JP2003107728A - Method for developing photosensitive planographic printing plate - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent a flare phenomenon from occurring due to combination of a specified developer and a specified printing plate. SOLUTION: A photopolymer printing plate is developed by using a non-silicic acid type developer containing an inorganic alkali agent and a nonionic compound. During the development, the development treatment is accelerated by brushing a photopolymerization layer with a brush roll 142. That is to say, a flare occurrence due to the use of the non-silicic acid type developer is suppressed by combining the photopolymer printing plate, the non-silicic acid type developer and the brush roll 142 together. In this way, combination of the photopolymerizaiton type photopolymer printing plate, the non-silicic acid type developer and the textile brush roll suppresses jumping of a highlight and occurrence of the flare phenomenon and is effective in improving picture quality.

Description

Detailed Description of the Invention

[0001]

TECHNICAL FIELD The present invention relates to a photosensitive lithographic printing plate having a photopolymerizable image recording layer provided on a support, exposed to a light beam, and then containing an inorganic alkali agent and a nonionic compound. And a method for developing a photosensitive lithographic printing plate which is developed using a non-silicic acid-based developer.

[0002]

2. Description of the Related Art Conventionally, in a printing plate, when developing an image recording layer, unnecessary recording layers have been brushed and removed in a developing solution.

For example, when a photopolymer plate having a photopolymerizable layer as a recording layer is applied as a printing plate, a latent image is recorded by irradiating the photopolymerizable layer with a light beam according to image data, and then developing solution. By immersing in the inside, a portion of the photopolymerization layer which is not exposed to light is swollen, and the photopolymerization layer including the swollen portion is rubbed with a brush roller. Thereby, only the swollen photopolymerization layer is removed, and an image can be formed.

As the brush roller, a channel brush roller has been widely used from the past, but this channel brush roller has a drawback that unevenness of rubbing easily occurs. As a measure for preventing this uneven rubbing, it is necessary to increase the roller diameter.

On the other hand, there is an apparatus in which a Molton brush roller is used as a brush roller instead of the channel brush roller. Since this Molton brush roller is made of a material such as so-called fluffy cloth, it has no rub-off and is cheaper than the channel brush roller.

However, the Molton brush roller is not durable and needs to be replaced in about 1 to 3 months under general use conditions. This has a durability of 1 / several tens as compared with the channel brush roller, and there is a problem that maintenance is poor.

Next, conventionally, as a developing solution, a pH of 12.
Eight silicate (Si) based developers have been used.
This developer has a drawback that the highlight part of an image is conventionally blown off.

This will be described in detail, for example, in Japanese Patent Application Laid-Open Nos. 9-272096 and 8-262715.
JP 2000-206690 A and the like disclose a very sensitive photosensitive composition for a printing plate using a combination initiation system of a titanocene photoinitiator and a sensitizing dye. But,
These high-sensitivity printing plates, when handled, stored, exposed, etc., have a small amount of leaked light that causes the polymerizable components in the photosensitive layer to polymerize and harden, and that part is not removed by development and stains on the non-image area. However, there is a problem that so-called optical fog is likely to occur. In particular, when exposure is performed by an inner drum type (inner drum type) laser exposure machine, light fog due to such high-sensitivity printing plate reflected light (flare light) is likely to occur. For example, when a negative type plate is used as a photosensitive material, when an image such as a solid front surface is exposed on one side of the plate, if the opposite side is a non-image area, a thin fogging due to poor development occurs, and the opposite side ( When the opposite side to the light source is 180 °, the halftone dot is about 140 to 220 °), and there is a problem that the halftone dot becomes thick, and it is difficult to reproduce minute images and highlights. Was desired. Further, in these printing plates, when the developing treatment is continued for a long period of time, unnecessary substances are accumulated in the developing solution, aggregated and settled, and become development dregs, which is a factor of destabilizing the developing treatment.

Therefore, recently, about pH 12 (pH 1
0 to 12.5) developing solution is being transferred. This makes it possible to prevent the highlight part from jumping and improve the printing durability.

[0010]

However, the developing solution having a pH of 12 prevents the highlight portion from flying, but causes a new problem of flare. This flare phenomenon is a phenomenon in which the recording layer remains in the form of a thin film around the recording layer held on the support of the printing plate (a part that should be removed originally), Remarkably appears in the photopolymerization layer.

As described above, conventionally, in the case of a printing plate, measures such as cheapness, durability, and rubbing unevenness in the case of a brush roller, jumping of highlight portions, flare phenomenon, etc. (For example, image easiness of recording), the image quality is deteriorated due to various factors depending on the combination of the brush roller, the developing solution and the printing plate.

In particular, the flare phenomenon when a photopolymer plate is applied as a printing plate and treated with a developing solution having a pH of 12 has a great adverse effect on the image quality and causes deterioration of the image quality.

In consideration of the above facts, an object of the present invention is to obtain a method for developing a photosensitive lithographic printing plate which can prevent a flare phenomenon when a specific developing solution and a specific printing plate are combined. .

[0014]

According to a first aspect of the present invention, a photosensitive lithographic printing plate having a photopolymerizable image recording layer provided on a support is exposed to a light beam, and then an inorganic alkaline agent is used. And a method for developing a photosensitive lithographic printing plate which is developed by using a non-silicic acid-based developer containing a nonionic compound, wherein the photosensitive lithographic printing plate is transported while being immersed in the non-silicic acid-based developer. During this immersion, the brushing belt body in which the bristle material is woven into the sheet-like base material is brushed by the brush member wound around the peripheral surface of the axially rotating roller to accelerate the developing process. .

First, the developing solution components described in claim 1 will be described in detail.

The developer of the present invention contains a nonionic compound represented by the following general formula (I).

A-W (I) In the formula (I), A represents a hydrophobic organic group having a log P of A-H of 1.5 or more, and W is a nonionic compound having a log P of W-H of less than 1.0. Represents a hydrophilic hydrophilic organic group.

LogP means C. Hansch, A. Leo, "Substi.
tuent Constants for CorrelationAnalysis in Chemist
ry and Biology ”, J. Wile & Sons, 1979. Generally used as a hydrophobicity parameter described in octanol / water bilayer system of target molecule (AH and WH). , Is defined as the logarithm of the equilibrium concentration ratio P calculated from the ratio distributed to each layer.

In this case, the groups A and W in the general formula (I) are used as an index for identifying each group, and AH and W, which are hydrogen atoms bonded to the organic groups A and W for convenience, are used. For the -H structure, AKGhose, et. al. J. Comput. Chem. 9,80 (198
8). Calculated and calculated from known data based on the method described.

Specifically, as the structure, organic groups A and W are used.
Are different from each other and represent monovalent organic residues satisfying the above-mentioned logP. More preferably, the same or different from each other, a hydrogen atom, a halogen atom, a hydrocarbon group which may have a substituent, and may contain an unsaturated bond,
Heterocyclic group, hydroxyl group, substituted oxy group, mercapto group, substituted thio group, amino group, substituted amino group, substituted carbonyl group, carboxylate group, sulfo group, sulfonato group, substituted sulfinyl group, substituted sulfonyl group, phosphono group, It represents a substituted phosphono group, a phosphonato group, a substituted phosphonato group, a cyano group, and a nitro group.

The hydrocarbon group which may have the above-mentioned substituent and may contain an unsaturated bond is an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, an alkenyl group or a substituted alkenyl. Groups, alkynyl groups and substituted alkynyl groups.

The alkyl group has 1 to 2 carbon atoms.
Examples thereof include linear, branched, or cyclic alkyl groups of up to 0, and specific examples thereof include methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group. , Nonyl group, decyl group, undecyl group, dodecyl group, tridecyl group, hexadecyl group, octadecyl group, eicosyl group, isopropyl group,
Isobutyl group, s-butyl group, t-butyl group, isopentyl group, neopentyl group, 1-methylbutyl group, isohexyl group, 2-ethylhexyl group, 2-methylhexyl group, cyclohexyl group, cyclopentyl group, 2-norbornyl group be able to. Among these, straight-chain having 1 to 12 carbon atoms and 3 to 12 carbon atoms
And branched alkyl groups having 5 to 10 carbon atoms are more preferable.

The substituted alkyl group is composed of a bond between a substituent and an alkylene group, and as the substituent, a monovalent non-metallic atomic group excluding hydrogen is used. Preferred examples are halogen atoms (-F,-). Br, -Cl, -I), hydroxyl group, alkoxy group, aryloxy group, mercapto group, alkylthio group, arylthio group, alkyldithio group, aryldithio group, amino group, N-alkylamino group, N, N-dialkylamino. Group, N-arylamino group, N, N-diarylamino group, N-alkyl-N-
Arylamino group, acyloxy group, carbamoyloxy group, N-alkylcarbamoyloxy group, N-arylcarbamoyloxy group, N, N-dialkylcarbamoyloxy group, N, N-diarylcarbamoyloxy group, N-alkyl-N-aryl Rucarbamoyloxy group, alkylsulfoxy group, arylsulfoxy group, acylthio group, acylamino group, N-alkylacylamino group, N-arylacylamino group, ureido group, N ′
-Alkylureido group, N ', N'-dialkylureido group, N'-arylureido group, N', N'-diarylureido group, N'-alkyl-N'-arylureido group, N-alkylureido group, N-arylureido group, N'-alkyl-N-alkylureido group, N '
-Alkyl-N-arylureido group, N ', N'-dialkyl-N-alkylureido group, N', N'-dialkyl-N-arylureido group, N'-aryl-N
-Alkylureido group, N'-aryl-N-arylureido group, N ', N'-diaryl-N-alkylureido group, N', N'-diaryl-N-arylureido group, N'-alkyl-N ′ -Aryl-N-alkylureido group, N′-alkyl-N′-aryl-N-
Arylureido group, alkoxycarbonylamino group,
Aryloxycarbonylamino group, N-alkyl-N-
Alkoxycarbonylamino group, N-alkyl-N-aryloxycarbonylamino group, N-aryl-N-alkoxycarbonylamino group, N-aryl-N-aryloxycarbonylamino group, formyl group, acyl group,
Carboxyl group and its conjugate base group (hereinafter referred to as carboxylate), alkoxycarbonyl group, aryloxycarbonyl group, carbamoyl group, N-alkylcarbamoyl group, N, N-dialkylcarbamoyl group, N-arylcarbamoyl group, N, N- di arylcarbamoyl group, N- alkyl -N- arylcarbamoyl group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group, a sulfo group (-SO ₃ H) and its conjugated base group (hereinafter, a sulfonato group A), alkoxysulfonyl group, aryloxysulfonyl group, sulfinamoyl group, N-alkylsulfinamoyl group, N, N-dialkylsulfinamoyl group, N-arylsulfinamoyl group, N, N-diarylsulfinamoyl. , N-alkyl-N-arylsulfamomoyl group, sulfamoyl group, N-alkylsulfamoyl group, N, N-dialkylsulfamoyl group, N-arylsulfamoyl group, N, N-diarylsulfamoyl group group, N- alkyl -N- arylsulfamoyl group, N- acylsulfamoyl group and a conjugate base group, N- alkylsulfonylsulfamoyl group _{(-SO 2 NHSO 2 (alkyl)} ) and its conjugated base group ,
N- aryl acylsulfamoyl group (-SO ₂ N
HSO ₂ (aryl) and its conjugate base group, N-alkylsulfonylcarbamoyl group (-CONHSO ₂ (alky
l)) and its conjugate base group, N-arylsulfonylcarbamoyl group (-CONHSO ₂ (aryl)) and its conjugate base group, alkoxysilyl group (-Si (Oalky
l) ₃ ), aryloxysilyl group (-Si (Oary
l) _3), hydroxy silyl group (-Si (OH) ₃₎ and its conjugated base group, a phosphono group (-PO ₃ H ₂₎ and its conjugated base group (hereinafter referred to as phosphonato group), dialkylphosphono group ( -PO ₃ (alkyl) _2), diaryl phosphono group _{(-PO 3 (aryl) 2)} , alkyl aryl phosphono group _{(-PO 3 (alkyl) (aryl} )), monoalkyl phosphono group (-PO ₃ H (Alkyl)) and its conjugate base group (hereinafter,
Alkyl referred to as phosphonic Hona preparative group), monoaryl phosphono group (-PO ₃ H (aryl)) and its conjugated base group (hereinafter,
Arylphosphonato group), phosphonooxy group (-
OPO ₃ H ₂ ) and its conjugate base group (hereinafter referred to as phosphonatoxy group), dialkylphosphonooxy group (-OP
O ₃ (alkyl) ₂ ), diarylphosphonooxy group (-O
PO ₃ (aryl) _2), alkylaryl phosphono group _{(-OPO 3 (alkyl) (aryl} )), monoalkyl phosphono group (-OPO ₃ H (alkyl)) and its conjugated base group (hereinafter, the alkyl phosphonatooxy referred to as group), monoarylphosphono group (-OPO ₃ H (aryl)) and its conjugated base group (hereinafter referred to as aryl phosphite Hona preparative group), a cyano group, a nitro group, an aryl group, an alkenyl Group, an alkynyl group.

