tablets, pills, capsules, granules, powders, solutions, etc., or injections such as intravenous and intramuscular, suppositories, eye drops, eye ointments, transdermal solutions, ointments, Transdermal patch, transmucosal fluid,
It may be in any form of parenteral administration such as transmucosal patch and inhalant. As the solid composition for oral administration according to the present invention, tablets, powders, granules and the like are used.
In such solid compositions, the one or more active substances comprise at least one inert excipient such as lactose, mannitol, glucose, hydroxypropylcellulose, microcrystalline cellulose, starch, polyvinylpyrrolidone, metasilicate. Acid mixed with magnesium aluminate etc. The composition may contain an inert additive, for example, a lubricant such as magnesium stearate, a disintegrating agent such as sodium carboxymethyl starch, and a solubilizing agent according to a conventional method. If necessary, tablets or pills may be coated with sugar coating or gastric or enteric coating agent.
【0028】経口投与のための液体組成物は、薬剤的に
許容される乳剤、液剤、懸濁剤、シロップ剤、エリキシ
ル剤等を含み、一般的に用いられる不活性な溶剤、例え
ば精製水、エタノールを含む。この組成物は不活性な溶
剤以外に可溶化剤、湿潤剤、懸濁化剤のような補助剤、
甘味剤、矯味剤、芳香剤、防腐剤を含有していてもよ
い。非経口投与のための注射剤としては、無菌の水性又
は非水性の液剤、懸濁剤、乳剤を含む。水性の溶剤とし
ては、例えば注射用蒸留水及び生理食塩水が含まれる。
非水性の溶剤としては、例えばプロピレングリコール、
ポリエチレングリコール、オリーブ油のような植物油、
エタノールのようなアルコール類、ポリソルベート80
(商品名)等がある。このような組成物は、さらに等張
化剤、防腐剤、湿潤剤、乳化剤、分散剤、安定化剤、溶
解補助剤を含んでもよい。これらは例えばバクテリア保
留フィルターを通す濾過、殺菌剤の配合又は照射によっ
て無菌化される。また、これらは無菌の固体組成物を製
造し、使用前に無菌水又は無菌の注射用溶媒に溶解、懸
濁して使用することもできる。Liquid compositions for oral administration include pharmaceutically acceptable emulsions, solutions, suspensions, syrups, elixirs and the like, and generally used inert solvents such as purified water, Contains ethanol. This composition contains auxiliary agents such as solubilizers, wetting agents and suspending agents, in addition to inert solvents.
It may contain a sweetening agent, a flavoring agent, an aromatic agent, and a preservative. Injections for parenteral administration include sterile aqueous or non-aqueous liquids, suspensions and emulsions. Examples of the aqueous solvent include distilled water for injection and physiological saline.
As the non-aqueous solvent, for example, propylene glycol,
Polyethylene glycol, vegetable oils such as olive oil,
Alcohols such as ethanol, polysorbate 80
(Product name) etc. Such a composition may further contain an isotonicity agent, a preservative, a wetting agent, an emulsifying agent, a dispersing agent, a stabilizing agent, and a solubilizing agent. These are sterilized by, for example, filtration through a bacteria-retaining filter, addition of a bactericide, or irradiation. In addition, these can also be used by producing a sterile solid composition and dissolving or suspending it in sterile water or a sterile solvent for injection before use.
【0029】経粘膜剤は固体、液体、半固体状のものが
用いられ、従来公知の方法に従って製造することができ
る。例えば公知のpH調整剤、防腐剤、増粘剤や賦形剤が
適宜添加され、固体、液体若しくは半固体状に成形され
る。例えば、経鼻剤は通常のスプレー器具、点鼻容器、
チューブ、鼻腔内挿入具等を用いて投与される。通常経
口投与の場合、1日の投与量は、体重当たり約0.001〜7
0 mg/kg、好ましくは0.1〜50 mg/kgが適当であり、これ
を1回であるいは2乃至4回に分けて投与する。静脈投
与される場合は、1日の投与量は、体重当たり約0.001
から10mg/kgが適当で、1日1回乃至複数回に分けて投
与するまた、経粘膜剤としては、体重当たり約0.001〜7
0 mg/kgを1日1回乃至複数回に分けて投与する。投与
量は症状、年令、性別等を考慮して個々の場合に応じて
適宜決定されるAs the transmucosal agent, solid, liquid or semi-solid transmucosal agents are used, and they can be produced by a conventionally known method. For example, known pH adjusters, preservatives, thickeners and excipients are added as appropriate and molded into a solid, liquid or semi-solid form. For example, transnasal products are usually spray equipment, nasal containers,
It is administered using a tube, an intranasal insert, or the like. Normally, for oral administration, the daily dose is about 0.001 to 7 per body weight.
A suitable dose is 0 mg / kg, preferably 0.1 to 50 mg / kg, which may be administered once or in 2 to 4 divided doses. When administered intravenously, the daily dose is approximately 0.001 per body weight
10 mg / kg is appropriate, and it is administered once or in multiple divided doses daily. As a transmucosal agent, about 0.001 to 7 per body weight
Administer 0 mg / kg once a day or in multiple divided doses. The dose is appropriately determined according to each case, taking into consideration symptoms, age, sex, etc.
【0030】[0030]
【実施例】以下、実施例に基づき本発明を更に詳細に説
明する。本発明化合物は下記実施例に記載の化合物に限
定されるものではない。また原料化合物の製法を参考例
に示す。なお、化合物番号で“S-”と共に示される番号
の化合物(例えば、S-1、S-100等)は、原料化合物であ
ることを示す。
実施例1−1(化合物2)
2-アミノ-5-t-ブチル-4-メチルチアゾール塩酸塩 (5.88
g)のピリジン溶液に3-ニトロベンゼンスルホニルクロ
リド (9.46 g)を加え、室温で2時間攪拌した。反応液に
水を加え析出した固体を濾取して得た固体をシリカゲル
カラムクロマトグラフィー(クロロホルム)で精製し、
更にメタノールより結晶化して、N-(5-t-ブチル-4-メチ
ルチアゾール-2-イル)-3-ニトロベンゼンスルホンアミ
ド(化合物2)8.49 gを得た。1
H-NMR (DMSO-d6) δ: 12.58 (1H, br-s), 8.46 (1H,
t), 8.42 (1H, ddd), 8.21 (1H, dd), 7.86(1H, t), 2.
16 (3H, s), 1.30(9H, s);FAB-MS: 356 [(M+H)+]
実施例1−2(化合物1及び653)
化合物2(8.49 g)のTHF溶液に60%水素化ナトリウム(1.44
g)、ヨウ化メチル(2.98 ml)を氷冷化加え、室温で12時
間攪拌した。反応液に水を加えた後、酢酸エチルで抽出
した。有機層を水及び飽和食塩水で順次洗浄し、無水硫
酸ナトリウムで乾燥後、減圧濃縮した。残渣をシリカゲ
ルカラムクロマトグラフィー(クロロホルム)で精製
し、N-(5-t-ブチル-3,4-ジメチル-2,3-ジヒドロチアゾ
ール-2-イリデン)-3-ニトロベンゼンスルホンアミド(化
合物1)及びN-(5-t-ブチル-4-メチルチアゾール-2-イル)
-N-メチル-3-ニトロベンゼンスルホンアミド(化合物65
3)を得た。化合物1を更にメタノールから再結晶して、
化合物1 (6.56 g)を得た。
化合物1:1H-NMR (DMSO-d6) δ: 8.49 (1H, t), 8.42
(1H, dd), 8.26 (1H, d), 7.85(1H, t), 3.43 (3H, s),
2.28 (3H, s), 1.32(9H, s);FAB-MS: 370 [(M+H)+]
化合物653:MS (AP): 370 [(M+H)+]
実施例1−1及び/又は1−2と同様にして、対応する
原料より、後記表3〜10に示す化合物を製造した。The present invention will be described in more detail based on the following examples. The compound of the present invention is not limited to the compounds described in the examples below. A method for producing the raw material compound is shown in Reference Example. In addition, a compound with a number shown together with "S-" in the compound number (for example, S-1, S-100, etc.) indicates a raw material compound. Example 1-1 (Compound 2) 2-amino-5-t-butyl-4-methylthiazole hydrochloride (5.88
3-Nitrobenzenesulfonyl chloride (9.46 g) was added to the pyridine solution of g), and the mixture was stirred at room temperature for 2 hours. Water was added to the reaction solution and the precipitated solid was collected by filtration and the obtained solid was purified by silica gel column chromatography (chloroform).
Further, it was crystallized from methanol to obtain 8.49 g of N- (5-t-butyl-4-methylthiazol-2-yl) -3-nitrobenzenesulfonamide (Compound 2). 1 H-NMR (DMSO-d 6 ) δ: 12.58 (1H, br-s), 8.46 (1H,
t), 8.42 (1H, ddd), 8.21 (1H, dd), 7.86 (1H, t), 2.
16 (3H, s), 1.30 (9H, s); FAB-MS: 356 [(M + H) + ] Example 1-2 (Compounds 1 and 653) 60% in a THF solution of Compound 2 (8.49 g). Sodium hydride (1.44
g) and methyl iodide (2.98 ml) were added under ice cooling, and the mixture was stirred at room temperature for 12 hours. Water was added to the reaction solution, which was then extracted with ethyl acetate. The organic layer was washed successively with water and saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The residue was purified by silica gel column chromatography (chloroform), N- (5-t-butyl-3,4-dimethyl-2,3-dihydrothiazole-2-ylidene) -3-nitrobenzenesulfonamide (Compound 1) and N- (5-t-butyl-4-methylthiazol-2-yl)
-N-methyl-3-nitrobenzenesulfonamide (Compound 65
3) got. Compound 1 was further recrystallized from methanol,
Compound 1 (6.56 g) was obtained. Compound 1: 1 H-NMR (DMSO-d 6 ) δ: 8.49 (1H, t), 8.42
(1H, dd), 8.26 (1H, d), 7.85 (1H, t), 3.43 (3H, s),
2.28 (3H, s), 1.32 (9H, s); FAB-MS: 370 [(M + H) + ] Compound 653: MS (AP): 370 [(M + H) + ] Examples 1-1 and Compounds shown in Tables 3 to 10 below were produced from the corresponding raw materials in the same manner as / or 1-2.
【0031】実施例2(化合物134)
化合物1 (1.00 g)のTHF/エタノール溶液に10%パラジウ
ム炭素(0.1 g)を加え、水素雰囲気下、室温で1時間攪拌
した。セライト濾過後、減圧下濃縮し、析出した固体を
熱酢酸エチルで洗浄後、アセトニトリルから再結晶し
て、3-アミノ-N-(5-t-ブチル-3,4-ジメチル-2,3-ジヒド
ロチアゾール-2-イリデン)ベンゼンスルホンアミド(化
合物134)387 mgを得た。1
H-NMR (DMSO-d6) δ: 7.11 (1H, t), 7.03 (1H, t),
6.90 (1H, d), 6.68 (1H,dd), 5.48 (2H, bs), 3.38 (3
H, s), 2.26 (3H, s), 1.31(9H, s);FAB-MS: 340 [(M+
H)+]
実施例2と同様にして、後記表11及び12に示す化合
物を製造した。
実施例3(化合物16)
化合物6 (0.60 g)、エタノール及び1 M 水酸化ナトリウ
ム水溶液(1.56ml)混合物を、70℃で1時間攪拌した。室
温に放冷後、酢酸エチルを加え、析出した固体を濾取
し、3,4-ジメチル-2-[(3-ニトロベンゼンスルホニル)イ
ミノ]-2,3-ジヒドロチアゾール-5-カルボン酸ナトリウ
ム(化合物16)380 mgを得た。1
H-NMR (DMSO-d6) δ: 8.49 (1H, t), 8.41(1H, dd),
8.25 (1H, d), 7.84 (1H,t), 3.39 (3H, s);FAB-MS: 3
56 [(M-H)-]
実施例3と同様にして、後記表13に示す化合物を製造
した。Example 2 (Compound 134) To a THF / ethanol solution of Compound 1 (1.00 g) was added 10% palladium carbon (0.1 g), and the mixture was stirred at room temperature for 1 hour under a hydrogen atmosphere. After filtration through Celite, the mixture was concentrated under reduced pressure, and the precipitated solid was washed with hot ethyl acetate and recrystallized from acetonitrile to give 3-amino-N- (5-t-butyl-3,4-dimethyl-2,3- 387 mg of dihydrothiazole-2-ylidene) benzenesulfonamide (Compound 134) was obtained. 1 H-NMR (DMSO-d 6 ) δ: 7.11 (1H, t), 7.03 (1H, t),
6.90 (1H, d), 6.68 (1H, dd), 5.48 (2H, bs), 3.38 (3
H, s), 2.26 (3H, s), 1.31 (9H, s); FAB-MS: 340 [(M +
H) + ] In the same manner as in Example 2, the compounds shown in Tables 11 and 12 below were produced. Example 3 (Compound 16) A mixture of compound 6 (0.60 g), ethanol and 1 M aqueous sodium hydroxide solution (1.56 ml) was stirred at 70 ° C for 1 hour. After cooling to room temperature, ethyl acetate was added, the precipitated solid was collected by filtration, and sodium 3,4-dimethyl-2-[(3-nitrobenzenesulfonyl) imino] -2,3-dihydrothiazole-5-carboxylate ( Compound 16) 380 mg was obtained. 1 H-NMR (DMSO-d 6 ) δ: 8.49 (1H, t), 8.41 (1H, dd),
8.25 (1H, d), 7.84 (1H, t), 3.39 (3H, s); FAB-MS: 3
56 [(MH) − ] In the same manner as in Example 3, the compounds shown in Table 13 below were produced.
【0032】実施例4(化合物232)
化合物230 (300 mg)のDMSO溶液に1 M 水酸化ナトリウム
水溶液(2.0 ml)を加え、氷冷下30%過酸化水素水(2.0 m
l)を加えた。100℃で5時間攪拌し、放冷後、氷水に注い
だ。酢酸エチルで抽出し、有機層を水及び飽和食塩水で
洗浄後、無水硫酸ナトリウムで乾燥し、減圧下濃縮し
た。析出した固体を酢酸エチルで洗浄して、3-{[(5-t-
ブチル-3,4-ジメチル-2,3-ジヒドロチアゾール-2-イリ
デン)アミノ]スルホニル}-4-ヒドロキシベンズアミド
(化合物232)136 mgを得た。FAB-MS: 384 [(M+H)+]
実施例4と同様にして、後記表14に示す化合物を製造
した。
実施例5(化合物17)
化合物16 (100 mg)のDMF溶液に、WSC塩酸塩(56 mg)、HO
Bt(39 mg)及びピペリジン(28.8μl)を加え、室温下24時
間攪拌した。反応液に水及び飽和炭酸水素ナトリウム水
溶液を加え、析出した固体を濾取し、イソプロパノール
/エタノール混合溶媒で洗浄して、N-[3,4-ジメチル-5-
(ピペリジン-1-カルボニル)-2,3-ジヒドロチアゾール-2
-イリデン]-3-ニトロベンゼンスルホンアミド(化合物1
7)70 mgを得た。1
H-NMR (DMSO-d6) δ: 8.50 (1H, br s), 8.45 (1H, br
d), 8.28 (1H, br d),7.87 (1H, t), 3.49-3.40 (4H,
m), 3.43 (3H, s), 2.20 (3H, s), 1.65-1.45 (6H,
m);FAB-MS: 425 [(M+H)+]
実施例5と同様にして、後記表15に示す化合物を製造
した。Example 4 (Compound 232) To a DMSO solution of compound 230 (300 mg) was added a 1 M aqueous sodium hydroxide solution (2.0 ml), and the mixture was cooled with ice to give a 30% hydrogen peroxide solution (2.0 m).
l) was added. The mixture was stirred at 100 ° C for 5 hours, allowed to cool, and then poured into ice water. The mixture was extracted with ethyl acetate, the organic layer was washed with water and saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The precipitated solid was washed with ethyl acetate to give 3-{[(5-t-
Butyl-3,4-dimethyl-2,3-dihydrothiazole-2-ylidene) amino] sulfonyl} -4-hydroxybenzamide
(Compound 232) 136 mg was obtained. FAB-MS: 384 [(M + H) + ] In the same manner as in Example 4, the compounds shown in Table 14 below were produced. Example 5 (Compound 17) Compound 16 (100 mg) in DMF was added with WSC hydrochloride (56 mg) and HO.
Bt (39 mg) and piperidine (28.8 μl) were added, and the mixture was stirred at room temperature for 24 hours. Water and saturated aqueous sodium hydrogen carbonate solution were added to the reaction solution, and the precipitated solid was collected by filtration and washed with a mixed solvent of isopropanol / ethanol to give N- [3,4-dimethyl-5-
(Piperidine-1-carbonyl) -2,3-dihydrothiazole-2
-Ylidene] -3-nitrobenzenesulfonamide (Compound 1
7) 70 mg was obtained. 1 H-NMR (DMSO-d 6 ) δ: 8.50 (1H, br s), 8.45 (1H, br
d), 8.28 (1H, br d), 7.87 (1H, t), 3.49-3.40 (4H,
m), 3.43 (3H, s), 2.20 (3H, s), 1.65-1.45 (6H,
m); FAB-MS: 425 [(M + H) + ] In the same manner as in Example 5, compounds shown in Table 15 below were produced.
【0033】実施例6(化合物34)
化合物5 (1.78 g)のメタノール溶液に、氷冷下、水素化
ホウ素ナトリウム (0.19 g)を加えた。室温で2時間攪拌
後、水素化ホウ素ナトリウム(0.38 g)を追加し、そこに
THFを加え澄明な溶液とし、2.5時間室温で攪拌した。更
に水素化ホウ素ナトリウム(0.38 g)を加え1時間室温で
攪拌し、更に水素化ホウ素ナトリウム(0.19 g)を加え、
12時間室温で攪拌した。含水アセトンを加えた後、減圧
濃縮した。酢酸エチルを加え、有機層を水及び飽和食塩
水で洗浄後、無水硫酸ナトリウムで乾燥し、減圧下濃縮
した。得られた残渣をシリカゲルカラムクロマトグラフ
ィー(クロロホルム/メタノール)で精製し、得られた
固体を熱イソプロパノールで洗浄して、N-[5-(1-ヒドロ
キシエチル)-3,4-ジメチル-2,3-ジヒドロチアゾール-2-
イリデン]-3-ニトロベンゼンスルホンアミド(化合物34)
743 mgを得た。1
H-NMR (DMSO-d6) δ: 8.49 (1H, t), 8.42 (1H, m),
8.26 (1H, m), 7.85 (1H,t), 5.66 (1H, d), 4.95 (1H,
dq), 3.42 (3H, s), 2.16 (3H, s), 1.28 (3H,d);FAB
-MS: 358 [(M+H)+]
実施例6と同様にして、後記表16に示す化合物及び表
17に示す化合物126を製造した。
実施例7(化合物98)
化合物97 (200 mg)のTHF溶液に、-10℃でクロロギ酸イ
ソブチル(0.075 ml)及びトリエチルアミン(0.10 ml)を
加え、10分間攪拌した。そこに水素化ホウ素ナトリウム
(183 mg)とエタノール混合物を一気に加えた。そのまま
室温で攪拌し、5%硫酸水素カリウム水溶液、1 M 塩酸水
溶液及び酢酸エチルを加え30分間室温で攪拌した。有機
層を硫酸マグネシウムで乾燥後、減圧下濃縮した。得ら
れた残渣をシリカゲルカラムクロマトグラフィー(メタ
ノール/クロロホルム)で精製して、N-[5-t-ブチル-3-
(2-ヒドロキシエチル)-4-メチル-2,3-ジヒドロチアゾー
ル-2-イリデン]-3-ニトロベンゼンスルホンアミド(化合
物98)40 mgを得た。1
H-NMR (DMSO-d6) δ: 8.48 (1H, t), 8.41 (1H, dd),
8.24 (1H, d), 7.84 (1H, t), 4.96(1H, bs), 3.96(2H,
t), 3.56 (2H, t), 2.32 (3H, s), 1.32 (9H, s);FAB
-MS: 400 [(M+H)+]Example 6 (Compound 34) Sodium borohydride (0.19 g) was added to a methanol solution of compound 5 (1.78 g) under ice cooling. After stirring at room temperature for 2 hours, sodium borohydride (0.38 g) was added and added there.
THF was added to make a clear solution, and the mixture was stirred at room temperature for 2.5 hours. Sodium borohydride (0.38 g) was added and the mixture was stirred at room temperature for 1 hour, and sodium borohydride (0.19 g) was added,
Stir for 12 hours at room temperature. After adding water-containing acetone, the mixture was concentrated under reduced pressure. Ethyl acetate was added, the organic layer was washed with water and saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was purified by silica gel column chromatography (chloroform / methanol), and the obtained solid was washed with hot isopropanol to give N- [5- (1-hydroxyethyl) -3,4-dimethyl-2, 3-dihydrothiazole-2-
Ylidene] -3-nitrobenzenesulfonamide (Compound 34)
743 mg was obtained. 1 H-NMR (DMSO-d 6 ) δ: 8.49 (1H, t), 8.42 (1H, m),
8.26 (1H, m), 7.85 (1H, t), 5.66 (1H, d), 4.95 (1H,
dq), 3.42 (3H, s), 2.16 (3H, s), 1.28 (3H, d); FAB
-MS: 358 [(M + H) + ] In the same manner as in Example 6, the compound shown in Table 16 and the compound 126 shown in Table 17 were produced. Example 7 (Compound 98) To a THF solution of compound 97 (200 mg), isobutyl chloroformate (0.075 ml) and triethylamine (0.10 ml) were added at -10 ° C, and the mixture was stirred for 10 minutes. Sodium borohydride there
(183 mg) and ethanol mixture were added all at once. The mixture was stirred as it was at room temperature, 5% aqueous potassium hydrogen sulfate solution, 1 M aqueous hydrochloric acid solution and ethyl acetate were added, and the mixture was stirred at room temperature for 30 minutes. The organic layer was dried over magnesium sulfate and then concentrated under reduced pressure. The obtained residue was purified by silica gel column chromatography (methanol / chloroform), and N- [5-t-butyl-3-
40 mg of (2-hydroxyethyl) -4-methyl-2,3-dihydrothiazole-2-ylidene] -3-nitrobenzenesulfonamide (Compound 98) was obtained. 1 H-NMR (DMSO-d 6 ) δ: 8.48 (1H, t), 8.41 (1H, dd),
8.24 (1H, d), 7.84 (1H, t), 4.96 (1H, bs), 3.96 (2H,
t), 3.56 (2H, t), 2.32 (3H, s), 1.32 (9H, s); FAB
-MS: 400 [(M + H) + ]
【0034】実施例8(化合物263)
化合物256 (500 mg)のジクロロメタン溶液に、-78℃で1
M ジイソブチルアルミニウムハイドライド-ジクロロメ
タン溶液(DIBAL:1.8 ml)を滴下し、1時間攪拌した。更
に1 M DIBAL(1.2 ml)を滴下し、1時間攪拌した。反応液
に飽和塩化アンモニウム水溶液を加え、室温で攪拌し
た。クロロホルムで抽出し、有機層を1M 塩酸水溶液及
び飽和食塩水で洗浄し、無水硫酸ナトリウムで乾燥後、
減圧下濃縮した。得られた残渣をシリカゲルカラムクロ
マトグラフィー(クロロホルム/メタノール)で精製
後、イソプロパノールで結晶化して、N-(5-t-ブチル-3,
4-ジメチルチアゾール-2(3H)-イリデン)-5-クロロ-2-ホ
ルミルベンゼンスルホンアミド(化合物263)28 mgを得
た。1
H-NMR (DMSO-d6) δ: 10.78 (1H, S), 7.94 (1H, d),
7.92 (1H, d), 7.84 (1H, dd), 3.41 (3H, s), 2.74
(3H, s), 1.31 (9H, s);FAB-MS: 387 [(M+H)+]実施例
8と同様にして、後記表17に示す化合物S-11を製造し
た。
実施例9(化合物35)
化合物34(351 mg)を用い実施例1−2と同様にして、
N-[3,4-ジメチル-5-(1-メトキシエチル)-2,3-ジヒドロ
チアゾール-2-イリデン]-3-ニトロベンゼンスルホンア
ミド(化合物35)124 mgを得た。1
H-NMR (DMSO-d6) δ: 8.50 (1H, t), 8.42 (1H, dd),
8.27 (1H, d), 7.86(1H,t), 4.65 (1H, t), 3.43 (3H,
S), 3.15 (3H, S) 2.22 (3H, s), 1.31(6H, d);FAB-M
S: 372 [(M+H)+]
実施例9と同様にして、後記表18〜21に示す化合物
及び表22に示す化合物9及び10を製造した。Example 8 (Compound 263) To a solution of Compound 256 (500 mg) in dichloromethane was added 1-78 ° C.
