JP2003078819A - Solid-state imaging device and method for sweeping out electric charge - Google Patents
Solid-state imaging device and method for sweeping out electric chargeInfo
- Publication number
- JP2003078819A JP2003078819A JP2001261025A JP2001261025A JP2003078819A JP 2003078819 A JP2003078819 A JP 2003078819A JP 2001261025 A JP2001261025 A JP 2001261025A JP 2001261025 A JP2001261025 A JP 2001261025A JP 2003078819 A JP2003078819 A JP 2003078819A
- Authority
- JP
- Japan
- Prior art keywords
- transfer register
- semiconductor substrate
- voltage
- solid
- photosensor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010408 sweeping Methods 0.000 title claims abstract description 17
- 238000000034 method Methods 0.000 title claims description 12
- 238000003384 imaging method Methods 0.000 title claims description 10
- 239000000758 substrate Substances 0.000 claims abstract description 39
- 239000004065 semiconductor Substances 0.000 claims description 31
- 239000011159 matrix material Substances 0.000 claims description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000003491 array Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
Landscapes
- Transforming Light Signals Into Electric Signals (AREA)
- Solid State Image Pick-Up Elements (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、各種イメージセン
サに用いられる固体撮像素子に関し、特にフォトセンサ
の露光前の不要電荷掃き捨て方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a solid-state image pickup device used in various image sensors, and more particularly to a method of sweeping away unnecessary charges before exposure of a photosensor.
【0002】[0002]
【従来の技術】従来より、この種の固体撮像素子は、半
導体基板上に2次元マトリクス状に配列された複数のフ
ォトセンサと、このフォトセンサの各列毎に設けられた
複数の垂直転送レジスタと、この垂直転送レジスタから
の信号電荷を出力部に転送する水平転送レジスタと、信
号電荷を電圧信号に変換する出力部とを有し、フォトセ
ンサの露光によって生成される信号電荷を垂直転送レジ
スタに読み出して水平転送レジスタに順次転送し、さら
に、この信号電荷を水平転送レジスタから出力部に順次
転送することで、信号電荷を順次電圧信号に変換し、撮
像信号として出力するようになっている。2. Description of the Related Art Conventionally, this type of solid-state image pickup device has a plurality of photosensors arranged in a two-dimensional matrix on a semiconductor substrate and a plurality of vertical transfer registers provided for each column of the photosensors. And a horizontal transfer register for transferring the signal charge from the vertical transfer register to the output unit, and an output unit for converting the signal charge into a voltage signal, and the signal charge generated by the exposure of the photosensor is transferred to the vertical transfer register. Then, the signal charges are sequentially transferred to the horizontal transfer register, and further, the signal charges are sequentially transferred from the horizontal transfer register to the output section, whereby the signal charges are sequentially converted into a voltage signal and output as an imaging signal. .
【0003】[0003]
【発明が解決しようとする課題】ところで、上述のよう
な固体撮像素子においては、フォトセンサに溜った不要
な信号電荷を半導体基板にある一定以上の電圧を加え
る、いわゆる電子シャッタ機能を用いて半導体基板側に
掃き捨てることが可能であるが、垂直転送レジスタに留
まっている不要信号電荷については、水平転送レジスタ
への掃き捨て転送を行う方法しかなく、不要信号電荷の
掃き捨てに水平転送レジスタへの転送時間分だけ時間を
要してした。By the way, in the solid-state image pickup device as described above, a semiconductor is formed by using a so-called electronic shutter function in which unnecessary signal charges accumulated in the photosensor are applied to the semiconductor substrate with a voltage higher than a certain level. It is possible to sweep to the substrate side, but for unnecessary signal charge remaining in the vertical transfer register, there is only a way to perform sweep transfer to the horizontal transfer register. It took only the transfer time.
【0004】図3は、従来の電荷掃き捨て動作を示すタ
イミングチャートである。まず、露光前にフォトセンサ
の電荷の掃き捨てを行うため半導体基板に電圧パルスφ
SUBを立てる。その後、各垂直転送レジスタの各クロ
ックパルスVφ1、Vφ2、Vφ3によって信号電荷の
高速転送を行い、垂直転送レジスタの電荷を掃き捨て
る。このように、フォトセンサの露光前に、信号電荷の
掃き捨てを行う場合に、垂直転動レジスタの転送動作が
必要となり、ある程度の時間が必要となる。例えば、カ
メラの連写を行う場合に、露光前に、この掃き捨て転送
を行わなければならず、連写スピードを落としてしま
う。FIG. 3 is a timing chart showing a conventional charge sweeping operation. First, a voltage pulse φ is applied to the semiconductor substrate in order to sweep away the charge of the photo sensor before exposure.
