JP2002076202A - Structure and method for packaging semiconductor device - Google Patents

Structure and method for packaging semiconductor device

Info

Publication number
JP2002076202A
JP2002076202A JP2000264098A JP2000264098A JP2002076202A JP 2002076202 A JP2002076202 A JP 2002076202A JP 2000264098 A JP2000264098 A JP 2000264098A JP 2000264098 A JP2000264098 A JP 2000264098A JP 2002076202 A JP2002076202 A JP 2002076202A
Authority
JP
Japan
Prior art keywords
semiconductor device
substrate
sealing material
mounting
underfill resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2000264098A
Other languages
Japanese (ja)
Inventor
Masaya Sakurai
雅也 櫻井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Keihin Corp
Original Assignee
Keihin Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Keihin Corp filed Critical Keihin Corp
Priority to JP2000264098A priority Critical patent/JP2002076202A/en
Publication of JP2002076202A publication Critical patent/JP2002076202A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector

Landscapes

  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Wire Bonding (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To prevent burnout of wiring and the cracks of resist at the lower portion of the end of a sealing material due to thermal stresses being generated between a semiconductor device and a packaging substrate, while protecting a solder bump from vibration or the like, when filling the sealing material into clearance formed between the semiconductor device and the packaging substrate having the solder bump, and to delay their progress in t he burnout of the wiring and generation of the cracks. SOLUTION: The semiconductor device 12 and substrate 14 are inverted, when an underfill resin 18 is cured, the semiconductor device 12 is positioned downward in a vertical direction to the substrate 14 for precipitating a filler constituent at the side of the semiconductor device (an underfill resin 18a on the side of the semiconductor device), and at the same time, the content of the filler constituent at the side of the substrate (an underfill resin 18b on the side of the substrate) is reduced, thus achieving a sufficient physical property for protecting the solder bump in the underfill resin 18a on the side of the semiconductor device, and at the same time, achieving physical property for reducing the thermal stress generated at a section to the substrate 14 in the underfill resin 18b on the side of the substrate.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、半導体装置の実
装構造および実装方法に関し、より具体的には、BGA
(Ball Grid Array)やFC(Flip Chip )などのはんだ
バンプを有する半導体装置の実装基板への実装構造およ
び実装方法に関する。
[0001] 1. Field of the Invention [0002] The present invention relates to a mounting structure and a mounting method of a semiconductor device, and more specifically, to a BGA.
The present invention relates to a mounting structure and a mounting method of a semiconductor device having solder bumps such as (Ball Grid Array) and FC (Flip Chip) on a mounting substrate.

【0002】[0002]

【従来の技術】図3および図4に従来技術に係る半導体
装置の実装構造および実装方法を示す。
2. Description of the Related Art FIGS. 3 and 4 show a mounting structure and a mounting method of a semiconductor device according to the prior art.

【0003】図3を参照して従来技術に係る半導体装置
の実装方法について説明すると、先ず、同図(a)に示
すように、はんだバンプ100を有する半導体装置10
2と実装基板104とを接続する。この接続は、はんだ
バンプ100を実装基板104に設けられた電極パッド
(図示せず)に接触させつつ加熱溶融(リフロー)する
ことにより行われる。尚、実装基板104は、基材10
4aとはんだ付け不要部分を覆うレジスト(ビルドアッ
プ法により製造されるビルドアップ基板においてはレジ
ストおよびビルドアップ層)104bからなる。
Referring to FIG. 3, a method of mounting a semiconductor device according to the prior art will be described. First, as shown in FIG.
2 and the mounting board 104 are connected. This connection is performed by heating and melting (reflowing) the solder bumps 100 while contacting the electrode pads (not shown) provided on the mounting substrate 104. Note that the mounting substrate 104 is
4a and a resist (a resist and a build-up layer in the case of a build-up substrate manufactured by a build-up method) 104b covering a portion not requiring soldering.

【0004】このように接続された半導体装置102お
よび実装基板104が、車両のエンジンルームなどの温
度変化や振動、衝撃が生じる環境に配置されると、繰り
返しの熱的負荷、より具体的には半導体装置102と実
装基板104との線膨張係数および弾性係数の相違に起
因して生じる熱応力がはんだバンプ100に集中すると
共に、振動や衝撃による応力もはんだバンプ100に集
中し、前記はんだバンプ100に亀裂が発生することが
ある。
When the semiconductor device 102 and the mounting board 104 connected as described above are placed in an environment where a temperature change, vibration, or impact occurs, such as an engine room of a vehicle, a repetitive thermal load, more specifically, The thermal stress generated due to the difference between the linear expansion coefficient and the elastic coefficient between the semiconductor device 102 and the mounting board 104 is concentrated on the solder bump 100, and the stress due to vibration and impact is also concentrated on the solder bump 100. Cracks may occur.

【0005】このため、従来、半導体装置102と実装
基板104の間に形成される間隙に封止材(アンダーフ
ィル樹脂)を充填し、よってはんだバンプ100に集中
する熱応力および振動、衝撃による応力を封止材に分散
させることにより、はんだバンプ100における亀裂の
発生を抑制している。
For this reason, conventionally, a gap formed between the semiconductor device 102 and the mounting board 104 is filled with a sealing material (underfill resin), so that the thermal stress concentrated on the solder bumps 100 and the stress due to vibration and impact. Is dispersed in the sealing material, thereby suppressing the occurrence of cracks in the solder bumps 100.

【0006】具体的には、図3(b)に示すように、半
導体装置102の周辺の実装基板104上に、ニードル
106などを用いて封止材108を塗布する。塗布され
た封止材108は、毛細管現象によって、同図(c)に
示すように半導体装置102と実装基板104の間隙に
隙間なく充填され、よって従来技術に係る半導体装置の
実装構造が完成する。尚、封止材108を充填すると、
通常、半導体装置102の端部からその外方の実装基板
104上にかけてフィレットが形成される。図4に、図
3(c)、即ち、従来技術に係る半導体装置の実装構造
を上方から見た平面図を示す。
More specifically, as shown in FIG. 3B, a sealing material 108 is applied on a mounting substrate 104 around the semiconductor device 102 by using a needle 106 or the like. The applied sealing material 108 fills the gap between the semiconductor device 102 and the mounting substrate 104 without gaps by the capillary phenomenon as shown in FIG. 3C, thereby completing the mounting structure of the semiconductor device according to the prior art. . When the sealing material 108 is filled,
Usually, a fillet is formed from the end of the semiconductor device 102 to the mounting substrate 104 outside the end. FIG. 4 is a plan view of FIG. 3C, that is, a top view of the mounting structure of the semiconductor device according to the related art.