M diisobutylaluminum hydride-dichloromethane solution (DIBAL: 1.8 ml) was added dropwise, and the mixture was stirred for 1 hour. Further, 1 M DIBAL (1.2 ml) was added dropwise, and the mixture was stirred for 1 hour. A saturated ammonium chloride aqueous solution was added to the reaction solution, and the mixture was stirred at room temperature. Extracted with chloroform, the organic layer was washed with 1M aqueous hydrochloric acid solution and saturated brine, dried over anhydrous sodium sulfate,
It was concentrated under reduced pressure. The obtained residue was purified by silica gel column chromatography (chloroform / methanol), and crystallized from isopropanol to give N- (5-t-butyl-3,
28 mg of 4-dimethylthiazole-2 (3H) -ylidene) -5-chloro-2-formylbenzenesulfonamide (Compound 263) was obtained. 1 H-NMR (DMSO-d 6 ) δ: 10.78 (1H, S), 7.94 (1H, d),
7.92 (1H, d), 7.84 (1H, dd), 3.41 (3H, s), 2.74
(3H, s), 1.31 (9H, s); FAB-MS: 387 [(M + H) + ] Compound S-11 shown in Table 17 below was produced in the same manner as in Example 8. Example 9 (Compound 35) Using Compound 34 (351 mg) in the same manner as in Example 1-2,
124 mg of N- [3,4-dimethyl-5- (1-methoxyethyl) -2,3-dihydrothiazole-2-ylidene] -3-nitrobenzenesulfonamide (Compound 35) was obtained. 1 H-NMR (DMSO-d 6 ) δ: 8.50 (1H, t), 8.42 (1H, dd),
8.27 (1H, d), 7.86 (1H, t), 4.65 (1H, t), 3.43 (3H,
S), 3.15 (3H, S) 2.22 (3H, s), 1.31 (6H, d); FAB-M
S: 372 [(M + H) + ] In the same manner as in Example 9, the compounds shown in Tables 18 to 21 below and the compounds 9 and 10 shown in Table 22 were produced.
【0035】実施例10(化合物53)
化合物S-3 (1.04 g)より製造した化合物S-4の3分の1
量を用い、室温下、THF、ピペリジン(0.18 ml)、酢酸
(0.52 ml)、水素化トリアセトキシホウ素ナトリウム (5
75 mg)を加え、2日間攪拌した。反応混合物に水及び飽
和炭酸水素ナトリウム水溶液を加え、酢酸エチルで抽出
した。有機層を無水硫酸マグネシウムで乾燥後、減圧下
濃縮した。得られた残渣をシリカゲルカラムクロマトグ
ラフィー(クロロホルム/メタノール/アンモニア水)
で精製後、4 M 塩化水素-酢酸エチル溶液を加えて減圧
濃縮し、残渣をアセトニトリルより固化させて、N-[3,4
-ジメチル-5-(1-メチル-2-ピペリジン-1-イルエチル)-
2,3-ジヒドロチアゾール-2-イリデン]-3-ニトロベンゼ
ンスルホンアミド塩酸塩(化合物53)34 mgを得た。1
H-NMR (DMSO-d6) δ: 9.48 ( 1H, bs), 8.51 (1H, t),
8.43 (1H, dd), 8.27 (1H, d), 3.75 (1H, q), 3.16-
3.44 (3H, m), 3.43 (3H, S), 2.79-2.96 (2H, m)2.23
(3H, s), 1.61-1.82 (5H, m), 1.32-1.43 (1H, m), 1.2
3(3H, d);FAB-MS: 439 [(M+H)+]
実施例10と同様にして、後記表22に示す化合物54及
び表23に示す化合物S-61を製造した。
実施例11(化合物147)
化合物129 (234 mg)、ピリジン(5 ml)及び無水酢酸(0.5
3 ml)の混合物を、室温下1時間攪拌した。反応混合物に
水を加え、減圧下濃縮した。酢酸エチルを加え、飽和炭
酸水素ナトリウム水溶液、1 M塩酸水溶液及び飽和食塩
水で順次洗浄し、無水硫酸ナトリウムで乾燥後、減圧下
濃縮し、得られた残渣を酢酸エチルより固化させて、2-
(2-{[(5-t-ブチル-3,4-ジメチル-2,3-ジヒドロチアゾー
ル-2-イリデン)アミノ]スルホニル}-4-クロロフェノキ
シ)エチル アセタート(化合物147)170 mgを得た。1
H-NMR (DMSO-d6) δ: 7.77 ( 1H, d), 7.59 (1H, d
d), 7.23 (1H, d), 4.23(2H, t), 4.11 (2H, t), 3.38
(3H, S), 2.29 (3H, s), 1.97 (3H, s), 1.33 (9H,
s);FAB-MS: 461 [(M+H)+]
実施例11と同様にして、後記表24〜28に示す化合
物を製造した。Example 10 (Compound 53) One third of Compound S-4 prepared from Compound S-3 (1.04 g)
Volume, room temperature, THF, piperidine (0.18 ml), acetic acid
(0.52 ml), sodium triacetoxyborohydride (5
75 mg) was added and the mixture was stirred for 2 days. Water and saturated aqueous sodium hydrogen carbonate solution were added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was dried over anhydrous magnesium sulfate and then concentrated under reduced pressure. The obtained residue is subjected to silica gel column chromatography (chloroform / methanol / ammonia water).
After purification with, add 4 M hydrogen chloride-ethyl acetate solution and concentrate under reduced pressure.The residue is solidified with acetonitrile and N- [3,4
-Dimethyl-5- (1-methyl-2-piperidin-1-ylethyl)-
34 mg of 2,3-dihydrothiazole-2-ylidene] -3-nitrobenzenesulfonamide hydrochloride (Compound 53) was obtained. 1 H-NMR (DMSO-d 6 ) δ: 9.48 (1H, bs), 8.51 (1H, t),
8.43 (1H, dd), 8.27 (1H, d), 3.75 (1H, q), 3.16-
3.44 (3H, m), 3.43 (3H, S), 2.79-2.96 (2H, m) 2.23
(3H, s), 1.61-1.82 (5H, m), 1.32-1.43 (1H, m), 1.2
3 (3H, d); FAB-MS: 439 [(M + H) + ] In the same manner as in Example 10, Compound 54 shown in Table 22 and Compound S-61 shown in Table 23 were produced. Example 11 (Compound 147) Compound 129 (234 mg), pyridine (5 ml) and acetic anhydride (0.5
The mixture (3 ml) was stirred at room temperature for 1 hour. Water was added to the reaction mixture, and the mixture was concentrated under reduced pressure. Ethyl acetate was added, washed successively with saturated aqueous sodium hydrogen carbonate solution, 1 M aqueous hydrochloric acid solution and saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure.The obtained residue was solidified with ethyl acetate,
(2-{[(5-t-butyl-3,4-dimethyl-2,3-dihydrothiazol-2-ylidene) amino] sulfonyl} -4-chlorophenoxy) ethyl acetate (Compound 147) 170 mg was obtained. . 1 H-NMR (DMSO-d 6 ) δ: 7.77 (1H, d), 7.59 (1H, d
d), 7.23 (1H, d), 4.23 (2H, t), 4.11 (2H, t), 3.38
(3H, S), 2.29 (3H, s), 1.97 (3H, s), 1.33 (9H,
s); FAB-MS: 461 [(M + H) + ] In the same manner as in Example 11, the compounds shown in Tables 24 to 28 below were produced.
【0036】実施例12(化合物172)
化合物170 (200 mg)のジクロロメタン溶液に、-78℃で
三臭化ホウ素(1.0 ml)を加え、徐々に室温まで昇温さ
せ、室温下4時間攪拌した。飽和炭酸水素ナトリウム水
溶液を加えた後、酢酸エチルで抽出し、有機層を無水硫
酸マグネシウムで乾燥後、減圧下濃縮した。得られた残
渣をシリカゲルカラムクロマトグラフィー(メタノール
/クロロホルム)で精製後、エーテル-ヘキサンで固化
させ、N-(5-t-ブチル-3,4-ジメチル-2,3-ジヒドロチア
ゾール-2-イリデン)-2-ヒドロキシベンゼンスルホンア
ミド(化合物172)167 mgを得た。1
H-NMR (DMSO-d6) δ: 10.12 (1H, s), 7.70 (1H, dd),
7.36 (1H, dt), 6.85-6.92 (2H, m), 3.38 (3H, s),
3.15 (3H, s), 2.27 (3H, s), 1.32 (9H, s);FAB-MS:
341 [(M+H)+]
実施例12と同様にして、後記表29〜31に示す化合
物を製造した。
実施例13(化合物256)
化合物132 (1.0 g)のジクロロメタン溶液に、トリフル
オロメタンスルホン酸無水物(0.67 ml)を加え、氷冷
下、2,6-ルチジン(0.62 ml)を滴下した。徐々に室温ま
で昇温後、室温下3時間攪拌した。反応混合物に水及び5
%硫酸水素カリウム水溶液を加え、酢酸エチルで抽出し
た。有機層を無水硫酸マグネシウムで乾燥後、減圧下濃
縮して、トリフルオロメタンスルホン酸エステル体(1.4
4 g)を得た。得られた化合物(1.1 g)、DMF(10 ml)、メ
タノール(10 ml)、酢酸パラジウム(49mg)、1,3-ビス(ジ
フェニルホスフィノ)プロパン(89 mg)及びトリエチルア
ミン(0.61 ml)の混合物に、室温下、一酸化炭素を10分
間バブリング後、一酸化炭素雰囲気下70℃で2時間攪拌
した。室温まで放冷後、水を加え、酢酸エチルで抽出し
た。有機層を無水硫酸マグネシウムで乾燥後、減圧下濃
縮し、得られた残渣をシリカゲルカラムクロマトグラフ
ィー(酢酸エチル/トルエン)で精製して、2-{[(5-t-
ブチル-3,4-ジメチルチアゾール-2(3H)-イリデン)アミ
ノ]スルホニル}-4-クロロ安息香酸メチル(化合物256)66
0 mgを得た。1
H-NMR (DMSO-d6) δ: 7.91 (1H, d), 7.75 (1H, dd),
7.61 (1H, d), 3.78 (3H, s), 3.43 (3H, s), 2.30 (3
H, s), 1.32(9H, s);FAB-MS: 417 [(M+H)+]
実施例13と同様にして、後記表32に示す化合物413
を製造した。Example 12 (Compound 172) Boron tribromide (1.0 ml) was added to a dichloromethane solution of the compound 170 (200 mg) at -78 ° C, the temperature was gradually raised to room temperature, and the mixture was stirred at room temperature for 4 hours. . After adding a saturated aqueous sodium hydrogen carbonate solution, the mixture was extracted with ethyl acetate, the organic layer was dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue is purified by silica gel column chromatography (methanol / chloroform) and then solidified with ether-hexane to give N- (5-t-butyl-3,4-dimethyl-2,3-dihydrothiazole-2-ylidene. ) -2-Hydroxybenzenesulfonamide (Compound 172) was obtained (167 mg). 1 H-NMR (DMSO-d 6 ) δ: 10.12 (1H, s), 7.70 (1H, dd),
7.36 (1H, dt), 6.85-6.92 (2H, m), 3.38 (3H, s),
3.15 (3H, s), 2.27 (3H, s), 1.32 (9H, s); FAB-MS:
341 [(M + H) + ] In the same manner as in Example 12, the compounds shown in Tables 29 to 31 below were produced. Example 13 (Compound 256) To a solution of the compound 132 (1.0 g) in dichloromethane was added trifluoromethanesulfonic anhydride (0.67 ml), and 2,6-lutidine (0.62 ml) was added dropwise under ice cooling. After gradually warming to room temperature, the mixture was stirred at room temperature for 3 hours. Water and 5 in the reaction mixture
% Potassium hydrogen sulfate aqueous solution was added, and the mixture was extracted with ethyl acetate. The organic layer was dried over anhydrous magnesium sulfate and then concentrated under reduced pressure to give a trifluoromethanesulfonic acid ester compound (1.4
4 g) was obtained. A mixture of the obtained compound (1.1 g), DMF (10 ml), methanol (10 ml), palladium acetate (49 mg), 1,3-bis (diphenylphosphino) propane (89 mg) and triethylamine (0.61 ml). After bubbling carbon monoxide for 10 minutes at room temperature, the mixture was stirred at 70 ° C. for 2 hours in a carbon monoxide atmosphere. After allowing to cool to room temperature, water was added and the mixture was extracted with ethyl acetate. The organic layer was dried over anhydrous magnesium sulfate, concentrated under reduced pressure, and the obtained residue was purified by silica gel column chromatography (ethyl acetate / toluene) to give 2-{[(5-t-
Butyl-3,4-dimethylthiazole-2 (3H) -ylidene) amino] sulfonyl} -4-methyl chlorobenzoate (Compound 256) 66
0 mg was obtained. 1 H-NMR (DMSO-d 6 ) δ: 7.91 (1H, d), 7.75 (1H, dd),
7.61 (1H, d), 3.78 (3H, s), 3.43 (3H, s), 2.30 (3
H, s), 1.32 (9H, s); FAB-MS: 417 [(M + H) + ] Compound 413 shown in Table 32 below in the same manner as in Example 13.
Was manufactured.
【0037】実施例14(化合物435)
実施例13と同様にして調整した、対応するトリフルオ
ロメタンスルホン酸エステル体(130 mg)のDMA溶液に、
アルゴン雰囲気下、トリス(ジベンジリデンアセトン)ジ
パラジウム(0) (4.1 mg)、1,1'-ビス(ジフェニルホスフ
ィノ)フェロセン(27.3 mg)、亜鉛(2.0 mg)及びシアン化
亜鉛(17.3 mg)を加え、110℃で1.5時間攪拌した。室温
まで放冷後、反応液を2 M アンモニア水溶液にあけ、酢
酸エチルで抽出した。有機層を水及び飽和食塩水で順次
洗浄し、無水硫酸マグネシウムで乾燥後、減圧下濃縮
し、残渣をシリカゲルカラムクロマトグラフィー(酢酸
エチル/トルエン)で精製して得られた固体をエーテル
で洗浄して、N-(5-sec-ブチル-4-クロロ-3-メチルチア
ゾール-2(3H)-イリデン)-5-クロロ-2-シアノベンゼンス
ルホンアミド(化合物435)50 mgを得た。1
H-NMR (DMSO-d6) δ: 8.12 ( 1H, d), 8.05 ( 1H, d),
7.92 ( 1H, dd), 3.53( 3H, s), 2.96 ( 1H, tq), 1.6
6-1.56( 1H, m), 1.52-1.42 ( 1H, m), 1.18 (3H, d),
0.83 ( 3H, t);FAB-MS: 404 [(M+H)+]
実施例14と同様にして、後記表32に示す、化合物43
6〜438、440及び442〜445を製造した。
実施例15(化合物322)
化合物132 (600 mg)、THF、2-ヒドロキシメチルピリジ
ン(0.23 ml)及びトリフェニルホスフィン(629 mg)の混
合物に、氷冷下、ジエチルアゾジカルボキシレート(0.3
8 ml)を加え、室温下4.5時間攪拌した。反応混合物を減
圧濃縮後、得られた残渣をシリカゲルカラムクロマトグ
ラフィー(メタノール/クロロホルム)で精製後、アセ
トニトリルより結晶化させて、N-(5-t-ブチル-3,4-ジメ
チルチアゾール-2(3H)-イリデン)-5-クロロ-2-(ピリジ
ン-2-イルメトキシ)ベンゼンスルホンアミド(化合物32
2)280 mgを得た。1
H-NMR (DMSO-d6) δ: 8.53 (1H, d), 7.82 (1H, dt),
7.79 (1H, d), 7.59( 1H, dd), 7.54(1H, d), 7.30-7.3
5(1H, m), 7.29(1H, d), 5.26(2H, s), 3.32(3H,s), 2.
21 (3H, s), 1.26(9H, s);FAB-MS: 466 [(M+H)+]
実施例15と同様にして、後記表33及び34に示す化
合物を製造した。Example 14 (Compound 435) A DMA solution of the corresponding trifluoromethanesulfonate ester compound (130 mg) prepared in the same manner as in Example 13 was added,
Under argon atmosphere, tris (dibenzylideneacetone) dipalladium (0) (4.1 mg), 1,1'-bis (diphenylphosphino) ferrocene (27.3 mg), zinc (2.0 mg) and zinc cyanide (17.3 mg) Was added and the mixture was stirred at 110 ° C. for 1.5 hours. After allowing to cool to room temperature, the reaction solution was poured into a 2 M aqueous ammonia solution and extracted with ethyl acetate. The organic layer was washed successively with water and saturated brine, dried over anhydrous magnesium sulfate, concentrated under reduced pressure, the residue was purified by silica gel column chromatography (ethyl acetate / toluene), and the obtained solid was washed with ether. Thus, 50 mg of N- (5-sec-butyl-4-chloro-3-methylthiazole-2 (3H) -ylidene) -5-chloro-2-cyanobenzenesulfonamide (Compound 435) was obtained. 1 H-NMR (DMSO-d 6 ) δ: 8.12 (1H, d), 8.05 (1H, d),
7.92 (1H, dd), 3.53 (3H, s), 2.96 (1H, tq), 1.6
6-1.56 (1H, m), 1.52-1.42 (1H, m), 1.18 (3H, d),
0.83 (3H, t); FAB-MS: 404 [(M + H) + ] Compound 43 shown in Table 32 below in the same manner as in Example 14.
6-438, 440 and 442-445 were produced. Example 15 (Compound 322) A mixture of compound 132 (600 mg), THF, 2-hydroxymethylpyridine (0.23 ml) and triphenylphosphine (629 mg) was added to a mixture of diethylazodicarboxylate (0.3
8 ml) was added, and the mixture was stirred at room temperature for 4.5 hours. The reaction mixture was concentrated under reduced pressure, and the obtained residue was purified by silica gel column chromatography (methanol / chloroform) and crystallized from acetonitrile to give N- (5-t-butyl-3,4-dimethylthiazole-2 ( 3H) -Ylidene) -5-chloro-2- (pyridin-2-ylmethoxy) benzenesulfonamide (compound 32
2) Obtained 280 mg. 1 H-NMR (DMSO-d 6 ) δ: 8.53 (1H, d), 7.82 (1H, dt),
7.79 (1H, d), 7.59 (1H, dd), 7.54 (1H, d), 7.30-7.3
5 (1H, m), 7.29 (1H, d), 5.26 (2H, s), 3.32 (3H, s), 2.
21 (3H, s), 1.26 (9H, s); FAB-MS: 466 [(M + H) + ] In the same manner as in Example 15, the compounds shown in Tables 33 and 34 below were produced.
