JP2003015099A - 電気光学装置、電子機器、および電気光学装置の製造方法 - Google Patents
電気光学装置、電子機器、および電気光学装置の製造方法Info
- Publication number
- JP2003015099A JP2003015099A JP2001194939A JP2001194939A JP2003015099A JP 2003015099 A JP2003015099 A JP 2003015099A JP 2001194939 A JP2001194939 A JP 2001194939A JP 2001194939 A JP2001194939 A JP 2001194939A JP 2003015099 A JP2003015099 A JP 2003015099A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- photosensitive resin
- electro
- film
- optical device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 28
- 239000000758 substrate Substances 0.000 claims abstract description 187
- 239000011347 resin Substances 0.000 claims abstract description 134
- 229920005989 resin Polymers 0.000 claims abstract description 134
- 239000004973 liquid crystal related substance Substances 0.000 claims abstract description 87
- 238000005520 cutting process Methods 0.000 claims abstract description 61
- 238000000034 method Methods 0.000 claims abstract description 41
- 230000002093 peripheral effect Effects 0.000 claims description 37
- 239000003566 sealing material Substances 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 13
- 238000000149 argon plasma sintering Methods 0.000 claims description 7
- 230000015572 biosynthetic process Effects 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 5
- 239000010410 layer Substances 0.000 description 136
- 239000011229 interlayer Substances 0.000 description 30
- 239000003990 capacitor Substances 0.000 description 14
- 239000012535 impurity Substances 0.000 description 14
- 239000004065 semiconductor Substances 0.000 description 14
- 238000000206 photolithography Methods 0.000 description 11
- 238000003860 storage Methods 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 229920001721 polyimide Polymers 0.000 description 10
- 229910052814 silicon oxide Inorganic materials 0.000 description 10
- 239000011159 matrix material Substances 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- -1 phosphorus ions Chemical class 0.000 description 8
- 239000004925 Acrylic resin Substances 0.000 description 7
- 229920000178 Acrylic resin Polymers 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 230000001681 protective effect Effects 0.000 description 7
- 239000007789 gas Substances 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 6
- 239000004642 Polyimide Substances 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- 229910052796 boron Inorganic materials 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 239000011574 phosphorus Substances 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 239000000470 constituent Substances 0.000 description 3
- 230000010365 information processing Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- 101001062854 Rattus norvegicus Fatty acid-binding protein 5 Proteins 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- RHZWSUVWRRXEJF-UHFFFAOYSA-N indium tin Chemical compound [In].[Sn] RHZWSUVWRRXEJF-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000005224 laser annealing Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 235000013842 nitrous oxide Nutrition 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229920005575 poly(amic acid) Polymers 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000002964 rayon Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
Landscapes
- Liquid Crystal (AREA)
- Optical Elements Other Than Lenses (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001194939A JP2003015099A (ja) | 2001-06-27 | 2001-06-27 | 電気光学装置、電子機器、および電気光学装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001194939A JP2003015099A (ja) | 2001-06-27 | 2001-06-27 | 電気光学装置、電子機器、および電気光学装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003015099A true JP2003015099A (ja) | 2003-01-15 |
| JP2003015099A5 JP2003015099A5 (enrdf_load_stackoverflow) | 2005-07-21 |
Family
ID=19032990
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001194939A Withdrawn JP2003015099A (ja) | 2001-06-27 | 2001-06-27 | 電気光学装置、電子機器、および電気光学装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2003015099A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007294403A (ja) * | 2006-03-28 | 2007-11-08 | Canon Inc | 有機発光装置及びその製造方法 |
| WO2008047500A1 (fr) * | 2006-10-20 | 2008-04-24 | Sharp Kabushiki Kaisha | Procédé de fabrication d'unité de diffusion et unité de diffusion |
-
2001
- 2001-06-27 JP JP2001194939A patent/JP2003015099A/ja not_active Withdrawn
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007294403A (ja) * | 2006-03-28 | 2007-11-08 | Canon Inc | 有機発光装置及びその製造方法 |
| US8067785B2 (en) | 2006-03-28 | 2011-11-29 | Canon Kabushiki Kaisha | Organic light emitting apparatus and method of producing the same |
| US8093076B2 (en) | 2006-03-28 | 2012-01-10 | Canon Kabushiki Kaisha | Organic light emitting apparatus and method of producing the same |
| WO2008047500A1 (fr) * | 2006-10-20 | 2008-04-24 | Sharp Kabushiki Kaisha | Procédé de fabrication d'unité de diffusion et unité de diffusion |
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