JP2002369579A - Motor drive, stage, aligner, device manufactured by the aligner, and method of manufacturing the device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a low cost, small volume, and light-weight motor drive, to provide a stage using the motor drive, an aligner using the stage, and a device manufactured by the aligner, and to provide a method of manufacturing the device. SOLUTION: In a motor drive of a linear motor utilizing a PWM method, a capacitor 64 is inserted between a constant voltage power supply 61 and a PWM drive circuit 62. As the maximum supply current of the constant voltage power supply 61 is smaller than a drive current necessary for the acceleration of the linear motor, the drive current for the acceleration of the linear motor is supplemented by the capacitor 64 inserted.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

TECHNICAL FIELD The present invention relates to a motor driving device,
The present invention relates to a stage apparatus, an exposure apparatus, a device manufactured by the exposure apparatus, and a device manufacturing method.

[0002]

2. Description of the Related Art In a semiconductor exposure apparatus that performs scan exposure, a reticle stage and a wafer stage are driven with high precision to project a pattern on a reticle (or mask) onto a wafer. In such a case, the reticle stage and the wafer stage are driven to repeat acceleration → constant speed → deceleration → reversal → acceleration. On the other hand, a linear motor is used as a motor for driving each stage. The power supply of the linear motor drive device is generally designed according to the power at the maximum output. Therefore, in the case where acceleration → constant speed → deceleration → reversal → acceleration is repeated, the power supply of the linear motor drive device is designed to match the power at the time of reversal that requires the most power.

[0003]

However, if the power supply of the linear motor drive device is designed to match the power at the time of reversal, which requires the most power, the power supply becomes large, and consequently the volume, weight and cost of the semiconductor exposure apparatus. The problem of bulging arises.

An object of the present invention is to provide a low cost, small volume, and low weight motor driving device. Another object of the present invention is to provide a stage device using the motor drive device, an exposure device using the stage device, a device manufactured by the exposure device, and a device manufacturing method.

[0005]

The present invention will be described below with reference to FIG. 4 and FIGS. 7 to 10 showing the embodiments, in which the reference numerals of the corresponding elements are given in parentheses. In order to achieve the above object, a first aspect of the present invention is a constant voltage power supply (61).
And a motor that repeats at least constant-speed and acceleration driving (2
2) is applied to a motor drive device having a motor drive control circuit (62) for controlling the drive current from the constant voltage power supply (61) to the constant voltage power supply (61). ) Is smaller than the maximum drive current during the acceleration drive, and is provided between the constant voltage power supply (61) and the motor drive control circuit (62) in order to supply the maximum drive current during the acceleration drive of the motor (22). And a capacitor (64) inserted therein. According to a second aspect of the present invention, in the motor driving device according to the first aspect, the capacity of the capacitor (64) is:
The drive current during the acceleration drive of the motor (22) exceeds the maximum supply current of the constant voltage power supply (61) and is determined based on the required drive current value and the duration thereof. According to a third aspect of the present invention, in the motor drive device according to the first or second aspect, the motor drive control circuit (6
2) is configured to control a drive current to a motor (22) that repeats driving of constant speed, deceleration, reversal, and acceleration, and that a regenerative brake operates when the motor (22) decelerates. The electric charge generated by the regenerative braking is stored. The invention of Claim 4 is Claim 1
The motor drive device according to any one of claims 1 to 3, wherein the motor (22) is a linear motor, and the motor drive control circuit (62) uses a PWM method based on pulse width modulation control based on an input signal. This is a PWM control circuit for controlling the output current to the linear motor (22).
According to a fifth aspect of the present invention, in the motor driving device according to the fourth aspect, the PWM control circuit compares the input signal with the triangular wave with a triangular wave generating circuit (101) for generating a triangular wave, and responds to the voltage level of the input signal. A comparator (103) that outputs a PWM signal having a changed pulse width and a circuit after the capacitor (64) is inserted, and outputs a voltage from the circuit after the capacitor (64) is inserted on and off based on the PWM signal. A switching element (Q1, Q2) and an adjusting circuit (104) for adjusting the duty ratio of the PWM signal in accordance with a change in the voltage level of the circuit after the insertion of the capacitor (64) are provided. According to a sixth aspect of the present invention, in the motor driving device according to the fifth aspect, the adjustment circuit (104) includes:
This is a circuit (104) for dividing the input signal by the voltage level of the circuit after inserting the capacitor (64). According to a seventh aspect of the present invention, in the motor driving device according to the fifth aspect, the adjusting circuit (201, 301, 404) adjusts the amplitude of the triangular wave according to a change in the voltage level of the circuit after the capacitor (64) is inserted. It is a circuit. Claim 8
The stage device has a stage on which a moving object is mounted,
A motor (22) for driving a stage for moving a moving object, and a motor (22) for driving the motor.
And a motor driving device according to any one of the above. An exposure apparatus according to a ninth aspect of the present invention is an exposure apparatus that forms a predetermined pattern on a substrate by exposure, and includes at least one of the stage device according to the eighth aspect and a mask and a substrate. It was made. A device according to a tenth aspect is manufactured by the exposure apparatus according to the ninth aspect. According to a eleventh aspect of the present invention, there is provided a device manufacturing method including a step of performing exposure using the exposure apparatus according to the ninth aspect.

[0006] In the section of the means for solving the above-mentioned problems, correspondence is made with the drawings of the embodiments for easy explanation, but the present invention is not limited to the embodiments.

[0007]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS First Embodiment Before describing a motor drive device of the present invention, a projection exposure apparatus using the present motor drive device and its stage device will be described first.

FIG. 1 is a schematic configuration diagram of a projection exposure apparatus.
The projection exposure apparatus mainly includes an illumination optical system 1, a reticle stage device 2, a projection optical system 3, and a wafer stage device 4. FIG. 1 is a view of the projection exposure device as viewed from the front. The projection exposure apparatus employs a slit scan exposure method. The slit scan exposure method is as follows. That is, the reticle 5 is illuminated with the exposure light IL restricted in the form of a slit emitted from the illumination optical system 1, the reticle 5 is driven in one direction, and the reticle 5 is driven in one direction. The exposure light IL scans the entire pattern provided on the reticle 5, and drives the wafer 6 in the opposite direction to the reticle 5 in accordance with this scan. As a result, the entire pattern is projected onto a predetermined area of the wafer 6. Projection exposure is performed via the optical system 3. This is repeated. The slit scan exposure method has a known content (for example, see JP-A-6-140305). Further, in this specification, both the reticle and the mask are treated as synonymous with a pattern to be projected on a wafer.

The projection exposure apparatus will be further described with reference to FIGS. In FIG. 1, the direction perpendicular to the paper is X
The axis, the vertical direction is the Z axis, and the horizontal direction is the Y axis. The reticle stage device 2 includes a reticle base 7, a reticle scanning stage 8, and a reticle fine movement stage 9, and the reticle 5 is mounted on the reticle fine movement stage 9. The reticle scanning stage 8 is also called a reticle coarse movement stage.
The reticle scanning stage 8 is driven by a reticle scanning drive device 10, and the reticle fine movement stage 9 is driven by a reticle fine movement drive device 11. The reticle scanning drive device 10 and the reticle fine movement drive device 11 are connected to and controlled by a control device 12. The control device 12 includes a microprocessor and peripheral circuits, and also performs other controls related to the projection exposure apparatus.

The wafer stage device 4 includes a wafer base 1
3, wafer stage X-axis drive unit 14, wafer stage Y
The wafer 6 is mounted on the wafer stage Y-axis drive unit 15. The wafer stage X-axis driving unit 14 and the wafer stage Y-axis driving unit 15 are driven by a wafer driving device 16, and the wafer driving device 16 is connected to and controlled by the control device 12.

