JP2002250800A - Electron beam treatment device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an electron beam treatment device that can exactly measure only the quantity of electron beams emitted from corresponding electron beam tubes. SOLUTION: In an electron beam treatment device which has electron beam tubes 1 and electron beam quantity detection components 2 that respectively detect the quantity of the electron beams emitted from the electron emission windows 11 of each of the electron beam tubes 1 outside the electron emission windows 11, shielding members 9 which block the incidence of the electron beams emitted from other electron beam tubes 1 that do not correspond to them are placed in the electron beam quantity detection components 2.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to the use of electron beams radiated from a vacuum tube type electron beam tube to cure interlayer insulating films such as semiconductor wafers and resists and to dry ink applied to various printed materials. , Surface modification of various objects, thin film formation,
The present invention relates to an electron beam processing apparatus used for processing such as electron beam curing and dry cleaning.

[0002]

2. Description of the Related Art In recent years, an electron beam tube used for an electron beam processing apparatus has become commercially available. The electron beam tube emits thermionic electrons emitted from an electron beam emitting portion in a vacuum vessel. The electron beam is transmitted through a window by being accelerated by an acceleration unit.

FIG. 5 is a diagram showing an example of an electron beam processing apparatus proposed by the applicant. As shown in FIG. 1, a filament 111 and a grid 112 are provided inside the electron beam tube 101, and the filament 111 and the grid 11 are provided.
2, for example, from 10 to 70 k
A high voltage of V is applied. The filament power supply 103 is connected to the filament 111, and the filament 1
11 is heated by the current supplied from the power supply and emits thermoelectrons. The emitted electrons are shaped into a beam shape 115 by the electric field of the grid 112 controlled by the grid power supply 104. The shaped electron beam is emitted from the window 114 provided in the flange 113 to the outside of the electron beam tube 101.

An electron dose measuring section 105 having an electron dose detecting section 106 is provided near the outside of the window 114 of the electron beam tube 101 (for example, at a distance of 5 mm from the window). The electron dose detecting unit 106 is usually made of stainless steel, which is a conductor.
The electron beam tube 101 is made of copper, aluminum, or a semiconductor such as silicon, germanium, or a compound semiconductor.
A part of the electron beam emitted from is detected by the electron dose detection unit 106, and a detection signal is sent to the control unit 107. The control unit 107 compares the detected signal value with a preset value set in advance and controls the filament power supply 103 based on the comparison value. The filament power supply 103 controls the current flowing into the filament 111, and controls the amount of electron beams emitted from the electron beam tube 101 to a constant and stable value.

[0005]

However, in the above-mentioned electron beam processing apparatus, a plurality of electron beam tubes 101 are usually provided, and each electron beam tube 101 is provided with a corresponding one of the electron beam tubes 10.
An electron dose detection unit 106 for detecting an electron beam emitted from the electron beam detector 1 is provided.
Has a problem that an electron beam emitted from another adjacent electron beam tube 101 is also detected, and only the electron beam of the corresponding electron beam tube 101 cannot be accurately measured.

In particular, when the pressure in the processing chamber is reduced, the electrons emitted from each electron beam tube 101 spread over a wide range. There is a problem that even more electron beams are measured.

An object of the present invention is to provide an electron beam processing apparatus capable of accurately measuring only the dose of electrons emitted from a corresponding electron beam tube in view of the various problems described above.

[0008]

The present invention employs the following means in order to solve the above-mentioned problems. The first means is an electron beam processing apparatus provided with a plurality of electron beam tubes and an electron dose detection unit for detecting an electron dose emitted from an electron emission window of each electron beam tube outside the electron emission window. Each electron dose detecting section is provided with a shielding member for blocking incidence of an electron beam emitted from another electron beam tube which does not correspond to the electron beam detecting section.

[0009] A second means is the first means, wherein the shielding member is provided with a cylindrical body provided so as to surround each electron dose detecting section, or another electron beam tube which does not correspond to each electron dose detecting section. It is characterized by being a partition provided between.

[0010]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment of the present invention will be described with reference to FIGS. FIG. 1 is a front sectional view showing a configuration of an electron beam processing apparatus according to the present embodiment, and FIG.
It is the figure seen from XX of FIG. In these figures, reference numeral 1 denotes an electron beam tube, 2 denotes an electron beam emitted from the electron beam tube 1 and is disposed near the front of an electron beam emission window 11 provided in a cover member 12; An electron dose detector 3 composed of a conductor or a semiconductor such as silicon, germanium, or a compound semiconductor is connected to a power supply device 8 by a signal line detected by the electron dose detector 2. Denotes an electron beam tube holding frame provided to support the electron beam tube 1;
Holding unit for electron dose detection unit provided to support
Is an object 7 to be processed by an electron beam emitted from the electron beam tube 1.
A processing chamber provided for processing the electron beam;
Is a cylindrical shielding member provided between the electron beam emission window 11 and the electron dose detection unit 2 so as to shield an electron beam emitted from another electron beam tube 1.

