JP2002006098A - Method and device for electron beam irradiation - Google Patents

Method and device for electron beam irradiation

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Publication number
JP2002006098A
JP2002006098A JP2000191797A JP2000191797A JP2002006098A JP 2002006098 A JP2002006098 A JP 2002006098A JP 2000191797 A JP2000191797 A JP 2000191797A JP 2000191797 A JP2000191797 A JP 2000191797A JP 2002006098 A JP2002006098 A JP 2002006098A
Authority
JP
Japan
Prior art keywords
electron beam
irradiated
beam irradiation
irradiation
transporting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2000191797A
Other languages
Japanese (ja)
Inventor
Takashi Yamakawa
隆 山川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP2000191797A priority Critical patent/JP2002006098A/en
Publication of JP2002006098A publication Critical patent/JP2002006098A/en
Withdrawn legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a high productive electron beam irradiation method and its device where electron beam is efficiently projected to an object to exclude wasting of electron beam and electric power. SOLUTION: An electron beam irradiation device 30 is provided where a solid object 11 is transported in a specified direction while irradiated with electron beam for sterilization and the like. Here, there are provided a roller conveyor 12 for transporting the objects 11 with appropriate interval, an irradiation conveyor 14 which is slower than the roller conveyor 12, positioned on its lower stream side, and transports the object in tight-contact manner, a skew conveyor 13 which, positioned between the two conveyors, comprises a putting- aside means for putting the objects 11 aside in a specified direction, and a stopper 17 which is at least provided on an outlet side of the roller conveyor 12 and temporarily stops the object 11. An electron beam accelerator 10 for projecting electron beam 20 is so provided as to face the irradiation conveyor 14.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、例えば医療機器等
のように立体形状をもつ被照射物を搬送しながら、該被
照射物に高エネルギ電子線を照射して殺菌等の初期の目
的を達成する電子線照射方法及びその装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an initial object such as sterilization by irradiating a high-energy electron beam to an irradiated object while conveying the object having a three-dimensional shape such as a medical device. The present invention relates to a method and an apparatus for irradiating an electron beam.

【0002】[0002]

【従来の技術】従来より、医療機器や飲料水容器等の滅
菌処理には、高圧蒸気滅菌法、エチレンオキシドガス滅
菌法、γ線滅菌法、及び電子線照射滅菌法等が用いられ
ている。その中でも電子線照射滅菌法は、電子線の加速
電圧を大きくすることで、医療機器等の滅菌を可能とす
るもので、被照射物の耐熱性や残留毒性の心配がなく、
更に滅菌処理時間が極めて短時間で処理が可能であると
ともに、電源を切れば、瞬時に照射を停止し、環境上の
安全性が高く、コスト面からも安価である等の有利性を
有す。更に、γ線照射との違いは、材料劣化が小さいと
言われていることである。このため、材料選択の範囲が
広がる可能性がある。このように、ある程度以上の肉厚
を有し、特に前記したような医療機器等を滅菌する際に
は十分な量の電子線の照射が必要となるため、一般に使
用される浸透性の低い低エネルギ電子線では不十分であ
り、産業応用として許されている上限に近い電子線エネ
ルギをもつ5〜10MeVの電子線が多く利用されてい
る。
2. Description of the Related Art Conventionally, high-pressure steam sterilization, ethylene oxide gas sterilization, γ-ray sterilization, electron beam irradiation sterilization, and the like have been used for sterilization of medical equipment and drinking water containers. Among them, the electron beam irradiation sterilization method enables sterilization of medical equipment and the like by increasing the acceleration voltage of the electron beam, and there is no concern about heat resistance and residual toxicity of the irradiated object,
Furthermore, sterilization can be performed in a very short time, and irradiation is stopped instantly when the power is turned off. This has the advantages of high environmental safety and low cost. . Further, the difference from γ-ray irradiation is that it is said that material deterioration is small. For this reason, there is a possibility that the range of material selection may be expanded. As described above, it has a certain thickness or more, and in particular, when sterilizing a medical device as described above, it is necessary to irradiate a sufficient amount of an electron beam. Energy electron beams are not sufficient, and electron beams of 5 to 10 MeV having electron beam energies close to the upper limit allowed for industrial applications are often used.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、このよ
うな高エネルギの電子線は電力の消費が比較的大きく、
電子線も高価であるため、電力の無駄を排除し電子線を
最大限に利用することが重大な課題となっている。図1
(b)に示す従来の搬送方法にみるように、搬送手段で
ある照射コンベア14は所定速度で運転されているた
め、被照射物11は一定間隔をあけて該コンベア14上
に載置、移送される。このため、被照射物11間の空間
に電子線20を照射することとなり、上記したように、
電子線や電力が無駄に消費されることとなる。また、被
照射物11が電子線照射域にないときには電子線の照射
を停止する方法も考えられるが、電子線加速器の運転が
煩雑化して好ましくない。
However, such a high energy electron beam consumes relatively large power,
Since an electron beam is also expensive, it is an important task to eliminate the waste of electric power and maximize the use of the electron beam. Figure 1
As shown in the conventional transfer method shown in (b), since the irradiation conveyor 14 as the transfer means is operated at a predetermined speed, the irradiated objects 11 are placed and transferred on the conveyor 14 at regular intervals. Is done. For this reason, the space between the irradiation objects 11 is irradiated with the electron beam 20, and as described above,
Electron beams and power are wasted. A method of stopping the irradiation of the electron beam when the irradiation target 11 is not in the electron beam irradiation area is also considered, but the operation of the electron beam accelerator becomes complicated, which is not preferable.

