JP2003005332A - Development processing device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To logically discriminate the fall of a liquid level of a development processing tank 3As of a development processing device having temperature control means for controlling the temperature of heating means H in accordance with the result detected by temperature detecting means ST so as to maintain the temperature of a development processing solution at a target temperature and further to suppress the thermal damage of members by excessive heating up of the heating means H. SOLUTION: This development processing device is provided with abnormality detecting means which is arranged with a temperature sensing section STa of the temperature detecting means ST in a position where the radiation heat from an exothermic section Ha of the heating means H is received and which detects that the liquid level is in an abnormally low state when the abnormal temperature higher than the target temperature is detected by the temperature detecting means ST. The surface area of the exothermic section Ha is so set as to be kept shorter in the detection time after the operation start of the heating means H before the abnormal temperature is detect by the temperature detecting means ST than the time before the temperature of the members in the tank 3As attains the permissible upper limit temperature within the tank 3As where the liquid level is in the abnormally low state.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention comprises a tank for storing a developing solution and a transport mechanism for feeding a photosensitive material to the tank, and temperature detecting means for measuring the temperature of the developing solution in the tank. A temperature control unit that controls the output of the heating unit based on the detection result of the temperature detection unit so that the temperature of the development processing liquid is maintained at a target temperature. The present invention relates to a development processing apparatus including a means.

[0002]

2. Description of the Related Art A conventional development processing apparatus is provided with a development processing tank as the above-mentioned tank, and develops a photosensitive material such as photographic film or photographic paper in the development processing tank. By providing a temperature detecting means such as a temperature sensor and a heating means such as a heater, the temperature control means maintains the temperature of the development processing liquid at a target temperature (a temperature of about 38 to 40 degrees) suitable for the development processing. Is configured.

[0003]

As an example of a conventional developing apparatus for developing a photographic film,
During development processing, the development processing solution in the development processing tank adheres to the photographic film and is carried out, so unless the development processing solution is sent by a replenishment pump, etc., the liquid level in the development processing tank will decrease over time as the development processing proceeds. To do.

For this reason, this type of development processing apparatus is provided with a liquid level sensor or the like for measuring the liquid level of the development processing tank, and when the liquid level is lowered by this liquid level sensor, the development processing solution is used. When the liquid level sensor detects that the liquid level is in an abnormally low state, the heater is stopped, for example, to prevent excessive temperature rise of the heater. Control.

However, in a liquid level sensor equipped with a float that directly touches the developing solution and moves up and down in response to changes in the liquid level, the chemical in the developing solution crystallizes and adheres to the float. A phenomenon may also occur, and the crystallized chemicals may hinder the movement of the float, and it may not be possible to properly detect the drop in the liquid level.

When the liquid level drop cannot be properly detected in this way, the liquid level of the developing solution falls below a level at which the heater can heat it, and the temperature of the developing solution also rises. Not only will it not be maintained properly, but the heating portion of the heater will overheat, which may lead to thermal damage to the development tank or other members inside the development tank. A discriminating technique is desired.

Therefore, it is conceivable to add a liquid surface level sensor or to provide a sensor for measuring the liquid surface level in a non-contact manner using ultrasonic waves or infrared rays, but it is difficult to adopt because it leads to cost increase. There is a face. Further, even a liquid level sensor such as an ultrasonic type may have a failure.

Therefore, it is an object of the present invention to reasonably determine the decrease in the liquid level in the development processing tank even if the sensors for measuring the liquid level are broken down, and further, the heat damage to the member due to the excessive temperature rise of the heating means. The reason is that a development processing device capable of suppressing the above is rationally configured.

