JP2003217348A - Conductive paste, manufacturing method therefor and light-transmissive touch panel using this - Google Patents

Conductive paste, manufacturing method therefor and light-transmissive touch panel using this

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Publication number
JP2003217348A
JP2003217348A JP2002011357A JP2002011357A JP2003217348A JP 2003217348 A JP2003217348 A JP 2003217348A JP 2002011357 A JP2002011357 A JP 2002011357A JP 2002011357 A JP2002011357 A JP 2002011357A JP 2003217348 A JP2003217348 A JP 2003217348A
Authority
JP
Japan
Prior art keywords
conductive layer
indium
silver
conductive paste
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002011357A
Other languages
Japanese (ja)
Inventor
Koji Tanabe
功二 田邉
Toshiharu Fukui
俊晴 福井
Kenichi Takahata
謙一 高畠
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2002011357A priority Critical patent/JP2003217348A/en
Publication of JP2003217348A publication Critical patent/JP2003217348A/en
Pending legal-status Critical Current

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Abstract

<P>PROBLEM TO BE SOLVED: To provide a conductive paste and a light-transmissive touch panel using this in which the connection resistance at a boundary face of a conductive layer and an electrode is small in the light-transmissive touch panel used for operation, in various kinds of electronic instruments. <P>SOLUTION: The conductive paste is formed by dispersing an alloy of silver and indium or a compound in which indium is deposited on silver in a synthetic resin and making the ratio of indium against the silver to 1-50 wt.%. Thereby, since the electrode formed by the conductive paste containing the same indium as a constituent of the conductive layer has good affinity for the boundary face of the conductive layer made of indium oxide tin, the conductive paste can be obtained in which the connection resistance at the boundary face of the upper conductive layer 6 and the upper electrode 17 and the connection resistance of the boundary face of the lower conductive layer 2 and the lower electrode 13 and a whole resistance value of the upper electrode 17 and the lower electrode 13 can be made small. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、導電ペーストとそ
の製造方法及びこれを用いた光透過性タッチパネルに関
するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a conductive paste, a method for manufacturing the same, and a light-transmitting touch panel using the same.

【0002】[0002]

【従来の技術】近年、電子機器の高機能化や多様化が進
むに伴い、LCD等の表示素子の前面に光透過性タッチ
パネルを装着し、この光透過性タッチパネルを通して表
示素子に表示された文字や記号、絵柄等の視認、選択を
行い、光透過性タッチパネルの操作によって機器の各機
能の切換えを行うものが増えている。
2. Description of the Related Art In recent years, as electronic equipment has become more sophisticated and diversified, a light transmissive touch panel is mounted on the front surface of a display element such as an LCD, and characters displayed on the display element through the light transmissive touch panel. Increasingly, the functions and functions of the device are switched by visually recognizing and selecting symbols, symbols, pictures, etc. and operating the light-transmissive touch panel.

【0003】このような従来の光透過性タッチパネルに
ついて、図2を用いて説明する。
Such a conventional light transmissive touch panel will be described with reference to FIG.

【0004】図2は従来の光透過性タッチパネルの断面
図であり、同図において、1は光透過性の下基板で、こ
の下基板1上面には酸化インジウム錫の光透過性の下導
電層2が形成されている。
FIG. 2 is a sectional view of a conventional light transmissive touch panel. In FIG. 2, reference numeral 1 denotes a light transmissive lower substrate, and a light transmissive lower conductive layer of indium tin oxide is provided on the upper surface of the lower substrate 1. 2 is formed.

【0005】そして、この下導電層2の上面に、銀を合
成樹脂中に分散させた導電ペーストにより形成された下
電極3が両端に形成されて、下光透過性導電配線基板4
が構成されている。
On the upper surface of the lower conductive layer 2, lower electrodes 3 made of a conductive paste in which silver is dispersed in a synthetic resin are formed at both ends, and a lower light-transmitting conductive wiring board 4 is formed.
Is configured.