【0007】[0007]

【発明が解決しようとする課題】上記のように、はんだ
バンプ100における亀裂の発生を抑制するために半導
体装置102と実装基板104の間隙に封止材108を
充填する場合、充填する封止材108の物性値(性質)
は、その目的から線膨張係数が低く(温度変化に起因す
る伸縮量が少なく)、かつ弾性係数が大きい(応力に起
因する変形量が少ない)ことが好ましい。具体的には、
線膨張係数が20〜40〔ppm/°C〕程度で、かつ
弾性係数が5〜10〔GPa〕程度のエポキシ系樹脂を
主成分とした封止材が使用されることが多い。
As described above, when filling the gap between the semiconductor device 102 and the mounting substrate 104 with the sealing material 108 in order to suppress the occurrence of cracks in the solder bumps 100, the sealing material to be filled is used. Physical property value (property) of 108
For that purpose, it is preferable that the coefficient of linear expansion be low (the amount of expansion and contraction caused by temperature change is small) and the elastic coefficient is large (the amount of deformation caused by stress is small). In particular,
In many cases, a sealing material whose main component is an epoxy resin having a linear expansion coefficient of about 20 to 40 [ppm / ° C.] and an elastic coefficient of about 5 to 10 [GPa] is used.

【0008】尚、封止材108の物性値は、フィラ成
分、例えば金属やシリカ(SiO2 )などを添加するこ
とにより、その目的に合わせて調整することができる。
The physical properties of the sealing material 108 can be adjusted according to the purpose by adding a filler component, for example, a metal or silica (SiO 2 ).

【0009】一方、実装基板104の物性値は、広く一
般に使用されているガラスエポキシ系の基材104a
で、線膨張係数が12〜16〔ppm/°C〕程度、弾
性係数が20〔GPa〕程度である。
On the other hand, the physical properties of the mounting board 104 are based on the glass epoxy base material 104a which is widely used in general.
The linear expansion coefficient is about 12 to 16 ppm / ° C. and the elastic coefficient is about 20 GPa.

【0010】また、レジスト(あるいはレジストおよび
ビルドアップ基板)104bは、線膨張係数が40〜7
0〔ppm/°C〕程度、弾性係数が1〜3〔GPa〕
程度である。
The resist (or the resist and the build-up substrate) 104b has a linear expansion coefficient of 40-7.
About 0 [ppm / ° C], elastic coefficient is 1-3 [GPa]
It is about.

【0011】このように、封止材108と実装基板10
4(基材104a、レジスト(あるいはレジストおよび
ビルドアップ層)104b)の線膨張係数および弾性係
数は大きく相違する。このため、前述の如く、半導体装
置102と実装基板104との線膨張係数および弾性係
数の相違に起因して熱応力が生じるのと同様に、封止材
108と実装基板104の線膨張係数および弾性係数の
相違によっても熱応力が生じる。
As described above, the sealing material 108 and the mounting substrate 10
4 (base material 104a, resist (or resist and build-up layer) 104b) have significantly different coefficients of linear expansion and elasticity. For this reason, as described above, similarly to the case where thermal stress is generated due to the difference between the linear expansion coefficient and the elastic coefficient between the semiconductor device 102 and the mounting substrate 104, the linear expansion coefficient and the Thermal stress also occurs due to the difference in elastic modulus.

【0012】封止材108と実装基板104、より具体
的にはレジスト(あるいはレジストおよびビルドアップ
層)104b間に生じた熱応力は、図3および図4に符
号112で示す封止材の端部、より詳しくは表面張力に
より生じたフィレットの端部に集中する。そのため、端
部112の下方に配置された配線114が断線されるこ
とがあり、接続に対する信頼性の低下につながってい
た。
The thermal stress generated between the sealing material 108 and the mounting substrate 104, more specifically, between the resist (or the resist and the build-up layer) 104b is caused by the end of the sealing material 112 shown in FIGS. Part, more particularly at the end of the fillet caused by surface tension. As a result, the wiring 114 disposed below the end 112 may be disconnected, leading to a reduction in the reliability of the connection.

【0013】尚、封止材108の線膨張係数および弾性
係数を実装基板104のそれと近い値に設定すれば、封
止材108とレジスト(あるいはレジストおよびビルド
アップ層)104b間に生じる熱応力が低減し、配線1
14の断線のおそれも少なくなるが、はんだバンプ10
0の保護という、本来の目的が十分に達成し得なくなる
のはいうまでもない。
If the coefficient of linear expansion and the coefficient of elasticity of the sealing material 108 are set to values close to those of the mounting substrate 104, thermal stress generated between the sealing material 108 and the resist (or the resist and the build-up layer) 104b is reduced. Reduce and wiring 1
14 is less likely to break, but the solder bumps 10
It goes without saying that the original purpose of protecting 0 cannot be sufficiently achieved.

【0014】従って本発明の目的は、半導体装置と実装
基板の間隙に封止材を充填してはんだバンプを保護しつ
つ、封止材の端部下方に配置された配線の断線を防止、
あるいはその進行を遅らせ、よって接続に対する信頼性
を向上させることができるようにした半導体装置の実装
構造および実装方法を提供することにある。
Accordingly, an object of the present invention is to fill a gap between a semiconductor device and a mounting board with a sealing material to protect solder bumps and prevent disconnection of wiring arranged below an end of the sealing material.
Another object of the present invention is to provide a semiconductor device mounting structure and a mounting method capable of delaying the progress and thereby improving the connection reliability.

