JP2003248289A - Heat developing device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a heat developing device by which a contact resistance between a heat developable sensitive material and a guide member right after heat development is performed is reduced. <P>SOLUTION: The heat developing device is provided with a heat developing part by which the heat developable sensitive material is fed by a roller and the heat development of the heat developable sensitive material is performed by pressing and heating at a feeding time. Also, the heat developing device is provided with a guide member 4 brought into contact with the heat developable sensitive material for which the heat development is performed and to guide the heat developable sensitive material in a specified direction on a next process side from the heat developing part. The guide member 4 is arranged right after the heat developing part and is made of metal or a resin, and several recessed and projected parts are formed on the surface of the guide member 4 so as to reduce a contact area with the heat developable sensitive material for which the heat development is performed by the heat developing part. Then, several grooves as the recessed parts 4a and several protrusions as the projected parts 4b are formed nearly in the feeding direction of the heat developable sensitive material fed on the surface of the guide member 4. <P>COPYRIGHT: (C)2003,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention conveys a heat-developable photosensitive material by rollers and pressurizes and heats during conveyance,
The present invention relates to a heat developing apparatus having a heat developing section for thermally developing the heat-developable photosensitive material.

[0002]

2. Description of the Related Art A heat developing section of a heat developing apparatus (hereinafter referred to as "apparatus") for performing heat development on a silver halide photosensitive heat developable photosensitive material (hereinafter referred to as "heat development photosensitive material") will be briefly described. As shown in FIG. 4, the heat developing section 1 for heat-development of the heat-developable photosensitive material F includes a heating roller 2 whose temperature is controlled to a predetermined temperature and a predetermined interval along the circumferential direction of the heating roller 2. A plurality of biasing rollers 3 provided open and biased in the direction toward the rotation axis of the heating roller 2, and a sheet-like thermal development feeling is provided between the heating roller 2 and the plurality of biasing rollers 3. The heat-developable photosensitive material F is thermally developed by rotating the heating roller 2 while sandwiching the material F. Then, the tip of the heat-developable photosensitive material F sent out (taken out from the heat developing section 1) between the heating roller 2 and the endmost urging roller 3a arranged at the most downstream side among the plurality of urging rollers 3. The portion contacts the surface of a guide member 4 disposed below the urging roller 3a at the end, and the heat-developable photosensitive material F is guided by the guide member 4 so as to be separated from the heating roller 2. Slide down the top of 4. After that, the heat-developable photosensitive material F is nipped between the driving roller 5a which rotates in one direction and the driven roller 5b which is driven by the rotation of the driving roller 5a, and is conveyed in the next process (see the arrow in FIG. 4). It is supposed to be transported to.

Here, in order to save the space of the apparatus itself or for the convenience of the structure of the apparatus itself, in the guide member 4 described above, as shown in FIG. Collide at a predetermined angle with the direction in which it is carried out from the developing unit 1 (the direction in which the leading end of the heat-developable photosensitive material F passes through the urging roller 3a at the end and is separated from the heating roller 2 toward the guide member 4). It is arranged. Therefore, a considerable amount of contact resistance occurs between the tip of the heat-developable photosensitive material F and the guide member 4. Further, when the cut sheet-shaped heat-developable photosensitive material F passes over the guide member 4, contact resistance is also generated between the tip portion of the heat-developable photosensitive material F and the guide member 4.

Further, the heat-developable photosensitive material F formed into a roll before being installed in the apparatus (see FIG. 5A).
Is cut to a desired size by the cutting blade 6 in the cutting step of changing from a roll form to a cut sheet form (see FIG. 5 (b)), but at this time, there are variations in cutting conditions. Alternatively, if the cutting blade 6 is worn away with time, the cutting surface of the heat-developable photosensitive material F may not be cut cleanly. This also means that the tip portion of the heat-developable photosensitive material F contacts the guide member 4. It will increase the resistance.