【0006】また、5は光透過性の上基板で、この上基
板5下面には下導電層2と同様の上導電層6が形成され
ている。
Reference numeral 5 is an optically transparent upper substrate, and an upper conductive layer 6 similar to the lower conductive layer 2 is formed on the lower surface of the upper substrate 5.

【0007】そして、この上導電層6の下面に、下電極
3と同様の導電ペーストにより形成された上電極7が下
電極3とは直交方向をなす両端に形成されて、上光透過
性導電配線基板8が構成されている。
On the lower surface of the upper conductive layer 6, upper electrodes 7 made of a conductive paste similar to the lower electrode 3 are formed on both ends of the lower electrode 3 in a direction orthogonal to each other. The wiring board 8 is configured.

【0008】また、これら下光透過性導電配線基板4と
上光透過性導電配線基板8は、上下面に粘着剤(図示せ
ず)が塗布された額縁状のスペーサ9によって、下光透
過性導電配線基板4上面の下導電層2と上光透過性導電
配線基板8下面の上導電層6が所定の間隔を空けて対向
するように外周が貼合されて、光透過性タッチパネルが
構成されている。
Further, the lower light-transmissive conductive wiring board 4 and the upper light-transmissive conductive wiring board 8 are provided with a frame-like spacer 9 whose upper and lower surfaces are coated with an adhesive (not shown). The light-transmitting touch panel is configured by bonding the outer periphery of the lower conductive layer 2 on the upper surface of the conductive wiring substrate 4 and the upper conductive layer 6 on the lower surface of the upper light-transmitting conductive wiring substrate 8 so as to face each other with a predetermined gap. ing.

【0009】以上の構成において、上電極7と下電極3
が電子機器の検出回路に接続され、上基板1上面のスペ
ーサ9の部分を除く箇所、つまり、押圧操作及びその位
置検出が可能な動作有効エリアを指或いはペン等で押圧
操作すると、上基板1が撓み、押圧された箇所の上導電
層6が下導電層2に接触し、上電極7間及び下電極3間
の抵抗比によって、この押圧された位置を検出するよう
に構成されている。
In the above structure, the upper electrode 7 and the lower electrode 3
Is connected to the detection circuit of the electronic device, and a portion excluding the spacer 9 on the upper surface of the upper substrate 1, that is, an operation effective area where the pressing operation and its position can be detected is pressed with a finger or a pen, the upper substrate 1 The upper conductive layer 6 that is bent and pressed contacts the lower conductive layer 2, and the pressed position is detected by the resistance ratio between the upper electrodes 7 and between the lower electrodes 3.

【0010】[0010]

【発明が解決しようとする課題】しかしながら上記従来
の導電ペースト及びこれを用いた光透過性タッチパネル
においては、上下導電層の材料である酸化インジウム錫
と上下電極の材料である銀との親和性があまり良くない
ため、上導電層6と上電極7間及び下導電層2と下電極
3間の界面の接続抵抗が大きいという課題があった。
However, in the above-mentioned conventional conductive paste and the light transmissive touch panel using the same, the affinity between the material of the upper and lower conductive layers, indium tin oxide, and the material of the upper and lower electrodes, silver, is high. Since it was not so good, there was a problem that the connection resistance at the interfaces between the upper conductive layer 6 and the upper electrode 7 and between the lower conductive layer 2 and the lower electrode 3 was large.

【0011】本発明は、このような従来の課題を解決す
るものであり、導電層と電極の界面の接続抵抗の小さい
導電ペースト及びこれを用いた光透過性タッチパネルを
提供することを目的とする。
SUMMARY OF THE INVENTION The present invention is intended to solve such a conventional problem, and an object thereof is to provide a conductive paste having a small connection resistance at the interface between a conductive layer and an electrode, and a light transmissive touch panel using the same. .

