JP2002298452A - Method of manufacturing optical information recording medium, apparatus for manufacturing the same and optical information recording medium - Google Patents

Abstract

PROBLEM TO BE SOLVED: To raise a substrate temperature in deposition of a recording layer without the occurrence of substrate deformation and to eliminate the need for an initialization process or to rapidly perform the process without using recording materials. SOLUTION: In manufacturing the optical information recording medium 1, the temperature of the substrate 2 molded by a molding machine 11 is regulated to >=50 deg.C and below the deformation temperature of the substrate 2 and the substrate is fed into a deposition system 12 and is deposited with a recording layer 5, etc. The recording layer 5 is then regulated the substrate temperature in the deposition to a high temperature to the extent of preventing the occurrence of the substrate deformation and the recording layer 5 is put into a crystallized state or at least the mingled state of the crystalline state and a amorphous state right after the deposition.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and apparatus for manufacturing an optical information recording medium using a phase change material, and an optical information recording medium.

[0002]

2. Description of the Related Art In a phase change type optical information recording medium, a recording layer is formed by a vacuum film forming method such as sputtering or vapor deposition, and a recording film immediately after the film formation is usually in an amorphous state. On the other hand, in an optical information recording medium using a phase change material, usually, recording and reproduction are performed with an amorphous state as a recording state and a crystalline state as an erasing state. What you do is done. This is called initialization, and crystallization is generally performed by sequentially irradiating a recording layer of an optical information recording medium with a high-power laser beam. However, this method has a disadvantage that the initialization itself takes time and productivity is not good.

In order to avoid this drawback, for example, as disclosed in JP-A-5-342629, JP-A-9-161316, JP-A-11-96596, etc., a crystal is formed in contact with at least a part of a recording layer. A method of providing a crystallization assisting layer and a crystallization promoting layer has been proposed. When the crystallization assisting layer is provided, the initialization time can be reduced, but in most cases, the initialization process must be performed. Also, it has been experimentally confirmed that even when a crystallization promoting layer is provided, crystallization is incomplete depending on the recording material. That is, the crystallization promoting layer is considered to have the effect of lowering the activation energy of crystallization at the film formation stage of the recording layer and promoting crystallization, but depending on the recording material, the effect alone may not be sufficient. .

On the other hand, the optical information recording medium disclosed in Japanese Patent Application Laid-Open No. 11-96596 is provided with a crystallization promoting layer, and immediately before or immediately after the formation of the crystallization promoting layer, or the formation of the recording layer. An appropriate substrate heating step is added immediately before or immediately after the film. Further, in the method for manufacturing an optical information recording medium disclosed in WO 98-47142, the formation of the recording layer is performed by utilizing heat generated by film formation performed before the formation of the recording layer and accumulated on the substrate. The film is formed immediately after the end of the previous film formation, and the residual heat of the film formation is used. They are,
By heating the substrate to a high temperature to compensate for the lack of the effect of the crystallization promoting layer, the atoms of the formed recording layer move on the substrate, rearrange and form a lattice to form a crystal. In this case, the energy required for the crystallization is supplied as thermal energy from the substrate to realize crystallization at the film formation stage.

[0005]

SUMMARY OF THE INVENTION However, Japanese Patent Laid-Open No.
As shown in JP-A-1-96596, heating during the film formation process is required to perform the process immediately before or immediately after the formation of the crystallization promoting layer or immediately before or immediately after the film formation of the recording layer. This must be large and results in a reduction in manufacturing cost, contrary to the original purpose. Furthermore, since heating is performed immediately before or immediately after the formation of the crystallization promoting layer or immediately before or immediately after the formation of the recording layer, in high-tact manufacturing aimed at reducing costs, the substrate temperature must be sufficient for crystallization. There is a problem in that when the temperature is adjusted to a suitable temperature, the temperature is rapidly increased and the substrate is deformed.

Further, as shown in WO 98-47142, a method utilizing the residual heat of film formation is advantageous in that no heating equipment is required, but a substrate is not used in high-tact manufacturing aimed at cost reduction. Since it is necessary to heat the substrate to a high temperature in a very short time, there is a problem that the substrate temperature is rapidly increased and the substrate is deformed due to the rapid rise.

The present invention solves such a problem,
The substrate temperature at the time of forming the recording layer is increased without causing the substrate deformation, and the initialization process is unnecessary or can be performed in a short time regardless of the recording material. An object of the present invention is to provide a method and an apparatus for manufacturing an optical information recording medium capable of manufacturing an information recording medium, and an optical information recording medium.

