JP2003092252A5 - - Google Patents
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- JP2003092252A5 JP2003092252A5 JP2001283152A JP2001283152A JP2003092252A5 JP 2003092252 A5 JP2003092252 A5 JP 2003092252A5 JP 2001283152 A JP2001283152 A JP 2001283152A JP 2001283152 A JP2001283152 A JP 2001283152A JP 2003092252 A5 JP2003092252 A5 JP 2003092252A5
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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JP2001283152A JP2003092252A (en) | 2001-09-18 | 2001-09-18 | Semiconductor exposure method and semiconductor projection aligner |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001283152A JP2003092252A (en) | 2001-09-18 | 2001-09-18 | Semiconductor exposure method and semiconductor projection aligner |
Publications (2)
Publication Number | Publication Date |
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JP2003092252A JP2003092252A (en) | 2003-03-28 |
JP2003092252A5 true JP2003092252A5 (en) | 2008-11-06 |
Family
ID=19106690
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001283152A Pending JP2003092252A (en) | 2001-09-18 | 2001-09-18 | Semiconductor exposure method and semiconductor projection aligner |
Country Status (1)
Country | Link |
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JP (1) | JP2003092252A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9703214B2 (en) * | 2013-07-19 | 2017-07-11 | Canon Kabushiki Kaisha | Lithography apparatus, lithography method, and article manufacturing method |
JP6448220B2 (en) | 2014-05-22 | 2019-01-09 | キヤノン株式会社 | Exposure apparatus, exposure method, and device manufacturing method |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10284396A (en) * | 1997-04-03 | 1998-10-23 | Nikon Corp | Method for alignment and method for measuring alignment precision |
JPH11145029A (en) * | 1997-11-05 | 1999-05-28 | Sony Corp | Alignment measuring equipment |
JP3003694B2 (en) * | 1998-12-07 | 2000-01-31 | 株式会社ニコン | Projection exposure equipment |
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2001
- 2001-09-18 JP JP2001283152A patent/JP2003092252A/en active Pending