JP2001340868A - Electromagnetic treatment apparatus for magnetic treatment of associated molecule - Google Patents
Electromagnetic treatment apparatus for magnetic treatment of associated moleculeInfo
- Publication number
- JP2001340868A JP2001340868A JP2000167034A JP2000167034A JP2001340868A JP 2001340868 A JP2001340868 A JP 2001340868A JP 2000167034 A JP2000167034 A JP 2000167034A JP 2000167034 A JP2000167034 A JP 2000167034A JP 2001340868 A JP2001340868 A JP 2001340868A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic flux
- coil
- magnetic
- electromagnetic
- processed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Water Treatment By Electricity Or Magnetism (AREA)
- Chemically Coating (AREA)
- Electroplating Methods And Accessories (AREA)
- ing And Chemical Polishing (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、移動する被処理物
中に含まれる会合分子の磁気処理のための電磁処理装置
に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electromagnetic processing apparatus for magnetically processing associated molecules contained in a moving object to be processed.
【0002】[0002]
【従来の技術】同種の分子2個以上が比較的弱い分子間
力によって集合し、一つの単位として行動している状態
を会合と称するが、会合を生じている分子から成る物質
は、活性度が低いために、浸透性が低下したり、乱流が
抑制されたりすることの原因となっている。故に会合を
解いたり、より小さい会合状態にしたりすることができ
れば、その度合いに応じて物質の活性度を回復させ、浸
透性の向上と乱流状態の維持等が図られると考えられ
る。2. Description of the Related Art A state in which two or more molecules of the same type are aggregated by a relatively weak intermolecular force and act as one unit is called an association. Is low, causing a decrease in permeability and a suppression of turbulence. Therefore, if the association can be dissociated or a smaller association state can be achieved, it is considered that the activity of the substance is restored in accordance with the degree, the permeability is improved, and the turbulent state is maintained.
【0003】一方、無電解めっき法、電解めっき法及び
エッチング法はいずれも被処理物を媒体中に配置して所
定の処理を行うものであるが、これらの方法において薬
品や装置の改良により効率を高めることは既に限界に達
している。これに対してスケールを磁気処理によって除
去しようという提案がなされている。On the other hand, the electroless plating method, the electrolytic plating method, and the etching method all perform a predetermined treatment by arranging an object to be treated in a medium. In these methods, the efficiency is improved by improving chemicals and equipment. Enhancing has already reached its limits. On the other hand, it has been proposed to remove the scale by magnetic treatment.
【0004】例えば米国特許第5074998号明細書
記載の発明は、管壁に付着するスケールの除去及び付着
量の減少を扱っている。しかし同発明の効果を期待でき
るのは、比較的小さい共鳴振動数を持つ会合分子に限ら
れると考えられる。その理由は、同発明の実施品と見な
される装置では、電磁コイルの特性が実質的に120ア
ンペアターン程度しか得られないからである。また上記
の米国特許発明は流体一般に適用されると説明されてい
るが、前記の無電解めっき法、電解めっき法及びエッチ
ング法等の酸化還元反応系に適用できるとの説明乃至言
及はない。For example, the invention described in US Pat. No. 5,074,998 deals with the removal of scale adhering to a tube wall and the reduction of the amount of adhering. However, the effect of the present invention can be expected to be limited only to associated molecules having a relatively small resonance frequency. The reason is that the device considered as an embodiment of the present invention can obtain the characteristic of the electromagnetic coil substantially only about 120 amperes. Although the above US patent invention is described as being generally applied to fluids, there is no description or mention that it is applicable to redox reaction systems such as the aforementioned electroless plating method, electrolytic plating method and etching method.
