JP2002278048A - Photomask and color filter manufacturing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a photomask which suppresses the breakage of a shading pattern due to electrical influence. SOLUTION: This photomask has a connecting means which electrically connects an isolated shading part and a shading part at its periphery.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photomask used for exposing a photosensitive resin thin film and the like and a method for producing a color filter.

[0002]

2. Description of the Related Art Generally, a liquid crystal display device is mounted on a personal computer, a word processor, a pachinko game console, an automobile navigation system, a small television, and the like, and the demand has been increasing in recent years. However, liquid crystal display devices are expensive, and the demand for cost reduction of liquid crystal display devices is increasing year by year.

A color filter constituting a liquid crystal display device is configured by arranging pixels of red (R), green (G), blue (B), etc. on a transparent substrate. Is provided with a black matrix for shielding light in order to increase display contrast.

A dyeing method, a pigment dispersing method, an electrodeposition method, an ink jet method, and the like have been proposed for forming a colored portion constituting a pixel of a color filter.

Some ink jet methods (Japanese Patent Laid-Open No.
No. 9110), a photomask is used in the manufacturing process.

As an example of a method for manufacturing a color filter by an ink-jet method, a resin layer having an ink receiving ability and having a reduced ink receiving ability due to a photochemical reaction is provided on a transparent substrate on which a black matrix is formed. A non-colored area is formed in a resin layer in a pattern along a black matrix on a transparent substrate, and ink droplets of three colors of R, G, and B are ejected from an orifice into an unexposed colored area by an ink-jet method, so that the color is permeated. There is a method for producing a filter. This uncolored area is
When the R, G, and B inks are impregnated into the adhesion area, they are formed to prevent color mixture between inks of different colors.

[0007] A photomask for forming a fine pattern, such as is required in a photosensitive resin exposure step in such a color filter manufacturing step or the like, generally includes an inorganic material as a light shielding portion on a glass substrate. A hard mask provided with a thin film is widely used. In addition, a conductive material such as chromium is usually used as the inorganic material used for the light shielding portion.

FIGS. 7 and 8 are conceptual diagrams of the shape of a conventional photomask. FIG. 7 shows a photomask used for manufacturing a color filter by a pigment dispersion method, and FIG. Those used in manufacturing are shown respectively. In these figures, 1
Reference numeral 1 denotes a photomask, 12 denotes a light shielding portion of the photomask provided on a transparent substrate (not shown), and 13 denotes a light transmitting portion of the photomask. Reference numeral 122 denotes an inner light shielding area;
Reference numeral 3 denotes a peripheral light-shielding region, and reference numeral 124 denotes a boundary between the inner light-shielding region 122 and the peripheral light-shielding region 123.

Here, the inner light-shielding region refers to a region where a light-shielding portion of a main pattern for forming a colored region or the like of a color filter is formed, and the peripheral light-shielding region is usually from the peripheral portion of the inner light-shielding region. It indicates a blank area where the light-shielding portion is continuously formed up to the outline of the photomask.
The surrounding light-shielding region usually occupies most of the area of the mask pattern, and has a shape surrounding the inner light-shielding region.

[0010] In FIG. 8, the entire inner light-shielding region 122 is surrounded by the light transmitting portion 13. That is, the inner light shielding area 122 is different from the surrounding light shielding area 123 in the light shielding section 12.
Is an isolated pattern shape in the point of connection. Note that the boundary 124 indicated by the dotted line does not particularly indicate a strict position, but indicates the boundary between the inner light-shielding region 122 and the peripheral light-shielding region 123 shown in the above-described meaning in the drawing. It only shows. In other words, it does not have such a property that this boundary must be located at a position of several μm from the outer edge of the inner light-shielding region.

[0011]

Generally, a photomask may be affected by various kinds of static electricity in a manufacturing process. For example, when exposing the color filter substrate from the substrate stage in an exposure machine,
The influence of the charging phenomenon that occurs when the distance between the substrate and the photomask is increased, and the effect of the charge transfer phenomenon that occurs due to the potential difference between the hand or robot and the photomask when handling the photomask are considered. Can be
Then, the pattern of the photomask may be destroyed due to the movement of charges generated due to such an electrostatic influence.

For example, in the case of a photomask as shown in FIG. 7, such an electrostatic influence is caused by the occurrence of discharge between the light-shielding portions 12 because the light-shielding portions 12 are formed continuously over the entirety. Is not a big problem,
In the case of the photomask as shown in FIG. 8, there is an isolated pattern that is a light-shielding pattern that is electrically isolated inside, and the pattern is destroyed due to, for example, discharge occurring between the light-shielding portions 12. Leads to.