【0012】[0012]

【課題を解決するための手段】上記目的を達成するため
に本発明は、以下の構成を有するものである。
In order to achieve the above object, the present invention has the following constitution.

【0013】本発明の請求項1に記載の発明は、合成樹
脂中に銀とインジウムの合金或いは銀にインジウムを付
着させたものを分散させると共に、この銀に対するイン
ジウムの比率を1〜50重量%として導電ペーストを形
成したものであり、導電層の構成成分と同じインジウム
が含有された導電ペーストで形成された電極は、酸化イ
ンジウム錫でできた導電層との界面の親和性が良いた
め、導電層と電極の界面の接続抵抗を小さくできると共
に、電極全体の抵抗値も小さくできる導電ペーストを得
ることができるという作用を有する。
According to the first aspect of the present invention, an alloy of silver and indium or a mixture of silver and indium deposited on a synthetic resin is dispersed, and the ratio of indium to silver is 1 to 50% by weight. The conductive paste is formed as, and the electrode formed of the conductive paste containing the same indium as the constituent of the conductive layer has a good affinity for the interface with the conductive layer made of indium tin oxide. This has the effect of making it possible to obtain a conductive paste that can reduce the connection resistance at the interface between the layer and the electrode and also reduce the resistance value of the entire electrode.

【0014】請求項2に記載の発明は、銀とインジウム
の粉末を攪拌して銀にインジウムを付着させる請求項1
記載の導電ペーストの製造方法としたものであり、簡易
に銀にインジウムを付着させることができるという作用
を有する。
According to a second aspect of the present invention, silver and indium powder are stirred to deposit indium on the silver.
This is a method for producing the conductive paste described above, and has an effect that indium can be easily attached to silver.

【0015】請求項3に記載の発明は、下面に上導電層
が形成された上基板と、上面に上導電層と所定の間隔を
空けて対向する下導電層が形成された下基板の、上導電
層または下導電層表面の少なくとも一方に請求項1記載
の導電ペーストによって電極を形成した光透過性タッチ
パネルを構成したものであり、接続抵抗が小さく検出誤
差の少ない光透過性タッチパネルを得ることができると
いう作用を有する。
According to a third aspect of the present invention, there is provided an upper substrate having an upper conductive layer formed on a lower surface thereof, and a lower substrate having a lower conductive layer formed on the upper surface thereof and facing the upper conductive layer with a predetermined gap therebetween. A light-transmissive touch panel having electrodes formed on the surface of at least one of an upper conductive layer and a lower conductive layer by the conductive paste according to claim 1, which has a small connection resistance and a small detection error. It has the effect that

【0016】請求項4に記載の発明は、請求項3記載の
発明において、導電層の表面に導電ペーストを印刷した
後、150〜250℃で乾燥して所定の電極を形成した
ものであり、インジウムは銀よりはるかに柔らかく展延
性に富むと共に融点が156℃であるため、150〜2
50℃での乾燥時に導電ペーストに含有しているインジ
ウムが表面から溶融し始め、導電層と電極の界面に広が
って更に接続抵抗を小さくできるという作用を有する。
According to a fourth aspect of the invention, in the third aspect of the invention, a predetermined electrode is formed by printing a conductive paste on the surface of the conductive layer and then drying at 150 to 250 ° C. Indium is much softer than silver and rich in malleability and has a melting point of 156 ° C.
When dried at 50 ° C., the indium contained in the conductive paste starts to melt from the surface and spreads to the interface between the conductive layer and the electrode to further reduce the connection resistance.

【0017】[0017]

【発明の実施の形態】以下、本発明の実施の形態につい
て、図1を用いて説明する。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to FIG.

【0018】なお、従来の技術の項で説明した構成と同
一構成の部分には同一符号を付して、詳細な説明を簡略
化する。
The same components as those described in the section of the prior art are designated by the same reference numerals to simplify the detailed description.