【0005】さらに本件の発明者は電気コイルによって
発生させた磁極をヨークにより分極し、被処理流体の中
心部を貫通する磁束を形成することができる装置を発明
し、既にその成果について出願をした(特願平11−2
64410)。同発明は、前記米国特許発明が流れと平
行な磁束を形成するのに対して、流れと直交する磁束を
形成することができる画期的なものであり、かつ高エネ
ルギーレベルでの磁気処理を可能とするという特徴を有
する。ところが無電解めっき法、電解めっき法及びエッ
チング法では、高エネルギーレベルのイオン励起状態が
負の作用をなすという側面がある。Further, the inventor of the present invention has invented a device which can polarize a magnetic pole generated by an electric coil by a yoke to form a magnetic flux penetrating a central portion of a fluid to be processed, and has already filed an application for the result. (Japanese Patent Application No. 11-2
64410). The invention is an epoch-making method that can form a magnetic flux perpendicular to the flow while the U.S. patent invention forms a magnetic flux parallel to the flow, and uses a magnetic treatment at a high energy level. It has the feature that it is possible. However, in the electroless plating method, the electrolytic plating method, and the etching method, there is an aspect that the ion excited state at a high energy level has a negative effect.
【0006】[0006]
【発明が解決しようとする課題】つまり、より低いエネ
ルギーレベルで、磁束を自由にコントロールできること
が望ましいというケースも存在する。That is, in some cases, it is desirable to be able to freely control the magnetic flux at a lower energy level.
【0007】本発明は上記の点に着目してなされたもの
であって、その課題は、抑制されたイオン励起状態の下
で、分子会合を解いて、物質の活性度を回復可能とする
ことである。The present invention has been made in view of the above points, and an object thereof is to make it possible to recover the activity of a substance by dissociating molecules under a suppressed ion excited state. It is.
【0008】また本発明は他の課題は無電解めっき法、
電解めっき法及びエッチング法等の上記酸化還元反応系
のように高エネルギーレベルによるイオン励起状態の形
成が負の作用を為すような条件の下でも、会合分子に対
して効果的な活性化処理を行うことができる電磁処理装
置を提供することである。Another object of the present invention is to provide an electroless plating method,
Even under conditions where the formation of an ion excited state at a high energy level has a negative effect, such as in the above oxidation-reduction reaction systems such as electrolytic plating and etching, an effective activation treatment can be performed on the associated molecules. An object of the present invention is to provide an electromagnetic processing device that can perform the processing.
【0009】[0009]
【課題を解決するための手段】前記の課題を解決するた
め、本発明は、通電により磁束を形成して、移動する被
処理物に作用するコイルを多重に形成し、多重のコイル
に対する通電を制御することによって被処理物に作用す
る磁束方向を変化させるという手段を講じたものであ
る。SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, the present invention forms a magnetic flux by energization, forms multiple coils acting on a moving workpiece, and energizes multiple coils. The control is performed to change the direction of the magnetic flux acting on the object to be processed.
【0010】本発明の会合分子の磁気処理のための電磁
処理装置は、より具体的には通電により磁束を形成する
コイルを被処理物が流れる管路の外周に2重に巻き付
け、一方のコイルを駆動する電気回路と他の一方のコイ
ルを駆動する電気回路を制御することによって被処理物
に作用する磁束方向を変化させるという構成をとること
ができる。The electromagnetic processing apparatus for magnetically processing an associated molecule according to the present invention, more specifically, a coil for forming a magnetic flux by energization is wound twice around the outer circumference of a conduit through which an object flows, and one of the coils is wound. By controlling the electric circuit for driving the object and the electric circuit for driving the other coil, the direction of the magnetic flux acting on the object to be processed can be changed.
【0011】[0011]
【発明の実施の形態】本発明の電磁処理装置は、電磁コ
イルの磁気作用によって会合分子の処理を行う装置であ
る。コイルは導線を巻回したもので、電磁回路中に磁束
を形成する。DESCRIPTION OF THE PREFERRED EMBODIMENTS The electromagnetic processing apparatus of the present invention is an apparatus for processing associated molecules by the magnetic action of an electromagnetic coil. The coil is formed by winding a conductive wire and forms a magnetic flux in an electromagnetic circuit.