In a method of manufacturing a color filter using a photomask, the pattern shape of the photomask in which such a pattern is destroyed is transferred to a substrate.
As a result, pixel defects such as color mixture and white spots may occur in the color filter.

In the case where the photomask in which the pattern has been destroyed causes the pixel defect, the photomask is immediately replaced with a photomask in which the pattern has not been destroyed. Needed to be

However, in order to replace the photomask, it is often necessary to temporarily stop the production line, which causes a problem of lowering the operation rate.

Even when the photomask is replaced, the manufactured color filter becomes defective before the photomask is replaced, and there is a problem that the yield is reduced.

Further, in a photomask in which a pattern has been destroyed, it is often impossible to repair the destroyed portion.
Cannot be reused. For this reason, it is necessary to newly manufacture an expensive mask, causing waste in terms of schedule and cost, and there has been a problem.

Further, even if the pattern can be repaired,
Repair costs were required, and there were problems in terms of schedule and cost.

In the method of manufacturing a color filter using a photomask as described above, it is very important to prevent the pattern from being destroyed in the photomask.

SUMMARY OF THE INVENTION The present invention has been made in view of the state of the prior art, and has as its object to provide a photomask in which the occurrence of pattern destruction is suppressed.

[0021]

According to a first aspect of the present invention, there is provided a color filter having a predetermined pattern comprising an inner light-shielding region and a peripheral light-shielding region. During the manufacturing process,
A photomask for exposing a negative photosensitive resin layer, comprising at least one connection means for establishing an electrical connection between the inner light-shielding region and the peripheral light-shielding region.

The inner light-shielding region refers to a region where a light-shielding portion of a main pattern for forming a colored region or the like of a color filter is formed. It indicates a blank area where the light-shielding portion is continuously formed up to the outline of the photomask.
The surrounding light-shielding region usually occupies most of the area of the mask pattern, and has a shape surrounding the inner light-shielding region.

According to a second aspect of the present invention, in the photomask according to the first aspect, the inner light-shielding region is a pattern for forming a colored region of a color filter, and the peripheral light-shielding region is formed of a color filter. A pattern forming the periphery of the colored region.

The third aspect of the present invention is the first or second aspect.
In the photomask of the invention, the connecting means of the invention,
The connection pattern is a light-shielding portion that is connected to both the inner light-shielding region and the peripheral light-shielding region.

According to a fourth aspect of the present invention, in the photomask according to the third aspect, the position of the connecting pattern is determined by determining whether the pattern forming the colored region is formed in a row in the two ends of the row. , At least at one end.

According to a fifth aspect of the present invention, in the photomask according to the fourth aspect, the position of the connecting pattern is a position in contact with every other end of the one end group on the same side of the row. It is characterized by the following.

[0027] The invention according to claim 6 is the invention according to claims 1 to 5.
In the photomask according to any one of the above,
An electrical connection is established between all the light-shielding portions.

According to a seventh aspect of the present invention, there is provided a photomask having at least a predetermined pattern of light shielding portions on a transparent substrate, wherein the isolated pattern is an isolated light shielding portion; Is characterized by having at least one connection means for electrically connecting a peripheral pattern which is a light-shielding portion of the periphery.

According to an eighth aspect of the present invention, in the photomask of the seventh aspect, the connection means is provided for all of the isolated patterns so that all of the light shielding portions are electrically connected. It is characterized by having been done.

The ninth aspect of the present invention is the invention according to the seventh or eighth aspect.
Wherein the connecting means is made of a conductive material that is transparent to light irradiated in the exposure step.

According to a tenth aspect of the present invention, in the photomask according to the ninth aspect, the connecting means has a shape having at least a portion in contact with both the isolated pattern and the peripheral pattern. Is formed by patterning.

According to an eleventh aspect of the present invention, in the photomask of the tenth aspect, the connecting means forms the conductive material on one surface of the transparent substrate in contact with all of the light-shielding portions. It is characterized by being formed as a film.

According to a twelfth aspect of the present invention, there is provided a color filter manufacturing method using the photomask according to any one of the first to eleventh aspects.

[0034]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail with reference to specific embodiments of the present invention, but the present invention is not limited to these embodiments.

