JP2002367864A - Method for forming electrode foil for aluminum electrolytic capacitor - Google Patents
Method for forming electrode foil for aluminum electrolytic capacitorInfo
- Publication number
- JP2002367864A JP2002367864A JP2001172009A JP2001172009A JP2002367864A JP 2002367864 A JP2002367864 A JP 2002367864A JP 2001172009 A JP2001172009 A JP 2001172009A JP 2001172009 A JP2001172009 A JP 2001172009A JP 2002367864 A JP2002367864 A JP 2002367864A
- Authority
- JP
- Japan
- Prior art keywords
- power supply
- foil
- chemical conversion
- forming
- conversion film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明はアルミ電解コンデン
サ用電極箔の化成方法に関するものである。The present invention relates to a method for forming an electrode foil for an aluminum electrolytic capacitor.
【０００２】[0002]
【従来の技術】一般的なアルミ電解コンデンサは、アル
ミニウム箔をエッチング処理によって実効表面積を拡大
させたエッチング箔の表面に化成処理により化成皮膜を
形成した陽極箔と、アルミニウム箔をエッチング処理に
よって実効表面積を拡大させた陰極箔と、この陽極箔と
陰極箔をその間にセパレータを介在させて巻回すること
によりコンデンサ素子を作製し、このコンデンサ素子に
駆動用電解液を含浸させるとともに、このコンデンサ素
子を金属ケース内に封止することにより構成されてい
る。2. Description of the Related Art A general aluminum electrolytic capacitor has an anode foil in which a chemical conversion film is formed on a surface of an etched foil in which the effective surface area is enlarged by etching a aluminum foil, and an effective surface area by etching a aluminum foil. A capacitor element is produced by winding the cathode foil with the cathode foil enlarged and the anode foil and the cathode foil with a separator interposed therebetween, and the capacitor element is impregnated with a driving electrolyte, and the capacitor element is It is configured by sealing in a metal case.
【０００３】図３は上記陽極箔に化成処理により化成皮
膜を形成する製造装置を概念図で示したものであり、同
図において、３１はアルミニウム箔を電気化学的にエッ
チング処理することによって実効表面積が拡大されたエ
ッチング箔で、厚さ０．０７〜０．１２ｍｍ、幅が５０
０ｍｍ、長さ５００〜１０００ｍのものを用いる。この
エッチング箔３１は第１直流電源３３の陽極に接続され
た給電ローラ３２と接触させ、第１直流電源３３の陰極
に接続された複数の陰極板３４と電解液（図示せず）を
有する化成槽３５内で一定の耐電圧を有する化成皮膜を
形成する。なお、この電解液は、有機酸または無機酸も
しくはこれらの塩からなる水溶液が用いられる。FIG. 3 is a conceptual view showing a manufacturing apparatus for forming a chemical conversion film on the above-mentioned anode foil by a chemical conversion treatment. In FIG. 3, reference numeral 31 denotes an effective surface area by electrochemically etching an aluminum foil. Is an enlarged etched foil, having a thickness of 0.07 to 0.12 mm and a width of 50.
A material having a length of 0 mm and a length of 500 to 1000 m is used. The etching foil 31 is brought into contact with a power supply roller 32 connected to the anode of the first DC power supply 33, and has a plurality of cathode plates 34 connected to the cathode of the first DC power supply 33 and a chemical solution (not shown). A chemical conversion film having a certain withstand voltage is formed in the tank 35. Note that an aqueous solution composed of an organic acid or an inorganic acid or a salt thereof is used as the electrolytic solution.
【０００４】次に、上記一定の耐電圧を有する化成皮膜
を形成したエッチング箔３１は化成皮膜に欠陥を作る減
極処理槽３６を経て、第２直流電源３９の陽極を電極板
３７に接続した給電槽３８にてエッチング箔３１に液体
給電し、その後、上記第２直流電源３９の陰極を接続し
た陰極板４０，４２を設置した化成槽４１，４３にてエ
ッチング箔３１を再化成し、所定の耐電圧を有する化成
皮膜を形成した陽極箔４４が得られる。[0004] Next, the anode of the second DC power supply 39 is connected to the electrode plate 37 through the depolarizing treatment tank 36 for forming the chemical conversion film having the above-mentioned constant withstand voltage and forming a defect in the chemical conversion film. Liquid is supplied to the etching foil 31 in the power supply tank 38, and thereafter, the etching foil 31 is re-formed in the formation tanks 41 and 43 in which the cathode plates 40 and 42 connected to the cathode of the second DC power supply 39 are provided. The anode foil 44 on which the chemical conversion film having the withstand voltage is formed is obtained.