[0009]

[Means for Solving the Problems] [Structure 1] According to a first aspect of the present invention, there is provided a development processing apparatus, wherein the radiant heat from the temperature sensing portion of the temperature detecting means and the heat generating portion of the heating means is radiated. It is arranged at a receiving position, and when an abnormal temperature higher than the target temperature is detected by the temperature detecting means,
The tank having the liquid level is in an abnormally low state, the tank in which the liquid level is in the abnormally low state has the abnormal temperature detected by the temperature detecting means from the start of operation of the heating means. The surface area of the heat-generating part of the heating means is set so that the detection time until the detection is shorter than the time from the start of operation of the heating means until the member temperature in the tank reaches the allowable upper limit temperature. It is characterized by

[Advantageous Effects] According to the development processing apparatus of this configuration, when the level of the development processing liquid is at an appropriate level,
Since both the temperature detecting means and the heat generating part of the heating means are submerged in the developing solution, the surface temperature of the heat generating part does not rise sharply, and the temperature detecting means does not detect a sharp temperature change.

Even if the sensors for detecting the liquid surface level are broken down, if the liquid surface level of the development processing liquid is abnormally lowered during the operation of the development processing device, the heat generating portion of the heating means is operated. The development processing liquid is exposed upward from the liquid surface, and the temperature of the heat generating portion rises in a short time. However, in such a case, the temperature sensing portion of the temperature detecting means, which has been heated up to about the target temperature of the developing solution in advance, receives the radiant heat from the heat generating portion and relatively rises to an abnormal temperature higher than the target temperature. Since the temperature is raised easily, the temperature detecting means detects an abnormal temperature, and the abnormality detecting means easily detects an abnormal decrease in the liquid level.

On the other hand, when the temperature of the temperature detecting means is lower than the target temperature and the liquid level of the developing treatment tank is abnormally lowered, such as when the developing treatment device is started. Despite this, if the liquid level sensors have already failed, and the heating means has started operating,
The temperature rise of the temperature sensing part of the temperature detecting means cannot follow the rapid temperature rise of the heat generating part of the heating means, and the development processing tank or There is a risk that the internal members and the like will be thermally damaged.

Therefore, in the developing processing apparatus of this structure, as described above, the heating means is used even when the temperature of the temperature sensing portion of the temperature detecting means is room temperature and the liquid level in the tank is abnormally lowered. When the operation is started, the surface area of the heat generating part of the heating means is set so that the abnormal temperature is detected by the temperature detecting means before the temperature of the wall of the tank or other member temperature in the tank reaches the upper limit temperature. By setting, the heat generation amount per unit area in the heat generation part of the heating means can be set to a relatively low level, and the output of the heating means can be maintained at an appropriate level for controlling the temperature of the developing solution.

Thus, after the abnormality detecting means detects that the liquid surface level is in an abnormally low state, for example, control such as operation of the alarm mechanism or control of stopping heating by the heating means is performed. Based on the notification of the notification mechanism, it is possible to easily detect that the developing solution has dropped and perform appropriate processing such as replenishing the developing solution and repairing the defective part, and heating the heating means automatically. By stopping, it is possible to prevent heat damage to the tank or other members due to excessive temperature rise of the heat generating portion of the heating means.

[Structure 2] The development processing apparatus according to the present invention comprises:
According to a second aspect of the present invention, in addition to the configuration of the developing processing apparatus having the first configuration, the heating unit is configured by providing a heating element in a portion corresponding to the heating section of the vertically long sheath. In order to set the surface area of the heat generating portion, at least one of the diameter of the sheath and the length of the heat generating portion is set.

[Advantageous Effects] According to the developing processing apparatus of this configuration, when the heating means is a so-called sheathed heater in which a heating element such as an electric resistor is built in a tubular sheath, the diameter of the sheath is increased. Alternatively, the surface area of the heat generating portion can be set as described above by setting the length of the heat generating portion containing the heat generating element.

[Structure 3] The development processing apparatus according to the present invention comprises:
According to a third aspect of the present invention, in addition to the configuration of the developing processing apparatus having the second configuration, the temperature detecting unit is configured by providing a temperature sensitive element in a portion corresponding to the temperature sensitive section of the sheath in the vertically long posture. The temperature sensing part of the temperature detecting means is located at a position overlapping the heat generating part of the heating means in the height direction, and at a position closer to the heat generating part of the heating means than other members in the tank. It is characterized by being arranged.

