JP2003273321A - Semiconductor module - Google Patents

Semiconductor module

Info

Publication number
JP2003273321A
JP2003273321A JP2002069209A JP2002069209A JP2003273321A JP 2003273321 A JP2003273321 A JP 2003273321A JP 2002069209 A JP2002069209 A JP 2002069209A JP 2002069209 A JP2002069209 A JP 2002069209A JP 2003273321 A JP2003273321 A JP 2003273321A
Authority
JP
Japan
Prior art keywords
substrate
semiconductor module
common potential
wiring
wiring pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002069209A
Other languages
Japanese (ja)
Inventor
Toshitsune Iijima
利恒 飯嶋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP2002069209A priority Critical patent/JP2003273321A/en
Publication of JP2003273321A publication Critical patent/JP2003273321A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA

Landscapes

  • Structure Of Printed Boards (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a semiconductor module by which the noise produced among wiring patterns is reduced and the heat dissipation effect can be obtained. <P>SOLUTION: The semiconductor module has upper and lower substrates which are arranged one above the other. Several signal wires and common potential wires which surround each of the signal wires at some intervals are provided on the upper and lower substrates. Semiconductors having electrode pads which are electrically connected with the signal wires and the common potential wires are provided on the upper and lower substrates. A support substrate having wiring patterns is provided under the lower substrate. First and second connection conductive layers provided between the upper substrate and the lower substrate electrically and mutually connect the signal wires and the common potential wires on the substrates. A third connection conductive layer is provided through the supporting substrate and electrically connects the first and the second connection conductive layers and the wiring patterns. The third connection conductive layer is connected to external connection terminals provided on the wiring patterns. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、例えば、半導体チ
ップが設けられた基板を複数積層して構成された半導体
モジュールに関し、詳しくは、上記基板の構造に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to, for example, a semiconductor module configured by laminating a plurality of substrates provided with semiconductor chips, and more particularly to the structure of the substrate.

【0002】[0002]

【従来の技術】例えばSRAM(Static Random Access
Memory)、フラッシュメモリ、DRAM(Dynamic RA
M)等のメモリ、及びCPU(Central Processing Uni
t)等、異種又は同種の半導体チップを複数積層して1
つのパッケージとする積層モジュールが開発されてい
る。すなわち、基板上に半導体チップを配置したチップ
・基板構造体を形成し、複数のチップ・基板構造体を積
層する。このような半導体モジュールとして、各半導体
チップを1つの機能ブロックとしたSBM(System Blo
ck Module)が知られている。
2. Description of the Related Art For example, SRAM (Static Random Access)
Memory), flash memory, DRAM (Dynamic RA)
Memory such as M) and CPU (Central Processing Uni
t) etc., and stack multiple semiconductor chips of different types or the same type.
Stacked modules in one package are being developed. That is, a chip / substrate structure in which semiconductor chips are arranged is formed on a substrate, and a plurality of chip / substrate structures are stacked. As such a semiconductor module, an SBM (System Block) in which each semiconductor chip is one functional block is used.
ck Module) is known.

【0003】図6は、従来の半導体モジュールを概略的
に示す断面図である。図6に示すように、半導体モジュ
ール51は、基板52上に配線パターン53及び半導体
チップ54が設けられたチップ・基板構造体55が複数
積層された構造を有する。各チップ・基板構造体55間
には、層間基板56が設けられ、層間基板56には複数
の接続導電層57が設けられる。この接続導電層57に
より、各チップ・基板構造体55の配線パターン53が
相互に電気的に接続される。
FIG. 6 is a sectional view schematically showing a conventional semiconductor module. As shown in FIG. 6, the semiconductor module 51 has a structure in which a plurality of chip / substrate structures 55 each having a wiring pattern 53 and a semiconductor chip 54 are stacked on a substrate 52. An interlayer substrate 56 is provided between each chip / substrate structure 55, and a plurality of connection conductive layers 57 are provided on the interlayer substrate 56. The connection conductive layer 57 electrically connects the wiring patterns 53 of each chip / substrate structure 55 to each other.

【0004】半導体モジュール51の最下層の基板52
a上には、所定のパターンを有する配線パターン59が
設けられ、この配線パターン59上に複数の外部電極6
0が設けられる。この外部電極60は、例えばバンプに
より形成され、図7に示すように、所謂ボールグリッド
アレイ構造とされる。
The lowermost substrate 52 of the semiconductor module 51
A wiring pattern 59 having a predetermined pattern is provided on a, and a plurality of external electrodes 6 are formed on the wiring pattern 59.
0 is provided. The external electrodes 60 are formed by bumps, for example, and have a so-called ball grid array structure, as shown in FIG.

【0005】図8は、上記チップ・基板構造体55を概
略的に示している。図8に示すように、基板52の上面
及び下面上に所定のパターンを有する配線パターン53
が形成される。基板52の上面、下面の配線パターン5
3はスルーホール61により相互に電気的に接続され
る。
FIG. 8 schematically shows the chip / substrate structure 55. As shown in FIG. 8, a wiring pattern 53 having a predetermined pattern on the upper surface and the lower surface of the substrate 52.
Is formed. Wiring pattern 5 on the upper and lower surfaces of the substrate 52
3 are electrically connected to each other by through holes 61.

