JP2002047576A - Treating solution and treating method for forming insulating film on silicon steel sheet - Google Patents

Treating solution and treating method for forming insulating film on silicon steel sheet

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Publication number
JP2002047576A
JP2002047576A JP2000232866A JP2000232866A JP2002047576A JP 2002047576 A JP2002047576 A JP 2002047576A JP 2000232866 A JP2000232866 A JP 2000232866A JP 2000232866 A JP2000232866 A JP 2000232866A JP 2002047576 A JP2002047576 A JP 2002047576A
Authority
JP
Japan
Prior art keywords
insulating film
steel sheet
film
treatment liquid
polyvalent metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000232866A
Other languages
Japanese (ja)
Other versions
JP3935664B2 (en
Inventor
Katsu Takahashi
克 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Sumitomo Metal Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Industries Ltd filed Critical Sumitomo Metal Industries Ltd
Priority to JP2000232866A priority Critical patent/JP3935664B2/en
Publication of JP2002047576A publication Critical patent/JP2002047576A/en
Application granted granted Critical
Publication of JP3935664B2 publication Critical patent/JP3935664B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To form an inorganic or semiorganic type insulating film bakable at a temperature of 200 to 330 deg.C same as that in the case of a bichromate treating solution and excellent in water resistance and adhesive properties even in the case of a thin film with the coating weight of <=1.0 g/m2 on the surface of a silicon steel sheet by using a phosphate treating solution which does not contain chromium. SOLUTION: A treating solution obtained by adding a phosphonic chelating agent to an aqueous solution of polyvalent metal phosphate in such a manner that the ratio between the total ΣMi of the product between the molar number of the metallic atoms in the polyvalent metal phosphate and the number of their valencies and the total ΣOi of the product between the molar number of the chelating agent and the number of acid radicals in the molecules (ΣOi/ΣMi) is controlled to the range of 0.1 to 5 is used. The treating solution may further contain one or more kinds selected from water-based synthetic resin, boric acid and colloidal silica.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は電磁鋼板の表面に絶
縁皮膜を形成するための処理液および処理方法に関し、
特に6価クロム等の有害な化合物を含まず、無方向性電
磁鋼板用絶縁皮膜として従来は一般的であった重クロム
酸塩系皮膜と同程度の焼付け温度で製造可能であり、か
つ従来のリン酸塩系絶縁皮膜では得られない優れた耐水
性を有し、特に1.0 g/m2以下の薄膜の絶縁皮膜を形成さ
せる際の成膜性や密着性、耐水性に優れた、電磁鋼板の
絶縁皮膜形成用処理液および処理方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a processing solution and a processing method for forming an insulating film on the surface of a magnetic steel sheet.
In particular, it does not contain harmful compounds such as hexavalent chromium and can be manufactured at the same baking temperature as dichromate-based coatings, which were conventionally common as non-oriented electrical steel sheet insulating coatings. An electrical steel sheet that has excellent water resistance that cannot be obtained with a phosphate-based insulating film, and is particularly excellent in film forming properties, adhesion, and water resistance when forming a thin insulating film of 1.0 g / m 2 or less. And a method for forming an insulating film.

【0002】[0002]

【従来の技術】回転機や変圧器の鉄芯に使用される電磁
鋼板の絶縁皮膜は、層間抵抗だけでなく、ユーザーにお
ける利便性 (打抜性、溶接性、耐熱性、かしめ性) 等の
種々の特性が要求される。
2. Description of the Related Art Insulating coatings of electromagnetic steel sheets used for iron cores of rotating machines and transformers have not only interlayer resistance but also user convenience (punching property, welding property, heat resistance, caulking property) and the like. Various characteristics are required.

【0003】現在一般に使用されている無方向性電磁鋼
板用の絶縁皮膜は、以下の3種に大別される: 耐熱性が重視され、歪取り焼鈍可能な無機皮膜、 打抜き性と溶接性の両立を目指した、歪取焼鈍可能
な、無機有機混合型の半有機皮膜、 打抜き性が重視され、歪取り焼鈍不可の有機皮膜。
[0003] Insulating films for non-oriented electrical steel sheets that are currently generally used are roughly classified into the following three types: an inorganic film that emphasizes heat resistance and can be subjected to strain relief annealing; An inorganic-organic mixed semi-organic film that can be strain-annealed to achieve compatibility. An organic film that emphasizes punchability and cannot be strain-annealed.

【0004】この中で汎用されているのは、歪取り焼鈍
可能な、およびの無機成分を含む絶縁皮膜である。
特に、の半有機皮膜が、無機皮膜に比較して打抜き性
が格段に優れるため、主流となっている。
[0004] Among them, an insulating film that can be used for strain relief annealing and contains an inorganic component is widely used.
In particular, semi-organic coatings have become predominant because punching properties are much better than inorganic coatings.

【0005】これまで上記、の絶縁皮膜中の無機成
分を形成するための材料としては、重クロム酸塩が広く
用いられてきた。重クロム酸塩を使用した絶縁皮膜は、
6価クロムと多価金属塩を含む水溶液にエチレングリコ
ールやグリセリンなどの有機還元剤を混合して得た処理
液を電磁鋼板に塗布した後、加熱して塗膜を焼付け、6
価クロムを3価クロムに還元して造膜させることにより
形成される。焼付けは200 ℃から330 ℃の温度で1分以
内の短時間で終了する。しかし、この絶縁皮膜の形成に
用いる6価クロムは、毒性が強く、製造に携わる人間の
健康を害する危険性が懸念される。また、形成された絶
縁皮膜中に含まれる3価クロムは、6価クロムに比べる
と毒性は格段に低いが、完全に無害であるとは言えな
い。したがって、重クロム酸塩を用いる絶縁皮膜は、製
造時および製品段階で、人間あるいは環境に僅かながら
でも有害である可能性が否定できず、クロムを全く使用
しないノンクロム型の絶縁皮膜が求められるようになっ
てきた。
Hitherto, dichromate has been widely used as a material for forming the inorganic component in the insulating film. The insulating film using dichromate is
A treatment liquid obtained by mixing an organic reducing agent such as ethylene glycol or glycerin with an aqueous solution containing hexavalent chromium and a polyvalent metal salt is applied to an electromagnetic steel sheet, and then heated to bake the coating film.
It is formed by reducing valent chromium to trivalent chromium and forming a film. The baking is completed at a temperature of 200 ° C. to 330 ° C. in a short time within 1 minute. However, hexavalent chromium used for forming this insulating film is highly toxic, and there is a concern that it may harm human health involved in the production. Further, trivalent chromium contained in the formed insulating film is much less toxic than hexavalent chromium, but cannot be said to be completely harmless. Therefore, it cannot be denied that the insulating film using dichromate may be slightly harmful to humans or the environment at the time of manufacturing and at the product stage, and a non-chromium type insulating film using no chromium is required. It has become

【0006】重クロム酸塩と同様に絶縁皮膜の形成に利
用可能な無機成分として、リン酸塩がある。リン酸塩水
溶液は、無機成分として数少ない造膜可能な系であり、
かつ比較的安価に得られるため、従来より無機および半
有機の絶縁皮膜用無機成分として検討されてきた (例え
ば、特公昭53−28375 号公報) 。
[0006] Phosphate is an inorganic component that can be used for forming an insulating film in the same manner as dichromate. Phosphate aqueous solution is a system that can form a few films as an inorganic component,
Since it is obtained at a relatively low cost, it has been conventionally studied as an inorganic component for inorganic and semi-organic insulating films (for example, Japanese Patent Publication No. 53-28375).