【０００５】なお、上記化成処理において、第１直流電
源３３の電圧は、第２直流電源３９の電圧よりも低く設
定するようにしている。In the above-mentioned chemical conversion treatment, the voltage of the first DC power supply 33 is set lower than the voltage of the second DC power supply 39.
【０００６】また、化成処理による化成皮膜の形成の別
の方法として、特開平０２−１２８４１５号公報に記載
の技術では、エッチング箔に異なる化成電圧を多段階に
印加して化成処理するときに、少なくとも各化成段階の
間に所定時間の減極処理を行うことにより陽極箔の漏れ
電流を小さくすることができるということが記載されて
いる。[0006] As another method of forming a chemical conversion film by a chemical conversion treatment, the technique described in Japanese Patent Application Laid-Open No. 02-128415 discloses a method in which a chemical conversion treatment is performed by applying different chemical conversion voltages to an etching foil in multiple stages. It is described that the leakage current of the anode foil can be reduced by performing a depolarization treatment for a predetermined time at least between each formation step.
【０００７】[0007]
【発明が解決しようとする課題】しかしながら、上記従
来の化成処理による化成皮膜の形成において、減極処理
槽３６による化成皮膜の欠陥が不充分であるために、第
２直流電源３９の陽極を電極板３７に接続した給電槽３
８にてエッチング箔３１に液体給電する電流量が低減し
てしまい、再化成での化成皮膜を均一に形成することが
できず、陽極箔４４の静電容量や耐電圧のばらつきが大
きくなるという課題を有している。However, in the formation of the chemical conversion film by the above-mentioned conventional chemical conversion treatment, the anode of the second DC power supply 39 is connected to the electrode because the defect of the chemical conversion film by the depolarization treatment tank 36 is insufficient. Power supply tank 3 connected to plate 37
In 8, the amount of current supplied to the etching foil 31 by liquid supply is reduced, so that a chemical conversion film cannot be formed uniformly by re-chemical conversion, and the variation in the capacitance and withstand voltage of the anode foil 44 increases. Has issues.
【０００８】特に、耐電圧が高電圧になるほど、エッチ
ング箔３１に充分な電流量を供給することができず、陽
極箔４４の静電容量や耐電圧のばらつきが大きくなるば
かりでなく、給電槽３８でエッチング箔３１が箔切れす
るトラブルやエッチング箔３１の表面に凹凸が発生する
などの品質問題が起きていた。In particular, as the withstand voltage becomes higher, a sufficient amount of current cannot be supplied to the etching foil 31 and not only the capacitance and the withstand voltage of the anode foil 44 become larger, but also the power supply tank becomes larger. 38, quality problems such as a problem that the etching foil 31 breaks or irregularities occur on the surface of the etching foil 31 have occurred.
【０００９】本発明は上記従来の課題を解決するもの
で、陽極箔の静電容量、耐電圧のばらつきを低減し、化
成処理の工程不良を低減することができるアルミ電解コ
ンデンサ用電極箔の化成方法を提供することを目的とす
るものである。SUMMARY OF THE INVENTION The present invention solves the above-mentioned conventional problems, and provides a method of forming an electrode foil for an aluminum electrolytic capacitor capable of reducing variations in the capacitance and withstand voltage of an anode foil and reducing process defects in a chemical conversion treatment. It is intended to provide a method.
