JP2002241685A - Method for producing polyphenol resin-containing varnish - Google Patents
Method for producing polyphenol resin-containing varnishInfo
- Publication number
- JP2002241685A JP2002241685A JP2001045875A JP2001045875A JP2002241685A JP 2002241685 A JP2002241685 A JP 2002241685A JP 2001045875 A JP2001045875 A JP 2001045875A JP 2001045875 A JP2001045875 A JP 2001045875A JP 2002241685 A JP2002241685 A JP 2002241685A
- Authority
- JP
- Japan
- Prior art keywords
- solvent
- water
- formula
- varnish
- condensation reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Paints Or Removers (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明はハロゲン系難燃剤や
アンチモン化合物を含有しなくても難燃性に優れる硬化
物を与え、しかもフィルムを形成するだけのフレキシビ
リティーを有するポリフェノール樹脂を含有するワニス
の効率的な製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention provides a cured product having excellent flame retardancy without containing a halogen-based flame retardant or an antimony compound, and contains a polyphenol resin having flexibility enough to form a film. The present invention relates to an efficient varnish production method.
【0002】[0002]
【従来の技術】エポキシ樹脂は種々の硬化剤で硬化させ
ることにより、一般的に機械的性質、耐水性、耐薬品
性、耐熱性、電気的性質などに優れた硬化物となり、接
着剤、塗料、積層板、成形材料、注型材料などの幅広い
分野に利用されている。従来、最も一般的に使用されて
きたエポキシ樹脂としてはビスフェノールA型エポキシ
樹脂が挙げられる。その他難燃剤としてはテトラブロモ
ビスフェノールA及びそのエポキシ化物、或いはテトラ
ブロモビスフェノールAにビスフェノールA型エポキシ
樹脂を反応させた化合物などが一般的に知られている。
またエポキシ樹脂の硬化剤としては酸無水物やアミン系
化合物が知られているが電気・電子部品分野では信頼性
の面からフェノールノボラックが使用されることが多
い。2. Description of the Related Art Epoxy resins can be cured with various curing agents to give cured products having generally excellent mechanical properties, water resistance, chemical resistance, heat resistance, electrical properties, etc. It is used in a wide range of fields, such as laminates, molding materials, and casting materials. Conventionally, the most commonly used epoxy resin is a bisphenol A type epoxy resin. As other flame retardants, tetrabromobisphenol A and epoxidized products thereof, and compounds obtained by reacting tetrabromobisphenol A with a bisphenol A type epoxy resin are generally known.
Acid anhydrides and amine compounds are known as curing agents for epoxy resins, but phenol novolak is often used in the field of electrical and electronic components from the viewpoint of reliability.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、前記し
たような臭素を含有する化合物は、難燃性には優れてい
るものの廃棄、焼却時に環境汚染の原因となる物質を発
生させる可能性がある点が指摘されている。また難燃性
助剤として使用されるアンチモン化合物も同様にその毒
性が懸念されている。近年の環境保護意識の高まりから
エポキシ樹脂組成物においてもハロゲンフリー、アンチ
モンフリーの要望が高まっている。また、フェノールノ
ボラックによるエポキシ樹脂の硬化物は信頼性には優れ
ているものの、その硬化物は剛直でフレキシビリティー
に欠ける。近年の電気・電子部品の形態は従来の大型パ
ッケージやガラス繊維を基材とした基板だけではなく、
ポリイミドやPETフィルム、金属泊上にワニスの状態
で塗布した後、溶剤を除去するシート状の成形物が開発
されている。この様な場合使用される樹脂には十分なフ
レキシビリティーが要求される。また、この様な樹脂を
製造する場合には、その縮合過程において塩酸が発生す
る場合がある。こうした場合発生した塩酸の一部は溶剤
中に溶解してしまうが、この塩酸はワニスを塗布乾燥さ
せた場合空気中に拡散し、製造装置などを腐食させてし
まう原因となる。However, the compounds containing bromine as described above are excellent in flame retardancy, but may generate substances that cause environmental pollution during disposal or incineration. Has been pointed out. Antimony compounds used as flame retardant auxiliaries are also concerned about their toxicity. In recent years, the demand for halogen-free and antimony-free epoxy resin compositions has been increasing due to the increasing awareness of environmental protection. Although a cured product of an epoxy resin by phenol novolak is excellent in reliability, the cured product is rigid and lacks flexibility. In recent years, the form of electric and electronic components is not limited to conventional large packages and substrates based on glass fiber,
A sheet-like molded product has been developed in which a solvent is removed after coating in a varnish state on a polyimide, PET film, or metal substrate. In such a case, the resin used is required to have sufficient flexibility. In the case of producing such a resin, hydrochloric acid may be generated in the condensation process. In such a case, a part of the generated hydrochloric acid is dissolved in the solvent. However, when the varnish is applied and dried, the hydrochloric acid diffuses into the air and causes corrosion of the manufacturing apparatus.