【0019】(実施の形態)図1は本発明の一実施の形
態による光透過性タッチパネルの断面図であり、同図に
おいて、1はガラスまたはアクリルやポリカーボネート
樹脂等の光透過性の下基板で、この下基板1上面には酸
化インジウム錫の光透過性の下導電層2が形成されてい
る。
(Embodiment) FIG. 1 is a cross-sectional view of a light-transmitting touch panel according to an embodiment of the present invention. In FIG. 1, reference numeral 1 is a light-transmitting lower substrate such as glass or acrylic or polycarbonate resin. A light-transmitting lower conductive layer 2 of indium tin oxide is formed on the upper surface of the lower substrate 1.

【0020】そして、合成樹脂中に銀とインジウムの合
金或いは銀にインジウムを付着させたものを分散させる
と共に、この銀に対するインジウムの比率を1〜50重
量%とした導電ペーストにより形成された下電極13
が、下導電層2の上面の両端に形成されて、下光透過性
導電配線基板14が構成されている。
Then, an alloy of silver and indium or a mixture of silver and indium adhered in a synthetic resin is dispersed, and a lower electrode formed of a conductive paste in which the ratio of indium to silver is 1 to 50% by weight. Thirteen
Are formed on both ends of the upper surface of the lower conductive layer 2 to form the lower light-transmissive conductive wiring board 14.

【0021】また、5はポリエチレンテレフタレートや
ポリカーボネートフィルム等の光透過性の上基板で、こ
の上基板5下面には下導電層2と同様の上導電層6が形
成されている。
Reference numeral 5 is a light-transmissive upper substrate such as polyethylene terephthalate or polycarbonate film, and an upper conductive layer 6 similar to the lower conductive layer 2 is formed on the lower surface of the upper substrate 5.

【0022】そして、この上導電層6の下面に、下電極
13と同様の導電ペーストにより形成された上電極17
が下電極13とは直交方向をなす両端に形成されて、上
光透過性導電配線基板18が形成されている。
Then, on the lower surface of the upper conductive layer 6, an upper electrode 17 formed of the same conductive paste as the lower electrode 13 is formed.
Are formed on both ends which are orthogonal to the lower electrode 13 to form an upper light-transmissive conductive wiring board 18.

【0023】また、これら下光透過性導電配線基板14
と上光透過性導電配線基板18は、上下面にアクリル系
やポリエステル系樹脂等の熱可塑性樹脂からなる粘着剤
(図示せず)が塗布された不織布やポリエステルフィル
ム等の額縁状のスペーサ9によって、下光透過性導電配
線基板14上面の下導電層2と上光透過性導電配線基板
18下面の上導電層6が所定の間隙を空けて対向するよ
うに外周が貼合されて、光透過性タッチパネルが構成さ
れている。
The lower light-transmissive conductive wiring board 14 is also used.
The upper light-transmitting conductive wiring board 18 is formed by a frame-shaped spacer 9 such as a non-woven fabric or a polyester film whose upper and lower surfaces are coated with an adhesive (not shown) made of a thermoplastic resin such as an acrylic resin or a polyester resin. The lower conductive layer 2 on the upper surface of the lower light-transmissive conductive wiring board 14 and the upper conductive layer 6 on the lower surface of the upper light-transmissive conductive wiring board 18 are bonded together at their outer peripheries so as to face each other with a predetermined gap therebetween, thereby transmitting light. A sex touch panel is configured.

