JP2002323758A5 - - Google Patents

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Publication number
JP2002323758A5
JP2002323758A5 JP2001157367A JP2001157367A JP2002323758A5 JP 2002323758 A5 JP2002323758 A5 JP 2002323758A5 JP 2001157367 A JP2001157367 A JP 2001157367A JP 2001157367 A JP2001157367 A JP 2001157367A JP 2002323758 A5 JP2002323758 A5 JP 2002323758A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001157367A
Other languages
Japanese (ja)
Other versions
JP2002323758A (en
JP4117117B2 (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2001157367A priority Critical patent/JP4117117B2/en
Priority claimed from JP2001157367A external-priority patent/JP4117117B2/en
Priority to KR1020020009638A priority patent/KR100795109B1/en
Priority to US10/079,414 priority patent/US6858370B2/en
Publication of JP2002323758A publication Critical patent/JP2002323758A/en
Publication of JP2002323758A5 publication Critical patent/JP2002323758A5/ja
Application granted granted Critical
Publication of JP4117117B2 publication Critical patent/JP4117117B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2001157367A 2001-02-23 2001-05-25 Positive photosensitive composition Expired - Fee Related JP4117117B2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2001157367A JP4117117B2 (en) 2001-02-23 2001-05-25 Positive photosensitive composition
KR1020020009638A KR100795109B1 (en) 2001-02-23 2002-02-22 Positive Photosensitive Composition
US10/079,414 US6858370B2 (en) 2001-02-23 2002-02-22 Positive photosensitive composition

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001048783 2001-02-23
JP2001-48783 2001-02-23
JP2001157367A JP4117117B2 (en) 2001-02-23 2001-05-25 Positive photosensitive composition

Publications (3)

Publication Number Publication Date
JP2002323758A JP2002323758A (en) 2002-11-08
JP2002323758A5 true JP2002323758A5 (en) 2006-01-26
JP4117117B2 JP4117117B2 (en) 2008-07-16

Family

ID=26610015

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001157367A Expired - Fee Related JP4117117B2 (en) 2001-02-23 2001-05-25 Positive photosensitive composition

Country Status (1)

Country Link
JP (1) JP4117117B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6855476B2 (en) * 2001-04-05 2005-02-15 Arch Specialty Chemicals, Inc. Photoacid generators for use in photoresist compositions
JP4121388B2 (en) * 2003-01-30 2008-07-23 富士フイルム株式会社 Positive resist composition and compound that generates acid upon irradiation with actinic rays
JP4443898B2 (en) * 2003-11-13 2010-03-31 富士フイルム株式会社 Photosensitive composition and pattern forming method using the same
JP6136491B2 (en) * 2012-04-24 2017-05-31 Jsr株式会社 Radiation sensitive resin composition, interlayer insulating film for display element and method for forming the same

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