【0007】しかし、重クロム酸塩系の還元反応とは異
なり、リン酸塩系の絶縁皮膜では、脱水反応による縮合
の進行によりリン酸塩を高分子化し、皮膜の水不溶性を
高めて造膜させる。そのため、耐水性の高い絶縁皮膜を
形成するには、処理液の塗布後に、重クロム酸塩系処理
液に比べてより高い温度(例、 300〜400 ℃)で焼き付
けることが必要である。焼付け温度が高くなると、次に
述べるような問題点がある。
However, unlike the dichromate-based reduction reaction, the phosphate-based insulating film polymerizes the phosphate due to the progress of condensation by a dehydration reaction, and increases the water insolubility of the film to form a film. Let it. Therefore, in order to form an insulating film having high water resistance, it is necessary to bake at a higher temperature (eg, 300 to 400 ° C.) than the dichromate-based treatment liquid after applying the treatment liquid. When the baking temperature increases, there are the following problems.

【0008】焼付けに必要な熱量および/または時間
が増え、工業生産性・経済性の観点から不利である。 汎用の半有機皮膜に含まれる樹脂の一部が熱分解し
て、皮膜の性能 (密着性、耐食性、打ち抜き性) が低下
する恐れがある。耐熱性の高い樹脂を使用すれば、この
問題は軽減されるが、そのような樹脂は高価であり、経
済性の観点から工業的には採用しにくい。
The amount of heat and / or time required for baking increases, which is disadvantageous from the viewpoint of industrial productivity and economy. Some of the resin contained in the general-purpose semi-organic film may be thermally decomposed, and the performance (adhesion, corrosion resistance, punching property) of the film may be reduced. If a resin having high heat resistance is used, this problem is reduced, but such a resin is expensive and is industrially difficult to employ from the viewpoint of economy.

【0009】リン酸塩系絶縁皮膜の例として、第一リン
酸アルミニウムと有機エマルジョン樹脂とを含有し、エ
マルジョンの粒径を粗大化するか、他の成分 (架橋体樹
脂粉体、アルコール、または有機酸金属塩) をさらに添
加した処理液を用いて絶縁皮膜を形成することが、特開
平5−78855 号、同6−330338号、同11−131250号およ
び同11−152579号各公報に提案されている。
[0009] Examples of the phosphate-based insulating film include an aluminum monophosphate and an organic emulsion resin to increase the particle size of the emulsion or to make other components (crosslinked resin powder, alcohol, or It has been proposed in JP-A-5-78855, JP-A-6-330338, JP-A-11-131250 and JP-A-11-152579 that an insulating film is formed by using a treatment solution further containing an organic acid metal salt. Have been.

【0010】しかし、本発明者らが検討した結果、これ
らの各公報に記載された処理液では、特に膜厚が小さい
(付着量約1.0 g/m2以下の) 薄膜の絶縁皮膜を形成する
場合に、成膜性が不十分となり、焼付け温度を高くしな
いと、絶縁皮膜の耐水性や密着性が低下し、薄膜での性
能に劣ることが判明した。薄膜の絶縁皮膜を設けた電磁
鋼板は、特に溶接性が重視される用途や、自動化かしめ
性が重視される用途などで、必要になってくる。
However, as a result of investigations by the present inventors, the processing liquids described in these publications have particularly small film thicknesses.
In the case of forming a (deposition amount of about 1.0 g / m 2 or less) of a thin film of insulating coating, film forming property is insufficient, unless a higher baking temperature, water resistance and adhesion of the insulating coating is reduced, a thin film Was found to be inferior in performance. An electromagnetic steel sheet provided with a thin insulating film is required particularly in applications where importance is placed on weldability and applications where importance is placed on automated caulking.

【0011】例えば、特開平11−131250号および同11−
152579号各公報には、200 ℃または250 ℃で焼付けた皮
膜の湿潤試験での耐食性の試験結果が示されており、錆
の有無で耐食性を評価しているが、このような評価方法
で錆が認められない場合でも、耐水性が十分であるとは
いえない。錆が発生しなくても、絶縁皮膜が白化するだ
けでべたつきや滑り性低下といった性能劣化が認められ
るからである。
For example, JP-A-11-131250 and JP-A-11-131250
In each of the publications 152579, the corrosion resistance test result of the film baked at 200 ° C or 250 ° C is shown by the wetting test, and the corrosion resistance is evaluated based on the presence or absence of rust. Is not recognized, it cannot be said that the water resistance is sufficient. This is because even if rust does not occur, performance deterioration such as stickiness and slipperiness is reduced only by whitening of the insulating film.

【0012】[0012]

【発明が解決しようとする課題】これまで無方向性電磁
鋼板用の半有機皮膜としてリン酸塩系皮膜が使用されて
きた例はいくつかあるものの、特に薄膜の場合には、重
クロム酸塩系に比べて高い焼付温度が必要とされること
から、ごく限られた用途にしか使用されていなかった。
There have been several examples of the use of a phosphate-based coating as a semi-organic coating for non-oriented electrical steel sheets. Since a high baking temperature is required as compared with the system, it has been used only for very limited applications.

【0013】クロムを使用せず、重クロム酸塩系なみの
低い焼付け温度で成膜でき、その場合でも湿潤試験で白
化に耐えるといった優れた耐水性や、密着性、絶縁性等
の電磁鋼板用絶縁皮膜に必要な諸性能を有し、薄膜でも
優れた成膜性を示す電磁鋼板の絶縁皮膜形成用処理液は
これまで皆無に等しかった。本発明は、このような処理
液とそれを用いた電磁鋼板の絶縁皮膜形成方法とを提供
するものである。
It is possible to form a film without using chromium at a baking temperature as low as that of dichromate, and even in such a case, it has excellent water resistance such as resistance to whitening in a wet test, as well as excellent adhesion and insulating properties. Until now, there has been no treatment solution for forming an insulating film on an electromagnetic steel sheet that has various properties required for an insulating film and exhibits excellent film forming properties even in a thin film. The present invention provides such a treatment liquid and a method for forming an insulating film on a magnetic steel sheet using the treatment liquid.

【0014】[0014]

【課題を解決するための手段】本発明者らは、リン酸塩
系処理液を用いた電磁鋼板の絶縁皮膜形成について、従
来の重クロム酸塩系処理液と同様の焼付け温度で成膜可
能で、優れた耐水性と密着性を有する皮膜が形成でき、
さらに付着量1.0g/m2 以下の薄膜の絶縁皮膜の場合でも
良好に成膜可能な処理液の開発を目指して鋭意検討を行
った。
Means for Solving the Problems The present inventors can form an insulating film on an electromagnetic steel sheet using a phosphate-based treatment solution at the same baking temperature as that of a conventional dichromate-based treatment solution. Can form a film with excellent water resistance and adhesion,
Furthermore, intensive studies were conducted with the aim of developing a processing solution capable of forming a good film even in the case of a thin insulating film having a coating amount of 1.0 g / m 2 or less.

【0015】その結果、水溶性の多価リン酸塩の水溶液
に、酸基、特にホスホン酸基を含有するキレート剤を添
加した処理液により、上記目的が達成されることを見出
し、本発明を完成させた。
As a result, it has been found that the above-mentioned object can be achieved by a treatment solution obtained by adding a chelating agent containing an acid group, particularly a phosphonic acid group, to an aqueous solution of a water-soluble polyvalent phosphate. Completed.