【0024】以上の構成において、上電極17と下電極
13が電子機器の検出回路に接続され、上基板1上面の
スペーサ9の部分を除く箇所、つまり、押圧操作及びそ
の位置検出が可能な動作有効エリアを指或いはペン等で
押圧操作すると、上基板1が撓み、押圧された箇所の上
導電層6が下導電層2に接触し、上電極17間及び下電
極13間の抵抗比によって、この押圧された位置を検出
するように構成されている。
In the above-mentioned structure, the upper electrode 17 and the lower electrode 13 are connected to the detection circuit of the electronic device, and a position excluding the spacer 9 on the upper surface of the upper substrate 1, that is, an operation capable of pressing and detecting its position. When the effective area is pressed with a finger or a pen or the like, the upper substrate 1 bends, the upper conductive layer 6 contacts the lower conductive layer 2 at the pressed position, and the resistance ratio between the upper electrodes 17 and the lower electrodes 13 causes It is configured to detect the pressed position.

【0025】次に、このような導電ペーストの具体的な
製作方法及びこれを用いた電極の形成方法について説明
する。
Next, a specific method of producing such a conductive paste and a method of forming electrodes using the same will be described.

【0026】先ず、所定量の銀粉末(昭栄化学工業製A
g530)とインジウム粉末(三井金属製)をボールポ
ットミルに入れ、これに水:エタノール=70:30の
溶媒液と凝集防止のためステアリン酸を溶媒の0.01
重量%添加して10時間攪拌し、攪拌後メタノール洗浄
をして乾燥させる。
First, a predetermined amount of silver powder (A, manufactured by Shoei Chemical Industry Co., Ltd.)
g530) and indium powder (Mitsui Kinzoku Co., Ltd.) were put into a ball pot mill, and a solvent solution of water: ethanol = 70: 30 and stearic acid of 0.01% were added to prevent coagulation.
Add by weight% and stir for 10 hours. After stirring, wash with methanol and dry.

【0027】次に、この乾燥させたものにビスフェノー
ル樹脂(昭和化成株式会社製MR−1)とエチル化ルビ
トールをペースト粘度が10Pa.sになるように添加
して、攪拌し、導電ペーストを作製する。
Next, bisphenol resin (MR-1 manufactured by Showa Kasei Co., Ltd.) and ethylated rubitol were added to the dried product so that the paste viscosity was 10 Pa.s. s to give a conductive paste.

【0028】なお、この時銀に対してインジウムは1〜
60重量%の比率のものを作製した。
At this time, indium is 1 to 1 with respect to silver.
A 60 wt% ratio was prepared.

【0029】そして、この導電ペーストを上導電層6や
下導電層2上面に印刷して、その後150〜250℃で
乾燥し、上電極17や下電極13を形成する。
Then, this conductive paste is printed on the upper surfaces of the upper conductive layer 6 and the lower conductive layer 2 and then dried at 150 to 250 ° C. to form the upper electrode 17 and the lower electrode 13.

【0030】なお、インジウムは銀よりはるかに柔らか
く展延性に富むと共に融点が156℃であるため、15
0〜250℃での乾燥時に導電ペーストに含有している
インジウムが表面から溶融し始め、導電層と電極の界面
に広がり、更にこの界面の接続抵抗が小さくなる。
Since indium is much softer than silver and rich in spreadability, and has a melting point of 156 ° C.,
When dried at 0 to 250 ° C., the indium contained in the conductive paste begins to melt from the surface, spreads to the interface between the conductive layer and the electrode, and the connection resistance at this interface becomes smaller.

【0031】次に、このような導電ペーストの具体的な
評価方法について説明する。
Next, a specific method for evaluating such a conductive paste will be described.

【0032】以上のようにして、銀に対するインジウム
の比率を変えた導電ペーストを、ガラス基板上面に形成
された酸化インジウム錫の導電層上面に電極として形成
したものについて、電極と導電層との界面の接続抵抗値
を測定し、これを初期の接続抵抗値とした。
As described above, the conductive paste in which the ratio of indium to silver was changed was formed as the electrode on the upper surface of the conductive layer of indium tin oxide formed on the upper surface of the glass substrate. Was measured as the initial connection resistance value.

