JP2002260208A - Magnetic recording medium, its manufacturing method and device, and magnetic recording/reproducing apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To give a magnetic recording medium which is excellent in the magnetic properties, such as thermal fluctuation resistance and in the glide height properties, and which can be manufactured readily. SOLUTION: This magnetic recording medium comprises a non-magnetic substrate 1, a non-magnetic base layer 3 formed thereon, a magnetic layer 4, and a protective layer 5 fundamentally. The non-magnetic base layer 3 has a body centered cubic(bcc) structure, and between the non-magnetic substrate 1 and the non-magnetic base layer 3, an orientation adjusting layer 2 which make the non-magnetic base layer orient to (200) preferentially is formed. The magnetic layer 4 have a crystal structure such that a columnar microcrystal grain is inclined to the radial direction, and the ratio of the coercive force Hcc in the circumferential direction to the coercive force Her in the radial direction of the magnetic layer 4, Hcc/Hcr, is set larger than one.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic recording medium used in a computer peripheral device, a magnetic disk device used for image / audio recording, and the like, a method of manufacturing the same, a manufacturing apparatus, and a magnetic device using the magnetic recording medium. The present invention relates to a recording / reproducing device.

[0002]

2. Description of the Related Art With the increase in recording density of magnetic recording media, it has been proposed to reduce noise and improve resolution by reducing the size of magnetic particles in a magnetic layer, magnetically isolating the magnetic layer, and thinning the magnetic layer. ing. However, finer magnetic particles,
When magnetic isolation and thinning of the magnetic layer are performed, there is a problem that the thermal fluctuation resistance is likely to be reduced because the magnetic particles become small. Thermal fluctuation refers to a phenomenon in which recorded bits become unstable and recorded data is lost, and in a magnetic recording / reproducing apparatus, it appears as a decay of reproduced output of recorded data over time. Conventionally, as a substrate for a magnetic recording medium, a nonmagnetic metal substrate made of an aluminum alloy or the like has been often used. The non-magnetic metal substrate is usually provided with a hard film made of NiP or the like for hardening the surface, and the surface thereof is subjected to texture processing. Texture processing is processing to form irregularities along a predetermined direction (usually the circumferential direction) on the substrate surface. By performing texture processing, the crystal orientation of the underlayer and the magnetic layer formed on the substrate is improved. As a result, the magnetic anisotropy of the magnetic layer can be increased, and the magnetic characteristics such as thermal fluctuation resistance can be improved.

In recent years, as a substrate for a magnetic recording medium, a metal substrate made of aluminum or the like has been used instead.
Non-metallic substrates made of glass, ceramics and the like have been widely used. A nonmetallic substrate is advantageous in terms of glide height characteristics because it has high hardness and hardly causes head slap, and has high surface smoothness. However,
A non-metallic substrate such as a glass substrate has a problem that it is difficult to perform texture processing, the magnetic anisotropy of the magnetic layer is insufficient, and the resistance to thermal fluctuation tends to be low. For this reason,
It has been proposed to form a hard film that can be easily textured on a nonmetallic substrate made of glass, ceramics, or the like. For example, JP-A-5-197941 discloses a magnetic recording medium in which a NiP film, which is a hard film that can be easily textured, is formed on a nonmetallic substrate surface by a sputtering method. To manufacture a magnetic recording medium having a hard film provided on the surface of a non-metallic substrate, a hard film is formed on the substrate in a film forming apparatus such as a sputtering apparatus, and then the substrate is once carried out of the film forming apparatus and subjected to texture processing. A method is employed in which texture processing is performed using an apparatus, and then carried again into a film forming apparatus to form an underlayer and a magnetic layer.

[0004]

However, in a conventional magnetic recording medium using a non-magnetic metal substrate such as the aluminum substrate or a non-metal substrate such as a glass substrate, a hard magnetic material such as NiP formed on the surface is used. Although the magnetic anisotropy of the magnetic layer can be enhanced by texturing the film, the surface unevenness of the hard film tends to lower the surface smoothness of the medium. For this reason, there was a problem that the glide height characteristics deteriorated and it was difficult to increase the recording density. Further, there is a disadvantage that the manufacturing cost is increased because the manufacturing process is complicated. The present invention has been made in view of the above circumstances, and has excellent magnetic characteristics such as thermal fluctuation resistance and glide height characteristics, and can be easily manufactured, and a magnetic recording medium that can be easily manufactured. It is another object of the present invention to provide a method and an apparatus which can perform the above-mentioned method, and a magnetic recording / reproducing apparatus using a magnetic recording medium having excellent magnetic properties such as thermal fluctuation resistance.

[0005]

According to the present invention, there is provided a magnetic recording medium comprising a non-magnetic substrate, a non-magnetic underlayer formed thereon,
The magnetic layer and the protective layer have a basic configuration, and the nonmagnetic underlayer has
An orientation adjusting layer having a bcc structure and having a non-magnetic underlayer preferentially oriented to (200) is formed between the non-magnetic substrate and the non-magnetic underlayer. It has a crystal structure inclined in the circumferential direction, and has a coercive force H in the circumferential direction of the magnetic layer.
The ratio Hcc / Hcr between cc and the coercive force Hcr in the radial direction is:
It is characterized by being larger than 1. The nonmagnetic underlayer preferably has a configuration in which columnar fine crystal grains have a crystal structure inclined in the radial direction. The magnetic layer has a plurality of magnetic films, these magnetic films have an hcp structure and are preferentially oriented to (110), and antiferromagnetic coupling can be formed between these magnetic films. Is preferred. The orientation adjustment layer is
It is preferable that the columnar fine crystal grains have a crystal structure inclined in the radial direction. According to the above configuration, the magnetic layer can have enhanced magnetic anisotropy in the circumferential direction, and can increase the crystal magnetic anisotropy constant (Ku). Therefore, thermal fluctuation resistance, coercive force, and S / N ratio of a recording / reproducing signal can be improved. The magnetic characteristics such as the above can be improved. In the present invention, in addition to this, due to the antiferromagnetic coupling between the magnetic films, the magnetization of the magnetic films other than the main magnetic film having the highest coercive force, the state of apparently no magnetization, or the magnetization of the main magnetic film, An apparently smaller state is obtained by the amount of magnetization corresponding to the magnetization of the other magnetic films. For this reason, the volume of the magnetic particles can be made sufficiently large without adversely affecting noise and resolution, and thermal stability can be achieved, and the thermal fluctuation resistance can be improved. The magnetic layer may have a laminated ferrimagnetic structure in which the magnetic moment directions of adjacent magnetic films face each other. The magnetic layer may have a structure having a plurality of magnetic films and an intermediate film interposed therebetween. Magnetic layer,
A configuration having two or more laminated structures including a magnetic film and an intermediate film adjacent to the magnetic film can be employed. The antiferromagnetic coupling magnetic field of the magnetic film adjacent to the main magnetic film having the largest coercive force among the plurality of magnetic films is preferably set to be larger than the coercive force of this magnetic film. The intermediate film is made of Ru, Cr, I
It is preferable to use a material containing at least one of r, Rh, Mo, Cu, Co, Re, and V as a main component. The orientation adjusting layer is formed by forming a nonmagnetic underlayer having a bcc structure into (2
00), ie, Cr, V,
A configuration composed of one or more of Nb, Mo, W, and Ta can be adopted. The orientation adjusting layer may have a structure in which the non-magnetic underlayer having the bcc structure is preferentially oriented to (200), that is, may be made of an alloy containing Cr as a main component. The orientation adjusting layer is configured to preferentially orient the nonmagnetic underlayer having the bcc structure to (200), that is, Ta.
X ₁ Ta (X ₁ is Be, Co, Cr, Fe, N
b, one, two or more of Ni, V, Zn, and Zr)
May be a main component, and may have an Fd3m structure or an amorphous structure. The orientation adjusting layer is bcc
The structure in which the nonmagnetic underlayer of the structure is preferentially oriented to (200), that is, an alloy X ₂ Nb containing Nb (X ₂ is Be, C
one of o, Cr, Fe, Ni, Ta, V, Zn, and Zr
(Or two or more species) and may have an Fd3m structure or an amorphous structure. The orientation adjusting layer has a configuration in which the nonmagnetic underlayer having the bcc structure is preferentially oriented to (200), that is, CoTa or CoTa.
It has a main component of Nb, a content of Ta or Nb of 30 to 75 at%, and can have an Fd3m structure or an amorphous structure. The orientation adjusting layer has a structure in which the nonmagnetic underlayer having the bcc structure is preferentially oriented to (200), that is, CrTa or Cr.
It can be configured to contain Nb as a main component and have a Ta or Nb content of 15 to 75 at%.
As the orientation adjusting layer, a nonmagnetic underlayer having a bcc structure is formed by (200)
, Or NiTa or N
It has iNb as a main component, a Ta or Nb content of 30 to 75 at%, and can have a structure having an Fd3m structure or an amorphous structure.
As the orientation adjusting layer, a nonmagnetic underlayer having a bcc structure is formed by (200)
, That is, a nonmagnetic metal having an Fd3m structure. The orientation adjusting layer may be configured to preferentially orient the nonmagnetic underlayer having the bcc structure to (200), that is, may be made of a nonmagnetic metal having a C15 structure. In the present invention, a configuration in which an orientation improving layer is formed between the nonmagnetic substrate and the orientation adjusting layer can be adopted. The orientation improving layer may be made of a material having a B2 structure or an amorphous structure. The orientation improving layer is made of NiAl, FeAl, CoAl, CoZr, CoC.
A configuration in which any one of rZr and CoCrC is a main component can be adopted. In the present invention, a plurality of orientation adjusting layers can be provided.

[0006] The magnetic recording medium of the present invention comprises a non-magnetic substrate,
The magnetic layer and the protective layer formed thereon have a basic configuration, and an orientation adjustment layer for adjusting the crystal orientation of the layer immediately above is formed between the nonmagnetic substrate and the magnetic layer. The crystal grains have a crystal structure inclined in the circumferential direction, and the ratio Hc between the circumferential coercive force Hcc and the radial coercive force Hcr of the magnetic layer.
A configuration in which c / Hcr is greater than 1 can be employed. The magnetic layer has a plurality of magnetic films, and these magnetic films are
It is preferable that the magnetic film has an hcp structure and is preferentially oriented to (110), so that antiferromagnetic coupling can be formed between these magnetic films. The orientation adjusting layer preferably has a structure in which columnar fine crystal grains are inclined in the radial direction. The magnetic recording medium of the present invention has a basic structure of a non-magnetic substrate, a non-magnetic underlayer, a magnetic layer and a protective layer formed thereon, and a layer immediately above the non-magnetic substrate and the non-magnetic underlayer. A non-magnetic underlayer having a bcc structure; a magnetic layer having a crystal structure in which columnar fine crystal grains are inclined in a circumferential direction; Is made of a NiP alloy having an amorphous structure, and the non-magnetic underlayer can be preferentially oriented to (200), and the coercive force Hcc in the circumferential direction and the coercive force in the radial direction of the magnetic layer are The ratio Hcc / Hcr with respect to Hcr may be configured to be larger than 1. The nonmagnetic underlayer is
It is preferable that the columnar fine crystal grains have a crystal structure inclined in the radial direction. The magnetic layer has a plurality of magnetic films, these magnetic films have an hcp structure and are preferentially oriented to (110), and antiferromagnetic coupling can be formed between these magnetic films. Is preferred. The orientation adjusting layer preferably has a structure containing 1 at% or more of nitrogen or oxygen.

A method of manufacturing a magnetic recording medium according to the present invention comprises a nonmagnetic substrate, a nonmagnetic underlayer, a magnetic layer and a protective layer formed thereon, and the nonmagnetic underlayer has a bcc structure. A method for producing a magnetic recording medium having an orientation adjusting layer for preferentially orienting the nonmagnetic underlayer to (200) between the nonmagnetic substrate and the nonmagnetic underlayer. Is emitted from the emission source and adhered to the surface to be adhered to form a magnetic layer. At this time, the projected line of the orbit of the film-forming particles on the surface perpendicular to the radial direction at the point where the film-forming particles adhere is a nonmagnetic substrate It is characterized in that the direction of the film-forming particles is set so as to be inclined with respect to. In the manufacturing method of the present invention, the magnetic layer has a plurality of magnetic films, these magnetic films have an hcp structure, and are preferentially oriented to (110), It is possible to adopt a configuration in which magnetic coupling can be formed. In the production method of the present invention, at least one of the nonmagnetic underlayer and the orientation adjustment layer is formed by emitting the film-forming particles from the emission source and attaching the film-forming particles to the surface to be adhered. The direction of the film-forming particles can be set such that the projection line of the track on the surface to be adhered substantially follows the radial direction of the non-magnetic substrate and is incident on the non-magnetic substrate at an angle. In the manufacturing method of the present invention, the orientation adjustment layer can be subjected to an oxidation treatment or a nitridation treatment. In forming the orientation adjustment layer, a sputtering method using a sputtering target as a source of film-forming particles can be employed. In forming the orientation adjustment layer, an oxidation treatment or a nitridation treatment can be performed by using a sputtering gas containing oxygen or nitrogen. The oxidation treatment or the nitridation treatment can be performed by bringing the surface of the orientation adjustment layer into contact with an oxygen-containing gas or a nitrogen-containing gas.

An apparatus for manufacturing a magnetic recording medium according to the present invention comprises a nonmagnetic substrate, a nonmagnetic underlayer, a magnetic layer and a protective layer formed thereon, and the nonmagnetic underlayer has a bcc structure. An apparatus for manufacturing a magnetic recording medium having an alignment adjustment layer formed between a non-magnetic substrate and a non-magnetic under layer to preferentially orient the non-magnetic under layer to (200). And a direction setting means for determining the direction of the film-forming particles emitted from the emission source, the direction setting means comprising: It is characterized in that the direction of the film-forming particles can be set so that the projection line of the film-forming particle trajectory on the plane perpendicular to the radial direction at the attachment point is inclined with respect to the non-magnetic substrate.