[Advantageous Effects] According to the developing processing apparatus of this configuration, the temperature detecting means can also be configured by incorporating a temperature sensing element such as a platinum resistance temperature detector, a thermistor, or a thermocouple in the sheath. Since both the temperature detecting means and the heating means are formed in a vertical posture, they are in a parallel posture, so that the radiant heat from the heat generating portion of the heating means can be well captured by the temperature sensing portion of the temperature detecting means in the same height region. The temperature rise can be quickly discriminated. Further, since the temperature sensing part of the temperature detecting means is located closer to the heat generating part of the heating means than the other members in the tank, it is most likely to receive the radiant heat from the heat generating part of the heating means, and other members. Since it becomes easy to detect an abnormal temperature by the temperature detecting means before the heat-damage of the heat-generating material, the surface area of the heating portion of the heating means can be made as small as possible.

[Structure 4] The development processing apparatus according to the present invention comprises:
As described in claim 4, in addition to the configuration of the development processing apparatus of the configuration 2 or 3, the sheath is made of titanium.

[Function and Effect] In the development processing apparatus, the sheath of the heating means is preferably made of titanium from the viewpoint of chemical resistance to the development processing solution. However, when titanium is used as the material of the sheath as compared with stainless steel, dielectric breakdown is more likely to occur due to excessive temperature rise of the heating means. However, in the development processing apparatus according to the present invention, when the liquid level is lowered, Since the excessive temperature rise of the heating means can be satisfactorily detected, the heating means using the titanium sheath can be effectively used.

[Structure 5] The development processing apparatus according to the present invention comprises:
As described in claim 5, in addition to the constitution of the developing treatment apparatus according to any one of constitutions 1 to 4, the shortest distance between the heat generating portion of the heating means and the inner wall of the tank is within a range of 5 to 30 mm. It is characterized by

[Operation and Effect] In the development processing apparatus according to the present invention, the abnormal temperature can be detected by the temperature detecting means before the inner wall of the tank reaches the upper limit temperature.
Since the surface area of the heat generating portion of the heating means is set to be large, it is possible to reduce the size of the tank by keeping the shortest distance between the inner wall of the tank and the heat generating portion of the heating means within the above range as in this configuration. It can be done well. Further, the shortest distance between the heat generating portion of the heating means and the inner wall of the tank is 5 mm.
If it is less than the above, the installation of the heating means and the temperature detecting means becomes complicated, and the temperature detecting means may be thermally damaged due to a rapid temperature rise of the heat generating portion, and the minimum distance is 30 mm. If it is larger than this, it becomes difficult for the temperature sensing portion of the temperature detecting means to receive radiant heat from the heat generating portion, and it becomes difficult to detect the abnormal temperature when the liquid level is abnormally lowered.

[0023]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of a development processing apparatus according to the present invention will be described below with reference to the drawings. FIG. 1 shows the structure of a photographic developing apparatus for developing a film 1 as an example of a photosensitive material. In this photographic developing apparatus, a film loading section 2 for loading a film 1 with a leader connected to the tip, a film developing section 3 for developing the film 1 fed from the film loading section 2, and a film after the development processing 1. A film drying unit 4 for warming 1 by a drying heater and drying with warm air from a drying fan, a film discharging unit 5 for discharging the dried film 1, and a film receiving unit for temporarily storing the discharged film 1. 6
And are provided. The film 1 loaded in the film loading unit 2 is transported while being sandwiched between a transport roller and an idler roller and fed into the film developing unit 3, but an optical sensor is provided near the entrance of the film developing unit 3. 7 is provided, and the length of the film carried into the film developing section 3 and processed for development can be obtained from the signal of the optical sensor 7 and the film transport speed.