Specific examples of the alkyl group in these substituents include the above-mentioned alkyl groups, and specific examples of the aryl group include phenyl group, biphenyl group, naphthyl group, tolyl group, xylyl group and mesityl group. , Cumenyl group, fluorophenyl group, chlorophenyl group, bromophenyl group, chloromethylphenyl group, hydroxyphenyl group, methoxyphenyl group, ethoxyphenyl group, phenoxyphenyl group, acetoxyphenyl group, benzoyloxyphenyl group, methylthiophenyl group, Phenylthiophenyl group, methylaminophenyl group, dimethylaminophenyl group, acetylaminophenyl group, carboxyphenyl group, methoxycarbonylphenyl group, ethoxycarbonylphenyl group, phenoxycarbonylphenyl group, N-phenylcaphyl group Ba carbamoylphenyl group, a phenyl group, nitrophenyl group, cyanophenyl group, sulfophenyl group, sulfonatophenyl group, phosphonophenyl group,
Examples thereof include a phosphonatophenyl group. Examples of the alkenyl group include vinyl group, 1-propenyl group, 1-butenyl group, cinnamyl group, 2-chloro- group.
1-ethenyl group and the like, and examples of the alkynyl group, ethynyl group, 1-propynyl group, 1-butynyl group,
Examples thereof include a trimethylsilylethynyl group and a phenylethynyl group.

As the above-mentioned acyl group (R ³¹ CO--),
Examples of R ³¹ include a hydrogen atom and the above alkyl group, aryl group, alkenyl group, and alkynyl group. On the other hand, examples of the alkylene group in the substituted alkyl group include a divalent organic residue obtained by removing any one of the hydrogen atoms on the alkyl group having 1 to 20 carbon atoms described above. Can be a linear alkylene group having 1 to 12 carbon atoms, a branched alkylene group having 3 to 12 carbon atoms, and a cyclic alkylene group having 5 to 10 carbon atoms. Specific examples of preferred substituted alkyl groups include a chloromethyl group, a bromomethyl group, a 2-chloroethyl group, a trifluoromethyl group, a methoxymethyl group, a methoxyethoxyethyl group, an allyloxymethyl group, a phenoxymethyl group, a methylthiomethyl group, and a trimethylmethyl group. Ruthiomethyl group, ethylaminoethyl group, diethylaminopropyl group, morpholinopropyl group, acetyloxymethyl group,
Benzoyloxymethyl group, N-cyclohexylcarbamoyloxyethyl group, N-phenylcarbamoyloxyethyl group, acetylaminoethyl group, N-methylbenzoylaminopropyl group, 2-oxoethyl group, 2-oxopropyl group, carboxypropyl group, methoxy Carbonylethyl group, methoxycarbonylmethyl group, methoxycarbonylbutyl group, ethoxycarbonylmethyl group,
Butoxycarbonylmethyl group, allyloxycarbonylmethyl group, benzyloxycarbonylmethyl group, methoxycarbonylphenylmethyl group, trichloromethylcarbonylmethyl group, allyloxycarbonylbutyl group, chlorophenoxycarbonylmethyl group, carbamoylmethyl group, N-methylcarbamoylethyl group Group, N, N-dipropylcarbamoylmethyl group, N- (methoxyphenyl) carbamoylethyl group, N-methyl-N- (sulfophenyl) carbamoylmethyl group, sulfopropyl group,
Sulfobutyl group, sulfonatobutyl group, sulfamoylbutyl group, N-ethylsulfamoylmethyl group, N, N
-Dipropylsulfamoylpropyl group, N-tolylsulfamoylpropyl group, N-methyl-N- (phosphonophenyl) sulfamoyloctyl group,

[0026]

[Chemical 1]

Phosphonobutyl group, phosphonatohexyl group, diethylphosphonobutyl group, diphenylphosphonopropyl group, methylphosphonobutyl group, methylphosphonatobutyl group, tolylphosphonohexyl group, tolylphosphonatohexyl group, phosphonooxy Propyl group, phosphonatooxybutyl group, benzyl group, phenethyl group, α-methylbenzyl group, 1-methyl-1-phenylethyl group, p
-Methylbenzyl group, cinnamyl group, allyl group, 1-propenylmethyl group, 2-butenyl group, 2-methylallyl group, 2-methylpropenylmethyl group, 2-propynyl group, 2-butynyl group, 3-butynyl group, etc. Can be mentioned.

Examples of the aryl group include those in which 1 to 3 benzene rings form a condensed ring, and those in which a benzene ring and a 5-membered unsaturated ring form a condensed ring, and specific examples include phenyl. Examples thereof include a group, a naphthyl group, an anthryl group, a phenanthryl group, an indenyl group, an acenabutenyl group, and a fluorenyl group. Among these, a phenyl group and a naphthyl group are more preferable.

The substituted aryl group is a group in which a substituent is bonded to an aryl group, and a group having a monovalent non-metal atomic group other than hydrogen as a substituent on the ring-forming carbon atom of the aryl group is used. To be Examples of preferable substituents include the above-mentioned alkyl groups, substituted alkyl groups, and the substituents described above for the substituted alkyl groups. Preferred specific examples of these substituted aryl groups include a biphenyl group, a tolyl group, a xylyl group,
Mesityl group, cumenyl group, chlorophenyl group, bromophenyl group, fluorophenyl group, chloromethylphenyl group, trifluoromethylphenyl group, hydroxyphenyl group, methoxyphenyl group, methoxyethoxyphenyl group, allyloxyphenyl group, phenoxyphenyl group,
Methylthiophenyl group, tolylthiophenyl group, phenylthiophenyl group, ethylaminophenyl group, diethylaminophenyl group, morpholinophenyl group, acetyloxyphenyl group, benzoyloxyphenyl group, N-cyclohexylcarbamoyloxyphenyl group, N-phenylcarbamoyloxy Phenyl group, acetylaminophenyl group, N-methylbenzoylaminophenyl group, carboxyphenyl group, methoxycarbonylphenyl group,
Allyloxycarbonylphenyl group, chlorophenoxycarbonylphenyl group, carbamoylphenyl group, N-
Methylcarbamoylphenyl group, N, N-dipropylcarbamoylphenyl group, N- (methoxyphenyl) carbamoylphenyl group, N-methyl-N- (sulfophenyl) carbamoylphenyl group, sulfophenyl group, sulfonatophenyl group, sulfa Moylphenyl group, N-ethylsulfamoylphenyl group, N, N-dipropylsulfamoylphenyl group, N-tolylsulfamoylphenyl group, N-methyl-N- (phosphonophenyl) sulfamoylphenyl group, Phosphonophenyl group, phosphonatophenyl group, diethylphosphonophenyl group, diphenylphosphonophenyl group, methylphosphonophenyl group, methylphosphonatophenyl group, tolylphosphonophenyl group, tolylphosphonatophenyl group, allyl group, 1 -Propenylmethyl group, 2 Butenyl, 2-methyl-allyl phenyl group, 2-methyl propenyl phenyl group, 2-propynyl phenyl group, 2-butynyl phenyl group, and a 3-butynylphenyl group.

Examples of the alkenyl group include those mentioned above. The substituted alkenyl group is a substituent in which a hydrogen atom of the alkenyl group is replaced and bonded, and as the substituent, the substituent in the above-mentioned substituted alkyl group is used, while the alkenyl group is the above-mentioned alkenyl group. You can Examples of preferred substituted alkenyl groups include

[0031]

[Chemical 2]

And the like. Examples of the alkynyl group include those mentioned above. The substituted alkynyl group is one in which the substituent replaces a hydrogen atom of the alkynyl group and is bonded, and as the substituent, the substituent in the above substituted alkyl group is used, while the alkynyl group uses the above alkynyl group. be able to.

The heterocyclic group means a monovalent group obtained by removing one hydrogen atom on the heterocyclic ring, and one hydrogen atom is further removed from this monovalent group, and the substituent group in the above-mentioned substituted alkyl group is bonded thereto. The resulting monovalent group (substituted heterocyclic group). Examples of preferred heterocycles include:

[0034]

[Chemical 3]

[0035]

[Chemical 4]

And the like.

The substituted oxy group (R ³² O--) includes R ³²
Can be a monovalent non-metallic atomic group excluding hydrogen. Preferred substituted oxy groups are alkoxy groups, aryloxy groups, acyloxy groups, carbamoyloxy groups, N-alkylcarbamoyloxy groups, N-arylcarbamoyloxy groups, N, N-dialkylcarbamoyloxy groups, N, N-diarylcarbamoyloxy groups. Group, N-alkyl-N-arylcarbamoyloxy group, alkylsulfoxy group, arylsulfoxy group,
Examples thereof include a phosphonooxy group and a phosphonatoxy group. Examples of the alkyl group and the aryl group in these groups include those described above as the alkyl group, the substituted alkyl group, the aryl group and the substituted aryl group. The acyl group in the acyloxy group (R ⁶ CO-), R ⁶ is, there may be mentioned alkyl group above, a substituted alkyl group, aryl group or substituted aryl group. Among these substituents, alkoxy group, aryloxy group, acyloxy group,
An arylsulfoxy group and the like are more preferable. Specific examples of the preferred substituted oxy group include a methoxy group, an ethoxy group,
Propyloxy group, isopropyloxy group, butyloxy group, pentyloxy group, hexyloxy group, dodecyloxy group, benzyloxy group, allyloxy group, phenethyloxy group, carboxyethyloxy group, methoxycarbonylethyloxy group, ethoxycarbonylethyloxy group , Methoxyethoxy group, phenoxyethoxy group,
Methoxyethoxyethoxy group, ethoxyethoxyethoxy group, morpholinoethoxy group, morpholinopropyloxy group, allyloxyethoxyethoxy group, phenoxy group,
Tolyloxy group, xylyloxy group, mesityloxy group, cumenyloxy group, methoxyphenyloxy group, ethoxyphenyloxy group, chlorophenyloxy group, bromophenyloxy group, acetyloxy group, benzoyloxy group, naphthyloxy group, phenylsulfonyloxy group, phosphonooxy group , Phosphonatooxy and the like.

