JP2001263957A - Vacuum furnace - Google Patents

Vacuum furnace

Info

Publication number
JP2001263957A
JP2001263957A JP2000080534A JP2000080534A JP2001263957A JP 2001263957 A JP2001263957 A JP 2001263957A JP 2000080534 A JP2000080534 A JP 2000080534A JP 2000080534 A JP2000080534 A JP 2000080534A JP 2001263957 A JP2001263957 A JP 2001263957A
Authority
JP
Japan
Prior art keywords
heat transfer
radiant tube
transfer plate
vacuum furnace
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000080534A
Other languages
Japanese (ja)
Inventor
Masao Hattori
雅夫 服部
Toshiharu Shimizu
敏春 清水
Kenjiro Sato
健二郎 佐藤
Hirokazu Matsubara
寛和 松原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daido Steel Co Ltd
Toho Gas Co Ltd
Original Assignee
Daido Steel Co Ltd
Toho Gas Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daido Steel Co Ltd, Toho Gas Co Ltd filed Critical Daido Steel Co Ltd
Priority to JP2000080534A priority Critical patent/JP2001263957A/en
Publication of JP2001263957A publication Critical patent/JP2001263957A/en
Pending legal-status Critical Current

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  • Powder Metallurgy (AREA)
  • Crucibles And Fluidized-Bed Furnaces (AREA)
  • Furnace Details (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain of a high-quality product by uniformly heating a material to be treated while achieving the quick cooling of the material efficiently. SOLUTION: A plurality of combustion type radiant tube heaters 34 facing the inside of a treating chamber 16 are arranged in a vacuum furnace 10 so as to be placed between heat insulating walls 14 and a material 18 to be treated. Heat transfer plates 36 whose size is set so as to be capable of covering whole of the surface of the material 18, which is opposed to the radiant tube heater 34, are arranged between the radiant tube heaters 34 and the material 18 in the treating chamber 16. Whole of the heat transfer plates 36 is heated by radiation from the radiant tube heaters 34 and whole of the material 18 is heated uniformly by the radiant heat of the heat transfer plates 36. Dampers 40 for regulating and controlling inert gas, which flows into the treating chamber 16, so as to flow toward the side of the material 18 mainly, are arranged at the lower ends of the heat transfer plates 36 so as to be capable of controlling the slanting of the dampers 40.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、ラジアントチュ
ーブヒータを用いて処理品を加熱する真空炉に関するも
のである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum furnace for heating a processed product using a radiant tube heater.

【0002】[0002]

【従来の技術】各種合金製品の粉末焼結やセラミック製
品の焼成等に用いられる真空炉は、真空容器内に、断熱
壁で囲繞された処理室が画成され、該処理室内に装入し
た処理品を、電気抵抗式ヒータを用いて加熱するよう構
成されている。
2. Description of the Related Art In a vacuum furnace used for powder sintering of various alloy products, firing of ceramic products, etc., a processing chamber surrounded by heat insulating walls is defined in a vacuum vessel. The processed article is configured to be heated using an electric resistance heater.

【0003】しかし、加熱源として電気抵抗式ヒータの
みを使用する従来の真空炉では、ランニングコストが嵩
む難点があった。そこで、ランニングコストを低く抑え
ることのできる、液化天然ガス等を燃料とする熱放射
管、すなわちラジアントチューブヒータを加熱源として
用いる提案がなされている。またラジアントチューブヒ
ータは、処理品からの蒸発物に対するヒータの保護を図
り得る点でも優れている。
However, the conventional vacuum furnace using only an electric resistance heater as a heating source has a problem that running costs are increased. Therefore, a proposal has been made to use a heat radiation tube using liquefied natural gas or the like as a fuel, that is, a radiant tube heater as a heating source, which can keep running costs low. The radiant tube heater is also excellent in that the heater can be protected from the evaporant from the processed product.

