JP2003203386A - Phase change recording medium and method for manufacturing the same - Google Patents

Phase change recording medium and method for manufacturing the same

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Publication number
JP2003203386A
JP2003203386A JP2002001845A JP2002001845A JP2003203386A JP 2003203386 A JP2003203386 A JP 2003203386A JP 2002001845 A JP2002001845 A JP 2002001845A JP 2002001845 A JP2002001845 A JP 2002001845A JP 2003203386 A JP2003203386 A JP 2003203386A
Authority
JP
Japan
Prior art keywords
layer
protective layer
recording medium
corrosion
change recording
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002001845A
Other languages
Japanese (ja)
Inventor
Takeshi Kibe
剛 木邊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP2002001845A priority Critical patent/JP2003203386A/en
Publication of JP2003203386A publication Critical patent/JP2003203386A/en
Pending legal-status Critical Current

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  • Manufacturing Optical Record Carriers (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To prevent the corrosion of a reflection heat radiation layer made of Ag or an Ag alloy in a phase change recording medium. <P>SOLUTION: In this phase change recording medium for using thermal action (quenching and slow cooling) by light irradiation to perform transfer between a crystal condition and an amorphous condition, a layer (corrosion resistance protective layer) 8 inactive to oxygen, sulfur or halogen is disposed closely contactly between the reflection heat radiation layer 6 made of Ag or an Ag alloy and a protective layer 7 made of a high polymer resin (1). In the phase change recording medium, the dimensions of the corrosion resistance protective layer 8 are larger than those of the reflection heat radiation layer 6, and at least one end face of the reflection heat radiation layer 6 is covered with the corrosion resistance protective layer 8 (2). In a method for manufacturing the phase change recording medium, oxygen is mixed in sputter process gas for sputtering and forming the corrosion resistance protective layer 8 (3). <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【０００１】[0001]

【発明の属する技術分野】本発明は、相変化記録媒体及
びその製造方法に関するものであり、特に、Ａｇ、又は
Ａｇ合金からなる反射放熱層の腐食防止に関するもので
ある。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a phase change recording medium and a method for manufacturing the same, and more particularly to prevention of corrosion of a reflective heat dissipation layer made of Ag or an Ag alloy.

【０００２】[0002]

【従来技術】相変化記録媒体の記録・消去は熱的な作用
により結晶化転移温度まで昇温した記録層を急冷（非結
晶化）、又は徐冷（結晶化）することで実現される。そ
して、この急冷作用は、記録層に誘電体層を挟んで隣接
する反射放熱層の熱的特性（熱伝導率、熱容量など）に
よって制御されるため、より高速な記録（記録層の急
冷）を実現するためには、より高い熱伝導率を有する反
射放熱層が必要となる。記録媒体の大容量化・高密度化
が進み、必然的に記録速度の高速化が要求される現在、
代表的な相変化記録媒体であるＤＶＤ＋ＲＷの反射放熱
層の材料には、高い熱伝導率を有するという点から、Ａ
ｇ又はＡｇ合金が望ましい。ところが、Ａｇ又はＡｇ合
金は、空気又は水分中の硫化水素やハロゲンイオンと反
応し易く、孔食腐食や部分腐食が生じ易いという欠点を
持っている。通常は、高分子保護層によってコーティン
グされており問題はないが、高温高湿度の環境下におい
ては、その保護効果は低く、前述の腐食を引き起こす物
質を容易に透過させ、反射放熱層の腐食を生じ、記録媒
体のエラー原因となる。また、ＡｇにＰｄ、Ｃｕ、Ａｕ
等を添加し合金化することによりＡｇの腐食反応を抑制
できるという研究結果も報告されてはいるが、高温高湿
度の環境下においては、やはりその効果は完全でなく、
数百時間の放置で腐食が生じてしまう。更に、ＰｄやＡ
ｕを含む合金は非常に高価であるため、材料コストの点
でも問題がある。2. Description of the Related Art Recording / erasing of a phase change recording medium is realized by rapidly cooling (non-crystallizing) or gradually cooling (crystallizing) a recording layer heated to a crystallization transition temperature by a thermal action. Since this quenching action is controlled by the thermal characteristics (thermal conductivity, heat capacity, etc.) of the reflective heat dissipation layer adjacent to the recording layer with the dielectric layer sandwiched between them, faster recording (quenching of the recording layer) is achieved. In order to realize it, a reflection heat dissipation layer having higher thermal conductivity is required. Now that the capacity and density of recording media are increasing, it is inevitable that the recording speed will increase.
The material of the reflective / heat dissipation layer of DVD + RW, which is a typical phase change recording medium, has a high thermal conductivity.
g or Ag alloy is desirable. However, Ag or Ag alloy has a drawback that it easily reacts with hydrogen sulfide or halogen ions in air or water, and pitting corrosion or partial corrosion easily occurs. Normally, there is no problem because it is coated with a polymer protective layer, but in a high temperature and high humidity environment, its protective effect is low, and it easily permeates the above-mentioned substances that cause corrosion and corrodes the reflective heat dissipation layer. And cause an error in the recording medium. Moreover, Pd, Cu, Au is added to Ag.
Although the research results that the corrosion reaction of Ag can be suppressed by adding and alloying with etc. have been reported, the effect is not perfect in the environment of high temperature and high humidity.
Corrosion occurs after standing for several hundred hours. Furthermore, Pd and A
Since the alloy containing u is very expensive, there is a problem in terms of material cost.