Set up SUB. After that, high-speed transfer of signal charges is performed by each clock pulse Vφ1, Vφ2, Vφ3 of each vertical transfer register, and the charges of the vertical transfer register are swept away. As described above, when the signal charges are swept away before the exposure of the photosensor, the transfer operation of the vertical rolling register is required, and a certain amount of time is required. For example, when performing continuous shooting with a camera, this sweep-away transfer must be performed before exposure, which slows down the continuous shooting speed.
【0005】そこで本発明の目的は、転送レジスタの転
送動作を行うことなく、信号電荷の掃き捨てを行うこと
ができ、動作時間の短縮を図ることが可能な固体撮像素
子及びその電荷掃き捨て方法を提供することにある。Therefore, an object of the present invention is to remove the signal charges without performing the transfer operation of the transfer register, and to shorten the operation time, and the solid-state image pickup device and the charge cleaning method. To provide.
【0006】[0006]
【課題を解決するための手段】上記目的を達成するた
め、本発明は、半導体基板に複数のフォトセンサと、前
記フォトセンサの信号電荷を出力部に転送する転送レジ
スタと、前記信号電荷を電圧信号に変換する出力部とを
有し、前記フォトセンサの露光によって生成される信号
電荷を前記転送レジスタに読み出して出力部に転送する
固体撮像素子において、前記フォトセンサの露光前に、
前記転送レジスタの駆動電圧をオフした後、前記半導体
基板に大電圧をかけ、フォトセンサ及び転送レジスタに
貯留した信号電荷を一度に半導体基板側に掃き捨てるこ
とを特徴とする。In order to achieve the above object, the present invention provides a plurality of photosensors on a semiconductor substrate, a transfer register for transferring signal charges of the photosensors to an output section, and a voltage for the signal charges. In a solid-state imaging device having an output unit for converting into a signal, reading the signal charge generated by the exposure of the photosensor to the transfer register and transferring the signal charge to the output unit, before the exposure of the photosensor,
After turning off the drive voltage of the transfer register, a large voltage is applied to the semiconductor substrate to sweep out the signal charges stored in the photosensor and the transfer register to the semiconductor substrate side at once.
【0007】また本発明は、半導体基板に複数のフォト
センサと、前記フォトセンサの信号電荷を出力部に転送
する転送レジスタと、前記信号電荷を電圧信号に変換す
る出力部とを有し、前記フォトセンサの露光によって生
成される信号電荷を前記転送レジスタに読み出して出力
部に転送する固体撮像素子の電荷掃き捨て方法におい
て、前記フォトセンサの露光前に、前記転送レジスタの
駆動電圧をオフする第1の動作ステップと、前記半導体
基板に大電圧をかけ、フォトセンサ及び転送レジスタに
貯留した信号電荷を一度に半導体基板側に掃き捨てる第
2の動作ステップとを有することを特徴とする。According to the present invention, a semiconductor substrate has a plurality of photosensors, a transfer register for transferring the signal charges of the photosensors to an output section, and an output section for converting the signal charges into a voltage signal. A method of sweeping out a charge of a solid-state imaging device, which reads out a signal charge generated by exposure of a photosensor to a transfer register and transfers the signal charge to an output unit, in which a drive voltage of the transfer register is turned off before exposure of the photosensor. 1) and a second operation step in which a large voltage is applied to the semiconductor substrate and the signal charges stored in the photosensor and the transfer register are swept to the semiconductor substrate side at a time.
【0008】本発明の固体撮像素子においては、フォト
センサの露光前に、まず、転送レジスタの駆動電圧をオ
フし、電荷が溜りにくく、かつ、暗電流が発生しにくい
状態とする。その後、半導体基板に大電圧をかけ、フォ
トセンサ及び転送レジスタに貯留した信号電荷を一度に
半導体基板側に掃き捨てる。この後、フォトセンサの露
光動作を行う。これにより、転送レジスタの転送動作を
行うことなく、フォトセンサの露光前にフォトセンサ及
び転送レジスタの信号電荷を一括して掃き捨てることが
でき、動作時間の短縮を図ることが可能となる。In the solid-state image pickup device of the present invention, before the exposure of the photosensor, the drive voltage of the transfer register is first turned off so that the electric charge is less likely to be accumulated and the dark current is less likely to occur. After that, a large voltage is applied to the semiconductor substrate, and the signal charges stored in the photosensor and the transfer register are swept away to the semiconductor substrate side at once. After that, the exposure operation of the photo sensor is performed. Thus, the signal charges of the photosensor and the transfer register can be collectively swept away before the exposure of the photosensor without performing the transfer operation of the transfer register, and the operation time can be shortened.
