JP2001335571A - Method for producing phthalic anhydride - Google Patents

Method for producing phthalic anhydride

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Publication number
JP2001335571A
JP2001335571A JP2000160359A JP2000160359A JP2001335571A JP 2001335571 A JP2001335571 A JP 2001335571A JP 2000160359 A JP2000160359 A JP 2000160359A JP 2000160359 A JP2000160359 A JP 2000160359A JP 2001335571 A JP2001335571 A JP 2001335571A
Authority
JP
Japan
Prior art keywords
group
halo
acid
dehydration reaction
phthalic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000160359A
Other languages
Japanese (ja)
Inventor
Noboru Abe
登 阿部
Kazuhiro Takagi
和裕 高木
Kenji Tsubata
健治 津幡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nihon Nohyaku Co Ltd
Original Assignee
Nihon Nohyaku Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Nohyaku Co Ltd filed Critical Nihon Nohyaku Co Ltd
Priority to JP2000160359A priority Critical patent/JP2001335571A/en
Publication of JP2001335571A publication Critical patent/JP2001335571A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a method for efficiently producing phthalic anhydrides, under mild conditions in a high yield by a simple process and a simple aftertreatment. SOLUTION: This method for producing a phthalic anhydride of formula (I) (R is h, a halogen, NO2, CN, a (halo)1-8C alkyl, a (halo)1-20C alkoxy, a (halo)1-20C alkylthio, phenyl or a substituted phenyl substituted with one or more halogens, 1-6C alkyls, halo 1-6C alkyls or 1-6C alkoxys; n is 0-4; R can exhibit a 4C alkenylene or a 1-2C alkylenedioxy with an adjoining C) is characterized by subjecting a phthalic acid of formula (II) to a dehydration reaction in an inert solvent in the presence of a catalytic amount of an acidic compound.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、医薬、農薬、化学
品等の原料化合物として有用な無水フタル酸類の製造方
法に関するものである。
TECHNICAL FIELD The present invention relates to a method for producing phthalic anhydrides useful as starting compounds for pharmaceuticals, agricultural chemicals, chemicals and the like.

【0002】[0002]

【従来の技術】無水フタル酸類の製造方法は、例えばフ
タル酸類からの製造法として、無溶媒で加熱する方法
(J.Am.Chem.Soc.,77,5093,
(1955))や無水酢酸(J.Chem.Soc.,
1950,2842)、メトキシアセチレン(同,19
54,1860)、カルボジイミド(J.Am.Che
m.Soc.,85,1997(1963))又は五酸
化リン(同,85,2282(1963)等に記載の
脱水剤を併用する方法が知られている。
2. Description of the Related Art A method for producing phthalic anhydrides is, for example, a method of heating from phthalic acids without solvent (J. Am. Chem. Soc., 77 , 5093,
(1955)) and acetic anhydride (J. Chem. Soc.,
1950 , 2842), methoxyacetylene (ibid., 19
54 , 1860), carbodiimide (J. Am. Che
m. Soc. , 85 , 1997 (1963)) and phosphorus pentoxide (the same, 85 , 2282 (1963 ) ).

【0003】[0003]

【発明が解決しようとする課題】従来技術では、無溶媒
で加熱する方法は高温を必要とし、又脱水剤を使用する
方法は反応試剤が高価なものを含み、且つその使用量も
当量以上を要する。しかも、反応後に使用した脱水剤か
ら生じる大量の副生物を後処理で除去する必要がある等
の課題がある。
In the prior art, the method of heating without a solvent requires a high temperature, and the method of using a dehydrating agent involves an expensive reaction reagent, and the amount of the reagent used is more than equivalent. It costs. In addition, there is a problem that a large amount of by-products generated from the dehydrating agent used after the reaction needs to be removed by a post-treatment.

