JP2002258265A - Transfer sheet - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a transfer sheet, which is used for producing an electrode substrate for an active matrix type color liquid crystal display device, solving a problem of possibilities that defects are generated on a pattern through transfer from a coloring layer to the back of an adjacent support sheet, or the surface of the coloring layer gets scratched when the transfer sheet of a color filter is rolled out of a roll for transfer after it is stored with being rolled in a roll, and is carried. SOLUTION: By providing a release layer 32 at least on one surface of the support sheet 26, and forming cylinder-shaped parts 33 and the coloring layer 14 having a function of color filter on the release layer, transfer from the coloring layer 14 to the back of the adjacent support sheet is prevented, even when the transfer sheet is carried with being rolled. When the coloring layer is transferred to the electrode substrate, the cylinder-shaped parts are not transferred.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a transfer sheet used for manufacturing an electrode substrate for a color liquid crystal display device, and more particularly to a transfer sheet used for manufacturing an electrode substrate for an active matrix type color liquid crystal display device.

[0002]

2. Description of the Related Art FIG. 16 is a sectional view schematically showing a part of an example of a transfer sheet. 17 is the same as FIG.
FIG. 2 is a cross-sectional view schematically showing a part of a transfer sheet wound in a roll shape. As shown in FIGS. 16 and 17, the transfer sheet (25) is made of, for example, 42 alloy (3
1) a support sheet (26) comprising (42% by weight of nickel, balance iron) and release layers (32) formed on both sides thereof;
And a colored layer (14) having a color filter function.

When the transfer sheet is rolled and transported with the colored layer (14) having a color filter function inside, the colored layer (14) is tightly wound on the release layer (32). . For this reason, there is a problem that the colored layer (14) may be set off on the back surface of the adjacent support sheet (26) when it is pulled out from the roll during transfer, or the surface of the colored layer may be damaged. ing.

[0004]

An object of the present invention is to prevent a colored layer having a color filter function from being transferred to the back of an adjacent transfer sheet when the transfer sheet is rolled and conveyed as described above. Another object of the present invention is to provide a transfer sheet that does not cause a pattern shape defect or the like due to the above problem.

[0005]

According to the present invention, there is provided a color sheet comprising a release sheet formed on at least one surface of a support sheet, and a columnar portion and a colored layer having a color filter function formed on the release layer. A transfer sheet for use in manufacturing an electrode substrate for a liquid crystal display device, wherein the columnar portion is not transferred when a colored layer is transferred to the electrode substrate.

According to the present invention, a columnar portion is formed at a position corresponding to a position of a through hole formed so as to expose a pixel wiring in a protective film on an auxiliary capacitance portion of a thin film transistor element forming electrode substrate. The transfer sheet.

Further, the present invention is the transfer sheet, wherein the transfer sheet is a continuous sheet of metal having substantially the same thermal expansion coefficient as the substrate of the object to be transferred.

[0008]

DESCRIPTION OF THE PREFERRED EMBODIMENTS A transfer sheet according to the present invention will be described below in detail based on one embodiment.

FIGS. 3A, 3B and 3C are illustrations of the transfer sheet of the present invention. FIG. 3A is a plan view of the transfer sheet (30), and FIG.
FIG. 3C is a sectional view taken along the line X ′, and FIG.
It is sectional drawing in Y '.

As shown in FIGS. 3 (a), 3 (b) and 3 (c), the transfer sheet (30) comprises a support sheet (42) composed of a 42 alloy (31) and a release layer (32) formed thereon. 2
6) A columnar portion (33) made of a photosensitive resin or the like and a colored layer (14) having a color filter function are formed thereon. The colored layer (14) having a color filter function is, for example, a pattern in which a large number of red (R), green (G), and blue (B) stripe-shaped patterns for color display are regularly arranged. This colored layer (14)
Is formed of a pigment-dispersed photoresist, a printing ink, an inorganic multilayer interference film, or the like.