【００１０】[0010]
【課題を解決するための手段】上記課題を解決するため
に本発明の請求項１に記載の発明は、エッチング箔を直
流電源の陽極に接続された給電ローラと接触させ、上記
直流電源の陰極に接続された複数の陰極板と電解液を有
した化成槽内で上記エッチング箔に一定の耐電圧を有す
る化成皮膜を形成する工程と、このエッチング箔の両面
に機械的な応力を交互に加えて化成皮膜に亀裂を形成す
る工程と、上記直流電源とは別の直流電源の陽極に接続
された電極板と給電液を有した給電槽内で上記エッチン
グ箔に液体給電する工程と、上記別の直流電源の陰極に
接続された複数の陰極板と電解液を有した複数の化成槽
内で上記化成皮膜を再化成して所定の耐電圧を有する化
成皮膜を形成する工程とを備えたもので、この方法によ
り、化成皮膜に均一な亀裂を形成することができるの
で、静電容量、耐電圧の特性のばらつきを低減し、化成
処理における工程不良を低減した陽極箔を得ることがで
きるという作用を有する。According to a first aspect of the present invention, an etching foil is brought into contact with a power supply roller connected to an anode of a DC power supply, and a cathode of the DC power supply is provided. Forming a chemical conversion film having a constant withstand voltage on the etching foil in a chemical conversion tank having a plurality of cathode plates and an electrolytic solution connected to the etching foil; and applying a mechanical stress alternately to both surfaces of the etching foil. Forming a crack in the chemical conversion film by applying a power supply to the etching foil in a power supply tank having an electrode plate and a power supply liquid connected to an anode of a DC power supply different from the DC power supply; Forming a conversion coating having a predetermined withstand voltage by re-forming the conversion coating in a plurality of conversion plates having an electrolyte and a plurality of cathode plates connected to the cathode of the DC power supply. In this way, the conversion coating Since a crack can be formed, capacitance, and reduce variations in characteristics of the withstand voltage, an effect that can be obtained a reduced anode foil processing defects in the chemical conversion treatment.
【００１１】請求項２に記載の発明は、請求項１に記載
の発明において、化成皮膜に亀裂を形成する工程がエッ
チング箔の両面をローラに交互に少なくとも１回以上押
しつけるようにしたもので、エッチング箔の両面の化成
皮膜に均一に亀裂を形成することができるという作用を
有する。According to a second aspect of the present invention, in the first aspect of the invention, the step of forming a crack in the chemical conversion film alternately presses both surfaces of the etching foil against the roller at least once or more. This has the effect that cracks can be uniformly formed in the chemical conversion films on both sides of the etching foil.
【００１２】請求項３に記載の発明は、請求項２に記載
の発明において、エッチング箔がローラと接触するとき
の接触角を１１０〜１６０度の範囲としたもので、請求
項２に記載の発明による作用効果よりもさらに化成皮膜
に亀裂を形成することができるという作用を有する。According to a third aspect of the present invention, in the second aspect of the present invention, the contact angle when the etching foil contacts the roller is in a range of 110 to 160 degrees. This has the effect that cracks can be formed in the chemical conversion film more than the effects of the invention.
【００１３】なお、エッチング箔の接触角が１１０度未
満では、エッチング箔への機械的応力が強くなりすぎて
箔切れを起こしやすくなり、また、接触角が１６０度を
越えると化成皮膜に亀裂を形成しにくくなる。If the contact angle of the etching foil is less than 110 degrees, the mechanical stress on the etching foil becomes too strong, so that the foil is liable to be cut. If the contact angle exceeds 160 degrees, the chemical conversion film is cracked. It becomes difficult to form.
【００１４】請求項４に記載の発明は、請求項１に記載
の発明において、一定の耐電圧を有する化成皮膜を形成
する工程を複数の直流電源と複数の化成槽により段階的
に耐電圧を有する化成皮膜を形成するようにしたもの
で、一定の耐電圧を有する化成皮膜を均一に形成するこ
とができるという作用を有する。According to a fourth aspect of the present invention, in the first aspect of the present invention, the step of forming a chemical conversion film having a constant withstand voltage is performed stepwise by using a plurality of DC power supplies and a plurality of chemical conversion tanks. It has a function of forming a chemical conversion film having a certain withstand voltage uniformly.
【００１５】[0015]
【発明の実施の形態】以下、本発明の一実施の形態につ
いて図面を用いて詳細に説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below in detail with reference to the drawings.
【００１６】本発明の一実施の形態による化成処理によ
る化成皮膜を形成する製造装置の概念図を図１に示す。
同図１において、１はアルミニウム箔をエッチング処理
したエッチング箔で、厚さ０．０７〜０．１２ｍｍ、幅
が５００ｍｍ、長さ１００〜２０００ｍのものが用いら
れる。２は第１直流電源３および第２直流電源６の陽極
側が接続されてエッチング箔１に電流を供給する給電ロ
ーラ、５および８は化成槽で、この化成槽５，８内には
複数の陰極板４，７がそれぞれ設置され、電解液（図示
せず）で満たされている。上記複数の陰極板４，７には
第１直流電源３および第２直流電源６の陰極がそれぞれ
接続されており、上記エッチング箔１が複数の陰極板
４，７の間を通過することにより一定の耐電圧を有する
化成皮膜を形成する。FIG. 1 is a conceptual diagram of a manufacturing apparatus for forming a chemical conversion film by a chemical conversion treatment according to an embodiment of the present invention.
