JP2003068556A - Method of removing insulating coating film and method of manufacturing coil device - Google Patents

Method of removing insulating coating film and method of manufacturing coil device

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Publication number
JP2003068556A
JP2003068556A JP2001253526A JP2001253526A JP2003068556A JP 2003068556 A JP2003068556 A JP 2003068556A JP 2001253526 A JP2001253526 A JP 2001253526A JP 2001253526 A JP2001253526 A JP 2001253526A JP 2003068556 A JP2003068556 A JP 2003068556A
Authority
JP
Japan
Prior art keywords
conductor
bobbin
insulated
station
core
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2001253526A
Other languages
Japanese (ja)
Inventor
Iwao Naka
岩男 中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
PARAT DO CO Ltd
Original Assignee
PARAT DO CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by PARAT DO CO Ltd filed Critical PARAT DO CO Ltd
Priority to JP2001253526A priority Critical patent/JP2003068556A/en
Publication of JP2003068556A publication Critical patent/JP2003068556A/en
Withdrawn legal-status Critical Current

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  • Manufacturing Cores, Coils, And Magnets (AREA)

Abstract

PROBLEM TO BE SOLVED: To remove an insulating coating film (10) made of polyether-sulfone resin by pressure-contacting a high-temperature iron (21) to the surface of an insulated conductor wire (1) having an insulating coating film (10) to expose the conductor (11), which is able to be soldered. SOLUTION: This method of removing an insulating coating film is constituted by setting the heating time X (seconds) and the heating temperature Y( deg.C) of the iron (21) so as to satisfy the formula Y<-20X+540.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、絶縁導線の絶縁皮
膜除去方法及びコイル装置の製造方法に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for removing an insulating film from an insulated conductor and a method for manufacturing a coil device.

【0002】[0002]

【従来の技術】近年、トランスを構成するコイル用導線
として、図8に示す如き絶縁導線(1)が使用されてい
る。該絶縁導線(1)は、銅製の導体(11)の表面に3層(1
0a)(10b)(10c)からなる絶縁皮膜(10)を具えており、該
絶縁皮膜(10)は、ポリエーテルサルホン樹脂製であっ
て、非常に優れた絶縁性能を有している。
2. Description of the Related Art In recent years, an insulated conducting wire (1) as shown in FIG. 8 has been used as a conducting wire for a coil which constitutes a transformer. The insulated conductor (1) has three layers (1) on the surface of the copper conductor (11).
The insulating film (10) is composed of 0a, 10b, and 10c, and the insulating film 10 is made of polyethersulfone resin and has a very excellent insulating performance.

【0003】該絶縁導線(1)を用いるトランスの製造工
程は、コイル巻線工程と半田付け工程を有しており、コ
イル巻線工程においては、図9に示す如く、巻枠(41)か
ら絶縁導線(1)を繰り出し、巻線用のノズル(61)に絶縁
導線(1)を通過せしめ、巻線用のノズル(61)が、絶縁導
線(1)をボビン(80)に突設されている一方の端子部(81)
に絡げ固定した後、絶縁導線(1)を所定の回数でボビン
(80)に巻回する。続いて、ボビン(80)に突設されている
他方の端子部(81)に絶縁導線(1)を絡げ、端子部(81)の
先端近傍において切断機(62)を用いて絶縁導線(1)を切
断して、コイル装置(8)を作製する。半田付け工程は、
絶縁導線(1)が絡げられている端子部(81)を、溶融半田
槽に所定の時間で浸漬せしめた後、溶融半田槽から抜き
出して放冷する。上記半田付け工程によれば、端子部に
絡げられた絶縁導線の絶縁皮膜が、溶融半田槽に浸漬さ
れている間に溶融半田の熱によって溶解し、これによっ
て導体が露出するので、絶縁導線(1)の導体(11)とボビ
ンの端子部(81)とが半田付けされる。
A manufacturing process of a transformer using the insulated conductor (1) includes a coil winding process and a soldering process. In the coil winding process, as shown in FIG. The insulated wire (1) is fed out, and the winding wire nozzle (61) is passed through the insulated wire (1). The winding wire nozzle (61) is installed on the bobbin (80) so as to project. One terminal part (81)
After fixing it to the bobbin, attach the insulated conductor (1) to the bobbin a predetermined number of times.
Wind around (80). Next, the insulated conductor (1) is entangled with the other terminal portion (81) protruding from the bobbin (80), and the insulated conductor ( The coil device (8) is manufactured by cutting 1). The soldering process is
The terminal portion (81) around which the insulated conducting wire (1) is entangled is immersed in the molten solder bath for a predetermined time, then extracted from the molten solder bath and allowed to cool. According to the soldering step, the insulating coating of the insulated conductor entangled in the terminal portion is melted by the heat of the molten solder while being immersed in the molten solder bath, and the conductor is thereby exposed. The conductor (11) of (1) and the terminal portion (81) of the bobbin are soldered.

【0004】[0004]

【発明が解決しようとする課題】上述の如くポリエーテ
ルサルホン樹脂製の絶縁皮膜(10)を熱によって溶解する
には、溶融半田の温度を500℃以上に設定する必要が
ある。溶融半田の温度が500℃以上の場合、ボビンの
端子部を溶融半田槽に浸漬している間に、溶融半田の熱
によってボビンが熱損傷を受ける問題があった。そこ
で、溶融半田の温度を、ボビンに熱損傷を与えることが
ない400℃程度とするために、端子部に絡げられた絶
縁導線の絶縁皮膜を、半田付け工程前に除去することが
必要である。しかし、絶縁皮膜の除去方法として従来用
いられてきた、カッター等の刃を有する工具を用いて絶
縁皮膜を削り取る機械的除去方法では、絶縁皮膜がポリ
エーテルサルホン樹脂製であって強靭なために、除去剥
離作業に長時間を要し、ポリエーテルサルホン樹脂製以
外の絶縁皮膜に比べて刃が短期間で損傷するという欠点
があり、実用的ではなかった。又、ガスバーナーを用い
て絶縁皮膜を加熱して熱分解させて除去する加熱除去方
法では、絶縁皮膜除去後の導体表面が酸化皮膜に覆われ
る問題があった。導体表面が酸化皮膜に覆われている
と、半田付け工程において溶融半田と導体の間に酸化皮
膜が介在することになって、溶融半田が導体に付着せ
ず、導体と端子部の間を半田付けすることが出来ない。
In order to melt the insulating film (10) made of polyethersulfone resin by heat as described above, it is necessary to set the temperature of the molten solder to 500 ° C. or higher. When the temperature of the molten solder is 500 ° C. or higher, there is a problem that the bobbin is thermally damaged by the heat of the molten solder while the terminal portion of the bobbin is immersed in the molten solder bath. Therefore, in order to set the temperature of the molten solder to about 400 ° C., which does not cause heat damage to the bobbin, it is necessary to remove the insulating coating of the insulated conductor entangled in the terminal portion before the soldering process. is there. However, in the mechanical removal method that has been conventionally used as a method for removing the insulating coating, which uses a tool having a blade such as a cutter to scrape off the insulating coating, the insulating coating is made of polyethersulfone resin and is tough. However, the removal and peeling work takes a long time, and the blade is damaged in a short period of time as compared with an insulating film made of a material other than polyethersulfone resin, which is not practical. In addition, in the heat removal method in which the insulating coating is heated by using a gas burner to be thermally decomposed and removed, there is a problem that the conductor surface after the insulating coating is removed is covered with the oxide coating. If the surface of the conductor is covered with an oxide film, the oxide film will be present between the molten solder and the conductor during the soldering process, and the molten solder will not adhere to the conductor, and the solder will be soldered between the conductor and the terminal. I can't attach it.

【0005】そこで本発明の第1の目的は、酸化皮膜が
形成されることのない絶縁皮膜除去方法を提供すること
である。第2の目的は、酸化皮膜が形成されることのな
い絶縁皮膜除去工程を有するコイル装置の製造方法を提
供することである。
Therefore, a first object of the present invention is to provide a method of removing an insulating film without forming an oxide film. A second object is to provide a method for manufacturing a coil device having an insulating film removing step in which an oxide film is not formed.