Further, the temperature of the photothermographic material F immediately after the heat development is 100 ° C. or higher, so that the inside of the emulsion layer F1 laminated on the surface of the photothermographic material F is liquefied and the emulsion layer F is liquefied.
1 is easily separated from the support F2 (see FIG. 5 (c)),
Further, since the glass transition point of PET (polyethylene terephthalate) of the support F2 is about 70 ° C., the photothermographic material F is in a flat state (softened state). At this time, even if the heat-developable photosensitive material F has a small resistance, it is easily affected by the resistance. Therefore, the heat-developable photosensitive material F immediately after being subjected to the heat-development (carried out from the heat-development unit 1) is not affected. Guide member 4
When the photothermographic material F comes into contact with the photothermographic material F, there are inconveniences such that the photothermographic material F is scratched (damaged or damaged) and the photothermographic material F has uneven density.

[0006]

Therefore, in order to solve the above-mentioned inconvenience, a non-woven fabric may be attached to the guide member 4 or the like. However, the heat-developable photosensitive material F and the guide member 4 contact each other. By repeating the above, the non-woven fabric is abraded with time or soiled by the organic acid generated from the photothermographic material F, and further, the emulsion is attached to the non-woven fabric, and the non-woven fabric needs to be handled as a consumable item. This allows
There is an inconvenience that a large amount of labor is required due to an increase in the maintenance process related to the replacement of the non-woven fabric.

An object of the present invention is to provide a heat developing apparatus which can reduce the contact resistance between the heat developing photosensitive material and the guide member immediately after the heat developing.

[0008]

The invention according to claim 1 is
A heat developing apparatus comprising a heat developing section for carrying a heat developing sensitive material by rollers and applying pressure and heat during the carrying, to thermally develop the heat developing sensitive material. A guide member for contacting the heat-developable photosensitive material and guiding the heat-developable photosensitive material in a predetermined direction on the side of the next process from the heat-development section is provided immediately after the heat-development section and is made of metal. Alternatively, it is made of resin, and a plurality of irregularities are formed on the surface of the guide member so as to reduce a contact area with the heat-developable photosensitive material which has been heat-developed by the heat-development section.

According to the first aspect of the present invention, since a plurality of irregularities are formed on the surface of the guide member so as to reduce the contact area with the photothermographic material, the guide member having a substantially flat surface is formed. Compared with the above, it is possible to reduce the contact area between the heat-developable photosensitive material carried out from the heat-development section and the surface of the guide member. As a result, the contact resistance between the heat-developable photosensitive material carried out from the heat-development section (heat-development by the heat-development section) and the guide member can be reduced as compared with the prior art. It is possible to significantly reduce scratches and uneven density on the surface of the photosensitive material. Further, in this case, since it is not necessary to deal with the non-woven fabric being attached to the guide member, the conventional inconvenience that the maintenance process for exchanging the non-woven fabric is increased and a lot of labor is required can be solved.

According to a second aspect of the present invention, there are provided in the guide member a plurality of grooves as concave portions and a plurality of ridges as convex portions in the unevenness formed on the surface of the guide member. It is preferable that the heat-developable photosensitive material that is guided and conveyed is substantially along the conveying direction. Note that claim 2
In other words, the direction in which the groove as the concave portion and the ridge as the convex portion extend is substantially parallel to the conveying direction of the heat-developable photosensitive material guided and conveyed by the guide member.
Therefore, it passes (is transported) on the surface of the guide member.
Focusing on an arbitrary portion of the heat-developable photosensitive material, since the arbitrary portion is not transported across the ridges as a plurality of convex portions during transportation, contact between the surface of the guide member and the heat-developable photosensitive material. The resistance can be suppressed as much as possible, and the heat-developable photosensitive material can be smoothly transported in the transport direction on the surface of the guide member. Further, the extending direction of the groove as the concave portion and the protrusion as the convex portion may be slightly curved with respect to the conveying direction of the heat-developable photosensitive material guided and conveyed by the guide member. Even in this case, the heat-developable photosensitive material can be smoothly transported in the transport direction on the surface of the guide member.