FIG. 18 is an explanatory view schematically showing a cross section of the transfer sheet (30) thus prepared, which corresponds to a cross section taken along the line ZZ 'in FIG. 3 (a). FIG. 19 is an explanatory diagram schematically showing a part of a cross section of the transfer sheet of FIG. 18 wound in a roll shape. As shown in the figure, the upper end of the columnar portion (33) is made of 42 alloy (3
1) It is in contact with the lower release layer (32).

Hereinafter, the structure of the transfer sheet of the present invention will be described. The transfer base is a continuous metal plate or metal foil, and the plate thickness is 0.20 mm or less, preferably 0.02 mm or less.
It is preferably about 6 to 0.20 mm, and the material is preferably a metal having a coefficient of thermal expansion substantially equal to that of the transparent glass substrate as the transfer object.

The transparent glass substrate used for the liquid crystal display device is a low expansion coefficient glass having a coefficient of thermal expansion of about 40 × 10 ⁻⁷ / ° C., and therefore, the metal used is an iron-nickel alloy, for example, a 42 alloy (nickel 42 (% By weight, balance iron), amber (36% by weight of nickel, trace amount of manganese, balance of iron) and the like have a coefficient of thermal expansion of about 10 to 40 × 10 ⁻⁷ / ° C., which is convenient. Iron-nickel alloys are also suitable in that they hardly rust in the air and have good storage stability.

The release layer is a polymer film having resistance to an organic solvent and imparts an effect of smoothing the surface of the transfer base and elasticity for maintaining the adhesion between the transparent glass substrate and the transfer base during transfer. . The thickness is preferably 4.5 μm or more and 5.5 μm or less. It is preferable that the release layer has flexibility in terms of transferability. On the other hand, in view of the intrinsic suitability of the release layer, it is desirable that the surface is inert and the film hardness is high.

Specifically, a film obtained by applying and drying casein, polyvinyl alcohol, hydroxyethylcellulose, etc. with a water-soluble resin having organic solvent resistance, and a polyurethane resin and various rubber resins as elastic resins can be mentioned. However, it is not limited to these resins. It is also effective to add a silicone-based or fluorine-based surfactant for the purpose of improving releasability, and the transfer base can exhibit its original function only when integrated with the release layer.

The columnar portion formed on the release layer and corresponding to the position of a predetermined through-hole pattern provided on the protective film on the TFT substrate auxiliary capacitance portion is coated with a negative photosensitive resin composition by a known photolithography method. For example, a pattern having a thickness of about 3 μm and a thickness of about 15 μm square is formed according to the pattern size and pitch of the colored layer.

For the colored layer, a pigment dispersion method, a printing method and the like can be applied. The pigment dispersion method forms a colored layer by repeating the steps of applying, exposing, developing, and heating a photosensitive resin in which a pigment having a desired hue is dispersed in advance. The printing method is a method of forming a color coloring layer by sequentially printing red, green, and blue inks on a substrate, for example, mainly by lithographic offset or intaglio offset printing.

An embodiment in which the transfer sheet thus prepared is used will be described below. FIG. 1 is an example of a cross-sectional view schematically showing a part of an electrode substrate for a color liquid crystal display device manufactured using the transfer sheet of the present invention. FIG. 2 is an example of a sectional view schematically showing a part of a color liquid crystal display device using the color liquid crystal display device electrode substrate shown in FIG.

As shown in FIG. 1, an electrode substrate (1) for a liquid crystal display device has a TFT element (12), a protective film (13), an adhesive layer (15), a color on one side of a transparent substrate (11). The colored layer (14) having a filter function, the pixel electrode (1
8), an alignment film (16) and a columnar spacer (17) are formed.

As shown in FIG. 2, a liquid crystal display (4) using the electrode substrate (1) for a liquid crystal display shown in FIG.
Is composed of a liquid crystal display electrode substrate (1), an electrode substrate (2) and a liquid crystal (3). The electrode substrate (2)
A transparent conductive film (22) and an alignment film (23) are formed on one surface of a transparent substrate (21).

