JP2001313464A - Evaluation substrate, evaluation device and evaluating method for wettability of brazing material electrode - Google Patents

Evaluation substrate, evaluation device and evaluating method for wettability of brazing material electrode

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Publication number
JP2001313464A
JP2001313464A JP2000130558A JP2000130558A JP2001313464A JP 2001313464 A JP2001313464 A JP 2001313464A JP 2000130558 A JP2000130558 A JP 2000130558A JP 2000130558 A JP2000130558 A JP 2000130558A JP 2001313464 A JP2001313464 A JP 2001313464A
Authority
JP
Japan
Prior art keywords
wettability
electrode
substrate
evaluation
brazing material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000130558A
Other languages
Japanese (ja)
Inventor
Yoshiki Fukuda
圭基 福田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP2000130558A priority Critical patent/JP2001313464A/en
Publication of JP2001313464A publication Critical patent/JP2001313464A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a substrate, device and method for evaluating by which the solder wettability of a connection electrode of an electronic component with a solder ball as a connection electrode, e.g. such as a BGA can be evaluated readily under a safe environment and with high reliability. SOLUTION: Through holes 14 are formed on a tabular base material 11, and a metal film 14a is formed on the inner wall of each through-hole. At the same time, metal electrodes 12 and 13 are formed on both upper and lower surfaces of each through-hole, and an evaluation substrate 10 for solder balls 15 is produced. The metal electrodes of the evaluation substrate and solder balls of a BGA component 104 are heated, in a state where they abut against each other to melt and re-solidify. After that, the copper electrode 13 side on the backside of the evaluation substrate 10 is observed to determine the wettability of the solder (Refer to Fig. 3).

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、ろう付け材電極の
濡れ性評価基板、これを用いる評価装置および評価方法
に関し、特に半田ボールを固着したBGA部品における
半田濡れ性を評価する場合に好適な、ろう付け材電極の
濡れ性評価基板、評価装置および評価方法に関するもの
である。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate for evaluating the wettability of a brazing material electrode, an evaluation device and an evaluation method using the same, and particularly suitable for evaluating the solder wettability of a BGA component to which a solder ball is fixed. The present invention relates to a substrate for evaluating wettability of a brazing material electrode, an evaluation device, and an evaluation method.

【0002】[0002]

【従来の技術】近年、電子機器の小型軽量化の流れは益
々著しくなってきた。使用される電子部品、特に半導体
部品(半導体集積回路装置)に関しては、高機能集積
化,信号処理の高速化,メモリ容量の増大といった性能
のトレンドに対して、部品容積を小さく抑える為の努力
がなされ、基板上での部品実装面積を小さく抑えるため
の努力がなされている。
2. Description of the Related Art In recent years, the trend of reducing the size and weight of electronic equipment has become increasingly significant. With regard to electronic components used, especially semiconductor components (semiconductor integrated circuit devices), efforts are being made to keep component volumes small in response to performance trends such as high-performance integration, faster signal processing, and increased memory capacity. Efforts have been made to keep the component mounting area on the board small.

【0003】従来は半導体部品のパッケージ形状として
例えばQFP(Quad F1at Package)の様に、接続対象
のマザー基板(図6参照)への接続用電極(部品電極)
をパッケージ側面からガルウィング状に引き出したもの
が多かったが、近年は、前記部品電極をBGA(Ba11 G
rid Array )やLGA(Land Grid Array ),LCC
(Lead1ess Chip Carrier ),QFN(Quad F1at No l
ead Package )の様に、パッケージの下面または側面に
配置したものが多用される様になってきた。その理由
は、かかる構成の半導体部品を使うことにより、マザー
基板上に当該半導体部品を半田付け等の手法により実装
する際における、半導体部品の占有面積を格段に小型化
し得るからであり、電気配線を短く出来得るため、回路
の電気特性が向上するからである。
Conventionally, a connection electrode (component electrode) for connecting to a mother board (see FIG. 6) to be connected, such as a QFP (Quad F1at Package) as a package shape of a semiconductor component.
In many cases, the component electrodes were pulled out from the side of the package in a gull wing shape.
rid Array), LGA (Land Grid Array), LCC
(Lead1ess Chip Carrier), QFN (Quad F1at Nol)
e.g., ead Package), which are disposed on the lower surface or the side surface of the package, has come to be used frequently. The reason for this is that the use of the semiconductor component having such a configuration makes it possible to significantly reduce the area occupied by the semiconductor component when the semiconductor component is mounted on the mother board by a method such as soldering. Can be shortened, and the electrical characteristics of the circuit are improved.

【0004】BGAやLGAの様に下面に接続用電極を
備えた部品(下面電極部品)をマザー基板へ実装する際
には、図6(a)〜(d)に示すように、マザー基板1
01の電極102上にソルダーペースト103を印刷
し、このソルダーぺースト上に部品側の接続用電極が載
る状態でBGA部品104等の部品を搭載し、リフロー
装置等の加熱装置を用いて半田を一括して溶融・再凝固
させることにより、電気的・機械的に部品とマザー基板
とを接続する方法が一般的に用いられている。
[0006] When mounting a component having a connection electrode on the lower surface (lower electrode component), such as BGA or LGA, on the mother substrate, as shown in FIGS.
The solder paste 103 is printed on the electrode 102 of No. 01, a component such as the BGA component 104 is mounted on the solder paste with the connection electrode on the component side mounted thereon, and solder is applied by using a heating device such as a reflow device. In general, a method of electrically and mechanically connecting a component and a mother board by melting and re-solidifying in a lump is generally used.

