JP2002179469A - Production process of sintered compact for target - Google Patents

Production process of sintered compact for target

Info

Publication number
JP2002179469A
JP2002179469A JP2000378837A JP2000378837A JP2002179469A JP 2002179469 A JP2002179469 A JP 2002179469A JP 2000378837 A JP2000378837 A JP 2000378837A JP 2000378837 A JP2000378837 A JP 2000378837A JP 2002179469 A JP2002179469 A JP 2002179469A
Authority
JP
Japan
Prior art keywords
green body
casting
target
dried
drying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000378837A
Other languages
Japanese (ja)
Inventor
Yuji Takatsuka
裕二 高塚
Shoji Takanashi
昌二 高梨
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP2000378837A priority Critical patent/JP2002179469A/en
Publication of JP2002179469A publication Critical patent/JP2002179469A/en
Pending legal-status Critical Current

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  • Compositions Of Oxide Ceramics (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a production process of a sintered compact for a target with which when dried, no crack or no warpage is not caused in the green body and the dried green body shows high strength, by applying a slip casting method in formation of a large-sized green body. SOLUTION: This sintered compact production process involves casting a slurry consisting of a powdery metal oxide such as oxide of indium, tin, zinc, aluminum, gallium, cerium, germanium or silicon, or multiple oxide of plural metals selected from these metals, a binder, a dispersant and water, into a casting mold, drying the resulting green body to obtain a dried green body and sintering the dried green body, wherein: immediately after the casting, the formed green body is dried under drying conditions sufficient to provide a 3-5 mg/cm3/hr [(weight) of H2O removed)/(green body unit volume)/(unit time)] drying rate and also, an about >=70% ratio of the amount of water removed to the amount of water contained in the green body immediately after the casing, more specifically, when the drying is performed in an atmosphere of 20-60 deg.C and a 75-85% relative humidity; subsequently, the dried green body is subjected to heat treatment at 80-200 deg.C for 20 min to 1 hr; and thereafter; the heat-treated body is sintered at a desired temperature.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、太陽電池や液晶表
示素子などに用いられる透明導電膜や半導体メモリのキ
ャパシタやコンデンサ、PDPの放電電極の保護膜に用い
られる高・強誘電体膜をスパッタリング法で製造する際
に利用されるセラミックス焼結体ターゲットに関し、よ
り具体的には、高密度で大型のセラミックス焼結体の製
造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sputtering method for a transparent conductive film used for a solar cell or a liquid crystal display device, a high-ferroelectric film used for a protective film of a capacitor or a capacitor of a semiconductor memory, or a discharge electrode of a PDP. The present invention relates to a ceramic sintered body target used when manufacturing by a method, and more specifically, to a method for manufacturing a high-density and large-sized ceramic sintered body.

【0002】[0002]

【従来の技術】従来、スパッタリングターゲット用セラ
ミックス焼結体は原料粉末をボールミルや媒体撹拌ミル
での粉砕・混合し、スプレードライヤー等により乾燥・
造粒し、金型成型や鋳込み成型、冷間静水圧プレス(C
IP)等で成型した後、焼結炉での焼結して得る、いわ
ゆる常圧焼結法で製造されることが多い。他の方法とし
ては、ホットプレス等を用いる加圧焼結法があるが、装
置コストが高くなり、大型のスパッタリングターゲット
製造方法としては一般的ではない。
2. Description of the Related Art Conventionally, a ceramic sintered body for a sputtering target is obtained by pulverizing and mixing a raw material powder with a ball mill or a medium stirring mill, and drying and mixing the powder with a spray drier or the like.
Granulation, mold molding and casting molding, cold isostatic pressing (C
It is often manufactured by a so-called normal pressure sintering method, which is obtained by sintering in a sintering furnace after molding by IP) or the like. As another method, there is a pressure sintering method using a hot press or the like, but the equipment cost is high, and it is not general as a method for manufacturing a large sputtering target.

【0003】近年、液晶表示素子や太陽電池の大型化や
半導体のSiウエハーの大口径化に伴って用いられるス
パッタリングターゲットも大型化し、700mm角の酸
化錫添加酸化インジウム(ITO)ターゲットやガリウ
ム添加酸化亜鉛ターゲット(GZO)、アルミニウム添
加酸化亜鉛ターゲット(AZO)や直径350mmのス
トロンチウム添加チタン酸バリウムターゲット等が開発
されている。
In recent years, as the size of liquid crystal display elements and solar cells has increased, and the diameter of semiconductor Si wafers has increased, the size of sputtering targets used has also increased, resulting in a 700 mm square tin oxide-added indium oxide (ITO) target and gallium-added oxide. A zinc target (GZO), an aluminum-added zinc oxide target (AZO), a strontium-added barium titanate target having a diameter of 350 mm, and the like have been developed.

【0004】800mm角程度の大型ターゲット用焼結
体を製造するには成型時の面圧を500Kg/cm2
することが望まれるが、そうすると金型プレス法では2
500トンの金型プレスが必要となり、CIP法でも大
型の装置が必要となり、現実的でない。そのため、複数
のより小さな焼結体を張り合わせた分割ターゲットが使
用されていた。しかし、この様な分割ターゲットを用い
ると以下の問題が発生する。
[0004] To produce a 800mm angle about a large target for sinter is desirable to surface pressure during molding and 500 Kg / cm 2, Then the die pressing method 2
A 500-ton mold press is required, and the CIP method also requires a large-sized apparatus, which is not practical. Therefore, a split target in which a plurality of smaller sintered bodies are bonded has been used. However, the use of such a split target causes the following problem.

