JP2003007586A - Temperature regulator and aligner - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent the performance of an aligner from deteriorating by sustaining temperature regulation constantly at a high accuracy part, e.g. a projection lens, even when the aligner is not operated but stored. SOLUTION: A temperature regulation facility 2 for regulating temperature of a chamber 1 containing an exposing stage 10 comprises a partial temperature regulating section 30 performing temperature regulation only of a high accuracy part, e.g. a projection lens 14, by surrounding it with a temperature regulation cover 17, and a main temperature regulating section 20 performing temperature regulation in the chamber 1 entirely. When temperature regulation of a clean room for installing the chamber 1 is stopped for maintenance under a state where the exposing stage 10 is not operating, temperature management of the projection lens 14 is sustained by operating only the partial temperature regulating section 30.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a temperature controller and an exposure apparatus for controlling the temperature of an exposure apparatus for exposing a substrate such as a wafer for manufacturing a semiconductor device or the like.

[0002]

2. Description of the Related Art In recent years, semiconductor exposure apparatuses are required to have higher performance as semiconductor elements are miniaturized. For example, alignment accuracy between a wafer and a reticle, transfer accuracy of a reticle pattern onto a wafer, etc. Is required to be more sophisticated. In order to realize these, parts with high dimensional accuracy are used for each part of the exposure device, and
In order to prevent such deformation and displacement due to thermal expansion of the high precision component and maintain the component precision, it is necessary to strictly control the temperature of each part of the exposure apparatus.

The exposure apparatus is provided with a chamber and temperature control equipment for controlling the temperature of the main body of the exposure apparatus on which the above-mentioned high-precision parts are mounted. The chamber covers the entire body of the exposure apparatus, and the temperature control equipment controls the temperature of the atmosphere inside the chamber by supplying temperature control air or the like.

Conventionally, chamber temperature control has been performed as follows. In order for the exposure apparatus to exert a predetermined performance, it is necessary to strictly control the space temperature around the exposure apparatus main body and the exposure apparatus main body with an accuracy of 0.05 ° C., for example. Therefore, the entire body of the exposure apparatus is surrounded by a chamber, and the temperature inside the chamber is controlled by temperature control equipment to control the temperature of the exposure apparatus body and the space around the exposure apparatus body to a required temperature.

Normally, the exposure apparatus is installed in a room called a clean room. When the temperature of the clean room is high, in order to maintain the temperature in the chamber constant and maintain the performance of the exposure apparatus, the temperature of more chambers is increased. Requires controllability.

As described above, the temperature control capability required for the exposure apparatus is determined by how much the external temperature of the exposure apparatus fluctuates, but in the clean room in which the exposure apparatus is installed, the temperature control is normally 1 to 2 ° C. at all times. The temperature control capability of the exposure apparatus is determined on the basis of the accuracy. That is, in order for the exposure apparatus to operate normally, the temperature control capability of the chamber is not sufficient, and it is necessary that the temperature of the clean room be properly controlled. On the other hand, regarding the temperature control of the exposure apparatus, the temperature control equipment attached to the chamber of the exposure apparatus has been downsized because the temperature control of the clean room is assumed.

[0007]

However, in order to maintain high exposure apparatus performance, even when the exposure apparatus is stored, that is, when the exposure apparatus is not used, the high-precision parts of the exposure apparatus main body are always For example, it is necessary to control the temperature at about ± 3 ° C to prevent thermal deformation of high-precision parts. If the temperature control function of the clean room is stopped for maintenance, it is difficult to perform the necessary temperature control. There were unresolved issues.

More specifically, the projection lens and the like of the main body of the exposure apparatus may not be able to reproduce the desired apparatus performance if the positional accuracy and shape accuracy change greatly due to thermal distortion. Therefore, in order to prevent deformation and displacement of high-precision parts such as the projection lens even when it is stored without using the exposure apparatus, it is necessary to manage the temperature in a temperature range slightly gentler than that during operation of the exposure apparatus.

Since the temperature of the clean room is normally controlled at all times, even if the temperature control function of the chamber of the exposure apparatus is stopped when the exposure apparatus is stored, the temperature of the outside of the exposure apparatus is controlled, and the exposure apparatus cannot be controlled. The temperature required during operation is maintained.