【0009】本発明の電荷掃き捨て方法においては、フ
ォトセンサの露光前に、まず、第1の動作ステップで転
送レジスタの駆動電圧をオフし、電荷が溜りにくく、か
つ、暗電流が発生しにくい状態とする。その後、第2の
動作ステップで半導体基板に大電圧をかけ、フォトセン
サ及び転送レジスタに貯留した信号電荷を一度に半導体
基板側に掃き捨てる。この後、フォトセンサの露光動作
を行う。これにより、転送レジスタの転送動作を行うこ
となく、フォトセンサの露光前にフォトセンサ及び転送
レジスタの信号電荷を一括して掃き捨てることができ、
動作時間の短縮を図ることが可能となる。In the charge sweeping method of the present invention, before the photosensor is exposed, first, the drive voltage of the transfer register is turned off in the first operation step so that the charge is less likely to accumulate and the dark current is less likely to occur. State. After that, in the second operation step, a large voltage is applied to the semiconductor substrate, and the signal charges stored in the photo sensor and the transfer register are swept away to the semiconductor substrate side at once. After that, the exposure operation of the photo sensor is performed. As a result, the signal charges of the photosensor and the transfer register can be collectively swept away before the exposure of the photosensor without performing the transfer operation of the transfer register.
It is possible to reduce the operation time.
【0010】[0010]
【発明の実施の形態】以下、本発明の実施の形態につい
て図面を参照して詳細に説明する。なお、以下に説明す
る実施の形態は、本発明の好適な具体例であり、技術的
に好ましい種々の限定が付されているが、本発明の範囲
は、以下の説明において、特に本発明を限定する旨の記
載がない限り、これらの態様に限定されないものとす
る。BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. The embodiments described below are preferred specific examples of the present invention, and various technically preferable limitations are given. However, the scope of the present invention is not limited to the present invention in the following description. Unless otherwise stated, the present invention is not limited to these embodiments.
【0011】本実施の形態は、半導体基板上に多数のフ
ォトセンサをマトリクス状に配置し、各フォトセンサで
生成した信号電荷を垂直転送レジスタ及び水平転送レジ
スタによって出力部に転送し、この出力部で電荷−電圧
変換を行うことにより、撮像信号として出力する2次元
イメージセンサに適用したものであり、この2次元イメ
ージセンサにおけるフォトセンサの露光前の電荷の掃き
捨てを、垂直転送レジスタの転送動作を行うことなく実
現するため、まず、垂直転送レジスタの駆動電圧を全て
オフ、すなわちローレベルに設定することにより、転送
路に電荷を貯めにくい状態とし、次に、フォトセンサの
電子シャッタ機能よりも大きな電圧を半導体基板にかけ
ることにより、フォトセンサの電荷だけでなく、垂直転
送レジスタの電荷も一括して半導体基板側に掃き捨てる
ようにしたものである。In this embodiment, a large number of photosensors are arranged in a matrix on a semiconductor substrate, and signal charges generated by each photosensor are transferred to an output section by a vertical transfer register and a horizontal transfer register. The present invention is applied to a two-dimensional image sensor that outputs an image pickup signal by performing charge-to-voltage conversion in the above. The sweeping-out of the charge before exposure of the photosensor in this two-dimensional image sensor is performed by the vertical transfer register transfer operation. In order to realize without performing the above, first, all the drive voltages of the vertical transfer registers are turned off, that is, set to the low level, so that it is difficult to store the charges in the transfer path, and then the electronic shutter function of the photo sensor is used. By applying a large voltage to the semiconductor substrate, not only the charge of the photo sensor but also the charge of the vertical transfer register Collectively it is obtained as swept into the semiconductor substrate side.