FIG. 2 is a plan view of the reticle stage device 2. The reticle base 7 is formed with two rows of air guides 21a and 21b in the X direction, on which the reticle scanning stage 8 is mounted. A plurality of electromagnets 22a and 22b are embedded outside the air guides 21a and 21b in a row in the X direction, and a permanent magnet (not shown) is embedded on the back surface of the reticle scanning stage 8. The reticle scanning stage 8 includes electromagnets 22a, 22b
And air guides 21a and 21b by permanent magnets (not shown).
Is driven by a linear motor in the X direction. Hereinafter, the linear motor that drives the reticle scanning stage 8 is referred to as a linear motor 22.

A reticle fine movement stage 9 is mounted on the reticle scanning stage 8. Further, on the reticle scanning stage 8, actuators 23 and 24 for finely driving the reticle fine movement stage 9 in the X direction, respectively, and Y
An actuator 25 that finely drives in the direction is fixed.
The actuators 23 to 25 are constituted by voice coils, and one end is fixed to the reticle fine movement stage 9. Therefore, the reticle fine movement stage 9 is finely driven in the XY plane with respect to the reticle scanning stage 8 by controlling the current flowing through the voice coil.
It is fixed at a predetermined position on the reticle scanning stage 8.
The reticle fine movement stage 9 includes actuators 23 and 24
Is finely driven also in the rotational direction in the XY plane by adjusting the balance of the control.

The movable mirrors 26, 27 and 28 are fixed to the reticle fine movement stage 9 as shown in FIG. Further, laser interferometers 29, 30, 31 are provided to face these movable mirrors 26, 27, 28. The laser interferometers 29, 30, 31 are provided in a fixed relation to the reticle base 7, and the outputs thereof are connected to the controller 12. The combination of the movable mirror 26 and the laser interferometer 29 detects the position of the reticle fine movement stage 9 in the Y direction, and the combination of the movable mirror 27 and the laser interferometer 30 detects the position of the reticle fine movement stage 9 in the X direction. Movable mirror 27
The rotation angle of the reticle fine movement stage 9 in the XY plane is detected by the combination of the laser interferometer 30, the moving mirror 28, and the laser interferometer 31.

FIG. 3 is a plan view of the wafer stage device 4. On the wafer base 13, two rows of air guides 41a and 41b are formed in the X direction, and the wafer stage X-axis drive unit 14 is mounted thereon. A plurality of electromagnets 42a and 42b are embedded in a row in the X direction outside the air guides 41a and 41b, respectively, and a permanent magnet (not shown) is embedded on the back surface of the wafer stage X-axis drive unit 14. The wafer stage X-axis drive unit 14 is driven by electromagnets 42a and 42b and permanent magnets (not shown) in the X direction along the air guides 41a and 41b by a linear motor. Hereinafter, a linear motor that drives the wafer stage X-axis drive unit 14 is referred to as a linear motor 42.

On the wafer stage X-axis drive unit 14, two rows of air guides 43a and 43b are formed in the Y direction, and the wafer stage Y-axis drive unit 15 is mounted thereon. The wafer stage Y-axis driving unit 15 is provided with a stepping motor 44 along the air guides 43a and 43b.
, And is driven in the Y direction via the ball screw 45.

The wafer stage Y-axis drive unit 15 includes
The movable mirrors 46 and 47 are fixed as shown in FIG. Two laser interferometers 48 and 49 are provided facing the moving mirror 46, and a laser interferometer 50 is provided facing the moving mirror 47. The laser interferometers 48, 49, 50 are provided in a fixed relation to the wafer base 13, and the outputs thereof are connected to the controller 12. The combination of the movable mirror 46 and the laser interferometer 48 detects the position of the wafer stage Y-axis drive unit 15 in the Y direction, and the movable mirror 47 and the laser interferometer 5
X of the wafer stage Y-axis drive unit 15 in combination with 0
The position in the direction is detected, and the movable mirror 46 and the laser interferometer 48 are detected.
Wafer stage Y in combination with the laser interferometer 49
The rotation angle of the shaft drive unit 15 in the XY plane is detected.

With the reticle stage device 2 and the wafer stage device 4 configured as described above, slit scan exposure can be realized. In the present embodiment, a pattern for one chip is formed on the reticle 5, and one chip is projected and exposed on the wafer 6 by one slit scan exposure. The minute pattern is projected and exposed. Hereinafter, the state of one slit scan exposure will be described.

When the previous slit scan exposure (exposure by moving the reticle in the −X direction in FIG. 2) is completed, the control device 12 controls the reticle scan drive device 10 to move the reticle scan stage 8 to the X direction. Stop at a predetermined position in the direction. Further, the wafer drive unit 16 is controlled to set the wafer stage X-axis drive unit 14 and the wafer stage Y-axis drive unit 15 at predetermined positions so that the wafer 6 comes to the next projection start position. At this time, the control device 12 receives signals from the laser interferometers 29 to 31 and 48 to 50, and performs control while grasping the positions of the reticle fine movement stage 9 and the wafer stage Y-axis driving unit 15. The control device 12 also controls the reticle fine movement driving device 11 so that the reticle fine movement stage 9 is stopped on the reticle scanning stage 8. Thus, the reticle 5 and the wafer 6 are set in a predetermined state before the next slit scan exposure. In the following description, the control device 1
2 actually controls each of the driving devices 10, 11, and 16 to drive each of the stages 8, 9, 14, and 15, but for simplicity of description, the control device 12 directly drives each of the stages. Such expressions are sometimes used.

When the next slit scan exposure is started with the exposure start position set as described above,
The control device 12 sets the wafer stage X-axis drive unit 14 to -X
It is driven in the direction (upward in FIG. 3). The wafer stage X-axis drive unit 14 is accelerated to reach a constant scan speed. The control device 12 controls the wafer stage X-axis driving unit 1
4 is detected by the laser interferometer 50, and the reticle scanning stage 8 is driven in the + X direction (downward in FIG. 2) correspondingly. At this time, the moving speed of the reticle scanning stage 8 is controlled so as to be approximately the moving speed of the wafer stage X-axis driving unit 14 multiplied by the reciprocal of the reduction magnification of the projection optical system 3.

In FIG. 2, reference numeral 32 denotes an illumination area of the exposure light limited to a slit shape, and reference numeral 51 in FIG. In FIG. 3, the position of the projection optical system 3 is indicated by a dotted-line circle. The wafer stage X-axis drive unit 14 that has reached a certain scan speed is controlled to continue moving in the -X direction at that speed. In response, reticle scanning stage 8 also continues to move in the + X direction. During this time, the image of the pattern on the reticle 5 is projected and exposed on the wafer 6 via the projection optical system 3 at a constant reduction magnification. When the slit-shaped illumination area has finished illuminating the pattern to be projected on the reticle 5,
The wafer stage X-axis drive unit 14 is controlled so as to decelerate and stop. The reticle scanning stage 8 is similarly decelerated and stopped. Thus, one slit scan exposure is completed, and the next slit scan exposure is repeated.

During the above-mentioned slit scan exposure, in order to control the positional relationship between the reticle 5 and the wafer 6 with high precision, the control unit 12 inputs signals from the laser interferometers 29 to 31, 48 to 50, and The fine drive device 11 is controlled to drive the actuators 23 to 25. This allows
The position of the reticle fine movement stage 9 is finely adjusted, and the positional relationship between the reticle 5 and the wafer 6 during slit scan exposure is maintained with high accuracy.