A magnetic recording / reproducing apparatus according to the present invention comprises a magnetic recording medium and a magnetic head for recording / reproducing information on / from the magnetic recording medium. The magnetic recording medium includes a non-magnetic substrate and a non-magnetic substrate formed thereon. The magnetic underlayer, the magnetic layer and the protective layer have a basic structure, the nonmagnetic underlayer has a bcc structure, and a nonmagnetic underlayer is provided between the nonmagnetic substrate and the nonmagnetic underlayer.
An orientation adjustment layer for preferentially orienting is formed, and the magnetic layer has a crystal structure in which columnar fine crystal grains are inclined in the circumferential direction,
The circumferential coercive force Hcc and the radial coercive force Hcr of the magnetic layer
The ratio Hcc / Hcr with respect to is set to be larger than 1. The nonmagnetic underlayer preferably has a configuration in which columnar fine crystal grains have a crystal structure inclined in the radial direction. The magnetic layer has a plurality of magnetic films, these magnetic films have an hcp structure and are preferentially oriented to (110), and antiferromagnetic coupling can be formed between these magnetic films. Is preferred. The orientation adjusting layer preferably has a structure in which columnar fine crystal grains are inclined in the radial direction.

[0010]

FIG. 1 shows a first embodiment of a magnetic recording medium according to the present invention. In the magnetic recording medium shown here, an orientation adjusting layer 2 is formed on a non-magnetic substrate 1; A nonmagnetic underlayer 3, a magnetic layer 4, a protective layer 5, and a lubricating layer 6 are sequentially formed thereon. FIG. 1A is a cross-sectional view showing the overall configuration of the magnetic recording medium of the present embodiment.
FIG. 2B is an enlarged view of a main part created based on a transmission electron microscope (TEM) photograph of a cross section of the magnetic recording medium.

As the non-magnetic substrate 1, a metal substrate made of a metal material such as aluminum or an aluminum alloy may be used, or a non-metal substrate made of a non-metal material such as glass, ceramic, silicon, silicon carbide or carbon may be used. It may be used. As the glass substrate, amorphous glass or crystallized glass can be used, and as the amorphous glass, general-purpose soda lime glass, aluminosilicate glass, or aluminosilicate glass can be used. As the crystallized glass, a lithium-based crystallized glass can be used. As a ceramic substrate,
A general-purpose sintered body mainly containing aluminum oxide, aluminum nitride, silicon nitride, or the like, or a fiber reinforced material thereof can be used. As the non-magnetic substrate 1, a glass substrate is preferably used from the viewpoint of durability, cost, and the like.
In addition, NiP is formed on the surface of these substrates by plating or the like.
A substrate on which a layer is formed can also be mentioned as the nonmagnetic substrate 1. In the present invention, a non-magnetic metal substrate made of aluminum or the like and a non-metal substrate such as a glass substrate are referred to as a non-magnetic substrate. The surface of the non-magnetic substrate 1 may be textured. Average roughness Ra of the surface of the substrate 1
Is 0.01 to 2 nm (preferably 0.05 to 1.5 n
m) is preferred.

The orientation adjusting layer 2 adjusts the crystal orientation of the nonmagnetic underlayer 3 formed immediately above, further adjusts the crystal orientation of the magnetic layer 4 formed thereon, and adjusts the magnetic orientation of the magnetic layer 4. This is for improving the anisotropy. The orientation adjustment layer 2
It is preferable to use one or more of Cr, V, Nb, Mo, W, and Ta. Thereby, the nonmagnetic underlayer 3 having the bcc structure can be preferentially oriented to (200). As the material of the orientation control layer 2, as a main component Cr (ie the Cr content exceeds 50at%) can also be an alloy, particularly CrX ₀ (X ₀ of V,
It is preferable to use one or more of Nb, Mo, Ta, and W) -based alloys. Thereby, the nonmagnetic underlayer 3 having the bcc structure can be preferentially oriented to (200). When a CrX ₀ -based alloy is used, the content of X ₀ is preferably 1 at% or more and less than 50 at%. By setting the content of X ₀ within the above range, the crystal orientation of the nonmagnetic underlayer 3 and the magnetic layer 4 can be increased, and the magnetic anisotropy can be improved.

The orientation adjusting layer 2 is made of an alloy X ₁ Ta containing Ta.
(X ₁ is Be, Co, Cr, Fe, Nb, Ni, V, Z
One or more of n and Zr) may be the main component and may have an Fd3m structure or an amorphous structure. Thereby, the nonmagnetic underlayer 3 having the bcc structure can be preferentially oriented to (200).
The orientation adjusting layer 2 is made of an alloy X ₂ Nb containing Nb (X ₂ is Be,
One or more of Co, Cr, Fe, Ni, Ta, V, Zn, and Zr) may be used as a main component and may have an Fd3m structure or an amorphous structure.
As a result, the non-magnetic underlayer 3 having the bcc structure is
0) can be preferentially oriented. Orientation adjustment layer 2
Is composed mainly of CoTa or CoNb, has a Ta or Nb content of 30 to 75 at%, and has an Fd3m structure or an amorphous structure. Thereby, the nonmagnetic underlayer 3 having the bcc structure can be preferentially oriented to (200). The orientation adjusting layer 2 is mainly composed of CrTa or CrNb, and has a Ta or Nb content of 1%.
The composition may be 5 to 75 at%. Thereby, the nonmagnetic underlayer 3 having the bcc structure can be preferentially oriented to (200). The orientation adjusting layer 2 is made of Ni
The main component is Ta or NiNb, the content of Ta or Nb is 30 to 75 at%, and Fd
A configuration having a 3m structure or an amorphous structure may be employed. Thereby, the nonmagnetic underlayer 3 having the bcc structure can be preferentially oriented to (200). The orientation adjusting layer 2 is made of CoTa, CoNb, CrTa, C
When rNb, NiTa, and NiNb are the main components, it is preferable that the content of Ta or Nb be in the above-described range. If the content is too high, the orientation in the magnetic layer may be reduced and the coercive force may be reduced. The orientation adjusting layer 2 is made of Ta or Nb at 30 at.
% Or more of a non-magnetic alloy material. Thereby, the nonmagnetic underlayer 3 having the bcc structure is formed.
Can be preferentially oriented to (200).

The orientation adjusting layer 2 may be made of a non-magnetic metal having an Fd3m structure (space group notation). Thereby, bc
The nonmagnetic underlayer 3 having the c structure can be preferentially oriented to (200). As the nonmagnetic metal having a Fd3m structure, CrNb system of CrX ₀ based alloy mentioned above (70
C15 such as Cr30Nb, CrTa-based (65Cr35Ta, etc.), CrTi-based (64Cr36Ti, etc.)
Structural (Skrukturbertcht Symbol notation) alloys are preferred. Other metals having the Fd3m structure include CoTa-based (65Co35Ta and the like), CoNb-based (70Co30Nb and the like), WHf-based (66W34Hf), and AlY-based (67Al33Y and the like).
And C15 structural alloys. In addition, CoTa-based (relatively C
An alloy having a low o content, for example, 50Co50Ta or the like, or an FeNb-based alloy (50Fe50Nb or the like) can also be used. When using a material having the Fd3m structure, it is preferable that the crystal structure (Fd3m structure) is adjusted by performing an oxidation treatment or a nitridation treatment (described later) during film formation. The orientation adjustment layer 2 not only adjusts the crystal orientation of the nonmagnetic underlayer 3 but also functions as a crystal grain refinement layer that refines crystal grains in the nonmagnetic underlayer 3 and the magnetic layer 4.

The orientation adjusting layer 2 contains 1a of nitrogen or oxygen.
It is preferable to contain t% or more. This is because by containing 1 at% or more of nitrogen or oxygen, the crystal of the nonmagnetic underlayer 3 can be more accurately oriented to (200) and the magnetic anisotropy of the magnetic layer 4 can be increased. .

As shown in FIG. 1B, the orientation adjusting layer 2
Means that the columnar fine crystal grains 2a are perpendicular to the line 2b
It is preferable to adopt a configuration having a crystal structure inclined in the radial direction with respect to That is, the inclination angle α of the columnar fine crystal grains 2a
It is preferable that 1 (the inclination in the axial direction of the columnar microcrystal grains 2a with respect to the vertical line 2b) is more than 0 ° and less than 90 °. The inclination angle α1 of the columnar fine crystal grains 2a is 10 to 7
5 ° (preferably 15 to 75 °, more preferably 20 °
To 75 °, more preferably 25 to 55 °). When the inclination angle α1 is less than the above range, the crystal orientation of the non-magnetic underlayer 3 and the magnetic layer 4 deteriorates, and the magnetic anisotropy decreases. Further, it is difficult to set the angle α1 to a range exceeding the above range from the viewpoint of the configuration of the film forming apparatus.
The inclination angle α1 can be set to a value that is equal to or more than 10 ° and less than 30 °. Further, it may be a value exceeding 65 ° and less than 90 °. The orientation adjusting layer 2 may have a configuration in which the inclination of the columnar fine crystal grains 2a gradually increases from the inner peripheral side to the outer peripheral side. When the columnar fine crystal grains 2a are inclined in the radial direction of the orientation adjusting layer 2, the inclination of the columnar fine crystal grains 2a in the circumferential direction may be arbitrary. A configuration that is hardly inclined in the direction is preferable.

It is desirable that the thickness of the alignment adjusting layer 2 is 2 to 100 nm. When the thickness is less than the above range, the magnetic anisotropy of the magnetic layer decreases, and when the thickness exceeds the above range, the production efficiency decreases.

The surface average roughness Ra of the orientation adjusting layer 2 is set to 0.1.
The thickness is preferably 4 nm or less (preferably 0.2 nm or less). When the surface average roughness Ra exceeds the above range,
The surface irregularities of the medium become large, and the glide height characteristics are reduced.

The nonmagnetic underlayer 3 is made of a conventionally known underlayer material, for example, one or more of Cr, V, and Ta, or an alloy obtained by adding other elements to these in a range that does not impair the crystallinity. can do. In particular, Cr
Or Cr alloy (for example, CrW, CrMo, CrV
System) is preferred. Also, as this material,
A material having a B2 structure such as Ni50Al (Ni-50 at% Al) can also be used. In addition, the nonmagnetic underlayer 3
May have a single-layer structure or a multilayer structure in which a plurality of two or more kinds of films are stacked. It is desirable that the thickness of the nonmagnetic underlayer 3 is 1 to 100 nm, preferably 2 to 50 nm.

The non-magnetic underlayer 3 has a bcc structure and an orientation plane (a dominant crystal plane on the surface of the non-magnetic underlayer 3) is (200).
Can be improved in magnetic anisotropy.

The nonmagnetic underlayer 3 can have a crystal structure in which columnar fine crystal grains are inclined in the radial direction.
FIG. 2 shows a nonmagnetic underlayer 3 having a structure in which columnar fine crystal grains are inclined. Has a crystal structure inclined in the radial direction with respect to. That is, the inclination angle α2 of the columnar microcrystal grains 3a (the inclination of the columnar microcrystal grains 3a in the axial direction with respect to the vertical line 3b) exceeds 0 ° and is less than 90 °. Inclination angle α of columnar microcrystal grains 3a
2 is 10 to 75 ° (preferably 15 to 75 °, more preferably 20 to 75 °, more preferably 25 to 55 °).
°). When the inclination angle α2 is less than the above range, the crystal orientation of the magnetic layer 4 deteriorates and the magnetic anisotropy decreases. Further, it is difficult to set the angle α2 to a range exceeding the above range from the viewpoint of the configuration of the film forming apparatus. The inclination angle α2 can be set to a value that is equal to or more than 10 ° and less than 30 °. Further, it may be a value exceeding 65 ° and less than 90 °. When the non-magnetic underlayer 3 has a configuration in which the columnar microcrystal grains 3a are inclined in the radial direction, the circumferential inclination of the columnar microcrystal grains 3a may be arbitrary.
A configuration in which the columnar fine crystal grains 3a are hardly inclined in the circumferential direction is preferable.

As shown below, the magnetic layer 4 has a structure in which antiferromagnetic coupling is formed between a plurality of magnetic films, that is, an antiferromagnetic coupling structure (a so-called AFC (Anti Ferro magnet)).
ic Coupling structure).
The magnetic layer 4 includes a first magnetic film 4a (upper layer side), a second magnetic film 4b (lower layer side), and an intermediate film 4 interposed therebetween.
c. The first and second magnetic films 4a, 4b include:
For example, Cr, Pt, Ta, B, Ti, Ag, Cu, A
1, Au, W, Nb, Zr, V, Ni, Fe and Mo
A Co alloy in which at least one of them is added to Co can be used. Preferred examples of the above materials include CoPt
System, CoCrPt system, CoCrPtTa system, CoCrP
tB type, CoCrPtBTa type, CoCrPtTaCu
System, CoCrPtTaZr system, CoCrPtTaW system,
CoCrPtCu, CoCrPtZr, CoCrP
tBCu, CoCrPtBZr, CoNiTa,
Alloys such as CoNiTaCr and CoCrTa can be used. Also, non-magnetic metals such as Ag, Ti, Ru, and C;
This nonmagnetic metal compound, oxide (SiO ₂ , SiO,
Al ₂ O ₃ ), nitride (Si ₃ N ₄ , AlN, TiN, B
N), a granular film in which magnetic particles are dispersed in a nonmagnetic base material such as a fluoride (CaF or the like) or a carbide (TiC or the like).

