JP2003075645A - Color reflector, method for manufacturing the same, and liquid crystal display device using the color reflector - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a color reflector which is bright and shows preferable white balance compared to a conventional one and to provide a method for manufacturing the reflector. SOLUTION: The color reflector used is prepared by forming a phase volume hologram optical element by interference exposure using a laser and patterning into pixels of RGB colors or the like. The white balance and brightness are both obtained by using the laser light for the interference exposure at a shorter wavelength than the wavelength of conventionally used light (for example, at 568 nm for the R region, 488 nm for the G region and 407 nm for B region) and by optimizing the modulation of the hologram structure (by 10 to 20% for example).

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color reflector which can be used in a reflective liquid crystal display device and a method for manufacturing the same.

[0002]

2. Description of the Related Art A color reflector using a phase type volume hologram optical element is known. As a manufacturing method, as disclosed in JP-A-9-152586, the photosensitive material can be manufactured by interference exposure with a laser. Further, as a method of forming a pixel pattern of R, G, B, etc., which is necessary when used as a color filter of a liquid crystal display element, a method of interference exposure using a mask is also disclosed.

Further, in Japanese Patent Laid-Open No. 2000-276036,
In order to prevent the white reproducibility from deteriorating due to deviation from the center wavelengths (650 nm, 550 nm, 450 nm) of the hologram's red, green, and blue regions, the hologram's red, green, and blue regions respectively By controlling any one or more of the wavelength, height or half width of the peak of the diffraction efficiency, the chromaticity coordinate values x and y represented by the CIE display system showing a white image can be expressed as x, y = 1 / 3 to ±
A method of photographing a hologram is disclosed in which it is kept within a range of 0.05.

[0004]

Brightness and good white display are required as the performance of the color reflector, but at the wavelength of the laser light source conventionally used for interference exposure, R,
Even though the monochromatic colors of G and B are good, the white balance of the color reflection plate is not balanced, so that the white display becomes yellowish or greenish white, and a good white display is obtained. Not obtained. Further, since the reflection wavelength width in each pixel region is narrow, bright display is not obtained. Incidentally, Table 1 shows the wavelengths conventionally used.

[0005]

[Table 1]

Japanese Patent Publication No. 9-506441 discloses a method of increasing the reflection wavelength width of a phase type volume hologram optical element. After interference exposure, the photosensitive material with the hologram structure has a monomer concentration gradient formed by diffusing the photocurable monomer from one surface and irradiating it with ultraviolet rays before completely diffusing it into the film. To cure. At this time, swelling occurs according to the monomer concentration, so that a gradient can be formed in the hologram layer intervals. Since the light having the wavelength corresponding to each layer interval is reflected, the reflection wavelength width of the color reflector can be increased. The reflection wavelength width can be controlled by adjusting the diffusion time of the monomer or the like to variously change the ratio of the maximum portion and the minimum portion of the layer spacing of the hologram. FIG. 1 shows the structure of the color reflector after the structure modulation.
Reference numeral 1 represents a blue area, 2 represents a green area, and 3 represents a red area. The layer spacing in each hologram structure is modulated stepwise from one end to the other.

However, in order to use such a color reflection plate in a liquid crystal display device, it is necessary to further optimize the white balance of the color filters of R, G and B. Since the maximum part and the minimum part of the layer spacing in each pixel region are the long wavelength side and the short wavelength side of the reflection wavelength, respectively,
It is necessary to control the brightness and tint of the color reflector by adjusting the modulation amount of the hologram structure, and to study the manufacturing conditions for achieving good white display.

The method described in JP-A 2000-276036, as shown in Table 1, uses a wavelength of a length conventionally used as a wavelength used for exposure to produce a white image C
Chromaticity coordinate values x and y represented by the IE display system are represented by x and y = 1.
Although it is set within the range of / 3 to ± 0.05, there are cases where a better white display is desired in some cases.

An object of the present invention is to provide a brighter and better white-balanced color reflector that is manufactured by using a wavelength shorter than a wavelength conventionally used as a wavelength used for exposure, and particularly It is an object of the present invention to provide a color reflector suitable for a reflective liquid crystal display element, a method for manufacturing the same, and a liquid crystal display device using the color reflector.