As the substituted thio group (R ³³ S-), those in which R ³³ is a monovalent non-metal atomic group excluding hydrogen can be used. Examples of preferred substituted thio groups include an alkylthio group, an arylthio group, an alkyldithio group, an aryldithio group, and an acylthio group. Alkyl group in these alkyl groups described above as the aryl group, a substituted alkyl group, and aryl group, those can be cited shown as substituted aryl group, R ⁶ acyl group in the acylthio group (R ⁶ CO-) in As described above. Of these, an alkylthio group and an arylthio group are more preferable. Specific examples of preferable substituted thio groups include:
Examples thereof include a methylthio group, an ethylthio group, a phenylthio group, an ethoxyethylthio group, a carboxyethylthio group and a methoxycarbonylthio group.

Substituted amino group (R³⁴NH-, (R³⁵)
(R³⁶) N-) is R³⁴, R³⁵, R ³⁶Removes hydrogen
A monovalent non-metallic atomic group can be used. Substituted amino
Preferred examples of the group include N-alkylamino group, N,
N-dialkylamino group, N-arylamino group, N,
N-diarylamino group, N-alkyl-N-aryl
Amino group, acylamino group, N-alkylacylamino
Group, N-arylacylamino group, ureido group, N'-
Alkylureido group, N ', N'-dialkylureido
Group, N'-arylureido group, N ', N'-diaryl
Ruureido group, N'-alkyl-N'-arylurei
Group, N-alkylureido group, N-arylureido group
Group, N'-alkyl-N-alkylureido group, N'-
Alkyl-N-arylureido group, N ', N'-dia
Rualkyl-N-alkylureido group, N ', N'-dial
Kill-N-arylureido group, N'-aryl-N-
Alkyl ureido group, N'-aryl-N-aryl group
Raid group, N ', N'-diaryl-N-alkyluree
Id group, N ', N'-diaryl-N-arylurei
Group, N'-alkyl-N'-aryl-N-alkyl
Ureido group, N'-alkyl-N'-aryl-N-a
Reel ureido group, alkoxycarbonylamino group,
Ryloxycarbonylamino group, N-alkyl-N-a
Lucoxycarbonylamino group, N-alkyl-N-ary
-Roxycarbonylamino group, N-aryl-N-ar
Coxycarbonylamino group, N-aryl-N-aryl
Roxycarbonylamino group is mentioned. In these
As the alkyl group and aryl group,
Substituted alkyl group, aryl group, and substituted aryl group
Can be mentioned as an acylamino
Group, N-alkylacylamino group, N-arylacyl
Acyl group in amino group (R³³R of CO-)³³Is the above
It is as follows. Among these, more preferable ones
Is an N-alkylamino group, N, N-dialkylamino
Group, N-arylamino group, acylamino group and the like.
Be done. Specific examples of preferred substituted amino groups include methyl
Amino group, ethylamino group, diethylamino group, morpho
Rino group, piperidino group, pyrrolidino group, phenylamino
Group, benzoylamino group, acetylamino group, etc.
Be done.

As the substituted carbonyl group (R ³⁷ —CO—), those in which R ³⁷ is a monovalent non-metal atomic group can be used. Preferred examples of the substituted carbonyl group include a formyl group, an acyl group, a carboxyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a carbamoyl group, an N-alkylcarbamoyl group, an N, N-dialkylcarbamoyl group, an N-arylcarbamoyl group, Examples thereof include N, N-diarylcarbamoyl groups and N-alkyl-N-arylcarbamoyl groups. As the alkyl group and the aryl group in these, the above-mentioned alkyl group, substituted alkyl group,
In addition, those shown as the aryl group and the substituted aryl group can be mentioned. Among these, more preferable substituents include a formyl group, an acyl group, a carboxyl group,
Alkoxycarbonyl group, aryloxycarbonyl group,
Carbamoyl group, N-alkylcarbamoyl group, N, N
Examples thereof include a -dialkylcarbamoyl group and an N-arylcarbamoyl group, and more preferable examples thereof include a formyl group, an acyl group, an alkoxycarbonyl group and an aryloxycarbonyl group. Specific examples of preferable substituents include formyl group, acetyl group, benzoyl group, carboxyl group, methoxycarbonyl group, allyloxycarbonyl group, N-methylcarbamoyl group, N.
-Phenylcarbamoyl group, N, N-diethylcarbamoyl group, morpholinocarbonyl group and the like can be mentioned.

As the substituted sulfinyl group (R ³⁸ —SO—), those in which R ³⁸ is a monovalent nonmetallic atomic group can be used. Preferred examples include alkylsulfinyl group, arylsulfinyl group, sulfinamoyl group, N-alkylsulfinamoyl group, N, N-dialkylsulfinamoyl group, N-arylsulfinamoyl group, N, N-diarylsulfinamoyl group. Group, and an N-alkyl-N-arylsulfinamoyl group. Examples of the alkyl group and aryl group in these groups include the alkyl group, the substituted alkyl group, and the aryl group and the substituted aryl group. Among these, more preferable examples include an alkylsulfinyl group and an arylsulfinyl group. Specific examples of such a substituted sulfinyl group include a hexylsulfinyl group,
Examples thereof include a benzylsulfinyl group and a tolylsulfinyl group.

As the substituted sulfonyl group (R ³⁹ --SO _2- ), those in which R ³⁹ is a monovalent non-metal atomic group can be used.
More preferable examples include an alkylsulfonyl group and an arylsulfonyl group. As the alkyl group and aryl group in these, the aforementioned alkyl group,
Examples thereof include a substituted alkyl group, an aryl group and a substituted aryl group. like this,
Specific examples of the substituted sulfonyl group include a butylsulfonyl group and a chlorophenylsulfonyl group.

The sulfonato group (-SO ₃ -) are as described above, means a conjugate base anion group of a sulfo group (-SO ₃ H), it is usually used preferably in combination with a counter cation. Such counter cations are generally known, that is, various oniums (ammoniums, sulfoniums, phosphoniums, iodoniums, aziniums, etc.), and metal ions (Na ⁺ , K ⁺ , C).
a ²⁺ , Zn ^2+, etc.).

The carboxylate group (—CO ₂ —) means a conjugate base anion group of the carboxyl group (CO ₂ H) as described above, and usually, it is preferably used together with a counter cation. Such counter cations are generally known, that is, various oniums (ammoniums, sulfoniums, phosphoniums, iodoniums, aziniums, etc.), and metal ions (N
a ⁺ , K ⁺ , Ca ²⁺ , Zn ^{2+ and the} like).

The substituted phosphono group means one in which one or two of the hydroxyl groups on the phosphono group are substituted with another organic oxo group, and preferable examples thereof include the above-mentioned dialkylphosphono group, diarylphosphono group, Examples thereof include an alkylarylphosphono group, a monoalkylphosphono group and a monoarylphosphono group. Among these, a dialkylphosphono group and a diarylphosphono group are more preferable. Specific examples thereof include a diethylphosphono group, a dibutylphosphono group, a diphenylphosphono group and the like.

[0046] phosphonate group ^{_{(-PO 3 2-, -PO 3 H}} -)
As described above, the phosphono group (—PO ₃ H ₂ ) means a conjugated base anion group derived from acid first dissociation or acid second dissociation. Usually, it is preferably used together with a counter cation. Such counter cations are generally known, that is, various oniums (ammoniums, sulfoniums, phosphoniums, iodoniums: aziniums, etc.), and metal ions (Na
⁺ , K ⁺ , Ca ²⁺ , Zn ^{2+ and the} like).

The substituted phosphono group means the above-mentioned substituted phosphono group.
Of the groups, the
The base is an anionic group, and specific examples thereof include the above-mentioned mono
Alkylphosphono group (-PO₃H (alkyl), monoant
Phosphono group (-PO₃List of conjugate bases of H (aryl)
You can get it. Usually used with counter cations
Is preferred. Such counter cations are generally
Known ones, namely various oniums (ammoni
Um, sulfonium, phosphonium, iodonium
Mums, aziniums, etc.), and metal ions (N
a⁺, K⁺, Ca ²⁺, Zn²⁺Etc.) can be mentioned.

In the general formula (I), each structure of A and W is more preferably an organic group in which A contains an aromatic group, W
Is a nonionic organic group containing a polyoxyalkylene group.

Specific examples of AH and WH are shown below.

[0050]

[Chemical 5]

[0051]

[Chemical 6]

Specific examples of the nonionic compound represented by the general formula (I) are shown below.

[0053]

[Chemical 7]

[0054]

[Chemical 8]

[0055]

[Chemical 9]

As the nonionic compound represented by the general formula (I), more preferable ones are those represented by the following formula (IA) or (IB).

[0057]

[Chemical 10]

(R ₁ and R ₂ are H or have 1 to 100 carbon atoms.
Is an alkyl group, and n and m are integers of 0 to 100. Examples of the compound represented by the general formula (IA) include polyoxyethylene phenyl ether, polyoxyethylene methyl phenyl ether, polyoxyethylene octyl phenyl ether, and polyoxyethylene nonyl phenyl ether.

Examples of the compound represented by the general formula (IB) include polyoxyethylene naphthyl ether, polyoxyethylene methyl naphthyl ether, polyoxyethylene octyl naphthyl ether, and polyoxyethylene nonyl naphthyl ether.

In the compounds of the above general formulas (IA) and (IB), the number of repeating units of the polyoxyethylene chain is preferably 3 to 50, more preferably 5 to 30. The number of repeating units of the polyoxypropylene chain is preferably 0-10, more preferably 0-5. The polyoxyethylene part and the polyoxypropylene part may be random or block copolymers.

The nonionic aromatic ether activators represented by the general formulas (IA) and (IB) are used alone or in combination of two or more.

In the present invention, it is effective to add the nonionic compound represented by the general formula (I) to the developer in an amount of 1 to 20% by weight, preferably 2 to 10% by weight.

If the amount added is too small, the developability and the solubility of the components of the photosensitive layer are lowered. On the contrary, if the amount is too large, the printing durability of the printing plate is lowered.

[Chelating Agent] The developer of the present invention is
It may contain an agent. For example, as a chelating agent
For example, Na₂P₂O₇, Na_FiveP₃O₃, Na₃P₃O₉, Na₂O_FourP
(NaO₃P) PO₃Na ₂, Calgon (Nato polymetaphosphate
) And other polyphosphates, eg ethylenediamine
Tetraacetic acid, its potassium salt, its sodium salt;
Tylene triamine pentaacetic acid, its potassium salt, Natri
Umium salt; triethylenetetramine hexaacetic acid, its potassium
Umium salt, its sodium salt; hydroxyethylethylene
Diamine triacetic acid, its potassium salt, its sodium
Salt; nitrilotriacetic acid, its potassium salt, its sodium
Salt; 1,2-diaminocyclohexanetetraacetic acid,
Potassium salt, its sodium salt; 1,3-diamino-
2-propanol tetraacetic acid, its potassium salt, its sodium
Other than aminopolycarboxylic acids such as thorium salt 2
-Phosphonobutane tricarboxylic acid-1,2,4, its
Lium salt and its sodium salt; 21-phosphonobutanoneto
Licarboxylic acid-2,3,4, its potassium salt, its nato
Lithium salt; 1-phosphonoethanetricarboxylic acid-1,
2, 2, its potassium salt, its sodium salt; 1-hydr
Roxyethane-1,1-diphosphonic acid, its potassium
Salt, its sodium salt; aminotri (methylenephosphone
Acid), its potassium salt, its sodium salt, etc.
Organic phosphonic acids can be mentioned. Such a key
The optimum amount of rate agent depends on the hardness of the hard water used and its usage.
It varies depending on the dose, but in general, it is a developer at the time of use.
0.01 to 5% by weight, and more preferably 0.01 to
It is contained in the range of 0.5% by weight.

