JP2003005405A - Layered photoreceptor and method for manufacturing base body for layered photoreceptor - Google Patents

Abstract

PROBLEM TO BE SOLVED: To manufacture a layered photoreceptor and a base body for the layered photoreceptor having excellent appearance quality and preferable electrophotographic characteristics which suppresses production of black speckles during forming images without requiring the preparation of a detergent or a special equipment. SOLUTION: An aluminum substrate is electrolytically treated to produce an anodized film which is subjected to sealing treatment. A charge generating layer and a charge transfer layer are formed on the anodized layer after the sealing treatment to manufacture the layered photoreceptor. In this method, the anodized layer after the sealing treatment is immersed in an aqueous solution of nitric acid with the concentration of >=5 wt.% and <=10 wt.% then, the anodized layer after immersion is cleaned with water.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention performs a pore-sealing treatment on an alumite layer produced by electrolytically treating an aluminum substrate, and forms a charge-generating layer and a charge-transporting layer on the alumite layer after the pore-sealing treatment. The present invention relates to a laminated photoconductor and a method for manufacturing a laminated photoconductor substrate.

[0002]

2. Description of the Related Art As a conventional method for manufacturing a laminated type photoreceptor,
JP-A-10-333342 and JP-A-5-15
There is a method disclosed in Japanese Patent No. 8257. That is, the former is
After the alumite treatment and the sealing treatment, it is a method of washing with a detergent containing a predetermined surfactant and having a pH value of 9.5 to 13.0. The latter is a method of irradiating the conductive substrate with ultrasonic waves and washing the substrate with pure water or the like while rocking the substrate. The purpose of these methods is to prevent the generation of cissing and spots when a photosensitive solution is applied, and to prevent the generation of black spots and uneven density when an image is formed using the obtained photoreceptor.

[0003]

However, the conventional technique using the cleaning agent has a problem that the work of preparing the cleaning agent is required, and the conventional technique of irradiating the ultrasonic wave does not emit the ultrasonic wave. There was a problem that equipment was required. Further, it is desired that the laminated-type photoreceptor has a better appearance quality because it improves image characteristics.

The present invention has been made in view of such conventional problems. It does not require a cleaning agent preparation operation or special equipment, has an excellent appearance quality, and produces black spots during image formation. It is an object of the present invention to provide a method for producing a laminated photoreceptor and a substrate for laminated photoreceptor having excellent electrophotographic characteristics that suppress

[0005]

In order to achieve the above object, in the method for producing a laminated type photoreceptor according to the present invention, a sealing treatment is performed on an alumite layer produced by electrolytically treating an aluminum substrate, In the method for producing a laminated-type photoconductor in which a charge generation layer and a charge transport layer are provided on the alumite layer after the pore-sealing treatment, the amount of the alumite layer after the pore-sealing treatment is 5% by weight or more.
It is characterized in that it is immersed in a nitric acid aqueous solution having a concentration of 0% by weight or less, and the alumite layer after the immersion is washed with water.

In the method for producing a laminated-type photoconductor substrate according to the present invention, the alumite layer produced by electrolytically treating an aluminum substrate is subjected to a pore-sealing treatment, and charges are generated on the alumite layer after the pore-sealing treatment. In the method for producing a laminated-type photoreceptor substrate used in a laminated-type photoreceptor having a layer and a charge transport layer,
It is characterized in that the alumite layer after the sealing treatment is immersed in a nitric acid aqueous solution having a concentration of 5% by weight or more and 10% by weight or less, and the alumite layer after the immersion is washed with water.

In the method for producing a laminated photoreceptor and the method for producing a substrate for a laminated photoreceptor according to the present invention, the alumite layer after the pore-sealing treatment is immersed in an aqueous nitric acid solution having a concentration of 5% by weight or more and 10% by weight or less. As a result, foreign substances such as aluminum compounds adhered to the alumite layer by the sealing treatment can be dissolved and removed in a nitric acid aqueous solution. As a result, the produced laminated-type photoreceptor has improved appearance quality and can prevent occurrence of black spots and density unevenness when an image is formed. By washing the alumite layer after immersion with water,
It is possible to prevent the alumite layer from being corroded by the nitric acid aqueous solution.

