JP2001274065A - Aligner and manufacturing method of device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To make it possible to return the contents of parameters easily and reliably to the contents before the change, to make it possible to rapidly perform the treatment for the return and moreover, to achieve these return and treatment without increasing the cost of the manufacture of a device. SOLUTION: In the case where a change in the value of each parameter of each parameter set is accepted and the result of the change is preserved, the result of the change is accumulatively preserved as change history information 31 and 32 including information necessary for restoring afterwards the contents of parameter sets at the point of time of each change. Moreover, each selected parameter set and identification information specifying each change history information to underlie the restoration of each parameter set are kept being previously stored. In the case where the identification information is indicated afterwards, one selected out of the identification information being stored is restored about each parameter set being specified and the change history information.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to an exposure apparatus such as a semiconductor exposure apparatus for printing a circuit pattern on a wafer, and a device manufacturing method using the same.

[0002]

2. Description of the Related Art Generally, in an exposure apparatus used in a semiconductor manufacturing (exposure) process, a control parameter is a unit of a parameter set called a job. The operator uses a parameter set editing function called an editor for each exposure process, and changes parameters related to various measurement sequences, exposure dose, various offsets, and the like to appropriate values as needed.
Save it in advance.

Normally, this job has about 1000 parameters. Each parameter needs to be adjusted to an optimal value for the process. Adjustment of each parameter is performed by repeating a cycle of editing a job, performing a test exposure, and evaluating the result a plurality of times. Since this adjustment cycle is performed by trial and error, it is not possible to determine whether to adopt the changed content of the parameter until the result is determined.
In other words, there is a possibility that the changes are discarded and undone.

Conventionally, when undoing changes, the operator memorizes the changes in advance or writes them down on paper, and re-enters the changes to undo the changes. . Alternatively, the entire parameter set (job) may be copied in a different name beforehand, and the name may be memorized or written down. When the changed content is discarded, the copied job may be overwritten and restored. I have to. For this reason, the contents of the change parameters stored by the operator are inaccurate, incorrectly input when re-inputting, or the operator forgets the name of the previously copied job, and In some cases, the contents cannot be restored. Alternatively, another job may be mistakenly overwritten by misunderstanding the name of the job copied in advance, and the changed contents may be lost. If such an operation error occurs, the edited contents of the parameters that were repeated and taken over a long period of time are lost, and as a result, the adjustment cycle must be restarted from the beginning, resulting in a huge time loss. Problem occurs. In particular, when multiple operators work in cooperation, it is difficult to convey the purpose and meaning of the edited content of the job between operators, or information on the job name copied to return the edited content May not be transmitted, and the operation error as described above is more likely to occur.

Further, if the adjustment cycle is repeated for many jobs, the number of jobs stored in advance continues to increase. In particular, when there are a plurality of operators, it is not possible to determine whether the saved job is already unnecessary and whether it is OK to delete it, and as a result, unnecessary job files increase. As described above, when the number of unnecessary job files increases, a problem occurs that the storage area of the disk cannot be used efficiently.

On the other hand, as a parameter set other than the above job parameters, there are a reticle parameter which is a set of parameters relating to the reticle, and a system parameter which is a collection of parameters unique to the apparatus. Since reticle parameters are created corresponding to individual reticles, there are a plurality of files as reticle parameters as in the case of a job. Since the system parameters are device-specific parameters, only one set exists for the device. In addition, there are usually parameters that are changed in order to absorb the effects of environmental changes such as aging of the device and weather. Many of these parameters are included in device-specific system parameters. Parameters that vary depending on the environment change factor parameters included in these system parameters exist in the parameters of the job file and the reticle file. Because of this dependency,
Even if only the job or reticle is stored and the same exposure result is expected to be used after a lapse of time, the same result may not be reproduced when the system parameters are changed.

Therefore, conventionally, when backing up,
A system parameter backup, a necessary job or reticle file, and a backup date and time are set and copied in the apparatus. In this way, if the system parameters and necessary jobs and reticle parameters are backed up as a set, the set can be restored to the state at the time of backup. However, actually, restoring all system parameters may affect files other than the backed-up job and reticle file. Therefore, in reality, it is necessary to back up all parameters in the apparatus, that is, all job files, all reticle files, and system parameter files. Generally, backing up all parameters in the apparatus requires a large capacity and takes time. Also, if there is not enough space on the disk,
Since backup cannot be performed, it is necessary to perform backup in an auxiliary storage device or the like. Therefore, a costly large-capacity disk and an auxiliary storage device are required. Further, since backup and restoration take time, the use efficiency of the device is reduced.

