JP2002084715A - Carbon brush for electric machine - Google Patents

Carbon brush for electric machine

Info

Publication number
JP2002084715A
JP2002084715A JP2000269609A JP2000269609A JP2002084715A JP 2002084715 A JP2002084715 A JP 2002084715A JP 2000269609 A JP2000269609 A JP 2000269609A JP 2000269609 A JP2000269609 A JP 2000269609A JP 2002084715 A JP2002084715 A JP 2002084715A
Authority
JP
Japan
Prior art keywords
brush
copper plating
electric machine
commutator
carbon brush
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000269609A
Other languages
Japanese (ja)
Other versions
JP4476458B2 (en
Inventor
Takahito Sakoda
隆仁 佐古田
Masayuki Takuma
政幸 詫間
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TotanKako Co Ltd
Original Assignee
TotanKako Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TotanKako Co Ltd filed Critical TotanKako Co Ltd
Priority to JP2000269609A priority Critical patent/JP4476458B2/en
Publication of JP2002084715A publication Critical patent/JP2002084715A/en
Application granted granted Critical
Publication of JP4476458B2 publication Critical patent/JP4476458B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Electric Suction Cleaners (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Motor Or Generator Current Collectors (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a carbon brush for an electric machine, for which high output and high-speed rotations are required, the temperature rise of which is minimal even when used for many hours, and that can maintain stable commutation characteristics over the long period of time. SOLUTION: In a carbon brush provided with copper plating on the surface of a carbon base material for the electric machine, a chelating complex by a triazole derivative is formed on the surface of the copper plating. To provide a carbon brush for an electric machine, high output and high-speed rotations are required, the temperature rise thereof is minimal even when used for many hours, and that stable commutation characteristics can be maintained over the long period of time.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は電気機械用カーボン
ブラシに関し、特に電気掃除機や電動工具等の整流子電
動機用で、高出力、高速回転が要求される電気機械用カ
ーボンブラシに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a carbon brush for an electric machine, and more particularly to a carbon brush for an electric machine for a commutator motor such as a vacuum cleaner or a power tool, which requires high output and high speed rotation.

【0002】[0002]

【従来の技術】整流子電動機に用いられる電気機械用カ
ーボンブラシ(以下ブラシと呼ぶ)は、近年、特に小型
化、高出力化、高速回転化が進んでいる。そのため、高
電流密度の状況下でも小型で、摩耗が少なく、温度上昇
の小さいブラシが要求されるようになった。
2. Description of the Related Art In recent years, carbon brushes for electric machines (hereinafter referred to as brushes) used in commutator motors have been particularly reduced in size, increased in output, and increased in rotation speed. Therefore, there has been a demand for a brush that is small in size, has low wear, and has a small temperature rise even under high current density conditions.

【0003】しかしながら、従来のブラシでは、高電流
密度、高速回転の状況下では整流特性が悪化し、ブラシ
摩耗が大きくなり、ブラシ温度も上昇する傾向があっ
た。そのため、整流子の小型化に比して、ブラシの小型
化は、それほど進んでいないのが現状である。
[0003] However, in the conventional brush, the rectifying characteristics are deteriorated under the condition of high current density and high speed rotation, the brush wear tends to increase, and the brush temperature tends to increase. Therefore, at present, brush miniaturization has not progressed much in comparison with miniaturization of commutators.

【0004】一般に知られているように、整流子電動機
に抵抗率の高い基材からなるブラシを使用すると、整流
が安定する。これは、抵抗の大きい基材からなるブラシ
を使用するとブラシを経由して隣り合う整流子片間に流
れる短絡電流が抑制されるためである。しかしながら、
抵抗の大きい材質を用いた場合は、抵抗発熱によりブラ
シ自身が発熱し温度が上昇する。さらに、電動機が高出
力、小型化、高速回転化すると、整流子に流れる電流が
大きくなり、整流子の温度も高くなる。このため、皮膜
過剰により、スティック・スリップ(stick−sl
ip)を生じる。これによって、整流火花が増大し、さ
らなる温度上昇とブラシ摩耗の増大を招いていた。
As is generally known, when a brush made of a substrate having a high resistivity is used for a commutator motor, commutation is stabilized. This is because when a brush made of a substrate having a large resistance is used, short-circuit current flowing between adjacent commutator pieces via the brush is suppressed. However,
When a material having a large resistance is used, the brush itself generates heat due to resistance heat, and the temperature rises. Furthermore, when the motor has a high output, a small size, and a high speed rotation, the current flowing through the commutator increases, and the temperature of the commutator also increases. For this reason, stick-slip (stick-sl
ip). As a result, the commutation spark increased, resulting in a further increase in temperature and an increase in brush wear.