【0015】また、端部112の下方のレジスト(ある
いはレジストおよびビルドアップ層)104bに、同様
な理由から亀裂が生じる(ビルドアップ基板においては
レジストおよびビルドアップ層に著しい亀裂が生じる)
ことがあった。レジスト(あるいはレジストおよびビル
ドアップ層)104bに生じた亀裂が配線114にまで
達するとマイグレーションを引き起こす要因となり、絶
縁に対する信頼性の低下につながっていた。
The resist (or the resist and the build-up layer) 104b below the end 112 is cracked for the same reason (in the case of a build-up substrate, the resist and the build-up layer are significantly cracked).
There was something. When a crack generated in the resist (or the resist and the build-up layer) 104b reaches the wiring 114, it causes migration, leading to a decrease in reliability of insulation.

【0016】従って本発明の第2の目的は、半導体装置
と実装基板の間隙に封止材を充填してはんだバンプを保
護しつつ、封止材の端部下方におけるレジスト(あるい
はレジストおよびビルドアップ層)の亀裂を防止、ある
いはその進行を遅らせ、よって絶縁に対する信頼性を向
上させることができるようにした半導体装置の実装構造
および実装方法を提供することにある。
Accordingly, a second object of the present invention is to fill a gap between a semiconductor device and a mounting board with a sealing material to protect solder bumps, and to form a resist (or resist and build-up) under an end of the sealing material. An object of the present invention is to provide a semiconductor device mounting structure and a mounting method capable of preventing or delaying the progress of cracks in a layer, thereby improving the reliability of insulation.

【0017】[0017]

【課題を解決するための手段】上記した課題を解決する
ために、請求項1項においては、はんだバンプを用いて
半導体装置を実装基板上に接続すると共に、前記半導体
装置と実装基板との間隙に、フィラ成分を含む封止材を
充填する半導体装置の実装構造において、前記封止材に
含まれるフィラ成分の含有率を、前記半導体装置側と実
装基板側とで相違させ、よって前記封止材の物性を前記
半導体装置側と実装基板側とで相違させる如く構成し
た。
According to one aspect of the present invention, a semiconductor device is connected to a mounting substrate using solder bumps and a gap between the semiconductor device and the mounting substrate. In a semiconductor device mounting structure in which a sealing material containing a filler component is filled, the content of the filler component contained in the sealing material is made different between the semiconductor device side and the mounting substrate side, and thus the sealing is performed. The material properties are different between the semiconductor device side and the mounting substrate side.

【0018】封止材に含まれるフィラ成分の含有率を、
半導体装置側と実装基板側とで相違させ、よって封止材
の物性を半導体装置側と実装基板側とで相違させる如く
構成したので、封止材の物性を、半導体装置側と実装基
板側でそれぞれ半導体装置側に適した物性、および実装
基板側に適した物性とすることができる。より具体的に
は、半導体装置側の物性をはんだバンプを保護するに十
分な物性とすると共に、実装基板側の物性を封止材と実
装基板間の熱応力が低減するような物性とすることがで
きる。このため、はんだバンプを保護しつつ封止材の端
部下方に配置された配線の断線を防止、あるいはその進
行を遅らせることができ、よって接続に対する信頼性を
向上させることができる。また、同様に、はんだバンプ
を保護しつつ封止材の端部下方におけるレジスト(ある
いはレジストおよびビルドアップ層)の亀裂を防止、あ
るいはその進行を遅らせることができ、よって絶縁に対
する信頼性も向上させることができる。
The content of the filler component contained in the sealing material is
Since the semiconductor device side and the mounting substrate side are different from each other, and thus the physical properties of the sealing material are different between the semiconductor device side and the mounting substrate side, the physical properties of the sealing material are different between the semiconductor device side and the mounting substrate side. Physical properties suitable for the semiconductor device side and physical properties suitable for the mounting substrate side can be obtained. More specifically, the physical properties of the semiconductor device should be sufficient to protect the solder bumps, and the physical properties of the mounting board should be such that thermal stress between the sealing material and the mounting board is reduced. Can be. For this reason, it is possible to prevent disconnection of the wiring disposed below the end of the sealing material or to delay the progress thereof while protecting the solder bumps, thereby improving the reliability of the connection. Similarly, cracking of the resist (or the resist and the build-up layer) under the end of the sealing material can be prevented or the progress thereof can be delayed while protecting the solder bumps, thereby improving the reliability for insulation. be able to.

【0019】請求項2項においては、前記封止材の実装
基板側の物性を、前記実装基板を構成する素材の物性に
近い物性とする如く構成した。
In the present invention, the physical properties of the sealing material on the side of the mounting substrate are set to be close to the physical properties of the material constituting the mounting substrate.

【0020】封止材の実装基板側の物性を、実装基板を
構成する素材の物性に近い物性とする如く構成したの
で、封止材と実装基板間の熱応力を確実に低減させるこ
とができるため、封止材の端部下方に配置された配線の
断線をより効果的に防止、あるいはその進行をより効果
的に遅らせることができ、よって接続に対する信頼性を
より向上させることができる。また、同様に、封止材の
端部下方におけるレジスト(あるいはレジストおよびビ
ルドアップ層)の亀裂をより効果的に防止、あるいはそ
の進行をより効果的に遅らせることができ、よって絶縁
に対する信頼性もより向上させることができる。
Since the physical properties of the sealing material on the mounting substrate side are set to be close to those of the material constituting the mounting substrate, the thermal stress between the sealing material and the mounting substrate can be reliably reduced. Therefore, disconnection of the wiring disposed below the end of the sealing material can be more effectively prevented, or the progress thereof can be more effectively delayed, so that the reliability of the connection can be further improved. Similarly, cracking of the resist (or the resist and the build-up layer) under the end of the sealing material can be more effectively prevented or the progress thereof can be more effectively delayed, so that the reliability for insulation is also improved. It can be further improved.

