JP2002189188A - Planar type galvanomirror - Google Patents

Planar type galvanomirror

Info

Publication number
JP2002189188A
JP2002189188A JP2000387963A JP2000387963A JP2002189188A JP 2002189188 A JP2002189188 A JP 2002189188A JP 2000387963 A JP2000387963 A JP 2000387963A JP 2000387963 A JP2000387963 A JP 2000387963A JP 2002189188 A JP2002189188 A JP 2002189188A
Authority
JP
Japan
Prior art keywords
semiconductor substrate
base substrate
substrate
planar
movable plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000387963A
Other languages
Japanese (ja)
Other versions
JP4544734B2 (en
Inventor
Hirohiko Aiba
博彦 相場
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Miyota KK
Original Assignee
Miyota KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Miyota KK filed Critical Miyota KK
Priority to JP2000387963A priority Critical patent/JP4544734B2/en
Publication of JP2002189188A publication Critical patent/JP2002189188A/en
Application granted granted Critical
Publication of JP4544734B2 publication Critical patent/JP4544734B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To realize a planar type galvanomirror which is arranged with a semiconductor substrate at a center with respect to permanent magnets making a pair in order to act magnetic fields on plane coils of movable sections and enables to prevent the degradation in the reflectivity of a reflecting mirror, reduction of the number of components and improvement in productivity. SOLUTION: The flat planar movable sections 17 and 18 torsion bars 19 and 20 which pivot the movable sections oscillatably with a semiconductor substrate 16 are integrally formed on the semiconductor substrate and the top surfaces of the movable sections 17 and 18 are provided with the plane coils 21. The semiconductor substrate 16 is directly mounted on a base substrate 23 and is fixed by adhesion. The permanent magnets 31 making a pair for acting the magnetic fields on the plane coils of the movable sections are passed through holes 27 and are arranged and fixed at the inner walls of yokes 32. Pattern sections 23a disposed at the base substrate and pattern sections 16a formed on the semiconductor substrate are electrically connected.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、例えばレーザー光
を偏向走査するレーザースキャナまたは光スイッチ等に
利用するプレーナー型ガルバノミラーに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a planar galvano mirror used for a laser scanner or an optical switch for deflecting and scanning a laser beam, for example.

【0002】[0002]

【従来の技術】プレーナー型ガルバノミラーは、レーザ
ー光を偏向走査するレーザースキャナ等に利用されるも
ので、その原理は、磁界中に配置した可動コイルに電流
を流すと電流と磁束とに関連して電磁力が発生して電流
に比例した回転力が生じるのを利用している。回転力と
可動コイル保持部材のバネ力とが平衡する角度まで可動
コイルが回転し、この可動コイルを介して指針を振らせ
て電流の有無や大小を検出するというガルバノメータを
利用したもので、可動コイルと一体に回転する軸(可動
コイル保持部材)に、前記指針の代わりにミラー(反射
鏡)を設けて構成されるものである。小型のガルバノミ
ラーとして、半導体を使用したものが提案されている。
2. Description of the Related Art A planar type galvanometer mirror is used for a laser scanner or the like that deflects and scans a laser beam. The principle is that when a current is applied to a movable coil disposed in a magnetic field, the current and the magnetic flux are related. It utilizes the fact that an electromagnetic force is generated and a rotational force proportional to the current is generated. The movable coil rotates to an angle where the rotational force and the spring force of the movable coil holding member are balanced, and the pointer is swung through this movable coil to detect the presence or absence and magnitude of the current, using a galvanometer. A mirror (reflecting mirror) is provided instead of the pointer on a shaft (movable coil holding member) that rotates integrally with the coil. A small-sized galvanomirror using a semiconductor has been proposed.