【0006】[0006]

【課題を解決する為の手段】本発明の絶縁導線の絶縁皮
膜除去方法は、ポリエーテルサルホン樹脂からなる絶縁
皮膜(10)を有する絶縁導線(1)の表面に高温のこて(20)
を圧接せしめて、絶縁皮膜(10)を除去し導体(11)を露出
する。ここで、こて(20)による加熱時間をX(秒)、加熱
温度をY(℃)としたとき、下記数7で表わされる関係式
を満たす加熱時間と加熱温度を設定する。
A method for removing an insulating coating of an insulated wire according to the present invention is a hot iron (20) on the surface of an insulated wire (1) having an insulating coating (10) made of polyethersulfone resin.
Are pressed against each other to remove the insulating film (10) and expose the conductor (11). Here, when the heating time by the iron (20) is X (seconds) and the heating temperature is Y (° C.), the heating time and the heating temperature satisfying the relational expression represented by the following formula 7 are set.

【数7】Y<−20X+540[Equation 7] Y <−20X + 540

【0007】上記本発明の絶縁導線(1)の絶縁皮膜除去
方法によれば、数7で表わされる関係式を満たす加熱時
間と加熱温度で絶縁導線(1)の表面を加熱するので、導
体(11)の表面は酸化皮膜を形成する温度に達しない。従
って、絶縁皮膜(10)除去後の導体(11)の表面に酸化皮膜
が形成される虞はない。
According to the method for removing the insulating coating of the insulated conductor (1) of the present invention, the surface of the insulated conductor (1) is heated for the heating time and the heating temperature satisfying the relational expression expressed by the equation (7). The surface of 11) does not reach the temperature for forming an oxide film. Therefore, there is no fear that an oxide film will be formed on the surface of the conductor (11) after the insulating film (10) is removed.

【0008】具体的構成において、こて(20)による加熱
時間Y(℃)と加熱温度X(秒)は、下記数8で表わされる
関係式を満たす様に設定する。
In a specific construction, the heating time Y (° C.) and the heating temperature X (second) by the iron (20) are set so as to satisfy the relational expression expressed by the following equation 8.

【数8】Y≦−20X+530 該具体的構成によれば、数8で表わされる関係式を満た
す加熱時間と加熱温度で絶縁導線(1)の表面を加熱する
ので、導体(11)の表面の到達温度は酸化皮膜を形成する
温度よりも充分に低く、絶縁皮膜(10)除去後の導体(11)
の表面に酸化皮膜は形成されない。
[Equation 8] Y ≦ −20X + 530 According to the specific configuration, the surface of the insulated conducting wire (1) is heated for the heating time and the heating temperature that satisfy the relational expression represented by the expression 8. The temperature reached is sufficiently lower than the temperature at which the oxide film is formed, and the conductor (11) after removing the insulating film (10)
No oxide film is formed on the surface of.

【0009】本発明のコイル装置の製造装置は、ポリエ
ーテルサルホン樹脂からなる絶縁皮膜(10)を有する絶縁
導線(1)をコア若しくはボビンに巻回して、コイル装置
を製造する装置であって、絶縁導線(1)を繰り出す送線
ステーションと、送線ステーション(4)から繰り出され
る絶縁導線(1)に対して接触離間する高温のこて(20)が
配備され、該こて(20)を絶縁導線(1)の表面に圧接せし
めて、絶縁皮膜(10)を除去することにより、絶縁導線
(1)に導体被覆部(16)と導体露出部(15)とを交互に形成
する皮膜除去ステーションと、皮膜除去ステーション
(2)を経て供給される絶縁導線(1)の導体被覆部(16)を
コア若しくはボビンに巻回する巻線ステーションとを有
する。
The coil device manufacturing device of the present invention is a device for manufacturing a coil device by winding an insulated conductor wire (1) having an insulating film (10) made of polyethersulfone resin around a core or a bobbin. , A wire feeding station for feeding the insulated wire (1), and a high-temperature iron (20) which comes into contact with and separates from the wire (1) fed out from the wire feeding station (4). The insulation conductor (1) is pressed against the surface of the insulation conductor (1), and the insulation film (10) is removed.
A film removing station for alternately forming a conductor covering part (16) and a conductor exposed part (15) in (1), and a film removing station
And a winding station for winding the conductor coating portion (16) of the insulated conductor (1) supplied through (2) on a core or a bobbin.

【0010】本発明のコイル装置の製造方法は、ポリエ
ーテルサルホン樹脂からなる絶縁皮膜(10)を有する絶縁
導線(1)をコア若しくはボビンに巻回して、コイル装置
を製造する方法であって、絶縁導線(1)を繰り出しつ
つ、繰り出された絶縁導線(1)の表面に高温のこて(20)
を圧接せしめて、絶縁皮膜(10)を除去することにより、
絶縁導線(1)に導体被覆部(16)と導体露出部(15)とを交
互に形成する皮膜除去工程と、皮膜除去工程を経て供給
される絶縁導線(1)の導体被覆部(16)をコア若しくはボ
ビンに巻回する巻線工程とを有している。
A method for manufacturing a coil device according to the present invention is a method for manufacturing a coil device by winding an insulated conductive wire (1) having an insulating film (10) made of polyethersulfone resin around a core or a bobbin. While feeding the insulated conductor (1), a high-temperature trowel (20) is applied to the surface of the insulated conductor (1) that is fed out.
By pressing and removing the insulating film (10),
A film removing step of alternately forming a conductor coating portion (16) and a conductor exposed portion (15) on the insulated conductor (1), and a conductor coating portion (16) of the insulated conductor (1) supplied through the film removing step. Winding step of winding the wire around a core or bobbin.

【0011】本発明に係るコイル装置の製造装置及び製
造方法においては、巻線ステーション(6)の前に皮膜除
去ステーション(2)を配備しているので、巻線工程に供
給される絶縁導線(1)には、導体被覆部(16)と導体露出
部(15)とが交互に形成されている。これにより、巻線工
程において、該導体被覆部(16)をコア若しくはボビンに
巻回するだけで、導体被覆部(16)の両端に導体露出部(1
5)を配置することが出来る。この結果、従来のコイル装
置の製造方法における絶縁導線をコア若しくはボビンに
巻回した後の導体を露出させる工程が不要となる。
In the coil device manufacturing apparatus and manufacturing method according to the present invention, since the film removing station (2) is provided before the winding station (6), the insulated conductor ( In 1), the conductor coating portion 16 and the conductor exposed portion 15 are alternately formed. Thus, in the winding step, the conductor exposed portion (1) is provided at both ends of the conductor covered portion (16) only by winding the conductor covered portion (16) around the core or the bobbin.
5) can be placed. As a result, the step of exposing the conductor after winding the insulated conductive wire around the core or the bobbin in the conventional coil device manufacturing method becomes unnecessary.

【0012】具体的構成において、前記皮膜除去ステー
ション(2)及び皮膜除去工程でのこて(21)による加熱時
間をX(秒)、加熱温度をY(℃)としたとき、下記数9で
表わされる関係式を満たす加熱時間と加熱温度が設定さ
れる。
In a concrete configuration, when the heating time by the iron (21) in the film removing station (2) and the film removing step is X (second) and the heating temperature is Y (° C.), The heating time and the heating temperature that satisfy the relational expression are set.

【数9】Y≦−20X+530 該具体的構成によれば、皮膜除去ステーション(2)及び
皮膜除去工程において、数9で表わされる関係式を満た
す加熱時間と加熱温度で絶縁導線(1)の表面を加熱する
こととなるので、導体(11)の表面の到達温度は酸化皮膜
を形成する温度よりも充分に低く、絶縁皮膜除去後の導
体表面に酸化皮膜は形成されない。
[Equation 9] Y ≦ −20X + 530 According to the specific configuration, in the film removing station (2) and the film removing process, the surface of the insulated conductor (1) is heated for a heating time and a heating temperature that satisfy the relational expression represented by the formula 9. Therefore, the temperature reached on the surface of the conductor (11) is sufficiently lower than the temperature at which the oxide film is formed, and no oxide film is formed on the conductor surface after the insulation film is removed.

【0013】他の具体的構成において、皮膜除去ステー
ション(2)の後に、巻線ステーション(6)においてコア
若しくはボビンに巻回された絶縁導線(1)の導体露出部
(15)に半田付けを施す半田付けステーションが配備され
ている。又、皮膜除去工程の後に、巻線工程においてコ
ア若しくはボビンに巻回された絶縁導線(1)の導体露出
部(15)に半田付けを施す半田付け工程を有している。
In another specific configuration, after the film removing station (2), the exposed conductor portion of the insulated wire (1) wound around the core or bobbin at the winding station (6).
There is a soldering station for soldering at (15). Further, after the film removing step, there is a soldering step of soldering the conductor exposed portion (15) of the insulated conductive wire (1) wound around the core or bobbin in the winding step.

