JP2001242626A5 - - Google Patents

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Publication number
JP2001242626A5
JP2001242626A5 JP2000051687A JP2000051687A JP2001242626A5 JP 2001242626 A5 JP2001242626 A5 JP 2001242626A5 JP 2000051687 A JP2000051687 A JP 2000051687A JP 2000051687 A JP2000051687 A JP 2000051687A JP 2001242626 A5 JP2001242626 A5 JP 2001242626A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000051687A
Other languages
Japanese (ja)
Other versions
JP4166402B2 (ja
JP2001242626A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2000051687A priority Critical patent/JP4166402B2/ja
Priority claimed from JP2000051687A external-priority patent/JP4166402B2/ja
Priority to TW090103791A priority patent/TW594408B/zh
Priority to KR1020010010251A priority patent/KR100737253B1/ko
Publication of JP2001242626A publication Critical patent/JP2001242626A/ja
Publication of JP2001242626A5 publication Critical patent/JP2001242626A5/ja
Application granted granted Critical
Publication of JP4166402B2 publication Critical patent/JP4166402B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000051687A 2000-02-28 2000-02-28 遠紫外線露光用ポジ型フォトレジスト組成物 Expired - Fee Related JP4166402B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2000051687A JP4166402B2 (ja) 2000-02-28 2000-02-28 遠紫外線露光用ポジ型フォトレジスト組成物
TW090103791A TW594408B (en) 2000-02-28 2001-02-20 Positive photoresist composition for far-ultraviolet light exposure
KR1020010010251A KR100737253B1 (ko) 2000-02-28 2001-02-28 원자외선 노광용 포지티브 포토레지스트 조성물

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000051687A JP4166402B2 (ja) 2000-02-28 2000-02-28 遠紫外線露光用ポジ型フォトレジスト組成物

Publications (3)

Publication Number Publication Date
JP2001242626A JP2001242626A (ja) 2001-09-07
JP2001242626A5 true JP2001242626A5 (enrdf_load_stackoverflow) 2005-12-22
JP4166402B2 JP4166402B2 (ja) 2008-10-15

Family

ID=18573308

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000051687A Expired - Fee Related JP4166402B2 (ja) 2000-02-28 2000-02-28 遠紫外線露光用ポジ型フォトレジスト組成物

Country Status (3)

Country Link
JP (1) JP4166402B2 (enrdf_load_stackoverflow)
KR (1) KR100737253B1 (enrdf_load_stackoverflow)
TW (1) TW594408B (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4610280B2 (ja) * 2004-09-29 2011-01-12 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100330574B1 (ko) * 1997-12-29 2002-11-29 주식회사 하이닉스반도체 2층레지스트용실리콘계공중합체수지와그의제조방법및이수지를이용한레지스트패턴의형성방법
JP3847454B2 (ja) * 1998-03-20 2006-11-22 富士写真フイルム株式会社 遠紫外線露光用ポジ型フォトレジスト組成物及びパターン形成方法
JP3844322B2 (ja) * 1998-07-02 2006-11-08 富士写真フイルム株式会社 遠紫外線露光用ポジ型フォトレジスト組成物
US6291130B1 (en) * 1998-07-27 2001-09-18 Fuji Photo Film Co., Ltd. Positive photosensitive composition

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