As described above, reticle scanning stage 8
Is repeated in the ± X direction from start of drive → acceleration → maintenance of a constant speed → deceleration → stop. Since this operation is performed at a high speed, the stop state is substantially omitted, and the sequence of acceleration → constant speed → deceleration → reverse → acceleration → constant speed → deceleration → reversal is repeated. During this time, the reticle fine movement stage 9
The actuators 23 to 25 are controlled to maintain a constant positional relationship with the wafer stage Y-axis driving unit 15. When the reticle scanning stage 8 is decelerated, inverted, or accelerated, a large inertial force in the ± X direction acts on the reticle fine movement stage 9, and the fixed positional relationship between the reticle fine movement stage 9 and the wafer stage Y-axis drive unit 15 is broken. Become like
This misalignment or misalignment is caused by the interferometers 30, 50.
Is detected by The actuator 23 in the X direction is set so as to cancel the fixed positional relationship, that is, to cancel the inertial force acting on the reticle fine movement stage 9.
24 must be driven with large thrust.

When the reticle scanning stage 8 is decelerated, inverted, or accelerated, the controller 12 knows the contents. Therefore, in order to move the reticle fine movement stage 9 to follow the reticle scanning stage 8, the reticle fine movement is performed by calculating the thrust to be opposed to the inertial force at the same timing as the control of the deceleration, reversal, and acceleration of the reticle scanning stage 8. The driving device 11 may be controlled to drive the actuators 23 to 25. That is, the drive of reticle fine movement stage 9 may be controlled such that the positional relationship between reticle fine movement stage 9 and reticle scanning stage 8 is kept constant. Even in such control, when the reticle scanning stage 8 is decelerated, inverted, or accelerated, the actuators 23 and 24 of the reticle fine movement stage 9 require a large thrust.

As described above, the wafer stage X-axis drive section 14 repeats acceleration → constant speed → deceleration → reversal → acceleration → constant speed → deceleration. Also, reticle scanning stage 8
Also repeats acceleration → constant speed → deceleration → reversal → acceleration → constant speed → deceleration → reversal. Wafer stage X-axis drive unit 1
The linear motor 42 for driving the reticle scanning stage 8 and the linear motor 42 for driving the reticle scanning stage 8 require a large thrust at the time of deceleration → reversal → acceleration. On the other hand, when driving at a constant speed, a small thrust is sufficient. Linear motor 22, 4
2 requires a large thrust, the reticle scanning drive device 10 and the wafer drive device 16 (hereinafter simply referred to as a linear motor drive device) need to supply a large value of current, and need a small thrust. In some cases, it is sufficient to supply a small current. The linear motor driving device according to the present embodiment efficiently supplies a large value current and a small value current.

Next, a linear motor driving device for driving a linear motor will be described. Hereinafter, the driving of the linear motor 22, that is, the reticle scanning stage 8 is representatively described.
Will be described. The driving of the linear motor 42, that is, the driving of the wafer stage X-axis driving unit 14 is the same, and the description thereof will be omitted. FIG. 4 is a diagram illustrating a configuration of the linear motor driving device according to the first embodiment. Reference numeral 61
Is a constant voltage power supply that outputs a constant voltage of 600 V DC from a three-phase 200 V AC power supply. Reference numeral 62 denotes the input signal I.
Is a PWM drive circuit (PWM control circuit) for controlling an output current using a PWM (pulse width modulation) method for the voltage level of the PWM signal. A diode 63 is connected in series between the constant voltage power supply 61 and the PWM drive circuit 62, and a capacitor 64 is connected in parallel.
Is inserted. The PWM drive circuit 62 is configured such that a regenerative brake operates in the linear motor 22, and electricity (charge) generated by the regenerative brake is charged in the capacitor 64.

The linear motor 22 is driven by the linear motor driving device having the above configuration. In the present embodiment, the linear motor 22 is a three-phase linear motor, and is a moving magnet type linear synchronous motor having a permanent magnet mounted on the moving stage.

FIG. 5 is a timing chart showing the relationship among the position, speed, acceleration, circuit current, power supply input current, and power supply output voltage when the reticle scanning stage 8 moves. The horizontal axis is the time axis. FIG. 5A shows the reciprocating movement of the reticle scanning stage 8. FIG. 5B shows the acceleration applied to the reticle scanning stage 8. FIG. 5C shows the moving speed of the reticle scanning stage 8. FIG. 5D shows a linear motor drive current flowing through the PWM drive circuit 62. Specifically, it may be considered that the current indicates the current flowing at the point 65 in FIG. FIG.
(E) shows the input current input to the constant voltage power supply 61. FIG. 5F shows output voltages of the constant voltage power supply 61 and the capacitor 64. Specifically, point 6 in FIG.
5 may be considered.

As shown in FIG. 5A, the reticle scanning stage 8 moves the positions x1 and x in the X direction during the scanning exposure.
Reciprocating between the two. Constant speed v2 (Fig. 5
The reticle scanning stage 8 that has moved in (c)) reaches the position x1 at time t1. When it reaches position x1,
That is, at time t1, an acceleration a1 is applied to the reticle scanning stage 8 in a direction opposite to the moving direction. Acceleration a1
As a result, the reticle scanning stage 8 is decelerated. Acceleration a
As a result, the moving speed of the reticle scanning stage 8 becomes zero at time t2. Since the acceleration a1 is further applied to the reticle scanning stage 8 from the time t2 to the time t3, the reticle scanning stage 8 is accelerated and reaches the speed v1. When the reticle scanning stage 8 reaches the speed v1, the acceleration a1 is set to zero, and the operation shifts to the constant speed movement at the speed v1. From time t3 to time t4, the constant speed movement is continued, and the reticle scanning stage 8 moves to the position x2 at a constant speed. Note that the reticle scanning stage 8 operates at times t1 to t3.
During deceleration, reversal, and acceleration, the position is accurately moved. However, since the movement is very small, FIG.
In (a), it is represented flat for convenience.

The reticle scanning stage 8 that has moved at the constant speed v1 reaches the position x2 at time t4. Position x
2, that is, at time t4, the reticle scanning stage 8 moves the acceleration a2 in the direction opposite to the moving speed v1.
It takes. The reticle scanning stage 8 is decelerated by the acceleration a2. Due to the application of the acceleration a2, the moving speed of the reticle scanning stage 8 becomes zero at time t5. Since the acceleration a2 is further applied to the reticle scanning stage 8 from time t5 to t6, the reticle scanning stage 8 is accelerated and reaches the speed v2. When the reticle scanning stage 8 reaches the speed v2, the acceleration a1 is set to zero, and the stage shifts to constant speed movement at the speed v2. From time t6 to time t7, the constant speed movement is maintained, and the reticle scanning stage 8 is moved to the position x.
It moves at a constant speed toward 1. The moving speeds v1 and v2 have the same absolute value and opposite signs, and indicate constant speed movements in opposite directions. The reticle scanning stage 8 moves in the same manner as described above even during the period from time t4 to time t6. However, since the movement is very small, the movement is flat in FIG. 5A for convenience.

In this manner, the reticle scanning stage 8
Repeats a constant speed → deceleration → reversal → acceleration → constant speed → deceleration → reversal → acceleration → constant speed. The driving of the reticle scanning stage 8 is reversed at times t2 and t5.

Next, FIGS. 5D to 5F will be described in detail. At time t1-t2, an acceleration a1 is applied to the reticle scanning stage 8 in a direction opposite to the moving direction. A regenerative brake is used to apply this reverse acceleration a1. That is, the drive current to the linear motor 22 is stopped, the linear motor 22 is operated as a generator, and the electricity generated by the linear motor 22 is transferred to the capacitor 6.
Regenerate (charge) to 4. Therefore, between time t1 and t2, the current flowing at the point 65 becomes a charging current to the capacitor 64 and has a negative value as indicated by i2 in FIG.