【0004】また、図3(b)に示すように、従来技術
では、前記被照射物11は、照射コンベア14の両側に
具備された落下防止機能を有する固定式ガイドレール1
6間を搬送される際に幅方向位置は不確定であり、電子
線照射幅Aを被照射物幅Aより大幅に広くせざるを得
ず、ここでも電子線の無駄な照射が問題となる。また、
電子線照射幅Aを大きくすることで電子線加速器の振
幅も大となり、これにより電子線の密度が低くなるた
め、単位時間あたりの処理量が少なくなり、生産性が低
下する。そこで本発明は、上述した問題を解決し、電子
線を効率良く被照射物に照射することにより電子線及び
電力の無駄を排除するとともに、処理効率が良く生産性
の高い電子線照射方法及びその装置を提供することを目
的とする。
As shown in FIG. 3B, in the prior art, the irradiation target 11 is a fixed guide rail 1 provided on both sides of an irradiation conveyor 14 and having a fall prevention function.
Widthwise position between 6 when being conveyed is indeterminate, and it is inevitable to significantly wider than the electron beam irradiation width A 2 of the irradiated object width A, again useless irradiation of the electron beam is a problem Become. Also,
Amplitude large next to the electron beam accelerator by increasing the electron beam irradiation width A 2, which the density of the electron beam is lowered, the processing amount per unit time is reduced, productivity is lowered. Therefore, the present invention solves the above-mentioned problem, eliminates waste of electron beams and power by efficiently irradiating an electron beam to an object to be irradiated, and has an electron beam irradiation method with high processing efficiency and high productivity, and its method. It is intended to provide a device.

【0005】[0005]

【課題を解決するための手段】本発明はかかる課題を解
決するために、請求項1記載の発明として、立体被照射
物を所定方向に搬送させながら電子線を照射して殺菌等
の所期の目的を達成する電子線照射装置において、前記
被照射物を適宜間隔で搬送する第1の搬送工程と、その
下流側に位置し該被照射物を密着搬送する第2の搬送工
程とを有し、前記第2の搬送工程で被照射物に電子線を
照射することを特徴とする。
In order to solve the above-mentioned problems, the present invention is directed to the invention as defined in claim 1, wherein an object is irradiated with an electron beam while conveying a three-dimensional object to be irradiated in a predetermined direction, such as sterilization. The electron beam irradiation apparatus that achieves the above object has a first transporting step of transporting the object to be irradiated at appropriate intervals, and a second transporting step that is located downstream thereof and closely transports the object to be irradiated. Then, the object to be irradiated is irradiated with an electron beam in the second transporting step.

【0006】前記したように、被照射物は、搬送系の影
響により適宜間隔でコンベア上に載置されて電子線照射
処理を行う滅菌室へと搬入される。かかる発明は、該被
照射物を密着させた状態で搬送する第2の搬送工程を設
けることにより、電子線の無駄な照射を排除することを
目的とするものである。これは、図1(a)に示される
ように、前記第2の搬送工程である照射コンベア14上
を密着搬送されてくる被照射物11に電子線20を照射
するため、該被照射物を連続して効率良く処理でき、電
子線の無駄な照射が排除できる。これら2つの搬送工程
を設けることで被照射物を連続して効率良く滅菌するこ
とができるとともに、電子線及び電力の無駄な照射を大
幅に低減できる。
As described above, the objects to be irradiated are placed on a conveyor at appropriate intervals due to the influence of the transport system, and are carried into a sterilization chamber for performing an electron beam irradiation process. An object of the present invention is to eliminate a useless irradiation of an electron beam by providing a second transporting step of transporting the irradiated object in a state of being brought into close contact therewith. This is because, as shown in FIG. 1A, the object to be irradiated 11 which is closely transported on the irradiation conveyor 14 in the second transporting step is irradiated with the electron beam 20, so that the object to be irradiated is Processing can be continuously and efficiently performed, and unnecessary irradiation of electron beams can be eliminated. By providing these two transporting steps, the object to be irradiated can be sterilized continuously and efficiently, and unnecessary irradiation of electron beams and electric power can be significantly reduced.