【0003】図1は従来のプレーナー型2次元ガルバノ
ミラーを示す図で、(a)は上面図、(b)は側面断面
図である。図2はシリコン基板を台座基板に配置した状
態を示す図であり、(a)は上面図、(b)は側面断面
図である。可動部はシリコン基板1に一体形成され、第
1のトーションバー4,4でシリコン基板1に軸支され
る枠状の外側可動板2と、該第1トーションバー4,4
と軸方向が直交する第2のトーションバー5,5で外側
可動板2の内側に軸支される内側可動板3とからなり、
外側可動板2及び内側可動板3の上面には平面コイル6
を設け、内側可動板3の下面には反射ミラー7を設けて
ある。シリコン基板1を凹形状の台座基板8に配置固定
し、シリコン基板1上にはパターン1aが設けてあり、
該パターン1aと台座基板8上の配線パターン8aとは
ワイヤー9により接続されている。台座基板8の凹形状
の底部にはレーザーの入反射用の窓10があけられてい
る。
FIG. 1 is a view showing a conventional planar type two-dimensional galvanometer mirror, in which (a) is a top view and (b) is a side sectional view. 2A and 2B are views showing a state in which a silicon substrate is arranged on a pedestal substrate, wherein FIG. 2A is a top view and FIG. 2B is a side sectional view. The movable portion is formed integrally with the silicon substrate 1, and has a frame-shaped outer movable plate 2 supported by the silicon substrate 1 with the first torsion bars 4, 4.
And an inner movable plate 3 axially supported inside the outer movable plate 2 by second torsion bars 5, 5 whose axial direction is orthogonal to
A planar coil 6 is provided on the upper surfaces of the outer movable plate 2 and the inner movable plate 3.
And a reflection mirror 7 is provided on the lower surface of the inner movable plate 3. The silicon substrate 1 is arranged and fixed on a pedestal substrate 8 having a concave shape, and a pattern 1a is provided on the silicon substrate 1;
The pattern 1 a and the wiring pattern 8 a on the pedestal substrate 8 are connected by wires 9. At the bottom of the concave shape of the pedestal substrate 8, a window 10 for laser incident / reflection is opened.

【0004】台座基板8には4箇所のサイドスルーホー
ル8bが設けてあり、各サイドスルーホール8bは前記
配線パターン8aと接続している。台座基板8のベース
基板11への配置固定及び接続はベース基板11上に設
けた配線パターン11aと台座基板8のサイドスルーホ
ール8bを半田付けによって固定及び接続されている。
ベース基板11上の配線パターン11aには外部入力さ
れるコネクター12が接続されている。
The pedestal substrate 8 is provided with four side through holes 8b, each of which is connected to the wiring pattern 8a. The arrangement and fixing and connection of the pedestal substrate 8 to the base substrate 11 are performed by fixing and connecting the wiring pattern 11a provided on the base substrate 11 and the side through holes 8b of the pedestal substrate 8 by soldering.
An externally input connector 12 is connected to a wiring pattern 11 a on the base substrate 11.

【0005】可動部の平面コイル6に磁界を作用させる
ための対をなす永久磁石13,13は第1及び第2トー
ションバー4,4、5,5の軸方向と平行にベース基板
11の上下面に接着剤等で配置固定され、角状に中抜き
形成されたヨーク14の内壁に前記永久磁石13をそれ
ぞれ配置固定した構造になっている。ベース基板11上
の2箇所の丸穴15はプレーナー型2次元ガルバノミラ
ーのネジ固定用として設けている。
A pair of permanent magnets 13, 13 for applying a magnetic field to the planar coil 6 of the movable portion is provided on the base substrate 11 in parallel with the axial direction of the first and second torsion bars 4, 4, 5, 5. The permanent magnets 13 are arranged and fixed on the lower surface with an adhesive or the like, and the permanent magnets 13 are arranged and fixed on the inner wall of a yoke 14 which is hollowed out in a square shape. Two round holes 15 on the base substrate 11 are provided for fixing screws of a planar type two-dimensional galvanometer mirror.

【0006】[0006]