【0005】1.スパッタリング時に出るゴミが焼結体
と焼結体との繋ぎ部に貯まり、このゴミが膜 表面
に再付着して得られる膜のピンホールを増加させる。
[0005] 1. Debris generated during sputtering accumulates at the joint between the sintered bodies, and the dust re-adheres to the film surface, thereby increasing the number of pinholes in the resulting film.

【0006】2.焼結体繋ぎ部周囲の焼結体表面にノジ
ュールと呼ばれる黒色異物が発生し、成膜速 度の
低下、得られる膜の光透過率の低下、得られる膜の電気
抵抗の増加や異常放電 によるピンホールの増加が
おきる。
[0006] 2. Black foreign substances called nodules are generated on the surface of the sintered body around the joint of the sintered body, resulting in a decrease in deposition rate, a decrease in light transmittance of the obtained film, an increase in electric resistance of the obtained film, and abnormal discharge. Pinholes increase.

【0007】またノジュールはターゲット中の低密度部
分にも発生するため、焼結体の密度が高いく均一なター
ゲットが求められている。
[0007] Since nodules also occur in low-density portions of the target, a uniform target having a high density of the sintered body is required.

【0008】最近、特公平6-659や特開平9-188564に示
されるような圧力鋳込み成型法を用いることで金型プレ
ス法やCIP法よりも大型かつ高密度のターゲットが製造
できるようになった。これらの鋳込み成型に用いる型と
しては石膏製の型や特許第1073068号に記載された様な
フェノール樹脂系多孔質プラスチック製の型が使用可能
である。
Recently, by using a pressure casting method as disclosed in Japanese Patent Publication No. 6-659 and Japanese Patent Application Laid-Open No. Hei 9-88564, it has become possible to produce a larger and higher-density target than the die pressing method or the CIP method. Was. As the mold used for the casting, a mold made of gypsum or a mold made of a phenolic resin-based porous plastic as described in Japanese Patent No. 1073068 can be used.

【0009】[0009]

【発明が解決しようとする課題】ところで、最近では更
にLCDや太陽電池等が大型化する傾向になり、1m以上
の長さを持つターゲットが要求されるようになってきて
いる。しかしながら、上記鋳込み成型法を用いても、こ
の要求を満たすことは困難であった。即ち、鋳込み成型
法を適用しても、50cm×50cmを越える成形体で
は、乾燥時にクラックや反りが発生し易く、また焼結炉
へ入れる等の成形体ハンドリング時に変形、破損すると
いう問題がある。特に面積に比べて薄いターゲットを製
造する場合には成形体強度が低くなり、特にこの欠点が
顕著になる。
By the way, recently, the size of LCDs, solar cells, and the like has been increasing, and a target having a length of 1 m or more has been required. However, it has been difficult to satisfy this requirement even by using the casting method. That is, even if the casting method is applied, a molded article exceeding 50 cm × 50 cm is liable to crack or warp during drying, and is deformed or broken during handling of the molded article such as being put into a sintering furnace. . In particular, when a target thinner than the area is manufactured, the strength of the compact is reduced, and this disadvantage is particularly remarkable.

【0010】本発明は鋳込み成型法を適用して大型の成
形体を得るに際して、乾燥時にクラックや反りを発生さ
せないと同時に成形体強度の高いターゲット用焼結体を
得る方法の提供を目的とする。
An object of the present invention is to provide a method for obtaining a sintered body for a target which does not generate cracks and warpage during drying and has a high strength of the molded body when a large molded body is obtained by applying the casting method. .

【0011】[0011]

【課題を解決する手段】上記目的を達成する本発明のタ
ーゲット用焼結体の製造方法は、インジウム、錫、亜
鉛、アルミニウム、ガリウム、セリウム、ゲルマニウ
ム、シリコンの酸化物、またはこれらの複合酸化物等の
金属酸化物粉末、バインダー、分散剤および水からなる
スラリーを鋳込み型に注入し、乾燥して成形体を得、そ
の成形体を焼結してターゲット用焼結体を製造する方法
において、3〜5mgH2O/成形体1cm3/時間、よ
り好ましくは4〜4.5mgH2O/成形体1cm3/時
間の乾燥速度で、鋳込み直後の成形体の水分の概ね70
%以上を乾燥させ、次いで80〜200#Cで20分から
1時間熱処理し、その後所望温度で焼結するものであ
る。
A method for producing a sintered body for a target according to the present invention, which achieves the above object, comprises an oxide of indium, tin, zinc, aluminum, gallium, cerium, germanium, silicon, or a composite oxide thereof. In a method of manufacturing a sintered body for a target by injecting a slurry comprising a metal oxide powder such as a binder, a dispersant, and water into a casting mold and drying to obtain a molded body, and sintering the molded body, At a drying rate of 3 to 5 mg H 2 O / molded body 1 cm 3 / hour, more preferably 4 to 4.5 mg H 2 O / molded body 1 cm 3 / hour, the water content of the molded body immediately after casting is about 70.
% Or more, then heat-treated at 80 to 200 #C for 20 minutes to 1 hour, and then sintered at a desired temperature.