Further, as in the heat developing apparatus according to the third aspect of the invention, the tip end portion of the heat developing photosensitive material carried out from the heat developing section is directed toward the guide member and the heat developing section is carried out from the heat developing section. The angle α formed by the direction in which the heat-developable photosensitive material is guided by the guide member is 20 ° ≦ angle α ≦ 70 °, and the unevenness depth d of the unevenness formed in the guide member is
Is preferably 10 μm ≦ irregularity depth d.

In the structure of the third aspect of the invention, when the angle α is less than the angle α <20 °, the photothermographic material carried out from the heat developing section comes into contact with the guide member at a shallow angle. The contact resistance between the surface of the guide member and the photothermographic material is not so different between when the surface of the guide member is formed and when it is not formed, and the influence of the contact resistance is not so different. . On the other hand, when the angle α is greater than 70 °, the heat-developable photosensitive material comes into contact with the surface of the guide member so as to collide with the surface of the guide member at a deep angle even if any unevenness is formed on the surface of the guide member. Even if unevenness is formed on the surface to reduce the contact resistance between the surface of the guide member and the photothermographic material, the photothermographic material is easily scratched, which is not preferable. Further, when the unevenness depth d is the unevenness depth d <10 μm, deposits such as organic acids generated from the heat-developable photosensitive material are immediately accumulated in the recesses, so that the guide member and the heat-developable photosensitive material come into contact with each other. The meaning of the irregularities formed to reduce the area becomes undesirably thin.

[0013]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of a heat developing apparatus of the present invention will be described below with reference to the drawings. In the heat developing apparatus according to the present embodiment, the structure of the member of the heat developing unit that actually performs the heat development of the heat developing photosensitive material and the member related to the heat developing photosensitive material immediately after being carried out from the heat developing unit are , Fig. 4
Since they are substantially the same as the conventional ones described with reference to, the same reference numerals are given to these members and a detailed description of these members will be omitted. The heat-developable photosensitive material which is heat-developed in the heat-development section is in the form of a cut sheet, and the guide member is made of metal or resin.

As shown in FIG. 1A, on the surface of the guide member 4, a plurality of concave and convex portions are formed in a state where linear concave portions 4a and linear convex portions 4b are arranged substantially parallel to each other and repeatedly arranged. Are formed. The direction in which the grooves as the recesses 4a extend (or the direction in which the protrusions as the protrusions 4b extend) is substantially along the transport direction of the photothermographic material F. When the photothermographic material F is placed on the surface of the guide member 4, the ridges serving as the plurality of convex portions 4b and one side surface of the photothermographic material F are in line contact with each other. This allows
The contact area between the heat-developable photosensitive material F and the guide member 4 can be reduced. A coating material (for example, fluorine) may be applied to the surface of the guide member 4 in order to smoothly convey the photothermographic material F on the surface of the guide member 4.

When forming the above-mentioned unevenness on the surface of the guide member 4, (i) when the material of the guide member 4 is a metal, the unevenness is formed using a tool such as an end mill and a fullback. (Ii) When the material of the guide member 4 is a resin, the molten resin is poured into a mold having a desired unevenness and the resin is cured to form the unevenness. Instead of this, the cured resin may be processed to form irregularities.

The shape of the unevenness formed on the surface of the guide member 4 is shown in FIG. In addition, as shown in the unevenness in the upper part of FIG. 2, the width between the tops of the adjacent protrusions 4b (or the width between the bottoms of the adjacent recesses 4a) is a pitch p, and the bottom of the adjacent recesses 4a and the protrusions 4b. The height difference from the top of the
Express.

