JP2003094007A - Equipment and method for treatment for critical-water oxidation - Google Patents
Equipment and method for treatment for critical-water oxidationInfo
- Publication number
- JP2003094007A JP2003094007A JP2001294710A JP2001294710A JP2003094007A JP 2003094007 A JP2003094007 A JP 2003094007A JP 2001294710 A JP2001294710 A JP 2001294710A JP 2001294710 A JP2001294710 A JP 2001294710A JP 2003094007 A JP2003094007 A JP 2003094007A
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- critical
- water
- solid waste
- liquid crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/54—Improvements relating to the production of bulk chemicals using solvents, e.g. supercritical solvents or ionic liquids
Landscapes
- Processing Of Solid Wastes (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】この発明は、超臨界状態およ
び亜臨界状態において、固形廃棄物を臨界水酸化反応さ
せて処理を行う臨界水酸化処理装置および臨界水酸化処
理方法に関し、更に詳しくは、複数の原料から構成され
る固形廃棄物から各原料を連続的に回収する臨界水酸化
処理装置および臨界水酸化処理方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a critical hydroxylation treatment apparatus and method for treating a solid waste by subjecting it to a critical hydroxylation reaction in a supercritical state and a subcritical state. The present invention relates to a critical hydroxylation treatment apparatus and a critical hydroxylation treatment method for continuously collecting each raw material from solid waste composed of a plurality of raw materials.
【０００２】[0002]
【従来の技術】近年、資源の大量消費や産業廃棄物によ
る環境汚染が深刻化しており、特に化学物質の汚染によ
る公害が問題になっている。液晶パネルを例に挙げる
と、最近の液晶ディスプレイや携帯電話の普及により国
内および国外ともにその需要が加速度的に拡大してお
り、これらが廃棄物となった場合には、その処理量が極
めて多くなるため、大量の液晶パネルを効率的に処理す
る技術の確立が望まれている。2. Description of the Related Art In recent years, environmental pollution due to large consumption of resources and industrial waste has become serious, and pollution caused by pollution of chemical substances has become a serious problem. Taking liquid crystal panels as an example, the recent widespread use of liquid crystal displays and mobile phones has led to an accelerating demand both in Japan and abroad, and when these are turned into waste, the amount of processing is extremely large. Therefore, it is desired to establish a technique for efficiently processing a large amount of liquid crystal panels.
【０００３】図７は、一般的なＴＦＴ（Thin Film Tran
sistor）液晶パネルの構造を示す説明図である。一般的
なＴＦＴ液晶パネルＬの構造は、ＴＦＴガラス基板５０
１上にマトリックス状に透明電極である画素ＩＴＯ膜
（Indium Tin Oxide）５０２が形成され、この画素Ｉ
ＴＯ膜５０２毎にアクティブ素子５０３が形成される。
ＩＴＯ膜５０２はＩｎとＳｎの酸化物により構成され
る。アクティブ素子５０３は、Ｍｏ、Ｔａ、Ｃｒ、Ａｌ
等の金属導電体膜で形成した走査信号線５０４およびデ
ータ信号線５０５に接続されており、ＴＦＴガラス基板
５０１の画素ＩＴＯ膜５０２の間に格子状に形成されて
いる。FIG. 7 shows a general TFT (Thin Film Tran).
FIG. 3 is an explanatory diagram showing a structure of a liquid crystal panel. The structure of a general TFT liquid crystal panel L is the TFT glass substrate 50.
A pixel ITO film (Indium Tin Oxide) 502, which is a transparent electrode, is formed in a matrix on the pixel 1.
An active element 503 is formed for each TO film 502.
The ITO film 502 is composed of an oxide of In and Sn. The active element 503 is Mo, Ta, Cr, Al
It is connected to the scanning signal lines 504 and the data signal lines 505 formed of a metal conductor film such as the above, and is formed in a grid pattern between the pixel ITO films 502 of the TFT glass substrate 501.
【０００４】また、ＴＦＴガラス基板５０１に対向して
カラーフィルタガラス基板５０６が配置され、この対向
面には、カラーフィルタ５０７およびＩＴＯ膜５０８が
形成されている。また、ＴＦＴガラス基板５０１および
カラーフィルタガラス基板５０６の周囲はＵＶ樹脂等の
シール剤が充填され（図示省略）、これらガラス基板５
０１、５０６間に液晶５０９を封入している。また、カ
ラーフィルタガラス基板５０６の上面には、偏光板５１
０が設けられている。また、所定の分子配向を得るため
にガラス基板５０１、５０６には、ポリイミド等の有機
高分子膜である配向膜が形成されている（図示省略）。A color filter glass substrate 506 is arranged so as to face the TFT glass substrate 501, and a color filter 507 and an ITO film 508 are formed on the facing surface. The periphery of the TFT glass substrate 501 and the color filter glass substrate 506 is filled with a sealant such as UV resin (not shown), and these glass substrates 5
A liquid crystal 509 is sealed between 01 and 506. In addition, the polarizing plate 51 is provided on the upper surface of the color filter glass substrate 506.
0 is provided. In addition, an alignment film, which is an organic polymer film such as polyimide, is formed on the glass substrates 501 and 506 to obtain a predetermined molecular alignment (not shown).
【０００５】このように、ＴＦＴ液晶パネルＬは様々な
有機或いは無機の材料から構成されており、これらの材
料を大量かつ効率的に回収するのは旧来の技術では困難
であり、廃棄処分する他ないのが現状である。また、液
晶パネルＬの透明電極にはＩＴＯ膜５０２、５０８が用
いられているが、このＩＴＯ膜５０２、５０８を構成す
るＩｎの地球上に存在する量が限られており、その大半
が液晶パネルＬに用いられているのが現状である。この
ため、液晶パネルＬからＩｎを回収して再利用する必要
性が生じている。As described above, the TFT liquid crystal panel L is composed of various organic or inorganic materials, and it is difficult to recover these materials in large amounts and efficiently by the conventional technique. The current situation is that there are none. Further, although ITO films 502 and 508 are used for the transparent electrodes of the liquid crystal panel L, the amount of In constituting the ITO films 502 and 508 existing on the earth is limited, and most of them are liquid crystal panels. It is currently used for L. Therefore, it is necessary to collect In from the liquid crystal panel L and reuse it.
【０００６】[0006]
【発明が解決しようとする課題】ところで、最近になっ
てダイオキシンやＰＣＢ（ポリ塩化ビフェニル）、下水
汚泥等を安全かつ完全に無害化処理する技術として、超
臨界水酸化処理（ＳＣＷＯ：Supercritical Water Oxid
ation）が注目されている。超臨界状態処理は、温度３
７４℃、圧力２２．１ＭＰａ以上の超臨界状態の水中
で、有機物の酸化分解を行う処理法であり、ダイオキシ
ン等の難分解性有機物を効果的に分解する能力を有する
ものとして知られている。また、超臨界水は、液体と気
体の中間の性質で、液体の水に近い密度を有し且つ水蒸
気に近い粘度および拡散係数を有するものである。By the way, recently, as a technique for safely and completely detoxifying dioxin, PCB (polychlorinated biphenyl), sewage sludge, etc., supercritical water oxidation (SCWO: Supercritical Water Oxid)
ation) is attracting attention. Supercritical state treatment is at temperature 3
It is a treatment method of oxidizing and decomposing organic matter in supercritical water at 74 ° C. and a pressure of 22.1 MPa or more, and is known to have the ability to effectively decompose hardly decomposable organic matter such as dioxins. Supercritical water is an intermediate property between liquid and gas and has a density close to that of liquid water and a viscosity and diffusion coefficient close to that of water vapor.
【０００７】ところで、このＳＣＷＯにより液晶パネル
等の固形廃棄物を処理して、原材料を取り出す場合、超
臨界状態を発生させるチャンバー内に固形廃棄物を置
き、回収したい材料についての条件のもとで分解処理を
行うことになる。具体的には、液晶パネルの液晶や金属
導電体膜のＣｒを分解処理する場合は、チャンバー内に
過酸化水素水を入れて超臨界水状態にし、液晶やＣｒを
選択的に分解する。次に、別の部材、例えばＩＴＯ膜や
金属導電体膜のＴａを分解する場合は、チャンバー内に
硫酸或いは硝酸を導入し、ＩＴＯ膜を選択的に分解す
る。By the way, when the solid waste such as a liquid crystal panel is treated by this SCWO and the raw materials are taken out, the solid waste is placed in a chamber for generating a supercritical state, and under the condition of the material to be collected. It will be disassembled. Specifically, when the liquid crystal of the liquid crystal panel or Cr of the metal conductor film is decomposed, hydrogen peroxide water is put into the chamber to bring it into a supercritical water state, and the liquid crystal or Cr is selectively decomposed. Next, in the case of decomposing another member such as Ta of the ITO film or the metal conductor film, sulfuric acid or nitric acid is introduced into the chamber to selectively decompose the ITO film.
【０００８】しかしながら、超臨界状態のチャンバー内
に固形廃棄物を設置し、所定条件のもとで分解処理を行
う方法の場合、バッチ処理となってしまうため、大量の
固形廃棄物から複数種類の原料を連続的に回収すること
が困難な問題点があった。特に、液晶パネルのように、
大量に廃棄され且つ構造が複雑なものの場合、原料毎に
ＳＣＷＯを行うことは極めて非効率的でコストがかかっ
てしまう。However, in the case of a method in which solid waste is installed in a chamber in a supercritical state and decomposition treatment is performed under predetermined conditions, batch processing is performed, and therefore a large number of solid wastes of a plurality of types are selected. There is a problem that it is difficult to continuously collect the raw materials. Especially, like a liquid crystal panel,
When a large amount is discarded and the structure is complicated, performing SCWO for each raw material is extremely inefficient and costly.
【０００９】そこで、この発明は、上記に鑑みてなされ
たものであって、固形廃棄物から複数種類の原料を連続
的に回収する臨界水酸化処理装置および臨界水酸化処理
方法を提供することを目的とする。Therefore, the present invention has been made in view of the above, and it is an object of the present invention to provide a critical hydroxylation treatment apparatus and a critical hydroxylation treatment method for continuously recovering a plurality of types of raw materials from solid waste. To aim.
【００１０】[0010]
【課題を解決するための手段】上述の目的を達成するた
めに、この発明の臨界水酸化処理装置は、複数の原料か
ら構成される液晶パネル等の固形廃棄物を収納すると共
に、内部の温度および圧力を高めて臨界状態を得る処理
容器と、固形廃棄物の原料毎に用意された複数の反応促
進薬品を、臨界水酸化反応により処理する原料毎に選択
して臨界水に供給する反応促進薬品供給手段とを備えた
ことを特徴とする。In order to achieve the above-mentioned object, a critical water oxidation treatment apparatus of the present invention accommodates solid waste such as a liquid crystal panel composed of a plurality of raw materials, and has an internal temperature And a process vessel that raises the pressure to obtain a critical state, and multiple reaction accelerating chemicals prepared for each raw material of solid waste are selected for each raw material to be processed by the critical hydroxylation reaction and supply to critical water And a chemical supply means.