Since the current from the constant voltage power supply 61 is not consumed during the time t1-t2, the AC2
The input current of 00 V becomes zero as shown in FIG. During this time, the capacitor 64 is charged, and the voltage at the point 65 rises to a voltage V1 higher than the rated voltage of the constant voltage power supply 61, as shown in FIG.

Between time t2 and t3, a current i3 is supplied to the linear motor 22 in order to accelerate the reticle scanning stage 8. This is controlled by the PWM drive circuit 62 based on the signal I. The current i3 changes the moving speed of the reticle scanning stage 8 from zero to the speed v during the time t2-t3.
This is the drive current of the linear motor 22 required to accelerate to 1. The maximum supply current of the constant voltage power supply 61 is a value of the constant speed drive current i1 of the linear motor 22 and the current for charging the capacitor 64 taken into consideration, and is set to a value slightly higher than the current i1. It is. Therefore, the driving current i3 for accelerating the reticle scanning stage 8 cannot be provided by the constant voltage power supply 61 alone. Therefore,
In the present embodiment, the difference between the drive current i3 and the maximum supply current of the constant voltage power supply 61 is compensated for by the charge accumulated in the capacitor 64.

For example, the maximum drive current of the constant voltage power supply 61 is set to 5 A (ampere), and the drive current i3 required for acceleration is set to 3
0A, the drive current i1 required for constant speed drive is 4A,
Assuming that the acceleration time t2-t3 is 50 mS, it is not enough 25
A is supplemented from the capacitor 64 for 50 ms. Assuming that the voltage of the capacitor 64 rises to 650 V by charging the regenerative brake, and the voltage at the point 65 can be reduced to a voltage of at least 400 V, the capacitance C of the capacitor 64 can be derived from the following equation. That is, when the above value is substituted into the equation of capacitance C = (current i × time t) / voltage V, the capacitance C =
(25A × 0.05S) /250V=0.005F. As a result, the capacity of the capacitor 64 becomes 5000 μF
And it is sufficient.

FIG. 5F shows that the voltage at the point 65 rises to 650 V at time t2 due to charging of the regenerative brake, and falls to 400 V at time t3 due to current consumption due to acceleration. When the current consumption due to acceleration stops at time t3, the capacitor 64 becomes the constant voltage power supply 61.
To 600 V, and the charging is completed at time t8. The driving current for moving the reticle scanning stage 8 at a constant speed is 4
Since A is required, the capacitor 64 can be charged with the remaining 1 A of the maximum drive current 5 A of the constant voltage power supply 61.

FIG. 6 is a diagram showing voltage-current characteristics of a conventional constant-voltage power supply and the constant-voltage power supply 61 of the present embodiment. Reference numeral 71 indicates a voltage-current characteristic of the conventional constant-voltage power supply, and reference numeral 72 indicates a voltage-current characteristic of the constant-voltage power supply 61 of the present embodiment. In the above example, the conventional constant voltage power supply is 30 A
× 400V = 12KW, and the constant voltage power supply 61 of the present embodiment has a rating of 5A × 600V = 3KW.

As described above, by inserting the capacitor 64 between the constant voltage power supply 61 and the PWM drive circuit 62,
The constant voltage power supply 61 can have a very small rating. As a result, the power source is extremely miniaturized, and the volume, weight and cost of the semiconductor exposure apparatus are greatly reduced. Although the diode 63 prevents the current from flowing into the constant voltage power supply 61, it is not always an essential element.

-Second Embodiment- In a second embodiment, another embodiment of the motor driving device shown in Fig. 4 of the first embodiment will be described. The motor drive device of the second embodiment is also used in the projection exposure apparatus of FIG. 1 as in the first embodiment. Therefore, description of the projection exposure apparatus will be omitted, and the projection exposure apparatus will be described below with reference to FIG.

In the first embodiment, the PWM drive circuit 6
For No. 2, a known circuit should have been used. However, as shown in FIG. 5F, the PWM drive circuit 62
The power supply voltage supplied to the power supply varies greatly by charging and discharging of the capacitor 64. It is preferable that the driving device of the linear motors 22 and 42 be a high-precision, high S / N ratio motor driving device that is not affected by such fluctuations in the power supply voltage. Therefore, in the present embodiment, the PW
An M drive circuit is used.

FIG. 7 is a diagram showing a circuit configuration of a motor driving device for driving one coil of a linear motor. Since all the motor driving devices for driving the linear motors 22 and 42 are common in principle, one motor driving device for driving one coil of the linear motor will be representatively described here. The motor drive device of FIG. 7 is a current control device (current amplification circuit) that controls a current flowing through the linear motor 22 according to the voltage level of the input signal I. FIG.
Of the reticle scanning stage 8 based on a signal from the laser interferometer 29 or the like according to a predetermined program.
, And calculates and outputs a drive signal (input signal I) in order to appropriately drive the linear motor 22 in the X direction.

The motor driving device shown in FIG. 7 controls the output current using the PWM (pulse width modulation) method for the voltage level of the input signal I. In FIG. 7, a triangular wave generation circuit 101 includes resistors R1, R2, R3, a capacitor C1, and operational amplifiers U1, U2, and outputs a triangular wave having a predetermined frequency and amplitude. The input signal I is a signal having a sign of ± (positive / negative), and a triangular wave is also a periodic signal that swings with the same amplitude as ±. The difference detector 102 includes resistors R4 and R5, a capacitor C2, and an operational amplifier U3 as shown in FIG.
(Described later), and the difference is amplified and output. The comparator 103 is constituted by a comparator U5, and the triangular wave from the triangular wave generation circuit 101 and the division circuit 1
An input signal I input through an input device 04 (described later) is compared, and a PWM signal (pulse width modulated signal) is output. That is, a signal obtained by pulse-width-modulating the input signal I is output. This pulse width modulation method is a known content.

The PWM signal output from the comparator 103 is level-shifted by the photocoupler 105 and input to the PWM driver 106. At this time, the signal inverted by the inverter 107 is also input to the PWM driver 106. PW
The M driver 106 is composed of a bridge circuit,
The switching FETs Q1 and Q2 are switched based on the M signal. The low-pass filter 108 includes a coil L1 and a capacitor C3, removes a switching component from the output signals of the switching FETs Q1, Q2, and generates a desired output signal OUT.

Output signal O from low-pass filter 108
The UT has its current component detected by a current sensor 109,
The signal is fed back to the difference detector 102 described above. The current sensor 109 includes a Hall element, and generates a voltage according to a flowing current. As described above, since the output current is detected and fed back, the motor drive device of FIG. 7 functions as an output current control device (current amplifier). Note that the current sensor 109 may be configured by a resistor and an amplifier circuit instead of the Hall element.

Power for the switching FETs Q 1 and Q 2 is supplied from a power supply circuit 110. Power supply circuit 110
Is composed of a constant voltage power supply 61, a diode 63, and a capacitor 64, as in the first embodiment. Power supply circuit 1
The voltage of 10 fluctuates as shown in FIG.

By the way, if the power supply including such fluctuations is used as it is as the power supply for the switching FETs Q1 and Q2, the output signals of the switching FETs Q1 and Q2 become signals having noise components affected by the fluctuations. Therefore, in the motor driving device of the present embodiment, the division circuit 104 is used to remove the influence of the voltage fluctuation of the power supply circuit 110.

The differential amplifier 111 includes resistors R9 to R12 and an operational amplifier U6, detects the voltage of the power supply, amplifies it by a predetermined coefficient, and inputs the amplified voltage to the division circuit 104. The division circuit 104 includes a division unit U4 and resistors R6 and R7 for determining a division coefficient.
02 is divided by the signal from the differential amplifier 111, and the result is input to the comparator 103. That is,
The input signal I after the feedback of the output current is divided by the voltage level of the power supply circuit 110 and then the comparator 103
Is input to Specifically, when the voltage of the power supply circuit 110 fluctuates to a large value, the input signal I is corrected so as to decrease, and when the voltage of the power supply circuit 110 fluctuates to a small value, the input signal I increases. Will be corrected.

