JP2001300453A5 - - Google Patents
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- Publication number
- JP2001300453A5 JP2001300453A5 JP2000120015A JP2000120015A JP2001300453A5 JP 2001300453 A5 JP2001300453 A5 JP 2001300453A5 JP 2000120015 A JP2000120015 A JP 2000120015A JP 2000120015 A JP2000120015 A JP 2000120015A JP 2001300453 A5 JP2001300453 A5 JP 2001300453A5
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- JP
- Japan
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000120015A JP2001300453A (en) | 2000-04-20 | 2000-04-20 | Method for cleaning surface of article and cleaning device, method for manufacturing optic element using method for cleaning surface of article and cleaning device, and optic element manufacturing device, optical system, aligning method and aligning device, and device manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000120015A JP2001300453A (en) | 2000-04-20 | 2000-04-20 | Method for cleaning surface of article and cleaning device, method for manufacturing optic element using method for cleaning surface of article and cleaning device, and optic element manufacturing device, optical system, aligning method and aligning device, and device manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001300453A JP2001300453A (en) | 2001-10-30 |
| JP2001300453A5 true JP2001300453A5 (en) | 2007-06-14 |
Family
ID=18630905
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000120015A Pending JP2001300453A (en) | 2000-04-20 | 2000-04-20 | Method for cleaning surface of article and cleaning device, method for manufacturing optic element using method for cleaning surface of article and cleaning device, and optic element manufacturing device, optical system, aligning method and aligning device, and device manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001300453A (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201806001A (en) * | 2003-05-23 | 2018-02-16 | 尼康股份有限公司 | Exposure device and device manufacturing method |
| US8317929B2 (en) * | 2005-09-16 | 2012-11-27 | Asml Netherlands B.V. | Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus |
| WO2008072641A1 (en) * | 2006-12-08 | 2008-06-19 | Canon Kabushiki Kaisha | Exposure apparatus |
| JP5658245B2 (en) * | 2009-06-23 | 2015-01-21 | エーエスエムエル ネザーランズ ビー．ブイ． | Laser cleaning device, lithographic projection apparatus and method for cleaning a surface |
| JP5429866B2 (en) * | 2009-09-18 | 2014-02-26 | ヒューグルエレクトロニクス株式会社 | Dust removal system |
| JP2012211951A (en) * | 2011-03-30 | 2012-11-01 | Shin Etsu Chem Co Ltd | Method and device for cleaning photomask-related substrate |
| JP6214441B2 (en) * | 2014-03-18 | 2017-10-18 | 株式会社ニューフレアテクノロジー | Deflector cleaning device and deflector cleaning method |
| JP7038004B2 (en) * | 2018-05-24 | 2022-03-17 | 本田技研工業株式会社 | Cleaning method and cleaning equipment for optical components |
| CN108816963B (en) * | 2018-08-01 | 2024-02-06 | 中山普宏光电科技有限公司 | Ultraviolet light and ultraviolet laser double-light-source cleaning equipment |
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2000
- 2000-04-20 JP JP2000120015A patent/JP2001300453A/en active Pending