【0005】しかしながら、大気中での長期間の保管に
より部品電極の表面に酸化皮膜が出来ていたり、BGA
等の部品製造工程において異物が付着していたりする様
な場合には、電極の濡れ性が低下し、上述のリフロー後
に、電気的・機械的な接続が不完全となる。これは製造
現場での不良に止まらない。接触したり、接触しなかっ
たりといった不完全接続が製造現場で検出できぬままに
市場へと製品が出荷された場合には、消費者の使用中に
由々しき事態をもたらすことになる。従って、部品電極
表面の半田濡れ性を調べることは非常に重要であり、特
に、半田ボールを電極としたBGAの様な部品について
は、従来半田濡れ性を直接に調べる方法が無く、その評
価方法・装置が望まれていた。
However, an oxide film is formed on the surface of the component electrode due to long-term storage in the air,
In the case where a foreign matter is attached in a component manufacturing process such as that described above, the wettability of the electrode is reduced, and the electrical and mechanical connection becomes incomplete after the above-mentioned reflow. This is not just a defect at the manufacturing site. If a product is shipped to the market without an imperfect connection, such as touching or no touching, being detected at the manufacturing site, this can lead to significant consequences during consumer use. Therefore, it is very important to examine the solder wettability of the component electrode surface. In particular, for a component such as a BGA using a solder ball as an electrode, there is no conventional method for directly examining the solder wettability.・ A device was desired.

【0006】従来例を具体的に説明する。アキシャル,
ラジアルのリード部品や、チップ抵抗等の表面実装部品
といった、電極数の少ない部品の電極における半田濡れ
性に関しては、溶融半田浴に浸漬させ、メニスカス法を
用いてその濡れ挙動を捉える方法により、評価すること
が行われてきた。例えば、特開平7−83804号公報
の「半田付け性試験装置」が挙げられる。
A conventional example will be specifically described. Axial,
The solder wettability of electrodes with a small number of electrodes, such as radial lead components and surface-mounted components such as chip resistors, is evaluated by immersing the electrodes in a molten solder bath and using the meniscus method to capture the wetting behavior. That has been done. For example, there is a "solderability test apparatus" disclosed in JP-A-7-83804.

【0007】また、基板に半田付けしたエリアアレイ型
部品、特にBGAなどの電子部品に関しては、特開平4
−359447号公報の「半導体装置のハンダ接合部検
査装置」に見られる様に、エックス線透過画像の濃淡を
調べる方法や、特開平9−89536号公報の「BGA
接合部検査装置及び方法」に見られる様に、マザー基板
に部品を実装した後で、赤外領域波長の光を用いて半田
付け状態を判断する方法が挙げられる。
[0007] Further, regarding an area array type component soldered to a substrate, especially an electronic component such as a BGA, Japanese Patent Laid-Open No.
Japanese Patent Application Laid-Open No. Hei 9-89536 discloses a method for examining the density of an X-ray transmission image, as disclosed in Japanese Patent Application Laid-Open No. 9-89536.
And a method of judging the soldering state by using light in the infrared region wavelength after mounting the component on the motherboard.

【0008】[0008]

【発明が解決しようとする課題】しかしながら、前記特
開平7−83804号公報の方法では、部品電極への半
田供給量が一定でないこと、及び複数のサンプルを評価
している間に、部品電極の溶け込みや継続加熱による酸
化物生成等により、半田浴の金属組成が変化し、正確な
評価を継続することが難しい。更に部品下面または側面
に多数の電極をもつ部品、例えば、BGA,LGA,L
CC,QFN等の部品については、部品全体を一度に半
田浴に浸漬し、部品全体の濡れ性の平均的な値を求める
ことは可能であったが、一枚の部品上における個々の電
極の漏れ性を調べることは出来なかった。特にBGAの
場合には、電極として、部品に予め半田ボールが固着さ
れており、部品電極の半田と浴の半田の混入が起こる
為、半田浴を用いた濡れ性評価方法は適切とは言えず、
新たな評価方法が望まれていた。
However, according to the method disclosed in Japanese Patent Laid-Open No. 7-83804, the amount of solder supplied to the component electrode is not constant, and the evaluation of the component electrode during the evaluation of a plurality of samples. The metal composition of the solder bath changes due to the formation of oxides due to melting or continuous heating, and it is difficult to continue accurate evaluation. Further, a component having a large number of electrodes on the bottom or side surface of the component, for example, BGA, LGA, L
For components such as CC and QFN, it was possible to immerse the entire component in a solder bath at a time and determine the average value of the wettability of the entire component. Leakability could not be determined. In particular, in the case of BGA, the solder ball is fixed to the component in advance as an electrode, and the solder of the component electrode and the solder of the bath are mixed, so that the wettability evaluation method using the solder bath cannot be said to be appropriate. ,
A new evaluation method was desired.

【0009】また、前記特開平4−359447号公
報,特開平9−89536号公報の装置・方法では、エ
ックス線や赤外線の照射および撮像装置が大型で高価な
点、作業者の健康維持面からエックス線装置や赤外線装
置の安全管理・保守を厳重に行う必要があるという問題
があり、また半導体パッケージに内藏されるチップの部
分では、エックス線や赤外線の透過量が減少する為、全
ての半田接合部について正確に半田付け状態を観察する
ことが難しいという、欠点があった。
Further, in the apparatus and method disclosed in JP-A-4-35947 and JP-A-9-89536, the X-ray and infrared irradiation and the imaging apparatus are large and expensive, and the X-rays are required to maintain the health of workers. There is a problem that the safety management and maintenance of the device and the infrared device must be strictly performed, and in the chip part embedded in the semiconductor package, the amount of transmission of X-rays and infrared rays decreases, so all solder joints Has a drawback that it is difficult to observe the soldering state accurately.