【0004】[0004]

【課題を解決するための手段】本発明者は上記課題を解
決するため、フタル酸類の脱水方法を鋭意検討した結
果、適当な不活性溶媒中、触媒量の酸性化合物の存在下
に共沸脱水するか又はモレキュラーシーブスのような乾
燥剤を使用することにより高収率で反応が進行し、目的
とする無水フタル酸類が得られることを見出し、本発明
を完成させたものである。
Means for Solving the Problems In order to solve the above problems, the present inventors have intensively studied a method for dehydrating phthalic acids. It has been found that the reaction proceeds at a high yield by using a drying agent such as molecular sieves or a desired phthalic anhydride, thereby completing the present invention.

【0005】本発明は一般式(II);The present invention provides a compound represented by the general formula (II):

【化3】 (式中、Rは同一又は異なっても良く、水素原子、ハロ
ゲン原子、ニトロ基、シアノ基、 C1-C20アルキル基、
ハロ C1-C8アルキル基、C1-C20アルコキシ基、ハロ C1-
C8アルコキシ基、C1-C20アルキルチオ基、ハロ C1-C8
ルキルチオ基、フェニル基又は同一若しくは異なっても
良く、ハロゲン原子、 C1-C6アルキル基、ハロ C1-C6
ルキル基又はC1-C6 アルコキシ基から選択される1以上
の置換基を有する置換フェニル基を示し、nは0〜4の
整数を示す。又、Rは隣接する炭素原子と一緒になって
C4アルケニレン基又は C1-C2アルキレンジオキシ基を示
すこともできる。)で表されるフタル酸類を不活性溶媒
中、触媒量の酸性化合物の存在下に脱水反応することを
特徴とする一般式(I) ;
Embedded image (Wherein R may be the same or different, and represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, a C 1 -C 20 alkyl group,
Halo C 1 -C 8 alkyl group, C 1 -C 20 alkoxy group, halo C 1-
C 8 alkoxy group, C 1 -C 20 alkylthio group, halo C 1 -C 8 alkylthio group, phenyl group or may be the same or different, halogen atom, C 1 -C 6 alkyl group, halo C 1 -C 6 alkyl A substituted phenyl group having one or more substituents selected from a group or a C 1 -C 6 alkoxy group, and n represents an integer of 0-4. R together with adjacent carbon atoms
It can also represent a C 4 alkenylene group or a C 1 -C 2 alkylenedioxy group. A) a phthalic acid represented by the general formula (I), wherein the phthalic acid is dehydrated in an inert solvent in the presence of a catalytic amount of an acidic compound;

【化4】 (式中、R及びnは前記に同じ。)で表される無水フタ
ル酸類の製造方法に関するものである。本発明の製造方
法はプロセス的に簡便で、効率的で、温和な条件下で、
且つ安価に無水フタル酸類を製造でき、しかも後処理が
簡便な製造方法を提供することにある。
Embedded image (Wherein, R and n are the same as described above). The production method of the present invention is simple in process, efficient, and under mild conditions,
It is another object of the present invention to provide a production method that can produce phthalic anhydrides at low cost and can easily carry out post-treatment.

【0006】[0006]