【0012】本発明の装置ではコイルを多重に形成する
ことが一つの特徴となる。コイルを多重に形成とは、1
本の導線を巻回した1個のコイルを複数個重ねて配置す
る、というほどの意味である。複数個のコイルの巻数、
巻きピッチは、同じであっても、違っていてもどちらで
も良い。従って複数個のコイルは同じ面に形成される必
要はなく、例えば被処理流体を中心とした場合、内外に
配置することも当然可能である。One feature of the apparatus of the present invention is that coils are formed in multiple layers. Forming multiple coils means 1
This means that a plurality of coils each of which is wound with one conducting wire are arranged one on top of another. Number of turns of multiple coils,
The winding pitch may be the same or different. Therefore, the plurality of coils need not be formed on the same surface. For example, when the fluid to be processed is centered, the coils may be arranged inside and outside.
【0013】個々のコイルは、電気回路として、それぞ
れ独立して作動可能である。各個独立の多重コイルに対
する通電を制御することによって、被処理物に作用する
磁束方向を変化させる、と同時に磁束方向を変化させる
変化量の調整を可能とする。The individual coils are independently operable as electric circuits. By controlling the energization of each independent multiple coil, it is possible to change the direction of the magnetic flux acting on the workpiece and, at the same time, to adjust the amount of change that changes the direction of the magnetic flux.
【0014】例えば前述の無電解めっき法や電解めっき
法或いはエッチング法において、使用される処理液の活
性化のために本発明を実施する場合、多重のコイルは被
処理物である処理液が流れる管路に巻き付けて設置する
ことができる。図1はその例示であり、実線で図示され
た1番コイル11と破線で図示された2番コイル12と
は管路10の外周面を巻き胴として、2本の導線を同時
に巻き付けるようにして形成することができる。1番コ
イル11、2番コイル12の巻き径、巻き数は同一とさ
れ、導線の番手も同一とされている。For example, in the above-described electroless plating method, electrolytic plating method, or etching method, when practicing the present invention for activating a processing solution to be used, a processing solution as an object to be processed flows through multiple coils. It can be wrapped around a pipe and installed. FIG. 1 is an example of this, in which the first coil 11 shown by a solid line and the second coil 12 shown by a broken line are wound around the outer peripheral surface of the conduit 10 so that two conductors are wound simultaneously. Can be formed. The winding diameter and the number of windings of the first coil 11 and the second coil 12 are the same, and the number of the conductive wire is also the same.
【0015】図1の2重コイルに通電した場合に得られ
る磁束13、14は、図2に示したように管路10の流
れと平行の方向となる。ここで制御装置15を操作し、
一方のコイル例えば11を駆動する電気回路と他の一方
のコイル例えば12を駆動する電気回路との通電を制御
し、磁束方向が互いに逆向きとなるようにすると、各磁
束13、14は図2に示したように管路10の流れとほ
ぼ平行の方向となる。ここで制御装置15を操作し、一
方のコイル例えば11を駆動する電気回路と他の一方の
コイル例えば12を駆動する電気回路とが互いに逆向き
に作動するように通電を制御すると、各磁束13、14
は流れとほぼ平行の方向を保ちながら逆方向へ向きを変
えることになる。図1、図2の矢印参照。The magnetic fluxes 13 and 14 obtained when the double coil shown in FIG. 1 is energized are in a direction parallel to the flow of the pipeline 10 as shown in FIG. Here, the control device 15 is operated,
When the energization of an electric circuit for driving one coil, for example, 11 and an electric circuit for driving the other coil, for example, 12, is controlled so that the directions of the magnetic fluxes are opposite to each other, each of the magnetic fluxes 13 and 14 becomes as shown in FIG. The direction is substantially parallel to the flow of the pipeline 10 as shown in FIG. When the controller 15 is operated to control the energization so that the electric circuit for driving one coil, for example, 11 and the electric circuit for driving the other coil, for example, 12, operate in directions opposite to each other, each magnetic flux 13 , 14
Will turn in the opposite direction while maintaining a direction substantially parallel to the flow. See the arrows in FIGS.