In FIG. 1, reference numeral 1 denotes an etching foil obtained by etching an aluminum foil, which has a thickness of 0.07 to 0.12 mm, a width of 500 mm, and a length of 100 to 2000 m. Reference numeral 2 denotes a power supply roller to which the anode side of the first DC power supply 3 and the second DC power supply 6 is connected to supply current to the etching foil 1, and 5 and 8 denote chemical formation tanks. Plates 4 and 7 are respectively installed and filled with an electrolyte (not shown). The cathodes of the first DC power supply 3 and the second DC power supply 6 are connected to the plurality of cathode plates 4 and 7, respectively, and the etching foil 1 is kept constant by passing between the plurality of cathode plates 4 and 7. To form a chemical conversion film having a withstand voltage of
【００１７】９は亀裂形成部で、上記化成槽５および化
成槽８で一定の耐電圧を有する化成皮膜を形成したエッ
チング箔１の表裏に、ローラで交互に機械的な応力を加
えることにより上記化成皮膜に均一な亀裂を形成するこ
とができる。１２は給電槽で、第３直流電源１０の陽極
を接続した電極板１１と給電液（図示せず）を有してお
り、この電極板１１の間をエッチング箔１が通過するこ
とにより電流をエッチング箔１に液体給電することがで
きる。１４および１６は上記第３直流電源１０の陰極と
接続された陰極板１３，１５を有した化成槽で、エッチ
ング箔１を上記化成槽１４および化成槽１６にて再化成
して、所定の耐電圧を有する化成皮膜を形成した陽極箔
１７を得ることができる。Reference numeral 9 denotes a crack forming portion, which applies mechanical stress alternately to the front and back of the etching foil 1 on which the chemical conversion film having a certain withstand voltage has been formed in the chemical conversion tank 5 and the chemical conversion tank 8 by using a roller. Uniform cracks can be formed in the chemical conversion coating. Reference numeral 12 denotes a power supply tank, which has an electrode plate 11 to which the anode of the third DC power supply 10 is connected and a power supply solution (not shown). The current flows when the etching foil 1 passes between the electrode plates 11. Liquid power can be supplied to the etching foil 1. Reference numerals 14 and 16 denote formation tanks having cathode plates 13 and 15 connected to the cathode of the third DC power supply 10, and re-form the etching foil 1 in the formation tank 14 and the formation tank 16 to a predetermined resistance. The anode foil 17 on which the chemical conversion film having a voltage is formed can be obtained.
【００１８】このようにして得られた陽極箔１７は、静
電容量および耐電圧のばらつきが小さく、また、給電槽
１２でのエッチング箔１の箔切れや表面の凹凸などの問
題を起こすことがないので、化成処理の工程不良を低減
することができるという効果を奏するものである。The anode foil 17 thus obtained has a small variation in capacitance and withstand voltage, and may cause problems such as a break in the etching foil 1 in the power supply tank 12 and unevenness on the surface. Therefore, there is an effect that the process failure of the chemical conversion treatment can be reduced.
【００１９】なお、上記亀裂形成部９はローラとローラ
の距離やローラの大小、ローラとローラの中心軸の違い
などにより、エッチング箔１がローラと接触するときの
接触角を１１０〜１６０度の範囲になるようにする。The crack forming portion 9 has a contact angle of 110 to 160 degrees when the etching foil 1 comes into contact with the roller, depending on the distance between the rollers, the size of the rollers, the difference between the center axes of the rollers, and the like. Range.
【００２０】図２は上記ローラとエッチング箔の関係を
示す概念図である。同図２（ａ）は複数のローラ２１ａ
を同一軸上に設置し、ローラ２１ａ間の距離でエッチン
グ箔２２ａの接触角２３ａを変えるようにしたものであ
る。同図２（ｂ）は上記同図２（ａ）の構成において、
ローラ２１ｂを大きくすることによりエッチング箔２２
ｂの接触角２３ｂを変えるようにしたものである。同図
２（ｃ）はローラ２１ｃとローラ２１ｃの中心軸を違う
ようにしてエッチング箔２２ｃの接触角２３ｃを変える
ようにしたものである。FIG. 2 is a conceptual diagram showing the relationship between the roller and the etching foil. FIG. 2A shows a plurality of rollers 21a.