【００１１】液晶パネル等の固形廃棄物を収容する処理
容器の水を高温・高圧にすることで臨界状態とし、この
臨界水（超臨界水および亜臨界水の両方を含む）に、反
応促進薬品供給手段から固形廃棄物の特定の原料を選択
的に臨界水酸化反応処理し回収するため、当該原料に対
応する反応促進薬品を選択して供給する。別の原料を処
理する場合は、反応促進薬品供給手段から臨界水に当該
別の原料の反応を促進する薬品を供給する。これによ
り、バッチ処理せざるを得ない複数の原料から構成され
る固形廃棄物であっても、処理容器から出すことなく、
連続的に処理できる。Water in a processing container for containing solid waste such as a liquid crystal panel is brought to a critical state by applying high temperature and high pressure, and a reaction accelerating chemical is added to the critical water (including both supercritical water and subcritical water). Since a specific raw material of solid waste is selectively subjected to the critical hydroxylation reaction treatment and recovered from the supply means, a reaction accelerating chemical corresponding to the raw material is selected and supplied. When processing another raw material, a chemical that accelerates the reaction of the other raw material is supplied from the reaction-promoting chemical supply means to the critical water. As a result, even if the solid waste is composed of a plurality of raw materials that must be batch-processed, without discharging it from the processing container,
It can be processed continuously.
【００１２】なお、臨界状態には、いわゆる超臨界状態
および亜臨界状態が含まれるが、これらの性質に類似す
る性質を有する状態であれば、固形廃棄物の処理が可能
である。また、超臨界水により処理するのが好ましい
が、亜臨界水により処理しても相当の効果がある。前記
固形廃棄物については、液晶パネルの他、プリント基板
等の電子部品や下水汚泥に含まれる固形物または半固形
物等の、処理設備において流体として扱うことが困難な
ものが含まれる（以下同じ）。The critical state includes so-called supercritical state and subcritical state, and solid waste can be treated as long as it has a property similar to these properties. Further, it is preferable to treat with supercritical water, but treatment with subcritical water has a considerable effect. The solid waste includes not only liquid crystal panels but also electronic components such as printed circuit boards and solids or semi-solids contained in sewage sludge, which are difficult to handle as fluids in treatment equipment (the same applies below. ).
【００１３】また、この発明の臨界水酸化処理装置は、
圧力容器を有し、温度および圧力を高めて臨界水を発生
する臨界水発生手段と、前記圧力容器と別体となり、臨
界水発生手段から臨界水の供給を受け且つ複数の原料か
ら構成される液晶パネル等の固形廃棄物を収納する処理
容器と、固形廃棄物の原料毎に用意された複数の反応促
進薬品を、臨界水酸化反応により処理する原料毎に選択
して臨界水に供給する反応促進薬品供給手段とを備えた
ことを特徴とする。Further, the critical water oxidation treatment apparatus of the present invention is
A critical water generating unit that has a pressure vessel and raises temperature and pressure to generate critical water, and a separate unit from the pressure vessel, receives critical water from the critical water generating unit, and is composed of a plurality of raw materials. A reaction vessel that stores solid waste such as liquid crystal panels, and multiple reaction-promoting chemicals prepared for each raw material of solid waste are selected for each raw material to be processed by the critical hydroxylation reaction and supplied to critical water And a means for supplying accelerating chemicals.
【００１４】臨界水発生手段で発生した臨界水を液晶パ
ネル等の固形廃棄物を収容する処理容器に供給すると共
に、反応促進薬品供給手段から収納している固形廃棄物
の特定の原料を選択的に処理回収するため、当該原料に
対応する反応促進薬品を選択して臨界水に供給する。別
の原料を処理する場合は、反応促進薬品供給手段から臨
界水に当該別の原料の反応を促進する薬品を供給する。
これにより、複数の原料から構成される固形廃棄物であ
っても、処理容器から出すことなく、異なる原料を連続
的に処理できる。The critical water generated by the critical water generation means is supplied to a processing container containing solid waste such as a liquid crystal panel, and a specific raw material of the solid waste stored from the reaction promoting chemical supply means is selectively supplied. In order to process and recover, the reaction promoting chemical corresponding to the raw material is selected and supplied to the critical water. When processing another raw material, a chemical that accelerates the reaction of the other raw material is supplied from the reaction-promoting chemical supply means to the critical water.
Thereby, even if the solid waste is composed of a plurality of raw materials, different raw materials can be continuously treated without being discharged from the processing container.
【００１５】また、臨界水発生手段の圧力容器と処理容
器とが別体になっているため、固形廃棄物の量に臨界水
発生手段の圧力容器の寸法を合わせる必要はなく、処理
容器を固形廃棄物の量や寸法に合わせるようにすればよ
い。これにより、固形廃棄物の量や寸法に合わせて処理
容器を交換できるので、汎用性を向上できる。なお、臨
界水発生手段の圧力容器と処理容器とは、配管等で接続
されていてもよいし、連通口を介して接続されていても
よい。Further, since the pressure vessel of the critical water generating means and the processing vessel are separate bodies, it is not necessary to match the size of the pressure vessel of the critical water generating means to the amount of solid waste, and the processing vessel is solid. It may be adjusted according to the amount and size of waste. As a result, the processing container can be replaced according to the amount and size of the solid waste, thus improving versatility. The pressure vessel of the critical water generating means and the processing vessel may be connected by piping or the like, or may be connected via a communication port.
【００１６】また、上記臨界水酸化処理装置は、好まし
くは、圧力容器を有し、温度および圧力を高めて臨界水
を得る臨界水発生手段と、臨界水発生手段の圧力容器と
配管を持って接続されて当該圧力容器との間で循環系統
を構成しており、且つ複数の原料から構成される液晶パ
ネル等の固形廃棄物を収納する処理容器と、固形廃棄物
の原料毎に用意された複数の反応促進薬品がそれぞれの
薬品タンクに入れられており、臨界水酸化反応により処
理する原料毎に選択し切り換える切換手段を有し、当該
切換手段により選択した反応促進薬品を臨界水に供給す
る反応促進薬品供給手段と、臨界水酸化処理による処理
水とガスを外部に排出する排出手段とを備えた構成によ
り実現される。Further, the above-mentioned critical water oxidation treatment apparatus preferably has a pressure vessel, and has a critical water generating means for increasing the temperature and pressure to obtain critical water, a pressure vessel of the critical water generating means and a pipe. A processing container that is connected to form a circulation system with the pressure vessel and that stores solid waste such as liquid crystal panels composed of a plurality of raw materials, and prepared for each raw material of the solid waste A plurality of reaction-promoting chemicals are contained in respective chemical tanks, and there is a switching means for selecting and switching for each raw material to be processed by the critical hydroxylation reaction, and the reaction-promoting chemical selected by the switching means is supplied to the critical water. It is realized by a configuration including a reaction promoting chemical supply means and a discharge means for discharging treated water and gas by the critical hydroxylation treatment to the outside.
【００１７】また、この発明の臨界水酸化処理装置は、
前記臨界水の化学成分を監視する監視手段を備え、監視
手段が臨界水酸化反応による処理物質を所定量検出した
場合、前記反応促進薬品供給手段の反応促進薬品を切り
換えることを特徴とする。Further, the critical water oxidation treatment apparatus of the present invention is
It is characterized in that it comprises a monitoring means for monitoring the chemical component of the critical water, and switches the reaction promoting chemical of the reaction promoting chemical supply means when the monitoring means detects a predetermined amount of the substance to be treated by the critical hydroxylation reaction.
【００１８】すなわち、監視手段により臨界水酸化反応
による処理物質を検出し、所定量超えたと判断した場合
は、臨界水酸化反応が進行していると判断して、次の薬
品による異なる原料の処理に移行するようにする。これ
により、液晶パネルのような複数の原料で構成された固
形廃棄物を連続かつ自動的に処理できる。That is, when the substance to be treated by the critical hydroxylation reaction is detected by the monitoring means and it is judged that the amount exceeds a predetermined amount, it is judged that the critical hydroxylation reaction is in progress and the treatment of different raw materials with the next chemical is performed. To move to. As a result, solid waste composed of a plurality of raw materials such as liquid crystal panels can be continuously and automatically processed.
【００１９】また、この発明の臨界水酸化処理装置は、
圧力容器を有し、温度および圧力を高めて臨界水を得る
複数の臨界水発生手段と、固形廃棄物の原料毎に用意さ
れた複数の反応促進薬品を、前記それぞれの臨界水発生
手段の臨界水に供給する複数の反応促進薬品供給手段
と、各臨界水発生手段から選択的に臨界水の供給を受
け、且つ複数の原料から構成される液晶パネル等の固形
廃棄物を収納する処理容器とを備えたことを特徴とす
る。Further, the critical water oxidation treatment apparatus of the present invention is
A plurality of critical water generating means having a pressure vessel and increasing the temperature and pressure to obtain critical water, and a plurality of reaction accelerating chemicals prepared for each raw material of the solid waste are added to the critical water generating means. A plurality of reaction-promoting chemicals supplying means for supplying water, and a processing container for selectively receiving the critical water from each of the critical water generating means and accommodating solid waste such as a liquid crystal panel composed of a plurality of raw materials. It is characterized by having.
【００２０】この発明では、複数の臨界水発生手段が設
けられ、この臨界水発生手段毎に反応促進薬品供給手段
が対応しており、固形廃棄物を収納した処理容器内に対
して、構成原料に応じた反応促進薬品を投入した臨界水
を選択して供給する。これにより、反応促進薬品供給手
段において、薬品の切換を行うことなく、固形廃棄物の
処理を行うことができる。また、装置を減圧して処理水
を抜く作業を処理対象原料毎に行う必要がないので、処
理効率を向上できる。In the present invention, a plurality of critical water generating means are provided, and the reaction accelerating chemical supply means corresponds to each of the critical water generating means, and the constituent raw materials are provided in the processing container containing the solid waste. Select and supply the critical water containing the reaction accelerating chemicals. As a result, the solid waste can be treated without switching the chemicals in the reaction-promoting chemical supply means. Moreover, since it is not necessary to perform the work of depressurizing the apparatus to drain the treated water for each raw material to be treated, the treatment efficiency can be improved.