(Photomask 1) First, a light-shielding portion having a predetermined pattern consisting of an inner light-shielding region and a peripheral light-shielding region is provided. A photomask for exposure, which has at least one connection means for making an electrical connection between an inner light-shielding region and a peripheral light-shielding region, will be described.

FIG. 1 is a conceptual diagram of the shape of a photomask of the present invention. In FIG. 1, reference numeral 11 denotes a photomask in which a light-shielding portion is formed by forming a conductive light-shielding material on a transparent substrate (not shown). Reference numeral 12 denotes a light shielding portion of a photomask formed of a conductive material, and reference numeral 13 denotes a light transmitting portion of the photomask. Reference numeral 121 denotes a connection pattern characteristic of the present invention;
122 is an inner light shielding area, 123 is a surrounding light shielding area, 124
Is a boundary between the inner light shielding area and the surrounding light shielding area. In addition,
The description in the above-described conventional technique applies to the boundary 124 indicated by the dotted line as it is, and does not have a strict meaning. In other words, it does not have such a property that this boundary must be located at a position of several μm from the outer edge of the inner light-shielding region.

In the embodiment shown in FIG. 1, a connection pattern 121 formed of the same material as that of the light-shielding portion 12 and connected to both the inner light-shielding region and the surrounding light-shielding region includes all the light-shielding portions included in the inner light-shielding region 122. And surrounding light shielding area 123
This is a preferred mode corresponding to connection means for making an electrical connection between However, the connection means in the present invention is not limited to this mode. For example, the connecting means may not be provided for all the inner light-shielding regions, and if there is at least one, it is possible to prevent pattern destruction around the light-shielding portion with which the connecting means is in contact. Also, connection pattern 1
21 does not necessarily have to be the same material as the light-shielding part 12,
The formation may be performed before or after the formation of the light shielding portion 12. However, if the connection pattern 121 is formed of the same material as that of the light-shielding portion 12 and the entire light-shielding portion is formed at the same time as the formation of the light-shielding portion 121, that is, the entire light-shielding portion is formed from the pattern including the connection pattern 121, the number of processes is reduced. Therefore, it is preferable.

Further, the shape of the connection pattern 121 is the same in width as the pattern shape of the inner light-shielding region 122 for convenience of explanation, but the present invention is not limited to this shape, and as shown in FIG. , 121L, and the like,
It may have a constricted shape such as 121M and 121N.

The number of connecting patterns 121 connected to any one inner light-shielding region 122 is not limited to one, but may be plural. For the sake of simplicity, the surrounding light-shielding region 123 has been described as an example of a pattern shape in which the light-shielding portion 12 is continuously formed from the peripheral portion of the boundary 124 to the outline of the photomask 11. There is no need to extend to the outline of the mask;

For the transparent substrate, quartz glass, soda lime glass, or the like, which is usually used for a photomask, can be used. For the light shielding portion 12 and the connecting pattern 121, generally used chrome, chromium oxide, or the like can be used. Metals and metal oxides can be used.

FIG. 3 is a plan view of a specific embodiment of the photomask of the present invention. The photosensitive resin is exposed to an exposure pattern as shown in FIG. 4 to form a non-colored area. The shape of the photomask for manufacturing the color filter as shown is shown. In these figures, the same reference numerals as those in FIGS. 1 and 2 indicate the same members.

In FIG. 4, reference numeral 36 denotes a colored region formed in a row without being exposed by the light shielding portion of the photomask, and 37 denotes a non-colored region formed by exposure. Also, R, G, and B shown in each column indicate that the columns are colored red, green, and blue, respectively.

In FIG. 5, reference numeral 31 denotes a color filter in which a black matrix and a colored region are formed on a transparent substrate. 32 is an effective pixel, 33 is an outer edge of an effective pixel area, 34
The outer pixels with hatching are dummy pixels, 35
Denotes an outer edge of the dummy pixel area, and 36 denotes a black matrix.

Also, 33 and 35 in FIG. 3 represent the outer edges corresponding to the outer edges 33 and 35 in FIG. 5, respectively, and the line segment A, line segment B and line segment C in both figures respectively indicate the light shielding of the photomask of FIG. The position of each pattern (A and B are the vertical positions of the connecting pattern, and C is one line with the pattern of the inner light-shielding region) corresponds to the position of the color filter of FIG. I have.

Here, the dummy pixel is a connection pattern 1
21 is a dummy pixel provided so as not to affect display even if color mixing with an adjacent pixel of a different color occurs in the colored region of the color filter at the position corresponding to the photomask. An effective pixel is a pixel used for actual display other than the dummy pixel.