In the method for manufacturing a laminated photoreceptor and the method for manufacturing a substrate for a laminated photoreceptor according to the present invention, the temperature of the nitric acid aqueous solution is 20 ° C. or higher and 35 ° C. or lower, and the immersion time of the alumite layer is 5 minutes. It is preferably 10 minutes or less. By performing the immersion treatment under these conditions, it is possible to dissolve and remove the foreign matter in the nitric acid aqueous solution while preventing the alumite layer from being corroded by the nitric acid aqueous solution. The immersion in the nitric acid aqueous solution is preferably performed while stirring the nitric acid aqueous solution.

The method for producing a laminated photoreceptor and the method for producing a substrate for a laminated photoreceptor according to the present invention are the same as those described above, except that after the washing treatment, the final washing treatment of the alumite layer is performed at an electric power of 30 μS or less. 75 ℃ with conductivity
The pure alumite layer is applied to pure water at a temperature of 95 ° C. or higher and 10 ° C. or lower.
10mm / after dipping for more than 120 seconds
It is preferable to discharge from pure water at a speed of not less than 40 seconds and not more than 40 mm / second.

By setting the electric conductivity and temperature of pure water, the immersion time of the alumite layer, and the speed of discharging from the pure water within the above ranges, it is possible to obtain a high quality and excellent appearance alumite film free from stains and impurities. You can The obtained alumite coating can suppress cissing and unevenness of the coating liquid when the charge generation layer and the charge transport layer are coated. As a result, when image formation is performed, it is possible to suppress the occurrence of black spots and density unevenness, which are problematic in the white paper portion during the reversal phenomenon, and it is possible to manufacture a multi-layer photosensitive member having good electrophotographic characteristics. If any one of the electric conductivity and temperature of pure water, the immersion time of the alumite layer, and the speed of discharging from pure water is out of the above range, black spots and density unevenness may occur during image formation. However, it is not possible to manufacture a laminated photoreceptor having good electrophotographic characteristics. The method for producing a laminated photoreceptor and the method for producing a substrate for a laminated photoreceptor according to the present invention do not require special equipment such as cleaning agent preparation work and ultrasonic wave irradiation equipment work.

In the method for producing a laminated type photoreceptor and the method for producing a laminated type photoreceptor substrate according to the present invention, the alumite layer contains 0.2 A / s of sulfuric acid at a temperature of 0 ° C. to 7 ° C. as an electrolyte. dm ² or more 0.7 a / dm ² to be produced in the following thickness 10μm or 3μm by electrolytic treatment of aluminum substrate at a current density of less preferred.

In the method for producing a laminated photoreceptor and the method for producing a laminated photoreceptor substrate according to the present invention, when treated with pure water, the temperature of the pure water is in the range of 75 ° C. to 95 ° C., particularly 80 ° C. C. or higher and 85.degree. Immersion time is 1
In the range of 0 second to 120 seconds, 20 seconds to 40 seconds are particularly preferable. The immersion treatment in pure water is preferably performed using an immersion tank having an upper cooling pipe. in this case,
It is possible to perform hot water draining on the cooling pipe for the laminated-type photoconductor discharged from pure water.

In the method for producing a laminated photoreceptor and the method for producing a laminated photoreceptor substrate according to the present invention, it is preferable that the aluminum substrate has a cylindrical shape. The charge generating layer may be formed of only the charge generating substance or may be formed by uniformly dispersing the charge generating substance in the binder. Examples of the organic pigment include various azo pigments, perylene pigments, phthalocyanine pigments, polycyclic quinone pigments,
Indigo pigments, quinacridone pigments and the like are used. The thickness of the charge generation layer is preferably 0.01 μm or more and 2 μm or less.

The charge transport layer is formed by dissolving a charge transport material, a binder resin and, if necessary, a plasticizer and a leveling agent in a suitable solvent, coating the solution on the charge generating layer, and drying. Examples of the charge transport material include poly-N-vinylcarbazole, poly-γ-carbazolylethylglutamate, pyrene-formaldehyde, polyvinylpyrene, polyvinylphenanthrene, oxazole, and the like.
Oxadiazole, imidazole, triphenylamine, 9- (p-diethylaminostyryl) anthracene, 1,1-bis (4-dibenzylalnophenyl) propane, styrylanthracene, styrylpyrazoline,
Examples thereof include electron-donating substances composed of attractants such as phenylhydrazones and α-stilbene. The thickness of the charge transport layer is
It is preferably 5 μm or more and 30 μm or less.