【0006】図9は、基板52及び配線パターン3を概
略的に示す平面図である。基板52上に複数の配線パタ
ーン3が配設される。配線パターン53の一端は基板5
2の略中央部に位置し、ここで半導体チップ54のバン
プと接続される。
FIG. 9 is a plan view schematically showing the substrate 52 and the wiring pattern 3. A plurality of wiring patterns 3 are arranged on the substrate 52. One end of the wiring pattern 53 is the substrate 5
It is located at a substantially central portion of 2, and is connected to the bump of the semiconductor chip 54 here.

【0007】[0007]

【発明が解決しようとする課題】ところで、近時、上記
したような半導体モジュールの高速動作に対する要求が
高まっている。高速動作を実現するに当たり、スイッチ
ングノイズ等のノイズが問題となる。このようなノイズ
は配線パターン相互間で発生し、ノイズにより各種半導
体チップは誤動作をおこしたり、信号伝搬速度が低下し
たりする。この結果、半導体チップの特性を十分に引き
出すことができず、半導体モジュール全体としての性能
が低下する。
By the way, recently, there is an increasing demand for high-speed operation of the semiconductor module as described above. Noise such as switching noise becomes a problem in realizing high-speed operation. Such noise is generated between the wiring patterns, which causes various semiconductor chips to malfunction and the signal propagation speed to decrease. As a result, the characteristics of the semiconductor chip cannot be fully obtained, and the performance of the semiconductor module as a whole deteriorates.

【0008】従来、上記問題を回避する方法として、配
線パターン53相互間の間隔を大きくする方策が採られ
ていた。これにより、ノイズの影響を低減することがで
きる。しかし、この方法だけでは、ノイズの低減が十分
ではなく、半導体チップの特性を十分に発揮することは
できない。また、半導体チップの高度化、半導体モジュ
ールの小型化に伴い、配線パターン53間の間隔を十分
取ることができず、この方法のみではノイズの低減対策
に限界がある。
Conventionally, as a method for avoiding the above problem, a measure for increasing the distance between the wiring patterns 53 has been adopted. Thereby, the influence of noise can be reduced. However, this method alone cannot sufficiently reduce the noise and cannot fully exhibit the characteristics of the semiconductor chip. Further, with the sophistication of semiconductor chips and the miniaturization of semiconductor modules, it is not possible to secure a sufficient space between the wiring patterns 53, and this method alone limits the noise reduction measures.

【0009】また、積層構造の半導体モジュールの場
合、各チップ・基板構造体55間で上下に隣接する配線
パターン53により発生するノイズの影響も大きくな
り、半導体モジュールの性能が低下する。
Further, in the case of the semiconductor module having a laminated structure, the influence of noise generated by the wiring patterns 53 vertically adjacent between the respective chip / substrate structures 55 becomes large, and the performance of the semiconductor module deteriorates.

【0010】また、高速動作する半導体チップは、発熱
量も大きく、的確に放熱させる必要がある。特に、上記
した半導体モジュールのように封止することにより、半
導体チップが完全に外部と遮断されている構造の場合、
効果的な放熱方法の開発が望まれる。
Further, a semiconductor chip operating at a high speed has a large amount of heat generation, and it is necessary to radiate heat accurately. In particular, in the case of a structure in which the semiconductor chip is completely shielded from the outside by sealing like the semiconductor module described above,
Development of effective heat dissipation method is desired.

【0011】本発明は、上記課題を解決するためになさ
れたものであり、その目的とするところは、配線パター
ン間に発生するノイズを低減できると共に、放熱効果を
得ることが可能な半導体モジュールを提供しようとする
ものである。
The present invention has been made to solve the above problems, and an object of the present invention is to provide a semiconductor module capable of reducing the noise generated between wiring patterns and obtaining a heat dissipation effect. It is the one we are trying to provide.

【0012】[0012]

【課題を解決するための手段】本発明の半導体モジュー
ルは、上記課題を解決するため、基板上に半導体チップ
が配設された基板構造体が、複数積層されてなる半導体
モジュールであって、絶縁性の上側基板と、前記上側基
板の下方に配設された絶縁性の下側基板と、前記上側及
び下側基板上にそれぞれ配設された複数の信号配線と、
前記信号配線のそれぞれを間隔をおいて囲うように前記
上側及び下側基板上にそれぞれ配設された第1共通電位
配線と、前記上側及び下側基板上にそれぞれ配設され、
且つ前記信号配線及び前記第1共通電位配線と電気的に
接続された電極パッドを有する半導体チップと、前記下
側基板の下方に配設され、且つ前記下側基板と反対側の
面上に配設された配線パターンを有する、支持基板と、
前記上側基板と下側基板との間に配設され、且つ前記上
側及び下側基板上の前記信号配線を相互に電気的に接続
する第1接続導電層と、前記上側基板と下側基板との間
に配設され、且つ前記上側及び下側基板上の前記第1共
通電位配線を相互に電気的に接続する第2接続導電層
と、前記支持基板を貫通して配設され、前記第1及び第
2接続導電層と、前記配線パターンと、を電気的に接続
する第3接続導電層と、前記配線パターン上に配設され
た外部接続端子と、を具備することを特徴とする。
In order to solve the above problems, a semiconductor module of the present invention is a semiconductor module in which a plurality of substrate structures having semiconductor chips arranged on a substrate are laminated, Flexible upper substrate, an insulating lower substrate disposed below the upper substrate, and a plurality of signal wirings respectively disposed on the upper and lower substrates,
First common potential wirings respectively disposed on the upper and lower substrates so as to surround each of the signal wirings at intervals, and respectively disposed on the upper and lower substrates,
A semiconductor chip having an electrode pad electrically connected to the signal wiring and the first common potential wiring, and a semiconductor chip disposed below the lower substrate and on a surface opposite to the lower substrate. A supporting substrate having an established wiring pattern;
A first connection conductive layer disposed between the upper substrate and the lower substrate and electrically connecting the signal wirings on the upper and lower substrates to each other; and the upper substrate and the lower substrate. A second connection conductive layer which is disposed between the first and second substrates and electrically connects the first common potential wirings on the upper and lower substrates to each other, and the second connection conductive layer which penetrates through the support substrate. It is characterized by comprising: a first and a second connection conductive layer; a third connection conductive layer for electrically connecting the wiring pattern; and an external connection terminal arranged on the wiring pattern.