【0012】また、本発明の別の態様はインジウム、
錫、亜鉛、アルミニウム、ガリウム、セリウム、ゲルマ
ニウム、シリコンの酸化物、またはこれらの複合酸化物
等の金属酸化物粉末、バインダー、分散剤および水から
なるスラリーを鋳込み型に注入し、乾燥して成形体を
得、その成形体を焼結してターゲット用焼結体を製造す
る方法において、鋳込み直後の乾燥条件を、温度20〜
60#C、湿度75〜85%の雰囲気中とし、該雰囲気中
で鋳込み直後の成形体の水分の概ね70%以上を乾燥さ
せ、次いで80〜200#Cで20分から1時間熱処理
し、その後所望温度で焼結する。
Another embodiment of the present invention provides indium,
Inject a slurry consisting of metal oxide powder such as tin, zinc, aluminum, gallium, cerium, germanium, silicon oxide or composite oxides of these, binder, dispersant and water into a casting mold, dry and mold In a method for producing a sintered body and sintering the molded body to produce a sintered body for a target, the drying conditions immediately after casting are adjusted to a temperature of 20 to
In an atmosphere of 60 # C and humidity of 75 to 85%, the molded body immediately after casting is dried in the atmosphere for about 70% or more of the water content, and then heat-treated at 80 to 200 # C for 20 minutes to 1 hour. Sinter at temperature.

【0013】なお、鋳込み成形時に用いるバインダーを
アクリル樹脂とすると本発明は一層効果的である。
The present invention is more effective when acrylic resin is used as a binder at the time of casting.

【0014】[0014]

【発明の実施の形態】鋳込み成形法を用いると比較的簡
単に大きな成形体を作成することが出来るが、鋳込み直
後の成形体は水を多量に含んでいるため乾燥させる必要
がある。乾燥は成形体内部に水分の分布を作らないよう
に恒率乾燥させることが必要となる。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A large molded article can be relatively easily prepared by using a casting method. However, a molded article immediately after casting contains a large amount of water and must be dried. For drying, it is necessary to perform constant-rate drying so as not to form a distribution of moisture inside the molded body.

【0015】このための条件としては、乾燥速度として
3〜5mgH2O/成形体1cm3/時間、より好ましく
は4〜4.5mgH2O/成形体1cm3/時間が適当で
ある。5mgH2O/成形体1cm3/時間より速くする
と成形体にクラックや変形が発生する。また3mgH2
O/成形体1cm3/時間より遅いと乾燥時間が長くな
り、乾燥室の開閉などにより外部の影響を受けて乾燥吸
湿を繰り返し、恒率乾燥が難しくなる。この様な乾燥速
度を得る具体的な乾燥条件としては、例えば、乾燥室の
温度25〜55#C、湿度を75〜85%とすることで実
現できる。この条件での鋳込み成形直後に成形体に含ま
れている水分の概ね70%以上を除去する。なお、これ
以後の乾燥速度を高くしても成形体にクラックの発生や
変形は起きない。
As a condition for this, a drying speed of 3 to 5 mgH 2 O / 1 cm 3 / hour of molded article, more preferably 4 to 4.5 mgH 2 O / 1 cm 3 / hour of molded article, is appropriate. If the speed is higher than 5 mgH 2 O / cm 3 / hour, cracks and deformation occur in the molded body. 3 mgH 2
If it is slower than O / compacted body 1 cm 3 / hour, the drying time will be long, and the moisture will be repeatedly dried and absorbed under the influence of the outside due to the opening and closing of the drying chamber, making it difficult to dry at a constant rate. Specific drying conditions for obtaining such a drying speed can be realized, for example, by setting the temperature of the drying chamber at 25 to 55 ° C. and the humidity at 75 to 85%. Immediately after casting under these conditions, approximately 70% or more of the water contained in the molded body is removed. Even if the drying speed thereafter is increased, no cracking or deformation occurs in the molded body.

【0016】この様にして得られた成形体は焼結炉で焼
結させるが、その前に焼結までの保管、焼結炉までの移
動等のハンドリング作業にさらされる。面積の割に厚み
が小さい成形体はこうしたハンドリングで変形し易く、
破損し易い。
The compact obtained in this way is sintered in a sintering furnace, but before that, it is subjected to handling operations such as storage until sintering and movement to the sintering furnace. A molded body with a small thickness for its area is easily deformed by such handling,
Easy to break.

【0017】成形体のハンドリング性を良好にするため
に、本発明では、上記乾燥後の成形体を40〜200#
C、成形体に水分が残っている場合は60〜120#Cで
完全に乾燥させる。この処理後20分程度より効果が見
られ始め、2時間程度でこの効果は飽和した。これは2
0分以下では成形体全体の温度が上昇せず、バインダー
の改質と残留水分の蒸発が十分でなく、2時間以上では
バインダーの改質、残留水分の蒸発が終了しているため
と思われる。
In order to improve the handleability of the molded article, in the present invention, the dried molded article is 40 to 200 #
C. If moisture remains in the compact, dry completely at 60-120 # C. The effect began to be seen after about 20 minutes after this treatment, and this effect was saturated in about 2 hours. This is 2
If the time is 0 minutes or less, the temperature of the entire molded body does not rise, and the modification of the binder and the evaporation of the residual moisture are not sufficient. If it is 2 hours or more, the modification of the binder and the evaporation of the residual moisture are considered to have been completed. .