【0021】請求項3項においては、はんだバンプを用
いて半導体装置を実装基板上に接続すると共に、前記半
導体装置と実装基板との間隙に、フィラ成分を含む封止
材を充填する半導体装置の実装方法において、前記はん
だバンプを用いて前記半導体装置を実装基板上に接続
し、前記半導体装置と実装基板との間隙に前記封止材を
充填し、および前記半導体装置が接続された実装基板を
反転させて前記半導体装置を鉛直方向下方に向け、よっ
て前記封止材に含まれるフィラ成分を前記半導体装置側
に沈殿させつつ前記封止材を硬化させる、工程からなる
如く構成した。
According to a third aspect of the present invention, there is provided a semiconductor device in which a semiconductor device is connected to a mounting substrate using solder bumps, and a gap between the semiconductor device and the mounting substrate is filled with a sealing material containing a filler component. In the mounting method, the semiconductor device is connected to a mounting substrate using the solder bumps, the gap between the semiconductor device and the mounting substrate is filled with the sealing material, and the mounting substrate to which the semiconductor device is connected is mounted. The semiconductor device is turned upside down so that the filler is hardened while the filler component contained in the sealing material is precipitated on the semiconductor device side.

【0022】はんだバンプを用いて半導体装置を実装基
板上に接続し、半導体装置と実装基板との間隙に封止材
を充填し、および半導体装置が接続された実装基板を反
転させて半導体装置を鉛直方向下方に向け、よって封止
材に含まれるフィラ成分を半導体装置側に沈殿させつつ
封止材を硬化させる、工程からなる如く構成したので、
封止材の物性を、半導体装置側と実装基板側とでそれぞ
れ半導体装置側に適した物性、および実装基板側に適し
た物性とすることができる。より具体的には、半導体装
置側の物性をはんだバンプを保護するに十分な物性とす
ると共に、実装基板側の物性を封止材と実装基板間の熱
応力が低減するような物性とすることができる。このた
め、はんだバンプを保護しつつ封止材の端部下方に配置
された配線の断線を防止、あるいはその進行を遅らせる
ことができ、よって接続に対する信頼性を向上させるこ
とができる。また、同様に、はんだバンプを保護しつつ
封止材の端部下方におけるレジスト(あるいはレジスト
およびビルドアップ層)の亀裂を防止、あるいはその進
行を遅らせることができ、よって絶縁に対する信頼性も
向上させることができる。
The semiconductor device is connected to the mounting substrate by using the solder bumps, a gap between the semiconductor device and the mounting substrate is filled with a sealing material, and the mounting substrate to which the semiconductor device is connected is inverted to mount the semiconductor device. It is configured so as to consist of a step of curing the sealing material while causing the filler component included in the sealing material to precipitate downward on the semiconductor device side, so as to face downward in the vertical direction.
The properties of the sealing material on the semiconductor device side and the mounting board side can be set to physical properties suitable for the semiconductor device side and physical properties suitable for the mounting board side, respectively. More specifically, the physical properties of the semiconductor device should be sufficient to protect the solder bumps, and the physical properties of the mounting board should be such that thermal stress between the sealing material and the mounting board is reduced. Can be. For this reason, it is possible to prevent disconnection of the wiring disposed below the end of the sealing material or to delay the progress thereof while protecting the solder bumps, thereby improving the reliability of the connection. Similarly, cracking of the resist (or the resist and the build-up layer) under the end of the sealing material can be prevented or the progress thereof can be delayed while protecting the solder bumps, thereby improving the reliability for insulation. be able to.

【0023】[0023]

【発明の実施の形態】以下、添付した図面を参照して、
本発明に係る半導体装置の実装構造および実装方法につ
いて説明する。
BRIEF DESCRIPTION OF THE DRAWINGS FIG.
The mounting structure and mounting method of the semiconductor device according to the present invention will be described.

【0024】図1は、本発明の一つの実施の形態に係る
半導体装置の実装構造および実装方法を説明する説明断
面図であり、図2は図1に示す半導体装置の実装構造を
上方から見た平面図である。
FIG. 1 is an explanatory sectional view for explaining a semiconductor device mounting structure and a mounting method according to one embodiment of the present invention. FIG. 2 is a top view of the semiconductor device mounting structure shown in FIG. FIG.

【0025】図1および図2を参照して本発明の一つの
実施の形態に係る半導体装置の実装構造および実装方法
について説明すると、先ず、図1(a)に示すように、
BGAやFCなどのはんだバンプ10を有する半導体装
置12を、実装基板(以下、単に「基板」という)14
に接続する。この接続は、はんだバンプ10を基板14
に設けられた電極パッド(図示せず)に接触させつつ加
熱溶融(リフロー)することにより行われる。尚、基板
14は、基材14aとはんだ付け不要部分を覆うレジス
ト(ビルドアップ法により製造されるビルドアップ基板
においてはレジストおよびビルドアップ層。以下、「レ
ジスト」とは、特にことわりのない限り、レジスト単体
としての意味はもちろん、レジストおよびビルドアップ
層双方を示す意味も含むものとして使用する)14bか
らなる。
A mounting structure and a mounting method of a semiconductor device according to one embodiment of the present invention will be described with reference to FIGS. 1 and 2. First, as shown in FIG.
A semiconductor device 12 having a solder bump 10 such as BGA or FC is mounted on a mounting substrate (hereinafter, simply referred to as a “substrate”) 14.
Connect to This connection is made by connecting the solder bump 10 to the substrate 14.
This is performed by heating and melting (reflow) while making contact with an electrode pad (not shown) provided on the substrate. The substrate 14 is formed of a resist covering the base material 14a and a portion that does not need to be soldered (a resist and a build-up layer in a build-up substrate manufactured by a build-up method. Hereinafter, the “resist” is a reference unless otherwise specified. 14b) is used to mean both the resist and the build-up layer.