[Alkaline Agent] The developer used in the present invention is an alkaline aqueous solution containing the nonionic compound represented by the above general formula (I). The alkaline agent contained is
For example, tribasic sodium phosphate, potassium, ammonium, sodium carbonate, potassium, ammonium, sodium hydrogencarbonate, potassium, ammonium, sodium borate, potassium, ammonium, sodium hydroxide, potassium, ammonium. , And inorganic alkali agents such as lithium. Also monomethylamine, dimethylamine, trimethylamine,
Monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine,
Organic alkaline agents such as triisopropylamine, n-butylamine, monoethanolamine, diethanolamine, triethanolamine, monoisopropanolamine, diisopropanolamine, ethyleneimine, ethylenediamine, pyridine and tetramethylammonium hydroxide are also used.

These alkaline agents may be used alone or in combination of two or more.

[Surfactant] In addition to the nonionic compound represented by the above general formula (I), the developer used in the present invention may further contain other surfactants described below. .

Other surfactants include, for example, polyoxyethylene lauryl ether, polyoxyethylene cetyl ether, polyoxyethylene stearyl ether, and other polyoxyethylene alkyl ethers, polyoxyethylene octylphenyl ether, polyoxyethylene nonyl. Polyoxyethylene alkyl allyl ethers such as phenyl ether, polyoxyethylene alkyl esters such as polyoxyethylene stearate,
Sorbitan alkyl esters such as sorbitan monolaurate, sorbitan monostearate, sorbitan distearate, sorbitan monooleate, sorbitan sesquioleate and sorbitan trioleate; monoglyceride alkyl esters such as glycerol monostearate and glycerol monooleate Nonionic surfactants: alkylbenzenesulfonates such as sodium dodecylbenzenesulfonate, sodium butylnaphthalenesulfonate, sodium pentylnaphthalenesulfonate, sodium hexylnaphthalenesulfonate, alkylnaphthalenesulfonates such as sodium octylnaphthalenesulfonate, lauryl Alkyl sulfates such as sodium sulfate, alkyl sulfonates such as sodium dodecyl sulfonate Anionic surfactants such as sulfosuccinate salts such as sodium dilauryl sulfosuccinate: Alkyl betaines such as lauryl betaine and stearyl betaine, and amphoteric surfactants such as amino acids can be used, but alkyl naphthalene is particularly preferable. Anionic surfactants such as sulfonates.

These surfactants can be used alone or in combination. The content of these surfactants in the developer is preferably 0.1 to 20% by weight in terms of active ingredient.

[Other Components] The developer used in the present invention may contain the following components in addition to the above components, if desired. For example, benzoic acid, phthalic acid, p-ethylbenzoic acid, pn-propylbenzoic acid,
p-isopropylbenzoic acid, pn-butylbenzoic acid,
p-t-butylbenzoic acid, p-t-butylbenzoic acid, p
Organic carboxylic acids such as 2-hydroxyethylbenzoic acid, decanoic acid, salicylic acid, 3-hydroxy-2-naphthoic acid; organics such as isopropyl alcohol, benzyl alcohol, ethyl cellosolve, butyl cellosolve, phenyl cellosolve, propylene glycol, diacetone alcohol Solvent; Other than this, chelating agent, reducing agent, dye, pigment,
Examples include water softeners and antiseptics.

Further, when the plate-making method of the present invention is subjected to development processing using an automatic developing machine, the developing solution becomes fatigued depending on the processing amount. Therefore, the processing ability can be improved by using a replenishing solution or a fresh developing solution. You may restore it.

Next, the properties of the developer will be described in detail.

[PH] The developer of the present invention is an alkaline aqueous solution having a pH of 12.5, more preferably pH 10.0 to 12.5, and most preferably pH from the viewpoint of the developing rate.
It is 11.0 to 12.5.

[Electrical Conductivity] The electrical conductivity of the developer of the present invention is 30.
mS / cm or less, more preferably 3 to 30 mS / cm, and most preferably 3 to 15 in terms of the developing speed.
It is mS / cm.

[Foamability] 30 ml of the developing solution is placed in a 100 ml transparent glass bottle having an inner diameter of 3 cm, and the glass bottle is shaken up and down for 1 minute at 25 ° C. at a rate of 3 times per second. Then, it is left to stand and the time until the bubbles disappear (defoaming time) is measured. The shorter this time is, the lower the foaming property is (the higher the defoaming property is).

The developer of the present invention preferably has a low foaming property, has a defoaming time of 5 minutes or less, and does not cause a foaming during the development processing and hinder the development processing step.

[Color] The developer of the present invention is colorless, and preferably has a color to the extent that visibility is obtained for the purpose of preventing misidentification with water.

[Viscosity] The viscosity of the developing solution of the present invention is preferably 1.0 to 10.0 cp at 25 ° C. when diluted with water.
Therefore, smooth development processing can be performed.

According to the first aspect of the invention, a photosensitive lithographic printing plate having a photopolymerizable image recording layer is subjected to an exposure treatment, and then a non-silicic acid developing solution containing an inorganic alkaline agent and a nonionic compound. To develop. At this time, the photopolymerization layer is brushed by a roller (brush member) around which a brushing strip, in which a bristle material is woven into a base material, is wound to accelerate the developing process.

According to this brush member, it is possible to suppress flare that occurs when a non-silicic acid-based developer having a pH different from the conventional one (approximated to alkali) which is applied as the developer is used. It is possible to suppress the factors that deteriorate the image quality, such as the highlight that occurs during the development by the above method and the flare that occurs during the development by the developing solution applied to the present invention.

According to a second aspect of the invention, in the invention according to the first aspect, the developer has a pH of 10.0 to pH.
It is characterized by having an electric conductivity of 32.5 ms / cm.

According to the second aspect of the present invention, the developer applied to the present invention has a pH of 10.0 to pH 12.5 and an electric conductivity of 3 to 30 ms / cm. There is a difference of 0.3 to 2.8 as compared with 0.8. This reduces the damage given to the photosensitive layer (photopolymerization layer),
Although the highlight part is prevented from jumping, it also causes flare. Therefore, by reliably brushing the boundary between the photosensitive portion and the non-photosensitive portion by the brush member,
Suppress flare.

The invention described in claim 3 is characterized in that, in the invention described in claim 2, the base material is a woven fabric.

A fourth aspect of the present invention is the invention according to any one of the first to third aspects, wherein the hair material is a natural fiber or an artificial fiber, and the thickness D of the hair material is D
= 1 to 10000 denier / piece, the length of the bristle material is 1 to 35 mm, and the density P of the bristle material formed as the band for brushing is P = 1000 to 200,000.
It is characterized in that it is denier / cm ² (where P = D × the number of hair materials per unit area (the number is / cm ² )).

According to a fifth aspect of the invention, in the invention of the fourth aspect, the thickness of the bristle material (denier / piece)
5. The development of the photosensitive lithographic printing plate according to claim 4, wherein the relationship between the length of the bristle material and the length L (mm) is 1 ≦ L ≦ 7.5 × (logD + (2/3)). Method.

A sixth aspect of the present invention is the invention according to any one of the first to third aspects, wherein the material of the bristle material is a metal fiber, and the wire diameter R of the bristle material is R. = 10
~ 200 μm / piece, and the length of the bristle material is 1 to 30 m
m, and the density P of the bristle material formed as the brushing band is P = 0.05 to 7.0 mm ² / cm ² .
(However, P = cross-sectional area per hair material (mm ² / piece) × number of hair materials per unit area (piece / cm ² ).)

In the invention according to claim 7, in the invention according to claim 6, the relationship between the wire diameter R (μm / piece) of the bristle material and the length L (mm) of the bristle material is 1 The feature is that ≦ L ≦ 0.1R + 10.

The base material is preferably a woven fabric as described in claim 3, and the bristle material is preferably natural fiber, artificial fiber or metal fiber as described in claims 4 to 7.

As a specific numerical value for obtaining the appropriate rigidity, when the hair material is a natural fiber or an artificial fiber, the thickness D of the hair material is D = 1 to 10,000 denier /
It is a book, the length of the bristle material is 1 to 35 mm, and the density P of the bristle material formed as the band for brushing is P = 1.
000 to 200,000 denier / cm ² (however, P =
D × the number of hair materials per unit area (the number is / cm ² ).

In this case, the thickness of the bristle material (denier /
Book) and the length L (mm) of the hair material is 1 ≦ L ≦
It is 7.5 × (logD + (2/3)).

When the material of the bristle material is metal fiber, the wire diameter R of the bristle material is 10 to 200 μm, the length of the bristle material is 1 to 30 mm, and it is formed as a brushing band. The density P of the hair material is P = 0.05-
7.0 mm ² / cm ² (where P = cross-sectional area per hair material (mm ² / piece) x number of hair materials per unit area)
(Books / cm ² ). ).

In this case, the wire diameter R of the bristle material (μm / piece)
And the length L (mm) of the bristle material is 1 ≦ L ≦ 0.1
R + 10.

The length L of the bristle material means the length protruding from the surface of the base material, as shown in FIG.

(Basis for numerical limitation) Hair material length Natural / artificial fiber: 1 ≦ L ≦ 7.5 × (logD + (2 /
3)) Metal fibers: 1 ≦ L ≦ 0.1R + 10 When L is 1 or less, the usage period of the hair material becomes short and the hair material cannot be used (it becomes unusable after a little abrasion).

If L exceeds the value on the right side of each, the stiffness of the bristle material becomes weak and the rubbing effect is lost. Thickness of hair material Natural / artificial fiber: 1 to 10000 denier / wire diameter of hair material: 10 to 200 μm / this As shown in FIG. 8, in the case of each lower limit value, the material of hair material is If it does not exist and exceeds the upper limit, the quality of the finished image is poor. Hair material density Natural / artificial fiber: 1000-200000 denier / cm
² Metal fiber: When the upper limit is 0.05 to 7.0 mm ² / cm ² , the rubbing effect cannot be obtained. When the amount is more than the upper limit, it is difficult to increase the density more than this in production.

If rubbing is the main focus, it is advantageous that the density is high, but if the stirring effect is involved, the density will be lowered while considering the balance with the rubbing effect.

[0097]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 shows the basic configuration of an automatic developing apparatus applied to this embodiment.

The automatic developing apparatus comprises a preprocessing section 20 shown in FIG.
0 and the development processing section 10 shown in FIG.

In the pretreatment section 200, the photopolymer plate 12 is subjected to preheating treatment and prewashing treatment prior to the developing treatment. The photopolymer plate 12 pretreated by the pretreatment device 200 is developed by the development processing unit 10. The development processing unit 10 uses any configuration capable of developing the photopolymer plate 12. be able to. Further, the pre-processing unit 200 applied to the present embodiment may be used separately from the development processing unit 10 or may be used by being connected to the development processing unit 10.

The pretreatment device 200 has a machine frame 202,
The pre-heating unit 204 is provided on the upstream side in the conveying direction of the photopolymer plate 12, and the pre-washing unit 206 as a pre-washing process is provided on the downstream side.