[0008]

As described above, according to the prior art, if there is a possibility that the changed contents of the parameters may be discarded and restored, a note of the changed contents may be taken, or Since the job name is changed and copied, there is a problem that errors are likely to occur and a large amount of disk space is consumed. Also, when backing up job files and reticle files that contain job parameters that depend on system parameters, all parameters in the device are backed up, so a large amount of disk space is required. There is also a problem that a storage device and an auxiliary storage device are required, which increases the cost of the device. Further, there is a problem that it takes a long time to perform the backup and restore operations, thereby lowering the use efficiency of the apparatus. In recent years, with the improvement of the performance of semiconductor exposure apparatuses, the narrowing of process technology, the diversification of products, and the like, the adjustment of the above-described job parameters has been diversified and increased in complexity. Has become a more important solution.

Therefore, the present invention provides an exposure apparatus and a device manufacturing method, wherein
It is an object of the present invention to be able to easily and surely restore the contents before the change. It is another object of the present invention to perform processing for that purpose quickly. Furthermore, it is an object to achieve these without increasing the cost.

[0010]

In order to solve these problems, a first exposure apparatus of the present invention includes editing means for editing each parameter set used for controlling the apparatus. In an exposure apparatus comprising: means for accepting a change to each parameter value of a target parameter set; and storage means for storing a result of the change, wherein the storage means sequentially saves each change result at a later time at each change time. It is characterized by being cumulatively stored as change history information including information necessary for restoring the contents of the parameter set.

A second exposure apparatus is the first exposure apparatus, wherein the editing means converts a parameter set to be edited based on the change history information into a change result at a designated arbitrary change time point. It is characterized by comprising a restoring means for restoring as an editing target having contents.

A third exposure apparatus according to the second exposure apparatus, wherein the editing means accepts the change and saves change history information for the restored parameter set. .

A fourth exposure apparatus according to the second or third exposure apparatus, wherein the editing means has means for storing the restored parameter set as another parameter set.

A fifth exposure apparatus is the exposure apparatus according to any one of the first to fourth exposure apparatuses, wherein each change history information includes information on the number of changes indicating the number of changes counted for each parameter set. And a corresponding parameter change value.

A sixth exposure apparatus according to any one of the first to fifth exposure apparatuses, wherein the editing means receives an editor name and a comment when each change history information is stored, and the storage means The information is stored as a part of each change history information.

A seventh exposure apparatus according to any one of the first to sixth exposure apparatuses, wherein each change history information includes an editor name, a comment, a history number indicating the number of changes for each parameter set, and its storage. Time information is included, and the editing means has means for displaying a list of such information.

An eighth exposure apparatus according to the seventh exposure apparatus, wherein the restoring means restores the parameter set based on one selected from the contents displayed in the list. Features.

A ninth exposure apparatus is the exposure apparatus according to any one of the first to eighth exposure apparatuses, wherein the editing means outputs identification information for specifying the selected parameter set and the change history information which is a basis for restoring the selected parameter set. It is characterized by having means for storing.

A tenth exposure apparatus is the ninth exposure apparatus, wherein the editing means selects the parameter set by selecting an option for selecting all parameter sets and a group of predetermined parameter sets. And accepting the user by selecting one of the options.

An eleventh exposure apparatus according to the tenth exposure apparatus, wherein the editing means includes a parameter set specified by the identification information based on a selected one of the stored identification information. The above-mentioned restoration is performed.

Further, the first device manufacturing method includes a step of receiving a change to each parameter value of each parameter set, a storing step of storing a result of the change, and an exposure while controlling the exposure apparatus based on each parameter set. Performing a process, wherein the storing step sequentially accumulates each change result as change history information including information necessary for restoring the contents of the parameter set at each change point in time. It is characteristically stored.