As shown in FIGS. 1 and 2, in one embodiment of an electrode substrate for a liquid crystal display device (1) manufactured using the transfer sheet of the present invention and a liquid crystal display device (4) using the same. The columnar spacer (17) has a spacer function for maintaining the thickness of the liquid crystal layer without the presence of spacer particles for maintaining the thickness of the liquid crystal layer between the substrates in the pixel portion inside the cell. In addition, it is possible to provide a liquid crystal display device in which spacer particles are not present in the pixel portion.

4 to 15 are explanatory views showing one embodiment of a process for manufacturing an electrode substrate for a liquid crystal display device using the transfer sheet of the present invention. 4 (a), (b) and (c)
FIG. 2 is an explanatory view of a thin film transistor element forming electrode substrate (hereinafter, a TFT element forming electrode substrate) used for manufacturing an electrode substrate for a liquid crystal display device using the transfer sheet of the present invention. FIG.
(A) is a plan view of a TFT element forming electrode substrate (40),
4B is a cross-sectional view taken along line XX ′ of FIG. 4A, and FIG. 4C is a cross-sectional view taken along line YY ′ of FIG.

As shown in FIGS. 4A, 4B and 4C, the TFT element forming electrode substrate (40) has a TFT element (12) and a gate wiring (41) on one surface of a transparent substrate (11). ), A source wiring (42), a pixel wiring (43), an auxiliary capacitance section (44), and the like. Then, the pitch (P) of the source wiring (42) in FIG.
The width (W) corresponds to the pitch (P) and the width (W) of the colored layer (14) on the transfer sheet in FIG. The TFT element (12) has a gate electrode (4
5) and a drain electrode (48).

First, as shown in FIGS. 4 (a), (b) and (c), the TFT of the TFT element forming electrode substrate (40)
A protective film (49) is formed on the entire surface on the element side. Then
As shown in FIG. 5, through holes (51) are formed in the protective film (49) on the auxiliary capacitance portion (44) according to a predetermined pattern by, for example, a photography method or a dry etching method.
Is formed, and a part of the pixel wiring (43) is exposed from the protective film.

Next, as shown in FIG. 6, an adhesive layer (15) made of, for example, a solventless UV-curable adhesive is formed on the entire surface of the TFT element forming electrode substrate (40) on the TFT element side.
To form It is important to use a non-solvent type ultraviolet curable adhesive which is transparent when cured and transmits light.

Next, as shown in FIG. 7, the transfer sheet (30) of the present invention is connected to the source wiring (42) shown in FIG.
Of the color layer (1) on the transfer sheet in FIG.
The substrate is superposed on the TFT element forming electrode substrate (40) while controlling the position so as to correspond to the width (W) of 4). At this time, the adhesive layer (1) of the TFT element forming electrode substrate (40) is formed.
The surface on which 5) is formed and the surface on which the colored layer (14) of the transfer sheet (30) is formed are opposed to each other and pressure-bonded.

Next, as shown in FIG. 8, ultraviolet rays (81) are irradiated from the side opposite to the TFT element side of the TFT element forming electrode substrate (40), and the TFT elements, gate wiring, source wiring, and The adhesive layer (15) in a light-transmitting portion other than the auxiliary capacitance portion is light-cured.

Next, as shown in FIG. 9, the support sheet (26) is peeled off, and the TFT element forming electrode substrate (40) is peeled off.
Of the colored layer (1) on the photo-cured adhesive
4) is transferred to peel off the columnar portion and the colored layer on the uncured adhesive.

Next, as shown in FIG. 10, the uncured adhesion of the light-impermeable portions such as the TFT element, the gate wiring, the source wiring, and the auxiliary capacitance section on the TFT element side of the TFT element forming electrode substrate (40). The agent layer (15) is removed to expose the pixel wiring (43) in the through hole portion.

Next, as shown in FIG. 11, ITO is applied to the entire surface of the TFT element forming electrode substrate (40) on the TFT element side and baked to form a transparent conductive film (28).

