JP2001261377A - Glass with laminated film - Google Patents
Glass with laminated filmInfo
- Publication number
- JP2001261377A JP2001261377A JP2000079630A JP2000079630A JP2001261377A JP 2001261377 A JP2001261377 A JP 2001261377A JP 2000079630 A JP2000079630 A JP 2000079630A JP 2000079630 A JP2000079630 A JP 2000079630A JP 2001261377 A JP2001261377 A JP 2001261377A
- Authority
- JP
- Japan
- Prior art keywords
- film
- layer
- refractive index
- transparent
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 title claims abstract description 29
- 239000000758 substrate Substances 0.000 claims abstract description 29
- 230000003287 optical effect Effects 0.000 claims abstract description 24
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 24
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 13
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 13
- 230000001699 photocatalysis Effects 0.000 claims description 7
- 230000000638 stimulation Effects 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 4
- 239000010410 layer Substances 0.000 abstract description 39
- 239000002344 surface layer Substances 0.000 abstract description 13
- 230000005284 excitation Effects 0.000 abstract 1
- 238000010030 laminating Methods 0.000 abstract 1
- 239000002932 luster Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 84
- 239000000463 material Substances 0.000 description 16
- 239000000377 silicon dioxide Substances 0.000 description 12
- 239000011247 coating layer Substances 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 239000002356 single layer Substances 0.000 description 4
- 229910006404 SnO 2 Inorganic materials 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 239000005357 flat glass Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 235000008733 Citrus aurantifolia Nutrition 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 235000011941 Tilia x europaea Nutrition 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000004040 coloring Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 239000005329 float glass Substances 0.000 description 2
- 239000004571 lime Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- OVUAGMYZTNYYHJ-UHFFFAOYSA-N oxygen(2-) titanium(4+) Chemical compound [O-2].[O-2].[Ti+4].[O-2].[Ti+4].[Ti+4] OVUAGMYZTNYYHJ-UHFFFAOYSA-N 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- 102100032566 Carbonic anhydrase-related protein 10 Human genes 0.000 description 1
- 102100033029 Carbonic anhydrase-related protein 11 Human genes 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 101000867836 Homo sapiens Carbonic anhydrase-related protein 10 Proteins 0.000 description 1
- 101000867841 Homo sapiens Carbonic anhydrase-related protein 11 Proteins 0.000 description 1
- 101001075218 Homo sapiens Gastrokine-1 Proteins 0.000 description 1
- 101000650817 Homo sapiens Semaphorin-4D Proteins 0.000 description 1
- 102100027744 Semaphorin-4D Human genes 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HHOHUIYBZRDRSZ-UHFFFAOYSA-N [O--].[O--].[O--].[O--].[Ti+4].[Ti+4].[Ti+4].[Ti+4] Chemical compound [O--].[O--].[O--].[O--].[Ti+4].[Ti+4].[Ti+4].[Ti+4] HHOHUIYBZRDRSZ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000005118 spray pyrolysis Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
Landscapes
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- Catalysts (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Exhaust Gas Treatment By Means Of Catalyst (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は平滑表面を有する比
較的低い屈折率の透明なガラス基体上に高屈折率膜を高
膜厚、すなわち200nm以上の膜厚で被覆した積層膜付き
透明基体に係り、殊に前記高屈折率、高膜厚の被膜に起
因して被膜表面における反射光と被膜／基体の界面での
反射光の作用により発生する虹彩色を極力無彩色にすべ
く設計工夫した積層膜付き透明基体に関する。BACKGROUND OF THE INVENTION The present invention relates to a transparent substrate with a laminated film comprising a transparent glass substrate having a relatively low refractive index having a smooth surface and a high refractive index film coated thereon with a high film thickness, that is, a film thickness of 200 nm or more. In particular, the design was devised to make the iris color generated by the action of the reflected light on the coating surface and the reflected light at the coating / substrate interface as achromatic as possible as a result of the high refractive index, high thickness coating. The present invention relates to a transparent substrate with a laminated film.