The second device manufacturing method includes the first
Storing identification information for specifying each selected parameter set and each change history information serving as a basis for restoring the selected parameter set, and selecting a selected one of the stored identification information. Performing the restoration for each parameter set and change history information to be performed.

In the configuration of the present invention, the parameter values of each parameter set are sequentially changed as necessary, and the change results are stored. The change history information of each parameter set is accumulated accordingly. Each change history information includes information necessary for restoring the contents of the parameter set at each change time. Therefore, when it is necessary to return the contents of a certain parameter set to the contents of a certain past change, of the change history information accumulated and stored for that parameter set, If the object is specified, information necessary for restoring the contents of the parameter set at the time of the change is obtained, and the contents of the parameter set are restored accordingly.

According to this, since the contents of the parameter set at the time of the change are restored just by selecting the change history information at the time of the desired change, the operator can take notes,
There is no need to change the name in advance and save a copy of the parameter set, and work errors are reduced. Therefore, the content of the parameter can be easily and reliably returned to the content at the time of any change in the past,
The productivity of the exposure apparatus is improved.

When a backup is required, the parameter set selected as a target and identification information for specifying each change history information serving as a basis for restoring the parameter set are stored as a substantial backup. Then, when it becomes necessary to restore, by selecting a desired one of the stored identification information, each parameter set specified by the identification information is determined according to the change history information. The contents of the set are restored.

According to this, instead of backing up the data of all the parameters of the target parameter set as in the prior art, only the identification information for specifying the target parameter set and its change history information is stored. Thus, a substantial backup is performed. Therefore, even when backup of all parameter sets is required, there is no need to use a large-capacity disk or auxiliary storage device, and a lower-priced storage device is sufficient.
The cost of the apparatus is reduced. Also, the time required for backup and restoration is reduced.

[0027]

FIG. 1 shows a schematic configuration of a semiconductor exposure apparatus according to one embodiment of the present invention. In FIG. 1, reference numeral 1 denotes a semiconductor exposure apparatus main body, and 2 denotes a console for setting control parameters of the semiconductor exposure apparatus main body 1 and instructing start and stop of an operation. The console unit 2 includes a CPU 3,
A monitor 4, a keyboard 5, a mouse 6, a communication I / F 7 and the like are provided. The exposure apparatus includes a communication I / F 7 and a communication path 8
It can also be connected to an operation unit of another semiconductor exposure apparatus, a host computer, or the like via the.

The control parameters of the semiconductor exposure apparatus are input and edited by a program on a computer for providing input means attached to the apparatus, and, if necessary, externally via a storage device of the apparatus or a communication path. Stored in the storage device. In actual exposure, edited and stored parameters are transmitted to the semiconductor exposure apparatus main body 1 in parameter set units called jobs, and the exposure apparatus main body 1 performs an exposure operation according to the job. The input and editing of the parameter set is realized by a program on a computer for providing input means attached to the apparatus. This program is called an editor, and the operator performs input using a mouse, a keyboard, a touch panel, or the like as input means in accordance with parameter names and input guides displayed on a monitor screen of a computer.

A procedure for saving the changed contents of the parameter set and restoring the changed contents as necessary will be described with reference to FIGS. FIG. 2 shows a screen displayed by an editor program for editing job parameters. In the figure, reference numeral 11 denotes a title portion displaying the name of the job being edited, 12 denotes an editing area for parameters, 13 denotes a scroll operation unit for scrolling the editing area 12, and 14 denotes a history for displaying a history described later. A display button 15 is a save button for saving the edited result, 1
Reference numeral 6 denotes an end button for ending the editor. 1
Reference numeral 7 denotes a dialog screen displayed when parameters are saved. In this screen, 18 is an input area for an edited operator name, 19 is an input area for a comment on the edited content, and 20 is an input user name and the content of the comment. A button for validating the information and exiting the screen 17 is displayed.
Is a display area for confirming the edited contents.

Reference numeral 22 denotes a display screen of a history list of the parameter set. In this screen, reference numeral 23 denotes a title display area;
24 is a history number display area, 25 is a history list display area, 26 is an operation button for instructing display of history details, and 27 is an operation button for instructing restoration (history restoration). 28 is a detailed history display screen, 29 is a restore operation confirmation dialog screen, and 30 is a display area for confirming changes.