【0013】更に、本発明に係る実施の形態には種々の
段階の発明が含まれており、開示される複数の構成要件
における適宜な組み合わせにより種々の発明が抽出され
得る。例えば、実施の形態に示される全構成要件から幾
つかの構成要件が省略されることで発明が抽出された場
合、その抽出された発明を実施する場合には省略部分が
周知慣用技術で適宜補われるものである。
Further, the embodiments of the present invention include inventions at various stages, and various inventions can be extracted by appropriately combining a plurality of disclosed constituent elements. For example, when the invention is extracted by omitting some of the constituent elements shown in the embodiment, when omitting the extracted invention, the omitted part is appropriately supplemented by a well-known conventional technique. It is something that will be done.

【0014】[0014]

【発明の実施の形態】以下に本発明の実施の形態につい
て図面を参照して説明する。なお、以下の説明におい
て、略同一の機能及び構成を有する構成要素について
は、同一符号を付し、重複説明は必要な場合にのみ行
う。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings. In the following description, constituent elements having substantially the same functions and configurations are designated by the same reference numerals, and redundant description will be given only when necessary.

【0015】(第1の実施形態)図1は、本発明の第1
の実施形態に係る半導体モジュールを概略的に示す断面
図である。図1に示すように、半導体モジュール1は、
基板2上に配線パターン3及び半導体チップ4が設けら
れたチップ・基板構造体5が複数積層された構造を有す
る。チップ・基板構造体5の詳しい構造については後に
詳述する。各チップ・基板構造体5間には、平面におい
て、半導体チップ4が設けられる位置に対応した開口部
を有する層間基板6が設けられ、層間基板6には複数の
接続導電層7が設けられる。この接続導電層7により、
各チップ・基板構造体5の配線パターン3が相互に電気
的に接続される。接続導電層7のうち、接続導電層7a
は例えば信号配線用であって、接続導電層7bは例えば
共通電位配線用として用いられる。共通電位配線は、例
えばグランドまたは電源線として使用できる。層間基板
6の開口部は、例えば樹脂8により封止される。
(First Embodiment) FIG. 1 shows a first embodiment of the present invention.
3 is a cross-sectional view schematically showing the semiconductor module according to the embodiment of FIG. As shown in FIG. 1, the semiconductor module 1 is
It has a structure in which a plurality of chip / substrate structures 5 each provided with a wiring pattern 3 and a semiconductor chip 4 are stacked on a substrate 2. The detailed structure of the chip / substrate structure 5 will be described later. An interlayer substrate 6 having an opening corresponding to a position where the semiconductor chip 4 is provided in a plane is provided between each chip / substrate structure 5, and the interlayer substrate 6 is provided with a plurality of connection conductive layers 7. With this connection conductive layer 7,
The wiring patterns 3 of each chip / substrate structure 5 are electrically connected to each other. Of the connection conductive layers 7, the connection conductive layer 7a
Is for signal wiring, for example, and the connection conductive layer 7b is used for common potential wiring, for example. The common potential wiring can be used as, for example, a ground or a power supply line. The opening of the interlayer substrate 6 is sealed with resin 8, for example.

【0016】上記半導体モジュールを形成する際、例え
ばガラスエポキシ基板の積層技術である熱プレス方式が
用いられる。すなわち、各チップ・基板構造体5及び層
間基板6の位置合わせが行われた後、これらに熱プレス
を施すことにより一括して積層構造が形成される。半導
体モジュール1の最下層の基板2a上には、所定のパタ
ーンを有する配線パターン9が設けられ、この配線パタ
ーン9上に複数の外部電極(外部接続端子)10が設け
られる。この外部電極10は、例えばバンプにより形成
され、ボールグリッドアレイ構造とされる。11は、配
線パターン9を覆うソルダーレジストである。
When forming the above-mentioned semiconductor module, for example, a hot pressing method which is a lamination technique of glass epoxy substrates is used. That is, after the respective chips / substrate structures 5 and the interlayer substrate 6 are aligned with each other, they are subjected to hot pressing to collectively form a laminated structure. A wiring pattern 9 having a predetermined pattern is provided on the lowermost substrate 2a of the semiconductor module 1, and a plurality of external electrodes (external connection terminals) 10 are provided on the wiring pattern 9. The external electrode 10 is formed of, for example, a bump and has a ball grid array structure. Reference numeral 11 is a solder resist that covers the wiring pattern 9.

