JP2002339073A - Applied electrode temperature adjusting device of plasma cvd apparatus - Google Patents

Applied electrode temperature adjusting device of plasma cvd apparatus

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Publication number
JP2002339073A
JP2002339073A JP2001149231A JP2001149231A JP2002339073A JP 2002339073 A JP2002339073 A JP 2002339073A JP 2001149231 A JP2001149231 A JP 2001149231A JP 2001149231 A JP2001149231 A JP 2001149231A JP 2002339073 A JP2002339073 A JP 2002339073A
Authority
JP
Japan
Prior art keywords
temperature control
electrode
temperature
plasma cvd
cvd apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001149231A
Other languages
Japanese (ja)
Inventor
Tatsusaburo Yamakawa
達三朗 山川
Sumio Nakatake
純夫 中武
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Priority to JP2001149231A priority Critical patent/JP2002339073A/en
Publication of JP2002339073A publication Critical patent/JP2002339073A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide an applied electrode temperature adjusting device capable of reducing accidents caused by an electric leak and eliminating power losses in a plasma CVD apparatus. SOLUTION: In the applied electrode temperature adjusting device of the plasma CVD apparatus, a temperature-adjusting liquid-contact part of the electrode is covered by an electric insulating material.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、プラズマCVD装
置の印加電極の温度調節装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for controlling the temperature of an applied electrode of a plasma CVD apparatus.

【0002】[0002]

【従来の技術】プラズマCVD装置においては、印加電
極の冷却や加熱の目的で電極に接する管路を形成して、
冷媒や熱媒を流通させる温度調整機構が採用されててい
る。
2. Description of the Related Art In a plasma CVD apparatus, a pipe is formed in contact with an applied electrode for the purpose of cooling or heating the applied electrode.
A temperature adjusting mechanism for flowing a refrigerant or a heat medium is employed.

【0003】上記冷媒等を流通させる管路としては、金
属製の配管等を用いているが、冷媒等の温度調節液に基
づく経路からの漏電が起こりやすいという問題があり、
特に、近年注目されている大気圧下のプラズマCVD処
理においては、印加電圧が十数kV以上と高いため、そ
の影響は無視できないものとなる。これを解決する方法
の一つとしては、漏電防止のため電気絶縁性の大きな温
度調節液として、パーフルオロカーボン、ハイドロフル
オロエーテル、あるいは純水にエチレングリコールを添
加した混合液を使用する方法が特開2000−2006
97号公報に開示されている。しかしながら、電気絶縁
性の大きな温度調節液を用いても、金属部からのイオン
溶出が進むと非導通性が失われて漏電が生じ、電力ロス
や感電事故の危険が生じるため、電流条件や運転時間に
よって異なるものの平均して200時間に一回程度は温
度調節液を交換する必要があり、未だ漏電問題は完全に
解決していないのが現状である。
[0003] Although a metal pipe or the like is used as a pipe through which the refrigerant or the like flows, there is a problem that electric leakage easily occurs from a path based on a temperature control liquid such as a refrigerant.
In particular, in the plasma CVD process under the atmospheric pressure, which has been attracting attention in recent years, the applied voltage is as high as ten and several kV or more, so that the influence cannot be ignored. One method for solving this problem is to use a perfluorocarbon, hydrofluoroether, or a mixture of pure water and ethylene glycol as a temperature control liquid having a large electric insulation to prevent electric leakage. 2000-2006
No. 97 is disclosed. However, even if a temperature control liquid with a large electrical insulation is used, if the elution of ions from the metal part progresses, the non-conductivity is lost and electric leakage occurs, causing a risk of power loss or electric shock accident. Although it depends on the time, it is necessary to replace the temperature control liquid about once every 200 hours on average, and the current leakage problem has not been completely solved yet.