【0010】そこで本発明の課題は、例えばBGAのよ
うに半田ボールを接続用電極として備えた電子部品に対
して、安全な環境下で接続用電極の半田濡れ性を簡易
に、かつ高い信頼性の下に評価可能な評価基板、これを
用いる評価装置および評価方法を提供することである。
Accordingly, an object of the present invention is to provide a simple and highly reliable solder wettability of a connection electrode in a safe environment for an electronic component having a solder ball as a connection electrode such as a BGA. It is an object of the present invention to provide an evaluation board which can be evaluated under the following conditions, an evaluation apparatus and an evaluation method using the same.

【0011】[0011]

【課題を解決するための手段】前記課題を解決するため
に請求項1記載の発明は、平板状の基材にスルーホール
を形成し、該スルーホール内壁に金属膜を形成すると共
に、該スルーホール上下両面に金属電極を形成してなる
ことを特徴とするろう付け材電極の濡れ性評価基板であ
る。
According to a first aspect of the present invention, a through hole is formed in a flat base material, a metal film is formed on an inner wall of the through hole, and the through hole is formed. A brazing material electrode wettability evaluation substrate, wherein metal electrodes are formed on both upper and lower surfaces of a hole.

【0012】また、請求項2記載の発明は、前記基材に
形成したスルーホールが、複数からなることを特徴とす
るろう付け材電極の濡れ性評価基板である。
The invention according to claim 2 is a substrate for evaluating wettability of a brazing material electrode, wherein a plurality of through holes are formed in the base material.

【0013】請求項1記載のろう付け材電極の濡れ性評
価基板では、例えば図1に示す評価基板10のように、
平板状の基材11にスルーホール14を形成し、該スル
ーホール14の内壁に金属膜として銅めっき14aを形
成すると共に、該スルーホール14の上下両面に金属電
極として銅電極12,13を形成する。
In the substrate for evaluating the wettability of the brazing material electrode according to the first aspect, for example, an evaluation substrate 10 shown in FIG.
A through hole 14 is formed in a flat base material 11, copper plating 14 a is formed as a metal film on the inner wall of the through hole 14, and copper electrodes 12 and 13 are formed as metal electrodes on both upper and lower surfaces of the through hole 14. I do.

【0014】また、請求項3記載の発明は、請求項1又
は2に記載の濡れ性評価基板を用いる、ろう付け材電極
の濡れ性評価装置であって、ろう付け材を予め表面に固
着したろう付け対象部材を載置するろう付け対象部材載
置手段と、前記濡れ性評価基板を載置する濡れ性評価基
板載置手段と、前記ろう付け対象部材のろう付け材を前
記濡れ性評価基板の表面電極に当接させる当接手段と、
該当接状態のろう付け対象部材と濡れ性評価基板とを加
熱してろう付け材を溶融する加熱手段と、該加熱手段で
加熱後の濡れ性評価基板の裏面電極を観察する観察手段
とを備えたことを特徴とするろう付け材電極の濡れ性評
価装置である。
According to a third aspect of the present invention, there is provided an apparatus for evaluating the wettability of a brazing material electrode using the wettability evaluation substrate according to the first or second aspect, wherein the brazing material is fixed to the surface in advance. A brazing target member mounting unit for mounting the brazing target member, a wettability evaluation substrate mounting unit for mounting the wettability evaluation substrate, and the brazing material of the brazing target member to the wettability evaluation substrate Contact means for contacting the surface electrode of
Heating means for heating the brazing target member and the wettability evaluation substrate in the corresponding contact state to melt the brazing material, and observation means for observing the back electrode of the wettability evaluation substrate after heating by the heating means. An apparatus for evaluating wettability of a brazing material electrode.

【0015】請求項3記載のろう付け材電極の濡れ性評
価装置では、例えば図4に示す濡れ性評価装置20のよ
うに(図2、図5をも参照)、ろう付け材としての半田
ボール15を予め表面に固着したBGA部品104(ろ
う付け対象部材)を載置する可動式ステージ21と、濡
れ性評価基板載置手段としての基板ホルダ22と、半田
ボール15を評価基板10の表面電極に当接させる当接
手段としての、可動式ステージ21および部品吸着装置
26と、該当接状態のBGA部品104と評価基板10
とを加熱して半田ボール15を溶融する加熱装置27
と、該加熱装置で加熱後の評価基板10の裏面電極を観
察するカメラ部24とを配備する。
In the apparatus for evaluating the wettability of a brazing material electrode according to a third aspect of the present invention, a solder ball as a brazing material is used as in a wettability evaluating apparatus 20 shown in FIG. 4 (see also FIGS. 2 and 5). A movable stage 21 for mounting a BGA component 104 (a member to be brazed) to which a surface 15 is fixed in advance, a substrate holder 22 as a wettability evaluation substrate mounting means, and a solder ball 15 are connected to a surface electrode of the evaluation substrate 10. Stage 21 and component suction device 26 as contact means for contacting the BGA component 104 and the evaluation board 10
Heating device 27 that heats solder balls 15 by heating
And a camera unit 24 for observing the back surface electrode of the evaluation substrate 10 heated by the heating device.