Division circuit 104 and differential amplifier 111
When the input signal I has a constant value, the voltage of the power supply circuit 110 that includes the fluctuation is equal to the switching FET Q
1, even if supplied to Q2, the output signal OUT is determined so as to exhibit a constant value which is not affected by fluctuations.

In the circuit of FIG. 7, the input signal I is a voltage signal having a sign of ±, and when the voltage is ± zero, the duty ratio of the PWM signal is 50% so that the output current OUT is zero. Has been adjusted as follows. When the input signal I changes in the positive direction, the duty ratio of the PWM signal changes to be smaller than 50% so that the output current OUT flows in the positive direction according to the magnitude of the input signal I. on the other hand,
When the input signal I changes in the negative direction, the output current OUT flows in the negative direction in accordance with the magnitude of the input signal I such that PW
The duty ratio of the M signal changes so as to be larger than 50%. In the above description, when simply saying the magnitude of the input signal I, it means the magnitude of the absolute value of the input signal I.

As described above, in the circuit based on the PWM method (hereinafter simply referred to as a PWM circuit), the duty ratio (modulation degree) of the PWM signal is changed according to the magnitude of the input signal I to output the signal OUT (the first embodiment). In the second embodiment, the output current is controlled.
The duty ratio of the PWM signal is adjusted according to the fluctuation of the voltage of 0. Specifically, when the voltage of the power supply circuit 110 fluctuates to a large value, the output current OUT becomes larger than the target current.
Is adjusted so that the duty ratio of the PWM signal approaches 50% in order to reduce. In the second embodiment, for this adjustment, a dividing circuit 104 for dividing the input signal I by the magnitude of the voltage of the power supply circuit 110 is inserted. That is, when the voltage of the power supply circuit 110 fluctuates greatly, the input signal I is controlled by the division circuit 104 to have a small value. As a result, the duty ratio of the PWM signal approaches 50%, and the output current OUT Is adjusted to be small.

As described above, since the output current is adjusted in accordance with the fluctuation of the voltage level of the power supply circuit 110, the power supply circuit 110 does not need to regulate with high accuracy. Therefore, even with a circuit in which the maximum supply current of the power supply circuit 110 is supplemented by the capacitor 64, high accuracy and high S /
N motor driving devices can be realized. As a result, cost reduction, volume reduction, and weight reduction can be realized in a stage apparatus and an exposure apparatus using this stage apparatus while maintaining high accuracy and high S / N ratio stage drive.

In the above embodiment, the PWM
Direction of change of duty ratio in signal and output current OU
The relationship of the direction of the current of T may be reversed depending on the circuit configuration.

Third Embodiment In a third embodiment, FIG. 7 in the second embodiment will be described.
Another embodiment of the motor drive device will be described. The motor driving device according to the third embodiment is also used in the projection exposure apparatus shown in FIG. 1 as in the first embodiment. Therefore, description of the projection exposure apparatus will be omitted, and the projection exposure apparatus will be described below with reference to FIG.

FIG. 8 is a diagram showing a circuit configuration of a motor driving device for driving one linear motor. The difference from the motor driving apparatus of the second embodiment shown in FIG. 7 is that the division circuit 104 provided on the output side of the difference detection circuit 102 is eliminated and the multiplication circuit 201 is provided on the output side of the triangular wave generation circuit 101.
This is the point provided. Other parts are common to those of the motor drive device of FIG. 7, and thus common components are denoted by the same reference numerals and description thereof will be omitted.

The multiplication circuit 201 comprises a multiplier U21 and resistors R21 and R22 for determining a coefficient of the multiplication. The multiplication circuit 201 multiplies the triangular wave from the triangular wave generation circuit 101 by a signal from the differential amplifier 111, and compares the result with a comparator. Input to 103. Specifically, when the voltage of the power supply circuit 110 fluctuates to a large value, the amplitude of the triangular wave is corrected to increase, and when the voltage of the power supply circuit 110 fluctuates to a small value, the amplitude of the triangular wave decreases. Will be corrected.

Multiplication circuit 201 and differential amplifier 111
When the input signal I has a constant value, the voltage of the power supply circuit 110 that includes the fluctuation is equal to the switching FET Q
1, even if it is supplied to Q2, the output signal OUT is determined so as to show a constant value which is not affected by the voltage fluctuation.

As in the second embodiment, the input signal I is a voltage signal having a sign of ±, and when the voltage is ± zero, the duty ratio of the PWM signal is 50% in order to make the output current OUT zero. It has been adjusted to be. Since the relationship between the change in the input signal I and the change in the duty ratio of the PWM signal is as described in the second embodiment, the description is omitted here.

The PWM circuit according to the third embodiment also has
The duty ratio of the PWM signal is adjusted according to the fluctuation of the voltage of the power supply circuit 110. Specifically, when the voltage of the power supply circuit 110 fluctuates to a large value, the output current OUT becomes larger than the target current, so that the duty ratio of the PWM signal is set to 5 in order to reduce the output current OUT.
Adjust so that it approaches 0%. In the third embodiment,
For this adjustment, a multiplying circuit 201 that multiplies the triangular wave signal output from the triangular wave generating circuit 101 by the magnitude of the voltage of the power supply circuit 110 is inserted.

This is based on the fact that the duty ratio of the PWM signal approaches 50% when the amplitude of the triangular wave increases when the signal levels input to the comparator 103 are the same in the circuit configuration of FIG. Is what you do. Therefore, when the voltage of the power supply circuit 110 fluctuates to a large value, the triangular wave is controlled by the multiplication circuit 201 to have a large amplitude, and as a result, the duty ratio of the PWM signal approaches 50%. Output current OUT
Is adjusted to be small.

As described above, also in the third embodiment, according to the fluctuation of the power supply voltage level of the power supply circuit 110,
Since the output current is adjusted, it is not necessary for the power supply circuit 110 to take regulation with high accuracy. As a result, the second
The same effect as that of the embodiment can be obtained.

Fourth Embodiment In a fourth embodiment, FIG. 7 in the second embodiment will be described.
Another embodiment of the motor drive device will be described. The motor driving device according to the fourth embodiment is also used in the projection exposure apparatus shown in FIG. 1 as in the first embodiment. Therefore, description of the projection exposure apparatus will be omitted, and the projection exposure apparatus will be described below with reference to FIG.

FIG. 9 is a diagram showing a circuit configuration of a motor driving device for driving one linear motor. The difference from the motor drive device of FIG. 7 of the second embodiment is that the division circuit 104 provided on the output side of the difference detection circuit 102 is omitted, and a triangular wave power supply circuit 301 for supplying the triangular wave generation circuit 101 is provided. Is a point. The differential amplifier 111 is also omitted. Other parts are common to those of the motor drive device of FIG. 7, and thus common components are denoted by the same reference numerals and description thereof will be omitted.

The triangular wave power supply circuit 301 includes a resistor R31,
It comprises a differential amplifier composed of R32, R33, R34 and an operational amplifier U31, and an inverting amplifier composed of resistors 35, 36 and an operational amplifier U32. This differential amplifier generates a voltage signal V− corresponding to the voltage of the power supply circuit 110, and the inverting amplifier generates a voltage signal V + whose sign is inverted. The voltage V + and the voltage V− generated by the triangular wave power supply circuit 301
Are ± of the operational amplifiers U1 and U2 of the triangular wave generation circuit 101.
It is supplied as power.

