JP2003209268A - Optical module - Google Patents

Optical module

Info

Publication number
JP2003209268A
JP2003209268A JP2002004341A JP2002004341A JP2003209268A JP 2003209268 A JP2003209268 A JP 2003209268A JP 2002004341 A JP2002004341 A JP 2002004341A JP 2002004341 A JP2002004341 A JP 2002004341A JP 2003209268 A JP2003209268 A JP 2003209268A
Authority
JP
Japan
Prior art keywords
light receiving
receiving element
light
monitor light
monitoring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002004341A
Other languages
Japanese (ja)
Inventor
Hidekazu Kodera
秀和 小寺
Hirotoshi Yonezawa
宏敏 米澤
Kiyohide Sakai
清秀 酒井
Hiroshi Izawa
浩 井沢
Akira Takemoto
彰 武本
Tatsuo Hatta
竜夫 八田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2002004341A priority Critical patent/JP2003209268A/en
Publication of JP2003209268A publication Critical patent/JP2003209268A/en
Pending legal-status Critical Current

Links

Abstract

<P>PROBLEM TO BE SOLVED: To provide an optical module in which an assembling man hour is reduced when a photodetector for monitoring an optical output is mounted and a cost is decreased. <P>SOLUTION: The optical module comprises a light emitting element, the photodetector for monitoring the optical output of the emitting element, and a mounting board. A photodetecting sensitivity layer formed in a planar state of the photodetector for monitoring the optical output has a structure having a sensitivity at a base side. The emitting element and the photodetector are horizontally mounted on the board. The optical module further comprises an optical element such as a diffraction grating, a prism having an uneven pattern or the like formed on an incident light side base end face of the photodetector. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、光通信用に用いら
れる半導体レーザダイオード(以下、LDと示す)等の
発光素子とその光出力モニタ用の受光素子を使用した半
導体レーザ装置及びその製造方法に関わり、特に、半導
体LDの背面側からの出射光を取り込むための受光素子
を実装する方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor laser device using a light emitting element such as a semiconductor laser diode (hereinafter referred to as LD) used for optical communication and a light receiving element for monitoring its optical output, and a method of manufacturing the same. In particular, the present invention relates to a method of mounting a light receiving element for capturing light emitted from the back side of the semiconductor LD.

【0002】[0002]

【従来の技術】光ファイバを用いた公衆通信網の普及に
は、高性能の半導体レーザ装置を廉価で製造することが
重要である。
2. Description of the Related Art In order to popularize a public communication network using optical fibers, it is important to manufacture high-performance semiconductor laser devices at low cost.

【0003】半導体LDは、時間経過による劣化や作動
中の温度上昇に伴って、出力が低下する。このため、光
通信用の半導体LDにおいては、半導体LDの裏面側か
らの出射光(以下、モニタ光と示す)をその光出力モニ
タ用の受光素子(以下、モニタ用受光素子と示す)にて
受光し、ここで発生する電流に基づいて半導体LDを制
御し、半導体LDの出力を一定に保っている。
The output of the semiconductor LD decreases with the deterioration over time and the temperature rise during operation. Therefore, in the semiconductor LD for optical communication, the light emitted from the back side of the semiconductor LD (hereinafter referred to as monitor light) is received by the light output monitoring light receiving element (hereinafter referred to as monitor light receiving element). Light is received and the semiconductor LD is controlled based on the current generated here, and the output of the semiconductor LD is kept constant.

【0004】図8は、従来技術に係る半導体レーザ装置
50の一つの例の(1)斜視図、及び(2)一部破断側
面図である。図8において、2は基板、4は半導体LD
素子、6は半導体LD素子の活性層、8はモニタ用受光
素子の基材、10はモニタ用受光素子の受光感度層、1
2はモニタ用受光素子、14はモニタ光、16はレーザ
出力光、102は半導体LDサブキャリア、104はモ
ニタ用受光素子のサブマウントである。
FIG. 8 is a perspective view (1) of one example of a semiconductor laser device 50 according to the prior art, and a partially cutaway side view (2). In FIG. 8, 2 is a substrate, 4 is a semiconductor LD
Element, 6 is an active layer of a semiconductor LD element, 8 is a base material of a monitor light receiving element, 10 is a light receiving sensitivity layer of a monitor light receiving element, 1
Reference numeral 2 is a monitor light receiving element, 14 is monitor light, 16 is laser output light, 102 is a semiconductor LD subcarrier, and 104 is a submount of the monitor light receiving element.

【0005】図8の半導体レーザ装置50においては、
半導体LD素子4の後方から出射されたモニタ光14を
効率よく受光するために、モニタ光14に対してモニタ
用受光素子12が垂直となるよう配置されている。
In the semiconductor laser device 50 shown in FIG.
In order to efficiently receive the monitor light 14 emitted from the rear of the semiconductor LD element 4, the monitor light receiving element 12 is arranged perpendicular to the monitor light 14.

【0006】図9は、従来技術に係る半導体レーザ装置
の別の例の一部破断側面図である。図8と同じ符号は、
同じものまたは相当のものを示す。更に、106はスペ
ーサ、108は反射膜である。
FIG. 9 is a partially cutaway side view of another example of the conventional semiconductor laser device. The same symbols as in FIG.
Indicates the same or equivalent. Further, 106 is a spacer and 108 is a reflective film.

【0007】図9の半導体レーザ装置50においては、
モニタ光14を基板2上の反射膜108で反射させ、受
光感度層10の感度面に導いている。これらの従来技術
の例(図8、図9)は、特開2000−323745号
で開示されている。
In the semiconductor laser device 50 of FIG. 9,
The monitor light 14 is reflected by the reflective film 108 on the substrate 2 and guided to the sensitivity surface of the light receiving sensitivity layer 10. Examples of these conventional techniques (FIGS. 8 and 9) are disclosed in Japanese Patent Laid-Open No. 2000-323745.

【0008】図8に係る半導体レーザ装置50において
は、確かに、モニタ用受光素子12の受光感度層10に
多くの光を取り入れることが可能である。しかし一方
で、モニタ用受光素子12をモニタ光14に対して垂直
となるように設定するのは、時間及び工数がかかるとい
った問題がある。また、モニタ用受光素子12とモニタ
用受光素子サブマウント104との間のワイヤリング作
業が困難であるという問題もある。
In the semiconductor laser device 50 according to FIG. 8, it is certainly possible to incorporate a large amount of light into the light receiving sensitivity layer 10 of the monitor light receiving element 12. However, on the other hand, setting the monitor light-receiving element 12 to be perpendicular to the monitor light 14 has a problem that it takes time and man-hours. There is also a problem that it is difficult to carry out the wiring work between the monitor light receiving element 12 and the monitor light receiving element submount 104.

【0009】また、図9に係る半導体レーザ装置50に
おいては、半導体LD素子4とモニタ用受光素子12と
が水平(即ち、基板2に平行)に配設されるので、図8
に係る半導体レーザ装置50における問題点は解決され
ている。しかしながら、構造が複雑であるため、実装コ
ストを大きく低減させることができない。
Further, in the semiconductor laser device 50 according to FIG. 9, since the semiconductor LD element 4 and the monitor light receiving element 12 are arranged horizontally (that is, parallel to the substrate 2), the structure shown in FIG.
The problem in the semiconductor laser device 50 according to (1) is solved. However, since the structure is complicated, the mounting cost cannot be significantly reduced.