【０００２】[0002]
【従来技術および解決すべき課題】屈折率が1.6以下の
比較的低い屈折率のガラス基体上に、屈折率が2.0を越
える高屈折率膜を形成する例としては、酸化チタン膜で
代表される光触媒機能膜を形成する例がある。光触媒機
能膜は、ガラス表面に水滴が付着して曇りが生ずるよう
な場合に、水滴を水膜に変えることにより曇りを防ぐべ
く親水性能を付与したり、ガラス表面に有機質塵埃が付
着して汚れが生ずるような場合に、塵埃を分解、ガス化
して汚れを防ぐべく有機物分解・防汚性能を付与する目
的で施される。2. Description of the Related Art An example of forming a high refractive index film having a refractive index exceeding 2.0 on a glass substrate having a relatively low refractive index having a refractive index of 1.6 or less is a titanium oxide film. There is an example of forming a photocatalytic function film. When water droplets adhere to the glass surface and cause fogging, the photocatalytic function film imparts hydrophilicity to prevent fogging by changing the water droplets to a water film, or stains due to organic dust adhering to the glass surface. In such a case, dust is decomposed and gasified to prevent contamination, so that organic substances are decomposed and stain-proofed.
【０００３】別に耐候性、耐摩耗性、紫外線遮断性、誘
電体特性、半導体特性等を付与するうえでの高屈折率膜
を施す例は少なからずある。There are quite a few examples of applying a high refractive index film for imparting weather resistance, abrasion resistance, ultraviolet ray blocking properties, dielectric properties, semiconductor properties, and the like.
【０００４】それらの膜は、前記性能を長期にわたり発
揮するうえで、膜厚200nm以上とするケースが多く、そ
の場合虹彩色が目立つという不具合がある。In order to exhibit the above-mentioned performance for a long period of time, these films are often made to have a film thickness of 200 nm or more, in which case there is a problem that the iris color is conspicuous.
【０００５】特公昭63−39535号公報には、透明ガラス
板に赤外反射性で透明半導体物質からなる第１の被覆層
と、前記ガラス板と第１の被覆層との間に、前記被覆層
の光彩色を減ずべく第２の被覆層を介在させたガラス構
造物であって、第２の被覆層の屈折率が、ガラス板の屈
折率×第１の被覆層の屈折率の平方根に相当し、かつ第
２の被覆層の厚みが、波長500nmの光の１／４λに相当
するものである無光彩ガラス構造物が開示され、また、
特公平１−57061号公報には、SiO2を多く含有するガラ
ス基材と、SiO2−SnO2系で基材側より離れるに従い漸次
SnO2を増大した下部被覆層と、フッ素ドープされたSnO2
からなる上部被覆層とからなる光彩（真珠光）を抑えた
ガラス構造物が開示され、更に特公平３−72586号公報
には、透明な基材と、0.1〜1.0μm厚の赤外反射性透明
半導体表層と、それらの間に前記基材側に配した第１中
間層成分、表層側に配した第２中間層成分を介在させ、
第１中間層成分の屈折率＞第２中間層成分の屈折率であ
って、それらの光学厚みが基材、第１中間層及び第２中
間層成分、更に表層の各屈折率を含む特定式より導き出
される特定値とすることが開示されている。JP-B-63-39535 discloses that a transparent glass plate is provided with a first coating layer made of a transparent semiconductor material which is infrared-reflective, and that the coating is provided between the glass plate and the first coating layer. A glass structure having a second coating layer interposed in order to reduce the glow of the layer, wherein the refractive index of the second coating layer is the refractive index of the glass plate × the square root of the refractive index of the first coating layer. And the thickness of the second coating layer is equivalent to １ ／ λ of light having a wavelength of 500 nm.
The Kokoku 1-57061 discloses a glass substrate containing a large amount of SiO 2, gradually with distance from the substrate side by SiO 2 -SnO 2 based
SnO 2 enriched undercoat layer and fluorine doped SnO 2
A glass structure in which the pearlescent light is suppressed is disclosed, comprising a transparent base material and a 0.1-1.0 μm thick infrared reflective material. A transparent semiconductor surface layer, a first intermediate layer component disposed on the base material side therebetween, and a second intermediate layer component disposed on the surface layer side therebetween,
Refractive index of first intermediate layer component> refractive index of second intermediate layer component, and the optical thickness thereof is a specific expression including each refractive index of the base material, the first intermediate layer and the second intermediate layer component, and the surface layer. It is disclosed that the specific value is derived more.