【0038】実施例16(化合物43)
化合物5 (1.0 g)のDMF溶液に、炭酸カリウム(1.16 g)及
びトリメチルホスフォノアセテート(666 mg)を加え、80
℃で12時間攪拌した。室温まで放冷後、減圧下濃縮し、
水を加え、酢酸エチルで抽出した。有機層を5%硫酸水素
カリウム水溶液、飽和炭酸水素ナトリウム水溶液及び水
で順次洗浄し、無水硫酸マグネシウムで乾燥後、有機層
を減圧下濃縮した。得られた残渣をシリカゲルカラムク
ロマトグラフィー(酢酸エチル/トルエン)で精製し
て、メチル 3-{3,4-ジメチル-2-[(3-ニトロベンゼンス
ルホニル)イミノ]-2,3-ジヒドロチアゾール-5-イル}-2-
ブテノエート(化合物43)101 mgを得た。1
H-NMR (DMSO-d6) δ: 8.50 (1H, t), 8.44 (1H, d),
8.29 (1H, d), 7.59( 1H,d), 7.86(1H, t), 5.92(1H,
d), 3.67(3H, s), 3.48(3H, s), 2.40(3H, d), 2.31 (3
H, s);FAB-MS: 412 [(M+H)+]
実施例16と同様にして、後記表36に示す化合物S-3
を製造した。
実施例17(化合物55)
化合物S-5 (200 mg)を用い、実施例11と同様にして製
造した中間体のメタンスルホン酸エステル体にアセトニ
トリル及び1,8-ジアザビシクロ[5.4.0]ウンデク-7-エン
(0.16 ml)を加え2時間攪拌した。1,8-ジアザビシクロ
[5.4.0]ウンデク-7-エン(3.0 ml)を更に加え12時間攪拌
した。反応混合物を室温まで放冷後、5%硫酸水素カリウ
ム水溶液を加え、酢酸エチルで抽出し、硫酸マグネシウ
ムで乾燥後、減圧下濃縮した。得られた残渣をシリカゲ
ルカラムクロマトグラフィー(酢酸エチル/トルエン)
で精製して得られた固体をジエチルエーテルで洗浄し
て、N-(3,4-ジメチル-5-イソプロペニル-2,3-ジヒドロ
チアゾール-2-イリデン)-3-ニトロベンゼンスルホンア
ミド(化合物55)32 mgを得た。1
H-NMR (DMSO-d6) δ: 8.49 (1H, t), 8.43(1H, dd),
8.28 (1H, d), 7.85 (1H,t), 5.30 (1H, s), 5.12 (1H,
s), 3.46 (3H, s), 2.27 (3H, s), 2.02(3H, s);FAB-
MS: 354 [(M+H)+]
実施例17と同様にして、後記表35に示す化合物38及
び表36に示す化合物477を製造した。Example 16 (Compound 43) To a DMF solution of compound 5 (1.0 g), potassium carbonate (1.16 g) and trimethylphosphonoacetate (666 mg) were added,
The mixture was stirred at ° C for 12 hours. After allowing to cool to room temperature, concentrate under reduced pressure,
Water was added and the mixture was extracted with ethyl acetate. The organic layer was washed successively with 5% aqueous potassium hydrogen sulfate solution, saturated aqueous sodium hydrogen carbonate solution and water, dried over anhydrous magnesium sulfate, and then the organic layer was concentrated under reduced pressure. The obtained residue was purified by silica gel column chromatography (ethyl acetate / toluene) to give methyl 3- {3,4-dimethyl-2-[(3-nitrobenzenesulfonyl) imino] -2,3-dihydrothiazole-5. -Il} -2-
101 mg of butenoate (Compound 43) was obtained. 1 H-NMR (DMSO-d 6 ) δ: 8.50 (1H, t), 8.44 (1H, d),
8.29 (1H, d), 7.59 (1H, d), 7.86 (1H, t), 5.92 (1H,
d), 3.67 (3H, s), 3.48 (3H, s), 2.40 (3H, d), 2.31 (3
H, s); FAB-MS: 412 [(M + H) + ] In the same manner as in Example 16, Compound S-3 shown in Table 36 below.
Was manufactured. Example 17 (Compound 55) Using the compound S-5 (200 mg), an intermediate methanesulfonate ester compound produced in the same manner as in Example 11 was treated with acetonitrile and 1,8-diazabicyclo [5.4.0] undec-. 7-en
(0.16 ml) was added and the mixture was stirred for 2 hours. 1,8-diazabicyclo
[5.4.0] Undec-7-ene (3.0 ml) was further added, and the mixture was stirred for 12 hours. The reaction mixture was allowed to cool to room temperature, 5% aqueous potassium hydrogen sulfate solution was added, the mixture was extracted with ethyl acetate, dried over magnesium sulfate, and concentrated under reduced pressure. The obtained residue is subjected to silica gel column chromatography (ethyl acetate / toluene).
The solid obtained by purification with N was washed with diethyl ether to give N- (3,4-dimethyl-5-isopropenyl-2,3-dihydrothiazol-2-ylidene) -3-nitrobenzenesulfonamide (Compound 55 ) 32 mg was obtained. 1 H-NMR (DMSO-d 6 ) δ: 8.49 (1H, t), 8.43 (1H, dd),
8.28 (1H, d), 7.85 (1H, t), 5.30 (1H, s), 5.12 (1H,
s), 3.46 (3H, s), 2.27 (3H, s), 2.02 (3H, s); FAB-
MS: 354 [(M + H) + ] In the same manner as in Example 17, Compound 38 shown in Table 35 below and Compound 477 shown in Table 36 were produced.
【0039】実施例18(化合物59)
化合物58 (172 mg)に40%メチルアミン-メタノール溶液
(20 ml)を加え、室温下4時間攪拌した。減圧下濃縮し、
クロロホルムを加え、水で洗浄した。無水硫酸マグネシ
ウムで乾燥後、減圧下濃縮し、得られた残渣をシリカゲ
ルカラムクロマトグラフィー(アンモニア水/メタノー
ル/クロロホルム)で精製後、メタノール中、4 M 塩化
水素-ジオキサン溶液を加え、減圧下濃縮した。得られ
た固体をエタノールで洗浄して、N-(4-アミノメチル-5-
t-ブチル-3-メチル-2,3-ジヒドロチアゾール-2-イリデ
ン)-3-ニトロベンゼンスルホンアミド 一塩酸塩(化合物
59)42 mgを得た。1
H-NMR (DMSO-d6) δ: 8.50 (3H, m), 8.44(1H, dd),
8.29 (1H, d), 7.87 (1H,t), 4.17(2H, s), 3.50(3H,
s), 1.38(9H, s);FAB-MS: 385 [(M+H)+]
実施例18と同様にして、後記表35に示す化合物269
を製造した。
実施例19(化合物191)
化合物S-14に、塩化チオニル(1 ml)及びDMF(3滴)を加
え、70℃で1時間攪拌した。塩化チオニルを減圧留去
し、クロロホルムを加え、クロロホルム/飽和アンモニ
ア水(1:1, 20 ml)混合液中に0℃で滴下した。溶媒を
減圧下留去後、酢酸エチルで抽出し、水及び飽和食塩水
で洗浄した。無水硫酸ナトリウムで乾燥後、減圧下濃縮
し、得られた固体を酢酸エチル−ヘキサンより洗浄し
て、5-イソプロピル-3-メチル-2-(3-ニトロベンゼンス
ルホニルイミノ)-2,3-ジヒドロチアゾール-4-カルボキ
サミド(化合物191)547 mgを得た。1
H-NMR (DMSO-d6) δ: 8.50 (1H, m), 8.44 (1H, d),
8.28 (1H, d), 8.19 (1H,s), 8.15 (1H, s), 7.87 (1H,
t), 3.41 (3H, s), 3.31 (1H, m), 1.20 (6H, d);FAB
-MS: 385 [(M+H)+]
実施例19と同様にして、後記表37に示す化合物S-12
を製造した。Example 18 (Compound 59) Compound 58 (172 mg) in 40% methylamine-methanol solution
(20 ml) was added, and the mixture was stirred at room temperature for 4 hours. Concentrated under reduced pressure,
Chloroform was added and washed with water. After drying over anhydrous magnesium sulfate, concentration under reduced pressure, the obtained residue was purified by silica gel column chromatography (ammonia water / methanol / chloroform), 4 M hydrogen chloride-dioxane solution in methanol was added, and the mixture was concentrated under reduced pressure. . The obtained solid was washed with ethanol, and N- (4-aminomethyl-5-
t-Butyl-3-methyl-2,3-dihydrothiazole-2-ylidene) -3-nitrobenzenesulfonamide monohydrochloride (compound
59) 42 mg was obtained. 1 H-NMR (DMSO-d 6 ) δ: 8.50 (3H, m), 8.44 (1H, dd),
8.29 (1H, d), 7.87 (1H, t), 4.17 (2H, s), 3.50 (3H,
s), 1.38 (9H, s); FAB-MS: 385 [(M + H) + ] In the same manner as in Example 18, Compound 269 shown in Table 35 below.
Was manufactured. Example 19 (Compound 191) Thionyl chloride (1 ml) and DMF (3 drops) were added to compound S-14, and the mixture was stirred at 70 ° C for 1 hr. Thionyl chloride was distilled off under reduced pressure, chloroform was added, and the mixture was added dropwise to a mixture of chloroform / saturated aqueous ammonia (1: 1, 20 ml) at 0 ° C. The solvent was evaporated under reduced pressure, extracted with ethyl acetate, and washed with water and saturated brine. After drying over anhydrous sodium sulfate, concentration under reduced pressure, the resulting solid was washed with ethyl acetate-hexane to give 5-isopropyl-3-methyl-2- (3-nitrobenzenesulfonylimino) -2,3-dihydrothiazole. 547 mg of 4-carboxamide (Compound 191) was obtained. 1 H-NMR (DMSO-d 6 ) δ: 8.50 (1H, m), 8.44 (1H, d),
8.28 (1H, d), 8.19 (1H, s), 8.15 (1H, s), 7.87 (1H,
t), 3.41 (3H, s), 3.31 (1H, m), 1.20 (6H, d); FAB
-MS: 385 [(M + H) + ] Compound S-12 shown in Table 37 below was prepared in the same manner as in Example 19.
Was manufactured.
【0040】実施例20(化合物187)
化合物S-13 (0.217 g)のトリフルオロ酢酸(2 ml)溶液
に、氷冷下、トリフルオロメタンスルホン酸(0.1 ml)を
加え、4時間攪拌した。クロロホルムを加え、有機層を
飽和炭酸水素ナトリウム水溶液で洗浄し、無水硫酸マグ
ネシウムで乾燥後、減圧下濃縮した。得られた残渣をシ
リカゲルカラムクロマトグラフィー(メタノール/クロ
ロホルム)で精製後、メタノールで結晶化させて、N-(5
-t-ブチル-3,4-ジメチル-2,3-ジヒドロチアゾール-2-イ
リデン)-5-クロロ-2-スルファニルベンゼンスルホンア
ミド (化合物187)50 mgを得た。1
H-NMR (DMSO-d6) δ: 7.97 (1H, s), 7.45 (2H, d),
6.22 (1H, bs), 3.43 (3H, s), 2.29 (3H, s), 1.32 (9
H, s);FAB-MS: 390 [(M+H)+]
実施例21(化合物192)
化合物191 (268 mg)の1,2-ジクロロエタン溶液に氷冷
下、オキシ塩化リン(0.33 ml)及びDMF(2 ml)を順次滴下
し、70℃で1時間攪拌した。反応液を氷水へ注加し、酢
酸エチルで抽出し、水及び飽和食塩水で洗浄した。無水
硫酸ナトリウムで乾燥後、減圧下濃縮し、得られた固体
を酢酸エチル−ヘキサンで洗浄して、N-(4-シアノ-5-イ
ソプロピル-3-メチル-3H-チアゾール-2-イリデン)-3-ニ
トロベンゼンスルホンアミド(化合物192)180 mgを得
た。1
H-NMR (CDCl3) δ: 8.76 (1H, t), 8.40 (1H, ddd),
8.27 (1H, d), 7.70 (1H,t), 3.59 (3H, s), 3.38 (1H,
heptet), 1.37 (6H, d);FAB-MS: 367 [(M+H)+]
実施例21と同様にして、後記表35に示す化合物28
5、408及び416、並びに表36に示す化合物422及び424
を製造した。Example 20 (Compound 187) To a solution of compound S-13 (0.217 g) in trifluoroacetic acid (2 ml) was added trifluoromethanesulfonic acid (0.1 ml) under ice cooling, and the mixture was stirred for 4 hours. Chloroform was added, the organic layer was washed with saturated aqueous sodium hydrogen carbonate solution, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue is purified by silica gel column chromatography (methanol / chloroform) and crystallized from methanol to give N- (5
50 mg of -t-butyl-3,4-dimethyl-2,3-dihydrothiazol-2-ylidene) -5-chloro-2-sulfanylbenzenesulfonamide (Compound 187) was obtained. 1 H-NMR (DMSO-d 6 ) δ: 7.97 (1H, s), 7.45 (2H, d),
6.22 (1H, bs), 3.43 (3H, s), 2.29 (3H, s), 1.32 (9
FAB-MS: 390 [(M + H) + ] Example 21 (Compound 192) A solution of Compound 191 (268 mg) in 1,2-dichloroethane under ice cooling under phosphorus oxychloride (0.33 ml). And DMF (2 ml) were sequentially added dropwise, and the mixture was stirred at 70 ° C for 1 hr. The reaction solution was poured into ice water, extracted with ethyl acetate, and washed with water and saturated saline. After drying over anhydrous sodium sulfate, the mixture was concentrated under reduced pressure, the obtained solid was washed with ethyl acetate-hexane, and N- (4-cyano-5-isopropyl-3-methyl-3H-thiazol-2-ylidene)- 180 mg of 3-nitrobenzenesulfonamide (Compound 192) was obtained. 1 H-NMR (CDCl 3 ) δ: 8.76 (1H, t), 8.40 (1H, ddd),
8.27 (1H, d), 7.70 (1H, t), 3.59 (3H, s), 3.38 (1H,
heptet), 1.37 (6H, d); FAB-MS: 367 [(M + H) + ] Compound 28 shown in Table 35 below in the same manner as in Example 21.
5, 408 and 416, and compounds 422 and 424 shown in Table 36
Was manufactured.
【0041】実施例22(化合物202)
化合物194 (150 mg)、酢酸、水及びシアン化カリウム(6
5 mg)の混合物を80℃で1時間攪拌した。シアン化カリウ
ム(65 mg)を追加し、80℃で4時間攪拌後、更にシアン化
カリウム(260 mg)を追加し、80℃で2時間攪拌した。反
応混合物に水を加え析出した固体を濾取し、アセトニト
リルより再結晶して、N-(5-t-ブチル-3,4-ジメチル-2,3
-ジヒドロチアゾール-2-イリデン)-5-クロロ-2-ウレイ
ドベンゼンスルホンアミド(化合物202)56 mgを得た。1
H-NMR (CDCl3) δ: 8.15 (1H, s), 8.14 (1H, d), 7.7
2 (1H, d), 7.52 (1H, dd), 3.44 (3H, s), 2.27 (1H,
s), 1.31 (9H, s);FAB-MS: 417 [(M+H)+]
実施例23(化合物206)
化合物195 (0.20 g)、メタノール(2 ml)及び濃塩酸(2 m
l)の混合物を11時間加熱環流下攪拌した。次いで酢酸(4
ml)を加え22時間加熱環流下攪拌した。放冷後、飽和炭
酸水素ナトリウム水溶液を加えて中和し、酢酸エチルで
抽出した。無水硫酸マグネシウムで乾燥し、減圧下濃縮
後、得られた残渣をメタノールから結晶化させて、N-(5
-t-ブチル-3,4-ジメチル-2,3-ジヒドロチアゾール-2-イ
リデン)-2-ヒドロキシ-5-ニトロベンゼンスルホンアミ
ド(化合物206)74 mgを得た。1
H-NMR (DMSO-d6) δ: 12.09 (1H, bs), 8.54 (1H, d),
8.26 (1H, dd), 7.06 (1H, d), 3.40 (3H, s), 2.29
(1H, s), 1.33 (9H, s);FAB-MS: 386 [(M+H)+]Example 22 (Compound 202) Compound 194 (150 mg), acetic acid, water and potassium cyanide (6
The mixture of 5 mg) was stirred at 80 ° C. for 1 hour. Potassium cyanide (65 mg) was added, and the mixture was stirred at 80 ° C for 4 hr, potassium cyanide (260 mg) was further added, and the mixture was stirred at 80 ° C for 2 hr. Water was added to the reaction mixture and the precipitated solid was collected by filtration and recrystallized from acetonitrile to give N- (5-t-butyl-3,4-dimethyl-2,3
56 mg of -dihydrothiazole-2-ylidene) -5-chloro-2-ureidobenzenesulfonamide (Compound 202) were obtained. 1 H-NMR (CDCl 3 ) δ: 8.15 (1H, s), 8.14 (1H, d), 7.7
2 (1H, d), 7.52 (1H, dd), 3.44 (3H, s), 2.27 (1H,
s), 1.31 (9H, s); FAB-MS: 417 [(M + H) + ] Example 23 (Compound 206) Compound 195 (0.20 g), methanol (2 ml) and concentrated hydrochloric acid (2 m
The mixture of l) was stirred under reflux for 11 hours. Then acetic acid (4
ml) was added and the mixture was stirred for 22 hours under reflux. After allowing to cool, a saturated aqueous sodium hydrogen carbonate solution was added to neutralize, and the mixture was extracted with ethyl acetate. After drying over anhydrous magnesium sulfate and concentrating under reduced pressure, the obtained residue was crystallized from methanol, and N- (5
74 mg of -t-butyl-3,4-dimethyl-2,3-dihydrothiazol-2-ylidene) -2-hydroxy-5-nitrobenzenesulfonamide (Compound 206) was obtained. 1 H-NMR (DMSO-d 6 ) δ: 12.09 (1H, bs), 8.54 (1H, d),
8.26 (1H, dd), 7.06 (1H, d), 3.40 (3H, s), 2.29
(1H, s), 1.33 (9H, s); FAB-MS: 386 [(M + H) + ].
【0042】実施例24(化合物207)
化合物S-16 (300 mg)にトリフルオロ酢酸、メタンスル
ホン酸及びペンタメチルベンゼン(445 mg)を加え室温下
2時間攪拌した。反応混合物を減圧下濃縮し、水を加え
酢酸エチルで抽出した。有機層を飽和炭酸水素ナトリウ
ム水溶液で洗浄し、無水硫酸マグネシウムでて乾燥後、
減圧下濃縮した。得られた残渣をシリカゲルカラムクロ
マトグラフィー(酢酸エチル/トルエン)で精製して、N-
(5-t-ブチル-3,4-ジメチル-2,3-ジヒドロチアゾール-2-
イリデン)-4,5-ジクロロ-2-ヒドロキシベンゼンスルホ
ンアミド(化合物207)164 mgを得た。1
H-NMR (DMSO-d6) δ: 11.55 (1H, s), 7.91 (1H, s),
7.09 (1H, s), 3.42 (3H, s), 2.28 (1H, s), 1.31 (9
H, s);FAB-MS: 409 [(M+H)+]
実施例25(化合物389)
化合物388 (307 mg)にトリフルオロ酢酸を加え室温下15
分間攪拌した。減圧下濃縮後エーテルを加え、析出した
固体をイソプロパノールより再結晶して、3-ブロモ-N-
(5-t-ブチル-3,4-ジメチルチアゾール-2(3H)-イリデン)
-6-フルオロ-2-ヒドロキシベンゼンスルホンアミド(化
合物389)198 mgを得た。1
H-NMR (DMSO-d6) δ: 10.73 (1H, s), 7.82 (1H, dd),
6.86 (1H, t), 3.46 (3H, s), 2.32 (1H, s), 1.34 (9
H, s);FAB-MS: 437, 439 [(M+H)+]
実施例25と同様にして、後記表35に示す化合物390
を製造した。Example 24 (Compound 207) To compound S-16 (300 mg) were added trifluoroacetic acid, methanesulfonic acid and pentamethylbenzene (445 mg) at room temperature.
It was stirred for 2 hours. The reaction mixture was concentrated under reduced pressure, water was added, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated aqueous sodium hydrogen carbonate solution, dried over anhydrous magnesium sulfate,
It was concentrated under reduced pressure. The obtained residue was purified by silica gel column chromatography (ethyl acetate / toluene) to give N-
(5-t-butyl-3,4-dimethyl-2,3-dihydrothiazole-2-
Ylidene) -4,5-dichloro-2-hydroxybenzenesulfonamide (Compound 207) (164 mg) was obtained. 1 H-NMR (DMSO-d 6 ) δ: 11.55 (1H, s), 7.91 (1H, s),
7.09 (1H, s), 3.42 (3H, s), 2.28 (1H, s), 1.31 (9
H, s); FAB-MS: 409 [(M + H) + ] Example 25 (Compound 389) Trifluoroacetic acid was added to Compound 388 (307 mg) at room temperature 15
Stir for minutes. After concentration under reduced pressure, ether was added, and the precipitated solid was recrystallized from isopropanol to give 3-bromo-N-
(5-t-butyl-3,4-dimethylthiazole-2 (3H) -ylidene)
198 mg of -6-fluoro-2-hydroxybenzenesulfonamide (Compound 389) was obtained. 1 H-NMR (DMSO-d 6 ) δ: 10.73 (1H, s), 7.82 (1H, dd),
6.86 (1H, t), 3.46 (3H, s), 2.32 (1H, s), 1.34 (9
H, s); FAB-MS: 437, 439 [(M + H) + ] In the same manner as in Example 25, compound 390 shown in Table 35 below.
Was manufactured.
【0043】実施例26(化合物277)
化合物34 (3.62 g)のクロロホルム溶液に、氷冷下、ト
リエチルアミン(1.94 ml)及びメタンスルホニルクロラ
イド(1.08 ml)を順次加え、室温下1時間攪拌した。更に
トリエチルアミン(1.94 ml)及びメタンスルホニルクロ
ライド(1.08 ml)を加え室温下30分間攪拌した。反応混
合物に水を加え、クロロホルムで抽出後、有機層を1 M
塩酸水溶液、飽和炭酸水素ナトリウム水溶液及び飽和食
塩水で順次洗浄し、無水硫酸ナトリウムで乾燥後減圧下
濃縮して、メタンスルホン酸エステル体S-37(5.16 g)を
得た。得られた化合物にDMF及びアジ化ナトリウム(3.03
g)を加え、室温下1時間攪拌した。反応混合物を濾過
後、トルエン-酢酸エチル(1:1)混合液を加え、水及び
飽和食塩水で順次洗浄し、無水硫酸ナトリウムで乾燥
後、減圧下濃縮した。得られた残渣をシリカゲルカラム
クロマトグラフィー(酢酸エチル/トルエン)で精製
後、イソプロパノールより結晶化させて、2-アジドメチ
ル-N-(5-t-ブチル-3,4-ジメチルチアゾール-2(3H)-イリ
デン)-5-クロロベンゼンスルホンアミド(化合物227)2.7
9 gを得た。1
H-NMR (DMSO-d6) δ: 7.90 (1H, d), 7.73 (1H, dd),
7.65 (1H, d), 4.93(2H,s), 3.45 (3H, s), 2.28 (1H,
s), 1.30 (9H, s);FAB-MS: 414 [(M+H)+]
実施例27(化合物271)
化合物S-37 (1.08 g)にDMF及びシアン化カリウム(0.33
g)を加え、70℃で50分間攪拌した。反応混合物にトルエ
ン-酢酸エチル(1:1)混合液を加え、水及び飽和食塩水
で順次洗浄し、無水硫酸ナトリウムで乾燥後、減圧下濃
縮した。得られた残渣をシリカゲルカラムクロマトグラ
フィー(酢酸エチル/トルエン)で精製後、イソプロパ
ノールより結晶化させて、N-(5-t-ブチル-3,4-ジメチル
チアゾール-2(3H)-イリデン)-5-クロロ-2-シアノメチル
ベンゼンスルホンアミド(化合物227)176 mgを得た。1
H-NMR (DMSO-d6) δ: 7.92 (1H, d), 7.75 (1H, dd),
7.67 (1H, d), 4.41(2H,s), 3.45 (3H, s), 2.27 (1H,
s), 1.31 (9H, s);FAB-MS: 398 [(M+H)+]Example 26 (Compound 277) To a chloroform solution of the compound 34 (3.62 g), triethylamine (1.94 ml) and methanesulfonyl chloride (1.08 ml) were sequentially added under ice cooling, and the mixture was stirred at room temperature for 1 hour. Furthermore, triethylamine (1.94 ml) and methanesulfonyl chloride (1.08 ml) were added, and the mixture was stirred at room temperature for 30 minutes. After adding water to the reaction mixture and extracting with chloroform, the organic layer was diluted to 1 M.