【0004】[0004]

【発明が解決しようとする課題】本発明は、上記問題に
鑑み、プラズマCVD装置において、漏電による事故等
を削減でき、電力ロスを無くすことのできる印加電極の
温度調節装置を提供することを目的とする。
SUMMARY OF THE INVENTION In view of the above problems, an object of the present invention is to provide an apparatus for controlling the temperature of an applied electrode in a plasma CVD apparatus, which can reduce accidents due to earth leakage and eliminate power loss. And

【0005】[0005]

【課題を解決するための手段】本発明者らは、上記課題
を解決すべく鋭意研究した結果、印加電極の温度調節装
置の配管において、接液部を電気絶縁性の材料で被覆す
ることにより、温度調節液へのイオン溶出を防止し、長
期に渡って温度調節液を非導通性に保ち、漏電及び電力
ロスを抑制することができることを見出し、本発明を完
成させた。
Means for Solving the Problems The inventors of the present invention have made intensive studies to solve the above-mentioned problems, and as a result, by covering the liquid-contacting part with an electrically insulating material in the piping of the temperature control device of the applied electrode. The present inventors have found that ions can be prevented from being eluted into the temperature control solution, the temperature control solution can be kept non-conductive for a long period of time, and leakage and power loss can be suppressed, thus completing the present invention.

【0006】すなわち、本発明の第1の発明は、プラズ
マCVD装置の印加電極温度調節装置において、電極の
温度調節液接液部を電気絶縁性材料による被覆を施して
なることを特徴とする印加電極の温度調節装置である。
That is, a first aspect of the present invention is an application electrode temperature control apparatus for a plasma CVD apparatus, wherein the temperature control liquid contact portion of the electrode is coated with an electrically insulating material. It is an electrode temperature control device.

【0007】また、本発明の第2の発明は、電気絶縁性
材料が、内部抵抗109ρ/Ω・m以上の絶縁材料であ
ることを特徴とする第1の発明に記載の印加電極の温度
調節装置である。
According to a second aspect of the present invention, the electric insulating material is an insulating material having an internal resistance of not less than 10 9 ρ / Ω · m. It is a temperature control device.

【0008】また、本発明の第3の発明は、温度調節液
としてイオン交換水を用い、かつ接液部を全て樹脂製と
することを特徴とする第1又は2の発明に記載の印加電
極の温度調節装置である。
According to a third aspect of the present invention, there is provided an application electrode according to the first or second aspect, wherein ion-exchanged water is used as a temperature control liquid, and all liquid contact portions are made of resin. Temperature control device.

【0009】[0009]

【発明の実施の形態】本発明の装置は、プラズマCVD
装置の印加電極を冷媒によって冷却する構造を有する装
置において、電極内部に冷媒を通して電極を冷却し、電
極の温度を低下させることにより冷却能力が低下した冷
媒を、外部に設けた熱交換器により冷却能力を向上させ
て循環させる温度調節装置内の冷媒である温度調節液と
の接液部を電気絶縁性材料により被覆した装置である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The apparatus of the present invention is a plasma CVD apparatus.
In a device having a structure in which an applied electrode of the device is cooled by a refrigerant, the electrode is cooled through a refrigerant inside the electrode, and the refrigerant whose cooling capacity is lowered by lowering the temperature of the electrode is cooled by a heat exchanger provided outside. This is a device in which a part in contact with a temperature control liquid, which is a refrigerant, in a temperature control device that circulates with improved capacity is coated with an electrically insulating material.