【0004】[0004]

【発明が解決しようとする課題】前記ラジアントチュー
ブヒータは、前述したように電気抵抗式ヒータに比べて
ランニングコストを低減し得る点で優れているが、電気
抵抗式ヒータのように緻密な配置が困難である。すなわ
ち、真空炉のように対流伝熱がなく、輻射伝熱によって
処理品を加熱する炉では、ラジアントチューブヒータの
配設位置近傍と、配設位置から離間している部位とでは
加熱能力の差が大きく、処理品の温度分布が不均一とな
るおそれがある。そして、このような処理品の加熱時に
発生する温度差に起因して、所期通りの高品質製品が得
られなくなる欠点を招く問題があった。
As described above, the radiant tube heater is superior in that the running cost can be reduced as compared with the electric resistance type heater, but the radiant tube heater has a dense arrangement like the electric resistance type heater. Have difficulty. That is, in a furnace such as a vacuum furnace that does not have convective heat transfer and heats a processed product by radiant heat transfer, the difference in heating capacity between the vicinity of the radiant tube heater installation position and the part distant from the installation position is different. And the temperature distribution of the processed product may be non-uniform. In addition, there is a problem in that a high quality product as expected cannot be obtained due to a temperature difference generated when the processed product is heated.

【0005】また前記真空炉において、加熱後の処理品
を処理室内で冷却する場合は、炉内全体を冷却すること
が必要であるが、焼入れ効果を高める冷却では、処理品
を急速に冷却することが重要である。従来、処理品を急
速に冷却する場合は、炉内に不活性ガスを供給し、炉内
に配設したファンを用いて不活性ガスを断熱壁の内外に
循環させている。しかるに、処理室内での不活性ガスの
流れは制御されておらず、処理品を冷却するのに時間が
掛かる難点があった。
[0005] In the vacuum furnace, when the processed product after heating is cooled in the processing chamber, it is necessary to cool the entire furnace. In the cooling for enhancing the quenching effect, the processed product is rapidly cooled. This is very important. Conventionally, when a processed product is rapidly cooled, an inert gas is supplied into the furnace, and the inert gas is circulated inside and outside the heat insulating wall using a fan provided in the furnace. However, the flow of the inert gas in the processing chamber is not controlled, so that it takes time to cool the processed product.

【0006】[0006]

【発明の目的】この発明は、前述した従来の技術に内在
している前記課題に鑑み、これを好適に解決するべく提
案されたものであって、処理品を均一に加熱して、高品
質製品を得ることができ、また処理品の急速冷却を効率
的に達成し得る真空炉を提供することを目的とする。
SUMMARY OF THE INVENTION The present invention has been proposed in view of the above-mentioned problems inherent in the prior art, and has been proposed to solve the problem suitably. It is an object of the present invention to provide a vacuum furnace capable of obtaining a product and efficiently achieving rapid cooling of a processed product.

【0007】[0007]

【課題を解決するための手段】前述した課題を解決し、
所期の目的を好適に達成するため、本発明に係る真空炉
は、真空チャンバー内に断熱壁で囲まれた処理室を設
け、該処理室に装入される処理品と断熱壁との間にラジ
アントチューブヒータを配設した真空炉において、前記
処理品とラジアントチューブヒータとの間に、処理品の
均一な温度分布を向上させる伝熱板を配置したことを特
徴とする。
[MEANS FOR SOLVING THE PROBLEMS]
In order to appropriately achieve the intended purpose, the vacuum furnace according to the present invention is provided with a processing chamber surrounded by a heat insulating wall in a vacuum chamber, and a space between a processing product charged into the processing chamber and the heat insulating wall. In a vacuum furnace provided with a radiant tube heater, a heat transfer plate for improving a uniform temperature distribution of the processed product is disposed between the processed product and the radiant tube heater.

【0008】[0008]

【発明の実施の形態】次に、本発明に係る真空炉につ
き、好適な実施例を挙げて、添付図面を参照しながら以
下説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, a vacuum furnace according to the present invention will be described below with reference to the accompanying drawings by way of preferred embodiments.