【０００３】相変化記録媒体の耐食性や耐環境性の向上
を目的とする公知技術として、特開２０００−１１３５
１４号公報には、第２誘電体層と保護層の間に２層反射
層を設ける発明が開示されているが、第２誘電体層に接
する第1反射層の役割は、第２反射層と第２誘電体層と
の化学反応を抑制する障壁であり、第２反射層の役割は
第１反射層に付加された熱的負荷を緩和することである
と記載されており、位置的に本発明の耐熱性保護層に相
当する第２保護層の役割は本発明と全く異なる。また、
第１及び第２反射層の材料としてＡｇ又はＡｇ合金から
なる材料を用いることは記載されていない。同じく、特
開２０００−３３９７６５号公報には、ＺｎＳとＳｉＯ
２からなる上部保護層の上にＡｌｘＴｉｙＭ
（１００−ｘ−ｙ）とＡｇｘＴｉｙＭ（１００
−ｘ−ｙ）の２層構造の反射層を設ける発明が開示され
ているが、この発明は、反射層材料中のＡｇと上部保護
層のＳ成分との反応による記録特性の悪化防止を目的と
しており、後述する本発明の目的（反射層を構成するＡ
ｇ又はＡｇ合金が空気又は水分中の硫化水素やハロゲン
イオンと反応して腐食することを防止する）とは相違し
ている。そして、上部保護層と上記Ａｇ合金層の間にＡ
ｌ合金層を設けている点で、本発明のＺｎＳとＳｉＯ２
からなる第二誘電体層（上部保護層に相当）に接して設
けたＡｇを含有する反射層の上に耐食性保護層を設ける
という本発明とは構成上も明確に相違する。As a known technique for improving the corrosion resistance and environment resistance of a phase change recording medium, there is known Japanese Patent Laid-Open No. 2000-1135.
Japanese Patent Publication No. 14 discloses an invention in which a two-layer reflective layer is provided between a second dielectric layer and a protective layer. The role of the first reflective layer in contact with the second dielectric layer is to serve as the second reflective layer. It is described that it is a barrier that suppresses the chemical reaction between the first dielectric layer and the second dielectric layer, and the role of the second reflective layer is to alleviate the thermal load applied to the first reflective layer. The role of the second protective layer corresponding to the heat resistant protective layer of the present invention is completely different from that of the present invention. Also,
The use of a material made of Ag or an Ag alloy as the material of the first and second reflective layers is not described. Similarly, Japanese Patent Laid-Open No. 2000-339765 discloses ZnS and SiO.
AlxTiyM on the upper protective layer consisting of 2
(100-xy) and AgxTiyM (100
Although the invention of providing a reflective layer having a two-layer structure of ( x-y) is disclosed, the present invention aims to prevent deterioration of recording characteristics due to reaction between Ag in the reflective layer material and S component of the upper protective layer. The purpose of the present invention described later (A which constitutes the reflective layer
g or Ag alloy to prevent corrosion due to reaction with hydrogen sulfide or halogen ions in air or water). A between the upper protective layer and the Ag alloy layer
lS alloy layer, ZnS and SiO 2 of the present invention are provided.
The structure is clearly different from the present invention in which the corrosion-resistant protective layer is provided on the reflective layer containing Ag provided in contact with the second dielectric layer (corresponding to the upper protective layer).