The thicknesses of the first and second magnetic films 4a and 4b are not particularly limited. However, if the thickness is too small, the volume of the magnetic particles becomes small, which is disadvantageous in terms of heat fluctuation resistance. There is a possibility that it becomes excessive and noise increases. Therefore, the thickness of the magnetic film 4a is 1 to 40 nm.
(Preferably 5 to 30 nm), and the thickness of the magnetic film 4 b is 1 to 20 nm (preferably 1 to 10 n).
m) is preferred. The coercive force of the first magnetic film 4a is 2000 (Oe) or more (preferably 3000 (Oe).
e) above). When the coercive force is less than the above range, the thermal fluctuation resistance of the magnetic film 4a decreases, and the effect of improving the thermal fluctuation resistance decreases. The coercive force of the first magnetic film 4a is preferably set to be larger than the coercive force of the second magnetic film 4b. In this case, the first magnetic film 4a
The main magnetic film has a larger coercive force than the second magnetic film 4b.
At this time, it is preferable that the coercive force of the entire magnetic layer 4 (magnetic recording medium) be equal to the coercive force of the main magnetic film.

The first and second magnetic films 4a and 4b have their magnetic moment directions facing each other by antiferromagnetic coupling via an intermediate film 4c, whereby the magnetic layer 4 has a laminated ferrimagnetic structure. Has become. The first and second magnetic films 4a and 4b have an hcp structure and have an orientation plane of (110).

The intermediate film 4c includes Ru, Cr, Ir, R
It is preferable to use a material containing at least one of h, Mo, Cu, Co, Re, and V as a main component. Among them, it is particularly preferable to use Ru. When Ru is used for the intermediate film 4c, the thickness of the intermediate film 4c is preferably set to 0.6 to 1 nm (preferably 0.7 to 0.9 nm).
If the thickness is less than the above range or exceeds the above range, the antiferromagnetic coupling between the two magnetic films 4a and 4b becomes insufficient, and the effect of improving the thermal fluctuation resistance is reduced. When Cr or a Cr alloy is used for the intermediate film 4c, its thickness is 2 to 3 nm (preferably 2.2 to 3 nm).
2.8 nm). If this thickness is less than the above range or exceeds the above range,
The antiferromagnetic coupling between the magnetic films 4a and 4b becomes insufficient, and the effect of improving the thermal fluctuation resistance is reduced.

As shown in FIG. 3, the magnetic layer 4 (first magnetic film 4a, intermediate film 4c, second magnetic film 4b) has columnar fine crystal grains 4d, 4e, 4f perpendicular to the non-magnetic substrate 1. It has a crystal structure inclined in the circumferential direction of the substrate 1 with respect to the line 4g. That is, the inclination angle α3 of the columnar microcrystal grains 4d, 4e, and 4f (the tilt in the axis direction of the columnar microcrystal grains 4d, 4e, and 4f with respect to the vertical line 4g) exceeds 0 ° and is less than 90 °. . Inclination angle α3 of columnar fine crystal grains 4d, 4e, 4f
Is 10 to 75 ° (preferably 15 to 75 °, more preferably 20 to 75 °, more preferably 25 to 55 °).
°). When the inclination angle α3 is less than the above range, the crystal orientation of the magnetic layer 4 deteriorates and the magnetic anisotropy decreases. Further, it is difficult to set the angle α3 to a range exceeding the above range from the viewpoint of the configuration of the film forming apparatus. The inclination angle α3 can be set to a value that is equal to or more than 10 ° and less than 30 °. Further, it may be a value exceeding 65 ° and less than 90 °. Columnar fine crystal grains 4d, 4e, 4f
May be inclined in the circumferential direction, and the inclination in the radial direction may be arbitrary. In other words, the direction of the columnar microcrystal grains when viewed in plan (the direction of the projection line on the substrate) may be along the tangent, or may be along the direction intersecting the tangent.

As the material of the protective layer 5, a conventionally known material may be used. For example, a single component such as carbon, silicon oxide, silicon nitride, zirconium oxide, or a material containing these as a main component may be used. it can. Protective layer 5
Is preferably 2 to 10 nm.

The lubricating layer 6 can be made of a fluorine-based lubricant such as perfluoropolyether.

The magnetic recording medium having the above structure has a ratio Hc between the coercive force Hcc in the circumferential direction of the magnetic layer 4 and the coercive force Hcr in the radial direction.
c / Hcr is larger than 1 (preferably 1.1 or more, more preferably 1.2 or more). This ratio Hcc
When / Hcr is less than the above range, the magnetic anisotropy of the magnetic recording medium becomes insufficient, and the magnetic characteristics such as thermal fluctuation resistance, error rate, and noise characteristics become insufficient. Tsu

Next, an embodiment of a method for manufacturing a magnetic recording medium according to the present invention will be described by taking, as an example, the case of manufacturing the magnetic recording medium. FIG. 4 shows an embodiment of a magnetic recording medium manufacturing apparatus according to the present invention. The sputtering apparatus 21 shown here is for forming the orientation adjustment layer 2 on the non-magnetic substrate 1, and includes a sputtering target 22 as an emission source for emitting film-forming particles, and a sputtering target 22 emitted from the sputtering target 22. A shielding plate 23 which is a direction setting means for determining the direction of the film particles is provided in the chamber 28. Reference numeral 29 denotes an introduction path for introducing a sputtering gas or the like into the chamber 28, and reference numeral 30 denotes a derivation path for leading the sputtering gas or the like in the chamber 28 from the chamber 28.

The sputtering target 22 is made of a constituent material of a layer to be formed, and is formed in a disk shape. The shielding plate 23 is used to determine the direction of the film-forming particles by blocking the film-forming particles emitted in a direction other than the intended direction among the film-forming particles emitted from the sputtering target 22. A circular film-forming particle passing port 24 is formed substantially at the center. The shielding plate 23 is provided substantially parallel to the sputtering target 22 and at a predetermined interval from the sputtering target 22. The shielding plate 23 has an axis 23 a which is the axis 2 of the sputtering target 22.
It is installed so as to substantially coincide with 2a. In order to increase the accuracy of the incident angle of the film-forming particles, the shielding plate 23 is required.
Is preferably formed as thin as possible. For example, when the non-magnetic substrate 1 having an outer diameter of 2.5 inches (63.5 mm) is used, the thickness of the shielding plate 23 is preferably 1.5 to 5 mm (preferably 2 to 4 mm). For the shielding plate 23, it is preferable to use a metal material (for example, stainless steel or an aluminum alloy) that is excellent in heat resistance and generates little impurities. In particular, the work of removing adhered film-forming particles is easy, and It is preferable to use an aluminum alloy because it is inexpensive.

The inner diameter of the film-forming particle passage 24 is determined by the angle of incidence of the film-forming particles on the non-magnetic substrate 1 when the discharged film-forming particles adhere to the orientation adjusting layer forming region 1b on the surface 1a of the non-magnetic substrate 1. Preferably, α is set to be 10 to 75 °. The incident angle α is an angle with respect to a line 1c perpendicular to the non-magnetic substrate 1. It is preferable that the inner diameter of the film-forming particle passage 24 be small as long as the film-forming efficiency is not reduced. For example, when a non-magnetic substrate 1 having an outer diameter of 2.5 inches (63.5 mm) is used, the inner diameter of the film-forming particle passage 24 should be 20 mm or less (preferably 15 mm or less, more preferably 7 mm or less). Is preferred.

In order to form the orientation adjusting layer 2 using the sputtering apparatus 21, the non-magnetic substrate 1 is loaded into the chamber 28, and the non-magnetic substrate 1 is placed on the opposite side (left side in the figure) of the shielding plate 23 to the sputtering target 22 side. The non-magnetic substrate 1 is arranged. At this time, the non-magnetic substrate 1 includes a sputtering target 22,
It is arranged substantially parallel to the shielding plate 23.

Next, a sputtering gas such as argon is introduced into the chamber 28 through the introduction path 29, and at the same time, power is supplied to the sputtering target 22 to discharge film-forming particles by a sputtering method. At this time, of the film-forming particles emitted from the film-forming particle emission points 25, 25 at a position slightly away from the central portion of the sputtering target 22,
The one facing the center of the shielding plate 23 is the film-forming particle passage 2
4 and the others are blocked by the shielding plate 23.

As shown in FIGS. 4 and 5, the film-forming particles having passed through the film-forming particle passage opening 24 are discharged from a film-forming particle discharge point 25 slightly away from the central portion of the target 22, and The projection line 27 of the film-forming particle trajectory 26 on the substrate surface 1a is substantially along the radial direction of the non-magnetic substrate 1 because the film 23 has passed through the film-forming particle passage opening 24 in the central portion 23 (see FIG. 4). (See FIG. 5). Therefore, the film-forming particles uniformly adhere to the surface 1 a in the circumferential direction of the substrate 1. The film-forming particles adhere to the annular alignment adjustment layer forming region 1b on the surface 1a, which is the surface to be adhered, so that the incident angle α is preferably 10 to 75 °. The incident angle α is 15 to 75
° (preferably 20-75 °, more preferably 25-
55 °). This incident angle α
Is less than the above range, the crystal orientation of the nonmagnetic underlayer 3 and the magnetic layer 4 deteriorates, and the magnetic anisotropy decreases. In addition, it is difficult to set the incident angle α to a range exceeding the above range from the viewpoint of the device configuration. The inclination angle α is 10 ° or more,
The value may be less than 30 °. Further, it may be a value exceeding 65 ° and 75 ° or less.

By setting the incident angle α within the above range, as shown in FIG. It has a crystal structure inclined in the radial direction.

The orientation adjusting layer 2 is preferably subjected to an oxidation treatment or a nitridation treatment. In order to perform the oxidation treatment or the nitridation treatment, a method of using a gas containing oxygen or nitrogen as a sputtering gas introduced into the chamber 28 through the introduction path 29 when forming the orientation adjustment layer 2 using the sputtering apparatus 21 is employed. Can be. As a sputtering gas containing oxygen, a mixed gas of oxygen and argon can be used. As a sputtering gas containing nitrogen, a mixed gas of nitrogen and argon can be used. The content of oxygen or nitrogen in the mixed gas can be 1 to 50 vol%.

In the present invention, after forming the orientation adjusting layer 2, the surface thereof may be oxidized or nitrided by a method of contacting the surface with an oxygen-containing gas or a nitrogen-containing gas. Air, pure oxygen, and water vapor can be used as the oxygen-containing gas. An oxygen-enriched gas having an increased oxygen content in the air can also be used. As the nitrogen-containing gas, air, pure nitrogen, or a nitrogen-enriched gas can be used.

An oxygen-containing gas or a nitrogen-containing gas
As a specific example of the method of contacting the element-containing gas,
As described above, the orientation adjustment is performed on the substrate 1 in the sputtering apparatus 21.
After forming the rectifying layer 2, the introduction path 29 is introduced into the chamber 28.
Through which oxygen-containing gas or nitrogen-containing gas is introduced
Law. Oxygen-containing gas or nitrogen-containing
The oxygen or nitrogen content in the gas is 1 to 100 vol%
It can be. The amount of oxygen and nitrogen to be introduced
Orientation by appropriately setting the exposure time to nitrogen and nitrogen
The degree of oxidation (nitriding) of the adjustment layer 2 can be adjusted.
You. For example, 10 ^-Four-10^-6For a degree of vacuum of Pa, 10
^-3In an atmosphere with an oxygen gas pressure of Pa or more,
By exposing for 0.1 to 30 seconds, the specified oxidation state
Obtainable. Oxygen-containing gas or nitrogen-containing gas
Depending on use, oxidation or nitrogen treatment can be performed easily.
Will be able to do it. This oxidation or nitridation
By the treatment, at least the vicinity of the surface of the alignment adjustment layer 2 is acidified.
Or nitrided.

In order to perform the oxidation treatment or the nitridation treatment,
It is also possible to adopt a method in which after the orientation adjusting layer 2 is formed using a gas containing oxygen or nitrogen as a sputtering gas, the surface thereof is brought into contact with an oxygen-containing gas or a nitrogen-containing gas. Further, a method of exposing the surface of the orientation adjusting layer 2 to the atmosphere can be adopted.

When the nonmagnetic underlayer 3 has a crystal structure in which the columnar fine crystal grains are inclined in the radial direction, the nonmagnetic underlayer 3 can be formed using the sputtering apparatus 21. That is, as in the case of forming the orientation adjusting layer 2, the film-forming particles are released from the sputtering target 22 and adhere to the surface to be adhered.
The non-magnetic underlayer 3 can be formed by setting the direction of the film-forming particles so that the projection line 27 on the surface to be adhered substantially follows the radial direction of the substrate 1 and is inclined with respect to the substrate 1.

FIGS. 6 and 7 show a sputtering apparatus 31 for forming a magnetic layer 4 having a crystal structure in which columnar fine crystal grains are inclined in the circumferential direction of the substrate. The sputtering apparatus 31 shown here includes a sputtering target 32 as an emission source for emitting film-forming particles, and a shielding plate 33 as direction setting means for determining the direction of the film-forming particles emitted from the sputtering target 32. Inside.
Reference numeral 39 denotes an introduction path for introducing a sputtering gas or the like into the chamber 38, and reference numeral 40 denotes a derivation path for leading the sputtering gas or the like in the chamber 38 from the chamber 38.

The sputtering target 32 is made of the constituent material of the magnetic layer 4 and is formed in a disk shape. The shielding plate 33 is used to determine the direction of the film-forming particles by blocking the film-forming particles emitted in a direction other than the intended direction among the film-forming particles emitted from the sputtering target 32. A base 33a, and a plurality of shielding plate bodies 33b attached to the base 33a. At the center of the base 33a, a circular film-forming particle passage port 34 is formed.