The film developing section 3 serves as a development processing tank for storing a development processing solution for developing the film 1, and is used for sequentially performing development processing such as development, bleaching and fixing. Development processing area in which seven development processing tanks 3A to 3G (an example of a tank) filled with a development processing solution such as a solution and a stabilizing solution are formed, and a length for transporting the film 1 in the development processing area And a different conveyance roller unit 8 (an example of a conveyance mechanism). The seven development processing tanks 3A to 3G are arranged in the order of the transport direction of the film 1, and the first deep tank is the processing tank 3 for the developing solution.
In A, the bleaching solution processing tank 3B is next, the next two are fixing solution processing tanks 3C and 3D, and the three shallow baths are stabilizing solution processing tanks 3E, 3F, and 3G. Although the processing tanks have different depths, they have substantially the same structure, and FIG. 2 shows a schematic view of the developing solution processing tank 3A in a vertical sectional view. Hereinafter, each processing tank will be described by taking the processing tank 3A for developer as an example.

As shown in FIG. 2, the processing tank 3A for developing solution is provided with a sub tank 3As on the side of the upper area thereof, and the upper area of the processing tank 3A and the sub tank 3As can communicate with each other. On the other hand, the sub-tank 3As and the bottom of the processing tank 3A are connected by a circulation pipe line 13L passing through a filter F, and a circulation pump 13P is provided in the middle of the circulation pipe line 13L. Further, inside the sub-tank 3As, there is provided a float SLb which moves up and down along the guide rod SLa according to the level of the developing treatment liquid level.
A liquid level sensor SL for detecting the liquid level of the developing solution according to the position of b, a heater H as a heating means for heating the developing solution, and a temperature detecting means 100 for detecting the temperature of the developing solution. A temperature sensor ST is provided.

A water supply line 14L forming a water supply line is connected to the sub-tank 3As, and a water supply pump 14P is timely provided in order to compensate for evaporation of water from the developing solution.
Is operated and the amount of water required by the flow rate sensor 14S is measured and sent from the water supply tank 14T to the sub tank 3As via the water supply pipe line 14L. Further, the sub tank 3As has a replenishing conduit 15 for replenishing the developing solution.
L is connected, and the processing amount of the film 1 has reached the set value for the purpose of replenishing the development processing liquid attached to the film 1 and carried out, and for the purpose of keeping the activity of the development liquid constant. In this case, and when the liquid level sensor SL detects the liquid level drop, the replenishment pump 15P is operated to supply the development processing liquid from the replenishment development processing liquid tank 15T to the flow sensor 15S in an amount required. The development processing solution is sent to the sub-tank 3As through the replenishment pipeline 15L until the measurement is performed.

A discharge pipe 16L forming a discharge line is connected to the developing solution processing tank 3A, and the discharging pump 16P is operated simultaneously or in sequence when the developing solution is replenished, so that the developing solution processing tank 3A is operated. The flow rate sensor 16S measures a predetermined amount of the deteriorated developer and discharges it to the discharge tank 16T. An overflow occurs between the developer processing tank 3A and the discharge tank 16T in preparation for an unexpected situation. A discharge line 16F is additionally provided.

As shown in FIGS. 3 and 4, the heater H is
Is a so-called sheathed heater in which a heating portion Ha containing a heating element such as a nichrome wire is formed on the tip side of a vertically oriented titanium sheath, and insulating powder such as magnesium oxide is filled between the sheath and the heating element. Is configured as. More specifically, the heater H uses a titanium pipe material having a diameter h of 16 mm as a sheath, and a heating portion Ha from a position 10 mm above to a position 115 mm above the lower end of the sheath, and the surface area of the heating portion Ha is It is about 5280 mm ² . Further, since the rated output of the heater H is 200 W to 600 W, the heating portion H
The power density corresponding to the heat generation amount per unit area in a is about 0.038 to 0.114 W / mm ² . Therefore, the heater H is
It has a low output density while having substantially the same rated output, so that the surface area of the heat generating portion Ha is set to be large.