【0026】次いで、同図(b)に示すように、半導体
装置12周辺の基板14上に、ニードル16などを用い
てエポキシ系樹脂を主成分としたアンダーフィル樹脂
(前記した第1の封止材)18を塗布する。アンダーフ
ィル樹脂18には、その主成分であるエポキシ系樹脂の
線膨張係数(およそ65〜75〔ppm/°C〕)を低
下させると共に、弾性係数(およそ2〜3〔GPa〕)
を増大させるためのフィラ成分、例えばシリカ(線膨張
係数がおよそ0.4〔ppm/°C〕、弾性係数がおよ
そ73〔GPa〕)が適当量添加され、はんだバンプ1
0を保護するのに十分な物性、例えば従来技術で述べた
ように、線膨張係数においては20〜40〔ppm/°
C〕程度、弾性係数においては5〜10〔GPa〕程度
の物性が与えられる。
Next, as shown in FIG. 1B, an underfill resin mainly composed of an epoxy resin is formed on the substrate 14 around the semiconductor device 12 by using a needle 16 or the like (the first sealing described above). Material 18 is applied. The underfill resin 18 reduces the linear expansion coefficient (about 65 to 75 [ppm / ° C.]) of the epoxy resin as its main component, and has an elasticity coefficient (about 2 to 3 [GPa]).
, For example, silica (having a coefficient of linear expansion of about 0.4 [ppm / ° C.] and an elastic coefficient of about 73 [GPa]), and a solder bump 1
0, such as 20 to 40 ppm / ° in linear expansion coefficient as described in the prior art.
C] and an elastic coefficient of about 5 to 10 [GPa].

【0027】尚、以降の理解の便宜のため、図1および
図2において、アンダーフィル樹脂18について、その
内部に含有されるフィラ成分の分布(黒塗り部分が多い
ほど含有量(率)が多い(高い))を示す。
1 and 2, the distribution of filler components contained in the underfill resin 18 (the content (ratio) increases as the number of black portions increases) in FIGS. (High)).

【0028】塗布されたアンダーフィル樹脂18は、毛
細管現象によって、同図(c)に示すように半導体装置
12と基板14の間に形成された間隙に隙間なく充填さ
れる。尚、この際、半導体装置12の端部からその外方
の基板14上にかけてアンダーフィル樹脂18の表面張
力によりフィレットが形成されるが、適宜な型枠などを
用いてフィレットが形成されないようにしてもよい。
The applied underfill resin 18 fills the gap formed between the semiconductor device 12 and the substrate 14 without any gap by capillary action as shown in FIG. At this time, a fillet is formed by the surface tension of the underfill resin 18 from the end of the semiconductor device 12 to the substrate 14 outside the semiconductor device 12, but the fillet is not formed using an appropriate mold or the like. Is also good.

【0029】以上までの実装構造および実装方法は従来
技術と同様であり、本発明の一つの実施の形態に係る半
導体装置の実装構造および実装方法において特徴的なこ
とは、充填されたアンダーフィル樹脂18を硬化させる
際に、同図(d)に示すように半導体装置12および基
板14を反転させ、半導体装置12を基板14に対して
鉛直方向下方に位置させることにある。
The mounting structure and the mounting method up to heretofore are the same as those of the prior art, and the characteristic of the mounting structure and the mounting method of the semiconductor device according to one embodiment of the present invention is that the filled underfill resin is used. When the hardening 18 is cured, the semiconductor device 12 and the substrate 14 are turned over as shown in FIG. 4D, and the semiconductor device 12 is positioned vertically below the substrate 14.

【0030】このようにすることで、アンダーフィル樹
脂18の物性(線膨張係数および弾性係数)を半導体装
置12側と基板14側とで相違させる、より具体的に
は、半導体装置12側の物性をはんだバンプを保護する
に十分な物性とすると共に、基板14側の物性をアンダ
ーフィル樹脂18と基板14間の熱応力が低減するよう
な物性、即ち、基板14の物性値に近い物性とすること
ができる。
By doing so, the physical properties (linear expansion coefficient and elastic modulus) of the underfill resin 18 are made different between the semiconductor device 12 side and the substrate 14 side, more specifically, the physical properties on the semiconductor device 12 side. Are sufficient to protect the solder bumps, and the physical properties of the substrate 14 are such that the thermal stress between the underfill resin 18 and the substrate 14 is reduced, that is, physical properties close to the physical properties of the substrate 14. be able to.

【0031】以下詳説すると、アンダーフィル樹脂18
の主成分であるエポキシ系樹脂の線膨張係数を低下させ
ると共、弾性係数を向上させるためのフィラ成分、例え
ば前記したシリカなどは、一般的にアンダーフィル樹脂
18、より厳密にはその主成分であるエポキシ系樹脂に
比して比重が大きいことから、静的状態におかれると鉛
直方向下方に沈殿する。
The details will be described below.
A filler component for improving the elastic coefficient while lowering the linear expansion coefficient of the epoxy resin, which is a main component of, for example, the above-mentioned silica or the like is generally an underfill resin 18, more strictly, the main component thereof. Since the specific gravity is larger than that of the epoxy resin, the resin precipitates vertically downward in a static state.

【0032】従って、前記したように、アンダーフィル
樹脂18を硬化させる際に半導体装置12および基板1
4を反転させ、半導体装置12を基板14に対して鉛直
方向下方に位置させることにより、フィラ成分を半導体
装置12側(半導体装置側アンダーフィル樹脂18a)
に沈殿させることができると共に、基板14側(基板側
アンダーフィル樹脂18b)のフィラ成分の含有量を少
なくすることができる。
Therefore, as described above, when the underfill resin 18 is cured, the semiconductor device 12 and the substrate 1 are hardened.
4 and the semiconductor device 12 is positioned vertically below the substrate 14 to reduce the filler component to the semiconductor device 12 side (semiconductor device side underfill resin 18a).
And the content of the filler component on the substrate 14 side (substrate side underfill resin 18b) can be reduced.

【0033】即ち、フィラ成分を半導体装置側アンダー
フィル樹脂18aに沈殿させて半導体装置側アンダーフ
ィル樹脂18aにおけるフィラ成分の含有量を多くした
ため、半導体装置側アンダーフィル樹脂18aにあって
は、はんだバンプを保護するのに十分な物性とすること
ができる。
That is, since the filler component is precipitated in the semiconductor device-side underfill resin 18a to increase the content of the filler component in the semiconductor device-side underfill resin 18a, the semiconductor device-side underfill resin 18a has a solder bump. Have sufficient physical properties to protect the.