【０００４】[0004]

【発明が解決しようとする課題】本発明は、上記従来技
術の問題点を解決すべくなされたものであって、相変化
記録媒体のＡｇ又はＡｇ合金からなる反射放熱層の腐食
防止を目的とする。SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems of the prior art, and its object is to prevent corrosion of the reflective heat dissipation layer made of Ag or Ag alloy of the phase change recording medium. To do.

【０００５】[0005]

【課題を解決するための手段】上記課題は、次の１）〜
６）の発明（以下、本発明１〜６という）によって解決
される。 １） 光の照射による熱的な作用（急冷・徐冷）を利用
して、結晶状態と非結晶状態の転移を行う相変化記録媒
体において、Ａｇ又はＡｇ合金からなる反射放熱層と高
分子樹脂からなる保護層との間に、酸素、硫黄又はハロ
ゲンに対して不活性な層（耐食性保護層）を密着して配
置したことを特徴とする相変化記録媒体。 ２） 耐食性保護層が、Ａｌ又はＡｌ合金からなること
を特徴とする１）記載の相変化記録媒体。 ３） 耐食性保護層が、Ｓｉ、Ｓｉの炭化物、Ｓｉの窒
化物の少なくとも一つからなることを特徴とする１）記
載の相変化記録媒体。 ４） 耐食性保護層の表層部に、酸化アルミニウム（ア
ルミナ）の緻密な皮膜が形成されていることを特徴とす
る２）記載の相変化記録媒体。 ５） 耐食性保護層の寸法が反射放熱層の寸法よりも大
きく、反射放熱層の少なくとも一方の端面が耐食性保護
層で覆われていることを特徴とする１）〜４）の何れか
に記載の相変化記録媒体。 ６） スパッタプロセスガス中に酸素を混合してスパッ
タリングを行い耐食性保護層を形成することを特徴とす
る４）記載の相変化記録媒体の製造方法。[Means for Solving the Problems] The above problems are solved in the following 1) to
It is solved by the invention 6) (hereinafter, referred to as the present inventions 1 to 6). 1) In a phase-change recording medium that makes a transition between a crystalline state and an amorphous state by utilizing a thermal action (rapid cooling / slow cooling) by irradiation of light, a reflective heat dissipation layer made of Ag or Ag alloy and a polymer resin A phase-change recording medium characterized in that a layer (corrosion-resistant protective layer) inert to oxygen, sulfur, or halogen is disposed in close contact with the protective layer consisting of. 2) The phase change recording medium according to 1), wherein the corrosion-resistant protective layer is made of Al or an Al alloy. 3) The phase change recording medium according to 1), wherein the corrosion-resistant protective layer is made of at least one of Si, Si carbide, and Si nitride. 4) The phase change recording medium according to 2), wherein a dense film of aluminum oxide (alumina) is formed on the surface layer of the corrosion-resistant protective layer. 5) The size of the corrosion-resistant protective layer is larger than the size of the reflection / heat dissipation layer, and at least one end surface of the reflection / heat dissipation layer is covered with the corrosion-resistant protection layer. Phase change recording medium. 6) The method for producing a phase change recording medium according to 4), wherein oxygen is mixed in a sputtering process gas and sputtering is performed to form a corrosion-resistant protective layer.