[0008]

According to a method of manufacturing an optical information recording medium according to the present invention, a molded substrate is transported to a film forming apparatus by a substrate support and thrown in, and at least a first protective layer and a crystallization promoting medium are formed. In the method for manufacturing an optical information recording medium for forming a layer, a recording layer, a second protective layer, and a reflective layer, it is preferable that the temperature of the formed substrate is not lower than 50 ° C. and not higher than the deformation temperature of the substrate, and is then input to the film forming apparatus. Features.

It is desirable that the substrate be put into a film forming apparatus within 20 seconds after the completion of molding. It is preferable that the variation of the charging time be within 2 seconds.

In addition, before the substrate is put into the film forming apparatus, a heating step of heating the substrate to a temperature of 50 ° C. or higher and a deformation temperature of the substrate or lower may be provided.

[0011] An apparatus for manufacturing an optical information recording medium according to the present invention comprises:
Manufacture of an optical information recording medium in which the formed substrate is transported and input into a film forming apparatus with a substrate support, and at least a first protective layer, a crystallization promoting layer, a recording layer, a second protective layer, and a reflective layer are formed. The apparatus is characterized in that the temperature of the formed substrate is set to 50 ° C. or higher and equal to or lower than the deformation temperature of the substrate, and the substrate is put into a film forming apparatus.

It is desirable that the substrate be put into a film forming apparatus within 20 seconds after the completion of molding.

The molding machine and the film forming apparatus for molding the substrate are preferably arranged in a constant temperature chamber at 50 ° C.

Further, it is preferable that at least a surface of the substrate support facing the substrate, which is put into the film forming apparatus while holding the substrate, is made of a material having a thermal conductivity close to that of the substrate or a material having the same thermal conductivity as the substrate. When the substrate is made of a polymer material such as polycarbonate resin, the material of at least the surface of the substrate support facing the substrate has a thermal conductivity of 0.1 to 1.0 (Kcal / mhr.
(° C.). further,
It is preferable to provide a heating device on the substrate support.

Further, it is preferable that at least a part of the back surface of the thin film deposition region of the substrate of the substrate holder that holds the substrate in the film deposition apparatus is in close contact with the substrate. Further, at least the surface of the substrate holder facing the substrate is preferably made of a material having a thermal conductivity close to that of the substrate or a material having the same thermal conductivity as the substrate. When the substrate is made of a polymer material such as polycarbonate resin, the material of at least the surface of the substrate holder opposed to the substrate should have a thermal conductivity in a range of 0.1 to 1.0 (Kcal / mhr- ° C). Good to use.

It is desirable that the substrate is cooled after the recording layer is formed by the film forming apparatus.

An optical information recording medium according to the present invention is characterized by being manufactured by the above-described optical information recording medium manufacturing apparatus.

[0018]

FIG. 1 is a schematic sectional view showing the structure of an optical information recording medium according to the present invention. As shown in the figure, the optical information recording medium 1 has a substrate 2, a first protective layer 3, a crystallization promoting layer 4, a recording layer 5, a second protective layer 6, and a reflective layer 7. The substrate 1 is formed of polycarbonate or the like. First
Protective layer 3 and the second protective layer 7 is made of ZnS · SiO _2.
The crystallization promoting layer 4 contains Bi atoms. The crystallization accelerating layer 4 containing Bi atoms has a large crystallization accelerating effect, and further, by setting the substrate temperature at the time of forming the recording layer 5 to a high temperature which is advantageous for crystallization, a recording material which does not need to be initialized is formed. Can be expanded.

The recording layer 5 is formed of a sub-zone belonging to the space group Fm3m.
Constant Sb₃A recording layer material having a Te phase is used. this
Metastable phase is different from Sb-Te eutectic recording layer material
Sb and Sb₂Te₃At the grain boundaries without separation
The recording marks do not disturb due to
Therefore, the metastable Sb belonging to the space group Fm3m₃With Te phase
High-density recording is possible with
Has the advantage of Note that the recording characteristics can be improved and preserved.
Meta-stable Sb ₃Te phase
Group Ib element, group II element, group III element
Element, group IV element, group V element, group VI element, rare earth element and transition
At least one element selected from the transfer metal elements is added
It is. Specifically, AgInSbTe, GeSbTe, GeInSbTe, etc. are listed.
But not limited to this, laser light irradiation
Its optical properties change reversibly before and after
Reversible transition between crystallized and amorphous states by action
Any material may be used as long as it is a recording layer material that changes dynamically. The reflection layer 7 is made of Al
Made of alloy.