The extract was washed successively with aqueous hydrochloric acid solution, saturated aqueous sodium hydrogen carbonate solution and saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure to give methanesulfonic acid ester S-37 (5.16 g). The obtained compound was added to DMF and sodium azide (3.03
g) was added and the mixture was stirred at room temperature for 1 hour. After filtering the reaction mixture, a toluene-ethyl acetate (1: 1) mixed solution was added, and the mixture was washed successively with water and saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was purified by silica gel column chromatography (ethyl acetate / toluene) and crystallized from isopropanol to give 2-azidomethyl-N- (5-t-butyl-3,4-dimethylthiazole-2 (3H). -Ylidene) -5-chlorobenzenesulfonamide (Compound 227) 2.7
I got 9 g. 1 H-NMR (DMSO-d 6 ) δ: 7.90 (1H, d), 7.73 (1H, dd),
7.65 (1H, d), 4.93 (2H, s), 3.45 (3H, s), 2.28 (1H,
s), 1.30 (9H, s); FAB-MS: 414 [(M + H) + ] Example 27 (Compound 271) Compound S-37 (1.08 g) was added to DMF and potassium cyanide (0.33).
g) was added, and the mixture was stirred at 70 ° C for 50 minutes. Toluene-ethyl acetate (1: 1) mixture was added to the reaction mixture, washed successively with water and saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was purified by silica gel column chromatography (ethyl acetate / toluene) and crystallized from isopropanol to give N- (5-t-butyl-3,4-dimethylthiazole-2 (3H) -ylidene)-. 176 mg of 5-chloro-2-cyanomethylbenzenesulfonamide (Compound 227) was obtained. 1 H-NMR (DMSO-d 6 ) δ: 7.92 (1H, d), 7.75 (1H, dd),
7.67 (1H, d), 4.41 (2H, s), 3.45 (3H, s), 2.27 (1H,
s), 1.31 (9H, s); FAB-MS: 398 [(M + H) + ].
【0044】実施例28(化合物283)
化合物263 (500 mg)、エタノール、ヒドロキシルアミン
塩酸塩(99 mg)及びピリジン(0.11 ml)の混合物を30分間
加熱環流した。室温まで放冷後、減圧下濃縮した。得ら
れた残渣に酢酸エチルを加え、1 M 塩酸水溶液及び飽和
食塩水で順次洗浄し、無水硫酸ナトリウムで乾燥後、減
圧下濃縮した。得られた固体を熱トルエン-酢酸エチル
混合液で洗浄して、N-(5-t-ブチル-3,4-ジメチルチアゾ
ール-2(3H)-イリデン)-5-クロロ-2-(ヒドロキシイミノ
メチル)ベンゼンスルホンアミド(化合物283)395 mgを得
た。1
H-NMR (DMSO-d6) δ: 11.72 (1H, s), 8.84 (1H, s),
7.93 (1H, d), 7.88 (1H, d), 7.66 (1H, dd), 3.40(3
H, s), 2.27 (1H, s), 1.30 (9H, s);FAB-MS: 402 [(M
+H)+]
実施例28と同様にして、後記表35に示す化合物310
及び343を製造した。
実施例29(化合物294)
化合物293 (1.06 g)のメタノール溶液に、酢酸(1 ml)を
加え、加熱環流下7時間攪拌した。放冷後、クロロホル
ム及びメタノールを加え、有機層を水で洗浄し、無水硫
酸マグネシウムで乾燥後減圧下濃縮した。得られた残渣
をシリカゲルカラムクロマトグラフィー(メタノール/
クロロホルム)で精製後、エタノール-ジエチルエーテ
ルより結晶化させて、N-(5-t-ブチル-3,4-ジメチルチア
ゾール-2(3H)-イリデン)-5-クロロ-2-(1H-イミダゾール
-4-イルメトキシ)ベンゼンスルホンアミド(化合物294)4
41 mgを得た。1
H-NMR (DMSO-d6) δ: 7.73 (1H, d), 7.52-7.61 (2H,
m), 7.45 (1H, d), 7.03(1H, bs), 7.66 (1H, dd), 5.0
0 (2H, s), 3.28 (3H, s), 2.26 (1H, s), 1.32(9H,
s);FAB-MS: 455 [(M+H)+]
実施例29と同様にして、後記表35に示す化合物354
及び359を製造した。Example 28 (Compound 283) A mixture of compound 263 (500 mg), ethanol, hydroxylamine hydrochloride (99 mg) and pyridine (0.11 ml) was heated under reflux for 30 minutes. After allowing to cool to room temperature, the mixture was concentrated under reduced pressure. Ethyl acetate was added to the obtained residue, washed successively with a 1 M aqueous hydrochloric acid solution and saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained solid was washed with hot toluene-ethyl acetate mixed solution, and N- (5-t-butyl-3,4-dimethylthiazole-2 (3H) -ylidene) -5-chloro-2- (hydroxyimino) 395 mg of methyl) benzenesulfonamide (Compound 283) was obtained. 1 H-NMR (DMSO-d 6 ) δ: 11.72 (1H, s), 8.84 (1H, s),
7.93 (1H, d), 7.88 (1H, d), 7.66 (1H, dd), 3.40 (3
H, s), 2.27 (1H, s), 1.30 (9H, s); FAB-MS: 402 [(M
+ H) + ] In the same manner as in Example 28, compounds 310 shown in Table 35 below were used.
And 343 were produced. Example 29 (Compound 294) Acetic acid (1 ml) was added to a methanol solution of compound 293 (1.06 g), and the mixture was stirred under reflux with heating for 7 hours. After allowing to cool, chloroform and methanol were added, the organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue is subjected to silica gel column chromatography (methanol /
After purification with chloroform), crystallize from ethanol-diethyl ether to give N- (5-t-butyl-3,4-dimethylthiazole-2 (3H) -ylidene) -5-chloro-2- (1H-imidazole.
-4-ylmethoxy) benzenesulfonamide (Compound 294) 4
41 mg was obtained. 1 H-NMR (DMSO-d 6 ) δ: 7.73 (1H, d), 7.52-7.61 (2H,
m), 7.45 (1H, d), 7.03 (1H, bs), 7.66 (1H, dd), 5.0
0 (2H, s), 3.28 (3H, s), 2.26 (1H, s), 1.32 (9H,
s); FAB-MS: 455 [(M + H) + ] Compound 354 shown in Table 35 below was prepared in the same manner as in Example 29.
And 359 were produced.
【0045】実施例30(化合物308)
化合物307 (0.59 g)、エタノール、28%ナトリウムメト
キシド-メタノール溶液(0.28 ml)及び炭酸ジエチル(0.1
7 ml)を加え2.5時間加熱環流下攪拌した。炭酸ジエチル
(0.68 ml)を追加し2.5時間加熱環流下攪拌後、更に28%
ナトリウムメトキシド-メタノール溶液(0.28 ml)を加え
1時間加熱環流下攪拌した。放冷後1 M塩酸水溶液を加え
減圧下濃縮した。得られた残渣に酢酸エチルを加え、飽
和食塩水で洗浄し、無水硫酸ナトリウムで乾燥後、減圧
下濃縮した。得られた固体をアセトニトリルより結晶化
させて、N-(5-t-ブチル-3,4-ジメチルチアゾール-2(3H)
-イリデン)-5-クロロ-2-(2,4-ジオキソオキサゾリジン-
5-イル)ベンゼンスルホンアミド(化合物308)326 mgを得
た。1
H-NMR (DMSO-d6) δ: 12.22 (1H, bs), 7.96 (1H, d),
7.74 (1H, dd), 7.54 (1H, d), 6.93 (1H, s), 3.45(3
H, s), 2.28 (1H, s), 1.31 (9H, s);FAB-MS: 458 [(M
+H)+]
実施例31(化合物341)
化合物257 (3.46 g)のトルエン/t-ブタノール(1:1)溶
液に、アルゴン雰囲気下、ジフェニルホスフィノアジド
(2.76 ml)及びトリエチルアミン(1.78 ml)を氷冷下加
え、10分間攪拌した。その後90ーCまで昇温し、1時間
攪拌した。反応混合物を水にあけた後、酢酸エチルで抽
出した。有機層を5%硫酸水素カリウム水溶液、水及び飽
和食塩水で順次洗浄し、無水硫酸マグネシウムで乾燥
後、減圧下濃縮した。残渣をシリカゲルカラムクロマト
グラフィー(酢酸エチル/トルエン)で精製後、ヘキサ
ン-酢酸エチルから結晶化して、t-ブチル (2-{[(5-t-ブ
チル-3,4-ジメチルチアゾール-2(3H)-イリデン)アミノ]
スルホニル}-4-クロロフェニル)カルバマート(化合物34
1)2.37 gを得た。1
H-NMR (DMSO-d6) δ: 8.65 (1H, s), 8.15 (1H, d),
7.76 (1H, d), 6.62 (1H,dd), 3.45 (3H, s), 2.29 (3
H, s), 1.48 (9H, s), 1.31 (9H, s);FAB-MS: 446[(M+
H)+]
実施例31と同様にして、後記表35に示す化合物349
及び350を製造した。Example 30 (Compound 308) Compound 307 (0.59 g), ethanol, 28% sodium methoxide-methanol solution (0.28 ml) and diethyl carbonate (0.18 g).
(7 ml) was added, and the mixture was stirred for 2.5 hours while heating under reflux. Diethyl carbonate
(0.68 ml) was added and after stirring under reflux for 2.5 hours, 28%
Add sodium methoxide-methanol solution (0.28 ml)
The mixture was stirred under reflux for 1 hour. After allowing to cool, 1 M hydrochloric acid aqueous solution was added, and the mixture was concentrated under reduced pressure. Ethyl acetate was added to the obtained residue, washed with saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained solid was crystallized from acetonitrile, N- (5-t-butyl-3,4-dimethylthiazole-2 (3H)
-Ylidene-5-chloro-2- (2,4-dioxooxazolidine-
326 mg of 5-yl) benzenesulfonamide (Compound 308) was obtained. 1 H-NMR (DMSO-d 6 ) δ: 12.22 (1H, bs), 7.96 (1H, d),
7.74 (1H, dd), 7.54 (1H, d), 6.93 (1H, s), 3.45 (3
H, s), 2.28 (1H, s), 1.31 (9H, s); FAB-MS: 458 [(M
+ H) + ] Example 31 (Compound 341) Diphenylphosphino azide was added to a toluene / t-butanol (1: 1) solution of compound 257 (3.46 g) under an argon atmosphere.
(2.76 ml) and triethylamine (1.78 ml) were added under ice cooling, and the mixture was stirred for 10 minutes. After that, the temperature was raised to 90-C and the mixture was stirred for 1 hour. The reaction mixture was poured into water and then extracted with ethyl acetate. The organic layer was washed successively with 5% aqueous potassium hydrogen sulfate solution, water and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue was purified by silica gel column chromatography (ethyl acetate / toluene) and crystallized from hexane-ethyl acetate to give t-butyl (2-{[(5-t-butyl-3,4-dimethylthiazole-2 (3H ) -Ylidene) Amino]
Sulfonyl} -4-chlorophenyl) carbamate (Compound 34
1) Obtained 2.37 g. 1 H-NMR (DMSO-d 6 ) δ: 8.65 (1H, s), 8.15 (1H, d),
7.76 (1H, d), 6.62 (1H, dd), 3.45 (3H, s), 2.29 (3
H, s), 1.48 (9H, s), 1.31 (9H, s); FAB-MS: 446 [(M +
H) + ] In the same manner as in Example 31, the compound 349 shown in Table 35 below.
And 350 were produced.
【0046】実施例32(化合物347)
化合物285 (370 mg)にトルエン及びアジ化トリブチルス
ズ(1.32 ml)を加え加熱環流下6時間攪拌した。放冷後、
1 M 塩酸水溶液(20 ml)及びメタノールを加え、室温下4
8時間攪拌した。減圧下濃縮後、クロロホルムを加え、1
M 塩酸水溶液で洗浄し、無水硫酸マグネシウムで乾燥
し、減圧下濃縮した。得られた残渣をシリカゲルカラム
クロマトグラフィー(酢酸エチル/トルエン)で精製
し、ジエチルエーテルより結晶化させて、N-(5-t-ブチ
ル-3,4-ジメチルチアゾール-2(3H)-イリデン)-5-クロロ
-2-(1H-テトラゾール-5-イル)ベンゼンスルホンアミド
(化合物347)166 mgを得た。1
H-NMR (DMSO-d6) δ: 16.50 (1H, bs), 8.09 (1H, d),
7.84 (1H, dd), 7.63 (1H, d), 3.22 (3H, s), 2.26
(3H, s), 1.30 (9H, s);FAB-MS: 427 [(M+H)+]
実施例32と同様にして、後記表35に示す化合物342
を製造した。
実施例33(化合物306)
化合物S-56 (0.29 g)にエタノール、ベンゼン及びブロ
モアセトン(0.133 ml)、トリエチルアミン(0.108 ml)を
加え、加熱環流下2時間攪拌した。室温まで放冷後減圧
下濃縮した。得られた残渣をシリカゲルカラムクロマト
グラフィー(酢酸エチル/ヘキサン)で精製後、ジエチ
ルエーテルより結晶化させて、N-(5-t-ブチル-3,4-ジメ
チルチアゾール-2(3H)-イリデン)-5-クロロ-2-[(4-メチ
ルチアゾール-2-イル)メトキシ]ベンゼンスルホンアミ
ド(化合物306)144 mgを得た。1
H-NMR (DMSO-d6) δ: 7.78 (1H, d), 7.61 (1H, dd),
7.33 (1H, d), 7.27 (1H, s), 5.43 (2H, s), 3.33 (3
H, s), 2.34 (3H, s), 2.25 (3H, s), 1.32 (9H,s);FA
B-MS: 486 [(M+H)+]
実施例33と同様にして、後記表35に示す化合物344
を製造した。Example 32 (Compound 347) Toluene and tributyltin azide (1.32 ml) were added to compound 285 (370 mg), and the mixture was stirred under heating reflux for 6 hours. After cooling down,
Add 1 M hydrochloric acid aqueous solution (20 ml) and methanol, and then at room temperature 4
It was stirred for 8 hours. After concentrating under reduced pressure, add chloroform and
The extract was washed with an aqueous solution of M hydrochloric acid, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was purified by silica gel column chromatography (ethyl acetate / toluene) and crystallized from diethyl ether to give N- (5-t-butyl-3,4-dimethylthiazole-2 (3H) -ylidene). -5-chloro
-2- (1H-tetrazol-5-yl) benzenesulfonamide
(Compound 347) 166 mg was obtained. 1 H-NMR (DMSO-d 6 ) δ: 16.50 (1H, bs), 8.09 (1H, d),
7.84 (1H, dd), 7.63 (1H, d), 3.22 (3H, s), 2.26
(3H, s), 1.30 (9H, s); FAB-MS: 427 [(M + H) + ] In the same manner as in Example 32, compound 342 shown in Table 35 below.
Was manufactured. Example 33 (Compound 306) Ethanol, benzene and bromoacetone (0.133 ml) and triethylamine (0.108 ml) were added to Compound S-56 (0.29 g), and the mixture was stirred under reflux with heating for 2 hours. After cooling to room temperature, the mixture was concentrated under reduced pressure. The obtained residue was purified by silica gel column chromatography (ethyl acetate / hexane) and crystallized from diethyl ether to give N- (5-t-butyl-3,4-dimethylthiazole-2 (3H) -ylidene). There was obtained 144 mg of -5-chloro-2-[(4-methylthiazol-2-yl) methoxy] benzenesulfonamide (Compound 306). 1 H-NMR (DMSO-d 6 ) δ: 7.78 (1H, d), 7.61 (1H, dd),
7.33 (1H, d), 7.27 (1H, s), 5.43 (2H, s), 3.33 (3
H, s), 2.34 (3H, s), 2.25 (3H, s), 1.32 (9H, s); FA
B-MS: 486 [(M + H) + ] In the same manner as in Example 33, compounds 344 shown in Table 35 below were used.
Was manufactured.
【0047】実施例34(化合物345)
化合物343 (1.24 g)にオルトギ酸エチル(13 ml)及び三
フッ化ホウ素-ジエチルエーテル(5滴)を加え、加熱環流
下2時間攪拌した。減圧下濃縮後、クロロホルムを加
え、1 M 塩酸水溶液及び飽和炭酸水素ナトリウム水溶液
で順次洗浄し、無水硫酸マグネシウムで乾燥後、減圧下
濃縮した。得られた残渣をシリカゲルカラムクロマトグ
ラフィー(酢酸エチル/トルエン)で精製後、イソプロ
パノールより結晶化させて、5-ブロモ-N-(5-t-ブチル-
3,4-ジメチルチアゾール-2(3H)-イリデン)-2-(1,2,4-オ
キサジアゾール-3-イルメトキシ)ベンゼンスルホンアミ
ド(化合物345)800 mgを得た。1
H-NMR (DMSO-d6) δ: 9.63 (1H, s), 7.90 (1H, d),
7.74 (1H, dd), 7.32 (1H, d), 5.35 (2H, s), 3.30 (3
H, s), 2.24 (3H, s), 1.30 (9H, s);FAB-MS: 501,50
3 [(M+H)+]
実施例35(化合物361)
化合物S-62 (600 mg)にアセトニトリル及びヨウ化メチ
ル(0.15 ml)を加え、加熱環流下1.5時間攪拌した。更に
ヨウ化メチル(1.5 ml)を加え、加熱環流下1時間攪拌し
た。室温まで放冷後、減圧下濃縮し、得られた残渣にメ
タノールを加え加熱環流下5時間攪拌した。放冷後、減
圧下濃縮し得られた残渣に酢酸エチルを加え、飽和炭酸
水素ナトリウム水溶液で洗浄し、無水硫酸マグネシウム
で乾燥後、減圧下濃縮した。得られた残渣をシリカゲル
カラムクロマトグラフィー(メタノール/クロロホル
ム)で精製後、得られた化合物に4 M 塩化水素-酢酸エ
チル溶液を加え、減圧下濃縮し、得られた固体をジエチ
ルエーテル-エタノールの混合液で結晶化させて、5-ブ
ロモ-N-(5-t-ブチル-3,4-ジメチルチアゾール-2(3H)-イ
リデン)-2-[(1-メチル-1H-イミダゾール-5-イル)メトキ
シ]ベンゼンスルホンアミド 一塩酸塩 二水和物(化合物
361)105 mgを得た。1
H-NMR (DMSO-d6) δ: 9.09 (1H, s), 7.90 (1H, d),
7.77-7.81 (2H, m), 7.38(1H, d), 5.35 (2H, s), 3.92
(3H, s), 3.30 (3H, s), 2.24 (3H, s), 1.29 (9H,
s);FAB-MS: 513,515 [(M+H)+]Example 34 (Compound 345) Ethyl orthoformate (13 ml) and boron trifluoride-diethyl ether (5 drops) were added to compound 343 (1.24 g), and the mixture was stirred under reflux with heating for 2 hours. After concentration under reduced pressure, chloroform was added, and the mixture was washed successively with 1 M aqueous hydrochloric acid solution and saturated aqueous sodium hydrogen carbonate solution, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was purified by silica gel column chromatography (ethyl acetate / toluene), and crystallized from isopropanol to give 5-bromo-N- (5-t-butyl-
800 mg of 3,4-dimethylthiazol-2 (3H) -ylidene) -2- (1,2,4-oxadiazol-3-ylmethoxy) benzenesulfonamide (Compound 345) was obtained. 1 H-NMR (DMSO-d 6 ) δ: 9.63 (1H, s), 7.90 (1H, d),
7.74 (1H, dd), 7.32 (1H, d), 5.35 (2H, s), 3.30 (3
H, s), 2.24 (3H, s), 1.30 (9H, s); FAB-MS: 501, 50
3 [(M + H) + ] Example 35 (Compound 361) Acetonitrile and methyl iodide (0.15 ml) were added to Compound S-62 (600 mg), and the mixture was stirred under reflux with heating for 1.5 hours. Methyl iodide (1.5 ml) was further added, and the mixture was stirred under reflux with heating for 1 hour. After allowing to cool to room temperature, the mixture was concentrated under reduced pressure, methanol was added to the obtained residue, and the mixture was stirred under reflux with heating for 5 hours. After allowing to cool, the mixture was concentrated under reduced pressure, ethyl acetate was added to the obtained residue, washed with a saturated aqueous sodium hydrogen carbonate solution, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was purified by silica gel column chromatography (methanol / chloroform), 4 M hydrogen chloride-ethyl acetate solution was added to the obtained compound, and the mixture was concentrated under reduced pressure. The obtained solid was mixed with diethyl ether-ethanol. Crystallized with liquid, 5-bromo-N- (5-t-butyl-3,4-dimethylthiazol-2 (3H) -ylidene) -2-[(1-methyl-1H-imidazol-5-yl ) Methoxy] benzenesulfonamide monohydrochloride dihydrate (compound
361) 105 mg were obtained. 1 H-NMR (DMSO-d 6 ) δ: 9.09 (1H, s), 7.90 (1H, d),
7.77-7.81 (2H, m), 7.38 (1H, d), 5.35 (2H, s), 3.92
(3H, s), 3.30 (3H, s), 2.24 (3H, s), 1.29 (9H,
s) ; FAB-MS: 513, 515 [(M + H) + ].
