JP2001242626A5 - - Google Patents
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- Publication number
- JP2001242626A5 JP2001242626A5 JP2000051687A JP2000051687A JP2001242626A5 JP 2001242626 A5 JP2001242626 A5 JP 2001242626A5 JP 2000051687 A JP2000051687 A JP 2000051687A JP 2000051687 A JP2000051687 A JP 2000051687A JP 2001242626 A5 JP2001242626 A5 JP 2001242626A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000051687A JP4166402B2 (ja) | 2000-02-28 | 2000-02-28 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| TW090103791A TW594408B (en) | 2000-02-28 | 2001-02-20 | Positive photoresist composition for far-ultraviolet light exposure |
| KR1020010010251A KR100737253B1 (ko) | 2000-02-28 | 2001-02-28 | 원자외선 노광용 포지티브 포토레지스트 조성물 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000051687A JP4166402B2 (ja) | 2000-02-28 | 2000-02-28 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001242626A JP2001242626A (ja) | 2001-09-07 |
| JP2001242626A5 true JP2001242626A5 (de) | 2005-12-22 |
| JP4166402B2 JP4166402B2 (ja) | 2008-10-15 |
Family
ID=18573308
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000051687A Expired - Fee Related JP4166402B2 (ja) | 2000-02-28 | 2000-02-28 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4166402B2 (de) |
| KR (1) | KR100737253B1 (de) |
| TW (1) | TW594408B (de) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4610280B2 (ja) * | 2004-09-29 | 2011-01-12 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100330574B1 (ko) * | 1997-12-29 | 2002-11-29 | 주식회사 하이닉스반도체 | 2층레지스트용실리콘계공중합체수지와그의제조방법및이수지를이용한레지스트패턴의형성방법 |
| JP3847454B2 (ja) * | 1998-03-20 | 2006-11-22 | 富士写真フイルム株式会社 | 遠紫外線露光用ポジ型フォトレジスト組成物及びパターン形成方法 |
| JP3844322B2 (ja) * | 1998-07-02 | 2006-11-08 | 富士写真フイルム株式会社 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| US6291130B1 (en) * | 1998-07-27 | 2001-09-18 | Fuji Photo Film Co., Ltd. | Positive photosensitive composition |
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2000
- 2000-02-28 JP JP2000051687A patent/JP4166402B2/ja not_active Expired - Fee Related
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2001
- 2001-02-20 TW TW090103791A patent/TW594408B/zh not_active IP Right Cessation
- 2001-02-28 KR KR1020010010251A patent/KR100737253B1/ko not_active IP Right Cessation