However, when the temperature control function of the clean room is stopped, the outside temperature of the chamber of the exposure apparatus becomes high, and when the temperature exceeds the allowable temperature, the temperature control equipment of the chamber of the exposure apparatus on the premise of the temperature control of the clean room is installed. Since it is small as described above, it was not possible to maintain the temperature of the main body of the exposure apparatus at the required temperature even when it was fully operated.

Therefore, in the conventional exposure apparatus, the temperature control function of the clean room could not be stopped for a long period of time.

On the other hand, in the temperature control equipment of the chamber of the exposure apparatus,
Even if the temperature control function of the clean room is stopped, it is necessary to provide a temperature control capability that can prevent thermal deformation of the main body of the exposure apparatus. The inconvenience of having to deploy occurs.

The present invention has been made in view of the above-mentioned unsolved problems of the prior art, and the projection of the exposure table is performed even when the temperature control of the clean room is stopped, or when the exposure apparatus is stored or transported outside the clean room. It is an object of the present invention to provide a small-sized and high-performance temperature control device and an exposure device that can continuously control the temperature of a highly accurate part such as a lens.

[0014]

In order to achieve the above object, the temperature control apparatus of the present invention comprises a chamber for accommodating the apparatus main body and a temperature control medium for controlling the temperature of the entire apparatus main body. A main temperature control part for supplying to the chamber, a partial temperature control part for supplying a temperature control medium for locally controlling the temperature of the high precision part of the apparatus body part to the periphery of the high precision part, and the main temperature control part. A first control system for controlling the tuning section,
A second control system for controlling the partial temperature control unit, wherein the first and second control systems individually and independently control the main temperature control unit and the partial temperature control unit. Is characterized by.

When the temperature outside the chamber is not controlled, it is preferable to operate only the partial temperature control section.

A battery for supplying electric power to the partial temperature control unit may be provided.

The main temperature controller and the partial temperature controller may share a temperature controller, and an inverter for adjusting the output of the temperature controller may be provided.

A temperature control cover may be provided to surround the high precision portion.

The chamber is preferably arranged in a clean room.

The exposure apparatus of the present invention is characterized in that the temperature of the exposure table is controlled by the above temperature controller.

It is preferable that the high precision portion is a projection lens of the exposure table.

[0022]

When the exposure apparatus is operating in the clean room, the main temperature control section for controlling the temperature of the entire apparatus main body section such as the exposure table,
The temperature control of the entire exposure table is performed by simultaneously operating the partial temperature control units that control the temperature of high-precision parts such as the projection lens. When the exposure table is not in operation, the temperature of the clean room in which the chamber is installed is controlled by the temperature control (external temperature control means) .However, when the temperature control by the clean room is stopped due to maintenance of the clean room, etc. There is a possibility that thermal distortion or positional displacement may occur in the projection lens or the like due to an increase in the external temperature of the projector. In order to prevent this, the second control system operates only the partial temperature control unit to control the temperature of only the projection lens.

The other parts of the exposure table except the high-precision part such as the projection lens are not affected by the temperature rise while the clean room is stopped, and therefore only the partial temperature control part is operated.

As in the case where the temperature of the entire chamber is controlled to control the temperature of a highly accurate part while the clean room is stopped,
Since it is not necessary to increase the temperature control capacity of the entire temperature control device,
It is possible to avoid increasing the size of the temperature control device.

By using such a small-sized and power-saving temperature control device, it is possible to perform highly reliable temperature control without impairing the performance of a highly accurate part such as the projection lens of the exposure table under any circumstances. .

[0026]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described with reference to the drawings.

FIG. 1 illustrates a temperature control apparatus according to the first embodiment. An exposure table 10, which is the apparatus main body of the exposure apparatus provided in a chamber 1 that is substantially sealed, is protected from external vibration. Vibration isolation table 11 to be removed, structure 1 for holding the projection optical system
2. Wafer stage 1 for moving the wafer W as a substrate
3, a projection lens 14 which is a highly accurate portion for projecting and transferring the reticle pattern onto the wafer W, a reticle alignment device 15 for positioning the reticle, an illumination system 16 for irradiating the reticle, and the like.

The temperature control equipment 2 of the chamber 1 includes a main temperature control section 20 for supplying air (temperature control air) as a temperature control medium to the entire exposure apparatus, and a projection lens 1 requiring more strict temperature control.
It has a partial temperature control unit 30 that specializes in temperature control of the temperature control cover 17 surrounding the temperature control unit 4.