【０００６】以下、上記本発明について詳しく説明す
る。図２に、本発明に係る相変化記録媒体をＤＶＤ＋Ｒ
Ｗに適用した場合の層構成の一例を示す。耐食性保護層
８は、酸素、硫黄又はハロゲンに対して不活性な材料、
換言すれば、これらの材料と反応しない材料からなる。
耐食性保護層以外の各層の材料は特に限定されず、本出
願前公知の種々のものを用いることが可能であるが、代
表的なものを例示すると、基板１としてはポリカーボネ
ート樹脂、第一、第二誘電体層（保護層）２、４として
はＺｎＳ・ＳｉＯ２、相変化記録層３としてはＡｇ・Ｉ
ｎ・Ｓｂ・Ｔｅ・Ｇｅ合金、バリア層５としてはＳｉ
Ｃ、高分子保護層７としてはアクリル樹脂が挙げられ
る。耐食性保護層の膜厚は、通常４〜２０ｎｍ程度とす
る。また、その他の各層の膜厚は従来公知の範囲内で適
宜選択すればよい。The present invention will be described in detail below. FIG. 2 shows the phase change recording medium according to the present invention as DVD + R.
An example of the layer structure when applied to W is shown. The corrosion-resistant protective layer 8 is made of a material inert to oxygen, sulfur or halogen,
In other words, it consists of materials that do not react with these materials.
The material of each layer other than the corrosion-resistant protective layer is not particularly limited, and various known materials can be used before the present application. Typical examples are polycarbonate resin, the first, the first as the substrate 1. The two dielectric layers (protective layers) 2 and 4 are ZnS.SiO 2 and the phase change recording layer 3 is Ag.I.
n.Sb.Te.Ge alloy, Si as the barrier layer 5
Examples of C and the polymer protective layer 7 include acrylic resins. The thickness of the corrosion-resistant protective layer is usually about 4 to 20 nm. Further, the film thickness of each of the other layers may be appropriately selected within a conventionally known range.

【０００７】耐食性保護層の材料としては、酸素、硫黄
又はハロゲンに対して不活性な材料であれば特に限定さ
れないが、好ましいのは、Ａｌ、ＡｌＴｉ、Ａｌ
２Ｏ３、Ｓｉ、ＳｉＣ、ＳｉＮなどである。耐食性保護
層にＡｌ又はＡｌ合金を用いると、ＤＣスパッタリング
で膜形成が可能となり製造コストを削減できる。また、
耐食性保護層にＳｉ、ＳｉＣ、ＳｉＮの少なくとも一つ
を用いると、より耐食性に優れた保護層を得ることがで
きる。また、スパッタプロセスガス中に酸素を混合する
などしてＡｌ又はＡｌ合金からなる耐食性保護層の表面
に酸化アルミニウム（アルミナ）の緻密な皮膜を形成す
ることにより、より耐食性の優れた保護層を安価に作成
することができる。更に、図３に層構成の一例を示した
ように、耐食性保護層８の寸法を反射放熱層６の寸法よ
りも大きくし、反射放熱層の少なくとも一方の端面を耐
食性保護層で覆うようにすれば、反射放熱層の端面から
の腐食を防止することができる。The material for the corrosion-resistant protective layer is not particularly limited as long as it is a material inert to oxygen, sulfur or halogen, but Al, AlTi and Al are preferred.
2 O 3 , Si, SiC, SiN and the like. When Al or an Al alloy is used for the corrosion-resistant protective layer, it is possible to form a film by DC sputtering and reduce the manufacturing cost. Also,
By using at least one of Si, SiC, and SiN for the corrosion-resistant protective layer, a protective layer having more excellent corrosion resistance can be obtained. Also, by forming a dense film of aluminum oxide (alumina) on the surface of the corrosion-resistant protective layer made of Al or Al alloy by mixing oxygen into the sputtering process gas, a protective layer with more excellent corrosion resistance can be obtained at a low cost. Can be created. Further, as shown in FIG. 3 as an example of the layer structure, the size of the corrosion-resistant protective layer 8 is made larger than the size of the reflection / heat dissipation layer 6, and at least one end surface of the reflection / heat dissipation layer may be covered with the corrosion-resistant protection layer. For example, it is possible to prevent corrosion from the end surface of the reflective heat dissipation layer.

【０００８】[0008]

【実施例】以下、ＤＶＤ＋ＲＷの層構成を有する実施例
及び比較例を挙げて、本発明を具体的に説明する。EXAMPLES The present invention will be described in detail below with reference to examples and comparative examples having a DVD + RW layer structure.