The shielding plate main body 33b is formed in a thin plate shape having a width gradually increasing from one end to the other end, and is arranged along the radial direction of the passage 34. The shield plate main body 33b is fixed to the base 33a in a state where one end side having a small width is arranged at the center of the passage opening 34 and the other end side having a large width is arranged near the inner edge of the passage opening 34. The shielding plate main body 33b is fixed to the base 33a in a state of being inclined in the circumferential direction of the base 33a. Only the light emitted in the direction (i.e., direction) passes through the gap in the shielding plate main body 33b.

The angle of inclination of the shielding plate main body 33b is determined by the incident angle β of the film-forming particles to the non-magnetic substrate 1 when the emitted film-forming particles adhere to the surface (adhering surface) 3c of the non-magnetic underlayer 3. It is preferable to set the angle to 10 to 75 °.
The incident angle β refers to an angle with respect to a line 1c perpendicular to the non-magnetic substrate 1, as described later.

In order to improve the accuracy of the incident angle of the film-forming particles,
It is preferable that the shielding plate body 33b be formed as thin as possible. For example, when the non-magnetic substrate 1 having an outer diameter of 2.5 inches (63.5 mm) is used, the thickness of the shielding plate main body 33b is preferably set to 0.5 to 2 mm. Shield plate body 33b
It is preferable to use a metal material (e.g., stainless steel, aluminum alloy) that is excellent in heat resistance and generates few impurities. Particularly, the operation of removing adhered film-forming particles is easy and inexpensive. For this reason, it is preferable to use an aluminum alloy. The plurality of shielding plate main bodies 33b are provided at intervals in the circumferential direction of the passage port 34.

In order to form the magnetic layer 4 by using the sputtering apparatus 31, a disk D having a non-magnetic underlayer 3 formed on its surface is loaded into a chamber 38, and the shielding plate 33 is placed on the sputtering target 32 side. Place it on the opposite side (left side in the figure). At this time, the center axis of the disk D is the shielding plate 33.
Are arranged so as to substantially coincide with the central axis of the. The disk D is disposed substantially parallel to the base 33a of the shielding plate 33 and the sputtering target 32.

Next, a sputtering gas such as argon is introduced into the chamber 38 through the introduction path 39, and at the same time, power is supplied to the sputtering target 32 to discharge film-forming particles by the sputtering method. Of the film-forming particles released from the sputtering target 32, the shielding plate main body 3
Those emitted in the direction along 3b (the direction inclined in the circumferential direction of the substrate) adhere to the surface 3c of the nonmagnetic underlayer 3 through the gap in the shielding plate main body 33b and are emitted in other directions. The object is shielded by the shield plate body 33b.

In FIG. 7, reference numeral 42 denotes a radial direction 41 at a point 35 where the film-forming particles adhere to the surface 3c (film-forming particle attachment point) 35.
Shows a plane perpendicular to. As shown in FIGS. 6 and 7,
Since the film-forming particles that have passed through the shielding plate 33 have passed through the gap in the shielding plate main body 33b, the trajectory 36 is inclined in the circumferential direction of the substrate 1. That is, the vertical surface 4
The projection line 37 of the film-forming particle trajectory 36 onto the non-magnetic substrate 1
Would lean against The incident angle β of the film-forming particles with respect to the non-magnetic substrate 1 (the angle of the projection line 37 with respect to the line 1c perpendicular to the non-magnetic substrate 1) is preferably 10 to 75 °. This incident angle β is 15 to 75 ° (preferably 2
0-75 °, more preferably 25-55 °). If the incident angle β is less than the above range, the crystal orientation of the non-magnetic underlayer 3 and the magnetic layer 4 deteriorates, and the magnetic anisotropy decreases. In addition, it is difficult to set the incident angle β in a range exceeding the above range from the viewpoint of the device configuration.

When the magnetic layer 4 is formed, it is preferable that the shielding plate 33 or the disk D is rotated in the circumferential direction so that the amount of deposited particles is uniform in the circumferential direction.

By forming the magnetic layer 4 using the sputtering device 31, as shown in FIG. 3, the magnetic layer 4 has columnar fine crystal grains which grow in the above-mentioned incident direction of the film-forming particles and are inclined in the circumferential direction. It has a crystal structure of

The nonmagnetic underlayer 3 grown under the influence of the orientation adjusting layer 2 has excellent crystal orientation. The nonmagnetic underlayer 3 has a bcc structure, and the orientation plane (the dominant crystal orientation plane in the nonmagnetic underlayer 3) is (200). As a result of the nonmagnetic underlayer 3 having excellent crystal orientation, the crystal orientation of the magnetic layer 4 formed thereon is improved. First and second magnetic films 4a, 4a of magnetic layer 4
b has an hcp structure, and the orientation plane (the dominant crystal orientation plane in the magnetic layer 4) is (110).

The protective layer 5 can be formed by a plasma CVD method, a sputtering method or the like. For forming the lubricating layer 6, a method of applying a lubricant such as a fluorine-based liquid lubricant such as perfluoropolyether on the protective layer 5 by a dipping method can be adopted.

The magnetic recording medium of the present embodiment has the magnetic layer 4
However, since the columnar fine crystal grains have a crystal structure inclined in the circumferential direction, the magnetic anisotropy of the magnetic layer 4 in the circumferential direction can be increased. Since the magnetic anisotropy in the circumferential direction is increased in the magnetic film 4, the crystal magnetic anisotropy constant (Ku) can be increased, so that the resistance to thermal fluctuation can be improved.

Further, since the magnetic anisotropy in the circumferential direction can be increased in the magnetic layer 4, the half width of the isolated reproduction wave can be reduced, and the resolution of the reproduction output can be improved. Therefore, the error rate can be improved. Also,
By increasing the magnetic anisotropy, the coercive force is improved,
The reproduction output can be improved. Therefore, the SNR
It is possible to improve noise characteristics such as noise.

Furthermore, since the magnetic layer 4 has a structure in which the first and second magnetic films 4a and 4b are formed and antiferromagnetic coupling is formed between them, the magnetic layer 4 has By the ferromagnetic coupling, an apparently small state of magnetization is obtained. Therefore, the volume of the magnetic particles can be made sufficiently large without adversely affecting the noise characteristics and the resolution, and the thermal stabilization can be achieved. Therefore, the thermal fluctuation resistance can be further enhanced.

In general, the strength of antiferromagnetic coupling between two magnetic films is greatly affected by the thickness of an intermediate film provided between the magnetic films. For example, when using Ru for the intermediate film,
The antiferromagnetic coupling strength between the magnetic films is 0.8
It takes a maximum value when the thickness is around nm, and the thickness of the intermediate film is
When the thickness becomes slightly larger or smaller than the thickness corresponding to the maximum value, the antiferromagnetic coupling strength is greatly reduced. For this reason, when the antiferromagnetic coupling structure (AFC structure) is adopted for the magnetic layer, if the surface unevenness of the film formed under the magnetic layer is large, the thickness of the intermediate film becomes uneven, and In addition, the antiferromagnetic coupling strength tends to decrease, and the thermal fluctuation resistance tends to be insufficient. On the other hand, in the magnetic recording medium of the present embodiment, since the magnetic anisotropy of the magnetic layer 4 can be improved, texture processing is not required at the time of manufacturing. Prevent the non-uniformity, increase the antiferromagnetic coupling strength,
A sufficient effect of improving thermal fluctuation resistance can be obtained.

Further, in the magnetic recording medium of the present embodiment, an orientation adjusting layer 2 is formed between the non-magnetic substrate 1 and the non-magnetic underlayer 3, and the orientation adjusting layer 2 includes columnar fine crystal grains 2a. With a configuration having a crystal structure inclined in the radial direction, the crystal orientation of the nonmagnetic underlayer 3 and the magnetic layer 4 can be improved, and the magnetic anisotropy of the magnetic layer 4 in the circumferential direction can be increased. Since the magnetic anisotropy in the circumferential direction is increased in the magnetic film 4, the crystal magnetic anisotropy constant (Ku) can be increased, so that the resistance to thermal fluctuation can be improved.

Further, since the surface smoothness of the orientation adjusting layer 2 can be enhanced, the surface average roughness Ra of the medium can be reduced, and excellent glide height characteristics can be obtained.
Further, since texture processing is not required, manufacturing is facilitated and manufacturing cost can be reduced.

Further, since the crystal grains in the nonmagnetic underlayer 3 can be made finer and the magnetic grains in the magnetic layer 4 grown under the influence of the underlayer 3 can be made finer and uniform, noise can be reduced. be able to. Therefore, noise characteristics can be further improved.

When the orientation adjusting layer 2 is made of a nonmagnetic metal having an Fd3m structure, the crystal orientation of the nonmagnetic underlayer 3 and the magnetic layer 4 is improved, and
Can further increase the magnetic anisotropy.

The manufacturing method according to the above-described embodiment uses the magnetic layer 4
Is formed, the direction of the film-forming particles is set so that the projection line 37 of the film-forming particle trajectory 36 on the surface 42 perpendicular to the radial direction 41 at the film-forming particle attachment point 35 is inclined with respect to the non-magnetic substrate 1. . For this reason, the magnetic layer 4 in which the columnar fine crystal grains are inclined in the circumferential direction can be easily formed, and the magnetic anisotropy of the magnetic layer 4 can be increased. Therefore, the resistance to thermal fluctuation can be improved. In addition, it is possible to improve magnetic characteristics such as an error rate and a noise characteristic and to obtain excellent glide height characteristics.

In the manufacturing method of the above embodiment, the film formation particles are released from the sputtering target 22 and adhered to the surface 1 a of the non-magnetic substrate 1, thereby forming the alignment adjustment layer 2.
Is formed such that the projection line 27 of the trajectory 26 of the film-forming particles onto the non-magnetic substrate 1 is substantially along the radial direction of the non-magnetic substrate 1 and obliquely enters the non-magnetic substrate 1. By setting the direction, the magnetic anisotropy in the magnetic layer 4 can be increased. For this reason, the thermal fluctuation resistance can be improved. In addition, it is possible to improve magnetic characteristics such as an error rate and a noise characteristic and to obtain excellent glide height characteristics.

Also, since the magnetic anisotropy of the magnetic layer 4 can be improved without performing texture processing, it is possible to prevent the glide height characteristic from deteriorating due to the increase in the surface roughness of the medium due to the surface unevenness of the texture processing. Can be prevented. In addition, since texture processing is not required during manufacturing, manufacturing is facilitated and manufacturing cost can be reduced.

By oxidizing or nitriding the surface of the orientation adjusting layer 2, the orientation of the nonmagnetic underlayer 3 is set to (200), and the magnetic anisotropy of the magnetic layer 4 is further increased.
Thermal fluctuation resistance, error rate, noise characteristics, and the like of the magnetic recording medium can be improved.

In the above-described manufacturing method, since the sputtering method using the sputtering target 22 as the emission source of the film-forming particles is employed in forming the alignment adjusting layer 2, the alignment adjusting layer 2 can be easily formed.

Further, by performing the oxidation treatment or the nitridation treatment by a method of forming the orientation adjustment layer 2 using a sputtering gas containing oxygen or nitrogen, the formation of the orientation adjustment layer 2 and the oxidation or nitrogen treatment are performed in one. This can be performed in a process, and the manufacturing process can be simplified. Therefore, the work can be facilitated and the production efficiency can be improved.

When the oxidation treatment or the nitriding treatment is performed by bringing the surface of the orientation adjusting layer 2 into contact with an oxygen-containing gas or a nitrogen-containing gas, the orientation adjusting layer 2 is formed, the obtained medium substrate M (having the orientation adjusting layer 2 formed on the non-magnetic substrate 1) is not carried out from the sputtering apparatus 21 and is continuously placed in the sputtering apparatus 21. The surface can be oxidized or nitrided. Therefore, the manufacturing process can be simplified, the work can be simplified, and the manufacturing efficiency can be improved.

The sputtering apparatus 31 includes a sputtering target 32 and a shielding plate 33 for determining the direction of the emitted film-forming particles. Since only the light emitted in the direction inclined in the circumferential direction passes through the gap of the shielding plate main body 33b, the incident direction of the film-forming particles to the non-magnetic substrate 1 can be accurately determined. . Therefore, the crystal orientation of the magnetic layer 4 can be improved, and the magnetic anisotropy of the magnetic layer 4 can be reliably increased.

Since the sputtering apparatus 21 includes the sputtering target 22 as a source for emitting the film-forming particles and the shielding plate 23 for determining the direction of the film-forming particles emitted, Can be accurately determined. For this reason, the crystal orientation of the nonmagnetic underlayer 3 and the magnetic layer 4 can be improved, and the magnetic anisotropy of the magnetic layer 4 can be reliably increased.

In the above embodiment, the magnetic recording medium having the orientation adjusting layer 2 having a crystal structure in which the columnar fine crystal grains 2a are inclined in the radial direction is exemplified. However, the magnetic recording medium of the present invention is not limited to this, The adjustment layer 2 may not have the crystal grain tilt structure. The nonmagnetic underlayer 3 also has a structure in which the columnar fine crystal grains 3a are inclined in the radial direction. However, the present invention is not limited to this, and a configuration in which the crystal grains are not inclined is also possible. Further, in the magnetic recording medium of the above embodiment, in all of the first magnetic film 4a, the intermediate film 4c, and the second magnetic film 4b,
Although the columnar fine crystal grains 4d, 4e, and 4f are configured to be inclined, the present invention is not limited to this, and the first magnetic film 4a, the intermediate film 4
(c) At least one of the second magnetic films 4b may have a structure in which columnar fine crystal grains are inclined. In particular, it is preferable that all the magnetic films (the first magnetic film 4a and the second magnetic film 4b in this example) have a structure in which crystal grains are inclined.