Normally, the operator directly designates a job name from a job name list screen by a mouse operation or a keyboard, and instructs the start of an editing program. When the editing program is started, an editing screen as shown in FIG. 2 is displayed. The operator edits parameters using the parameter input area 12. At this time, the user operates the scroll operation button 13 as necessary to display necessary parameters for editing.

When the editing operation is completed and the save button 15 is pressed, the editor program displays a save confirmation dialog screen 17. The editor confirms the editing content based on the display content of the display area 30. After that, the name of the editor is input to the input area 18 and the comment is input to the comment input area 19. It is desirable to always input the name and comment of the editor, but it is also possible to devise it by setting the program. It is desirable that the name of the editor be unique to the operator. For example, a login user name of the computer OS, E-m
For example, an email (e-mail) address may be used. A registration file is separately provided for the names of these editors, and if the names of the editors not registered in this file are input, it is conceivable to make the change contents ineffective. It is also conceivable that the editor name and password are registered together at the time of registration, and the editor name and password are entered on the save confirmation screen, and if they do not match, the changes will not be valid.

Next, a method in which the editor program saves the changed contents will be described. FIG. 3 is a schematic diagram showing the contents of the storage table used by the editor program. In the figure, 31 is a storage table for the job name "JOBA", and 32 is a storage table for "JOBB". This storage table is created each time a job file is increased, and one storage table exists for one job. An area 33 stores job names. An area 34 stores the final history number of the job. The history number is a number corresponding to the number of times the change has been made, and in the example of FIG. 3, the parameter set of “JOBA” indicates that the change has been made five times.

Each row in the storage tables 31 and 32 is divided by a parameter identification ID (PID), and each column is divided by a history number. The parameter identification ID (hereinafter, referred to as “identification ID”) is for identifying each parameter. The identification ID is defined in advance so that all parameters are unique. The editor program is programmed so that each parameter is handled with a parameter identification ID. In this embodiment, for the sake of explanation, the identification ID is “001” to
Although there are six parameters “006”, an actual job includes several hundred parameters and requires the same number of rows in the storage table. The last lines of “comment” and “editor name” are areas in which comments input in the input area 19 and names of editors input in the input area 18 are stored. Since the history number needs to be added every time the number of changes of the parameter set increases, the number of rows in the storage table increases each time the change is made. FIG. 3 shows a state where editing is performed five times and data of up to five columns is stored.

Each element in the storage table represents the change of each parameter for each history number. The first column with the history number 1 indicates the first edition. ID
Has a value of “6.0”, “002” is “5.0”, “003” is “4.0”, “004” is “3.0”, “ 005 "is" 2.0 "and" 006 "is" 1.0 ". The second column shows the contents of the second editing of JOBA, in which the operator operates the editor, edits the parameters with the identification IDs “004” and “006”, and saves them. ing. That is, when each matrix element in the storage table is represented by (history number, identification ID),
(2,004) and (2,006) are changed, and the values are "11.0" and "12.0", respectively. In this case, since the values of the other parameters are the same as the values of the history number 1, there is no need to store them. For such a parameter that has not been changed, a special character having no meaning as a parameter value such as “*” is stored in the corresponding matrix element. “*”
The actual value of the element in which is stored is the value of the adjacent element with the youngest history number and not the first element that is not "*". That is, in the example of JOBA, since the value of the parameter of “001” of history number 4 is “*” when “001” of history number 3 is referred, “001” of history number 2 which is younger is referred to. . Then, since it is “*” again, finally, the history number 1 “00”
The content “6.0” of “1” becomes the content of the parameter “001” of the history number 4. By realizing the above-described storage method using an editor program, it is possible to store changed contents.

Next, the display of the change history, the restoration of the past history, and the re-editing from the restored history will be described.
When the operator operates the history display button 14 in FIG. 2, a job change history screen 22 is displayed. In this example, JOBA
Has been edited five times, the history up to history number 5 is displayed in the history list display area 25. When the editing is repeated, the storage area in the column direction in FIG. 3 increases, and the number of rows in the history list also increases. The display of the history number display area 24 is also updated.

The operator operates the restore operation button 27 corresponding to the history number 2 in the history list when the operator wants to restore the change contents of the history number 2 at the time of the job number. When the user wants to confirm the detailed change content of the history number 2, the user can operate the history detail display button 26 to display the detail history display screen 28 and confirm it.