【0017】図2は、チップ・基板構造体5を概略的に
示している。図2に示すように、基板2の上面及び下面
上に所定のパターンを有する配線パターン3が形成され
る。基板2の上面及び下面の配線パターン3はスルーホ
ール21により相互に電気的に接続される。スルーホー
ル21のうち、スルーホール21aは、例えば信号配線
用であって、図1の接続導電層7aと接続される。ま
た、スルーホール21bは、例えば共通電位配線用であ
って、図1の接続導電層7bと接続される。基板2の下
面には、半導体チップ4が設けられる。半導体チップ4
は、基板2上に例えば接着フィルム22を用いて熱圧着
により接着される。基板2と半導体チップ4との接着
は、例えば液状の接着剤を用いてもよい。半導体チップ
4は、複数の内部バンプ(電極パッド)23を有してお
り、この内部バンプ23を介して配線パターン3と電気
的に接続される。
FIG. 2 schematically shows a chip / substrate structure 5. As shown in FIG. 2, the wiring pattern 3 having a predetermined pattern is formed on the upper surface and the lower surface of the substrate 2. The wiring patterns 3 on the upper surface and the lower surface of the substrate 2 are electrically connected to each other through the through holes 21. The through hole 21a of the through hole 21 is for signal wiring, for example, and is connected to the connection conductive layer 7a of FIG. The through hole 21b is for common potential wiring, for example, and is connected to the connection conductive layer 7b of FIG. A semiconductor chip 4 is provided on the lower surface of the substrate 2. Semiconductor chip 4
Is bonded to the substrate 2 by thermocompression bonding using, for example, the adhesive film 22. The substrate 2 and the semiconductor chip 4 may be bonded to each other by using a liquid adhesive, for example. The semiconductor chip 4 has a plurality of internal bumps (electrode pads) 23, and is electrically connected to the wiring pattern 3 via the internal bumps 23.

【0018】図3は、基板2及び配線パターン3a、3
bを概略的に示す平面図である。基板2上に、例えば銅
から構成される配線パターン3が配設される。配線パタ
ーン3は、例えば信号配線としての複数の配線パターン
3aと、共通電位配線としての配線パターン3bと、か
ら構成される。配線パターン3aの一端部3a−1は、
基板2の略中央部に位置し、ここで半導体チップ4の内
部バンプ23と接続される。配線パターン3の他端部は
スルーホール21aまで達する。
FIG. 3 shows the substrate 2 and the wiring patterns 3a, 3
It is a top view which shows b roughly. A wiring pattern 3 made of, for example, copper is provided on the substrate 2. The wiring pattern 3 is composed of, for example, a plurality of wiring patterns 3a as signal wirings and a wiring pattern 3b as a common potential wiring. One end 3a-1 of the wiring pattern 3a is
It is located in the approximate center of the substrate 2 and is connected to the internal bumps 23 of the semiconductor chip 4 here. The other end of the wiring pattern 3 reaches the through hole 21a.

【0019】配線パターン3a、スルーホール21aが
設けられた部分を除く基板2上の略全面には、平面状の
配線パターン3bが設けられる。この配線パターン3b
は、配線パターン3a相互間で発生するノイズを低減す
るとともに、放熱効果を有する。配線パターン3bとし
て、例えば銅が用いられる。21bは、配線パターン3
b用のスルーホールである。配線パターン3bは、接続
部3b−1を有し、この接続部3b−1と半導体チップ
4の内部バンプ23と接続される。
A planar wiring pattern 3b is provided on substantially the entire surface of the substrate 2 except the portions where the wiring pattern 3a and the through holes 21a are provided. This wiring pattern 3b
Reduces the noise generated between the wiring patterns 3a and has a heat dissipation effect. Copper, for example, is used as the wiring pattern 3b. 21b is a wiring pattern 3
It is a through hole for b. The wiring pattern 3b has a connecting portion 3b-1 and is connected to the connecting portion 3b-1 and the internal bump 23 of the semiconductor chip 4.

【0020】上記配線パターン3a及び3bは、基板2
上の全面に銅を形成し、この銅を周知の技術を用いてパ
ターニングすることにより形成することができる。配線
パターン3bは、必ずしも基板2上の全面に形成される
必要はなく、各配線パターン3aの周囲を覆っていれば
よい。また、配線パターン3aの周囲を覆うと共に、各
配線パターン3a相互間の領域を埋めるように設けてあ
ればよい。これにより隣接しあう配線パターン3a間の
ノイズの影響を排除できる。また、配線パターン3aと
配線パターン3bとの間隔は、例えば、全ての配線パタ
ーン3aにおいて、同程度の値とすることにより、各配
線パターン3aにおける電磁界の影響を同一とすること
ができる。
The wiring patterns 3a and 3b are formed on the substrate 2
It can be formed by forming copper on the entire upper surface and patterning the copper using a well-known technique. The wiring pattern 3b does not necessarily have to be formed on the entire surface of the substrate 2, and may cover the periphery of each wiring pattern 3a. Further, it may be provided so as to cover the periphery of the wiring pattern 3a and fill the area between the wiring patterns 3a. This can eliminate the influence of noise between the adjacent wiring patterns 3a. Further, by setting the intervals between the wiring patterns 3a and 3b to be similar values in all the wiring patterns 3a, the influence of the electromagnetic field in each wiring pattern 3a can be made the same.