【0010】[0010]

【発明が解決しようとする課題】本発明は、モニタ用受
光素子12の実装の工程においてコストを低減し、更
に、モニタ光を受光感度層に精度よく取り込むモニタ用
受光素子を備える半導体レーザ装置を提供することを、
目的とする。
SUMMARY OF THE INVENTION The present invention reduces the cost in the process of mounting the monitor light-receiving element 12, and further provides a semiconductor laser device having a monitor light-receiving element for accurately capturing the monitor light into the light-sensitive layer. To provide
To aim.

【0011】[0011]

【課題を解決するための手段】本発明は、上記の目的を
達成するためになされたものである。本発明に係る請求
項1に記載の光モジュールは、発光素子とその光出力モ
ニタ用受光素子を備え、モニタ用受光素子の平面状に形
成された受光感度層が基材側に感度を持つ構造とし、上
記発光素子と上記モニタ用受光素子が実装基板上に水平
に実装される光モジュールである。その光モジュール
は、モニタ用受光素子のモニタ光の入射側基材端面に回
折格子、又は凹凸パターンを備えるプリズム等の光学素
子を形成している。
The present invention has been made to achieve the above object. An optical module according to claim 1 of the present invention comprises a light emitting element and a light receiving element for monitoring the optical output thereof, and a light receiving sensitivity layer formed in a plane shape of the monitor light receiving element has sensitivity on the substrate side. It is an optical module in which the light emitting element and the monitor light receiving element are horizontally mounted on a mounting substrate. In the optical module, an optical element such as a prism having a diffraction grating or a concavo-convex pattern is formed on the end surface of the monitor light incident side of the monitor light receiving element.

【0012】本発明に係る請求項2に記載の光モジュー
ルは、発光素子とその光出力モニタ用受光素子を備え、
モニタ用受光素子の平面状に形成された受光感度層が基
材側に感度を持つ構造とし、上記発光素子と上記モニタ
用受光素子が実装基板上に水平に実装される光モジュー
ルである。その光モジュールは、モニタ用受光素子のモ
ニタ光の入射側基材端面において、粗面が形成されてい
る。
An optical module according to a second aspect of the present invention comprises a light emitting element and a light receiving element for monitoring the optical output thereof,
This is an optical module in which a light receiving sensitivity layer formed in a planar shape of a monitor light receiving element has a structure having sensitivity on the base material side, and the light emitting element and the monitor light receiving element are horizontally mounted on a mounting substrate. In the optical module, a rough surface is formed on the end surface of the monitor light incident side of the monitor light receiving element.

【0013】本発明に係る請求項3に記載の光モジュー
ルは、発光素子とその光出力モニタ用受光素子を備え、
モニタ用受光素子の平面状に形成された受光感度層が基
材側に感度を持つ構造とし、上記発光素子と上記モニタ
用受光素子が実装基板上に水平に実装される光モジュー
ルである。その光モジュールは、モニタ用受光素子の基
材部分において、屈折率分布層を形成している。
An optical module according to a third aspect of the present invention comprises a light emitting element and a light receiving element for monitoring the optical output thereof,
This is an optical module in which a light receiving sensitivity layer formed in a planar shape of a monitor light receiving element has a structure having sensitivity on the base material side, and the light emitting element and the monitor light receiving element are horizontally mounted on a mounting substrate. In the optical module, a refractive index distribution layer is formed in the base material portion of the monitor light receiving element.

【0014】本発明に係る請求項4に記載の光モジュー
ルは、発光素子とその光出力モニタ用受光素子を備え、
モニタ用受光素子の平面状に形成された受光感度層が基
材側に感度を持つ構造とし、上記発光素子と上記モニタ
用受光素子が実装基板上に水平に実装される光モジュー
ルである。その光モジュールは、実装基板のモニタ用受
光素子を搭載する面が、発光素子を搭載する面に対し
て、勾配を有している。
An optical module according to a fourth aspect of the present invention comprises a light emitting element and a light receiving element for monitoring its optical output,
This is an optical module in which a light receiving sensitivity layer formed in a planar shape of a monitor light receiving element has a structure having sensitivity on the base material side, and the light emitting element and the monitor light receiving element are horizontally mounted on a mounting substrate. In the optical module, the surface of the mounting board on which the monitor light receiving element is mounted has a gradient with respect to the surface on which the light emitting element is mounted.

【0015】本発明に係る請求項5に記載の光モジュー
ルは、発光素子とその光出力モニタ用受光素子を備え、
モニタ用受光素子の平面状に形成された受光感度層が基
材側に感度を持つ構造とし、上記発光素子と上記モニタ
用受光素子が実装基板上に水平に実装される光モジュー
ルである。その光モジュールは、モニタ用受光素子のモ
ニタ光の入射側基材端面に反射防止膜(ARコート)、
その反対側の基材端面に高反射膜(HRコート)を施さ
れている。
An optical module according to a fifth aspect of the present invention comprises a light emitting element and a light receiving element for monitoring its optical output,
This is an optical module in which a light receiving sensitivity layer formed in a planar shape of a monitor light receiving element has a structure having sensitivity on the base material side, and the light emitting element and the monitor light receiving element are horizontally mounted on a mounting substrate. The optical module has an antireflection film (AR coat) on the end face of the monitor light incident side of the monitor light receiving element,
A highly reflective film (HR coat) is applied to the opposite end face of the substrate.

【0016】[0016]

【発明の実施の形態】以下において、図面を参照しつつ
本発明に係る実施の形態について説明する。
DETAILED DESCRIPTION OF THE INVENTION Embodiments of the present invention will be described below with reference to the drawings.

【0017】実施の形態1.図1は、本発明の実施の形
態1に係る半導体レーザ装置50の一部破断側面図であ
る。図1において、2は基板、4は半導体LD素子、6
は半導体LD素子の活性層、8はモニタ用受光素子の基
材、10はモニタ用受光素子の受光感度層、12はモニ
タ用受光素子、14はモニタ光、16はレーザ出力光で
ある。
Embodiment 1. FIG. 1 is a partially cutaway side view of a semiconductor laser device 50 according to the first embodiment of the present invention. In FIG. 1, 2 is a substrate, 4 is a semiconductor LD element, and 6
Is an active layer of a semiconductor LD element, 8 is a substrate of a monitor light receiving element, 10 is a light receiving sensitivity layer of a monitor light receiving element, 12 is a monitor light receiving element, 14 is monitor light, and 16 is laser output light.