When a restore operation instruction is given to the editor program by the restore operation button 27, the program
Referring to the column of the history number 2 in the storage table 31 of FIG. 3, the contents of the elements in each row in which the parameter value is stored are read, and those in which "*" is stored are read in the history. The parameter values are read from the column of number 1 and displayed on the screen.

By the above operation, restoration to past editing contents can be realized. Further, the operator can check the restored contents and execute a job with the contents by using the editor.

Further, new editing can be performed based on the restored contents. After the parameter is newly changed in a state where the restoration content of the history number 2 is displayed by the editor, the save operation is performed by the save button 15.
At this time, the editor program compares the content of the parameter being edited with the content of history number 5, which is the latest history number, that is, the content of each row in the fifth column in the storage table 31, and determines the parameter that has not been changed. Line contains
“*” Is saved, and the contents of the changed parameter are saved. At this time, since the history number of this change is 6, the storage area is increased by one column, and the column is stored. The history number of the area 34 in FIG.
Will be updated to

According to the above method, the editor program can save and restore the changed content and re-edit the restored content.

Next, a method of storing and restoring a plurality of related parameter sets or the entire parameter collectively will be described. FIG. 4 shows a display screen by an editor in which backup and restore functions are added to the editor of FIG. On this display screen, a backup / restore button 41 for instructing backup or restore is added. Reference numeral 42 denotes a lower layer selection menu displayed by operating the button 41, and is a menu for giving an instruction of either a backup operation or a restore operation. Reference numeral 43 denotes a menu for selecting a parameter set to be backed up, which is displayed when a backup operation is instructed, and includes "ALL" (all) for all parameter sets and "ALL" for job parameters. “JOB” (job), “RET” (reticle) for reticle parameters, or “SYS” (system) for system parameters can be selected.

Reference numeral 44 denotes a screen for inputting a label for the backup of the selected parameter set.
In the screen 44, 51 is a title portion, 52 is a label name input portion, 53 is an end button, and 54 is a backup label confirmation end button.

Reference numeral 45 denotes a menu for selecting a parameter set to be restored, which is displayed when an instruction for a restore operation is given on the screen 42. As in the case of the backup operation, ALL (whole), JOB
(Job), RET (reticle) or SYS (system) can be selected.

A screen 46 displays a list of label names of backups that can be restored for the selected parameter set. 50 in the screen 46 is a title area, 47
Is a scroll area, 48 is an end button, and 49 is a button for confirming and terminating the instruction of the label name of the backup to be restored.

In this screen configuration, when backing up a plurality of parameter sets, first, the operation button 4
Operate 1 Then, a backup or restore selection menu 42 is displayed. When a backup is selected in the menu 42, a menu 43 is displayed, and a desired one is selected from ALL (entire), JOB (job), RET (reticle), or SYS (system). Then, a backup label name input screen 44 is displayed, and a name easy to understand when restoring is input as a backup label name. For example, the name may be associated with a date. In this example, the name “D990705” is input. At this time, the editor program checks that the same name as the input backup label does not exist in the already used label names. If there is a label name already used, display a message,
Prompt for a different label name. That is, a unique label name is always assigned.

If the unique backup label name set in this way, the names of a plurality of parameter sets to be backed up, and the history number of each parameter set are stored as backup information, it will be described with reference to FIG. By using the technique of saving and restoring the individual parameter sets obtained, the parameter set stored as the backup information can be restored.

FIG. 5 is a schematic diagram showing the contents of a storage table storing backup information. In the first line,
With a backup label name of “D990704”,
Parameter set “JOBA” of job parameters,
The backup information of “JOBB” and “JOBC”, the reticle parameter parameter sets “RETA”, “RETB” and “RETC”, and the system parameter parameter set “SYSP” are stored. History counter)
"JOBA" is 5, "JOBB" is 2, "JOBC"
Is 11, RETA is 3, RETB is 8, RE
“TC” is 9 and “SYSP” is 110.

