JP2002323758A5 - - Google Patents
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- JP2002323758A5 JP2002323758A5 JP2001157367A JP2001157367A JP2002323758A5 JP 2002323758 A5 JP2002323758 A5 JP 2002323758A5 JP 2001157367 A JP2001157367 A JP 2001157367A JP 2001157367 A JP2001157367 A JP 2001157367A JP 2002323758 A5 JP2002323758 A5 JP 2002323758A5
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Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001157367A JP4117117B2 (en) | 2001-02-23 | 2001-05-25 | Positive photosensitive composition |
KR1020020009638A KR100795109B1 (en) | 2001-02-23 | 2002-02-22 | Positive Photosensitive Composition |
US10/079,414 US6858370B2 (en) | 2001-02-23 | 2002-02-22 | Positive photosensitive composition |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001048783 | 2001-02-23 | ||
JP2001-48783 | 2001-02-23 | ||
JP2001157367A JP4117117B2 (en) | 2001-02-23 | 2001-05-25 | Positive photosensitive composition |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2002323758A JP2002323758A (en) | 2002-11-08 |
JP2002323758A5 true JP2002323758A5 (en) | 2006-01-26 |
JP4117117B2 JP4117117B2 (en) | 2008-07-16 |
Family
ID=26610015
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001157367A Expired - Fee Related JP4117117B2 (en) | 2001-02-23 | 2001-05-25 | Positive photosensitive composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4117117B2 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6855476B2 (en) * | 2001-04-05 | 2005-02-15 | Arch Specialty Chemicals, Inc. | Photoacid generators for use in photoresist compositions |
JP4121388B2 (en) * | 2003-01-30 | 2008-07-23 | 富士フイルム株式会社 | Positive resist composition and compound that generates acid upon irradiation with actinic rays |
JP4443898B2 (en) * | 2003-11-13 | 2010-03-31 | 富士フイルム株式会社 | Photosensitive composition and pattern forming method using the same |
JP6136491B2 (en) * | 2012-04-24 | 2017-05-31 | Jsr株式会社 | Radiation sensitive resin composition, interlayer insulating film for display element and method for forming the same |
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2001
- 2001-05-25 JP JP2001157367A patent/JP4117117B2/en not_active Expired - Fee Related