Are arranged on the same axis, and the contact angle 23a of the etching foil 22a is changed depending on the distance between the rollers 21a. FIG. 2B shows the configuration of FIG.
By increasing the size of the roller 21b, the etching foil 22
The contact angle 23b of b is changed. In FIG. 2C, the contact angle 23c of the etching foil 22c is changed by making the center axis of the roller 21c different from that of the roller 21c.
【００２１】以下、本実施の形態について実施例を用い
て説明する。Hereinafter, this embodiment will be described with reference to examples.
【００２２】（実施例１）上記実施の形態に示す製造装
置において、（表１）に示す化成条件でエッチング箔を
化成処理して陽極箔を作製した。(Example 1) In the manufacturing apparatus shown in the above embodiment, an anode foil was produced by subjecting an etching foil to a chemical conversion treatment under the chemical formation conditions shown in (Table 1).
【００２３】[0023]
【表１】 [Table 1]
【００２４】なお、亀裂形成部９は図２（ａ）に示す構
成のものを用い、エッチング箔１がローラ２１ａと接触
するときの接触角を１１０度とした。The crack forming portion 9 has the structure shown in FIG. 2A, and the contact angle when the etching foil 1 contacts the roller 21a is 110 degrees.
【００２５】（実施例２）上記実施例１において、亀裂
形成部９を図２（ａ）に示す構成のものを用い、ローラ
間の距離を調整して、エッチング箔１がローラ２１ａと
接触するときの接触角を１３０度とした以外は実施例１
と同様にして陽極箔を作製した。(Embodiment 2) In the above-mentioned embodiment 1, the crack forming portion 9 having the structure shown in FIG. 2A is used, the distance between the rollers is adjusted, and the etching foil 1 comes into contact with the roller 21a. Example 1 except that the contact angle at the time was 130 degrees.
In the same manner as in the above, an anode foil was produced.
【００２６】（実施例３）上記実施例１において、亀裂
形成部９を図２（ａ）に示す構成のものを用い、ローラ
間の距離を調整して、エッチング箔１がローラ２１ａと
接触するときの接触角を１６０度とした以外は実施例１
と同様にして陽極箔を作製した。(Embodiment 3) In the above-described embodiment 1, the crack forming portion 9 having the structure shown in FIG. 2A is used, the distance between the rollers is adjusted, and the etching foil 1 comes into contact with the roller 21a. Example 1 except that the contact angle at the time was 160 degrees.
In the same manner as in the above, an anode foil was produced.
【００２７】（実施例４）上記実施例１において、亀裂
形成部９を図２（ｃ）に示す構成のものを用い、エッチ
ング箔１がローラ２１ｃと接触するときの接触角を１３
０度とした以外は実施例１と同様にして陽極箔を作製し
た。(Example 4) In Example 1, the crack forming portion 9 having the structure shown in FIG. 2C was used, and the contact angle when the etching foil 1 was in contact with the roller 21c was 13
An anode foil was produced in the same manner as in Example 1 except that the angle was set to 0 degree.
【００２８】（実施例５）上記実施例１において、亀裂
形成部９を図２（ｂ）に示す構成のものを用い、ローラ
径を図２（ａ）のローラ径の１．５倍にしたローラ２１
ｂを使用し、エッチング箔１がローラ２１ｂと接触する
ときの接触角を１３０度とした以外は実施例１と同様に
して陽極箔を作製した。(Example 5) In Example 1, the crack forming portion 9 having the structure shown in FIG. 2B was used, and the roller diameter was set to 1.5 times the roller diameter shown in FIG. 2A. Roller 21
b, an anode foil was produced in the same manner as in Example 1 except that the contact angle when the etching foil 1 was in contact with the roller 21b was 130 degrees.
【００２９】（比較例１）上記実施の形態１に示す製造
装置において、亀裂形成部の代わりに、温度３０℃の５
％のアジピン酸アンモニウム水溶液を満たした減極処理
槽を用いて化成皮膜に亀裂を形成するようにした以外は
実施例１と同様にして陽極箔を作製した。(Comparative Example 1) In the manufacturing apparatus shown in the first embodiment, instead of the crack forming part, 5
An anode foil was produced in the same manner as in Example 1, except that a crack was formed in the chemical conversion film using a depolarizing treatment tank filled with an aqueous solution of ammonium adipate.
