JP2002016046A5 - - Google Patents

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Publication number
JP2002016046A5
JP2002016046A5 JP2000195201A JP2000195201A JP2002016046A5 JP 2002016046 A5 JP2002016046 A5 JP 2002016046A5 JP 2000195201 A JP2000195201 A JP 2000195201A JP 2000195201 A JP2000195201 A JP 2000195201A JP 2002016046 A5 JP2002016046 A5 JP 2002016046A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2000195201A
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Japanese (ja)
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JP2002016046A (ja
JP4514291B2 (ja
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Priority to JP2000195201A priority Critical patent/JP4514291B2/ja
Priority claimed from JP2000195201A external-priority patent/JP4514291B2/ja
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Publication of JP2002016046A5 publication Critical patent/JP2002016046A5/ja
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Publication of JP4514291B2 publication Critical patent/JP4514291B2/ja
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Expired - Fee Related legal-status Critical Current

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JP2000195201A 2000-06-28 2000-06-28 マイクロ波プラズマ処理装置及びプラズマ処理方法 Expired - Fee Related JP4514291B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000195201A JP4514291B2 (ja) 2000-06-28 2000-06-28 マイクロ波プラズマ処理装置及びプラズマ処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000195201A JP4514291B2 (ja) 2000-06-28 2000-06-28 マイクロ波プラズマ処理装置及びプラズマ処理方法

Publications (3)

Publication Number Publication Date
JP2002016046A JP2002016046A (ja) 2002-01-18
JP2002016046A5 true JP2002016046A5 (enrdf_load_stackoverflow) 2007-08-23
JP4514291B2 JP4514291B2 (ja) 2010-07-28

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ID=18693895

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000195201A Expired - Fee Related JP4514291B2 (ja) 2000-06-28 2000-06-28 マイクロ波プラズマ処理装置及びプラズマ処理方法

Country Status (1)

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JP (1) JP4514291B2 (enrdf_load_stackoverflow)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2925535B2 (ja) * 1997-05-22 1999-07-28 キヤノン株式会社 環状導波路を有するマイクロ波供給器及びそれを備えたプラズマ処理装置及び処理方法
JP3979453B2 (ja) * 1998-01-14 2007-09-19 東京エレクトロン株式会社 マイクロ波プラズマ処理装置
JP4004154B2 (ja) * 1998-10-20 2007-11-07 東京エレクトロン株式会社 プラズマ処理装置
JP2000173797A (ja) * 1998-12-01 2000-06-23 Sumitomo Metal Ind Ltd マイクロ波プラズマ処理装置

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