【0004】[0004]
【課題を解決するための手段】本発明者らはこうした実
状に鑑み、難燃性に優れた硬化物を与え、シート状に成
形してもフレキシビリティーを損なわず、しかもワニス
の溶剤中に塩酸の残存する量が極めて低いポリフェノー
ル樹脂の製造方法を求めて鋭意研究した結果、本発明を
完成させるに到った。In view of these circumstances, the present inventors have provided a cured product having excellent flame retardancy, and did not impair the flexibility even when formed into a sheet. As a result of intensive research for a method for producing a polyphenol resin having an extremely low residual amount of hydrochloric acid, the present invention has been completed.
【0005】すなわち本発明は、(1)下記式(1)That is, the present invention provides (1) the following formula (1)
【0006】[0006]
【化4】 Embedded image
【0007】(式中、Xはメチル基、塩素原子又は水酸
基を表す。)で表される化合物1モルに対しフェノール
を通常1.5〜10モル、好ましくは2〜8モルの割合
で縮合反応(1段目縮合反応)させた後、未反応のフェ
ノールを除去し、得られた化合物のフェノール性水酸基
1当量に対して、式(2)(Wherein X represents a methyl group, a chlorine atom or a hydroxyl group) The phenol is usually subjected to a condensation reaction at a ratio of 1.5 to 10 mol, preferably 2 to 8 mol, per 1 mol of the compound. After the (first-stage condensation reaction), unreacted phenol is removed, and the formula (2)
【0008】[0008]
【化5】 Embedded image
【0009】で表される化合物を、水に対する親和性が
低い沸点が100℃以上の溶剤の存在下で0.01〜
0.45モル縮合反応(2段目縮合反応)させ、反応終
了後、系内の温度を100℃以下に下げた後、系中に水
を加え撹拌下で、溶剤中に残存する塩酸を水側に溶解せ
しめた後、再度100℃以上に加熱し塩酸を含む水を系
外に留去することを特徴とするポリフェノール樹脂含有
ワニスの製造方法、(2)2段目縮合反応に使用される
溶剤がプロピレングリコールモノメチルエーテル、プロ
ピレングリコールモノプロピルエーテル及びプロピレン
グリコールモノブチルエーテルからなる群から選ばれた
1種以上である上記(1)記載のポリフェノール樹脂含
有ワニスの製造方法、(3)ポリフェノール樹脂が式
(3)The compound represented by the formula (I) may be used in the presence of a solvent having a low affinity for water and a boiling point of 100 ° C or higher in the range of 0.01 to
After a 0.45 mol condensation reaction (second-stage condensation reaction), and after the completion of the reaction, the temperature in the system is lowered to 100 ° C. or less, water is added to the system, and the hydrochloric acid remaining in the solvent is removed with stirring. And then reheating to 100 ° C. or higher to distill water containing hydrochloric acid out of the system. (2) Used in the second stage condensation reaction Wherein the solvent is at least one selected from the group consisting of propylene glycol monomethyl ether, propylene glycol monopropyl ether and propylene glycol monobutyl ether; (3)
【0010】[0010]
【化6】 Embedded image
【0011】(式中nは、2〜20の正数(平均値)を
表す。)で表され、GPC(ゲルパーミエーションクロ
マトグラフィー)による重量平均分子量が3000以上
である上記(1)又は(2)記載のポリフェノール樹脂
含有ワニスの製造方法に関する。(Where n represents a positive number (average value) of 2 to 20), and the weight average molecular weight determined by GPC (gel permeation chromatography) is 3,000 or more (1) or (1). 2) A method for producing a varnish containing a polyphenol resin described in 2).