In the present invention, the orientation adjusting layer may be made of a NiP alloy having an amorphous structure (amorphous NiP alloy). As a magnetic recording medium in which the orientation adjusting layer is made of an amorphous NiP alloy,
The structure shown in FIG. 1A can be exemplified. A second embodiment of the magnetic recording medium of the present invention will be described with reference to FIG. In the magnetic recording medium of the present embodiment, the orientation adjusting layer 2 is made of N
It differs from that of the first embodiment in that it is made of an iP alloy. The Ni content of the orientation adjusting layer 2 is 50 to
Preferably it is 90 at%. The orientation adjusting layer 2 made of an amorphous NiP alloy can be formed in the same manner as in the above manufacturing method. That is, amorphous NiP
Sputtering target 22 made of alloy and shielding plate 2
The sputtering device 21 having the sputtering target 3 is used to deposit the film-forming particles from the sputtering target 22, preferably at an incident angle α.
Is attached to the surface 1a of the non-magnetic substrate 1 so that the angle?

In forming the alignment adjusting layer 2, according to the method described above, a sputtering gas containing oxygen or nitrogen is used, or the surface of the alignment adjusting layer 2 is brought into contact with an oxygen-containing gas or a nitrogen-containing gas to form an alignment. The adjustment layer 2 is subjected to an oxidation treatment or a nitridation treatment. Thereby, there is a possibility that at least the surface of the alignment adjustment layer 2 is crystallized. This magnetic recording medium has a coercive force H in the circumferential direction of the magnetic layer 4.
The ratio Hcc / Hcr between cc and the coercive force Hcr in the radial direction is:
1 (preferably 1.1 or more, more preferably 1.2 or more).

In this magnetic recording medium, similarly to the magnetic recording medium of the first embodiment, the crystal orientation of the non-magnetic underlayer 3 and the magnetic layer 4 can be improved, and the magnetic anisotropy can be increased. Therefore, magnetic characteristics such as thermal fluctuation resistance, error rate, and noise characteristics can be improved. In addition, glide height characteristics can be improved.

FIG. 8 shows a third embodiment of the magnetic recording medium of the present invention. In the magnetic recording medium shown in FIG. A first intermediate film 14d between the first and second magnetic films 14a and 14b;
1 in that a second intermediate film 14e is provided between the second and third magnetic films 14b and 14c. The first to third magnetic films 14a, 14b,
The magnetic material exemplified as the material of the magnetic films 4a and 4b can be used for 14c. First magnetic film 14a
Is preferably 2000 (Oe) or more (preferably 3000 (Oe) or more). When the coercive force Hc1 is less than the above range, the thermal fluctuation resistance of the magnetic film 14a decreases, and the effect of improving the thermal fluctuation resistance decreases. The coercive force Hc1 of the first magnetic film 14a is preferably set to be larger than the coercive forces Hc2 and Hc3 of the second and third magnetic films 14b and 14c. In this case, the first magnetic film 14a is a main magnetic film having the largest coercive force.

The first to third magnetic films 14a, 14b, 1
The thickness of 4c is not particularly limited. However, if it is too small, the volume of the magnetic particles becomes small, which is disadvantageous in terms of heat fluctuation resistance. Therefore, the thickness of the first magnetic film 14a is preferably 1 to 40 nm (preferably 5 to 30 nm), and the thickness of the second and third magnetic films 14b and 14c is 1 to 20 nm (preferably 1 to 10 nm). First and second intermediate films 14d, 14e
Can be the same as the material and thickness of the above-described intermediate film 4c.

The magnetic layer 14, like the magnetic layer 4 of the magnetic recording medium of the first embodiment, has a structure in which columnar fine crystal grains are inclined in the circumferential direction. The magnetic layer 14 includes a magnetic film 14a,
In all of the layers 14b and 14c and the intermediate films 14d and 14e, a configuration in which columnar microcrystal grains are inclined may be employed, or a structure in which columnar microcrystal grains are inclined in at least one of them may be employed. In particular, it is preferable that all the magnetic films (magnetic films 14a, 14b, 14c) have a structure in which crystal grains are inclined.

In the magnetic recording medium of the present embodiment, the antiferromagnetic coupling magnetic field of the second magnetic film 14b adjacent to the first magnetic film 14a having the largest coercive force via the intermediate film 14d is:
It is preferable that the coercive force is larger than the coercive force of the magnetic film. Hereinafter, this will be described with reference to FIG. FIG. 9 shows a hysteresis curve of the magnetic recording medium of the present embodiment. In this magnetic recording medium, the uppermost magnetic film (first magnetic film 1)
4a), the magnetization reversal occurs individually in the other magnetic films (second and third magnetic films 14b and 14c), so that the hysteresis curve has a plurality of steps (magnetization reversal portions). That is, as shown in FIG. 9A, the curve drawn in the process of reducing the external magnetic field H is the second magnetic film 14.
b, the magnetization reversal part R2 (the external magnetic field H and the magnetization M are in the first quadrant where both are positive), the magnetization reversal part R3 of the third magnetic film 14c, and the magnetization reversal part R1 of the first magnetic film 14a. Is obtained. The magnetization reversal units R2, R3,
In R1, the rate of decrease in magnetization, which becomes smaller as the external magnetic field H decreases, suddenly increases. The broken line in the figure shows a part of a hysteresis curve (minor loop) created by increasing or decreasing the external magnetic field H near these magnetization reversal parts.

In this magnetic recording medium, the external magnetic field H
In the region A1 in which the magnetic field is sufficiently high, the magnetization directions of the three magnetic films are all positive. However, as the external magnetic field H is reduced, the magnetization direction of the second magnetic film 14b is first switched in the magnetization switching section R2. And the second magnetic film 14b in the region A2
Becomes the negative direction. When the external magnetic field H is further reduced, the magnetization direction of the third magnetic film 14c is reversed in the magnetization reversal part R3, and the magnetization direction of the third magnetic film 14c in the region A3 becomes negative. When the external magnetic field H is further reduced, the magnetization direction of the first magnetic film 14a is reversed in the magnetization reversal part R1 to become a negative direction, and reaches the region A4, and becomes completely negative. Here, the coercive force Hc of the entire magnetic layer 14 is
It becomes almost equal to the coercive force Hc1 of the first magnetic film 14a having the largest coercive force. The external magnetic field H at which the absolute value of the differential value of the hysteresis curve near the magnetization reversal portion R1 has a peak is changed to the coercive force Hc.
Set to 1. Hc2A and Hc2B are the external magnetic fields at which the absolute value of the differential value of the hysteresis curve (minor loop) MR2 near the magnetization reversal part R2 is a peak, and the average value of these Hc2A and Hc2B is the antiferromagnetic coupling magnetic field Hbias2. Hc2A and Hbia
The difference from s2 is defined as the coercive force Hc2 of the second magnetic film 14b. In the magnetic recording medium shown here, as shown in FIG.
The external magnetic field H corresponding to the center of the hysteresis curve (minor loop) MR2 in the magnetization switching portion R2 of the second magnetic film 14b
Is larger than the coercive force Hc2 of the second magnetic film. Therefore, when the external magnetic field H is reduced to zero from a state where the magnetization directions of the three magnetic films are all set to the positive direction by applying a high external magnetic field H, the second magnetic film 14b
The antiferromagnetic coupling with the magnetic films 14a and 14c vertically adjacent to each other ensures that the magnetization direction is reversed and the magnetization direction becomes negative. Therefore, in reproduction in a state where the external magnetic field is zero due to antiferromagnetic coupling, the magnetization of the magnetic layer 14 is apparently obtained by subtracting the magnetization of the magnetic film 14b from the total magnetization of the magnetic films 14a, 14b and 14c. It can be a value. As a result, the magnetization of the entire magnetic layer 14 is apparently reduced, and the effect of improving the thermal fluctuation resistance can be reliably obtained without deteriorating the noise characteristics and the resolution.
On the other hand, when the antiferromagnetic coupling magnetic field Hbias2 is smaller than the coercive force Hc2, the antiferromagnetic coupling between the magnetic films becomes insufficient, and even when the external magnetic field is zero, the second magnetic film 14
b, the magnetization direction of the magnetic layer 14 is not reversed.
The overall magnetization will increase, which can adversely affect noise characteristics and resolution. Furthermore, the effect of increasing the effective volume of the magnetic particles is weakened due to insufficient antiferromagnetic coupling between the magnetic films, and the effect of increasing the resistance to thermal fluctuation may be reduced.

In the magnetic recording medium of the present embodiment, the magnetic layer 1
4 is the first to third magnetic films 14a, 14b, 14c
And the first and second interlayer films 1 provided therebetween.
4d and 14e, the first magnetic film having two magnetic films
Compared to the magnetic recording medium of the embodiment (FIG. 1).
The thickness of the magnetic film 14a can be set small without reducing the effective volume of the entire magnetic particles. Therefore, the thermal fluctuation resistance can be improved, the disturbance of the magnetization direction in the magnetic film 14a can be minimized, and the noise characteristics and resolution in recording and reproduction can be improved. The magnetic recording medium of this embodiment has two laminated structures each composed of a magnetic film and an intermediate film adjacent to the magnetic film (the magnetic film 14b and the intermediate film 14d).
A first laminated structure comprising a magnetic film 14c and an intermediate film 14
e), but in the present invention, the magnetic layer may be configured to have three or more laminated structures composed of a magnetic film and an intermediate film adjacent thereto.
In this case, the effective volume of the magnetic particles of the magnetic film can be further increased, so that the thermal fluctuation resistance can be improved.

FIG. 10 shows a fourth embodiment of the magnetic recording medium of the present invention.
A nonmagnetic intermediate layer 1 is provided between the nonmagnetic underlayer 3 and the magnetic layer 14.
5 are provided. It is preferable to use a nonmagnetic material having an hcp structure for the nonmagnetic intermediate layer 15. For the non-magnetic intermediate layer 15, it is preferable to use a CoCr-based alloy.
Pt, Ta, ZrNb, Cu, Re, N
An alloy to which one or more of i, Mn, Ge, Si, O, N, and B are added can also be used. The thickness of the nonmagnetic intermediate layer 15 is preferably 20 nm or less (preferably 10 nm or less) in order to prevent the magnetic particles in the magnetic layer 14 from becoming coarse. In the magnetic recording medium of the present embodiment, by providing the non-magnetic intermediate layer 15, the orientation of the magnetic layer 14 can be increased, and the thermal fluctuation resistance can be further improved.

The nonmagnetic intermediate layer 15 is made of a crystal in which columnar fine crystal grains are inclined in the radial or circumferential direction, similarly to the orientation adjusting layer 2, the nonmagnetic underlayer 3, and the magnetic layer 4 shown in FIGS. A configuration having a structure can also be adopted. The inclination angles of the columnar microcrystal grains can be the same as those of the columnar microcrystal grains of the orientation adjustment layer 2, the nonmagnetic underlayer 3, and the magnetic layer 4. In order to form the non-magnetic intermediate layer 15 having a crystal structure in which the columnar fine crystal grains are inclined in the radial direction or the circumferential direction, a method similar to the method of forming the orientation adjusting layer 2, the non-magnetic underlayer 3, and the magnetic layer 4 is used. A method can be adopted. Thereby, the magnetic anisotropy of the magnetic layer 14 can be further increased, and the thermal fluctuation resistance can be improved.

FIG. 11 shows a fifth embodiment of the magnetic recording medium of the present invention.
A second underlayer 1 is provided between the orientation adjusting layer 2 and the nonmagnetic underlayer 3.
6 are provided. For the second underlayer 16, Cr or a Cr alloy can be used. In this magnetic recording medium, the crystal orientation of the nonmagnetic underlayer 3 and the magnetic layer 14 can be improved, and the magnetic anisotropy of the magnetic layer 14 can be further increased.

The second underlayer 16 is, like the orientation adjustment layer 2, the nonmagnetic underlayer 3, and the magnetic layer 4 shown in FIGS. 1 to 3, a crystal in which columnar fine crystal grains are inclined in a radial direction or a circumferential direction. A configuration having a structure can also be adopted. The inclination angles of the columnar microcrystal grains can be the same as those of the columnar microcrystal grains of the orientation adjustment layer 2, the nonmagnetic underlayer 3, and the magnetic layer 4. In order to form the second underlayer 16 having a crystal structure in which the columnar fine crystal grains are inclined in the radial direction or the circumferential direction, a method similar to the method of forming the orientation adjustment layer 2, the nonmagnetic underlayer 3, and the magnetic layer 4 is used. A method can be adopted. Thereby, the magnetic anisotropy of the magnetic layer 14 can be further increased, and the thermal fluctuation resistance can be improved.

FIG. 12 shows a sixth embodiment of the magnetic recording medium of the present invention.
Between the non-magnetic substrate 1 and the orientation adjusting layer 2, the orientation improving layer 1
7 are provided. The orientation improving layer 17 adjusts the orientation of the orientation adjusting layer 2 and prevents peeling of the orientation adjusting layer 2 from the substrate side. The material is, for example, Cr, Mo, Nb, V, Re. , Zr, W, Ti
It is possible to use alloys containing at least one kind as a main component. Among them, CrMo, CrTi, CrV,
It is preferable to use an alloy such as a system or Cr. Alternatively, a material having a B2 structure or an amorphous structure can be used. Examples of the material having the B2 structure include NiAl-based (Ni50Al and the like), CoAl-based (Co50Al and the like), and FeAl-based (Fe50Al) alloys. As a material having an amorphous structure, alloys such as CuZr-based, TiCu-based, NbNi-based, and NiP-based can be used. Preferred specific examples of the material of the orientation improving layer 17 include NiAl, FeAl, C
One containing any of oAl, CoZr, CoCrZr, and CoCrC as a main component can be given. The thickness of the orientation improving layer 17 is preferably 200 nm or less, for example, 5 to 200 nm. This thickness is 20
If the thickness exceeds 0 nm, the effect of increasing the magnetic anisotropy of the magnetic layer 14 is reduced.