【0016】図3は上記制御装置15の構成の例示であ
り、図中検出部は管路を流れる液の状態、磁束密着、極
性変換のための交流電流周波数を絶えず観測し演算部へ
送信する。演算部は送信されてきた値を表示部に表示す
るとともに、設定部にて設定されたプログラムによって
制御部を介して磁気処理部及びポンプ等の周辺機器を制
御する。電力部は各部に対して必要な電力を供給する。FIG. 3 shows an example of the configuration of the control device 15. In the drawing, the detecting section constantly observes the state of the liquid flowing through the pipeline, the magnetic flux adhesion, and the AC current frequency for polarity conversion, and transmits it to the arithmetic section. . The arithmetic unit displays the transmitted value on the display unit, and controls the magnetic processing unit and the peripheral devices such as the pump via the control unit according to the program set by the setting unit. The power unit supplies necessary power to each unit.
【0017】磁気処理部は周波数設定回路によって直接
制御可能とすることができる。その1例を図4に示す。
周波数設定回路は、被処理物の移動速度や会合分子の大
きさが、極性と磁束の単位時間当たりの変化即ち周波数
と密接に関係するため、これらを適切な値に設定するも
のである。このため、上記設定回路によって設定された
値で正確に安定した発振をする発振回路、発振回路によ
って作り出された基本周波数信号により適切な波形を作
り出す波形整形回路、波形整形回路で作り出された電気
信号を磁気処理部や電力回路による減衰量を磁気処理部
における実際の強度と比較し、自動的にレベルを設定す
るレベル設定する回路を含む作動部を有する。The magnetic processing section can be directly controlled by a frequency setting circuit. One example is shown in FIG.
The frequency setting circuit sets an appropriate value because the moving speed of the object to be processed and the size of the associated molecules are closely related to the change per unit time of the polarity and the magnetic flux, that is, the frequency. For this reason, an oscillation circuit that accurately and stably oscillates at the value set by the setting circuit, a waveform shaping circuit that creates an appropriate waveform based on the fundamental frequency signal created by the oscillation circuit, and an electric signal created by the waveform shaping circuit Has an operation unit including a level setting circuit for comparing the attenuation by the magnetic processing unit and the power circuit with the actual intensity in the magnetic processing unit and automatically setting the level.
【0018】[0018]
【実施例1】図5に示すめっき槽20を使用し、ステン
レス304より成る100×100ミリメートルのめっ
き析出部21をめっき浴22に浸漬し、表1に示す電流
密度において、めっき皮膜50マイクロメートルを目標
とし、循環ポンプ23の吐出側配管24に本発明に係る
電磁処理装置(図3、図4における磁気処理部)25を
取り付け、電解めっき処理を行った。EXAMPLE 1 Using a plating bath 20 shown in FIG. 5, a 100.times.100 mm plating deposition portion 21 made of stainless steel 304 was immersed in a plating bath 22. At a current density shown in Table 1, a plating film having a thickness of 50 micrometers was formed. The electromagnetic processing apparatus (magnetic processing unit in FIGS. 3 and 4) 25 according to the present invention was attached to the discharge-side pipe 24 of the circulation pump 23, and electroplating was performed.
【0019】処理条件:めっき浴 スルファミン酸ニッ
ケル600ミリグラム/リットル、ホウ酸40グラム/
リットル、浴量50リットル、電流効率100%の析出
量4.425グラム/平方デシメートル、ポンプ循環量
200ミリリットル/分、浴温50℃、ロッキングR=
30ミリメートル、50RPM、磁力通電量5A、周波
数2000Hz、通電コイル2.2ミリメートル径、巻
き数12。なお陽極金属26はニッケルとして、結果を
表1に示す。Processing conditions: plating bath 600 mg / liter nickel sulfamate, 40 g / boric acid /
Liter, bath volume 50 liter, deposition amount of 100% current efficiency 4.425 g / sq. Decimeter, pump circulation volume 200 ml / min, bath temperature 50 ° C., rocking R =
30 millimeters, 50 RPM, 5 A of magnetic force, frequency of 2000 Hz, 2.2 mm diameter of energizing coil, 12 turns. The results are shown in Table 1 with the anode metal 26 being nickel.