In the preheating section 204, a plurality of skewer rollers 210 are arranged in the heating chamber 208. Further, in the heating chamber 208, a heater 214 is provided on the inlet 212 side and a circulation fan 216 is provided on the upstream side of the heater 214.

In the pre-heating section 204, the photopolymer plate 1
When the photopolymer plate 1 passes through the heating chamber 208, the photopolymer plate 1 has a predetermined temperature and a predetermined heating time.
Photopolymer layer 1 is prepared by properly curing the photopolymerization layer 2
We are trying to increase the printing durability of 2.

On the other hand, the photopolymer plate 12 that has passed through the heating chamber 208 is sent from the outlet 218 to the pre-water washing section 206.

The front washing section 206 is provided with a washing tank 220, and a washing tank 222 for storing washing water is formed in the washing tank 220.

Conveying rollers 224, 226, and 228 are arranged in a staggered manner in the pre-water washing section 206 on the pre-heating section 204 side. The transport rollers 224, 228 are provided so as to face the upper surface of the photopolymer plate 12, and the transport roller 226 is arranged between the transport rollers 224, 228 so as to face the lower surface of the photopolymer plate 12. .

As a result, the photopolymer plate 12 sent to the pre-water washing unit 206 is transported to the transport rollers 224 and 228.
And the transport roller 44.

In the front water washing section 206, the brush roller 230 and the backup roller 2 are provided on the downstream side of the conveying roller 228.
32 are provided in a pair at the top and bottom. Brush roller 23
The contact position between 0 and the backup roller 232 is lower than the lower end of the transport roller 228. As a result, the photopolymer plate 12 is tilted from between the transport rollers 226 and 228 and is fed between the brush roller 230 and the backup roller 232.

Further, in the front water washing section 202, the conveying roller 2
28 and the brush roller 230 between the spray pipe 234
And the spray pipe 236 is provided above the brush roller 230.

The cleaning water ejected from the spray pipe 236 is supplied to the entire region along the axial direction of the brush roller 230, and the cleaning water ejected from the spray pipe 236 is
Supplied to this brush material, the photopolymer plate 12
Brushing is performed by the brush roller 230 supplied with the cleaning water.

As a result, the cleaning water is supplied to the surface of the photopolymer plate 12, and further the cleaning water is sent between the brush roller 230 and the backup roller 232 in a state where the cleaning water is stored.

The overcoat layer provided on the photopolymer plate 12 is swollen by the washing water and easily peeled off. Therefore, the photopolymer plate 12 was subjected to the development treatment by brushing it with the brush roller 230 in a state where the cleaning water was accumulated on the surface thereof, the overcoat layer was reliably removed, and the overcoat layer was partially left. Occasionally, uneven development will not occur.

The brush roller 230 is designed to obtain a predetermined brush pressure when the photopolymer plate 12 is sandwiched between the brush roller 230 and the backup roller 232.
As a result, the photopolymer plate 12 is rotated in the predetermined direction, and the photopolymer plate 12 is rotated by the brush roller 48 and the backup roller 23.
When passing between the two, the brush roller 230 brushes the surface of the photopolymer plate 12.

On the other hand, in the pre-water washing section 206, a skewer roller 238 is provided on the downstream side of the brush roller 230. The skewer roller 238 is arranged above the conveying path of the photopolymer plate 12, and the brush roller 230.
The photopolymer plate 12 having passed between the backup roller 232 and the backup roller 232 is prevented from being lifted by brushing by the brush roller 230 and coming off from the conveyance path.

When the pretreatment unit 200 is connected to the development treatment unit 10, the conveyance roller pair 42 of the development treatment unit 10 is provided at the most downstream side of the prewater washing unit 206.

As shown in FIG. 2, this automatic developing apparatus 1
0 is a photosensitive lithographic printing plate image-exposed by an exposure device (not shown) (hereinafter referred to as "photopolymer plate 12")
Applied to the development processing of.

As shown in FIG. 2, the photopolymer plate 12 developed by the automatic developing apparatus 10 of the present embodiment has an adhesive layer 105 on one surface of a thin support 104 made of aluminum or the like. The photosensitive layer 106 is formed on the plate, and an overcoat layer is provided on the photosensitive layer 106. The photopolymer plate 12 is subjected to image exposure by bringing a document film on which a document image is formed into close contact with the photosensitive surface.

As shown in FIG. 2, the automatic developing device 10
Is a developing section 14 for treating the photopolymer plate 12 with a developing solution, and a washing section 16 for supplying washing water of the photopolymer plate 12 treated with the developing solution to wash with water.
And a desensitizing treatment section 18 for desensitizing the photopolymer plate 12 after washing with water by applying a gum solution for protecting the plate surface,
And a drying unit 20 for drying the photopolymer plate 12. That is, in the automatic developing device 10, a developing process, a water washing process, a desensitizing process process, and a drying process are sequentially arranged along the conveying direction (arrow A in FIG. 2) of the photopolymer plate 12.

A processing tank 22 is provided in the automatic developing device 10.
Is provided. In this processing tank 22, a developing tank 24 is formed as a processing tank at a position to be the developing section 14, and a washing tank 2 is provided at positions to be the water washing section 16 and the desensitizing processing section 18.
6 and a desensitizing tank 28 are formed. Further, in the processing tank 22, a space for the insertion portion 34 is provided on the upstream side of the developing tank 24 (the upstream side in the transport direction of the photopolymer plate 12), and the drying section 20 is provided on the downstream side of the desensitizing processing tank 28.
Space is formed.

An outer panel 3 for covering the periphery of the processing tank 22.
0, a slit-shaped insertion opening 32 is formed on the insertion side of the photopolymer plate 12 into the automatic developing device 10 (on the left side of the paper in FIG. 1), and the processing tank 22 has an insertion opening 3 for the developing unit 14.
The insertion portion 34 is formed on the second side.

The automatic developing device 10 is provided with covers 36 and 38 for covering the upper part of the processing tank 22 and the upper part of the drying part 20. The cover 36 on the insertion port 32 side is arranged so as to cover the insertion part 34 of the processing tank 22 to the upper part of the water washing part 16, and the cover 38 is arranged so as to cover between the upper part of the water washing part 16 and the upper part of the drying part 20.

Further, the cover 36 is provided with a reentry insertion port (sub-insertion port) 40 for inserting the photopolymer plate 12 between the developing section 14 and the water washing section 16. The sub-insertion port 40 is for inserting the photopolymer plate 12 for performing the process in the PS plate processor 10 except the process in the developing section 14.

At the insertion portion 34 adjacent to the insertion opening 40, a rubber conveying roller pair 42 is arranged. The photopolymer plate 12 on which the image is printed is inserted from the insertion opening 32 in the direction of the arrow A, so that the pair of transport rollers 4
It is sent in between 2.

When the conveying roller pair 42 is driven to rotate, the photopolymer plate 12 is drawn into the insertion port 32 and is sent to the developing unit 14 at an angle of about 15 ° to 31 ° with respect to the horizontal direction. . An automatic developing device 1 used for processing the single-sided photopolymer plate 12
At 0, the photosensitive layer (photosensitive surface) is inserted from the insertion opening 32 with the photosensitive layer facing upward. That is, the photopolymer plate 12 is processed by the automatic developing device 10 with the photosensitive surface thereof facing upward.

Developing tank 2 formed in processing tank 22
4 has a substantially mountain shape in which the center of the bottom is projected downward, and stores a developing solution for developing the photopolymer plate 12.

In the developing tank 24, a conveying roller 48 is arranged on the side of the insertion portion 34 which is the upstream portion of the conveying path of the photopolymer plate 12. In the developing tank 24, PS
A conveyance roller pair 50 is arranged at the center of the plate conveyance path, and a conveyance roller pair 52 is arranged on the downstream side of the washing section 16.

In the developing tank 24 of the automatic developing device 10, a guide 116 is provided between the carrying roller 48 and the carrying roller pair 50. One end of this guide 116 is the transport roller 4
8, the other end is directed between the pair of transport rollers 50.

As a result, the photopolymer plate 1 drawn into the automatic developing device 10 by the pair of conveying rollers 42.
The sheet 2 is fed between the conveying roller 48 and the guide 116 and guided and conveyed on the guide 116 between the conveying roller pair 50.

In the developing tank 24, a pair of conveying rollers 5
In the vicinity of 0, the brush roller 14 is opposed to the guide 116.
1 is placed. The brush roller 141 is rotationally driven in a predetermined rotation direction and a predetermined rotation speed to contact the surface of the photopolymer plate 12 conveyed on the guide 116, thereby brushing the upper surface of the photopolymer plate 12. The guide 116 is arranged so that the brush roller 141 contacts the upper surface of the photopolymer plate 12 with a predetermined brush pressure.

Further, the brush roller 141 is adapted to project from the liquid surface of the developing solution, and the recess 100B of the shielding lid 100, together with the conveying roller pair 50, has an upper part projecting from the liquid surface of the brush roller 141. It is designed to get in.

On the other hand, in the developing tank 24, a pair of conveying rollers 5
Between 0 and 52, the brush roller 142 and the transport roller 60
Are arranged. The brush roller 142 and the transport roller 60 are attached so as to face the upper surface side of the photopolymer plate 12 transported between the transport roller pair 50 and 52. The brush roller 142 comes into contact with the upper surface of the photopolymer plate 12 while rotating in a predetermined direction and a predetermined rotation direction, thereby brushing the photosensitive layer on the upper surface side of the photopolymer plate 12, and the unnecessary photosensitive layer by the developing solution. Is designed to facilitate the removal of.

The photopolymer plate 12 drawn from the insertion opening 32 by the pair of conveying rollers 42 is conveyed by the conveying roller 4
8 below, and after being brushed by the brush roller 141, is fed into between the conveying roller pair 50,
Further, the conveying roller 50 guides the conveying roller pair 52 obliquely upward along the bottom surface of the developing tank 24. At this time, the upper surface side of the photopolymer plate 12 is brushed by the brush roller 142.

Further, the conveying roller pair 52 is formed, for example, by a roller whose outer peripheral portion is made of rubber. While sandwiching the photopolymer plate 12 and pulling it out from the developing tank 24,
It is sent to the washing section 16.

In the developing tank 24, a spray pipe 56 is provided in the vicinity of the bottom surface between the conveying roller pair 50 and the conveying roller pair 52. The developer in the developing tank 24 sucked by a pump (not shown) is supplied to the spray pipe 56, and the developer is jetted from the spray pipe 56. As a result, the developing solution in the developing tank 24 is agitated so that the photopolymer plate 12 can be uniformly processed.

The photopolymer plate 12 drawn out from the developing tank 24 by the pair of conveying rollers 52 is sent to the water washing section 16 while the developing solution adhering to the surface thereof is squeezed out by the pair of conveying rollers 52.

In the washing section 16, a conveying path for conveying the photopolymer plate 12 in a substantially horizontal state is formed by a pair of conveying rollers 62, 64 arranged above the washing tank 26. , Conveying roller pair 62, 64
It is sandwiched between the sheets and conveyed horizontally above the washing tank 26.

The water washing section 16 includes a pair of conveying rollers 62, 64.
In between, spray pipes 66 and 68 are provided in a pair in the upper and lower sides with the conveying path of the photopolymer plate 12 interposed therebetween. The spray pipes 66 and 68 are arranged such that the axial direction is along the width direction of the photopolymer plate 12 (direction orthogonal to the conveying direction), and a plurality of discharge holes (not shown) facing the conveying path of the photopolymer plate 12 are provided. It is formed along the axial direction.