[0010]

SUMMARY OF THE INVENTION The above-mentioned problems can be solved in a color reflector using a phase-type volume hologram optical element in which pixel regions of R, G, B, etc. are pixelated on the same substrate. Has a reflectance of 50% or more at at least one point between 568 nm and 620 nm, has a reflectance of 50% or more at at least one point between 477 nm and 514 nm in the G pixel area, and has a reflectance of 50% or more in the B pixel area. At 407 nm
It is solved by the color reflector of the present invention, which has a reflectance of 50% or more at at least one point between 1 and 448 nm.

The above-mentioned problems are also caused by R, G, B on the same substrate.
In a color reflection plate using a phase-type volume hologram optical element in which each pixel region such as P is pixelized, the R pixel region has a reflectance of 50% or more at at least one point between 568 nm and 620 nm, and 477nm in the pixel area of
From 413 nm to 514 nm, at least one point has a reflectance of 50% or more, and in the pixel region of B, 413 nm to 448 nm
A color reflector of the present invention is characterized in that it has a reflectance of 50% or more at at least one point between.

[0012] The above-mentioned problem is further posed on the same substrate by R, G,
In a color reflection plate using a phase-type volume hologram optical element in which each pixel region such as B is pixelated, the R pixel region has a reflectance of 50% or more at at least one point between 568 nm and 620 nm, 488n in the G pixel area
has a reflectance of 50% or more at at least one point between m and 514 nm, and 407 nm to 448 n in the B pixel region.
The color reflector of the present invention is characterized by having a reflectance of 50% or more at at least one point between m.

Further, the above-mentioned problem is that R,
In a color reflector using a phase-type volume hologram optical element in which each pixel region of G, B, etc. is pixelized, at least one point between 568 nm and 620 nm has a reflectance of 50% or more in the R pixel region. 48 in the G pixel area
It has a reflectance of 50% or more at least at one point between 8 nm and 514 nm, and has a reflectance of 413 nm to 44 in the B pixel region.
The color reflector of the present invention is characterized by having a reflectance of 50% or more at at least one point between 8 nm.

The above-mentioned problems are also caused by R, G, B on the same substrate.
In a color reflection plate using a phase-type volume hologram optical element in which each pixel region such as P is pixelized, the R pixel region has a reflectance of 50% or more at at least one point between 568 nm and 620 nm, and 497nm in the pixel area of
From 407 nm to 514 nm, at least one point has a reflectance of 50% or more, and in the pixel region of B, 407 nm to 448 nm
A color reflector of the present invention is characterized in that it has a reflectance of 50% or more at at least one point between.

The above-mentioned problem is further solved in that R, G, and
In a color reflection plate using a phase-type volume hologram optical element in which each pixel region such as B is pixelated, the R pixel region has a reflectance of 50% or more at at least one point between 568 nm and 620 nm, 497n in the G pixel area
has a reflectance of 50% or more at least at one point between m and 514 nm, and 413 nm to 448 n in the B pixel region.
The color reflector of the present invention is characterized by having a reflectance of 50% or more at at least one point between m.

The liquid crystal display device according to the present invention preferably uses the color reflector according to any one of claims 1 to 6. The above-mentioned problem is, in a method of manufacturing a color reflector using a phase-type volume hologram optical element in which each pixel region of R, G, B, etc. is pixelized on the same substrate, when R, R, Interference exposure is performed by using different wavelengths for each of the G and B pixel regions, and after the interference exposure, the layer spacing of the multilayer film structure of each pixel region whose refractive index is modulated is stepwise modulated under the same condition. This is solved by the method for manufacturing a color reflector of the present invention, which is characterized in that the reflection wavelength width in the pixel region is expanded.

According to one aspect of the present invention, the color reflector has a wavelength of a laser light source used for forming the R region, the G region and the B region and a maximum portion of the layer spacing in the hologram structure of each pixel region. By optimizing the enlarged ratio with respect to the minimum part, it is preferable to design the reflective liquid crystal display device so as to achieve both the brightness and the good white display.

The method for manufacturing a color reflector of the present invention is as follows: 568 nm in the R region and 488 n in the G region as a laser light source.
As a hologram structure modulation after interference exposure using a wavelength of 407 nm for the m and B regions, the portion where the layer spacing of the hologram structure in each pixel region is the largest is 10 to 20% wider than the layer spacing of the minimum portion. As described above, it is preferable to be modulated stepwise.

According to one aspect of the present invention, a laser light source having a wavelength of 568 nm in the R region, a wavelength of 488 nm in the G region, and a wavelength of 413 nm in the B region is used, and hologram structure in each pixel region is used as hologram structure modulation after interference exposure. It is preferable that the portion having the largest layer spacing is modulated stepwise so that it is wider by 10 to 20% than the layer spacing of the smallest portion.