As the binder resin used in the charge generating layer or the charge transporting layer, the charge generating layer binder resin is, for example, polyamide, polyurethane, polyester, epoxy resin, polyketone, polycarbonate, silicone resin, acrylic resin, polyvinyl butyral, Polyvinyl formal, polyvinyl ketone, polystyrene, poly-N-vinylcarbazole, polyacrylamide and the like are used. The charge transport layer binder resin is, for example,
Polystyrene, styrene-acrylonitrile copolymer, styrene-butadiene copolymer, styrene-maleic anhydride copolymer, polyester, polyvinyl chloride, vinyl chloride-vinyl acetate copolymer, polyvinyl acetate, polyvinylidene chloride, poly Acrylate resin, phenoxy resin, polycarbonate, cellulose acetate resin, ethyl cellulose resin, polyvinyl butyral, polyvinyl formal, polyvinyl toluene, poly-N-vinylcarbazole, acrylic resin, silicone resin, epoxy resin, melamine resin, urethane resin, phenol resin, alkyd A thermoplastic or thermosetting resin such as resin is used.

The charge generation layer and the charge transport layer may have a charge transport layer provided on the charge generation layer or a charge generation layer provided on the charge transport layer. The layered photoreceptor according to the present invention may have a surface protective layer, an undercoat layer or an intermediate layer, if necessary.

The electrolytic treatment is carried out using an aluminum substrate as an anode, and an alumite layer is formed on the surface thereof. The electrolytic solution may be sulfuric acid, oxalic acid, phosphoric acid, or the like.
When sulfuric acid is used as the electrolytic solution, the temperature is preferably 0 ° C. or higher and 7 ° C. or lower, particularly 3 ° C. or higher and 6 ° C. or lower. The current density of the electrolytic treatment is 0.2 A / dm ² or more and 0.7 A /
Especially in the range of dm ² or less, 0.4 A / dm ² or more and 0.6 A
/ Dm ² or less is preferable.

When sulfuric acid is used as the electrolytic solution when forming the alumite layer, the temperature, the current density during the electrolytic treatment, and the thickness of the alumite layer are set within the above ranges, so that they are hard and dense, It is possible to form an alumite layer having high electrolytic film sensitivity. As a result, the manufactured laminated-type photoreceptor can improve the sensitivity during image formation, achieve a reduction in residual potential, and obtain good electrophotographic characteristics. The formed alumite layer has the property of not cracking even if a difference in thermal expansion occurs between the aluminum substrate and the alumite layer when the charge generation layer and the charge transport layer are provided.

In the conventional method for producing a laminated type photoreceptor, sulfuric acid at a temperature of 8 ° C. to 9 ° C. is used as an electrolytic solution in order to prevent cracks from occurring in the alumite layer when the charge generation layer and the charge transport layer are provided. Used as the aluminum substrate for 1-1.
It was common to perform an electrolytic treatment at a current density of 5 A / dm ² to produce an alumite layer. Since the alumite layer thus formed has a limit in the sensitivity of the electrolytic coating, the sensitivity during image formation could not be improved. In contrast,
Using sulfuric acid as the electrolytic solution, its temperature, by setting the current density during the electrolytic treatment and the thickness of the alumite layer within the above range, it is hard and dense, the sensitivity during image formation is improved, and cracks are formed. Can be achieved together.

In the method for producing a laminated photoreceptor and the method for producing a substrate for a laminated photoreceptor according to the present invention, after the formation of the alumite layer and before the final washing treatment, sufficient washing treatment, sealing treatment and finish washing are performed. It is preferable to apply a treatment.

In particular, in the method for producing a laminated type photoreceptor and the method for producing a laminated type photoreceptor substrate according to the present invention, the generated alumite layer is made to have a sealing degree of 600 μS or more and 3000 μS or less by the chromic acid method or the nickel acetate method. It is preferable to perform fine sealing treatment.

The degree of sealing is in the range of 600 μS to 3000 μS, more preferably 800 μS to 2000 μS.
The range of 1000 μS or more and 1500 μS or less is particularly preferable. Here, the degree of sealing is JIS H
It is a value measured by "a sealing test method for anodic oxide films of aluminum and aluminum alloys" based on 8683-1994.