The main temperature control unit 20 is a duct 20 connected to the lower exhaust port and the upper intake port of the chamber 1, respectively.
a, 20b and the chamber 1 taken from the duct 20a
A temperature controller 21 that adjusts the exhaust air (air) to an appropriate temperature,
The air having the blower 22 and discharged from the exhaust port of the chamber 1 to the duct 20a as shown by the arrow A1 is used for the temperature controller 2
1, the temperature control air A2 is generated, is introduced into the upper part of the chamber 1 through the duct 20b as shown by an arrow A3, and flows down in the chamber 1 as shown by an arrow A4, and the exposure table 10
Perform overall temperature control.

Further, the partial temperature control unit 30 includes ducts 30a and 30b connected to the lower exhaust port and the upper intake port of the temperature control cover 17 surrounding the projection lens 14 of the exposure table 10, respectively.
And a temperature controller 31 that adjusts the exhaust (air) of the temperature control cover 17 taken in from the duct 30a to an appropriate temperature, and a blower 32, and the duct from the exhaust port of the temperature control cover 17 as indicated by arrow B1. The air discharged to 30a is supplied to the temperature controller 31.
Becomes the temperature control air B2 by way of the duct 30b and is introduced to the upper part of the temperature control cover 17 as shown by the arrow B3.
The inside of the projection lens 1 flows down as indicated by an arrow B4, and the projection lens 1
The temperature control of 4 is partially performed.

Since the temperature of the partial temperature control unit 30 is controlled only by the projection lens 14, the temperature controller 31 and the blower 32 are smaller than those of the main temperature control unit 20.

In the normal operating state of the exposure apparatus, the main temperature control unit 20 and the partial temperature control are controlled by the first control system for controlling the main temperature control unit 20 and the second control system for controlling the partial temperature control unit 30. The parts 30 are simultaneously operated to control the temperature of the entire exposure apparatus. That is, both the main temperature control air A1 to A4 and the partial temperature control air B1 to B4 are flowing.

Further, the environmental temperature of the clean room in which the exposure apparatus is installed is also temperature-controlled, and the external temperature is also controlled by this to realize the required temperature control accuracy (eg, 0.05 ° C.) of each part of the exposure apparatus. ing. The second control system that controls the partial temperature control unit 30 realizes more severe temperature control accuracy in terms of the performance of the projection lens 14.

The temperature control capability of the above-mentioned exposure apparatus is premised on the fact that the clean room is controlled to a predetermined temperature. Without such external temperature control, the exposure table 10 cannot be controlled to the required temperature. On the other hand, the control temperature of the clean room is set so as to suppress the temperature rise of each part of the exposure apparatus within a predetermined temperature even when the exposure apparatus stops and the temperature control facility 2 stops. In this case, in order to maintain the performance of the apparatus, the temperature rise allowed by returning to a predetermined temperature when the exposure apparatus operation is restarted, for example, even if the projection lens or the like whose position accuracy and shape accuracy have extremely severe tolerance values is thermally deformed. The temperature at which the projection lens can return to a predetermined size or shape again.

Next, the case where the clean room operation is stopped will be described. The operation of the clean room is an extremely rare condition that is mainly assumed during maintenance of the clean room.At this time, the exposure apparatus is not operating and is in the storage state, but the clean room is stopped and the external temperature control is lost. When the temperature around the exposure apparatus rises, the temperature of the main body of the exposure apparatus exceeds the allowable temperature. At this time, once the temperature of the projection lens 14 exceeds the allowable value, the exposure apparatus cannot exhibit the predetermined performance even if the operation is restarted due to the displacement of the lens or the like.

If the overall capability of the temperature control facility 2 is increased so that the entire exposure apparatus can be maintained at a predetermined temperature even in such an extremely rare clean room stop state, the cost will increase and the size of the exposure apparatus will increase. In order to prevent this, the exposure apparatus of the conventional example had no choice but to keep operating the clean room.