【0007】また、請求項2記載の発明は、前記第1の
搬送工程の速度を大とし、前記第2の搬送工程の速度を
小とするとともに、該第1の搬送工程の少なくとも出口
側に一時的に被照射物を停止させる停止手段が存在する
ことを特徴とする。かかる発明は、前記被照射物を密着
する方法の一つで、前記第1の搬送工程の速度を前記第
2の搬送工程より大に設定することにより、該第2の搬
送工程で被照射物の間隔が狭まり、さらに、該第1の搬
送工程の少なくとも出口側に圧縮空気により作動するス
トッパ等の停止手段を具え、所定時間毎に該ストッパを
解除して被照射物の間隔を制御することにより、該被照
射物を密着させるものである。このように、夫々の搬送
速度の差と停止手段とを制御することで、前記第2の工
程で被照射物は密着された状態で電子線照射を施される
ため、上記したような電子線の無駄な照射を排除でき
る。また、このように夫々の搬送速度を設定することに
より、前記第1の搬送工程の速度を上げることができ、
生産性が向上する。
According to a second aspect of the present invention, the speed of the first transporting step is increased, the speed of the second transporting step is reduced, and at least the outlet side of the first transporting step is provided. There is a stopping means for temporarily stopping the irradiation object. This invention is one of the methods for bringing the irradiated object into close contact with each other, wherein the speed of the first transporting step is set to be higher than that of the second transporting step, so that the irradiated object can be irradiated in the second transporting step. And a stopping means such as a stopper operated by compressed air is provided at least on the outlet side of the first transporting step, and the stopper is released every predetermined time to control the distance between the irradiation objects. The object is brought into close contact with the object. As described above, by controlling the difference between the respective transport speeds and the stopping means, the object to be irradiated is subjected to the electron beam irradiation in the second step in a state of being in close contact with the object. Useless irradiation can be eliminated. Further, by setting the respective transport speeds in this manner, the speed of the first transport step can be increased,
Productivity is improved.

【0008】また、請求項3記載の発明は、前記第1の
搬送工程と第2の搬送工程との間に、被照射物を所定方
向に片寄せ整列させる片寄せ手段を有する第3の搬送工
程が存在することを特徴とする。前記被照射物に電子線
を照射する際に、電子線照射幅を該被照射物幅より余分
にとらなければならないことは上記したとおりである。
かかる発明は、電子線照射領域の上流側に第3の搬送工
程を設け、該第3の搬送工程において搬送コンベアの両
側面に位置するガイドレールのどちらか一方の側へ片寄
せすることで、電子線照射幅を小さくできるため電子線
の密度が大きくなり効率のよい照射が可能となるととも
に、電子線の無駄な照射も排除できる。
According to a third aspect of the present invention, there is provided a third conveying apparatus having a biasing means for biasing and aligning an irradiation object in a predetermined direction between the first transporting step and the second transporting step. The method is characterized in that a process exists. As described above, when irradiating the irradiation object with the electron beam, the irradiation width of the electron beam must be larger than the irradiation object width.
According to the invention, a third transporting step is provided on the upstream side of the electron beam irradiation area, and the third transporting step is biased toward one of the guide rails located on both side surfaces of the transporting conveyor, Since the electron beam irradiation width can be reduced, the electron beam density is increased and efficient irradiation is possible, and unnecessary irradiation of the electron beam can be eliminated.

【0009】さらに、上記した方法を効果的に実施する
装置として、請求項4記載の発明は、立体被照射物を所
定方向に搬送させながら電子線を照射して殺菌等の所期
の目的を達成する電子線照射装置において、前記被照射
物を適宜間隔で搬送する第1の搬送手段と、該第1の搬
送手段より低速でその下流側に位置し該被照射物を密着
搬送する第2の搬送手段と、該2つの搬送手段の間に位
置し被照射物を所定方向に片寄せ整列させる片寄せ手段
を具えた第3の搬送手段と、前記第1の搬送手段の少な
くとも出口側に設けられ被照射物を一時的に停止させる
ストッパ手段と、を具えるとともに、電子線を照射する
電子線加速器を第2の搬送手段に対面させて配設したこ
とを特徴とする。
Further, as an apparatus for effectively carrying out the above-mentioned method, the invention according to claim 4 aims at an intended object such as sterilization by irradiating an electron beam while transporting a three-dimensional object in a predetermined direction. In the electron beam irradiation apparatus to be achieved, a first conveying means for conveying the object to be irradiated at appropriate intervals, and a second means for closely conveying the object to be irradiated, which is located downstream of the first conveying means at a lower speed than the first conveying means. Transport means, a third transport means provided between the two transport means and a biasing means for biasing and aligning the irradiation target in a predetermined direction, and at least an outlet side of the first transport means And a stopper means for temporarily stopping the object to be irradiated, and an electron beam accelerator for irradiating the electron beam is provided facing the second transport means.