According to another aspect of the present invention, a laser light source having a wavelength of 568 nm in the R region, a wavelength of 477 nm in the G region, and a wavelength of 407 nm in the B region is used, and the hologram in each pixel region is used as a hologram structure modulation after interference exposure. It is preferable that the portion having the largest layer spacing of the structure is stepwise modulated so as to be wider by 15 to 25% than the layer spacing of the minimum portion.

According to still another aspect of the present invention, a laser light source has a R region of 568 nm and a G region of 477 nm.
As a hologram structure modulation after interference exposure using a wavelength of 413 nm in the m and B regions, the portion where the layer spacing of the hologram structure in each pixel region is maximum becomes 15 to 25% wider than the layer spacing of the minimum portion. As described above, it is preferable to be modulated stepwise.

According to another aspect of the present invention, a laser light source has a R region of 568 nm and a G region of 497 nm.
As a hologram structure modulation after interference exposure using a wavelength of 407 nm in the m and B regions, the maximum layer spacing of the hologram structure in each pixel region is 10 to 15% wider than the minimum layer spacing. As described above, it is preferable to be modulated stepwise.

According to still another aspect of the present invention, a laser light source has a R region of 568 nm and a G region of 497 n.
As a hologram structure modulation after interference exposure using a wavelength of 413 nm in the m and B regions, the maximum layer spacing of the hologram structure in each pixel region is 10 to 15% wider than the minimum layer spacing. As described above, it is preferable to be modulated stepwise.

According to another aspect of the present invention, as a laser light source, 568 nm in the R region, 488 nm in the G region and B are used.
The first combination using any one of the wavelengths 406 to 417 in the region, and the wavelength of any one of 568 nm in the R region, 483 to 488 nm in the G region, and B.
A second combination using a wavelength of 407 nm in the region,
Hologram structure using any combination of 565 to 575 nm for R region, third combination using 488 nm for G region and 407 nm for B region and after interference exposure As the modulation, it is preferable that the portion having the largest layer spacing of the hologram structure in each pixel region is stepwise modulated so as to be 15% wider than the layer spacing of the minimum portion.

[0025]

Preferred embodiments of the present invention will be described below with reference to the drawings. First, a method for manufacturing a color reflector according to a preferred embodiment of the present invention will be described.
A phase type volume hologram optical element was formed by interference exposure of laser light using HRF-700X manufactured by DuPont as a photosensitive material. The R, G, and B patterns were sequentially subjected to interference exposure using a mask for patterning the R, G, and B patterns. FIG. 2 shows the state of exposure. Reference numerals 4 and 5 are photomasks, 6 is a photosensitive material, 7 is object light, and 8 is reference light. The laser light source used was an Ar laser or a Kr laser.
The object light enters perpendicularly to the photosensitive material, and by setting the angle between the object light and the reference light to be 30 °, it is possible to give off-axis property to the reflection characteristic of the color reflection plate. A reflective film is formed to reflect light incident at a polar angle of 30 ° in the 0 ° direction. The exposure wavelength in each pixel region was selected from the oscillation wavelengths and outputs of Ar laser and Kr laser shown in Table 2 below.

[0026]

[Table 2]

Since it is necessary for the laser output to be sufficiently strong in order to carry out interference exposure, a wavelength that gives an output of about 1 W was used. Combining these wavelengths, R region is 568 nm, G region is 488 nm, B region is 407 nm
The patterning of R, G, and B was performed by exposing at. Next, the DuPont is applied to the HRF-700X after the interference exposure.
A color tuning film (CTF) of t company was brought into close contact, heated at 80 ° C. for 45 seconds on a hot plate, and the layer structure of the hologram was modulated by diffusing the photocurable monomer, and then 365 nm, 15 mW / cm ² of ultraviolet rays. 3
The color curable plate was obtained by irradiating for 0 seconds to completely cure the photo-curable monomer, and then baking at 120 ° C. for 2 hours. The amount of structural modulation can be controlled by changing the heating time on the hot plate. The amount of structural modulation is defined by the percentage of the portion of the hologram structure where the layer spacing is the largest and the portion where the layer spacing is the smallest. The portion with the largest layer spacing after structural modulation corresponds to the long wavelength side of the reflection spectrum and the portion with the smallest layer spacing corresponds to the edge on the short wavelength side.Therefore, the structural modulation amount can be defined by the reflection wavelength width of the reflection spectrum. It is possible. As shown in FIG. 10 to be described later, as a result of this embodiment, it was confirmed that the reflectance shows 50% or more in the R region from 568 nm to 650 nm, in the G region from 488 nm to 560 nm, and in the B region from 407 nm to 470 nm.