【0014】該具体的構成によれば、半田付けステーシ
ョンの前に皮膜除去ステーション(2)が配備され、半田
付け工程の前に導体露出部が形成されているので、従来
のコイル装置の製造方法の如く、半田付け工程において
絶縁皮膜を熱溶融する必要がない。従って、溶融半田の
温度を従来よりも低く設定することが出来る。この結
果、半田付け工程において溶融半田の温度によるコア若
しくはボビンの熱損傷を防止することが出来る。又、導
体露出部(15)の表面には酸化皮膜が形成されていないの
で、導体露出部(15)の表面に半田が付着する。
According to this specific structure, since the film removing station (2) is provided before the soldering station and the conductor exposed portion is formed before the soldering step, the conventional coil device manufacturing method is provided. As described above, there is no need to heat-melt the insulating film in the soldering process. Therefore, the temperature of the molten solder can be set lower than before. As a result, it is possible to prevent thermal damage to the core or bobbin due to the temperature of the molten solder in the soldering process. Further, since no oxide film is formed on the surface of the exposed conductor portion (15), solder adheres to the surface of the exposed conductor portion (15).

【0015】本発明に係る他のコイル装置の製造装置
は、ポリエーテルサルホン樹脂からなる絶縁皮膜(10)を
有する絶縁導線(1)をコア若しくはボビンに巻回して、
コイル装置を製造する装置であって、絶縁導線(1)を繰
り出す送線ステーションと、送線ステーション(4)から
繰り出される絶縁導線(1)をコア若しくはボビンに巻回
した後、続けて絶縁導線(1)をコア若しくはボビンに設
けられた端子部(91)に絡げて、該端子部(91)の近傍にて
絶縁導線(1)を切断する巻線絡げステーションと、巻線
絡げステーション(64)を経て供給されるコア若しくはボ
ビンの端子部(91)に絡げられた絶縁導線(1)に対して、
接触離間する高温のこて(23)が配備され、該こて(23)を
コア若しくはボビンの端子部(91)に絡げられた絶縁導線
(1)の表面に圧接せしめて、絶縁皮膜(10)を少なくとも
一部除去することにより、絶縁導線(1)に導体露出部(1
5)を形成する導体露出ステーションとを有する。
In another coil device manufacturing apparatus according to the present invention, an insulated conductive wire (1) having an insulating film (10) made of polyethersulfone resin is wound around a core or a bobbin,
An apparatus for manufacturing a coil device, comprising: a wire feeding station for feeding an insulated wire (1); and an insulating wire (1) fed from a wire feeding station (4), wound around a core or a bobbin, and then continuously insulated wire. A winding entanglement station for entwining (1) with a terminal portion (91) provided on a core or a bobbin and cutting the insulated conductor (1) in the vicinity of the terminal portion (91), and a winding entanglement station. For the insulated conductor wire (1) entwined with the terminal portion (91) of the core or bobbin supplied through the station (64),
An insulated conductive wire in which a high-temperature iron (23) that is separated from the contact is provided, and the iron (23) is entangled with the terminal portion (91) of the core or bobbin.
By pressing the surface of (1) and removing at least part of the insulating film (10), the exposed conductor (1
5) forming a conductor exposing station.

【0016】本発明に係る他のコイル装置の製造方法
は、ポリエーテルサルホン樹脂からなる絶縁皮膜(10)を
有する絶縁導線(1)をコア若しくはボビンに巻回して、
コイル装置を製造する方法であって、絶縁導線(1)を繰
り出しつつ、繰り出された絶縁導線(1)をコア若しくは
ボビンに巻回した後、続けて絶縁導線(1)をコア若しく
はボビンに設けられた端子部(91)に絡げて、該端子部(9
1)の近傍にて絶縁導線(1)を切断する巻線絡げ工程と、
巻線絡げ工程を経て供給されるコア若しくはボビンの端
子部(91)に絡げられた絶縁導線(1)に対して、接触離間
する高温のこて(23)が配備され、該こて(23)をコア若し
くはボビンの端子部(91)に絡げられた絶縁導線(1)の表
面に圧接せしめて、絶縁皮膜(10)を少なくとも一部除去
することにより、絶縁導線(1)に導体露出部(15)を形成
する導体露出工程とを有している。
Another method of manufacturing a coil device according to the present invention is to wind an insulated wire (1) having an insulating film (10) made of polyethersulfone resin around a core or a bobbin.
A method for manufacturing a coil device, which comprises winding an unwinding insulated wire (1) around a core or a bobbin while letting out the insulated wire (1), and subsequently providing the insulated wire (1) on the core or bobbin. Entwined with the terminal part (91)
A winding entanglement step of cutting the insulated conductor (1) in the vicinity of 1),
A high-temperature iron (23) that is in contact with and separated from the insulated conductor (1) entwined with the terminal portion (91) of the core or bobbin supplied through the winding entanglement step is provided. (23) is pressed against the surface of the insulated conducting wire (1) entwined with the terminal portion (91) of the core or bobbin, and at least a part of the insulating film (10) is removed to form the insulated conducting wire (1). And a conductor exposing step of forming a conductor exposing portion (15).

【0017】本発明に係る他のコイル装置の製造装置及
び製造方法によれば、巻線絡げステーション(64)の後に
導体露出ステーション(24)を配備しているので、導体露
出工程において、コア若しくはボビンの端子部(91)に絡
げられた絶縁導線(1)の少なくとも一部の導体(11)を露
出させることが出来る。
According to another coil device manufacturing apparatus and manufacturing method of the present invention, since the conductor exposing station (24) is provided after the winding entanglement station (64), the core is not exposed in the conductor exposing step. Alternatively, at least a part of the conductor (11) of the insulated conductor (1) entwined with the terminal portion (91) of the bobbin can be exposed.

【0018】具体的構成において、前記導体露出ステー
ション(24)及び導体露出工程でのこてによる加熱時間を
X(秒)、加熱温度をY(℃)としたとき、下記数10で表
わされる関係式を満たす加熱時間と加熱温度が設定され
る。
In a concrete structure, when the heating time by the trowel in the conductor exposing station (24) and the conductor exposing step is X (seconds) and the heating temperature is Y (° C.), the relation expressed by the following formula 10 is given. The heating time and heating temperature that satisfy the formula are set.

【数10】Y≦−20X+530 該具体的構成によれば、導体露出ステーション(24)及び
導体露出工程において、数10で表わされる関係式を満
たす加熱時間と加熱温度で絶縁導線(1)の表面を加熱す
ることとなるので、導体(11)の表面の到達温度は酸化皮
膜を形成する温度よりも充分に低く、絶縁皮膜除去後の
導体表面に酸化皮膜は形成されない。
[Equation 10] Y ≦ −20X + 530 According to the specific configuration, in the conductor exposure station (24) and the conductor exposure step, the surface of the insulated conductor (1) is heated for a heating time and a heating temperature that satisfy the relational expression expressed by the equation 10. Therefore, the temperature reached on the surface of the conductor (11) is sufficiently lower than the temperature at which the oxide film is formed, and no oxide film is formed on the conductor surface after the insulation film is removed.

【0019】他の具体的構成において、導体露出ステー
ション(24)の後段には、コア若しくはボビンの端子部(9
1)に絡げられた絶縁導線(1)の導体(11)に半田付けを施
す半田処理ステーションが配備されている。又、導体露
出工程の後に、コア若しくはボビンの端子部(91)に絡げ
られた絶縁導線(1)の導体(11)に半田付けを施す半田処
理工程を有している。
In another specific configuration, the terminal portion (9) of the core or bobbin is provided after the conductor exposing station (24).
A solder processing station is provided for soldering the conductor (11) of the insulated conductor (1) entangled in (1). Further, after the conductor exposing step, there is a soldering step of soldering the conductor (11) of the insulated conducting wire (1) entwined with the terminal portion (91) of the core or bobbin.