【0016】本発明に係る電磁鋼板の絶縁皮膜形成用処
理液は、水性溶媒中に水溶性の多価金属リン酸塩(A) と
酸基を有するキレート剤(B) とが溶解している処理液か
らなり、多価金属リン酸塩(A) に含まれる金属原子のモ
ル数とその価数の積の総和をΣMiとし、キレート剤
(B) のモル数と分子中の酸基数の積の総和をΣOiとす
るとき、(A) と(B) の割合が下記の式(1) を満たす。
In the treatment liquid for forming an insulating film on an electromagnetic steel sheet according to the present invention, a water-soluble polyvalent metal phosphate (A) and a chelating agent having an acid group (B) are dissolved in an aqueous solvent. The sum of the product of the number of moles of metal atoms contained in the polyvalent metal phosphate (A) and its valence is defined as ΔMi, and the chelating agent
Assuming that the sum of the product of the number of moles of (B) and the number of acid groups in the molecule is ΣOi, the ratio of (A) and (B) satisfies the following equation (1).

【0017】0.1 ≦ΣOi/ΣMi≦5 ‥‥ (1) 好適態様にあっては、多価金属リン酸塩(A) は第一リン
酸アルミニウムおよび/または第一リン酸マグネシウム
であり、その処理液中の濃度は1〜50質量%の範囲内で
あり、キレート剤(B) は少なくとも一部がホスホン酸化
合物である。
0.1 ≦ {Oi / {Mi ≦ 5}} (1) In a preferred embodiment, the polyvalent metal phosphate (A) is aluminum monophosphate and / or magnesium monophosphate, and its treatment The concentration in the liquid is in the range of 1 to 50% by mass, and the chelating agent (B) is at least partially a phosphonic acid compound.

【0018】本発明の絶縁皮膜形成用処理液は、半有機
皮膜を形成するように、さらに合成樹脂を含有していて
もよい。合成樹脂は、リン酸塩水溶液に分散または溶解
させて使用される。この場合、主に水性合成樹脂を用い
るのが好ましい。水性合成樹脂とは、水溶性合成樹脂、
水分散性合成樹脂、および水中エマルジョン型合成樹脂
を包含する意味である。また、本発明の処理液は、合成
樹脂とは別に、またはこれに加えて、さらにホウ酸およ
び/またはコロイダルシリカを含有していてもよい。
The treatment liquid for forming an insulating film of the present invention may further contain a synthetic resin so as to form a semi-organic film. The synthetic resin is used after being dispersed or dissolved in a phosphate aqueous solution. In this case, it is preferable to use mainly an aqueous synthetic resin. An aqueous synthetic resin is a water-soluble synthetic resin,
It is meant to include water-dispersible synthetic resins and underwater emulsion-type synthetic resins. Further, the treatment liquid of the present invention may further contain boric acid and / or colloidal silica separately from or in addition to the synthetic resin.

【0019】本発明の処理液を用いた電磁鋼板の処理方
法は、この処理液を電磁鋼板の少なくとも片面に塗布し
た後、加熱して塗膜を焼付け、電磁鋼板の表面に絶縁皮
膜を形成することからなる。この処理方法は、特に形成
された絶縁皮膜の付着量が片面当たり1.0 g/m2以下の薄
い絶縁皮膜の形成に適用することが有利であり、その場
合でも耐水性や密着性に優れ、湿潤試験で白化に耐える
優れた絶縁皮膜を形成することができる。また、塗膜の
焼付け温度 (最高到達板温度、以下同じ) は、従来の重
クロム酸塩系処理液の場合と同様に 200〜330 ℃の範囲
内とすることが好ましい。
In the method for treating an electromagnetic steel sheet using the treatment liquid of the present invention, the treatment liquid is applied to at least one surface of the electromagnetic steel sheet, and then heated to bake the coating, thereby forming an insulating film on the surface of the electromagnetic steel sheet. Consisting of This treatment method is particularly advantageous when applied to the formation of a thin insulating film in which the amount of the formed insulating film is 1.0 g / m 2 or less per side. An excellent insulating film that resists whitening can be formed in the test. Further, the baking temperature of the coating film (the highest attained plate temperature, the same applies hereinafter) is preferably in the range of 200 to 330 ° C. as in the case of the conventional dichromate-based treatment liquid.

【0020】[0020]

【発明の実施の形態】本発明により処理する電磁鋼板の
種類は、特に限定されない。電磁鋼板は無方向性と方向
性のいずれでもよく、また熱延鋼板と冷延鋼板のいずれ
でもよい。一般的な電磁鋼板は、Siを1〜5%程度含む
低炭素鋼板であるが、Siをほとんど含まない普通鋼も電
磁鋼板として使用可能である。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The type of magnetic steel sheet to be treated according to the present invention is not particularly limited. The electrical steel sheet may be either non-oriented or oriented, and may be either a hot-rolled steel sheet or a cold-rolled steel sheet. A general electromagnetic steel sheet is a low carbon steel sheet containing about 1 to 5% of Si, but ordinary steel containing almost no Si can be used as the electromagnetic steel sheet.

【0021】本発明で電磁鋼板に絶縁皮膜を形成するの
に用いる処理液は、水性溶媒中に水溶性多価金属リン酸
塩(A) と酸基を有するキレート剤(B) とが溶解した溶液
である。水性溶媒は、水でよいが、水と水混和性有機溶
媒 (例、アルコール、ケトン等) との混合溶媒も使用す
ることができる。
The treatment liquid used for forming the insulating film on the magnetic steel sheet in the present invention is obtained by dissolving a water-soluble polyvalent metal phosphate (A) and a chelating agent (B) having an acid group in an aqueous solvent. Solution. The aqueous solvent may be water, but a mixed solvent of water and a water-miscible organic solvent (eg, alcohol, ketone, etc.) can also be used.

【0022】多価金属リン酸塩(A) とキレート剤(B) の
割合は、(A) に含まれる金属原子のモル数とその価数の
積の総和をΣMiとし、(B) のモル数と分子中の酸基数
の積の総和をΣOiとするとき、下記の式(1) を満たす
ような割合とする。
The ratio of the polyvalent metal phosphate (A) to the chelating agent (B) is determined by the sum of the product of the number of moles of metal atoms contained in (A) and the valence, ΔMi, and the mole of (B) Assuming that the sum of the product of the number and the number of acid groups in the molecule is ΣOi, the ratio satisfies the following equation (1).

【0023】0.1 ≦ΣOi/ΣMi≦5 ‥‥ (1) ΣOi/ΣMiの値が0.1 より小さいと、薄膜の絶縁皮
膜を形成する場合の成膜性が劣化し、均一な絶縁皮膜を
形成することができず、耐水性も低下する。一方、ΣO
i/ΣMiの値が5より大きいと、処理液の粘度が上昇
したり、処理液中の無機成分が経時的に沈降したりし
て、形成される絶縁皮膜の品質が安定しないばかりか、
その耐水性が劣ることもある。ΣOi/ΣMiの値の好
ましい範囲は 0.2〜3である。
0.1 ≦ ΣOi / ΣMi ≦ 5 ‥‥ (1) If the value of ΣOi / ΣMi is less than 0.1, the film-forming property when forming a thin insulating film is deteriorated, and a uniform insulating film is formed. And water resistance decreases. On the other hand,
When the value of i / ΣMi is greater than 5, the viscosity of the processing solution increases, the inorganic components in the processing solution settle with time, and the quality of the formed insulating film is not stable.
Its water resistance may be poor. A preferred range of the value of ΣOi / ΣMi is 0.2 to 3.