In the magnetic recording medium of the present embodiment, by providing the orientation improving layer 17, the disorder of the orientation during the initial growth of the orientation adjusting layer 2 can be prevented, and the crystal orientation of the nonmagnetic underlayer 3 and the magnetic layer 14 can be prevented. Properties can be improved, and the magnetic anisotropy of the magnetic layer 14 can be further increased. Therefore, the thermal fluctuation resistance can be further enhanced. In addition, it is possible to prevent the alignment adjustment layer 2 from peeling off from the non-magnetic substrate 1.

In the present invention, a plurality of orientation adjusting layers can be provided as exemplified below. FIG.
FIG. 17 shows a seventh embodiment of the magnetic recording medium of the present invention,
The magnetic recording medium shown here differs from the magnetic recording medium shown in FIG. 8 in that first and second orientation adjusting layers 2c and 2d are provided instead of the orientation adjusting layer 2. Orientation adjustment layer 2
The materials used for c and 2d and their thicknesses can be the same as those of the orientation adjusting layer 2 of the magnetic recording medium shown in FIG.
Note that the number of the orientation adjusting layers may be three or more.

Further, the magnetic recording medium of the present invention may have a configuration in which a magnetic layer is formed directly on an orientation adjusting layer without providing a nonmagnetic underlayer, as exemplified below. Figure 1
Reference numeral 4 denotes an eighth embodiment of the magnetic recording medium of the present invention. The magnetic recording medium shown here is different from the magnetic recording medium shown in FIG. 8 in that the nonmagnetic underlayer 3 is not formed.
In this magnetic recording medium, the crystal orientation of the magnetic layer 14 is improved, and the magnetic anisotropy of the magnetic layer 14 in the circumferential direction is increased.
Heat fluctuation resistance can be improved. In the present invention, the magnetic layer may have a single-layer structure made of a single material. In this case, a material that can be used for the magnetic films 4a and 4b can be used for the magnetic layer.

FIG. 15 shows an example of a magnetic recording and reproducing apparatus using the above magnetic recording medium. The magnetic recording / reproducing apparatus shown here comprises a magnetic recording medium 7 having the above configuration, a medium driving unit 8 for driving the magnetic recording medium 7 to rotate, a magnetic head 9 for recording / reproducing information on / from the magnetic recording medium 7, and a head driving unit. 10 and a recording / reproducing signal processing system 11. The recording / reproducing signal processing system 11 can process input data and send a recording signal to the magnetic head 9, or can process a reproducing signal from the magnetic head 9 and output data.

In this magnetic recording / reproducing apparatus, since the magnetic anisotropy of the magnetic recording medium can be increased, the resistance to thermal fluctuation can be improved, and troubles such as data loss due to the thermal fluctuation phenomenon can be prevented. Can be prevented. In addition, it is possible to improve magnetic characteristics such as an error rate and a noise characteristic and to obtain excellent glide height characteristics.
Therefore, high recording density can be achieved.

FIG. 16 shows another embodiment of the apparatus for manufacturing a magnetic recording medium according to the present invention. In the sputtering apparatus 51 shown here, a sputtering target 52 which is a source of film-forming particles is formed in an annular shape. The shielding plate 53 is different from the sputtering apparatus 21 in that the shielding plate 53 includes an annular outer shielding plate 53a and a disk-shaped inner shielding plate 53b disposed in the opening of the outer shielding plate 53a.

The shielding plate 53 is formed such that the outer diameter of the inner shielding plate 53b is smaller than the inner diameter of the outer shielding plate 53a, and is provided between the inner peripheral edge of the outer shielding plate 53a and the outer peripheral edge of the inner shielding plate 53b. A film-forming particle passage slit 54 through which the film-forming particles pass is formed. The inner diameter of the outer shielding plate 53a and the outer diameter of the inner shielding plate 53b are set so that when the released film-forming particles adhere to the non-magnetic substrate 1, the film-forming particles are inclined and incident on the non-magnetic substrate 1 ( Preferably, the incident angle α ′ is 10
７５75 °).

When the orientation adjusting layer 2 is formed using the sputtering apparatus 51, the film-forming particles emitted from the sputtering target 52 and passing through the film-forming particle passage slit 54 are incident on the non-magnetic substrate 1 at an incident angle α. Is attached to the surface 1a of the non-magnetic substrate 1 so that the angle? Thereby, the orientation adjusting layer 2 having the columnar fine crystal grains 2a inclined in the radial direction can be formed.
Further, the nonmagnetic underlayer 3 having the columnar fine crystal grains 3a inclined in the radial direction can be formed by using the sputtering apparatus 51.

In the present invention, as a method for forming the orientation adjusting layer, a physical vapor deposition method such as a vacuum vapor deposition method, a gas in-gas sputtering method, a gas flow sputtering method, or an ion beam method can be used in addition to the sputtering method. . In the above embodiment, the coercive force H of the entire magnetic layer is used as an index of the magnetic anisotropy.
c, the circumferential coercive force Hcc and the radial coercive force Hcc
Although the ratio Hcc / Hcr with respect to cr is used, the present invention is not limited to this. The ratio of the coercive force to the coercive force in the radial direction can also be used as an index of magnetic anisotropy.

[0095]

The present invention will be described below in detail with reference to specific examples. (Test Example 1) A non-magnetic substrate (amorphous glass, diameter 65 mm, thickness 0.63) by a sputtering method using a DC magnetron sputtering apparatus (3010 manufactured by Anelva).
5mm) on top of 50Ni50Al (50at% Ni-5).
0at% Al), 94Cr6Mo
(94 at% Cr-6 at% Mo) nonmagnetic underlayer (10 nm thick), 60Co40Cr (60 at% C
o-40 at% Cr) (2n thickness)
m), 64Co22Cr10Pt4B (64at% Co
A magnetic layer (thickness: 18 nm) composed of -22 at% Cr-10 at% Pt-4 at% B) and a protective layer (thickness: 6 nm) composed of carbon were formed. Next, a lubricating layer made of perfluoroether was formed by a dipping method.
During the film formation, the pressure in the chamber of the sputtering apparatus was reduced until the vacuum reached 2 × 10 ⁻⁶ Pa. Non-magnetic substrate 1
Was heated to 200 ° C. Argon was used as a sputtering gas.

(Test Example 2) The magnetic layer was made of 64Co22Cr.
A first magnetic film (18 nm thick) made of 10Pt4B;
84Co12Cr4Ta second and third magnetic films (2.5 nm in thickness), and R
A magnetic recording medium was manufactured as a structure having first and second intermediate films (thickness: 0.8 nm) made of u. Other conditions were the same as in Test Example 1.

(Test Example 3) A magnetic recording medium was prepared by providing a second underlayer (10 nm thick) made of Cr between a nonmagnetic substrate and a nonmagnetic underlayer without providing an orientation improving layer made of NiAl. Produced. Other conditions were the same as in Test Example 1.

(Test Example 4) A magnetic recording medium was manufactured by forming an orientation adjusting layer (thickness: 20 nm) made of 70Cr30Nb. When forming the orientation adjusting layer, the sputtering apparatus 2
1 so that the projection line 27 of the trajectory 26 of the film-forming particles onto the nonmagnetic substrate 1 is substantially along the radial direction of the nonmagnetic substrate 1 and the incident angle with respect to the nonmagnetic substrate 1 is 10 to 75 °. The direction of the film-forming particles was set. In forming the orientation adjusting layer, a mixed gas obtained by adding 25 vol% of nitrogen to argon was used as a sputtering gas. Other conditions were the same as in Test Example 3.

(Test Examples 5 to 7) The magnetic recording medium shown in FIG. 11 was manufactured as follows. A non-magnetic substrate 1 (amorphous glass, diameter 65
mm, thickness 0.635 mm), an orientation adjustment layer 2 (thickness 20 nm) made of 70Cr30Nb, a second underlayer 16 made of Cr (thickness 10 nm), and a nonmagnetic underlayer 3 made of 94Cr6Mo (thickness 10 nm). ), 60Co40Cr
Non-magnetic intermediate layer 15 (2 nm thick) made of
4. A protective layer 5 (thickness: 6 nm) made of carbon was formed. Next, a lubricating layer 6 made of perfluoroether was formed by a dipping method. The magnetic layer 14 includes first to third magnetic films 14a, 14b, and 14c (having a thickness of 18 nm, 2.5 nm, and 2.5 nm, respectively) and first and second intermediate films 14d provided between the magnetic films. , 14e
(A thickness of 0.8 nm). The first magnetic film 14a is made of 64Co22Cr10Pt4B,
And 84Co12Cr on the third magnetic films 14b and 14c.
4Ta was used, and Ru was used for the intermediate films 14d and 14e. When forming the alignment adjustment layer 2, the sputtering device 21
The projection line 27 of the trajectory 26 of the film-forming particles onto the non-magnetic substrate 1 is formed substantially along the radial direction of the non-magnetic substrate 1 and the incident angle with respect to the non-magnetic substrate 1 is 10 to 75 °. The direction of the membrane particles was set. In forming the alignment adjustment layer 2, a mixed gas obtained by adding 25 vol% of nitrogen to argon was used as a sputtering gas. Other conditions were the same as in Test Example 4.

(Test Example 8) The magnetic layer 4 was divided into the first and second magnetic layers.
Magnetic films 4a and 4b (thicknesses 18 nm and 2.5 n, respectively)
m) and the intermediate film 4c (thickness 0.8
(nm).
64Co22Cr10Pt4B was used for the first magnetic film 4a, 84Co12Cr4Ta was used for the second magnetic film 4b, and Ru was used for the intermediate film 4c. Other conditions were in accordance with Test Examples 5 to 7.

(Test Examples 9 to 13) The magnetic recording media shown in FIG. 10 were manufactured as follows. On a non-magnetic substrate 1 (crystallized glass, diameter 65 mm, thickness 0.635 mm), 7
Orientation adjustment layer 2 (thickness: 20 n)
m), a nonmagnetic underlayer 3 (thickness: 10 nm) made of 85Cr15Mo, and a nonmagnetic intermediate layer 1 made of 60Co40Cr
5 (2 nm thick), a magnetic layer 14, a protective layer 5 (6 nm thick) made of carbon, and a lubricating layer 6 were formed. When the orientation adjusting layer 2 is formed, the projection line 27 of the trajectory 26 of the film-forming particles onto the non-magnetic substrate 1 is substantially along the radial direction of the non-magnetic substrate 1 using the sputtering apparatus 21. The direction of the film-forming particles was set so that the incident angle with respect to 1 was 10 to 75 °. In forming the alignment adjustment layer 2, a mixed gas obtained by adding 25 vol% of nitrogen to argon was used as a sputtering gas. Other conditions were in accordance with Test Examples 5 to 7.

The magnetostatic properties of the magnetic recording media of Test Examples 1 to 13 were measured using a vibration type magnetic property measuring device (VSM). The ratio (Hcc / Hcr) of the coercive force Hcc in the circumferential direction and the coercive force Hcr in the radial direction of the entire magnetic layer was measured and used as an index of magnetic anisotropy. For Test Examples 9 to 13, hysteresis curves were created and used to determine the coercive force Hc2 and the antiferromagnetic coupling magnetic field Hbias2 of the second magnetic film 14b. The electromagnetic conversion characteristics were measured using a read / write analyzer RWA1632 manufactured by Guzik and a spinstand S1701M.
It was measured using P. To evaluate the electromagnetic conversion characteristics, a composite thin-film magnetic recording head having a giant magnetoresistive (GMR) element in the reproducing section was used, and the recording conditions were set to a linear recording density of 600 kFC.
The measurement was performed as I. Regarding the thermal fluctuation resistance (thermal demagnetization), a decrease in output at a recording density of 300 kFCI at 70 ° C. was measured using a spin stand S1701MP. Further, the dominant crystal orientation planes of the nonmagnetic underlayer and the magnetic layer of the magnetic recording medium were specified by the θ / 2θ method using an X-ray diffraction measurement apparatus. The production conditions and test results are shown in Tables 1 to 4.

(Test Example 14) NiA was placed on the non-magnetic substrate 1.
1, a nonmagnetic underlayer 3 made of 94Cr6Mo, a nonmagnetic intermediate layer 15 made of 60Co40Cr, a magnetic layer 14, a protective layer 5 made of carbon, and a lubricating layer 6 to form a magnetic recording medium. did. Other conditions were in accordance with Test Examples 9 to 13.

(Test Example 15) An orientation improving layer 17 made of NiP was provided, and the surface of the orientation improving layer 17 was subjected to texture processing along the circumferential direction. Non-magnetic intermediate layer 1
5, magnetic layer 14, protective layer 5 made of carbon, lubricating layer 6
Was formed to produce a magnetic recording medium. Other conditions were the same as in Test Example 14.

