JP2002090987A5 - - Google Patents
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- Publication number
- JP2002090987A5 JP2002090987A5 JP2001209543A JP2001209543A JP2002090987A5 JP 2002090987 A5 JP2002090987 A5 JP 2002090987A5 JP 2001209543 A JP2001209543 A JP 2001209543A JP 2001209543 A JP2001209543 A JP 2001209543A JP 2002090987 A5 JP2002090987 A5 JP 2002090987A5
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- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001209543A JP4226808B2 (en) | 2000-07-12 | 2001-07-10 | Positive resist composition |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000-211642 | 2000-07-12 | ||
| JP2000211642 | 2000-07-12 | ||
| JP2001209543A JP4226808B2 (en) | 2000-07-12 | 2001-07-10 | Positive resist composition |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002090987A JP2002090987A (en) | 2002-03-27 |
| JP2002090987A5 true JP2002090987A5 (en) | 2006-01-19 |
| JP4226808B2 JP4226808B2 (en) | 2009-02-18 |
Family
ID=26595896
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001209543A Expired - Fee Related JP4226808B2 (en) | 2000-07-12 | 2001-07-10 | Positive resist composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4226808B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004004561A (en) * | 2002-02-19 | 2004-01-08 | Sumitomo Chem Co Ltd | Positive resist composition |
| JP4606392B2 (en) * | 2002-04-01 | 2011-01-05 | ダイセル化学工業株式会社 | Method for producing polymer compound for photoresist |
| KR100979871B1 (en) | 2002-04-01 | 2010-09-02 | 다이셀 가가꾸 고교 가부시끼가이샤 | Process For The Production Of Polymer Solution For ArF Excimer Laser Resist |
| EP2539316B1 (en) | 2010-02-24 | 2019-10-23 | Basf Se | Latent acids and their use |
| US9994538B2 (en) | 2015-02-02 | 2018-06-12 | Basf Se | Latent acids and their use |
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2001
- 2001-07-10 JP JP2001209543A patent/JP4226808B2/en not_active Expired - Fee Related