【0012】[0012]
【発明の実施の形態】本発明は、前記式(1)の化合物
とフェノールを反応(1段目縮合反応)させ得られた化
合物に、式(2)の化合物を特定の溶剤の存在下に反応
(2段目縮合反応)させる。1段目の縮合反応におい
て、Xが塩素の場合は触媒は特に必要ではないが、メト
キシ基又は水酸基の場合は酸触媒を用いる。用い得る酸
触媒としては塩酸、硫酸、パラトルエンスルホン酸など
が挙げられるが、特にパラトルエンスルホン酸が好まし
い。酸触媒の使用量としては前記式(1)で表される化
合物1モルに対し通常0.001〜0.1重量部、好ま
しくは0.005〜0.05重量部である。フェノール
の使用量は、式(1)の化合物1モルに対し、1.5〜
10モルの範囲にする必要がある。1.5モル未満だと
分子量が大きくなりすぎて粘度上昇し作業性に困難をき
たす。また、10モルを超えると未反応のフェノールの
除去にコストがかかりすぎ経済的ではない。BEST MODE FOR CARRYING OUT THE INVENTION The present invention relates to a compound obtained by reacting a compound of the above formula (1) with phenol (first stage condensation reaction) and a compound of the formula (2) in the presence of a specific solvent. Reaction (second stage condensation reaction). In the first-stage condensation reaction, a catalyst is not particularly required when X is chlorine, but an acid catalyst is used when X is chlorine or methoxy group or hydroxyl group. Examples of the acid catalyst that can be used include hydrochloric acid, sulfuric acid, p-toluenesulfonic acid and the like, with p-toluenesulfonic acid being particularly preferred. The amount of the acid catalyst to be used is generally 0.001 to 0.1 part by weight, preferably 0.005 to 0.05 part by weight, per 1 mol of the compound represented by the formula (1). The phenol is used in an amount of 1.5 to 1 mol per 1 mol of the compound of the formula (1).
It must be in the range of 10 moles. If it is less than 1.5 mol, the molecular weight becomes too large and the viscosity rises, resulting in difficulty in workability. On the other hand, if it exceeds 10 moles, removal of unreacted phenol is too costly and not economical.
【0013】1段目の縮合反応は無溶剤下でも溶剤の存
在下でも行うことが出来る。溶剤を使用する場合、用い
得る溶剤としてはメタノール、エタノール、イソプロパ
ノール、メチルエチルケトン、メチルイソブチルケトン
等が挙げられる。溶剤の使用量としては前記式(1)で
表される化合物とフェノールの合計重量に対して通常1
0〜300重量%、好ましくは20〜250重量%であ
る。The first-stage condensation reaction can be carried out without a solvent or in the presence of a solvent. When a solvent is used, usable solvents include methanol, ethanol, isopropanol, methyl ethyl ketone, methyl isobutyl ketone and the like. The amount of the solvent used is usually 1 to the total weight of the compound represented by the formula (1) and phenol.
It is 0 to 300% by weight, preferably 20 to 250% by weight.
【0014】1段目の縮合反応は前記式(1)で表され
る化合物が完全に消失するまで、GPC(ゲルパーミエ
ーションクロマトグラフィー)で確認しながら行う。反
応温度としては通常40〜150℃、反応時間としては
通常1〜10時間である。The first-stage condensation reaction is performed while confirming by GPC (gel permeation chromatography) until the compound represented by the formula (1) is completely eliminated. The reaction temperature is usually 40 to 150 ° C, and the reaction time is usually 1 to 10 hours.
【0015】縮合反応終了後、必要により中和、水洗な
どにより酸触媒を除去し、次いで加熱減圧下に溶剤及び
未反応のフェノールを除去する。After completion of the condensation reaction, if necessary, the acid catalyst is removed by neutralization, washing with water, etc., and then the solvent and unreacted phenol are removed under reduced pressure while heating.
【0016】こうして得られた縮合物は、ビフェニル分
子とフェノール分子がメチレン結合を介して結合した構
造を取り、その重量平均分子量は通常500〜1500
となり、平均分子量によって異なり一概には言えないが
その軟化点は通常50〜100℃程度となる。次いで得
られた縮合物のフェノール性水酸基1当量に対し、前記
式(2)で表される化合物を通常0.01〜0.45モ
ル、好ましくは0.05〜0.4モルの範囲内で加え2
段目の縮合反応を行う。The condensate thus obtained has a structure in which a biphenyl molecule and a phenol molecule are bonded via a methylene bond, and the weight average molecular weight thereof is usually 500 to 1500.
The softening point is usually about 50 to 100 ° C., although it depends on the average molecular weight and cannot be unconditionally determined. Next, the compound represented by the formula (2) is used in an amount of usually 0.01 to 0.45 mol, preferably 0.05 to 0.4 mol, per 1 equivalent of the phenolic hydroxyl group of the obtained condensate. Plus 2
The second stage condensation reaction is performed.
【0017】2段目の縮合反応は生成物の分子量が大き
くなるにつれ粘度も上昇するため溶剤を使用する。溶剤
としては沸点が100℃以上、好ましくは100〜20
0℃で酸に対して不活性であり水との親和性が低く、好
ましくは比重が水より小さいものを使用する。具体的な
例としてはプロピレングリコールモノメチルエーテル、
プロピレングリコールモノプロピルエーテル又はプロピ
レングリコールモノブチルエーテル等が挙げられ、1種
又は2種以上を混合して用いる。溶剤は、生成物の重量
に対して通常2〜200重量%、好ましくは3〜150
重量%となるよう2段目縮合反応の前に予め反応系に添
加するか、適宜反応中に分割して添加する。In the second stage condensation reaction, a solvent is used because the viscosity increases as the molecular weight of the product increases. The solvent has a boiling point of 100 ° C or higher, preferably 100 to 20 ° C.