The non-colored area 37 as shown in FIG. 4 is provided so as not to cause color mixing between the different colors of R, G and B shown in the figure. Actually, these patterns are very fine, and if there is a portion where the non-colored region 37 is not formed in the portion corresponding to the connection pattern, for example, the G color in the second column from the left and the G Such as between the colors of R,
Color mixing may occur in regions that are not divided by the non-colored region 37. Therefore, if a dummy pixel region as described above is provided in the periphery, even if color mixing occurs in this portion, the quality of the display device is not affected.

In the present embodiment, the inner light-shielding region is a pattern that forms a colored region of the color filter, and the peripheral light-shielding region is a pattern that forms the periphery of the colored region of the color filter. Further, the connection means is a connection pattern which is a light shielding portion connected to both the inner light shielding area and the surrounding light shielding area.

The position of the connection pattern is determined by determining the position of the pattern forming the colored area in a row of the two ends of the row.
It is preferably at least one end position. More preferably, the position of the connection pattern is a position in contact with every other end of the one end group on the same side of each row, and furthermore, electrical connection is established between all the light shielding portions. That is. FIG. 3 shows an embodiment having a connection pattern of this most preferable form.

That is, in FIG.
Reference numeral 23 denotes a pattern shape in which the light-shielding portion is continuously formed up to the outline of the photomask 11.
Denotes a pattern shape formed over the effective pixel region and the dummy pixel region. Also, the inner light-shielding region 122
The connection pattern 121 is electrically connected to the surrounding light shielding area 123. The connection pattern 121 is located at a position in contact with one end of a row in which a continuous pattern for forming a single-colored layer of a color filter is arranged. The vertical position of the connection pattern 121 is determined by the line segment A and the line segment B orthogonal to the direction of a row (for example, the row of C in the drawing) in which the continuous monochromatic colored layer forming pattern shapes of the color filters are arranged side by side. Of the one end group formed continuously on the line segment A and the line segment B, and is in contact with every other one end position.

(Photomask 2) Next, in a photomask in which a light-shielding portion is provided at least in a predetermined pattern on a transparent substrate, an isolated pattern that is an isolated light-shielding portion and a peripheral portion that is a light-shielding portion around the isolated pattern. A photomask having at least one connection means for electrically connecting a pattern will be described.

According to the present invention, in a photomask having an isolated pattern as shown in FIG. 8, light exposure using a photomask of the present invention is performed on a transparent substrate in a step immediately before or immediately after a step of forming a light shielding portion. This can be realized by forming a conductive material which is transparent to light applied in the process over the entire surface.

In this way, it is possible to completely prevent a discharge from occurring between the light-shielding portions, and to suppress the destruction of the pattern of the photomask.

In the present embodiment, the connection means is formed by forming a conductive material on one surface of the transparent substrate in contact with all of the light-shielding portions, and is transparent to light irradiated in the exposure step. This is the most preferable form made of a conductive material.

However, in the present invention, the transparent conductive material may be formed in the same shape as the connection pattern shown in FIG. 1, or may not be provided for all the isolated patterns. Is also good. That is, it is sufficient if there is a connecting means that contacts at least two isolated patterns, and thereby, it is possible to suppress pattern destruction as compared with the related art.

Materials similar to those described above can be used for the material of the transparent substrate, the light shielding portion, and the like, and ITO and the like can be used for the transparent conductive material.

(Color Filter Manufacturing Method) Next, a specific embodiment of the color filter manufacturing method will be described.

Here, a resin layer having an ink receiving ability and having a reduced ink receiving ability by a photochemical reaction is provided on a transparent substrate on which a black matrix is formed, and a non-colored area is formed in a pattern along the black matrix by exposure. A method for forming a color filter by ejecting ink droplets of three colors R, G, and B from an orifice into an unexposed colored region by an ink jet method to form a color filter will be described.

The above-mentioned materials having an ink receiving ability include acrylic resins, epoxy resins, imide resins,
Cellulose derivatives such as hydroxypropylcellulose, hydroxyethylcellulose, methylcellulose and carboxymethylcellulose are preferred. As a forming method, a method such as spin coating, roll coating, bar coating, spray coating, and dip coating can be used. The thickness of the ink receptive resin layer to be formed depends on the type and composition of the ink used for forming the pattern shape, or the ejection amount, the method of use, and the like, but is preferably about 0.5 to 2 μm.