【０００６】それら従来技術に開示される赤外反射性半
導体被覆層として酸化錫、酸化インジウム等が挙げられ
ているが、これらは屈折率2.0以下である。また、各被
覆層として特定の数式条件にあてはめた屈折率の材料を
模索し、厳密に厚みを制御し成膜する手段は容易な技術
とはいい難い。勿論、被覆層の成分を漸次変化させる手
段も工業生産上、技術上に難点が多い。[0006] As the infrared-reflective semiconductor coating layer disclosed in the prior art, tin oxide, indium oxide and the like are mentioned, but these have a refractive index of 2.0 or less. Further, means for searching for a material having a refractive index applied to a specific mathematical condition for each coating layer and strictly controlling the thickness to form a film is not an easy technique. Of course, the means for gradually changing the components of the coating layer has many technical and technical difficulties.
【０００７】本発明は前記従来技術に開示される赤外反
射性透明半導体材料より屈折率が高い表層を有するガラ
ス基体に適用するもので、従ってより虹彩色が発現し易
い被膜の虹彩色の抑制に効果を奏するものである。The present invention is applied to a glass substrate having a surface layer having a higher refractive index than the infrared-reflective transparent semiconductor material disclosed in the above-mentioned prior art. Is effective.
【０００８】[0008]
【課題を解決するための手段】本発明は、平滑表面を有
する屈折率1.6以下のガラス基体の少なくとも片面に、
屈折率2.0を超え、かつ光学厚み200nm以上の表層透明膜
を膜付けした透明積層体であって、基体と表層透明膜と
の間に、基体側より第一層として屈折率2.0を超えた透
明膜を、該第一層上に第二層として屈折率1.6以下の透
明膜を積層介在させ、前記第一層と第二層の光学厚みの
合計が90〜180nmであり、これら膜付き基体の可視光反
射率が20％以下、かつ反射光刺激純度が20％以下である
積層膜付きガラス基体である。According to the present invention, a glass substrate having a smooth surface and a refractive index of 1.6 or less is provided on at least one surface thereof.
A transparent laminate having a refractive index of more than 2.0, and a surface transparent film having an optical thickness of 200 nm or more, and a transparent layer having a refractive index of more than 2.0 as a first layer from the substrate side between the substrate and the surface transparent film. The film, a transparent film having a refractive index of 1.6 or less as a second layer is interposed on the first layer, and the total optical thickness of the first layer and the second layer is 90 to 180 nm. A glass substrate with a laminated film having a visible light reflectance of 20% or less and a reflected light stimulation purity of 20% or less.
【０００９】前記において表層透明膜が光触媒機能を有
する膜であることが好ましい。In the above, it is preferable that the surface transparent film is a film having a photocatalytic function.
【００１０】更に前記光触媒機能を有する膜が酸化チタ
ン膜であることが好ましい。It is preferable that the film having the photocatalytic function is a titanium oxide film.
【００１１】また、前記屈折率2.0を超えた第一層の透
明膜が光学厚み20〜80nmの酸化チタン膜、屈折率1.6以
下の第二層の透明膜が光学厚み50〜120nmの酸化珪素膜
であることが望ましい。The first transparent film having a refractive index exceeding 2.0 is a titanium oxide film having an optical thickness of 20 to 80 nm, and the second transparent film having a refractive index of 1.6 or less is a silicon oxide film having an optical thickness of 50 to 120 nm. It is desirable that
【００１２】[0012]
【発明の実施の形態】ガラス基体としては、透明で一般
的な珪酸塩系ガラスを採用する。ごく特殊な光学ガラス
を除けばガラスの屈折率は1.6以下である。前記ガラス
として具体的にはシリカガラス、高シリカガラス、ソー
ダ石灰シリカ系ガラスで代表されるアルカリ石灰シリカ
系ガラス、アルミノ石灰シリカ系ガラス、アルカリ硼珪
酸系ガラス、無アルカリ硼珪酸系ガラス等があるが、こ
れらの屈折率は1.45〜1.60程度である。DESCRIPTION OF THE PREFERRED EMBODIMENTS As a glass substrate, a transparent and general silicate glass is employed. Except for very special optical glass, the refractive index of glass is less than 1.6. Specific examples of the glass include silica glass, high silica glass, alkali lime silica glass represented by soda lime silica glass, alumino lime silica glass, alkali borosilicate glass, and alkali-free borosilicate glass. However, these refractive indexes are about 1.45 to 1.60.