【0016】また、請求項4記載の発明は、請求項1又
は2に記載の濡れ性評価基板を用いる、ろう付け材電極
の濡れ性評価方法であって、ろう付け材を予め表面に固
着したろう付け対象部材を用意する工程と、前記濡れ性
評価基板を用意する工程と、前記ろう付け対象部材のろ
う付け材を前記濡れ性評価基板の表面電極に当接させる
工程と、該当接状態のろう付け対象部材と濡れ性評価基
板とを加熱する工程と、該加熱後に前記濡れ性評価基板
の裏面電極のろう付け濡れ性を観察する工程とを備えた
ことを特徴とするろう付け材電極の濡れ性評価方法であ
る。
According to a fourth aspect of the present invention, there is provided a method for evaluating the wettability of a brazing material electrode using the wettability evaluating substrate according to the first or second aspect, wherein the brazing material is fixed to the surface in advance. A step of preparing a brazing target member; a step of preparing the wettability evaluation substrate; and a step of bringing a brazing material of the brazing target member into contact with a surface electrode of the wettability evaluation substrate. A step of heating the brazing target member and the wettability evaluation substrate, and a step of observing the brazing wettability of the back electrode of the wettability evaluation substrate after the heating. This is a wettability evaluation method.

【0017】上記濡れ性評価方法では、ろう付け材電極
の濡れ性評価基板として、例えば図1(A)〜(C)に
示した評価基板10を作製し、該評価基板10を濡れ性
評価装置20の基板ホルダ22に搭載する(図4参
照)。一方、ろう付け対象部材であるBGA部品104
を用意しておき、該BGA部品104を部品貯蔵部23
に搭載する。この状態を図4(a)の「基板認識時」と
して示す。以下評価装置10を動作させて、順次フラッ
クス塗布,部品吸着,部品マウントを行い、半田ボール
15を評価基板10の表面銅電極12に当接させる(図
2参照)。この状態で加熱装置27を用いて加熱し、半
田ボール15を溶融すると、溶融半田がスルーホール1
4内に、これを濡らしながら浸入する(図3参照)。
In the above wettability evaluation method, for example, an evaluation substrate 10 shown in FIGS. 1A to 1C is prepared as a wettability evaluation substrate for a brazing material electrode, and the evaluation substrate 10 is attached to a wettability evaluation apparatus. 20 is mounted on the substrate holder 22 (see FIG. 4). On the other hand, the BGA component 104 which is a member to be brazed
Are prepared, and the BGA component 104 is stored in the component storage unit 23.
To be mounted on. This state is shown as “at the time of board recognition” in FIG. Hereinafter, the evaluation device 10 is operated to sequentially perform flux application, component suction, and component mounting, and the solder balls 15 are brought into contact with the surface copper electrodes 12 of the evaluation substrate 10 (see FIG. 2). In this state, when the solder ball 15 is melted by heating using the heating device 27, the molten solder is
4 and while it is wet (see FIG. 3).

【0018】そして、半田ボール15の濡れ性が良好で
あれば、図3(A),(B)に示すように、溶融半田は
評価基板10の裏面側まで浸入し、更に評価基板の裏面
の銅電極13をも濡らす。逆に、半田ボールの濡れ性が
悪い場合は、溶融半田はスルーホールの途中で止まって
しまい、評価基板の裏面まで到達しない。従って、図3
(B)の状態をカメラ部24で観察すれば、その半田ボ
ールの濡れ性の度合を把握することができる。
If the wettability of the solder ball 15 is good, the molten solder penetrates to the back side of the evaluation board 10 as shown in FIGS. The copper electrode 13 is also wetted. Conversely, when the solder ball has poor wettability, the molten solder stops in the middle of the through-hole and does not reach the back surface of the evaluation board. Therefore, FIG.
By observing the state (B) with the camera unit 24, the degree of wettability of the solder ball can be grasped.

【0019】また、請求項5記載の発明は、板厚の異な
る複数の前記濡れ性評価基板を用意しておき、ろう付け
材の濡れ性の大小に応じて、前記濡れ性評価基板の板厚
を選択して半田濡れ性を評価することを特徴とするろう
付け材電極の濡れ性評価方法である。この濡れ性評価方
法では、ろう付け材(半田ボール)の濡れ性の大小に応
じて、評価基板10の板厚を選択するので、濡れ性の度
合を正確に測定することができる。
According to a fifth aspect of the present invention, a plurality of the wettability evaluation substrates having different thicknesses are prepared, and the thickness of the wettability evaluation substrate is determined according to the wettability of the brazing material. And evaluating the solder wettability of the brazing material electrode. In this wettability evaluation method, the thickness of the evaluation substrate 10 is selected according to the wettability of the brazing material (solder ball), so that the degree of wettability can be accurately measured.

【0020】[0020]

【発明の実施の形態】以下、本発明を図示の実施の形態
に基づいて説明する。なお既に説明した部分には同一符
号を付し、重複記載を省略する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to the illustrated embodiments. The parts already described are given the same reference numerals, and redundant description is omitted.

【0021】(1)原理説明 先ず、本発明の原理を、図面を参照しつつ説明する。図
1(A)は本発明に適用する評価基板10の平面図、図
1(B)はその側断面図、図1(C)は(B)の拡大図
である。
(1) Explanation of Principle First, the principle of the present invention will be described with reference to the drawings. 1A is a plan view of an evaluation substrate 10 applied to the present invention, FIG. 1B is a side sectional view thereof, and FIG. 1C is an enlarged view of FIG.