Further, the temperature sensor ST is constructed by forming a temperature sensitive portion STa containing a temperature sensitive element such as a thermistor on the distal end side of a sheath which is also in a vertically long posture. Specifically, the diameter of at least the temperature sensitive portion STa of the sheath of the temperature sensor ST is 2 to 5 mm, preferably 3 to 4 mm, and the response is improved by using a sheath having a diameter smaller than that of a general temperature sensor. Has been planned.

Further, the shortest distance d1 between the heat generating portion Ha of the heater H and the inner wall of the sub tank 3As is longer than the shortest distance d2 between the heat generating portion Ha and the temperature sensing portion STa of the temperature sensor ST, and the distance d1 is 5 Within a range of up to 30 mm,
The distance d2 is set within the range of 3 to 20 mm. Further, the heater H and the temperature sensor ST are arranged so that the respective sheaths are adjacent to each other in a posture in which they are parallel to each other.
Furthermore, the heating portion Ha of the heater H and the temperature sensor ST
The temperature sensing portion STa is disposed at a position overlapping with the height direction, and the temperature sensing portion STa can directly receive the radiant heat from the heat generating portion Ha.

In this photographic development processing apparatus, the developing solution supplied to the developing solution processing tank 3A, the bleaching solution supplied to the bleaching solution processing tank 3B, and the fixing solution supplied to the fixing solution processing tanks 3C and 3D. A control system for automatically controlling the temperature of the stabilizing liquid supplied to the stabilizing liquid processing tanks 3E, 3F, 3G and the liquid level is provided. In this apparatus, each of the developing solution, the bleaching solution, the fixing solution and the stabilizing solution is sent through a mechanism having almost the same structure, and the control for one of them will be described in detail below. The above-mentioned control system is configured as shown in FIG. 5, and for the control device 18 equipped with a microprocessor, a transport motor (not shown) for feeding the film 1 to each developing treatment tank is in a driving state or stopped. A film transport signal indicating whether or not there is a state, a temperature sensor ST, a liquid level sensor SL, and three flow rate sensors 14S, 15S, 1
The signals from the respective 6S are input, and the control device 1
8 to heater H, circulation pump 13P, water supply pump 14
A drive signal is output to each of the P, the replenishment pump 15P, the discharge pump 16P, the liquid crystal monitor 19 capable of displaying characters and figures, and the alarm 20 including a buzzer, a speaker emitting a sound, and the like. In the figure, only one set of an input system for signals from the five sensors and an output system for the heater H and the four pumps is shown. However, each of the input system and the output system is a development processing tank. There are only sets corresponding to 3A to 3G.

Explaining the drive configuration of the heater H, the heater H is energized by electric power from a commercial single-phase AC power source to generate heat in the heat generating portion Ha, and the AC is used to control the operation of the heater H. A power control element 11 such as a triac that is turned on / off by a signal from the control device 18 is provided in a power supply circuit from the power supply to the heater H.

By using the control device 18, the heater H is maintained so that the temperature of the developing treatment liquid detected by the temperature sensor ST is maintained at a target temperature (for example, 40 ° C.).
Temperature control means 10 for executing temperature control for controlling the operation of
2 are configured. Next, the content of this temperature control will be described based on the flowchart of the temperature management routine shown in FIG. 6. First, a signal of the temperature D measured by the temperature sensor ST is input, and the temperature D is the target temperature. When the temperature is lower than the target temperature D1 (40 ° C.) set as an example, the heater H is energized to heat the developing solution, and when the temperature D is equal to or higher than the target temperature D1, the heater H is energized. A process of stopping (maintaining the stopped state if the power supply is already stopped) is performed (steps # 11 to # 15).

Further, an abnormality detecting means 102a is provided, and the abnormality detecting means 102a has a temperature D measured by the temperature sensor ST exceeding an abnormal temperature (for example, 46 ° C.) set on a higher temperature side than the target temperature D1. If the liquid level is abnormally lowered, the liquid crystal monitor 19 displays the word “liquid overheat” and the alarm 20 is activated, and the development processing liquid is overheated. To prevent this, the heating operation of the heater H is stopped (# 16
~ # 18 step). In addition, in the above processing, # 11-
# Step 15 corresponds to the temperature control means 102, and
Steps 16 to # 18 correspond to the abnormality detecting means 102a.