【００３０】上記の実施例１〜５と比較例１の陽極箔に
ついて、静電容量および耐電圧を測定した。その結果を
（表２）に示す。With respect to the anode foils of Examples 1 to 5 and Comparative Example 1, the capacitance and withstand voltage were measured. The results are shown in (Table 2).
【００３１】[0031]
【表２】 [Table 2]
【００３２】なお、静電容量および耐電圧の測定は、陽
極箔１７を５０ｍごとに切断し、その部分を１０ｃｍ2
に切断した試験片を用意し、静電容量はアジピン酸アン
モニウム１５０ｇ／ｌ、３０℃の水溶液中で測定した値
を示し、耐電圧はアジピン酸アンモニウム３０ｇ／ｌ、
７０℃の水溶液中で、０．２ｍＡ／ｃｍ2で電流を流し
て所望の電圧の９０％の電圧値に到達後、５分間保持し
たときの電圧を値とし、そのときの電流値を漏れ電流の
値とした。In the measurement of the capacitance and the withstand voltage, the anode foil 17 was cut every 50 m and the portion was cut into 10 cm 2.
The test piece was prepared as follows, the capacitance was 150 g / l of ammonium adipate, a value measured in an aqueous solution at 30 ° C., the withstand voltage was 30 g / l of ammonium adipate,
After a current of 0.2 mA / cm 2 is passed in an aqueous solution at 70 ° C. to reach a voltage value of 90% of a desired voltage, a voltage obtained when the voltage is held for 5 minutes is defined as a value. Value.
【００３３】（表２）から明らかなように、実施例１〜
５の陽極箔１７は、エッチング箔１が給電槽１２に入る
前に機械的な応力を加えて上記エッチング箔１の表面に
形成した化成皮膜に亀裂を形成することにより、エッチ
ング箔１への液体給電を均一に給電することができ、そ
の後の再化成により、所定の耐電圧を有する化成皮膜を
均一に形成することができるので、静電容量および耐電
圧のばらつきが少なくて漏れ電流特性の優れた陽極箔１
７を得ることができる。As is clear from (Table 2), Examples 1 to
The anode foil 17 of No. 5 applies a mechanical stress before the etching foil 1 enters the power supply tank 12 to form a crack in the chemical conversion film formed on the surface of the etching foil 1, thereby forming a liquid on the etching foil 1. The power can be supplied uniformly, and the subsequent chemical conversion can form a chemical conversion film having a predetermined withstand voltage uniformly, so there is little variation in capacitance and withstand voltage and excellent leakage current characteristics. Anode foil 1
7 can be obtained.
【００３４】また、比較例１では給電槽でエッチング箔
の表面に凹凸が発生し、陽極箔としての品質が悪いもの
であったが、実施例１〜５の陽極箔１７は給電槽１２で
のエッチング箔１の表面に凹凸の発生がなく、品質的に
も優れている。In Comparative Example 1, the surface of the etching foil was uneven in the power supply tank, and the quality of the anode foil was poor. There is no unevenness on the surface of the etching foil 1 and the quality is excellent.
【００３５】なお、上記実施例１〜５では一定の耐電圧
を有する化成皮膜を形成する化成層と、所定の耐電圧を
有する化成皮膜を形成する２つの化成槽を用いて、その
各化成槽内をエッチング箔が１往復するようにしたが、
化成槽の数および往復回数をさらに増しても、陽極箔の
化成皮膜特性を向上させる効果を発揮することができ
る。In Examples 1 to 5, each of the chemical conversion tanks is formed by using a chemical conversion layer for forming a chemical conversion film having a constant withstand voltage and two chemical conversion tanks for forming a chemical conversion film with a predetermined withstand voltage. The etching foil made one round trip inside,
Even if the number of chemical conversion tanks and the number of times of reciprocation are further increased, the effect of improving the chemical conversion film characteristics of the anode foil can be exhibited.