【0048】実施例36(化合物371)
化合物370 (8.13 g)、エタノール、水、塩化アンモニウ
ム(0.47 g)及び鉄(9.78 g)の混合物を、2時間加熱環流
下攪拌した。室温まで放冷後セライト濾過し、濾液を減
圧濃縮した。得られた残渣にクロロホルムを加え、飽和
食塩水で洗浄後、無水硫酸ナトリウムで乾燥し、減圧下
濃縮した。得られた固体をアセトニトリルで洗浄して、
3-アミノ-5-ブロモ-N-(5-t-ブチル-4-メチルチアゾール
-2-イル)-2-メトキシベンゼンスルホンアミド(化合物37
1)5.45 gを得た。1
H-NMR (DMSO-d6) δ: 12.24 (1H, bs), 7.02 (1H, d),
6.99 (1H, d), 5.57 (2H, s), 3.68 (3H, s), 2.16 (3
H, s), 1.30 (9H, s);FAB-MS: 434,436 [(M+H) +]
実施例36と同様にして、後記表37に示す化合物S-39
を製造した。
実施例37(化合物449)
化合物416 (755 mg)及びアセトニトリル-水(1:1)混合物
に、過硫酸アンモニウム (883 mg)及び塩化ナトリウム
(452 mg)を加え、70℃で攪拌下、硫酸鉄(II)五水和物(2
68 mg)水溶液を、30分間かけて滴下した。5時間攪拌
後、室温まで放冷し、酢酸エチルを加え、水で洗浄し
た。無水硫酸マグネシウムで乾燥後、減圧下濃縮し、得
られた残渣をシリカゲルカラムクロマトグラフィー(酢
酸エチル/トルエン)で精製し、得られた固体をジエチ
ルエーテルで洗浄して、5-クロロ-N-[4-クロロ-5-(1-ヒ
ドロキシ-1-メチルエチル)-3-メチルチアゾール-2(3H)-
イリデン]-2-シアノベンゼンスルホンアミド(化合物44
9)295 mgを得た。1
H-NMR (CDCl3) δ: 8.15 (1H, d,J=1.5Hz), 7.76 (1H,
d, J=6.3), 7.60 (H, dd,J=1.5,,6.3), 3.60 (3H, s),
3.53 (1H, s), 1.66 (6H, s);FAB-MS: 406 [(M+H)+]Example 36 (Compound 371)
Compound 370 (8.13 g), ethanol, water, ammonium chloride
A mixture of aluminum (0.47 g) and iron (9.78 g) under reflux for 2 hours.
It was stirred under. After cooling to room temperature, filter through Celite to reduce the filtrate.
It was concentrated under pressure. Chloroform was added to the obtained residue and saturated.
After washing with brine, drying over anhydrous sodium sulfate, and reducing pressure
Concentrated. The solid obtained is washed with acetonitrile,
3-amino-5-bromo-N- (5-t-butyl-4-methylthiazole
-2-yl) -2-methoxybenzenesulfonamide (Compound 37
1) Obtained 5.45 g.1
H-NMR (DMSO-d6) δ: 12.24 (1H, bs), 7.02 (1H, d),
6.99 (1H, d), 5.57 (2H, s), 3.68 (3H, s), 2.16 (3
H, s), 1.30 (9H, s); FAB-MS: 434, 436 [(M + H) +]
Compound S-39 shown in Table 37 below was prepared in the same manner as in Example 36.
Was manufactured.
Example 37 (Compound 449)
Compound 416 (755 mg) and acetonitrile-water (1: 1) mixture
, Ammonium persulfate (883 mg) and sodium chloride
(452 mg) was added, and iron (II) sulfate pentahydrate (2
68 mg) aqueous solution was added dropwise over 30 minutes. Stir for 5 hours
After that, let cool to room temperature, add ethyl acetate, and wash with water.
It was After drying over anhydrous magnesium sulfate, concentrate under reduced pressure to obtain
The resulting residue is subjected to silica gel column chromatography (vinegar
Ethylate / toluene) and the resulting solid
Washed with ether and washed with 5-chloro-N- [4-chloro-5- (1-hi
Droxy-1-methylethyl) -3-methylthiazole-2 (3H)-
Ylidene] -2-cyanobenzenesulfonamide (Compound 44
9) Obtained 295 mg.1
H-NMR (CDCl3) δ: 8.15 (1H, d, J = 1.5Hz), 7.76 (1H,
d, J = 6.3), 7.60 (H, dd, J = 1.5,, 6.3), 3.60 (3H, s),
3.53 (1H, s), 1.66 (6H, s); FAB-MS: 406 [(M + H)+]
【0049】実施例38(化合物491)
2 M ジメチル亜鉛-トルエン溶液(2.5 ml)にジクロロメ
タンを加え、氷冷下、四塩化チタン(IV)(0.55 ml)を加
え10分間攪拌し、化合物449 (100 mg)のジクロロメタン
溶液を加え、室温下5時間攪拌した。反応混合物に飽和
炭酸水素ナトリウム水溶液を加え酢酸エチルで抽出し
た。有機層を無水硫酸マグネシウムで乾燥後、減圧下濃
縮した。得られた残渣をシリカゲルカラムクロマトグラ
フィー(メタノール/クロロホルム)で精製後、ジエチ
ルエーテルで固体を洗浄して、N-(5-t-ブチル-4-クロロ
-3-メチルチアゾール-2(3H)-イリデン)-5-クロロ-2-シ
アノベンゼンスルホンアミド(化合物491)56 mgを得た。1
H-NMR (DMSO-d6) δ: 8.12 (1H, d), 8.04 (1H, d),
7.91 (1H, dd), 3.53 (3H, s), 1.37 (9H, s);FAB-MS:
404 [(M+H)+]
実施例39(化合物492)
2-アミノ-5-t-ブチル-4-メチルチアゾール塩酸塩(21 m
g)のピリジン溶液に、3-シアノベンゼンスルホニルクロ
ライド(40 mg)を加え、室温下終夜攪拌した。反応混合
物に水を加え、クロロホルムで抽出した。有機層を1 M
塩酸水溶液、飽和炭酸水素ナトリウム水溶液及び飽和食
塩水で順次洗浄し、無水硫酸マグネシウムを用いて水層
を分離後、減圧下溶媒を留去して、N-(5-t-ブチル-4-メ
チルチアゾール-2-イル)-3-シアノベンゼンスルホンア
ミド(化合物492)33 mgを得た。Example 38 (Compound 491) Dichloromethane was added to a 2 M dimethylzinc-toluene solution (2.5 ml), titanium (IV) tetrachloride (0.55 ml) was added under ice-cooling, and the mixture was stirred for 10 minutes to give compound 449 ( A dichloromethane solution of 100 mg) was added, and the mixture was stirred at room temperature for 5 hours. A saturated aqueous sodium hydrogen carbonate solution was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was dried over anhydrous magnesium sulfate and then concentrated under reduced pressure. The obtained residue was purified by silica gel column chromatography (methanol / chloroform), and the solid was washed with diethyl ether to give N- (5-t-butyl-4-chloro).
-3-Methylthiazole-2 (3H) -ylidene) -5-chloro-2-cyanobenzenesulfonamide (Compound 491) 56 mg was obtained. 1 H-NMR (DMSO-d 6 ) δ: 8.12 (1H, d), 8.04 (1H, d),
7.91 (1H, dd), 3.53 (3H, s), 1.37 (9H, s); FAB-MS:
404 [(M + H) + ] Example 39 (Compound 492) 2-Amino-5-t-butyl-4-methylthiazole hydrochloride (21 m
3-Cyanobenzenesulfonyl chloride (40 mg) was added to the pyridine solution of g), and the mixture was stirred at room temperature overnight. Water was added to the reaction mixture and extracted with chloroform. 1 M organic layer
It was washed successively with aqueous hydrochloric acid solution, saturated aqueous sodium hydrogen carbonate solution and saturated brine, and the aqueous layer was separated using anhydrous magnesium sulfate, and the solvent was evaporated under reduced pressure to give N- (5-t-butyl-4-methyl). 33 mg of thiazol-2-yl) -3-cyanobenzenesulfonamide (Compound 492) was obtained.
【0050】実施例40(化合物653)
化合物2 (100 mg)のメタノール(5.6 ml)溶液に、0℃で2
M (トリメチルシリル)ジアゾメタン-ヘキサン溶液(1.1
2 ml)を加え、室温下終夜攪拌した。減圧下溶媒を留去
後、得られた残渣をシリカゲルカラムクロマトグラフィ
ー(ヘキサン/酢酸エチル)で精製して、N-(5-t-ブチ
ル-4-メチルチアゾール-2-イル)-N-メチル-3-ニトロベ
ンゼンスルホンアミド(化合物653)30 mg及び化合物1 (3
1 mg)を得た。
実施例41(化合物612)
化合物645 (33 mg)を用い、実施例11と同様にして、N
-(5-t-ブチル-4-メチルチアゾール-2-イル)-3-メタンス
ルホニルアミノベンゼンスルホンアミド(化合物612)17.
9 mgを得た。
実施例42(化合物618)
化合物645 (33 mg)、ジクロロエタン及びDMF混合物に、
テトラヒドロフタル酸無水物(23 mg)を加え、80℃で終
夜攪拌した。反応混合物を室温に冷却後、PS-トリスア
ミン(30 mg)を加え、3時間室温下攪拌した。1PSフィル
ターでレジンを濾過し、減圧下溶媒を留去して、N-(5-t
-ブチル-4-メチルチアゾール-2-イル)-3-(1,3-ジオキソ
-1,3,3a,4,7,7a-ヘキサヒドロイソインドール-2-イル)
ベンゼンスルホンアミド(化合物618)25.8 mgを得た。実
施例39〜42に記載の方法と同様にして、後記表38
〜48に示す化合物を製造した。Example 40 (Compound 653) A solution of compound 2 (100 mg) in methanol (5.6 ml) was added at 0 ° C.
M (trimethylsilyl) diazomethane-hexane solution (1.1
2 ml) was added, and the mixture was stirred overnight at room temperature. After evaporating the solvent under reduced pressure, the obtained residue was purified by silica gel column chromatography (hexane / ethyl acetate) to give N- (5-t-butyl-4-methylthiazol-2-yl) -N-methyl. -3-Nitrobenzenesulfonamide (Compound 653) 30 mg and Compound 1 (3
1 mg) was obtained. Example 41 (Compound 612) Using compound 645 (33 mg) and in the same manner as in Example 11, N 2
-(5-t-Butyl-4-methylthiazol-2-yl) -3-methanesulfonylaminobenzenesulfonamide (Compound 612) 17.
9 mg was obtained. Example 42 (Compound 618) To a mixture of Compound 645 (33 mg), dichloroethane and DMF,
Tetrahydrophthalic anhydride (23 mg) was added, and the mixture was stirred at 80 ° C overnight. The reaction mixture was cooled to room temperature, PS-trisamine (30 mg) was added, and the mixture was stirred at room temperature for 3 hr. The resin was filtered through a 1PS filter, the solvent was distilled off under reduced pressure, and N- (5-t
-Butyl-4-methylthiazol-2-yl) -3- (1,3-dioxo
-1,3,3a, 4,7,7a-hexahydroisoindol-2-yl)
25.8 mg of benzenesulfonamide (Compound 618) was obtained. Similarly to the method described in Examples 39 to 42, Table 38 below.
The compounds shown in 48 were prepared.
【0051】参考例1(化合物S-70)
2-アミノ-4-メチルチアゾールに氷冷下、濃硫酸を少し
ずつ加えた。この溶液に30℃以下に冷やしながらtBuOH
を滴下し、室温に戻した後、16時間攪拌した。反応液を
氷水にあけ、炭酸水素ナトリウムで中和したのち、クロ
ロホルムで抽出した。有機層を無水硫酸ナトリウム乾燥
後に減圧下濃縮し、残渣を酢酸エチルに溶解して、氷冷
下4M塩化水素-酢酸エチル溶液を加え、室温で15分攪拌
した。溶媒を減圧下で留去しアセトニトリルに溶解、ヘ
キサンで洗浄、減圧濃縮した。残渣を酢酸エチル−アセ
トニトリルから再結晶して、化合物2-アミノ-5-t-ブチ
ル-4-メチルチアゾール 塩酸塩(化合物S-70)を得た。FA
B-MS: 171 [(M+H)+]
参考例1と同様にして、後記表49に示す化合物S-71、
S-78、S-81、S-86、S-88〜S-92を製造した。
参考例2(化合物S-72)
エチル トリフルオロアセトアセタートのiPrOH溶液にチ
オウレア及びヨウ素を加え、加熱還流下3時間攪拌し
た。反応液を減圧濃縮後、メタノール−水から再結晶
し、メチル 2-アミノ-4-トリフルオロメチルチアゾール
-5-カルボン酸を得た。得られた化合物のTHF溶液にジ-t
-ブチル-ジカーボネート((Boc)2O)及び4-ジメチルアミ
ノピリジンを加え、60℃で1時間攪拌した。反応液を減
圧濃縮後、残渣をシリカゲルカラムクロマトグラフィー
(酢酸エチル/トルエン)で精製し、メチル 2-(N-Boc)
アミノ-4-トリフルオロメチルチアゾール-5-カルボン酸
を得た。得られた化合物のTHF溶液に-78℃で、1.14 M
メチルリチウム-ジエチルエーテル溶液を加え、30分間
攪拌した。反応液に飽和塩化アンモニウム水溶液を加
え、酢酸エチルで抽出した。有機層を水及び飽和食塩水
で洗浄、無水硫酸ナトリウム乾燥後、減圧下濃縮し、残
渣をシリカゲルカラムクロマトグラフィー(酢酸エチル
/ヘキサン)で精製し、t-ブチル [5-(1-ヒドロキシ-1-
メチルエチル)-4-トリフルオロメチルチアゾール-2-イ
ル]カルボン酸を得た。得られた化合物のトリフルオロ
酢酸溶液にトリエチルシランを加え、室温で2時間攪拌
した。反応液を減圧下濃縮後、残渣をシリカゲルカラム
クロマトグラフィー(酢酸エチル/ヘキサン)で精製し
て、2-アミノ-5-(1-メチルエチル)-4-トリフルオロメチ
ルチアゾール(化合物S-72)を得た。FAB-MS: 211 [(M+H)
+]Reference Example 1 (Compound S-70) Concentrated sulfuric acid was gradually added to 2-amino-4-methylthiazole under ice cooling. Add tBuOH to this solution while cooling below 30 ° C.
Was dropped, and the mixture was returned to room temperature and then stirred for 16 hours. The reaction solution was poured into ice water, neutralized with sodium hydrogen carbonate, and then extracted with chloroform. The organic layer was dried over anhydrous sodium sulfate, concentrated under reduced pressure, the residue was dissolved in ethyl acetate, 4M hydrogen chloride-ethyl acetate solution was added under ice cooling, and the mixture was stirred at room temperature for 15 min. The solvent was distilled off under reduced pressure, the residue was dissolved in acetonitrile, washed with hexane, and concentrated under reduced pressure. The residue was recrystallized from ethyl acetate-acetonitrile to obtain the compound 2-amino-5-t-butyl-4-methylthiazole hydrochloride (Compound S-70). FA
B-MS: 171 [(M + H) + ] In the same manner as in Reference Example 1, Compound S-71 shown in Table 49 below,
S-78, S-81, S-86, S-88 to S-92 were manufactured. Reference Example 2 (Compound S-72) Thiourea and iodine were added to an iPrOH solution of ethyl trifluoroacetoacetate, and the mixture was stirred with heating under reflux for 3 hours. The reaction solution was concentrated under reduced pressure and recrystallized from methanol-water to give methyl 2-amino-4-trifluoromethylthiazole.
-5-carboxylic acid was obtained. Di-t in a THF solution of the obtained compound.
-Butyl-dicarbonate ((Boc) 2 O) and 4-dimethylaminopyridine were added, and the mixture was stirred at 60 ° C for 1 hr. The reaction mixture was concentrated under reduced pressure, and the residue was purified by silica gel column chromatography (ethyl acetate / toluene), methyl 2- (N-Boc).
Amino-4-trifluoromethylthiazole-5-carboxylic acid was obtained. To a solution of the obtained compound in THF at -78 ° C, 1.14 M
A methyllithium-diethyl ether solution was added and stirred for 30 minutes. A saturated aqueous ammonium chloride solution was added to the reaction solution, and the mixture was extracted with ethyl acetate. The organic layer was washed with water and saturated brine, dried over anhydrous sodium sulfate, concentrated under reduced pressure, and the residue was purified by silica gel column chromatography (ethyl acetate / hexane) to give t-butyl [5- (1-hydroxy-1 -
Methylethyl) -4-trifluoromethylthiazol-2-yl] carboxylic acid was obtained. Triethylsilane was added to a solution of the obtained compound in trifluoroacetic acid, and the mixture was stirred at room temperature for 2 hours. The reaction mixture was concentrated under reduced pressure, and the residue was purified by silica gel column chromatography (ethyl acetate / hexane) to give 2-amino-5- (1-methylethyl) -4-trifluoromethylthiazole (Compound S-72). Got FAB-MS: 211 [(M + H)
+ ]
【0052】参考例3(化合物S-73)
4-メチル-2-ペンタノン及び臭化トリメチルシランのア
セトニトリル溶液に、氷冷下DMSOを滴下しその後室温に
て2時間攪拌した。反応混合物を水にあけ、ジエチルエ
ーテルにて抽出した。有機層を水及び飽和食塩水で洗浄
し、無水硫酸マグネシウムで乾燥後、減圧下濃縮した。
粗生成物にエタノール及びチオウレアを加え、2時間加
熱環流した。室温まで放冷後、減圧下濃縮した。残渣に
飽和炭酸水素ナトリウム水溶液を加え、酢酸エチルで抽
出した。有機層を飽和食塩水で洗浄し、無水硫酸マグネ
シウムで乾燥後、減圧下濃縮して得た残渣をシリカゲル
カラムクロマトグラフィー(酢酸エチル/ヘキサン)で
精製して2-アミノ-5-(1-メチルエチル)-4-メチルチアゾ
ール(化合物S-73)を得た。FAB-MS: 157 [(M+H)+]
参考例3と同様にして、後記表49に示す化合物S-79、
S-80、S-82〜S-84を製造した。
参考例4(化合物S-74)
2-メトキシ-5-フェニルアニリンのTHF溶液に氷冷下ベン
ゾイルイソチオシアナートを滴下し、その後室温で2時
間攪拌した。減圧濃縮後、メタノール、水及び水酸化ナ
トリウムを加え、室温で1時間攪拌した。析出した固体
を濾取し、水、エタノール及びヘキサンで順次洗浄し
て、N-(2-メトキシ-5-フェニルフェニル)チオウレアを
得た。得られた化合物のクロロホルム溶液に氷冷下、臭
素のクロロホルム溶液を滴下した。1時間加熱環流後、
室温まで放冷し、析出した固体を濾取し、化合物2-アミ
ノ-4-メトキシ-7-フェニルベンゾチアゾール 臭化水素
酸塩を得た。得られた化合物を48%臭化水素酸水溶液に
加え、3昼夜加熱環流した。放冷後、減圧濃縮した。得
られた化合物に無水酢酸及びピリジンを加え、2昼夜、
室温で攪拌した。反応液に水を加え、析出した固体を濾
取し、水、エタノール、ジエチルエーテル及びヘキサン
で順次洗浄して、2-アセチルアミノ-4-アセトキシ-7-フ
ェニルベンゾチアゾールを得た。得られた化合物に1M
水酸化ナトリウム水溶液及びメタノールを加え、30分間
室温で攪拌した。水を加え酢酸エチルで抽出し、無水硫
酸マグネシウムで乾燥後、減圧下濃縮し、2-アセチルア
ミノ-4-ヒドロキシ-7-フェニルベンゾチアゾールを得
た。得られた化合物に2,6-ルチジンを加え、氷冷下、ト
リフルオロメタンスルホン酸無水物を滴下し、室温で一
晩攪拌した。次いで、0.5 M 塩酸水溶液を加え、ジエチ
ルエーテルで抽出した。有機層を0.5 M 塩酸水溶液で
洗浄し、無水硫酸マグネシウムにて乾燥後、減圧下濃縮
した。析出した固体にDMF、トリエチルアミン、ギ酸(0.
88ml)、1,3-ビス(ジフェニルホスフィノ)プロパン及び
酢酸パラジウムを加え、40℃で5時間攪拌した。反応混
合物に水を加え、酢酸エチルとトルエンの1:1混合溶媒
で抽出した。有機層を水で洗い、無水硫酸マグネシウム
で乾燥後、減圧下濃縮して得られた残渣を酢酸エチルか
ら結晶化させ、2-アセチルアミノ-7-フェニルベンゾチ
アゾールを得た。得られた化合物にメタノール及び1 M
水酸化ナトリウム水溶液を加え、50℃で2昼夜攪拌し
た。メタノールを減圧下留去後、酢酸エチルで抽出し、
無水硫酸マグネシウムで乾燥後、減圧下濃縮した。析出
した固体をジエチルエーテル/ヘキサンで洗浄して、2-
アミノ-7-フェニルベンゾチアゾール(化合物S-74)を得
た。FAB-MS: 227 [(M+H)+]
参考例4と同様にして、後記表49に示す化合物S-85を
製造した。Reference Example 3 (Compound S-73) DMSO was added dropwise to an acetonitrile solution of 4-methyl-2-pentanone and trimethylsilane bromide under ice cooling, and then the mixture was stirred at room temperature for 2 hours. The reaction mixture was poured into water and extracted with diethyl ether. The organic layer was washed with water and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure.
Ethanol and thiourea were added to the crude product, and the mixture was heated under reflux for 2 hours. After allowing to cool to room temperature, the mixture was concentrated under reduced pressure. A saturated aqueous sodium hydrogen carbonate solution was added to the residue, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The residue obtained was purified by silica gel column chromatography (ethyl acetate / hexane) to give 2-amino-5- (1-methyl Ethyl) -4-methylthiazole (Compound S-73) was obtained. FAB-MS: 157 [(M + H) + ] In the same manner as in Reference Example 3, Compound S-79 shown in Table 49 below,
S-80 and S-82 to S-84 were manufactured. Reference Example 4 (Compound S-74) Benzoyl isothiocyanate was added dropwise to a THF solution of 2-methoxy-5-phenylaniline under ice cooling, and then the mixture was stirred at room temperature for 2 hours. After concentration under reduced pressure, methanol, water and sodium hydroxide were added, and the mixture was stirred at room temperature for 1 hr. The precipitated solid was collected by filtration and washed successively with water, ethanol and hexane to give N- (2-methoxy-5-phenylphenyl) thiourea. A chloroform solution of bromine was added dropwise to the chloroform solution of the obtained compound under ice cooling. After heating to reflux for 1 hour,
The mixture was allowed to cool to room temperature and the precipitated solid was collected by filtration to give the compound 2-amino-4-methoxy-7-phenylbenzothiazole hydrobromide. The obtained compound was added to a 48% hydrobromic acid aqueous solution, and the mixture was heated under reflux for 3 days. After allowing to cool, it was concentrated under reduced pressure. Acetic anhydride and pyridine were added to the obtained compound, and 2 days and nights,
Stir at room temperature. Water was added to the reaction solution, and the precipitated solid was collected by filtration and washed successively with water, ethanol, diethyl ether and hexane to give 2-acetylamino-4-acetoxy-7-phenylbenzothiazole. 1M for the obtained compound
Aqueous sodium hydroxide solution and methanol were added, and the mixture was stirred at room temperature for 30 minutes. Water was added, the mixture was extracted with ethyl acetate, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure to give 2-acetylamino-4-hydroxy-7-phenylbenzothiazole. 2,6-lutidine was added to the obtained compound, trifluoromethanesulfonic anhydride was added dropwise under ice cooling, and the mixture was stirred overnight at room temperature. Then, 0.5 M hydrochloric acid aqueous solution was added, and the mixture was extracted with diethyl ether. The organic layer was washed with 0.5 M aqueous hydrochloric acid solution, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. DMF, triethylamine, formic acid (0.