【００１３】表層膜における屈折率が2.0を越える高屈
折率膜としては、前記光触媒機能膜としての酸化チタン
膜（酸化チタンに酸化ジルコニウム、酸化アルミニウ
ム、酸化珪素等を若干量混入したものも含む）がある。
また、酸化チタン膜より光触媒機能がやや劣っていた
り、着色して透明性を減じたりするが、酸化鉄、酸化ビ
スマス等の材料も含まれる。As the high refractive index film having a refractive index exceeding 2.0 in the surface layer film, a titanium oxide film as the photocatalytic function film (including a film obtained by mixing zirconium oxide, aluminum oxide, silicon oxide and the like in titanium oxide in a small amount). There is.
In addition, although the photocatalytic function is slightly inferior to the titanium oxide film or the transparency is reduced by coloring, materials such as iron oxide and bismuth oxide are also included.
【００１４】別に、耐候性、耐摩耗性を有する酸化ジル
コニウム膜や酸化タンタル膜（それらは誘電体特性も有
する）、紫外線遮断性を有する酸化セリウム膜、半導体
特性を有する酸化亜鉛膜等があり、これらも本発明の範
疇である。Separately, there are a zirconium oxide film and a tantalum oxide film having weather resistance and abrasion resistance (they also have dielectric properties), a cerium oxide film having ultraviolet blocking properties, a zinc oxide film having semiconductor properties, and the like. These are also within the scope of the present invention.
【００１５】それらの膜は、それら機能を長期にわたり
充分に発揮するうえで、膜厚200nm以上とするケースが
少なくなく、この場合、虹彩色が目立つという不具合が
あるが、本発明はそのような高膜厚のものを対象とし、
虹彩色を極力無彩色にすべく設計したものである。In order to sufficiently exhibit these functions over a long period of time, these films often have a film thickness of 200 nm or more. In this case, there is a problem that the iris color is conspicuous. For high film thickness,
The iris was designed to be as achromatic as possible.
【００１６】本発明は、上記屈折率が2.0を越える高屈
折率膜を200nm以上の光学膜厚で施すことを前提とし、
ガラスと高屈折率膜との間に介在する下地膜において、
第一層の透明膜の屈折率を2.0超過、第二層の透明膜の
屈折率を1.6以下、かつそれら透明膜の光学厚み合計を9
0〜180nmとすることにより、それら膜付き面側の可視光
反射率を20％以下、かつ反射光刺激純度を20％以下と
し、虹彩色を極力減ずることができる。The present invention is based on the premise that the high refractive index film having a refractive index of more than 2.0 is applied with an optical film thickness of 200 nm or more.
In the underlying film interposed between the glass and the high refractive index film,
The refractive index of the transparent film of the first layer exceeds 2.0, the refractive index of the transparent film of the second layer is 1.6 or less, and the total optical thickness of the transparent films is 9
By setting the thickness to 0 to 180 nm, the visible light reflectance on the film-coated side is set to 20% or less, and the reflected light stimulation purity is set to 20% or less, and the iris color can be reduced as much as possible.
【００１７】第一層の屈折率が2.0を越える透明膜とし
ては、表層膜同様の膜が採用できる。勿論光吸収、着色
の目立たない膜が望ましいことはいうまでもない。第二
層の屈折率が1.6以下の透明膜としては、ガラス基材同
様の膜が採用できるが、殊更多成分膜とする必要はな
く、酸化珪素、酸化アルミニウム、それらの混合膜等が
好適に採用できる。As the transparent film having the refractive index of the first layer exceeding 2.0, the same film as the surface film can be adopted. Needless to say, a film in which light absorption and coloring are not conspicuous is desirable. As the transparent film having a refractive index of the second layer of 1.6 or less, a film similar to a glass substrate can be employed, but it is not particularly necessary to use a multi-component film, and silicon oxide, aluminum oxide, a mixed film thereof and the like are preferable. Can be adopted.