【0010】また、請求項5記載の発明は、前記第2の
搬送手段で被照射物が密着搬送されるように、前記搬送
手段の夫々の速度とストッパ手段による被照射物の切り
出し間隔とを制御する制御手段を設けたことを特徴とす
る。上記構成により、第1の搬送手段に空間部を保って
載置された被照射物は、該第1の搬送手段の少なくとも
出口側に位置するストッパ手段により停止され、所定時
間毎に解除される該ストッパにより1又は複数個密着若
しくは密に配列された状態で切り出される。さらに、そ
の後段に位置するスキューコンベア等の片寄せ機能を有
する第2の搬送手段上にて所定方向に片寄せ整列された
後、速度が第1の搬送手段より小に設定された第3の搬
送手段で密着状態となり、該第3の搬送手段の途中に具
えられた電子線加速器により電子線を照射される。この
とき、前記被照射物は、電子線照射領域下を密着状態
で、かつ所定方向に片寄せされた状態で通過するため該
被照射物間の空間部に電子線を照射してしまうという無
駄が省け、さらに電子線加速器の振り幅を小さくできる
ため高密度で電子線照射を行うことが出来、高効率で以
って滅菌処理を行うことが可能となる。
According to a fifth aspect of the present invention, the speed of each of the transporting means and the interval of cutting out the illuminated object by the stopper means are set so that the illuminated object is closely transported by the second transporting means. It is characterized in that control means for controlling is provided. According to the above configuration, the irradiation target placed with the space maintained in the first transport unit is stopped by the stopper unit located at least on the exit side of the first transport unit, and is released at predetermined time intervals. One or more pieces are cut out by the stopper in a state of being closely or densely arranged. Further, after being aligned in a predetermined direction on a second transporting means having a biasing function such as a skew conveyor positioned at a subsequent stage, the third transporting speed is set to be smaller than that of the first transporting means. The carrier is brought into close contact with the carrier, and is irradiated with an electron beam by an electron beam accelerator provided in the middle of the third carrier. At this time, the irradiation object passes under the electron beam irradiation area in a close contact state and is biased in a predetermined direction, so that the space between the irradiation objects is irradiated with the electron beam. However, since the swing width of the electron beam accelerator can be reduced, electron beam irradiation can be performed at a high density, and sterilization can be performed with high efficiency.

【0011】さらに、請求項6記載の発明は、前記第3
の搬送手段の始端付近に所定の直線距離をもたせるよう
に構成したことを特徴とする。前記第2の搬送手段は、
ローラコンベアのローラ部を搬送方向に所定角度傾けて
移載物を所定方向に片寄せさせながら搬送するスキュー
コンベア等を用いるが、このとき、被照射物が完全に片
寄せされる前に曲行部分を通過すると配列が乱れる惧れ
があるため、第2の搬送手段に該被照射物が完全に片寄
せされる程度の直線距離を設ける必要がある。
[0011] Further, the invention according to claim 6 is the third invention.
The present invention is characterized in that a predetermined linear distance is provided near the starting end of the conveying means. The second transport means,
A skew conveyor or the like that transports the transferred object while shifting the roller portion of the roller conveyor at a predetermined angle in the transfer direction while shifting the transferred object in the predetermined direction is used. Since the arrangement may be disturbed when passing through the portion, it is necessary to provide the second conveying means with a linear distance such that the irradiated object is completely offset.

【0012】また、請求項7記載の発明は、前記ストッ
パ手段と電子線照射領域との間に遮蔽壁を設け、該電子
線照射領域から発生するX線が該ストッパ手段に直接あ
たらないように構成したことを特徴とする。かかる発明
のように、主として高エネルギ電子線を用いる場合、該
電子線が物質を通過する際、原子核のクーロン場でX線
を放出する制動放射現象がおこる。これにより、前記ス
トッパを構成する材料の劣化が起こり易く、このよう
な、ストッパの寿命の著しい低下を防ぐために、請求項
7記載のように構成することで、ストッパの劣化を低減
し、寿命の向上を図ることができる。
Further, according to the present invention, a shielding wall is provided between the stopper means and the electron beam irradiation area so that X-rays generated from the electron beam irradiation area do not directly hit the stopper means. It is characterized by comprising. When a high-energy electron beam is mainly used as in this invention, when the electron beam passes through a substance, a bremsstrahlung phenomenon in which X-rays are emitted in a Coulomb field of a nucleus occurs. Thus, the material constituting the stopper is apt to deteriorate, and in order to prevent such a remarkable reduction in the life of the stopper, by configuring as in claim 7, the deterioration of the stopper is reduced, and the life of the stopper is reduced. Improvement can be achieved.

【0013】また、前記ストッパ手段は、所定時間毎に
被照射物を停止可能なものであれば限定されないが、前
記制動X線により滅菌室内の部分が、ある程度の熱をお
びる場合があるため、特に、該ストッパ手段には油圧式
ストッパなどを用いず、請求項8記載の発明のように、
圧縮空気により作動する空圧式ストッパを用いるのが好
ましい。
The stopper means is not limited as long as it can stop the object to be irradiated at predetermined time intervals. However, since a part of the sterilization chamber may receive a certain amount of heat due to the braking X-ray, In particular, a hydraulic stopper or the like is not used for the stopper means.
It is preferable to use a pneumatic stopper that is operated by compressed air.

【0014】[0014]

【発明の実施の形態】以下、図面を参照して本発明の好
適な実施例を例示的に詳しく説明する。但しこの実施例
に記載されている構成部品の寸法、材質、形状、その相
対的配置等は特に特定的な記載がない限りは、この発明
の範囲をそれに限定する趣旨ではなく、単なる説明例に
過ぎない。図2は本発明にかかる電子線照射装置の密着
搬送を示す側面図、図4は本発明にかかる電子線照射装
置の片寄せ搬送を示す側面図、図5は本実施形態にかか
る電子線照射装置の概略構成図である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be illustratively described in detail below with reference to the drawings. However, the dimensions, materials, shapes, relative arrangements, and the like of the components described in this embodiment are not intended to limit the scope of the invention thereto, unless otherwise specified, and are merely illustrative examples. Not just. FIG. 2 is a side view showing close contact conveyance of the electron beam irradiation apparatus according to the present invention, FIG. 4 is a side view showing one-sided conveyance of the electron beam irradiation apparatus according to the present invention, and FIG. 5 is electron beam irradiation according to the present embodiment. It is a schematic structure figure of an apparatus.