(Test Example 16) The magnetic recording medium shown in FIG. 12 was manufactured as follows. Co30 on the non-magnetic substrate 1
An orientation improving layer 17 made of Cr10Zr is provided, on which an orientation adjusting layer 2 made of Cr25V and a second
An underlayer 16, a nonmagnetic underlayer 3 made of 94Cr6Mo,
60Co40Cr nonmagnetic intermediate layer 15, magnetic layer 1
4. A protective layer 5 made of carbon and a lubricating layer 6 were formed to produce a magnetic recording medium. When forming the orientation adjustment layer 2, the projection line 27 of the trajectory 26 of the film-forming particles onto the non-magnetic substrate 1 is substantially along the radial direction of the non-magnetic substrate 1 using the sputtering device 21. The incident angle to 1 is 10
The direction of the film-forming particles was set so as to be 75 °. In forming the alignment adjustment layer 2, as a sputtering gas,
A mixed gas obtained by adding 25 vol% of nitrogen to argon was used. Other conditions were the same as in Test Example 14.

(Test Example 17) A substrate 1 in which a NiP plating layer was formed on the surface of an aluminum alloy substrate (NiP
Aluminum substrate) and a second Cr
An underlayer 16, a nonmagnetic underlayer 3 made of 94Cr6Mo,
60Co40Cr nonmagnetic intermediate layer 15, magnetic layer 1
4. A protective layer 5 made of carbon and a lubricating layer 6 were formed to produce a magnetic recording medium. Other conditions were the same as in Test Example 14.

Test Example 18 A magnetic recording medium was manufactured in the same manner as in Test Example 17, except that the surface of the substrate 1 was textured along the circumferential direction.

(Test Example 19) A magnetic recording medium was manufactured in the same manner as in Test Example 16, except that a substrate made of aluminum was used.

Test Example 20 The magnetic layer was made of 64Co22C
A magnetic recording medium was manufactured in the same manner as in Test Example 18 except that the magnetic recording medium was made of r10Pt4B (having a thickness of 18 nm).

The static magnetic properties of the magnetic recording media of Test Examples 14 to 20 were measured using a vibration type magnetic property measuring device (VSM). The ratio (Hcc / Hcr) of the coercive force Hcc in the circumferential direction to the coercive force Hcr in the radial direction of the entire magnetic layer was measured and used as an index of magnetic anisotropy. In addition, the electromagnetic conversion characteristics are defined by Guzi
The measurement was performed using a read / write analyzer RWA1632 manufactured by K Company and a spin stand S1701MP. To evaluate the electromagnetic conversion characteristics, a giant magnetoresistance (GMR)
Using a composite type thin film magnetic recording head having an element, the recording was performed at a recording condition of a linear recording density of 600 kFCI. At this time, one recording track is divided into 512 sectors, these are divided into four regions every 128 sectors, the electromagnetic conversion characteristics are evaluated for each region, and the variation of the reproduction output signal (LFTAA) and the SNR in the recording track. Was examined. The evaluation of the electromagnetic conversion characteristics was performed at a position with a radius of 20 mm and a radius of 30 mm.
mm. The manufacturing conditions and test results are shown in Tables 5 and 6.

(Test Example 21) 45N was placed on a non-magnetic substrate 1 (crystallized glass, diameter 65 mm, thickness 0.635 mm).
i55Nb orientation adjusting layer 2 (thickness: 20 nm), C
r underlayer 16 (10 nm thick), 80Cr
Non-magnetic underlayer 3 (10 nm thick) of 20 V, 60
Nonmagnetic intermediate layer 15 made of Co40Cr (thickness 2n
m), a magnetic layer made of 66Co21Cr9Pt4B (thickness 17 nm), and a protective layer 5 made of carbon (thickness 6n).
m) A lubricating layer 6 was formed to produce a magnetic recording medium. When forming the alignment adjustment layer 2, the projection device 21 is used to project the projection line 27 of the orbit 26 of the film-forming particles onto the non-magnetic substrate 1.
However, the direction of the film-forming particles was set so as to be substantially along the radial direction of the non-magnetic substrate 1 and the incident angle with respect to the non-magnetic substrate 1 was 10 to 75 °. In forming the alignment adjustment layer 2, a mixed gas obtained by adding 15 vol% of nitrogen to argon was used as a sputtering gas.

(Test Examples 22 to 27) 83Co14Cr3
A laminated structure including a lower magnetic film (2 nm in thickness) made of Ta and an intermediate film (0.8 nm in thickness) made of Ru has the following structure.
A magnetic recording medium was manufactured in the same manner as in Test Example 21 except that the magnetic layer was stacked up to six times, and a magnetic layer having a configuration in which an uppermost magnetic film (thickness: 17 nm) made of 66Co21Cr9Pt4B was provided thereon.

(Test Examples 28 to 36) The magnetic recording medium shown in FIG. 11 was manufactured as follows. The orientation adjusting layer 2 is made of the material shown in Table 7, and the nonmagnetic underlayer 3 is
A magnetic recording medium was manufactured as one made of Cr6Mo. The magnetic layer is formed by laminating twice a laminated structure including a magnetic film (second and third magnetic films 14b and 14c) made of 83Co14Cr3Ta and an intermediate film (intermediate films 14d and 14e) made of the materials shown in Table 7. 66Co21Cr on it
The configuration was such that a magnetic film (first magnetic film 14a) (thickness 17 nm) made of 9Pt4B was provided. Other conditions were in accordance with Test Example 21.

(Test Examples 37 to 58) Orientation improving layer 17,
The material and thickness of the orientation adjusting layer 2 were as shown in Table 8, and the surface of the orientation adjusting layer 2 was subjected to oxidation or nitridation by the method described in Table 8 to produce a magnetic recording medium. The nonmagnetic underlayer 3 is made of 80Cr20W (thickness 5
nm), and the nonmagnetic intermediate layer 15 is made of 63Co37Cr (2 nm thick). The magnetic layer is 73Co1
The third magnetic film 14c (thickness 2) made of 8Cr6Pt3Ta
nm), a second intermediate film 14 e made of Ru (with a thickness of 0.8 n).
m), the second magnetic film 14 made of 84Co12Cr4Ta
b (thickness: 2.5 nm), first intermediate film 14d made of Ru
(Thickness: 0.8 nm) and a first magnetic film 14a (thickness: 18 nm) made of 64Co22Cr10Pt4B. Other conditions were the same as in Test Example 21. In the table, in the column of oxidation / nitridation treatment, the method of oxidation treatment or nitridation treatment is shown. For example, 20 vol% N ₂ / Ar
Indicates that a sputtering gas having a nitrogen content of 20 vol% and a balance of Ar was used. The exposure to O ₂ gas refers to a process of exposing the orientation adjustment layer 2 to oxygen gas (pure oxygen). Indicates that The magnetostatic characteristics and the electromagnetic conversion characteristics of the magnetic recording media of Test Examples 21 to 58 were measured. Tables 7 and 8 show the manufacturing conditions and test results.

In Test Examples 1 to 58, the incident direction of the film-forming particles was set to the circumferential direction when forming the magnetic film of the magnetic layer. That is, the radial direction 41 at the deposition particle attachment point 35
Projection line 37 of film-forming particle trajectory 36 on plane 42 perpendicular to
Are inclined with respect to the non-magnetic substrate 1, and the incident angle β is 10 to 7
The direction of the film-forming particles was set to be 5 °.

(Test Examples 59 to 80) NiP was used as the substrate 1.
Using an aluminum substrate or a glass substrate, Tables 9 and 10
Was produced. Other conditions were the same as in Test Example 21. The magnetostatic characteristics and electromagnetic conversion characteristics of the magnetic recording media of Test Examples 59 to 80 were measured. Tables 9 and 10 show the manufacturing conditions and test results.

In the magnetic recording medium of each of the above test examples, when the incident direction of the film-forming particles was set in the radial direction at the time of film formation, the cross section was observed by TEM. It became clear that the crystal had a crystal structure inclined by 10 to 75 °. Also, when the incident direction of the film-forming particles was set in the circumferential direction at the time of film formation, the cross section was observed by TEM. It became clear that it became something.

[0118]

[Table 1]

[0119]

[Table 2]

[0120]

[Table 3]

[0121]

[Table 4]

[0122]

[Table 5]

[0123]

[Table 6]

[0124]

[Table 7]

[0125]

[Table 8]

[0126]

[Table 9]

[0127]

[Table 10]

Tables 1 and 2 show that, in comparison with Test Example 1 in which no orientation adjusting layer was provided and the AFC structure was not employed, Test Example 4 in which the magnetic layer was provided with magnetic anisotropy by the orientation adjusting layer 2, and AFC structure In Test Example 2 employing the method, the thermal fluctuation resistance was improved, but in Test Examples 5 to 8 employing the alignment control layer 2 and the AFC structure, these Test Examples 2 and 4 were used.
It can be seen that a remarkable effect of improving the thermal fluctuation resistance was obtained as compared to In particular, in Test Examples 5 to 7 having a magnetic layer composed of three magnetic films and two intermediate films, it can be seen that excellent thermal fluctuation resistance was obtained. Further, the intermediate films 4d, 4d
It can be seen that in Test Example 5 in which the thickness of e was 0.8 nm, the thermal fluctuation resistance was superior to Test Examples 6 and 7 in which the thickness was 0.5 nm or 1.4 nm.
From Tables 3 and 4, Test Examples 9 to 12 in which the antiferromagnetic coupling magnetic field Hbias2 of the second magnetic film 14b is larger than the coercive force Hc2.
It can be seen that excellent results were obtained with respect to noise characteristics and PW50 as compared with Test Example 13 in which Hbias2 was equal to or less than Hc2. From Tables 5 and 6, it can be seen that in Test Examples 15, 18, and 20 in which texture processing is performed, the magnetic anisotropy can be increased, but the variation in the magnetic characteristics in the circumferential direction is large. This variation is considered to be caused by the fact that the thickness of the intermediate film becomes non-uniform due to the surface irregularities of the NiP film (orientation improving layer), and the antiferromagnetic coupling between the magnetic films becomes locally insufficient. Can be. In Test Examples 14 and 17 in which texture processing was not performed, the magnetic anisotropy was low, and the output and noise characteristics were inferior. On the other hand, in Test Examples 16 and 19 in which the orientation adjusting layer 2 was provided, the magnetic anisotropy could be increased, and excellent output and noise characteristics could be obtained even though the texturing was not performed. It can be seen that the variation in the magnetic characteristics in the circumferential direction could be suppressed. As shown in Table 7, by increasing the number of laminated structures from Test Examples 22 to 27,
It can be seen that excellent thermal fluctuation resistance was obtained.
According to Test Examples 28 to 36, Ru was used as the material of the intermediate film.
It can be seen that, in addition to the above, when Cr, Ir, Rh, Mo, Cu, Re, and V are used, the effect of improving thermal fluctuation resistance can be obtained. As shown in Table 8, Test Examples 37 to 4
3 shows that various Cr alloys (C
It can be seen that even when rTi, CrMo, etc.) was used, the effect of improving the thermal fluctuation resistance could be obtained. From Test Examples 44 to 51, it can be seen that even when a single element such as V was used as the material of the alignment adjustment layer 2, the effect of improving thermal fluctuation resistance could be obtained. In addition, according to Test Examples 52 to 57, as a material of the alignment adjustment layer 2, Nb such as BeNb
It can be seen that even when an alloy or a Ta alloy such as VTa was used, the effect of improving thermal fluctuation resistance could be obtained. Further, it can be seen that by performing the oxidizing and nitriding treatment on the orientation adjusting layer 2, the magnetic properties such as thermal fluctuation resistance could be improved. Further, by providing the orientation improving layer 17,
It can be seen that the magnetic anisotropy was increased and excellent thermal fluctuation resistance was obtained. Tables 9 and 10 show that the magnetic layer has a structure in which the columnar fine crystal grains have a crystal structure inclined in the circumferential direction, whereby an excellent effect of improving thermal fluctuation resistance can be obtained.

[0129]

As described above, in the magnetic recording medium of the present invention, since the magnetic layer has a crystal structure in which columnar fine crystal grains are inclined in the circumferential direction, the magnetic anisotropy in the magnetic layer in the circumferential direction is reduced. And the heat fluctuation resistance can be improved. Furthermore, the configuration in which the magnetic layer has a plurality of magnetic films and has a structure in which antiferromagnetic coupling is formed therebetween,
Due to the antiferromagnetic coupling between the magnetic films, the magnetizations of the magnetic films other than the main magnetic film having the highest coercive force have no apparent magnetization, or the magnetization of the main magnetic film corresponds to the magnetization of the other magnetic films. An apparently smaller state is obtained by the amount of magnetization. For this reason, the volume of the magnetic particles can be made sufficiently large without adversely affecting the noise characteristics and the resolution, the thermal stability can be achieved, and the thermal fluctuation resistance can be further improved. Generally, the strength of antiferromagnetic coupling between two magnetic films is greatly affected by the thickness of an intermediate film provided between the magnetic films. In addition, the thickness of the intermediate film becomes uneven, the antiferromagnetic coupling strength is locally reduced, and the thermal fluctuation resistance tends to be insufficient. On the other hand, in the magnetic recording medium of the present invention,
By adopting a crystal structure in which the columnar fine crystal grains are inclined in the radial direction, the magnetic anisotropy in the circumferential direction of the magnetic layer can be increased. The smoothness can be increased. Accordingly, it is possible to prevent the thickness of the intermediate film from becoming uneven due to the surface unevenness of the orientation adjusting layer, to increase the antiferromagnetic coupling strength, and to obtain a sufficient effect of improving the thermal fluctuation resistance.

[Brief description of the drawings]

FIG. 1A is a partial cross-sectional view showing a first embodiment of a magnetic recording medium of the present invention. (B) It is the principal part enlarged view created based on the transmission electron microscope (TEM) photograph of the cross section of the magnetic recording medium shown to (a).

FIG. 2 is an enlarged view of a main part created based on a transmission electron microscope (TEM) photograph of a cross section of the magnetic recording medium shown in FIG.