【０００９】比較例１ 図１に層構成の概略を示す従来のＤＶＤ＋ＲＷ媒体を、
次のようにして作成した。厚さ０．６ｍｍのポリカーボ
ネート基板１の凹凸を有する面の上に、ＺｎＳ・ＳｉＯ
２からなる膜厚８０ｎｍの第一誘電体層（保護層）、Ａ
ｇ・Ｉｎ・Ｓｂ・Ｔｅ・Ｇｅ合金からなる膜厚１５ｎｍ
の相変化記録層、ＺｎＳ・ＳｉＯ２からなる膜厚１４ｎ
ｍの第二誘電体層（保護層）、ＳｉＣからなる膜厚４ｎ
ｍのバリア層、Ａｇからなる膜厚１４０ｎｍの反射放熱
層を順次スパッタリングにより積層し、その上にスピン
コートによりアクリル樹脂からなる膜厚８μｍの高分子
保護層を形成して比較例１のサンプルを得た。本来なら
ば、更に、接着層を介してダミーの基板を貼り合わせる
が、耐食性保護層の効果を確認するための比較例である
から、敢えて単板の状態に留めた。Comparative Example 1 A conventional DVD + RW medium whose layer structure is schematically shown in FIG.
It was created as follows. On the surface of the polycarbonate substrate 1 having a thickness of 0.6 mm, which has irregularities, ZnS.SiO.
80 nm thick first dielectric layer (protective layer) consisting of 2 , A
15nm film thickness consisting of g-In-Sb-Te-Ge alloy
Of the phase change recording layer of ZnS / SiO 2 having a film thickness of 14 n
m second dielectric layer (protective layer), SiC film thickness 4n
m barrier layer and a 140 nm-thick reflection / heat dissipation layer made of Ag were sequentially laminated by sputtering, and a polymer protective layer made of acrylic resin and having a thickness of 8 μm was formed thereon by spin coating to prepare a sample of Comparative Example 1. Obtained. Originally, a dummy substrate is further bonded via an adhesive layer, but this is a comparative example for confirming the effect of the corrosion-resistant protective layer, so the state of a single plate was intentionally left.

【００１０】実施例１ 図２に示す層構成のＤＶＤ＋ＲＷ媒体を、次のようにし
て作成した。即ち、比較例１における反射放熱層の上
に、更にＡｌＴｉからなる膜厚１０ｎｍの耐食性保護層
をスパッタリングにより形成した点以外は、比較例１と
同様にして実施例１のサンプルを得た。Example 1 A DVD + RW medium having the layer structure shown in FIG. 2 was prepared as follows. That is, a sample of Example 1 was obtained in the same manner as in Comparative Example 1 except that a corrosion-resistant protective layer made of AlTi and having a film thickness of 10 nm was further formed on the reflection / heat dissipation layer in Comparative Example 1 by sputtering.

【００１１】実施例２ 耐食性保護層の材料をＳｉＣに代えた点以外は、実施例
１と同様にして実施例２のサンプルを得た。Example 2 A sample of Example 2 was obtained in the same manner as in Example 1 except that SiC was used as the material for the corrosion-resistant protective layer.

【００１２】実施例３ ＡｌＴｉのスパッタリングを行うチャンバーにおいて、
スパッタマスクの開口寸法を、内周、外周共に０．５ｍ
ｍ拡大し、耐食性保護層が反射放熱層より大きくなるよ
うに形成し、反射放熱層の両端面を耐食性保護層で覆う
ようにした点以外は、実施例１と同様にして、図３に示
す層構成のＤＶＤ＋ＲＷ媒体である実施例３のサンプル
を得た。Example 3 In a chamber for sputtering AlTi,
The opening size of the sputter mask is 0.5m on both the inner and outer circumferences.
3 is shown in FIG. 3 in the same manner as in Example 1 except that the corrosion-resistant protective layer is formed to be larger than the reflective heat-dissipating layer and both end surfaces of the reflective heat-dissipating layer are covered with the corrosion-resistant protective layer. A sample of Example 3 which is a layered DVD + RW medium was obtained.