【0015】本発明の実施形態について、図2及び図4
を参照して説明する。図2、図4において、10は高エ
ネルギ電子線を照射する電子線加速器で、11は被照射
物、12はローラコンベア、13はスキューコンベア、
14は照射コンベア、30は10MeVの電子線照射装
置である。図2に示すように、かかる電子線照射装置3
0の搬送系統は、被照射物11を適宜間隔で搬送するロ
ーラコンベア12、該被照射物11を片寄せ整列させな
がら搬送するスキューコンベア、及び電子線照射領域を
含む照射コンベア14とから構成される。前記ローラコ
ンベア12は、照射コンベア14に被照射物11を安定
供給する目的で、該照射コンベア及びスキューコンベア
13より高速に設定される。さらに、該スキューコンベ
ア13を照射コンベア14より高速に設定することで、
後記するストッパにより、完全には密着されていない被
照射物間の空間をさらに狭める。このように、夫々のコ
ンベアの速度制御により、被照射物を電子線照射領域に
て確実に密着させた状態とすることができる。
FIGS. 2 and 4 show an embodiment of the present invention.
This will be described with reference to FIG. 2 and 4, reference numeral 10 denotes an electron beam accelerator for irradiating a high-energy electron beam, 11 denotes an object to be irradiated, 12 denotes a roller conveyor, 13 denotes a skew conveyor,
Reference numeral 14 denotes an irradiation conveyor, and reference numeral 30 denotes a 10 MeV electron beam irradiation device. As shown in FIG. 2, such an electron beam irradiation device 3
The transport system of No. 0 is composed of a roller conveyor 12 for transporting the irradiated objects 11 at appropriate intervals, a skew conveyor for transporting the irradiated objects 11 in a one-sided alignment, and an irradiation conveyor 14 including an electron beam irradiation area. You. The roller conveyor 12 is set at a higher speed than the irradiation conveyor and the skew conveyor 13 in order to stably supply the irradiation object 11 to the irradiation conveyor 14. Furthermore, by setting the skew conveyor 13 at a higher speed than the irradiation conveyor 14,
The space between the irradiation objects that are not completely adhered to each other is further reduced by the stopper described later. In this way, by controlling the speed of each conveyor, the object to be irradiated can be reliably brought into close contact with the electron beam irradiation area.

【0016】前記照射コンベア14に移送された被照射
物11は、電子線加速器10から照射される高エネルギ
電子線の照射により所定時間滅菌処理を施されたのち、
再度後流側に位置するローラコンベア12に搬送され
て、次工程へと送られる。尚、前記電子線加速器10の
直下には、照射コンベア14を挟んでSUS等で形成さ
れる肉厚のビームストップ15が設置されており、被照
射物を透過した電子線若しくは空打ちされた電子線を受
け止めるように構成されている。また、前記照射コンベ
ア14には放熱の問題から冷却水が流れるフレームを採
用したチェーンコンベアを用いるのがよい。
The irradiation object 11 transferred to the irradiation conveyor 14 is subjected to a sterilization treatment for a predetermined time by irradiation of a high energy electron beam irradiated from the electron beam accelerator 10, and
It is again conveyed to the roller conveyor 12 located on the downstream side, and is sent to the next process. A thick beam stop 15 made of SUS or the like is provided immediately below the electron beam accelerator 10 with the irradiation conveyor 14 interposed therebetween. It is configured to receive a line. Further, it is preferable to use a chain conveyor employing a frame through which cooling water flows because of the problem of heat radiation.

【0017】尚、前記スキューコンベア13は、図4に
示すように、ローラコンベア12におけるローラ部の軸
芯13aの一端を進行方向に僅かにずらして固定したも
ので、その上に載置される被照射物11を斜め進行方向
に搬送し、被照射物11と該コンベア両側面に具えられ
た落下防止機能を有するガイドレール16との接触によ
り、図3(a)に示すように該被照射物11は所定方向
に片寄せされ、照射コンベア14に移送される。図3
(a)、(b)の従来技術との比較により明確なよう
に、本実施形態の電子線照射領域Aは従来の電子線照
射領域Aに較べて小さく設定することができ(A
)、電子線照射領域Aの電子線密度が大となるた
め、該被照射物への単位面積当たりの電子線照射時間を
短縮することが可能となり、よって生産性の向上をもた
らすとともに、電子線及び電力の無駄を排除できる。
As shown in FIG. 4, the skew conveyor 13 has one end of the axis 13a of the roller portion of the roller conveyor 12 fixed and slightly shifted in the traveling direction, and is mounted thereon. As shown in FIG. 3A, the object 11 is conveyed in an oblique traveling direction and is brought into contact with the object 11 and guide rails 16 provided on both side surfaces of the conveyor and having a function of preventing falling. The object 11 is shifted in a predetermined direction and transferred to the irradiation conveyor 14. FIG.
(A), as is clear by comparison with the prior art (b), the electron beam irradiation area A 1 of the present embodiment can be set smaller than the conventional electron beam irradiation area A 2 (A 1 <
A 2 ), since the electron beam density in the electron beam irradiation area A 1 is large, it is possible to shorten the electron beam irradiation time per unit area on the irradiation object, thereby improving the productivity. , Waste of electron beam and power can be eliminated.