The fine sealing treatment by the chromic acid method is carried out by thoroughly washing the aluminum substrate on which the alumite layer has been formed with water and then immersing it in a mixed aqueous solution of potassium dichromate and sodium carbonate at a predetermined temperature and concentration. . This mixed aqueous solution contains potassium dichromate in an amount of 10 per liter of water.
g or more and 20 g or less, preferably 13 g or more and 17 g or less, and containing sodium carbonate in a concentration of 2 g or more and 7 g or less, preferably 4 g or more and 6 g or less per 1 liter of water,
It is preferable to maintain the temperature at 80 ° C. or higher and 90 ° C. or lower. The immersion time is preferably about 5 minutes.

The fine sealing treatment by the nickel acetate method is carried out by thoroughly washing the aluminum substrate on which the alumite layer has been formed with water and then immersing it in a nickel acetate sealing agent solution at a predetermined temperature and concentration. This nickel acetate sealing agent solution contains 5 g or more and 15 g or less of nickel acetate per liter of water.
It is preferably contained in a concentration of 8 g or more and 12 g or less, and is preferably kept at a temperature of 40 ° C. or more and 50 ° C. or less. The immersion time is preferably about 30 seconds.

By setting the degree of sealing in the above range by the chromic acid method or the nickel acetate method, the alumite layer is formed of aluminum even after a long time has elapsed after the charge generation layer and the charge transport layer were provided. It has the property of not peeling or cracking from the substrate.

In particular, when the fine sealing treatment is performed by the chromic acid method, the alumite layer becomes yellow and the light reflectance becomes low, so that the moire preventing effect can be obtained.

When a silicic acid method, a pure water boiling water method, or a steam method is used as a method for finely sealing holes, a uniform degree of sealing cannot be obtained, which is not preferable.

[0028]

Example A surface-treated cylindrical aluminum substrate was washed with an alkali. The alkali cleaning was performed by keeping a cleaning agent (product code “CC3505” manufactured by Nippon CBB Chemical Co., Ltd.) having a concentration of 5 vol% at 60 ° C., immersing the aluminum substrate three times for 170 seconds while performing filtration circulation and ultrasonic irradiation. It was Next, it was immersed and washed in tap water at room temperature for 170 seconds twice. Further, pure water having an electric conductivity of 30 μS or less was kept at 80 ° C., immersed for 170 seconds and washed with hot water.

After cleaning, the aluminum substrate was subjected to electrolytic treatment using it as an anode. As the electrolytic solution, 15 vol% sulfuric acid was used, and electrolysis was performed at the electrolysis temperature and current density shown in the upper column of Table 1. The thickness of the alumite layer formed by the electrolytic treatment was 7 μm. After the generation of the alumite layer by the electrolytic treatment, it was immersed in tap water at room temperature for 30 seconds, then for 15 seconds twice, and washed with stirring.

[0030]

[Table 1]

Table 1 shows the evaluation results of Test Examples 1-1 to 8 in which a charge generation layer was provided on the alumite layer thus produced, and a charge transport layer was further provided to manufacture a laminated type photoreceptor. In Test Examples 1-1 to 8, electrolytic treatment was performed at the electrolytic temperature and the current density shown in Table 1, respectively. Also,
The charge generation layer was formed of an azo pigment. The charge transport layer was formed of a dichloromethane resin. In the evaluation, the overall image characteristics were evaluated, and the presence or absence of cracks after electrolytic treatment drying, the presence or absence of cracks after coating the photosensitive layer, and the sensitivity of the electrolytic coating were examined. The evaluation of the entire image characteristics was performed by a digital copying machine manufactured by Ricoh. The electrolytic film sensitivity was measured with an electric checker manufactured by Ricoh.

As can be seen from Table 1, Test Examples 1-1 to 4
In the laminated photoreceptor of, the alumite layer is a hard film formed by low-temperature electrolysis, but due to the heat history applied when the charge generation layer and the charge transport layer are applied and dried, a space between the aluminum substrate and the alumite layer is obtained. It is prevented that a difference in thermal expansion occurs and a crack is generated in the alumite layer. Further, in the laminated-type photoreceptors of Test Examples 1-1 to 4, the sensitivity during image formation is improved. Therefore, it can be seen that good electrophotographic characteristics can be obtained with the laminated photoreceptors of Test Examples 1-1 to 4.