【0021】配線パターン3bの形成に際して、上記し
た最低の条件を満たすことにより、配線パターン3a相
互間のノイズを低減できるが、これによらず配線パター
ン3bは大きく形成されることが望ましい。これは、以
下の理由による。すなわち、配線パターン3bの面積を
より大きくすることにより、より大きな放熱効果を得る
ことができる。さらに、一般に、基板2の表面に段差が
存在すると、半導体チップ4と基板2とを熱圧着する際
に気泡を巻き込み、このため、良好な接着が得られな
い。そこで、基板2の全面に可能な限り配線パターン3
bを形成することにより、段差の形成を防止し、気泡の
発生を低減できる。
When the wiring pattern 3b is formed, noise between the wiring patterns 3a can be reduced by satisfying the above-mentioned minimum condition, but it is desirable that the wiring pattern 3b be formed large regardless of this. This is for the following reason. That is, a larger heat dissipation effect can be obtained by increasing the area of the wiring pattern 3b. Further, in general, when there is a step on the surface of the substrate 2, air bubbles are entrained when the semiconductor chip 4 and the substrate 2 are thermocompression bonded, and therefore good adhesion cannot be obtained. Therefore, the wiring pattern 3 is formed on the entire surface of the substrate 2 as much as possible.
By forming b, it is possible to prevent the formation of a step and reduce the generation of bubbles.

【0022】第1の実施形態によれば、基板2上に配線
パターン3a及びこの配線パターン3aを除く領域に平
面状の配線パターン3bを設け、この基板2上に半導体
チップ4を形成したチップ・基板構造体5を複数個積層
している。各チップ・基板構造体5は、基板2に設けら
れたスルーホール21、及びチップ・基板構造体5間に
設けられた接続導電層7により接続されている。配線パ
ターン3aを覆うように配線パターン3bを設け、これ
をグランド等の共通電位線としているため、各配線パタ
ーン3aは相互にシールされる。このため、各配線パタ
ーン3a間のノイズを低減でき、各半導体チップ5の誤
動作、信号伝搬速度の遅延を防止し、半導体チップ5の
特性を十分に引き出すことができる。
According to the first embodiment, a wiring pattern 3a and a planar wiring pattern 3b are provided on the substrate 2 in a region other than the wiring pattern 3a, and a semiconductor chip 4 is formed on the substrate 2. A plurality of substrate structures 5 are stacked. Each chip / substrate structure 5 is connected by a through hole 21 provided in the substrate 2 and a connection conductive layer 7 provided between the chip / substrate structures 5. Since the wiring pattern 3b is provided so as to cover the wiring pattern 3a and is used as a common potential line such as ground, the wiring patterns 3a are mutually sealed. Therefore, noise between the wiring patterns 3a can be reduced, malfunction of each semiconductor chip 5 and delay of signal propagation speed can be prevented, and the characteristics of the semiconductor chip 5 can be sufficiently obtained.

【0023】また、配線パターン3bを平面状とするこ
とにより、半導体チップ4から発生した熱を効果的に放
熱できる。半導体チップを複数積層する半導体モジュー
ルの場合、この放熱効果は特に有効である。さらに、各
配線パターン3a相互間の厚みの微差により生じる段差
を低減できるため、基板2と半導体チップ4とを熱圧着
する際、気泡の発生を低減し、基板2と半導体チップ4
とをより密着して積層することができる。
Further, by making the wiring pattern 3b planar, the heat generated from the semiconductor chip 4 can be effectively dissipated. In the case of a semiconductor module in which a plurality of semiconductor chips are laminated, this heat dissipation effect is particularly effective. Furthermore, since a step difference caused by a slight difference in thickness between the wiring patterns 3a can be reduced, air bubbles are reduced when the substrate 2 and the semiconductor chip 4 are thermocompression bonded, and the substrate 2 and the semiconductor chip 4 are reduced.
And can be laminated more closely.

【0024】(第2の実施形態)第2の実施形態は、第
1の実施形態とほぼ同一の構成である。異なるのは、基
板2の、配線パターン3aが形成されない面にも平面状
の配線パターン3bを全面に設けられる点である。
(Second Embodiment) The second embodiment has almost the same structure as the first embodiment. The difference is that the planar wiring pattern 3b is provided on the entire surface of the substrate 2 even on the surface where the wiring pattern 3a is not formed.

【0025】図4は、本発明の第2の実施形態に係る半
導体モジュールを概略的に示す断面図である。図4に示
すように、基板2の、配線パターン3aが形成されない
面(図4において基板2の上面)に平面状の配線パター
ン31が設けられる。配線パターン31は、例えば上面
の全面に一様に設けることができる。基板の上面に設け
られた配線パターン31は、例えばグランドまたは共通
電位として使用され、配線パターン3bとスルーホール
7bにより電気的に接続される。その他の構造について
は、第1の実施形態と同様であるため、説明は省略す
る。
FIG. 4 is a sectional view schematically showing a semiconductor module according to the second embodiment of the present invention. As shown in FIG. 4, a planar wiring pattern 31 is provided on the surface of the substrate 2 where the wiring pattern 3a is not formed (the upper surface of the substrate 2 in FIG. 4). The wiring pattern 31 can be uniformly provided on the entire upper surface, for example. The wiring pattern 31 provided on the upper surface of the substrate is used as a ground or a common potential, for example, and is electrically connected to the wiring pattern 3b through the through hole 7b. The other structure is similar to that of the first embodiment, and thus the description thereof is omitted.

【0026】第2の実施形態によれば、第1の実施形態
の構造に加え、裏面にも平面状の配線パターン31が設
けられる。これにより、第1の実施形態と同様の効果を
得られる。
According to the second embodiment, in addition to the structure of the first embodiment, a planar wiring pattern 31 is also provided on the back surface. As a result, the same effect as that of the first embodiment can be obtained.