【００２１】なお、臨界水発生手段の圧力容器と処理容
器とが別体になっているため、固形廃棄物の量に臨界水
発生手段の圧力容器の寸法を合わせる必要はなく、処理
容器を固形廃棄物の量や寸法に合わせるようにすればよ
い。これにより、固形廃棄物の量や寸法に合わせて処理
容器を交換できるので、汎用性を向上できる。Since the pressure vessel of the critical water generating means and the processing vessel are separate bodies, it is not necessary to match the size of the pressure vessel of the critical water generating means to the amount of solid waste, and the processing vessel is solid. It may be adjusted according to the amount and size of waste. As a result, the processing container can be replaced according to the amount and size of the solid waste, thus improving versatility.
【００２２】また、この発明の臨界水酸化処理装置は、
更に、前記臨界水発生手段と処理容器との間で臨界水を
循環させるようにしたことを特徴とする。臨界水を循環
させることで、例えば酸化金属の濃度が高くなり、臨界
水酸化反応の後に回収しやすくなる。また、臨界水を排
出しないので、エネルギー効率が良い。Further, the critical water oxidation treatment apparatus of the present invention is
Further, it is characterized in that the critical water is circulated between the critical water generating means and the processing container. By circulating the critical water, for example, the concentration of the metal oxide becomes high, and it becomes easy to collect it after the critical hydroxylation reaction. In addition, since it does not discharge critical water, it is energy efficient.
【００２３】また、この発明の臨界水酸化処理装置は、
前記固形廃棄物が液晶パネルであり、反応促進薬品供給
手段が、液晶パネルを構成するＩＴＯの原料であるＩｎ
の反応を促進する反応促進薬品を薬品の一つとして供給
することを特徴とする。Further, the critical water oxidation treatment apparatus of the present invention is
The solid waste is a liquid crystal panel, and the reaction accelerating chemical supply means is In, which is a raw material of ITO forming the liquid crystal panel.
It is characterized in that a reaction accelerating chemical that promotes the reaction of is supplied as one of the chemicals.
【００２４】Ｉｎは量の限られた金属であり、液晶パネ
ルに多く用いられていることから、液晶パネルからＩｎ
を回収して再利用することは資源循環の観点から有用で
ある。この発明によれば、他の原料の処理と共にＩｎを
処理回収することができる。Since In is a metal with a limited amount and is often used in liquid crystal panels, In
It is useful from the viewpoint of resource circulation to recover and reuse the waste. According to the present invention, In can be processed and recovered together with the processing of other raw materials.
【００２５】また、この発明の臨界水酸化処理方法は、
複数の原料から構成される液晶パネル等の固形廃棄物を
収納する処理容器に対して臨界水を導入するにあたり、
固形廃棄物に含まれる一つの原料の反応を促進する反応
促進薬品を供給して当該原料を臨界水酸化反応により処
理する第一処理手順と、この第一処理手順の後、固形廃
棄物に含まれる他の原料の反応を促進する反応促進薬品
に切り換えてこれを供給し、当該原料を臨界水酸化反応
により処理する第二処理手順とを少なくとも含むことを
特徴とする。Further, the method of critical hydroxylation treatment of the present invention is
When introducing critical water into a processing container that stores solid waste such as liquid crystal panels composed of multiple raw materials,
A first treatment procedure in which a reaction-promoting chemical that promotes the reaction of one raw material contained in solid waste is supplied to treat the raw material by a critical hydroxylation reaction, and after this first treatment procedure, it is included in the solid waste. And a second treatment procedure in which the raw material is switched to a reaction accelerating chemical for accelerating the reaction of the other raw material and is supplied, and the raw material is treated by a critical hydroxylation reaction.
【００２６】この発明の処理方法によれば、処理容器内
に収納した固形廃棄物を、反応促進薬品を切り換えるこ
とで、構成する原料毎に連続的な処理を行うことができ
る。また、少なくともこの２手順が含まれればよく、原
料毎に上記同様の任意の複数手順を続けて行うことがで
きる。このため、バッチ処理せざるを得ない固形廃棄物
の処理に好適である。なお、この方法を実施するにあた
っては、上記請求項２および５に記載の臨界水酸化処理
装置が好適であるが、これに限定されるものではない。According to the treatment method of the present invention, the solid waste contained in the treatment container can be continuously treated for each of the constituent raw materials by switching the reaction promoting chemicals. Further, at least these two procedures may be included, and any arbitrary plurality of procedures similar to the above can be continuously performed for each raw material. Therefore, it is suitable for the treatment of solid waste that must be batch treated. When carrying out this method, the critical water oxidation treatment apparatus described in claims 2 and 5 is suitable, but the invention is not limited to this.
【００２７】[0027]
【発明の実施の形態】以下、この発明につき図面を参照
しつつ詳細に説明する。なお、この実施の形態によりこ
の発明が限定されるものではない。また、この実施の形
態の構成要素には当業者により置換可能かつ容易なも
の、或いは実質的同一のものが含まれる。BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described below in detail with reference to the drawings. The present invention is not limited to this embodiment. Further, the constituent elements of this embodiment include those that can be easily replaced by those skilled in the art, or those that are substantially the same.
【００２８】［実施の形態１］図１は、この発明の実施
の形態１に係るＳＣＷＯ装置を示す構成図である。この
ＳＣＷＯ装置１００は、内部で超臨界水を発生する圧力
容器１と、配管２により圧力容器１と接続された処理容
器３とを備えている。圧力容器１と処理容器３との間に
は、超臨界水を送るためのポンプ４が設置されている。
また、処理容器３の出口側の配管５には、監視用のモニ
ター装置６と、加熱用のヒーター７が設置されている。[First Embodiment] FIG. 1 is a block diagram showing an SCWO device according to a first embodiment of the present invention. The SCWO device 100 includes a pressure vessel 1 that internally generates supercritical water, and a processing vessel 3 connected to the pressure vessel 1 by a pipe 2. A pump 4 for sending supercritical water is installed between the pressure vessel 1 and the processing vessel 3.
Further, a monitoring device 6 for monitoring and a heater 7 for heating are installed in the pipe 5 on the outlet side of the processing container 3.
【００２９】一方、圧力容器１には、反応促進薬品を入
れる薬品タンク８が複数設置されており、それぞれの薬
品タンク８は圧力容器１と配管９により接続されてい
る。各配管９には、バルブ１０および搬送用のポンプ１
１が設置されている。また、圧力容器１には、超純水を
供給する水供給源２１がヒーター２２および高圧ポンプ
２３を介して接続され、更に酸素供給源１２がヒーター
２４高圧ポンプ１３を介して接続されている。圧力容器
１の下部には排出用の配管１４が設けられ、冷却器１
５、減圧バルブ１６が設置され、その下流には気水分離
器１７が設置されている。冷却器１５には冷却水が流さ
れる。なお、この冷却水に純水を用い、冷却器１５で熱
交換した後にヒーター７で再加熱して処理用の水として
用いるようにしても良い。制御装置２０は、各ポンプ
４，１１、バルブ１０，１６およびヒーター７等を制御
する。また、制御装置２０には、モニター装置６からの
信号、ヒーター７に設けた温度計からの信号が入力され
る。On the other hand, the pressure vessel 1 is provided with a plurality of chemical tanks 8 for containing reaction promoting chemicals, and each chemical tank 8 is connected to the pressure vessel 1 by a pipe 9. Each pipe 9 has a valve 10 and a pump 1 for transportation.
1 is installed. A water supply source 21 for supplying ultrapure water is connected to the pressure vessel 1 via a heater 22 and a high pressure pump 23, and an oxygen supply source 12 is connected to the pressure vessel 1 via a heater 24 high pressure pump 13. A discharge pipe 14 is provided in the lower portion of the pressure vessel 1, and the cooler 1
5. A decompression valve 16 is installed, and a steam separator 17 is installed downstream thereof. Cooling water is caused to flow through the cooler 15. Pure water may be used as the cooling water, and heat may be exchanged in the cooler 15 and then reheated by the heater 7 to be used as water for treatment. The controller 20 controls the pumps 4, 11, the valves 10, 16 and the heater 7 and the like. Further, a signal from the monitor device 6 and a signal from a thermometer provided on the heater 7 are input to the control device 20.
【００３０】処理容器３内には固形廃棄物を収納する
が、この実施の形態では液晶パネルＬを例に挙げて説明
する。この処理対象である液晶パネルＬは、処理容器３
内に多量に収納され密閉される。なお、液晶パネルＬ以
外の固形廃棄物としては、回路基板、半導体チップ、抵
抗、コンデンサ等の電子部品などを挙げることができ
る。また、固形廃棄物は、ある程度の流動性があって
も、従来の液体処理を対象としたＳＣＷＯ装置では扱え
ない程度のものであれば、この発明に係るＳＣＷＯ装置
１００で処理するのが好ましい。Solid waste is stored in the processing container 3. In this embodiment, the liquid crystal panel L will be described as an example. The liquid crystal panel L to be processed is the processing container 3
A large amount is stored inside and sealed. Examples of solid waste other than the liquid crystal panel L include electronic components such as circuit boards, semiconductor chips, resistors and capacitors. Further, it is preferable to treat the solid waste with the SCWO device 100 according to the present invention as long as the solid waste has a certain degree of fluidity but cannot be handled by the conventional SCWO device for liquid treatment.
【００３１】圧力容器１および処理容器３は内部に耐食
コーティングを施したステンレス製の円筒容器であり、
両端部フランジに蓋をボルト止めした構成である。圧力
容器１と処理容器３とを別体にして管接続し循環系統を
構築することで、圧力容器１のサイズが固形廃棄物の処
理量に拘束されることなく必要十分な範囲で設計でき
る。また、処理容器３を圧力容器１側の条件に拘束され
ず、固形廃棄物の量や寸法に合わせて設計できる。ま
た、圧力容器１および処理容器３の外周には、容器内部
を加熱するためのヒーター２５が設けられ、各容器毎或
いは両容器全体として制御装置２０により温度制御され
る。The pressure vessel 1 and the processing vessel 3 are cylindrical stainless steel vessels having a corrosion-resistant coating inside,
The lids are bolted to the flanges on both ends. By constructing a circulation system by connecting the pressure vessel 1 and the treatment vessel 3 separately to each other and constructing a circulation system, the size of the pressure vessel 1 can be designed within a necessary and sufficient range without being restricted by the amount of solid waste to be treated. Further, the processing container 3 can be designed according to the amount and size of solid waste, without being restricted by the conditions on the pressure container 1 side. A heater 25 for heating the inside of the pressure vessel 1 and the processing vessel 3 is provided on the outer periphery of the vessel, and the temperature of each vessel or both vessels is controlled by the controller 20.
【００３２】更に、図面では、圧力容器１と処理容器３
のサイズが同程度に記載されているが、実際には処理対
象となる固形廃棄物の量や寸法により、処理容器３側の
容量を変更するようにする。例えば、容量の異なる複数
の処理容器３を準備しておき、処理量にあわせて取り替
えて使用するようにしてもよい。また、図中点線で示す
ようなサイズの異なる処理容器３ａを予め併設してお
き、両方同時に用いるようにしても良いし、一方のみを
用いるようにしても良い。Further, in the drawings, the pressure vessel 1 and the processing vessel 3 are shown.