88 ml), 1,3-bis (diphenylphosphino) propane and palladium acetate were added, and the mixture was stirred at 40 ° C. for 5 hours. Water was added to the reaction mixture, and the mixture was extracted with a 1: 1 mixed solvent of ethyl acetate and toluene. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure, and the obtained residue was crystallized from ethyl acetate to give 2-acetylamino-7-phenylbenzothiazole. Methanol and 1 M were added to the obtained compound.
An aqueous solution of sodium hydroxide was added, and the mixture was stirred at 50 ° C for 2 days and nights. After distilling off methanol under reduced pressure, extraction with ethyl acetate,
After drying over anhydrous magnesium sulfate, the mixture was concentrated under reduced pressure. The precipitated solid is washed with diethyl ether / hexane to give 2-
Amino-7-phenylbenzothiazole (Compound S-74) was obtained. FAB-MS: 227 [(M + H) + ] In the same manner as in Reference Example 4, Compound S-85 shown in Table 49 below was produced.
【0053】参考例5(化合物S-75)
2,4-ジクロロ-5-ホルミルチアゾールのDMF溶液にアジ化
ナトリウムを加え、50℃にて2時間加熱攪拌した。反応
混合物に水及び酢酸エチルを加え、有機層を分液後、5
%食塩水及び飽和食塩水で順次洗浄し、無水硫酸マグネ
シウムで乾燥後、濃縮した。得られた残渣をシリカゲル
カラムクロマトグラフィー(酢酸エチル/ヘキサン)で
精製し、2-アジド-4-クロロ-5-ホルミルチアゾールを得
た。得られた化合物のTHF溶液にトリフェニルホスフィ
ンを加え1時間加熱還流した。溶媒を減圧留去した後、
残渣に酢酸及び水を加え、100℃で2時間加熱攪拌した。
溶媒を約1/4に濃縮し、析出した固体を濾取し、水、
エタノール及びジエチルエーテルで順次洗浄して、2-ア
ミノ-4-クロロ-5-ホルミルチアゾールを得た。得られた
化合物)のTHF溶液に(Boc)2O及びジメチルアミノピリジ
ンを加え、1時間加熱還流した。溶媒を減圧下留去し、
残渣をシリカゲルカラムクロマトグラフィー(酢酸エチ
ル/ヘキサン)で精製して、t-ブチル (4-クロロ-5-ホ
ルミルチアゾール-2-イル)カルバマートを得た。得られ
た化合物とチオフェノールのエタノール溶液に、約3 M
NaOEt-エタノール溶液を加え、1時間加熱還流した。反
応液に冷水を加えた後、濃縮し、クロロホルムを加え有
機層を分液した。水層をクロロホルムで抽出し、合わせ
た有機層を、飽和食塩水で洗浄し、無水硫酸マグネシウ
ムで乾燥後、濃縮した。残渣をシリカゲルカラムクロマ
トグラフィー(酢酸エチル/ヘキサン)で精製して、t-
ブチル (5-ホルミル-4-フェニルスルファニルチアゾー
ル-2-イル)カルバマートを得た。t-ブチル (4-クロロ-5
-ホルミルチアゾール-2-イル)カルバマートのTHF溶液に
アルゴン雰囲気下、-78℃で0.63 M 臭化イソプロピルマ
グネシウム-THF溶液をゆっくり加え、1時間攪拌した
後、更に室温で30分攪拌した。反応液に飽和塩化アンモ
ニウム水溶液及び酢酸エチルを加え、有機層を分液後、
水層を酢酸エチルで抽出した。有機層を合わせ、飽和食
塩水で洗浄し、無水硫酸マグネシウムで乾燥後、濃縮し
た。残渣をシリカゲルカラムクロマトグラフィー(酢酸
エチル/ヘキサン)で精製して、t-ブチル [4-クロロ-5
-(1-ヒドロキシ-2-メチルプロピル)チアゾール-2-イル]
カルバマート及びt-ブチル (4-クロロ-5-ヒドロキシメ
チルチアゾール-2-イル)カルバマートを得た。t-ブチル
[4-クロロ-5-(1-ヒドロキシ-2-メチルプロピル)チアゾ
ール-2-イル]カルバマートのTFA溶液にトリエチルシラ
ンを加え、室温にて2時間攪拌した。溶媒を減圧留去
し、残渣に飽和炭酸水素ナトリウム及びクロロホルムを
加え、有機層を分液後、水層をクロロホルムで抽出し
た。合わせた有機層を飽和食塩水で洗浄し、無水硫酸マ
グネシウムで乾燥後、濃縮した。残渣をシリカゲルカラ
ムクロマトグラフィー(酢酸エチル/ヘキサン)で精製
して、2-アミノ-4-クロロ-5-イソブチルチアゾール(化
合物S-75)を得た。FAB-MS: 191 [(M+H)+]
参考例5と同様にして、後記表49に示す化合物S-87を
製造した。
参考例6(化合物S-76)
t-ブチル (4-クロロ-5-ホルミルチアゾール-2-イル)カ
ルバマートに、tBuOH、水、2-メチル-2-ブテン及びリン
酸二水素カリウム(8.87g)を加え、氷冷下、亜塩素酸ナ
トリウム水溶液を滴下した。その後室温で4時間攪拌
し、亜塩素酸ナトリウム)を同様に氷冷下加え、更に室
温で3時間攪拌した。反応混合物に酢酸エチルを加え、
5%硫酸水素カリウム水溶液で洗浄し、無水硫酸マグネシ
ウムで乾燥後、減圧下濃縮した。析出した固体をジエチ
ルエーテルで洗浄して、2-t-ブトキシカルボニルアミノ
-4-クロロチアゾール-5-カルボン酸を得た。得られた化
合物のDMF溶液にメタノール、WSC塩酸塩及び4-ジメチル
アミノピリジンを加え、一晩攪拌した。溶媒を減圧下留
去し、水を加え、酢酸エチル-トルエン1:1混合溶媒で抽
出した。有機層を無水硫酸マグネシウムで乾燥後減圧下
濃縮した。析出した固体をヘキサンで洗浄して、メチル
2-t-ブトキシカルボニルアミノ-4-クロロチアゾール-5
-カルボン酸を得た。得られた化合物を用い、参考例5
と同様にして、t-ブチル [4-クロロ-5-(1-ヒドロキシ-1
-メチルエチル)チアゾール-2-イル]カルバマート及び2-
アミノ-4-クロロ-5-(1-メチルエチル)チアゾール(化合
物S-76)を得た。Reference Example 5 (Compound S-75) Sodium azide was added to a DMF solution of 2,4-dichloro-5-formylthiazole, and the mixture was heated with stirring at 50 ° C for 2 hours. Water and ethyl acetate were added to the reaction mixture, the organic layer was separated, and
The extract was washed successively with% saline and saturated saline, dried over anhydrous magnesium sulfate, and concentrated. The obtained residue was purified by silica gel column chromatography (ethyl acetate / hexane) to give 2-azido-4-chloro-5-formylthiazole. Triphenylphosphine was added to a THF solution of the obtained compound, and the mixture was heated under reflux for 1 hour. After distilling off the solvent under reduced pressure,
Acetic acid and water were added to the residue, and the mixture was heated with stirring at 100 ° C. for 2 hours.
The solvent was concentrated to about 1/4, the precipitated solid was collected by filtration, and water,
It was washed successively with ethanol and diethyl ether to give 2-amino-4-chloro-5-formylthiazole. (Boc) 2 O and dimethylaminopyridine were added to a THF solution of the obtained compound), and the mixture was heated under reflux for 1 hour. The solvent was distilled off under reduced pressure,
The residue was purified by silica gel column chromatography (ethyl acetate / hexane) to give t-butyl (4-chloro-5-formylthiazol-2-yl) carbamate. About 3 M of the obtained compound and thiophenol in ethanol
A NaOEt-ethanol solution was added, and the mixture was heated under reflux for 1 hr. Cold water was added to the reaction solution, which was then concentrated, chloroform was added, and the organic layer was separated. The aqueous layer was extracted with chloroform, and the combined organic layers were washed with saturated brine, dried over anhydrous magnesium sulfate, and concentrated. The residue was purified by silica gel column chromatography (ethyl acetate / hexane) to give t-
Butyl (5-formyl-4-phenylsulfanylthiazol-2-yl) carbamate was obtained. t-butyl (4-chloro-5
A 0.63 M isopropylmagnesium bromide-THF solution was slowly added to the THF solution of -formylthiazol-2-yl) carbamate at -78 ° C under an argon atmosphere, and the mixture was stirred for 1 hour and further stirred at room temperature for 30 minutes. A saturated aqueous ammonium chloride solution and ethyl acetate were added to the reaction solution, and the organic layer was separated,
The aqueous layer was extracted with ethyl acetate. The organic layers were combined, washed with saturated brine, dried over anhydrous magnesium sulfate, and concentrated. The residue was purified by silica gel column chromatography (ethyl acetate / hexane) to give t-butyl [4-chloro-5].
-(1-Hydroxy-2-methylpropyl) thiazol-2-yl]
Carbamate and t-butyl (4-chloro-5-hydroxymethylthiazol-2-yl) carbamate were obtained. t-butyl
Triethylsilane was added to a TFA solution of [4-chloro-5- (1-hydroxy-2-methylpropyl) thiazol-2-yl] carbamate, and the mixture was stirred at room temperature for 2 hours. The solvent was evaporated under reduced pressure, saturated sodium hydrogen carbonate and chloroform were added to the residue, the organic layer was separated, and the aqueous layer was extracted with chloroform. The combined organic layers were washed with saturated brine, dried over anhydrous magnesium sulfate, and concentrated. The residue was purified by silica gel column chromatography (ethyl acetate / hexane) to give 2-amino-4-chloro-5-isobutylthiazole (Compound S-75). FAB-MS: 191 [(M + H) + ] In the same manner as in Reference Example 5, Compound S-87 shown in Table 49 below was produced. Reference Example 6 (Compound S-76) t-Butyl (4-chloro-5-formylthiazol-2-yl) carbamate, tBuOH, water, 2-methyl-2-butene and potassium dihydrogen phosphate (8.87 g) Was added, and an aqueous solution of sodium chlorite was added dropwise under ice cooling. Then, the mixture was stirred at room temperature for 4 hours, sodium chlorite) was similarly added under ice cooling, and the mixture was further stirred at room temperature for 3 hours. Ethyl acetate was added to the reaction mixture,
The extract was washed with 5% aqueous potassium hydrogen sulfate solution, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The precipitated solid is washed with diethyl ether and treated with 2-t-butoxycarbonylamino.
-4-Chlorothiazole-5-carboxylic acid was obtained. Methanol, WSC hydrochloride and 4-dimethylaminopyridine were added to the obtained DMF solution of the compound, and the mixture was stirred overnight. The solvent was evaporated under reduced pressure, water was added, and the mixture was extracted with a mixed solvent of ethyl acetate-toluene 1: 1. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The precipitated solid is washed with hexane to remove methyl
2-t-butoxycarbonylamino-4-chlorothiazole-5
-The carboxylic acid is obtained. Using the obtained compound, Reference Example 5
Similarly to, t-butyl [4-chloro-5- (1-hydroxy-1
-Methylethyl) thiazol-2-yl] carbamate and 2-
Amino-4-chloro-5- (1-methylethyl) thiazole (Compound S-76) was obtained.
【0054】参考例7(化合物S-77)
2-t-ブトキシカルボニルアミノ-4-クロロチアゾール-5-
カルボン酸のDMF溶液にHOBt、WSC塩酸塩、ジイソプロピ
ルエチルアミン及びN,O-ジメチルヒドロキシルアミン塩
酸塩を加え、室温で4時間攪拌した。溶媒を減圧留去
後、5%硫酸水素ナトリウム水溶液を加え、酢酸エチルで
抽出した。飽和炭酸水素ナトリウム水溶液、水及び飽和
食塩水で順次洗い、有機層を無水硫酸マグネシウムで乾
燥後、減圧下濃縮し、N,O-ジメチル 5-[4-クロロ-2-(t-
ブトキシカルボニルアミノ)チアゾール]カルボヒドロキ
サマートを得た。得られた化合物を用い、参考例5と同
様にして、順次、5-アセチル-2-t-ブトキシカルボニル
アミノ-4-クロロチアゾール、t-ブチル [4-クロロ-5-(1
-ヒドロキシ-1-メチルプロピル)チアゾール-2-イル]カ
ルバマート、及び2-アミノ-4-クロロ-5-(1-メチルプロ
ピル)チアゾール(化合物S-77)[2-アミノ-4-クロロ-5-(1
-メチル-1-プロペニル)チアゾールとの約4:5混合物]を
得た。参考例7と同様にして、後記表49に示す化合物
S-93を製造した。
参考例8(化合物S-94)
ヨウ素、マグネシウム及びTHF混合物に、室温で攪拌
下、反応の発熱により環流しながら、3-ブロモアニソー
ルのTHF溶液を少しずつ加えた。60℃にて1.5時間加熱環
流し、その後室温まで放冷した。反応混合物を、スルフ
リルクロリドのヘキサン溶液に氷冷下滴下した。30分間
氷冷下攪拌後、水を加え、酢酸エチルで抽出した。有機
層を水で洗い、無水硫酸マグネシウムで乾燥後、減圧下
濃縮して、粗製の3-メトキシベンゼンスルホニルクロリ
ド(化合物S-94)を得た。参考例8と同様にして、後記表
50に示す化合物S-100〜S-102、S-110及びS-111を製造
した。Reference Example 7 (Compound S-77) 2-t-Butoxycarbonylamino-4-chlorothiazole-5-
HOBt, WSC hydrochloride, diisopropylethylamine and N, O-dimethylhydroxylamine hydrochloride were added to the DMF solution of carboxylic acid, and the mixture was stirred at room temperature for 4 hours. The solvent was evaporated under reduced pressure, 5% aqueous sodium hydrogen sulfate solution was added, and the mixture was extracted with ethyl acetate. It was washed successively with saturated aqueous sodium hydrogen carbonate solution, water and saturated brine, the organic layer was dried over anhydrous magnesium sulfate, and concentrated under reduced pressure to give N, O-dimethyl 5- [4-chloro-2- (t-
Butoxycarbonylamino) thiazole] carbohydroxamate was obtained. Using the obtained compound, in the same manner as in Reference Example 5, 5-acetyl-2-t-butoxycarbonylamino-4-chlorothiazole and t-butyl [4-chloro-5- (1
-Hydroxy-1-methylpropyl) thiazol-2-yl] carbamate, and 2-amino-4-chloro-5- (1-methylpropyl) thiazole (Compound S-77) [2-amino-4-chloro-5 -(1
-Methyl-1-propenyl) thiazole about 4: 5 mixture] was obtained. Compounds shown in Table 49 below were prepared in the same manner as in Reference Example 7.
S-93 was manufactured. Reference Example 8 (Compound S-94) To a mixture of iodine, magnesium and THF, a THF solution of 3-bromoanisole was added little by little while stirring at room temperature while refluxing due to the heat of reaction. The mixture was refluxed by heating at 60 ° C for 1.5 hours, and then allowed to cool to room temperature. The reaction mixture was added dropwise to a hexane solution of sulfuryl chloride under ice cooling. After stirring for 30 minutes under ice cooling, water was added and the mixture was extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure to give crude 3-methoxybenzenesulfonyl chloride (Compound S-94). In the same manner as in Reference Example 8, compounds S-100 to S-102, S-110 and S-111 shown in Table 50 below were produced.
【0055】参考例9(化合物S-95)
1-クロロ-3,4-ジニトロベンゼン、亜硫酸ナトリウム及
び水の混合物を18.5時間加熱環流した。その後室温まで
放冷し、析出した固体を濾取し、粗製の5-クロロ-2-ニ
トロベンゼンスルホン酸ナトリウムを得た。五塩化リン
及びオキシ塩化リンの混合物を80℃にて攪拌していると
ころに上記ナトリウム塩を徐々に加え、3時間80℃にて
加熱攪拌した。減圧下濃縮し、更にトルエンを加え、減
圧下濃縮後、残渣をトルエンに溶解させ、飽和炭酸水素
ナトリウム水溶液及び飽和食塩水で順次洗浄し、無水硫
酸ナトリウムで乾燥後減圧濃縮し、粗製の5-クロロ-2-
ニトロベンゼンスルホニルクロリド(化合物S-95)。
参考例10(化合物S-96)
氷冷下、クロロ硫酸に4-ブロモアニソールを滴下し、室
温で3時間攪拌した。反応混合物を氷水にあけ、析出し
た固体を濾取した後、酢酸エチルに溶解し、飽和炭酸水
素ナトリウム水溶液で洗浄、無水硫酸マグネシウムで乾
燥後、減圧下濃縮し、粗製の5-ブロモ-2-メトキシベン
ゼンスルホニルクロリド(化合物S-96)を得た。参考例
10と同様にして、後記表50に示す化合物S-109、S-1
12、S-113及びS-115を製造した。Reference Example 9 (Compound S-95) A mixture of 1-chloro-3,4-dinitrobenzene, sodium sulfite and water was heated under reflux for 18.5 hours. Then, the mixture was allowed to cool to room temperature and the precipitated solid was collected by filtration to obtain crude sodium 5-chloro-2-nitrobenzenesulfonate. While the mixture of phosphorus pentachloride and phosphorus oxychloride was stirred at 80 ° C, the above sodium salt was gradually added, and the mixture was heated and stirred at 80 ° C for 3 hours. Concentrate under reduced pressure, further add toluene, concentrate under reduced pressure, dissolve the residue in toluene, wash with saturated aqueous sodium hydrogen carbonate solution and saturated brine successively, dry over anhydrous sodium sulfate and concentrate under reduced pressure to give crude 5- Chloro-2-
Nitrobenzenesulfonyl chloride (Compound S-95). Reference Example 10 (Compound S-96) 4-Bromoanisole was added dropwise to chlorosulfuric acid under ice cooling, and the mixture was stirred at room temperature for 3 hours. The reaction mixture was poured into ice water, and the precipitated solid was collected by filtration, dissolved in ethyl acetate, washed with saturated aqueous sodium hydrogen carbonate solution, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure to give crude 5-bromo-2- Methoxybenzenesulfonyl chloride (Compound S-96) was obtained. Compounds S-109 and S-1 shown in Table 50 below were prepared in the same manner as in Reference Example 10.
12, S-113 and S-115 were produced.
【0056】参考例11(化合物S-97)
3-ブロモアニソール、水、1 M 塩酸水溶液及びヒドロ
キシルアミン塩酸塩の混合物に加熱環流下、熱した包水
クロラール水溶液を一気に加え、30分間加熱環流した。
室温まで放冷後、析出した固体を濾取し、その濾過物を
酢酸エチルに溶解させ、水で洗浄し、有機層を無水硫酸
マグネシウムにて乾燥後、減圧濃縮した。析出した固体
をクロロホルムで洗浄し、粗製の3-ブロモイソニトロソ
アセトアニリドを得た。得られた化合物に氷冷下、水及
び濃硫酸を加え、75℃で1時間攪拌後に室温まで放冷し
た。反応混合物を氷に注ぎ酢酸エチルで抽出し、有機層
を無水硫酸マグネシウムで乾燥後、減圧下濃縮した。得
られた残渣に1 M 水酸化ナトリウム水溶液及び酢酸を加
え、析出した4-ブロモイサチンを濾別した。母液に濃塩
酸を加えpHを1とし、析出した固体を濾取して、6-ブロ
モイサチンを得た。6-ブロモイサチンと1 M 水酸化ナ
トリウム水溶液の混合物を氷冷下攪拌下に30%過酸化水
素を滴下した。室温で1時間攪拌後析出した固体を濾取
し、水で洗い、4-ブロモアントラニル酸を得た。4-ブロ
モアントラニル酸のDMF溶液に、ジメチル硫酸及びトリ
エチルアミンを加え、室温で6.5時間攪拌した。減圧下
濃縮後、飽和食塩水を加え、酢酸エチルで抽出した。有
機層を、飽和炭酸水素ナトリウム水溶液、1 M 水酸化
ナトリウム水溶液及び飽和食塩水で順次洗浄し、無水硫
酸マグネシウムで乾燥、減圧下濃縮した。得られた残渣
をシリカゲルカラムクロマトグラフィー(酢酸エチル/
ヘキサン)で精製して、メチル 2-アミノ-4-ブロモ安息
香酸を得た。得られた化合物、酢酸及び濃塩酸の混合物
を-5℃で攪拌下、亜硝酸ナトリウムの水溶液を滴下し、
1時間その温度で攪拌した。一方、塩化銅(I)、塩化銅
(II)、酢酸及び水を-5℃で攪拌下にSO2を1.5時間バブリ
ングした混合物に、先の反応混合物を0℃以下で加え
た。その後1時間室温で攪拌後、氷水にあけ、析出した
固体を濾取した。濃アンモニア水に氷冷下、濾過物を加
え、室温で終夜攪拌した。減圧下濃縮し、飽和炭酸水素
ナトリウム水溶液を加え、ジエチルエーテルで洗浄し、
水層を濃塩酸にてpH1とし、クロロホルムで抽出した。
有機層を無水硫酸マグネシウムで乾燥後、減圧下濃縮
し、6-ブロモ-1,2-ベンゾイソチアゾール-3(2H)-オン-
1,1-ジオキシドを得た。得られた化合物と五塩化リンの
混合物を120℃で1.5時間攪拌し、室温まで放冷後、氷水
にあけた。そのまま30分間攪拌後酢酸エチルで抽出、有
機層を飽和炭酸水素ナトリウム水溶液で洗浄し、無水硫
酸マグネシウムで乾燥後、減圧下濃縮して、5-ブロモ-2
-シアノベンゼンスルホニルクロリド(化合物S-97)を得
た。参考例11と同様にして、後記表50に示す化合物
S-103〜S-106、S-108及びS-114を製造した。
参考例12(化合物S-98)
5-ブロモ-2-メトキシベンゼンスルホニルクロリドと硫
酸の混合物を氷冷し、硝酸カリウムを10℃以下で加え、
室温で2.5時間攪拌した。反応混合物を氷水にあけ、炭
酸カリウムでpH1〜2とした後、酢酸エチルで抽出、飽和
炭酸水素ナトリウム水溶液及び飽和食塩水で順次洗浄
し、無水硫酸ナトリウムで乾燥後減圧下濃縮し、粗製の
5-ブロモ-3-ニトロ-2-メトキシベンゼンスルホニルクロ
リド(化合物S-98)を得た。参考例12と同様にして、後
記表50に示す化合物S-107及びS-116を製造した。Reference Example 11 (Compound S-97) To a mixture of 3-bromoanisole, water, a 1 M hydrochloric acid aqueous solution and hydroxylamine hydrochloride was heated under reflux, a heated aqueous chloral solution was added all at once, and the mixture was heated under reflux for 30 minutes. .