【0012】まず、本発明の特徴となる電荷の掃き捨て
動作の説明に先立って、本実施の形態における2次元イ
メージセンサの概要について説明する。図1は、本実施
の形態による2次元イメージセンサの構成を示す概略平
面図である。この2次元イメージセンサは、シリコン基
板等よりなる素子チップ300上に被写体を撮像する撮
像部100と、この撮像部100による撮像信号を外部
に出力する出力部200とを設けたものである。撮像部
100は、垂直(V)方向と水平(H)方向の2次元マ
トリクス状に配列された多数の単位画素を構成するフォ
トセンサ110と、垂直方向の各フォトセンサ列毎に配
置され、各フォトセンサ110の信号電荷を垂直方向に
転送する複数の垂直転送レジスタ120とを有してい
る。また、撮像部100の側部には、各垂直転送レジス
タ120から転送されてきた信号電荷を水平方向に転送
する水平転送レジスタ130が配置され、この水平転送
レジスタ130の終端部に出力部200が設けられてい
る。また、撮像部100の上面には、図示しないオンチ
ップレンズ(OCL)やカラーフィルタ等が配置され、
各フォトセンサ110の受光部に対する光の入射を制御
している。First, an outline of the two-dimensional image sensor according to the present embodiment will be described prior to the description of the charge sweeping operation which is a feature of the present invention. FIG. 1 is a schematic plan view showing the configuration of the two-dimensional image sensor according to this embodiment. This two-dimensional image sensor is provided with an image pickup section 100 for picking up an image of a subject on an element chip 300 made of a silicon substrate, and an output section 200 for outputting an image pickup signal from the image pickup section 100 to the outside. The image pickup unit 100 includes photosensors 110 that form a large number of unit pixels arranged in a two-dimensional matrix in the vertical (V) direction and the horizontal (H) direction, and are arranged for each photosensor column in the vertical direction. It has a plurality of vertical transfer registers 120 for vertically transferring the signal charges of the photo sensor 110. In addition, a horizontal transfer register 130 that horizontally transfers the signal charges transferred from each vertical transfer register 120 is arranged on the side of the imaging unit 100, and the output unit 200 is provided at the end of the horizontal transfer register 130. It is provided. On the upper surface of the image pickup unit 100, an on-chip lens (OCL), a color filter, etc., which are not shown, are arranged,
The incidence of light on the light receiving portion of each photo sensor 110 is controlled.
【0013】このような2次元イメージセンサでは、フ
ォトセンサ110によって蓄積された信号電荷を読み出
しゲート(図示せず)を介して垂直転送レジスタ120
に読み出し、この信号電荷を垂直方向に順次転送する。
そして、この垂直転送レジスタ120から転送された信
号電荷を読み出しゲートを介して水平転送レジスタ13
0に順次読み出し、これを水平方向に順次転送して出力
部200に送る。出力部200では、水平転送レジスタ
130によって転送されてきた信号電荷を電圧信号に変
換して出力する。In such a two-dimensional image sensor, the signal charge accumulated by the photosensor 110 is read out through a vertical transfer register 120 via a read gate (not shown).
, And the signal charges are sequentially transferred in the vertical direction.
Then, the signal charge transferred from the vertical transfer register 120 is read out through the horizontal transfer register 13 via the read gate.
The data is sequentially read out to 0, sequentially transferred in the horizontal direction, and sent to the output unit 200. The output unit 200 converts the signal charge transferred by the horizontal transfer register 130 into a voltage signal and outputs the voltage signal.
【0014】次に、以上のような本例の2次元イメージ
センサにおけるフォトセンサの露光前の不要電荷掃き捨
て方法について説明する。図2は、本例の2次元イメー
ジセンサにおける電荷掃き捨て動作を示すタイミングチ
ャートである。本例の2次元イメージセンサでは、例え
ばデジタルカメラのメカニカルシャッタオープンによる
フォトセンサ110の露光前に、垂直転送レジスタ12
0の駆動電圧をローレベルにオフする第1の動作ステッ
プと、素子チップ300のシリコン基板に電子シャッタ
機能より大きい大電圧をかけ、フォトセンサ110及び
垂直転送レジスタ120に貯留した信号電荷を一度にシ
リコン基板側に掃き捨てる第2の動作ステップとによっ
て不要電荷の掃き捨て動作を行うものである。Next, a method of sweeping away unnecessary electric charges before exposure of the photosensor in the above-described two-dimensional image sensor of this example will be described. FIG. 2 is a timing chart showing the charge sweeping operation in the two-dimensional image sensor of this example. In the two-dimensional image sensor of this example, the vertical transfer register 12 is exposed before the photosensor 110 is exposed by opening the mechanical shutter of the digital camera, for example.
The first operation step of turning off the drive voltage of 0 to a low level, and applying a large voltage larger than the electronic shutter function to the silicon substrate of the element chip 300, the signal charges stored in the photo sensor 110 and the vertical transfer register 120 are simultaneously The second operation step of sweeping away to the silicon substrate side is performed to sweep away unnecessary charges.