Although the sizes are described to be similar, the capacity on the side of the processing container 3 is actually changed depending on the amount and size of the solid waste to be processed. For example, a plurality of processing containers 3 having different capacities may be prepared, and the processing containers 3 may be replaced and used according to the processing amount. Further, processing vessels 3a having different sizes as shown by the dotted line in the figure may be preliminarily provided side by side and both may be used simultaneously, or only one may be used.
【００３３】前記モニター装置６としては、有機ＩＲ
（赤外線分析）法、分光測定法、レーザ誘起ブレークダ
ウン法等を用いたモニター装置を用いることができる。As the monitor device 6, an organic IR is used.
A monitor device using an (infrared analysis) method, a spectroscopic measurement method, a laser-induced breakdown method, or the like can be used.
【００３４】次に、このＳＣＷＯ装置１００の動作につ
いて説明する。薬品タンク８には、液晶パネルＬを構成
する原料を選択的に処理するための反応促進薬品８ｒが
それぞれ入っている。図７に例示したＴＦＴ液晶パネル
を処理する場合を例に挙げると、液晶およびＣｒの反応
促進薬品としては過酸化水素水を用い、ＴａおよびＩＴ
Ｏには、硫酸、硝酸、リン酸等の酸系溶媒、水酸化ナト
リウム、水酸化カリウム等の強アルカリ溶媒、酢酸、炭
酸等の弱酸溶媒、炭酸水素ナトリウム、炭酸ナトリウム
等の弱アルカリ溶媒を用いる。また、配向膜、シール材
には、濃度を調整した過酸化水素水を用いる。Next, the operation of the SCWO device 100 will be described. Each of the chemical tanks 8 contains a reaction accelerating chemical 8r for selectively treating the raw materials forming the liquid crystal panel L. Taking the case of treating the TFT liquid crystal panel illustrated in FIG. 7 as an example, hydrogen peroxide solution is used as a reaction promoting chemical for liquid crystal and Cr, and Ta and IT are used.
As O, an acid solvent such as sulfuric acid, nitric acid or phosphoric acid, a strong alkaline solvent such as sodium hydroxide or potassium hydroxide, a weak acid solvent such as acetic acid or carbonic acid, or a weak alkaline solvent such as sodium hydrogen carbonate or sodium carbonate is used. . Further, hydrogen peroxide solution whose concentration is adjusted is used for the alignment film and the sealing material.
【００３５】Ｃｒは、過酸化水素水により容易にイオン
化して溶解する。また、ＩＴＯは、Ｉｎ、Ｓｎの含有比
が９：１程度であるが、これらは同様に前記薬品にイオ
ン化して溶解する。Ｍｏ、Ａｌ等についても所定の薬品
にイオン化させて溶解できる。また、処理に当たって
は、液晶や偏光板等の有機物が酸化されて、ＣＯ2とＨ2
Ｏになるまで過酸化水素水を供給する。濃度は酸化反応
の速度や反応熱の発生の関係で制御可能な範囲でコント
ロールする。Cr is easily ionized and dissolved by hydrogen peroxide solution. Further, ITO has a content ratio of In and Sn of about 9: 1, but these are similarly ionized and dissolved in the above-mentioned chemicals. Mo and Al can also be ionized and dissolved in a predetermined chemical. Further, in the treatment, organic substances such as liquid crystal and a polarizing plate are oxidized to generate CO 2 and H 2
Hydrogen peroxide solution is supplied until it becomes O. The concentration is controlled within a controllable range depending on the rate of oxidation reaction and the generation of reaction heat.
【００３６】まず、処理対象となる液晶パネルＬを処理
容器３内に収納して密閉する。また、比抵抗が１０Ｍオ
ーム以上の超純水を水供給源２１からヒーター２２によ
り加熱しつつ供給し、圧力容器１内に入れて密閉する。
続いて、ポンプ４を駆動して純水を循環させつつヒータ
ー７で昇温する。この場合、前記ヒーター２５を用いる
ようにしても良い。これにより、装置内部の温度および
圧力を上昇させ、温度３７４℃、圧力２２．１ＭＰａ以
上の超臨界状態とする。なお、温度および圧力は、図示
しない温度計および圧力計により計測され、その計測デ
ータは制御装置２０に入力される。制御装置２０は当該
計測データに基いてヒーター７の温度制御を行う。First, the liquid crystal panel L to be processed is housed in the processing container 3 and hermetically sealed. Further, ultrapure water having a specific resistance of 10 M ohms or more is supplied from a water supply source 21 while being heated by a heater 22, put in the pressure vessel 1 and sealed.
Subsequently, the pump 4 is driven to circulate pure water, and the temperature is raised by the heater 7. In this case, the heater 25 may be used. As a result, the temperature and pressure inside the apparatus are raised to a supercritical state where the temperature is 374 ° C. and the pressure is 22.1 MPa or more. The temperature and the pressure are measured by a thermometer and a pressure gauge (not shown), and the measured data are input to the control device 20. The control device 20 controls the temperature of the heater 7 based on the measurement data.
【００３７】次に、制御装置２０は、一つの薬品タンク
８ａを選択し、この薬品タンク８ａのポンプ１１を駆動
すると共にバルブ１０を開けて、圧力容器１内に反応促
進薬品８ｒを投入する。例えば液晶パネルＬの液晶を分
解処理するために、第一薬品タンク８ａから過酸化水素
水を投入する。続いて、反応促進薬品８ｒを投入された
超臨界水は、配管２を通じて処理容器３に運ばれ、液晶
パネルＬの液晶と超臨界水酸化反応を起こす。なお、ポ
ンプ４によって処理容器３に運ばれた超臨界水は、処理
容器３内から再び圧力容器１に運ばれ、配管５の途中に
設置されたヒーター７によって再加熱され、超臨界状態
を維持できる程度の温度まで昇温される。昇温されて戻
された超臨界水は再び上部の配管２を介して処理容器３
に運ばれ、これを繰り返すことで装置内を超臨界水が循
環する。Next, the controller 20 selects one chemical tank 8a, drives the pump 11 of this chemical tank 8a, opens the valve 10 and inputs the reaction accelerating chemical 8r into the pressure vessel 1. For example, in order to decompose the liquid crystal of the liquid crystal panel L, hydrogen peroxide solution is added from the first chemical tank 8a. Then, the supercritical water charged with the reaction accelerating chemical 8r is carried to the processing container 3 through the pipe 2 and causes a supercritical water oxidation reaction with the liquid crystal of the liquid crystal panel L. The supercritical water carried to the processing container 3 by the pump 4 is carried to the pressure container 1 again from the inside of the processing container 3 and reheated by the heater 7 installed in the middle of the pipe 5 to maintain the supercritical state. The temperature is raised to a temperature as high as possible. The supercritical water that has been heated and returned is again processed through the upper pipe 2 into the processing container 3
The supercritical water is circulated in the device by being carried to the equipment.
【００３８】この循環系統を構成する配管５の一部に設
けたモニター装置６は、超臨界水酸化反応により生成さ
れた物質を検出する。このモニター装置６の出力信号は
制御装置２０に入力されており、制御装置２０はこの入
力された信号に基づいて薬品タンク８を制御する。制御
装置２０は、図示しない記憶装置に液晶パネルＬの原料
を処理した際に生成される物質の量を記憶しており、物
質の量（処理容器３に収納する液晶パネルＬの量から概
算で算出される）から分解処理が終了したか否かを判断
する。なお、モニター装置６による監視対象物質は、生
成された物質に限定されない。例えば超臨界水中の酸素
濃度を測定して、その酸素濃度が超臨界水酸化反応によ
り減少した量から分解処理の終了を判断するようにして
もよい。また、上記レーザ誘起ブレークダウン法によれ
ば、どのような物質もリアルタイムに計測可能であるか
ら、分解処理をリアルタイム制御できる。A monitor device 6 provided in a part of the pipe 5 constituting this circulation system detects a substance produced by the supercritical water oxidation reaction. The output signal of the monitor device 6 is input to the control device 20, and the control device 20 controls the chemical tank 8 based on the input signal. The control device 20 stores the amount of the substance generated when the raw material of the liquid crystal panel L is processed in a storage device (not shown), and calculates the amount of the substance (approximately from the amount of the liquid crystal panel L stored in the processing container 3). (Calculated) determines whether or not the disassembly processing has been completed. The substance to be monitored by the monitor device 6 is not limited to the generated substance. For example, the oxygen concentration in the supercritical water may be measured, and the end of the decomposition treatment may be determined from the amount of the oxygen concentration reduced by the supercritical water oxidation reaction. Further, according to the laser-induced breakdown method, any substance can be measured in real time, so that the decomposition process can be controlled in real time.
【００３９】そして、超臨界水の循環過程において液晶
パネルＬの液晶が分解されると、制御装置２０は一旦超
臨界水の循環を停止すると共に薬品タンク８ａからの反
応促進薬品８ｒの投入を停止する。そして、減圧弁１６
を開けて配管１４に設置した冷却器１５に超臨界水を流
し、水温を低下させつつ気水分離器１７により排ガスと
処理水に分離し、外部に排出する。When the liquid crystal of the liquid crystal panel L is decomposed in the circulation process of the supercritical water, the control device 20 once stops the circulation of the supercritical water and stops supplying the reaction accelerating chemical 8r from the chemical tank 8a. To do. And the pressure reducing valve 16
Supercritical water is caused to flow into the cooler 15 installed in the pipe 14 by opening the tank, and while the water temperature is lowered, the steam-water separator 17 separates the exhaust gas and the treated water and discharges them to the outside.
【００４０】次に、制御装置２０は、上記同様に圧力容
器１内に注水を行い、ヒーター７による加熱により再び
装置内部を超臨界状態にする。続いて、制御装置２０
は、第二薬品タンク８ｂのポンプ１１を駆動すると共に
バルブ１０を開け、反応促進薬品８ｓを圧力容器１内に
投入する。例えばＴＦＴ液晶パネルＬのＩＴＯ膜を分解
する場合、水酸化ナトリウム溶液を投入することで、液
晶パネルＬのＩＴＯ膜が分解され、Ｉｎが酸化物として
処理水に混入する。処理の終了は上記同様にモニター装
置６による生成物質の監視に基づいて制御装置２０で判
断する。Next, the controller 20 injects water into the pressure vessel 1 in the same manner as described above, and heats the heater 7 to bring the inside of the apparatus into a supercritical state again. Then, the control device 20
Drives the pump 11 of the second chemical tank 8b, opens the valve 10, and charges the reaction promoting chemical 8s into the pressure vessel 1. For example, when the ITO film of the TFT liquid crystal panel L is decomposed, by introducing a sodium hydroxide solution, the ITO film of the liquid crystal panel L is decomposed and In is mixed into the treated water as an oxide. The end of the process is judged by the controller 20 based on the monitoring of the produced substance by the monitor 6 as in the above.