From the reflection spectrum of each of the R, G, and B pixel regions after the structural modulation, D65 in the CIE1931 chromaticity diagram is obtained.
The chromaticity coordinates at the light source were determined and plotted. In addition, the chromaticity coordinates of white display, which is the average value thereof, are also plotted. Also, the R, G, and B chromaticity coordinates of the EBU standard are plotted for reference. Next, the reflection spectrum in each pixel was plotted, and the average white spectrum thereof was also plotted. Since white display is performed by additive color mixing using all pixels of R, G, and B, the contribution from each pixel area to the brightness is reduced to one third. FIG. 3 and FIG. 4 show chromaticity coordinates and reflection spectrum before structural modulation. 5 and 6
Shows the chromaticity coordinates and the reflection spectrum when the structural modulation amount is 5%. 7 and 8 show chromaticity coordinates and a reflection spectrum when the structural modulation amount is 10%. 9 and 10 show chromaticity coordinates and a reflection spectrum when the structural modulation amount is 15%.
11 and 12 show chromaticity coordinates and reflection spectra when the structural modulation amount is 20%. 13 and 14 show chromaticity coordinates and reflection spectra when the structural modulation amount is 25%. 15 and 16 show the chromaticity coordinates and the reflection spectrum when the structural modulation amount is 30%. Further, the chromaticity coordinate value of white display in the CIE1931 chromaticity diagram when the structural modulation amount is changed, and the D65 white point (x, y) of the coordinate value
= (0.3127, 0.329), Y value of white display, and color reproduction range S are shown in Table 3. The deviation of the chromaticity coordinate value of white display from the D65 white point is
It is defined by the distance on the xy coordinates between the white point of D65 and the white display point of the color reflector in the CIE1931 chromaticity diagram, but other color systems such as L ^* a ^* b ^* color difference and L ^* u ^* v ^* Color difference can also be used. The color reproduction range is defined by the area S of a triangle formed by R, G, and B chromaticity coordinates.

[0029]

[Table 3]

Deviation from the white point, ie C
When the distance between the IE1931 chromaticity coordinate and the white point coordinate of D65 is within 0.05, the white display is considered to be good, the Y value (brightness) of the white display is 20 or more, and the color reproduction range S is 0. If the display is bright when 1 or more, Table 3
Therefore, the amount of structural modulation that gives good white display chromaticity and bright display was 10 to 20%. When the amount of structural modulation is less than 10%, as shown in FIGS. 4 and 6, the spectra do not overlap and the respective color purities are high, but the reflection wavelength width is narrow, and a bright display is obtained as shown in Table 3. I couldn't do it. Further, as shown in FIG. 14 and FIG. 16, the structure modulation exceeding 20% is blue.
The reflection spectrum of the area is in the Green area,
Since the reflection spectrum of the region largely overlaps with the Red region, the brightness is improved (see Table 3), but the color purity of each single color is significantly deteriorated. as mentioned above,
By adjusting the amount of structural modulation, the deviation from the D65 white point can be prevented from being largely deviated from the chromaticity coordinates of the white display from the white point of D65, and the brightness and the color reproduction range of the white display can be made larger. We were able to optimize

Using the same method as described above, R, G,
B Interference exposure is performed by changing the exposure wavelength of each region, and after exposure, the CTF is closely adhered to perform the structural modulation, and the structural modulation amount is changed from 0% to 30% at 5% intervals, and the color reflection plate. Was produced. From the reflection spectrum and chromaticity coordinates, we selected the manufacturing conditions that are compatible with both brightness and good white display. The results are summarized in Table 4.

[0032]

[Table 4]

In addition, RGB, which is the basis of the modulation amount in Table 4,
The maximum and minimum layer spacing in each region is shown in Table 5 along with the combination of exposure wavelengths.