【0018】図1の半導体レーザ装置50では、半導体
LD素子4とモニタ用受光素子12とが、実装基板2上
に水平に実装される。更に、モニタ用受光素子12内で
平面状に形成される受光感度層10にて、基材8側が感
度面となるよう設定されている。ここで、上記のモニタ
用受光素子12の基材端面には、回折格子24、又は、
凹凸部を有するプリズム等の光学素子が形成されてい
る。
In the semiconductor laser device 50 of FIG. 1, the semiconductor LD element 4 and the monitor light-receiving element 12 are horizontally mounted on the mounting substrate 2. Further, in the light receiving sensitivity layer 10 formed in a flat shape in the monitor light receiving element 12, the base material 8 side is set to be the sensitivity surface. Here, on the end face of the substrate of the monitor light-receiving element 12, the diffraction grating 24, or
An optical element such as a prism having an uneven portion is formed.

【0019】従って、上記のモニタ用受光素子12で
は、モニタ光14は基材8のモニタ光14の入射側端面
において屈折され、受光感度層10に導かれる。ここ
で、モニタ用受光素子12は、受光感度層10におい
て、半導体LDの出力を制御するに足る光量を得られる
位置で、半導体LD素子4に対して実装されている。
Therefore, in the monitor light receiving element 12, the monitor light 14 is refracted at the end face of the base material 8 on the incident side of the monitor light 14 and guided to the light receiving sensitivity layer 10. Here, the monitor light receiving element 12 is mounted on the semiconductor LD element 4 at a position in the light receiving sensitivity layer 10 where a sufficient amount of light can be obtained to control the output of the semiconductor LD.

【0020】実施の形態1に係る半導体レーザ装置50
の概略の製造工程を示す。
The semiconductor laser device 50 according to the first embodiment.
The manufacturing process will be outlined.

【0021】(1)まず、モニタ用受光素子12の基材
端面に、凹凸のパターン、もしくは回折格子24を形成
する。 (2)次に、基板2上に半導体LD素子4を実装する。 (3)続いて、モニタ用受光素子12を、前工程(1)
で凹凸パターン、回折格子24等が刻み込まれた基材端
面側が、半導体LD素子4の背面光(モニタ光)14と
対向するよう実装する。 (4)以上により実施の形態1に係る半導体レーザ装置
50が作成される。
(1) First, an uneven pattern or a diffraction grating 24 is formed on the end face of the substrate of the monitor light receiving element 12. (2) Next, the semiconductor LD element 4 is mounted on the substrate 2. (3) Then, the monitor light-receiving element 12 is formed in the previous step (1).
The base material end surface side on which the concave-convex pattern, the diffraction grating 24, etc. are engraved is mounted so as to face the back light (monitor light) 14 of the semiconductor LD element 4. (4) With the above, the semiconductor laser device 50 according to the first embodiment is created.

【0022】本実施の形態では、基板2上に半導体LD
素子4を実装した後、その半導体LD素子4の実装位置
を基準にして同一平面上にモニタ用受光素子12を設置
する。従って、半導体LD素子4とモニタ用受光素子1
2との位置合わせの際に発生しがちなずれを少なくで
き、よって位置ずれによる光出力の減少を防ぐことがで
きる。
In this embodiment, the semiconductor LD is formed on the substrate 2.
After the element 4 is mounted, the monitor light receiving element 12 is placed on the same plane with the mounting position of the semiconductor LD element 4 as a reference. Therefore, the semiconductor LD element 4 and the monitor light receiving element 1
It is possible to reduce the deviation that tends to occur at the time of alignment with the position 2, so that it is possible to prevent a decrease in optical output due to the positional deviation.

【0023】実施の形態2.図2は、本発明の実施の形
態2に係る半導体レーザ装置50の一部破断側面図であ
る。この実施の形態2は、上記の実施の形態1に係る半
導体レーザ装置50と略同様の構成であり、よって同一
箇所には同一符号を付して説明を略し、異なる部位及び
箇所を中心に説明を進める。
Embodiment 2. FIG. 2 is a partially cutaway side view of a semiconductor laser device 50 according to the second embodiment of the present invention. The second embodiment has substantially the same configuration as that of the semiconductor laser device 50 according to the first embodiment. Therefore, the same parts are designated by the same reference numerals and the description thereof is omitted, and different parts and parts are mainly described. Proceed.

【0024】図2の半導体レーザ装置50でも、半導体
LD素子4とモニタ用受光素子12とが、実装基板2上
に水平に実装され、モニタ用受光素子12内で平面状に
形成される受光感度層10にて、基材8側が感度面とな
るよう設定されている。更にこの実施の形態2では、上
記のモニタ用受光素子12の基材端面に、粗面26が形
成される。
Also in the semiconductor laser device 50 of FIG. 2, the semiconductor LD element 4 and the monitor light receiving element 12 are horizontally mounted on the mounting substrate 2, and the light receiving sensitivity is formed in a planar shape in the monitor light receiving element 12. In the layer 10, the base material 8 side is set to be the sensitivity surface. Further, in the second embodiment, the rough surface 26 is formed on the end surface of the base material of the monitor light-receiving element 12.

【0025】従って、実施の形態2のモニタ用受光素子
12では、モニタ光14は粗面26である基材8のモニ
タ光の入射側端面において散乱され、受光感度層10に
導かれる。ここで、モニタ用受光素子12は、受光感度
層10において、半導体LDの出力を制御するに足る光
量を得られる位置で、半導体LD素子4に対して実装さ
れている。
Therefore, in the monitor light receiving element 12 of the second embodiment, the monitor light 14 is scattered at the monitor light incident side end surface of the base material 8 which is the rough surface 26 and is guided to the light receiving sensitivity layer 10. Here, the monitor light receiving element 12 is mounted on the semiconductor LD element 4 at a position in the light receiving sensitivity layer 10 where a sufficient amount of light can be obtained to control the output of the semiconductor LD.

【0026】実施の形態2に係る半導体レーザ装置50
の概略の製造工程を示す。
A semiconductor laser device 50 according to the second embodiment.
The manufacturing process will be outlined.

【0027】(1)まず、モニタ用受光素子12の基材
端面に、粗面26を形成する。 (2)次に、基板2上に半導体LD素子4を実装する。 (3)続いて、モニタ用受光素子12を、前工程(1)
で粗面26が刻み込まれた基材端面側が、半導体LD素
子4の背面光(モニタ光)14と対向するよう実装す
る。 (4)以上により実施の形態2に係る半導体レーザ装置
50が作成される。
(1) First, the rough surface 26 is formed on the end surface of the substrate of the monitor light-receiving element 12. (2) Next, the semiconductor LD element 4 is mounted on the substrate 2. (3) Then, the monitor light-receiving element 12 is formed in the previous step (1).
The substrate end surface side on which the rough surface 26 is engraved is mounted so as to face the back light (monitor light) 14 of the semiconductor LD element 4. (4) Through the above steps, the semiconductor laser device 50 according to the second embodiment is created.

【0028】本実施の形態でも、基板2上に半導体LD
素子4を実装した後、その半導体LD素子4の実装位置
を基準にして同一平面上にモニタ用受光素子12を設置
する。従って、半導体LD素子4とモニタ用受光素子1
2との位置合わせの際に発生しがちなずれを少なくで
き、よって位置ずれによる光出力の減少を防ぐことがで
きる。
Also in this embodiment, the semiconductor LD is formed on the substrate 2.
After the element 4 is mounted, the monitor light receiving element 12 is placed on the same plane with the mounting position of the semiconductor LD element 4 as a reference. Therefore, the semiconductor LD element 4 and the monitor light receiving element 1
It is possible to reduce the deviation that tends to occur at the time of alignment with the position 2, so that it is possible to prevent a decrease in optical output due to the positional deviation.

