JP2001351870A5

JP2001351870A5 -

Info

Publication number: JP2001351870A5
Application number: JP2000174330A
Authority: JP
Filing date: 2000-06-09
Publication date: 2004-11-04

Description

【００１１】
また、請求項２に記載の本発明は、バルブの開度及び／又はガス導入量により容器の内部の圧力を制御し、該容器の内部に導入された基板を低圧下で処理する基板処理装置において、上記バルブは、基板を保持する機能を併せ持つことを特徴とする。[0011]
Further, the invention according to claim 2 controls the pressure inside the barber device by the opening and / or gas introduction amount of the valve, processing the substrate, which is introduced into the vessel at low pressure The substrate processing apparatus is characterized in that the valve also has a function of holding a substrate.

【００１２】
更に、請求項３に記載の本発明は、バルブの開度及び／又はガス導入量により容器の内部の圧力を制御し、該容器の内部に導入された基板を低圧下で処理する基板処理装置において、上記バルブは、基板を回転させる機能を併せ持つことを特徴とする。[0012]
Furthermore, the present invention according to claim 3 is a substrate processing apparatus that controls the pressure inside the container by the opening of the valve and / or the gas introduction amount, and processes the substrate introduced into the container under low pressure. in, the valve is characterized by having both the function of rotating the substrate.

【００１３】
また、請求項４に記載の本発明は、バルブの開度及び／又はガス導入量により容器の内部の圧力を制御し、該容器の内部に導入された基板を低圧下で処理する基板処理装置において、上記バルブは、基板の温度を調節する機能を併せ持つことを特徴とする。[0013]
In the substrate processing apparatus according to the fourth aspect of the present invention, the pressure inside the container is controlled by the opening of the valve and / or the gas introduction amount, and the substrate introduced into the container is processed under low pressure. In the above, the valve is characterized in that it also has a function of adjusting the temperature of the substrate.

【００１４】
更に、請求項５に記載の本発明は、バルブの開度及び／又はガス導入量により容器の内部の圧力を制御し、該容器の内部に導入された基板を低圧下で処理する基板処理装置において、上記バルブは、上記容器内にガスを導入する機能を併せ持つことを特徴とする。[0014]
Furthermore, the present invention according to claim 5 is a substrate processing apparatus which controls the pressure inside the container by the opening of the valve and / or the gas introduction amount, and processes the substrate introduced into the container under low pressure. in, the valve is characterized by having both the function of introducing a gas into the container.

Claims

In a substrate processing apparatus which decompresses the inside of a container by a vacuum pump and processes a substrate introduced into the inside of the container under a low pressure,
Placing the vacuum pump adjacent to the vessel;
A substrate processing apparatus characterized in that a valve body capable of closing a suction port formed on the container side of the vacuum pump is provided inside the container.

In the substrate processing apparatus to control the pressure inside the barber device by the opening and / or gas introduction amount of the valve, processing the substrate, which is introduced into the vessel under low pressure, the valve, holds the substrate What is claimed is: 1. A substrate processing apparatus comprising:

In the substrate processing apparatus to control the pressure inside the barber device by the opening and / or gas introduction amount of the valve, processing the substrate, which is introduced into the vessel under low pressure, the valve may rotate the substrate What is claimed is: 1. A substrate processing apparatus comprising:

In the substrate processing apparatus to control the pressure inside the barber device by the opening and / or gas introduction amount of the valve, processing the substrate, which is introduced into the vessel under low pressure, the valve, the temperature of the substrate A substrate processing apparatus having a function of adjusting

In the substrate processing apparatus to control the pressure inside the barber device by the opening and / or gas introduction amount of the valve, processing the substrate, which is introduced into the vessel under low pressure, the valve, said container A substrate processing apparatus having a function of introducing a gas to the substrate.