Next, as shown in FIG. 12, the transparent electrode film is patterned into a predetermined shape to form a pixel electrode (18) made of a transparent conductive film electrically connected to the pixel wiring (43) by through holes. I do.

Next, as shown in FIG. 13, a black photosensitive resin composition (37) is applied to the entire surface of the TFT element forming electrode substrate (40) on the TFT element side. Next, when ultraviolet light (82) is irradiated from the side opposite to the TFT element side of the TFT element forming electrode substrate (40), as shown in FIG. 14, the TFT element, the gate wiring, the source wiring, and the auxiliary capacitance portion and the coloring layer are formed. The black photosensitive resin composition cures as a mask.

In the present invention, exposure using the pattern already formed on the coating surface side from the back side of the coating surface as a mask in this manner is referred to as back exposure self-alignment. Then, the uncured black photosensitive resin composition is removed by development to form a light-shielding film (27).

As described above, since the light-shielding film (27) is formed by irradiating ultraviolet rays (82) by the back exposure self-alignment, the outline of each colored layer is made clear without the light-shielding film overlapping the colored layer, and the contrast is improved. Will be improved.

Here, the back exposure self-alignment will be described in further detail using the above embodiment. First, since the color filter layer is formed using the transfer sheet, the transferred color layer may have the following chipping defect. That is, first, due to a defective defect such as a pinhole in the colored layer of the transfer sheet, a defect in which the transferred colored layer is defective, and secondly, when the support sheet is peeled off, The colored layer is separated at the boundary between the cured portion and the uncured portion of the adhesive layer, but the separation is not performed cleanly, and the colored layer at the portion to be transferred is peeled off. This is a defect in which chipping occurs. The chipping defect generated when the support sheet is peeled is a problem peculiar to the formation of the colored layer by transfer, and occurs at the contour of the colored layer.

Even when such a chipping defect occurs, when the black photosensitive resin composition is applied to the TFT element side and exposed to the back, the black photosensitive resin composition on the chipping defect in the colored layer is hardened and light is shielded. A layer is formed. Therefore, when the liquid crystal display device is used, light does not leak from the contour portion of the colored layer or a chipped defect in other portions, and the contrast is improved and the display image quality is improved.

Subsequently, as shown in FIG. 15, a black photosensitive resin composition is applied to the entire surface of the TFT element forming electrode substrate (40) on the TFT element side, and is exposed from the TFT element side using a mask. Thereby, a columnar spacer (17) is formed on the TFT element (12) side.

Here, since the light-shielding layer is formed by back exposure self-alignment, it is sufficient to use a mask that transmits light at least in the spacer portion. However, in the back exposure, no light-shielding layer is formed on the TFT element. For,
It is desirable to form a light-shielding layer on the TFT element. Further, in the back exposure, since no light-shielding layer is formed on the wiring such as the gate wiring, in order to smooth the light-shielding layer and to prevent poor alignment of the liquid crystal, It is desirable to form a light shielding layer also on the wiring portion. Changing the formation region of such a light shielding layer can be easily performed by changing the pattern of the mask.

Even when there is a chipped defect in the colored layer in the contour portion of the colored layer or the like, the light-shielding layer has already been formed by back-exposure self-alignment, and this mask does not require such high precision. Also, a slight positional deviation of the mask can be tolerated. Through the above steps, an electrode substrate for a liquid crystal display device having a columnar spacer is manufactured.

The transparent substrate used here is glass,
Preferably, a glass having a low coefficient of thermal expansion containing only a small amount or no alkali metal element is used. Its thickness is, for example, about 0.5 to 1.1 mm.

The adhesive comprises a resin having an ethylenically unsaturated group and a carboxyl group in a molecule, a diluting monomer,
Those comprising a photosensitizer, a thermosetting component and an additive are preferred.