【0027】さらに、上面に配線パターン31を設ける
ことにより、上下に隣接する他のチップ・基板構造体5
上の配線パターン3a間に発生するノイズをほぼ完全に
除去することができる。これにより、半導体モジュール
全体としての誤動作、信号伝搬速度の遅延をさらに効果
的に防止できる。
Further, by providing the wiring pattern 31 on the upper surface, another chip / substrate structure 5 adjacent vertically is formed.
Noise generated between the upper wiring patterns 3a can be almost completely removed. As a result, malfunction of the semiconductor module as a whole and delay of signal propagation speed can be prevented more effectively.

【0028】(第3の実施形態)半導体モジュールの小
型化及び半導体チップの高速化、高機能化等に伴い、配
線パターン間のピッチは減少している。このため、第
1,第2の実施形態で示したように、配線パターン3を
除いた領域にグランド配線を形成することが技術的に困
難な場合がある。そこで、第3の実施形態では、チップ
・基板構造体1の相互間に、基板上に平面状の配線パタ
ーンのみを設けた基板構造体が設けられる。
(Third Embodiment) The pitch between wiring patterns has been reduced with the miniaturization of semiconductor modules, the higher speed and higher functionality of semiconductor chips. For this reason, as shown in the first and second embodiments, it may be technically difficult to form the ground wiring in the region excluding the wiring pattern 3. Therefore, in the third embodiment, a substrate structure in which only a planar wiring pattern is provided on the substrate is provided between the chip / substrate structure 1.

【0029】図5は、本発明の第3の実施形態に係る半
導体モジュールを概略的に示す断面図である。図5に示
すように、従来のチップ・基板構造体34相互間に、配
線パターン・基板構造体41が設けられる。配線パター
ン・基板構造体41は、基板1の一方の面、または両方
の面上に、例えば全面に設けられた平面状の配線パター
ン31を有する。この配線パターン31はスルーホール
21b及び接続導電層7bにより、他の配線パターン3
bと接続され、同一の電位とされる。その他の構造につ
いては、従来の半導体モジュール及び第1,第2の実施
形態と同様であるため、説明は省略する。
FIG. 5 is a sectional view schematically showing a semiconductor module according to the third embodiment of the present invention. As shown in FIG. 5, a wiring pattern / substrate structure 41 is provided between the conventional chip / substrate structures 34. The wiring pattern / substrate structure 41 has, for example, a planar wiring pattern 31 provided on the entire surface of one surface or both surfaces of the substrate 1. This wiring pattern 31 is formed of the other wiring pattern 3 by the through hole 21b and the connection conductive layer 7b.
It is connected to b and has the same potential. Other structures are the same as those of the conventional semiconductor module and the first and second embodiments, and thus the description thereof will be omitted.

【0030】第3の実施形態によれば、基板2上の略全
面に平面状の配線パターン31が設けられた配線パター
ン・基板構造体41が、従来のチップ・基板構造体34
相互間に設けられる。これにより、第1,第2の実施形
態で示したようなチップ・基板構造体1を構成すること
が困難な構造の場合にも、各配線パターン3間にノイズ
が発生することを防止できる。
According to the third embodiment, the wiring pattern / substrate structure 41 in which the planar wiring pattern 31 is provided on substantially the entire surface of the substrate 2 is the conventional chip / substrate structure 34.
It is provided between each other. Accordingly, even in the case where it is difficult to configure the chip / substrate structure 1 as shown in the first and second embodiments, it is possible to prevent noise from occurring between the wiring patterns 3.

【0031】また、配線パターン・基板構造体41を設
けることにより、従来の半導体モジュールに比べ、より
大きな放熱効果得ることができる。
Further, by providing the wiring pattern / substrate structure 41, a greater heat radiation effect can be obtained as compared with the conventional semiconductor module.

【0032】また、配線パターン・基板構造体41にお
いて、基板2の両方の面上に配線パターン31を設ける
ことにより、一方の面上に設ける場合に比べ、より高い
ノイズ低減効果、放熱効果を得られる。
Further, in the wiring pattern / substrate structure 41, by providing the wiring patterns 31 on both surfaces of the substrate 2, higher noise reduction effect and heat dissipation effect can be obtained as compared with the case where they are provided on one surface. To be

【0033】その他、本発明の思想の範疇において、当
業者であれば、各種の変更例及び修正例に想到し得るも
のであり、それら変更例及び修正例についても本発明の
範囲に属するものと了解される。
In addition, within the scope of the idea of the present invention, those skilled in the art can come up with various modifications and modifications, and those modifications and modifications are also within the scope of the present invention. Understood.

【0034】[0034]

【発明の効果】以上、詳述したように本発明によれば、
配線パターン間に発生するノイズを低減できると共に、
放熱効果を得ることが可能な半導体モジュールを提供で
きる。
As described above in detail, according to the present invention,
Noise generated between wiring patterns can be reduced,
It is possible to provide a semiconductor module capable of obtaining a heat dissipation effect.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1の実施形態に係る半導体モジュー
ルを概略的に示す断面図である。
FIG. 1 is a sectional view schematically showing a semiconductor module according to a first embodiment of the present invention.

【図2】図1に示す半導体モジュールのチップ・基板構
造体を概略的に示す図である。
FIG. 2 is a diagram schematically showing a chip / substrate structure of the semiconductor module shown in FIG.

【図3】図1に示す半導体モジュールの基板及び配線パ
ターンを概略的に示す平面図である。
3 is a plan view schematically showing a substrate and a wiring pattern of the semiconductor module shown in FIG.