As for the unevenness on the upper stage, the unevenness depth d is approximately 2
5 μm: The pitch p is about 0.5 mm. Regarding the unevenness in the middle stage, the unevenness depth d is about 5 μm and the pitch p is about 0.25 mm. Regarding the unevenness in the lower stage, the unevenness depth d is about 15 μm and the pitch p is about 0.38 mm. As can be seen from the shapes of the unevenness, the pitch p increases as the unevenness depth d increases, and a proportional relationship is substantially established between the unevenness depth d and the formed minimum pitch p. .

Here, the following inconveniences (I) and (II) occur with respect to the pitch p and the uneven depth d. (I) When the uneven depth d is small (shallow), the photothermographic material F
Since the deposits such as organic acids generated from the above are immediately accumulated in the recesses 4a, the meaning of the unevenness formed to reduce the contact area between the guide member 4 and the photothermographic material F becomes undesirably small. (II) When the uneven depth d is large (deep), the uneven depth d
The pitch p also increases in proportion to. When the pitch p becomes large, when the heat-developable photosensitive material F comes into contact with the guide member 4, pitch unevenness occurs in the heat-developable photosensitive material F.

Since the surface of the guide member 4 is uneven, the heat-developable photosensitive material F that contacts the surface of the guide member 4 has a portion that contacts the guide member 4 and a portion that does not contact it. The heat energy of the heat-developable photosensitive material F is nonuniformly absorbed by the guide member 4. As a result, unevenness occurs in the image formed on the photothermographic material F. Here, this unevenness is referred to as "pitch unevenness". Therefore, a suitable uneven depth d and pitch p that can solve the inconveniences (I) and (II) described above are required.

FIG. 3 shows the relationship between the occurrence rate of scratches and the occurrence rate of pitch unevenness on the photothermographic material F with respect to the uneven depth d. In the figure, the upper limit of the occurrence rate of scratches and the occurrence rate of pitch unevenness is zero, which means that the occurrence of scratches or pitch unevenness disappears as the various curves described below approach zero, and the curve falls downward. It means that the number of scratches or uneven pitches increases. In addition, as shown in FIG. 4, the direction toward the surface of the guide member 4 at the tip of the heat-developable photosensitive material F carried out from the heat-development section 1 and the heat-developable photosensitive material F carried out from the heat-development section 1 are shown. An angle formed by the guide member 4 and the direction in which the guide member 4 guides is expressed as “angle α”.

Curves in the figure (hereinafter referred to as "curves")
Indicates the rate of scratches generated on the photothermographic material F at the angle α = 20 °. A curve (hereinafter, referred to as “curve”) in the drawing shows a rate of scratches generated on the photothermographic material F at an angle α = 70 °. A curve (hereinafter, referred to as “curve”) in the drawing shows a ratio of pitch unevenness generated in the photothermographic material F.

For curves and curves, the depth of unevenness d
Becomes larger, more specifically, it converges to zero until the unevenness depth d reaches near 200 μm, and the unevenness depth d becomes 200 μm.
It becomes almost zero when the distance exceeds m. That is, as the uneven depth d increases, the number of scratches on the photothermographic material F decreases. Although FIG. 3 shows two cases of the angle α = 20 ° and the angle α = 70 °, each angle is 20 °.
In the case of ° <angle α <70 °, a curve and a curve exhibiting substantially the same behavior as the curve are formed between the curves. In the case of the angle α <20 °, the heat-developable photosensitive material F carried out from the heat-development section 1 (passes the urging roller 3a at the end and is peeled off from the heating roller 2) is applied to the surface of the guide member 4 at a shallow angle. Since they come into contact with each other, there is not much difference in the rate of scratches generated on the heat-developable photosensitive material F between when the surface of the guide member 4 is formed and when it is not formed. On the other hand, when the angle α> 70 °, the heat-developable photosensitive material F contacts the surface of the guide member 4 at a deep angle so as to collide with the guide member 4, no matter what irregularity is formed on the guide member 4. Even if unevenness is formed on the surface to reduce the contact resistance between the surface of the guide member 4 and the photothermographic material F, the photothermographic material F is easily scratched, which is not preferable. Therefore, considering the occurrence rate of scratches on the photothermographic material F, the angle α is preferably 20 ° ≦ angle α ≦ 70 °. Further, regarding the curve, when the unevenness depth d is the unevenness depth d <10 μm, the heat-developable photosensitive material F has a large proportion of scratches, and the heat-developable photosensitive material may become a defect, which is preferable. Absent. Therefore, considering the occurrence rate of scratches on the photothermographic material F, the unevenness depth d satisfies 10 μm ≦ unevenness depth d, more preferably 20 μm ≦ unevenness depth d.
It is preferable to satisfy.