【００４１】ＩＴＯの超臨界水酸化処理が終了したら、
上記同様にポンプ４およびヒーター７等を一時停止し、
減圧弁１６を開いて処理水を冷却しつつ気水分離して排
出する。この処理水にはＩｎが高濃度で含まれているか
ら、この処理水からＩｎを取り出すことでＩｎを再利用
することが可能になる。なお、循環系統によって一定の
超臨界水を用いて分解処理を行うことで、処理水のＩｎ
の濃度が高まるため、処理水からＩｎを取り出しやすい
という利点がある。なお、Ｉｎに限らず処理水から特定
物質を取り出す場合には有効である。After the supercritical water oxidation of ITO is completed,
In the same manner as above, temporarily stop the pump 4 and heater 7, etc.,
The pressure reducing valve 16 is opened to cool the treated water and separate it into steam and discharge it. Since this treated water contains In at a high concentration, it is possible to reuse In by taking out In from this treated water. In addition, by performing decomposition treatment using constant supercritical water by the circulation system, In
Has the advantage that In can be easily extracted from the treated water. It should be noted that this is effective not only for In but for extracting a specific substance from treated water.
【００４２】以下、上記同様の手順により薬品タンク８
ａ…から処理対象の原料に対応した反応促進薬品８ｒ…
を投入し、超臨界水を循環させつつ液晶パネルＬの処理
を行う。そして、原料毎に処理水および排ガスを排出す
ると共に、処理水に含まれる酸化金属等を取り出す。そ
して、初回に処理容器３に収納した液晶パネルＬの処理
が終了したら、次回の液晶パネルＬを処理容器３に収納
し、上記同様の手順により超臨界水酸化処理を行う。Thereafter, the chemical tank 8 is subjected to the same procedure as above.
From a ... Reaction promoting chemicals 8r ... corresponding to the raw material to be treated
Then, the liquid crystal panel L is processed while circulating supercritical water. Then, the treated water and the exhaust gas are discharged for each raw material, and the metal oxide and the like contained in the treated water are taken out. Then, when the processing of the liquid crystal panel L stored in the processing container 3 for the first time is completed, the next liquid crystal panel L is stored in the processing container 3 and the supercritical water oxidation treatment is performed by the same procedure as described above.
【００４３】このように、圧力容器１と処理容器３を分
離して管接続して循環系統を構築し、この圧力容器１に
異なる反応促進薬品８ｒ…を投入しつつ、処理容器内の
液晶パネルＬを超臨界水により分解処理するようにした
ので、液晶パネルＬのような異なる原料により構成され
た固形廃棄物であっても、液晶パネルＬを処理容器３か
ら出すことなく、連続的に処理できる。この結果、処理
効率が飛躍的に向上して、資源の循環を実現できるよう
になる。In this way, the pressure vessel 1 and the processing vessel 3 are separated and pipe-connected to construct a circulation system, and different reaction promoting chemicals 8r ... Are charged into the pressure vessel 1 while the liquid crystal panel in the processing vessel is being introduced. Since L is decomposed by supercritical water, even if the solid waste is composed of different raw materials such as the liquid crystal panel L, the liquid crystal panel L is continuously processed without being taken out from the processing container 3. it can. As a result, the processing efficiency is dramatically improved and resource circulation can be realized.
【００４４】なお、上記実施の形態では薬品タンク８毎
にポンプ１１およびバルブ１０を設けているが、図２に
示すように、ポンプ１１およびバルブ１０をそれぞれ１
つとし、反応促進薬品８ｒを別の反応促進薬品８ｓに切
り換える場合は、取り付けている薬品タンク８ａを外し
て、別の薬品タンク８ｂに交換するようにしてもよい。
また、薬品を投入する位置は、上記実施の形態では圧力
容器１の側面となっているがこれに限定されない。例え
ば途中の配管２、５であっても処理容器３であっても良
い。Although the pump 11 and the valve 10 are provided for each chemical tank 8 in the above-described embodiment, as shown in FIG.
If the reaction accelerating chemical 8r is switched to another reaction accelerating chemical 8s, the attached chemical tank 8a may be removed and replaced with another chemical tank 8b.
Further, although the position of introducing the chemical is on the side surface of the pressure vessel 1 in the above-described embodiment, it is not limited to this. For example, the pipes 2 and 5 on the way or the processing container 3 may be provided.
【００４５】また、圧力容器１と処理容器３は必ずしも
配管２で接続する必要はない。図３は、ＳＣＷＯ装置の
変形例を示す構成図である。このＳＣＷＯ装置１５０
は、処理容器３の上部に圧力容器１を設置した構造であ
り、その他の構成は図１に示すＳＣＷＯ装置１００と同
様である。圧力容器１の下部には当該圧力容器１と処理
容器３とを連通する連通孔１８が設けられており、処理
容器３の底部から延出する配管１９は圧力容器１の上部
に接続され、循環系統が構成されている。The pressure vessel 1 and the processing vessel 3 need not necessarily be connected by the pipe 2. FIG. 3 is a configuration diagram showing a modified example of the SCWO device. This SCWO device 150
1 has a structure in which the pressure vessel 1 is installed above the processing vessel 3, and the other configurations are the same as those of the SCWO device 100 shown in FIG. A communication hole 18 that connects the pressure container 1 and the processing container 3 is provided in the lower portion of the pressure container 1, and a pipe 19 extending from the bottom of the processing container 3 is connected to the upper portion of the pressure container 1 for circulation. The system is configured.
【００４６】このＳＣＷＯ装置１５０では、反応促進薬
品を投入した超臨界水が圧力容器１から連通孔１８を通
って処理容器３に運ばれ、処理容器３内の液晶パネルＬ
の分解処理を行う。超臨界水は処理容器３下部から搬出
されヒーター７により再加熱された後、配管１９を介し
て圧力容器１に戻される。そして、超臨界水が循環を繰
り返しつつ、液晶パネルＬの処理を行う。液晶パネルＬ
の別の原料を処理する場合は、減圧して冷却した処理水
とガスを排出し、上記同様、再び圧力容器１内に純水を
入れて超臨界水状態とする。そして、薬品タンク８から
別の反応促進薬品を投入し、超臨界水を循環させる。In this SCWO device 150, supercritical water charged with a reaction promoting chemical is carried from the pressure vessel 1 to the processing vessel 3 through the communication hole 18, and the liquid crystal panel L in the processing vessel 3 is carried out.
The disassembly processing of. The supercritical water is carried out from the lower part of the processing container 3, reheated by the heater 7, and then returned to the pressure container 1 through the pipe 19. Then, the liquid crystal panel L is processed while the supercritical water is repeatedly circulated. LCD panel L
When another raw material is treated, the treated water and gas cooled under reduced pressure are discharged, and pure water is put into the pressure vessel 1 again in the same manner as described above to bring it into a supercritical water state. Then, another reaction promoting chemical is charged from the chemical tank 8 and the supercritical water is circulated.
【００４７】次に、上記実施の形態では、純水を高温・
高圧にして超臨界状態としたが、亜臨界状態でも液晶パ
ネルの処理を行い得る。図４に示すように、温度が３７
４℃、圧力が２２．１ＭＰａに臨界点があり、これを超
えた領域が超臨界領域となり、この発明も超臨界領域で
処理を行うのが好ましいが、この超臨界領域の図中左側
に亜臨界領域が存在し、この亜臨界領域における物性は
超臨界領域における物性に近似したものである。このた
め、難分解物質の完全分解を行うのでなければ、当該亜
臨界領域における水熱反応により分解処理を行うように
してもよい。このようにすれば、所要エネルギーの点で
有利であり、ランニングコストの削減に役立つものとな
る。なお、本発明の実施に当たっては、超臨界領域で分
解処理を行うのが最も好ましく、亜臨界領域であっても
好ましい処理が可能であるが、図中の超臨界領域および
亜臨界領域から若干外れる場合でも、要求される分解性
能の範囲であれば、処理可能である。Next, in the above embodiment, pure water is heated to a high temperature.
Although the pressure was raised to a supercritical state, the liquid crystal panel can be processed even in a subcritical state. As shown in FIG. 4, the temperature is 37
There is a critical point at 4 ° C. and a pressure of 22.1 MPa, and a region exceeding this is a supercritical region. In the present invention, it is preferable to perform treatment in the supercritical region. There is a critical region, and the physical properties in this subcritical region are close to those in the supercritical region. Therefore, if the hardly decomposable substance is not completely decomposed, the decomposition treatment may be performed by hydrothermal reaction in the subcritical region. In this way, it is advantageous in terms of energy requirements and helps reduce running costs. Incidentally, in carrying out the present invention, it is most preferable to carry out the decomposition treatment in the supercritical region, and it is possible to perform preferable treatment even in the subcritical region, but it is slightly deviated from the supercritical region and the subcritical region in the figure. Even in the case, it can be processed within the range of the required decomposition performance.
【００４８】［実施の形態２］図５は、この発明の実施
の形態２に係るＳＣＷＯ装置を示す構成図である。この
ＳＣＷＯ装置２００は、複数の圧力容器２０１を備え、
圧力容器２０１毎に薬品タンク２０２を備えた構成であ
る。各圧力容器２０１の上部から延出する配管２０３は
途中で集合し、処理容器３に接続されている。処理容器
３には、制御装置２０により温度制御されるヒーター２
５が設けられている。この配管２０３には、超臨界水を
循環させるためのポンプ４が設置されている。また、処
理容器３の下部からは配管２０４が延出しており、この
配管２０４にはモニター装置６およびヒーター７が設置
されている。この配管２０４は、各圧力容器２０１に接
続されており、全体で循環系統を形成している。更に、
配管２０３、２０４には、圧力容器２０１毎にバルブ２
０５が設けられている。[Second Embodiment] FIG. 5 is a block diagram showing an SCWO device according to a second embodiment of the present invention. The SCWO device 200 includes a plurality of pressure vessels 201,
This is a configuration in which a chemical tank 202 is provided for each pressure vessel 201. The pipes 203 extending from the upper portion of each pressure vessel 201 gather together on the way and are connected to the processing vessel 3. The processing container 3 has a heater 2 whose temperature is controlled by the controller 20.
5 are provided. A pump 4 for circulating supercritical water is installed in the pipe 203. A pipe 204 extends from the lower part of the processing container 3, and the monitor device 6 and the heater 7 are installed in the pipe 204. The pipe 204 is connected to each pressure vessel 201 and forms a circulation system as a whole. Furthermore,
A valve 2 is provided in each of the pipes 203 and 204 for each pressure vessel 201.