【0005】また、電気掃除機などのように回転数の高
い電動機では、高速回転時においても整流が良好で、且
つ電気掃除機本体の使用中にブラシ交換をしなくても良
いように、寿命を長くしたいという要求から黒鉛粉を樹
脂バインダーで結合せしめたレジンボンド系の材質が用
いられていることがある。しかし、長時間使用すると温
度上昇によって、ブラシ自身の潤滑性が低下し、さらに
温度が上昇するという悪循環も生まれる。
[0005] In addition, a motor having a high rotation speed such as a vacuum cleaner has good commutation even during high-speed rotation, and has a long service life so that the brush need not be replaced during use of the vacuum cleaner body. Resin-bonded materials obtained by binding graphite powder with a resin binder have been used in some cases in order to increase the length of the resin. However, if the brush is used for a long time, the lubricating property of the brush itself is reduced due to the temperature rise, and a vicious cycle is created in which the temperature further rises.

【0006】そこで、本発明者らは、ブラシの基材周囲
の外表面に電気の良導性金属、例えば、ニッケル、銅、
金、銀等、特に、安価で電気良導性に優れた銅の皮膜を
メッキにより形成することで、みかけの抵抗を下げ、温
度上昇を抑える技術を特開平5−182733号公報で
開示した。この特開平5−182733号公報の技術に
よって、ある程度の温度上昇の抑制は行えるようになっ
た。
Therefore, the inventors of the present invention have proposed a method of forming a conductive metal such as nickel, copper,
Japanese Patent Application Laid-Open No. 5-182733 discloses a technique in which an apparent resistance is reduced and a temperature rise is suppressed by forming a coating of gold, silver or the like, in particular, copper, which is inexpensive and excellent in electrical conductivity, by plating. The technology disclosed in Japanese Patent Application Laid-Open No. 5-182733 has made it possible to suppress the temperature rise to some extent.

【0007】[0007]

【発明が解決しようとする課題】ところが、表面に施さ
れたメッキによる銅の皮膜は、空気中で酸化しやすいた
め、長時間使用すると、表面が酸化してしまっていた。
このため、形成された酸化膜によって電気抵抗が高くな
り、ブラシの温度上昇を抑制する効果が低減し、ブラシ
の寿命の長命化という目的を達成できないという問題が
あった。
However, since the copper film formed on the surface by plating is easily oxidized in the air, the surface has been oxidized when used for a long time.
For this reason, there is a problem in that the electrical resistance is increased by the formed oxide film, the effect of suppressing the temperature rise of the brush is reduced, and the object of extending the life of the brush cannot be achieved.

【0008】そこで、本発明は、長時間の使用によって
も、温度上昇が小さく、長時間に亘って安定した整流特
性を可能とする高出力、高速回転が要求される電気機械
用カーボンブラシを提供することを目的とする。
Accordingly, the present invention provides a carbon brush for an electric machine, which requires a high output and a high speed rotation, with a small rise in temperature and a stable commutation characteristic over a long period of time even when used for a long time. The purpose is to do.

【0009】[0009]

【課題を解決するための手段】前記課題を解決するため
に本発明者らは、ブラシの基材表面に形成された無電解
メッキ法による銅メッキの表面をトリアゾール誘電体で
あるトリアゾール、アルキルトリアゾール、ベンゾトリ
アゾール等、特にベンゾトリアゾール(以下、BTAと
いう。)を含む溶液と接触させ、銅メッキの表面上にB
TAによるキレート錯体を形成させることで、銅メッキ
の酸化を防止し、高出力、高速回転で長時間使用して
も、安定した整流特性のブラシとできることを見出し本
発明を完成した。
Means for Solving the Problems In order to solve the above-mentioned problems, the present inventors have proposed a method of coating a copper plating surface formed on a base material of a brush by electroless plating with a triazole dielectric material such as triazole or alkyltriazole. , Benzotriazole, etc., especially a solution containing benzotriazole (hereinafter referred to as BTA), and B
By forming a chelate complex by TA, oxidation of copper plating is prevented, and it has been found that a brush having stable rectification characteristics can be obtained even when used for a long time at high output and high speed rotation, and completed the present invention.