【0029】実施の形態3.図3は、本発明の実施の形
態3に係る半導体レーザ装置50の一部破断側面図であ
る。この実施の形態3も、上記の実施の形態1に係る半
導体レーザ装置50と略同様の構成であり、よって同一
箇所には同一符号を付して説明を略し、異なる部位及び
箇所を中心に説明を進める。
Embodiment 3. FIG. 3 is a partially cutaway side view of a semiconductor laser device 50 according to the third embodiment of the present invention. The third embodiment also has substantially the same configuration as the semiconductor laser device 50 according to the first embodiment. Therefore, the same portions are denoted by the same reference numerals and the description thereof is omitted, and different portions and portions are mainly described. Proceed.

【0030】図3の半導体レーザ装置50においても、
半導体LD素子4とモニタ用受光素子12とが、実装基
板2上に水平に実装され、モニタ用受光素子12内で平
面状に形成される受光感度層10において、基材8側が
感度面になるように設定されている。更に、この実施の
形態3では、上記モニタ用受光素子12の基材8に、屈
折率を変化させるドーパンドを選択拡張させ、屈折率分
布層28を形成する。
Also in the semiconductor laser device 50 of FIG. 3,
The semiconductor LD element 4 and the monitor light-receiving element 12 are horizontally mounted on the mounting substrate 2, and in the light-receiving sensitivity layer 10 formed in a flat shape in the monitor light-receiving element 12, the base material 8 side is the sensitivity surface. Is set. Further, in the third embodiment, a dopant for changing the refractive index is selectively expanded on the base material 8 of the monitor light receiving element 12 to form the refractive index distribution layer 28.

【0031】従って、実施の形態3のモニタ用受光素子
12では、モニタ光14はモニタ用受光素子12の基材
8の屈折率分布層28において屈折され、受光感度層1
0に導かれる。ここで、モニタ用受光素子12は、受光
感度層10において、半導体LDの出力を制御するに足
る光量を得られる位置で、半導体LD素子4に対して実
装されている。
Therefore, in the monitor light receiving element 12 of the third embodiment, the monitor light 14 is refracted in the refractive index distribution layer 28 of the base material 8 of the monitor light receiving element 12, and the light receiving sensitivity layer 1 is obtained.
Lead to zero. Here, the monitor light receiving element 12 is mounted on the semiconductor LD element 4 at a position in the light receiving sensitivity layer 10 where a sufficient amount of light can be obtained to control the output of the semiconductor LD.

【0032】実施の形態3に係る半導体レーザ装置50
の概略の製造工程を示す。
A semiconductor laser device 50 according to the third embodiment.
The manufacturing process will be outlined.

【0033】(1)まず、モニタ用受光素子12の基材
端面に、屈折率変化のドーパンドを選択拡張しておく。 (2)次に、基板2上に半導体LD素子4を実装する。 (3)続いて、モニタ用受光素子12を、前工程(1)
で屈折率変化のドーパンドが刻み込まれた基材端面側
が、半導体LD素子4の背面光(モニタ光)14と対向
するよう実装する。 (4)以上により実施の形態3に係る半導体レーザ装置
50が作成される。
(1) First, on the end face of the substrate of the monitor light-receiving element 12, a dopant with a change in refractive index is selectively expanded. (2) Next, the semiconductor LD element 4 is mounted on the substrate 2. (3) Then, the monitor light-receiving element 12 is formed in the previous step (1).
The base material end face side in which the dopant of the refractive index change is engraved is mounted so as to face the back light (monitor light) 14 of the semiconductor LD element 4. (4) With the above, the semiconductor laser device 50 according to the third embodiment is produced.

【0034】本実施の形態でも、基板2上に半導体LD
素子4を実装した後、その半導体LD素子4の実装位置
を基準にして同一平面上にモニタ用受光素子12を設置
する。従って、半導体LD素子4とモニタ用受光素子1
2との位置合わせの際に発生しがちなずれを少なくで
き、よって位置ずれによる光出力の減少を防ぐことがで
きる。
Also in this embodiment, the semiconductor LD is formed on the substrate 2.
After the element 4 is mounted, the monitor light receiving element 12 is placed on the same plane with the mounting position of the semiconductor LD element 4 as a reference. Therefore, the semiconductor LD element 4 and the monitor light receiving element 1
It is possible to reduce the deviation that tends to occur at the time of alignment with the position 2, so that it is possible to prevent a decrease in optical output due to the positional deviation.

【0035】実施の形態4.図4(1)(2)は、本発
明の実施の形態4に係る半導体レーザ装置50の一部破
断側面図である。この実施の形態4も、上記の実施の形
態1に係る半導体レーザ装置50と略同様の構成であ
り、よって同一箇所には同一符号を付して説明を略し、
異なる部位及び箇所を中心に説明を進める。
Fourth Embodiment 4 (1) and 4 (2) are partially cutaway side views of the semiconductor laser device 50 according to the fourth embodiment of the present invention. The fourth embodiment also has substantially the same configuration as the semiconductor laser device 50 according to the first embodiment, and therefore, the same portions are denoted by the same reference numerals and the description thereof is omitted.
The explanation will focus on different parts and places.

【0036】図4(1)(2)の半導体レーザ装置50
でも、半導体LD素子4とモニタ用受光素子12とが実
装基板2に実装される。但し、基板2は表面にV字型溝
(図4(1)参照)或いは面取り部(図4(2)参照)
などの傾斜面を有しており、モニタ用受光素子12はそ
れらの傾斜面上に搭載される。
The semiconductor laser device 50 shown in FIGS. 4A and 4B.
However, the semiconductor LD element 4 and the monitor light receiving element 12 are mounted on the mounting substrate 2. However, the substrate 2 has a V-shaped groove (see FIG. 4 (1)) or a chamfered portion (see FIG. 4 (2)) on the surface.
And the like, and the monitor light receiving element 12 is mounted on these inclined surfaces.

【0037】一方、モニタ用受光素子12内で平面状に
形成される受光感度層10は、本実施の形態4において
も基材8側が感度面となるように設定されている。
On the other hand, the light receiving sensitivity layer 10 formed in a planar shape in the monitor light receiving element 12 is set so that the base material 8 side becomes the sensitivity surface also in the fourth embodiment.

【0038】従って、実施の形態4のモニタ用受光素子
12では、モニタ光14が基材8の入射側端面において
屈折され、受光感度層10に導かれる。ここで、モニタ
用受光素子12は、受光感度層10において、半導体L
Dの出力を制御するに足る光量を得られる位置で、半導
体LD素子4に対して実装されている。
Therefore, in the monitor light receiving element 12 of the fourth embodiment, the monitor light 14 is refracted at the incident side end surface of the base material 8 and guided to the light receiving sensitivity layer 10. Here, the monitor light-receiving element 12 includes the semiconductor L in the light-receiving sensitivity layer 10.
The semiconductor LD device 4 is mounted at a position where a sufficient amount of light can be obtained to control the output of D.