In this embodiment, the main temperature control section 20 for controlling the temperature of the entire exposure table 10 and the partial temperature control section 30 for controlling the temperature of only the projection lens 14 are separated, and the first and second temperature control sections are separated. It is controlled individually by the control system, and when the main temperature control unit 20 and the partial temperature control unit 30 are operated and stopped at the same time, or the operation of the clean room is stopped for maintenance or the like, the second control system controls the partial temperature control. Only the adjusting unit 30 can be operated. That is, it should be noted that the allowable value of the temporary temperature rise in the exposure apparatus due to the stop of the clean room operation is looser in the other parts of the exposure table 10 than the projection lens 14, and when the clean room is stopped, the second control system is used. Thus, only the temperature of the projection lens 14 is adjusted, and the main temperature adjusting section 20 for adjusting the temperature of the other parts is stopped.

In other words, when the clean room operation is stopped, the power supply to the main temperature control unit 20 is stopped and only the temperature control air B1 to B4 for controlling the temperature of the projection lens 14 is allowed to flow. Since the temperature control range of the projection lens 14 is a small space between the temperature control covers 17, the temperature control device 31 is not so large.

Thus, when the clean room operation is stopped, the temperature control except for the projection lens 14 is stopped to save power in the storage state of the apparatus.

In the present embodiment, the object of partial temperature control is the projection lens, but it is not limited to this. Although air cooling was used as the temperature control method, liquid cooling may be used.

FIG. 2 shows a modification of the first embodiment. This is the temperature controller 31 and the blower 32 of the partial temperature controller 30.
A battery 33 is provided as a power source for the main temperature control unit 20.
The temperature control of the projection lens 14 can be continued even when the power source of the device for driving the projector is stopped, the commercial power source is not used for transportation, the temporary storage location, or the like.

By thus separating the power source for the partial temperature control unit from the power source for the main temperature control unit, the reliability of device protection can be further improved.

FIG. 3 shows a second embodiment. this is,
Branch for connecting the duct 40a on the introduction side of the partial temperature control unit to the duct 20a on the introduction side of the main temperature control unit 20 and for utilizing a part of the temperature control air of the main temperature control unit 20 for the partial temperature control unit. The duct 41 and the blower 42 are provided, and when only the partial temperature control unit is operated to control the temperature of the projection lens 14 when the clean room is stopped, the ducts 20a and 20b of the main temperature control unit 20 are controlled by the second control system. It is configured to close the gates 23 and 24 provided in the.

The chamber 1, the exposure table 10 and each part thereof,
The main temperature control unit 20 is the same as that of the first embodiment, and therefore is denoted by the same reference numeral and its description is omitted.

The mechanism of temperature control during operation of the apparatus is the same as that of the first embodiment. Main temperature control air A1 to A4 for controlling the temperature of the entire apparatus by the first control system and the second control system. Partial temperature control air C1 to C4 for controlling only the projection lens 14
Both are flowing. The temperature controller 21 does not have the ability to maintain the temperature of the entire exposure apparatus at a necessary temperature while the temperature control of the clean room is stopped.

When the temperature control function of the clean room is stopped during the storage of the exposure apparatus, the gates 23 and 24 are closed to block the flow of the temperature control airs A1 to A4, and the temperature control air C1 to the temperature control section of the projection lens 14 is controlled. Only C4 is thrown. In addition, in order to stop the main temperature control air A1 to A4, the blower 2
It goes without saying that 2 is stopped.

When the flow of the temperature control air A1 to A4 of the entire apparatus is stopped, only the partial temperature control air C1 to C4 flows to the temperature controller 21. Then, the temperature controller 21 causes the temperature control air C1 to
Since the temperature control capacity that can be processed with respect to C4 is increased, the temperature control capacity of the temperature controller 21 corresponding to that temperature control air C1 that requires a larger processing capacity than usual due to the rise of the external temperature. It is possible to turn to the temperature control ability for C4. That is, the temperature control ability of the entire exposure apparatus does not change, but the temperature control ability usable for lens temperature control increases.

Therefore, the temperature controller 21 has the same size as that of the conventional example, and even if the temperature control function of the clean room is stopped during the storage of the exposure apparatus, the temperature control necessary for protecting the projection lens 14, which is a highly accurate portion, is performed. be able to. However, since the capacity of the temperature controller 21 may become excessive by stopping the main temperature control air A1 to A4, an inverter 43 that reduces the output of the temperature controller 21 and adjusts it to a predetermined level is provided.