【0024】多価金属リン酸塩の水溶液にキレート剤を
添加した処理液を使用することによ、成膜性や密着性、
さらには付着量が1.0 g/m2以下の薄膜の絶縁皮膜の形成
能が向上する理由は、明確には解明されていないが、下
記のような機構が関与しているのではないかと本発明者
らは推測している。
By using a processing solution in which a chelating agent is added to an aqueous solution of a polyvalent metal phosphate, film forming properties, adhesion, and the like can be improved.
Further, the reason why the ability to form a thin insulating film having a coating weight of 1.0 g / m 2 or less is improved has not been clearly elucidated, but the present invention is thought to involve the following mechanism. Are speculating.

【0025】キレート剤を含有しない処理液 (即ち、多
価金属リン酸塩の水溶液) を電磁鋼板の表面に塗布した
場合、この処理液中に存在する、多価金属リン酸塩から
解離した第一リン酸イオンや遊離リン酸が強酸性である
ため、鋼板表面がエッチングされ、処理液中に鉄イオン
が溶出する。溶出した鉄イオンと第一リン酸イオンまた
は遊離リン酸が、乾燥に伴う処理液の濃縮によって化合
し、乾燥初期からリン酸鉄の微細な粒子を形成する。こ
れらのリン酸鉄微粒子は結晶質であるため、白濁した皮
膜の外観を与えて成膜性を阻害したり、或いはリン酸鉄
を基点として皮膜剥離を生じて密着性を阻害し、それに
より耐水性をも低下させる。特に付着量1.0 g/m2以下の
薄膜の場合には、皮膜中に生成するリン酸鉄粒子の径
(短径あるいは長径) の膜厚に対する占める割合が大き
くなるため、皮膜の欠陥を生じやすくなり、成膜性や密
着性・耐水性への悪影響がより大きくなる。
When a processing solution containing no chelating agent (ie, an aqueous solution of a polyvalent metal phosphate) is applied to the surface of the magnetic steel sheet, the second solution dissociated from the polyvalent metal phosphate present in the processing solution. Since the monophosphate ions and free phosphoric acid are strongly acidic, the surface of the steel sheet is etched, and iron ions are eluted into the treatment solution. The eluted iron ions and primary phosphate ions or free phosphoric acid are combined by the concentration of the treatment solution accompanying the drying, and fine iron phosphate particles are formed from the initial stage of the drying. Since these iron phosphate fine particles are crystalline, they give the appearance of a cloudy film and impair the film formability, or cause film peeling from iron phosphate as a base to impede the adhesion, thereby preventing water resistance. It also reduces the quality. In particular, in the case of a thin film having a coating weight of 1.0 g / m 2 or less, the diameter of iron phosphate particles generated in the film
Since the ratio of (short diameter or long diameter) to the film thickness is large, the film is likely to have a defect, and the adverse effect on the film formability, adhesion and water resistance is further increased.

【0026】多価金属リン酸塩にキレート剤を添加した
処理液を電磁鋼板の表面に塗布すると、鋼板表面のエッ
チングにより溶出した鉄イオンが、リン酸鉄の粒子を生
成するより前に、キレート剤によって捕捉され、塗布さ
れた未乾燥の処理液中で安定化する。キレート剤は処理
液中にほぼ均一に分散されていると考えられ、乾燥焼付
けが進行するにつれ、キレート剤自身の一部脱水縮合を
伴って、非晶質の皮膜として安定化するものと推測され
る。
When a treatment solution in which a chelating agent is added to a polyvalent metal phosphate is applied to the surface of an electromagnetic steel sheet, iron ions eluted by etching of the steel sheet surface are chelated before iron phosphate particles are formed. It is captured by the agent and stabilized in the applied undried processing liquid. It is considered that the chelating agent is almost uniformly dispersed in the processing solution, and it is presumed that as the drying and baking progresses, a part of the chelating agent itself is dehydrated and condensed, and is stabilized as an amorphous film. You.

【0027】水溶性多価金属リン酸塩化合物(A) は、絶
縁皮膜を形成するベースとなる成分である。金属が1価
のアルカリ金属であると、耐水性のある皮膜を形成する
ことができないので、リン酸の多価金属を使用する。
The water-soluble polyvalent metal phosphate compound (A) is a base component for forming an insulating film. If the metal is a monovalent alkali metal, a water-resistant film cannot be formed, so a polyvalent metal of phosphoric acid is used.

【0028】水溶性の多価金属リン酸塩(A) としては、
第一リン酸アルミニウムおよび第一リン酸マグネシウム
の一方または両方を使用することが好ましい。ここで、
第一リン酸アルミニウムはAl/Pのモル比が 0.7/3〜
1.2/3のものを包含し、第一リン酸マグネシウムはMg
/Pのモル比が 0.7/2〜 1.2/2 のものを包含する。
多価金属リン酸塩の金属イオンは、高濃度の処理液が得
られやすい、工業的に安価といった理由から、上記の2
種類 (アルミニウム塩およびマグネシウム塩)が好まし
いが、他の2価または3価の金属塩 (Ca、Sr、Ba、Zn塩
等) も使用できる。また、市販のリン酸塩水溶液に金属
または金属酸化物もしくは水酸化物を添加して、リン酸
イオンに対して多価金属の比率を高めたものも使用でき
る。
As the water-soluble polyvalent metal phosphate (A),
It is preferred to use one or both of aluminum monophosphate and magnesium monophosphate. here,
Aluminum monophosphate has Al / P molar ratio of 0.7 / 3 ~
1.2 / 3 magnesium monophosphate is Mg
/ P having a molar ratio of 0.7 / 2 to 1.2 / 2.
The metal ions of the polyvalent metal phosphate are difficult to obtain a high-concentration processing solution and are industrially inexpensive because of the above-mentioned reasons.
Types (aluminum salts and magnesium salts) are preferred, but other divalent or trivalent metal salts (Ca, Sr, Ba, Zn salts, etc.) can also be used. Further, a commercially available aqueous solution of phosphate to which a metal or metal oxide or hydroxide is added to increase the ratio of polyvalent metal to phosphate ion can be used.

【0029】処理液中の多価金属リン酸塩の濃度は1〜
50質量%の範囲が好ましく、より好ましくは2〜30質量
%である。この濃度が1質量%未満では、造膜性が乏し
く、耐水性も低下する傾向が認められる。一方、この濃
度が50%を超えると、処理液の安定性が低下し、固形物
の沈降や粘度の上昇が生じ、均一な皮膜を形成すること
が困難となる。
The concentration of the polyvalent metal phosphate in the treatment solution is 1 to
The range is preferably 50% by mass, more preferably 2 to 30% by mass. If the concentration is less than 1% by mass, the film-forming properties are poor, and the water resistance tends to decrease. On the other hand, if this concentration exceeds 50%, the stability of the treatment liquid is reduced, solids settle, and the viscosity increases, making it difficult to form a uniform film.

【0030】キレート剤(B) は、多価金属リン酸塩の成
膜性を改善し、低温焼付け条件においても耐水性が良好
な皮膜が形成できるようにする。また、キレート剤(B)
は、多価金属リン酸塩のみでは困難な、均一かつ非晶質
で緻密な絶縁皮膜の形成を可能にする作用も果たす。
The chelating agent (B) improves the film formability of the polyvalent metal phosphate and enables the formation of a film having good water resistance even under low-temperature baking conditions. In addition, chelating agent (B)
Has an effect of enabling formation of a uniform, amorphous, and dense insulating film, which is difficult with polyvalent metal phosphate alone.