05 is provided.
【００４９】また、各圧力容器２０１には、排出用の配
管２０６が設けられており、この配管２０６は集合して
その下流に冷却器１５、減圧弁１６および気水分離器１
７が設置されている。各配管２０６にはバルブ２０７が
設けられている。更に、書く圧力容器２０１には、制御
装置２０により温度制御されるヒーター（図示省略）が
設けられている。制御装置２０は、ヒーター７およびモ
ニター装置６からの信号を受信すると共にヒーター７の
温度制御や、各バルブ２０５の開閉制御を行う。処理容
器３内には、液晶パネルＬが収納されて密封される。ま
た、処理容器３には酸素供給源１２がポンプ１３を介し
て接続されている。Further, each pressure vessel 201 is provided with a pipe 206 for discharge, and the pipes 206 are gathered together, and the cooler 15, the pressure reducing valve 16 and the steam separator 1 are provided downstream thereof.
7 is installed. Each pipe 206 is provided with a valve 207. Further, the writing pressure vessel 201 is provided with a heater (not shown) whose temperature is controlled by the control device 20. The control device 20 receives signals from the heater 7 and the monitor device 6, and controls the temperature of the heater 7 and the opening / closing control of each valve 205. The liquid crystal panel L is housed and hermetically sealed in the processing container 3. An oxygen supply source 12 is connected to the processing container 3 via a pump 13.
【００５０】次に、このＳＣＷＯ装置２００の動作につ
いて説明する。まず、液晶パネルＬの所定の原料を分解
処理する場合、当該処理対象となる原料（例えば液晶）
の反応促進薬品の薬品タンク２０２ａを備えた第一の圧
力容器２０１ａ内に純水を入れて密封する。このとき、
純水を入れる圧力容器２０１ａのバルブ２０５ａは開状
態となり、その他の圧力容器２０１ｂ、２０１ｃのバル
ブ２０５ｂ、２０５ｃは閉状態となっている。続いて、
ポンプ４を駆動して圧力容器２０１と処理容器３との間
で純水を循環させつつ、ヒーター７を作動させ、当該純
水を加熱する。なお、前記ヒーター２５を用いて加熱し
ても良い。この加熱により純水が超臨界状態になるまで
加圧昇温される。Next, the operation of the SCWO device 200 will be described. First, when a predetermined raw material of the liquid crystal panel L is decomposed, the raw material (for example, liquid crystal) to be treated is decomposed.
Pure water is put into the first pressure vessel 201a equipped with the chemical tank 202a for the reaction accelerating chemical, and sealed. At this time,
The valve 205a of the pressure vessel 201a containing pure water is in the open state, and the valves 205b and 205c of the other pressure vessels 201b and 201c are in the closed state. continue,
The pure water is circulated between the pressure container 201 and the processing container 3 by driving the pump 4, and the heater 7 is operated to heat the pure water. The heater 25 may be used for heating. By this heating, the temperature of the pure water is increased by pressurization until it reaches a supercritical state.
【００５１】次に、この状態で薬品タンク２０２ａから
圧力容器２０１内に反応促進薬品２０２ｒを投入する。
圧力容器２０１ａの超臨界水は配管２０３を介して処理
容器３に運ばれ、この処理容器３内において液晶パネル
Ｌの特定原料を分解する。処理容器３の超臨界水は、下
部の配管２０４から再び出てヒーター７により再加熱さ
れて圧力容器２０１ａに戻される。そして、この超臨界
水の循環の過程において液晶パネルＬの特定原料の分解
処理が促進される。また、分解処理は、モニター装置６
により生成物質をモニタリングすることで監視されてお
り、制御装置２０は生成物質が所定量に達した場合に分
解を終了したと判断する。Next, in this state, the reaction promoting chemical 202r is charged into the pressure vessel 201 from the chemical tank 202a.
The supercritical water in the pressure container 201a is conveyed to the processing container 3 through the pipe 203, and the specific raw material of the liquid crystal panel L is decomposed in the processing container 3. The supercritical water in the processing container 3 again flows out of the lower pipe 204, is reheated by the heater 7, and is returned to the pressure container 201a. Then, in the process of circulating the supercritical water, the decomposition process of the specific raw material of the liquid crystal panel L is promoted. Also, the disassembly process is performed by the monitor device 6
Is monitored by monitoring the produced substance, and the controller 20 determines that the decomposition is completed when the produced substance reaches a predetermined amount.
【００５２】そして、特定の原料について分解処理が終
了したら、制御装置２０は、ヒーター７やポンプ４の駆
動を一時停止し、使用中の圧力容器２０１に設けた排出
用のバルブ２０７ａを開状態とする。一方、この他の圧
力容器２０１ｂ、２０１ｃに設けた排出用のバルブ２０
７ｂ、２０７ｃは閉状態である。そして、減圧弁１６を
開き、冷却器１５によって処理水およびガスを冷却し、
気水分離器１７により処理水とガスを分離して外部に排
出する。When the decomposition process for the specific raw material is completed, the controller 20 temporarily stops the driving of the heater 7 and the pump 4, and opens the discharge valve 207a provided in the pressure vessel 201 in use. To do. On the other hand, the discharge valve 20 provided in the other pressure vessels 201b and 201c.
7b and 207c are in a closed state. Then, the pressure reducing valve 16 is opened, and the treated water and gas are cooled by the cooler 15.
The treated water and gas are separated by the steam separator 17 and discharged to the outside.
【００５３】次に、液晶パネルＬの別の原料（例えばシ
ール剤）を分解処理する場合は、当該原料の反応を促進
する反応促進薬品２０２ｓの入った薬品タンク２０２ｂ
を備えた圧力容器２０１ｂを用いて処理を行う。制御装
置２０は、当該第二の圧力容器２０１ｂに純水を注入し
て密閉状態とする。また、制御装置２０は、第二の圧力
容器２０１ｂのバルブ２０５ｂを開状態とし、その他の
圧力容器２０１ａ、２０１ｃのバルブ２０５ａ、２０５
ｃを閉状態とする。ここで、このＳＣＷＯ装置２００で
は、第一の圧力容器２０１ａを減圧し処理水およびガス
を排出している間に、この第二の圧力容器２０１ｂの純
水注入や超臨界状態への加熱昇圧作業を行うことが可能
である。これにより、処理時間を極めて短縮化できる。Next, when another raw material (for example, a sealant) of the liquid crystal panel L is decomposed, a chemical tank 202b containing a reaction accelerating chemical 202s for accelerating the reaction of the raw material.
Processing is performed using the pressure vessel 201b provided with. The control device 20 injects pure water into the second pressure vessel 201b to bring it into a closed state. Further, the control device 20 opens the valve 205b of the second pressure vessel 201b and opens the valves 205a and 205 of the other pressure vessels 201a and 201c.
c is closed. Here, in this SCWO device 200, while decompressing the first pressure vessel 201a and discharging treated water and gas, pure water is injected into this second pressure vessel 201b and heating and pressurizing work to a supercritical state. It is possible to As a result, the processing time can be extremely shortened.
【００５４】そして、圧力容器２０１と処理容器３とを
接続してポンプ４を駆動することで装置内に純水を循環
させ、更にヒーター７による加熱を行い、純水が超臨界
状態になるまで加圧昇温する。続いて、薬品タンク８か
ら圧力容器２０１ｂ内に所定の反応促進薬品２０１ｓを
投入し、超臨界水と共に循環系統を循環させる。これに
より、液晶パネルＬの特定原料が分解処理される。そし
て、上記同様に処理が終了したら、制御装置２０により
ヒーター７およびポンプ４の駆動を一時停止し、減圧弁
１６を開き、処理水およびガスを排出用の配管２０６か
ら出し、気水分離器１７により分離して外部に排出す
る。Then, the pressure vessel 201 and the processing vessel 3 are connected to each other and the pump 4 is driven to circulate pure water in the apparatus, and further heated by the heater 7 until the pure water reaches a supercritical state. Pressurize and heat up. Subsequently, a predetermined reaction promoting chemical 201s is put into the pressure vessel 201b from the chemical tank 8 to circulate the circulation system together with the supercritical water. As a result, the specific raw material of the liquid crystal panel L is decomposed. Then, when the processing is completed in the same manner as described above, the control device 20 temporarily stops the driving of the heater 7 and the pump 4, opens the pressure reducing valve 16, takes out the treated water and the gas from the discharge pipe 206, and removes the steam separator 17. Separated by and discharged to the outside.
【００５５】次に、液晶パネルＬの更に別の原料を分解
処理する場合は、同じく第三の圧力容器２０１ｃに純水
を注入し、バルブ２０５ｃを開いて循環系統を構成し、
ヒーター加熱により超臨界状態とする。続いて、薬品タ
ンク２０２ｃから反応促進薬品２０２ｔを注入して超臨
界水と共に循環させ、液晶パネルＬの特定原料の分解処
理を行う。そして、分解処理が終了した場合、同様にポ
ンプ４等の駆動を一時停止し、減圧冷却後、気水分離し
て外部に排出する。なお、上記いずれの過程において
も、処理水に含まれる酸化金属等の元素は取り出して再
利用に供する。Next, in the case where another raw material of the liquid crystal panel L is decomposed, pure water is injected into the third pressure vessel 201c and the valve 205c is opened to form a circulation system.
It is brought into a supercritical state by heating with a heater. Subsequently, the reaction accelerating chemical 202t is injected from the chemical tank 202c and circulated together with the supercritical water to decompose the specific raw material of the liquid crystal panel L. When the disassembling process is completed, the driving of the pump 4 and the like is temporarily stopped in the same manner, and after decompression cooling, steam and water are separated and discharged to the outside. In any of the above processes, elements such as metal oxide contained in the treated water are taken out and reused.
【００５６】以上の手順によっても、複数の原料で構成
される液晶パネル等の固形廃棄物を処理容器３から出す
ことなく連続的に処理できる。また、このＳＣＷＯ装置
２００では、前に用いた圧力容器２０１の減圧作業等の
間に、次の圧力容器２０１の純水注入や加熱昇圧作業等
が可能であるので、液晶パネルＬの処理時間を短縮化で
きる。このため、処理のランニングコストを効果的に低
減できる。Also by the above procedure, solid waste such as liquid crystal panel composed of a plurality of raw materials can be continuously treated without taking out from the treatment container 3. In addition, in this SCWO device 200, it is possible to inject pure water into the next pressure vessel 201 and to heat and pressurize the pressure vessel 201 during the depressurization operation of the pressure vessel 201 used before. Can be shortened. Therefore, the running cost of processing can be effectively reduced.