【0020】該具体的構成によれば、導体露出ステーシ
ョン(24)の後段に半田処理ステーションを配備してお
り、半田処理工程の前に絶縁導線(1)の絶縁皮膜(10)の
少なくとも一部が除去されて導体が露出しているので、
従来のコイル装置の製造方法の如く、半田付け工程にお
いて絶縁皮膜を熱溶融する必要がない。従って、溶融半
田の温度を従来よりも低く設定することが出来る。この
結果、半田付け工程において溶融半田の温度によるコア
若しくはボビンの熱損傷を防止することが出来る。又、
導体露出部(15)の表面には酸化皮膜が形成されていない
ので、導体露出部(15)の表面に半田が付着する。
According to this specific structure, the solder treatment station is provided after the conductor exposure station (24), and at least a part of the insulating film (10) of the insulated conductor (1) is provided before the solder treatment step. Is removed and the conductor is exposed, so
Unlike the conventional coil device manufacturing method, it is not necessary to heat-melt the insulating film in the soldering process. Therefore, the temperature of the molten solder can be set lower than before. As a result, it is possible to prevent thermal damage to the core or bobbin due to the temperature of the molten solder in the soldering process. or,
Since no oxide film is formed on the surface of the exposed conductor portion (15), solder adheres to the surface of the exposed conductor portion (15).

【0021】[0021]

【発明の効果】本発明に係る絶縁皮膜除去方法によれ
ば、絶縁皮膜の除去に伴なって導体表面に酸化皮膜が形
成されることはないので、半田付けが可能である。又、
本発明に係るコイル装置の製造方法によれば、酸化皮膜
が形成されていない導体表面を露出させることによっ
て、半田付け工程において溶融半田の温度を従来よりも
低く設定することが出来るので、コア若しくはボビンの
熱損傷が防止される。
According to the insulating film removing method of the present invention, since an oxide film is not formed on the surface of the conductor as the insulating film is removed, soldering is possible. or,
According to the coil device manufacturing method of the present invention, by exposing the conductor surface on which the oxide film is not formed, it is possible to set the temperature of the molten solder to be lower than the conventional temperature in the soldering process. Heat damage to the bobbin is prevented.

【0022】[0022]

【発明の実施の形態】以下、本発明の実施の形態につ
き、図面に沿って具体的に説明する。本発明に係る皮膜
除去装置を図1に示す。皮膜除去装置(20)は、一対のこ
て(21)を具えており、該こて(21)の表面は、通電加熱に
よって所定の温度に設定可能である。一対のこて(21)の
間には、銅製の導体(11)の表面に3層からなるポリエー
テルサルホン樹脂製の絶縁皮膜(10)を具えた絶縁導線
(1)が配置される。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be specifically described below with reference to the drawings. A film removing device according to the present invention is shown in FIG. The film removing device (20) includes a pair of trowels (21), and the surface of the trowel (21) can be set to a predetermined temperature by electric heating. Between the pair of irons (21), an insulated conductor comprising a copper conductor (11) and a three-layered insulation film (10) made of polyethersulfone resin on the surface.
(1) is placed.

【0023】先ず、一対のこて(21)を温度Y(℃)に設定
する。次に、図2(a)に示す如く、一対のこて(21)を矢
印で示す絶縁導線(1)に接近する方向に移動させて、図
2(b)に示す如く絶縁導線(1)を挟圧し、設定時間X
(秒)だけ保持する。これによって、絶縁導線(1)の表面
が加熱される。その後、こて(21)を矢印で示す絶縁導線
(1)から離れる方向に移動させて、絶縁導線(1)の表面
から離間せしめる。ここで、こて(21)による絶縁導線
(1)の加熱温度Y(℃)と加熱時間X(秒)は、下記数11
で表わされる関係式を満たす様に設定されている。
First, the temperature of the pair of irons (21) is set to Y (° C.). Next, as shown in FIG. 2 (a), the pair of irons (21) are moved in a direction approaching the insulated conducting wire (1) indicated by the arrow, and the insulated conducting wire (1) is moved as shown in FIG. 2 (b). Pinch, and set time X
Hold only (seconds). As a result, the surface of the insulated conducting wire (1) is heated. Then, use the insulated wire with the trowel (21) indicated by the arrow.
It is moved in the direction away from (1) to separate it from the surface of the insulated conductor (1). Where the insulated wire with the trowel (21)
The heating temperature Y (° C) and heating time X (seconds) in (1) are shown in the following equation 11
It is set so as to satisfy the relational expression represented by.

【数11】Y<−20X+540 更に好ましくは、加熱温度Y(℃)と加熱時間X(秒)は、
下記数12を満たす様に設定されている。
[Equation 11] Y <−20X + 540 More preferably, the heating temperature Y (° C.) and the heating time X (seconds) are
It is set so as to satisfy the following expression 12.

【数12】Y≦−20X+530 該絶縁皮膜除去方法によれば、こて(21)によって加熱さ
れた絶縁皮膜(10)が昇華して、図2(c)に示す如く、導
体(11)を部分的に露出させることが出来る。尚、露出し
た導体(11)の表面には、後述の実験の結果から明らかな
様に、酸化皮膜は形成されない。
[Equation 12] Y ≦ −20X + 530 According to the insulating film removing method, the insulating film (10) heated by the trowel (21) is sublimated to form the conductor (11) as shown in FIG. 2 (c). It can be partially exposed. It should be noted that an oxide film is not formed on the exposed surface of the conductor (11), as is clear from the results of experiments described later.

【0024】実験 絶縁導線の絶縁皮膜を除去し、表面を露出させた導体に
半田付けの試験を行なった。こての条件を表1に示す加
熱温度と加熱時間の組み合わせに設定して、上記絶縁皮
膜除去方法と同様の方法によって、絶縁皮膜を除去し
た。
[0024]Experiment Remove the insulation film from the insulated conductor to create a conductor whose surface is exposed.
A soldering test was performed. Table 1 shows the conditions of the iron.
Set the combination of heat temperature and heating time to
Remove the insulation film by the same method as the film removal method.
It was

【0025】[0025]

【表1】 [Table 1]

【0026】半田付け試験には、図3(a)に示す形状の
試験片(3)を用いた。半田付け試験は、前記試験片(3)
の導体部(30)を、図3(b)に示す如く400℃に加熱し
た溶融半田槽(5)に1秒間浸漬した後、溶融半田槽(5)
から引き上げ、試験片(3)を放冷する。その結果、図3
(c)に示す如く導体部(30)の表面を完全に半田(13)が覆
っている場合は半田付け可とし、図3(d)に示す如く導
体部(30)の表面に半田が付着していない場合を半田付け
不可とする。又、導体部(30)の導体表面に部分的に半田
が付着している場合であっても半田付け不可とする。
For the soldering test, a test piece (3) having the shape shown in FIG. 3 (a) was used. For the soldering test, the test piece (3)
As shown in FIG. 3 (b), the conductor portion (30) is immersed in the molten solder bath (5) heated to 400 ° C. for 1 second, and then the molten solder bath (5)
The test piece (3) is allowed to cool. As a result,
When the surface of the conductor (30) is completely covered by the solder (13) as shown in (c), soldering is possible, and the solder adheres to the surface of the conductor (30) as shown in FIG. 3 (d). If not, soldering is not possible. Further, even if the solder is partially adhered to the conductor surface of the conductor portion (30), the soldering is not possible.

【0027】半田付け試験の結果を図4のグラフに示
す。グラフは、表1に示す加熱温度と加熱時間の組み合
わせで絶縁皮膜を除去した後の導体の半田付け試験結果
を表わしている。この結果から明らかな様に、各加熱時
間において半田付け不可となる最も低い温度の近似直線
は、下記数13で表わされる。該近似直線(以下、半田
付け不可境界線という)を含まない下側の領域(以下、半
田付け可領域という)に含まれる加熱条件においては、
半田付け可となる。
The results of the soldering test are shown in the graph of FIG. The graph shows the soldering test results of the conductor after the insulating film was removed by the combination of heating temperature and heating time shown in Table 1. As is clear from this result, the approximate straight line of the lowest temperature at which the soldering becomes impossible at each heating time is represented by the following expression 13. In the heating conditions included in the lower area (hereinafter, referred to as solderable area) that does not include the approximate straight line (hereinafter, referred to as solderable boundary line),
Solderable.