At the time of restoration, first, the operation button 41 of FIG. 4 is operated. Then, a backup or restore selection menu 42 is displayed. Then, when you select restore, a menu 45 is displayed.
A desired group is selected from L (overall), JOB (job), RET (reticle) or SYS (system) groups. Then, restore label list display screen 4
6 is displayed. On the screen 46, as in the area 25 of FIG. 2, a list of backup labels of the selected group and the date and time when the label was created are displayed. When the user selects the label name of the backup to be restored from this list display and operates the confirm / execute button 49, the editor program reads from the storage table shown in FIG.
The parameter set name and history number stored under the specified backup label name are read. Then, based on the read parameter set name and history number, all parameter sets stored under the selected backup label name are restored by the restoration method described with reference to FIGS.

In the present embodiment, the entire parameter set, job file, reticle file and system parameters can be selected as a group of parameter sets to be backed up and restored. An arbitrary parameter set may be selected from the whole, defined as a group, and set as a backup and restore target.

According to such a backup and restore method, even when all the parameter sets are backed up, only the contents of the changed parameters are substantially stored. Compared to the conventional method of storing a copy of the parameter set, backup can be performed with a very small storage area. Further, since the amount of data to be read and written in the backup and restore processing is smaller than in the conventional method, the processing time can be shortened.

<Embodiment of Device Manufacturing Method> Next, an embodiment of a device manufacturing method using the above-described exposure apparatus will be described. FIG. 6 shows a flow of manufacturing micro devices (semiconductor chips such as ICs and LSIs, liquid crystal panels, CCDs, thin-film magnetic heads, micromachines, etc.). In step 1 (circuit design), a device pattern is designed. Step 2 is a process for making a mask on the basis of the designed pattern. On the other hand, in step 3 (wafer manufacture), a wafer is manufactured using a material such as silicon or glass. Step 4 (wafer process) is called a pre-process, and an actual circuit is formed on the wafer by lithography using the prepared mask and wafer. Next Step 5
(Assembly) is called a post-process, and is a process of forming a semiconductor chip using the wafer produced in step 4,
It includes processes such as an assembly process (dicing and bonding) and a packaging process (chip encapsulation). In step 6 (inspection), inspections such as an operation confirmation test and a durability test of the semiconductor device manufactured in step 5 are performed. Through these steps, a semiconductor device is completed and shipped (step 7).

FIG. 7 shows the wafer process (step 4).
The detailed flow of is shown. Step 11 (oxidation) oxidizes the wafer's surface. Step 12 (CVD) forms an insulating film on the wafer surface. Step 13 (electrode formation) forms electrodes on the wafer by vapor deposition. In step 14 (ion implantation), ions are implanted into the wafer. In step 15 (resist processing), a resist is applied to the wafer. Step 16 (exposure) uses the above-described exposure apparatus or exposure method to align and print the circuit pattern of the mask on a plurality of shot areas of the wafer.
Step 17 (development) develops the exposed wafer.
In step 18 (etching), portions other than the developed resist image are removed. In step 19 (resist stripping), unnecessary resist after etching is removed. By repeating these steps, multiple circuit patterns are formed on the wafer.

By using the production method of this embodiment, it is possible to produce a large-sized device, which was conventionally difficult to produce, at low cost.

[0055]

As described above, according to the present invention,
The edited contents of the parameter set of the exposure apparatus can be easily and reliably returned to past edited contents. At this time, since it is not necessary to make a copy or take a memo in advance, it is possible to eliminate the problem of an operation error and improve the productivity of the exposure apparatus. Further, the time required for backing up and restoring the parameter set can be reduced. Also, the disk capacity required for backup can be reduced. Therefore, using a relatively inexpensive and small-capacity disk device can contribute to a reduction in the cost of the device.

[Brief description of the drawings]

FIG. 1 is a diagram showing a schematic configuration of a semiconductor exposure apparatus according to one embodiment of the present invention.

FIG. 2 is a diagram showing a screen displayed by an editor for editing parameters in the apparatus of FIG. 1;

FIG. 3 is a schematic view of a parameter set storage table by the editor of FIG. 2;

FIG. 4 is an explanatory diagram of an editor obtained by adding a function of performing backup and restoration to the editor of FIG. 2;

FIG. 5 is a schematic diagram of a storage table storing backups of a plurality of parameter sets by the editor of FIG. 4;

FIG. 6 is a flowchart illustrating a device manufacturing method that can use the exposure apparatus of the present invention.