In the development processing apparatus according to the present invention, the diameter or length of the heat generating portion Ha of the heater H is set as described above, and the output density of the heat generating portion Ha is set to be low as described above. Therefore, even if the operation of the heater H is started in the sub tank 3As in the state where the liquid level of the processing liquid is abnormally lowered and the heat generating part Ha and the temperature sensing part STa are exposed above the liquid level, the temperature sensor The detection time until the abnormal temperature D2 higher than the target temperature D1 is detected by ST becomes shorter than that until the wall surface of the sub-tank 3As reaches the allowable upper limit temperature, and the heat damage to the sub-tank 3As can be suppressed well. it can.

That is, the above process is a simple control for turning on / off the power supply to the heater H so as to maintain the temperature of the developing solution measured by the temperature sensor ST at a temperature suitable for the developing process. In the case where the liquid level drops significantly as in the case where the surface sensor SL fails, the heater H is set before the sub tank 3As and the like reach the upper limit temperature.
The surface temperature of the heater becomes high in a short time, and the heater H
The temperature sensor ST directly receives the radiant heat from the sensor to detect the temperature rise, and it is determined that the liquid level is abnormally lowered, and the fact that the liquid level is lowered is notified. By doing so, appropriate measures can be taken to raise the liquid level to the target level, and the heater H and the sub tank 3A can be forcibly stopped.
It is possible to prevent heat damage to the s.

Further, using the control device 18, the liquid surface control means 103 for executing the liquid surface control for maintaining the liquid surface level of the development processing liquid at an appropriate level based on the detection information of the liquid surface level sensor SL. Is configured. The liquid level sensor SL has a structure capable of detecting whether the float SLb is located at the upper end or the lower end of the movable range, and when the float SLb is at the upper end position. The liquid level of the float S
Basically, the liquid level when Lb is at the lower end position is determined to be an abnormal level, and when it is at an intermediate position between the lower end position and the upper end position (neither upper end nor lower end), it is determined to be the replenishment level. Judgment conditions are set. Therefore, the lower limit liquid level detected by the liquid level sensor SL corresponds to the abnormal level.

Next, regarding the contents of this liquid level control, FIG.
To explain based on the flow chart of the liquid level management routine shown in FIG. 1, first, when a signal from the liquid level sensor SL is input and the liquid level of the development processing liquid is at an appropriate level (upper end position), special processing is performed. When the replenishment level (the intermediate position between the lower end position and the upper end position) is not performed and the signal from the flow rate sensor 15S is fed back, the replenishment pump 15P is driven to replenish the set amount of the developing treatment liquid. Perform (steps # 21 to # 24). On the other hand, when it is at an abnormal level (lower end position), the message "Lower liquid level" is displayed on the liquid crystal monitor 19 and at the same time, the alarm 20 is activated and the heating operation by the heater H is stopped (# 2).
5, step # 26). In the above process, when the liquid level of the developing solution drops below the proper level due to the phenomenon that the developing solution adheres to the film and is taken out, the developing solution is replenished and the liquid level is maintained at the proper level. And the control performed when the liquid level drops to an abnormal level. Then, of the above processes, # 2
Steps 1 to 24 correspond to the liquid level control means 103.

As described above, in the present invention, for example, when the replenishment developing solution is completely consumed or the replenishing system fails, it is determined that the level of the developing solution is abnormally lowered. A means for directly detecting with the sensor SL and an indirect detection with the abnormal temperature detection by the temperature sensor ST that the heater H exposed from the liquid surface due to the lowering of the liquid surface of the development processing liquid are in an empty state Abnormality detecting means 102a
It is possible to detect using any one of the two systems of detection means, and even if one of them fails, the abnormal lowering of the liquid level can be reliably detected without error, and the lowering of the liquid level of the developing solution and the heater H can be detected. The operator can be surely notified of the overheating of the object by the characters displayed on the liquid crystal monitor 19 and the sound of the alarm 20, so that an appropriate response can be swiftly performed.
Since the power supply to the heater H is forcibly stopped, the heater H
Also, it is possible to prevent damage to the processing tank and the like.