【0033】次に、85℃中に30分放置と−30℃中
に30分間放置を1サイクルとする、いわゆる熱衝撃試
験を1000サイクル行った後の接続抵抗値と、温度6
0℃・湿度95%RH中に放置する、いわゆる高温高湿
試験を1000時間行った後の接続抵抗値を測定した。
Next, the connection resistance value after 1000 cycles of a so-called thermal shock test, in which the test pieces were left at 85 ° C. for 30 minutes and at −30 ° C. for 30 minutes as one cycle, and a temperature of 6
The connection resistance value was measured after 1000 hours of so-called high temperature and high humidity test, in which the test piece was left to stand in 0 ° C. and 95% RH.

【0034】この評価結果を表1に示す。The results of this evaluation are shown in Table 1.

【0035】[0035]

【表1】 [Table 1]

【0036】表1から明らかなように、銀にインジウム
が含有されていないNo.1に比べ銀に対するインジウ
ムの比率が1〜50重量%であるNo.2から6のもの
は、初期の接続抵抗値が小さく、熱衝撃後及び高温高湿
後でも変化の小さなものとなっている。
As is apparent from Table 1, No. 1 in which silver does not contain indium was used. No. 1 in which the ratio of indium to silver is 1 to 50% by weight as compared with No. 1. Nos. 2 to 6 had small initial connection resistance values and showed little change after thermal shock and after high temperature and high humidity.

【0037】なお、銀に対するインジウムの比率が60
重量%のNo.7のものは、40重量%以下のNo.1
から5のものに比べて導電ペーストの電気伝導度の逆数
である比抵抗が10倍程度大きくなり、好ましくなかっ
た。
The ratio of indium to silver is 60.
% By weight of No. No. 7 of 40% by weight or less. 1
The specific resistance, which is the reciprocal of the electric conductivity of the conductive paste, was about 10 times larger than that of Nos. 5 to 5, which was not preferable.

【0038】以上のことより、銀に対するインジウムの
比率が1〜50重量%、より好ましくは10〜40重量
%とすることによって、初期だけでなく熱衝撃後及び高
温高湿後も含めて接続抵抗値が小さく、比抵抗も小さな
導電ペーストを得ることができる。
From the above, by setting the ratio of indium to silver to be 1 to 50% by weight, and more preferably 10 to 40% by weight, the connection resistance not only at the initial stage but also after thermal shock and after high temperature and high humidity can be obtained. A conductive paste having a small value and a small specific resistance can be obtained.

【0039】このように本実施の形態によれば、合成樹
脂中に銀とインジウムの合金或いは銀にインジウムを付
着させたものを分散させると共に、この銀に対するイン
ジウムの比率を1〜50重量%として導電ペーストを形
成することによって、導電層の構成成分と同じインジウ
ムが含有された導電ペーストで形成された電極は、酸化
インジウム錫でできた導電層との界面の親和性が良いた
め、上導電層6と上電極17及び下導電層2と下電極1
3の界面の接続抵抗を小さくできると共に、上電極17
及び下電極13全体の抵抗値も小さくできる導電ペース
トを得ることができるものである。
As described above, according to the present embodiment, the alloy of silver and indium or the one in which indium is attached to silver is dispersed in the synthetic resin, and the ratio of indium to silver is set to 1 to 50% by weight. By forming the conductive paste, the electrode formed of the conductive paste containing the same indium as the constituent component of the conductive layer has a good interface affinity with the conductive layer made of indium tin oxide. 6 and the upper electrode 17, and the lower conductive layer 2 and the lower electrode 1
The connection resistance at the interface of 3 can be reduced and the upper electrode 17
Also, it is possible to obtain a conductive paste that can reduce the resistance value of the entire lower electrode 13.

【0040】また、銀とインジウムの粉末を攪拌して導
電ペーストを製造することによって、簡易に銀にインジ
ウムを付着させることができる。
Further, indium can be easily attached to silver by stirring the silver and indium powders to produce a conductive paste.