【0018】熱処理による成形体強度増加の理由は、単
純にはバインダーである有機物の熱変成、増膜による強
度増加が考えられるが、本発明ではそれで予測した以上
に強度が増加している。これはバインダーと原料粒子の
接する面から水が除去されることによってバインダーと
原料粒子間の密着力、ひいては原料粒子間の密着力が増
加した効果が寄与していると思われる。これは、熱処理
後の成形体を再度湿度の高い環境に置いて吸湿させると
強度が低下することから裏付けられる。
The reason for the increase in the strength of the molded article due to the heat treatment may be simply due to thermal denaturation of an organic substance as a binder and an increase in the strength due to an increase in film thickness. In the present invention, however, the strength is increased more than expected. This is considered to be due to the effect that the adhesion between the binder and the raw material particles and the adhesion between the raw material particles are increased by removing water from the surface where the binder and the raw material particles are in contact. This is supported by the fact that the strength decreases when the heat-treated molded body is placed in a humid environment again to absorb moisture.

【0019】成形体に添加するバインダーとしては特に
限定しないが、油研工業のセランダーDB系や共栄社化
学製オリコックスKC系、中央理化学工業のリカボンド
ES系、三井化学WA310系等のアクリル系エマルジョ
ン、これらのアクリル系エマルジョンとクラレポバール
PVA105やPVA117(PVA)との混合物、あるいはこれら
のアクリル系エマルジョンとオリゴ糖アルコール、日研
化学のD−ソルビトールやSE−20など糖類との混合
物をバインダーとするとより効果的である。
The binder to be added to the molded product is not particularly limited, but acrylic emulsions such as Yuken Kogyo's Celander DB system, Kyoeisha Chemical Oricox KC system, Chuo Rika Chemical Industry's Rica Bond ES system, Mitsui Chemicals WA310 system, etc. These acrylic emulsions and Kuraray Povar
It is more effective to use a mixture of PVA105 or PVA117 (PVA), or a mixture of these acrylic emulsions and oligosaccharide alcohols, or sugars such as D-sorbitol or SE-20 of Niken Kagaku as the binder.

【0020】バインダーの添加量は、一般的に採用され
る割合で良く、例えば乾燥原料粉末に対して0.5〜4
重量%、特に好ましくは1〜2重量%が望ましい。
The amount of the binder to be added may be a generally employed ratio, for example, 0.5 to 4 parts by weight based on the dry raw material powder.
% By weight, particularly preferably 1-2% by weight.

【0021】本発明を適用すると良好な結果が得られる
金属酸化物粉末としてはインジウム、錫、亜鉛、アルミ
ニウム、ガリウム、セリウム、ゲルマニウム、シリコン
の酸化物、またはこれらの複合酸化物である。なお、鋳
込み直前の金属酸化物粉末の粒径は0.1μm以下とす
ることが好ましい。このためには、必要であれば金属酸
化物粉末とバインター等とを混合後、湿式ボールミルや
媒体撹拌ミルで粉砕する。
The metal oxide powder which can obtain good results by applying the present invention is an oxide of indium, tin, zinc, aluminum, gallium, cerium, germanium, silicon, or a composite oxide thereof. The particle diameter of the metal oxide powder immediately before casting is preferably 0.1 μm or less. For this purpose, if necessary, the metal oxide powder is mixed with a binder or the like, and then pulverized by a wet ball mill or a medium stirring mill.

【0022】[0022]

【実施例】以下本発明の実施例を示し、本発明を具体的
に説明する。なお、以下の結果はGZOやAZOを用い
ても得られ、これらの大型焼結体を得ることが可能であ
る。 (実施例1)内寸法、360mm×195mm×10m
mのフェノール樹脂製の型を大型のプレスに固定してIT
O焼結体の製造試験を行った。
The present invention will be described below in detail with reference to examples of the present invention. In addition, the following results can be obtained even by using GZO or AZO, and it is possible to obtain these large sintered bodies. (Example 1) Internal dimensions, 360 mm x 195 mm x 10 m
m with phenolic resin mold fixed to a large press
A production test of an O-sinter was performed.

【0023】酸化インジウム粉末(2260g)、酸化
錫(251g)、固形分40重量%のポリカルボン酸系
分散剤(85g)、固形分40重量%のアクリルエマル
ジョン系バインダー(189g)、水(354g)を調
合して高速媒体撹拌ミルに入れ、混合粉砕して濃度80
重量%のスラリーを作成した。得られたスラリーを真空
下で脱泡した後、鋳込み型に注入し、鋳込み圧力5Kg
/cm2で鋳込み成型を行った。
Indium oxide powder (2260 g), tin oxide (251 g), polycarboxylic acid dispersant having a solid content of 40 wt% (85 g), acrylic emulsion binder having a solid content of 40 wt% (189 g), water (354 g) Is mixed in a high-speed medium stirring mill, mixed and pulverized to a concentration of 80.
A weight percent slurry was made. After degassing the obtained slurry under vacuum, it is poured into a casting mold, and the casting pressure is 5 kg.
/ Cm 2 was cast.