【発明の実施形態】本発明のフタル酸類及び無水フタル
酸類の定義において、「ハロゲン原子」とは塩素原子、
臭素原子、沃素原子又はフッ素原子を示し、「C1-C20
ルキル基」とは、例えばメチル基、エチル基、n−プロ
ピル基、i−プロピル基、n−ブチル基、i−ブチル
基、s−ブチル基、t−ブチル基、n−ペンチル基、n
−ヘキシル基、n−オクチル基、n−ドデシル基、n−
アイコシル基等の直鎖又は分岐鎖状の炭素原子数1〜2
0個のアルキル基を示し、「ハロ C1-C8アルキル基」と
は、同一又は異なっても良い1以上のハロゲン原子によ
り置換された直鎖又は分岐鎖状の炭素原子数1〜8個の
アルキル基を示し、例えばフルオロメチル基、ジフルオ
ロメチル基、トリフルオロメチル基、クロロメチル基、
ブロモメチル基、ペンタフルオロエチル基、テトラフル
オロエチル基等が挙げられる。
BEST MODE FOR CARRYING OUT THE INVENTION In the definition of phthalic acids and phthalic anhydrides of the present invention, "halogen atom" means chlorine atom,
Indicates bromine atom, iodine atom or fluorine atom, the "C 1 -C 20 alkyl group" such as methyl group, ethyl group, n- propyl group, i- propyl, n- butyl group, i- butyl group, s-butyl group, t-butyl group, n-pentyl group, n
-Hexyl group, n-octyl group, n-dodecyl group, n-
Straight or branched chain carbon atoms such as an eicosyl group
Represents 0 alkyl groups, and “halo C 1 -C 8 alkyl group” refers to a straight or branched C 1-8 alkyl group substituted by one or more halogen atoms which may be the same or different. Represents an alkyl group of, for example, fluoromethyl group, difluoromethyl group, trifluoromethyl group, chloromethyl group,
A bromomethyl group, a pentafluoroethyl group, a tetrafluoroethyl group and the like can be mentioned.

【0007】本発明の一般式(I) で表される無水フタル
酸類は、触媒量の酸性化合物の存在下に、一般式(II)で
表されるフタル酸類を不活性溶媒の存在したに脱水反応
することにより製造することができる。酸性化合物とし
ては、例えば硫酸、ポリリン酸、ベンゼンスルホン酸、
パラトルエンスルホン酸、メタンスルホン酸、トリフル
オロメタンスルホン酸、陽イオン交換樹脂などの酸を使
用することができ、好ましくはベンゼンスルホン酸、パ
ラトルエンスルホン酸、メタンスルホン酸などのスルホ
ン酸類を使用するのが良く、これらの酸性化合物は単独
で使用しても又は二種以上を混合して使用することもで
きる。
The phthalic anhydrides of the general formula (I) of the present invention can be obtained by dehydrating the phthalic acids of the general formula (II) in the presence of an inert solvent in the presence of a catalytic amount of an acidic compound. It can be produced by reacting. Examples of the acidic compound include sulfuric acid, polyphosphoric acid, benzenesulfonic acid,
Acids such as p-toluenesulfonic acid, methanesulfonic acid, trifluoromethanesulfonic acid, and cation exchange resin can be used.Preferably, sulfonic acids such as benzenesulfonic acid, paratoluenesulfonic acid, and methanesulfonic acid are used. These acidic compounds may be used alone or in combination of two or more.

【0008】酸性化合物の使用量は触媒量で良く、例え
ば一般式(II)で表されるフタル酸類に対して1/2 から1/
10000 の範囲で使用すれば良く、好ましくは1/10から1/
1000の範囲で使用することができる。本反応において
は、反応中に生成する水を除去する必要があるが、除去
の方法としては共沸脱水、 モレキュラーシーブスなどの
乾燥剤を使用する方法などを用いることができる。乾燥
剤としては、例えば塩化カルシウム、酸化カルシウム、
硫酸マグネシウム、シリカゲル、アルミナ、濃硫酸等を
例示することができる。
The amount of the acidic compound used may be a catalytic amount, for example, from 1/2 to 1 /
It may be used within the range of 10000, preferably 1/10 to 1 /
Can be used in the range of 1000. In this reaction, it is necessary to remove water generated during the reaction, and as a removing method, a method using a drying agent such as azeotropic dehydration or molecular sieves can be used. As a desiccant, for example, calcium chloride, calcium oxide,
Examples thereof include magnesium sulfate, silica gel, alumina, and concentrated sulfuric acid.