[0034]

[Table 5]

When a color reflector is manufactured using a combination of wavelengths other than those shown in Table 4, the tint is biased in any of the R, G, and B regions, and good white display cannot be performed. It was

As an example, the R region is 568 nm and the G region is 5
FIG. 17 and FIG. 1 show the reflection spectrum and chromaticity coordinates when the structural modulation amount is 15% when the 14 nm and B regions are exposed at 407 nm.
8 shows. As shown in FIG. 18, Blue area and Green
A part where the spectra do not overlap occurs in the n region, and on the contrary, the spectra largely overlap between the green region and the red region, so that a display with good white balance cannot be obtained as shown in FIG. Table 6 shows CIE1931
The chromaticity coordinates of white display in the chromaticity diagram, the deviation from the D65 white point, the Y value of white display, and the color reproduction range are shown.

[0037]

[Table 6]

As shown in Table 6, although the brightness could be improved by the structural modulation, a good white display could not be obtained. Also, the color reproduction range could not be wide. Next, it will be described that good white display can be obtained at a wavelength shorter than the conventional exposure laser wavelength as shown in Table 1.
For example, at present, it is difficult to obtain a high output from a laser having a wavelength of 410 nm in practice, and only discrete wavelengths such as 407 nm and 413 nm as described above are obtained, but virtually all wavelengths can be obtained. As
A simulation was performed. The calculation method is Red
2 out of (red), Green (green), and Blue (blue)
The calculation was performed by fixing one and shaking the remaining one wavelength. The amount of structural modulation used for calculation was fixed at 15%. Red (red)
And GREEN (green) with wavelengths of 568 nm and 488 nm respectively, and BLUE (blue) with 4 wavelengths.
Table 7 shows the results calculated by shaking from 00 to 450 nm.
56 each as Red (red) and Blue (blue)
Using wavelengths of 8 nm and 407 nm, Green
The results calculated by shaking (green) from 460 to 510 nm are shown in Table 8, and wavelengths of 488 nm and 407 nm are used as Green (green) and Blue (blue), respectively.
The results calculated by shaking Red (red) from 550 to 600 nm are shown in Table 9. In the table, Y, S, and d represent Y of the white display, the color reproduction range, and the deviation from the white point, respectively.

[0039]

[Table 7]

[0040]

[Table 8]

[0041]

[Table 9]

The wavelength of each color region having a Y value of 25 or more, S of 0.125 or more, and d of 0.01 or less as an allowable level is shown by a square frame. This permissible level is stricter than the judgment criteria of the previous embodiment shown in FIGS. 3 to 16, that is, the Y value is 20 or more, the color reproduction range is 0.1 or more, and the d is 0.05 or less. In addition, a better white display can be obtained. Table 10 shows combinations of wavelengths of the respective color regions that satisfy the allowable level.

[0043]

[Table 10]

From Table 10, as shown in Table 1, each pixel region is exposed with a wavelength shorter than the conventionally used laser wavelength, and the structure is uniformly modulated, so that it is bright on the same substrate and has a white balance. It was found that it is possible to pixelize R, G, and B that have been taken.

[0045]

As described above, by optimizing the exposure wavelength in each of the R, G and B regions and the amount of structural modulation, it is possible to form a color reflecting plate that achieves both bright display and good white display. did it.

The hue and white balance of each pixel are maintained by optimizing the exposure wavelength. Further, it is possible to realize bright display by modulating the hologram structure at the same time in the R, G, and B regions and widening the reflection wavelength width.

For example, the R region is 568 nm and the G region is 4
When 88 nm and B region are exposed at 407 nm, the portion where the layer spacing of the hologram structure in each pixel region after interference exposure is the largest is 10 to 15% wider than the layer spacing of the smallest portion. By doing so, the reflection wavelength width in each pixel region was widened and the brightness was improved. It should be noted that, at a certain amount of structural modulation, the brightness was further improved by overlapping the spectra in some wavelength regions. Also,
Since the amount of modulation was optimized, white balance was also achieved and good white display could be obtained. By exposing each pixel area with a wavelength shorter than the laser wavelength used conventionally, and uniformly modulating the structure, it is possible to make R, G, B pixels with white balance on the same substrate. became.

[Brief description of drawings]

FIG. 1 is a diagram showing a structure of a color reflector after structural modulation.

FIG. 2 is a diagram showing a state of exposure.

FIG. 3 is a diagram showing chromaticity coordinates before structural modulation.

FIG. 4 is a diagram showing a reflection spectrum before structural modulation.

FIG. 5 is a diagram showing chromaticity coordinates when the structural modulation amount is 5%.