At 0 ° C., those which are inert to acids and have low affinity for water, preferably those having a specific gravity smaller than water are used. Specific examples include propylene glycol monomethyl ether,
Propylene glycol monopropyl ether, propylene glycol monobutyl ether, and the like are mentioned, and one kind or a mixture of two or more kinds is used. The solvent is usually 2-200% by weight, preferably 3-150% by weight, based on the weight of the product.
It is added to the reaction system in advance before the second-stage condensation reaction so as to obtain a weight%, or it is appropriately divided and added during the reaction.
【0018】反応は前記式(2)で表される化合物が完
全に消失するまでGPCで確認しながら行う。反応温度
としては通常100〜180℃、反応時間としては通常
1〜20時間である。The reaction is carried out while confirming by GPC until the compound represented by the formula (2) completely disappears. The reaction temperature is usually 100 to 180 ° C, and the reaction time is usually 1 to 20 hours.
【0019】尚、1段目、2段目の縮合反応とも原料で
あるビフェニル化合物として塩素を含有する化合物を使
用した場合、反応器の一方から窒素を吹き込み、他方か
ら副反応物として生成する塩酸ガスをチューブなどで取
り出す。取り出された塩酸は水酸化ナトリウム水溶液な
どのアルカリ性水溶液中にバブリングしてトラップする
ことが好ましい。また、1段目の反応で式(1)の化合
物としてXがメトキシ基又は水素原子である化合物をし
ようした場合、反応の進行に伴いメタノール又は水が生
成するが、これらは分留管を用いて系外へ除去する。2
段目縮合反応により、目的とするポリフェノール樹脂が
得られる。こうして得られたポリフェノール樹脂は通常
式(3)で表され、GPCによる重合平均分子量が30
00以上のものとなる。When a chlorine-containing compound is used as the starting biphenyl compound in the first and second condensation reactions, nitrogen is blown from one side of the reactor and hydrochloric acid generated as a by-product from the other side is used. Take out the gas with a tube. The extracted hydrochloric acid is preferably bubbled and trapped in an alkaline aqueous solution such as an aqueous sodium hydroxide solution. When a compound of the formula (1) in which X is a methoxy group or a hydrogen atom is used as the compound of the first step, methanol or water is produced as the reaction proceeds. To remove it from the system. 2
The target polyphenol resin is obtained by the stage condensation reaction. The polyphenol resin thus obtained is usually represented by the formula (3) and has a polymerization average molecular weight of 30 by GPC.
00 or more.
【0020】反応終了後、70〜100℃まで冷却を行
う。この温度範囲において粘度が上昇し、撹拌が困難な
場合は上記の溶剤を生成物の重量に対して通常10〜1
50重量%、好ましくは15〜100重量%程度となる
ように添加してもよい。After the completion of the reaction, the mixture is cooled to 70 to 100 ° C. When the viscosity increases in this temperature range and stirring is difficult, the above solvent is usually used in an amount of 10 to 1 based on the weight of the product.
You may add so that it may become 50 weight%, Preferably it is about 15-100 weight%.
【0021】次いで系内を100℃以下に下げ、70〜
100℃に保ちながら、撹拌下で温水を加える。温水の
量としては生成物の重量に対し通常10〜300重量%
であり、好ましくは20〜200重量%である。充分撹
拌を行った後、100℃から溶剤の沸点まで昇温し分流
管を用いて塩酸を含んだ水を系外に除去する。共沸によ
り溶剤も同時に流出するが、分流管を用いて分液し、溶
剤は系中に戻す。Next, the temperature in the system is lowered to 100 ° C. or less,
While maintaining the temperature at 100 ° C., add warm water under stirring. The amount of hot water is usually 10 to 300% by weight based on the weight of the product.
And preferably 20 to 200% by weight. After sufficient stirring, the temperature is raised from 100 ° C. to the boiling point of the solvent, and water containing hydrochloric acid is removed from the system using a diversion tube. The solvent also flows out at the same time due to azeotrope, but the liquid is separated using a diversion tube, and the solvent is returned to the system.