【0009】図1および図2は、実施例に係る真空炉を
示すものであって、該真空炉10における真空チャンバ
ー12の内部には、金属材料からなる保持材に断熱材を
配設することで箱状に形成した断熱壁14が収納される
と共に、該断熱壁14により囲繞されて処理室16が内
部画成されている。この処理室16の内部に、処理品1
8が載置される載置台20が配置され、該載置台20に
載置された処理品18は、処理室16の内部略中央に臨
むよう設定される。また、真空チャンバー12には真空
ポンプ(図示せず)が接続され、該真空チャンバー12お
よび処理室16の内部を略真空雰囲気とし得るよう構成
される。
FIGS. 1 and 2 show a vacuum furnace according to an embodiment. In a vacuum chamber 12 of the vacuum furnace 10, a heat insulating material is provided on a holding material made of a metal material. A heat-insulating wall 14 formed in a box shape is stored therein, and a processing chamber 16 is defined by being surrounded by the heat-insulating wall 14. Inside the processing chamber 16, the processed product 1
A mounting table 20 on which the mounting 8 is mounted is arranged, and the processing product 18 mounted on the mounting table 20 is set so as to face substantially the center of the inside of the processing chamber 16. Further, a vacuum pump (not shown) is connected to the vacuum chamber 12, and the inside of the vacuum chamber 12 and the processing chamber 16 can be set to a substantially vacuum atmosphere.

【0010】前記真空チャンバー12の上部にモータ2
2が配設され、該モータ22により回転されるファン2
4が、断熱壁14と真空チャンバー12との間(断熱壁
外)に臨んでおり、前記処理品18の冷却時に真空チャ
ンバー12の内部に供給される不活性ガス(炉内雰囲気
ガス)を循環させるよう構成される。また真空チャンバ
ー12と断熱壁14との間には、図1に示す如く、該断
熱壁14を挟む炉幅方向の左右両側に、冷却水が循環す
るクーラー26が夫々配設され、ファン24の回転によ
り循環される不活性ガスを冷却するよう構成されてい
る。前記断熱壁14の天井部および底部に夫々開口部2
8が形成され、各開口部28に開閉扉30が開閉可能に
配設されると共に、該開閉扉30は真空チャンバー12
の外部に配設した流体圧シリンダ32を介して開閉作動
されるようになっている。すなわち、両開閉扉30,3
0は、処理品18の加熱時には開口部28,28を閉成
(図1)し、処理品18の冷却時には開口部28,28を
開放(図2)してクーラー26で冷却された不活性ガスが
処理室16内を循環するようにして、該処理品18を焼
入れレベルまで急速冷却し得るよう構成される。
A motor 2 is provided above the vacuum chamber 12.
2 is disposed, and the fan 2 rotated by the motor 22 is provided.
4 faces between the heat insulating wall 14 and the vacuum chamber 12 (outside the heat insulating wall) and circulates an inert gas (furnace atmosphere gas) supplied to the inside of the vacuum chamber 12 when the processing product 18 is cooled. It is configured to As shown in FIG. 1, coolers 26 for circulating cooling water are provided between the vacuum chamber 12 and the heat insulating wall 14 on both left and right sides in the furnace width direction with the heat insulating wall 14 interposed therebetween. It is configured to cool the inert gas circulated by rotation. Openings 2 are provided at the ceiling and the bottom of the heat insulating wall 14, respectively.
8 is formed, and an opening / closing door 30 is disposed at each opening 28 so as to be openable and closable, and the opening / closing door 30 is attached to the vacuum chamber 12.
Is opened and closed via a fluid pressure cylinder 32 disposed outside the device. That is, both doors 30, 3
0 indicates that the openings 28 are closed when the processed product 18 is heated.
1 (FIG. 1), the openings 28, 28 are opened (FIG. 2) at the time of cooling the processing product 18, so that the inert gas cooled by the cooler 26 circulates in the processing chamber 16, so that the processing product 18 is cooled. Is rapidly cooled to the quenching level.

【0011】前記真空炉10には、真空チャンバー12
および断熱壁14を貫通して処理室16の内部に臨む複
数の燃焼式のラジアントチューブヒータ34が、処理品
18を挟む炉幅方向の両側に、該断熱壁14と処理品1
8との間に臨むように、夫々炉壁に沿って上下方向に延
在するよう配設されている。すなわち真空炉10では、
処理室16に装入された処理品18を、複数のラジアン
トチューブヒータ34により加熱するよう構成される。
The vacuum furnace 10 includes a vacuum chamber 12.
A plurality of combustion-type radiant tube heaters 34 penetrating through the heat insulating wall 14 and facing the inside of the processing chamber 16 are provided on both sides of the processing product 18 in the furnace width direction with the heat insulating wall 14 and the processing product 1.
8 are arranged so as to extend in the vertical direction along the furnace wall, respectively. That is, in the vacuum furnace 10,
The processing product 18 loaded in the processing chamber 16 is configured to be heated by a plurality of radiant tube heaters 34.