【0039】実施の形態4に係る半導体レーザ装置50
の概略の製造工程を示す。
A semiconductor laser device 50 according to the fourth embodiment.
The manufacturing process will be outlined.

【0040】(1)まず、基板2にV字型溝(図4
(1)参照)もしくは面取り部(図4(2)参照)など
の傾斜面を形成する。 (2)次に、基板2上に半導体LD素子4を実装する。 (3)続いて、モニタ用受光素子12を、前工程(1)
で形成されたV字型溝・面取り部の傾斜面上に実装す
る。 (4)以上により実施の形態4に係る半導体レーザ装置
50が作成される。
(1) First, a V-shaped groove (see FIG. 4) is formed on the substrate 2.
(1)) or a chamfer (see FIG. 4B) is formed. (2) Next, the semiconductor LD element 4 is mounted on the substrate 2. (3) Then, the monitor light-receiving element 12 is formed in the previous step (1).
It is mounted on the inclined surface of the V-shaped groove / chamfered part formed in (4). (4) With the above, the semiconductor laser device 50 according to the fourth embodiment is produced.

【0041】本実施の形態でも、基板2上に半導体LD
素子4を実装した後、その半導体LD素子4の実装位置
を基準にして同一平面上にモニタ用受光素子12を設置
する。従って、半導体LD素子4とモニタ用受光素子1
2との位置合わせの際に発生しがちなずれを少なくで
き、よって位置ずれによる光出力の減少を防ぐことがで
きる。
Also in this embodiment, the semiconductor LD is formed on the substrate 2.
After the element 4 is mounted, the monitor light receiving element 12 is placed on the same plane with the mounting position of the semiconductor LD element 4 as a reference. Therefore, the semiconductor LD element 4 and the monitor light receiving element 1
It is possible to reduce the deviation that tends to occur at the time of alignment with the position 2, so that it is possible to prevent a decrease in optical output due to the positional deviation.

【0042】また、本実施の形態に係る半導体レーザ装
置50によれば、モニタ用受光素子12及びサブマウン
ト20の基材端面からの反射戻り光30は、入射光(モ
ニタ光14)と方向が異なるため、再び、反射戻り光3
0が半導体LD素子4に入ることを抑制でき、安定した
レーザ光出力を得ることができる。
Further, according to the semiconductor laser device 50 of the present embodiment, the reflected return light 30 from the end face of the substrate of the monitor light-receiving element 12 and the submount 20 has the direction of the incident light (monitor light 14). Because it is different, the reflected return light 3 again
0 can be suppressed from entering the semiconductor LD element 4, and a stable laser light output can be obtained.

【0043】実施の形態5.図5は、本発明の実施の形
態5に係る半導体レーザ装置50の一部破断側面図であ
る。この実施の形態5も、上記の実施の形態1に係る半
導体レーザ装置50と略同様の構成であり、よって同一
箇所には同一符号を付して説明を略し、異なる部位及び
箇所を中心に説明を進める。
Fifth Embodiment FIG. 5 is a partially cutaway side view of a semiconductor laser device 50 according to the fifth embodiment of the present invention. The fifth embodiment also has substantially the same configuration as that of the semiconductor laser device 50 according to the first embodiment. Therefore, the same parts are designated by the same reference numerals and the description thereof is omitted, and different parts and parts are mainly described. Proceed.

【0044】図5の半導体レーザ装置50でも、半導体
LD素子4とモニタ用受光素子12とが実装基板2に実
装される。但し、基板2は表面に大きさの異なる2対の
Auバンプ32を有しており、モニタ用受光素子12は
それらAuバンプ32上に基板2に対して傾斜して搭載
される。
Also in the semiconductor laser device 50 of FIG. 5, the semiconductor LD element 4 and the monitor light receiving element 12 are mounted on the mounting substrate 2. However, the substrate 2 has two pairs of Au bumps 32 having different sizes on the surface thereof, and the monitor light-receiving element 12 is mounted on the Au bumps 32 with an inclination with respect to the substrate 2.

【0045】一方、モニタ用受光素子12内で平面状に
形成される受光感度層10は、本実施の形態5において
も基材8側が感度面となるように設定されている。
On the other hand, the light receiving sensitivity layer 10 formed in a planar shape in the monitor light receiving element 12 is set so that the base material 8 side becomes the sensitivity surface also in the fifth embodiment.

【0046】従って、実施の形態5のモニタ用受光素子
12においても、実施の形態4と同様、モニタ光14が
モニタ用受光素子12のモニタ光の入射側基材端面にお
いて屈折され、受光感度層10に導かれる。ここで、モ
ニタ用受光素子12は、受光感度層10において、半導
体LDの出力を制御するに足る光量を得られる位置で、
半導体LD素子4に対して実装されている。
Therefore, also in the monitor light-receiving element 12 of the fifth embodiment, similarly to the fourth embodiment, the monitor light 14 is refracted at the end face of the monitor light-incident side of the monitor light-receiving element 12, and the light-receiving sensitivity layer is formed. Guided to 10. Here, the monitor light-receiving element 12 has a position in the light-receiving sensitivity layer 10 where a sufficient amount of light can be obtained to control the output of the semiconductor LD.
It is mounted on the semiconductor LD element 4.

【0047】実施の形態5に係る半導体レーザ装置50
の概略の製造工程を示す。
A semiconductor laser device 50 according to the fifth embodiment.
The manufacturing process will be outlined.

【0048】(1)まず、基板2上に半導体LD素子4
を実装する。 (2)次に、基板2上にて、モニタ用受光素子12の実
装位置にあたる箇所に大きさの異なる2対のAuバンプ
32を形成する。 (3)続いて、モニタ用受光素子12を、前工程(2)
で形成されたAuバンプ32上に実装する。半導体LD
素子4に近い方のAuバンプ32の対は小さく遠い方の
対は大きく形成されているため、モニタ用受光素子12
は基板2に対して傾斜して実装される。 (4)以上により実施の形態5に係る半導体レーザ装置
50が作成される。
(1) First, the semiconductor LD element 4 is formed on the substrate 2.
Implement. (2) Next, two pairs of Au bumps 32 having different sizes are formed on the substrate 2 at the mounting positions of the monitor light receiving elements 12. (3) Subsequently, the monitor light-receiving element 12 is formed in the previous step (2).
It is mounted on the Au bump 32 formed in. Semiconductor LD
Since the pair of Au bumps 32 closer to the element 4 is smaller and the pair farther away is large, the monitor light-receiving element 12 is formed.
Are mounted to be inclined with respect to the substrate 2. (4) With the above, the semiconductor laser device 50 according to the fifth embodiment is produced.

【0049】上記の製造工程において、対となるAuバ
ンプ32の大きさを制御することにより、半導体LD素
子4に対するモニタ用受光素子12の位置を制御するこ
とができる。
In the above manufacturing process, the position of the monitor light receiving element 12 with respect to the semiconductor LD element 4 can be controlled by controlling the size of the paired Au bumps 32.