【0022】留去された水が中性に近くなるまで、上記
の水洗工程を繰り返す。通常、必要な水洗回数は2〜1
0回である。水洗終了後得られたポリフェノール樹脂の
溶液は、そのまま目的とするワニスとすることができる
が、更に上記の溶剤か或いは別の溶剤を固形分濃度が通
常10〜80重量%、好ましくは20〜70重量%にな
るまで加えて、常温での取り扱いが容易な溶液粘度に調
節することも可能である。用いられる溶剤としては、例
えばγ−ブチロラクトン類、N−メチルピロリドン(N
MP)、N,N−ジメチルホルムアミド(DMF)、
N,N−ジメチルアセトアミド、N,N−ジメチルイミ
ダゾリジノン等のアミド系溶剤、テトラメチレンスルフ
ォン等のスルフォン類、ジエチレングリコールジメチル
エーテル、ジエチレングリコールジエチルエーテル、プ
ロピレングリコール、プロピレングリコールジメチルエ
ーテル、プロピレングリコールモノメチルエーテルモノ
アセテート、プロピレングリコールモノブチルエーテル
等のエーテル系溶剤、アセトン、メチルエチルケトン、
メチルイソブチルケトン等のケトン系溶剤、トルエン、
キシレンなどの芳香族系溶剤が挙げられる。こうして得
られた得られた本発明のワニスはエポキシ樹脂の硬化剤
として好適に使用できる。得られたワニス中に、更に各
種エポキシ樹脂、及び硬化剤などを添加してワニス状組
成物とすることも出来る。The above washing step is repeated until the distilled water is close to neutral. Usually, the required number of washings is 2-1.
0 times. The polyphenol resin solution obtained after the completion of the water washing can be used as a target varnish as it is, and the solid content of the above solvent or another solvent is usually 10 to 80% by weight, preferably 20 to 70% by weight. In addition, it is possible to adjust the solution viscosity so that it can be easily handled at room temperature. As the solvent used, for example, γ-butyrolactones, N-methylpyrrolidone (N
MP), N, N-dimethylformamide (DMF),
Amide solvents such as N, N-dimethylacetamide, N, N-dimethylimidazolidinone, sulfones such as tetramethylene sulfone, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, propylene glycol, propylene glycol dimethyl ether, propylene glycol monomethyl ether monoacetate, Ether solvents such as propylene glycol monobutyl ether, acetone, methyl ethyl ketone,
Ketone solvents such as methyl isobutyl ketone, toluene,
And aromatic solvents such as xylene. The varnish of the present invention thus obtained can be suitably used as a curing agent for epoxy resin. A varnish-like composition can be obtained by further adding various epoxy resins and a curing agent to the obtained varnish.
【0023】[0023]
【実施例】次に本発明を更に実施例により具体的に説明
するが、以下において部は特に断わりのない限り重量部
である。またGPCの測定条件は以下の通りである。 機種:Shodex SYSTEM−21 カラム:KF−804L+KF−803L(×2本)連
結 溶離液:テトラヒドロフラン(1ml/min.,40
℃) 検出器:RI(RI−71S) UV(254nm;UV−41) サンプル:約0.4重量%THF溶液 (100μlイ
ンジェクト) 検量線:Shodex製標準ポリスチレン使用Next, the present invention will be described in further detail with reference to Examples. In the following, parts are by weight unless otherwise specified. GPC measurement conditions are as follows. Model: Shodex SYSTEM-21 Column: KF-804L + KF-803L (x2) connected Eluent: tetrahydrofuran (1 ml / min., 40
C) Detector: RI (RI-71S) UV (254 nm; UV-41) Sample: Approximately 0.4% by weight THF solution (100 μl injection) Calibration curve: Use standard Shodex polystyrene
【0024】実施例1 温度計、冷却管、撹拌器を取り付けたフラスコに窒素ガ
スパージを施しながら下記式(4)Example 1 A flask equipped with a thermometer, a cooling pipe, and a stirrer was purged with nitrogen gas and subjected to the following formula (4).
【0025】[0025]
【化7】 Embedded image
【0026】で表される化合物121部、フェノール1
88部を仕込み撹拌下で130℃まで昇温し、溶解させ
た。次いでパラトルエンスルホン酸0.5部を添加し、
その後、生成するメタノールを分留管を用いて系外に除
去しながら3時間反応を行った。GPCで式(4)の化
合物が消失したのを確認した後、メチルイソブチルケト
ン260部を加え、次いで3回水洗を行った後、油層か
らエバポレーターを用いて加熱減圧下、メチルイソブチ
ルケトン及び未反応のフェノールを除去することにより
化合物(A)168部を得た。得られた化合物(A)の
軟化点は70℃、150℃における溶融粘度は0.8P
a・s、水酸基当量は203g/eqであった。またG
PCを用いて重量平均分子量を測定したところ960で
あった。121 parts of a compound represented by the formula, phenol 1
88 parts were heated to 130 ° C. under stirring and dissolved. Then, 0.5 parts of paratoluenesulfonic acid was added,
Thereafter, the reaction was carried out for 3 hours while removing generated methanol outside the system using a fractionating tube. After confirming the disappearance of the compound of the formula (4) by GPC, 260 parts of methyl isobutyl ketone was added, followed by washing with water three times, and then heating the oil layer using an evaporator under reduced pressure while heating with methyl isobutyl ketone and unreacted. Was removed to obtain 168 parts of compound (A). The obtained compound (A) has a softening point of 70 ° C. and a melt viscosity at 150 ° C. of 0.8 P
a · s and the hydroxyl equivalent were 203 g / eq. G
It was 960 when the weight average molecular weight was measured using PC.