FIG. 6 is a diagram showing a reflection spectrum when the structural modulation amount is 5%.

FIG. 7 is a diagram showing chromaticity coordinates when the structural modulation amount is 10%.

FIG. 8 is a diagram showing a reflection spectrum when the structural modulation amount is 10%.

FIG. 9 is a diagram showing chromaticity coordinates when the structural modulation amount is 15%.

FIG. 10 is a diagram showing a reflection spectrum when the structural modulation amount is 15%.

FIG. 11 is a diagram showing chromaticity coordinates when the structural modulation amount is 20%.

FIG. 12 is a diagram showing a reflection spectrum when the structural modulation amount is 20%.

FIG. 13 is a diagram showing chromaticity coordinates when the structural modulation amount is 25%.

FIG. 14 is a diagram showing a reflection spectrum when the structural modulation amount is 25%.

FIG. 15 is a diagram showing chromaticity coordinates when the structural modulation amount is 30%.

FIG. 16 is a diagram showing a reflection spectrum when the structural modulation amount is 30%.

FIG. 17 is a diagram showing chromaticity coordinates in the case of a combination of exposure wavelengths that does not exhibit good white display (structure modulation amount 15%).

FIG. 18 is a diagram showing a reflection spectrum in the case of a combination of exposure wavelengths that does not exhibit good white display (structure modulation amount 15%).

[Explanation of symbols]

1 Blue area 2 Green area 3 Red area 4 photo mask 5 photo mask 6 Photosensitive material 7 Object light 8 Reference light

   ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Masayuki Okamoto             22-22 Nagaike, Nagaike-cho, Abeno-ku, Osaka-shi, Osaka             Group Co., Ltd. F-term (reference) 2H049 CA05 CA08 CA11 CA22 CA28                       CA30                 2H091 FA02Y FA02Z FA19 FC10                       FD23 KA10 LA30

Claims (16)