As shown in FIG. 2, a manufacturing apparatus for manufacturing the optical information recording medium 1 includes a molding machine 11 for molding a substrate 2, a first protective layer 3, a crystallization promoting layer 4, and a recording layer. 5 and a film forming apparatus 12 for forming the second protective layer 6 and the reflective layer 7. As shown in the configuration diagram of FIG. 3, the film forming apparatus 12 includes a substrate loading / unloading chamber 21, first protective layer film forming chambers 22 and 23, a crystallization promoting layer film forming chamber 24, and a recording layer film forming chamber 25. The second protective layer film forming chambers 26 and 27 and the reflective layer film forming chamber 28 are continuously arranged, and a substrate loading / unloading chamber 21 and a rotation mechanism 29 provided at the center of each of the film forming chambers 22 to 28 are provided. Substrate holders 3 corresponding to the number of substrate loading / unloading chambers 21 and each of the film forming chambers 22 to 28
0 is attached via a telescopic arm 31.

When the optical information recording medium 1 is manufactured by the manufacturing apparatus, the substrate 2 is formed by a forming machine 11 as shown in FIG. The substrate is held by a substrate support 15 provided at the tip of the substrate, transported to the film forming apparatus 12, and charged therein, where the first protective layer 3, the crystallization promoting layer 4, the recording layer 5, and the second protective layer 6
And the reflection layer 7 is formed. When forming a film by the film forming apparatus 12, the temperature of the substrate 2 is set to 50 ° C. or higher and equal to or lower than the deformation temperature of the substrate 2, and the film is put into the film forming apparatus 12.

In order to set the temperature of the substrate 2 at 50 ° C. or higher and at the deformation temperature of the substrate 2 and feed the substrate 2 to the film forming apparatus 12, the substrate 2 is molded by the molding machine 11. The substrate 2 molded into a film is put into the film forming apparatus 12. This is a substrate molding method represented by injection molding.
It utilizes the fact that the temperature of the substrate 2 immediately after molding is at a high temperature of 100 ° C. or higher (hereinafter, referred to as use of residual molding heat).
Accordingly, the temperature of the substrate 2 can be set to 50 ° C. or higher and the deformation temperature of the substrate 2 in a very short time. Molding air 1
If the substrate 11 molded in 1 is not provided with a heat retaining facility or the like, the temperature rapidly decreases due to heat radiation to the atmosphere. Therefore, in order to prevent the temperature of the substrate 2 from lowering to 50 ° C. or less, it is desirable that the substrate 2 be charged into the film forming apparatus 12 within 20 seconds after the completion of the molding. Further, by managing the variation in the input time, it is possible to prevent the occurrence of temperature variation for each substrate due to the difference in the input time. It is better that the variation of the charging time is as small as possible, and it is better to manage it within 2 seconds.

As described above, the substrate 2 placed in the film forming apparatus 12 at a temperature not lower than 50 ° C. and not higher than the deformation temperature of the substrate 2 is further subjected to a temperature rise due to film deposition during film formation (hereinafter referred to as film residual heat). It will be hot. Therefore, the energy required for crystallization of the recording material can be supplied as thermal energy from the substrate 2, and even if the crystallization promoting layer 4 alone is not enough to crystallize the recording material, Some or all of the shortfall can be made up. The heating of the substrate 2 by the residual heat of film formation may be an auxiliary one, and may be actively heated by the residual heat of film formation, for example, the first protective layer 3.
It is not necessary to set the film thickness to be large. Therefore, there is no increase in production cost due to an increase in manufacturing tact and material cost due to an increase in the film thickness of the first protective layer 3, and a rise in the temperature of the substrate 2 as compared with a case where the temperature of the substrate 2 is increased only by remaining heat for film formation. Is gentle, it is possible to prevent the substrate 2 from being deformed.