【0024】鋳込み成型完了後、鋳込み型に0.2Kg
/cm2の空圧をかけて上型を上昇させ、成形体を型か
ら取り出した。
After the completion of the casting, 0.2 kg is added to the casting mold.
/ Cm 2 was applied to the upper mold to raise the upper mold, and the molded body was taken out of the mold.

【0025】このようにして得た成形体を恒温恒湿槽で
30#C・80%Rh、30#C・75%Rh、30℃・7
0%Rh、40℃80%Rh、60℃・80%Rh,7
0℃・80%Rhの条件で各3枚づつ乾燥させた。恒温
恒湿槽での乾燥は鋳込み成形直後に成形体中に含まれて
いる水分の70%が蒸発した時点で終了とした。結果と
乾燥速度(mgH2O/成形体1cm3/時間)とを合わ
せて表1に示す。表中のクラック発生枚数は(クラック
が発生した成形体数)/(乾燥枚数)で表した。
The molded body thus obtained is placed in a thermo-hygrostat at 30 ° C./80% Rh, 30 ° C./75% Rh, 30 ° C. · 7
0% Rh, 40 ° C, 80% Rh, 60 ° C, 80% Rh, 7
Each three sheets were dried under the conditions of 0 ° C. and 80% Rh. Drying in the thermo-hygrostat was terminated when 70% of the moisture contained in the molded body had evaporated immediately after casting. Table 1 shows the results together with the drying rate (mgH 2 O / molded article 1 cm 3 / hour). The number of cracks in the table is represented by (number of cracked compacts) / (number of dried articles).

【0026】各条件での成形体乾燥過程の重量変化を図
1と図2に示す。 表1 乾燥条件とクラック発生枚数 ─────────────────────────────────── 乾 燥 条 件 30℃ 30℃ 30℃ 40℃ 60℃ 70℃ 80%Rh 75%Rh 70%Rh 80%Rh 80%Rh 80%Rh ─────────────────────────────────── クラック発生枚数 0/3 0/3 2/3 0/3 0/3 3/3 ─────────────────────────────────── 乾燥速度 3.5 4.3 5.3 4.2 4.7 5.2 (mgH2O/成形体 1cm3/時間) ─────────────────────────────────── クラックが入らなかった成形体を恒温槽内で100#C、
1時間の熱処理を行った。その後、寸法と重量を測定し
て成形体密度を算出した。成形体密度は49%であっ
た。
FIGS. 1 and 2 show the change in weight during the drying process of the compact under each condition. Table 1 Drying conditions and number of cracks ─────────────────────────────────── Drying conditions 30 ℃ 30 ℃ 30 ℃ 40 ℃ 60 ℃ 70 ℃ 80% Rh 75% Rh 70% Rh 80% Rh 80% Rh 80% Rh ───────────────────────枚 数 Number of cracks generated 0/3 0/3 2/3 0/3 0/3 3/3 ────────────────── Drying rate 3.5 4.3 5.3 4.2 4.7 5.2 (mgH 2 O / molded product 1cm 3 / hour) ────────────を The molded body without cracks is put in a thermostat at 100 # C,
Heat treatment was performed for one hour. Thereafter, the dimensions and weight were measured to calculate the density of the compact. The compact density was 49%.

【0027】この成形体を600℃で脱バインダー処理
した後、1550℃、25時間焼結してITO焼結体を
得た。この焼結体の焼結密度は99.3%〜99.7%
であった。
After demolding the molded body at 600 ° C., it was sintered at 1550 ° C. for 25 hours to obtain an ITO sintered body. The sintered density of this sintered body is 99.3% to 99.7%
Met.

【0028】(実施例2)実施例1と同じ方法で鋳込み
成形を行い、得られた成形体を恒温恒湿槽で40#C・8
0%Rhの条件で鋳込み成形直後に成形体中に含まれて
いる水分の70%が蒸発するまで乾燥させた。同じ方法
で19枚の成形体を作成した。1枚は熱処理をせずに室
温で放置して成形体中の水分率が2%程度になるまで乾
燥させた。他は恒温槽内で40#C、80#C、100#C、
150#C、200#C、250#Cの各温度で1時間の熱処
理を行った。これらの成形体密度は50%であった。
(Example 2) Cast molding was carried out in the same manner as in Example 1, and the obtained molded product was subjected to 40 ° C · 8 in a thermo-hygrostat.
Immediately after the casting, the molded body was dried under the condition of 0% Rh until 70% of the water contained in the molded body was evaporated. Nineteen molded articles were prepared in the same manner. One sheet was left at room temperature without heat treatment, and dried until the moisture content in the molded article became about 2%. Others are 40 # C, 80 # C, 100 # C in the thermostat.
Heat treatment was performed for 1 hour at each of 150 # C, 200 # C, and 250 # C. The density of these compacts was 50%.

【0029】これらの成形体から30mm×10mm×
10mmの試料を各4ヶ切り出して3点曲げ試験を行っ
た。得られた結果を表2に示す。
From these compacts, 30 mm × 10 mm ×
Four 10 mm samples were each cut out and subjected to a three-point bending test. Table 2 shows the obtained results.