【0018】次に、本実施形態の電子線照射装置30を
備えた滅菌室25の構成を説明する。図5に示すよう
に、かかる滅菌室25は、電子線照射時に発生するX線
が外部に漏出しないように、周囲をコンクリートなどの
遮蔽壁22で囲繞する。また、該遮蔽壁22に沿って被
照射物11を搬送するコンベアが設けられており、該コ
ンベアは、入口26側から出口27側に向けて、ローラ
コンベア12、スキューコンベア13、照射コンベア1
4、ローラコンベア12の順で配置されている。また、
前記入口側ローラコンベア12の下流側には圧縮空気に
より作動するストッパ17が具えらている。該ストッパ
17は、空気圧ストッパに限らないが、X線による影響
を考慮して圧縮空気により作動するものを採用するのが
好ましい。
Next, the configuration of the sterilization chamber 25 provided with the electron beam irradiation device 30 of the present embodiment will be described. As shown in FIG. 5, the sterilization chamber 25 is surrounded by a shielding wall 22 made of concrete or the like so that X-rays generated during electron beam irradiation do not leak outside. In addition, a conveyor for conveying the irradiation target 11 along the shielding wall 22 is provided. The conveyor includes a roller conveyor 12, a skew conveyor 13, an irradiation conveyor 1 from the entrance 26 side to the exit 27 side.
4. Rollers 12 are arranged in this order. Also,
Downstream of the inlet roller conveyor 12, a stopper 17 operated by compressed air is provided. The stopper 17 is not limited to a pneumatic stopper, but it is preferable to employ a stopper that operates with compressed air in consideration of the influence of X-rays.

【0019】さらに、前記照射コンベア14の所定位置
上方には電子線加速器10が設置され、電子線照射領域
を被照射物11が通過する際に電子線を照射し、滅菌処
理を行なうことができるように構成されている。このと
き、前記電子線加速器10を該照射コンベア14側壁に
配置して、被照射物11側面に電子線を照射するように
構成してもよいし、また、電子線の片面照射のみでは照
射量が不十分な場合には、該電子線加速器10と対面す
る側にもう一基の電子線加速器を設けても良い。本実施
形態における滅菌室25の中央部には、外壁と同様にコ
ンクリートなどで形成される中央遮蔽壁21が存在す
る。かかる中央遮蔽壁21は、前記ストッパ17に電子
線照射領域から発生するX線が直接当たらないように形
成され、該ストッパ17の劣化を防ぐ目的を有する。
Further, an electron beam accelerator 10 is provided above a predetermined position of the irradiation conveyor 14, and can irradiate an electron beam when the object 11 passes through the electron beam irradiation area to perform a sterilization process. It is configured as follows. At this time, the electron beam accelerator 10 may be arranged on the side wall of the irradiation conveyor 14 so as to irradiate the side surface of the irradiation target 11 with the electron beam. If is not enough, another electron beam accelerator may be provided on the side facing the electron beam accelerator 10. In the central part of the sterilization chamber 25 in the present embodiment, there is a central shielding wall 21 made of concrete or the like, like the outer wall. The central shielding wall 21 is formed so that X-rays generated from the electron beam irradiation area do not directly hit the stopper 17 and has a purpose of preventing the stopper 17 from being deteriorated.

【0020】かかる電子線照射装置30において、搬送
系統の流れは以下に示す通りである。まず、滅菌室25
の入口26から、被照射物11がローラコンベア12に
より搬入され、該被照射物はローラコンベア12出口側
に位置するストッパ17により所定時間停止される。該
ストッパ17は所定時間経過した時点で解除され、被照
射物11はスキューコンベア13に移送される。ここ
で、密着状態若しくは被照射物間の間隔をある程度狭め
られて搬送されてくる被照射物11は、スキューの作用
により所定方向に片寄せ整列され、次段の照射コンベア
14に送給される。前記照射コンベア14とスキューコ
ンベア13との速度差により密着状態となった被照射物
11は、該照射コンベア14の途中に設置された電子線
加速器10から照射される高エネルギ電子線で滅菌処理
を施された後、その後段に設けられたローラコンベア1
2により出口側に搬送される。このように、本実施形態
における電子線照射装置は、容易にかつ連続的に電子線
照射処理を行うことができ、電子線及び電力損失が少な
くかつ単位時間当たりの処理効率の高い滅菌処理を行う
ことができる。
In the electron beam irradiation apparatus 30, the flow of the transport system is as follows. First, the sterilization room 25
The irradiation object 11 is carried in by the roller conveyer 12 through the entrance 26 of the roller, and the irradiation object is stopped for a predetermined time by the stopper 17 located on the exit side of the roller conveyer 12. The stopper 17 is released when a predetermined time has elapsed, and the irradiation target 11 is transferred to the skew conveyor 13. Here, the irradiation object 11 which is conveyed in a close contact state or with the distance between the irradiation objects narrowed to some extent is aligned in a predetermined direction by the action of skew, and is fed to the irradiation conveyor 14 of the next stage. . The irradiated object 11 that has been brought into close contact with the irradiation conveyor 14 due to the speed difference between the irradiation conveyor 14 and the skew conveyor 13 is sterilized by a high-energy electron beam emitted from an electron beam accelerator 10 installed in the middle of the irradiation conveyor 14. After being applied, the roller conveyor 1 provided in the subsequent stage
2 to the exit side. As described above, the electron beam irradiation apparatus according to the present embodiment can easily and continuously perform the electron beam irradiation processing, and performs the sterilization processing with low electron beam and power loss and high processing efficiency per unit time. be able to.