【0031】キレート剤(B) としては、酸基を有するキ
レート剤を使用する。これは、処理液が多価金属リン酸
塩を含有し、酸性であるからである。例えば、エチレン
ジアミンといった酸基を有しないキレート剤では、処理
液中の第一リン酸イオンと反応して、キレート形成能あ
るいは金属捕捉能力を失ってしまう。
As the chelating agent (B), a chelating agent having an acid group is used. This is because the treatment liquid contains a polyvalent metal phosphate and is acidic. For example, a chelating agent having no acid group, such as ethylenediamine, reacts with primary phosphate ions in the processing solution and loses the ability to form chelate or trap metal.

【0032】酸基を有するキレート剤(B) としては、オ
キシカルボン酸、ジカルボン酸、アミノカルボン酸等の
カルボン酸化合物も使用できるが、ホスホン酸 (亜リン
酸)化合物が、同じリン酸類であり、かつ皮膜の耐水性
向上効果が大きいことから好ましい。また、ホスホン酸
系キレート剤とカルボン酸系キレート剤とを併用するこ
ともできる。
As the chelating agent (B) having an acid group, carboxylic acid compounds such as oxycarboxylic acid, dicarboxylic acid and aminocarboxylic acid can be used, but the phosphonic acid (phosphorous acid) compound is the same phosphoric acid. It is preferable because the effect of improving the water resistance of the film is large. Further, a phosphonic acid-based chelating agent and a carboxylic acid-based chelating agent can be used in combination.

【0033】ホスホン酸系キレート剤の具体例として
は、ヒドロキシエチリデンモノ−およびジ−ホスホン
酸、アミノトリメチレンホスホン酸等が挙げられる。カ
ルボン酸系キレート剤のうち、オキシカルボン酸の具体
例としてはグリコール酸、乳酸等が、ジカルボン酸の具
体例としてはシュウ酸、マロン酸、コハク酸等が、アミ
ノカルボン酸の具体例としてはエチレンジアミン四酢
酸、ニトリロ三酢酸等がそれぞれ挙げられる。以上はい
ずれも例示にすぎず、他の化合物も使用することができ
る。
Specific examples of the phosphonic acid chelating agent include hydroxyethylidene mono- and di-phosphonic acids, aminotrimethylene phosphonic acid and the like. Among the carboxylic acid chelating agents, specific examples of oxycarboxylic acids include glycolic acid and lactic acid, specific examples of dicarboxylic acids include oxalic acid, malonic acid, and succinic acid, and specific examples of aminocarboxylic acids include ethylenediamine. Examples thereof include tetraacetic acid and nitrilotriacetic acid. All of the above are merely examples, and other compounds can be used.

【0034】特開平11−131250号公報には、第一リン酸
アルミニウムに有機酸金属塩を添加した処理液が開示さ
れ、有機酸としてコハク酸等のキレート剤となる化合物
も例示されている。しかし、この有機酸は金属塩の形態
で使用され、当然ながらキレート剤としては機能しな
い。例えば、コハク酸を本発明でキレート剤として使用
する場合には、これは遊離形態でなければならない。
Japanese Patent Application Laid-Open No. 11-131250 discloses a treatment solution in which an organic acid metal salt is added to aluminum monophosphate, and a compound which becomes a chelating agent such as succinic acid as an organic acid is also exemplified. However, this organic acid is used in the form of a metal salt and naturally does not function as a chelating agent. For example, if succinic acid is used as a chelating agent in the present invention, it must be in free form.

【0035】本発明の絶縁皮膜形成用処理液には、打抜
き性のよい半有機皮膜が形成されるように、合成樹脂、
好ましくは水性の合成樹脂を添加してもよい。水性合成
樹脂は、前述したように、エマルジョン型、水分散性
型、水溶性型のいずれの水性樹脂であってもよい。合成
樹脂の具体例として、アクリル樹脂、アクリルスチレン
樹脂、アルキッド樹脂、ポリエステル樹脂、シリコーン
樹脂、フッ素樹脂、ポリオレフィン樹脂、スチレン樹
脂、酢酸ビニル樹脂、エポキシ樹脂、フェノール樹脂、
ウレタン樹脂、メラミン樹脂等が挙げられる。合成樹脂
は、1種または2種以上添加することができる。
The processing solution for forming an insulating film of the present invention contains a synthetic resin,
Preferably, an aqueous synthetic resin may be added. As described above, the aqueous synthetic resin may be any one of an emulsion type, a water dispersible type, and a water soluble type. As specific examples of the synthetic resin, acrylic resin, acrylic styrene resin, alkyd resin, polyester resin, silicone resin, fluororesin, polyolefin resin, styrene resin, vinyl acetate resin, epoxy resin, phenol resin,
Urethane resins, melamine resins, and the like. One or more synthetic resins can be added.

【0036】合成樹脂を処理液に添加する場合、その添
加量は、多価金属リン酸塩100 質量部に対して3〜100
質量部の範囲内とすることが好ましい。合成樹脂の量が
3質量部より少ないと、打抜き性の向上がほとんど得ら
れず、100 質量部を超えると、歪取り焼鈍後の層間抵抗
が低下することがある。この合成樹脂の添加量は、より
好ましくは5〜5 質量部、さらに好ましくは7〜30質量
部である。
When the synthetic resin is added to the treating solution, the amount of the resin added is 3 to 100 parts by mass per 100 parts by mass of the polyvalent metal phosphate.
It is preferably within the range of parts by mass. If the amount of the synthetic resin is less than 3 parts by mass, almost no improvement in the punching property is obtained, and if it exceeds 100 parts by mass, the interlayer resistance after strain relief annealing may decrease. The addition amount of the synthetic resin is more preferably 5 to 5 parts by mass, and further preferably 7 to 30 parts by mass.

【0037】本発明の処理液に、特に歪取り焼鈍後の耐
食性を向上させるため、ホウ酸を添加してもよい。ホウ
酸添加量は、多価金属リン酸塩のP換算100 質量部あた
り、B換算で50質量部以下とすることが好ましい。添加
量が過多であると層間抵抗や歪取り焼鈍後の耐食性が向
上するものの、処理液中にホウ酸を完全に溶解すること
ができず、液中で沈殿することがある。この添加量はよ
り好ましくは2〜20質量部である。
In order to improve the corrosion resistance especially after the strain relief annealing, boric acid may be added to the treatment liquid of the present invention. The amount of boric acid added is preferably not more than 50 parts by mass in terms of B per 100 parts by mass of P of the polyvalent metal phosphate. If the addition amount is excessive, the interlayer resistance and the corrosion resistance after strain relief annealing are improved, but the boric acid cannot be completely dissolved in the treatment liquid and may precipitate in the liquid. This addition amount is more preferably 2 to 20 parts by mass.

【0038】本発明の処理液にはまた、層間抵抗を向上
させるため、コロイダルシリカを配合してもよい。コロ
イダルシリカの添加量は、多価金属リン酸塩のP換算10
0 質量部あたり、Si換算で50質量部以下とすることが好
ましい。シリカ添加量が過多であると、処理液の安定性
が失われたり、表面性状が損なわれることがある。この
添加量はより好ましくは2〜30質量部である。
[0038] Colloidal silica may be added to the treatment liquid of the present invention in order to improve interlayer resistance. The amount of colloidal silica to be added is 10 in terms of P of polyvalent metal phosphate.
It is preferable to be 50 parts by mass or less per 0 parts by mass in terms of Si. If the added amount of silica is too large, the stability of the treatment liquid may be lost or the surface properties may be impaired. This addition amount is more preferably 2 to 30 parts by mass.