【0010】本発明の印加電極の温度調節装置の一例を
図で説明するが、本発明の趣旨を逸脱しない限り、本発
明はこれによって何ら限定されるものではない。図1
は、印加電極から、冷却能力の低下した温度調節液を熱
交換器を通して冷却能力を回復させ、電極に循環するシ
ステムの概略を示す図である。冷却対象の電極1内で高
温になった電極を所定の温度に冷却することにより温度
が上昇した温度調節液は、流通配管3を通じ矢印方向に
流通され、流量計8で流量をコントロールされ熱交換器
2に導入される。熱交換器2内で、温度調節液はスパイ
ラルチューブ4内を流通し、熱交換器2の冷却水導入口
21から導入され排出口22から排出される2次冷却水
と熱交換され、所定の温度に冷却される。冷却された温
度調節液は、流通配管5を通じ電極1に戻され、電極1
の温度を冷却コントロールする。また、温度調節液の温
度コントロールを温度インジケーター(TI)9でバル
ブを開閉しながら微調整することもできる。さらに、温
度調節液の補充は、リザーブタンク7から流通配管6を
通じて適宜補充され、廃温度調節液はドレンバルブ10
より適宜排出できる。
An example of a temperature control device for an applied electrode according to the present invention will be described with reference to the drawings. However, the present invention is not limited thereto without departing from the spirit of the present invention. FIG.
FIG. 3 is a view schematically showing a system in which a cooling capacity is reduced from an applied electrode, the cooling capacity is restored through a heat exchanger, and the temperature regulating liquid is circulated to the electrode. The temperature control liquid whose temperature has risen by cooling the hot electrode in the electrode 1 to be cooled to a predetermined temperature is circulated through the flow pipe 3 in the direction of the arrow, and the flow rate is controlled by the flow meter 8 to exchange heat. It is introduced into the vessel 2. In the heat exchanger 2, the temperature control liquid flows through the spiral tube 4, exchanges heat with the secondary cooling water introduced from the cooling water inlet 21 of the heat exchanger 2 and discharged from the outlet 22, and a predetermined temperature. Cooled to temperature. The cooled temperature control liquid is returned to the electrode 1 through the flow pipe 5, and
Cooling control of the temperature. Further, the temperature of the temperature control liquid can be finely adjusted while opening and closing the valve with the temperature indicator (TI) 9. Further, the replenishment of the temperature control liquid is appropriately replenished from the reserve tank 7 through the distribution pipe 6, and the waste temperature control liquid is supplied to the drain valve 10.
It can be discharged more appropriately.

【0011】なお、図には記載していないが、温度調節
液を循環させるポンプ、電極の表面温度をコントロール
する赤外線放射温度計、熱電対等の温度センサーと温度
調節液温度とを連動させる温度コントローラーから構成
される制御手段を備えている必要があり、さらに、温度
調節液の導通性状態のモニタのための温度調節液の電気
抵抗測定機構を設けるのが好ましい。
Although not shown in the drawings, a pump for circulating the temperature control liquid, an infrared radiation thermometer for controlling the surface temperature of the electrode, and a temperature controller for interlocking the temperature sensor such as a thermocouple with the temperature of the temperature control liquid. It is necessary to provide a control means composed of the following. Further, it is preferable to provide a mechanism for measuring the electric resistance of the temperature control liquid for monitoring the conductivity state of the temperature control liquid.

【0012】本発明は、上記図で説明したような冷媒で
ある温度調節液が接触する配管等の接液部を電気絶縁性
材料で被覆した装置である。温度調節液の接液部として
は、例えば、流通配管、配管の継ぎ手、熱交換内のスパ
イラルチューブ、温度調節液のリザーブタンク内壁等が
挙げられる。なお、電極内部については、小さな穴を開
けた冷却機構を採用した場合は、穴内面の被覆は技術的
に難しくコストアップにつながる恐れがあり省略するの
が好ましいが、広幅の径をましい。
The present invention is an apparatus in which a liquid contact portion, such as a pipe, in contact with a temperature control liquid as a refrigerant as described in the above-mentioned figure is covered with an electrically insulating material. Examples of the liquid contact portion of the temperature control liquid include a flow pipe, a pipe joint, a spiral tube in heat exchange, and an inner wall of a reserve tank for the temperature control liquid. When a cooling mechanism with a small hole is used for the inside of the electrode, it is technically difficult to cover the inner surface of the hole, which may lead to an increase in cost.