Therefore, when the film is formed by the film forming apparatus 12, the recording layer 5 can be formed immediately after the film formation without deforming the substrate 2.
Can be in a crystallized state or at least a state in which the crystalline state and the amorphous state are mixed. in this case,
Whether the recording layer 5 is in a completely crystallized state or a state in which the recording layer 5 is mixed with the amorphous state greatly depends on the recording layer material and material composition for forming the recording layer 5. It produces various effects. When a material that is in a completely crystallized state is used, the optical information recording medium 1 that does not require initialization can be manufactured. Eliminating the initialization step in this way can eliminate enormous investment related to the construction of the initialization system and improve the production throughput of the optical information recording medium 1. In addition, when a material that is in a mixed state of a crystalline state and an amorphous state is used, the optical information recording medium 1 that can be easily initialized can be manufactured. In this optical information recording medium 1, it is only necessary to crystallize the amorphous state remaining in the initialization step, and the initial step can be significantly reduced.

In order to maintain the temperature of the substrate 2 at 50 ° C. or higher and at the deformation temperature of the substrate 2 within 20 seconds after the completion of the molding of the substrate 2 by the molding machine 11, The substrate support 15 for taking out the substrate 2 from the molding machine 11 and transporting it to the film forming apparatus 12 is provided at least for the substrate 2.
By using a material having a thermal conductivity close to or the same as that of the substrate 2 to prevent heat from being emitted from the substrate 2, the temperature of the substrate 2 can be kept high, and the temperature distribution in the substrate 2 can be made uniform. Acceleration of crystallization of the layer 5 and uniform crystallization can be realized. Therefore, when a polymer material such as polycarbonate resin is used as the material of the substrate 2, the material of the substrate holding surface of the substrate support 15 has a thermal conductivity of 0.1 to 1.0 (Kcal / m · hr).
・ ℃) is desirable.

A heating device is provided on the substrate support 15,
The substrate 2 at the time of transfer may be kept at a temperature higher than or equal to 50 ° C. and lower than or equal to the deformation temperature of the substrate 2. This heating device can be simply configured by embedding a heater in the substrate support 15.

The substrate 2 loaded into the substrate loading / unloading section 21 of the substrate support 15 film forming apparatus 12 is held by a substrate holder 30 which is rotated by a rotating mechanism section 29, and is transferred from the first protective layer film forming chamber 22 to a reflective layer. The first protective layer 3, the crystallization promoting layer 4, the recording layer 5, the second protective layer 6, and the reflective layer 7 are sequentially sent through the film forming chamber 28. As the substrate holder 30 for holding the substrate 2, it is preferable to use one having a structure in which at least a part of the back surface of the thin film deposition region of the substrate 2 is in close contact. By using the substrate holder 30 having such a structure that at least a part of the back surface of the thin film deposition region of the substrate 2 is adhered, even if there is a thermal shock due to the residual heat of the deposition, the deformation of the substrate 2 can be more reliably performed. Can be prevented. Although the reason why the deformation of the substrate 2 is reduced is not clear, it is considered that the rigidity of the substrate 2 is eventually increased and the deformation of the substrate 2 is reduced by holding the substrate 2 in close contact.

It is preferable that at least the surface of the substrate holder 30 facing the substrate 2 is made of a material having a thermal conductivity close to or the same as that of the substrate 2. Thereby, heat radiation from the substrate 2 can be prevented, the temperature of the substrate 2 can be kept high, the temperature distribution in the substrate 2 can be made uniform, and crystallization of the recording layer 5 can be promoted and uniform crystallization can be realized. When a polymer material such as a typical polycarbonate resin is used as the material of the substrate 2, the material of at least the surface of the substrate holder 30 facing the substrate 2 has a thermal conductivity of 0.1 to 1.0 (Kcal / m · hr · ° C).

Further, the substrate 2 may be cooled after forming the recording layer 5 in order to reduce the temperature rise of the substrate 2 due to the residual heat of the film after the film formation and to reduce the deformation of the substrate 2.
The method of cooling the substrate 2 includes a method of indirectly cooling the substrate 2 by cooling the substrate holder 30 with water, and a method of providing a dedicated cooling chamber and blowing a low-temperature He gas onto the substrate 2. A method of providing a cooling chamber is preferable because it can be performed in a short time. The cooling of the substrate 2 may be performed at any film formation stage after the formation of the recording layer 5, but is preferably performed before the formation of the reflective layer 7.
If the cooling is performed after the reflective layer 7 is formed, the substrate 2 is deformed at the time of forming the reflective layer 7, and the cooling effect cannot be obtained.