【００３６】[0036]
【発明の効果】以上のように本発明は、エッチング箔を
直流電源の陽極に接続された給電ローラと接触させ、上
記直流電源の陰極に接続された複数の陰極板と電解液を
有した化成槽内で上記エッチング箔に一定の耐電圧を有
する化成皮膜を形成する工程と、このエッチング箔の両
面に機械的な応力を交互に加えて化成皮膜に亀裂を形成
する工程と、上記直流電源とは別の直流電源の陽極に接
続された電極板と給電液を有した給電槽内で上記エッチ
ング箔に液体給電する工程と、上記別の直流電源の陰極
に接続された複数の陰極板と電解液を有した複数の化成
槽内で上記化成皮膜を再化成して所定の耐電圧を有する
化成皮膜を形成する工程とを備えた化成方法にすること
により、静電容量、耐電圧の特性のばらつきを低減した
陽極箔を得ることができ、化成処理の工程不良を低減す
ることができるという効果を奏するものである。As described above, according to the present invention, an etching foil is brought into contact with a power supply roller connected to an anode of a DC power supply, and a plurality of cathode plates connected to the cathode of the DC power supply and a chemical solution having an electrolyte are provided. A step of forming a chemical conversion film having a certain withstand voltage on the etching foil in the tank, a step of alternately applying mechanical stress to both surfaces of the etching foil to form cracks in the chemical conversion film, and Supplying a liquid to the etching foil in a power supply tank having an electrode plate and a power supply liquid connected to an anode of another DC power supply, and a plurality of cathode plates connected to a cathode of the another DC power supply. Forming a chemical conversion film having a predetermined withstand voltage by re-chemically converting the chemical conversion film in a plurality of chemical conversion tanks having a liquid. Obtaining anode foil with reduced variation Can, in which an effect that it is possible to reduce the processing defects of the chemical conversion treatment.
【図面の簡単な説明】[Brief description of the drawings]
【図１】本発明の実施の形態による化成皮膜を形成する
製造装置を示す概念図FIG. 1 is a conceptual diagram showing a manufacturing apparatus for forming a chemical conversion film according to an embodiment of the present invention.
【図２】（ａ）同実施の形態による亀裂形成部の構成を
示す概念図 （ｂ）同実施の形態による他の亀裂形成部の構成を示す
概念図 （ｃ）同実施の形態による別の他の亀裂形成部の構成を
示す概念図FIG. 2A is a conceptual diagram illustrating a configuration of a crack forming unit according to the embodiment; FIG. 2B is a conceptual diagram illustrating a configuration of another crack forming unit according to the embodiment; Conceptual diagram showing the configuration of another crack forming part
【図３】従来の化成皮膜を形成する製造装置を示す概念
図FIG. 3 is a conceptual diagram showing a conventional manufacturing apparatus for forming a chemical conversion film.
１ エッチング箔 ２ 給電ローラ ３ 第１直流電源 ４，７ 陰極板 ５，８ 化成槽 ６ 第２直流電源 ９ 亀裂形成部 １０ 第３直流電源 １１ 電極板 １２ 給電槽 １３，１５ 陰極板 １４，１６ 化成槽 １７ 陽極箔 DESCRIPTION OF SYMBOLS 1 Etching foil 2 Power supply roller 3 1st DC power supply 4,7 Cathode plate 5,8 Chemical formation tank 6 2nd DC power supply 9 Crack formation part 10 3rd DC power supply 11 Electrode plate 12 Power supply tank 13,15 Cathode plate 14,16 Chemical formation Vessel 17 Anode foil
───────────────────────────────────────────────────── フロントページの続き (72)発明者 吉田 健二 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Kenji Yoshida 1006 Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd.
Claims (4)
れた給電ローラと接触させ、上記直流電源の陰極に接続
された複数の陰極板と電解液を有した化成槽内で上記エ
ッチング箔に一定の耐電圧を有する化成皮膜を形成する
工程と、このエッチング箔の両面に機械的な応力を交互
に加えて化成皮膜に亀裂を形成する工程と、上記直流電
源とは別の直流電源の陽極に接続された電極板と給電液
を有した給電槽内で上記エッチング箔に液体給電する工
程と、上記別の直流電源の陰極に接続された複数の陰極
板と電解液を有した複数の化成槽内で上記化成皮膜を再
化成して所定の耐電圧を有する化成皮膜を形成する工程
とを備えたアルミ電解コンデンサ用電極箔の化成方法。An etching foil is brought into contact with a power supply roller connected to an anode of a DC power supply, and the etching foil is fixed to a plurality of cathode plates connected to a cathode of the DC power supply and a formation tank having an electrolyte. A step of forming a chemical conversion film having a withstand voltage of, and a step of alternately applying mechanical stress to both surfaces of the etching foil to form a crack in the chemical conversion film, and forming a crack on the anode of a DC power supply different from the DC power supply. A step of supplying liquid to the etching foil in a power supply tank having a connected electrode plate and a power supply liquid; and a plurality of chemical tanks having a plurality of cathode plates and an electrolyte connected to the cathode of the another DC power supply. Forming a chemical conversion film having a predetermined withstand voltage by re-chemically forming the chemical conversion film therein.