【0013】本発明で用いることのできる電気絶縁性材
料としては、電気絶縁性を有し配管内等を被覆加工又は
配管等に成形加工できるものであれば特に限定がない
が、雲母、ガラス、ゴム、セラミックス、プラスチック
等が好ましい。また、電気絶縁性材料の内部抵抗が10
9ρ/Ω・m以上の材料が好ましく、より好ましくは1
15ρ/Ω・m以上である。これらの中では、成形加工
性等の観点から、内部抵抗が109ρ/Ω・m以上のプ
ラスチックが特に好ましい。内部抵抗が109ρ/Ω・
m未満であると、電流・電圧条件及び電気絶縁材料の厚
みにもよるが、通電する可能性が生じる。
The electrically insulating material that can be used in the present invention is not particularly limited as long as it has electrical insulation properties and can coat the inside of a pipe or form it into a pipe or the like. Rubber, ceramics, plastics and the like are preferred. Further, the internal resistance of the electrically insulating material is 10
A material with 9 ρ / Ω · m or more is preferable, and
0 15 ρ / Ω · m or more. Among these, plastics having an internal resistance of 10 9 ρ / Ω · m or more are particularly preferable from the viewpoint of moldability and the like. Internal resistance is 10 9 ρ / Ω.
If it is less than m, there is a possibility that current will flow depending on the current / voltage conditions and the thickness of the electrically insulating material.

【0014】上記プラスチックとしては、アクリル系樹
脂、エポキシ系樹脂、ポリ塩化ビニル樹脂、ポリテトラ
フルオロエチレン樹脂、ポリアミド樹脂、ポリウレタン
樹脂、ポリエチレン樹脂、ポリスチレン樹脂等を挙げる
ことができる。配管、配管継ぎ手等は、加工性に優れ、
無極性であり、かつ耐薬品性の高いポリオレフィン系樹
脂のポリエチレン樹脂等が好ましい。また、熱交換機内
のスパイラル管等は、内部の被覆が困難であることか
ら、ポリウレタン樹脂やポリテトラフルオロエチレン樹
脂が直接スパイラル管に成形でき、弾力性があり、加工
性に優れていて好ましい。
Examples of the plastic include acrylic resins, epoxy resins, polyvinyl chloride resins, polytetrafluoroethylene resins, polyamide resins, polyurethane resins, polyethylene resins, and polystyrene resins. Pipes, pipe joints, etc. are excellent in workability,
A non-polar and highly chemical-resistant polyolefin-based resin such as polyethylene resin is preferred. Further, since it is difficult to coat the inside of the spiral tube or the like in the heat exchanger, a polyurethane resin or a polytetrafluoroethylene resin can be directly formed into a spiral tube, which is preferable because it has elasticity and excellent workability.

【0015】温度調節液としては、電気絶縁性及び不燃
性や化学安定性を有する液体であることが好ましく、電
気絶縁性の大きなパーフルオロカーボン、ハイドロフル
オロエーテル、あるいは純水にエチレングリコールを5
〜60重量%添加した混合液、純水、イオン交換水が挙
げられる。これらの中では、コストや取扱性の観点か
ら、純水、イオン交換水を用いることが好ましい。この
ような絶縁性を有する温度調節液は、高電圧が印加され
る電極からの漏電を防ぐのに好適である。
The temperature control liquid is preferably a liquid having electrical insulation, non-combustibility and chemical stability. Ethylene glycol is added to perfluorocarbon, hydrofluoroether or pure water having high electrical insulation.
A mixed solution, pure water, and ion-exchanged water to which 〜60% by weight is added. Among these, it is preferable to use pure water and ion-exchanged water from the viewpoint of cost and handleability. Such a temperature control liquid having an insulating property is suitable for preventing electric leakage from an electrode to which a high voltage is applied.