【0050】本実施の形態でも、基板2上に半導体LD
素子4を実装した後、その半導体LD素子4の実装位置
を基準にして同一平面上にモニタ用受光素子12を設置
する。従って、半導体LD素子4とモニタ用受光素子1
2との位置合わせの際に発生しがちなずれを少なくで
き、よって位置ずれによる光出力の減少を防ぐことがで
きる。
Also in this embodiment, the semiconductor LD is formed on the substrate 2.
After the element 4 is mounted, the monitor light receiving element 12 is placed on the same plane with the mounting position of the semiconductor LD element 4 as a reference. Therefore, the semiconductor LD element 4 and the monitor light receiving element 1
It is possible to reduce the deviation that tends to occur at the time of alignment with the position 2, so that it is possible to prevent a decrease in optical output due to the positional deviation.

【0051】また、本実施の形態に係る半導体レーザ装
置50においても、モニタ用受光素子12及びサブマウ
ント20の基材端面からの反射戻り光30は、入射光
(モニタ光14)と方向が異なるため、再び、反射戻り
光30が半導体LD素子4に入ることを抑制でき、安定
したレーザ光出力を得ることができる。
Also in the semiconductor laser device 50 according to the present embodiment, the reflected return light 30 from the end face of the substrate of the light receiving element 12 for monitoring and the submount 20 is different in direction from the incident light (monitor light 14). Therefore, the reflected return light 30 can be prevented from entering the semiconductor LD element 4 again, and a stable laser light output can be obtained.

【0052】実施の形態6.図6は、本発明の実施の形
態6に係る半導体レーザ装置50の一部破断側面図であ
る。この実施の形態6も、上記の実施の形態1に係る半
導体レーザ装置50と略同様の構成であり、よって同一
箇所には同一符号を付して説明を略し、異なる部位及び
箇所を中心に説明を進める。
Sixth Embodiment FIG. 6 is a partially cutaway side view of a semiconductor laser device 50 according to the sixth embodiment of the present invention. The sixth embodiment also has substantially the same configuration as the semiconductor laser device 50 according to the first embodiment. Therefore, the same portions are denoted by the same reference numerals and the description thereof is omitted, and different portions and portions will be mainly described. Proceed.

【0053】図6の半導体レーザ装置50でも、実施の
形態1と同様に、半導体LD素子4とモニタ用受光素子
12とが、実装基板2上に水平に実装され、モニタ用受
光素子12内で平面状に形成される受光感度層10に
て、基材8側が感度面となるよう設定されている。更に
この実施の形態6では、上記のモニタ用受光素子12に
関して、背面光(モニタ光)14の入射側基材端面にA
Rコート(反射防止膜)34が、その反対側の基材端面
にHRコート(高反射膜)36が施される。
Also in the semiconductor laser device 50 of FIG. 6, as in the first embodiment, the semiconductor LD element 4 and the monitor light receiving element 12 are horizontally mounted on the mounting substrate 2, and within the monitor light receiving element 12. In the light receiving sensitivity layer 10 formed in a flat shape, the base material 8 side is set to be the sensitivity surface. Further, in the sixth embodiment, with respect to the monitor light-receiving element 12, A is formed on the end surface of the incident side substrate of the back light (monitor light) 14.
An R coat (antireflection film) 34 is applied, and an HR coat (high reflection film) 36 is applied to the end face of the base material on the opposite side.

【0054】従って、実施の形態6のモニタ用受光素子
12では、モニタ用受光素子12に入射したモニタ光1
4がモニタ用受光素子12内に閉じ込められ、受光感度
層10に効率よく取り込まれる。ここで、モニタ用受光
素子12は、受光感度層10において、半導体LDの出
力を制御するに足る光量を得られる位置で、半導体LD
素子4に対して実装されている。
Therefore, in the monitor light receiving element 12 of the sixth embodiment, the monitor light 1 incident on the monitor light receiving element 12 is detected.
4 is confined in the light receiving element 12 for monitoring, and is efficiently taken into the light receiving sensitivity layer 10. Here, the monitor light-receiving element 12 has the semiconductor LD at a position in the light-sensitivity layer 10 where a sufficient amount of light can be obtained to control the output of the semiconductor LD.
It is mounted on the element 4.

【0055】実施の形態6に係る半導体レーザ装置50
の概略の製造工程を示す。
A semiconductor laser device 50 according to the sixth embodiment.
The manufacturing process will be outlined.

【0056】(1)まず、モニタ用受光素子12の向か
い合う2つの基材端面に、夫々ARコート34およびH
Rコート36を形成しておく。 (2)次に、基板2上に半導体LD素子4を実装する。 (3)続いて、モニタ用受光素子12を、前工程(1)
でARコート34が施された基材端面側が、半導体LD
素子4の背面光(モニタ光)14と対向するよう実装す
る。 (4)以上により実施の形態6に係る半導体レーザ装置
50が作成される。
(1) First, AR coats 34 and H are respectively provided on the end faces of two base materials of the monitor light receiving element 12 which face each other.
The R coat 36 is formed. (2) Next, the semiconductor LD element 4 is mounted on the substrate 2. (3) Then, the monitor light-receiving element 12 is formed in the previous step (1).
On the end face side of the base material on which the AR coat 34 is applied, the semiconductor LD
It is mounted so as to face the back light (monitor light) 14 of the element 4. (4) With the above, the semiconductor laser device 50 according to the sixth embodiment is produced.

【0057】本実施の形態でも、基板2上に半導体LD
素子4を実装した後、その半導体LD素子4の実装位置
を基準にして同一平面上にモニタ用受光素子12を設置
する。従って、半導体LD素子4とモニタ用受光素子1
2との位置合わせの際に発生しがちなずれを少なくで
き、よって位置ずれによる光出力の減少を防ぐことがで
きる。
Also in this embodiment, the semiconductor LD is formed on the substrate 2.
After the element 4 is mounted, the monitor light receiving element 12 is placed on the same plane with the mounting position of the semiconductor LD element 4 as a reference. Therefore, the semiconductor LD element 4 and the monitor light receiving element 1
It is possible to reduce the deviation that tends to occur at the time of alignment with the position 2, so that it is possible to prevent a decrease in optical output due to the positional deviation.

【0058】また、本実施の形態6に限らず、本発明
(例えば、実施の形態1乃至実施の形態5)において
は、モニタ用受光素子12表面に電極部を設置し、ワイ
ヤボンダ配線を行うことができるため、ワイヤリングは
比較的容易である。図7にそのワイヤボンダ配線を施し
た本発明に係る半導体レーザ装置50の斜視図を示す。
In addition to the sixth embodiment, in the present invention (for example, the first to fifth embodiments), the electrode section is installed on the surface of the monitor light receiving element 12, and the wire bonder wiring is performed. Wiring is relatively easy because it can be performed. FIG. 7 is a perspective view of the semiconductor laser device 50 according to the present invention, which is provided with the wire bonder wiring.