The second control system includes a controller 44 that closes the gates 23 and 24 as the blower 22 is stopped and the output of the temperature controller 21 is reduced by the inverter 43.

FIG. 4 shows a modification of the second embodiment. This is provided with a branch duct 45 for adjusting the partial temperature of the wafer stage 13 in addition to the branch duct 41 for adjusting the partial temperature of the projection lens 14, and the temperature adjusting air D3, D4 is supplied for controlling the temperature of the wafer stage 13. ing. A blower 46 and a gate 47 for adjusting the air volume of the temperature-controlled air D3, D4 are added to a branch duct 45 that guides the partial-temperature-controlled air to the wafer stage 13, and the exposure table 10 is bypassed in the chamber 1. A pipe 48 is provided. The gates 23, 24, and 47 do not completely close so that an appropriate gap is created so that the temperature-adjusting air for the wafer stage and the temperature-adjusting air for the lenses can flow in appropriate amounts.

Although the temperature of the partial temperature control unit is controlled by a temperature sensor (not shown) or the like, the control temperature is set higher than that during operation of the exposure apparatus. By doing so, it is possible to save power when the exposure apparatus is stored. Further, the change in the temperature setting is automatically changed by the controller 44.

The temperature outside the exposure apparatus is measured by a temperature sensor (not shown), and the opening / closing degree of the gates 23, 24, 47 is adjusted,
By changing the air volume of the temperature control air, more appropriate temperature control during storage of the exposure apparatus can be performed according to the ambient temperature of the chamber 1. Furthermore, if the temperature exceeds the set temperature range,
The operator is warned by a buzzer, a signal light, etc. as in the case of operating the exposure apparatus.

[0053]

Since the present invention is configured as described above, it has the following effects.

By realizing a temperature control device capable of continuing the temperature control of a highly accurate portion such as the projection lens of the exposure table even when the temperature control of the clean room is stopped or when the exposure device is stored and transported outside the clean room, It is possible to avoid deterioration of the performance of the exposure apparatus due to thermal distortion or the like of the precision portion, and promote higher precision of the exposure apparatus and semiconductor manufacturing apparatus.

By using such an exposure apparatus and semiconductor manufacturing apparatus, it is possible to contribute to cost reduction and high definition of semiconductor devices and the like.

[Brief description of drawings]

FIG. 1 is a diagram illustrating a first embodiment.

FIG. 2 is a diagram illustrating a modification of the first embodiment.

FIG. 3 is a diagram illustrating a second embodiment.

FIG. 4 is a diagram illustrating a modification of the second embodiment.

[Explanation of symbols]

1 chamber 2 Temperature control equipment 10 exposure table 11 Vibration isolation table 12 structures 13 Wafer stage 14 Projection lens 15 Reticle alignment device 16 Lighting system 17 Temperature control cover 20 Main temperature control section 21, 31 Temperature controller 22, 32, 42, 46 Blower Gate 23, 24, 47 30 Partial temperature control section 33 battery 41, 45 branch duct 43 inverter 44 controller

Claims (8)

[Claims] 1. A chamber for accommodating an apparatus main body, a main temperature control section for supplying a temperature control medium for controlling the temperature of the entire apparatus main body to the chamber, and a high-precision part of the apparatus main section. A partial temperature control unit that supplies a temperature control medium for locally performing temperature control to the periphery of the high-precision region, a first control system that controls the main temperature control unit, and a control of the partial temperature control unit And a second control system, wherein the first and second control systems individually and independently control the main temperature control unit and the partial temperature control unit. . 2. The temperature controller according to claim 1, wherein only the partial temperature controller is operated when the temperature outside the chamber is not controlled. 3. The temperature control device according to claim 1, further comprising a battery for supplying electric power to the partial temperature control section. 4. The main temperature controller and the partial temperature controller share a temperature controller, and an inverter for adjusting the output of the temperature controller is provided. Temperature control device. 5. The temperature control device according to claim 1, further comprising a temperature control cover surrounding a high precision portion. 6. The chamber according to claim 1, wherein the chamber is arranged in a clean room.
The temperature control device according to the item. 7. An exposure apparatus, wherein the temperature control device according to claim 1 controls the temperature of an exposure table. 8. The exposure apparatus according to claim 7, wherein the high precision portion is a projection lens of an exposure table.