【0016】熱交換器は、温度調節液が接する配管及び
その接続部が電気絶縁性材料で被覆されるか、電気絶縁
性材料から成形されているものであれば、例えば、二重
管式熱交換器、コイル式熱交換器、カスケード式熱交換
器、平板熱交換器等のどのような形状であってもよい。
図1で説明した熱交換器は、コイル式熱交換器の一つで
あり、ステンレス製のケーシングで、コイル状配管をウ
レタン製チューブにするのが好ましい。
[0016] The heat exchanger may be, for example, a double-pipe type heat exchanger, provided that the pipe and the connecting portion thereof in contact with the temperature control liquid are coated with an electrically insulating material or are formed of an electrically insulating material. The heat exchanger may have any shape such as an exchanger, a coil heat exchanger, a cascade heat exchanger, and a flat plate heat exchanger.
The heat exchanger described with reference to FIG. 1 is one of coil heat exchangers, and it is preferable that the coiled pipe be a urethane tube with a stainless steel casing.

【0017】上記のような印加電極の温度調節装置は、
プラズマCVD装置、特に、大気圧で行われるプラズマ
CVD装置に設置するのが好ましい。また、プラズマ発
生装置等においても本発明の温度調節装置を設置するこ
とができる。
The temperature control device for the application electrode as described above is
It is preferably installed in a plasma CVD apparatus, particularly, a plasma CVD apparatus performed at atmospheric pressure. Further, the temperature control device of the present invention can also be installed in a plasma generator or the like.

【0018】[0018]

【実施例】本発明を実施例に基づいてさらに詳細に説明
するが、本発明はこれら実施例のみに限定されるもので
はない。
EXAMPLES The present invention will be described in more detail with reference to examples, but the present invention is not limited to these examples.

【0019】実施例1 電極内に冷却用穴を有するアルミニウム製の電極を用い
たプラズマCVD装置に図1に示すような電極温度調節
装置を付加させ、CVD処理中の電極の温度コントロー
ルを行った。CVD処理は、電極に15kVの電圧を印
加し、シラン0.1%、水素1%をアルゴンガスで希釈
した混合ガス中で、ポリイミドフィルムを処理するよう
にし、電極の温度は、温度調節を行わないと、300℃
以上に上昇するため、約80℃の一定に保つようにし
た。図1の装置において、配管内部をウレタン樹脂でコ
ーティングし、熱交換器内のスパイラル管をポリウレタ
ン製にし、接液部を全て電気絶縁性にし、配管圧損が最
大100kPaになるようにした。また、温度調節液
(冷媒)として、イオン交換水を用い、熱交換量140
0W/h、流量20l/min、2次冷却水として20
℃の水を用いた。その結果、温度調節液の漏電はなく、
安定して処理を行うことができた。
Example 1 An electrode temperature controller as shown in FIG. 1 was added to a plasma CVD apparatus using an aluminum electrode having a cooling hole in the electrode to control the temperature of the electrode during the CVD process. . In the CVD process, a voltage of 15 kV is applied to the electrode, and the polyimide film is processed in a mixed gas obtained by diluting 0.1% of silane and 1% of hydrogen with argon gas. The temperature of the electrode is adjusted. If not, 300 ℃
In order to increase the temperature, the temperature was kept constant at about 80 ° C. In the apparatus shown in FIG. 1, the inside of the pipe was coated with urethane resin, the spiral pipe in the heat exchanger was made of polyurethane, and all the liquid contact parts were made electrically insulating so that the pipe pressure loss was 100 kPa at the maximum. In addition, ion exchange water is used as the temperature control liquid (refrigerant), and the heat exchange amount
0 W / h, flow rate 20 l / min, 20 as secondary cooling water
° C water was used. As a result, there is no leakage of the temperature control liquid,
Processing could be performed stably.

