JP2002050606A5 - - Google Patents
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- Publication number
- JP2002050606A5 JP2002050606A5 JP2000233252A JP2000233252A JP2002050606A5 JP 2002050606 A5 JP2002050606 A5 JP 2002050606A5 JP 2000233252 A JP2000233252 A JP 2000233252A JP 2000233252 A JP2000233252 A JP 2000233252A JP 2002050606 A5 JP2002050606 A5 JP 2002050606A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000233252A JP2002050606A (ja) | 2000-08-01 | 2000-08-01 | 基板用リンス液及び基板処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000233252A JP2002050606A (ja) | 2000-08-01 | 2000-08-01 | 基板用リンス液及び基板処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002050606A JP2002050606A (ja) | 2002-02-15 |
| JP2002050606A5 true JP2002050606A5 (is) | 2005-08-11 |
Family
ID=18725797
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000233252A Pending JP2002050606A (ja) | 2000-08-01 | 2000-08-01 | 基板用リンス液及び基板処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002050606A (is) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005051101A (ja) * | 2003-07-30 | 2005-02-24 | Ses Co Ltd | 基板の洗浄方法 |
| US8055064B2 (en) | 2005-03-30 | 2011-11-08 | National Printing Bureau, Incorporated Administrative Agency | Printed product, printed product detection method and detection apparatus, and authentication method and authentication apparatus |
| JP2012109290A (ja) | 2010-11-15 | 2012-06-07 | Kurita Water Ind Ltd | シリコンウェハ清浄化方法及びシリコンウェハ清浄化装置 |
| US8859428B2 (en) * | 2012-10-19 | 2014-10-14 | Air Products And Chemicals, Inc. | Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof |
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2000
- 2000-08-01 JP JP2000233252A patent/JP2002050606A/ja active Pending