【数13】Y=−20X+540 半田付け可領域に含まれる加熱条件において半田付けが
出来た理由は、半田付け可領域に含まれる加熱条件であ
れば、導体表面が酸化皮膜を形成する温度に達しないた
めに、絶縁皮膜除去後の導体表面に酸化皮膜は形成され
ず、半田付け試験において導体表面が溶融半田と直接接
触したためである。
[Equation 13] Y = −20X + 540 The reason why soldering was successful under the heating conditions included in the solderable area was that the heating temperature included in the solderable area reached the temperature at which the conductor surface formed an oxide film. This is because the oxide film was not formed on the conductor surface after the insulation film was removed, and the conductor surface was in direct contact with the molten solder in the soldering test.

【0028】更に、本発明に係る下記数14で表わされ
る直線(以下、半田付け可境界線という)を含む下側の領
域(以下、半田付け確実領域という)の加熱条件において
は、確実に半田付けが出来る。
Further, under the heating condition of the lower region (hereinafter referred to as the soldering certain region) including the straight line represented by the following equation 14 (hereinafter referred to as the solderable boundary line) according to the present invention, the solder is surely soldered. Can be attached.

【数14】Y=−20X+530 半田付け確実領域に含まれる加熱条件において半田付け
が出来た理由は、半田付け確実領域に含まれる加熱条件
であれば、導体表面の到達温度が、酸化皮膜を形成する
温度よりも充分に低い温度であるために、絶縁皮膜除去
後の導体表面に酸化皮膜が形成されることはなく、半田
付け試験において導体表面が溶融半田と直接接触したた
めである。
[Formula 14] Y = −20X + 530 The reason why soldering was successful under the heating conditions included in the certain soldering area is that if the heating conditions included in the certain soldering area, the temperature reached on the conductor surface forms an oxide film. This is because the temperature is sufficiently lower than the heating temperature, so that an oxide film is not formed on the conductor surface after the insulation film is removed, and the conductor surface is in direct contact with the molten solder in the soldering test.

【0029】本発明に係るコイル装置の製造装置は、図
5に示す如く送線ステーション(4)と巻線ステーション
(6)の間に皮膜除去ステーション(2)が配置されてお
り、送線ステーション(4)と巻線ステーション(6)の間
には、皮膜除去ステーション(2)を経由する、絶縁導線
(1)の送線経路が設けられている。更に、巻線ステーシ
ョン(6)の後段には、図示省略する半田付けステーショ
ンが配置されている。
As shown in FIG. 5, the coil device manufacturing apparatus according to the present invention comprises a wire sending station (4) and a winding station.
A film removing station (2) is arranged between (6), and an insulated conductor that passes through the film removing station (2) between the wire sending station (4) and the winding station (6).
The transmission route of (1) is provided. Further, a soldering station (not shown) is arranged after the winding station (6).

【0030】上記製造装置の送線ステーション(4)に
は、絶縁導線(1)が巻回された巻枠(41)が配備されてお
り、絶縁導線(1)を連続して皮膜除去ステーション(2)
に供給している。皮膜除去ステーション(2)には、一対
のこて(21)を具えた皮膜除去装置(20)が配備されてお
り、送線ステーション(4)から供給された絶縁導線(1)
の表面は、一対のこて(21)によって挟圧され、絶縁皮膜
(10)が除去される。これによって、絶縁導線(1)に導体
被覆部(16)と導体露出部(15)が交互に形成される。ここ
で、こて(21)による絶縁皮膜(10)の加熱温度Y(℃)及び
加熱時間X(秒)は、前記半田付け確実領域の範囲に含ま
れている。
A winding frame (41) around which the insulated conductor (1) is wound is provided in the wire sending station (4) of the above-mentioned manufacturing apparatus, and the insulation conductor (1) is continuously connected to the film removal station ( 2)
Is being supplied to. The film removing station (2) is equipped with a film removing device (20) having a pair of trowels (21), and the insulated conductor (1) supplied from the wire sending station (4).
The surface of the is pinched by a pair of trowels (21),
(10) is removed. As a result, conductor covered portions (16) and conductor exposed portions (15) are alternately formed on the insulated conductor (1). Here, the heating temperature Y (° C.) and the heating time X (seconds) of the insulating film (10) by the trowel (21) are included in the range of the certain soldering area.

【0031】巻線ステーション(6)には、巻線ノズル(6
1)と、切断機(62)が配備されており、ボビン(70)が適宜
供給されている。皮膜除去ステーション(2)を経て供給
された絶縁導線(1)は、導体露出部(15)が巻線ノズル(6
1)によってボビン(70)の一方の端子部(71)に絡げられ、
続いて導体被覆部(16)がボビン(70)に所定の回数、巻回
される。その後、ボビン(70)に巻きつけられた導体被覆
部(16)から伸びる導体露出部(15)はボビン(70)の他方の
端子部(71)に絡げられ、該端子部(71)の先端近傍におい
て切断機(62)によって切断される。
The winding station (6) has a winding nozzle (6
1) and a cutting machine (62) are provided, and a bobbin (70) is appropriately supplied. In the insulated conductor (1) supplied through the film removal station (2), the exposed conductor (15) has a winding nozzle (6).
It is entangled in one terminal part (71) of the bobbin (70) by 1),
Then, the conductor coating portion (16) is wound around the bobbin (70) a predetermined number of times. Thereafter, the conductor exposed portion (15) extending from the conductor coating portion (16) wound around the bobbin (70) is entangled with the other terminal portion (71) of the bobbin (70), and the terminal portion (71) It is cut by the cutting machine (62) near the tip.

【0032】半田付けステーションには、溶融半田槽が
配備されている。巻線ステーション(6)を経て供給され
たボビン(70)の端子部(71)は、溶融半田槽に浸漬された
後、引き上げられる。これによって、導体露出部(15)の
導体(11)の表面とボビン(70)の端子部(71)が半田付けさ
れる。
A molten solder bath is provided at the soldering station. The terminal portion (71) of the bobbin (70) supplied through the winding station (6) is pulled up after being immersed in the molten solder bath. As a result, the surface of the conductor (11) of the conductor exposed portion (15) and the terminal portion (71) of the bobbin (70) are soldered.

【0033】本発明に係るコイル装置の製造方法は、先
ず、図2(a)〜(c)に示す如き皮膜除去工程において、
巻枠(41)から繰り出される絶縁導線(1)の表面に、高温
の一対のこて(21)を圧接せしめ、絶縁皮膜(10)を所定の
間隔で除去する。これによって、絶縁導線(1)に導体露
出部(15)と導体被覆部(16)が交互に形成される。ここ
で、こて(21)による絶縁皮膜(10)の加熱温度Y(℃)及び
加熱時間X(秒)は、前記半田付け確実領域の範囲に含ま
れている。
In the coil device manufacturing method according to the present invention, first, in a film removing step as shown in FIGS.
A pair of hot irons (21) are pressed against the surface of the insulated conductor (1) fed from the winding frame (41) to remove the insulating film (10) at predetermined intervals. As a result, the exposed conductors (15) and the conductor coatings (16) are alternately formed on the insulated conductor (1). Here, the heating temperature Y (° C.) and the heating time X (seconds) of the insulating film (10) by the trowel (21) are included in the range of the certain soldering area.

【0034】次に、巻線工程において、巻線ノズル(61)
を用いて絶縁導線(1)の導体露出部(15)をボビン(70)の
一方の端子部(71)に絡げ、続いて導体被覆部(16)をボビ
ン(70)に所定の回数で巻回した後、ボビン(70)に巻きつ
けた導体被覆部(16)から伸びる導体露出部(15)をボビン
(70)の他方の端子部(71)に絡げ、該端子部(71)の先端部
において、導体露出部(15)を切断してコイル装置(7)を
完成する。
Next, in the winding step, the winding nozzle (61)
The exposed conductor part (15) of the insulated conductor (1) is entangled with one terminal part (71) of the bobbin (70) by using, and then the conductor coating part (16) is attached to the bobbin (70) at a predetermined number of times. After winding, bobbin the exposed conductor part (15) extending from the conductor covering part (16) wound around the bobbin (70).
The coil device (7) is completed by entwining with the other terminal portion (71) of (70) and cutting the exposed conductor portion (15) at the tip of the terminal portion (71).