【0027】温度計、分留管、冷却管、撹拌器、冷却管
の先端に容器内に発生した塩酸ガスを系外に追い出せる
ようシリコンチューブを取り付けたフラスコに窒素ガス
パージを施しながら、得られた化合物(A)101.5
部、前記式(2)で表される化合物31.4部、プロピ
レングリコールモノブチルエーテル12.4部を仕込ん
だ。次いで、撹拌下で165℃まで昇温させ還流下で脱
塩酸反応を行った。発生した塩酸ガスはシリコンチュー
ブを通じて系外に除去した。GPC分析により反応を追
跡し式(2)で表される化合物が反応開始後3時間で完
全に消失したことを確認した後、更に3時間撹拌を続け
反応を終了させた。系内の温度を140℃まで冷却した
ところでプロピレングリコールモノブチルエーテル3
7.1部を更に追加し溶液粘度を下げた。系内の温度を
90℃まで冷却し70℃の温水を60部加え、90℃で
30分撹拌した。その後165℃まで昇温し、共沸脱水
により塩酸を含む水とプロピレングリコールモノブチル
エーテルの一部を系外に留去した。更に分留管を用いて
分液を行い塩酸を含む水は除去しプロピレングリコール
モノブチルエーテルは系内に戻した。その後、同様に系
内の温度を90℃まで下げ、70℃の温水(イオン交換
水)60部を再び加えて水洗を行った。この水洗工程を
5回行った。各水洗工程において留去された水中の塩素
量を硝酸銀滴定により測定したところ、表1のような結
果となった。A flask equipped with a thermometer, a fractionating tube, a cooling tube, a stirrer, and a silicon tube attached to the tip of the cooling tube so that hydrochloric acid gas generated in the container can be driven out of the system is purged with nitrogen gas. Compound (A) 101.5
Parts, 31.4 parts of the compound represented by the formula (2) and 12.4 parts of propylene glycol monobutyl ether. Next, the temperature was raised to 165 ° C. with stirring, and a dehydrochlorination reaction was performed under reflux. The generated hydrochloric acid gas was removed outside the system through a silicon tube. The reaction was followed by GPC analysis, and after confirming that the compound represented by the formula (2) had completely disappeared 3 hours after the start of the reaction, stirring was continued for another 3 hours to terminate the reaction. When the temperature in the system is cooled down to 140 ° C., propylene glycol monobutyl ether 3
An additional 7.1 parts was added to lower the solution viscosity. The temperature in the system was cooled to 90 ° C, 60 parts of 70 ° C hot water was added, and the mixture was stirred at 90 ° C for 30 minutes. Thereafter, the temperature was raised to 165 ° C., and water containing hydrochloric acid and a part of propylene glycol monobutyl ether were distilled out of the system by azeotropic dehydration. Further, liquid separation was carried out using a fractionation tube, water containing hydrochloric acid was removed, and propylene glycol monobutyl ether was returned into the system. Thereafter, similarly, the temperature in the system was lowered to 90 ° C., and 60 parts of 70 ° C. hot water (ion-exchanged water) was added again to perform water washing. This washing step was performed five times. The amount of chlorine in the water distilled off in each washing step was measured by silver nitrate titration, and the results were as shown in Table 1.