【0039】上記以外にも、処理液中に、所望により、
防錆剤、消泡剤、処理液安定化剤等の他の添加剤を適宜
配合することができる。本発明の処理液を使用し、これ
を素地の電磁鋼板の表面 (通常は両面であるが、片面に
塗布することも可能) に塗布し、加熱して塗膜を焼付け
ると、耐水性と密着性に優れたリン酸塩系絶縁皮膜が形
成される。
In addition to the above, if desired,
Other additives such as a rust inhibitor, a defoaming agent, and a treatment liquid stabilizer can be appropriately compounded. Using the treatment liquid of the present invention, apply it to the surface of a base magnetic steel sheet (usually, both sides, but it is also possible to apply it to one side), and heat it to bake the coating film. A phosphate insulating film having excellent adhesion is formed.

【0040】処理液の塗布方法は特に制限されず、工業
的に一般に用いられる、ロールコーター、カーテンフロ
ーコーター、スプレー塗装、ナイフコーター、浸漬等の
種々の塗布方法が適用できる。
The coating method of the treatment liquid is not particularly limited, and various coating methods generally used in industry such as a roll coater, a curtain flow coater, a spray coating, a knife coater, and a dipping can be applied.

【0041】皮膜の焼付けも、通常実施される、熱風
式、赤外線式、誘導加熱式等の方法によって実施でき、
従来の重クロム酸塩なみの焼付温度、即ち、 200〜330
℃の温度範囲で1分以内の短時間の焼付きによる成膜
で、耐水性と密着性に優れ、絶縁性も良好な皮膜にな
る。この絶縁皮膜の耐水性は、湿潤試験で白化に耐える
のに十分なものである。
The baking of the film can also be carried out by a method usually employed, such as a hot air method, an infrared method, an induction heating method, or the like.
Baking temperature comparable to conventional dichromate, i.e. 200-330
A film formed by short-time seizure within 1 minute within a temperature range of ° C. is formed into a film having excellent water resistance and adhesion, and excellent insulation. The water resistance of this insulating film is sufficient to withstand whitening in a wet test.

【0042】電磁鋼板の絶縁皮膜の付着量は、0.1 g/m2
以上、3g/m2以下が好ましい。付着量が0.1 g/m2未満で
あると、均一塗布が困難になるだけでなく、焼鈍時の耐
焼付き性および耐食性、層間抵抗が不足する。付着量が
3g/m2を超えると、層間抵抗の向上しろが飽和する上、
皮膜の密着性が低下するようになる。層間抵抗、即ち、
絶縁性が主に要求される場合には、付着量を1.0 g/m2
上とするのがよい。逆に、例えば、鉄芯や回転機の生産
時の生産性の向上のために溶接性の改善が要求される場
合には、1.0 g/m2未満、好ましくは0.5 g/m2以下の薄膜
とすることが要求される。このように、用途で重視され
る性能に応じて、膜厚を設定することができる。本発明
の処理液は、特に付着量が1.0 g/m2以下の薄膜を形成す
る場合にも成膜性が良好で、密着性や耐水性に優れた絶
縁皮膜を形成できるという特長があるので、このような
薄膜の絶縁皮膜の形成に適用することが有利である。
The amount of the insulating film deposited on the magnetic steel sheet was 0.1 g / m 2
As described above, the amount is preferably 3 g / m 2 or less. When the amount of adhesion is less than 0.1 g / m 2 , not only uniform coating becomes difficult, but also seizure resistance, corrosion resistance, and interlayer resistance during annealing are insufficient. If the adhesion amount exceeds 3 g / m 2 , the margin for improving the interlayer resistance is saturated, and
The adhesion of the film is reduced. Interlayer resistance, ie
When insulation is mainly required, it is preferable to set the adhesion amount to 1.0 g / m 2 or more. Conversely, for example, when the improvement of the weldability is required in order to improve the productivity in the production of the iron core and the rotating machine is less than 1.0 g / m 2, preferably 0.5 g / m 2 or less of membrane Is required. In this way, the film thickness can be set according to the performance that is emphasized in the application. The treatment liquid of the present invention has a feature that it has good film formability even when a thin film having an adhesion amount of 1.0 g / m 2 or less is formed, and can form an insulating film having excellent adhesion and water resistance. It is advantageous to apply to the formation of such a thin insulating film.

【0043】[0043]

【実施例】以下に示す実施例により本発明を具体的に例
示するが、本発明はこれら実施例により制限されるもの
ではない。実施例中の%および部は、特に指定しない限
り質量%および質量部である。
The present invention will be specifically illustrated by the following examples, but the present invention is not limited by these examples. The percentages and parts in the examples are% by mass and parts by mass unless otherwise specified.

【0044】(実施例1)濃度30%の第一リン酸アルミニ
ウム水溶液 (Al/P比= 0.9/3) に、キレート剤とし
て1−ヒドロキシエチリデン−1,1 −ジホスホン酸 (k
1と表記) を、ΣOi/ΣMiの値が種々の値をとるよ
うに添加して溶解させ、または無添加で、供試用の絶縁
皮膜形成用処理液を作製した。比較用として、エチレン
グリコールまたはクエン酸アルミニウムをそれぞれリン
酸アルミニウム100 部に対して5部の割合で添加した処
理液を用意した。これらの処理液を40℃で6カ月間保存
し、処理液の安定性を調べた。保存後の処理液に固形物
が発生しない場合を○、固形物が発生した場合を×と評
価した。
Example 1 A 30% aqueous solution of aluminum monophosphate (Al / P ratio = 0.9 / 3) was mixed with 1-hydroxyethylidene-1,1-diphosphonic acid (k
Was added and dissolved so that the value of ΣOi / ΣMi could take various values, or a treatment liquid for forming an insulating film for a test was prepared without addition. For comparison, a treatment liquid was prepared by adding 5 parts of ethylene glycol or aluminum citrate to 100 parts of aluminum phosphate. These treatment solutions were stored at 40 ° C. for 6 months, and the stability of the treatment solutions was examined. The case where no solid matter was generated in the treatment liquid after storage was evaluated as “○”, and the case where a solid matter was generated was evaluated as “x”.

【0045】これらの各処理液を、0.1 %のSiを含む板
厚0.5 mmの電磁鋼板の両面に、焼付け後の絶縁皮膜の付
着量が 0.1〜2g/m2となるようにロールコーターで塗布
した後、熱風炉で最高到達板温度が270 ℃となるように
30秒間加熱して塗膜を焼付け、絶縁皮膜を形成した。得
られた絶縁皮膜付き電磁鋼板の耐水性と密着性を次に述
べるように評価した。結果を、処理液組成と一緒に表1
に示す。
Each of these treatment liquids is applied to both sides of a 0.5 mm-thick electromagnetic steel sheet containing 0.1% Si by a roll coater so that the amount of the applied insulating film after baking is 0.1 to 2 g / m 2. After that, use a hot blast stove to raise the maximum plate temperature to 270 ° C.
The coating film was baked by heating for 30 seconds to form an insulating film. The water resistance and adhesion of the obtained magnetic steel sheet with an insulating film were evaluated as described below. Table 1 shows the results together with the composition of the processing solution.
Shown in

【0046】耐水性 50℃、98%RHの湿潤試験機内に、絶縁皮膜付き電磁鋼板
の試験片を吊るし、72時間後の皮膜表面の状態を、触手
によるべたつきの有無と、色差測定による白化の程度に
より調査した。評価は下記の4段階にて行い○、◎を合
格とした。皮膜の白化については、ミノルタ製全反射型
色差測定器CR-300を使用し、JIS-Z8730で規定されるL
値 (白さを表す数値) を試験前後に測定し、そのL値の
変化 (ΔL) の大きさで白化を判断した。
A test piece of an electromagnetic steel sheet with an insulating film was hung in a wet tester having a water resistance of 50 ° C. and 98% RH, and the state of the film surface after 72 hours was checked for stickiness by a tentacle and for whitening by color difference measurement. Investigated according to degree. The evaluation was performed in the following four stages, and ○ and ◎ were evaluated as acceptable. For whitening of the film, use Minolta's total reflection type color difference meter CR-300 and specify the L specified in JIS-Z8730.
The value (numerical value representing whiteness) was measured before and after the test, and whitening was judged based on the magnitude of the change (ΔL) in the L value.