【0020】[0020]
【表1】 [Table 1]
【実施例2】磁力通電量を10Aとし、かつ通電コイル
の巻き数を倍の12としたほかは、実施例1と同じ条件
で、同じめっき槽を使用して、磁力通電量を変化させて
電解処理を行った。結果を表2に示す。Embodiment 2 The same amount of magnetic force was applied to the same plating tank under the same conditions as in Example 1 except that the amount of magnetic force applied was 10 A and the number of windings of the energizing coil was doubled to 12. An electrolytic treatment was performed. Table 2 shows the results.
【0021】[0021]
【表2】 [Table 2]
【比較例1】本発明に係る電磁処理装置を取り外したほ
かは、実施例1と同じ条件で、同じめっき槽を使用し、
電解処理を行った。その結果を表3に示す。Comparative Example 1 The same plating tank was used under the same conditions as in Example 1 except that the electromagnetic treatment device according to the present invention was removed.
An electrolytic treatment was performed. Table 3 shows the results.
【0022】[0022]
【表3】 [Table 3]
【実施例3】図6に示すエッチング装置30を使用し、
厚さ70マイクロメートルの銅箔に幅100マイクロメ
ートルのラインを100マイクロメートルの間隔でエッ
チングし、エッチングスピードとエッチングファクター
とを測定した。図6中、31は本発明に係る電磁処理装
置、32は循環ポンプ、33はエッチング液のスプレ
ー、34は配管、を示す。Embodiment 3 Using an etching apparatus 30 shown in FIG.
A line having a width of 100 μm was etched at an interval of 100 μm on a copper foil having a thickness of 70 μm, and the etching speed and the etching factor were measured. 6, reference numeral 31 denotes an electromagnetic processing apparatus according to the present invention, 32 denotes a circulation pump, 33 denotes a spray of an etching solution, and 34 denotes a pipe.
【0023】エッチング条件:スプレーポンプ250リ
ットル/分、配管内圧1.5キログラム/平方センチメ
ートル、液温50℃、液量60リットル、使用薬品 塩
化第2鉄40重量パーセント水溶液、エッチングファク
ターFC=L/(D1+D2)×1/2、図7参照。結
果を表4に示す。磁力通電量は5A、使用周波数200
0Hz、通電コイル径2.2ミリメートル、巻き数1
2。図7において、D1、D2は食刻部の端部の傾斜部
分で、板厚Lの上部が表面側となる。Etching conditions: spray pump 250 liter / min, pipe internal pressure 1.5 kg / square centimeter, liquid temperature 50 ° C., liquid volume 60 liter, chemical used 40% by weight aqueous solution of ferric chloride, etching factor FC = L / ( D1 + D2) × 1 /, see FIG. Table 4 shows the results. The amount of magnetic force is 5A, the operating frequency is 200
0 Hz, energized coil diameter 2.2 mm, number of turns 1
2. In FIG. 7, D1 and D2 are inclined portions at the ends of the etched portion, and the upper part of the plate thickness L is the front side.
【0024】[0024]
【表4】 [Table 4]
【実施例4】磁力通電量を12Aとしたほかは実施例3
と同じ条件及び同じ装置を使用し、通電量を変化させエ
ッチング処理を行った。結果を表5に示す。Fourth Embodiment A third embodiment is the same as the third embodiment except that the amount of energized magnetic force is 12 A.
Using the same conditions and the same equipment as those described above, the etching process was performed while changing the amount of electricity. Table 5 shows the results.
【0025】[0025]
【表5】 [Table 5]
【比較例2】本発明に係る電磁処理装置を取り外したほ
かは、実施例4と同じ条件で、同じめっき槽を使用し、
エッチング処理を行った。Comparative Example 2 The same plating tank was used under the same conditions as in Example 4 except that the electromagnetic treatment device according to the present invention was removed.
An etching process was performed.
【0026】[0026]
【表6】 結果を表6に示す。[Table 6] Table 6 shows the results.