【0009】本反応の不活性溶媒としては、本反応を阻
害しなければ特に制限はないが、例えばトルエン、クロ
ロベンゼン等の芳香族系溶媒、クロロホルム等のハロゲ
ン化炭化水素系溶媒、ジオキサン等のエーテル系溶媒、
アセトニトリル等のニトリル系溶媒等の不活性溶媒が使
用でき、これらの溶媒は単独で、又は二種以上を混合し
て使用することもできる。本反応の温度は溶媒の沸点域
で行えば良いが、好ましくは50〜150℃の範囲であ
る。
The inert solvent for this reaction is not particularly limited as long as it does not inhibit this reaction. Examples thereof include aromatic solvents such as toluene and chlorobenzene, halogenated hydrocarbon solvents such as chloroform, and ethers such as dioxane. System solvent,
An inert solvent such as a nitrile solvent such as acetonitrile can be used, and these solvents can be used alone or in combination of two or more. The reaction may be performed at a temperature within the boiling range of the solvent, but is preferably in the range of 50 to 150 ° C.

【0010】[0010]

【実施例】以下に本発明の代表的な実施例をあげて具体
的に説明するが、本発明はこれらに限定されるものでは
ない。 (製造例1)50mlガラス製反応器にトルエン25m
l、フタル酸5g(30ミリモル)及びパラトルエンス
ルホン酸一水和物0.2gを加え、5時間攪拌下に還流
させた。この際、還流液は5gのモレキュラシーブス4
Aを充填した乾燥管を通じて反応系に戻し連続脱水し
た。反応終了後、不溶物をろ別し溶媒を減圧下で留去し
て4.2gの無水フタル酸を得た。収率95%
EXAMPLES The present invention will be described in detail below with reference to typical examples, but the present invention is not limited to these examples. (Production Example 1) Toluene 25 m in a 50 ml glass reactor
1, 5 g (30 mmol) of phthalic acid and 0.2 g of paratoluenesulfonic acid monohydrate were added, and the mixture was refluxed for 5 hours while stirring. At this time, the reflux liquid was 5 g of molecular sieves 4
The solution was returned to the reaction system through a drying tube filled with A and continuously dehydrated. After completion of the reaction, insolubles were filtered off and the solvent was distilled off under reduced pressure to obtain 4.2 g of phthalic anhydride. 95% yield

【0011】(製造例2〜3)製造例1と同様にし、原
料化合物のフタル酸類をかえて反応させた。 (製造例4〜5)触媒をトリフルオロメタンスルホン酸
にかえて製造例1と同様にして反応させた。 (製造例6〜9)触媒をかえ、製造例1と同様にして反
応させた。 (製造例10〜11)溶媒をかえ、製造例1と同様にし
て反応させた。示した。 (比較例)触媒(酸性化合物)を使用せず、他の反応条
件は実施例1と同様に行った。
(Production Examples 2 and 3) In the same manner as in Production Example 1, the reaction was carried out by changing the phthalic acid as the starting compound. (Production Examples 4 and 5) The reaction was carried out in the same manner as in Production Example 1 except that the catalyst was changed to trifluoromethanesulfonic acid. (Production Examples 6 to 9) The reaction was carried out in the same manner as in Production Example 1 except that the catalyst was changed. (Production Examples 10 to 11) The reaction was carried out in the same manner as in Production Example 1 except that the solvent was changed. Indicated. (Comparative Example) The reaction was carried out in the same manner as in Example 1 except that no catalyst (acid compound) was used.

【0012】製造例2〜11及び比較例の製造条件及び
結果を第1表に示す。尚、表中、「触媒(wt%)」
は、触媒添加量が重量%であることを示し、「TsO
H」はパラトルエンスルホン酸を、「Toluene」
とはトルエンを、「Dioxane」はジオキサンを、
「PPA」はポリリン酸を、「MCB」はモノクロロベ
ンゼンを、「MS−4A」は脱水剤にモレキュラーシー
ブス4Aを用いていることを示す。
The production conditions and results of Production Examples 2 to 11 and Comparative Example are shown in Table 1. In the table, "catalyst (wt%)"
Indicates that the catalyst addition amount is% by weight, and "TsO
"H" stands for paratoluenesulfonic acid and "Toluene"
Means toluene, "Dioxane" means dioxane,
"PPA" indicates polyphosphoric acid, "MCB" indicates monochlorobenzene, and "MS-4A" indicates that molecular sieves 4A is used as a dehydrating agent.