【発明が解決しようとする課題】従来のプレーナー型2
次元ガルバノミラー構造の場合では、永久磁石の磁界を
効率的に可動部上の平面コイルに作用させるため、永久
磁石の中央に半導体基板が配置されるように凹形状の台
座基板を配置固定した後、該台座基板をベース基板に固
定していた。しかし、台座基板とベース基板とを半田付
けによって固定及び接続する作業では、台座基板にあけ
られたレーザーの入反射用の窓から半田フラックスが飛
散して、半導体基板に設けられた反射ミラーに付着して
しまうことがあり、反射ミラーの反射率を低下させてし
まう。また、台座基板とベース基板との相対位置を合わ
せながら半田付け作業を行うので、作業時間も非常にか
かってしまい、生産性も悪い。
SUMMARY OF THE INVENTION Conventional planar type 2
In the case of the two-dimensional galvanomirror structure, in order to effectively apply the magnetic field of the permanent magnet to the planar coil on the movable part, the concave base member is arranged and fixed so that the semiconductor substrate is arranged at the center of the permanent magnet. The pedestal substrate is fixed to the base substrate. However, in the work of fixing and connecting the pedestal substrate and the base substrate by soldering, the solder flux scatters from the window for entering and reflecting the laser opened on the pedestal substrate and adheres to the reflection mirror provided on the semiconductor substrate. And the reflectivity of the reflection mirror is reduced. In addition, since the soldering operation is performed while adjusting the relative positions of the pedestal substrate and the base substrate, the operation time is extremely long, and the productivity is poor.

【0007】ベース基板の上下面に配置しているそれぞ
れの永久磁石は、ベース基板を挟んだ上下を合わせて1
箇所の永久磁石としての役割をなしている。しかし1箇
所の永久磁石をベース基板で分割してしまっているた
め、ベース基板の厚さ分の距離が永久磁石から発生する
磁力を低下させてしまっている。また、半導体基板を永
久磁石に対して理想位置である中央に配置しずらくなっ
ている。
Each of the permanent magnets disposed on the upper and lower surfaces of the base substrate has one
The part serves as a permanent magnet. However, since one permanent magnet is divided by the base substrate, the distance corresponding to the thickness of the base substrate reduces the magnetic force generated from the permanent magnet. In addition, it is difficult to arrange the semiconductor substrate at the ideal center of the permanent magnet.

【0008】[0008]

【課題を解決するための手段】半導体基板に、平板状の
可動部と該可動部を半導体基板に対して揺動可能に軸支
するトーションバーとを一体形成し、前記可動部の上面
には平面コイル、下面には反射ミラーを設け、該半導体
基板をベース基板に搭載する。該ベース基板の上下面に
はヨークを配置固定し、前記半導体基板のトーションバ
ーの軸方向と平行に配置された可動部の平面コイルに磁
界を作用させるための対をなす永久磁石をベース基板に
あけられた穴に貫通し、ヨークの内壁に配置固定する。
前記ベース基板に設けられたパターン部と前記半導体基
板に形成されたパターン部とが電気的に接続されたプレ
ーナー型ガルバノミラーとする。
A flat movable portion and a torsion bar for pivotally supporting the movable portion with respect to the semiconductor substrate are integrally formed on a semiconductor substrate, and an upper surface of the movable portion is provided on an upper surface of the movable portion. A plane coil and a reflection mirror are provided on the lower surface, and the semiconductor substrate is mounted on a base substrate. A yoke is arranged and fixed on the upper and lower surfaces of the base substrate, and a pair of permanent magnets for applying a magnetic field to a planar coil of a movable portion arranged in parallel with the axial direction of the torsion bar of the semiconductor substrate is provided on the base substrate. It penetrates the drilled hole and is fixed on the inner wall of the yoke.
A planar type galvano mirror in which a pattern portion provided on the base substrate and a pattern portion formed on the semiconductor substrate are electrically connected.

【0009】可動部が、第1のトーションバーで半導体
基板に軸支される枠状の外側可動板と、その第1トーシ
ョンバーと軸方向が直交する第2のトーションバーで外
側可動板の内側に軸支される内側可動板とからなり、外
側可動板及び内側可動板の上面には平面コイルを設け、
内側可動板の下面には反射ミラーを設け、第1及び第2
トーションバーの軸方向と平行に配置した可動部の平面
コイルに磁界を作用させるそれぞれの対をなす永久磁石
をヨークに固定し、該ヨークをベース基板に配置させた
プレーナー型ガルバノミラーとする。
The movable portion has a frame-shaped outer movable plate pivotally supported by the semiconductor substrate with a first torsion bar, and a second torsion bar whose axial direction is orthogonal to the first torsion bar inside the outer movable plate. It consists of an inner movable plate that is pivotally supported by, and a planar coil is provided on the upper surface of the outer movable plate and the inner movable plate,
A reflection mirror is provided on the lower surface of the inner movable plate, and the first and second mirrors are provided.
A pair of permanent magnets for applying a magnetic field to the planar coil of the movable portion arranged in parallel with the axial direction of the torsion bar is fixed to the yoke, and the yoke is a planar galvanomirror arranged on the base substrate.