The amplitude of the triangular wave generated by the triangular wave generating circuit 101 changes according to the power supply level supplied to the operational amplifiers U1 and U2. In the fourth embodiment, the amplitude of the triangular wave is adjusted using this property in the same manner as in the third embodiment. Specifically, when the voltage of the power supply circuit 110 fluctuates to a large value, the potential difference between the voltage V + and the voltage V− generated by the triangular wave power supply circuit 301 is controlled to be a large value. As a result, the amplitude of the triangular wave generated by the triangular wave generating circuit 101 is corrected so as to increase. Similarly, when the voltage of the power supply circuit 110 fluctuates to a small value, the amplitude of the triangular wave is corrected to be small.

The circuit constant of the triangular wave power supply circuit 301 fluctuates when the voltages V + and V− have a voltage level suitable for the power supply of the triangular wave generation circuit 101 and the input signal I has a constant value. Even if the voltage of the power supply circuit 110 that is included is supplied to the switching FETs Q1 and Q2, the output signal OUT is determined to have a constant value that is not affected by the voltage fluctuation.

Since the relationship between the amplitude of the triangular wave and the duty ratio of the PWM signal is as described in the third embodiment, the description is omitted here.

As described above, also in the fourth embodiment, according to the fluctuation of the power supply voltage level of power supply circuit 110,
Since the output current is adjusted, it is not necessary for the power supply circuit 110 to take regulation with high accuracy. As a result, the second
The same effect as that of the embodiment can be obtained.

-Fifth Embodiment- In a fifth embodiment, FIG. 7 in the second embodiment is used.
Another embodiment of the motor drive device will be described. The motor driving device according to the fifth embodiment is also used in the projection exposure apparatus shown in FIG. 1 as in the first embodiment. Therefore, description of the projection exposure apparatus will be omitted, and the projection exposure apparatus will be described below with reference to FIG.

FIG. 10 is a diagram showing a circuit configuration of a motor driving device for driving one linear motor. The difference from the motor drive device of FIG. 7 of the second embodiment is that the division circuit 104 provided on the output side of the difference detection circuit 102 is eliminated, and another triangular wave generation circuit 401 is provided instead of the triangular wave generation circuit 101. It is a point. Further, the differential amplifier 111 is also omitted, and a triangular wave level signal generation circuit 404 that generates ± triangular wave level signals S1 and S2 that change according to the fluctuation of the voltage of the power supply circuit 110 is provided. Other parts are common to those of the motor drive device of FIG. 7, and thus common components are denoted by the same reference numerals and description thereof will be omitted.

The triangular wave generating circuit 401 includes an OSC (oscillator) 403 for determining the period of the triangular wave, and a switching element 402 for receiving a signal from the OSC 403 and alternately switching between a + triangular wave level signal S1 and a − triangular wave level signal S2. , A resistor 41 for integrating an output signal from the switching element 402, a capacitor 41, and an operational amplifier U41
And an integrating circuit consisting of From this integration circuit, a triangular wave is output and input to the comparator 103. The amplitude of the triangular wave is determined by the voltage levels of the ± triangle wave level signals S1 and S2, the period of the OSC 403, the resistor R41, and the capacitor C.
41 and the like. In the fifth embodiment, the amplitude of the triangular wave is adjusted by changing the voltage levels of the triangular wave level signals S1 and S2. The third embodiment and the fourth embodiment are similar to the third and fourth embodiments in that the amplitude of the triangular wave is adjusted.

The triangular wave level signals S1 and S2 are generated by a triangular wave level signal generating circuit 404. The triangular wave level signal generation circuit 404 includes resistors R42, R43, R4
4, a differential amplifier composed of R45 and an operational amplifier U42, and an inverting amplifier composed of resistors 46 and 47 and an operational amplifier U43. The power supply circuit 110 is
A minus triangular wave level signal S1 is generated in accordance with the voltage of the above-mentioned voltage, and a plus triangle wave level signal S2 is generated by inverting the sign of the signal S1 with an inverting amplifier. The ± triangular wave level signals S1 and S2 generated by the triangular wave level signal are input to the switching element 402 of the triangular wave generating circuit 401.

The triangular wave level signal generating circuit 404 and the triangular wave generating circuit 401 configured as described above generate a triangular wave having an amplitude corresponding to the fluctuation of the voltage of the power supply circuit 110. Specifically, when the voltage of the power supply circuit 110 fluctuates to a large value, the potential difference between the ± triangle wave level signals S1 and S2 generated by the triangular wave level signal generation circuit 404 is controlled to be a large value. As a result, the amplitude of the triangular wave generated by the triangular wave generation circuit 401 is corrected so as to increase. Similarly, when the voltage of the power supply circuit 110 fluctuates to a small value, the amplitude of the triangular wave is corrected to be small.

The circuit constants of the triangular wave level signal generating circuit 404 and the triangular wave generating circuit 401 are set so that the amplitude of the triangular wave becomes a voltage level appropriate for the PWM circuit of FIG. 10 and the input signal I has a constant value. In addition, the voltage of the power supply circuit 110 including the fluctuation is changed to the switching FET Q1,
Even when the output signal OUT is supplied to Q2, the output signal OUT is determined so as to exhibit a constant value which is not affected by the voltage fluctuation.

The relationship between the amplitude of the triangular wave and the duty ratio of the PWM signal is as described in the third embodiment, and a description thereof will be omitted.

As described above, also in the fifth embodiment, according to the fluctuation of the power supply voltage level of power supply circuit 110,
Because the output current is adjusted, the power supply circuit does not need to regulate with high accuracy. As a result, the same effects as those of the second embodiment can be obtained.

As a linear motor used in the projection exposure apparatus of FIG. 1, a synchronous linear motor driven by applying three-phase currents having different phases to each other is known. In such a linear motor, PWM is applied to the current of each phase.
The current amplification by the method will be performed. In that case, FIG.
0 power supply circuit 110, triangular wave level signal generation circuit 40
4, and the OSC 403 and the switching element 402 of the triangular wave generation circuit 401 may be configured to be shared by each phase. Then, in the triangular wave generation circuit 401, an integrating circuit including the resistor R41, the capacitor C41, and the operational amplifier U41 may be provided for each phase circuit.

In a device having a plurality of linear motors and a plurality of motor driving devices for driving these motors, similarly, the power supply circuit 110, the triangular wave level signal generating circuit 404, and the triangular wave S of the generation circuit 401
The C403 and the switching element 402 may be shared by the driving devices of the respective linear motors. This makes it possible to synchronize the triangular waves between the currents applied to the motor, thereby preventing the generation of noise such as a beat signal.

The fact that the PWM amplifier circuit of the motor drive device is affected by the power supply voltage means that the PWM amplifier circuit changes the loop gain to absorb the change in output current due to this power supply voltage. As a result, the frequency characteristics of the gain and the phase change. Therefore, the above second to second
In the fifth embodiment, the loop gain is not affected by the fluctuation of the power supply voltage, for example, by calculating the voltage of the input signal or the amplitude of the triangular wave based on the change of the power supply voltage. . Thereby, even when the power supply fluctuates, a highly accurate motor driving device can be realized.

The circuit that adjusts according to the fluctuation of the power supply voltage does not need to be limited to the above embodiment. PWM
Any circuit that can adjust the duty ratio of the PWM signal in accordance with the fluctuation of the power supplied to the switching element of the circuit can be employed. In particular, some specific examples of the circuit for adjusting the amplitude of the triangular wave are illustrated, but any other circuit for adjusting the amplitude of the triangular wave can of course be employed.