【0059】[0059]

【発明の効果】以上により、本発明によれば、光出力モ
ニタ用受光素子の実装に際し、組立工数の削減により、
実装に伴うコストを大幅に低減することができる。特
に、本発明に係る請求項4の光モジュールによれば、モ
ニタ用受光素子の基材端面からの反射戻り光が半導体L
Dに入ることも抑制でき、安定したレーザ光出力を得る
ことができる。
As described above, according to the present invention, the number of assembling steps can be reduced when mounting the light receiving element for the optical output monitor.
It is possible to significantly reduce the cost associated with mounting. In particular, according to the optical module of claim 4 of the present invention, the reflected return light from the end face of the base material of the light receiving element for monitoring is the semiconductor L.
It is also possible to suppress entry into D and obtain a stable laser light output.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明の実施の形態1に係る半導体レーザ装
置の一部破断側面図である。
FIG. 1 is a partially cutaway side view of a semiconductor laser device according to a first embodiment of the present invention.

【図2】 本発明の実施の形態2に係る半導体レーザ装
置の一部破断側面図である。
FIG. 2 is a partially cutaway side view of a semiconductor laser device according to a second embodiment of the present invention.

【図3】 本発明の実施の形態3に係る半導体レーザ装
置の一部破断側面図である。
FIG. 3 is a partially cutaway side view of a semiconductor laser device according to a third embodiment of the present invention.

【図4】 本発明の実施の形態4に係る半導体レーザ装
置の一部破断側面図である。
FIG. 4 is a partially cutaway side view of a semiconductor laser device according to a fourth embodiment of the present invention.

【図5】 本発明の実施の形態5に係る半導体レーザ装
置の一部破断側面図である。
FIG. 5 is a partially cutaway side view of a semiconductor laser device according to a fifth embodiment of the present invention.

【図6】 本発明の実施の形態6に係る半導体レーザ装
置の一部破断側面図である。
FIG. 6 is a partially cutaway side view of a semiconductor laser device according to a sixth embodiment of the present invention.

【図7】 ワイヤボンダ配線を施した本発明に係る半導
体レーザ装置の斜視図である。
FIG. 7 is a perspective view of a semiconductor laser device according to the present invention in which wire bonder wiring is provided.

【図8】 従来技術に係る半導体レーザ装置の一つの例
の(1)斜視図、及び(2)一部破断側面図である。
FIG. 8 is (1) a perspective view and (2) a partially cutaway side view of an example of a semiconductor laser device according to a conventional technique.

【図9】 従来技術に係る半導体レーザ装置の別の例の
一部破断側面図である。
FIG. 9 is a partially cutaway side view of another example of the semiconductor laser device according to the related art.

【符号の説明】[Explanation of symbols]

2 基板、 4 半導体レーザダイオード素子、 6
半導体レーザダイオード素子活性層、 8 モニタ用受
光素子基材、 10 モニタ用受光素子受光感度層、
12 モニタ用受光素子、 14 モニタ光、 16
レーザ出力光、24 回折格子、 26 粗面、 28
屈折率分布層、 30 反射戻り光、 32 Auバ
ンプ、 34 反射防止膜(ARコート)、 36 高
反射膜(HRコート)、 50 半導体レーザ装置、
102 半導体LDサブキャリア、 104 モニタ用
受光素子のサブマウント、 106 スペーサ、 10
8 反射膜。
2 substrate, 4 semiconductor laser diode element, 6
Semiconductor laser diode element active layer, 8 monitor light receiving element base material, 10 monitor light receiving element light receiving sensitivity layer,
12 light receiving element for monitor, 14 monitor light, 16
Laser output light, 24 diffraction grating, 26 rough surface, 28
Refractive index distribution layer, 30 reflected return light, 32 Au bumps, 34 antireflection film (AR coat), 36 high reflection film (HR coat), 50 semiconductor laser device,
102 semiconductor LD subcarrier, 104 light receiving element submount for monitor, 106 spacer, 10
8 Reflective film.

フロントページの続き (72)発明者 酒井 清秀 東京都千代田区丸の内二丁目2番3号 三 菱電機株式会社内 (72)発明者 井沢 浩 東京都千代田区丸の内二丁目2番3号 三 菱電機株式会社内 (72)発明者 武本 彰 東京都千代田区丸の内二丁目2番3号 三 菱電機株式会社内 (72)発明者 八田 竜夫 東京都千代田区丸の内二丁目2番3号 三 菱電機株式会社内 Fターム(参考) 5F073 AB25 BA02 EA15 FA04 GA12 5F088 BA16 BA18 BB01 DA17 DA20 JA05 JA10 JA11 JA20 5F089 AA01 AB03 AC02 AC11 AC13 CA15 GA01 GA10 Continued front page    (72) Inventor Kiyohide Sakai             2-3 2-3 Marunouchi, Chiyoda-ku, Tokyo             Inside Ryo Electric Co., Ltd. (72) Inventor Hiroshi Izawa             2-3 2-3 Marunouchi, Chiyoda-ku, Tokyo             Inside Ryo Electric Co., Ltd. (72) Inventor Akira Takemoto             2-3 2-3 Marunouchi, Chiyoda-ku, Tokyo             Inside Ryo Electric Co., Ltd. (72) Inventor Tatsuo Hatta             2-3 2-3 Marunouchi, Chiyoda-ku, Tokyo             Inside Ryo Electric Co., Ltd. F-term (reference) 5F073 AB25 BA02 EA15 FA04 GA12                 5F088 BA16 BA18 BB01 DA17 DA20                       JA05 JA10 JA11 JA20                 5F089 AA01 AB03 AC02 AC11 AC13                       CA15 GA01 GA10