【００１８】なお、上記膜厚範囲において、より好適に
は第一層の透明膜の光学厚みを20〜80nm、第二層の透明
膜の光学厚みを50〜120nmとするのが望ましく、それに
より、より虹彩色を無彩色に近づけることができる。In the above thickness range, it is more preferable that the optical thickness of the transparent film of the first layer is 20 to 80 nm, and the optical thickness of the transparent film of the second layer is 50 to 120 nm. The iris color can be made closer to achromatic color.
【００１９】各透明膜の形成手段としては、スパッタリ
ング法、ＣＶＤ法、塗布−熱分解法、スプレー−熱分解
法、ゾルゲル法等があり、成膜手段は特定するものでは
ない。以下、実施例により本発明を説明する。The means for forming each transparent film includes a sputtering method, a CVD method, a coating-pyrolysis method, a spray-pyrolysis method, a sol-gel method and the like, and the film formation means is not specified. Hereinafter, the present invention will be described with reference to examples.
【００２０】[0020]
【実施例】〔実施例１、２〕屈折率1.51のクリアーなソ
ーダ石灰シリカ系フロート板ガラス上に、第一層として
アモルファス(a)酸化チタン膜を、第二層としてアモル
ファス(a)シリカ膜を、第三層（表層膜）としてアモル
ファス(a)酸化チタン膜を、いずれもスパッタリング法
により成膜、積層した。[Examples 1 and 2] An amorphous (a) titanium oxide film as a first layer and an amorphous (a) silica film as a second layer were placed on a clear soda-lime-silica-based float plate glass having a refractive index of 1.51. Then, an amorphous (a) titanium oxide film was formed as a third layer (surface layer film) by sputtering and laminated.
【００２１】スパッタリング法は通常のＤＣスパッタリ
ング法によるもので、酸素ガスを含む不活性雰囲気（極
く低圧下）で、チタン、珪素等をターゲットとし、所要
電圧下グロー放電により板ガラス基板にスパッタリング
するもので、本実施例においては膜厚はスパッタリング
時間（搬送時間）により調整した。The sputtering method is a normal DC sputtering method, which is a method in which a target such as titanium or silicon is sputtered on a sheet glass substrate by a glow discharge under a required voltage in an inert atmosphere containing oxygen gas (at extremely low pressure). In this example, the film thickness was adjusted by the sputtering time (transport time).
【００２２】標準サンプル（単層膜サンプル）の分光光
度計による分光透過率、反射率を測定し、計算により各
膜の屈折率、光学厚みを求め、それを基に分光光度計測
定により、各試料（積層膜試料）について反射率、反射
光の主波長、刺激純度を求め、更に外観色調を観察し
た。The spectral transmittance and reflectance of a standard sample (single-layer film sample) were measured with a spectrophotometer, and the refractive index and optical thickness of each film were determined by calculation. With respect to the sample (laminated film sample), the reflectance, the main wavelength of reflected light, and the stimulus purity were determined, and the external color tone was observed.
【００２３】〔実施例３〕実施例１、２同様のシリカ系
板ガラス上に、実施例１、２同様の第一層としてアモル
ファス(a)酸化チタン膜を、第二層としてアモルファス
(a)シリカ膜を、第三層（表層膜）としてアモルファス
(a)酸化チタン膜を、いずれもＣＶＤ法により成膜、積
層した。[Embodiment 3] An amorphous (a) titanium oxide film was used as a first layer and an amorphous titanium oxide film was used as a second layer on a silica-based plate glass similar to the first and second embodiments.
(a) The silica film is amorphous as the third layer (surface layer)
(a) Titanium oxide films were all formed and deposited by the CVD method.