In the above description, the case where the substrate 2 is put into the film forming apparatus 12 within 20 seconds after the completion of the molding of the substrate 2 by the molding machine 11 and the temperature of the substrate 2 is kept at 50 ° C. or more and at the deformation temperature of the substrate 2 or less. However, when the molding substrate 2 is once taken out of the production line, stored, and then put back into the production line, if the molding residual heat is not available, the substrate 2 is placed in a stage before the molding substrate 2 is put into the film forming apparatus 12. It is preferable to provide a second heating step. As described above, even when the remaining heat of molding cannot be used by providing the heating step of the substrate 2 before the charging into the film forming apparatus 12, the substrate 2 is heated in advance before the charging into the film forming apparatus 12 to be 50 ° C. or more. With substrate 2
Can be introduced into the film forming apparatus 12 at a temperature equal to or lower than the deformation temperature.

[0031]

[Example 1] A substrate 2 was molded by an injection molding method with a molding machine 11 using polycarbonate as a raw material, and within 20 seconds after the completion of molding, a film forming apparatus 12 was formed by a substrate support 15.
And fed. The film thickness of the first protective layer 3 is formed by the film forming apparatus 12.
The crystallization promoting layer 4 is 1 nm thick, the recording layer 5 is 20 nm thick, the second protective layer 6 is 20 nm thick, and the reflective layer 7 is formed.
Were sequentially formed in a film thickness of 200 nm. At this time, the first protective layer 3
The second protective layer 6 was made of ZnS / SiO ₂ , the crystallization promoting layer 4 was made of Bi, the recording layer 5 was made of GeInSbTe, and the reflective layer 7 was made of Al. The tact time for film formation at this time was 20 seconds.

With respect to the thus-prepared recording medium 1 for phase-change type martial arts, the reflectivity of the medium measured after film formation was 18% or more, and it was confirmed that the recording layer 5 was crystallized. When the mechanical properties of the substrate 2 were measured,
It was confirmed that no deformation occurred. In addition, the wavelength 66
Using a pickup head of 0 nm and NA of 0.65, recording and reproduction of information were performed with a recording density of 0.267 μm / bit and an EFM + modulation method. However, the yield at this time was only 70%. Approximately 65% of the failures are caused by insufficient reflectance (the crystallization of the recording layer is incomplete in a part of the substrate surface and the predetermined reflectance is not satisfied), and the remaining 35% is caused by substrate deformation. The mechanical properties were reduced. At this time, the results of examining the charging time t to the film forming apparatus 12 and the temperature of the substrate 2 after the completion of the molding of the substrate 2 with a contact-type thermocouple are shown in the following table. In the following table, the temperature of the substrate 2 has an upper limit and a lower limit because there is an in-plane distribution of the substrate temperature. By setting the charging time t within 20 seconds, the substrate 2 can be charged into the film forming apparatus 12 at a temperature of 50 ° C. or higher and a deformation temperature of the substrate 2 or lower, and the recording layer 5 can be crystallized. .

[0033]

[Table 1]

[Example 2] In Example 1, the substrate support 15 to be transported from the molding machine 11 to the film forming apparatus 12 was made of polycarbonate resin, which is the same material as the substrate 2, and the substrate 2 was formed in the same manner as in Example 1. Was introduced into the film forming apparatus 12 from the molding machine 11, and as a result, defects due to insufficient reflectance were reduced, and the yield was improved to 80%. In addition, the film forming apparatus 1
2. Adhesion type substrate holder 30 made of polycarbonate resin
By using, defects due to substrate deformation were reduced, and the yield could be improved to 90%. Thus, by using the substrate support 15 made of polycarbonate resin, the crystallization non-uniformity in the substrate surface due to the substrate temperature distribution is reduced, and by using the close contact type substrate holder 30 made of polycarbonate resin, It can be seen that the substrate deformation can be reduced.

Example 3 In Example 2, the molding machine 11 and the film forming apparatus 12 were provided in a constant temperature chamber at 50 ° C.
As a result of forming the recording layer and forming a recording layer, defects due to insufficient reflectance were reduced, and the yield was improved to 95%.

Comparative Example 1 The structure was the same as that of Example 1 except that the time from completion of the molding of the substrate 2 to the introduction into the film forming apparatus 12 was set to 60 seconds. When the phase change type optical information recording medium 1 manufactured at this time was measured after film formation, the reflectance of the medium was 10% or less, and it was found that the recording layer 5 was not crystallized at the time of film formation. At this time, the temperature of the substrate 2 when the substrate was put into the film forming apparatus 12 was 25 ° C.