In the above embodiment, an example in which the constant voltage power supply 61 is used as the power supply has been described.
1 does not necessarily have to be sufficiently regulated. What is necessary is just what functions as a simple constant voltage power supply. For example, it may be one that only rectifies three-phase alternating current. In other words, any power source may be used as long as it supplies a constant voltage to some extent.

In the above embodiment, the present invention is applied to a PWM current amplifier circuit. However, the present invention can be applied to a PWM voltage amplifier circuit.

In the above embodiment, an example in which the linear motor is driven has been described. However, the present invention is not limited to this. For example, the present invention can be applied to a case where a rotary motor is driven. That is, the motor drive device of the present invention can be used for driving a motor that requires at least a large drive current and a small drive current during use. In addition, as an application of the motor drive device of the present invention, an example of a stage device and a projection exposure apparatus using the stage device has been described. However, the present invention is not limited to this. The present invention can be applied to any device that requires at least two stages of thrust during the use of the motor: a large thrust and a small thrust.

The exposure apparatus of the present embodiment can be applied to a step-and-repeat type exposure apparatus that exposes a mask pattern while the mask and the substrate are stationary and sequentially moves the substrate.

The exposure apparatus of the present embodiment can be applied to a proximity exposure apparatus that exposes a mask pattern by bringing a mask and a substrate into close contact without using a projection optical system.

The use of the exposure apparatus is not limited to the exposure apparatus for manufacturing semiconductors. For example, the present invention can be widely applied to an exposure apparatus for a liquid crystal for exposing a liquid crystal display element pattern to a square glass plate and an exposure apparatus for manufacturing a thin film magnetic head.

The light source of the exposure apparatus of this embodiment is g
Line (436 nm), i-line (365 nm), KrF excimer laser (248 nm), ArF excimer laser (19
3 nm), not only the _{F 2} laser (157 nm) only, it is possible to use a charged particle beam such as X-ray or electron beam. For example, when using an electron beam, thermionic emission type lanthanum hexaborite (LaB6), tantalum (Ta)
Can be used. Further, when an electron beam is used, a structure using a mask may be used, or a pattern may be formed on a substrate by direct drawing using an electron beam without using a mask.

The magnification of the projection optical system may be not only a reduction system but also any one of an equal magnification and an enlargement system.

When far ultraviolet rays such as an excimer laser are used as the projection optical system, a material that transmits far ultraviolet rays such as quartz or fluorite may be used as a glass material. When an F ₂ laser or X-ray is used, a catadioptric or refractive optical system is used (a reticle is of a reflective type).
When an electron beam is used, an electron optical system including an electron lens and a deflector may be used as the optical system. It goes without saying that the optical path through which the electron beam passes is set in a vacuum state.

Vacuum ultraviolet light (V
In an exposure apparatus using (UV light), a catadioptric optical system may be used as the projection optical system. Examples of the catadioptric optical system include, for example, Japanese Patent Application Laid-Open No. Hei 8-171504 and US Pat. No. 5,668,67 corresponding thereto.
2, a catadioptric optical system having a beam splitter and a concave mirror as a reflective optical element, disclosed in Japanese Patent Application Laid-Open No. 10-20195 and US Pat. No. 5,835,275 corresponding thereto. Can be used. Also, Japanese Patent Application Laid-Open No. 8-334695 and US Patent No. 5,689,377 corresponding thereto, and Japanese Patent Application Laid-Open No. 10-3039 and US Patent Application No. 873,605 corresponding thereto (filing date: 1997) June 12,
And the like, a catadioptric optical system having a concave mirror or the like can be used as a reflective optical element without using a beam splitter. The present invention is also applicable to an exposure apparatus having such a projection optical system.

In addition, US Pat. No. 5,031,976
Nos. 5,488,229 and 5,717,518
Nos. 1 and 2, a plurality of refractive optical elements and two mirrors (a primary mirror that is a concave mirror, and a sub-mirror that is a back-side mirror in which a reflection surface is formed on the reflection element or a plane opposite to the plane of incidence of the plane-parallel plate).
Are arranged on the same axis, and a catadioptric optical system that re-images the intermediate image of the reticle pattern formed by the plurality of refractive optical elements on the wafer by the primary mirror and the secondary mirror may be used. Good. In this catadioptric optical system, a primary mirror and a secondary mirror are arranged following a plurality of refractive optical elements, and illumination light reaches a wafer through a part of the primary mirror.

The catadioptric projection optical system has, for example, a circular image field, is telecentric on both the object side and the image side, and has a projection magnification of 1/4 or 1 / A reduction system of 5 times may be used. In the case of a scanning type exposure apparatus having this catadioptric projection optical system, the irradiation area of the illumination light has its optical axis substantially centered within the field of view of the projection optical system and is substantially orthogonal to the scanning direction of the reticle or wafer. It may be of a type defined in a rectangular slit shape extending along the direction of movement.
According to such a scanning exposure apparatus, for example, the wavelength 15
Be used F ₂ laser beam 7nm as exposure illumination light 1
It is possible to transfer a fine pattern of about a 00 nm L / S pattern onto a wafer with high accuracy. The present invention is also applicable to an exposure apparatus having such a projection optical system.

As the linear motor of the wafer stage or reticle stage, either an air floating type using an air bearing or a magnetic floating type using Lorentz force or reactance force may be used. The stage may be of a type that moves along a guide or a guideless type that does not have a guide.

When a plane motor is used as the stage driving device, one of the magnet unit and the armature unit is connected to the stage, and the other of the magnet unit and the armature unit is provided on the moving surface side of the stage. Good. As the flat motor, for example, a configuration disclosed in Japanese Patent Application Laid-Open No. H11-27925 can be used.

The reaction force generated by the movement of the wafer stage may be mechanically released to the floor (ground) using a frame member as described in Japanese Patent Application Laid-Open No. 8-166475. The present invention is also applicable to a wafer stage having such a reaction force processing mechanism.

The reaction force generated by the movement of the reticle stage may be released mechanically to the floor (ground) using a frame member as described in, for example, JP-A-8-330224. The present invention is also applicable to a reticle stage having such a reaction force processing mechanism.

The exposure apparatus according to the embodiment of the present invention includes the components (eleme) described in the claims of the present application.
It is manufactured by assembling various subsystems including nts) so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. Before and after this assembly, adjustments to achieve optical accuracy for various optical systems, adjustments to achieve mechanical accuracy for various mechanical systems, and various electric systems to ensure these various accuracy Are adjusted to achieve electrical accuracy. The process of assembling the exposure apparatus from the various subsystems includes mechanical connection, wiring connection of an electric circuit, and piping connection of a pneumatic circuit among the various subsystems. It goes without saying that there is an assembling process for each subsystem before the assembling process from the various subsystems to the exposure apparatus. After the process of assembling the various subsystems into the exposure apparatus is completed, comprehensive adjustments including electrical adjustment, operation confirmation, and the like are performed, and various precisions of the entire exposure apparatus are secured. It is desirable that the exposure apparatus be manufactured in a clean room in which the temperature, the degree of cleanliness, and the like are controlled.

Hereinafter, the method of manufacturing the device will be described in more detail. FIG. 11 shows devices (IC and LSI).
Of the semiconductor chip, the liquid crystal panel, the CCD, the thin-film magnetic head, the micromachine, etc.). As shown in FIG. 11, first, in step S301 (design step), a function / performance design of a device (for example, a circuit design of a semiconductor device) is performed, and a pattern design for realizing the function is performed. Subsequently, in step S302 (mask manufacturing step), a mask (reticle) on which the designed circuit pattern is formed is manufactured. On the other hand, in step S303 (wafer manufacturing step), a wafer is manufactured using a material such as silicon.