【0035】更に、巻線工程の後段には、溶融半田槽を
有する半田付け工程があり、絶縁導線(1)の導体露出部
(16)が絡げられたボビン(70)の端子部(71)を、溶融半田
槽に浸漬して、導体露出部(16)の導体(11)の表面と端子
部(71)を半田付けする。
Further, there is a soldering step having a molten solder bath after the winding step, and the exposed conductor portion of the insulated conductor (1) is exposed.
The terminal part (71) of the bobbin (70) in which the (16) is entangled is immersed in a molten solder bath, and the surface of the conductor (11) of the exposed conductor part (16) and the terminal part (71) are soldered. To do.

【0036】上記コイル装置の製造装置及び製造方法に
よれば、巻線工程の前に絶縁導線(1)に導体露出部(16)
を形成するので、従来の製造方法において必要であった
巻線工程の後の皮膜除去工程が不要であり、これによっ
て、工程が簡略になる。更に、半田付け工程の前に導体
露出部が形成されているので、従来のコイル装置の製造
方法の如く半田付け工程において絶縁皮膜を熱溶融する
必要がない。従って、溶融半田の温度を従来よりも低く
設定することが出来る。この結果、溶融半田の温度によ
るコア若しくはボビンの熱損傷を防止することが出来
る。又、こて(21)による絶縁導線(1)の加熱温度Y(℃)
及び加熱時間X(秒)は、前記半田付け確実領域の範囲に
含まれているので、前述の実験の結果から明らかな様
に、導体露出部(15)の導体(11)の表面に酸化皮膜は形成
されていない。従って、半田付け工程において導体露出
部(15)の導体(11)の表面とボビン(70)の端子部(71)とを
確実に半田付けすることが出来る。
According to the manufacturing apparatus and the manufacturing method of the coil device, the conductor exposed portion (16) is formed on the insulated conductor (1) before the winding step.
Therefore, the film removing step after the winding step, which is necessary in the conventional manufacturing method, is unnecessary, which simplifies the process. Further, since the conductor exposed portion is formed before the soldering step, it is not necessary to heat-melt the insulating film in the soldering step as in the conventional coil device manufacturing method. Therefore, the temperature of the molten solder can be set lower than before. As a result, heat damage to the core or bobbin due to the temperature of the molten solder can be prevented. Also, the heating temperature Y (° C) of the insulated wire (1) with the trowel (21)
Since the heating time X (seconds) is included in the range of the certain soldering area, the oxide film is formed on the surface of the conductor (11) of the conductor exposed portion (15), as is clear from the results of the above experiment. Is not formed. Therefore, in the soldering step, the surface of the conductor (11) of the conductor exposed portion (15) and the terminal portion (71) of the bobbin (70) can be reliably soldered.

【0037】本発明に係る他のコイル装置の製造装置
は、図6に示す如く、送線ステーション(4)と巻線絡げ
ステーション(64)と導体露出ステーション(24)を具えて
いる。更に、導体露出ステーション(24)の後段には、図
示省略する半田付けステーションが配置されている。
As shown in FIG. 6, another coil device manufacturing apparatus according to the present invention comprises a wire sending station (4), a winding entanglement station (64), and a conductor exposing station (24). Further, a soldering station (not shown) is arranged after the conductor exposing station (24).

【0038】上記製造装置の送線ステーション(4)は、
絶縁導線(1)を連続して巻線ステーションに供給するも
のである。巻線絡げステーション(64)には、巻線ノズル
(61)と、切断機(62)が配備されており、ボビン(90)が適
宜供給されている。送線ステーション(4)から供給され
た絶縁導線(1)は、巻線ノズル(61)によってボビン(90)
の一方の端子部(91)に絡げられ、続いてボビン(90)に所
定の回数で巻回された後、他方の端子部(91)に絡げら
れ、該他方の端子(91)の先端近傍において切断機(62)を
用いて切断される。
The wire-sending station (4) of the above manufacturing apparatus is
The insulated conductor (1) is continuously supplied to the winding station. The winding entanglement station (64) has a winding nozzle
(61) and a cutting machine (62) are provided, and a bobbin (90) is appropriately supplied. The insulated wire (1) supplied from the wire feeding station (4) is fed to the bobbin (90) by the winding nozzle (61).
After being entangled in one of the terminal portions (91) and subsequently wound around the bobbin (90) a predetermined number of times, entangled in the other terminal portion (91) and the other terminal (91) It is cut using a cutting machine (62) near the tip.

【0039】導体露出ステーション(24)には、こて(23)
を具えた皮膜除去装置(22)が配備されており、巻線絡げ
ステーションから供給されたボビン(90)の端子部(91)に
絡げられた絶縁導線(1)の表面には、図7(b)に示す如
くこて(23)が圧接され、絶縁皮膜(10)が除去されて、図
7(c)の如く導体(1)の一部が露出する。こて(23)によ
る絶縁導線(1)の加熱温度Y(℃)及び加熱時間X(秒)
は、前記半田付け確実領域の範囲に含まれている。
The conductor exposing station (24) has a trowel (23)
A film removing device (22) equipped with a wire is installed on the surface of the insulated conductor (1) entwined with the terminal (91) of the bobbin (90) supplied from the winding entanglement station. As shown in FIG. 7 (b), the iron (23) is pressure-welded, the insulating film (10) is removed, and a part of the conductor (1) is exposed as shown in FIG. 7 (c). Heating temperature Y (° C) and heating time X (seconds) of the insulated wire (1) with the trowel (23)
Is included in the range of the certain soldering area.

【0040】半田付けステーションには、溶融半田槽が
配備されている。導体露出ステーションを経て供給され
たボビンの端子部は、溶融半田槽に浸漬され、これによ
って、端子部に絡げられた絶縁導線の絶縁皮膜が熱溶融
される。この結果、導体が露出して、導体の表面と端子
部が半田付けされる。
A molten solder bath is provided at the soldering station. The terminal portion of the bobbin supplied through the conductor exposing station is dipped in the molten solder bath, whereby the insulating coating of the insulated conductor entwined with the terminal portion is thermally melted. As a result, the conductor is exposed, and the surface of the conductor and the terminal portion are soldered.

【0041】本発明に係る他のコイル装置の製造方法
は、図6に示す如く、巻枠(41)から繰り出される絶縁導
線(1)を、巻線ノズル(61)を用いてボビン(90)の一方の
端子部(91)に絡げる。続いてボビン(90)に所定の回数で
巻回した後、他方の端子部(91)に絡げ、該他方の端子部
(91)の先端部において切断機(62)を用いて切断する。次
に、導体露出工程においては、図7(a)に示す如き皮膜
除去装置(22)を構成する高温のこて(23)を矢印で示す絶
縁導線に接近する方向へ移動させ、図7(b)に示す如く
ボビン(90)の端子部(91)に絡げている絶縁導線(1)の表
面に圧接せしめて、絶縁皮膜(10)を昇華させて、図7
(c)に示す如く導体(11)の一部を露出させる。これによ
って、導体露出部(15)が形成されコイル装置(9)を完成
する。
In another coil device manufacturing method according to the present invention, as shown in FIG. 6, a bobbin (90) is formed by winding an insulated conductor (1) fed from a winding frame (41) using a winding nozzle (61). Engage in one terminal (91). Then, after winding the bobbin (90) a predetermined number of times, entangle it with the other terminal portion (91),
The tip end of (91) is cut using a cutting machine (62). Next, in the conductor exposing step, the high temperature iron (23) constituting the film removing device (22) as shown in FIG. 7 (a) is moved in a direction approaching the insulated conductor as shown by an arrow, As shown in b), the surface of the insulated conducting wire (1) entwined with the terminal portion (91) of the bobbin (90) is pressure-contacted to sublimate the insulating film (10),
Part of the conductor (11) is exposed as shown in (c). As a result, the conductor exposed portion 15 is formed to complete the coil device 9.

【0042】上記導体露出工程において、こて(23)によ
る絶縁皮膜(10)の加熱温度Y(℃)及び加熱時間X(秒)
は、前記半田付け確実領域の範囲に含まれている。
In the conductor exposing step, the heating temperature Y (° C.) and the heating time X (second) of the insulating film (10) by the trowel (23) are set.
Is included in the range of the certain soldering area.

【0043】又、導体露出工程の後段の半田処理工程に
おいては、絶縁導線(1)が絡げられたボビン(90)の端子
部(91)を溶融半田槽に浸漬して、引き上げて、導体露出
部(15)の表面と端子部(91)とを半田付けする。
Further, in the solder treatment step subsequent to the conductor exposing step, the terminal portion (91) of the bobbin (90) in which the insulated conductor (1) is entangled is dipped in the molten solder bath and pulled up, The surface of the exposed part (15) and the terminal part (91) are soldered.