【0030】 表2 ────────────────────────────────── 熱処理温度(#C) 無し 40 80 100 150 200 250 ────────────────────────────────── 強度MPa 3.92 10.78 11.55 12.74 13.45 15.76 14.95 ────────────────────────────────── 表2の結果より、熱処理を行うことにより成形体強度が
増加し、200#Cを越えると、強度が飽和することが解
る。
Table 2 熱処理 Heat treatment temperature (#C) None 40 80 100 150 200 250 ────────────────────────────────── Strength MPa 3.92 10.78 11.55 12.74 13.45 15.76 14.95 強度よ り From the results in Table 2, the heat treatment increases the strength of the compact, It is understood that the strength is saturated when the value exceeds.

【0031】次に本例で得られた成形体を600℃で脱
バインダー処理した後、1550℃、25時間焼結して
ITO焼結体を得た。このITO焼結体の焼結密度は9
9.5%であった。
Next, the molded body obtained in this example was subjected to a binder removal treatment at 600 ° C., and then sintered at 1550 ° C. for 25 hours to obtain an ITO sintered body. The sintered density of this ITO sintered body is 9
It was 9.5%.

【0032】次に、得られたITO焼結体を用いてター
ゲットとしての性能試験を行った。ITO焼結体から各
々直径125mm厚み7mmの円形ターゲットと丸型タ
ーゲットを2分割にした半円形ターゲットを作成して芝
浦電気製スパッタリング装置CFS52−Fで長時間ス
パッタリング試験を行った。スパッタ条件はガス圧0.
6Pa,酸素分圧2%,スパッタ電流は1.2Aで行っ
た。
Next, a performance test as a target was performed using the obtained ITO sintered body. A circular target having a diameter of 125 mm and a thickness of 7 mm, and a semicircular target obtained by dividing a round target into two were prepared from the ITO sintered body, and subjected to a long-term sputtering test using a sputtering apparatus CFS52-F manufactured by Shibaura Electric. Sputtering conditions were gas pressure of 0.
The sputtering was performed at 6 Pa, an oxygen partial pressure of 2%, and a sputtering current of 1.2 A.

【0033】1枚ものの円形ターゲットでは、エロージ
ェンの厚みが6mm程度になるまでノジュールの発生量
も少なく、得られるスパッタ膜の比抵抗は5×10-4Ω
・cm 程度で安定していた。他方、半円形ターゲット
2枚を合わせて円形ターゲットとして使用した分割ター
ゲットの場合には、ターゲットのエロージェンの厚みが
3mmを越えると接合部分の線上にノジュールが密集し
て発生し、得られるスパッタ膜の比抵抗は5×10-4Ω
・cm程度から8×10-4Ω・cmまで増加した。
With one circular target, the amount of nodules generated is small until the thickness of the erogen becomes about 6 mm, and the specific resistance of the obtained sputtered film is 5 × 10 −4 Ω.
・ It was stable at about cm 2. On the other hand, in the case of a divided target in which two semicircular targets are combined and used as a circular target, if the erogen thickness of the target exceeds 3 mm, nodules are densely generated on the line of the joining portion, and the resulting sputtered film has Specific resistance is 5 × 10 -4 Ω
· From about cm to 8 × 10 -4 Ω · cm.

【0034】ところで、得られルスパッタ膜中のパーテ
ィクルはスパッタリング中の異常放電と関係していると
言われている。そこでマイクロアークモニター(ランド
マークテクノロジー社製)を用いて、上記のスパッタ試
験中のアーク発生回数を測定した。結果を表3、表4に
示した。表中で、大は1回のアークエネルギーが50m
J以上、中は50mJ未満10mJ以上、小は10mJ
未満であることを示す。また発生回数は1分当たりの平
均発生数である。
It is said that particles in the obtained sputtered film are related to abnormal discharge during sputtering. Therefore, the number of arcs generated during the above-mentioned sputtering test was measured using a micro arc monitor (manufactured by Landmark Technology). The results are shown in Tables 3 and 4. In the table, the large value is 50 m per arc energy.
J or more, medium is less than 50 mJ, 10 mJ or more, small is 10 mJ
It is less than. The number of occurrences is the average number of occurrences per minute.

【0035】表から分かる様に小アークの発生回数は半
円形ターゲット2枚を用いた分割ターゲットの方が大き
い事が分かる。これから、大型ターゲットが異常放電の
減少に有効であり、パーティクルやピンホールの減少に
つながることがわかる。
As can be seen from the table, it can be seen that the number of occurrences of small arcs is larger in the divided target using two semicircular targets. This shows that a large target is effective in reducing abnormal discharge, which leads to a reduction in particles and pinholes.