Next, in step S304 (wafer processing step), steps S301 to S303
Using the mask (reticle) and the wafer prepared in the above, an actual circuit or the like is formed on the wafer by lithography technology or the like as described later. Next, in step S305 (device assembly step), device assembly is performed using the wafer processed in step S304. Step S305 includes processes such as a dicing process, a bonding process, and a packaging process (chip encapsulation) as necessary.

Finally, in step S306 (inspection step), inspections such as operation confirmation dest and a durability test of the device manufactured in step S305 are performed. After these steps, the device is completed and the device is shipped.

FIG. 12 shows a detailed flow example of step S304 in the case of a semiconductor device. In FIG. 12, in step S311 (oxidation step), the surface of the wafer is oxidized. In step S312 (CVD step), an insulating film is formed on the wafer surface. In step S313 (electrode forming step), electrodes are formed on the wafer by vapor deposition. In step S314 (ion implantation step), ions are implanted into the wafer. Step S3 above
Each of the steps 11 to S314 constitutes a pre-processing step in each stage of the wafer processing, and is selected and executed according to a necessary process in each stage.

In each stage of the wafer process, when the above-mentioned pre-processing step is completed, the post-processing step is executed as follows. In this post-processing step, first, step S
At 315 (resist forming step), a photosensitive agent is applied to the wafer. Subsequently, in step S316 (exposure step), the circuit pattern of the mask (reticle) is transferred onto the wafer using the exposure apparatus of the present embodiment.
Next, the wafer exposed in step S317 (development step) is developed, and in step S318 (etching step), the surface of the exposed member other than the portion where the resist remains is removed by etching. Then, in step S319 (resist removing step), unnecessary resist after etching is removed.

By repeating these pre-processing and post-processing, multiple circuit patterns are formed on the wafer.

[0102]

According to the present invention, as described above, the constant-voltage power supply used for the motor driving device can be extremely reduced in size. As a result, it is possible to provide a low cost, small volume, and low weight motor drive device. Also,
Even if the constant voltage power supply is extremely miniaturized, a motor drive device with high accuracy and high S / N ratio can be realized. Further, in a stage device using this motor drive device, an exposure apparatus using this stage device, etc., cost reduction, volume reduction, and weight reduction are achieved while maintaining high accuracy and high S / N ratio control. realizable.

[Brief description of the drawings]

FIG. 1 is a schematic configuration diagram of a projection exposure apparatus.

FIG. 2 is a plan view of the reticle stage device as viewed from above.

FIG. 3 is a plan view of the wafer stage device as viewed from above.

FIG. 4 is a diagram illustrating a configuration of a linear motor drive device according to the first embodiment.

FIG. 5 shows a position when the reticle scanning stage moves,
5 is a timing chart illustrating a relationship among a speed, an acceleration, a circuit current, a power supply input current, and a power supply output voltage.

FIG. 6 is a diagram showing voltage-current characteristics of a conventional constant-voltage power supply and a constant-voltage power supply of the present embodiment.

FIG. 7 is a diagram illustrating a circuit configuration of a motor driving device that drives a linear motor according to a second embodiment.

FIG. 8 is a diagram illustrating a circuit configuration of a motor drive device that drives a linear motor according to a third embodiment.

FIG. 9 is a diagram illustrating a circuit configuration of a motor drive device that drives a linear motor according to a fourth embodiment.

FIG. 10 is a diagram illustrating a circuit configuration of a motor driving device that drives a linear motor according to a fifth embodiment.

FIG. 11 is a flowchart illustrating a semiconductor manufacturing process.

FIG. 12 is a diagram showing a detailed flowchart of step S304 in FIG. 11;

[Explanation of symbols]

Reference Signs List 1 illumination optical system 2 reticle stage device 3 projection optical system 4 wafer stage device 5 reticle 6 wafer 7 reticle base 8 reticle scanning stage 9 reticle fine movement stage 10 reticle scanning drive device 11 reticle fine movement drive device 12 controller 13 wafer base 14 wafer stage X-axis driving unit 15 Wafer stage Y-axis driving unit 16 Wafer driving device 21a, 21b, 41a, 41b, 43a, 43b Air guide 22a, 22b, 42a, 42b Electromagnet 23 to 25 Actuator 26 to 28, 46, 47 Moving mirror 29 ~ 31,48 ~ 50 Laser interferometer 44 Stepping motor 45 Ball screw 61 Constant voltage power supply 62 PWM drive circuit 63 Diode 64 Capacitor 101,401 Triangular wave generation circuit 102 Difference detector 103 Comparison 104 Division circuit 104 105 Photocoupler 106 PWM driver 107 Inverter 108 Low-pass filter 109 Current sensor 110 Power supply circuit 111 Differential amplifier 201 Multiplication circuit 301 Triangular power supply circuit 402 Switching element 403 OSC I Input signal OUT Output signal R Resistance C Capacitor D Diode Q1, Q2 Switching FETs U1-U3, U5-U7, U31, U32, U41-U
43 Operational amplifier U4 Divider U21 Multiplier S1, S2 Triangular wave level signal

 ──────────────────────────────────────────────────続 き Continued from the front page F term (reference) 5H540 AA10 BA05 BB02 BB09 CC02 DD03 EE08 EE14 EE15 FA14 FC02 FC03

Claims (11)

[Claims] 1. A motor drive device comprising: a constant voltage power supply; and a motor drive control circuit that controls a drive current from the constant voltage power supply to a motor that repeats at least constant speed and acceleration driving. The maximum supply current is smaller than the maximum drive current during the acceleration drive of the motor.To supply the maximum drive current during the acceleration drive of the motor, the constant voltage power supply and the motor drive control circuit A motor drive device comprising a capacitor interposed therebetween. 2. The motor drive device according to claim 1, wherein the capacitance of the capacitor is a drive current value required by a drive current during acceleration driving of the motor to exceed a maximum supply current of the constant voltage power supply; A motor drive device, which is determined based on the duration. 3. The motor drive device according to claim 1, wherein the motor drive control circuit controls a drive current to the motor that repeats constant speed, deceleration, reversal, and acceleration drive, and controls the current when the motor decelerates. The regenerative brake is configured to operate, and the capacitor accumulates electric charge generated by the regenerative brake. 4. The motor drive device according to claim 1, wherein the motor is a linear motor, and the motor drive control circuit controls a pulse width modulation control.
A motor drive device comprising a PWM control circuit that controls an output current to the linear motor based on an input signal using a WM method. 5. The motor driving device according to claim 4, wherein the PWM control circuit compares a triangular wave generating circuit for generating a triangular wave with the input signal and the triangular wave, and responds to a voltage level of the input signal. A comparator that outputs a PWM signal having a pulse width; a switching element that is connected to the circuit after the capacitor is inserted, and that turns on and off a voltage from the circuit after the capacitor is inserted based on the PWM signal and outputs the PWM signal; An adjustment circuit for adjusting the duty ratio of the circuit according to the voltage level of the circuit after the capacitor is inserted. 6. The motor driving device according to claim 5, wherein the adjustment circuit is a circuit that divides the input signal by a voltage level of the circuit after inserting the capacitor. 7. The motor driving device according to claim 5, wherein the adjustment circuit is a circuit that adjusts the amplitude of the triangular wave according to a change in a voltage level of the circuit after the capacitor is inserted. Drive. 8. The motor drive according to claim 1, wherein a stage on which the moving object is mounted, a motor that drives the stage to move the moving object, and a motor that drives the motor. And a stage device. 9. An exposure apparatus for forming a predetermined pattern on a substrate by exposure, comprising at least one of the stage device according to claim 8 for mounting and moving one of a mask and a substrate. Exposure equipment. 10. A device manufactured by the exposure apparatus according to claim 9. 11. A device manufacturing method, comprising a step of performing exposure by the exposure apparatus according to claim 9.