【0013】 第1表 ──────────────────────────────── 製造例 フタル酸類 触媒(wt%) 溶媒 脱水法 収率(%) ──────────────────────────────── 2 4-(CH3)C6H3(COOH)2 TsOH(2) Toluene MS-4A 95 3 3-(I)C6H3(COOH)2 TsOH(2) Toluene MS-4A 92 4 4,5-(Cl)2C6H2(COOH)2 CF3SO3H(2) Toluene MS-4A 80 5 3-(NO2)C6H3(COOH)2 CF3SO3H(2) Toluene MS-4A 25 6 3-(I)C6H3(COOH)2 PPA(2) Toluene MS-4A 26 7 3-(I)C6H3(COOH)2 H2SO4(2) Toluene MS-4A 54 8 3-(I)C6H3(COOH)2 CH3SO3H(2) Toluene MS-4A 92 9 3-(I)C6H3(COOH)2 TsOH(2) CH3CN MS-4A 32 10 3-(I)C6H3(COOH)2 TsOH(2) Dioxane MS-4A 43 11 3-(I)C6H3(COOH)2 TsOH(2) MCB MS-4A 91 比較例 3-(I)C6H3(COOH)2 − Toluene MS-4A 7 ────────────────────────────────Table 1 Preparation Example Phthalic acid Catalyst (wt%) Solvent Dehydration method Yield (%) ──────────────────────────────── 2 4- (CH 3 ) C 6 H 3 (COOH ) 2 TsOH (2) Toluene MS-4A 95 3 3- (I) C 6 H 3 (COOH) 2 TsOH (2) Toluene MS-4A 92 4 4,5- (Cl) 2 C 6 H 2 (COOH) 2 CF 3 SO 3 H (2) Toluene MS-4A 80 5 3- (NO 2 ) C 6 H 3 (COOH) 2 CF 3 SO 3 H (2) Toluene MS-4A 25 6 3- (I) C 6 H 3 (COOH) 2 PPA (2) Toluene MS-4A 26 7 3- (I) C 6 H 3 (COOH) 2 H 2 SO 4 (2) Toluene MS-4A 54 8 3- (I) C 6 H 3 (COOH) 2 CH 3 SO 3 H (2) Toluene MS-4A 92 9 3- (I) C 6 H 3 (COOH) 2 TsOH (2) CH 3 CN MS-4A 32 10 3- (I) C 6 H 3 (COOH) 2 TsOH (2) Dioxane MS-4A 43 11 3- (I) C 6 H 3 (COOH) 2 TsOH (2) MCB MS-4A 91 Comparative Example 3- (I) C 6 H 3 (COOH) 2 − Toluene MS-4A 7 ────────────────────────────────

【0014】第2表に上記製造法により得られた化合物
の物性を示す。 第2表 ──────────────────────────────── 物性 実施例番号 1H-NMRδ値(ppm) ;溶媒 融点mp (℃) ──────────────────────────────── 2 2.57(s,3H) 7.69(d,1H) 7.79(s,1H) 7.88(d,1H) ;CDCl3 mp 85-86℃ 3 7.66(t,1H) 8.06(d,1H) 8.38(d,1H) ;DMSO-d6 mp 163-164℃ 4 8.10ppm(s) :CDCl3 mp 183-184℃ ────────────────────────────────
Table 2 shows the physical properties of the compounds obtained by the above production methods. Table 2 Physical Properties Example No. 1 H-NMR δ value (ppm); Solvent Melting point mp (℃) ────────────────────────────────2 2.57 (s, 3H) 7.69 (d, 1H) 7.79 (s, 1H) 7.88 (d, 1H); CDCl 3 mp 85-86 ℃ 3 7.66 (t, 1H) 8.06 (d, 1H) 8.38 (d, 1H); DMSO-d 6 mp 163-164 ℃ 4 8.10 ppm (s): CDCl 3 mp 183-184 ℃ ────────────────────────────────