The black photosensitive resin composition used for the light-shielding film and the columnar spacer has a high insulating property, and is composed of a resin material, a crosslinking agent, a photoacid generator, and a polymer graft. What consists of carbon black is preferable. The high insulating property prevents leakage between the electrodes of the liquid crystal display device and improves the display quality.

[0043]

The present invention will be described in detail with reference to the following examples.

<Example 1> (Preparation of transfer sheet) 42 alloy (iron-iron) having a thickness of 150 μm
Nickel alloy, nickel 42% by weight, balance iron) was used. At a predetermined site, alignment at the time of forming each colored layer,
In addition, alignment marks for alignment between the coloring layer and the TFT forming electrode substrate were formed by photolithography.

Next, a release layer made of photo-cured polyvinyl alcohol which adheres well to the 42 alloy and has good releasability from the colored layer has a thickness of about 5 μm and a surface smoothness of 0.0
It was formed to about 5 μm.

On the cured release layer, a negative photosensitive resin composition shown below was applied to a coating thickness of about 3 μm. Approximately 150m using a photomask on this coating surface
Ultraviolet radiation of J / cm ² was performed. As a developer, sodium carbonate: 0.1% by weight, sodium bicarbonate: 0.1%
Development processing was performed using an alkaline aqueous solution having a composition of weight%. As described above, a columnar portion having a pattern of about 3 μm and a pattern of 15 μm square was formed.

<Composition of Negative-Type Photosensitive Resin Composition> A: Anionic acrylic copolymer having the following composition: 10 parts by weight, 1 part by weight of methacrylic acid, 2 parts by weight of methyl methacrylate, 2 parts by weight of hydroxyethyl methacrylate -Butyl methacrylate 2 parts by weight-Cyclohexyl acrylate 3 parts by weight B: Polyfunctional acrylic monomer "Aronics M400" ... 10 parts by weight (manufactured by Toa Gosei Chemical Industry Co., Ltd.) C: Photopolymerization initiator "Irgacure 907" ... 0. 5 parts by weight (manufactured by Ciba Geigy) D: Solvent cyclohexanone 79.5 parts by weight

Next, a colored layer was formed by a pigment dispersion method using a known photolithography method to obtain a transfer sheet.

(Preparation of Electrode Substrate for Liquid Crystal Display) A TFT element, a gate wiring, a source wiring, a pixel wiring, and an auxiliary capacitor are formed on one surface of a transparent substrate by a known method.
An FT element forming electrode substrate was used. First, a protective film was formed by vapor deposition of SiO ₂ over the entire surface of the TFT element forming electrode substrate.

Then, after applying a photosensitive resist (trade name “AZ4620”, manufactured by Hoechst) on the protective film, the protective film is formed in accordance with a predetermined pattern from the photosensitive resist in the area of the auxiliary capacitance portion by photolithography. Was partially exposed.

Next, using a dry etching apparatus (trade name “Drytec 384T” manufactured by Lam Research Co., Ltd.)
Pressure 150 mTorr, at the output 700 W, CHF ₃ gas amount 100SCCM conditions, the dry etching was performed on the protective film exposed from the photosensitive resist. Thereafter, the photosensitive resist was peeled off, and a through-hole was formed in the protective film to expose a part of the pixel wiring according to a predetermined pattern.

Next, an adhesive layer was applied over the entire surface of the TFT element forming electrode substrate. The adhesive used was a resin comprising a resin having an ethylenically unsaturated group and a carboxyl group in the molecule, a diluting monomer, a photosensitizer, a thermosetting component, and an additive.

Incidentally, three lots of the transfer sheet were prepared. The length was 500 m per roll in a rolled state. The first lot was used after being left for several days after preparation. The second lot was used after standing for 3 months. The third lot was used after transporting about 500 km in the transportation test. After an adhesive is applied to the entire surface of the TFT element forming electrode substrate, the transfer sheet is overlapped so that the TFT element forming surface and the colored layer surface face each other while performing alignment, and a roll press is performed while maintaining this state. After pressing the TFT element forming electrode substrate and the transfer sheet at a pressure of 5 kg / cm ² , ultraviolet rays are irradiated from the side opposite to the TFT element forming surface to photo-cure the adhesive layer portion excluding the elements and wiring portions. The colored layer was transferred to the TFT element forming electrode substrate.