【0044】上記本発明に係る他のコイル装置の製造装
置及び製造方法によれば、半田処理工程の前に絶縁導線
(1)の絶縁皮膜(10)の一部を除去して導体露出部(15)を
形成しているので、従来のコイル装置の製造方法の如く
半田付け工程において絶縁皮膜を熱溶融する必要がな
い。従って、溶融半田の温度を従来よりも低く設定する
ことが出来る。この結果、溶融半田の温度によるコア若
しくはボビンの熱損傷を防止することが出来る。又、こ
てによって絶縁皮膜(10)を加熱する温度Y(℃)と加熱時
間X(秒)が前記半田付け確実領域の範囲に含まれている
ので、導体露出部(15)の導体(11)の表面に酸化皮膜が形
成されていることはない。従って、半田処理工程におい
て導体露出部(15)の導体(11)の表面とボビン(90)の端子
部(91)とを確実に半田付けすることが出来る。
According to the other coil device manufacturing apparatus and manufacturing method of the present invention, the insulated conductive wire is provided before the soldering process.
Since the exposed conductor part (15) is formed by removing a part of the insulating film (10) of (1), it is necessary to heat-melt the insulating film in the soldering step as in the conventional coil device manufacturing method. Absent. Therefore, the temperature of the molten solder can be set lower than before. As a result, heat damage to the core or bobbin due to the temperature of the molten solder can be prevented. Further, since the temperature Y (° C.) for heating the insulating film (10) by the trowel and the heating time X (seconds) are included in the range of the certain soldering area, the conductor (11) of the conductor exposed portion (15) is The oxide film is not formed on the surface of (). Therefore, the surface of the conductor (11) of the conductor exposed portion (15) and the terminal portion (91) of the bobbin (90) can be reliably soldered in the soldering process.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の絶縁皮膜除去方法に使用するこての斜
視図である。
FIG. 1 is a perspective view of an insulating film removing method of the present invention.

【図2】該絶縁皮膜除去方法の工程図である。FIG. 2 is a process drawing of the insulating film removing method.

【図3】半田付け試験を示す図である。FIG. 3 is a diagram showing a soldering test.

【図4】半田付け試験の結果のグラフである。FIG. 4 is a graph of results of a soldering test.

【図5】本発明に係るコイル装置製造方法の工程図であ
る。
FIG. 5 is a process drawing of the coil device manufacturing method according to the present invention.

【図6】本発明に係る他のコイル装置製造方法の工程図
である。
FIG. 6 is a process drawing of another coil device manufacturing method according to the present invention.

【図7】該工程の導体露出工程の図である。FIG. 7 is a diagram of a conductor exposing step in the step.

【図8】絶縁導線の斜視図である。FIG. 8 is a perspective view of an insulated conductor.

【図9】従来のコイル装置製造方法の工程図である。FIG. 9 is a process drawing of a conventional coil device manufacturing method.

【符号の説明】[Explanation of symbols]

(1) 絶縁導線 (10) 絶縁皮膜 (15) 導体露出部 (20) 皮膜除去装置 (5) 溶融半田槽 (7) コイル装置 (9) コイル装置 (1) Insulated conductor (10) Insulation film (15) Exposed conductor (20) Film removal device (5) Molten solder bath (7) Coil device (9) Coil device

Claims (14)