【0041】そして、下面に上導電層6が形成された上
基板5と、上面に上導電層6と所定の間隔を空けて対向
する下導電層2が形成された下基板1の、上導電層6ま
たは下導電層2表面の少なくとも一方に導電ペーストに
より上、下電極17や13を形成して光透過性タッチパ
ネルを構成することによって、接続抵抗が小さく検出誤
差の少ない光透過性タッチパネルを得ることができる。
Then, the upper conductivity of the upper substrate 5 having the lower conductive layer 6 formed on the lower surface and the lower substrate 1 having the lower conductive layer 2 facing the upper conductive layer 6 at a predetermined distance on the upper surface are formed. By forming the upper and lower electrodes 17 and 13 with the conductive paste on at least one of the surface of the layer 6 or the lower conductive layer 2 to form the light transparent touch panel, a light transparent touch panel having a small connection resistance and a small detection error is obtained. be able to.

【0042】また、導電層の表面に導電ペーストを印刷
した後、150〜250℃で乾燥して所定の電極を形成
することによって、インジウムは銀よりはるかに柔らか
く展延性に富むと共に融点が156℃であるため、15
0〜250℃での乾燥時に導電ペーストに含有している
インジウムが表面から溶融し始め、導電層と電極の界面
に広がって更に接続抵抗を小さくできる。
Further, by printing a conductive paste on the surface of the conductive layer and drying at 150 to 250 ° C. to form a predetermined electrode, indium is much softer than silver and has a good spreadability and a melting point of 156 ° C. Therefore, 15
The indium contained in the conductive paste starts to melt from the surface during drying at 0 to 250 ° C., spreads to the interface between the conductive layer and the electrode, and the connection resistance can be further reduced.

【0043】なお、以上の説明では、導電ペーストとし
て銀にインジウムを付着させたものを合成樹脂中に分散
させるものを用いて説明したが、溶融した銀と溶融した
インジウムをそれぞれの融点以上の温度で混合したもの
を冷却し、凝固させた銀とインジウムの合金を合成樹脂
中に分散させたものを使用しても本発明の実施は可能で
ある。
In the above description, a conductive paste in which indium is adhered to silver is dispersed in a synthetic resin has been described. However, molten silver and molten indium are heated at temperatures above their respective melting points. The present invention can be practiced by using a mixture obtained by cooling the mixture obtained in (1) and cooling and solidifying the alloy of silver and indium in a synthetic resin.

【0044】[0044]

【発明の効果】以上のように本発明によれば、電極を形
成する導電ペーストに酸化インジウム錫でできた導電層
と界面の親和性の良いインジウムを用いることによっ
て、導電層と電極の界面の接続抵抗の小さい導電ペース
ト及びこれを用いた光透過性タッチパネルを提供できる
という有利な効果が得られる。
As described above, according to the present invention, by using indium having a good affinity for the conductive layer made of indium tin oxide in the conductive paste forming the electrode, the conductive layer-electrode interface can be formed. An advantageous effect that a conductive paste having a low connection resistance and a light transmissive touch panel using the same can be provided is obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施の形態による光透過性タッチパ
ネルの断面図
FIG. 1 is a cross-sectional view of a light transmissive touch panel according to an embodiment of the present invention.

【図2】従来の光透過性タッチパネルの断面図FIG. 2 is a sectional view of a conventional light transmissive touch panel.

【符号の説明】[Explanation of symbols]

1 下基板 2 下導電層 3,13 下電極 4,14 下光透過性導電性配線基板 5 上基板 6 上導電層 7,17 上電極 8,18 上光透過性導電配線基板 9 スペーサ 1 Lower substrate 2 Lower conductive layer 3,13 Lower electrode 4,14 Lower light transmitting conductive wiring board 5 Upper substrate 6 Upper conductive layer 7,17 Upper electrode 8,18 Light-transmissive conductive wiring board 9 spacers