【００５７】［実施の形態３］図６は、この発明の実施
の形態３に係るＳＣＷＯ装置を示す構成図である。この
ＳＣＷＯ装置３００は、圧力容器３０１内に液晶パネル
Ｌを収納して、当該圧力容器３０１内にて処理を行う構
成である。このＳＣＷＯ装置３００では、圧力容器３０
１と、処理する原料毎に用意した反応促進薬品３０３ｒ
…を入れた複数の薬品タンク３０３ａ…と、純水を加熱
するヒーター３０４と、酸素供給源３０５と、配管３０
６上に設置した冷却器３０７、減圧弁３０８と、その下
流に設置した気水分離器３０９とから構成されている。
圧力容器３０１内には液晶パネルＬが収納されている。
また、圧力容器３０１の外周には、内部の温度制御を行
うためのヒーター３１２が設けられている。[Third Embodiment] FIG. 6 is a block diagram showing an SCWO device according to a third embodiment of the present invention. The SCWO device 300 has a configuration in which a liquid crystal panel L is housed in a pressure container 301 and processing is performed in the pressure container 301. In this SCWO device 300, the pressure vessel 30
1 and the reaction promoting chemical 303r prepared for each raw material to be treated
A plurality of chemical tanks 303a containing ..., a heater 304 for heating pure water, an oxygen supply source 305, and a pipe 30
6, a cooling device 307, a pressure reducing valve 308, and a steam separator 309 installed downstream thereof.
A liquid crystal panel L is housed in the pressure container 301.
Further, a heater 312 for controlling the internal temperature is provided on the outer circumference of the pressure vessel 301.
【００５８】まず、ヒーター３０４により純水を４００
℃程度まで加熱して圧力容器３０１内に注水する。ま
た、これと共に高圧ポンプ３０２により酸素供給源３０
５から酸素を供給し、内部を加圧することで、圧力容器
３０１内が超臨界状態となる。次に、液晶パネルＬの特
定の原料（例えば配向膜）を分解処理するために、この
原料の反応促進薬品３０３ｒを入れた薬品タンク３０３
ａのバルブ３１０を開けると共にポンプ３１１を作動さ
せ、圧力容器３０１内に反応促進薬品３０３ｒを投入す
る。First, the pure water is heated to 400 by the heater 304.
It is heated up to about ℃ and poured into the pressure vessel 301. Along with this, the high pressure pump 302 is used to supply the oxygen source 30.
By supplying oxygen from 5 and pressurizing the inside, the inside of the pressure vessel 301 becomes a supercritical state. Next, in order to decompose a specific raw material (for example, an alignment film) of the liquid crystal panel L, a chemical tank 303 containing a reaction accelerating chemical 303r of this raw material.
The valve 310 of a is opened and the pump 311 is operated, and the reaction accelerating chemical 303r is put into the pressure vessel 301.
【００５９】これにより、圧力容器３０１内の液晶パネ
ルＬの特定原料が分解処理される。分解処理が終了した
ら、減圧弁３０８を開き、内部の処理水およびガスを冷
却器３０７により冷却しつつ導出し、気水分離器３０９
により処理水とガスに分離する。次に、液晶パネルＬの
別の原料を分解処理する場合は、再びヒーター３０４で
純水を加熱して圧力容器３０１内に注水すると共に高圧
ポンプ３０２により酸素を導入し内部を昇圧する。As a result, the specific raw material of the liquid crystal panel L in the pressure vessel 301 is decomposed. When the decomposition treatment is completed, the pressure reducing valve 308 is opened, and the treated water and gas inside are discharged while being cooled by the cooler 307, and the steam separator 309.
To separate the treated water and gas. Next, when another raw material of the liquid crystal panel L is decomposed, pure water is again heated by the heater 304 to inject water into the pressure vessel 301, and oxygen is introduced by the high pressure pump 302 to raise the pressure inside.
【００６０】そして、当該処理対象の原料の反応を促進
する反応促進薬品３０３ｓを入れた薬品タンク３０３ｂ
のバルブ３１０を開け、ポンプ３１１を駆動すること
で、反応促進薬品３０３ｓを圧力容器３０１内に投入す
る。これにより、特定の原料が分解処理される。分解処
理が終了したら、減圧弁３０８を開き、内部の処理水お
よびガスを冷却器３０７により冷却しつつ導出し、気水
分離器３０９により処理水とガスに分離する。次の原料
を処理する場合も上記同様の手順により行う。全ての処
理が終了したら、圧力容器３０１内の液晶パネルＬを取
り出して、次の処理対象となる液晶パネルＬを収納し、
上記同様の手順で処理を行う。Then, a chemical tank 303b containing a reaction accelerating chemical 303s for accelerating the reaction of the raw material to be treated.
The valve 310 is opened and the pump 311 is driven, so that the reaction promoting chemical 303s is introduced into the pressure vessel 301. As a result, the specific raw material is decomposed. When the decomposition treatment is completed, the pressure reducing valve 308 is opened, and the treated water and gas in the inside are discharged while being cooled by the cooler 307, and separated by the steam separator 309 into treated water and gas. When processing the next raw material, the same procedure as above is performed. When all the processing is completed, the liquid crystal panel L in the pressure vessel 301 is taken out, and the liquid crystal panel L to be processed next is stored,
Processing is performed in the same procedure as above.
【００６１】以上のＳＣＷＯ装置３００によれば、液晶
パネルのような異なる原料により構成された固形廃棄物
であっても、液晶パネルＬを圧力容器３０１から出すこ
となく、連続的に処理できる。この結果、処理効率が飛
躍的に向上して、資源の循環を実現できるようになる。According to the SCWO device 300 described above, even a solid waste composed of different raw materials such as a liquid crystal panel can be continuously treated without taking out the liquid crystal panel L from the pressure container 301. As a result, the processing efficiency is dramatically improved and resource circulation can be realized.
【００６２】[0062]
【発明の効果】以上説明したように、この発明の臨界水
酸化処理装置では、固形廃棄物の原料毎に用意された複
数の反応促進薬品を、臨界水酸化反応により処理する原
料毎に選択して処理容器内の臨界水に供給し、当該処理
容器に収納した固形廃棄物を処理するので、複数の原料
から構成される固形廃棄物であっても、処理容器から出
すことなく、異なる原料を連続的に処理できる。As described above, in the critical water oxidation treatment apparatus of the present invention, a plurality of reaction promoting chemicals prepared for each raw material of solid waste are selected for each raw material to be processed by the critical water oxidation reaction. Is supplied to the critical water in the treatment container to treat the solid waste stored in the treatment container, so even if the solid waste is composed of multiple raw materials, different raw materials can be used without discharging from the treatment container. It can be processed continuously.
【００６３】また、この発明の臨界水酸化処理装置で
は、臨界水に、固形廃棄物の原料毎に用意された複数の
反応促進薬品を、処理する原料毎に選択して供給し、こ
の臨界水により処理容器内の固形廃棄物を処理するの
で、複数の原料から構成される固形廃棄物であっても、
処理容器から出すことなく、異なる原料を連続的に処理
できる。また、固形廃棄物の量や寸法に合わせて処理容
器を交換できるので、汎用性を向上できる。In the critical water oxidation treatment apparatus of the present invention, a plurality of reaction accelerating chemicals prepared for each raw material of the solid waste is selected and supplied to the critical water. Since the solid waste in the processing container is treated by, even if the solid waste is composed of a plurality of raw materials,
Different raw materials can be continuously processed without taking out from the processing container. Further, since the processing container can be replaced according to the amount and size of the solid waste, versatility can be improved.
【００６４】また、この発明の臨界水酸化処理装置で
は、臨界水の化学成分を監視する監視手段を備え、監視
手段が臨界水酸化反応による処理物質を所定量検出した
場合、前記反応促進薬品供給手段の反応促進薬品を切り
換えるようにしたので、固形廃棄物を連続かつ自動的に
処理できる。Further, in the critical water oxidation treatment apparatus of the present invention, there is provided a monitoring means for monitoring the chemical composition of the critical water, and when the monitoring means detects a predetermined amount of the substance to be processed by the critical water oxidation reaction, the reaction accelerating chemical is supplied. Since the reaction accelerating chemicals of the means are switched, solid waste can be continuously and automatically treated.
【００６５】また、この発明の臨界水酸化処理装置で
は、臨界水発生手段毎に反応促進薬品供給手段が対応し
ており、固形廃棄物を収納した処理容器内に対して、構
成原料に応じた反応促進薬品を投入した臨界水を選択し
て供給するので、複数の原料から構成される固形廃棄物
であっても、処理容器から出すことなく、異なる原料を
連続的に処理できる。また、装置を減圧して処理水を抜
く作業を処理対象原料毎に行う必要がないので、処理効
率を向上できる。Further, in the critical water oxidation treatment apparatus of the present invention, the reaction accelerating chemical supply means corresponds to each critical water generating means, and depending on the constituent raw materials in the processing container containing the solid waste. Since the critical water charged with the reaction accelerating chemical is selected and supplied, different solid materials can be continuously treated without being discharged from the processing container, even if the solid waste is composed of a plurality of raw materials. Moreover, since it is not necessary to perform the work of depressurizing the apparatus to drain the treated water for each raw material to be treated, the treatment efficiency can be improved.
【００６６】また、この発明の臨界水酸化処理装置で
は、臨界水発生手段と処理容器との間で臨界水を循環さ
せるようにしたので、臨界水酸化反応の後に回収しやす
く、エネルギー効率が良くなる。Further, in the critical water oxidation treatment apparatus of the present invention, since the critical water is circulated between the critical water generating means and the processing vessel, it is easy to recover after the critical water oxidation reaction and energy efficiency is improved. Become.
【００６７】また、この発明の臨界水酸化処理装置によ
れば、反応促進薬品供給手段により、液晶パネルを構成
するＩＴＯの原料であるＩｎの反応を促進する反応促進
薬品を薬品の一つとして供給することで、液晶パネルの
連続的な処理過程の中でＩｎを回収し、再利用すること
ができる。According to the critical oxidization treatment apparatus of the present invention, the reaction accelerating chemical supply means supplies the reaction accelerating chemical that promotes the reaction of In, which is the raw material of ITO constituting the liquid crystal panel, as one of the chemicals. By doing so, In can be recovered and reused in the continuous process of the liquid crystal panel.
【００６８】また、この発明の臨界水酸化処理方法で
は、固形廃棄物に含まれる一つの原料の反応を促進する
反応促進薬品を供給して当該原料を臨界水酸化反応によ
り処理し、その後、固形廃棄物に含まれる他の原料の反
応を促進する反応促進薬品に切り換えてこれを供給し、
当該原料を臨界水酸化反応により処理するので、固形廃
棄物を原料毎に連続的に処理できる。Further, in the critical hydroxylation treatment method of the present invention, a reaction accelerating chemical that accelerates the reaction of one raw material contained in the solid waste is supplied to treat the raw material by the critical hydroxylation reaction, and thereafter, Switch to a reaction accelerating chemical that accelerates the reaction of other raw materials contained in the waste, and supply this.