【0022】例えばBGA等における部品電極の評価を
行う為の評価基板10は、有機材料からなる基材11、
例えばガラスエポキシ製基材の表裏に、「金属電極」で
ある銅電極12,13を設け、これら表裏の電極同士
を、基材11に形成された貫通孔に銅メッキ14aを施
したスルーホール14により導通させる。通常、BGA
部品における表裏の電極は規定間隔で設けられているの
で、これらの電極12,13およびスルーホール14
を、評価基板10上に格子状に多数配置しておくこと
で、一種類の評価基板10により特定の電極数のBGA
部品に止まらず、種々の電極数のBGA部品に、この評
価基板を使用することが可能である。
For example, an evaluation substrate 10 for evaluating component electrodes in a BGA or the like includes a base material 11 made of an organic material,
For example, copper electrodes 12 and 13 that are “metal electrodes” are provided on the front and back of a glass epoxy base material, and these front and back electrodes are connected to each other by a through hole 14 in which a through hole formed in the base material 11 is plated with copper 14 a. To conduct. Usually BGA
Since the electrodes on the front and back of the component are provided at regular intervals, these electrodes 12 and 13 and the through holes 14 are provided.
Are arranged in a grid on the evaluation board 10 so that a single type of evaluation board 10 can
This evaluation board can be used not only for components but also for BGA components having various numbers of electrodes.

【0023】図2(A)は、評価基板10上に「ろう付
け対象部材」であるBGA部品104を搭載した状態
(加熱前)を示す平面図であり、符号15は「ろう付け
材」としての半田ボールである。なお、本明細書では溶
融前を半田ボール15と称し、溶融後を半田ボール電極
15Aと称する(図3参照)。
FIG. 2A is a plan view showing a state (before heating) in which the BGA component 104, which is a “member to be brazed”, is mounted on the evaluation board 10, and reference numeral 15 denotes “brazing material”. Solder balls. In this specification, the portion before melting is referred to as a solder ball 15, and the portion after melting is referred to as a solder ball electrode 15A (see FIG. 3).

【0024】次に、評価基板10を用いてBGA部品に
おける半田ボール電極の濡れ性評価を行う場合について
説明する。濡れ性が良好な半田ボール電極の場合には、
一定時間の加熱により半田ボール15が溶融してスルー
ホール14を充填し、溶融した半田は更に評価基板10
の裏面の銅電極13に漏れ広がる為、この濡れ広がり度
合について裏面から目視観察を行うことにより、半田ボ
ール電極の濡れ性評価を行うことが可能である。
Next, a case where the wettability of the solder ball electrode in the BGA component is evaluated using the evaluation board 10 will be described. For solder ball electrodes with good wettability,
The heating for a certain period of time causes the solder balls 15 to melt and fill the through holes 14, and the melted solder is further applied to the evaluation board 10.
Of the solder ball electrode can be evaluated by visually observing the degree of the wetting spread from the back surface.

【0025】BGA部品の電極間隔は、1.27mm、
1.00mm、0.80mm、0.50mmなど様々で
あるが、例えば電極間隔0.80mmピッチのBGA部
品では、電極としての半田ボールの直径が0.50mm
程度のものが用いられる為、その半田ボール1個当りの
容積は0.065mm3 程度になる。この場合の評価基
板の板厚およびスルーホール内径は、各々例えば0.6
0mm程度、0.25mm程度が望ましい。
The electrode spacing of the BGA component is 1.27 mm,
There are various types such as 1.00 mm, 0.80 mm, and 0.50 mm. For example, in a BGA component having a pitch of 0.80 mm between electrodes, the diameter of a solder ball as an electrode is 0.50 mm.
Therefore, the volume per solder ball is about 0.065 mm 3 . In this case, the thickness of the evaluation board and the inner diameter of the through hole are each, for example, 0.6
About 0 mm and about 0.25 mm are desirable.

【0026】図3(A)(a)〜(d)に示すように、
外径が例えば0.3mm〜0.6mmの基板表面の銅電
極12に対してフラックスを塗布した後(図3(A)
(b))、その上にBGA部品104における半田ボー
ル15を搭載し(図3(A)(c))、引き続いて加熱
手段によって半田を溶融・再凝固させる(図3(A)
(d))。半田ボール電極15Aの濡れ性が良い場合に
は、半田ボール15は溶融した際に球形を崩してスルー
ホール14内に流れ込み、内壁の銅めっき14aも十分
に半田で濡らし、スルーホール14を充填した後、更に
基板裏面の銅電極13に到達してきれいに濡れ広がる
(図3(B)−(1))。これに対し、半田ボール電極
15Aの濡れ性が悪い場合には、スルーホール14内に
半田が十分に流れ込まず、内壁の銅めっき14aの半田
濡らしが不十分であり、基板裏面の銅電極13に到達し
ない(図3(B)−(2))。なお図3(B)は、図3
(A)(d)の下面図であって、半田ボール電極15A
を基板裏面側から見たものである。
As shown in FIGS. 3 (A) (a)-(d),
After applying a flux to the copper electrode 12 on the substrate surface having an outer diameter of, for example, 0.3 mm to 0.6 mm (FIG. 3A)
(B)), the solder balls 15 of the BGA component 104 are mounted thereon (FIGS. 3A and 3C), and the solder is subsequently melted and re-solidified by heating means (FIG. 3A).
(D)). When the solder ball electrode 15A has good wettability, the solder ball 15 breaks its sphere when melted and flows into the through-hole 14, the copper plating 14a on the inner wall is sufficiently wetted with the solder, and the through-hole 14 is filled. After that, it further reaches the copper electrode 13 on the back surface of the substrate and spreads cleanly (FIG. 3B- (1)). On the other hand, when the wettability of the solder ball electrode 15A is poor, the solder does not sufficiently flow into the through hole 14, the solder wetting of the copper plating 14a on the inner wall is insufficient, and It does not reach (FIG. 3 (B)-(2)). Note that FIG.
(A) It is a bottom view of (d), and shows solder ball electrode 15A.
Is viewed from the back side of the substrate.