【0015】すなわち、図2において、メカニカルシャ
ッタをクローズした状態で、フォトセンサ110及び垂
直転送レジスタ120内の電荷を同時に掃き捨てるた
め、まず、垂直転送レジスタ120の駆動電圧となるク
ロックパルスVφ1、Vφ2、Vφ3をローレベルに設
定し、垂直転送レジスタ120内に電荷を溜りにくくか
つ、暗電流の発生を防ぐ。すなわち、図3に示す従来例
では、露光前の状態で、逆極性のクロックパルスVφ2
がオン(ハイレベル)になっているが、本例では、この
クロックパルスVφ2を他のクロックパルスVφ1、V
φ3と同様にオフ(ローレベル)に制御する。That is, in FIG. 2, in order to simultaneously sweep away the charges in the photosensor 110 and the vertical transfer register 120 with the mechanical shutter closed, first, clock pulses Vφ1 and Vφ2 serving as the drive voltage of the vertical transfer register 120. , Vφ3 is set to a low level to prevent charges from accumulating in the vertical transfer register 120 and to prevent generation of dark current. That is, in the conventional example shown in FIG. 3, in the state before exposure, the clock pulse V.phi.
Is on (high level), but in the present example, this clock pulse Vφ2 is replaced with other clock pulses Vφ1, Vφ1.
Similar to φ3, it is controlled to off (low level).
【0016】次に、電圧パルスφSUBをオンし、素子
チップ300の基板に大きな電圧をかけることにより、
フォトセンサ110及び垂直転送レジスタ120の電荷
を基板側に一機に排出させる。これにより、垂直転送レ
ジスタ120の電荷を、水平転送レジスタ130に向け
て掃き捨て転送することなく、素子チップ300の基板
側に掃き捨てることができる。この後、メカニカルシャ
ッタをオープンして所定期間の露光を行い、クロックパ
ルスVφ1による読み出しゲートパルスをオンして、フ
ォトセンサ110に蓄積された信号電荷を垂直転送レジ
スタ120に読み出す。そして、クロックパルスVφ
1、Vφ2、Vφ3を作動させて、垂直転送レジスタ1
20による転送を行う。ここで、クロックパルスVφ2
はクロックパルスVφ1、Vφ3に対して同極性の動作
となる。Next, by turning on the voltage pulse φSUB and applying a large voltage to the substrate of the element chip 300,
The charges of the photo sensor 110 and the vertical transfer register 120 are discharged to the substrate side. As a result, the charges of the vertical transfer register 120 can be swept to the substrate side of the element chip 300 without being swept and transferred to the horizontal transfer register 130. After that, the mechanical shutter is opened to perform exposure for a predetermined period, the read gate pulse by the clock pulse Vφ1 is turned on, and the signal charge accumulated in the photosensor 110 is read to the vertical transfer register 120. Then, the clock pulse Vφ
1, Vφ2, Vφ3 are activated to activate the vertical transfer register 1
20 transfer is performed. Here, the clock pulse Vφ2
Are of the same polarity with respect to the clock pulses Vφ1 and Vφ3.
【0017】以上のような2次元イメージセンサを例え
ばデジタルカメラに用いた場合、次のようなメリットを
得ることが可能である。すなわち、従来のデジタルカメ
ラでは、1ショット画像を取り込む場合、垂直転送レジ
スタのダーク成分を水平転送レジスタに掃き捨て転送を
行い、その後、画像を取り込む露光を行っていたが、こ
の方法では、連続取り込みを行った場合に垂直転送レジ
スタの電荷掃き捨てに時間がかかり、カメラの重要性能
である連写コマ数を低下させていた。これに対し、本例
の構成を用いた場合、垂直転送レジスタの電荷もフォト
センサと一括して掃き捨てる方法を採用することによ
り、フォトセンサと垂直転送レジスタの電荷を同時に掃
き捨てることが可能となり、掃き捨て転送の時間をロス
することがなくなり、連写コマ数の低下を防止できる。When the above two-dimensional image sensor is used in a digital camera, for example, the following merits can be obtained. That is, in the conventional digital camera, when capturing a one-shot image, the dark component of the vertical transfer register was swept to the horizontal transfer register for transfer, and then exposure for capturing the image was performed. In this case, it took a long time to sweep away the charges from the vertical transfer register, which reduced the number of continuous shooting frames, which is an important performance of the camera. On the other hand, when the configuration of this example is used, it is possible to sweep away the charges of the photo sensor and the vertical transfer register at the same time by adopting the method of sweeping out the charges of the vertical transfer register together with the photo sensor. , It is possible to prevent the time of sweep-out transfer from being lost and to prevent the number of continuous shooting frames from decreasing.