Comparative Example 2 The thickness of the first protective layer in Comparative Example 1 was set to 210 nm. With respect to the phase-change optical information recording medium 1 manufactured at this time, the reflectance of the medium measured after film formation was 18% or more, and it was confirmed that the recording layer 5 was crystallized. However, the substrate deformation is remarkable,
Recording and reproduction of information could not be performed due to unstable tracking. This is presumably because the substrate 2 was deformed due to the substrate temperature rise due to the residual heat of film formation.

[0038]

As described above, according to the present invention, when manufacturing an optical information recording medium, the temperature of the formed substrate is reduced by 50%.
Since the recording layer and the like are formed by setting the substrate at a temperature equal to or higher than ℃ and lower than the deformation temperature of the substrate and feeding the film into a film forming apparatus, the substrate temperature at the time of forming the recording layer can be increased without deforming the substrate. Regardless, an optical information recording medium that does not require initialization or that can be easily initialized can be manufactured.

The temperature of the formed substrate is reduced by 50% by putting the substrate into the film forming apparatus within 20 seconds after the completion of the forming.
The temperature can be set to a temperature not lower than the temperature of the substrate and not higher than the deformation temperature of the substrate, and the substrate can be introduced into the film forming apparatus. By setting the variation of the charging time within 2 seconds, it is possible to reduce the temperature variation of each substrate when it is loaded into the film forming apparatus, and to reduce the crystallization variation of each substrate.

Further, by providing a heating step of heating the substrate to a temperature of 50 ° C. or higher and a temperature equal to or lower than the deformation temperature of the substrate before the substrate is put into the film forming apparatus, the recording layer can be used even in a production mode in which the residual heat of molding cannot be used. The substrate temperature at the time of film formation can be increased without deforming the substrate.

Further, by disposing the molding machine for forming the substrate and the film forming apparatus in a constant temperature chamber at 50 ° C., the temperature of the formed substrate is surely kept at 50 ° C. or higher and lower than the deformation temperature of the substrate. Can be put in.

Further, at least the surface of the substrate support, which is placed in the film forming apparatus while holding the substrate, is made of a material having a thermal conductivity close to or similar to the substrate, or a material having the same thermal conductivity as the substrate. When a polymer material such as a polycarbonate resin is used, at least the material of the surface of the substrate support opposed to the substrate, having a thermal conductivity in the range of 0.1 to 1.0 (Kcal / mhr-C) is used. Thus, heat radiation from the substrate put into the film forming apparatus can be prevented, the substrate temperature can be kept high, the temperature distribution in the substrate can be made uniform, and crystallization of the recording layer can be promoted and uniform crystallization can be realized.

In addition, at least a part of the back surface of the thin film deposition region of the substrate of the substrate holder for holding the substrate in the film forming apparatus is made to adhere to the substrate, and at least the surface of the substrate holder facing the substrate is in contact with the substrate. If the material is close to the material or the same thermal conductivity as the substrate, or if the substrate is a polymer material such as polycarbonate resin, at least the material of the surface of the substrate holder facing the substrate has a thermal conductivity of 0.1 to 1.0.
(Kcal / m ・ hr ・ ° C) prevents heat radiation from the substrate during film formation, keeps the substrate temperature high, and makes the temperature distribution in the substrate uniform, and the recording layer Acceleration of crystallization and uniform crystallization can be realized.

Further, by cooling the substrate after the recording layer is formed by the film forming apparatus, the deformation of the substrate can be reduced.

The optical information recording medium manufactured by this optical information recording medium manufacturing apparatus is capable of high-density recording, requires no initialization or is easy to initialize, and eliminates or simplifies the initialization process. It is possible to eliminate enormous investment related to the construction of the system and to improve the production throughput of the optical information recording medium.

[Brief description of the drawings]

FIG. 1 is a schematic sectional view showing a configuration of an optical information recording medium of the present invention.

FIG. 2 is a configuration diagram of an apparatus for manufacturing an optical information recording medium.