【0027】一定時間加熱・再凝固した後に、スルーホ
ール14の半田による充填の有無を観察するか、または
基板裏面の銅電極13における半田の濡れ広がりを観察
することで、部品電極、即ち、半田ボール電極15Aの
濡れ性を判断することが可能である。さらに、基板裏面
の銅電極13の面積に対する、半田広がり面積の割合を
求めることで、半田ボールの濡れ性の良否を直接的に判
断することも可能となる。
After heating and re-solidification for a certain period of time, by observing whether or not the through hole 14 is filled with solder, or by observing the spread of the solder on the copper electrode 13 on the back surface of the substrate, the component electrode, ie, the solder It is possible to determine the wettability of the ball electrode 15A. Further, by determining the ratio of the spread area of the solder to the area of the copper electrode 13 on the back surface of the substrate, it is possible to directly determine whether the wettability of the solder ball is good or not.

【0028】(2)実施の形態 以下に、図面を参照しながら、本実施の形態の詳細を説
明する。図4および図5に、本実施の形態に適用する濡
れ性評価装置20と、これによる濡れ性評価方法を示
す。なお、図4は濡れ性評価工程の前半を、図5はその
後半をそれぞれ示している。
(2) Embodiment Hereinafter, the present embodiment will be described in detail with reference to the drawings. 4 and 5 show a wettability evaluation apparatus 20 applied to the present embodiment and a wettability evaluation method using the same. FIG. 4 shows the first half of the wettability evaluation step, and FIG. 5 shows the latter half.

【0029】図4のように、可動式ステージ21は水平
方向に可動であり、「当接手段」を構成する可動式ステ
ージ21上には「濡れ性評価基板載置手段」である基板
ホルダ22、及び「ろう付け対象部材載置手段」である
部品貯蔵部23が設けられている。部品貯蔵部23に
は、評価対象となるBGA部品104等を搭載する。ま
た、「観察手段」であるカメラ部24、フラックス塗布
装置25、「当接手段」を構成する部品吸着装置26、
「加熱手段」である加熱装置27は、それぞれが上下方
向に可動である。
As shown in FIG. 4, the movable stage 21 is movable in the horizontal direction, and on the movable stage 21 constituting the "contact means", there is provided a substrate holder 22 serving as a "wetting evaluation substrate mounting means". , And a component storage unit 23 that is a “brazing target member mounting unit”. In the component storage unit 23, a BGA component 104 to be evaluated and the like are mounted. Further, a camera unit 24 serving as “observing means”, a flux coating device 25, a component suction device 26 constituting “contacting means”,
Each of the heating devices 27 as “heating means” is movable in the vertical direction.

【0030】図4(a)に示すように、可動式ステージ
21上に評価基板10を搭載する。カメラ部24が電極
位置情報(評価基板10のどこに表面側の銅電極12が
存在するかの位置情報)を認識し、制御部(図示省略)
が記憶した後(図4(a))、フラックス塗布装置25
により部品電極上にフラックスを塗布する(図4
(b))。部品貯蔵部23に搭載されているBGA部品
104を部品吸着装置26により吸着し(図4
(c))、続いて、フラックスが塗布された評価基板表
面の銅電極12上にBGA部品の半田ボール15が接す
るように、BGA部品104を評価基板10上に搭載す
る(図4(d))。
As shown in FIG. 4A, the evaluation board 10 is mounted on the movable stage 21. The camera unit 24 recognizes the electrode position information (position information on where the front surface side copper electrode 12 is present on the evaluation board 10) and controls the control unit (not shown).
Is stored (FIG. 4A), the flux coating device 25
To apply flux onto the component electrodes (Fig. 4
(B)). The BGA component 104 mounted on the component storage unit 23 is suctioned by the component suction device 26 (FIG. 4).
(C)) Subsequently, the BGA component 104 is mounted on the evaluation substrate 10 so that the solder ball 15 of the BGA component contacts the copper electrode 12 on the surface of the evaluation substrate on which the flux is applied (FIG. 4D). ).

【0031】次に、図5(a)に示すように、加熱装置
27により半田ボールを加熱・溶融させると、溶融した
半田は基板のスルーホール内部に流れ込み、更に評価基
板裏面の銅電極13に回り込む。自然冷却により半田が
再凝固した後、反転用治具28を用いて、固着された状
態のBGA部品104と評価基板10を反転させること
により、評価基板の裏面側をカメラ部24で認識する為
の準備を行い(図5(b))、カメラ部24により評価
基板10を観察(図5(c))してBGA部品104に
おける半田濡れ性を評価する(図3参照)。
Next, as shown in FIG. 5A, when the solder balls are heated and melted by the heating device 27, the melted solder flows into the through holes of the board, and further flows to the copper electrodes 13 on the back surface of the evaluation board. Wrap around. After the solder is re-solidified by natural cooling, the fixed BGA component 104 and the evaluation board 10 are inverted using the inversion jig 28 so that the camera unit 24 can recognize the back side of the evaluation board. (FIG. 5B), the evaluation board 10 is observed by the camera unit 24 (FIG. 5C), and the solder wettability of the BGA component 104 is evaluated (see FIG. 3).

【0032】(3)変形例 本実施の形態の変形例を以下に述べる。評価基板の基材
としては、有機材料のみならず、セラミックスを始めと
する無機材料を使うことも可能である。
(3) Modification A modification of this embodiment will be described below. As the base material of the evaluation substrate, not only organic materials but also inorganic materials such as ceramics can be used.