In the washing tank 26, for example, water (hereinafter referred to as "washing water") is stored as a cleaning agent, and in the automatic developing device 10, it is synchronized with the conveyance of the photopolymer plate 12 by a water supply pump (not shown). Spray pipe 6
The washing water in the washing tank 26 is supplied to 6, 68. As a result, washing water is ejected from the spray pipes 66 and 68 toward the photopolymer plate 12, and the photopolymer plate 1
Rinse away the developer adhering to the surface of 2.

The washing water supplied to the photopolymer plate 12 is sent out while the photopolymer plate 12 is sandwiched by the conveying roller pair 64, and the photopolymer plate 12 and the developer adhered to the front and back surfaces of the photopolymer plate 12 are discharged. Edition 1
It is squeezed from the front and back surfaces of No. 2 and collected in the washing tank 26. In addition, the direction in which the washing water is ejected from the spray pipes 66, 68 is such that the spray pipe 66 is the photopolymer plate 12
Although the spray pipe 68 is on the upstream side in the transportation direction of the above, the spray pipe 68 is on the downstream side in the transportation direction of the photopolymer plate 12, but it is not limited to this and may be in another direction. Further, a new solution of rinsing water is supplied to the rinsing tank 26 by means not shown according to the treatment amount of the photopolymer plate 12.

The desensitizing section 18 is provided with a conveying roller pair 70 above the desensitizing tank 28, and the photopolymer plate 12 is conveyed by the conveying roller pair 64 toward the conveying roller pair 70. As a result, the desensitization processing unit 1
After being conveyed through the inside of the sheet 8, the sheet is nipped by the pair of conveying rollers 70 and sent to the drying section 20.

In the desensitizing section 18, a spray pipe 72 is provided above the transport path for the photopolymer plate 12, and a spray pipe 74 is provided below the transport path. The spray pipes 72, 74 are arranged vertically with the longitudinal direction (axial direction) extending along the width direction of the photopolymer plate 12 with the transport path of the photopolymer plate 12 interposed therebetween.
Further, the spray pipes 72, 74 are formed with a plurality of discharge holes along the width direction of the photopolymer plate 12.

The desensitizing tank 28 stores a gum solution used for protecting the plate surface of the photopolymer plate 12, and the gum solution is supplied to the spray pipes 72, 74 in synchronization with the conveyance of the photopolymer plate 12. To be done. Spray pipe 7
In No. 2, the gum solution is dropped onto the photopolymer plate 12 and spread on the surface of the photopolymer plate 12 to be applied. Further, the spray pipe 74 discharges the gum solution from the discharge hole toward the back surface of the photopolymer plate 12, and applies the gum solution to the back surface of the photopolymer plate 12.

On the photopolymer plate 12, protective films are formed by the gum solution applied to the front and back surfaces. The direction in which the gum solution is ejected from the spray pipe 72 is not limited to the downstream side in the conveying direction of the photopolymer plate 12, and may be in another direction. Further, a rectifying plate is provided and jetted toward the rectifying plate. While spreading the gum solution uniformly along the width direction of the photopolymer plate 12 by the straightening plate,
You may make it apply | coat by dropping on the surface of. Further, instead of the spray pipe 74, a discharging unit or the like may be used in which the photopolymer plate 12 moves while being in contact with the discharged gum liquid to apply the gum liquid to the back surface of the photopolymer plate 12.

In the desensitizing section 18, a cleaning spray 76 is provided above the conveying roller pair 70, and a cleaning roller 78 that rotates while contacting the roller above the conveying roller pair 70 is provided. The cleaning water is dropped from the cleaning spray 76 to a contact position between the cleaning roller 78 above the conveying roller pair 70 and the cleaning roller 78 at a predetermined timing set in advance through the straightening plate 80. The gum liquid is evenly diffused on the peripheral surfaces of the rollers above the conveying roller pair 70 to wash away the gum liquid from the peripheral surfaces of the upper and lower rollers of the conveying roller pair 70, and the gum liquid adheres to the peripheral surfaces of the rollers and the photopolymer plate 12 I try to prevent it from being damaged.

The photopolymer plate 12 coated with the gum solution in the desensitizing section 18 is sandwiched by the pair of conveying rollers 70, and a little gum solution remains on the front and back surfaces (state where gum solution remains as a thin film). ) Is sent to the drying unit 20.

The development processing section 10 includes a desensitization processing section 18
A partition plate 82 is provided between the drying unit 20 and the drying unit 20.
The partition plate 82 is arranged above the transporting path of the photopolymer plate 12 so as to face the upper end of the processing tank 22, whereby the desensitizing section 18 and the drying section 2 are arranged.
A slit-shaped insertion opening 84 is formed between 0. In addition, the partition plate 82 has a double structure, whereby a groove-shaped ventilation passage is formed on the drying portion 20 side of the insertion opening 84, and the air in the drying portion 20 enters into this ventilation passage. This prevents the air in the drying unit 20 from entering the desensitization processing unit 18 through the insertion opening 84.

In the drying section 20, in the vicinity of the insertion opening 84,
A support roller 86 that supports the photopolymer plate 12 is disposed, and a transport roller pair 90 and a transport roller pair 92 are disposed in the central portion of the photopolymer plate 12 in the transport direction and in the vicinity of the discharge port 88. ing. Photopolymer version 1
2 is transported in the drying unit 20 by the support roller 86 and the transport roller pair 90 and 92.

Ducts 94 and 96 are arranged between the support roller 86 and the pair of conveying rollers 90 and between the pair of conveying rollers 90 and the pair of conveying rollers 92 with the conveying path of the photopolymer plate 12 interposed therebetween. Has been done. The ducts 94 and 96 are arranged with the longitudinal direction extending along the width direction of the photopolymer plate 12, and slit holes 98 are provided in the surface of the photopolymer plate 12 facing the transport path.

When the dry air generated by the dry air generating means (not shown) is supplied to the ducts 94 and 96 from one end side in the longitudinal direction, the dry air is supplied from the slit holes 98 to the conveying path of the photopolymer plate 12. It is discharged toward and sprayed on the photopolymer plate 12. As a result, the gum solution applied to the front and back surfaces of the photopolymer plate 12 is dried to form a protective film.

In the developing processing section 10, by disposing the liquid surface lid 100 in the developing tank 24, deterioration due to contact of the developing solution in the developing tank 24 with carbon dioxide gas in the air or evaporation of moisture. I try to prevent it. A blade-shaped shielding member (not shown) formed of silicon rubber or the like is provided between the shielding lid 100 and the processing tank 22 and the conveying roller 48, the conveying roller pair 52, and the like, so that the developing solution in the developing tank 24 is fresh. It is more preferable because it may prevent contact with external air and evaporation of water in the developer.

Here, the detailed structure of the brush rollers 141 and 142 will be described with reference to FIG. Since the brush roller 142 used in the developing unit 130 is basic, the brush roller 142 for the developing unit 132 will be described as an example.

As shown in FIG. 4, the brush roller 142
Is a roller 164 as a core material, and a thin strip-shaped brushing strip 1 wound around the peripheral surface of the roller 164.
66 (hereinafter, simply referred to as a band 166).

As shown in FIG. 5A, the strip 166 is constructed by holding the fabric 168, which is a sheet-like base material, facing each other, and folding the bristle material 170 so as to hang it over them. . In this embodiment, the bristle material 170 is a pile of natural fibers or artificial fiber materials. The bristle material 170 may be made of metal as long as it has an appropriate thinness. The woven fabric 168 is not limited to natural fibers and artificial fibers, and may be a thin metal.

Here, the materials of the bristle material 170 are classified and listed. −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− Natural fiber Vegetable fiber, Animal fiber Artificial fiber Nylon 6, Polyamide type such as nylon 66, nylon 6/10 and nylon 11 Polyester type such as polyethylene terephthalate and polybutylene terephthalate Polyacrylonitrile such as polyacrylonitrile and polyalkyl acrylate Polypropylene polypropylene Polystyrene etc. Metal fiber Stainless steel Brass etc. -------------------------------- Here, after the hair material 170 is folded into the fabric 168 under tension, the hair material is The band 166 applied in this embodiment by cutting at the middle portion of 170 (see FIG. 5B)
Is completed. After the band 166 is spirally wound around the roller 164 (see FIG. 5C), it is further shirred so that the length is evenly adjusted (see FIG. 5C).
(See (D)), the brush roller is completed.

The specifications of the strip 166 at this time are as shown in Table 1.

[0155]

[Table 1]

The spiral density when the strip 166 is spirally wound around the roller 164 as described above is such that the adjacent strips 166 are wound tightly (close winding as shown in FIG. 4). ).

As a result, the peripheral surface of the roller 164 is in a state in which the bristle material 170 is uniformly flocked at a predetermined density over the entire surface.

As for winding the strip 166 around the roller 164, when three strips 166 shown in FIG. 6 are tightly wound side by side (three windings),
Further, a case may be considered in which one strip 166 as shown in FIG. 7 is wound at a predetermined pitch (pitch winding). Thereafter, the brush rollers 141 and 142 are completed by further cutting the bristle material 170 so that the lengths thereof are evenly adjusted as described above (see the dimension L in FIG. 8).

The effect of the present invention can be obtained by developing the above-mentioned photosensitive lithographic printing plate using the above-mentioned developing solution to form an image.

Here, in FIG. 9, when the material of the bristle material is natural fiber or artificial fiber, the conditions under which the unevenness of the brushing of the photosensitive lithographic printing plate can be improved are shown in the form of a graph. That is, the following can be read from the graph of FIG.

When brushing the photosensitive lithographic printing plate, the length (L) of the bristle material is 1 ≦ L ≦ 7.5 × (logD +
(2/3)) is preferable.

When brushing a photopolymer plate, which is a type of photosensitive lithographic printing plate, the length (L) of the bristle material is
1.5 × (logD + (1/3)) ≦ L ≦ 7.5 ×
(LogD + (2/15)), the thickness (D) of the bristle material is 2 ≦
It is preferable that D ≦ 200.

The operation of this embodiment will be described below.

In the pretreatment device 200, when the image-exposed photopolymer plate 12 is inserted into the preheating section 16,
The conveying process of the photopolymer plate 12 is started. At the same time, in the pretreatment device 200, the cleaning water in the cleaning tank 222 is supplied to the spray pipes 234 and 236 provided in the prewater cleaning unit 206.

Next, the photopolymer plate 12 inserted from the insertion port is drawn into the machine frame and the heating chamber 20
8 is sent. In the preheating unit 204, the heating chamber 20
The photopolymer plate 12 sent into the heater 8 is heated by the heater 32.
Transport while heating. As a result, the photopolymer plate 12 is heated at the preset heating temperature and heating time, the degree of polymerization of the photopolymerization layer in the image area is increased, and the printing durability is increased and the photopolymer plate 12 is sent out.

The photopolymer plate 12 having passed through the preheating section 204 is sent to the prewashing section 206. Front water washing section 2
In 06, the conveyance rollers 224 to 2 arranged in a zigzag pattern.
While supplying a conveying force to the photopolymer plate 12 by 28, the photopolymer plate 12 is sent out obliquely downward. As a result, the photopolymer plate 12 is fed between the brush roller 230 and the backup roller 232.

Further, in the pre-water washing section 206, the washing water is jetted from the spray pipe 236 to supply the washing water to the brush roller 230 and the washing water is jetted from the spray pipe 234.

As a result, when the photopolymer plate 12 is conveyed from between the conveying rollers 226 and 228 to between the brush roller 230 and the backup roller 232, it is sent between the brush roller 230 and the backup roller 232 and brushed. Brushed by the roller 232.