【0012】前記処理室16には、図1に示す如く、処
理品18を挟む炉幅方向の各側に位置する前記ラジアン
トチューブヒータ34と該処理品18との間には、処理
品18のラジアントチューブヒータ34との対向面の全
体を蔽い得る寸法に設定した伝熱板36が配置されてい
る。そして、ラジアントチューブヒータ34からの輻射
により伝熱板36の全体を加熱し、該伝熱板36の輻射
熱によって処理品18の全体を均一に加熱するよう構成
される。また各伝熱板36は、図3に示す如く、ラジア
ントチューブヒータ34の配設位置から離間する位置、
すなわち輻射加熱能力の低い位置に通孔38を形成する
ことで、伝熱板36における全体の温度分布のより一層
の均一化を図ることができる。なお通孔38は、複数の
孔であっても1つの孔であってもよい。
As shown in FIG. 1, the processing chamber 16 is provided between the radiant tube heater 34 located on each side in the furnace width direction of the processing product 18 and the processing product 18 as shown in FIG. A heat transfer plate 36 set to a size capable of covering the entire surface facing the radiant tube heater 34 is provided. The entirety of the heat transfer plate 36 is heated by radiation from the radiant tube heater 34, and the entire processed product 18 is uniformly heated by the radiant heat of the heat transfer plate 36. Further, as shown in FIG. 3, each heat transfer plate 36 is located at a position separated from a position where the radiant tube heater 34 is disposed,
That is, by forming the through hole 38 at a position where the radiation heating capability is low, the temperature distribution of the entire heat transfer plate 36 can be made more uniform. The through hole 38 may be a plurality of holes or a single hole.

【0013】前記各伝熱板36の下端には、調整手段と
してのダンパ40が傾動調整可能に配設され、該ダンパ
40によって、前記底部の開口部28から処理室16内
に流入する不活性ガスを、主に処理品18側に流れるよ
う調整制御することで、該処理品18の急速冷却を効率
的に行ない得るよう構成される。
At the lower end of each of the heat transfer plates 36, a damper 40 as an adjusting means is disposed so as to be capable of adjusting the tilt. The damper 40 allows the inert gas flowing into the processing chamber 16 from the opening 28 at the bottom. By adjusting and controlling the gas to flow mainly toward the processing product 18, the processing product 18 can be rapidly cooled.

【0014】[0014]

【実施例の作用】次に、実施例に係る真空炉の作用につ
き説明する。図1に示す如く、前記断熱壁14の開口部
28,28を開閉扉30,30により閉成した状態で、前
記処理室16内を図示しない真空ポンプで真空雰囲気と
し、ラジアントチューブヒータ34を加熱する。この場
合において、ラジアントチューブヒータ34からの輻射
は、前記伝熱板36に伝えられ、該伝熱板36の全体が
略均一に加熱される。この伝熱板36は、処理品18の
対向する側面の全体を蔽い得る寸法に設定されているか
ら、該伝熱板36の輻射によって処理品18の全体が略
均一に加熱される。すなわち、処理品18の加熱時に温
度差が生ずることを抑制し、所期通りの高品質製品を得
ることができるものである。
Next, the operation of the vacuum furnace according to the embodiment will be described. As shown in FIG. 1, in a state where the openings 28, 28 of the heat insulating wall 14 are closed by opening / closing doors 30, 30, the processing chamber 16 is evacuated to a vacuum atmosphere by a vacuum pump (not shown), and the radiant tube heater 34 is heated. I do. In this case, the radiation from the radiant tube heater 34 is transmitted to the heat transfer plate 36, and the entire heat transfer plate 36 is substantially uniformly heated. Since the heat transfer plate 36 is set to have such a size as to cover the entire opposing side surface of the processed product 18, the radiation of the heat transfer plate 36 heats the entire processed product 18 substantially uniformly. That is, it is possible to suppress the occurrence of a temperature difference when heating the processed product 18 and obtain a desired high-quality product.