【0036】 表3 一体ターゲット ───────────────────────────────エローシ゛ョン 深さ 大アーク 中アーク 小アーク ─────────────────────────────── 0から3mm 0 0.05ケ/分 2.9ヶ/分 ─────────────────────────────── 3mmから6mm 0 0.17ケ/分 3.7ヶ/分 ─────────────────────────────── 表4 2分割ターゲット ───────────────────────────────エローシ゛ョン 深さ 大アーク 中アーク 小アーク ─────────────────────────────── 0から3mm 0 0.04ケ/分 3.3ヶ/分 ─────────────────────────────── 3mmから6mm 0 0.31ケ/分 12.1ヶ/分 ─────────────────────────────── (実施例3)内寸法、780mm×360mm×10m
mのフェノール樹脂とSUSの多孔質の2層からなるの
型を用いて大型のプレスに固定してITO焼結体の製造
試験を行った。酸化インジウム粉末(9040g)、酸
化錫(1004g)、固形分40質量t%のポリカルボ
ン酸系分散剤を所定量、固形分40質量t%のアクリル
エマルジョン系バインダー(502g)、水所定量を調
合して高速媒体撹拌ミルに入れ、混合粉砕して濃度80
質量t%のスラリーを作成した。得られたスラリーを真
空脱法した後、本実施例で作成した鋳込み型に注入し、
鋳込み圧力20kg/cm 2で鋳込み成型を行った。鋳
込み成型完了後、鋳込み型に0.2kg/cm2の空圧
をかけて上型を上昇させて成形体を型から取り出した。
Table 3 Integrated target {Erosion depth Large arc Medium arc Small arc} ──────────────────────────── 0 to 3mm 0 0.05 pcs / min 2.9 pcs / min ────────── ───────────────────── 3mm to 6mm 0 0.17 pcs / min 3.7 pcs / min ───────────────── ────────────── Table 4 Split target ─────────────────────────────── Erosion depth Large arc Medium arc Small arc ─────────────────────────────── 0 to 3mm 0 0.04 pcs / min 3.3 pcs / Min ────────────────────────────── ─ 3mm to 6mm 0 0.31 pieces / min 12.1 pieces / min 内 (Example 3) Dimensions, 780mm × 360mm × 10m
phenolic resin and SUS porous layer
Production of ITO sintered body by fixing to large press using mold
The test was performed. Indium oxide powder (9040 g), acid
Tin Carbide (1004g), Polycarbo with 40% by mass solid content
Acrylic acid with predetermined amount of acid-based dispersant and solid content of 40% by mass
Emulsion binder (502g) and water
The mixture is put into a high-speed medium stirring mill, mixed and pulverized to a concentration of 80.
A slurry having a mass of t% was prepared. True the resulting slurry
After the emptying method, it is poured into the casting mold created in this example,
Casting pressure 20kg / cm TwoWas cast. Casting
After completion of casting, 0.2kg / cm in casting moldTwoPneumatic
And the upper mold was raised to remove the molded body from the mold.

【0037】この成形体を恒温恒湿槽で40℃・80%
Rhの条件で乾燥させた。恒温恒湿槽での乾燥は鋳込み
成形直後に成形体中に含まれている水分の70%が蒸発
した時点で終了とした。得られた成形体にはクラックは
入っていなかった。この成形体を恒温槽内で100℃、
1時間の熱処理を行った。
The molded body was placed in a thermo-hygrostat at 40 ° C. and 80%
It was dried under Rh conditions. Drying in the thermo-hygrostat was terminated when 70% of the moisture contained in the molded body had evaporated immediately after casting. There was no crack in the obtained molded body. This molded body is placed in a thermostat at 100 ° C.
Heat treatment was performed for one hour.

【0038】その後、寸法と重量を測定して成形体密度
を算出した。成形体の寸法は765mm×353mm×
9mmであった。成形体密度は49%であった。
Thereafter, the dimensions and weight were measured to calculate the density of the compact. The size of the molded body is 765mm x 353mm x
9 mm. The compact density was 49%.

【0039】この成形体を600℃で脱バインダー処理
した後、1550℃、25時間焼結してITO成形体を
得た。この焼結体を表面研削して615mm×280m
m×7mmのターゲットを作成した。このターゲットの
焼結密度は99.5%であった。
After demolding the molded body at 600 ° C., it was sintered at 1550 ° C. for 25 hours to obtain an ITO molded body. The surface of this sintered body is ground to 615 mm x 280 m
An mx 7 mm target was made. The sintered density of this target was 99.5%.

【0040】[0040]

【発明の効果】以上詳述したように、本発明に従えば、
鋳込み成形後、クラックを発生させることなく乾燥する
事が可能になり、成形体強度も増加した。それによって
大型焼結体を製造するためのハンドリングで成形体が変
形、破損することが無くなった。また一体型ターゲット
を用いるとスパッタ成膜での比抵抗の悪化の防止、異常
放電の防止につながる。
As described in detail above, according to the present invention,
After casting, it became possible to dry without generating cracks, and the strength of the molded body was increased. As a result, the molded body was not deformed or damaged in handling for producing a large-sized sintered body. Also, the use of the integrated target leads to prevention of deterioration of specific resistance in sputter deposition and prevention of abnormal discharge.

【0041】この大型焼結体はITOや酸化亜鉛系焼結
体を用いた透明導電膜の作成に極めて有用である。これ
らのことから、本発明は工業的に極めて価値の高いもの
である。
This large sintered body is extremely useful for producing a transparent conductive film using an ITO or zinc oxide based sintered body. For these reasons, the present invention is extremely valuable industrially.

【図面の簡単な説明】[Brief description of the drawings]

【図1】実施例1において成形体乾燥過程の重量変化を
しめした図である。
FIG. 1 is a diagram showing a change in weight during a drying process of a molded body in Example 1.