【0034】また、基板側アンダーフィル樹脂18bの
フィラ成分の含有量を少なくしたため、基板側アンダー
フィル樹脂18bにあっては、半導体装置側アンダーフ
ィル樹脂18aに比してアンダーフィル樹脂18の主成
分であるエポキシ系樹脂の物性に近い物性、換言すれ
ば、基板14の物性に近い物性とすることができ、アン
ダーフィル樹脂18が硬化した際の基板14との間に生
じる熱応力を低減することができる。このため、アンダ
ーフィル樹脂の端部22の下方に配置された配線26の
断線を防止、あるいはその進行を遅らせることができ、
よって接続に対する信頼性を向上させることができる。
また、同様に、アンダーフィル樹脂の端部22の下方に
おけるレジスト14bの亀裂を防止、あるいはその進行
を遅らせることができ、よって絶縁に対する信頼性も向
上させることができる。
Further, since the content of the filler component of the substrate-side underfill resin 18b is reduced, the main component of the underfill resin 18 in the substrate-side underfill resin 18b is smaller than that of the semiconductor device-side underfill resin 18a. Physical properties close to the physical properties of the epoxy resin, in other words, physical properties close to the physical properties of the substrate 14, and reducing the thermal stress generated between the underfill resin 18 and the substrate 14 when the underfill resin 18 is cured. Can be. For this reason, disconnection of the wiring 26 disposed below the end 22 of the underfill resin can be prevented or its progress can be delayed,
Therefore, the reliability of the connection can be improved.
Similarly, cracking of the resist 14b below the end 22 of the underfill resin can be prevented or its progress can be delayed, and the reliability for insulation can be improved.

【0035】尚、上記した効果をより確実に得るため
に、アンダーフィル樹脂18はフィラ成分が沈殿し易い
ものを使用することが好ましい。発明者の実験によれ
ば、例えば、信越化学工業株式会社製のアンダーフィル
樹脂Semicoat117(商品名)などにおいて、
必ず沈殿現象が発生することが確認されている。
In order to more reliably obtain the above-mentioned effects, it is preferable to use an underfill resin 18 in which a filler component is easily precipitated. According to experiments by the inventor, for example, in an underfill resin Semicoat 117 (trade name) manufactured by Shin-Etsu Chemical Co., Ltd.,
It has been confirmed that a sedimentation phenomenon always occurs.

【0036】以上のようにして得た本発明の一つの実施
の形態に係る半導体装置の実装構造を同図(e)および
図2に示す。
The mounting structure of the semiconductor device according to one embodiment of the present invention obtained as described above is shown in FIGS.

【0037】このように、本発明に係る半導体装置の実
装構造および実装方法においては、アンダーフィル樹脂
18を硬化させる際に半導体装置12および基板14を
反転させ、半導体装置12を基板14に対して鉛直方向
下方に位置させることにより、半導体装置側アンダーフ
ィル樹脂18aにあっては、はんだバンプを保護するの
に十分な物性とすることができると共に、基板側アンダ
ーフィル樹脂18bにあっては、基板14の物性に近い
物性とすることができる。
As described above, in the semiconductor device mounting structure and the mounting method according to the present invention, the semiconductor device 12 and the substrate 14 are inverted when the underfill resin 18 is cured, and the semiconductor device 12 is By being positioned vertically downward, the semiconductor device side underfill resin 18a can have physical properties sufficient to protect the solder bumps, and the substrate side underfill resin 18b can Physical properties close to those of No. 14 can be obtained.

【0038】このため、はんだバンプ10を保護しつつ
アンダーフィル樹脂の端部22下方に配置された配線2
6の断線を防止、あるいはその進行を遅らせることがで
き、よって接続に対する信頼性を向上させることができ
る。また、同様に、はんだバンプを保護しつつ封止材の
端部下方におけるレジスト14bの亀裂を防止、あるい
はその進行を遅らせることができ、よって絶縁に対する
信頼性も向上させることができる。
For this reason, while protecting the solder bumps 10, the wiring 2 arranged below the end 22 of the underfill resin
6 can be prevented or its progress can be delayed, and the reliability of connection can be improved. Similarly, cracking of the resist 14b below the edge of the sealing material can be prevented or its progress can be delayed while protecting the solder bumps, and the reliability for insulation can be improved.

【0039】以上のように、本発明の実施の形態にあっ
ては、はんだバンプ10を用いて半導体装置12を実装
基板(基板)14上に接続すると共に、前記半導体装置
と実装基板との間隙に、フィラ成分(例えばシリカ)を
含む封止材(アンダーフィル樹脂18)を充填する半導
体装置の実装構造において、前記封止材に含まれるフィ
ラ成分の含有率(量)を、前記半導体装置側(線膨張係
数および弾性係数)と実装基板側(基板側アンダーフィ
ル樹脂18b)とで相違させ、よって前記封止材の物性
(線膨張係数および弾性係数)を前記半導体装置側と実
装基板側とで相違させる如く構成した。
As described above, in the embodiment of the present invention, the semiconductor device 12 is connected to the mounting substrate (substrate) 14 by using the solder bumps 10 and the gap between the semiconductor device and the mounting substrate. In a semiconductor device mounting structure in which a sealing material (underfill resin 18) containing a filler component (for example, silica) is filled, the content (amount) of the filler component contained in the sealing material is determined on the semiconductor device side. (Linear expansion coefficient and elastic coefficient) and the mounting substrate side (substrate side underfill resin 18b), so that the physical properties (linear expansion coefficient and elastic coefficient) of the sealing material are different between the semiconductor device side and the mounting substrate side. It was configured to make the difference.

【0040】また、前記封止材の実装基板側の物性を、
前記実装基板を構成する素材(基材14aおよびレジス
ト(あるいはレジストおよびビルドアップ層)14b)
の物性に近い物性とする如く構成した。
The physical properties of the sealing material on the mounting substrate side are as follows:
Materials (base material 14a and resist (or resist and build-up layer) 14b) constituting the mounting board
It was configured so as to be a physical property close to that of the above.