【0015】また伝熱板36に、図3に示す如く、前記
ラジアントチューブヒータ34の配設位置から離間する
位置に通孔38を形成し、該伝熱板36の輻射加熱能力
が均一化するよう調整すると、処理品18の温度分布を
より一層均一化することが可能である。
As shown in FIG. 3, a through hole 38 is formed in the heat transfer plate 36 at a position away from the position where the radiant tube heater 34 is disposed, so that the heat transfer capability of the heat transfer plate 36 is made uniform. With such adjustment, the temperature distribution of the processed product 18 can be further uniformed.

【0016】前記処理品18の加熱処理が完了すると、
前記ラジアントチューブヒータ34の燃焼を停止すると
共に、図2に示す如く、前記開閉扉30,30を作動し
て開口部28,28を開放する。また真空チャンバー1
2内に不活性ガスを供給したもとで、前記ファン24を
回転することで不活性ガスは前記クーラー26,26に
接触して冷却され、このガスが開口部28,28を介し
て処理室16の内部を循環する。また底部の開口部28
を介して処理室16内に流入した不活性ガスは、前記各
伝熱板36に配設されたダンパ40によって、主に処理
品18側に流れるよう調整制御される。これにより、前
記処理品18は焼入れレベルまで効率的に急速冷却され
る。
When the heat treatment of the processed product 18 is completed,
The combustion of the radiant tube heater 34 is stopped, and as shown in FIG. 2, the doors 30, 30 are operated to open the openings 28, 28. Vacuum chamber 1
The inert gas is cooled by contacting the coolers 26, 26 by rotating the fan 24 with the inert gas supplied into the processing chamber 2 through the openings 28, 28. Circulates inside the 16. Opening 28 at the bottom
The inert gas that has flowed into the processing chamber 16 via the heat transfer plate 36 is adjusted and controlled by a damper 40 disposed on each of the heat transfer plates 36 so as to flow mainly toward the processing product 18. Thereby, the processed product 18 is efficiently and rapidly cooled to the quenching level.

【0017】なお、実施例では燃焼式のラジアントチュ
ーブヒータを用いた場合で説明したが、電気抵抗式のラ
ジアントチューブヒータを採用したものであってもよ
い。また実施例では、調整手段として伝熱板の下端に傾
動調整可能に配設したダンパを用いたが、該伝熱板の一
端に所定角度で一体的に折曲形成した折曲部により不活
性ガスの流れ方向を調整制御する構成を採用し得る。更
に、伝熱板をパンチングメタルで構成すると共に、その
通孔の数や配置を適宜に設定することで、該伝熱板の輻
射加熱能力を均一化してもよい。但し、伝熱板に通孔を
形成しなくても、処理品の温度分布を均一化し得るの
で、該通孔を形成しない伝熱板を採用することも可能で
ある。
Although the embodiment has been described using a combustion type radiant tube heater, an electric resistance type radiant tube heater may be employed. Further, in the embodiment, the damper disposed so as to be capable of adjusting the tilt at the lower end of the heat transfer plate is used as the adjusting means, but is inactivated by a bent portion integrally formed at one end of the heat transfer plate at a predetermined angle. A configuration for adjusting and controlling the gas flow direction may be employed. Further, the heat transfer plate may be made of a punching metal, and the number and arrangement of the through holes may be appropriately set to make the radiation heating capability of the heat transfer plate uniform. However, even if the through holes are not formed in the heat transfer plate, the temperature distribution of the processed product can be made uniform, so that a heat transfer plate without the through holes can be employed.