【0033】また、評価基板の板厚を変更したものを用
いることで、部品電極の濡れ性の大小に応じた評価を行
うことが出来る。例えば、半田ボールの濡れ性が不十分
であることが予測される場合(例えば保管期間が長い場
合)には、基板裏面まで溶融半田が回り込む程度の、板
厚がより薄い評価基板を用いることで、基板裏面銅電極
での濡れ広がりを適切に観察することが可能となる。逆
に半田ボールの濡れ性の過多が予測される場合には、板
厚がより厚い評価基板を用いることで、基板裏面銅電極
での濡れ広がりを適切に観察することが可能となる。ま
た、部品(BGA部品104)と基板(評価基板10)
の上下を逆にして加熱装置27を通過させることも可能
である。
Further, by using a board having a different thickness of the evaluation board, it is possible to make an evaluation according to the wettability of the component electrodes. For example, when it is expected that the wettability of the solder balls is insufficient (for example, when the storage period is long), it is possible to use a thinner evaluation board such that molten solder goes around to the back surface of the board. In addition, it is possible to appropriately observe the spread of the wetness on the copper electrode on the back surface of the substrate. Conversely, when excessive wettability of the solder balls is expected, it is possible to appropriately observe the spread of the wettability on the copper electrodes on the rear surface of the substrate by using a thicker evaluation substrate. Also, the component (BGA component 104) and the board (evaluation board 10)
Can be passed through the heating device 27 upside down.

【0034】なお、本発明を適用するケースとしては、
例えば長期間保管したBGA部品等のロット(例えば1
000個)の濡れ性傾向を把握する場合や、複数のBG
A部品等の購入先メーカー毎の濡れ性傾向を把握する場
合等がある。
The case where the present invention is applied is as follows.
For example, lots of BGA parts and the like stored for a long time (for example, 1 lot)
000 pieces) or multiple BGs
There is a case where the tendency of wettability of each manufacturer of parts such as A is grasped.

【0035】[0035]

【発明の効果】以上説明したように本発明によれば、以
下の効果を奏することができる。 (1)下面に接続用電極を備えた部品(下面電極部品)
の前記電極、特にBGA部品等の半田ボール電極につい
て、その濡れ性の評価を安全な環境下で簡易に、かつ高
い信頼性の下で直接的に行うことができる。 (2)また、部品の電極ピッチは同じだが電極数が異な
る部品に対しても、予め用意された濡れ性評価基板の電
極数以下であれば、一種類の評価基板で濡れ性評価を行
うことが可能なため、評価基板作製における費用削減に
貢献できる。 (3)評価対象となる半田ボール電極以外の半田が混入
する虞が無いため、半田浴を用いる方法に比べて、合金
組成を適切に維持したままで適切な濡れ性評価を行うこ
とができる。 (3)エックス線等を使用しないので、安全な作業環境
を構成できる。
As described above, according to the present invention, the following effects can be obtained. (1) Components with connection electrodes on the lower surface (lower electrode components)
The above-mentioned electrode, in particular, a solder ball electrode such as a BGA part, can be evaluated easily and directly in a safe environment with high reliability. (2) Even for components having the same electrode pitch but different numbers of electrodes, if the number of electrodes is less than the number of electrodes on the wettability evaluation substrate prepared in advance, wettability evaluation should be performed using one type of evaluation substrate. Is possible, which can contribute to cost reduction in manufacturing an evaluation substrate. (3) Since there is no possibility that solder other than the solder ball electrode to be evaluated is mixed, an appropriate wettability evaluation can be performed while maintaining the alloy composition appropriately, as compared with a method using a solder bath. (3) Since no X-ray or the like is used, a safe working environment can be configured.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る濡れ性評価基板の構成説明図であ
って、(A)は平面図、(B)はその側断面図、(C)
は(B)の拡大図である。
1A and 1B are explanatory diagrams of a configuration of a wettability evaluation substrate according to the present invention, wherein FIG. 1A is a plan view, FIG.
3 is an enlarged view of FIG.

【図2】(A)は図1の濡れ性評価基板上にBGA部品
を搭載した状態(加熱前)を示す平面図、(B)はその
側断面図である。
2A is a plan view showing a state (before heating) in which a BGA component is mounted on the wettability evaluation board of FIG. 1, and FIG. 2B is a side sectional view thereof.

【図3】本発明に係る濡れ性評価方法の原理説明図であ
って、(A)は半田ボールの溶融過程を説明する図、
(B)は濡れ性評価基板の裏面への半田回り込みを説明
する図である。
FIG. 3 is a diagram illustrating the principle of a wettability evaluation method according to the present invention, wherein (A) is a diagram illustrating a melting process of a solder ball;
(B) is a diagram for explaining the solder wrap around the back surface of the wettability evaluation substrate.

【図4】本発明の実施の形態に係るもので、濡れ性評価
装置の構成と、濡れ性評価基板およびBGA部品の搭載
から半田濡れ性の観察までの詳細過程のうちの、前半を
示す説明図である。
FIG. 4 relates to an embodiment of the present invention, and shows a configuration of a wettability evaluation apparatus and a first half of a detailed process from mounting of a wettability evaluation board and a BGA component to observation of solder wettability. FIG.