【0015】(製造例15)ディーンスターク(Dean-S
tark)管を付した50mlガラス製反応器にクロロベン
ゼン25ml、3−ヨードフタル酸5g(17ミリモ
ル)及びp−トルエンスルホン酸一水和物0.05gを
加え、5時間攪拌しながら還流させた。反応終了後、不
溶物をろ別し溶媒を減圧下で留去して4.5gの無水3
−ヨードフタル酸を得た。収率96%
(Production Example 15) Dean-Stark (Dean-S)
25 ml of chlorobenzene, 5 g (17 mmol) of 3-iodophthalic acid and 0.05 g of p-toluenesulfonic acid monohydrate were added to a 50 ml glass reactor equipped with a tark tube, and the mixture was refluxed with stirring for 5 hours. After completion of the reaction, insolubles were filtered off and the solvent was distilled off under reduced pressure to obtain 4.5 g of anhydrous 3
-Iodophthalic acid was obtained. 96% yield

【0016】[0016]

【発明の効果】本発明の製造方法はプロセス的に簡便
で、効率的で、温和な条件下で、且つ安価に無水フタル
酸類を製造でき、しかも後処理が簡便な製造方法であ
る。
The production method of the present invention is a production method which is simple in terms of process, is efficient, can produce phthalic anhydrides under mild conditions and at low cost, and is simple in post-treatment.

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 一般式(II); 【化1】 (式中、Rは同一又は異なっても良く、水素原子、ハロ
ゲン原子、ニトロ基、シアノ基、 C1-C20アルキル基、
ハロ C1-C8アルキル基、C1-C20アルコキシ基、ハロ C1-
C8アルコキシ基、C1-C20アルキルチオ基、ハロ C1-C8
ルキルチオ基、フェニル基又は同一若しくは異なっても
良く、ハロゲン原子、 C1-C6アルキル基、ハロ C1-C6
ルキル基又は C1-C6アルコキシ基から選択される1以上
の置換基を有する置換フェニル基を示し、nは0〜4の
整数を示す。又、Rは隣接する炭素原子と一緒になって
C4アルケニレン基又は C1-C2アルキレンジオキシ基を示
すこともできる。)で表されるフタル酸類を不活性溶媒
中、触媒量の酸性化合物の存在下に脱水反応することを
特徴とする一般式(I) ; 【化2】 (式中、R及びnは前記に同じ。)で表される無水フタ
ル酸類の製造方法。
1. A compound of the general formula (II): (Wherein R may be the same or different, and represents a hydrogen atom, a halogen atom, a nitro group, a cyano group, a C 1 -C 20 alkyl group,
Halo C 1 -C 8 alkyl group, C 1 -C 20 alkoxy group, halo C 1-
C 8 alkoxy group, C 1 -C 20 alkylthio group, halo C 1 -C 8 alkylthio group, phenyl group or may be the same or different, halogen atom, C 1 -C 6 alkyl group, halo C 1 -C 6 alkyl A substituted phenyl group having one or more substituents selected from a group or a C 1 -C 6 alkoxy group, and n represents an integer of 0-4. R together with adjacent carbon atoms
It can also represent a C 4 alkenylene group or a C 1 -C 2 alkylenedioxy group. Wherein the phthalic acid represented by the general formula (I) is dehydrated in an inert solvent in the presence of a catalytic amount of an acidic compound; (Wherein, R and n are the same as described above).
【請求項2】 酸性化合物がスルホン酸類である請求項
1記載の製造方法。
2. The method according to claim 1, wherein the acidic compound is a sulfonic acid.
【請求項3】 スルホン酸類がパラトルエンスルホン酸
である請求項2記載の製造方法。
3. The method according to claim 2, wherein the sulfonic acid is paratoluenesulfonic acid.
【請求項4】 脱水反応が共沸脱水反応である請求項1
乃至3のいずれか1項記載の製造方法。
4. The method according to claim 1, wherein the dehydration reaction is an azeotropic dehydration reaction.
The method according to any one of claims 1 to 3.
【請求項5】 脱水反応が乾燥剤を使用する脱水反応で
ある請求項1乃至3のいずれか1項記載の製造方法。
5. The production method according to claim 1, wherein the dehydration reaction is a dehydration reaction using a desiccant.
JP2000160359A 2000-05-30 2000-05-30 Method for producing phthalic anhydride Pending JP2001335571A (en)