[Claims] 1. A color reflection plate using a phase-type volume hologram optical element in which pixel regions of R, G, B, etc. are pixelated on the same substrate, and 568 nm in the R pixel region.
To 620 nm, at least one point has a reflectance of 50% or more, and in the G pixel region, 477 nm to 514 nm
Has a reflectance of 50% or more at at least one point between
A color reflector having a reflectance of 50% or more at least at one point between 407 nm and 448 nm in the pixel region of. 2. A color reflector using a phase-type volume hologram optical element in which pixel regions of R, G, B, etc. are pixel-formed on the same substrate, and 568 nm is formed in the R pixel region.
To 620 nm, at least one point has a reflectance of 50% or more, and in the G pixel region, 477 nm to 514 nm
Has a reflectance of 50% or more at at least one point between
A color reflector having a reflectance of 50% or more at least at one point between 413 nm and 448 nm in the pixel region of. 3. A color reflection plate using a phase-type volume hologram optical element in which pixel regions of R, G, B, etc. are pixelated on the same substrate, and 568 nm in the R pixel region.
To 620 nm, at least one point has a reflectance of 50% or more, and in the G pixel region, 488 nm to 514 nm
Has a reflectance of 50% or more at at least one point between
A color reflector having a reflectance of 50% or more at least at one point between 407 nm and 448 nm in the pixel region of. 4. A color reflector using a phase-type volume hologram optical element in which each pixel region of R, G, B, etc. is pixelated on the same substrate, and 568 nm in the R pixel region.
To 620 nm, at least one point has a reflectance of 50% or more, and in the G pixel region, 488 nm to 514 nm
Has a reflectance of 50% or more at at least one point between
A color reflector having a reflectance of 50% or more at least at one point between 413 nm and 448 nm in the pixel region of. 5. A color reflector using a phase-type volume hologram optical element in which pixel regions of R, G, B, etc. are pixel-formed on the same substrate, and 568 nm in the pixel region of R.
Has a reflectance of 50% or more at at least one point between 620 nm and 620 nm, and 497 nm to 514 nm in the G pixel region.
Has a reflectance of 50% or more at at least one point between
A color reflector having a reflectance of 50% or more at least at one point between 407 nm and 448 nm in the pixel region of. 6. A color reflection plate using a phase-type volume hologram optical element in which pixel regions of R, G, B, etc. are pixel-formed on the same substrate, and 568 nm in the R pixel region.
Has a reflectance of 50% or more at at least one point between 620 nm and 620 nm, and 497 nm to 514 nm in the G pixel region.
Has a reflectance of 50% or more at at least one point between
A color reflector having a reflectance of 50% or more at least at one point between 413 nm and 448 nm in the pixel region of. 7. A liquid crystal display device using the color reflecting plate according to claim 1. Description: 8. A method of manufacturing a color reflector using a phase-type volume hologram optical element in which pixel regions of R, G, B, etc. are pixel-formed on the same substrate, and R is used for interference exposure by laser. , G, B interference exposure is performed using different wavelengths for each pixel region, and after the interference exposure, the layer spacing of the multilayer film structure of each pixel region whose refractive index is modulated is stepwise modulated under the same condition. A method of manufacturing a color reflector, wherein a reflection wavelength width in each pixel region is expanded. 9. The method of manufacturing a color reflection plate according to claim 8, wherein the wavelength of the laser light source used when forming the R region, the G region and the B region and the maximum layer spacing in the hologram structure of each pixel region. A method for manufacturing a color reflector, which is designed so as to achieve both the brightness of a reflective liquid crystal display device and a good white display by optimizing a ratio in which a part is enlarged with respect to a minimum part. 10. The method of manufacturing a color reflector according to claim 8, wherein the laser light source is 568 n in the R region.
The wavelength of 488 nm for the m and G regions and the wavelength of 407 nm for the B region are used, and as a hologram structure modulation after interference exposure, the portion where the layer spacing of the hologram structure in each pixel region is maximum is 10 times the layer spacing of the minimum portion. 8. The method of manufacturing a color reflector according to claim 7, wherein the color reflector is modulated stepwise so that it becomes wider by 20%. 11. The method of manufacturing a color reflection plate according to claim 8, wherein the laser light source is 568 n in the R region.
As a hologram structure modulation after interference exposure, wavelengths of 488 nm for the m and G regions and 413 nm for the B region are used. A method for manufacturing a color reflection plate, characterized in that the color reflection plate is modulated stepwise so that it becomes wider by 20%. 12. The method of manufacturing a color reflector according to claim 8, wherein the laser light source is 568 n in the R region.
The wavelength of 477 nm for the m and G regions and the wavelength of 407 nm for the B region are used, and as the hologram structure modulation after interference exposure, the portion where the layer spacing of the hologram structure in each pixel region is maximum is 15 times the layer spacing of the minimum portion. A method for manufacturing a color reflection plate, characterized in that the color reflection plate is modulated stepwise so as to be widened by -25%. 13. The method of manufacturing a color reflection plate according to claim 8, wherein the laser light source is 568 n in the R region.
As a hologram structure modulation after interference exposure, wavelengths of 477 nm for the m and G regions and 413 nm for the B region are used, and the portion where the layer spacing of the hologram structure in each pixel region is maximum is 15 times the layer spacing of the minimum portion. A method for manufacturing a color reflection plate, characterized in that the color reflection plate is modulated stepwise so as to be widened by -25%. 14. The method of manufacturing a color reflection plate according to claim 8, wherein the laser light source is 568 n in the R region.
As a hologram structure modulation after interference exposure, wavelengths of 497 nm for the m and G regions and 407 nm for the B region are used. A method for manufacturing a color reflection plate, characterized in that the color reflection plate is modulated stepwise so that it becomes wider by 15%. 15. The method of manufacturing a color reflection plate according to claim 8, wherein the laser light source is 568 n in the R region.
The wavelengths of 497 nm for the m and G regions and 413 nm for the B region are used, and as the hologram structure modulation after interference exposure, the portion where the layer spacing of the hologram structure in each pixel region is the largest is 10 with respect to the layer spacing of the minimum portion. A method for manufacturing a color reflection plate, characterized in that the color reflection plate is modulated stepwise so that it becomes wider by 15%. 16. The method of manufacturing a color reflection plate according to claim 8, wherein the laser light source has an R region of 568 nm, and G
The first combination using 488 nm for the region and any one of 406 to 417 for the B region and 568 nm for the R region, any of 483 to 488 nm for the G region and 407 nm for the B region. Second combination with wavelength and 565 to 575n in R region
Any wavelength of m, a third combination using a wavelength of 488 nm in the G region and a wavelength of 407 nm in the B region, and as a hologram structure modulation after interference exposure, respectively. A method for manufacturing a color reflection plate, wherein a portion having a maximum layer spacing of the hologram structure in the pixel region is stepwise modulated so as to be 15% wider than a layer spacing of the minimum portion.