【００２４】ＣＶＤの条件は基板温度550℃、搬送速度
１ｍ/minで行い、各膜の原料はそれぞれチタンイソプロ
ポキシド（第一層、表層膜共通）、テトラエチルオルソ
シリケート（第二層）に依った。原料を加熱バブリング
し、空気をキャリアガスとして原料ガスを基板表面まで
送り、成膜した。本実施例に於いては膜厚は原料の加熱
温度により調整した。The CVD conditions are performed at a substrate temperature of 550 ° C. and a transfer speed of 1 m / min. The raw materials for each film depend on titanium isopropoxide (common to the first layer and the surface layer) and tetraethyl orthosilicate (second layer). Was. The raw material was heated and bubbled, and the raw material gas was sent to the substrate surface using air as a carrier gas to form a film. In this example, the film thickness was adjusted by the heating temperature of the raw material.
【００２５】実施例１、２同様に各単層膜の屈折率、光
学厚み測定結果を基に、積層膜試料について反射率、反
射光の主波長、刺激純度を求め、更に外観色調を観察し
た。In the same manner as in Examples 1 and 2, the reflectance, the principal wavelength of reflected light, and the stimulus purity of the laminated film sample were determined based on the measurement results of the refractive index and the optical thickness of each single-layer film, and the external color tone was observed. .
【００２６】〔比較例１〜４〕実施例１〜３同様のソー
ダ石灰シリカ系板ガラス上に、実施例１、２同様に各薄
膜を成膜、積層した。なお、比較例１は表層単層膜のみ
の成膜であり、比較例４は第二層相当の低屈折率膜およ
び表層膜の組合せからなる。Comparative Examples 1-4 Each thin film was formed and laminated in the same manner as in Examples 1 and 2 on the same soda-lime-silica glass sheet as in Examples 1-3. Note that Comparative Example 1 is formed by forming only the surface layer single-layer film, and Comparative Example 4 is formed by a combination of the low refractive index film corresponding to the second layer and the surface layer film.
【００２７】実施例１〜３同様に各単層膜の屈折率、光
学厚み測定結果を基に各試料（積層膜試料）について反
射率、反射光の主波長、刺激純度を求め、更に外観色調
を観察した。In the same manner as in Examples 1 to 3, the reflectance, the principal wavelength of reflected light, and the stimulus purity were determined for each sample (laminated film sample) based on the measurement results of the refractive index and the optical thickness of each single-layer film. Was observed.
【００２８】〔結果〕表１、２に各実施例、比較例にお
ける膜構成、光学特性、外観色調を纏めて示す。実施例
はいずれも可視光反射率が低く（20％以下）、かつ刺激
純度も低く（20％以下）、反射色調は殆ど無色である。
これに対し、比較例はいずれも虹彩色が目立つ。[Results] Tables 1 and 2 collectively show the film structure, optical characteristics, and external color tone in each of the examples and comparative examples. In each of the examples, the visible light reflectance is low (20% or less), the stimulus purity is low (20% or less), and the reflection color tone is almost colorless.
In contrast, the iris colors of all the comparative examples are conspicuous.