FIG. 3 is an enlarged view of a main part created based on a transmission electron microscope (TEM) photograph of a cross section of the magnetic recording medium shown in FIG.

FIG. 4 is a schematic configuration diagram illustrating an embodiment of a magnetic recording medium manufacturing apparatus according to the present invention.

FIG. 5 is an explanatory diagram illustrating a method for manufacturing a magnetic recording medium using the manufacturing apparatus shown in FIG.

FIG. 6 is a schematic configuration diagram showing another embodiment of the magnetic recording medium manufacturing apparatus of the present invention.

FIG. 7 is an explanatory diagram for explaining a method of manufacturing a magnetic recording medium using the manufacturing apparatus shown in FIG.

FIG. 8 is a partial sectional view showing a third embodiment of the magnetic recording medium of the present invention.

FIG. 9 is a graph showing a history curve of the magnetic recording medium shown in FIG.

FIG. 10 is a partial sectional view showing a fourth embodiment of the magnetic recording medium of the present invention.

FIG. 11 is a partial sectional view showing a fifth embodiment of the magnetic recording medium of the present invention.

FIG. 12 is a partial sectional view showing a sixth embodiment of the magnetic recording medium of the present invention.

FIG. 13 is a partial sectional view showing a seventh embodiment of the magnetic recording medium of the present invention.

FIG. 14 is a partial sectional view showing an eighth embodiment of the magnetic recording medium of the present invention.

FIG. 15 is a partial sectional view showing one embodiment of the magnetic recording / reproducing apparatus of the present invention.

FIG. 16 is a schematic configuration diagram showing another embodiment of the magnetic recording medium manufacturing apparatus of the present invention.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Non-magnetic substrate, 1a ... Non-magnetic substrate surface (adhered surface), 2, 2c, 2d ... Orientation adjustment layer, 2a, 3a, 4
d, 4e, 4f: columnar fine crystal grains, 3: non-magnetic underlayer,
3c: Non-magnetic underlayer surface (adhered surface), 4, 14: Magnetic layer, 4a, 4b, 14a, 14b, 14c: Magnetic film, 4c, 14d, 14e: Intermediate film, 7 magnetic recording medium, 9 magnetic head, 14a first magnetic film (main magnetic film), 22, 32 sputtering target (emission source), 23, 33 shielding plate (Direction setting means), 26,
36: trajectory of film-forming particles, 27, 37 ... projection line, 35 ...
-Film deposition particle attachment point, 41 ... radial direction at film deposition particle adhesion point, 42 ... plane perpendicular to the radial direction at film deposition particle adhesion point, α, α ', β ... incident angle, α1, α2, α3 ...
Angle of inclination of columnar fine crystal grains

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Claims (41)

[Claims] 1. A magnetic recording medium comprising a non-magnetic substrate and a non-magnetic under layer, a magnetic layer and a protective layer formed thereon as a basic structure, wherein the non-magnetic under layer has a bcc structure, An orientation adjusting layer is formed between the substrate and the non-magnetic underlayer to preferentially orient the non-magnetic underlayer to (200), and the magnetic layer has a crystal structure in which columnar fine crystal grains are inclined in the circumferential direction. Having a coercive force Hcc in the circumferential direction and a coercive force Hcr in the radial direction of the magnetic layer.
Wherein the ratio Hcc / Hcr is greater than 1. 2. The magnetic recording medium according to claim 1, wherein the nonmagnetic underlayer has a crystal structure in which columnar fine crystal grains are inclined in a radial direction. 3. The magnetic layer has a plurality of magnetic films, these magnetic films have an hcp structure and are preferentially oriented to (110), and antiferromagnetic coupling between these magnetic films. 3. The method according to claim 1, wherein
The magnetic recording medium according to the above. 4. The orientation adjusting layer has a crystal structure in which columnar fine crystal grains are inclined in a radial direction.
4. The magnetic recording medium according to claim 1, wherein 5. The magnetic recording medium according to claim 1, wherein the magnetic layer has a laminated ferri structure in which the magnetic moment directions of adjacent magnetic films face each other. 6. The magnetic layer according to claim 1, wherein the magnetic layer has a structure having a plurality of magnetic films and an intermediate film interposed therebetween. recoding media. 7. The magnetic recording medium according to claim 1, wherein the magnetic layer has at least two laminated structures each including a magnetic film and an intermediate film adjacent to the magnetic film. . 8. The magnetic film according to claim 1, wherein the antiferromagnetic coupling magnetic field of the magnetic film adjacent to the main magnetic film having the largest coercive force among the plurality of magnetic films is larger than the coercive force of the magnetic film. The magnetic recording medium according to any one of claims 1 to 7. 9. The intermediate film is made of Ru, Cr, Ir, Rh,
7. The magnetic recording medium according to claim 6, wherein the magnetic recording medium is made of a material containing at least one of Mo, Cu, Co, Re, and V as a main component. 10. The orientation adjusting layer is made of Cr, V, Nb, M
The magnetic recording medium according to any one of claims 1 to 9, wherein the magnetic recording medium comprises one or more of o, W, and Ta. 11. The alignment adjusting layer is made of an alloy containing Cr as a main component.
The magnetic recording medium according to claim 1. 12. The alignment adjusting layer is made of an alloy X ₁ T containing Ta.
a (X ₁ is Be, Co, Cr, Fe, Nb, Ni, V,
The magnetic recording medium according to any one of claims 1 to 9, wherein the magnetic recording medium mainly contains one or more of Zn and Zr) and has an Fd3m structure or an amorphous structure. . 13. The orientation adjusting layer is made of an alloy X ₂ N containing Nb.
b (X ₂ is Be, Co, Cr, Fe, Ni, Ta, V,
The magnetic recording medium according to any one of claims 1 to 9, wherein the magnetic recording medium mainly contains one or more of Zn and Zr) and has an Fd3m structure or an amorphous structure. . 14. The alignment adjustment layer is made of CoTa or CoTa.
The composition containing Nb as a main component, the content of Ta or Nb being 30 to 75 at%, and having an Fd3m structure or an amorphous structure.
10. The magnetic recording medium according to any one of 9 above. 15. The orientation adjusting layer is made of CrTa or Cr.
2. The composition according to claim 1, wherein the main component is Nb, and the content of Ta or Nb is 15 to 75 at%.
10. The magnetic recording medium according to any one of claims 9 to 9. 16. The alignment adjusting layer is made of NiTa or Ni.
The composition containing Nb as a main component, the content of Ta or Nb being 30 to 75 at%, and having an Fd3m structure or an amorphous structure.
10. The magnetic recording medium according to any one of 9 above. 17. The magnetic recording medium according to claim 1, wherein the orientation adjusting layer is made of a non-magnetic metal having an Fd3m structure. 18. The magnetic recording medium according to claim 1, wherein the orientation adjustment layer is made of a non-magnetic metal having a C15 structure. 19. Between a nonmagnetic substrate and an alignment adjustment layer,
19. The magnetic recording medium according to claim 1, wherein an orientation improving layer is formed. 20. The magnetic recording medium according to claim 19, wherein the orientation improving layer is made of a material having a B2 structure or an amorphous structure. 21. An orientation improving layer comprising NiAl, FeA
1, CoAl, CoZr, CoCrZr, and CoC
20. The magnetic recording medium according to claim 19, wherein any one of rC is a main component. 22. The magnetic recording medium according to claim 1, wherein a plurality of orientation adjusting layers are provided. 23. In a magnetic recording medium comprising a non-magnetic substrate and a magnetic layer and a protective layer formed thereon as a basic structure, the crystal orientation of the layer immediately above the non-magnetic substrate and the magnetic layer is adjusted. A magnetic layer having a crystal structure in which columnar fine crystal grains are inclined in a circumferential direction; a coercive force Hcc in a circumferential direction and a coercive force Hcr in a radial direction of the magnetic layer;
Wherein the ratio Hcc / Hcr is greater than 1. 24. The magnetic layer has a plurality of magnetic films, these magnetic films have an hcp structure and are preferentially oriented to (110), and antiferromagnetic coupling between these magnetic films. 24. The magnetic recording medium according to claim 23, wherein is formed. 25. The magnetic recording medium according to claim 23, wherein the orientation adjusting layer has a crystal structure in which columnar fine crystal grains are inclined in a radial direction. 26. A magnetic recording medium comprising a non-magnetic substrate and a non-magnetic under layer, a magnetic layer and a protective layer formed thereon as a basic structure, wherein a non-magnetic substrate and a non-magnetic under layer A non-magnetic underlayer having a bcc structure; a magnetic layer having a crystal structure in which columnar fine crystal grains are inclined in a circumferential direction; The adjustment layer is made of a NiP alloy having an amorphous structure, and the nonmagnetic underlayer can be preferentially oriented to (200). The coercive force Hcc in the circumferential direction of the magnetic layer and the Coercive force Hcr
Wherein the ratio Hcc / Hcr is greater than 1. 27. The magnetic recording medium according to claim 26, wherein the nonmagnetic underlayer has a crystal structure in which columnar fine crystal grains are inclined in a radial direction. 28. The magnetic layer has a plurality of magnetic films, these magnetic films have an hcp structure and are preferentially oriented to (110), and antiferromagnetic coupling between these magnetic films 28. The magnetic recording medium according to claim 26, wherein the magnetic recording medium can be formed. 29. The orientation adjusting layer contains one of nitrogen and oxygen.
29. The magnetic recording medium according to claim 1, wherein the magnetic recording medium contains at least at%. 30. A non-magnetic substrate, comprising a non-magnetic under layer, a magnetic layer and a protective layer formed thereon, wherein the non-magnetic under layer has a bcc structure, A method for producing a magnetic recording medium in which an orientation adjusting layer for preferentially orienting a non-magnetic underlayer to (200) is formed between a base layer and a magnetic recording medium. A magnetic layer is formed by adhering to the surface, and at this time, the projection line of the deposition particle trajectory onto the surface perpendicular to the radial direction at the deposition particle attachment point is tilted with respect to the non-magnetic substrate. A method for manufacturing a magnetic recording medium, comprising setting a direction. 31. A magnetic layer comprising a plurality of magnetic films, these magnetic films having a hcp structure and preferentially oriented to (110), and antiferromagnetic coupling between these magnetic films. 4. A structure in which is capable of being formed.
0. A method for manufacturing a magnetic recording medium according to item 0. 32. At least one of a non-magnetic underlayer and an orientation adjusting layer is formed by emitting film-forming particles from an emission source and attaching the film-forming particles to a surface to be adhered.
The direction of the film-forming particles is set so that a projection line of the film-forming particle trajectory to the surface to be adhered substantially follows the radial direction of the non-magnetic substrate and is incident obliquely on the non-magnetic substrate. 32. The method for manufacturing a magnetic recording medium according to 30 or 31. 33. The method for manufacturing a magnetic recording medium according to claim 30, wherein the orientation adjusting layer is subjected to an oxidation treatment or a nitridation treatment. 34. In forming the orientation adjusting layer,
31. A sputtering method using a sputtering target as an emission source of film-forming particles.
34. The method for manufacturing a magnetic recording medium according to any one of claims 33. 35. An oxidation treatment or a nitridation treatment by using a sputtering gas containing oxygen or nitrogen when forming the orientation adjusting layer.
5. The method for manufacturing a magnetic recording medium according to item 4. 36. The method for manufacturing a magnetic recording medium according to claim 33, wherein the oxidation treatment or the nitridation treatment is performed by bringing the surface of the orientation adjusting layer into contact with an oxygen-containing gas or a nitrogen-containing gas. 37. A non-magnetic substrate, comprising a non-magnetic under layer, a magnetic layer and a protective layer formed thereon, wherein the non-magnetic under layer has a bcc structure, An apparatus for manufacturing a magnetic recording medium in which an orientation adjusting layer for preferentially orienting a non-magnetic underlayer to (200) is formed between a base layer and a base layer, wherein the film-forming particles are emitted and adhered to a surface to be adhered. An emission source for forming the magnetic layer, and direction setting means for determining the direction of the film-forming particles emitted from the emission source. The direction setting means is perpendicular to the radial direction at the film-forming particle attachment point. An apparatus for manufacturing a magnetic recording medium, wherein a direction of a film forming particle can be set so that a projection line of a film forming particle trajectory on a surface is inclined with respect to a nonmagnetic substrate. 38. A magnetic recording medium, comprising: a magnetic head for recording and reproducing information on and from the magnetic recording medium, wherein the magnetic recording medium comprises a nonmagnetic substrate, a nonmagnetic underlayer, a magnetic layer, The protective layer has a basic structure, the nonmagnetic underlayer has a bcc structure, and an orientation adjusting layer for preferentially orienting the nonmagnetic underlayer to (200) is provided between the nonmagnetic substrate and the nonmagnetic underlayer. The magnetic layer has a crystal structure in which columnar fine crystal grains are inclined in the circumferential direction, and a ratio Hcc / R of the coercive force Hcc in the circumferential direction to the coercive force Hcr in the radial direction of the magnetic layer.
A magnetic recording / reproducing apparatus, wherein Hcr is larger than 1. 39. The magnetic recording / reproducing apparatus according to claim 38, wherein the nonmagnetic underlayer has a crystal structure in which columnar fine crystal grains are inclined in a radial direction. 40. The magnetic layer has a plurality of magnetic films, these magnetic films have an hcp structure and are preferentially oriented to (110), and antiferromagnetic coupling between these magnetic films 40. The magnetic recording / reproducing apparatus according to claim 38, wherein the magnetic recording / reproducing apparatus can be formed. 41. The magnetic recording / reproducing apparatus according to claim 38, wherein the orientation adjusting layer has a crystal structure in which columnar fine crystal grains are inclined in a radial direction.