【００１３】上記比較例１及び実施例１〜３の各サンプ
ルを高温高湿度（８０℃、８５ＲＨ％）の環境下に置
き、時間経過に伴うＡｇからなる反射放熱層の外観上の
変化とディスクとしての欠陥率を測定した。欠陥率と
は、未記録ディスクの欠陥量を数値化した指標の一つで
あり、「欠陥の積算量／検査範囲」で表されるものであ
る。ここでは、平均の反射率に対して±２０％の範囲を
超える部分を欠陥と定義して積算した。結果を纏めて次
の表１に示す。なお、欠陥率の欄の数値は、上記指標
（割合）を示したものであり、例えば「２．５１Ｅ−０
６」は、「２．５１×１０−６」を意味する。The samples of Comparative Example 1 and Examples 1 to 3 were placed in an environment of high temperature and high humidity (80 ° C., 85 RH%), and the change in appearance of the reflective heat dissipation layer made of Ag and the disc over time. The defect rate was measured. The defect rate is one of the numerical values of the defect amount of the unrecorded disc, and is represented by "the total amount of defects / inspection range". Here, the portion exceeding the range of ± 20% with respect to the average reflectance is defined as a defect and integrated. The results are summarized in Table 1 below. In addition, the numerical value in the column of the defect rate shows the above-mentioned index (ratio), for example, "2.51E-0.
“6” means “2.51 × 10 −6 ”.

【表１】 [Table 1]

【００１４】以上の結果から、実施例１〜３のサンプル
が比較例１のサンプルに比べて優れていることは明らで
あり、本発明に係る耐食性保護層が、Ａｇからなる反射
放熱層の高分子保護層側からの腐食を防止する効果を有
することが分った。また、Ａｇに代えてＡｇ合金を用い
ても同様の効果を奏することを確認した。From the above results, it is clear that the samples of Examples 1 to 3 are superior to the sample of Comparative Example 1, and the corrosion-resistant protective layer according to the present invention is a reflective heat dissipation layer made of Ag. It was found that it has an effect of preventing corrosion from the side of the polymer protective layer. It was also confirmed that the same effect was obtained even when an Ag alloy was used instead of Ag.

【００１５】[0015]

【発明の効果】本発明１によれば、Ａｇ又はＡｇ合金か
らなる反射放熱層の腐食（酸化、硫化、ハロゲン化）が
防止された相変化記録媒体を提供できる。本発明２によ
れば、耐食性保護層をＤＣスパッタリングにより形成で
きるので、前記腐食が防止された相変化記録媒体を安価
に提供できる。本発明３によれば、より耐食性に優れた
保護層を形成できる。本発明４によれば、より耐食性に
優れた保護層を安価に形成できる。本発明５によれば、
反射放熱層の端面からの腐食を防止できる。本発明６に
よれば、酸化アルミニウム（アルミナ）の形成が耐食性
保護層の表層部のみならず、その内部に渡って分布する
ことで、より強固な耐食性保護層を形成できる。EFFECTS OF THE INVENTION According to the present invention 1, it is possible to provide a phase change recording medium in which corrosion (oxidation, sulfurization, halogenation) of the reflection heat dissipation layer made of Ag or Ag alloy is prevented. According to the second aspect of the present invention, since the corrosion-resistant protective layer can be formed by DC sputtering, it is possible to inexpensively provide the phase change recording medium in which the corrosion is prevented. According to the present invention 3, it is possible to form a protective layer having more excellent corrosion resistance. According to the present invention 4, it is possible to inexpensively form a protective layer having more excellent corrosion resistance. According to the present invention 5,
It is possible to prevent corrosion from the end surface of the reflective heat dissipation layer. According to the sixth aspect of the present invention, the formation of aluminum oxide (alumina) is distributed not only on the surface layer portion of the corrosion-resistant protective layer but also inside thereof, so that a stronger corrosion-resistant protective layer can be formed.

【図面の簡単な説明】[Brief description of drawings]

【図１】従来のＤＶＤ＋ＲＷ媒体の層構成の概略を示す
図。FIG. 1 is a diagram showing an outline of a layer structure of a conventional DVD + RW medium.

【図２】本発明に係る相変化記録媒体をＤＶＤ＋ＲＷに
適用した場合の層構成の一例を示す図。FIG. 2 is a diagram showing an example of a layer structure when the phase change recording medium according to the present invention is applied to a DVD + RW.