【0018】[0018]

【実験例】前記伝熱板36に通孔38を設けない発明例
1、伝熱板36に通孔38を設けた発明例2および伝熱
板36を配置しない従来例について、処理品18として
金型鋼を用いて炉温1050℃で加熱した場合の温度分
布および1050℃から400℃まで冷却するのに要す
る冷却時間を、表1に示す。なお、発明例1および発明
例2の伝熱板36では、ダンパ40により不活性ガスが
主に処理品18側を流れるよう調整制御してある。
[Experimental Examples] Inventive Example 1 in which the through hole 38 is not provided in the heat transfer plate 36, Inventive Example 2 in which the through hole 38 is provided in the heat transfer plate 36, and a conventional example in which the heat transfer plate 36 is not provided, are treated products Table 1 shows the temperature distribution in the case of heating at a furnace temperature of 1050 ° C. using mold steel and the cooling time required to cool from 1050 ° C. to 400 ° C. In the heat transfer plates 36 of Invention Example 1 and Invention Example 2, the adjustment control is performed by the damper 40 so that the inert gas mainly flows on the processed product 18 side.

【0019】 [0019]

【0020】すなわち、この実験結果から、伝熱板36
およびダンパ40を配設することにより、温度分布およ
び冷却時間が、従来例に比較して向上することが明らか
となった。また伝熱板36に通孔38を設けることで、
処理品18の温度分布の均一化が更に向上することも確
認された。
That is, from the results of this experiment, the heat transfer plate 36
It has been clarified that the provision of the damper 40 improves the temperature distribution and the cooling time as compared with the conventional example. Further, by providing the through holes 38 in the heat transfer plate 36,
It was also confirmed that the uniformity of the temperature distribution of the processed product 18 was further improved.

【0021】[0021]

【発明の効果】以上説明した如く、本発明に係る真空炉
では、ラジアントチューブヒータと処理品との間に伝熱
板を配置することで、ヒータにより加熱された伝熱板に
より処理品の全体を略均一に加熱して、高品質製品を得
ることができる。また、伝熱板に通孔を形成して輻射加
熱能力を均一化することで、更に処理品の均一加熱を達
成し得る。更に、伝熱板に炉内雰囲気ガスの流れ方向を
調整制御する調節手段を設けることで、処理品の急速冷
却を効率的に達成し得る効果を奏する。
As described above, in the vacuum furnace according to the present invention, by disposing the heat transfer plate between the radiant tube heater and the processed product, the whole of the processed product is heated by the heat transfer plate heated by the heater. Can be heated substantially uniformly to obtain a high quality product. Further, by forming through holes in the heat transfer plate to make the radiation heating capability uniform, it is possible to further achieve uniform heating of the processed product. Further, by providing the heat transfer plate with adjusting means for adjusting and controlling the flow direction of the atmosphere gas in the furnace, there is an effect that the rapid cooling of the processed product can be efficiently achieved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の好適な実施例に係る真空炉を処理品の
加熱状態で示す概略縦断側面図である。
FIG. 1 is a schematic vertical sectional side view showing a vacuum furnace according to a preferred embodiment of the present invention in a state where a processed product is heated.

【図2】実施例に係る真空炉を処理品の冷却状態で示す
概略縦断側面図である。
FIG. 2 is a schematic vertical sectional side view showing the vacuum furnace according to the example in a state where a processed product is cooled.

【図3】実施例に係る真空炉の要部横断平面図である。FIG. 3 is a cross-sectional plan view of a main part of a vacuum furnace according to an example.

【符号の説明】[Explanation of symbols]

12 真空チャンバー 14 断熱壁 16 処理室 18 処理品 24 ファン 28 開口部 34 ラジアントチューブヒータ 36 伝熱板 38 通孔 40 ダンパ(調整手段) DESCRIPTION OF SYMBOLS 12 Vacuum chamber 14 Heat insulation wall 16 Processing chamber 18 Processed product 24 Fan 28 Opening 34 Radiant tube heater 36 Heat transfer plate 38 Through hole 40 Damper (adjustment means)

───────────────────────────────────────────────────── フロントページの続き (72)発明者 清水 敏春 愛知県名古屋市熱田区桜田町19番18号 東 邦瓦斯株式会社内 (72)発明者 佐藤 健二郎 愛知県豊明市栄町大根1番地の945 (72)発明者 松原 寛和 愛知県東海市加木屋町南鹿持18 Fターム(参考) 4K018 DA32 DA33 4K046 BA08 CC01 4K063 AA07 AA16 CA01 CA03 DA26 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Toshiharu Shimizu 19-18 Sakuradacho, Atsuta-ku, Nagoya City, Aichi Prefecture Inside Higashi Kuni Gas Co., Ltd. 72) Inventor Hirokazu Matsubara 18 F-term (reference) 4K018 DA32 DA33 4K046 BA08 CC01 4K063 AA07 AA16 CA01 CA03 DA26