Regarding the curve, as the depth d of the unevenness increases, more specifically, the depth d of the unevenness drops downward from a point exceeding about 200 μm. That is, the greater the unevenness depth d, the greater the pitch unevenness generated in the photothermographic material F. Regarding the curve, it is particularly preferable if the unevenness depth d is the unevenness depth d ≦ 200 μm because there is no pitch unevenness, and if the unevenness depth d is 200 μm <the unevenness depth d ≦ 500 μm, the pitch unevenness is Since the heat-developable photosensitive material F is small, it does not become a defect. When the unevenness depth d is 500 μm <the unevenness depth d, there are many uneven pitches occurring in the heat-developable photosensitive material F, and this heat-developable photosensitive material F may become a defect, which is not preferable. However,
Depending on the processing accuracy when forming the unevenness on the surface of the guide member 4, the size of the pitch p with respect to the unevenness depth d can be suppressed, and thus the occurrence rate of pitch unevenness due to the increase of the unevenness depth d can also be suppressed. It becomes possible. Therefore, the upper limit of the uneven depth d is not particularly limited.

From these facts, considering the rate of occurrence of scratches and the rate of unevenness of pitch occurring in the photothermographic material F, the angle α satisfies 20 ° ≦ angle α ≦ 70 ° and the depth d of the unevenness is satisfied.
Is required to satisfy 10 μm ≦ concavo-convex depth d (preferably 20 μm ≦ concavo-convex depth d).

As described above, according to the heat developing apparatus of the present embodiment, since a plurality of irregularities are formed on the surface of the guide member 4 so as to reduce the contact area with the photothermographic material F, the surface is substantially flat. The contact area between the heat-developable photosensitive material F carried out from the heat-development section 1 and the surface of the guide member 4 can be reduced as compared with the guide member formed in a shape. As a result, the contact resistance between the heat-developable photosensitive material F carried out from the heat-development unit 1 (heat-development by the heat-development unit 1) and the guide member 4 can be reduced as compared with the conventional case, so that the contact resistance with the guide member 4 is reduced. It is possible to significantly reduce scratches and uneven density on the surface of the photothermographic material F caused by the contact. Further, in this case, since it is not necessary to attach a non-woven fabric to the guide member 4 or the like, it is possible to eliminate the conventional inconvenience that the maintenance process for exchanging the non-woven fabric is increased and much labor is required.

Further, in this embodiment, the direction in which the groove as the concave portion 4a and the protrusion as the convex portion 4b extend and the conveying direction of the heat-developable photosensitive material F guided by the guide member 4 are conveyed. Since the concavities and convexities are formed to be substantially parallel to each other, focusing on an arbitrary portion of the conveyed heat-developable photosensitive material F,
Since the arbitrary portion is not transported across the ridges as the plurality of convex portions 4b during the transportation, the contact area between the surface of the guide member 4 and the heat-developable photosensitive material F can be suppressed as much as possible. The photothermographic material F can be smoothly transported in the transport direction on the surface of the guide member 4.

