JP2001284214A5 - - Google Patents

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Publication number
JP2001284214A5
JP2001284214A5 JP2000093960A JP2000093960A JP2001284214A5 JP 2001284214 A5 JP2001284214 A5 JP 2001284214A5 JP 2000093960 A JP2000093960 A JP 2000093960A JP 2000093960 A JP2000093960 A JP 2000093960A JP 2001284214 A5 JP2001284214 A5 JP 2001284214A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000093960A
Other languages
Japanese (ja)
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JP4532660B2 (en
JP2001284214A (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2000093960A priority Critical patent/JP4532660B2/en
Priority claimed from JP2000093960A external-priority patent/JP4532660B2/en
Publication of JP2001284214A publication Critical patent/JP2001284214A/en
Publication of JP2001284214A5 publication Critical patent/JP2001284214A5/ja
Application granted granted Critical
Publication of JP4532660B2 publication Critical patent/JP4532660B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000093960A 2000-03-30 2000-03-30 Exposure equipment Expired - Fee Related JP4532660B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000093960A JP4532660B2 (en) 2000-03-30 2000-03-30 Exposure equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000093960A JP4532660B2 (en) 2000-03-30 2000-03-30 Exposure equipment

Publications (3)

Publication Number Publication Date
JP2001284214A JP2001284214A (en) 2001-10-12
JP2001284214A5 true JP2001284214A5 (en) 2007-05-24
JP4532660B2 JP4532660B2 (en) 2010-08-25

Family

ID=18609074

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000093960A Expired - Fee Related JP4532660B2 (en) 2000-03-30 2000-03-30 Exposure equipment

Country Status (1)

Country Link
JP (1) JP4532660B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105223786B (en) * 2015-10-30 2017-11-07 武汉华星光电技术有限公司 Method and device for preventing camera lens atomized inside

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05210049A (en) * 1992-01-31 1993-08-20 Matsushita Electric Ind Co Ltd Method and device for correcting magnification of projecting lens
JPH07201702A (en) * 1993-12-28 1995-08-04 Fujitsu Ltd Aligning method and aligner
JP3734043B2 (en) * 1995-04-07 2006-01-11 株式会社ニコン Exposure equipment
JP3629790B2 (en) * 1995-12-05 2005-03-16 株式会社ニコン Exposure equipment
JPH09298151A (en) * 1996-05-02 1997-11-18 Nikon Corp Projection aligner
JP3472066B2 (en) * 1997-03-04 2003-12-02 キヤノン株式会社 Exposure apparatus, semiconductor production system and semiconductor manufacturing method
JP2000036447A (en) * 1998-07-17 2000-02-02 Nikon Corp Aligner and pressure control method for projection optical system
JPH11233412A (en) * 1998-02-13 1999-08-27 Nikon Corp Projection aligner
JP4026943B2 (en) * 1997-09-04 2007-12-26 キヤノン株式会社 Exposure apparatus and device manufacturing method
JPH11224839A (en) * 1998-02-04 1999-08-17 Canon Inc Exposure system, manufacture of device, and cleaning method of optical device of exposure system
WO1999060616A1 (en) * 1998-05-15 1999-11-25 Nikon Corporation Exposure method and apparatus
JP2000124121A (en) * 1998-10-16 2000-04-28 Canon Inc Optical device, aligner, lens-barrel, connecting device, case and lens-barrel end shield
JP2001060548A (en) * 1999-08-23 2001-03-06 Nikon Corp Exposure method and aligner
JP4738561B2 (en) * 1999-12-14 2011-08-03 キヤノン株式会社 Exposure apparatus and device manufacturing method
JP2001284215A (en) * 2000-03-30 2001-10-12 Canon Inc Exposure system, method of manufacturing device, and maintenance method for semiconductor manufacturing plant and exposure system
JP3976981B2 (en) * 2000-03-30 2007-09-19 キヤノン株式会社 Exposure apparatus, gas replacement method, and device manufacturing method

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