【0010】すなわち、本発明のブラシは、カーボン基
材の表面に銅メッキが施されてなり、前記銅メッキの表
面にトリアゾール誘導体によるキレート錯体を形成して
なることを特徴とする。また、前記基材の固有抵抗が、
100μΩ・m以上であるものが好ましい。また、前記
銅メッキが厚み0.1〜100μmで、無電解メッキに
よって形成されているものが好ましい。これによって、
銅メッキの表面上にトリアゾール誘導体、特にBTAに
よるキレート錯体を形成させることで、耐酸化性被覆層
を形成することができ、ブラシの基材表面に無電解メッ
キ法によって形成された銅メッキによる効果を長時間に
亘って維持することができる。
That is, the brush of the present invention is characterized in that a surface of a carbon substrate is plated with copper, and a chelate complex of a triazole derivative is formed on the surface of the copper plating. Further, the specific resistance of the base material,
Those having a resistance of 100 μΩ · m or more are preferable. Preferably, the copper plating has a thickness of 0.1 to 100 μm and is formed by electroless plating. by this,
By forming a chelate complex with a triazole derivative, particularly BTA, on the surface of copper plating, an oxidation-resistant coating layer can be formed, and the effect of copper plating formed by electroless plating on the base material surface of the brush Can be maintained for a long time.

【0011】本発明における、ブラシの基材は、(1)
いわゆる樹脂結合質(レジンボンド系)と呼ばれる、黒
鉛粉を熱硬化性樹脂などのバインダーで混練し、硬化せ
しめただけのもの、(2)いわゆる炭素黒鉛質(CG
系)と呼ばれる、黒鉛粉を熱硬化性樹脂又はピッチなど
のバインダーで混練し、低温度で焼成して、バインダー
成分を炭化したもの等が例示できる。
In the present invention, the base material of the brush is (1)
A so-called resin binder (resin bond type) obtained by kneading graphite powder with a binder such as a thermosetting resin and hardening it, (2) so-called carbon graphite (CG)
Examples thereof include those obtained by kneading graphite powder with a binder such as thermosetting resin or pitch, firing at a low temperature, and carbonizing the binder component.

【0012】中でも、結晶化度の余り高くない、人造黒
鉛粉を用い、バインダーとして熱硬化性樹脂を加えて混
捏し、所定の大きさに成形したものが好ましい。このバ
インダーとして用いられる熱硬化性樹脂には、フェノー
ル樹脂、エポキシ樹脂、マラン樹脂等を使用することが
できる。そして、この生成段階において、混合条件や、
焼成条件等を調整することによって、基材を所望の範囲
の固有抵抗100μΩ・m以上とすることが可能とな
る。
Above all, it is preferable to use artificial graphite powder which has not too high crystallinity, add a thermosetting resin as a binder, knead the mixture, and mold it to a predetermined size. As the thermosetting resin used as the binder, a phenol resin, an epoxy resin, a maran resin, or the like can be used. And in this generation stage, mixing conditions,
By adjusting the firing conditions and the like, the substrate can have a specific range of a specific resistance of 100 μΩ · m or more.

【0013】なお、このブラシ基材中に、高温での潤滑
性を安定的に維持するために、固体潤滑剤として二硫化
モリブデンや二硫化タングステン等を添加することもで
きる。これら添加混合する固体潤滑剤の二硫化モリブデ
ンや二硫化タングステン等は絶縁性であるため、単独で
樹脂などに混合すると、静電気等の影響により凝集しや
すく、樹脂内に均等に分散しにくい。しかしながら、最
初に通電性を有する黒鉛原料と混合するため、静電気に
よる凝集が非常に少なくなる。更に、バインダーを添加
して混捏した上で、粉砕する。このため、メカノケミカ
ル効果によりこれら固体潤滑剤は完全に分散し、バイン
ダー及び黒鉛粉と強固に接着結合する。このようにして
得られた黒鉛粉を主成分とする混合粉を成形し、硬化又
は焼成して基材とする。
In order to stably maintain the lubricity at a high temperature, molybdenum disulfide, tungsten disulfide or the like may be added to the brush substrate as a solid lubricant. Since molybdenum disulfide, tungsten disulfide, and the like, which are added and mixed, are insulative, if they are mixed alone with a resin or the like, they are easily aggregated by the influence of static electricity or the like, and are difficult to be uniformly dispersed in the resin. However, since it is first mixed with a graphite material having electrical conductivity, aggregation due to static electricity is extremely reduced. Further, the mixture is kneaded with a binder, and then pulverized. For this reason, these solid lubricants are completely dispersed by the mechanochemical effect, and are firmly bonded to the binder and the graphite powder. The mixed powder mainly composed of the graphite powder thus obtained is molded, cured or fired to obtain a base material.

