JP2001242626A5 - - Google Patents
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- Publication number
- JP2001242626A5 JP2001242626A5 JP2000051687A JP2000051687A JP2001242626A5 JP 2001242626 A5 JP2001242626 A5 JP 2001242626A5 JP 2000051687 A JP2000051687 A JP 2000051687A JP 2000051687 A JP2000051687 A JP 2000051687A JP 2001242626 A5 JP2001242626 A5 JP 2001242626A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000051687A JP4166402B2 (en) | 2000-02-28 | 2000-02-28 | Positive photoresist composition for deep ultraviolet exposure |
| TW090103791A TW594408B (en) | 2000-02-28 | 2001-02-20 | Positive photoresist composition for far-ultraviolet light exposure |
| KR1020010010251A KR100737253B1 (en) | 2000-02-28 | 2001-02-28 | Positive-working photoresist compositon for far ultraviolet rays exposure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000051687A JP4166402B2 (en) | 2000-02-28 | 2000-02-28 | Positive photoresist composition for deep ultraviolet exposure |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001242626A JP2001242626A (en) | 2001-09-07 |
| JP2001242626A5 true JP2001242626A5 (en) | 2005-12-22 |
| JP4166402B2 JP4166402B2 (en) | 2008-10-15 |
Family
ID=18573308
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000051687A Expired - Fee Related JP4166402B2 (en) | 2000-02-28 | 2000-02-28 | Positive photoresist composition for deep ultraviolet exposure |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4166402B2 (en) |
| KR (1) | KR100737253B1 (en) |
| TW (1) | TW594408B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4610280B2 (en) * | 2004-09-29 | 2011-01-12 | 富士フイルム株式会社 | Positive resist composition and pattern forming method using the same |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100330574B1 (en) * | 1997-12-29 | 2002-11-29 | 주식회사 하이닉스반도체 | Silicon-based copolymer resin for bilayer resist and preparation thereof and method for forming resist pattern by using the resin |
| JP3847454B2 (en) * | 1998-03-20 | 2006-11-22 | 富士写真フイルム株式会社 | Positive type photoresist composition for deep ultraviolet exposure and pattern forming method |
| JP3844322B2 (en) * | 1998-07-02 | 2006-11-08 | 富士写真フイルム株式会社 | Positive photoresist composition for deep ultraviolet exposure |
| KR100574257B1 (en) * | 1998-07-27 | 2006-04-27 | 후지 샤신 필름 가부시기가이샤 | Positive photosensitive composition |
-
2000
- 2000-02-28 JP JP2000051687A patent/JP4166402B2/en not_active Expired - Fee Related
-
2001
- 2001-02-20 TW TW090103791A patent/TW594408B/en not_active IP Right Cessation
- 2001-02-28 KR KR1020010010251A patent/KR100737253B1/en not_active IP Right Cessation