【0018】なお、本発明の固体撮像素子は、上述のよ
うなデジタルカメラ以外の撮像装置に用いることも可能
であり、また、2次元イメージセンサではなく、例えば
複数本のセンサ列による撮像信号を個別に出力するよう
なラインセンサに用いても良い。また、本発明にかかる
固体撮像素子は、上記図1に示す構成のものに限定され
ず、本発明の要旨を逸脱しない範囲でさらに種々の変形
が可能である。The solid-state image pickup device of the present invention can be used in an image pickup device other than the above-mentioned digital camera, and instead of a two-dimensional image sensor, for example, an image pickup signal from a plurality of sensor arrays is used. You may use for the line sensor which outputs individually. Further, the solid-state imaging device according to the present invention is not limited to the one having the configuration shown in FIG. 1, and various modifications can be made without departing from the gist of the present invention.
【0019】[0019]
【発明の効果】以上のように、本発明の固体撮像素子に
よれば、フォトセンサの露光前に、まず、転送レジスタ
の駆動電圧をオフし、電荷が溜りにくく、かつ、暗電流
が発生しにくい状態とし、その後、半導体基板に大電圧
をかけ、フォトセンサ及び転送レジスタに貯留した信号
電荷を一度に半導体基板側に掃き捨てるようにしたこと
から、転送レジスタの転送動作を行うことなく、フォト
センサの露光前にフォトセンサ及び転送レジスタの信号
電荷を一括して掃き捨てることができ、動作時間の短縮
を図ることができる。As described above, according to the solid-state image pickup device of the present invention, before the exposure of the photosensor, the drive voltage of the transfer register is first turned off so that the charge is less likely to be accumulated and the dark current is generated. After that, the semiconductor substrate was applied with a large voltage to sweep out the signal charges stored in the photosensor and the transfer register to the semiconductor substrate side at a time. Before the exposure of the sensor, the signal charges of the photo sensor and the transfer register can be collectively swept away, and the operation time can be shortened.
【0020】本発明の電荷掃き捨て方法によれば、フォ
トセンサの露光前に、まず、第1の動作ステップで転送
レジスタの駆動電圧をオフし、電荷が溜りにくく、か
つ、暗電流が発生しにくい状態とし、その後、第2の動
作ステップで半導体基板に大電圧をかけ、フォトセンサ
及び転送レジスタに貯留した信号電荷を一度に半導体基
板側に掃き捨てるようにしたことから、転送レジスタの
転送動作を行うことなく、フォトセンサの露光前にフォ
トセンサ及び転送レジスタの信号電荷を一括して掃き捨
てることができ、動作時間の短縮を図ることができる。According to the charge sweep-away method of the present invention, before the exposure of the photosensor, the drive voltage of the transfer register is first turned off in the first operation step so that the charge is less likely to be accumulated and the dark current is generated. In the second operation step, a large voltage is applied to the semiconductor substrate so that the signal charges stored in the photosensor and the transfer register are swept away to the semiconductor substrate side at a time. It is possible to collectively sweep out the signal charges of the photosensor and the transfer register before the exposure of the photosensor without performing the above, and to shorten the operation time.
【図1】本発明の実施の形態による2次元イメージセン
サの構成を示す概略平面図である。FIG. 1 is a schematic plan view showing a configuration of a two-dimensional image sensor according to an embodiment of the present invention.
【図2】図1に示す2次元イメージセンサにおける電荷
掃き捨て動作を示すタイミングチャートである。2 is a timing chart showing a charge sweeping operation in the two-dimensional image sensor shown in FIG.
【図3】従来の2次元イメージセンサにおける電荷掃き
捨て動作を示すタイミングチャートである。FIG. 3 is a timing chart showing a charge sweeping operation in the conventional two-dimensional image sensor.
100……撮像部、110……フォトセンサ、120…
…垂直転送レジスタ、130……水平転送レジスタ、2
00……出力部、300……素子チップ。100 ... Imaging unit, 110 ... Photo sensor, 120 ...
... Vertical transfer register, 130 ... Horizontal transfer register, 2
00 ... Output part, 300 ... Element chip.