【0010】可動部の平面コイルに磁界を作用させるた
めの対をなす永久磁石を、永久磁石貫通用の穴をあけた
ベース基板に貫通させる構成としたプレーナー型ガルバ
ノミラーとする。
A planar type galvanomirror is constructed so that a pair of permanent magnets for applying a magnetic field to a planar coil of a movable portion is penetrated through a base substrate having a hole for penetrating the permanent magnets.

【0011】ベース基板に半導体基板を直に接着固定
し、ベース基板を貫通した永久磁石は貫通方向中央に半
導体基板が配置されるプレーナー型ガルバノミラーとす
る。
A semiconductor substrate is directly adhered and fixed to a base substrate, and a permanent magnet penetrating the base substrate is a planar galvano mirror in which the semiconductor substrate is disposed at the center in the penetrating direction.

【0012】[0012]

【発明の実施の形態】図3は本発明の実施形態を示すプ
レーナー型2次元ガルバノミラーの反射ミラー側からの
斜視図である。図4は図3で示すプレーナー型2次元ガ
ルバノミラーであり、(a)は上面図、(b)は側面断
面図、(c)は正面断面図である。半導体基板16に、
平板状の可動部が、第1のトーションバー19,19で
半導体基板16に軸支される枠状の外側可動板17と、
その第1トーションバー19,19と軸方向が直交する
第2のトーションバー20,20で外側可動板17の内
側に軸支される内側可動板18とからなり、外側可動板
17及び内側可動板18の上面には平面コイル21を設
け、内側可動板18の下面には反射ミラー22を設けて
ある。
FIG. 3 is a perspective view of a planar type two-dimensional galvanometer mirror according to an embodiment of the present invention, as viewed from a reflection mirror side. 4A and 4B show the planar type two-dimensional galvanometer mirror shown in FIG. 3, wherein FIG. 4A is a top view, FIG. 4B is a side sectional view, and FIG. 4C is a front sectional view. On the semiconductor substrate 16,
A frame-shaped outer movable plate 17 in which a plate-shaped movable portion is supported by the semiconductor substrate 16 by first torsion bars 19;
The first torsion bars 19, 19 and the second torsion bars 20, 20 whose axial directions are orthogonal to each other, are comprised of an inner movable plate 18 supported inside the outer movable plate 17, and the outer movable plate 17 and the inner movable plate A planar coil 21 is provided on the upper surface of the movable member 18, and a reflection mirror 22 is provided on a lower surface of the inner movable plate 18.

【0013】半導体基板16をベース基板23上面に搭
載し、接着剤等により固定している。半導体基板16上
にはパターン16aが形成されており、該パターン16
aとベース基板23上面の配線パターン23aをワイヤ
ー24により接続し、該配線パターン23aには外部入
力されるコネクター25を接続している。
The semiconductor substrate 16 is mounted on the upper surface of the base substrate 23 and fixed by an adhesive or the like. On the semiconductor substrate 16, a pattern 16a is formed.
a and a wiring pattern 23a on the upper surface of the base substrate 23 are connected by a wire 24, and a connector 25 input externally is connected to the wiring pattern 23a.

【0014】ベース基板23には半導体基板16の内側
可動板18下面に設けられた反射ミラー22にレーザー
を入反射させるための穴26と、第1及び第2トーショ
ンバー19,19、20,20の軸方向に永久磁石31
貫通用の穴27が各2箇所ずつあけられている。また、
ヨーク32の配置位置を決めるための2箇所の穴28
と、本発明のプレーナー型2次元ガルバノミラーの位置
出し固定用としてネジ穴29、位置出し穴30を各2箇
所ずつ設けている。
The base substrate 23 has a hole 26 for allowing a laser to enter and reflect a reflection mirror 22 provided on the lower surface of the inner movable plate 18 of the semiconductor substrate 16, and first and second torsion bars 19, 19, 20, 20. Permanent magnet 31 in the axial direction of
Two through holes 27 are drilled. Also,
Two holes 28 for determining the arrangement position of the yoke 32
And two screw holes 29 and two positioning holes 30 for positioning and fixing the planar type two-dimensional galvanomirror of the present invention.