The alumite layer formed by the electrolytic treatment was washed twice with tap water at room temperature as described above,
The fine sealing treatment was performed by the chromic acid method at the sealing temperature and sealing degree shown in Table 2. The sealing treatment was performed by immersing in a mixed aqueous solution of potassium dichromate and sodium carbonate at a predetermined temperature and concentration. This mixed aqueous solution contains 15 g of potassium dichromate per liter of water and 5 g of sodium carbonate.
It was prepared by dissolving g and kept at a temperature of 80 ° C. The sealing time was 5 minutes. Thus, Test Examples 2-1 to 4 were prepared.

For comparison, as Test Example 2-5, fine sealing treatment was performed by the pure boiling method at the sealing temperature and sealing degree shown in Table 2. The sealing time was 20 minutes. Also,
As Test Example 2-6, an unsealed product was prepared.

For Test Examples 2-1 to 6-6, after sufficiently washing with water, a charge generation layer was provided on the alumite layer,
Further, a charge transport layer was provided. The charge generation layer and the charge transport layer were formed under the same conditions as in Test Examples 1-1 to 4. Thus, the laminated type photoreceptors of Test Examples 2-1 to 6 were manufactured.

With respect to the laminated photoreceptors of Test Examples 2-1 to 6, the degree of sealing of the alumite layer was examined after being left for 7 days and after being left for 60 days. The degree of sealing is evaluated according to JIS H8683-
Based on 1994, "Anodic oxide film sealing test method for aluminum and aluminum alloys". The results are shown in Table 2.

[0037]

[Table 2]

As can be seen from Table 2, Test Examples 2-1 to -4
In the laminated photoreceptor of, the alumite layer is a hard film formed by low-temperature electrolysis, but due to the heat history applied when the charge generation layer and the charge transport layer are applied and dried, a space between the aluminum substrate and the alumite layer is obtained. It was possible to prevent the occurrence of cracks in the alumite layer due to the difference in thermal expansion even after long-term storage.

In this example, the alumite layer produced by the electrolytic treatment was washed twice with tap water at room temperature as described above, and then finely sealed with the nickel acetate method at the sealing temperature and sealing degree shown in Table 3. I went. The sealing treatment was performed by sufficiently washing the alumite layer with water and then immersing it in a nickel acetate sealing agent solution at a predetermined temperature and concentration. As the nickel acetate sealing agent solution, a commercially available sealing agent (product name “nickel acetate sealing agent Topseal H-298”, manufacturer: Okuno Pharmaceutical Co., Ltd.) was used at a temperature of 45 ° C. at a temperature of 45 ° C. Kept at. The sealing time was 30 seconds. In this way, Test Examples 3-1 to 4 were prepared.

For comparison, as Test Example 3-5,
Fine sealing treatment was performed by the pure boiling method at the sealing temperature and sealing degree shown in Table 3. The sealing time was 20 minutes. In addition, as Test Example 3-6, an unsealed product was prepared.

In Test Examples 3-1 to 6-6, after sufficiently washing with water, a charge generation layer was provided on the alumite layer,
Further, a charge transport layer was provided. The charge generation layer and the charge transport layer were formed under the same conditions as in Example 1. Thus, the laminated type photoreceptors of Test Examples 3-1 to 6 were manufactured.

With respect to the laminate type photoreceptors of Test Examples 3-1 to 6-6, the adhesion of the alumite layer after leaving for 7 days and after leaving for 60 days was examined. Evaluation of adhesiveness was performed in the same manner as in Test Examples 2-1 to 4. The results are shown in Table 3.

[0043]

[Table 3]

As can be seen from Table 3, Test Examples 3-1 to 4
In the laminated type photoreceptor of, while the alumite layer is a hard film formed by low temperature electrolysis, the charge generation layer and the charge transport layer are coated, and due to the heat history applied when dried, the space between the aluminum substrate and the alumite layer is increased. It was possible to prevent the occurrence of cracks in the alumite layer due to the difference in thermal expansion even after long-term storage.

In this example, the aluminum substrate having the alumite layer subjected to the pore-sealing treatment was repeatedly immersed in tap water at room temperature for 30 to 60 seconds twice and washed with stirring. Next, the aluminum substrate after the sealing treatment is
It was immersed in a nitric acid aqueous solution having a concentration of 0 to 20% by weight at 20 to 50 ° C. for 5 to 10 minutes while stirring. The aluminum substrate after immersion was washed with tap water at room temperature using an air bubble, and then immersed in pure water, pulled up by washing with pure water and dried.