Claims (8)
記フォトセンサの信号電荷を出力部に転送する転送レジ
スタと、前記信号電荷を電圧信号に変換する出力部とを
有し、前記フォトセンサの露光によって生成される信号
電荷を前記転送レジスタに読み出して出力部に転送する
固体撮像素子において、 前記フォトセンサの露光前に、前記転送レジスタの駆動
電圧をオフした後、前記半導体基板に大電圧をかけ、フ
ォトセンサ及び転送レジスタに貯留した信号電荷を一度
に半導体基板側に掃き捨てる、 ことを特徴とする固体撮像素子。1. A semiconductor substrate having a plurality of photosensors, a transfer register for transferring signal charges of the photosensors to an output unit, and an output unit for converting the signal charges into a voltage signal. In a solid-state imaging device that reads out signal charges generated by exposure to the transfer register and transfers the signal charge to an output unit, a high voltage is applied to the semiconductor substrate after the drive voltage of the transfer register is turned off before the exposure of the photosensor. A solid-state image pickup device characterized in that the signal charges accumulated in the photosensor and the transfer register are swept away to the semiconductor substrate side at a time.
マトリクス状に配列され、前記転送レジスタは、前記フ
ォトセンサの各列毎に設けられた複数の垂直転送レジス
タと、前記垂直転送レジスタからの信号電荷を出力部に
転送する水平転送レジスタとを有することを特徴とする
請求項1記載の固体撮像素子。2. The photosensors are arranged in a two-dimensional matrix on a semiconductor substrate, and the transfer registers include a plurality of vertical transfer registers provided for each column of the photosensors and signals from the vertical transfer registers. The solid-state imaging device according to claim 1, further comprising a horizontal transfer register that transfers charges to an output unit.
駆動電圧をローレベルに制御する動作であることを特徴
とする請求項1記載の固体撮像素子。3. The driving voltage of the transfer register is turned off by
The solid-state image sensor according to claim 1, wherein the operation is an operation of controlling the drive voltage to a low level.
トセンサの電子シャッタ機能よりも十分大きい電圧であ
ることを特徴とする請求項1記載の固体撮像素子。4. The solid-state image sensor according to claim 1, wherein the large voltage applied to the semiconductor substrate is a voltage sufficiently higher than the electronic shutter function of the photo sensor.
記フォトセンサの信号電荷を出力部に転送する転送レジ
スタと、前記信号電荷を電圧信号に変換する出力部とを
有し、前記フォトセンサの露光によって生成される信号
電荷を前記転送レジスタに読み出して出力部に転送する
固体撮像素子の電荷掃き捨て方法において、 前記フォトセンサの露光前に、前記転送レジスタの駆動
電圧をオフする第1の動作ステップと、 前記半導体基板に大電圧をかけ、フォトセンサ及び転送
レジスタに貯留した信号電荷を一度に半導体基板側に掃
き捨てる第2の動作ステップと、 を有することを特徴とする固体撮像素子の電荷掃き捨て
方法。5. A semiconductor substrate having a plurality of photosensors, a transfer register for transferring signal charges of the photosensors to an output unit, and an output unit for converting the signal charges into a voltage signal. A method of sweeping out a charge of a solid-state imaging device, which reads out a signal charge generated by exposure to the transfer register and transfers the signal charge to an output unit, the first operation of turning off a drive voltage of the transfer register before exposure of the photosensor. And a second operation step in which a large voltage is applied to the semiconductor substrate and signal charges stored in the photosensor and the transfer register are swept away to the semiconductor substrate side at one time. How to sweep away.
マトリクス状に配列され、前記転送レジスタは、前記フ
ォトセンサの各列毎に設けられた複数の垂直転送レジス
タと、前記垂直転送レジスタからの信号電荷を出力部に
転送する水平転送レジスタとを有することを特徴とする
請求項5記載の固体撮像素子の電荷掃き捨て方法。6. The photosensors are arranged in a two-dimensional matrix on a semiconductor substrate, and the transfer registers include a plurality of vertical transfer registers provided for each column of the photosensors and signals from the vertical transfer registers. 6. A method for sweeping away charges from a solid-state image sensor according to claim 5, further comprising a horizontal transfer register for transferring charges to the output section.
駆動電圧をローレベルに制御する動作であることを特徴
とする請求項5記載の固体撮像素子の電荷掃き捨て方
法。7. The driving voltage of the transfer register is turned off by
6. The method for sweeping away charges from a solid-state image sensor according to claim 5, wherein the driving voltage is controlled to a low level.