【0021】[0021]

【発明の効果】以上記載のごとく本発明によれば、電子
線照射領域を搬送する被照射物を、密着した状態で通過
させることにより、該被照射物間の空間に電子線を照射
するというような電子線及び電力の無駄な消費を削減で
きる。また、前記被照射物を所定方向に片寄せ整列させ
て電子線照射を施すことで、電子線の無駄な照射を排除
するとともに、電子線照射密度が大となり処理時間が短
縮でき、生産性が向上する。さらに、前記電子線照射装
置を備えた滅菌室の中央部にコンクリート等で形成した
遮蔽壁を設け、その陰にストッパを設けることで、X線
などによるストッパの材質劣化を低減することができ
る。
As described above, according to the present invention, an object to be irradiated conveyed in an electron beam irradiation area is passed in a state of being in close contact with the object to irradiate the space between the objects with the electron beam. Such useless consumption of electron beams and power can be reduced. In addition, by performing the electron beam irradiation while aligning the irradiation object in a predetermined direction, unnecessary irradiation of the electron beam is eliminated, the electron beam irradiation density is increased, the processing time can be reduced, and the productivity is reduced. improves. Further, by providing a shielding wall made of concrete or the like at the center of the sterilization chamber provided with the electron beam irradiation device and providing a stopper behind the shielding wall, deterioration of the material of the stopper due to X-rays or the like can be reduced.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 (a)は本実施形態にかかる電子線照射領域
を示す部分構成図で、(b)は従来技術の電子線照射領
域を示す部分構成図である。
FIG. 1A is a partial configuration diagram illustrating an electron beam irradiation region according to the present embodiment, and FIG. 1B is a partial configuration diagram illustrating a conventional electron beam irradiation region.

【図2】 本発明にかかる電子線照射装置の密着搬送を
示す側面図である。
FIG. 2 is a side view showing close contact conveyance of the electron beam irradiation apparatus according to the present invention.

【図3】 (a)は図1におけるA−A矢視方向概略断
面図で、(b)はB−B矢視方向概略断面図を示す。
3A is a schematic cross-sectional view in the direction of arrows AA in FIG. 1, and FIG. 3B is a schematic cross-sectional view in the direction of arrows BB in FIG.

【図4】 本発明にかかる電子線照射装置の片寄せ搬送
を示す側面図である。
FIG. 4 is a side view showing the one-sided conveyance of the electron beam irradiation apparatus according to the present invention.

【図5】 本実施形態にかかる電子線照射装置の概略構
成図を示す。
FIG. 5 is a schematic configuration diagram of an electron beam irradiation apparatus according to the present embodiment.

【符号の説明】[Explanation of symbols]

10 電子線加速器 11 被照射物 12 ローラコンベア 13 スキュ―コンベア 14 照射コンベア 15 ビームストップ 16 固定式ガイドレール 17 ストッパ 20 電子線 25 滅菌室 30 電子線照射装置 DESCRIPTION OF SYMBOLS 10 Electron beam accelerator 11 Irradiated object 12 Roller conveyor 13 Skew conveyor 14 Irradiation conveyor 15 Beam stop 16 Fixed guide rail 17 Stopper 20 Electron beam 25 Sterilization room 30 Electron beam irradiation device

フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) G21K 5/04 G21K 5/04 E Continued on the front page (51) Int.Cl. 7 Identification FI FI Theme Court II (Reference) G21K 5/04 G21K 5/04 E