【0014】しかしながら、これら固体潤滑剤の二硫化
モリブデンや二硫化タングステン等を含むブラシは、使
用中に、整流子表面に皮膜を形成しやすい。この皮膜が
厚くなりすぎると、剥離しやすくなり、部分的に剥離等
を起こした場合、その部分に電流が集中してしまい、整
流特性が悪くなる。場合によっては、整流子自身が損傷
を負い、交換を余儀なくされる場合がある。そのため、
添加する固体潤滑剤はブラシ基材全体の0.5〜10質
量部が望ましい。0.5質量部より少ないと、潤滑性が
発揮されず、また、10質量部より多いと整流子表面に
形成される皮膜が過剰となり、整流特性が悪くなるため
である。
However, brushes containing these solid lubricants such as molybdenum disulfide and tungsten disulfide tend to form a film on the commutator surface during use. If this film is too thick, it will be easy to peel off, and if partial peeling or the like occurs, the current will concentrate on that part and the rectification characteristics will deteriorate. In some cases, the commutator itself may be damaged and must be replaced. for that reason,
The solid lubricant to be added is desirably 0.5 to 10 parts by mass of the entire brush substrate. If the amount is less than 0.5 part by mass, the lubricating property is not exhibited. If the amount is more than 10 parts by mass, the film formed on the commutator surface becomes excessive, and the rectifying characteristics deteriorate.

【0015】また、この固体潤滑剤によって整流子表面
に形成される皮膜を調整するために、ブラシ基材に研削
剤を添加することが好ましい。この研削剤には、アルミ
ナ、シリカ、炭化ケイ素等が使用される。この研削剤も
量が多い場合や、粒径が大きすぎたり、均一に分散せず
に、凝集したりした場合には、整流子表面を傷つける原
因となる。そのため、添加する研削剤はブラシ基材全体
の0.1〜1.5重量部が望ましい。0.1重量部より
少ないと、皮膜調整機能が発揮されず、また、1.5重
量部より多いと整流子表面を傷つける可能性が出てくる
ためである。また、この研削剤の粒径が、100μmよ
りも粗すぎると研削作用が強く、整流子表面が荒れる上
に、整流子摩耗が多くなり、5μmより細かいと整流子
表面の皮膜の除去作用が低くなる。したがって、粒径は
5〜100μmの範囲が好ましい。また、これら研削剤
は、樹脂等との親和性、分散性が高いので、これらの添
加は最初に潤滑剤と一緒に添加混合しても、黒鉛粉、バ
インダー及び潤滑剤の混捏、粉砕後に添加混合してもよ
い。
Further, in order to adjust the film formed on the commutator surface by the solid lubricant, it is preferable to add an abrasive to the brush base material. As the abrasive, alumina, silica, silicon carbide, or the like is used. When the amount of the abrasive is too large, when the particle size is too large, or when the particles are aggregated without being uniformly dispersed, they cause damage to the commutator surface. Therefore, the added abrasive is desirably 0.1 to 1.5 parts by weight of the entire brush base material. When the amount is less than 0.1 part by weight, the film adjusting function is not exhibited, and when the amount is more than 1.5 parts by weight, the surface of the commutator may be damaged. If the particle size of this abrasive is too coarse than 100 μm, the grinding action is strong, and the commutator surface is roughened, and commutator wear is increased. If it is smaller than 5 μm, the action of removing the film on the commutator surface is low. Become. Therefore, the particle size is preferably in the range of 5 to 100 μm. In addition, since these abrasives have a high affinity and dispersibility with resins and the like, even if these additives are added and mixed together with a lubricant at first, they are added after kneading and grinding of graphite powder, a binder and a lubricant. You may mix.

【0016】次に、図1に示すブラシの表面の整流子へ
の押し当て方向に延在する側面1a〜1dに金属質皮膜
として銅を、無電解メッキ法により形成、被覆する。こ
の無電解メッキの方法は文献等により公知の方法が広く
援用される。例えば、「無電解メッキ」(槇書店、神戸
徳蔵著(1986))に詳細されており、本発明にかか
るブラシの基材に対して、その表面に堅牢な皮膜を形成
させることができる。
Next, copper is formed as a metal film on the side surfaces 1a to 1d extending in the pressing direction of the brush against the commutator shown in FIG. As the electroless plating method, a method known from literatures and the like is widely used. For example, it is described in "Electroless Plating" (Maki Shoten, Tokuzo Kobe (1986)), and a robust film can be formed on the surface of the base material of the brush according to the present invention.