FIG. 3 is a configuration diagram of a film forming apparatus.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1; Optical information recording medium, 2; Substrate, 3; 1st protective layer, 4;
Crystallization promoting layer, 5; recording layer, 6; second protective layer, 7; reflective layer, 11; molding machine, 12; film forming apparatus, 13;
4; telescopic arm, 15; substrate support, 21;
Unloading chambers, 22, 23; first protective layer film forming chamber, 24; crystallization promoting layer film forming chamber, 25; recording layer film forming chamber, 26, 27; second
Protective layer film forming chamber, 28; reflective layer film forming chamber, 29; rotating mechanism section, 30; substrate holder, 31;

 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Masaru Makai 1-3-6 Nakamagome, Ota-ku, Tokyo Inside Ricoh Company, Ltd. (72) Inventor Yasuchi Aman 1-3-6 Nakamagome, Ota-ku, Tokyo In Ricoh Co., Ltd. (72) Inventor Kiyoto Shibata 1-3-6 Nakamagome, Ota-ku, Tokyo F-term in Ricoh Co., Ltd. 5D121 AA01 AA02 AA03 DD05 DD13 GG07 GG20 JJ03

Claims (15)

[Claims] 1. A light for transporting a formed substrate to a film forming apparatus with a substrate support and throwing the same into at least a first protective layer, a crystallization promoting layer, a recording layer, a second protective layer, and a reflective layer. A method for manufacturing an optical information recording medium, comprising: setting a molded substrate at a temperature of 50 ° C. or higher to a deformation temperature of the substrate or lower and feeding the formed substrate to a film forming apparatus. 2. The method for manufacturing an optical information recording medium according to claim 1, wherein said substrate is put into a film forming apparatus within 20 seconds after the completion of molding. 3. The method for manufacturing an optical information recording medium according to claim 2, wherein the variation of the charging time is set within 2 seconds. 4. The method for manufacturing an optical information recording medium according to claim 1, further comprising a heating step of heating the substrate to a temperature of not less than 50 ° C. and not more than a deformation temperature of the substrate before the substrate is put into the film forming apparatus. 5. A light for transporting the formed substrate to a film forming apparatus by a substrate support and throwing the same into at least a first protective layer, a crystallization promoting layer, a recording layer, a second protective layer, and a reflective layer. An apparatus for manufacturing an optical information recording medium, wherein the temperature of a molded substrate is set to 50 ° C. or higher and equal to or lower than the deformation temperature of the substrate, and the molded substrate is put into a film forming apparatus. 6. An apparatus for manufacturing an optical information recording medium according to claim 5, wherein said substrate is put into a film forming apparatus within 20 seconds after the completion of molding. 7. An apparatus for manufacturing an optical information recording medium according to claim 5, wherein a molding machine for forming said substrate and a film forming apparatus are arranged in a constant temperature chamber at 50 ° C. 8. A substrate supporting member to be loaded into a film forming apparatus while holding the substrate, at least a surface facing the substrate is made of a material having a thermal conductivity close to that of the substrate or a material having the same thermal conductivity as the substrate. 7. An apparatus for manufacturing an optical information recording medium according to 5 or 6. 9. The method according to claim 1, wherein the substrate is made of a polymer material such as polycarbonate resin, and the material of at least the surface of the substrate support facing the substrate has a thermal conductivity in the range of 0.1 to 1.0 (Kcal / m · hr · ° C.). 9. The apparatus for manufacturing an optical information recording medium according to claim 8, wherein said apparatus is used. 10. The apparatus for manufacturing an optical information recording medium according to claim 8, wherein said substrate support has a heating device. 11. The optical information recording device according to claim 5, wherein at least a part of the back surface of the thin film deposition area of the substrate of the substrate holder for holding the substrate by the film deposition apparatus is brought into close contact with the substrate. Media manufacturing equipment. 12. The optical information recording medium manufacturing apparatus according to claim 11, wherein at least a surface of the substrate holder facing the substrate is made of a material having a thermal conductivity close to or a material having the same thermal conductivity as the substrate. 13. The substrate is made of a polymer material such as polycarbonate resin, and the material of at least the surface of the substrate holder facing the substrate is made to have a thermal conductivity of 0.1 to 1.0 (Kcal / m · hr · ° C.).
13. The apparatus for manufacturing an optical information recording medium according to claim 12, wherein the optical information recording medium is used. 14. The optical information recording medium manufacturing apparatus according to claim 5, wherein the substrate is cooled after the recording layer is formed by the film forming apparatus. 15. An optical information recording medium manufactured by the optical information recording medium manufacturing apparatus according to claim 5.