【0015】ヨーク32は角状に中抜き形成し、ベース
基板23のヨーク32位置決め用の穴28に合わせるよ
うにしてベース基板23上下面の周縁部に配置固定す
る。外側及び内側可動板17,18の平面コイル21に
磁界を作用させるための対をなす永久磁石31を、ベー
ス基板23にあけられた第1及び第2トーションバー1
9,19、20,20の軸方向にある永久磁石31貫通
用の穴27にそれぞれ貫通し、前記ヨーク32の内壁に
配置固定する。ベース基板23を貫通した永久磁石31
の貫通位置は、貫通方向に対して永久磁石31の中央に
半導体基板16を配置する位置になっている。
The yoke 32 is hollowed out in a square shape, and is fixed to the upper and lower peripheral surfaces of the base substrate 23 so as to match the holes 28 for positioning the yoke 32 of the base substrate 23. A pair of permanent magnets 31 for applying a magnetic field to the planar coils 21 of the outer and inner movable plates 17 and 18 are connected to the first and second torsion bars 1 opened on the base substrate 23.
9, 19, 20, and 20 penetrate through the holes 27 for penetrating the permanent magnet 31 in the axial direction, and are arranged and fixed to the inner wall of the yoke 32. Permanent magnet 31 penetrating base substrate 23
Is a position where the semiconductor substrate 16 is arranged at the center of the permanent magnet 31 with respect to the penetration direction.

【0016】[0016]

【発明の効果】ベース基板に半導体基板が直に接着固定
されるようになったため、台座基板が不必要になり、構
成部品点数が削減できる。
As described above, since the semiconductor substrate is directly bonded and fixed to the base substrate, the pedestal substrate becomes unnecessary, and the number of components can be reduced.

【0017】ベース基板に半導体基板が直に接着固定さ
れるようになったため、半導体基板に設けられた反射ミ
ラー周辺部での半田付け作業が無くなったことによる反
射ミラーの反射率低下の防止と生産性向上が可能とな
る。
Since the semiconductor substrate is directly adhered and fixed to the base substrate, a reduction in the reflectance of the reflection mirror due to the absence of soldering work around the reflection mirror provided on the semiconductor substrate is prevented and production is performed. Performance can be improved.

【0018】ベース基板に永久磁石を貫通させる穴をあ
けたことにより、磁界を作用させるための対をなす永久
磁石がベース基板によって分割されなくなったため、磁
力の低下を防止できる。
By forming a hole in the base substrate through which the permanent magnet penetrates, a pair of permanent magnets for applying a magnetic field is not divided by the base substrate, so that a reduction in magnetic force can be prevented.

【0019】ベース基板に永久磁石を貫通させる穴をあ
けたことにより、貫通させた永久磁石の理想位置である
中央に半導体基板を配置させることが可能となる。
By forming a hole for penetrating the permanent magnet in the base substrate, it becomes possible to arrange the semiconductor substrate at the center, which is an ideal position of the penetrated permanent magnet.

【図面の簡単な説明】[Brief description of the drawings]

【図1】従来のプレーナー型2次元ガルバノミラーを示
す図で、(a)は上面図、(b)は側面断面図。
FIG. 1 is a view showing a conventional planar type two-dimensional galvanometer mirror, where (a) is a top view and (b) is a side sectional view.

【図2】従来のプレーナー型2次元ガルバノミラーのシ
リコン基板を台座基板に配置した状態を示す図で、
(a)は上面図、(b)は側面断面図。
FIG. 2 is a view showing a state in which a silicon substrate of a conventional planar type two-dimensional galvanometer mirror is arranged on a pedestal substrate;
(A) is a top view, (b) is a side sectional view.

【図3】本発明の実施形態を示すプレーナー型2次元ガ
ルバノミラーの反射ミラー側からの斜視図。
FIG. 3 is a perspective view of a planar type two-dimensional galvanometer mirror according to an embodiment of the present invention, as viewed from a reflection mirror side.