Since the raw material is treated by the critical hydroxylation reaction, solid waste can be continuously treated for each raw material.
【図１】この発明の実施の形態１に係るＳＣＷＯ装置を
示す構成図である。FIG. 1 is a configuration diagram showing an SCWO device according to a first embodiment of the present invention.
【図２】図１に示したＳＣＷＯ装置の変形例を示す説明
図である。FIG. 2 is an explanatory diagram showing a modified example of the SCWO device shown in FIG.
【図３】図１に示したＳＣＷＯ装置の変形例を示す構成
図である。FIG. 3 is a configuration diagram showing a modification of the SCWO device shown in FIG.
【図４】超臨界状態および亜臨界状態を示すグラフ図で
ある。FIG. 4 is a graph showing a supercritical state and a subcritical state.
【図５】この発明の実施の形態２に係るＳＣＷＯ装置を
示す構成図である。FIG. 5 is a configuration diagram showing an SCWO device according to a second embodiment of the present invention.
【図６】この発明の実施の形態３に係るＳＣＷＯ装置を
示す構成図である。FIG. 6 is a configuration diagram showing an SCWO device according to a third embodiment of the present invention.
【図７】一般的な液晶パネルの構造を示す説明図であ
る。FIG. 7 is an explanatory diagram showing a structure of a general liquid crystal panel.
１００ ＳＣＷＯ装置 １ 圧力容器 ２ 配管 ３ 処理容器 ４ ポンプ ５、９、１４ 配管 ６ モニター装置 ７ ヒーター ８ 薬品タンク １０ バルブ １１ ポンプ １２ 酸素供給源 １３ 高圧ポンプ １５ 冷却器 １６ 減圧バルブ １７ 気水分離器 ２０ 制御装置 100 SCWO device 1 pressure vessel 2 piping 3 processing vessels 4 pumps 5, 9, 14 piping 6 Monitor device 7 heater 8 chemical tanks 10 valves 11 pumps 12 Oxygen source 13 High pressure pump 15 Cooler 16 Pressure reducing valve 17 Steam separator 20 Control device
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） Ｂ０９Ｂ 3/00 ３０４Ｐ ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) B09B 3/00 304P
Claims (8)
の固形廃棄物を収納すると共に、内部の温度および圧力
を高めて臨界状態を得る処理容器と、 固形廃棄物の原料毎に用意された複数の反応促進薬品
を、臨界水酸化反応により処理する原料毎に選択して臨
界水に供給する反応促進薬品供給手段と、を備えたこと
を特徴とする臨界水酸化処理装置。1. A processing container for accommodating a solid waste such as a liquid crystal panel composed of a plurality of raw materials and increasing the internal temperature and pressure to obtain a critical state, and prepared for each raw material of the solid waste. A critical oxidization treatment apparatus comprising: a reaction accelerating chemical supply unit that selects a plurality of reaction accelerating chemicals for each raw material to be processed by a critical hydroxylation reaction and supplies the reaction accelerating chemicals to critical water.
て臨界水を発生する臨界水発生手段と、 前記圧力容器と別体となり、臨界水発生手段から臨界水
の供給を受け且つ複数の原料から構成される液晶パネル
等の固形廃棄物を収納する処理容器と、 固形廃棄物の原料毎に用意された複数の反応促進薬品
を、臨界水酸化反応により処理する原料毎に選択して臨
界水に供給する反応促進薬品供給手段と、を備えたこと
を特徴とする臨界水酸化処理装置。2. A critical water generating unit that has a pressure vessel and raises temperature and pressure to generate critical water; and a separate unit from the pressure vessel, which receives a supply of the critical water from the critical water generating unit and is provided with a plurality of units. A processing container that stores solid waste such as liquid crystal panels composed of raw materials and a plurality of reaction accelerating chemicals prepared for each raw material of solid waste are selected for each raw material to be processed by the critical hydroxylation reaction. A critical water oxidation treatment apparatus comprising: a reaction accelerating chemical supply means for supplying to water.
て臨界水を得る臨界水発生手段と、 臨界水発生手段の圧力容器と配管を持って接続されて当
該圧力容器との間で循環系統を構成しており、且つ複数
の原料から構成される液晶パネル等の固形廃棄物を収納
する処理容器と、 固形廃棄物の原料毎に用意された複数の反応促進薬品が
それぞれの薬品タンクに入れられており、臨界水酸化反
応により処理する原料毎に選択し切り換える切換手段を
有し、当該切換手段により選択した反応促進薬品を臨界
水に供給する反応促進薬品供給手段と、 臨界水酸化処理による処理水とガスを外部に排出する排
出手段と、を備えたことを特徴とする臨界水酸化処理装
置。3. A critical water generating means having a pressure vessel for increasing temperature and pressure to obtain critical water, and a pressure vessel of the critical water generating means, which is connected with a pipe, and circulates between the pressure vessel. A processing container that configures the system and that stores solid waste such as liquid crystal panels composed of multiple raw materials, and multiple reaction accelerating chemicals prepared for each raw material of solid waste are stored in each chemical tank. It has a switching means for selecting and switching for each raw material to be processed by the critical hydroxylation reaction, a reaction promoting chemical supply means for supplying the reaction promoting chemical selected by the switching means to the critical water, and a critical hydroxylation treatment. And a discharge means for discharging treated water and gas to the outside.
段を備え、監視手段が臨界水酸化反応による処理物質を
所定量検出した場合、前記反応促進薬品供給手段の反応
促進薬品を切り換えることを特徴とする請求項１〜３の
いずれか一つに記載の臨界水酸化処理装置。4. A monitoring means for monitoring the chemical component of the critical water is provided, and when the monitoring means detects a predetermined amount of a substance to be treated by the critical hydroxylation reaction, the reaction accelerating chemical of the reaction accelerating chemical supply means is switched. The critical water oxidation treatment apparatus according to any one of claims 1 to 3, which is characterized in that.
て臨界水を得る複数の臨界水発生手段と、 固形廃棄物の原料毎に用意された複数の反応促進薬品
を、前記それぞれの臨界水発生手段の臨界水に供給する
複数の反応促進薬品供給手段と、 各臨界水発生手段から選択的に臨界水の供給を受け、且
つ複数の原料から構成される液晶パネル等の固形廃棄物
を収納する処理容器と、を備えたことを特徴とする臨界
水酸化処理装置。5. A plurality of critical water generating means having a pressure vessel for increasing the temperature and pressure to obtain critical water, and a plurality of reaction accelerating chemicals prepared for each raw material of solid waste are added to the respective critical waters. A plurality of reaction-promoting chemicals supplying means for supplying the critical water of the water generating means, and a solid waste such as a liquid crystal panel which is selectively supplied with the critical water from each of the critical water generating means and which is composed of a plurality of raw materials. A critical water oxidation treatment apparatus comprising: a treatment container that is stored.
の間で臨界水を循環させるようにしたことを特徴とする
請求項２、４または５に記載の臨界水酸化処理装置。6. The critical water oxidation treatment apparatus according to claim 2, wherein the critical water is circulated between the critical water generating means and the processing container.
応促進薬品供給手段が、液晶パネルを構成するＩＴＯの
原料であるＩｎの反応を促進する反応促進薬品を薬品の
一つとして供給することを特徴とする請求項１〜６のい
ずれか一つに記載の臨界水酸化処理装置。7. The solid waste is a liquid crystal panel, and the reaction-promoting chemical supply means supplies, as one of the chemicals, a reaction-promoting chemical that promotes a reaction of In, which is a raw material of ITO forming the liquid crystal panel. 7. The critical water oxidation treatment apparatus according to any one of claims 1 to 6.
の固形廃棄物を収納する処理容器に対して臨界水を導入
するにあたり、 固形廃棄物に含まれる一つの原料の反応を促進する反応
促進薬品を供給して当該原料を臨界水酸化反応により処
理する第一処理手順と、 この第一処理手順の後、固形廃棄物に含まれる他の原料
の反応を促進する反応促進薬品に切り換えてこれを供給
し、当該原料を臨界水酸化反応により処理する第二処理
手順と、を少なくとも含むことを特徴とする臨界水酸化
処理方法。8. A reaction promotion for promoting the reaction of one raw material contained in solid waste when introducing critical water into a processing container containing solid waste such as a liquid crystal panel composed of a plurality of raw materials. A first treatment procedure in which a chemical is supplied to treat the raw material by a critical hydroxylation reaction, and after this first treatment procedure, a reaction-promoting chemical that promotes the reaction of other raw materials contained in the solid waste is switched to And a second treatment procedure in which the raw material is treated by a critical hydroxylation reaction.
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| JP2001294710A JP3969040B2 (en) | 2001-09-26 | 2001-09-26 | Critical water treatment apparatus and method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001294710A JP3969040B2 (en) | 2001-09-26 | 2001-09-26 | Critical water treatment apparatus and method |
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| JP3969040B2 JP3969040B2 (en) | 2007-08-29 |
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| JP2001294710A Expired - Fee Related JP3969040B2 (en) | 2001-09-26 | 2001-09-26 | Critical water treatment apparatus and method |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010090218A1 (en) * | 2009-02-04 | 2010-08-12 | 公立大学法人大阪府立大学 | Method for separating/recovering glass and transparent electrode material from liquid crystal panel |
| CN104646395A (en) * | 2015-01-30 | 2015-05-27 | 上海交通大学 | Device and method for recovering acetic acid from waste liquid crystal panel through subcritical/supercritical water method |
| CN104962746A (en) * | 2015-07-20 | 2015-10-07 | 上海交通大学 | Device and method for extracting metals from electronic waste by supercritical water process |
-
2001
- 2001-09-26 JP JP2001294710A patent/JP3969040B2/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010090218A1 (en) * | 2009-02-04 | 2010-08-12 | 公立大学法人大阪府立大学 | Method for separating/recovering glass and transparent electrode material from liquid crystal panel |
| JP5385924B2 (en) * | 2009-02-04 | 2014-01-08 | 公立大学法人大阪府立大学 | Separation and recovery method of glass and transparent electrode material from liquid crystal panel |
| CN104646395A (en) * | 2015-01-30 | 2015-05-27 | 上海交通大学 | Device and method for recovering acetic acid from waste liquid crystal panel through subcritical/supercritical water method |
| CN104646395B (en) * | 2015-01-30 | 2018-01-23 | 上海交通大学 | Asia/overcritical water law reclaims the device and method of acetic acid from discarded liquid crystal panel |
| CN104962746A (en) * | 2015-07-20 | 2015-10-07 | 上海交通大学 | Device and method for extracting metals from electronic waste by supercritical water process |
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| Publication number | Publication date |
|---|---|
| JP3969040B2 (en) | 2007-08-29 |
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