【0017】このようにして被覆される銅メッキ膜の厚
さは、厚すぎると摺動時に相手摺動面を荒らし、ブラシ
及び相手材(整流子)の摩耗が大きくなる傾向がある。
また、逆に極端に薄いと、ブラシの基材の被覆効果が少
なく、ブラシの抵抗が余り下がらず、ブラシの温度の上
昇を抑制することが困難となる。従って、銅メッキ膜の
厚さとしては0.1〜100μm程度が好適である。
If the thickness of the copper plating film coated in this manner is too large, the sliding surface of the mating member tends to be roughened during sliding, and the abrasion of the brush and the mating material (commutator) tends to increase.
On the other hand, if the thickness is extremely thin, the effect of covering the base material of the brush is small, and the resistance of the brush does not decrease so much that it is difficult to suppress an increase in the temperature of the brush. Therefore, the thickness of the copper plating film is preferably about 0.1 to 100 μm.

【0018】また、無電解メッキにより形成される銅メ
ッキ膜は、生成した核が略均一に成長し、成長した核が
積層して形成されたものである。そのため、一般的な製
法で作製された銅とは異なり、それぞれの核が重なり合
った状態となり、電気はそれぞれの核を伝播することで
良導体となっている。したがって、核の表面が酸化して
しまうと、電気の伝播がうまく行われず、一般の銅に比
較して抵抗の上昇率が大きくなりやすい。
The copper plating film formed by the electroless plating is formed by growing the generated nuclei substantially uniformly and laminating the grown nuclei. Therefore, unlike copper produced by a general manufacturing method, each nucleus is in an overlapping state, and electricity is a good conductor by propagating through each nucleus. Therefore, when the surface of the nucleus is oxidized, electricity does not propagate well, and the rate of increase in resistance tends to increase as compared with general copper.

【0019】銅メッキ後、整流子2との接触面のメッキ
を機械加工により除去する。また、整流子2の回転方向
に直交する側面1a、1cのうち、整流子の回転方向に
対して前面1a又は後面1c若しくは両面1a、1cを
機械加工によってメッキを除去することが好ましい。側
面1aに形成されたメッキを除去することで、ブラシが
摩滅した時にその面1aに形成されていたメッキがブラ
シと整流子2間に入り込み、整流子2を傷つけることを
予防することができる。また、側面1cに形成されたメ
ッキを除去することで、ブラシが摩滅した時にその面に
形成されていたメッキによって発生することがある整流
子片間の短絡を予防することができる。なお、両側面1
a、1cのメッキを除去することで、これら両者の予防
を行うことができる。
After the copper plating, the plating on the contact surface with the commutator 2 is removed by machining. Further, of the side surfaces 1a and 1c orthogonal to the rotation direction of the commutator 2, it is preferable to remove the plating by machining the front surface 1a or the rear surface 1c or both surfaces 1a and 1c in the rotation direction of the commutator. By removing the plating formed on the side surface 1a, it is possible to prevent the plating formed on the surface 1a from entering between the brush and the commutator 2 when the brush is worn and damaging the commutator 2. In addition, by removing the plating formed on the side surface 1c, it is possible to prevent a short circuit between commutator pieces that may be caused by plating formed on the surface when the brush is worn. In addition, both sides 1
By removing the platings a and 1c, both of these can be prevented.

【0020】次に、この銅メッキしたブラシを、トリア
ゾール、アルキルトリアゾール、BTA等のトリアゾー
ル誘導体、好ましくはBTAを水又はアルコールに溶解
した溶液中に浸漬、若しくは該溶液を表面に任意の方法
で塗布する。これによって、銅メッキの表面をBTAを
含む溶液に接触させ、銅メッキ表面にBTAによるキレ
ート錯体が形成され、銅の表面に耐酸化性被覆層が形成
される。なお、このBTAによるキレート錯体の生成
は、前述のブラシと整流子の接触面及び側面の銅メッキ
の除去は、BTAによるキレート錯体の形成後であって
もよい。
Next, this copper-plated brush is immersed in a triazole derivative such as triazole, alkyltriazole or BTA, preferably a solution in which BTA is dissolved in water or alcohol, or the solution is applied to the surface by any method. I do. Thus, the surface of the copper plating is brought into contact with the solution containing BTA, a chelate complex of BTA is formed on the surface of the copper plating, and an oxidation-resistant coating layer is formed on the surface of the copper. The formation of the chelate complex by BTA may be performed after the above-described removal of the copper plating on the contact surface and the side surface between the brush and the commutator after the formation of the chelate complex by BTA.