【図4】図3で示すプレーナー型2次元ガルバノミラー
であり、(a)は上面図、(b)は側面断面図。
4A and 4B are planer type two-dimensional galvanometer mirrors shown in FIG. 3, wherein FIG. 4A is a top view and FIG.

【符号の説明】[Explanation of symbols]

1 シリコン基板 1a パターン 2 外側可動板 3 内側可動板 4 第1トーションバー 5 第2トーションバー 6 平面コイル 7 反射ミラー 8 台座基板 8a 配線パターン 8b サイドスルーホール 9 ワイヤー 10 窓 11 ベース基板 11a配線パターン 12 コネクター 13 永久磁石 14 ヨーク 15 丸穴 16 半導体基板 16aパターン 17 外側可動板 18 内側可動板 19 第1トーションバー 20 第2トーションバー 21 平面コイル 22 反射ミラー 23 ベース基板 23a配線パターン 24 ワイヤー 25 コネクター 26 穴 27 穴 28 穴 29 ネジ穴 30 位置出し穴 31 永久磁石 32 ヨーク Reference Signs List 1 silicon substrate 1a pattern 2 outer movable plate 3 inner movable plate 4 first torsion bar 5 second torsion bar 6 planar coil 7 reflection mirror 8 pedestal substrate 8a wiring pattern 8b side through hole 9 wire 10 window 11 base substrate 11a wiring pattern 12 Connector 13 Permanent magnet 14 Yoke 15 Round hole 16 Semiconductor substrate 16a pattern 17 Outer movable plate 18 Inner movable plate 19 First torsion bar 20 Second torsion bar 21 Flat coil 22 Reflection mirror 23 Base substrate 23a Wiring pattern 24 Wire 25 Connector 26 Hole 27 hole 28 hole 29 screw hole 30 positioning hole 31 permanent magnet 32 yoke

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 半導体基板に、平板状の可動部と該可動
部を半導体基板に対して揺動可能に軸支するトーション
バーとを一体形成し、前記可動部の上面には平面コイ
ル、下面には反射ミラーを設け、該半導体基板をベース
基板に搭載し、該ベース基板と、前記半導体基板のトー
ションバーの軸方向と平行に配置した可動部の平面コイ
ルに磁界を作用させるための対をなす永久磁石をヨーク
に固定し、該ヨークをベース基板に配置固定し、前記ベ
ース基板に設けたパターン部と前記半導体基板に設けた
パターン部とが電気的に接続されたプレーナー型ガルバ
ノミラー。
1. A semiconductor substrate in which a plate-shaped movable portion and a torsion bar for pivotally supporting the movable portion with respect to the semiconductor substrate are integrally formed, a planar coil is provided on an upper surface of the movable portion, and a lower surface is provided on the lower surface. Is provided with a reflection mirror, the semiconductor substrate is mounted on a base substrate, and a pair for applying a magnetic field to the base substrate and a planar coil of a movable portion disposed in parallel with the axial direction of the torsion bar of the semiconductor substrate. A planar galvano mirror in which a permanent magnet to be formed is fixed to a yoke, the yoke is arranged and fixed to a base substrate, and a pattern portion provided on the base substrate and a pattern portion provided on the semiconductor substrate are electrically connected.
【請求項2】 可動部が、第1のトーションバーで半導
体基板に軸支される枠状の外側可動板と、該第1トーシ
ョンバーと軸方向が直交する第2のトーションバーで外
側可動板の内側に軸支される内側可動板とからなり、外
側可動板及び内側可動板の上面には平面コイルを設け、
内側可動板の下面には反射ミラーを設け、第1及び第2
トーションバーの軸方向と平行に配置した可動部の平面
コイルに磁界を作用させるそれぞれの対をなす永久磁石
をヨークに固定し、該ヨークをベース基板に配置させて
いるプレーナー型ガルバノミラー。
A movable portion having a frame-shaped outer movable plate pivotally supported by the semiconductor substrate with a first torsion bar; and a second torsion bar having an axial direction orthogonal to the first torsion bar. It consists of an inner movable plate that is pivotally supported inside, and a planar coil is provided on the upper surface of the outer movable plate and the inner movable plate,
A reflection mirror is provided on the lower surface of the inner movable plate, and the first and second mirrors are provided.
A planar galvano mirror in which a pair of permanent magnets for applying a magnetic field to a plane coil of a movable portion arranged in parallel with the axial direction of a torsion bar is fixed to a yoke, and the yoke is arranged on a base substrate.
【請求項3】 可動部の平面コイルに磁界を作用させる
ための対をなす永久磁石を、貫通用の穴があけられたベ
ース基板に貫通させる構成を特徴とした請求項1または
2に記載のプレーナー型ガルバノミラー。
3. The structure according to claim 1, wherein a pair of permanent magnets for applying a magnetic field to the planar coil of the movable portion is penetrated through the base substrate having a hole for penetration. Planar type galvanometer mirror.
【請求項4】 ベース基板に半導体基板を直に接着固定
し、ベース基板を貫通した永久磁石は貫通方向中央に半
導体基板が配置されることを特徴とした請求項3に記載
のプレーナー型ガルバノミラー。
4. The planar galvanomirror according to claim 3, wherein the semiconductor substrate is directly adhered and fixed to the base substrate, and the semiconductor substrate is disposed at the center of the permanent magnet penetrating the base substrate in the penetrating direction. .
JP2000387963A 2000-12-21 2000-12-21 Planar type galvanometer mirror Expired - Lifetime JP4544734B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000387963A JP4544734B2 (en) 2000-12-21 2000-12-21 Planar type galvanometer mirror