After cooling to room temperature, the precipitated solid was collected by filtration, the filtered material was dissolved in ethyl acetate, washed with water, the organic layer was dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The precipitated solid was washed with chloroform to obtain crude 3-bromoisonitrosoacetanilide. Water and concentrated sulfuric acid were added to the obtained compound under ice cooling, and the mixture was stirred at 75 ° C. for 1 hour and allowed to cool to room temperature. The reaction mixture was poured into ice and extracted with ethyl acetate. The organic layer was dried over anhydrous magnesium sulfate and then concentrated under reduced pressure. A 1 M aqueous sodium hydroxide solution and acetic acid were added to the obtained residue, and the precipitated 4-bromoisatin was filtered off. Concentrated hydrochloric acid was added to the mother liquor to adjust the pH to 1, and the precipitated solid was collected by filtration to obtain 6-bromoisatin. A mixture of 6-bromoisatin and a 1 M aqueous sodium hydroxide solution was added dropwise with 30% hydrogen peroxide with stirring under ice cooling. After stirring at room temperature for 1 hour, the precipitated solid was collected by filtration and washed with water to obtain 4-bromoanthranilic acid. Dimethylsulfate and triethylamine were added to a DMF solution of 4-bromoanthranilic acid, and the mixture was stirred at room temperature for 6.5 hours. After concentration under reduced pressure, saturated brine was added, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with saturated aqueous sodium hydrogen carbonate solution, 1 M aqueous sodium hydroxide solution and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue is subjected to silica gel column chromatography (ethyl acetate /
Hexane) to give methyl 2-amino-4-bromobenzoic acid. The resulting compound, a mixture of acetic acid and concentrated hydrochloric acid was stirred at -5 ° C, an aqueous solution of sodium nitrite was added dropwise,
Stir for 1 hour at that temperature. On the other hand, copper (I) chloride, copper chloride
The above reaction mixture was added at 0 ° C. or lower to a mixture of (II), acetic acid and water at −5 ° C. with bubbling SO 2 for 1.5 hours. After stirring for 1 hour at room temperature, the mixture was poured into ice water and the precipitated solid was collected by filtration. The filtrate was added to concentrated aqueous ammonia under ice cooling, and the mixture was stirred at room temperature overnight. Concentrate under reduced pressure, add saturated aqueous sodium hydrogen carbonate solution, wash with diethyl ether,
The aqueous layer was adjusted to pH 1 with concentrated hydrochloric acid and extracted with chloroform.
The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure to give 6-bromo-1,2-benzisothiazol-3 (2H) -one-
1,1-dioxide was obtained. The mixture of the obtained compound and phosphorus pentachloride was stirred at 120 ° C. for 1.5 hours, allowed to cool to room temperature, and then poured into ice water. The mixture was stirred for 30 minutes as it was, extracted with ethyl acetate, the organic layer was washed with a saturated aqueous sodium hydrogen carbonate solution, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure to give 5-bromo-2.
-Cyanobenzenesulfonyl chloride (Compound S-97) was obtained. Compounds shown in Table 50 below were prepared in the same manner as in Reference Example 11.
S-103 to S-106, S-108 and S-114 were produced. Reference Example 12 (Compound S-98) A mixture of 5-bromo-2-methoxybenzenesulfonyl chloride and sulfuric acid was ice-cooled, and potassium nitrate was added at 10 ° C or lower,
The mixture was stirred at room temperature for 2.5 hours. The reaction mixture was poured into ice water, adjusted to pH 1-2 with potassium carbonate, extracted with ethyl acetate, washed successively with saturated aqueous sodium hydrogen carbonate solution and saturated brine, dried over anhydrous sodium sulfate and concentrated under reduced pressure to give a crude product.
5-Bromo-3-nitro-2-methoxybenzenesulfonyl chloride (Compound S-98) was obtained. In the same manner as in Reference Example 12, compounds S-107 and S-116 shown in Table 50 below were produced.
【0057】参考例13(化合物S-28)
化合物179のDMF溶液にシアン化亜鉛及びテトラキス(ト
リフェニルホスフィン)パラジウムを順次加え、80℃で2
4時間攪拌した。反応液を氷水に注加し、酢酸エチルで
抽出後、飽和アンモニア水、水及び飽和食塩水で順次洗
浄した。有機層を無水硫酸ナトリウムで乾燥後、減圧下
濃縮し、シリカゲルカラムクロマトグラフィー(酢酸エ
チル/トルエン)で精製し、N-(5-t-ブチル-3,4-ジメチ
ルチアゾール-2(3H)-イリデン)-5-シアノ-2-メトキシベ
ンゼンスルホンアミド(化合物S-28)を得た。FAB-MS: 38
0 [(M+H)+]
参考例14(化合物S-17)
化合物179の1,2-ジメトキシエタン溶液に2 M 炭酸ナト
リウム水溶液、フェニルホウ酸及びテトラキス(トリフ
ェニルホスフィン)パラジウムを順次加え、80℃で48時
間攪拌した。反応液に氷冷下、30%過酸化水素水を加
え、酢酸エチルで抽出、水及び飽和食塩水で洗浄し、硫
酸ナトリウム乾燥後、減圧下濃縮した。シリカゲルカラ
ムクロマトグラフィー(酢酸エチル/トルエン)で精製
後、酢酸エチル-ヘキサンより結晶化して、N-(5-t-ブチ
ル-3,4-ジメチル-3H-チアゾール-2-イリデン)-2-メトキ
シ-5-フェニルベンゼンスルホンアミド(化合物S-17)を
得た。FAB-MS: 431 [(M+H)+]
参考例14と同様にして、後記表51に示す化合物S-18
〜S-22を製造した。Reference Example 13 (Compound S-28) Zinc cyanide and tetrakis (triphenylphosphine) palladium were sequentially added to a DMF solution of Compound 179, and the mixture was heated at 80 ° C. for 2 minutes.
It was stirred for 4 hours. The reaction solution was poured into ice water, extracted with ethyl acetate, and washed successively with saturated aqueous ammonia, water and saturated saline. The organic layer was dried over anhydrous sodium sulfate, concentrated under reduced pressure, purified by silica gel column chromatography (ethyl acetate / toluene), and N- (5-t-butyl-3,4-dimethylthiazole-2 (3H)- Ylidene) -5-cyano-2-methoxybenzenesulfonamide (Compound S-28) was obtained. FAB-MS: 38
0 [(M + H) + ] Reference Example 14 (Compound S-17) To a 1,2-dimethoxyethane solution of Compound 179, 2 M aqueous sodium carbonate solution, phenylboric acid and tetrakis (triphenylphosphine) palladium were sequentially added, The mixture was stirred at ℃ for 48 hours. 30% hydrogen peroxide solution was added to the reaction solution under ice cooling, extracted with ethyl acetate, washed with water and saturated brine, dried over sodium sulfate, and concentrated under reduced pressure. After purification by silica gel column chromatography (ethyl acetate / toluene), crystallize from ethyl acetate-hexane to give N- (5-t-butyl-3,4-dimethyl-3H-thiazol-2-ylidene) -2-methoxy. -5-Phenylbenzenesulfonamide (Compound S-17) was obtained. FAB-MS: 431 [(M + H) + ] Compound S-18 shown in Table 51 below was prepared in the same manner as in Reference Example 14.
~ S-22 was manufactured.
【0058】参考例15(化合物S-23)
化合物179のDMF溶液にトリエチルアミン、4-クロロスチ
レン及びビス(トリフェニルホスフィン)パラジウムジク
ロリドを順次加え、110℃で12時間攪拌した。反応液を
減圧下濃縮し、シリカゲルカラムクロマトグラフィー
(酢酸エチル/ベンゼン)で精製後、酢酸エチル-ヘキ
サンより結晶化して、N-(5-t-ブチル-3,4-ジメチル-3H-
チアゾール-2-イリデン)-2-メトキシ-5-(4-クロロスチ
リル)ベンゼンスルホンアミド(化合物S-23)を得た。FAB
-MS: 457 [(M+H)+]
参考例15と同様にして、後記表51に示す化合物S-24
及びS-25を製造した。
参考例16(化合物S-2)
化合物1、四塩化炭素、N-ブロモスクシンイミド及び2,
2'-アゾビスイソブチロニトリルの混合物を、1時間加熱
環流下攪拌した。放冷後、酢酸エチルを加え、1M 水酸
化ナトリウム水溶液で洗浄し、無水硫酸マグネシウムで
乾燥後、減圧下濃縮した。析出した固体を酢酸エチルで
洗浄して、N-(4-ブロモメチル-5-t-ブチル-3-メチル-3H
-チアゾール-2-イリデン)-3-ニトロベンゼンスルホンア
ミド(化合物S-2)を得た。FAB-MS: 448, 450 [(M+H)+]Reference Example 15 (Compound S-23) To a DMF solution of Compound 179, triethylamine, 4-chlorostyrene and bis (triphenylphosphine) palladium dichloride were sequentially added and stirred at 110 ° C for 12 hours. The reaction mixture was concentrated under reduced pressure, purified by silica gel column chromatography (ethyl acetate / benzene), and crystallized from ethyl acetate-hexane to give N- (5-t-butyl-3,4-dimethyl-3H-).
Thiazol-2-ylidene) -2-methoxy-5- (4-chlorostyryl) benzenesulfonamide (Compound S-23) was obtained. FAB
-MS: 457 [(M + H) + ] Compound S-24 shown in Table 51 described below in the same manner as in Reference Example 15.
And S-25 were manufactured. Reference Example 16 (Compound S-2) Compound 1, carbon tetrachloride, N-bromosuccinimide and 2,
The mixture of 2'-azobisisobutyronitrile was stirred with heating under reflux for 1 hour. After cooling, ethyl acetate was added, the mixture was washed with 1M aqueous sodium hydroxide solution, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The precipitated solid was washed with ethyl acetate, and N- (4-bromomethyl-5-t-butyl-3-methyl-3H
-Thiazole-2-ylidene) -3-nitrobenzenesulfonamide (Compound S-2) was obtained. FAB-MS: 448, 450 [(M + H) + ]
【0059】参考例17(化合物S-4)
化合物S-3のアセトニトリル溶液に氷冷下、ヨウ化トリ
メチルシランを加え室温で30分間攪拌した。酢酸エチル
を加え、水で洗浄し、無水硫酸マグネシウムで乾燥後、
減圧下濃縮し、N-[3,4-ジメチル-5-(1-メチル-2-オキソ
エチル)チアゾール-2(3H)-イリデン]-3-ニトロベンゼン
スルホンアミド(化合物S-4)を得た。
参考例18(化合物S-8)
化合物114、アセトン及び水の混合物に、ピリジニウム
p-トルエンスルホナートを加え、室温で1時間、その後
加熱環流下4時間攪拌した。放冷後アセトンを減圧下留
去し、酢酸エチルで抽出、無水硫酸マグネシウムで乾燥
後、減圧濃縮して、N-(5-t-ブチル-4-メチルチアゾール
-2-イル)-3-ニトロ-N-(4-オキソブチル)ベンゼンスルホ
ンアミド(化合物S-8)を得た。参考例18と同様にし
て、後記表51に示す化合物S-6〜S-7、及び表17に示
す化合物S-9を製造した。Reference Example 17 (Compound S-4) To a solution of compound S-3 in acetonitrile was added trimethylsilane iodide under ice cooling and the mixture was stirred at room temperature for 30 minutes. Ethyl acetate was added, washed with water, dried over anhydrous magnesium sulfate,
Concentration under reduced pressure gave N- [3,4-dimethyl-5- (1-methyl-2-oxoethyl) thiazole-2 (3H) -ylidene] -3-nitrobenzenesulfonamide (Compound S-4). Reference Example 18 (Compound S-8) Pyridinium was added to a mixture of Compound 114, acetone and water.
p-Toluenesulfonate was added, and the mixture was stirred at room temperature for 1 hour and then heated under reflux for 4 hours. After cooling, acetone was distilled off under reduced pressure, extracted with ethyl acetate, dried over anhydrous magnesium sulfate and concentrated under reduced pressure to give N- (5-t-butyl-4-methylthiazole).
-2-yl) -3-nitro-N- (4-oxobutyl) benzenesulfonamide (Compound S-8) was obtained. In the same manner as in Reference Example 18, compounds S-6 to S-7 shown in Table 51 below and compound S-9 shown in Table 17 were produced.
【0060】参考例19(化合物S-47)
化合物263のジクロロメタン溶液に、氷冷下、ヨウ化亜
鉛及びトリメチルシリルシアニドを加え攪拌後、ジエチ
ルエーテルを加え、更にトリメチルシリルシアニドを加
え室温で14時間攪拌した。反応混合物に酢酸エチルを加
え、1 M 塩酸水溶液、飽和炭酸水素ナトリウム水溶液及
び飽和食塩水で順次洗浄後、減圧下濃縮し、N-[5-t-ブ
チル-3,4-ジメチルチアゾール-2(3H)-イリデン]-5-クロ
ロ-2-[シアノ(トリメチルシロキシ)メチル]ベンゼンス
ルホンアミド(化合物S-47)を得た。
参考例20(化合物S-56)
化合物244及び4 M 塩化水素-酢酸エチル溶液混合物に、
氷冷下、ジエチル ジチオリン酸を加え、室温で3時間攪
拌した。水を加え、クロロホルムで抽出し、無水硫酸マ
グネシウムで乾燥後、減圧下濃縮した。得られた残渣を
シリカゲルカラムクロマトグラフィー(クロロホルム)
で精製して、2-{[5-t-ブチル-3,4-ジメチルチアゾール-
2(3H)-イリデン]スルファモイル}-4-クロロフェノキシ
チオアセトアミド(化合物S-56)を得た。FAB-MS: 448
[(M+H)+]
参考例20と同様にして、後記表51に示す化合物S-57
を製造した。Reference Example 19 (Compound S-47) Zinc iodide and trimethylsilyl cyanide were added to a dichloromethane solution of compound 263 under ice-cooling, and the mixture was stirred, diethyl ether was added, trimethylsilyl cyanide was further added, and the mixture was stirred at room temperature for 14 hours. It was stirred. Ethyl acetate was added to the reaction mixture, and the mixture was washed successively with 1 M aqueous hydrochloric acid solution, saturated aqueous sodium hydrogen carbonate solution and saturated brine, and concentrated under reduced pressure to give N- [5-t-butyl-3,4-dimethylthiazole-2 ( 3H) -Ylidene] -5-chloro-2- [cyano (trimethylsiloxy) methyl] benzenesulfonamide (Compound S-47) was obtained. Reference Example 20 (Compound S-56) Compound 244 and a 4 M hydrogen chloride-ethyl acetate solution mixture were added,
Diethyldithiophosphoric acid was added under ice cooling, and the mixture was stirred at room temperature for 3 hours. Water was added, the mixture was extracted with chloroform, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue is subjected to silica gel column chromatography (chloroform).
Purified with 2-{[5-t-butyl-3,4-dimethylthiazole-
2 (3H) -ylidene] sulfamoyl} -4-chlorophenoxythioacetamide (Compound S-56) was obtained. FAB-MS: 448
[(M + H) + ] Compound S-57 shown in Table 51 below was prepared in the same manner as in Reference Example 20.
Was manufactured.
【0061】参考例21(化合物S-64)
化合物S-39に48%臭化水素酸水溶液を加え、-5℃で、硫
酸銅(II)・五水和物を加え、更に亜硝酸ナトリウム水溶
液を滴下し、30分間攪拌した。反応混合物に臭化銅(I)
を加え20分間室温で攪拌後、水を加えクロロホルムで抽
出した。有機層を飽和炭酸水素ナトリウム水溶液、1M
塩酸水溶液及び飽和食塩水で順次洗浄し、無水硫酸ナト
リウムで乾燥後、減圧下濃縮した。得られた残渣をシリ
カゲルカラムクロマトグラフィー(クロロホルム)で精
製し、得られた固体をアセトニトリルで洗浄して、N-(5
-t-ブチル-4-メチルチアゾール-2-イル)-3-ブロモ-5-ク
ロロ-2-メトキシベンゼンスルホンアミド(化合物S-64)
を得た。1
H-NMR (DMSO-d6) δ: 12.48 (1H, bs), 8.04 (1H, d),
7.77 (1H, d), 3.87 (3H, s), 2.18 (3H, s), 1.31 (9
H, s);FAB-MS: 453, 455 [(M+H)+]
後記表中、次に示す略号を用いる。No:化合物番号、St
r:構造式、Syn:各表題化合物の製造に使用した原料化
合物番号(記載がない場合は、市販又は自明の化合物を
製造原料として使用)、Pr:1-プロピル、Boc:tBu-O-C
O-、Bn:ベンジル、Hex:ヘキシル、cHex:シクロヘキ
シル、Dat:物理化学的データ(F:FAB-MS[(M+H)+];F
N:FAB-MS [(M-H)-];EI:EI-MS(M+);AP:APCI-MS [(M
+H)+];空欄:未精製のまま次の反応に使用)をそれぞ
れ示す。また、置換基の前の数字は置換位置を示し、数
字が複数個あるものは複数個の置換を示す。例えば4-Cl
-Phは4-クロロフェニルを、2,5-(OMe)2-Phは2,5-ジメト
キシフェニルを、2-OMe-5-Br-Phは2-メトキシ-5-ブロモ
フェニルをそれぞれ示す。Reference Example 21 (Compound S-64) A 48% aqueous solution of hydrobromic acid was added to Compound S-39, copper (II) sulfate pentahydrate was added at -5 ° C, and a sodium nitrite aqueous solution was added. Was added dropwise and stirred for 30 minutes. Copper (I) bromide in the reaction mixture
Was added and stirred at room temperature for 20 minutes, water was added and the mixture was extracted with chloroform. The organic layer was saturated aqueous sodium hydrogen carbonate solution, 1M
The extract was washed successively with aqueous hydrochloric acid solution and saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was purified by silica gel column chromatography (chloroform), the obtained solid was washed with acetonitrile, and N- (5
-t-Butyl-4-methylthiazol-2-yl) -3-bromo-5-chloro-2-methoxybenzenesulfonamide (Compound S-64)
Got 1 H-NMR (DMSO-d 6 ) δ: 12.48 (1H, bs), 8.04 (1H, d),
7.77 (1H, d), 3.87 (3H, s), 2.18 (3H, s), 1.31 (9
H, s); FAB-MS: 453, 455 [(M + H) + ] The following abbreviations are used in the tables below. No: Compound number, St
r: structural formula, Syn: raw material compound number used for production of each title compound (unless otherwise noted, a commercially available or obvious compound is used as a production raw material), Pr: 1-propyl, Boc: tBu-OC
O-, Bn: benzyl, Hex: hexyl, cHex: cyclohexyl, Dat: physicochemical data (F: FAB-MS [(M + H) + ]; F
N: FAB-MS [(MH) - ]; EI: EI-MS (M + ); AP: APCI-MS [(M
+ H) + ]; blank: used in the next reaction without purification). Further, the number before the substituent indicates a substitution position, and the one having a plurality of numbers indicates a plurality of substitutions. For example 4-Cl
-Ph represents 4-chlorophenyl, 2,5- (OMe) 2 -Ph represents 2,5-dimethoxyphenyl, and 2-OMe-5-Br-Ph represents 2-methoxy-5-bromophenyl.
【0062】[0062]
【表3】 [Table 3]
【0063】[0063]
【表4】 [Table 4]
【0064】[0064]
【表5】 [Table 5]
【0065】[0065]
【表6】 [Table 6]
【0066】[0066]
【表7】 [Table 7]
【0067】[0067]
【表8】 [Table 8]
【0068】[0068]
【表9】 [Table 9]
【0069】[0069]
【表10】 [Table 10]
【0070】[0070]
【表11】 [Table 11]
【0071】[0071]
【表12】 [Table 12]
【0072】[0072]
【表13】 [Table 13]
【0073】[0073]
【表14】 [Table 14]
【0074】[0074]
【表15】 [Table 15]
【0075】[0075]
【表16】 [Table 16]
【0076】[0076]
【表17】 [Table 17]
【0077】[0077]
【表18】 [Table 18]
【0078】[0078]
【表19】 [Table 19]
【0079】[0079]
【表20】 [Table 20]
【0080】[0080]
【表21】 [Table 21]
【0081】[0081]
【表22】 [Table 22]
【0082】[0082]
【表23】 [Table 23]
【0083】[0083]
【表24】 [Table 24]
【0084】[0084]
【表25】 [Table 25]
【0085】[0085]
【表26】 [Table 26]
【0086】[0086]
【表27】 [Table 27]
【0087】[0087]
【表28】 [Table 28]
【0088】[0088]
【表29】 [Table 29]
【0089】[0089]
【表30】 [Table 30]
【0090】[0090]
【表31】 [Table 31]
【0091】[0091]
【表32】 [Table 32]
【0092】[0092]
【表33】 [Table 33]
【0093】[0093]
【表34】 [Table 34]
【0094】[0094]
【表35】 [Table 35]
【0095】[0095]
【表36】 [Table 36]
【0096】[0096]
【表37】 [Table 37]
【0097】[0097]
【表38】 [Table 38]
【0098】[0098]
【表39】 [Table 39]
【0099】[0099]
【表40】 [Table 40]
【0100】[0100]
【表41】 [Table 41]
【0101】[0101]
【表42】 [Table 42]
【0102】[0102]
【表43】 [Table 43]
【0103】[0103]
【表44】 [Table 44]
【0104】[0104]
【表45】 [Table 45]
【0105】[0105]
【表46】 [Table 46]
【0106】[0106]
【表47】 [Table 47]
【0107】[0107]
【表48】 [Table 48]
【0108】[0108]
【表49】 [Table 49]
【0109】[0109]
【表50】 [Table 50]
【0110】[0110]
【表51】 [Table 51]
【0111】本発明化合物の作用は以下の薬理試験によ
って確認された。
HIV-1逆転写酵素阻害試験
A) 酵素の調製
Saitoh A等の方法(Microbiol. Immunol., 1990, 34, 5
09-521)に従い酵素の調製を行った。HIV-1逆転写酵素
(RT)の103番目Lysアミノ酸残基をAsnに置換したK103
N、および181番目のTyrをCysに置換したY181Cのアミノ
酸変異組換えHIV-1RTの発現ベクターは、pPG280の103番
目Lysに対応する塩基コドンAAAをAATに(pPG280-K103
N)、181番目のTyrに対応する塩基コドンTATをTGT(pPG
280-Y181C)に置換することで作製した。野生型RT(WT-
RT)および2種類の変異型RT(K103N-RT及びY181C-RT)
は、発現ベクター pPG280、pPG280-K103N及びpPG280-Y1
81Cで形質転換された大腸菌株UT481を用いて調製した。
B) アッセイ
Baba M.等の方法(Proc. Natl. Acad. Sci. USA, 1991,
88, 2356-2360)に準じて実施した。具体的には、50 m
M トリス(ヒドロキシメチル)アミノメタンヒドロクロ
ライド(pH 8.4)、2 mM ジチオスレイトール、100 mM
塩化カリウム、10 mM 塩化マグネシウム、0.1% トリト
ンX-100、1μCi [1',2'-3H]dGTP、テンプレート・プラ
イマーとして0.01U(OD 260nm)poly(rC)・oligo(dG)
12-18、試験物質、逆転写酵素(WT-RTは0.01U、K103N-R
T及びY181C-RTは0.02U)を含む、50μlの液で37℃、1時
間反応させた。5%トリクロロ酢酸で反応を止め、氷中に
て10分放置する。析出物をフィルターにトラップした
後、その放射活性を液体シンチレーションカウンターに
て測定した。3HラベルしたdGTPの取り込みを50%阻害す
る試験物質の濃度をIC50値として算出した(単位μM)。
結果を下記表52に示す。The action of the compound of the present invention was confirmed by the following pharmacological tests. HIV-1 Reverse Transcriptase Inhibition Test A) Enzyme Preparation Method by Saitoh A et al. (Microbiol. Immunol., 1990, 34, 5
09-521) to prepare the enzyme. K103 in which the 103rd Lys amino acid residue of HIV-1 reverse transcriptase (RT) was replaced with Asn
The expression vector of the amino acid mutation recombinant HIV-1RT of Y181C in which Nyr and 181st Tyr were replaced with Cys, the base codon AAA corresponding to 103rd Lys of pPG280 was converted into AAT (pPG280-K103
N), the base codon TAT corresponding to the 181st Tyr is TGT (pPG
280-Y181C). Wild-type RT (WT-
RT) and two mutant RTs (K103N-RT and Y181C-RT)
Are the expression vectors pPG280, pPG280-K103N and pPG280-Y1.