FIG. 7 is a detailed flowchart of a wafer process in FIG. 6;

[Explanation of symbols]

1: semiconductor exposure apparatus main body part, 2: console part, 3: C
PU unit, 4: monitor, 5: keyboard, 6: mouse,
7: communication I / F, 8: communication path, 11: title section for displaying the name of the job being edited, 12: parameter editing area, 13: scroll operation section, 14: history display button, 15: save button, 16: Exit button of editor,
17: Dialog screen when saving parameters, 1
8: an area for inputting the edited operator name, 19: an area for inputting the comment of the edited content, 20: a button for confirming the input content and closing the screen, 21: discarding the input content and closing the screen Button, 22: history list display screen, 23: title display section, 24: history number display section,
25: history display area, 26: button for displaying history details, 27: restore operation button, 28: detailed history display screen, 29: restore operation confirmation dialog screen,
30: display area for confirming changes, 31: storage table for job name JOBA, 32: JOB
B: storage table, 33: area storing job name, 34: area storing history number, 4
1: Backup / Restore button execution button, 42:
Backup / Restore instruction menu, 43: Backup target selection instruction menu, 44: Backup label name input screen, 45: Restore target selection instruction menu, 46: Label name list display screen, 4
7: an area for performing a scroll operation, 48: an end button, 49: a button for finalizing, 50: a title area, 51: a title part, 52: a label name input part, 5
3: End button, 54: Confirm end button, 55: Backup label list display area.

Claims (13)

[Claims] An editing means for editing each parameter set used for controlling the apparatus, wherein the editing means accepts a change to each parameter value of a parameter set to be edited, and stores a result of the change. An exposure apparatus comprising:
An exposure apparatus, characterized in that each successive change result is cumulatively stored as change history information including information necessary for restoring the contents of a parameter set at the time of each change. 2. The image processing apparatus according to claim 1, wherein the editing unit restores the parameter set to be edited as an editing object having the contents of a change result at a designated arbitrary change point based on the change history information. The exposure apparatus according to claim 1, wherein the exposure is performed. 3. The exposure apparatus according to claim 2, wherein the editing unit accepts the change and saves change history information for the restored parameter set. 4. The exposure apparatus according to claim 2, wherein the editing unit has a unit that saves the restored parameter set as another parameter set. 5. The method according to claim 1, wherein each change history information includes information on the number of changes indicating the number of changes counted for each parameter set, and a corresponding parameter change value. The exposure apparatus according to claim 1. 6. The editing means accepts an editor name and a comment when each change history information is stored, and the storage means stores the information as a part of each change history information. The exposure apparatus according to claim 1. 7. Each change history information includes an editor name, a comment, a history number indicating the number of changes for each parameter set,
The exposure apparatus according to any one of claims 1 to 6, wherein the editing unit includes a unit for displaying a list of the information. 8. The exposure apparatus according to claim 7, wherein the restoring unit restores the parameter set based on a selected one of the contents displayed in the list. 9. The apparatus according to claim 1, wherein said editing means has means for storing identification information for specifying the selected parameter set and said change history information which is a basis for restoring the selected parameter set. 2. The exposure apparatus according to claim 1. 10. The editing means accepts the selection of the parameter set by allowing the user to select from among options for selecting all parameter sets and options for selecting a predetermined group of parameter sets. The exposure apparatus according to claim 9, wherein: 11. The method according to claim 11, wherein the editing unit is configured to perform, based on a selected one of the stored identification information, the restoration of a parameter set specified by the identification information. Item 11. An exposure apparatus according to Item 10. 12. A method comprising: accepting a change to each parameter value of each parameter set; storing a result of the change; and performing an exposure process while controlling an exposure apparatus based on each parameter set. In the device manufacturing method, in the storing step, successive change results are stored cumulatively as change history information including information necessary for restoring the contents of the parameter set at each change point in time. Device manufacturing method. 13. A step of storing identification information for specifying each selected parameter set and each change history information serving as a basis for restoring the parameter set, and specifying a selected one of the stored identification information. 13. The method according to claim 12, further comprising the step of performing the restoration for each parameter set and change history information.