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000387963A JP4544734B2 (en) 2000-12-21 2000-12-21 Planar type galvanometer mirror

Publications (2)

Publication Number Publication Date
JP2002189188A true JP2002189188A (en) 2002-07-05
JP4544734B2 JP4544734B2 (en) 2010-09-15

Family

ID=18854792

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP4544734B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010041873A (en) * 2008-08-07 2010-02-18 Nippon Signal Co Ltd:The Planar type electromagnetic actuator
JP2014200140A (en) * 2013-03-29 2014-10-23 日本信号株式会社 Planar type actuator

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08322227A (en) * 1995-05-26 1996-12-03 Nippon Signal Co Ltd:The Planar type electromagnetic actuator
WO1996039643A1 (en) * 1995-06-05 1996-12-12 Nihon Shingo Kabushiki Kaisha Electromagnetic actuator
JPH11231252A (en) * 1997-12-09 1999-08-27 Olympus Optical Co Ltd Light deflector and manufacturing method thereof
JP2000249964A (en) * 1999-02-26 2000-09-14 Nippon Signal Co Ltd:The Planar type optical scanning device and its mount structure
JP2000258721A (en) * 1999-03-10 2000-09-22 Miyota Kk Planar type galvanomirror
JP2001272627A (en) * 2000-03-28 2001-10-05 Miyota Kk Planer type galvanometer mirror and its manufacturing method
JP2002014297A (en) * 2000-06-29 2002-01-18 Miyota Kk Galvano mirror

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08322227A (en) * 1995-05-26 1996-12-03 Nippon Signal Co Ltd:The Planar type electromagnetic actuator
WO1996039643A1 (en) * 1995-06-05 1996-12-12 Nihon Shingo Kabushiki Kaisha Electromagnetic actuator
JPH11231252A (en) * 1997-12-09 1999-08-27 Olympus Optical Co Ltd Light deflector and manufacturing method thereof
JP2000249964A (en) * 1999-02-26 2000-09-14 Nippon Signal Co Ltd:The Planar type optical scanning device and its mount structure
JP2000258721A (en) * 1999-03-10 2000-09-22 Miyota Kk Planar type galvanomirror
JP2001272627A (en) * 2000-03-28 2001-10-05 Miyota Kk Planer type galvanometer mirror and its manufacturing method
JP2002014297A (en) * 2000-06-29 2002-01-18 Miyota Kk Galvano mirror

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010041873A (en) * 2008-08-07 2010-02-18 Nippon Signal Co Ltd:The Planar type electromagnetic actuator
JP2014200140A (en) * 2013-03-29 2014-10-23 日本信号株式会社 Planar type actuator

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