【0028】表1 水洗回数 水洗水中の塩素量(ppm) 1回目 1580 2回目 290 3回目 190 4回目 150 5回目 90Table 1 Number of times of washing The amount of chlorine in the washing water (ppm) 1st 1580 2nd 290 3rd 190 4th 150 5th 90
【0029】5回目の水洗を行った後、系中の温度を8
0℃まで下げ、メチルエチルケトン74.3部を加えて
希釈し固形分50%のワニス245部を得た。得られた
ポリフェノール樹脂は、式(3)で表され化合物はGP
Cを用いて重量平均分子量を測定したところ7800で
あった。またこのワニス中に含まれる全塩素量と溶剤を
蒸発させた固形分中の塩素量とを試料燃焼装置及びイオ
ンクロマトグラフィーを用いて測定した。その結果ワニ
ス中に含まれる全塩素量は90ppm、固形分中に含ま
れる全塩素量は140ppmであった。この結果から換
算するとワニスの溶剤中に含まれる塩素量は20ppm
となる。After the fifth washing with water, the temperature in the system was reduced to 8
The temperature was lowered to 0 ° C., and the mixture was diluted with 74.3 parts of methyl ethyl ketone to obtain 245 parts of a varnish having a solid content of 50%. The obtained polyphenol resin is represented by the formula (3) and the compound is GP
The weight average molecular weight measured using C was 7,800. The total chlorine content in the varnish and the chlorine content in the solid content obtained by evaporating the solvent were measured using a sample combustion apparatus and ion chromatography. As a result, the total chlorine content in the varnish was 90 ppm, and the total chlorine content in the solid content was 140 ppm. When converted from this result, the amount of chlorine contained in the solvent of the varnish was 20 ppm.
Becomes
【0030】[0030]
【発明の効果】本発明の製造方法によるポリフェノール
樹脂含有ワニスは溶剤中に含まれる塩酸の量が極めて少
ないため、このワニスを用いて組成物を調製し、溶剤を
蒸発させた場合、製造装置を腐食させることがない為、
成形材料、注型材料、積層材料、塗料、接着剤、レジス
トなどの広範囲の用途にきわめて有用である。The varnish containing a polyphenol resin according to the production method of the present invention has a very small amount of hydrochloric acid contained in the solvent. Therefore, when a composition is prepared using this varnish and the solvent is evaporated, the production apparatus is Because it does not corrode,
It is extremely useful in a wide range of applications such as molding materials, casting materials, laminate materials, paints, adhesives, resists, and the like.
Claims (3)
表す。)で表される化合物1モルに対しフェノールを
1.5〜10モルの範囲で縮合反応(1段目縮合反応)
させた後加熱減圧下で未反応のフェノールを除去し、得
られた化合物のフェノール性水酸基1当量に対して、式
(2) 【化2】 で表される化合物を、水に対する親和性が低い沸点が1
00℃以上の溶剤の存在下で0.01〜0.45モル縮
合反応(2段目縮合反応)させ、反応終了後、系内の温
度を100℃以下に下げた後、系中に水を加え撹拌下
で、溶剤中に残存する塩酸を水側に溶解せしめた後、再
度100℃以上に加熱し塩酸を含む水を系外に留去する
ことを特徴とするで表されるポリフェノール樹脂含有ワ
ニスの製造方法。(1) The following formula (1): (Wherein, X represents any one of chlorine, methoxy group and hydroxyl group). Condensation reaction of phenol in the range of 1.5 to 10 moles with respect to 1 mole of the compound represented by the formula (first stage condensation reaction)
After the reaction, unreacted phenol is removed under reduced pressure by heating, and the compound of the formula (2) A compound having a low affinity for water having a boiling point of 1
A 0.01-0.45 mol condensation reaction (second-stage condensation reaction) is performed in the presence of a solvent at 00 ° C or higher, and after the reaction is completed, the temperature in the system is lowered to 100 ° C or lower, and water is added to the system. Addition of polyphenol resin represented by the formula, wherein the hydrochloric acid remaining in the solvent is dissolved in the water side under stirring, and then heated to 100 ° C. or more again to distill water containing hydrochloric acid out of the system. Varnish production method.
レングリコールモノメチルエーテル、プロピレングリコ
ールモノプロピルエーテル及びプロピレングリコールモ
ノブチルエーテルからなる群から選ばれた1種以上であ
る請求項1記載のポリフェノール樹脂含有ワニスの製造
方法。2. The polyphenol resin according to claim 1, wherein the solvent used in the second-stage condensation reaction is at least one selected from the group consisting of propylene glycol monomethyl ether, propylene glycol monopropyl ether and propylene glycol monobutyl ether. Method for producing varnish containing varnish.