【0027】[0027]
【発明の効果】本発明は以上の如く構成されかつ作用す
るものであるから、負の作用を起こさない抑制されたイ
オン励起状態の下で分子会合を解いて物質の活性度を顕
著な段階にまで回復することができるという効果を奏す
る。Since the present invention is constructed and operates as described above, the activity of the substance is brought to a remarkable stage by dissociating molecules under a suppressed ion excited state which does not cause a negative effect. It has the effect of being able to recover up to.
【図1】本発明に係る会合分子の磁気処理のための電磁
処理装置の一つの実施例を示す説明図。FIG. 1 is an explanatory view showing one embodiment of an electromagnetic treatment apparatus for magnetic treatment of associated molecules according to the present invention.
【図2】図1の作用説明図。FIG. 2 is an operation explanatory view of FIG. 1;
【図3】同上装置の作動抑制のための制御装置の1例を
示す構成図。FIG. 3 is a configuration diagram showing an example of a control device for suppressing operation of the above device.
【図4】磁気処理部の周波数制御のためのブロック図。FIG. 4 is a block diagram for frequency control of a magnetic processing unit.
【図5】本発明を適用する電解めっき装置の1例を示す
説明図。FIG. 5 is an explanatory view showing one example of an electrolytic plating apparatus to which the present invention is applied.
【図6】同様のエッチング装置の1例を示す説明図。FIG. 6 is an explanatory view showing one example of a similar etching apparatus.
【図7】エッチングファクターを示す説明図。FIG. 7 is an explanatory diagram showing an etching factor.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 木内 丈司 東京都小平市花小金井5丁目428番地 日 本弗素工業株式会社内 Fターム(参考) 4D061 DA05 DB05 EA18 EC11 FA20 4K022 DB21 4K024 AA03 CB26 4K057 WA10 WB04 WE08 WM20 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Takeshi Kiuchi 5-428, Hanakoganei, Kodaira-shi, Tokyo F-term in Nihon Fluorine Industry Co., Ltd. 4D061 DA05 DB05 EA18 EC11 FA20 4K022 DB21 4K024 AA03 CB26 4K057 WA10 WB04 WE08 WM20
Claims (3)
の磁気処理のための装置であって、通電により磁束を形
成して、移動する被処理物に作用するコイルを多重に形
成し、多重のコイルに対する通電を制御することによっ
て被処理物に作用する磁束方向を変化させることを特徴
とする会合分子の磁気処理のための電磁処理装置。An apparatus for magnetically treating associated molecules contained in a moving object to be processed, wherein a magnetic flux is formed by energization, and a plurality of coils acting on the moving object to be processed are formed. An electromagnetic processing apparatus for magnetically processing associated molecules, wherein the direction of magnetic flux acting on an object to be processed is changed by controlling energization of multiple coils.
の磁気処理のための装置であって、通電により磁束を形
成するコイルを被処理物が流れる管路の外周に2重に巻
き付け、一方のコイルを駆動する電気回路と他の一方の
コイルを駆動する電気回路を制御することによって被処
理物に作用する磁束方向を変化させることを特徴とする
会合分子の磁気処理のための電磁処理装置。2. An apparatus for magnetically treating associated molecules contained in a moving object to be processed, wherein a coil for forming a magnetic flux by energization is wound twice around an outer circumference of a pipe through which the object flows. Electromagnetic treatment for the magnetic treatment of associated molecules characterized by changing the direction of magnetic flux acting on the workpiece by controlling the electric circuit driving one coil and the electric circuit driving the other coil apparatus.