At this time, the portion of the adhesive layer on the TFT element and the wiring is not exposed to light and does not harden because the TFT element and the wiring shield the ultraviolet rays irradiated.

Next, the support sheet was removed, and the TFT element forming electrode substrate was washed with an alkaline solution or the like to remove unexposed uncured portions, that is, the adhesive on the TFT element and the wiring. As a result, the unexposed and uncured adhesive layer on the TFT element and the wiring is removed by washing, and the surfaces of the TFT element and the wiring appear.

Next, an ITO film was applied by sputtering or the like, baked to form a transparent conductive film, and was etched by photolithography. Thereby, a pixel electrode patterned into a predetermined shape was formed on the colored layer. The pixel electrode is electrically connected to the pixel wiring through a through hole.

Next, on the surface on which the pixel electrode is formed,
A black photosensitive resin composition for forming a light-shielding film was applied, and a light-shielding film was formed by back-exposure self-alignment.

Subsequently, a black photosensitive resin composition is applied to the TFT element side, and is exposed through a mask from the TFT element side to form a light-shielding film and a columnar spacer on the TFT element. An electrode substrate for a liquid crystal display device having a spacer was obtained.

The mode of the present invention is not limited to the above-described embodiment, and various types of transfer and patterning methods such as thermocompression bonding, EB (electron beam) curing, and electron beam curing can be considered. , Material used, film thickness, coloring layer and TF
It goes without saying that various conditions such as the structure of the T element can be changed.

[0060]

As described above, the transfer sheets prepared in the three lots are:
As described above, in a rolled state, the length is 500 m per roll, the first lot is left for several days after preparation, the second lot is left for three months, and the third lot is left. Is used after transporting about 500 km in the transport test, but in each lot, the color filter has no set-off or scratches, etc., and it is possible to produce an electrode substrate for a liquid crystal display device having a good columnar spacer. Was.

According to the present invention, the position of the through-hole formed on the support sheet coated with polyvinyl alcohol resin on the protective film in the auxiliary capacitance line region of the thin film transistor in order to expose the pixel wiring according to a predetermined pattern. Due to the columnar portion formed to correspond to the above, the columnar portion becomes a spacer even if it is wound up on a roll and conveyed, and the color filter is overlaid on the back surface of the adjacent support sheet It was confirmed that there was no set-off.

By using the transfer sheet of the present invention, as described above, the color filter can be rolled without causing defects such as chipping of the pattern due to set-off at the time of being pulled out from the roll at the time of transfer or scratching of the surface of the colored layer. Since it can be transported and stored in a state of being wound around, it can be said that it is extremely excellent in practical use compared to a color filter formed on conventional glass.

[0063]

[Brief description of the drawings]

FIG. 1 is an explanatory diagram schematically showing a part of a cross section of an electrode substrate for a liquid crystal display device manufactured using a transfer sheet of the present invention.

FIG. 2 is an example of an explanatory diagram schematically showing a part of a cross section of a liquid crystal display device using the liquid crystal display device electrode substrate shown in FIG. 1;

FIGS. 3A to 3C are explanatory diagrams showing a method for manufacturing an electrode substrate for a liquid crystal display device using the transfer sheet of the present invention.

FIGS. 4A to 4C are explanatory diagrams illustrating a method for manufacturing an electrode substrate for a liquid crystal display device using the transfer sheet of the present invention.

FIGS. 5A to 5C are explanatory diagrams illustrating a method for manufacturing an electrode substrate for a liquid crystal display device using the transfer sheet of the present invention.

FIGS. 6A to 6C are explanatory views showing a method for manufacturing an electrode substrate for a liquid crystal display device using the transfer sheet of the present invention.

FIGS. 7A to 7C are explanatory views showing a method for manufacturing an electrode substrate for a liquid crystal display device using the transfer sheet of the present invention.