【図4】本発明の第2の実施形態に係る半導体モジュー
ルを概略的に示す断面図である。
FIG. 4 is a sectional view schematically showing a semiconductor module according to a second embodiment of the present invention.

【図5】本発明の第3の実施形態に係る半導体モジュー
ルを概略的に示す断面図である。
FIG. 5 is a sectional view schematically showing a semiconductor module according to a third embodiment of the present invention.

【図6】従来の半導体モジュールを概略的に示す断面図
である。
FIG. 6 is a sectional view schematically showing a conventional semiconductor module.

【図7】外部接続端子の配置を示す図である。FIG. 7 is a diagram showing an arrangement of external connection terminals.

【図8】従来のチップ・基板構造体を概略的に示す図で
ある。
FIG. 8 is a diagram schematically showing a conventional chip / substrate structure.

【図9】従来の基板及び配線パターンを概略的に示す平
面図である。
FIG. 9 is a plan view schematically showing a conventional substrate and wiring pattern.

【符号の説明】[Explanation of symbols]

1…半導体モジュール、 2…基板、 3…配線パターン、 4…半導体チップ、 5…チップ・基板構造体、 6…層間基板、 7…接続導電層、 8…樹脂、 9…配線パターン、 10…外部接続端子。 1 ... Semiconductor module, 2 ... substrate, 3 ... Wiring pattern, 4 ... Semiconductor chip, 5 ... Chip / substrate structure, 6 ... Interlayer substrate, 7 ... Connection conductive layer, 8 ... Resin, 9 ... Wiring pattern, 10 ... External connection terminal.

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】基板上に半導体チップが配設された基板構
造体が、複数積層されてなる半導体モジュールであっ
て、 絶縁性の上側基板と、 前記上側基板の下方に配設された絶縁性の下側基板と、 前記上側及び下側基板上にそれぞれ配設された複数の信
号配線と、 前記信号配線のそれぞれを間隔をおいて囲うように前記
上側及び下側基板上にそれぞれ配設された第1共通電位
配線と、 前記上側及び下側基板上にそれぞれ配設され、且つ前記
信号配線及び前記第1共通電位配線と電気的に接続され
た電極パッドを有する半導体チップと、 前記下側基板の下方に配設され、且つ前記下側基板と反
対側の面上に配設された配線パターンを有する、支持基
板と、 前記上側基板と下側基板との間に配設され、且つ前記上
側及び下側基板上の前記信号配線を相互に電気的に接続
する第1接続導電層と、 前記上側基板と下側基板との間に配設され、且つ前記上
側及び下側基板上の前記第1共通電位配線を相互に電気
的に接続する第2接続導電層と、 前記支持基板を貫通して配設され、前記第1及び第2接
続導電層と、前記配線パターンと、を電気的に接続する
第3接続導電層と、 前記配線パターン上に配設された外部接続端子と、 を具備することを特徴とする半導体モジュール。
1. A semiconductor module in which a plurality of substrate structures, each having a semiconductor chip disposed on a substrate, are stacked, the upper module having an insulating property, and the insulating feature disposed below the upper substrate. A lower substrate, a plurality of signal wirings respectively arranged on the upper and lower substrates, and a plurality of signal wirings respectively arranged on the upper and lower substrates so as to surround each of the signal wirings at intervals. A first common potential wiring; a semiconductor chip having electrode pads respectively disposed on the upper and lower substrates and electrically connected to the signal wiring and the first common potential wiring; A support substrate disposed below the substrate and having a wiring pattern disposed on a surface opposite to the lower substrate, and disposed between the upper substrate and the lower substrate, and The signal wiring on the upper and lower substrates And a first connection conductive layer electrically connecting the first common potential wiring on the upper and lower substrates and electrically connected to each other. A second connection conductive layer that is connected to the second connection conductive layer, a third connection conductive layer that is disposed so as to penetrate the support substrate, and that electrically connects the first and second connection conductive layers and the wiring pattern, An external connection terminal disposed on the wiring pattern, and a semiconductor module.
【請求項2】前記信号配線及び第1共通電位配線は、前
記上側基板の前記下側基板と対向する第1面上と、前記
下側基板の前記第1面と反対側の第2面上と、に配設さ
れることを特徴とする請求項1に記載の半導体モジュー
ル。
2. The signal wiring and the first common potential wiring are on a first surface of the upper substrate facing the lower substrate and on a second surface of the lower substrate opposite to the first surface. The semiconductor module according to claim 1, wherein the semiconductor module is provided in the semiconductor module.
【請求項3】前記上側基板と前記下側基板との間に配設
された絶縁性の層間基板をさらに具備し、前記第1接続
導電層は、前記層間基板を貫通して形成されることを特
徴とする請求項1または2に記載の半導体モジュール。
3. An insulating interlayer substrate disposed between the upper substrate and the lower substrate, wherein the first connection conductive layer is formed so as to penetrate the interlayer substrate. The semiconductor module according to claim 1, wherein the semiconductor module is a semiconductor module.
【請求項4】前記第1共通電位配線は、前記信号配線の
それぞれを間隔をおいて囲うように、且つ前記信号配線
のそれぞれの間を埋めるように配設されることを特徴と
する請求項1または2に記載の半導体モジュール。
4. The first common potential wiring is arranged so as to surround each of the signal wirings with a space and to fill the space between each of the signal wirings. 1. The semiconductor module according to 1 or 2.
【請求項5】前記第1共通電位配線は、前記信号配線の
それぞれを間隔をおいて囲うように、且つ前記信号配線
のそれぞれの間を埋めるように、且つ前記上側及び下側
基板の略全面上に配設されることを特徴とする請求項1
または2に記載の半導体モジュール。
5. The first common potential wirings surround each of the signal wirings at intervals and fill the spaces between the signal wirings, and substantially the entire surfaces of the upper and lower substrates. It is provided on the upper side, and is characterized by the above-mentioned.
Alternatively, the semiconductor module according to item 2.
【請求項6】前記第1共通電位配線は、グランド線また
は電源線であることを特徴とする請求項1に記載の半導
体モジュール。
6. The semiconductor module according to claim 1, wherein the first common potential wiring is a ground line or a power supply line.
【請求項7】前記第1共通電位配線は、前記上側基板の
前記第1面と対向する第3面上と、前記下側基板の前記
第2面と対向する第4面上と、の全面にさらに配設さ
れ、前記第1共通電位配線はそれぞれが電気的に接続さ
れることを特徴とする請求項1乃至5のいずれかに記載
の半導体モジュール
7. The entire first common potential wiring is on a third surface of the upper substrate facing the first surface and on a fourth surface of the lower substrate facing the second surface. 6. The semiconductor module according to claim 1, wherein the first common potential wiring is further electrically connected to each other.
【請求項8】前記上側基板と前記下側基板との間に配設
され、且つ上面及び下面に配設された平面状の第2共通
電位配線を有する、中間基板をさらに具備し、前記第
1、第2共通電位配線は相互に電気的に接続されること
を特徴とする請求項1に記載の半導体モジュール。
8. An intermediate substrate, further comprising: an intermediate substrate, which is disposed between the upper substrate and the lower substrate and has planar second common potential wirings disposed on an upper surface and a lower surface, The semiconductor module according to claim 1, wherein the first and second common potential wirings are electrically connected to each other.
【請求項9】前記第2共通電位配線は前記上面及び前記
下面の略全面に配設されることを特徴とする請求項8に
記載の半導体モジュール。
9. The semiconductor module according to claim 8, wherein the second common potential wiring is provided on substantially the entire upper surface and the lower surface.
JP2002069209A 2002-03-13 2002-03-13 Semiconductor module Pending JP2003273321A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002069209A JP2003273321A (en) 2002-03-13 2002-03-13 Semiconductor module