【0047】 ◎:べたつきなし、白化なし (ΔL≦2) 、 ○:べたつきなし、白化やや有り (ΔL≦5) 、 △:べたつき有り、白化有り (ΔL≦10) 、 ×:べたつき有り、白化顕著 (ΔL≦20) 。◎: no stickiness, no whitening (ΔL ≦ 2), :: no stickiness, slight whitening (ΔL ≦ 5), Δ: sticky, whitening (ΔL ≦ 10), ×: sticky, significant whitening (ΔL ≦ 20).

【0048】絶縁皮膜の密着性 長さ50 mm 、幅25 mm の絶縁皮膜付き電磁鋼板の試験片
を、直径5mmの鉄棒に巻き付け、巻き付けた外側の部分
についてテープ剥離試験を行って、鋼板に残存した絶縁
皮膜の状況を調査した。下記の4段階で評価を行い、
◎、○を合格とした。
Adhesion of Insulating Film A test piece of an electromagnetic steel sheet with an insulating film having a length of 50 mm and a width of 25 mm was wound around a 5 mm-diameter iron rod, and a tape peeling test was carried out on the wound outer portion to remain on the steel sheet. The state of the insulating film thus obtained was investigated. The following four stages are used for evaluation.
◎ and ○ were accepted.

【0049】 ◎:皮膜剥離なし、 ○:皮膜剥離発生 (面積率で5%以下) 、 △:皮膜剥離発生 (面積率で5%超、30%以下) 、 ×:皮膜剥離発生 (面積率で30%超) 。◎: No film peeling, :: Film peeling occurred (5% or less in area ratio), Δ: Film peeling occurred (more than 5% in area ratio, 30% or less), ×: Film peeling occurred (in area ratio) Over 30%).

【0050】[0050]

【表1】 表1からわかるように、キレート剤を添加せず、第一リ
ン酸アルミニウムのみの絶縁皮膜では、耐水性が劣り、
その傾向は付着量が小さくなるほど強まり、密着性まで
悪くなる。それに対し、本発明に従ってキレート剤を配
合した処理液を使用すると、耐水性や密着性が著しく改
善され、 0.1〜0.2 g/m2という非常な薄膜の絶縁皮膜で
も、耐水性と密着性が十分に良好となる。ただし、キレ
ート剤の添加量が少なすぎると、この改善が得られず、
キレート剤の添加量が多すぎると、処理液の安定性が損
なわれる。
[Table 1] As can be seen from Table 1, an insulating film containing only aluminum monophosphate without adding a chelating agent has poor water resistance,
The tendency becomes stronger as the amount of adhesion becomes smaller, and the adhesion becomes worse. In contrast, when using a treatment liquid by blending a chelating agent according to the present invention, water resistance and adhesion is significantly improved, even with an insulating film of a very thin film of 0.1 to 0.2 g / m 2, sufficiently adhesion and water resistance To be good. However, if the amount of the chelating agent is too small, this improvement cannot be obtained,
If the added amount of the chelating agent is too large, the stability of the treatment liquid will be impaired.

【0051】作製した絶縁皮膜付き電磁鋼板について、
750 ℃で2時間の歪取焼鈍を施した後の皮膜性能を密着
性および層間抵抗に関して調査した。表1の試験No. の
試料のうち、1〜3および5〜8の試料は、焼鈍後に長
さ50 mm 、直径20 mm の丸棒に巻付け、巻き付けた皮膜
の外側をテープ剥離すると、皮膜剥離が見られた。6〜
16の試料は密着性良好であった。一方、4の試料は皮膜
ムラがあり、歪取焼鈍後の層間抵抗が0.5 Ωcm2/枚以下
であった。他の試料は3〜100 Ωcm2/枚の層間抵抗を示
し、焼鈍後としては十分な絶縁性を示した。
Regarding the manufactured electromagnetic steel sheet with an insulating film,
The film performance after the strain relief annealing at 750 ° C. for 2 hours was examined with respect to adhesion and interlayer resistance. Of the test No. samples in Table 1, samples 1 to 3 and 5 to 8 were wrapped around a round bar having a length of 50 mm and a diameter of 20 mm after annealing. Peeling was observed. 6 ~
16 samples had good adhesion. On the other hand, the sample No. 4 had film unevenness, and the interlayer resistance after strain relief annealing was 0.5 Ωcm 2 / sheet or less. Other samples showed an interlayer resistance of 3 to 100 Ωcm 2 / sheet, and showed sufficient insulation after annealing.

【0052】(実施例2)濃度30%の第一リン酸アルミニ
ウム (Al/P比= 0.9/3) または濃度30%の第一リン
酸マグネシウム (Mg/P比=0.85/2) の水溶液に、キ
レート剤として1−ヒドロキシエチリデン−1,1 −ジホ
スホン酸 (k1) 、アミノトリメチレンホスホン酸 (k
2) および/またはグリコール酸を (k3) を、ΣOi
/ΣMiの値が1になる割合で添加して溶解させた。こ
の多価金属リン酸塩/キレート剤水溶液に、ガラス転移
点20℃のアクリルエマルジョンを多価金属リン酸塩100
部に対して20部の量で添加し、場合によりさらに、多価
金属リン酸塩のP換算100部に対して、ホウ酸をB換算
で20部またはコロイダルシリカをSi換算で10部添加し、
十分に攪拌して、処理液を作製した。
Example 2 An aqueous solution of 30% concentration of aluminum monophosphate (Al / P ratio = 0.9 / 3) or 30% concentration of magnesium monophosphate (Mg / P ratio = 0.85 / 2) was prepared. 1-hydroxyethylidene-1,1-diphosphonic acid (k1), aminotrimethylene phosphonic acid (k
2) and / or glycolic acid as (k3) with {Oi
/ ΣMi was added and dissolved at a rate of 1 value. To this polyvalent metal phosphate / chelating agent aqueous solution, an acrylic emulsion having a glass transition point of 20 ° C. was added to a polyvalent metal phosphate 100
20 parts by weight per part by weight, and optionally, 20 parts by weight of boric acid or 10 parts by weight of colloidal silica in terms of Si with respect to 100 parts in terms of P of the polyvalent metal phosphate. ,
The mixture was sufficiently stirred to prepare a treatment liquid.

【0053】この処理液を用いて、焼付け温度 (最高到
達板温度) を変更した以外は実施例1と同様にして、電
磁鋼板の両面に絶縁皮膜を形成し、耐水性と密着性を評
価した。試験結果を、処理液組成および焼付け温度 (加
熱時間は30秒) 一緒に表2にまとめて示す。
Using this treatment liquid, insulating films were formed on both sides of the magnetic steel sheet, and the water resistance and adhesion were evaluated in the same manner as in Example 1 except that the baking temperature (maximum reached plate temperature) was changed. . The test results are shown in Table 2 together with the composition of the processing solution and the baking temperature (heating time is 30 seconds).