FIGS. 8A to 8C are explanatory views showing a method for manufacturing an electrode substrate for a liquid crystal display device using the transfer sheet of the present invention.

FIGS. 9A to 9C are explanatory views showing a method for manufacturing an electrode substrate for a liquid crystal display device using the transfer sheet of the present invention.

FIGS. 10A to 10C are explanatory diagrams illustrating a method for manufacturing an electrode substrate for a liquid crystal display device using the transfer sheet of the present invention.

FIGS. 11A to 11C are explanatory diagrams illustrating a method for manufacturing an electrode substrate for a liquid crystal display device using the transfer sheet of the present invention.

FIGS. 12A to 12C are explanatory diagrams illustrating a method for manufacturing an electrode substrate for a liquid crystal display device using the transfer sheet of the present invention.

13 (a) to 13 (c) are explanatory views showing a method for manufacturing an electrode substrate for a liquid crystal display device using the transfer sheet of the present invention.

14A to 14C are explanatory diagrams illustrating a method for manufacturing an electrode substrate for a liquid crystal display device using the transfer sheet of the present invention.

FIGS. 15A to 15C are explanatory views showing a method for manufacturing an electrode substrate for a liquid crystal display device using the transfer sheet of the present invention.

FIG. 16 is an explanatory diagram schematically showing an example of a cross section of a conventional transfer sheet.

FIG. 17 is an explanatory view schematically showing a part of a cross section of the transfer sheet of FIG. 16 wound in a roll shape.

FIG. 18 is an explanatory view schematically showing an example of a cross section of the transfer sheet of the present invention.

FIG. 19 is an explanatory view schematically showing a part of a cross section of a transfer sheet of the present invention wound in a roll shape.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Electrode substrate for liquid crystal display devices 2 ... Electrode substrate 3 ... Liquid crystal 4 ... Liquid crystal display device 5 ... Thin film transistor element side electrode substrate 11, 21 ... Transparent substrate 12 ... TFT elements 13, 49 Protective film 14 Coloring layer 15 Adhesive layer 16, 23 Alignment film 17 Column spacer 18 Pixel electrode 19 Insulating film 22 , 28: transparent conductive film 25: conventional transfer sheet 26: support sheet 27: light-shielding film 30: transfer sheet of the present invention 31: 42 alloy 32: release layer 33 ... columnar part 37 ... black photosensitive resin composition 40 ... TFT element formation electrode substrate 41 ... gate wiring 42 ... source wiring 43 ... pixel wiring 44 ... auxiliary capacitance part 45 ... Gate electrode 46 ... Source electrode 47 Silicon 48 ... drain electrode 51 ... through hole 81 ... ultraviolet R · · · · Red G · · · · Green B · · · · Blue

 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Toyoji Nishimoto 1-5-1, Taito, Taito-ku, Tokyo Toppan Printing Co., Ltd. F-term (reference) 2H048 BA43 BA45 BA48 BA55 BA66 BB02 BB08 BB42 2H091 FA02Y GA08 GA13 LA30 2H092 GA29 JA24 JA37 JA41 JA46 JB51 MA13 MA19 MA32 MA41 MA42 NA25 PA03 PA08

Claims (3)

[Claims] 1. Production of an electrode substrate for a color liquid crystal display device, wherein a release layer is formed on at least one surface of a support sheet, and a columnar portion and a colored layer having a color filter function are formed on the release layer. A transfer sheet used in the above, wherein the columnar portion is not transferred when the colored layer is transferred to the electrode substrate. 2. A columnar portion is formed at a position corresponding to a position of a through hole formed so as to expose a pixel wiring on a protective film on an auxiliary capacitance portion of a thin film transistor element forming electrode substrate. The transfer sheet according to the above. 3. The transfer sheet according to claim 1, wherein the transfer sheet is a continuous sheet of metal having a coefficient of thermal expansion substantially equal to that of the substrate of the transfer object.