【特許請求の範囲】[Claims] 【請求項1】 ポリエーテルサルホン樹脂からなる絶縁
皮膜(10)を有する絶縁導線(1)の表面に、高温のこて(2
1)を圧接せしめて、絶縁皮膜(10)を除去し、導体(11)を
露出させる方法であって、こて(21)による加熱時間をX
(秒)、加熱温度をY(℃)としたとき、下記数1で表わさ
れる関係式を満たす加熱時間と加熱温度を設定すること
を特徴とする絶縁導線の絶縁皮膜除去方法。 【数1】Y<−20X+540
1. A high-temperature trowel (2) is attached to the surface of an insulated wire (1) having an insulating film (10) made of polyethersulfone resin.
It is a method of exposing the conductor (11) by removing the insulating film (10) by pressing 1) under pressure, and heating time by the trowel (21) is X.
(Sec), when the heating temperature is Y (° C.), a heating time and a heating temperature that satisfy the relational expression represented by the following mathematical formula 1 are set, and an insulating film removing method for an insulated conductor. [Equation 1] Y <-20X + 540
【請求項2】 こて(21)による加熱時間X(秒)と加熱温
度Y(℃)は、下記数2で表わされる関係式を満たす様に
設定する請求項1に記載の絶縁皮膜除去方法。 【数2】Y≦−20X+530
2. The insulating film removing method according to claim 1, wherein the heating time X (second) and the heating temperature Y (° C.) by the iron (21) are set so as to satisfy the relational expression represented by the following mathematical formula 2. . [Formula 2] Y ≦ −20X + 530
【請求項3】 ポリエーテルサルホン樹脂からなる絶縁
皮膜(10)を有する絶縁導線(1)をコア若しくはボビンに
巻回して、コイル装置を製造する装置において、 絶縁導線(1)を繰り出す送線ステーション(4)と、 送線ステーション(4)から繰り出される絶縁導線(1)に
対して接触離間する高温のこて(21)が配備され、該こて
(21)を絶縁導線(1)の表面に圧接せしめて、絶縁皮膜(1
0)を除去することにより、絶縁導線(1)に導体被覆部(1
6)と導体露出部(15)とを交互に形成する皮膜除去ステー
ション(2)と、 皮膜除去ステーション(2)を経て供給される絶縁導線
(1)の導体被覆部(16)をコア若しくはボビンに巻回する
巻線ステーション(6)とを有することを特徴とするコイ
ル装置の製造装置。
3. In a device for manufacturing a coil device by winding an insulating conductor (1) having an insulating film (10) made of polyether sulfone resin around a core or a bobbin, a wire for feeding the insulating conductor (1). A station (4) and a high-temperature iron (21), which comes into contact with and separates from the insulated conductor (1) fed from the wire station (4), are provided.
(21) is pressed against the surface of the insulated conductor (1), and the insulation film (1
By removing (0), the conductor coating (1
A film removing station (2) that alternately forms 6) and exposed conductors (15), and an insulated conductor supplied through the film removing station (2)
An apparatus for manufacturing a coil device, comprising: a winding station (6) for winding the conductor coating portion (16) of (1) around a core or a bobbin.
【請求項4】 前記皮膜除去ステーション(2)でのこて
(21)による加熱時間をX(秒)、加熱温度をY(℃)とした
とき、下記数3で表わされる関係式を満たす加熱時間と
加熱温度が設定される請求項3に記載のコイル装置の製
造装置。 【数3】Y≦−20X+530
4. A trowel at the film removal station (2)
4. The coil device according to claim 3, wherein the heating time and the heating temperature satisfying the relational expression represented by the following mathematical formula 3 are set when the heating time by (21) is X (seconds) and the heating temperature is Y (° C.). Manufacturing equipment. [Equation 3] Y ≦ −20X + 530
【請求項5】 更に、巻線ステーション(6)の後段に
は、コア若しくはボビンに巻回された絶縁導線(1)の導
体被覆部(16)から伸びる導体露出部(15)に半田付けを施
す半田付けステーションが配備されている請求項3又は
請求項4に記載のコイル装置の製造装置。
5. Further, after the winding station (6), solder is attached to a conductor exposed portion (15) extending from the conductor coating portion (16) of the insulated conductor (1) wound around a core or a bobbin. The apparatus for manufacturing a coil device according to claim 3 or 4, wherein a soldering station for applying is provided.
【請求項6】 ポリエーテルサルホン樹脂からなる絶縁
皮膜(10)を有する絶縁導線(1)をコア若しくはボビンに
巻回して、コイル装置を製造する方法において、 絶縁導線(1)を繰り出しつつ、繰り出された絶縁導線
(1)の表面に高温のこて(21)を圧接せしめて、絶縁皮膜
(10)を除去することにより、絶縁導線(1)に導体被覆部
(16)と導体露出部(15)とを交互に形成する皮膜除去工程
と、 皮膜除去工程を経て供給される絶縁導線(1)の導体被覆
部(16)をコア若しくはボビンに巻回する巻線工程とを有
していることを特徴とするコイル装置の製造方法。
6. A method for manufacturing a coil device by winding an insulating wire (1) having an insulating film (10) made of polyethersulfone resin around a core or a bobbin, while feeding the insulating wire (1), Insulated conductive wire
Insulate the surface of (1) with a hot iron (21)
By removing (10), the insulated wire (1) is covered with a conductor.
Winding for winding a conductor removing portion (16) of the insulated conductor (1) supplied through the film removing step and the film removing step of alternately forming the conductor exposed portion (15) around a core or a bobbin. And a wire process.
【請求項7】 皮膜除去工程でのこて(21)による加熱時
間をX(秒)、加熱温度をY(℃)としたとき、下記数4で
表わされる関係式を満たす加熱時間と加熱温度を設定す
る請求項6に記載のコイル装置の製造方法。 【数4】Y≦−20X+530
7. A heating time and a heating temperature that satisfy the relational expression represented by the following mathematical formula 4, when the heating time by the trowel (21) in the film removing step is X (seconds) and the heating temperature is Y (° C.). The method for manufacturing a coil device according to claim 6, wherein: [Equation 4] Y ≦ −20X + 530
【請求項8】 更に、巻線工程の後に、コア若しくはボ
ビンに巻回された絶縁導線(1)の導体被覆部(16)から伸
びる導体露出部(15)に半田付けを施す半田付け工程を有
している請求項6又は請求項7に記載のコイル装置の製
造方法。
8. A soldering step of, after the winding step, soldering an exposed conductor portion (15) extending from a conductor coating portion (16) of an insulated conductor (1) wound around a core or a bobbin. The manufacturing method of the coil device according to claim 6 or 7, which has.
【請求項9】 ポリエーテルサルホン樹脂からなる絶縁
皮膜(10)を有する絶縁導線(1)をコア若しくはボビンに
巻回して、コイル装置を製造する装置において、 絶縁導線(1)を繰り出す送線ステーション(4)と、 送線ステーション(4)から繰り出される絶縁導線(1)を
コア若しくはボビンに巻回した後、連続して絶縁導線
(1)をコア若しくはボビンに設けられた端子部(71)に絡
げて、該端子部(71)の近傍にて絶縁導線(1)を切断する
巻線絡げステーションと、 巻線絡げステーション(64)を経て供給されるコア若しく
はボビンの端子部(71)に絡げられた絶縁導線(1)に対し
て、接触離間する高温のこて(21)が配備され、該こて(2
1)をコア若しくはボビンの端子部に絡げられた絶縁導線
(1)の表面に圧接せしめて、絶縁皮膜(10)の少なくとも
一部を除去することにより、絶縁導線(1)に導体露出部
(15)を形成する導体露出ステーションとを有することを
特徴とするコイル装置の製造装置。
9. A wire for feeding an insulated conductor (1) in a device for manufacturing a coil device, which comprises winding an insulated conductor (1) having an insulation film (10) made of polyethersulfone resin around a core or a bobbin. After winding the station (4) and the insulated conductor (1) fed from the wire-sending station (4) around a core or bobbin, the insulated conductor is continuous.
A winding entanglement station for entwining (1) with a terminal portion (71) provided on a core or a bobbin and cutting the insulated conductor (1) in the vicinity of the terminal portion (71); A high-temperature iron (21) that comes into contact with and separates from the insulated conductor (1) entwined with the terminal portion (71) of the core or bobbin supplied through the station (64) is provided. 2
1) Insulated wire entwined with the core or bobbin terminal
The conductor is exposed on the insulated conductor (1) by pressing it onto the surface of (1) and removing at least a part of the insulating film (10).
An apparatus for manufacturing a coil device, comprising: a conductor exposing station forming (15).
【請求項10】 前記導体露出ステーション(24)でのこ
て(21)による加熱時間をX(秒)、加熱温度をY(℃)とし
たとき、下記数5で表わされる関係式を満たす加熱時間
と加熱温度が設定される請求項9に記載のコイル装置の
製造装置。 【数5】Y≦−20X+530
10. Heating which satisfies the relational expression represented by the following formula 5 when the heating time by the iron (21) at the conductor exposing station (24) is X (seconds) and the heating temperature is Y (° C.) The manufacturing apparatus for a coil device according to claim 9, wherein time and heating temperature are set. [Equation 5] Y ≦ −20X + 530
【請求項11】 更に、導体露出ステーション(24)の後
段には、コア若しくはボビンの端子部(71)に絡げられた
絶縁導線(1)の導体(11)に半田付けを施す半田処理ステ
ーション(24)が配備されている請求項9又は請求項10
に記載のコイル装置の製造装置。
11. A solder processing station for soldering a conductor (11) of an insulated conductor (1) entwined with a terminal portion (71) of a core or a bobbin after a conductor exposing station (24). (24) is provided Claim 9 or Claim 10
An apparatus for manufacturing the coil device according to 1.
【請求項12】 ポリエーテルサルホン樹脂からなる絶
縁皮膜(10)を有する絶縁導線(1)をコア若しくはボビン
に巻回して、コイル装置を製造する方法において、 絶縁導線(1)を繰り出しつつ、繰り出された絶縁導線
(1)をコア若しくはボビンに巻回した後、連続して絶縁
導線(1)をコア若しくはボビンに設けられた端子部(71)
に絡げて、該端子部(71)の近傍にて絶縁導線(1)を切断
する巻線絡げ工程と、 巻線絡げ工程を経て供給されるコア若しくはボビンの端
子部(71)に絡げられた絶縁導線(1)に対して、接触離間
する高温のこて(21)が配備され、該こて(21)をコア若し
くはボビンの端子部(71)に絡げられた絶縁導線(1)の表
面に圧接せしめて、絶縁皮膜(10)の少なくとも一部を除
去することにより、絶縁導線(1)に導体露出部(15)を形
成する導体露出工程とを有していることを特徴とするコ
イル装置の製造方法。
12. A method for manufacturing a coil device by winding an insulating conductive wire (1) having an insulating coating (10) made of polyether sulfone resin around a core or a bobbin, while feeding the insulating conductive wire (1), Insulated conductive wire
After winding (1) around the core or bobbin, the insulated conductor (1) is continuously provided on the core or bobbin.
The winding wire wrapping step of cutting the insulated conductor (1) in the vicinity of the terminal portion (71) and the terminal portion (71) of the core or bobbin supplied through the winding wire wrapping step. A high-temperature trowel (21) that is in contact with and separated from the entangled insulated conductor (1) is provided, and the trowel (21) is entangled with the terminal portion (71) of the core or bobbin. A conductor exposing step of forming a conductor exposed portion (15) on the insulated conducting wire (1) by press-contacting the surface of (1) and removing at least part of the insulating film (10). And a method for manufacturing a coil device.
【請求項13】 皮膜除去工程でのこて(21)による加熱
時間をX(秒)、加熱温度をY(℃)としたとき、下記数6
で表わされる関係式を満たす加熱時間と加熱温度を設定
する請求項12に記載のコイル装置の製造方法。 【数6】Y≦−20X+530
13. When the heating time by the trowel (21) in the film removing step is X (seconds) and the heating temperature is Y (° C.), the following formula 6 is obtained.
The method for manufacturing a coil device according to claim 12, wherein the heating time and the heating temperature satisfying the relational expression are set. (6) Y ≦ −20X + 530
【請求項14】 更に、導体露出工程の後に、コア若し
くはボビンの端子部(71)に絡げられた絶縁導線(1)の導
体(11)に半田付けを施す半田処理工程を有している請求
項12又は請求項13に記載のコイル装置の製造方法。
14. The method further comprises, after the conductor exposing step, a soldering step of soldering the conductor (11) of the insulated conductor (1) entwined with the terminal portion (71) of the core or bobbin. A method for manufacturing the coil device according to claim 12 or 13.
JP2001253526A 2001-08-23 2001-08-23 Method of removing insulating coating film and method of manufacturing coil device Withdrawn JP2003068556A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001253526A JP2003068556A (en) 2001-08-23 2001-08-23 Method of removing insulating coating film and method of manufacturing coil device

Publications (1)

Publication Number Publication Date
JP2003068556A true JP2003068556A (en) 2003-03-07

Family

ID=19081839

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2003068556A (en)

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