【0054】[0054]

【表2】 表2からわかるように、合成樹脂を添加した打抜き性の
よい半有機型の絶縁皮膜の場合でも薄膜の絶縁皮膜で耐
水性と密着性に優れた絶縁皮膜を形成することができ
た。また、多価金属リン酸塩やキレート剤の種類を変更
したり、焼付け温度を変化させたり、あるいはホウ酸も
しくはコロイダルシリカといった添加剤を添加しても、
耐水性および密着性への著しい影響は見られず、いずれ
も良好な結果であった。
[Table 2] As can be seen from Table 2, even in the case of a semi-organic insulating film to which a synthetic resin was added and which had good punching properties, an insulating film having excellent water resistance and adhesion could be formed with a thin insulating film. Also, changing the type of polyvalent metal phosphate or chelating agent, changing the baking temperature, or adding an additive such as boric acid or colloidal silica,
No remarkable influence on water resistance and adhesion was observed, and both were good results.

【0055】[0055]

【発明の効果】本発明の電磁鋼板の絶縁皮膜形成用処理
液は、クロム等の有害物を含んでおらず、成膜性に優れ
ているので、電磁鋼板の従来の重クロム酸塩と同レベル
の焼付け温度で、かつ付着量が1.0 g/m2以下、特に0.5
g/m2以下といった薄膜でも、耐水性と密着性に優れた絶
縁皮膜を形成することができる。この絶縁皮膜は、付着
量が0.1 g/m2以上であれば、実用上十分な層間抵抗 (JI
S-C2550 に準拠した測定で5〜10Ω・cm2/枚以上) を有
する。
The treatment liquid for forming an insulating film of an electrical steel sheet according to the present invention does not contain harmful substances such as chromium and has excellent film-forming properties. at the level of the baking temperature and the amount of deposition is 1.0 g / m 2 or less, particularly 0.5
Even with a thin film having a thickness of g / m 2 or less, an insulating film having excellent water resistance and adhesion can be formed. As long as the coating weight is 0.1 g / m 2 or more, this insulating film has a practically sufficient interlayer resistance (JI
5 to 10Ω · cm 2 / sheet or more as measured according to S-C2550).

【0056】従って、本発明により、環境や人員への悪
影響を懸念せずに、耐水性、絶縁性、密着性等の必要な
諸性能を備えた絶縁皮膜を、用途に応じて厚膜から薄膜
までの付着量で、比較的安価に電磁鋼板の表面に形成す
ることができる。この絶縁皮膜は、従来の多価金属リン
酸塩系皮膜には見られない、優れた薄膜性能 (薄膜での
成膜性、密着性、耐水性) を有する。本発明の処理液を
用いて製造した絶縁皮膜付き電磁鋼板は、モーター用途
をはじめ、広範囲の用途に利用可能である。
Therefore, according to the present invention, an insulating film having necessary performances such as water resistance, insulation, adhesion, etc. can be changed from a thick film to a thin film depending on the application without fear of adverse effects on the environment and personnel. It can be formed on the surface of the electromagnetic steel sheet relatively inexpensively with the adhesion amount up to. This insulating film has excellent thin film performance (film forming property in thin film, adhesion, and water resistance) not found in the conventional polyvalent metal phosphate-based film. The electrical steel sheet with an insulating film manufactured using the treatment liquid of the present invention can be used for a wide range of uses including motor applications.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C23C 22/20 C23C 22/20 22/22 22/22 Fターム(参考) 4D075 BB28Z BB93Z CA23 DA06 DB03 EA02 EA06 EC01 EC03 EC54 4K026 AA03 BA03 BB05 BB10 CA16 CA18 CA24 CA38 CA39 CA41 DA02 DA15 EB11 4K033 TA03 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) C23C 22/20 C23C 22/20 22/22 22/22 F term (Reference) 4D075 BB28Z BB93Z CA23 DA06 DB03 EA02 EA06 EC01 EC03 EC54 4K026 AA03 BA03 BB05 BB10 CA16 CA18 CA24 CA38 CA39 CA41 DA02 DA15 EB11 4K033 TA03

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】 水性溶媒中に水溶性の多価金属リン酸塩
(A) と酸基を有するキレート剤(B) とが溶解している処
理液からなり、多価金属リン酸塩(A) に含まれる金属原
子のモル数とその価数の積の総和をΣMiとし、キレー
ト剤(B) のモル数と分子中の酸基数の積の総和をΣOi
とするとき、(A) と(B) の割合が下記の式(1) を満たす
ことを特徴とする、電磁鋼板の絶縁皮膜形成用処理液。 0.1 ≦ΣOi/ΣMi≦5 ‥‥ (1)
1. A polyvalent metal phosphate which is water-soluble in an aqueous solvent.
(A) and a treatment solution in which a chelating agent (B) having an acid group is dissolved, and the sum of the product of the number of moles of metal atoms contained in the polyvalent metal phosphate (A) and its valence is calculated asと し Mi and the sum of the product of the number of moles of the chelating agent (B) and the number of acid groups in the molecule is ΣOi
Wherein the proportion of (A) and (B) satisfies the following equation (1): a treatment liquid for forming an insulating film on an electromagnetic steel sheet. 0.1 ≦ ΣOi / ΣMi ≦ 5 ‥‥ (1)
【請求項2】 多価金属リン酸塩(A) が第一リン酸アル
ミニウムおよび/または第一リン酸マグネシウムであ
る、請求項1記載の処理液。
2. The treatment liquid according to claim 1, wherein the polyvalent metal phosphate (A) is aluminum monophosphate and / or magnesium monophosphate.
【請求項3】 キレート剤(B) の少なくとも一部がホス
ホン酸化合物である、請求項1または2記載の処理液。
3. The treatment liquid according to claim 1, wherein at least a part of the chelating agent (B) is a phosphonic acid compound.
【請求項4】 多価金属燐酸塩(A) の濃度が1〜50質量
%の範囲内である、請求項1ないし3のいずれかに記載
の処理液。
4. The treatment liquid according to claim 1, wherein the concentration of the polyvalent metal phosphate (A) is in the range of 1 to 50% by mass.
【請求項5】 さらに合成樹脂を含有する、請求項1な
いし4のいずれかに記載の処理液。
5. The treatment liquid according to claim 1, further comprising a synthetic resin.
【請求項6】 さらにホウ酸および/またはコロイダル
シリカを含有する、請求項1ないし5のいずれかに記載
の処理液。
6. The processing solution according to claim 1, further comprising boric acid and / or colloidal silica.
【請求項7】 請求項1ないし6のいずれかに記載の処
理液を電磁鋼板の少なくとも片面に塗布した後、加熱し
て塗膜を焼付け、電磁鋼板の表面に絶縁皮膜を形成する
ことからなる、電磁鋼板の処理方法。
7. A method comprising applying the treatment liquid according to claim 1 to at least one surface of an electromagnetic steel sheet, and then heating and baking the coating film to form an insulating film on the surface of the electromagnetic steel sheet. , Electrical steel sheet processing method.
【請求項8】 形成された絶縁皮膜の付着量が、片面当
たり1.0 g/m2以下である、請求項7記載の方法。
8. The method according to claim 7, wherein the coating weight of the formed insulating film is 1.0 g / m 2 or less per one side.
【請求項9】 塗膜の焼付け温度 (最高到達板温度) が
200〜330 ℃の範囲内である、請求項7または8記載の
方法。
9. The baking temperature (maximum attained plate temperature) of the coating film is
The method according to claim 7 or 8, wherein the temperature is in the range of 200-330 ° C.
JP2000232866A 2000-08-01 2000-08-01 Treatment liquid for insulating film formation of electrical steel sheet and method Expired - Lifetime JP3935664B2 (en)

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