【0041】また、はんだバンプ10を用いて半導体装
置12を実装基板(基板)14上に接続すると共に、前
記半導体装置と実装基板との間隙に、フィラ成分(例え
ばシリカ)を含む封止材(アンダーフィル樹脂18)を
充填する半導体装置の実装方法において、前記はんだバ
ンプを用いて前記半導体装置を実装基板上に接続し、前
記半導体装置と実装基板との間隙に前記封止材を充填
し、および前記半導体装置が接続された実装基板を反転
させて前記半導体装置を鉛直方向下方に向け、よって前
記封止材に含まれるフィラ成分を前記半導体装置側(半
導体装置側アンダーフィル樹脂18a)に沈殿させつつ
前記封止材を硬化させる、工程からなる如く構成した。
The semiconductor device 12 is connected to the mounting substrate (substrate) 14 using the solder bumps 10, and a sealing material (for example, silica) containing a filler component (eg, silica) is provided in a gap between the semiconductor device and the mounting substrate. In the method of mounting a semiconductor device to fill the underfill resin 18), the semiconductor device is connected to a mounting substrate using the solder bumps, and a gap between the semiconductor device and the mounting substrate is filled with the sealing material; And the mounting substrate to which the semiconductor device is connected is turned upside down so that the semiconductor device is directed downward in the vertical direction, so that the filler component contained in the sealing material is deposited on the semiconductor device side (semiconductor device side underfill resin 18a). And curing the sealing material.

【0042】[0042]

【発明の効果】請求項1項記載の発明にあっては、封止
材の物性を、半導体装置側と実装基板側でそれぞれ半導
体装置側に適した物性、および実装基板側に適した物性
とすることができる。より具体的には、半導体装置側の
物性をはんだバンプを保護するに十分な物性とすると共
に、実装基板側の物性を封止材と実装基板間の熱応力が
低減するような物性とすることができる。このため、は
んだバンプを保護しつつ封止材の端部下方に配置された
配線の断線を防止、あるいはその進行を遅らせることが
でき、よって接続に対する信頼性を向上させることがで
きる。また、同様に、はんだバンプを保護しつつ封止材
の端部下方におけるレジスト(あるいはレジストおよび
ビルドアップ層)の亀裂を防止、あるいはその進行を遅
らせることができ、よって絶縁に対する信頼性も向上さ
せることができる。
According to the first aspect of the present invention, the properties of the encapsulant are set so that the properties suitable for the semiconductor device side and the properties suitable for the mounting board side on the semiconductor device side and the mounting board side, respectively. can do. More specifically, the physical properties of the semiconductor device should be sufficient to protect the solder bumps, and the physical properties of the mounting board should be such that thermal stress between the sealing material and the mounting board is reduced. Can be. For this reason, it is possible to prevent disconnection of the wiring disposed below the end of the sealing material or to delay the progress thereof while protecting the solder bumps, thereby improving the reliability of the connection. Similarly, cracking of the resist (or the resist and the build-up layer) under the end of the sealing material can be prevented or the progress thereof can be delayed while protecting the solder bumps, thereby improving the reliability for insulation. be able to.

【0043】請求項2項記載の発明にあっては、封止材
と実装基板間の熱応力を確実に低減させることができる
ため、封止材の端部下方に配置された配線の断線をより
効果的に防止、あるいはその進行をより効果的に遅らせ
ることができ、よって接続に対する信頼性をより向上さ
せることができる。また、同様に、封止材の端部下方に
おけるレジスト(あるいはレジストおよびビルドアップ
層)の亀裂をより効果的に防止、あるいはその進行をよ
り効果的に遅らせることができ、よって絶縁に対する信
頼性もより向上させることができる。
According to the second aspect of the present invention, since the thermal stress between the sealing material and the mounting substrate can be reliably reduced, disconnection of the wiring disposed below the end of the sealing material can be prevented. Prevention can be performed more effectively, or the progress thereof can be more effectively delayed, so that reliability of connection can be further improved. Similarly, cracking of the resist (or the resist and the build-up layer) under the end of the sealing material can be more effectively prevented or the progress thereof can be more effectively delayed, so that the reliability for insulation is also improved. It can be further improved.

【0044】請求項3項記載の発明にあっては、封止材
の物性を、半導体装置側と実装基板側でそれぞれ半導体
装置側に適した物性、および実装基板側に適した物性と
することができる。より具体的には、半導体装置側の物
性をはんだバンプを保護するに十分な物性とすると共
に、実装基板側の物性を封止材と実装基板間の熱応力が
低減するような物性とすることができる。このため、は
んだバンプを保護しつつ封止材の端部下方に配置された
配線の断線を防止、あるいはその進行を遅らせることが
でき、よって接続に対する信頼性を向上させることがで
きる。また、同様に、はんだバンプを保護しつつ封止材
の端部下方におけるレジスト(あるいはレジストおよび
ビルドアップ層)の亀裂を防止、あるいはその進行を遅
らせることができ、よって絶縁に対する信頼性も向上さ
せることができる。
According to the third aspect of the present invention, the physical properties of the sealing material are set to be suitable for the semiconductor device and the mounting substrate, respectively. Can be. More specifically, the physical properties of the semiconductor device should be sufficient to protect the solder bumps, and the physical properties of the mounting board should be such that thermal stress between the sealing material and the mounting board is reduced. Can be. For this reason, it is possible to prevent disconnection of the wiring disposed below the end of the sealing material or to delay the progress thereof while protecting the solder bumps, thereby improving the reliability of the connection. Similarly, cracking of the resist (or the resist and the build-up layer) under the end of the sealing material can be prevented or the progress thereof can be delayed while protecting the solder bumps, thereby improving the reliability for insulation. be able to.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一つの実施の形態に係る半導体装置の
実装構造および実装方法を説明する説明断面図である。
FIG. 1 is an explanatory sectional view illustrating a mounting structure and a mounting method of a semiconductor device according to one embodiment of the present invention;

【図2】図1に示す半導体装置の実装構造を上方からみ
た平面図である。
FIG. 2 is a plan view of the mounting structure of the semiconductor device shown in FIG. 1 as viewed from above.