【図2】実施例1において成形体乾燥過程の重量変化を
しめした図である。
FIG. 2 is a diagram showing a change in weight during a drying process of a compact in Example 1.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】インジウム、錫、亜鉛、アルミニウム、ガ
リウム、セリウム、ゲルマニウム、シリコンの酸化物、
またはこれらの複合酸化物等の金属酸化物粉末、バイン
ダー、分散剤および水からなるスラリーを鋳込み型に注
入し、乾燥して成形体を得、その成形体を焼結してター
ゲット用焼結体を製造する方法において、3〜5mgH
2O/成形体1cm3/時間の乾燥速度で、鋳込み直後の
成形体の水分の概ね70%以上を乾燥させ、次いで80
〜200#Cで20分以上熱処理し、得られた成形体を所
望温度で焼結することを特徴とするターゲット用焼結体
の製造方法。
1. Indium, tin, zinc, aluminum, gas
Oxides of lithium, cerium, germanium, silicon,
Or a metal oxide powder such as a composite oxide thereof,
Pours a slurry consisting of
And dried to obtain a compact, which is sintered and
In the method for producing a sintered body for get, 3 to 5 mgH
TwoO / mold 1cmThree/ Hour drying speed, immediately after casting
After drying about 70% or more of the water content of the molded body,
Heat treatment at ~ 200 # C for more than 20 minutes
Sintered body for target characterized by sintering at desired temperature
Manufacturing method.
【請求項2】インジウム、錫、亜鉛、アルミニウム、ガ
リウム、セリウム、ゲルマニウム、シリコンの酸化物、
またはこれらの複合酸化物等の金属酸化物粉末、バイン
ダー、分散剤および水からなるスラリーを鋳込み型に注
入し、乾燥して成形体を得、その成形体を焼結してター
ゲット用焼結体を製造する方法において、鋳込み直後の
乾燥条件を、温度20〜60#C、湿度75〜85%の雰
囲気中で行うこととし、該雰囲気で鋳込み直後の成形体
の水分の概ね70%以上を乾燥させ、次いで80〜20
0#Cで20分から1時間熱処理し、その後所望温度で焼
結することを特徴とするターゲット用焼結体の製造方
法。
2. An oxide of indium, tin, zinc, aluminum, gallium, cerium, germanium, silicon,
Alternatively, a slurry comprising a metal oxide powder such as a composite oxide thereof, a binder, a dispersant, and water is poured into a casting mold, dried to obtain a molded body, and the molded body is sintered to form a sintered body for a target. In the method of manufacturing, the drying conditions immediately after the casting are performed in an atmosphere at a temperature of 20 to 60 ° C. and a humidity of 75 to 85%, and in the atmosphere, about 70% or more of the moisture of the molded body immediately after the casting is dried. And then 80-20
A method for producing a sintered body for a target, comprising heat-treating at 0 # C for 20 minutes to 1 hour, and thereafter sintering at a desired temperature.
【請求項3】請求項1または2に記載した製造方法にお
いてバインダーがアクリル樹脂系、である事を特徴とす
るターゲット用焼結体の製造方法。
3. The method for producing a sintered body for a target according to claim 1, wherein the binder is an acrylic resin.
JP2000378837A 2000-12-13 2000-12-13 Production process of sintered compact for target Pending JP2002179469A (en)

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Country Link
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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6639143B2 (en) * 2001-08-24 2003-10-28 Samsung Sdi Co. Ltd. Solar cell using ferroelectric material(s)
CN100454442C (en) * 2004-09-22 2009-01-21 Tdk株式会社 Transparent conductive material and transparent conductive member
JP2009537426A (en) * 2006-05-18 2009-10-29 イドロ−ケベック Ceramic preparation process, the ceramic thus obtained and its use as a sputtering target in particular
KR101177491B1 (en) 2007-07-27 2012-08-27 삼성코닝정밀소재 주식회사 Cylindrical oxide article and method of manufacturing cylindrical oxide target using the same
CN111943650A (en) * 2020-07-22 2020-11-17 长沙壹纳光电材料有限公司 IWO target material for activated plasma deposition technology and preparation method thereof

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6639143B2 (en) * 2001-08-24 2003-10-28 Samsung Sdi Co. Ltd. Solar cell using ferroelectric material(s)
CN100454442C (en) * 2004-09-22 2009-01-21 Tdk株式会社 Transparent conductive material and transparent conductive member
JP2009537426A (en) * 2006-05-18 2009-10-29 イドロ−ケベック Ceramic preparation process, the ceramic thus obtained and its use as a sputtering target in particular
US9120708B2 (en) 2006-05-18 2015-09-01 Hydro-Quebec Process for preparing ceramics, ceramics thus obtained and uses thereof, especially as a sputtering target
US10144674B2 (en) 2006-05-18 2018-12-04 Hydro-Quebec Process for preparing ceramics, ceramics thus obtained and uses thereof, especially as a sputtering target
KR101177491B1 (en) 2007-07-27 2012-08-27 삼성코닝정밀소재 주식회사 Cylindrical oxide article and method of manufacturing cylindrical oxide target using the same
CN111943650A (en) * 2020-07-22 2020-11-17 长沙壹纳光电材料有限公司 IWO target material for activated plasma deposition technology and preparation method thereof

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