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Cited By (6)

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JP2005019568A (en) * 2003-06-24 2005-01-20 Fujitsu Ltd Stacked semiconductor device
US7282791B2 (en) 2004-07-09 2007-10-16 Elpida Memory, Inc. Stacked semiconductor device and semiconductor memory module
US7368813B2 (en) 2003-11-10 2008-05-06 Casio Computer Co., Ltd. Semiconductor device including semiconductor element surrounded by an insulating member and wiring structures on upper and lower surfaces of the semiconductor element and insulating member, and manufacturing method thereof
US7608480B2 (en) 2004-03-31 2009-10-27 Casio Computer Co., Ltd. Method of fabricating a semiconductor device incorporating a semiconductor constructing body and an interconnecting layer which is connected to a ground layer via a vertical conducting portion
US7615411B2 (en) 2003-06-03 2009-11-10 Casio Computer Co., Ltd. Semiconductor package including connected upper and lower interconnections, and manufacturing method thereof
US8203849B2 (en) 2006-03-15 2012-06-19 Elpida Memory, Inc. Semiconductor device and manufacture method thereof

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7615411B2 (en) 2003-06-03 2009-11-10 Casio Computer Co., Ltd. Semiconductor package including connected upper and lower interconnections, and manufacturing method thereof
US7709942B2 (en) 2003-06-03 2010-05-04 Casio Computer Co., Ltd. Semiconductor package, including connected upper and lower interconnections
JP2005019568A (en) * 2003-06-24 2005-01-20 Fujitsu Ltd Stacked semiconductor device
US7368813B2 (en) 2003-11-10 2008-05-06 Casio Computer Co., Ltd. Semiconductor device including semiconductor element surrounded by an insulating member and wiring structures on upper and lower surfaces of the semiconductor element and insulating member, and manufacturing method thereof
US7563640B2 (en) 2003-11-10 2009-07-21 Casio Computer Co., Ltd. Semiconductor device including semiconductor element surrounded by an insulating member and wiring structures on upper and lower surfaces of the semiconductor element and insulating member, and manufacturing method thereof
US7692282B2 (en) 2003-11-10 2010-04-06 Casio Computer Co., Ltd Semiconductor device including semiconductor element surrounded by an insulating member wiring structures on upper and lower surfaces of the semiconductor element and insulating member, and manufacturing method thereof
USRE43380E1 (en) 2003-11-10 2012-05-15 Teramikros, Inc. Semiconductor device including semiconductor element surrounded by an insulating member and wiring structures on upper and lower surfaces of the semiconductor element and insulating member, and manufacturing method thereof
US7608480B2 (en) 2004-03-31 2009-10-27 Casio Computer Co., Ltd. Method of fabricating a semiconductor device incorporating a semiconductor constructing body and an interconnecting layer which is connected to a ground layer via a vertical conducting portion
US7282791B2 (en) 2004-07-09 2007-10-16 Elpida Memory, Inc. Stacked semiconductor device and semiconductor memory module
US8203849B2 (en) 2006-03-15 2012-06-19 Elpida Memory, Inc. Semiconductor device and manufacture method thereof

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