され、GPC(ゲルパーミエーションクロマトグラフィ
ー)による重量平均分子量が3000以上である請求項
1又は2記載のポリフェノール樹脂含有ワニスの製造方
法。3. A polyphenol resin having the formula (3): ## STR3 ## (Where n represents a positive number (average value) of 2 to 20), and the weight average molecular weight by GPC (gel permeation chromatography) is 3,000 or more. Method for producing varnish containing varnish.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001045875A JP4782930B2 (en) | 2001-02-22 | 2001-02-22 | Method for producing varnish containing polyphenol resin |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001045875A JP4782930B2 (en) | 2001-02-22 | 2001-02-22 | Method for producing varnish containing polyphenol resin |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2002241685A true JP2002241685A (en) | 2002-08-28 |
JP4782930B2 JP4782930B2 (en) | 2011-09-28 |
Family
ID=18907590
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001045875A Expired - Fee Related JP4782930B2 (en) | 2001-02-22 | 2001-02-22 | Method for producing varnish containing polyphenol resin |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4782930B2 (en) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0748426A (en) * | 1993-05-31 | 1995-02-21 | Mitsui Toatsu Chem Inc | Solid thermosetting resol resin, production and use thereof |
JPH07307203A (en) * | 1994-05-13 | 1995-11-21 | Mitsui Toatsu Chem Inc | Resistor varnish and its manufacture |
JPH09255603A (en) * | 1996-03-26 | 1997-09-30 | Meiwa Kasei Kk | Bis(hidroxybenzyl)biphenyl and its production |
JPH10130352A (en) * | 1996-10-28 | 1998-05-19 | Nippon Kayaku Co Ltd | Production of novolak type compound |
JPH11140148A (en) * | 1997-11-07 | 1999-05-25 | Meiwa Kasei Kk | Biphenyl novolac condensate |
-
2001
- 2001-02-22 JP JP2001045875A patent/JP4782930B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0748426A (en) * | 1993-05-31 | 1995-02-21 | Mitsui Toatsu Chem Inc | Solid thermosetting resol resin, production and use thereof |
JPH07307203A (en) * | 1994-05-13 | 1995-11-21 | Mitsui Toatsu Chem Inc | Resistor varnish and its manufacture |
JPH09255603A (en) * | 1996-03-26 | 1997-09-30 | Meiwa Kasei Kk | Bis(hidroxybenzyl)biphenyl and its production |
JPH10130352A (en) * | 1996-10-28 | 1998-05-19 | Nippon Kayaku Co Ltd | Production of novolak type compound |
JPH11140148A (en) * | 1997-11-07 | 1999-05-25 | Meiwa Kasei Kk | Biphenyl novolac condensate |
Also Published As
Publication number | Publication date |
---|---|
JP4782930B2 (en) | 2011-09-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US9217061B2 (en) | Phosphorus-containing compounds and their preparation process and use | |
WO2018020909A1 (en) | Thermally curable composition, varnish thereof, and thermally cured object | |
JP5563576B2 (en) | Phenol novolac resin, phenol novolac epoxy resin and epoxy resin composition | |
JP4104107B2 (en) | Epoxy resin composition and use thereof | |
JP2005501934A (en) | High nitrogen content triazine-phenol-aldehyde condensate | |
EP1323761B1 (en) | Polyphenol resin, process for its production, epoxy resin composition and its use | |
JP4591946B2 (en) | Poly (vinylbenzyl) ether compound and process for producing the same | |
WO2008068996A1 (en) | Oxetane-containing resin, and adhesive agent and resist agent each using the same | |
JP5142180B2 (en) | Epoxy resin composition and cured product thereof | |
JP2006193691A (en) | Photosensitive polyamic acid and photosensitive composition including the same | |
WO2012178111A2 (en) | Printed wiring board encapsulated by adhesive laminate comprising a di-isoimide, and process for preparing same | |
CN113227196B (en) | Phenoxy resin, process for producing the same, resin composition, material for circuit board, cured product, and laminate | |
JP3934829B2 (en) | 4,4'-biphenyldiyldimethylene-phenol resin and process for producing the same | |
JP4782930B2 (en) | Method for producing varnish containing polyphenol resin | |
US20140073736A1 (en) | Curable composition comprising bis-benzoxazine, method of curing, and the cured composition so formed | |
JP4605681B2 (en) | Polycresol resin, epoxy resin composition and cured product thereof | |
JP6016647B2 (en) | Epoxy resin and curable resin composition | |
US20140069693A1 (en) | Multi-layer article comprising discrete conductive pathways contacting a curable composition comprising bis-benzoxazine | |
JP4895065B2 (en) | Epoxy resin composition and cured product thereof | |
JP4509539B2 (en) | Epoxy resin composition sheet | |
JP2003268081A (en) | Method for producing polyphenol resin | |
JP2003105049A (en) | Method for manufacturing polyphenol resin | |
US8586734B2 (en) | Process for preparing substituted and unsubstituted diamino triazine aromatic di-isoimides | |
JPS6215221A (en) | Epoxy resin composition | |
JP2764456B2 (en) | Epoxy resin composition and cured product thereof |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20070618 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20101013 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20101019 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20101210 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20110704 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20110708 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140715 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
LAPS | Cancellation because of no payment of annual fees |