フロントページの続き (72)発明者 高畠 謙一 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 Fターム(参考) 5G006 AA01 AZ05 CD06 DD01 FB14 FB19 FB30 FB39 5G050 AA01 AA19 BA04 CA16 DA10 5G301 DA02 DA03 DA42 DD01 DE01Continued front page    (72) Inventor Kenichi Takahata             1006 Kadoma, Kadoma-shi, Osaka Matsushita Electric             Sangyo Co., Ltd. F-term (reference) 5G006 AA01 AZ05 CD06 DD01 FB14                       FB19 FB30 FB39                 5G050 AA01 AA19 BA04 CA16 DA10                 5G301 DA02 DA03 DA42 DD01 DE01

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 合成樹脂中に銀とインジウムの合金或い
は銀にインジウムを付着させたものを分散させると共
に、この銀に対するインジウムの比率を1〜50重量%
とした導電ペースト。
1. An alloy of silver and indium or a mixture of silver and indium adhered in a synthetic resin is dispersed, and the ratio of indium to silver is 1 to 50% by weight.
And conductive paste.
【請求項2】 請求項1記載の導電性ペーストの製造は
銀とインジウムの粉末を攪拌して銀にインジウムを付着
させる導電ペーストの製造方法。
2. The method for producing a conductive paste according to claim 1, wherein the powder of silver and indium is stirred to deposit indium on the silver.
【請求項3】 下面に上導電層が形成された上基板と、
上面に上記上導電層と所定の間隔を空けて対向する下導
電層が形成された下基板からなり、上記上導電層または
上記下導電層表面の少なくとも一方に請求項1記載の導
電ペーストによって電極を形成した光透過性タッチパネ
ル。
3. An upper substrate having an upper conductive layer formed on a lower surface,
2. An electrode formed by the conductive paste according to claim 1, comprising a lower substrate having a lower conductive layer formed on an upper surface thereof and facing the upper conductive layer with a predetermined space therebetween, and at least one of the upper conductive layer and the lower conductive layer surface. A light-transmissive touch panel.
【請求項4】 導電層の表面に導電ペーストを印刷した
後、150〜250℃で乾燥して所定の電極を形成した
請求項3記載の光透過性タッチパネル。
4. The light transmissive touch panel according to claim 3, wherein a conductive paste is printed on the surface of the conductive layer and then dried at 150 to 250 ° C. to form a predetermined electrode.
JP2002011357A 2002-01-21 2002-01-21 Conductive paste, manufacturing method therefor and light-transmissive touch panel using this Pending JP2003217348A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002011357A JP2003217348A (en) 2002-01-21 2002-01-21 Conductive paste, manufacturing method therefor and light-transmissive touch panel using this

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002011357A JP2003217348A (en) 2002-01-21 2002-01-21 Conductive paste, manufacturing method therefor and light-transmissive touch panel using this

Publications (1)

Publication Number Publication Date
JP2003217348A true JP2003217348A (en) 2003-07-31

Family

ID=27648853

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2003217348A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009295325A (en) * 2008-06-03 2009-12-17 Fujikura Kasei Co Ltd Conductive paste for electrode and transparent touch panel
JP2015132002A (en) * 2014-01-14 2015-07-23 Dowaエレクトロニクス株式会社 Indium coated silver powder, method of producing the same, conductive paste, and solar battery
CN109119182A (en) * 2017-06-26 2019-01-01 深圳光启高等理工研究院 A kind of conductive silver paste and preparation method thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009295325A (en) * 2008-06-03 2009-12-17 Fujikura Kasei Co Ltd Conductive paste for electrode and transparent touch panel
JP2015132002A (en) * 2014-01-14 2015-07-23 Dowaエレクトロニクス株式会社 Indium coated silver powder, method of producing the same, conductive paste, and solar battery
CN109119182A (en) * 2017-06-26 2019-01-01 深圳光启高等理工研究院 A kind of conductive silver paste and preparation method thereof

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