ング箔の両面をローラで交互に少なくとも１回以上押し
つけるようにした請求項１に記載のアルミ電解コンデン
サ用電極箔の化成方法。2. The method of forming an electrode foil for an aluminum electrolytic capacitor according to claim 1, wherein the step of forming a crack in the chemical conversion film is such that both surfaces of the etching foil are alternately pressed at least once by a roller.
接触角を１１０〜１６０度の範囲とした請求項２に記載
のアルミ電解コンデンサ用電極箔の化成方法。3. The method for forming an electrode foil for an aluminum electrolytic capacitor according to claim 2, wherein the contact angle when the etching foil contacts the roller is in the range of 110 to 160 degrees.
る工程を複数の直流電源と複数の化成槽を用いて段階的
に耐電圧を有する化成皮膜を形成するようにした請求項
１に記載のアルミ電解コンデンサ用電極箔の化成方法。4. The method according to claim 1, wherein the step of forming a chemical conversion film having a constant withstand voltage is performed by using a plurality of DC power supplies and a plurality of chemical conversion tanks to form the chemical conversion film having a withstand voltage stepwise. Of electrode foil for aluminum electrolytic capacitor.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001172009A JP4474802B2 (en) | 2001-06-07 | 2001-06-07 | Formation method of electrode foil for aluminum electrolytic capacitor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001172009A JP4474802B2 (en) | 2001-06-07 | 2001-06-07 | Formation method of electrode foil for aluminum electrolytic capacitor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002367864A true JP2002367864A (en) | 2002-12-20 |
| JP4474802B2 JP4474802B2 (en) | 2010-06-09 |
Family
ID=19013698
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001172009A Expired - Fee Related JP4474802B2 (en) | 2001-06-07 | 2001-06-07 | Formation method of electrode foil for aluminum electrolytic capacitor |
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| Country | Link |
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| JP (1) | JP4474802B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106947998A (en) * | 2017-02-17 | 2017-07-14 | 乳源东阳光机械有限公司 | A kind of electrochemical reaction appts for being used to produce etched foil |
| JP2019067940A (en) * | 2017-10-02 | 2019-04-25 | 日本ケミコン株式会社 | Capacitor and method for manufacturing the same |
| JP2019067939A (en) * | 2017-10-02 | 2019-04-25 | 日本ケミコン株式会社 | Capacitor and method for manufacturing the same |
| CN110067013A (en) * | 2019-04-28 | 2019-07-30 | 西安理工大学 | A kind of more cathodes, which are staggered the time, is connected differential arc oxidation control method |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109023474A (en) * | 2018-07-27 | 2018-12-18 | 南通海星电子股份有限公司 | A kind of manufacturing method of electrode foil feed liquid and high-intensitive low-pressure chemical synthesis foil |
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2001
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106947998A (en) * | 2017-02-17 | 2017-07-14 | 乳源东阳光机械有限公司 | A kind of electrochemical reaction appts for being used to produce etched foil |
| CN106947998B (en) * | 2017-02-17 | 2018-09-11 | 乳源东阳光机械有限公司 | A kind of electrochemical reaction appts for producing etched foil |
| JP2019067940A (en) * | 2017-10-02 | 2019-04-25 | 日本ケミコン株式会社 | Capacitor and method for manufacturing the same |
| JP2019067939A (en) * | 2017-10-02 | 2019-04-25 | 日本ケミコン株式会社 | Capacitor and method for manufacturing the same |
| CN110067013A (en) * | 2019-04-28 | 2019-07-30 | 西安理工大学 | A kind of more cathodes, which are staggered the time, is connected differential arc oxidation control method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4474802B2 (en) | 2010-06-09 |
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