[Other Embodiments] In the above embodiment, the temperature at which the temperature of the developing solution is detected in order to prevent overheating of the developing solution and the overheated state of the heating means (heater H) is detected when the liquid level abnormally drops. Although the temperature sensor ST is used as the detection means 100, a thermostat SS integrally attached to the lower end side of the liquid level sensor SL may be used as shown in FIG. Further, a thermostat SS is connected in series to the energizing circuit to the heater H, and when the ambient temperature of the thermostat SS exceeds an abnormal temperature preset as a temperature for preventing overheating of the development processing liquid, the thermostat SS operates. The abnormality detecting means can be configured so that the power supply to the heater H is cut off.

[Brief description of drawings]

FIG. 1 is a cross-sectional view showing an outline of a development processing apparatus.

FIG. 2 is a schematic diagram of a development processing tank.

FIG. 3 is a plan view showing the arrangement of sensors and heaters in the sub tank.

FIG. 4 is a side view showing the arrangement of sensors and heaters in the sub tank.

FIG. 5 is a block circuit diagram of a control system.

FIG. 6 is a flowchart of a temperature management routine.

FIG. 7 is a flowchart of a liquid level management routine.

FIG. 8 is a side view showing an arrangement of sensors and heaters in a sub tank according to another embodiment.

[Explanation of symbols]

1 Photosensitive material 3A-3G Development processing tank (tank) 100 temperature detection means 102 temperature control means 102a Abnormality detection means 103 Liquid level control means H heater (heating means) Ha heating part SL liquid level detection means ST temperature sensor D1 target temperature D2 abnormal temperature

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Claims (5)

[Claims] 1. A tank for storing a developing solution, a transport mechanism for feeding a photosensitive material to the tank, temperature detecting means for measuring the temperature of the developing solution in the tank, and the developing solution in the tank. And a heating means for heating the developing treatment liquid, and a developing treatment provided with a temperature control means for controlling the output of the heating means based on the detection result of the temperature detection means so as to maintain the temperature of the developing treatment liquid at a target temperature. In the device, the temperature sensing part of the temperature detecting means is arranged at a position for receiving radiant heat from the heat generating part of the heating means, and when the temperature detecting means detects an abnormal temperature higher than the target temperature. In the tank in which the liquid level is in an abnormally lowered state, the tank in which the liquid level is in the abnormally lowered state has the temperature from the start of operation of the heating means. The detection time until the abnormal temperature is detected by the detection means is shorter than the time from the start of operation of the heating means to the member upper limit temperature of the member temperature in the tank,
A development processing apparatus in which a surface area of a heat generating portion of the heating unit is set. 2. The heating means is configured by providing a heating element in a portion corresponding to a heating portion of a vertically elongated sheath, and the diameter of the sheath and the diameter of the sheath are set to set the surface area of the heating portion. The development processing apparatus according to claim 1, wherein at least one of the lengths of the heat generating portions is set. 3. The temperature detecting means is configured by providing a temperature sensitive element in a portion corresponding to the temperature sensitive portion of a vertically long sheath, and the temperature sensitive portion of the temperature detecting means has a height. 3. The development processing apparatus according to claim 2, wherein the development processing apparatus is arranged at a position overlapping the heat generating portion of the heating means in a direction and closer to the heat generating portion of the heating means than other members in the tank. 4. The development processing apparatus according to claim 2, wherein the sheath is made of titanium. 5. The shortest distance between the heat generating portion of the heating means and the inner wall of the tank is within a range of 5 to 30 mm.
4. The developing processing apparatus according to any one of items 4 to 4.