【0021】BTAによるキレート錯体は、無電解メッ
キによって形成された銅メッキの銅のそれぞれの核の表
面に形成される。このため、核の表面の酸化が防止でき
るため、核が重なり合って電気を伝播する無電解メッキ
法によって形成された銅メッキの抵抗の上昇を防止し、
ブラシの温度上昇を防止することができる。
The chelate complex by BTA is formed on the surface of each nucleus of copper in copper plating formed by electroless plating. For this reason, since oxidation of the surface of the nucleus can be prevented, the resistance of the copper plating formed by the electroless plating method in which the nuclei overlap and propagate electricity is prevented,
The temperature rise of the brush can be prevented.

【0022】このように、固有抵抗が100μΩ・m以
上という比較的高抵抗の基材からなるブラシの表面に、
BTAを含む耐酸化性被覆層を形成することで、表面に
形成された銅メッキ膜の特性を長時間に亘って維持する
ことができ、ブラシの使用中による温度上昇を抑制する
ことが可能となり、高出力、高速回転で長時間使用した
場合であっても、安定した整流特性を発揮するブラシと
できる。
As described above, the surface of the brush made of a relatively high-resistance base material having a specific resistance of 100 μΩ · m or more,
By forming the oxidation-resistant coating layer containing BTA, the characteristics of the copper plating film formed on the surface can be maintained for a long time, and it is possible to suppress a temperature rise due to the use of the brush. Even if the brush is used for a long time at a high output and a high rotation speed, the brush can exhibit stable rectification characteristics.

【0023】[0023]

【実施例】以下に、実施例を挙げ、本発明を詳しく説明
する。なお、本発明は以下の実施例に限定されるもので
はない。 (実施例1)平均粒径50μm、灰分0.5%以下の人
造黒鉛粉75質量部にビスフェノール系エポキシ樹脂2
5質量部と、アセトンを加えて常温で2時間混捏した。
その後アセトンを乾燥蒸発させ、粒径が40メッシュ以
下になるように粉砕し、100MPaの圧力で7×11
×31.5mmの寸法に型押し成形し、180℃で硬化
し、抵抗率が500μΩ・mのブラシ基材を得た。この
ブラシ基材を水酸化ナトリウムと酒石酸カリウムを加え
て錯化した硫酸銅溶液に浸漬し、還元剤としてホルマリ
ンを加えて基材表面に銅の皮膜を10μm形成した。次
に、この表面に銅メッキ膜が形成されたブラシ基材をB
TAと水との混合液に1分間浸漬して、表面にBTAに
よるキレート錯体を形成し、ブラシとした。
The present invention will be described below in detail with reference to examples. Note that the present invention is not limited to the following embodiments. Example 1 Bisphenol-based epoxy resin 2 was added to 75 parts by mass of artificial graphite powder having an average particle size of 50 μm and an ash content of 0.5% or less.
5 parts by mass and acetone were added and kneaded at room temperature for 2 hours.
Thereafter, the acetone was dried and evaporated, and pulverized so that the particle size became 40 mesh or less, and 7 × 11 at a pressure of 100 MPa.
It was embossed to a size of 31.5 mm, cured at 180 ° C., and a brush substrate having a resistivity of 500 μΩ · m was obtained. This brush substrate was immersed in a copper sulfate solution complexed by adding sodium hydroxide and potassium tartrate, and formalin was added as a reducing agent to form a 10 μm copper film on the surface of the substrate. Next, a brush substrate having a copper plating film formed on
It was immersed in a mixed solution of TA and water for 1 minute to form a chelate complex of BTA on the surface to form a brush.

【0024】(比較例1)銅メッキ膜の表面にBTAに
よるキレート錯体を形成していない以外、実施例1と同
様にしてブラシを作製した。
(Comparative Example 1) A brush was manufactured in the same manner as in Example 1, except that a chelate complex of BTA was not formed on the surface of the copper plating film.