It was prepared using E. coli strain UT481 transformed with 81C. B) Assay Baba M. et al. (Proc. Natl. Acad. Sci. USA, 1991,
88, 2356-2360). Specifically, 50 m
M Tris (hydroxymethyl) aminomethane hydrochloride (pH 8.4), 2 mM dithiothreitol, 100 mM
Potassium chloride, 10 mM magnesium chloride, 0.1% Triton X-100, 1 μCi [1 ', 2'- 3 H] dGTP, 0.01 U (OD 260 nm) poly (rC) oligo (dG) as template primer
12-18 , test substance, reverse transcriptase (0.01U for WT-RT, K103N-R
T and Y181C-RT contained 0.02 U), and reacted with 50 μl of liquid at 37 ° C. for 1 hour. Stop the reaction with 5% trichloroacetic acid and leave it in ice for 10 minutes. After trapping the precipitate in a filter, its radioactivity was measured with a liquid scintillation counter. The concentration of the test substance that inhibits the incorporation of 3 H-labeled dGTP by 50% was calculated as an IC 50 value (unit: μM).
The results are shown in Table 52 below.
【0112】[0112]
【表52】
上記試験の結果、本発明化合物は逆転写酵素阻害剤とし
て有用であることが確認された。[Table 52] As a result of the above test, it was confirmed that the compound of the present invention is useful as a reverse transcriptase inhibitor.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) A61K 31/437 A61K 31/437 31/4439 31/4439 31/454 31/454 31/496 31/496 31/519 31/519 31/5377 31/5377 A61P 31/18 A61P 31/18 C07D 277/54 C07D 277/54 277/60 277/60 277/82 277/82 285/135 417/06 417/06 417/12 417/12 417/14 417/14 471/04 108E 471/04 108 487/04 144 487/04 144 285/12 E (72)発明者 藤井 正大 茨城県つくば市御幸が丘 21 山之内製薬 株式会社内 (72)発明者 大神 哲郎 東京都板橋区蓮根3−17−1 山之内製薬 株式会社内 (72)発明者 増田 直之 茨城県つくば市御幸が丘 21 山之内製薬 株式会社内 (72)発明者 藤安 次郎 茨城県つくば市御幸が丘 21 山之内製薬 株式会社内 (72)発明者 紺谷 徹 茨城県つくば市御幸が丘 21 山之内製薬 株式会社内 (72)発明者 森友 紋子 茨城県つくば市御幸が丘 21 山之内製薬 株式会社内 (72)発明者 陰山 俊治 東京都板橋区蓮根3−17−1 山之内製薬 株式会社内 (72)発明者 井上 洋志 東京都板橋区蓮根3−17−1 山之内製薬 株式会社内 (72)発明者 八田 俊史 東京都板橋区蓮根3−17−1 山之内製薬 株式会社内 (72)発明者 児玉 栄一 京都府京都市伏見区向島庚申町14−1イン ペリアルパレスリバーサイド411号 (72)発明者 松岡 雅雄 滋賀県大津市仰木の里4丁目13番地グラン ドメゾン仰木の里5番館204号 Fターム(参考) 4C036 AD08 AD16 AD17 AD21 AD24 AD27 AD30 4C050 AA01 BB05 CC08 EE03 FF02 GG01 HH04 4C063 AA01 AA03 BB03 BB06 BB07 CC62 CC71 CC73 CC81 CC92 DD07 DD10 DD12 DD25 DD26 DD34 DD47 DD54 DD62 4C065 AA03 BB06 CC01 DD02 EE02 HH01 JJ01 KK04 LL01 PP17 4C086 AA01 AA02 AA03 BC82 BC84 BC85 CB05 GA02 GA04 GA07 GA08 GA09 GA10 MA01 MA04 NA14 ZC55 ─────────────────────────────────────────────────── ─── Continued Front Page (51) Int.Cl. 7 Identification Code FI Theme Coat (Reference) A61K 31/437 A61K 31/437 31/4439 31/4439 31/454 31/454 31/496 31/496 31 / 519 31/519 31/5377 31/5377 A61P 31/18 A61P 31/18 C07D 277/54 C07D 277/54 277/60 277/60 277/82 277/82 285/135 417/06 417/06 417 / 12 417/12 417/14 417/14 471/04 108E 471/04 108 487/04 144 487/04 144 285/12 E (72) Inventor Masahiro Fujii 21 Miyukigaoka, Tsukuba, Ibaraki Yamanouchi Pharmaceutical Co., Ltd. (72) Inventor Tetsuro Ogami 3-17-1, Hasune, Itabashi-ku, Tokyo Yamanouchi Pharmaceutical Co., Ltd. (72) Inventor Naoyuki Masuda 21 Miyukigaoka, Tsukuba City, Ibaraki Prefecture Yamanouchi Pharmaceutical Co., Ltd. (72) Inventor Fujiyasu Jiro 21 Miyukigaoka, Tsukuba-shi, Ibaraki Yamanouchi Pharmaceutical Co., Ltd. (72) Toru Kontani Toru Kontani 21 Miyukigaoka, Tsukuba, Ibaraki Prefecture Yamanouchi Pharmaceutical Co., Ltd. (72) Inventor, Moriko Morinomo Miyukigaoka 21, Tsukuba, Ibaraki Prefecture Yamanouchi Pharmaceutical Co., Ltd. (72) Inventor, Shunji Kageyama 3 Hasune, Itabashi-ku, Tokyo -17-1 Yamanouchi Pharmaceutical Co., Ltd. (72) Inventor Hiroshi Inoue 3-17-1 Hasune, Itabashi-ku, Tokyo Yamanouchi Pharmaceutical Co., Ltd. (72) Toshifumi Hatta 3-17-1 Hasune, Itabashi-ku, Tokyo Yamanouchi Pharmaceutical (72) Inventor Eiichi Kodama No. 411 Imperial Palace Riverside, 14-1, Mukojima-cho, Fushimi-ku, Kyoto-shi, Kyoto Prefecture (72) Inventor Masao Matsuoka 4-chome, Ohgi-sato, Otsu, Shiga Prefecture No. 204 F-term (reference) 4C036 AD08 AD16 AD17 AD21 AD24 AD27 AD30 4C050 AA01 BB05 CC08 EE03 FF02 GG01 HH04 4C063 AA01 AA03 BB03 BB06 BB07 CC62 CC71 CC73 CC81 CC92 DD07 DD02 DD07 DD02 DD02 DD02 DD05 DD02 DD02 DD05 DD02 DD02 DD02 DD54 DD02 DD02 DD02 DD02 DD02 DD02 DD01 DD02 DD02 DD05 DD02 DD02 DD02 DD05 DD02 DD02 DD02 DD01 DD02 JJ01 KK04 LL01 PP17 4C086 A A01 AA02 AA03 BC82 BC84 BC85 CB05 GA02 GA04 GA07 GA08 GA09 GA10 MA01 MA04 NA14 ZC55
Claims (3)
ド誘導体又はその塩。 【化1】 [式中の記号は以下の意味を有する。 a及びb:それぞれ単結合又は二重結合を意味し、少なく
とも一方は単結合であり他方は二重結合である、 R1:aが二重結合、且つ、bが単結合のとき、非存在;a
が単結合、且つ、bが二重結合のとき、-H、-低級アルキ
ル、-ハロゲンで置換された低級アルキル、-低級アルキ
レン-OH、-低級アルキレン-ヘテロ環、-低級アルキレン
-置換されていてもよいアリール、-低級アルキレン-O-
低級アルキル、-低級アルキレン-CHO、-低級アルキレン
-CO2H、-低級アルキレン-CO2-低級アルキル、-低級アル
キレン-CONH2又は-低級アルキレン-OCONH2、 R2:aが二重結合、且つ、bが単結合のとき、-H、-低級
アルキル、-ハロゲンで置換された低級アルキル、-低級
アルキレン-OH、-低級アルキレン-ヘテロ環、-低級アル
キレン-置換されていてもよいアリール、-低級アルキレ
ン-O-低級アルキル、-低級アルキレン-CHO、-低級アル
キレン-CO2H、-低級アルキレン-CO2-低級アルキル、-低
級アルキレン-CONH2又は-低級アルキレン-OCONH2;aが
単結合、且つ、bが二重結合のとき、非存在、 X:O又はS、 A:置換されていてもよいアリール又は置換されていて
もよいヘテロアリール、 B:置換されていてもよい含窒素ヘテロ環。 但し、式(I’)において、 【化2】 (式中、R3及びR4は上記B「置換されていてもよい含窒
素ヘテロ環」の置換基を意味する。)で示されるとき、
以下の化合物を意味する: 1)R2が非存在、R3がメチル、且つ、Aが、4位のみが
置換されていてもよいフェニル基のとき、R4はC2-6アル
キルである化合物、 2)R2及びR3がメチル、且つ、R4がH、2-プロピル又はt
ert-ブチルのとき、Aが、4位のみがクロロ、メチル、N
H2及びNHCOCH3から選択される基で置換されていてもよ
いフェニル以外の化合物、 3)R2及びR3がメチル、且つ、R4がC5アルキルのとき、
Aが、4位のみがメチル及びNO2から選択される基で置換
されていてもよいフェニル以外の化合物、 4)R2がエチル、R3がメチル、且つ、R4がHのとき、A
が、4位のみがメチル及びNHCOCH3から選択される基で
置換されていてもよいフェニル以外の化合物、 5)R2がエチル、R3がメチル、且つ、R4が2-プロピルの
とき、Aが4-メチルフェニル以外の化合物、 6)R2がエチル、R3がメチル、且つ、R4がtert-ブチル
のとき、Aが、4位のみがメチル、クロロ及びブロムか
ら選択される基で置換されたフェニル以外の化合物、 7)R2及びR3がメチル、且つ、R4がtert-ブチルのと
き、Aが3-ニトロフェニル以外の化合物、 8)R2がCH2CH2Cl又はCH2CH2OH、R3がメチル、且つ、R4
がHのとき、Aが4-クロロフェニル以外の化合物、 9)R2がベンジル、R3がメチル、且つ、R4がH、メチル
又はジエチルアミノのとき、Aが4-メチルフェニル以外
の化合物、 10)R2がメチル、R3がtert-ブチル、且つ、R4がクロ
ロのとき、Aが4-メチルフェニル以外の化合物、 11)R1がH、R3がメチル、且つ、R4がtert-ブチルのと
き、Aがフェニル、4-メチルフェニル、4-クロロフェニ
ル、3-ニトロフェニル又は4-ブロモフェニル以外の化合
物、 12)R1がH、R3がメチル、且つ、R4が2-プロピルのと
き、Aがフェニル、4-クロロフェニル又は4-メチルフェ
ニル以外の化合物、 13)R1がエチル、R3がメチル、且つ、R4がtert-ブチ
ル又は2-プロピルのとき、Aが4-クロロフェニル以外の
化合物、及び、 14)R1がH、R3がメチル、且つ、R4がCO2Etのとき、A
が3-ニトロフェニル以外の化合物。]1. A sulfonamide derivative represented by the general formula (I ′) or a salt thereof. [Chemical 1] [The symbols in the formula have the following meanings. a and b: each represents a single bond or a double bond, at least one is a single bond and the other is a double bond, R 1 : absent when a is a double bond and b is a single bond ; A
Is a single bond and b is a double bond, -H, -lower alkyl, -lower alkyl substituted with halogen, -lower alkylene-OH, -lower alkylene-heterocycle, -lower alkylene
-Optionally substituted aryl, -lower alkylene-O-
Lower alkyl, -lower alkylene-CHO, -lower alkylene
-CO 2 H, - lower alkylene -CO 2 - lower alkyl, - lower alkylene -CONH 2 or - lower alkylene -OCONH 2, R 2: a double bond, and, when b is a single bond, -H, -Lower alkyl, -lower alkyl substituted with halogen, -lower alkylene-OH, -lower alkylene-heterocycle, -lower alkylene-optionally substituted aryl, -lower alkylene-O-lower alkyl, -lower alkylene -CHO, - lower alkylene -CO 2 H, - lower alkylene -CO 2 - lower alkyl, - lower alkylene -CONH 2 or - lower alkylene -OCONH 2; a is a single bond, and, when b is a double bond, Absent, X: O or S, A: optionally substituted aryl or optionally substituted heteroaryl, B: optionally substituted nitrogen-containing heterocycle. However, in the formula (I ′), (In the formula, R 3 and R 4 represent the substituents of the above-mentioned “B optionally substituted nitrogen-containing heterocycle”.),
The following compounds are meant: 1) When R 2 is absent, R 3 is methyl, and A is a phenyl group which may be substituted only at the 4-position, R 4 is C 2-6 alkyl. A compound, 2) R 2 and R 3 are methyl, and R 4 is H, 2-propyl or t
When ert-butyl, A is chloro, methyl, N only at position 4
A compound other than phenyl optionally substituted with a group selected from H 2 and NHCOCH 3 , 3) when R 2 and R 3 are methyl, and R 4 is C 5 alkyl,
A is a compound other than phenyl optionally substituted with a group selected from methyl and NO 2 only at the 4-position, 4) when R 2 is ethyl, R 3 is methyl, and R 4 is H, A
Is a compound other than phenyl optionally substituted with a group selected from methyl and NHCOCH 3 only at the 4-position, 5) when R 2 is ethyl, R 3 is methyl, and R 4 is 2-propyl, A is a compound other than 4-methylphenyl, 6) a group in which when R 2 is ethyl, R 3 is methyl, and R 4 is tert-butyl, A is selected from methyl, chloro and bromine only at the 4-position. Compounds other than phenyl substituted with 7), when R 2 and R 3 are methyl, and R 4 is tert-butyl, A is a compound other than 3-nitrophenyl, 8) R 2 is CH 2 CH 2 Cl Or CH 2 CH 2 OH, R 3 is methyl, and R 4
When H is H, A is a compound other than 4-chlorophenyl, 9) R 2 is benzyl, R 3 is methyl, and when R 4 is H, methyl or diethylamino, A is a compound other than 4-methylphenyl, 10 ) R 2 is methyl, R 3 is tert-butyl, and R 4 is chloro, A is a compound other than 4-methylphenyl, 11) R 1 is H, R 3 is methyl, and R 4 is tert. -When it is butyl, A is a compound other than phenyl, 4-methylphenyl, 4-chlorophenyl, 3-nitrophenyl or 4-bromophenyl, 12) R 1 is H, R 3 is methyl, and R 4 is 2- When propyl, A is a compound other than phenyl, 4-chlorophenyl or 4-methylphenyl, 13) when R 1 is ethyl, R 3 is methyl, and R 4 is tert-butyl or 2-propyl, A is 4 -Compounds other than -chlorophenyl, and 14) when R 1 is H, R 3 is methyl, and R 4 is CO 2 Et, A
Is a compound other than 3-nitrophenyl. ]
誘導体又はその塩の1種又は2種以上を有効成分として
含有することを特徴とする医薬組成物。 【化3】 [式中の記号は以下の意味を有する。 a及びb:それぞれ単結合又は二重結合を意味し、少なく
とも一方は単結合であり他方は二重結合である、 R1:aが二重結合、且つ、bが単結合のとき、非存在;a
が単結合、且つ、bが二重結合のとき、-H、-低級アルキ
ル、-ハロゲンで置換された低級アルキル、-低級アルキ
レン-OH、-低級アルキレン-ヘテロ環、-低級アルキレン
-置換されていてもよいアリール、-低級アルキレン-O-
低級アルキル、-低級アルキレン-CHO、-低級アルキレン
-CO2H、-低級アルキレン-CO2-低級アルキル、-低級アル
キレン-CONH2又は-低級アルキレン-OCONH2、 R2:aが二重結合、且つ、bが単結合のとき、-H、-低級
アルキル、-ハロゲンで置換された低級アルキル、-低級
アルキレン-OH、-低級アルキレン-ヘテロ環、-低級アル
キレン-置換されていてもよいアリール、-低級アルキレ
ン-O-低級アルキル、-低級アルキレン-CHO、-低級アル
キレン-CO2H、-低級アルキレン-CO2-低級アルキル、-低
級アルキレン-CONH2又は-低級アルキレン-OCONH2;aが
単結合、且つ、bが二重結合のとき、非存在、 X:O又はS、 A:置換されていてもよいアリール又は置換されていて
もよいヘテロアリール、 B:置換されていてもよい含窒素ヘテロ環。 但し、R1がH、且つBが4-メチル-5-(2-プロピル)チアゾ
ール-2-イルのとき、Aがフェニル又は4-メチルフェニル
である化合物を除く。]2. A pharmaceutical composition comprising, as an active ingredient, one or two or more of the sulfonamide derivative represented by the general formula (I) or a salt thereof. [Chemical 3] [The symbols in the formula have the following meanings. a and b: each represents a single bond or a double bond, at least one is a single bond and the other is a double bond, R 1 : absent when a is a double bond and b is a single bond ; A
Is a single bond and b is a double bond, -H, -lower alkyl, -lower alkyl substituted with halogen, -lower alkylene-OH, -lower alkylene-heterocycle, -lower alkylene
-Optionally substituted aryl, -lower alkylene-O-
Lower alkyl, -lower alkylene-CHO, -lower alkylene
-CO 2 H, - lower alkylene -CO 2 - lower alkyl, - lower alkylene -CONH 2 or - lower alkylene -OCONH 2, R 2: a double bond, and, when b is a single bond, -H, -Lower alkyl, -lower alkyl substituted with halogen, -lower alkylene-OH, -lower alkylene-heterocycle, -lower alkylene-optionally substituted aryl, -lower alkylene-O-lower alkyl, -lower alkylene -CHO, - lower alkylene -CO 2 H, - lower alkylene -CO 2 - lower alkyl, - lower alkylene -CONH 2 or - lower alkylene -OCONH 2; a is a single bond, and, when b is a double bond, Absent, X: O or S, A: optionally substituted aryl or optionally substituted heteroaryl, B: optionally substituted nitrogen-containing heterocycle. However, when R 1 is H and B is 4-methyl-5- (2-propyl) thiazol-2-yl, compounds in which A is phenyl or 4-methylphenyl are excluded. ]
物。3. The pharmaceutical composition according to claim 2, which is an anti-HIV agent.
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JP2002098332A JP2003292485A (en) | 2002-04-01 | 2002-04-01 | Sulfonamide derivative |
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JP2002098332A JP2003292485A (en) | 2002-04-01 | 2002-04-01 | Sulfonamide derivative |
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Family
ID=29240368
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WO2005000825A1 (en) * | 2003-06-27 | 2005-01-06 | Dainippon Sumitomo Pharma Co., Ltd. | Thiazolimine compound and oxazolimine compound |
WO2006051704A1 (en) * | 2004-11-15 | 2006-05-18 | Taisho Pharmaceutical Co., Ltd. | Imine compound |
WO2007074688A1 (en) * | 2005-12-26 | 2007-07-05 | Matsushita Electric Industrial Co., Ltd. | Nitride compound semiconductor element and method for manufacturing same |
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JP2009541367A (en) * | 2006-06-27 | 2009-11-26 | インスティテュート オブ ファーマコロジー アンド トキシコロジー アカデミー オブ ミリタリー メディカル サイエンシス ピーエルエイ | 2,4,5-Trisubstituted thiazole compounds, pharmaceutical compositions containing them, and their preparation and medical use |
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US7994338B2 (en) * | 2006-08-16 | 2011-08-09 | The J. David Gladstone Institutes | Small molecule inhibitors of kynurenine-3-monooxygenase |
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WO2005000825A1 (en) * | 2003-06-27 | 2005-01-06 | Dainippon Sumitomo Pharma Co., Ltd. | Thiazolimine compound and oxazolimine compound |
WO2006051704A1 (en) * | 2004-11-15 | 2006-05-18 | Taisho Pharmaceutical Co., Ltd. | Imine compound |
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JP2009541367A (en) * | 2006-06-27 | 2009-11-26 | インスティテュート オブ ファーマコロジー アンド トキシコロジー アカデミー オブ ミリタリー メディカル サイエンシス ピーエルエイ | 2,4,5-Trisubstituted thiazole compounds, pharmaceutical compositions containing them, and their preparation and medical use |
US8071631B2 (en) | 2006-08-16 | 2011-12-06 | The J. David Gladstone Institutes, A Testamentary Trust Established Under The Will Of J. David Gladstone | Small molecule inhibitors of kynurenine-3-monooxygenase |
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US8741934B2 (en) | 2007-03-23 | 2014-06-03 | Pfizer Limited | Inhibitors of ion channels |
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