After that, the final water washing treatment of the alumite layer was performed. In the final treatment, pure water having an electrical conductivity of 30 μS or less is kept at 80 ° C., the aluminum substrate is immersed in the pure water for 50 seconds, and then 10 mm / second or more and 40 mm / second or more.
It was pulled up from pure water at a speed of less than a second. Thus, Test Example 4
Under the conditions described in Nos. -1 to 18, a laminated photoreceptor substrate was prepared.

Visual inspections were conducted on the laminated photoconductor substrates of Test Examples 4-1 to 18. The results are shown in Table 4.

[0048]

[Table 4]

As can be seen from Table 4, Test Example 4-1,
In the case of the laminated type photoreceptor substrate under the conditions of 2, 4, and 5, CG
L has good wettability, no stains, no residue of impurities, no color loss,
The appearance quality was excellent.

A charge generation layer was provided on the alumite layer of this laminated type photoreceptor substrate, and a charge transport layer was further provided. The charge generation layer and the charge transport layer were formed under the same conditions as in Test Examples 1-1 to 18. When the charge generation layer and the charge transport layer were coated, the alumite coating was able to suppress cissing and unevenness of the coating liquid. In this way, a laminated photoreceptor was manufactured according to this example.

The produced laminated-type photosensitive member had good electrophotographic characteristics because it was possible to suppress the occurrence of black spots and density unevenness which would be a problem in the white paper portion during the reversal phenomenon when an image was formed.

[0052]

EFFECTS OF THE INVENTION According to the method of manufacturing a laminated type photoreceptor and a substrate for a laminated type photoreceptor according to the present invention, the work of preparing a cleaning agent and special equipment are not required, the appearance quality is excellent, and the image forming is performed. In addition, it is possible to manufacture a laminated type photoreceptor having excellent electrophotographic characteristics that suppresses the generation of black spots.

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Claims (5)

[Claims] 1. A laminate type photoconductor, in which an alumite layer formed by electrolytically treating an aluminum substrate is subjected to a sealing treatment, and a charge generating layer and a charge transport layer are provided on the alumite layer after the sealing treatment. In the manufacturing method, the alumite layer after the pore-sealing treatment is dipped in a nitric acid aqueous solution having a concentration of 5% by weight or more and 10% by weight or less, and the alumite layer after the immersion is washed with water. . 2. The temperature of the nitric acid aqueous solution is 20 ° C. or higher and 35 ° C.
And the immersion time of the alumite layer is 5 minutes or more 1
It is 0 minutes or less, The manufacturing method of the laminated | multilayer type photoreceptor of Claim 1 characterized by the above-mentioned. 3. After the water washing treatment, the final water washing treatment of the alumite layer has an electric conductivity of 30 μS or less.
After immersing the alumite layer in pure water at a temperature of 5 ° C. or higher and 95 ° C. or lower for 10 seconds to 120 seconds, 10 m
The method for producing a laminated type photoreceptor according to claim 1 or 2, wherein the pure water is discharged from the pure water at a speed of not less than m / sec and not more than 40 mm / sec. 4. The alumite layer comprises 0.2 A / dm ² or more and 0.7 or more by using sulfuric acid having a temperature of 0 ° C. or more and 7 ° C. or less as an electrolytic solution.
The aluminum substrate is electrolyzed at a current density of A / dm ² or less to produce a thickness of 3 μm or more and 10 μm or less, and the sealing treatment is a fine sealing treatment with a sealing degree of 600 μS or more and 3000 μS or less. Claim 1
2. The method for producing a laminated photoreceptor according to 2 or 3. 5. A laminate type photoreceptor in which an alumite layer produced by electrolytically treating an aluminum substrate is subjected to a sealing treatment, and a charge generating layer and a charge transport layer are provided on the alumite layer after the sealing treatment. In the method for producing a laminated-type photoreceptor substrate to be used, the sealed alumite layer is immersed in an aqueous nitric acid solution having a concentration of 5% by weight or more and 10% by weight or less, and the alumite layer after the immersion is washed with water. A method for manufacturing a laminated-type photoconductor substrate.