【００２９】 〔表１〕 実施例１ 実施例２ 実施例３ ──────────────────────────────────── 基体 材質 ソーダ石灰シリカ系フロート板ガラス（共通） 屈折率 1.51（共通） 第1層 材質 酸化チタン 酸化チタン 酸化チタン 屈折率 2.45 2.45 2.45 光学厚み nm 56 70 64 第2層 材質 a-シリカ a-シリカ a-シリカ 屈折率 1.45 1.45 1.45 光学厚み nm 80 100 90 表層 材質 酸化チタン 酸化チタン 酸化チタン 屈折率 2.45 2.45 2.45 光学厚み nm 300 300 300 特性 反射率 % 13 15 17 主波長 nm 470 420 560 刺激純度 % ３ 14 16 外観 無色 殆ど無色 殆ど無色 (僅青色系) (僅緑色系) ────────────────────────────────────[Table 1] Example 1 Example 2 Example 3 ── Substrate material Soda lime silica float glass (common) Refractive index 1.51 (common) First layer material Titanium oxide Titanium oxide Titanium oxide Refractive index 2.45 2.45 2.45 Optical thickness nm 56 70 64 Second layer material a-silica a-silica a-Silica Refractive index 1.45 1.45 1.45 Optical thickness nm 80 100 90 Surface material Titanium oxide Titanium oxide Titanium oxide Refractive index 2.45 2.45 2.45 Optical thickness nm 300 300 300 Properties Reflectance% 13 15 17 Principal wavelength nm 470 420 560 Stimulation purity% 3 14 16 Appearance Colorless Almost colorless Almost colorless (light blue) (light green) ──────────────────────────────── ────
【００３０】 〔表２〕 比較例１ 比較例２ 比較例３ 比較例４ ──────────────────────────────────── 基体 材質 ソーダ石灰シリカ系フロート板ガラス（共通） 屈折率 1.51（共通） 第1層 材質 −− 酸化チタン 酸化チタン −− 屈折率 2.45 2.45 光学厚み nm 10 100 第2層 材質 −− a-シリカ a-シリカ a-シリカ 屈折率 1.45 1.45 1.45 光学厚み nm 70 110 90 表層 材質 酸化チタン 酸化チタン 酸化チタン 酸化チタン 屈折率 2.45 2.45 2.45 2.45 光学厚み nm 300 300 300 300 特性 反射率 % 30 22 19 29 主波長 nm 590 610 580 400 刺激純度 % 48 45 35 63 外観 虹彩色 虹彩色 虹彩色 虹彩色 (濃緑色) (黄色系) (緑色系) (紫色系) ────────────────────────────────────[Table 2] Comparative Example 1 Comparative Example 2 Comparative Example 3 Comparative Example 4 ───── Substrate material Soda-lime-silica float glass (common) Refractive index 1.51 (common) First layer material --- Titanium oxide Titanium oxide --- Refractive index 2.45 2.45 Optical thickness nm 10 100 Second layer material --- a -Silica a-Silica a-Silica Refractive index 1.45 1.45 1.45 Optical thickness nm 70 110 90 Surface material Titanium oxide Titanium oxide Titanium oxide Titanium oxide Refractive index 2.45 2.45 2.45 2.45 Optical thickness nm 300 300 300 300 Properties Reflectance% 30 22 19 29 Dominant wavelength nm 590 610 580 400 Stimulation purity% 48 45 35 63 Appearance Iris color Iris color Iris color Iris color (dark green) (yellow) (green) (purple) ─────────── ─────────────────────────
【００３１】[0031]
【発明の効果】本発明によれば、ガラス基体に高屈折
率、高膜厚の表層透明膜を膜付けするに際し、屈折率の
異なる二層の下地透明膜を介在させることにより、可視
光反射率、刺激純度が低く、反射色調を殆ど無色として
虹彩色を極力減ずることができる。According to the present invention, when a high-refractive-index, high-thickness surface transparent film is applied to a glass substrate, visible light reflection can be achieved by interposing two base transparent films having different refractive indices. The iris color can be reduced as much as possible by making the reflection color tone almost colorless with low rate and stimulus purity.
フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） Ｂ３２Ｂ 9/04 Ｂ３２Ｂ 17/06 17/06 Ｂ０１Ｄ 53/36 Ｊ Ｇ０２Ｂ 1/11 Ｚ Ｇ０２Ｂ 1/10 Ａ Ｆターム(参考） 2K009 AA05 BB02 CC03 DD03 DD04 4D048 AA21 AB03 AB05 BA06X BA06Y BA07X BA07Y BA12X BA12Y BB03 BB18 CC41 EA01 4F100 AA20D AA21C AG00A BA04 BA07 BA10A BA10D JK15A JM02C JM02D JN01B JN01C JN01D JN06 JN18A JN18B JN18C JN18D JN30 YY00A YY00B YY00C YY00D 4G059 AA01 AC04 GA02 GA04 GA12 4G069 AA03 AA08 BA02A BA02B BA04A BA04B BA14A BA14B BA48A BC50A BC50B CA10 CA11 DA06 EA08 EA11 EE01 FA03 FB02 FB03 Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat II (Reference) B32B 9/04 B32B 17/06 17/06 B01D 53/36 J G02B 1/11 Z G02B 1/10 A F term (reference) ) 2K009 AA05 BB02 CC03 DD03 DD04 4D048 AA21 AB03 AB05 BA06X BA06Y BA07X BA07Y BA12X BA12Y BB03 BB18 CC41 EA01 4F100 AA20D AA21C AG00A BA04 BA07 BA10A BA10D JK15A JM02C JM02D JN01B JN01C JN01D JN06 JN18A JN18B JN18C JN18D JN30 YY00A YY00B YY00C YY00D 4G059 AA01 AC04 GA02 GA04 GA12 4G069 AA03 AA08 BA02A BA02B BA04A BA04B BA14A BA14B BA48A BC50A BC50B CA10 CA11 DA06 EA08 EA11 EE01 FA03 FB02 FB03
Claims (4)
基体の少なくとも片面に、屈折率2.0を超え、かつ光学
厚み200nm以上の表層透明膜を膜付けした透明積層体で
あって、基体と表層透明膜との間に、基体側より第一層
として屈折率2.0を超えた透明膜を、該第一層上に第二
層として屈折率1.6以下の透明膜を積層介在させ、前記
第一層と第二層の透明膜の光学厚みの合計が90〜180nm
であり、これら膜付き面側の可視光反射率が20％以下、
かつ反射光刺激純度が20％以下であることを特徴とする
積層膜付きガラス。1. A transparent laminated body comprising a glass substrate having a smooth surface and a refractive index of 1.6 or less, and a surface transparent film having a refractive index of more than 2.0 and an optical thickness of 200 nm or more formed on at least one surface of the glass substrate. Between the transparent film, a transparent film having a refractive index of more than 2.0 as a first layer from the substrate side, a transparent film having a refractive index of 1.6 or less as a second layer is interposed on the first layer, the first layer And the total optical thickness of the transparent film of the second layer is 90 to 180 nm
And the visible light reflectance on these film-coated sides is 20% or less,
Glass with a laminated film, characterized in that the reflected light stimulation purity is 20% or less.
ことを特徴とする請求項１記載の積層膜付きガラス。2. The glass with a laminated film according to claim 1, wherein the surface transparent film is a film having a photocatalytic function.
徴とする請求項１または２記載の積層膜付きガラス。3. The glass with a laminated film according to claim 1, wherein the surface transparent film is a titanium oxide film.
チタン膜、第二層の透明膜が光学厚み50〜120nmの酸化
珪素膜であることを特徴とする請求項１、２または３記
載の積層膜付きガラス。4. The method according to claim 1, wherein the first transparent film is a titanium oxide film having an optical thickness of 20 to 80 nm, and the second transparent film is a silicon oxide film having an optical thickness of 50 to 120 nm. Or the glass with a laminated film according to 3.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000079630A JP2001261377A (en) | 2000-03-22 | 2000-03-22 | Glass with laminated film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000079630A JP2001261377A (en) | 2000-03-22 | 2000-03-22 | Glass with laminated film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2001261377A true JP2001261377A (en) | 2001-09-26 |
Family
ID=18596855
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000079630A Pending JP2001261377A (en) | 2000-03-22 | 2000-03-22 | Glass with laminated film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001261377A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007185616A (en) * | 2006-01-13 | 2007-07-26 | Sundecor:Kk | Photocatalyst layer and photocatalyst layer forming method |
| JP2020044700A (en) * | 2018-09-19 | 2020-03-26 | 日産自動車株式会社 | Water- and oil-repellent structure |
-
2000
- 2000-03-22 JP JP2000079630A patent/JP2001261377A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007185616A (en) * | 2006-01-13 | 2007-07-26 | Sundecor:Kk | Photocatalyst layer and photocatalyst layer forming method |
| JP2020044700A (en) * | 2018-09-19 | 2020-03-26 | 日産自動車株式会社 | Water- and oil-repellent structure |
| JP7078899B2 (en) | 2018-09-19 | 2022-06-01 | 日産自動車株式会社 | Water- and oil-repellent structure |
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