Examples of the ink jet system include a system using thermal energy and a system using mechanical energy, and any system can be suitably used. The ink to be used is not particularly limited as long as it can be used for ink-jet. As the colorant of the ink, various kinds of dyes or pigments are required for each pixel of R, G, B. The transmission spectrum that matches the transmission spectrum to be performed is appropriately selected.

First, the substrate on which the ink receptive resin layer is formed is formed at a temperature of 60 to 100 ° C. by using the above materials and methods.
Heat treatment is performed at an appropriate temperature.

Thereafter, an exposure step is performed. By this step, the ink receptivity of the non-colored area of the ink receptive resin layer is reduced, so that color mixing does not occur between inks of different colors. As the photomask used in the exposure step, the photomask of the present invention is used. FIG. 6 shows an example of a photomask. In the drawings, the same reference numerals as those in the previous drawings indicate the same members. In this embodiment, the width X of the connection pattern is the same as the width of the pattern of the inner light-shielding region 122, and the length Y of the connection pattern is determined so as to contact the inner light-shielding region 122 and the peripheral light-shielding region 123.

Thereafter, heat treatment is performed at an appropriate temperature within the range of 100 to 150 ° C., and the RGB pixels are colored by the ink jet method.

Further, heat treatment is performed at an appropriate temperature of 200 to 250 ° C., and thereafter, a protective layer and ITO are formed.

[0064]

(Embodiment 1) First, an example in which a photomask of the present invention is formed will be described.

After forming a light-shielding film on one side of quartz glass of 450 × 550 × 5 mm using chromium oxide and forming a pattern by photolithography, the present invention has a connecting pattern as shown in FIG. A photomask was created.

Here, 122 is 100 μm in width and 180 in length
mm is a rectangle, 121 is 100 μm in width and 10 in length.
This is a connecting pattern formed with a rectangular shape of μm, that is, the same width as 122. The light transmitting portion 13 around the inner light shielding region 122 has a slit shape with a width of 10 μm.

After manufacturing 5000 color filters using this photomask and observing the photomask, it was confirmed that no electrostatic breakdown of the pattern occurred.

Further, after the photomask was washed, the same observation was performed. As a result, it was confirmed that no electrostatic breakdown of the pattern occurred.

(Comparative Example 1) A photomask similar to that of Example 1 was prepared except that the connecting pattern 121 was not provided.

After 5,000 color filters were manufactured using this photomask, the photomask was observed. As a result, electrostatic damage was confirmed in the pattern.

(Embodiment 2) Next, an embodiment in which a method of manufacturing a color filter using a photomask of the present invention will be described.

On a transparent substrate on which a black matrix was formed, an ink-receiving resin layer made of an acrylic resin was provided in a thickness of 2 μm by a spin coating method, and heat-treated at 90 ° C.

Thereafter, an exposure step was performed. The photomask of the present invention was used as a photomask used in the exposure step. A photomask as shown in FIG. 6 was used. In this embodiment, the width X of the connection pattern is the same as the width of the pattern of the inner light-shielding region 122 and is 100 μm. The length Y of the link pattern is
And the surrounding light-shielding region 123 are formed to have a thickness of about 2 to 7 μm. The gap between the photomask and the substrate during exposure was 100 μm. The integrated exposure amount is 1
00 mJ / cm ² .

Thereafter, a heat treatment was performed at 120 ° C., and the ink (dye-based) was impregnated into the colored region of the ink-receiving resin layer by an ink-jet method to color the RGB pixels.

Further, a heat treatment is performed at 220 ° C.
A protective layer and ITO were formed.

In this way, 500 color filters are provided.
When zero sheets were manufactured, no pattern defects occurred in the photomask, and a good color filter could be manufactured.

Comparative Example 2 A color filter was manufactured in the same manner as in Example 2 except that a photomask having no connecting pattern, which is a feature of the present invention, was used.

As a result, when 5,000 color filters were manufactured, pattern shape destruction occurred on the photomask, and as a result, color mixing occurred in the color filters, and a good color filter could not be manufactured.

[0079]

According to the first aspect of the present invention, when the photomask is affected by static electricity, a steady potential difference is less likely to be generated in the photomask, and the charge accumulated by the static electricity is shielded. Discharge between the portions is suppressed, and pattern destruction of the photomask can be suppressed.

According to the third aspect of the present invention, since the connecting means can be formed at the same time as the patterning of the light shielding portion of the photomask, the connecting means can be formed without increasing the number of steps as compared with the conventional method. It becomes possible.