【図5】図4の実施の形態に係るもので、濡れ性評価基
板およびBGA部品の搭載から半田濡れ性の観察までの
詳細過程のうちの、後半を示す説明図である。
FIG. 5 is an explanatory diagram showing a latter half of a detailed process from mounting of a wettability evaluation board and a BGA component to observation of solder wettability according to the embodiment of FIG. 4;

【図6】従来のBGA部品の半田付け工程を説明する図
である。
FIG. 6 is a view for explaining a conventional BGA component soldering process.

【符号の説明】[Explanation of symbols]

10…濡れ性評価基板、11…基材、12…表面の銅電
極、13…裏面の銅電極、14…スルーホール、14a
…銅メッキ、15…半田ボール、15A…半田ボール電
極、20…濡れ性評価装置、21…可動式ステージ、2
2…基板ホルダ、23…部品貯蔵部、24…カメラ部、
25…フラックス塗布装置、26…部品吸着装置、27
…加熱装置、28…反転用治具、101…マザー基板、
102…電極、103…ソルダーペースト、104…B
GA部品
Reference Signs List 10: wettability evaluation substrate, 11: base material, 12: copper electrode on front surface, 13: copper electrode on back surface, 14: through hole, 14a
... Copper plating, 15 ... Solder ball, 15A ... Solder ball electrode, 20 ... Wettability evaluation device, 21 ... Movable stage, 2
2 ... board holder, 23 ... parts storage part, 24 ... camera part,
25: flux coating device, 26: component suction device, 27
... heating device, 28 ... reversing jig, 101 ... mother board,
102 ... electrode, 103 ... solder paste, 104 ... B
GA parts

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 平板状の基材にスルーホールを形成し、
該スルーホール内壁に金属膜を形成すると共に、該スル
ーホール上下両面に金属電極を形成してなることを特徴
とするろう付け材電極の濡れ性評価基板。
1. A through hole is formed in a flat base material,
A metal film is formed on the inner wall of the through hole, and metal electrodes are formed on both upper and lower surfaces of the through hole.
【請求項2】 前記基材に形成したスルーホールは、複
数からなることを特徴とする請求項1記載のろう付け材
電極の濡れ性評価基板。
2. The substrate for evaluating wettability of a brazing material electrode according to claim 1, wherein the substrate has a plurality of through holes formed therein.
【請求項3】 請求項1又は2に記載の濡れ性評価基板
を用いる、ろう付け材電極の濡れ性評価装置であって、 ろう付け材を予め表面に固着したろう付け対象部材を載
置するろう付け対象部材載置手段と、 前記濡れ性評価基板を載置する濡れ性評価基板載置手段
と、 前記ろう付け対象部材のろう付け材を前記濡れ性評価基
板の表面電極に当接させる当接手段と、 該当接状態のろう付け対象部材と濡れ性評価基板とを加
熱してろう付け材を溶融する加熱手段と、 該加熱手段で加熱後の濡れ性評価基板の裏面電極を観察
する観察手段とを備えたことを特徴とするろう付け材電
極の濡れ性評価装置。
3. A brazing material electrode wettability evaluating apparatus using the wettability evaluating substrate according to claim 1 or 2, wherein a brazing target member having a brazing material fixed to a surface in advance is placed. A brazing target member mounting unit; a wettability evaluation substrate mounting unit for mounting the wettability evaluation substrate; and a brazing material of the brazing target member abutting on a surface electrode of the wettability evaluation substrate. Contact means, heating means for heating the brazing target member and the wettability evaluation substrate in the corresponding contact state to melt the brazing material, and observation for observing the back electrode of the wettability evaluation substrate after heating by the heating means. Means for evaluating the wettability of a brazing material electrode.
【請求項4】 請求項1又は2に記載の濡れ性評価基板
を用いる、ろう付け材電極の濡れ性評価方法であって、 ろう付け材を予め表面に固着したろう付け対象部材を用
意する工程と、 前記濡れ性評価基板を用意する工程と、 前記ろう付け対象部材のろう付け材を前記濡れ性評価基
板の表面電極に当接させる工程と、 該当接状態のろう付け対象部材と濡れ性評価基板とを加
熱する工程と、 該加熱後に前記濡れ性評価基板の裏面電極のろう付け濡
れ性を観察する工程とを備えたことを特徴とするろう付
け材電極の濡れ性評価方法。
4. A method for evaluating the wettability of a brazing material electrode using the wettability evaluation substrate according to claim 1 or 2, wherein a brazing target member having a brazing material fixed on its surface in advance is prepared. Preparing the wettability evaluation substrate; bringing the brazing material of the brazing target member into contact with the surface electrode of the wettability evaluation substrate; and evaluating the brazing target member in the contact state and the wettability. A method for evaluating the wettability of a brazing material electrode, comprising: a step of heating a substrate; and a step of observing a brazing wettability of a back electrode of the wettability evaluation substrate after the heating.
【請求項5】 板厚の異なる複数の前記濡れ性評価基板
を用意しておき、ろう付け材の濡れ性の大小に応じて、
前記濡れ性評価基板の板厚を選択して半田濡れ性を評価
することを特徴とする請求項4記載のろう付け材電極の
濡れ性評価方法。
5. A plurality of wettability evaluation substrates having different plate thicknesses are prepared, and according to the wettability of the brazing material,
5. The method for evaluating wettability of a brazing material electrode according to claim 4, wherein the solder wettability is evaluated by selecting a thickness of the wettability evaluation substrate.
JP2000130558A 2000-04-28 2000-04-28 Evaluation substrate, evaluation device and evaluating method for wettability of brazing material electrode Pending JP2001313464A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
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Publications (1)

Publication Number Publication Date
JP2001313464A true JP2001313464A (en) 2001-11-09

Family

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Country Status (1)

Country Link
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