The present invention is not limited to the above embodiment, and various improvements and design changes may be made without departing from the spirit of the present invention. For example, as shown in FIG. 1B, curved arc-shaped irregularities may be formed on the surface of the guide member 4, and particularly when the guide member 4 is made of metal, a general-purpose disc-shaped cut is formed. Since irregularities can be formed using a tool with a blade,
The cost at the time of forming the unevenness can be suppressed. Also, FIG.
As described above, in the present embodiment, the heat development photosensitive material F is sandwiched between the heating roller 2 and the plurality of biasing rollers 3 in the heat development portion 1, and the heat development photosensitive material F is attached to the heat development photosensitive material F. Although the configuration is such that thermal development is performed, a configuration alternative to this may be employed. That is, in a heat developing portion including a heating member that is flat and temperature-controlled to a predetermined heat developing temperature, and a plurality of biasing rollers that are biased toward the heating member, the heating member and the biasing roller By rotating the biasing roller with the heat-developable photosensitive material sandwiched between them, the heat-developable photosensitive material is conveyed while being heated while being pressed against the heating member by the biasing roller. May be In addition, in the heat developing unit including a flat plate-shaped member and a plurality of biasing rollers that are biased toward the flat plate-shaped member and whose temperature is controlled to a predetermined heat development temperature, the flat plate-shaped member and the biasing roller are provided. By rotating the biasing roller while sandwiching the heat-developable photosensitive material between the two, the heat-developable photosensitive material is conveyed while being heated while being pressed against the flat plate member by the biasing roller. It may be configured to perform.

[0028]

According to the present invention, the contact resistance between the heat-developable photosensitive material and the guide member immediately after the heat-development can be reduced, so that the surface of the heat-developable photosensitive material caused by the contact with the guide member can be reduced. It is possible to significantly reduce scratches and uneven density. Further, in this case, since it is not necessary to deal with the non-woven fabric being attached to the guide member, the conventional inconvenience that the maintenance process for exchanging the non-woven fabric is increased and a lot of labor is required can be solved.

[Brief description of drawings]

FIG. 1 is a perspective view showing a guide member of a heat developing device according to the present embodiment.

FIG. 2 is a view showing a shape of unevenness provided on the guide member.

FIG. 3 is a diagram showing the relationship between the occurrence rate of scratches and the occurrence rate of pitch unevenness of the photothermographic material with respect to the depth of the unevenness.

FIG. 4 is a side view showing members in the vicinity of the developing section of the thermal developing device according to the related art and the present embodiment.

FIG. 5 is a diagram showing a heat-developable photosensitive material for explaining the problems of the prior art.

[Explanation of symbols]

1 Thermal development section 2 heating roller 3 energizing rollers 4 Guide member 4a recess 4b convex part p uneven pitch d Depth of unevenness 5 Conveyor rollers F Photothermographic material F1 emulsion layer F2 support

Claims (3)

[Claims] 1. A heat developing apparatus comprising: a heat developing section which conveys a heat developing sensitive material by a roller and pressurizes and heats during the conveying to heat develop the heat developing sensitive material; And a guide member for guiding the heat-developable photosensitive material in a predetermined direction on the side of the next process from the heat-development section, the guide member being disposed immediately after the heat-development section. The guide member is made of metal or resin, and the surface of the guide member is provided with a plurality of irregularities so as to reduce a contact area with the heat-developable photosensitive material thermally developed in the heat-development section. Heat developing device. 2. A heat-developable photosensitive material carrying direction in which a plurality of grooves as concave portions and a plurality of ridges as convex portions in unevenness formed on the surface of the guide member are guided and carried by the guide member. The heat developing apparatus according to claim 1, wherein the heat developing apparatus is substantially aligned with the heat developing apparatus. 3. A direction toward the guide member at the tip of the heat-developable photosensitive material carried out from the heat-development section, and a direction in which the heat-developable photosensitive material carried out from the heat-development section is guided by the guide member. The angle α formed by is 20 ° ≦ angle α ≦ 70 °
3. The thermal developing apparatus according to claim 1, wherein the unevenness depth d of the unevenness formed on the guide member is 10 μm ≦ unevenness depth d.