【0025】(比較例2)銅メッキ膜の表面を酒石酸に
1分間接触させ、表面に耐酸化性皮膜を形成した以外、
実施例1と同様にしてブラシを作製した。
Comparative Example 2 The surface of a copper plating film was contacted with tartaric acid for 1 minute to form an oxidation-resistant film on the surface.
A brush was produced in the same manner as in Example 1.

【0026】実施例1及び比較例1、2の各々のブラシ
について、基材の表面に形成された銅メッキ膜の抵抗の
変化及び、実機試験により推定寿命を測定した。
For each of the brushes of Example 1 and Comparative Examples 1 and 2, the change in resistance of the copper plating film formed on the surface of the base material and the estimated life thereof were measured by an actual machine test.

【0027】(抵抗の変化)40℃の飽和水蒸気圧に保
った雰囲気内に実施例1及び比較例1、2に係るブラシ
を設置し、各ブラシの基材表面に形成された銅メッキの
酸化による抵抗の変化を測定した。
(Change in Resistance) The brushes according to Example 1 and Comparative Examples 1 and 2 were installed in an atmosphere maintained at a saturated steam pressure of 40 ° C., and oxidation of copper plating formed on the base material surface of each brush was performed. And the change in resistance due to the pressure was measured.

【0028】図2にその結果をまとめて示す。FIG. 2 summarizes the results.

【0029】図2に示すように、表面にBTAによるキ
レート錯体を形成した実施例1のブラシは、6週間経過
したあとでも、初期の抵抗が変わらず一定の抵抗を示し
た。一方、比較例1のブラシは3週間を過ぎた頃から赤
く変色しはじめ、抵抗の上昇が見られた。また、比較例
2のブラシは、4週間経過した時点で、抵抗の上昇が見
られた。
As shown in FIG. 2, the brush of Example 1 in which the chelate complex of BTA was formed on the surface showed a constant resistance without change in the initial resistance even after 6 weeks. On the other hand, the brush of Comparative Example 1 began to turn red after three weeks, and the resistance was increased. Further, the resistance of the brush of Comparative Example 2 was increased after 4 weeks.

【0030】また、6週間40℃の飽和水蒸気圧の雰囲
気内に設置した各々のブラシをXMAによって、表面元
素の定量分析を行った結果、各表面の酸素濃度は、実施
例1のブラシは5.75%、比較例1のブラシは17.
05%、比較例2のブラシは12.55%であった。ま
た、これらを、XRDによって表面の定性分析を行った
結果、実施例1のブラシは、銅以外のものは検出されな
かったが、比較例1及び2のブラシには、酸化銅(Cu
2 O及びCuO)が検出された。
Further, each of the brushes installed in an atmosphere of a saturated steam pressure of 40 ° C. for 6 weeks was subjected to a quantitative analysis of surface elements by XMA. As a result, the oxygen concentration on each surface was 5% for the brush of Example 1. 0.75%, the brush of Comparative Example 1 was 17.
05%, and the brush of Comparative Example 2 was 12.55%. In addition, as a result of qualitative analysis of the surface by XRD, the brush of Example 1 did not detect anything other than copper, but the brushes of Comparative Examples 1 and 2 contained copper oxide (Cu
2 O and CuO) were detected.

【0031】(推定寿命の測定)推定寿命は試験時間と
ブラシの摩耗長さ、ブラシの有効摩耗長さから算出し
た。
(Measurement of Estimated Life) The estimated life was calculated from the test time, the wear length of the brush, and the effective wear length of the brush.

【0032】表1に結果をまとめて示す。Table 1 summarizes the results.

【0033】[0033]

【表1】 [Table 1]

【0034】表1より、基材表面に形成された銅メッキ
の表面にBTAによるキレート錯体からなる耐酸化性被
覆層を形成した実施例1のブラシは、推定寿命が従来の
銅メッキのみをしたブラシに比較して、その推定寿命が
約25%上昇した。また、酒石酸によって耐酸化性被膜
を形成した比較例2のブラシに比べて約10%上昇し
た。
From Table 1, it can be seen that the brush of Example 1 in which the oxidation-resistant coating layer composed of the chelate complex of BTA was formed on the surface of the copper plating formed on the substrate surface had an estimated life of only the conventional copper plating. Its life expectancy was increased by about 25% compared to the brush. In addition, the value was increased by about 10% as compared with the brush of Comparative Example 2 in which an oxidation-resistant film was formed with tartaric acid.