【図3】従来技術に係る半導体装置の実装構造および実
装方法を説明する説明断面図である。
FIG. 3 is an explanatory cross-sectional view illustrating a mounting structure and a mounting method of a semiconductor device according to a conventional technique.

【図4】図3に示す半導体装置の実装構造を上方からみ
た平面図である。
4 is a plan view of the mounting structure of the semiconductor device shown in FIG. 3 as viewed from above.

【符号の説明】[Explanation of symbols]

10 はんだバンプ 12 半導体装置 14 基板(実装基板) 14a 基材 14b レジスト(あるいはレジストおよびビルドアッ
プ層) 18 アンダーフィル樹脂(封止材) 18a 半導体装置側アンダーフィル樹脂 18b 基板側アンダーフィル樹脂
DESCRIPTION OF SYMBOLS 10 Solder bump 12 Semiconductor device 14 Substrate (mounting board) 14a Base material 14b Resist (or resist and buildup layer) 18 Underfill resin (sealing material) 18a Semiconductor device side underfill resin 18b Substrate side underfill resin

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 はんだバンプを用いて半導体装置を実装
基板上に接続すると共に、前記半導体装置と実装基板と
の間隙に、フィラ成分を含む封止材を充填する半導体装
置の実装構造において、前記封止材に含まれるフィラ成
分の含有率を、前記半導体装置側と実装基板側とで相違
させ、よって前記封止材の物性を前記半導体装置側と実
装基板側とで相違させることを特徴とする半導体装置の
実装構造。
1. A mounting structure for a semiconductor device, wherein a semiconductor device is connected to a mounting substrate using solder bumps and a gap between the semiconductor device and the mounting substrate is filled with a sealing material containing a filler component. The content of the filler component contained in the sealing material is different between the semiconductor device side and the mounting board side, and thus the physical properties of the sealing material are different between the semiconductor device side and the mounting board side. Semiconductor device mounting structure.
【請求項2】 前記封止材の実装基板側の物性を、前記
実装基板を構成する素材の物性に近い物性とすることを
特徴とする請求項1項記載の半導体装置の実装構造。
2. The mounting structure of a semiconductor device according to claim 1, wherein a physical property of the sealing material on a mounting substrate side is close to a physical property of a material forming the mounting substrate.
【請求項3】 はんだバンプを用いて半導体装置を実装
基板上に接続すると共に、前記半導体装置と実装基板と
の間隙に、フィラ成分を含む封止材を充填する半導体装
置の実装方法において、 a.前記はんだバンプを用いて前記半導体装置を実装基
板上に接続し、 b.前記半導体装置と実装基板との間隙に前記封止材を
充填し、および c.前記半導体装置が接続された実装基板を反転させて
前記半導体装置を鉛直方向下方に向け、よって前記封止
材に含まれるフィラ成分を前記半導体装置側に沈殿させ
つつ前記封止材を硬化させる、工程からなることを特徴
とする半導体装置の実装方法。
3. A method for mounting a semiconductor device, comprising: connecting a semiconductor device on a mounting substrate using solder bumps; and filling a gap between the semiconductor device and the mounting substrate with a sealing material containing a filler component. . Connecting the semiconductor device on a mounting substrate using the solder bumps; b. Filling the gap between the semiconductor device and the mounting board with the sealing material; and c. Inverting the mounting substrate to which the semiconductor device is connected, turning the semiconductor device downward in the vertical direction, and curing the sealing material while precipitating a filler component included in the sealing material on the semiconductor device side, A method for mounting a semiconductor device, comprising:
JP2000264098A 2000-08-31 2000-08-31 Structure and method for packaging semiconductor device Withdrawn JP2002076202A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000264098A JP2002076202A (en) 2000-08-31 2000-08-31 Structure and method for packaging semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000264098A JP2002076202A (en) 2000-08-31 2000-08-31 Structure and method for packaging semiconductor device

Publications (1)

Publication Number Publication Date
JP2002076202A true JP2002076202A (en) 2002-03-15

Family

ID=18751560

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000264098A Withdrawn JP2002076202A (en) 2000-08-31 2000-08-31 Structure and method for packaging semiconductor device

Country Status (1)

Country Link
JP (1) JP2002076202A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008069343A1 (en) * 2006-12-05 2008-06-12 Sumitomo Bakelite Company Limited Semiconductor package, core layer material, buildup layer material, and encapsulation resin composition
US8148828B2 (en) 2008-10-23 2012-04-03 Samsung Electronics Co., Ltd. Semiconductor packaging device
JP5660272B2 (en) * 2007-03-30 2015-01-28 住友ベークライト株式会社 Flip chip semiconductor package connection structure, build-up layer material, sealing resin composition, and circuit board

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008069343A1 (en) * 2006-12-05 2008-06-12 Sumitomo Bakelite Company Limited Semiconductor package, core layer material, buildup layer material, and encapsulation resin composition
TWI413220B (en) * 2006-12-05 2013-10-21 Sumitomo Bakelite Co Semiconductor package, core layer material, buildup layer material, and sealing resin composition
US8592994B2 (en) 2006-12-05 2013-11-26 Sumitomo Bakelite Co., Ltd. Semiconductor package, core layer material, buildup layer material, and sealing resin composition
JP5608977B2 (en) * 2006-12-05 2014-10-22 住友ベークライト株式会社 Semiconductor package, core layer material, buildup layer material, and sealing resin composition
KR101464008B1 (en) 2006-12-05 2014-11-20 스미또모 베이크라이트 가부시키가이샤 Semiconductor package, core layer material, buildup layer material, and encapsulation resin composition
JP5660272B2 (en) * 2007-03-30 2015-01-28 住友ベークライト株式会社 Flip chip semiconductor package connection structure, build-up layer material, sealing resin composition, and circuit board
US8148828B2 (en) 2008-10-23 2012-04-03 Samsung Electronics Co., Ltd. Semiconductor packaging device

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