When the cleaning water is supplied to the surface of the photopolymer plate 12, the uppermost overcoat layer swells and is easily peeled off. In addition, the overcoat layer is more likely to be peeled off due to the longer immersion time in the wash water.

In this way, the photopolymer plate 12 from which the overcoat layer has been brushed and removed is sandwiched by the pair of transport rollers 42 of the development processing section 10 and sent from the preprocessing section 200 to the development processing section 10. Be done.

In the development processing section 10, when the photopolymer plate 12 on which an image is recorded by being exposed by an image exposure device such as a printing device (not shown) is inserted from the insertion port 32, the conveying roller pair 42 is rotated. Drive it. As a result, the photopolymer plate 12 is nipped by the pair of conveying rollers 42 and drawn into the automatic developing device 10.

In the automatic developing device 10 including the automatic developing device 10, a sensor for detecting the photopolymer plate 12 including the photopolymer plate 12 passing through the insertion port 32 is provided near the insertion port 32, When this sensor detects insertion of the photopolymer plate 12, rotation of the conveying roller pair 42 and the like is started, and at the same time based on the detection of the photopolymer plate 12 by this sensor, the spray pipe 66 of the washing section 16 is started. , 68 for spraying washing water and spray pipe 7 of desensitizing section 18
The gum solution is discharged from Nos. 2 and 74.

The conveying roller pair 42 is arranged such that the photopolymer plate 12 drawn from the insertion port 32 is moved in the horizontal direction by 15
It is fed into the developing tank 24 at an insertion angle in the range of ° to 31 °. As a result, the photopolymer plate 12 becomes the guide plate 1.
While being guided by 16, it is transported in the developing tank 24 by the transport roller 48 and the transport roller pair 50, 52,
It is immersed in the developing solution stored in the developing tank 24,
It is sent out from the developing solution at a discharge angle in the range of ° to 31 °.

The photopolymer plate 12 is immersed in the developing solution in the developing tank 24, whereby the unnecessary photosensitive layer is removed from the support according to the exposed image. At this time, in the automatic developing device 10, the surface of the photopolymer plate 12 (the surface on the side of the photosensitive layer) is brushed by the brush rollers 141 and 142 arranged in the developing tank 24, so that the surface of the photopolymer plate 12 is brushed. The removal of the unwanted photosensitive layer from the is promoted.

The photopolymer plate 12 that has been developed and sent out from the developing tank 24 is sent to the washing section 16 by the pair of carrying rollers 52. At this time, the pair of transport rollers 52 squeeze out the developer adhering to the front and back surfaces of the photopolymer plate 12.

In the washing section 16, the photopolymer plate 1
The washing water is jetted from the spray pipes 66 and 68 while the sheet 2 is nipped by the pair of conveying rollers 62 and 64 and conveyed in a substantially horizontal state. Further, the conveying roller pair 64 arranged on the downstream side in the conveying direction of the photopolymer plate 12 has a function that the washing water supplied to the front and back surfaces of the photopolymer plate 12 is left undeveloped by the conveying roller pair 52. The photopolymer plate 12 is sent out to the desensitizing section 18 while being squeezed down.

As a result, when the photopolymer plate 12 passes through the water washing section 16, the developer remaining on the front and back surfaces is washed off.

The photopolymer plate 12 including the photopolymer plate 12 sent to the desensitizing section 18 passes between the spray pipes 72 and 74, and is sandwiched by the pair of transfer rollers 70. It is sent from the desensitization processing unit 18 by the pair 70.

At this time, in the desensitizing section 18, the gum solution is discharged from the spray pipes 66 and 68 to uniformly apply the gum solution to the front and back surfaces of the photopolymer plate 12 while diffusing the gum solution. The conveyance roller pair 70 is made of the photopolymer plate 12
Is sandwiched and conveyed, and excess gum solution is squeezed from the front and back surfaces of the photopolymer plate 12 to form a uniform thin film of gum solution on the front and back surfaces of the photopolymer plate 12.

Photopolymer plate 12 coated with gum solution
Is fed from the insertion opening 84 to the drying unit 20 by the pair of conveying rollers 70. When a shutter is provided in the insertion opening 84, the shutter is operated at the timing of the processing start of the photopolymer plate 12 or the timing when the photopolymer plate 12 is sent out from the desensitization processing unit 18, to open the insertion opening 84. Open, photopolymer plate 12
When not passing, the dry air of the drying unit 20 unnecessarily enters the desensitization processing unit 18 to prevent the gum solution from sticking to the conveying roller pair 70, and air enters from the insertion opening 84, It is possible to prevent the developing solution from deteriorating due to carbon dioxide gas in the air reaching the developing section 14, or to evaporate the water content in the developing solution, the washing water, and the water content in the gum solution.
It prevents you from getting out of.

In the drying section 20, while the photopolymer plate 12 is being conveyed by the support roller 86 and the pair of conveying rollers 90 and 92, dry air is blown from the ducts 94 and 96 to the front and back surfaces of the photopolymer plate 12. As a result, the photopolymer plate 12 has a protective film formed by the gum solution applied on the surface and is discharged from the discharge port 88.

Here, in the present embodiment, the front water washing section 12
0 and the brush roller 126 applied to the developing unit 130,
The structure of 142 is different from that of the conventional channel brush roller or Molton roller.

That is, the belt 166 is wound around the peripheral surface of the roller 164 as the core material. This strip 16
6 is a sheet-shaped woven fabric 168 and a bristle material (pile bristle) 170
Is woven.

By weaving the bristle material 170 into the woven fabric 168, it is possible to weave the bristle material 170 at a uniform pitch of μm, and to remove an unnecessary photopolymerization layer due to the uneven density of the bristle material that occurs in a channel brush. The occurrence of defects is eliminated.

Since the bristle material 170 can be arranged at a higher density, the rigidity of the bristle material 170 can be increased, and other photosensitivity can be used to remove the photopolymerization layer which is an unnecessary photosensitive layer such as a photopolymer plate. Even when it is necessary to rub more strongly (higher pressure) than the planographic printing plate, the tips of the bristle material 170 do not fall asleep, and the brushing function can be reliably exhibited.

The winding method of the strip 166 around the roller 164 is closely winding (see FIG. 3) and triple winding (see FIG. 5).
And pitch winding (see FIG. 6).

As described above, in the present embodiment, the front water washing unit 1
20 and a brush roller 14 applied to the development processing unit 10.
1, 142 (and the brush roller 2 of the pretreatment unit 200)
(Applicable to No. 30) as a core material, a long strip 166 in which a bristle material 170 is woven into a sheet-shaped woven fabric 168 is wound around the peripheral surface of the roller 164, so that the bristle material 170 is tightly packed over the roller peripheral surface. In addition, it is possible to dispose evenly, and it is possible to deal with the photopolymer plate 102 using the photopolymerization layer 106 as a photosensitive layer that needs to be strongly rubbed, and it is impossible to remove the unnecessary photopolymerization layer 106, which causes uneven brushing. There is nothing to do.

Further, the photopolymer plate 12 was developed using a non-silicic acid type developer containing an inorganic alkaline agent and a nonionic compound, and during this development, the brush roller (base material) applied to this embodiment was used. The photopolymerization layer is brushed by a roller 142 around which a brushing strip, in which a bristle material is woven, is wound to accelerate the development process. That is, by using the combination of the photopolymer plate 12, the non-silicic acid-based developer and the brush rollers 141 and 142, flare that occurs when the non-silicic acid-based developer is used can be suppressed and the conventional developer is used. It is possible to suppress both the highlights that occurred during development and the flare that occurred during development with the non-silicic acid-based developer according to the present embodiment, which are factors that reduce image quality.

The present invention can be applied not only to the pre-water washing section 200 and the developing section 14 but also to other processing sections such as the rinse section 138.

Furthermore, the present invention is not limited to the method in which the photosensitive lithographic printing plate is dipped in the developing solution in the reservoir of the developing section for processing, and the developing solution is applied to the photosensitive lithographic printing plate which is conveyed horizontally in the developing section. It can also be applied to a system in which the ink is discharged by a discharging means and then brushed with a brush roller.

[Specific Example 1 of Photopolymer Plate 12] An aluminum plate having a thickness of 0.30 mm and made of a material 1S was used with a No. 8 nylon brush and an 800-mesh aqueous suspension of Bumistone to roughen the rough surface. , Wash well with water. Next, after immersing in 10% sodium hydroxide at 70 ° C. for 60 seconds for etching, washing with running water and then 20% HNO ₃
Neutralize and wash with water.

This is subjected to electrolytic surface-roughening treatment in a 1% aqueous nitric acid solution using a sinusoidal alternating waveform current under the condition of V _A = 12.7 V, with an anode-time electrical quantity of 300 coulomb / dm ² . The surface roughness at that time is 0.45 μm (Ra indication)
Is.

Subsequently, it was immersed in a 30% H ₂ SO ₄ aqueous solution, desmutted at 55 ° C. for 2 minutes, and then 33 ° C.
C, 20% H ₂ SO ₄ aqueous solution, a cathode was placed on the grained surface and anodized at a current density of 5 A / dm ² for 50 seconds so that the thickness became 2.7 g / m ^2. To do.

On the aluminum plate thus treated, the high-sensitivity photopolymerizable composition 1 having the following composition was coated so that the dry coating amount was 1.5 g / m ^2, and the coating was carried out at 100 ° C. for 1 hour.
Dry for minutes to form a photosensitive layer. (Photopolymerization composition 1) Ethylenically unsaturated bond-containing compound (A1) 1.5 parts by weight Linear organic polymer (B1) 2.0 parts by weight Sensitizer (C1) 0.15 parts by weight Light Initiator (D1) 0.2 part by weight ε-phthalocyanine (F1) dispersion 0.02 part by weight Fluorine-based nonionic surfactant Megafac F177 0.03 part by weight (manufactured by Dainippon Ink and Chemicals, Inc.) Methyl ethyl ketone 9.0 parts by weight Propylene glycol monomethyl ether acetate 7.5 parts by weight Toluene 11.0 parts by weight

[0195]

[Chemical 11]

A 3% by weight aqueous solution of polyvinyl alcohol (saponification degree: 98 mol%, polymerization degree: 500) was applied onto the photosensitive layer so that the dry coating amount was 2.5 g / m ² .
Dry for 3 minutes at 120 ° C. to obtain a photopolymer plate.

This photopolymer plate is used as a PS plate 12C, and image exposure is performed using, for example, an FD / YAG laser (plate jet 4 manufactured by CSI). At this time, prior to the development processing, preheating is performed so that the temperature reached to the plate surface becomes 100 ° C.

In the automatic developing device 10C, the PS plate 12C
Is carried at a carrying speed (1120 mm / min) such that the developing time (immersion time in the developing solution) is 15 seconds, and the developing treatment is carried out. At this time, a developing solution having the following composition is used, and the developing treatment is performed with the solution temperature of the developing solution at 30 ° C. (Composition of developer) Potassium hydroxide 0.15 g Polyoxyethylene finyl ether (n = 13) 5.0 g CHIREST 400 (chelating agent) 0.1 g Water 94.75 g (pH is 11.5 at 25 ° C, conductivity) The rate is 5 ms / cm) The water washing treatment is performed using water, and the desensitizing treatment is PS Finishing Gum FP-2W (1: Fuji Photo Film Co., Ltd.).
1) is used.

With this, the size is 1030 mm × 800.
The mm photopolymer plate (PS plate 12C) was satisfactorily finished without uneven processing.