なるように2重のコイルを制御するものであり、かつ磁
束方向が毎秒150アンペアターン以上で反転を繰り返
すように構成されている請求項2記載の会合分子の磁気
処理のための電磁処理装置。3. An electric circuit for controlling a double coil so that magnetic flux directions are opposite to each other, and is configured to repeat reversal at a magnetic flux direction of 150 ampere turns per second or more. Item 6. An electromagnetic treatment apparatus for magnetically treating an associated molecule according to Item 2.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000167034A JP3319592B2 (en) | 2000-06-05 | 2000-06-05 | Electromagnetic treatment device for magnetic treatment of associated molecules |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000167034A JP3319592B2 (en) | 2000-06-05 | 2000-06-05 | Electromagnetic treatment device for magnetic treatment of associated molecules |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2001340868A true JP2001340868A (en) | 2001-12-11 |
JP3319592B2 JP3319592B2 (en) | 2002-09-03 |
Family
ID=18670252
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000167034A Expired - Fee Related JP3319592B2 (en) | 2000-06-05 | 2000-06-05 | Electromagnetic treatment device for magnetic treatment of associated molecules |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3319592B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011255345A (en) * | 2010-06-11 | 2011-12-22 | Ska Ltd | Device and method for electromagnetic wave treatment of fluid to be treated |
CN112944136A (en) * | 2021-02-03 | 2021-06-11 | 天津海旺海上石油工程技术服务有限公司 | F-type frequency conversion antiscaling instrument |
-
2000
- 2000-06-05 JP JP2000167034A patent/JP3319592B2/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011255345A (en) * | 2010-06-11 | 2011-12-22 | Ska Ltd | Device and method for electromagnetic wave treatment of fluid to be treated |
CN112944136A (en) * | 2021-02-03 | 2021-06-11 | 天津海旺海上石油工程技术服务有限公司 | F-type frequency conversion antiscaling instrument |
Also Published As
Publication number | Publication date |
---|---|
JP3319592B2 (en) | 2002-09-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4490422B2 (en) | Selectable ion concentration with electrolytic ion exchange | |
Gabrielli et al. | Magnetic water treatment for scale prevention | |
EP3039171B1 (en) | Method of treating a pickling solution for a pickling process | |
TW200811059A (en) | Electromagnetic field treatment method and electromagnetic field treatment equipment of water | |
US20160207812A1 (en) | Scale treatment apparatus | |
JP4089949B2 (en) | Scale removal method and scale removal apparatus | |
JP3319592B2 (en) | Electromagnetic treatment device for magnetic treatment of associated molecules | |
JP3469541B2 (en) | Water activation method and apparatus therefor | |
JP2001079556A (en) | Electromagnetic processor for magnetically processing associated molecule | |
JP2008202135A (en) | Method for producing hollow member and tool for anodic oxidation treatment | |
KR100704421B1 (en) | Three-dimensional electronic anti-fouling device and method thereof | |
JPH09235688A (en) | Method for pickling stainless steel | |
JPS62160991A (en) | Ship's propulsion device by electromagnetic pump | |
CN108735421A (en) | A kind of alternating electromagnetic field generating means based on parallel resonance principle | |
RU2269735C1 (en) | Device for prevention of scale formation | |
CN212024860U (en) | Multi-frequency combined water treatment device | |
RU2641137C1 (en) | Device for reagent-free treatment of water | |
JP2002260969A (en) | Manufacturing method for anode foil for aluminum electrolytic capacitor | |
RU192731U1 (en) | Device for magnetic fluid processing | |
JP2003164879A (en) | Electromagnetic field treatment method for fluid flowing in piping | |
JPS6230900A (en) | Electrolytic polishing method for inside surface of pipe | |
RU2764538C1 (en) | Method for combined processing of complex channels and apparatus for implementation thereof | |
JP4189157B2 (en) | Low iron loss unidirectional electrical steel sheet manufacturing method | |
JP2009073460A (en) | Electromagnetic induction type magneto hydrodynamics (mhd) propelling engine | |
JP2004346407A (en) | Methods and apparatuses for surface-treating and plating aluminum alloy |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313114 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R154 | Certificate of patent or utility model (reissue) |
Free format text: JAPANESE INTERMEDIATE CODE: R154 |
|
S802 | Written request for registration of partial abandonment of right |
Free format text: JAPANESE INTERMEDIATE CODE: R311802 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080621 Year of fee payment: 6 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080621 Year of fee payment: 6 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313117 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080621 Year of fee payment: 6 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080621 Year of fee payment: 6 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090621 Year of fee payment: 7 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090621 Year of fee payment: 7 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100621 Year of fee payment: 8 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100621 Year of fee payment: 8 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100621 Year of fee payment: 8 |
|
LAPS | Cancellation because of no payment of annual fees |