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】 立体被照射物を所定方向に搬送させなが
ら電子線を照射して殺菌等の所期の目的を達成する電子
線照射装置において、 前記被照射物を適宜間隔で搬送する第1の搬送工程と、
その下流側に位置し該被照射物を密着搬送する第2の搬
送工程とを有し、 前記第2の搬送工程で被照射物に電子線を照射すること
を特徴とする電子線照射方法。
1. An electron beam irradiation apparatus for irradiating an electron beam while conveying a three-dimensional irradiated object in a predetermined direction to achieve an intended purpose such as sterilization. Transport process,
A second transporting step located on the downstream side thereof to closely transport the object to be irradiated, and irradiating the object to be irradiated with an electron beam in the second transporting step.
【請求項2】 前記第1の搬送工程の速度を大とし、前
記第2の搬送工程の速度を小とするとともに、該第1の
搬送工程の少なくとも出口側に一時的に被照射物を停止
させる停止手段が存在することを特徴とする請求項1記
載の電子線照射方法。
2. The speed of the first transporting step is increased, the speed of the second transporting step is reduced, and the object to be irradiated is temporarily stopped at least at the exit side of the first transporting step. 2. The electron beam irradiation method according to claim 1, further comprising a stopping means for stopping the electron beam irradiation.
【請求項3】 前記第1の搬送工程と第2の搬送工程と
の間に、被照射物を所定方向に片寄せ整列させる片寄せ
手段を有する第3の搬送工程が存在することを特徴とす
る請求項1記載の電子線照射方法。
3. A method according to claim 1, further comprising a third transporting step having a biasing means for biasing and aligning the irradiation object in a predetermined direction between the first transporting step and the second transporting step. The electron beam irradiation method according to claim 1.
【請求項4】 立体被照射物を所定方向に搬送させなが
ら電子線を照射して殺菌等の所期の目的を達成する電子
線照射装置において、 前記被照射物を適宜間隔で搬送する第1の搬送手段と、
該第1の搬送手段より低速でその下流側に位置し該被照
射物を密着搬送する第2の搬送手段と、該2つの搬送手
段の間に位置し被照射物を所定方向に片寄せ整列させる
片寄せ手段を具えた第3の搬送手段と、 前記第1の搬送手段の少なくとも出口側に設けられ被照
射物を一時的に停止させるストッパ手段と、を具えると
ともに、 電子線を照射する電子線加速器を第2の搬送手段に対面
させて配設したことを特徴とする電子線照射装置。
4. An electron beam irradiation apparatus for irradiating an electron beam while transporting a three-dimensional object in a predetermined direction to achieve an intended purpose such as sterilization. Transportation means,
A second transporting means which is located at a lower speed downstream of the first transporting means and closely transports the object to be irradiated, and which is located between the two transporting means and aligns the object to be irradiated in a predetermined direction; A third transporting means provided with a biasing means for causing the light to irradiate an electron beam, and a stopper means provided at least on an exit side of the first transporting means for temporarily stopping an object to be irradiated. An electron beam irradiation apparatus, wherein an electron beam accelerator is disposed so as to face the second transport means.
【請求項5】 前記第2の搬送手段で被照射物が密着搬
送されるように、前記搬送手段の夫々の速度とストッパ
手段による被照射物の切り出し間隔とを制御する制御手
段を設けたことを特徴とする請求項4記載の電子線照射
装置。
5. A control means for controlling a speed of each of said transport means and a cut-out interval of an irradiated object by a stopper means so that an object to be irradiated is closely transported by said second transport means. The electron beam irradiation apparatus according to claim 4, wherein:
【請求項6】 前記第3の搬送手段の始端付近に所定の
直線距離をもたせるように構成したことを特徴とする請
求項4記載の電子線照射装置。
6. The electron beam irradiation apparatus according to claim 4, wherein a predetermined linear distance is provided near a start end of said third transport means.
【請求項7】 前記ストッパ手段と電子線照射領域との
間に遮蔽壁を設け、該電子線照射領域から発生するX線
が該ストッパ手段に直接あたらないように構成したこと
を特徴とする請求項4記載の電子線照射装置。
7. A system according to claim 1, wherein a shielding wall is provided between said stopper means and said electron beam irradiation area so that X-rays generated from said electron beam irradiation area do not directly hit said stopper means. Item 5. An electron beam irradiation apparatus according to Item 4.
【請求項8】 前記ストッパ手段が圧縮空気により作動
することを特徴とする請求項4記載の電子線照射装置。
8. An electron beam irradiation apparatus according to claim 4, wherein said stopper means is operated by compressed air.
JP2000191797A 2000-06-26 2000-06-26 Method and device for electron beam irradiation Withdrawn JP2002006098A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000191797A JP2002006098A (en) 2000-06-26 2000-06-26 Method and device for electron beam irradiation

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Application Number Priority Date Filing Date Title
JP2000191797A JP2002006098A (en) 2000-06-26 2000-06-26 Method and device for electron beam irradiation

Publications (1)

Publication Number Publication Date
JP2002006098A true JP2002006098A (en) 2002-01-09

Family

ID=18691035

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000191797A Withdrawn JP2002006098A (en) 2000-06-26 2000-06-26 Method and device for electron beam irradiation

Country Status (1)

Country Link
JP (1) JP2002006098A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011251708A (en) * 2010-05-31 2011-12-15 Mitsubishi Heavy Industries Food & Packaging Machinery Co Ltd Electron beam sterilizing device
JP2012247207A (en) * 2011-05-25 2012-12-13 Ihi Corp Electron beam irradiation system and conveyance system
JP2013133152A (en) * 2011-12-27 2013-07-08 Shibuya Kogyo Co Ltd Electron beam cap sterilizing device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011251708A (en) * 2010-05-31 2011-12-15 Mitsubishi Heavy Industries Food & Packaging Machinery Co Ltd Electron beam sterilizing device
JP2012247207A (en) * 2011-05-25 2012-12-13 Ihi Corp Electron beam irradiation system and conveyance system
JP2013133152A (en) * 2011-12-27 2013-07-08 Shibuya Kogyo Co Ltd Electron beam cap sterilizing device

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