[Specific Example 2 of Photopolymer Plate 12] In Specific Example 6, the following photopolymer plate was used as PS plate 12C.
Used as.

An aluminum plate having a thickness of 0.30 mm and made of material 1S was washed with a No. 8 nylon brush and an 800 mesh Bumistone water suspension to roughen the rough surface and then thoroughly rinsed with water. Next, add 10% sodium hydroxide to 70 ° C.
After dipping for 60 seconds in order to etch, rinse with running water,
Neutralize and wash with 20% HNO ₃ .

This is subjected to electrolytic surface roughening treatment under a condition of V _A = 12.7 V in an aqueous 1% nitric acid solution using a sinusoidal alternating waveform current with an anode hour electricity of 160 coulomb / dm ² . The surface roughness at that time is 0.6 μm (Ra indication).

Subsequently, it was immersed in a 30% H ₂ SO ₄ aqueous solution and desmutted at 55 ° C. for 2 minutes.
During ₂ SO ₄ aqueous solution at a current density of 2A / dm ^2, so that the thickness of the anodic oxide coating becomes 2.72.7g / m ^{2 2}
Anodizing treatment is performed for a minute.

On the aluminum plate thus treated, a photosensitive layer having the following composition was applied at a dry coating amount of 1.5 g / m ^2.
And is dried at 100 ° C. for 1 minute to form a photosensitive layer. (Composition of photosensitive layer) Pentaerythritol tetraacrylate 1.5 g Binder (polyurethane resin (90)) 2.0 g Dye-1 0.1 g S-1 0.2 g Fluorine-based nonionic surfactant 0.03 g Copper phthalocyanine pigment (organic) Polymer dispersion) 0.1 g Methyl ethyl ketone 20.0 g Propylene glycol monomethyl ether acetate 20.0 g

[0205]

[Chemical 12]

A 3% by weight aqueous solution of polyvinyl alcohol (saponification degree: 86.5-89 mol%, polymerization degree: 1000) was applied onto the photosensitive layer so that the dry coating amount was 2 g / m ² . Dry at 100 ° C for 2 minutes.

[0207] PS plate 12C thus obtained,
Image exposure is performed by an exposure device using a 75 mW air-cooled Ar laser as a light source, followed by heating at 100 ° C. for 1 minute and development processing using a developing solution having the following composition. In addition,
In the automatic developing device 10C, the temperature of the developing solution is set to 25 ° C., and the processing is performed at the carrying speed at which the developing time is 20 seconds. Potassium (composition developer) 1K potassium silicate 30g hydroxide _{15g C 12 H 25 -C 6 H} 4 -O-C 6 H 4 -SO 3 Na 3g water 1000g Also, after the development processing, water washing treatment with water Then, the plate surface is protected with a protective gum GU-7 (1: 2) manufactured by Fuji Photo Film Co., Ltd.

As a result, the size is 1030 mm × 800.
The mm photopolymer plate (PS plate 12C) was satisfactorily finished without uneven processing.

[Specific Example 3 of Photopolymer Evening 12] Next, application of the photopolymer plate subjected to image exposure by a blue laser to the development processing will be exemplified. That is, as the photopolymer plate 12, a development process is performed on the photopolymer plate which can be exposed to laser light having a wavelength of 350 nm to 700 nm, particularly 350 nm to 450 nm.

Such a PS plate 12C can be formed by using various supports. (Support 1) An aluminum plate of material 1S having a thickness of 0.30 mm is brushed with water after thoroughly graining the surface of No. 8 nylon brush and 800 mesh Bumistone water suspension. After immersing in 10% sodium hydroxide at 70 ° C for 60 seconds for etching, rinse with running water and then add 20% H
Neutralize and wash with NO ₃ , and wash with water. This is VA = 12.7V
Electrolytic surface roughening treatment was performed in a 1% nitric acid aqueous solution under the conditions of 1) in a 1% nitric acid aqueous solution with an anode time electricity of 300 Coulomb / dm2 to obtain a surface roughness of 0.45 μm (Ra indication).
And

Subsequently, it was immersed in a 30% H ₂ SO ₄ aqueous solution, desmutted at 55 ° C. for 2 minutes, and then 33 ° C.
In a 20% H ₂ SO ₄ aqueous solution of C, a cathode is placed on the grained surface and anodized at a current density of 5 A / dm 2 for 50 seconds. As a result, the support 1 having a thickness of 2.7 g / m ² is obtained. (Support 2) The support 2 is prepared by adding the following surface treatment undercoat liquid composition 1 to the above support 1 in a P amount of 0.005 g / m 2.
^It is applied so that it becomes ^2, and dried at 100 ° C. for 1 minute to obtain. (Liquid composition for undercoat 1) Finylphosphonic acid 2 parts by weight Methanol 800 parts by weight Water 50 parts by weight (Support 3) The support 3 is the undercoating liquid composition 2 for surface treatment described below on the support 1. To be 0.001 g / m ² and dried at 100 ° C. for 1 minute. (Liquid composition for undercoating 2) Liquid composition 2 for undercoating generates heat after about 5 minutes by mixing and stirring the following components, and after reacting for 60 minutes, the contents are transferred to another container,
Further, 30,000 parts by weight of methanol is added.

Unichemical Co., Ltd. Phosmer PE 20 parts by weight Methanol 130 parts by weight Water 20 parts by weight Paratoluenesulfonic acid 5 parts by weight Tetraethoxysilane 50 parts by weight 3-methacryloxypropyltriethoxysilane 50 parts by weight The photopolymerizable composition having the following composition is applied to the support 1 to the support 3 so as to have a dry coating weight of 1.5 g / m ² and dried at 100 ° C. for 1 minute to be formed.

Subsequently, a 3 wt% aqueous solution of polyvinyl alcohol (saponification degree: 98 mol%, polymerization degree: 500) was applied on the photosensitive layer so that the dry coating weight was 2.5 g / m ^2, and the temperature was 120 °. Dry at C for 3 minutes to obtain PS plate 12C. (Photopolymerizable composition (photosensitive layer coating solution)) Ethylenically unsaturated bond-containing compound (A) 1.7 parts by weight Linear organic polymer (B) 1.9 parts by weight Sensitizer (C) 0 .15 parts by weight Photoinitiator (D) 0.30 parts by weight Additive (S) 0.50 parts by weight Fluorosurfactant 0.03 parts by weight (Megafuck F-177, Dainippon Ink and Chemicals, Inc.) Thermal polymerization inhibitor 0.01 part by weight (N-nitrosohydroxylamine aluminum salt) ε-type copper phthalocyanine dispersion 0.2 part by weight Methyl ethyl ketone 30.0 parts by weight Propylene glycol monomethyl ether 30.0 parts by weight

[0214]

[Chemical 13]

After such a PS plate 12C is exposed with a laser beam having a predetermined wavelength (for example, 405 nm), it is preheated so that the plate surface reaching temperature is 100 ° C., and then developed by an automatic developing device 10C. Perform processing.

In the automatic developing device 10C, a developer having the following composition is prepared and used. (Developer) Potassium hydroxide 0.15 g Polyoxyethylene finyl ether (n = 13) 5.0 g CHIREST 400 (chelating agent) 0.1 g Water 94.75 g (pH is 11.5 at 25 ° C, conductivity is 5 ms / cm)

[0217]

As described above, the present invention has an excellent effect that the flare phenomenon can be prevented when a specific developing solution and a specific printing plate are combined. In particular, by combining a photopolymerization type photopolymer plate, a non-silicic acid type developing solution and a woven type brush roller, it is possible to suppress the occurrence of highlight jumps and flare phenomena and to improve image quality. Produce an effect.

[Brief description of drawings]

FIG. 1 is a schematic configuration diagram of a preprocessing unit according to the present embodiment.

FIG. 2 is a schematic configuration diagram of an automatic developing machine according to the present embodiment.

FIG. 3 is a cross-sectional view of a photosensitive lithographic printing plate applied to this embodiment.

FIG. 4 is a perspective view of a brush roller closely wound.

5 (A) to 5 (D) are flow charts showing a manufacturing process of a strip applied in the present embodiment.

FIG. 6 is a perspective view of a brush roller having three windings.

FIG. 7 is a perspective view of a pitch-rolled brush roller.

FIG. 8 is a sectional view of a brush member for defining the length L of the bristle material.

FIG. 9 is a diagram showing the suitability of various printing plates in relation to the thickness and length of the bristle material.

[Explanation of symbols]

12 Photopolymer plate 100 Development Processing Department 104 aluminum 106 recording layer 108 Overcoat layer 110 Pre-heating section 120 front washing section 126 brush roller 130 Development Department 132 storage tank 138 Rinse 142 brush roller 144, 146 Receiving roller 156 Finisher section 164 Roller (core material) 166 band (band for brushing) 168 Woven fabric (base material) 170 hair 200 Pretreatment section

   ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Toshihiro Sutani             1250 Takematsu, Minamiashigara City, Kanagawa Prefecture Fuji Equipment             Industry Co., Ltd. F-term (reference) 2H025 AB03 AC08 AD01 BC14 BC32                       BC42 CA00 CA20 CA28 CA41                       CB14 CB15 CB22 FA03 FA17                 2H096 AA07 BA05 BA20 EA04 GA08                       GA09 GA13 LA16

Claims (7)

[Claims] 1. A non-silicic acid developing solution containing an inorganic alkaline agent and a nonionic compound after exposing a photosensitive lithographic printing plate having a photopolymerizable image recording layer on a support with a light beam. A method for developing a photosensitive lithographic printing plate, wherein the photosensitive lithographic printing plate is immersed in the non-silicic acid-based developer while the photosensitive lithographic printing plate is being conveyed, and during the dipping, a sheet-shaped substrate is coated with hair. A method for developing a photosensitive lithographic printing plate, comprising: brushing a brushing strip, in which a material is woven, with a brush member wound around a peripheral surface of an axially rotating roller to accelerate development processing. 2. The developing solution has a pH of 10.0 to pH12.
5. The method for developing a photosensitive lithographic printing plate as claimed in claim 1, wherein the conductivity is 5 to 30 ms / cm. 3. The method for developing a photosensitive lithographic printing plate according to claim 1, wherein the base material is a woven fabric. 4. The hair material is a natural fiber or an artificial fiber, and the thickness D of the hair material is D = 1 to 10,000 denier /
The length of the bristle material is 1 to 35 mm, and the density P of the bristle material formed as a brushing band is P.
= 1000-200000 denier / cm ² (however,
The method for developing a photosensitive lithographic printing plate according to any one of claims 1 to 3, wherein P = D x the number of hair materials per unit area (the number is / cm ² ). 5. The relation between the thickness (denier / piece) of the hair material and the length L (mm) of the hair material is 1 ≦ L ≦ 7.5 × (logD + (2/3)). The method for developing a photosensitive lithographic printing plate according to claim 4, characterized in that 6. The brush material is a metal fiber, the wire diameter R of the hair material is R = 10 to 200 μm / piece, the length of the hair material is 1 to 30 mm, and the brushing belt is a brushing belt. The density P of the hair material formed as a body is P = 0.05-
7.0 mm ² / cm ² (where P = cross-sectional area per hair material (mm ² / piece) x number of hair materials per unit area)
(Books / cm ² ). ) The method of developing a photosensitive lithographic printing plate according to any one of claims 1 to 3. 7. The relationship between the wire diameter R (μm / piece) of the hair material and the length L (mm) of the hair material is 1 ≦ L ≦ 0.1R + 10. Method for developing the photosensitive lithographic printing plate of.