トセンサの電子シャッタ機能よりも十分大きい電圧であ
ることを特徴とする請求項5記載の固体撮像素子の電荷
掃き捨て方法。8. The method for sweeping away charges from a solid-state image pickup device according to claim 5, wherein the large voltage applied to the semiconductor substrate is a voltage sufficiently higher than the electronic shutter function of the photosensor.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001261025A JP4696426B2 (en) | 2001-08-30 | 2001-08-30 | Solid-state imaging device and charge sweeping method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001261025A JP4696426B2 (en) | 2001-08-30 | 2001-08-30 | Solid-state imaging device and charge sweeping method thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2003078819A true JP2003078819A (en) | 2003-03-14 |
JP4696426B2 JP4696426B2 (en) | 2011-06-08 |
Family
ID=19088130
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001261025A Expired - Fee Related JP4696426B2 (en) | 2001-08-30 | 2001-08-30 | Solid-state imaging device and charge sweeping method thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4696426B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007088750A (en) * | 2005-09-21 | 2007-04-05 | Fujifilm Corp | Ccd solid-state imaging element and drive method thereof, and digital camera |
JP2008118434A (en) * | 2006-11-06 | 2008-05-22 | Fujifilm Corp | Solid-state imaging element, and imaging apparatus |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63171073A (en) * | 1987-01-09 | 1988-07-14 | Fuji Photo Film Co Ltd | Image sensor with electronic shutter function |
JPH04266271A (en) * | 1991-02-21 | 1992-09-22 | Matsushita Electron Corp | Driving method for solid-state image pickup device |
JP2002320143A (en) * | 2001-04-23 | 2002-10-31 | Olympus Optical Co Ltd | Imaging device |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10144905A (en) * | 1996-11-06 | 1998-05-29 | Sony Corp | Solid-state image pickup device |
-
2001
- 2001-08-30 JP JP2001261025A patent/JP4696426B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63171073A (en) * | 1987-01-09 | 1988-07-14 | Fuji Photo Film Co Ltd | Image sensor with electronic shutter function |
JPH04266271A (en) * | 1991-02-21 | 1992-09-22 | Matsushita Electron Corp | Driving method for solid-state image pickup device |
JP2002320143A (en) * | 2001-04-23 | 2002-10-31 | Olympus Optical Co Ltd | Imaging device |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007088750A (en) * | 2005-09-21 | 2007-04-05 | Fujifilm Corp | Ccd solid-state imaging element and drive method thereof, and digital camera |
JP2008118434A (en) * | 2006-11-06 | 2008-05-22 | Fujifilm Corp | Solid-state imaging element, and imaging apparatus |
Also Published As
Publication number | Publication date |
---|---|
JP4696426B2 (en) | 2011-06-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US9749557B2 (en) | Solid-state image pickup device in which charges overflowing a memory during a charge transfer period are directed to a floating diffusion and method of driving same | |
TWI422221B (en) | Solid-state image capturing device, method of driving solid-state image capturing device, and image capturing apparatus | |
TWI539814B (en) | Electronic apparatus and driving method therefor | |
US20070013798A1 (en) | Image sensor with shared voltage converter for global shutter operation | |
TW200931962A (en) | Image sensor | |
JP3937716B2 (en) | Solid-state imaging device and imaging system | |
JP2002320143A (en) | Imaging device | |
JP4538337B2 (en) | Solid-state image sensor | |
JP4513415B2 (en) | Solid-state imaging device and driving method of solid-state imaging device | |
JP4272095B2 (en) | Imaging device | |
JP2003078819A (en) | Solid-state imaging device and method for sweeping out electric charge | |
US7274391B2 (en) | CCD having improved flushing by reducing power consumption and creating a uniform dark field while maintaining low dark current | |
JP4333144B2 (en) | Driving method of solid-state imaging device | |
EP0936809A2 (en) | Image sensing apparatus and driving method thereof | |
JP3050223B2 (en) | Solid-state imaging device and driving method thereof | |
JP3000958B2 (en) | Driving method of solid-state imaging device | |
KR100752405B1 (en) | pixel structure in CMOS image sensor by using photo diode for storage | |
JPH0965213A (en) | Image pickup device | |
JP2004096546A (en) | Solid-state image pickup device | |
JP4810566B2 (en) | Imaging device | |
JP2007159024A (en) | Driving system of ccd type solid-state imaging device and the ccd type solid-state imaging device | |
JP2007235889A (en) | Solid-state imaging apparatus | |
JP2002281397A (en) | Imaging system | |
JP2007189634A (en) | Imaging apparatus, driving method of ccd imaging element, and driver | |
JPH0654245A (en) | Driving system for solid state image pickup element |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20080715 |
|
RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20090817 |
|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20091013 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20100907 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100914 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20101105 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20101124 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110114 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20110201 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20110214 |
|
LAPS | Cancellation because of no payment of annual fees |