According to the sixth aspect of the present invention, it is possible to eliminate discharge between the light-shielding portions and prevent pattern destruction.

According to the seventh aspect of the invention, when the photomask is affected by static electricity, a steady potential difference is less likely to be generated in the photomask, and the charge accumulated between the light-shielding portions due to the electrostatic influence is reduced. , And the destruction of the pattern of the photomask can be suppressed.

According to the eighth aspect of the present invention, it is possible to eliminate the discharge between the light shielding portions and prevent the pattern from being destroyed.

According to the ninth aspect, the connecting means can be provided without changing the shape of the light-shielding pattern.

According to the eleventh aspect of the present invention, it is possible to easily form the connecting means for electrically connecting all the light shielding portions.

According to the twelfth aspect of the present invention, since the photomask is hardly destroyed, it is possible to suppress a decrease in the yield of the color filter due to the photomask being destroyed.

As described above, by employing the photomask of the present invention, the total number of photomasks to be manufactured can be reduced by extending the life of the photomask, and the cost of the color filter can be reduced. In addition, by suppressing the destruction of the photomask pattern, it is possible to reduce the pixel defects of the color filter and improve the yield, and further, it is possible to reduce the number of mask replacements and improve the line availability. Become.

[Brief description of the drawings]

FIG. 1 is a conceptual diagram of the shape of a photomask of the present invention.

FIG. 2 is an enlarged conceptual diagram of a connection pattern portion of the photomask of the present invention.

FIG. 3 is a plan view of one embodiment of the photomask of the present invention.

FIG. 4 is a plan view of an exposure pattern using the photomask of the present invention.

FIG. 5 is a plan view of an example of a color filter manufactured using the photomask of the present invention.

FIG. 6 is a plan view of one embodiment of the photomask of the present invention.

FIG. 7 is a conceptual diagram of a shape of a photomask used when a color filter is manufactured by a pigment dispersion method.

FIG. 8 is a conceptual diagram of the shape of a conventional photomask used when a color filter is manufactured by an inkjet method.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 11 Photomask 12 Light-shielding part 13 Light-transmitting part 121 Connecting pattern 122 Inner light-shielding area 123 Peripheral light-shielding area 124 Boundary 128 Isolated pattern 31 Color filter 32 Effective pixel 33 Effective pixel area outer edge 34 Dummy pixel 35 Dummy pixel area outer edge 36 Coloring area 37 Non Colored area 38 Black matrix

Claims (12)

[Claims] 1. A photomask for exposing a negative photosensitive resin layer during a process of manufacturing a color filter by an inkjet method, comprising a light-shielding portion having a predetermined pattern comprising an inner light-shielding region and a peripheral light-shielding region. A photomask, comprising: at least one connection means for establishing an electrical connection between the inner light-shielding region and the peripheral light-shielding region. 2. The method according to claim 1, wherein the inner light-shielding region is a pattern forming a colored region of a color filter, and the surrounding light-shielding region is a pattern forming a periphery of the colored region of a color filter. The photomask according to claim 1. 3. The photomask according to claim 1, wherein the connection unit is a connection pattern that is a light shielding portion connected to both the inner light shielding region and the surrounding light shielding region. 4. The connection pattern according to claim 3, wherein the position of the connection pattern is at least one end of both ends of the row in which the pattern forming the colored region is formed in a row. Photomask. 5. The photomask according to claim 4, wherein the position of the connection pattern is a position in contact with every other end of the one end group on the same side of the row. 6. The photomask according to claim 1, wherein electrical connection is established between all of the light-shielding portions. 7. In a photomask in which a light-shielding portion is provided at least in a predetermined pattern on a transparent substrate, an isolated pattern that is an isolated light-shielding portion and a peripheral pattern that is a light-shielding portion around the isolated pattern are electrically connected. A photomask having at least one connection means for connection. 8. The photomask according to claim 7, wherein the connection means is provided for all of the isolated patterns so that all of the light-shielding portions are electrically connected. 9. The photomask according to claim 7, wherein said connecting means is made of a conductive material transparent to light irradiated in said exposure step. 10. The method according to claim 9, wherein the connecting means is formed by patterning the conductive material in a shape having at least a portion that contacts both the isolated pattern and the peripheral pattern. Photo mask. 11. The device according to claim 10, wherein the connection means is formed by forming the conductive material on one surface of the transparent substrate so as to be in contact with all of the light shielding portions. Photo mask. 12. One of claims 1 to 11
13. A method for producing a color filter, comprising using the photomask described in the section.