【0035】[0035]

【発明の効果】本発明は以上のように構成されており、
基材表面に形成された銅メッキの表面にトリアゾール誘
導体、特にBTAによるキレート錯体の耐酸化性被覆層
を形成することにより、銅自身の酸化を抑制することが
できる。これによって、製品の変色防止、酸化による抵
抗の上昇を抑制することができ、高出力、高速回転でも
長時間に亘って、安定した整流特性を示す長寿命のブラ
シとできる。
The present invention is configured as described above.
Oxidation of copper itself can be suppressed by forming an oxidation-resistant coating layer of a triazole derivative, particularly a chelate complex with BTA, on the surface of copper plating formed on the substrate surface. As a result, it is possible to prevent discoloration of the product and suppress an increase in resistance due to oxidation, and it is possible to obtain a long-life brush that exhibits stable rectifying characteristics for a long time even at high output and high speed rotation.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係るブラシの概略斜視図である。FIG. 1 is a schematic perspective view of a brush according to the present invention.

【図2】飽和水蒸気圧中における基材表面に形成した銅
メッキの抵抗の変化を示す図である。
FIG. 2 is a diagram showing a change in resistance of copper plating formed on a substrate surface during a saturated steam pressure.

【符号の説明】[Explanation of symbols]

1 ブラシ 2 整流子 1 brush 2 commutator

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 3B006 FA01 4K026 AA06 AA21 BA01 BB08 CA16 CA37 4K044 AA13 AB05 BA06 BA21 BB03 BC02 BC14 CA15 CA16 CA53 5H613 AA01 AA03 BB04 BB15 GA09 GB01 GB05 GB06 GB08 GB09 GB12 KK02 KK13 QQ03 QQ07 SS04 SS07  ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 3B006 FA01 4K026 AA06 AA21 BA01 BB08 CA16 CA37 4K044 AA13 AB05 BA06 BA21 BB03 BC02 BC14 CA15 CA16 CA53 5H613 AA01 AA03 BB04 BB15 GA09 GB01 GB05 GB06 GB08 GB09 SS04

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 カーボン基材の表面に銅メッキが施され
てなる電気機械用カーボンブラシにおいて、前記銅メッ
キの表面にトリアゾール誘導体によるキレート錯体を形
成してなることを特徴とする電気機械用カーボンブラ
シ。
An electromechanical carbon brush comprising a carbon substrate and a copper plating applied to a surface of the carbon substrate, wherein a chelate complex of a triazole derivative is formed on the surface of the copper plating. brush.
【請求項2】 前記基材の固有抵抗が、100μΩ・m
以上である請求項1に記載の電気機械用カーボンブラ
シ。
2. The method according to claim 1, wherein the specific resistance of the substrate is 100 μΩ · m.
The carbon brush for an electric machine according to claim 1, which is the above.
【請求項3】 前記銅メッキが厚み0.1〜100μm
で、無電解メッキによって形成されている請求項1に記
載の電気機械用カーボンブラシ。
3. The method according to claim 1, wherein the copper plating has a thickness of 0.1 to 100 μm.
The carbon brush for an electric machine according to claim 1, wherein the carbon brush is formed by electroless plating.
JP2000269609A 2000-09-06 2000-09-06 Carbon brush for electric machine Expired - Lifetime JP4476458B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000269609A JP4476458B2 (en) 2000-09-06 2000-09-06 Carbon brush for electric machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000269609A JP4476458B2 (en) 2000-09-06 2000-09-06 Carbon brush for electric machine

Publications (2)

Publication Number Publication Date
JP2002084715A true JP2002084715A (en) 2002-03-22
JP4476458B2 JP4476458B2 (en) 2010-06-09

Family

ID=18756184

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP4476458B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006081231A (en) * 2004-09-02 2006-03-23 Totan Kako Kk Carbon brush for electric machine
US7129615B2 (en) 2003-04-09 2006-10-31 Totankako Co., Ltd. Metal coated carbon brush
JP2014230346A (en) * 2013-05-21 2014-12-08 パナソニック株式会社 Electric blower and electric cleaner using the same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7129615B2 (en) 2003-04-09 2006-10-31 Totankako Co., Ltd. Metal coated carbon brush
JP2006081231A (en) * 2004-09-02 2006-03-23 Totan Kako Kk Carbon brush for electric machine
JP4588392B2 (en) * 2004-09-02 2010-12-01 東炭化工株式会社 Carbon brush for electric machine
JP2014230346A (en) * 2013-05-21 2014-12-08 パナソニック株式会社 Electric blower and electric cleaner using the same

Also Published As

Publication number Publication date
JP4476458B2 (en) 2010-06-09

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