【0020】[0020]

【発明の効果】本発明のプラズマCVD装置の印加電極
の温度調節装置は、温度調節液との接液部を電気絶縁性
材料で被覆しているので、プラズマ処理中の感電事故防
止、漏電防止によるプロセス安定、電力ロスを無くし、
コスト削減に効果のある装置である。
According to the temperature control device for the applied electrode of the plasma CVD apparatus of the present invention, the portion in contact with the temperature control solution is covered with an electrically insulating material, so that an electric shock accident during plasma processing and a leakage prevention can be prevented. Process stability and power loss,
This is an effective device for cost reduction.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の装置を説明する図である。FIG. 1 is a diagram illustrating an apparatus of the present invention.

【符号の説明】[Explanation of symbols]

1 電極 2 熱交換器 3 温度調節液配管 4 スパイラル管 5 温度調節液配管 6 温度調節液補充配管 7 温度調節液リザーブタンク 9 TI 10 温度調節液ドレンバルブ 21 2次冷却水導入口 22 2次冷却水排出口 DESCRIPTION OF SYMBOLS 1 Electrode 2 Heat exchanger 3 Temperature control liquid pipe 4 Spiral tube 5 Temperature control liquid pipe 6 Temperature control liquid replenishment pipe 7 Temperature control liquid reserve tank 9 TI 10 Temperature control liquid drain valve 21 Secondary cooling water inlet 22 Secondary cooling Water outlet

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 プラズマCVD装置の印加電極温度調節
装置において、電極の温度調節液接液部を電気絶縁性材
料による被覆を施してなることを特徴とする印加電極の
温度調節装置。
1. An apparatus for controlling the temperature of an applied electrode of a plasma CVD apparatus, wherein a liquid contact portion of the electrode for controlling the temperature of the electrode is coated with an electrically insulating material.
【請求項2】 電気絶縁性材料が、内部抵抗109ρ/
Ω・m以上の絶縁材料であることを特徴とする請求項1
に記載の印加電極の温度調節装置。
2. An electric insulating material having an internal resistance of 10 9 ρ /
2. An insulating material having a resistance of not less than Ω · m.
3. The temperature control device for an application electrode according to claim 1.
【請求項3】 温度調節液としてイオン交換水を用い、
かつ接液部を全て樹脂製とすることを特徴とする請求項
1又は2に記載の印加電極の温度調節装置。
3. Use of ion-exchanged water as a temperature control liquid,
The apparatus for controlling the temperature of an application electrode according to claim 1, wherein the liquid contact portion is entirely made of resin.
JP2001149231A 2001-05-18 2001-05-18 Applied electrode temperature adjusting device of plasma cvd apparatus Pending JP2002339073A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
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Publications (1)

Publication Number Publication Date
JP2002339073A true JP2002339073A (en) 2002-11-27

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Country Link
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004079805A1 (en) * 2003-03-07 2004-09-16 Tokyo Electron Limited Substrate-processing apparatus and temperature-regulating apparatus
JP2006278777A (en) * 2005-03-29 2006-10-12 Mitsubishi Heavy Ind Ltd Apparatus and method for manufacturing thin film

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004079805A1 (en) * 2003-03-07 2004-09-16 Tokyo Electron Limited Substrate-processing apparatus and temperature-regulating apparatus
KR100822076B1 (en) * 2003-03-07 2008-04-14 동경 엘렉트론 주식회사 Substrate-processing apparatus and temperature-regulating apparatus
CN100421209C (en) * 2003-03-07 2008-09-24 东京毅力科创株式会社 Substrate-processing apparatus and temperature-regulating apparatus
JP2008288615A (en) * 2003-03-07 2008-11-27 Tokyo Electron Ltd Substrate processing apparatus and temperature controlling device
US8110044B2 (en) 2003-03-07 2012-02-07 Tokyo Electron Limited Substrate processing apparatus and temperature control device
JP2006278777A (en) * 2005-03-29 2006-10-12 Mitsubishi Heavy Ind Ltd Apparatus and method for manufacturing thin film
JP4519695B2 (en) * 2005-03-29 2010-08-04 三菱重工業株式会社 Thin film manufacturing apparatus and thin film manufacturing method

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