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004111026A1 (en) * 2003-06-17 2004-12-23 Nippon Shokubai Co., Ltd. Bis (fluorine-containing phthalic anhydride) and method for production thereof
JP2005029572A (en) * 2003-06-17 2005-02-03 Nippon Shokubai Co Ltd Bis(fluorine-containing phthalic anhydride) and method for production thereof
JP2010168395A (en) * 2003-06-17 2010-08-05 Nippon Shokubai Co Ltd Intermediate raw material
WO2010103976A1 (en) * 2009-03-11 2010-09-16 国立大学法人名古屋大学 Process for producing carboxylic anhydride, and arylboronic acid compound
CN105330634A (en) * 2015-12-07 2016-02-17 济南轩鸿生物医药有限公司 One-pot method for preparing 3-hydroxyphtalic anhydride
WO2017217741A1 (en) * 2016-06-13 2017-12-21 서울대학교 산학협력단 Novel brominated furanone derivative, method for preparing same, and pharmaceutical composition containing same as active ingredient
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Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004111026A1 (en) * 2003-06-17 2004-12-23 Nippon Shokubai Co., Ltd. Bis (fluorine-containing phthalic anhydride) and method for production thereof
JP2005029572A (en) * 2003-06-17 2005-02-03 Nippon Shokubai Co Ltd Bis(fluorine-containing phthalic anhydride) and method for production thereof
US7700647B2 (en) 2003-06-17 2010-04-20 Nippon Shokubai Co., Ltd. Fluorinated bis (phthalic anhydride) and method for producing the same
JP2010168395A (en) * 2003-06-17 2010-08-05 Nippon Shokubai Co Ltd Intermediate raw material
JP4541774B2 (en) * 2003-06-17 2010-09-08 株式会社日本触媒 Method for producing bis-fluorinated phthalic anhydride
WO2010103976A1 (en) * 2009-03-11 2010-09-16 国立大学法人名古屋大学 Process for producing carboxylic anhydride, and arylboronic acid compound
US8735582B2 (en) 2009-03-11 2014-05-27 National University Corporation Nagoya University Method for producing carboxylic anhydride and arylboronic acid compound
JP5747330B2 (en) * 2009-03-11 2015-07-15 国立大学法人名古屋大学 Method for producing carboxylic anhydride and arylboronic acid compound
CN105330634A (en) * 2015-12-07 2016-02-17 济南轩鸿生物医药有限公司 One-pot method for preparing 3-hydroxyphtalic anhydride
WO2017217741A1 (en) * 2016-06-13 2017-12-21 서울대학교 산학협력단 Novel brominated furanone derivative, method for preparing same, and pharmaceutical composition containing same as active ingredient
US11021455B2 (en) 2016-06-13 2021-06-01 Seoul National University R&Db Foundation Brominated furanone derivative, method for preparing same, and pharmaceutical composition containing same as active ingredient
CN114213372A (en) * 2021-12-20 2022-03-22 浙江工业大学 Catalytic synthesis method of anhydride
CN114213372B (en) * 2021-12-20 2023-03-14 浙江工业大学 Catalytic synthesis method of anhydride

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