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 発光素子とその光出力モニタ用受光素子
を備える光モジュールにおいて、 光出力モニタ用受光素子の平面状に形成された受光感度
層が基材側に感度を持つ構造とし、 上記発光素子と上記光出力モニタ用受光素子を実装基板
上に水平に実装したものであって、 上記光出力モニタ用受光素子のモニタ光の入射側基材端
面に、回折格子、又は凹凸パターンを備えるプリズム等
の光学素子が形成されていることを特徴とした光モジュ
ール。
1. An optical module comprising a light emitting element and a light receiving element for monitoring an optical output thereof, wherein a light receiving sensitivity layer formed in a plane shape of the light receiving element for an optical output monitoring has a structure having a sensitivity on a substrate side, A prism having a diffraction grating or a concavo-convex pattern on an end face of a monitor light incident side substrate of the light output monitoring light receiving element, the element and the light output monitoring light receiving element being horizontally mounted on a mounting substrate. An optical module in which optical elements such as are formed.
【請求項2】 発光素子とその光出力モニタ用受光素子
を備える光モジュールにおいて、 光出力モニタ用受光素子の平面状に形成された受光感度
層が基材側に感度を持つ構造とし、 上記発光素子と上記光出力モニタ用受光素子を実装基板
上に水平に実装したものであって、 上記光出力モニタ用受光素子のモニタ光の入射側基材端
面を粗面とすることを特徴とした光モジュール。
2. An optical module comprising a light emitting element and a light receiving element for monitoring an optical output thereof, wherein a light receiving sensitivity layer formed in a plane shape of the light receiving element for an optical output monitoring has a structure having sensitivity on the substrate side, An element and the light output monitor light-receiving element are horizontally mounted on a mounting substrate, wherein the light-output monitor light-receiving element has a rough surface at the end face of the incident side of the monitor light. module.
【請求項3】 発光素子とその光出力モニタ用受光素子
を備える光モジュールにおいて、 光出力モニタ用受光素子の平面状に形成された受光感度
層が基材側に感度を持つ構造とし、 上記発光素子と上記光出力モニタ用受光素子を実装基板
上に水平に実装したものであって、 上記光出力モニタ用受光素子の基材に屈折率を変化させ
るドーパンドが注入され、基材に屈折率分布層が形成さ
れていることを特徴とした光モジュール。
3. An optical module comprising a light emitting element and a light receiving element for monitoring the light output thereof, wherein a light receiving sensitivity layer formed in a plane shape of the light receiving element for the light output monitoring has a structure having sensitivity on the substrate side, An element and the light output monitoring light receiving element are horizontally mounted on a mounting substrate, and a dopant for changing the refractive index is injected into the base material of the light output monitoring light receiving element, and the refractive index distribution is applied to the base material. An optical module in which layers are formed.
【請求項4】 発光素子とその光出力モニタ用受光素子
を備える光モジュールにおいて、 光出力モニタ用受光素子の平面状に形成された受光感度
層が基材側に感度を持つ構造とし、 上記発光素子と上記光出力モニタ用受光素子を実装基板
上に水平に実装したものであって、 実装基板の光出力モニタ用受光素子を搭載する面が発光
素子を搭載する面に対して、勾配を有することを特徴と
した光モジュール。
4. An optical module comprising a light emitting element and a light receiving element for monitoring an optical output thereof, wherein a light receiving sensitivity layer formed in a plane shape of the light receiving element for an optical output monitoring has a structure having sensitivity on the base material side, Element and the light output monitor light receiving element are mounted horizontally on a mounting board, and the surface of the mounting board on which the light output monitoring light receiving element is mounted has a slope with respect to the surface on which the light emitting element is mounted. An optical module characterized by this.
【請求項5】 発光素子とその光出力モニタ用受光素子
を備える光モジュールにおいて、 光出力モニタ用受光素子の平面状に形成された受光感度
層が基材側に感度を持つ構造とし、 上記発光素子と上記光出力モニタ用受光素子を実装基板
上に水平に実装したものであって、 光出力モニタ用受光素子のモニタ光の入射側基材端面に
反射防止膜(ARコート)、その反対側の基材端面に高
反射膜(HRコート)を施されていることを特徴とした
光モジュール。
5. An optical module comprising a light emitting element and a light receiving element for monitoring an optical output thereof, wherein a light receiving sensitivity layer formed in a planar shape of the light receiving element for an optical output monitoring has a structure having a sensitivity on a substrate side, An optical element and the above-mentioned light output monitoring light receiving element are horizontally mounted on a mounting board, and an antireflection film (AR coat) is provided on an end surface of a light incident side of a monitor light of the light output monitoring light receiving element, and an opposite side thereof. An optical module in which a high reflection film (HR coat) is applied to the end surface of the substrate.
JP2002004341A 2002-01-11 2002-01-11 Optical module Pending JP2003209268A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
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Publications (1)

Publication Number Publication Date
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Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2003209268A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008244368A (en) * 2007-03-29 2008-10-09 Eudyna Devices Inc Optical semiconductor module and light-receiving element
US8378289B2 (en) 2008-12-11 2013-02-19 Oclaro Japan, Inc. Optical receiver module and manufacturing method with a shifted and angled light receiving element
WO2022003896A1 (en) * 2020-07-02 2022-01-06 株式会社京都セミコンダクター End face incidence-type semiconductor light-receiving element, and method for manufacturing end face incidence-type semiconductor light-receiving element

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5993157U (en) * 1982-12-14 1984-06-25 オムロン株式会社 semiconductor equipment
JPS59149069A (en) * 1983-02-15 1984-08-25 Sumitomo Electric Ind Ltd Light-receiving element for optical communication
JPS60180183A (en) * 1984-02-27 1985-09-13 Nippon Telegr & Teleph Corp <Ntt> Hermetically sealing package for optical semiconductor element
JPH03105985A (en) * 1989-09-20 1991-05-02 Matsushita Electron Corp Semiconductor photodetector and optical semiconductor device using same
JPH04373180A (en) * 1991-06-21 1992-12-25 Nec Corp Semiconductor photoreceptor element
JPH05304313A (en) * 1992-04-27 1993-11-16 Sharp Corp Optical semiconductor device
JPH08234063A (en) * 1994-12-19 1996-09-13 Sony Corp Signal transmission and reception optical module
JPH10239568A (en) * 1997-02-25 1998-09-11 Oki Electric Ind Co Ltd Optically coupled structure of light receiving module and light transmitting module
JPH11135823A (en) * 1997-10-29 1999-05-21 Nippon Telegr & Teleph Corp <Ntt> Manufacture of semiconductor photodetector
JP2000269539A (en) * 1999-03-15 2000-09-29 Matsushita Electric Ind Co Ltd Light receiving element and manufacture of the same

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5993157U (en) * 1982-12-14 1984-06-25 オムロン株式会社 semiconductor equipment
JPS59149069A (en) * 1983-02-15 1984-08-25 Sumitomo Electric Ind Ltd Light-receiving element for optical communication
JPS60180183A (en) * 1984-02-27 1985-09-13 Nippon Telegr & Teleph Corp <Ntt> Hermetically sealing package for optical semiconductor element
JPH03105985A (en) * 1989-09-20 1991-05-02 Matsushita Electron Corp Semiconductor photodetector and optical semiconductor device using same
JPH04373180A (en) * 1991-06-21 1992-12-25 Nec Corp Semiconductor photoreceptor element
JPH05304313A (en) * 1992-04-27 1993-11-16 Sharp Corp Optical semiconductor device
JPH08234063A (en) * 1994-12-19 1996-09-13 Sony Corp Signal transmission and reception optical module
JPH10239568A (en) * 1997-02-25 1998-09-11 Oki Electric Ind Co Ltd Optically coupled structure of light receiving module and light transmitting module
JPH11135823A (en) * 1997-10-29 1999-05-21 Nippon Telegr & Teleph Corp <Ntt> Manufacture of semiconductor photodetector
JP2000269539A (en) * 1999-03-15 2000-09-29 Matsushita Electric Ind Co Ltd Light receiving element and manufacture of the same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008244368A (en) * 2007-03-29 2008-10-09 Eudyna Devices Inc Optical semiconductor module and light-receiving element
EP1976023A3 (en) * 2007-03-29 2014-03-26 Eudyna Devices Inc. Optical semiconductor module and light receiving element
US8378289B2 (en) 2008-12-11 2013-02-19 Oclaro Japan, Inc. Optical receiver module and manufacturing method with a shifted and angled light receiving element
WO2022003896A1 (en) * 2020-07-02 2022-01-06 株式会社京都セミコンダクター End face incidence-type semiconductor light-receiving element, and method for manufacturing end face incidence-type semiconductor light-receiving element

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