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 真空チャンバー(12)内に断熱壁(14)で囲
まれた処理室(16)を設け、該処理室(16)に装入される処
理品(18)と断熱壁(14)との間にラジアントチューブヒー
タ(34)を配設した真空炉において、 前記処理品(18)とラジアントチューブヒータ(34)との間
に、処理品(18)の均一な温度分布を向上させる伝熱板(3
6)を配置したことを特徴とする真空炉。
A processing chamber (16) surrounded by a heat insulating wall (14) is provided in a vacuum chamber (12), and a processing product (18) charged into the processing chamber (16) and a heat insulating wall (14) are provided. In a vacuum furnace having a radiant tube heater (34) disposed between the treated product (18) and the radiant tube heater (34), a uniform temperature distribution of the treated product (18) is improved. Heat transfer plate (3
A vacuum furnace, wherein 6) is arranged.
【請求項2】 前記伝熱板(36)に、その輻射加熱能力が
均一となるように通孔(38)を形成した請求項1記載の真
空炉。
2. The vacuum furnace according to claim 1, wherein a through hole is formed in said heat transfer plate so as to have a uniform radiant heating capability.
【請求項3】 前記断熱壁(14)に設けた開口部(28,28)
を介して炉内雰囲気ガスを処理室(16)内に循環させるフ
ァン(24)を備え、前記伝熱板(36)には、処理室(16)内を
流れる炉内雰囲気ガスの流れ方向を調整する調整手段(4
0)が配設されている請求項1または2記載の真空炉。
3. Openings (28, 28) provided in said heat insulating wall (14).
A fan (24) for circulating the furnace atmosphere gas into the processing chamber (16) through the heat transfer plate (36). Adjusting means (4
The vacuum furnace according to claim 1 or 2, wherein (0) is provided.
JP2000080534A 2000-03-22 2000-03-22 Vacuum furnace Pending JP2001263957A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000080534A JP2001263957A (en) 2000-03-22 2000-03-22 Vacuum furnace

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000080534A JP2001263957A (en) 2000-03-22 2000-03-22 Vacuum furnace

Publications (1)

Publication Number Publication Date
JP2001263957A true JP2001263957A (en) 2001-09-26

Family

ID=18597627

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000080534A Pending JP2001263957A (en) 2000-03-22 2000-03-22 Vacuum furnace

Country Status (1)

Country Link
JP (1) JP2001263957A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004275994A (en) * 2003-03-19 2004-10-07 Toray Ind Inc Method for manufacturing hollow fiber membrane module and apparatus for manufacturing hollow fiber membrane module used for the same
JP2009518617A (en) * 2005-12-06 2009-05-07 プラクスエア・テクノロジー・インコーポレイテッド Heat exchange system and method for magnetic annealing apparatus
JP2010025406A (en) * 2008-07-17 2010-02-04 Sinfonia Technology Co Ltd Vacuum heating device and vacuum heating treatment method
CN108607988A (en) * 2018-05-04 2018-10-02 株洲稀美泰材料有限责任公司 Vertical sintering furnace balance system and use its vertical sintering furnace

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004275994A (en) * 2003-03-19 2004-10-07 Toray Ind Inc Method for manufacturing hollow fiber membrane module and apparatus for manufacturing hollow fiber membrane module used for the same
JP2009518617A (en) * 2005-12-06 2009-05-07 プラクスエア・テクノロジー・インコーポレイテッド Heat exchange system and method for magnetic annealing apparatus
KR101328278B1 (en) * 2005-12-06 2013-11-14 프랙스에어 테크놀로지, 인코포레이티드 Magnetic annealing tool heat exchange system and processes
JP2010025406A (en) * 2008-07-17 2010-02-04 Sinfonia Technology Co Ltd Vacuum heating device and vacuum heating treatment method
CN108607988A (en) * 2018-05-04 2018-10-02 株洲稀美泰材料有限责任公司 Vertical sintering furnace balance system and use its vertical sintering furnace

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