【図３】本発明５に係る相変化記録媒体をＤＶＤ＋ＲＷ
に適用した場合の層構成の一例を示す図。FIG. 3 shows a phase change recording medium according to the present invention 5 as a DVD + RW.
The figure which shows an example of the layer structure at the time of applying to.

【符号の説明】[Explanation of symbols]

１ 基板 ２ 第一誘電体層（保護層） ３ 相変化記録層 ４ 第二誘電体層（保護層） ５ バリア層 ６ 反射放熱層 ７ 高分子保護層 ８ 耐食性保護層 1 substrate 2 First dielectric layer (protective layer) 3 Phase change recording layer 4 Second dielectric layer (protective layer) 5 barrier layers 6 Reflective heat dissipation layer 7 Polymer protection layer 8 Corrosion resistance protective layer

Claims (6)

【特許請求の範囲】[Claims] 【請求項１】 光の照射による熱的な作用（急冷・徐
冷）を利用して、結晶状態と非結晶状態の転移を行う相
変化記録媒体において、Ａｇ又はＡｇ合金からなる反射
放熱層と高分子樹脂からなる保護層との間に、酸素、硫
黄又はハロゲンに対して不活性な層（耐食性保護層）を
密着して配置したことを特徴とする相変化記録媒体。1. A phase change recording medium that makes a transition between a crystalline state and an amorphous state by utilizing a thermal action (rapid cooling / slow cooling) by light irradiation, and a reflective heat dissipation layer made of Ag or Ag alloy. A phase-change recording medium, characterized in that a layer (corrosion-resistant protective layer) inert to oxygen, sulfur or halogen is disposed in close contact with a protective layer made of a polymer resin. 【請求項２】 耐食性保護層が、Ａｌ又はＡｌ合金から
なることを特徴とする請求項１記載の相変化記録媒体。2. The phase change recording medium according to claim 1, wherein the corrosion-resistant protective layer is made of Al or an Al alloy. 【請求項３】 耐食性保護層が、Ｓｉ、Ｓｉの炭化物、
Ｓｉの窒化物の少なくとも一つからなることを特徴とす
る請求項１記載の相変化記録媒体。3. The corrosion-resistant protective layer comprises Si, a Si carbide,
The phase change recording medium according to claim 1, wherein the phase change recording medium comprises at least one of Si nitride. 【請求項４】 耐食性保護層の表層部に、酸化アルミニ
ウム（アルミナ）の緻密な皮膜が形成されていることを
特徴とする請求項２記載の相変化記録媒体。4. The phase change recording medium according to claim 2, wherein a dense film of aluminum oxide (alumina) is formed on the surface layer portion of the corrosion-resistant protective layer. 【請求項５】 耐食性保護層の寸法が反射放熱層の寸法
よりも大きく、反射放熱層の少なくとも一方の端面が耐
食性保護層で覆われていることを特徴とする請求項１〜
４の何れかに記載の相変化記録媒体。5. The corrosion-resistant protective layer has a size larger than that of the reflection / heat dissipation layer, and at least one end surface of the reflection / heat dissipation layer is covered with the corrosion-resistant protection layer.
4. The phase change recording medium according to any one of 4 above. 【請求項６】 スパッタプロセスガス中に酸素を混合し
てスパッタリングを行い耐食性保護層を形成することを
特徴とする請求項４記載の相変化記録媒体の製造方法。6. The method of manufacturing a phase change recording medium according to claim 4, wherein oxygen is mixed in a sputtering process gas and sputtering is performed to form a corrosion-resistant protective layer.
JP2002001845A 2002-01-08 2002-01-08 Phase change recording medium and method for manufacturing the same Pending JP2003203386A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002001845A JP2003203386A (en) 2002-01-08 2002-01-08 Phase change recording medium and method for manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002001845A JP2003203386A (en) 2002-01-08 2002-01-08 Phase change recording medium and method for manufacturing the same

Publications (1)

Publication Number Publication Date
JP2003203386A true JP2003203386A (en) 2003-07-18

Family

ID=27641865

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002001845A Pending JP2003203386A (en) 2002-01-08 2002-01-08 Phase change recording medium and method for manufacturing the same

Country Status (1)

Country Link
JP (1) JP2003203386A (en)

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