Here, the shielding member 9 includes the electron dose detecting section 2.
, One end of which is in close contact with the cover member 12 or the electron beam tube holding frame 4 of the electron beam tube 1, and the other end of which is in close contact with the electron dose detecting portion holding portion 5. Can be
Further, this shielding member 9 does not transmit electrons and the connection line 3
It is made of a member having an appropriate type and thickness that does not electrically conduct with the member. For example, ceramic or glass is preferable.

The configuration of the electron beam tube 1 and the power supply device 8 according to the present embodiment and the operation as the electron beam processing device are substantially the same as those of the electron beam processing device shown in FIG. I do.

The electron beam processing apparatus according to the present embodiment
With the above configuration, for example, as shown in FIG. 2, the electron beam emitted from the electron beam emission window 11 of each electron beam tube 1 is detected by the electron dose detection unit 2 formed in a mesh shape. , And the detection signal is transmitted to the power supply device 8 through each connection line 3. At this time, the electron beam emitted from the electron beam emission window 11 of each electron beam tube 1 is not separated and diffused by each shielding member 9.

Therefore, each electron dose detecting section 2 does not detect an electron beam radiated from another electron beam tube 1 to which the electron dose detecting section 2 does not correspond. However, only the electron beam of the corresponding electron beam tube 1 can be accurately detected.

Next, a second embodiment of the present invention will be described with reference to FIGS. FIG. 3 is a front sectional view showing the configuration of the electron beam processing apparatus according to the present embodiment, and FIG. 4 is a view as seen from line XX in FIG. In these figures, reference numeral 10 denotes a partition-like wall provided between the electron beam emission window 11 of each electron beam tube 1 and the electron dose detection unit 2 so as to shield electron beams emitted from other electron beam tubes 1. It is a shielding member. The shielding member 9 of the first embodiment blocks each electron beam tube 1 with a cylindrical shielding member provided for each electron beam tube 1, but the shielding member 10 of the present embodiment is The difference is that the space between the wire tubes 1 is blocked by a partition wall. As the material of the shielding member 10, the same material as the shielding member 9 is used. The other configurations correspond to the configurations of the same reference numerals shown in FIGS.

The electron beam processing apparatus according to the present embodiment
With the above configuration, as shown in FIG. 4, the electron beam emitted from the electron beam emission window 11 of each electron beam tube 1 is detected by the electron dose detection unit 2 formed in a mesh, and the The detection signal is transmitted to the power supply 8 via each connection line 3.
At that time, the electron beam emitted from the electron beam emission window 11 of each electron beam tube 1 is not diffused by the shielding member 10 to the electron dose detection unit 2 provided in another electron beam tube 1. Therefore, each electron dose detection unit 2 detects only the electron beam of the corresponding electron beam tube 1 without detecting the electron beam emitted from another electron beam tube 1 that the electron dose detection unit 2 does not support. It can be detected accurately.

[0017]

According to the first aspect of the present invention, since each electron dose detecting section is provided with a shielding member for blocking incidence of an electron beam radiated from another electron beam tube which does not correspond, The electron dose detection unit accurately detects only the electron beam of the corresponding electron beam tube without detecting the electron beam emitted from another electron beam tube that does not correspond even if the processing chamber is in a reduced pressure state. be able to.

According to the second aspect of the present invention, the shielding member is easily constituted by a cylindrical body provided to surround the electron dose detecting section, a partition provided between the electron beam tubes, and the like. The effect of can be achieved.

[Brief description of the drawings]

FIG. 1 is a front sectional view showing a configuration of an electron beam processing apparatus according to a first embodiment of the present invention.

FIG. 2 is a diagram viewed from XX in FIG. 1;

FIG. 3 is a front sectional view showing a configuration of an electron beam processing apparatus according to a second embodiment of the present invention.

FIG. 4 is a diagram viewed from XX in FIG. 3;

FIG. 5 is a diagram showing a configuration of an electron beam processing apparatus according to the prior art of the present invention.

[Explanation of symbols]

 REFERENCE SIGNS LIST 1 electron beam tube 11 electron beam emission window 12 cover member 2 electron dose detection unit 3 connection wire 4 electron beam tube holding frame 5 electron dose detection unit holding unit 6 processing room 7 processed object 8 power supply device 9, 10 shielding member

Claims (2)

[Claims] 1. An electron beam processing apparatus comprising: a plurality of electron beam tubes; and an electron dose detection unit for detecting an electron dose emitted from an electron emission window of each electron beam tube, outside the electron emission window. An electron beam processing apparatus, wherein each electron dose detection unit is provided with a shielding member that blocks incidence of an electron beam emitted from another electron beam tube that does not correspond thereto. 2. The shielding member is a cylindrical body provided so as to surround each electron dose detecting unit, or a partition wall provided between another electron beam tube not corresponding to each electron dose detecting unit. The electron beam processing apparatus according to claim 1, wherein: