JP2001230177A - Positioning device, aligner and method for manufacturing the device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a positioning device having accurate positioning without giving an influence of a drive reaction force of a stage to another unit. SOLUTION: The positioning device comprises a base having a first reference surface, a first moving element capable of moving on the reference surface and having second reference surface perpendicular to the first reference surface, a second moving element capable of moving on the first reference surface and movable along the second reference surface, and a driver for generating a drive force between the first and second moving elements. Thus, the positioning accuracy of the second moving element for moving an object can be remarkably improved.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a positioning device for positioning an object at a target position. The present invention also relates to an exposure apparatus and a device manufacturing method using such a positioning device.

[0002]

2. Description of the Related Art FIG. 11 is a schematic view of a conventional positioning device.

An XY stage as a positioning device includes a Y stage 930, an X stage 920, and a fixed base 90.
Consists of one. X stage 920 and Y stage 930
Are both supported in the Z direction with respect to the reference surface 901u of the fixed base 901. The Y stage 930 moves in the Y direction by a driving force generated by a Y linear motor stator provided on a fixed base and a Y linear motor movable member provided on the Y stage. X stage 920
It moves in the X direction by an X linear motor stator provided on the Y stage and an X linear motor stage provided on the X stage.

[0004] The XY stage has a structure frame 90.
6 The structure frame 906 is mounted on the mount 9
07. For example, in a projection exposure apparatus that is a semiconductor manufacturing apparatus, a projection optical system, a reticle support system, and the like are mounted on a structure frame 906. Also, X
A laser interference system is used for measuring the position of the Y stage, and the laser interference system is mounted on a structure frame.

[0005]

However, the above-described conventional positioning device has the following problems. (1) When the stage is driven in the X direction or the Y direction, the driving reaction force propagates to the fixed base 901 and the structure frame 906, and excites the vibration of the fixed base 901. This vibration deteriorates the positioning accuracy of the stage. (2) The stage center of gravity moves due to the movement of the stage, whereby the properties of the structure frame 6 fluctuate. As a result, the positioning accuracy of the stage deteriorates. (3) The control reaction force of the stage is transmitted to excite local vibrations in an interference system or the like mounted on the structural body frame, and noise enters the output of the interference system, resulting in poor positioning accuracy.

SUMMARY OF THE INVENTION In view of these problems, an object of the present invention is to provide a positioning device having high positioning accuracy without driving the stage affecting other units.

[0007]

According to a first aspect of the present invention, there is provided a positioning apparatus comprising: a base having a reference surface; a first movable body movable on the reference surface; A second movable body that is movable above, and a drive device that generates a driving force between the first movable body and the second movable body, wherein the drive device includes the first movable body. When a driving force is generated between the first moving body and the second moving body, the first moving body moves in a direction opposite to the second moving body.

Further, the first moving body has a second reference plane perpendicular to the reference plane, and the second moving body is movable along the second reference plane. Is desirable.

The second moving body includes a first stage and a second stage, and the first stage is movable in a first direction with respect to the second stage. Is desirably movable in a second direction with respect to the first moving body.

It is preferable that the first moving body is supported by the base in a non-contact manner, and the second moving body is supported by the second moving body.
It is preferable that the moving body is supported by the base in a non-contact manner.

Preferably, the second moving body has a fine movement stage mounted thereon, and the fine movement stage has
It is preferable that the stage can be moved in six axial directions with respect to the stage.

It is preferable that a cooling mechanism is provided in an actuator for driving the fine movement stage.

It is desirable that the fine moving stage be given a force by a linear motor from the second moving body, or that the fine moving stage be given a force by an electromagnet.

It is desirable that the base is supported by a mount.

Note that an exposure apparatus having the above-described positioning apparatus and a device manufacturing method for manufacturing a device using the exposure apparatus are also included in the scope of the present invention.

[0016]

<First Embodiment> FIG. 1 is a schematic view of a positioning apparatus according to a second embodiment of the present invention.

The positioning apparatus according to the present invention comprises an XY stage 1
0, a base XY stage 2 and a structure frame 6.

The XY stage 10 (second moving body)
It has a stage 30 and an X stage 20. Y stage 3
The 0 and X stages 20 are arranged on a plane 6u (first
(Reference surface) of the first roller is movably supported in a non-contact manner by a static pressure bearing. Here, the plane 6u has a plane parallel to the XY plane.

The Y stage 30 (second stage) is moved by a static pressure bearing 35b with respect to the upper surface 6u of the structure frame.
Supported in a non-contact manner. Also, the Y stage 30
Are supported in a non-contact manner in the X direction with respect to a reference surface (second reference surface) 2s provided on the block 2L of the base XY stage 2 by a static pressure bearing 35s. Further, the Y stage 30 includes a structure frame upper surface 6u and a base X
A preload mechanism for generating a suction force between the Y stage 2 and the reference surface 2s is provided. The base XY stage receives a force in the X direction from the Y stage by a static pressure bearing and a preload mechanism provided between the base XY stage and the Y stage. When a permanent magnet is used for the preload mechanism, the base is limited to a magnetic material. However, when a vacuum suction mechanism is used for the preload mechanism, the material of the base is not particularly limited. For example, granite may be used. The Y stage 30 moves in the Y direction with respect to the base 1 by a driving force generated by a Y linear motor which is a driving mechanism of the XY stage. The Y linear motor includes a Y linear motor stator provided on the base XY stage and a Y linear motor movable element provided on the Y stage. The Y linear motor stator has a coil array 34R and a cooling jacket for covering the coil array. The Y linear motor mover has a magnet facing the coil array 34R.

The X stage 20 (first stage) is moved by a static pressure bearing 25b with respect to the upper surface 6u of the structure frame.
Supported in a non-contact manner. Furthermore, X stage 2
No. 0 has a preload mechanism for generating a suction force with the upper surface of the structure frame. The structure of the preload mechanism is almost the same as that of the above-mentioned Y stage. Also, the X stage
A static pressure bearing provided on the X stage supports the movable guide 31 provided on the Y stage in a non-contact manner from the Y direction, and is movable in the X direction with respect to the Y stage. The X stage 20 is driven by a driving force generated by an X linear motor which is a driving mechanism of the XY stage.
It moves in the X direction with respect to the Y stage. The X linear motor includes an X linear motor stator provided on the Y stage,
It comprises an X linear motor mover provided on the X stage 20. The X linear motor stator has a coil array and a cooling jacket for covering the coil array. The X linear motor mover has a magnet facing the coil array.

Base XY stage 2 (first moving body)
Is a rectangular structure integrally formed of four blocks 2L, 2F, 2R, and 2B. The hydrostatic bearing pads 4b attached to the lower surfaces of the blocks 2L and 2R form a structure frame upper surface 6u. Is supported in a non-contact manner in the Z direction. Thus, the base XY stage 2 can move smoothly on the upper surface 6u of the structure frame in the XY directions.

Further, the base XY stage 2 is a linear sensor or a two-dimensional sensor (not shown) for measuring the position of the base XY stage in the X and Y directions with respect to the structure frame 6, and the base XY with respect to the structure frame 6.
The stage 2 has an actuator (not shown) for applying a driving force in the X direction and the Y direction. The above sensor is
It is necessary to work effectively within the movable range of the base XY stage 2 in the XY directions. For example, it can be constituted by an ultrasonic sensor, an optical sensor, a laser interferometer, or a linear scale having a large scale width. Similarly, the actuator needs to work effectively within the movable range of the base XY stage 2 in the XY directions, and can be constituted by, for example, a linear motor. A base XY direction control system for performing position control and drive control of the base XY stage can be configured by the above sensors and actuators. This control system is XY
It is also possible to perform control independently of the XY stage control system for performing position control and drive control of the stage 10. For example, when the stage is initialized, the XY stage 10 is fixed by the actuator while the XY stage 10 is fixed. 2 or the base XY stage 2 can be fixed even when the XY stage 10 is driven.

The structure frame 6 (base) is provided on the mount 7.

The XY stage 10 is provided with a measurement mirror (not shown) provided for measuring the position of the XY stage. The laser interferometer that irradiates the measurement mirror with laser light may be provided integrally with the structure frame, or may be provided on another structure whose vibration is separated separately from the positioning device.

Next, the basic operation of the base XY stage will be described with reference to FIG. In the same figure, (a) shows a state in which both the XY stage and the base XY stage are at the center, (b) shows a state in which the XY stage has moved in the X direction, and (c) shows a state in which the XY stage has moved. FIG. 4 is a diagram illustrating a state in which the lens has moved in a Y direction.

2 (a) and 2 (b), when the X stage 20 of the XY stage moves in the X direction, the reaction force by the X linear motor is expressed as follows.

X stage mass x acceleration in X direction

This X linear motor reaction force is applied to the Y stage 3
0, transmitted to the base XY stage 2 via the static pressure bearing 35s. At this time, the base XY stage 2 moves in the direction opposite to the movement of the X stage. The acceleration of the base XY stage 2 at this time is expressed as follows.

X stage mass × X direction acceleration / (mass of base XY stage)

As a result, the base XY stage 2 moves by Xb with respect to the X stage movement amount Xs. This moving amount is determined by each mass ratio. For example, when the mass ratio of the mass of the Y stage / base XY stage to the mass of the X stage is 1:20, if Xs = 50 mm, Xb = 2.5 mm.

In FIGS. 2A to 2C, when the XY stage moves in the Y direction, the reaction force by the Y linear motor is expressed as follows.

(X stage mass + Y stage mass) ×
Y-direction acceleration

This Y linear motor reaction force is transmitted to the base XY stage 2. At this time, the base XY stage 2 moves in the direction opposite to the movement of the XY stage. The acceleration of the base XY stage 2 at this time is expressed as follows.

(X stage mass + Y stage mass) × Y
Acceleration / (base XY stage mass)

As a result, the base XY stage 2 moves integrally by Yb with respect to the XY stage movement amount Ys. This moving amount is determined by each mass ratio. For example, when the mass of the base XY stage 2 with respect to the XY stage is 1:10
, If Ys = 50 mm, Yb = 5 m
m.

According to the present embodiment, the base XY stage cancels the driving reaction force when driving the XY stage in the XY directions, so that the structural frame 6, which is the basic structure, is not greatly vibrated. Absent. In addition, since the total center of gravity of the base XY stage 2 and the XY stage 10 mounted on the structure frame does not move in the XY directions, the posture variation of the structure frame 6 is reduced.
When these effects work organically, the positioning accuracy of the XY stage on which the object is mounted can be dramatically improved.

When the center of gravity of the XY stage 10 and the base XY stage 2 in the Z direction are matched, the XY stage 1
When canceling the driving reaction force of 0, it is possible to suppress the generation of moments in the rotation direction around the X axis and the rotation direction (θx and θy directions) around the Y axis. Particularly, in the present embodiment, since the XY stage 10 and the base XY stage 2 are on the same reference plane, there is a feature that the center of gravity of the XY stage 10 and the base XY stage 2 in the Z direction can be easily adjusted.

In this embodiment, the XY stage 10
And the base XY stage 2 are on the same reference plane,
There is no need for a stepped structure, the configuration can be simplified, and processing and assembly are easy.

With this base XY stage, not only the acceleration / deceleration reaction force of the XY stage, but also the change in the center of gravity due to the movement of the XY stage, and the XY stage control reaction force do not act on the structure frame, so that high precision positioning accuracy is achieved. Can be.

<Second Embodiment> FIG. 3 is a schematic view of a positioning device according to a second embodiment.

In this embodiment, a fine movement stage which can move in a non-contact manner in six axial directions with respect to the XY stage is mounted on the XY stage.

The fine movement stage 41 is mounted so as to be movable in four axes or six axes with respect to the X stage top plate 21 of the XY stage. Here, the 6-axis direction is X
The rotation directions around the YZ direction and the XYZ axis are meant, and the four-axis direction means a direction excluding the XY direction from the six-axis direction.

The actuator 43 includes a fine movement stage 41
Is driven to the X-stage top plate 21. Here, an X actuator 43 for driving the fine movement stage 41 in the X direction is used as the actuator.
x, a Y actuator 43y for driving the fine movement stage 41 in the Y direction, and a Z actuator for driving the fine movement stage 41 in the Z direction. At least one of the X actuator 43x and the Y actuator 43Y is provided in plurality. Here, for example, when there are two Y actuators, by using these Y actuators, the fine movement stage 41 can be driven not only in the Y direction but also in the rotation direction (θ) about the Z axis. Further, at least three Z actuators are provided. With these three or more Z actuators, the fine movement stage can be moved not only in the Z direction but also in the tilt direction (X
(Rotation direction around the Y axis).

Here, when the fine movement stage 41 is supported on the XY stage in a non-contact manner in six axial directions, the actuator 43 operates the fine movement stage 4 at the required acceleration.
Performance that can accelerate 1 is required. Therefore, it is expected that the actuator 43 will generate heat when driving the fine movement stage. Therefore, by providing the cooling mechanism 45 in the actuator 43, it is possible to suppress the heat generation from leaking to the outside.

As the actuator 43, a linear motor which is a non-contact drive mechanism is desirable. In this case, the coil is used as a stator on the XY stage side for convenience of wiring and the like.
It is desirable to provide a permanent magnet as a mover on the mover side. In this case, the above-described cooling mechanism 45 is used to cool the coil. The cooling mechanism 45 covers the coil with a jacket, supplies a coolant to the inside of the jacket, and cools the coil. If a cooling mechanism using a jacket is provided for a linear motor for performing fine movement, the coil can be cooled with a relatively simple configuration because there is no switching of the coil or the like.

The fine movement stage 41 is provided with a measurement mirror 42 provided for measuring the position of the fine movement stage. The laser interferometer that irradiates the measurement mirror with laser light may be provided integrally with the structure frame, or may be provided on a structure whose vibration is removed from the positioning device.

In the present embodiment, the actuator for fine movement is required to have higher positioning performance than the linear motor for driving the XY stage. Also, XY
A linear motor that drives a stage is required to have a higher output than an actuator for fine movement.

According to the present embodiment, the behavior of the XY stage is not transmitted to the fine movement stage.
Even if the positioning of the stage is somewhat rough, the effect can be made to have no effect on the fine movement stage.

Third Embodiment FIGS. 4 to 6 show a positioning device according to a third embodiment.

In the present embodiment, the drive system of the fine movement stage and the control system of the XY stage and the fine movement stage are improved. Details are described below.

The fine movement stage 41 is mounted so as to be movable in four or six axes with respect to the X stage top plate 21 of the XY stage. Here, the 6-axis direction is X
Rotation directions around the YZ direction and the XYZ axis (θx, θy, θ
z), and the four-axis direction means a direction excluding the XY directions from the six-axis direction.

The fine movement stage 41 has a rectangular plate shape, is provided with a depression 272 at the center, and is provided with a wafer chuck 271 for mounting a wafer in the depression 272. A mirror 529 for reflecting the laser of the interferometer (first measuring instrument) is provided on the side surface of the fine movement stage 41 so that the position of the fine movement stage 41 can be measured.

Next, the position measurement of the X stage 20 and the position measurement of the fine movement stage 41 will be described with reference to FIG.

On the side of the top plate 21 of the X stage 20, X
Interferometer for measuring position of stage 20 (second measuring instrument)
A measurement mirror for reflecting the measurement light is formed. The measurement light of the laser interferometer is X from the X direction and the Y direction.
The stage side mirror 239 is irradiated to the X stage 20
Can be precisely measured with a laser interferometer.

A measuring mirror 42 for reflecting the laser of the interferometer is provided on the side of the fine movement stage 41 so that the position of the fine movement stage 41 can be measured.
The fine movement stage 41 is irradiated with six light beams, and the positions of the fine movement stage 41 with six degrees of freedom are measured. The position of the fine movement stage 41 in the X direction and the amount of rotation in the θy direction can be measured by two interferometer beams having different Z positions parallel to the X axis. Further, the position in the Y direction and the amount of rotation in the θxθy direction can be measured by three interferometer beams parallel to the Y axis and having different X and Z positions. Further, measurement light is obliquely incident on the wafer mounted on the wafer chuck 271, and the reflection position of the measurement light is measured, whereby the position of the wafer in the Z direction (that is, the position of the fine movement stage in the Z direction) can be measured. .

As described above, by measuring the positions of the X stage 20 and the fine movement stage 41, the X stage 2
The position measurement of 0 and the position measurement of the fine movement stage 41 can be accurately and independently measured by a laser interferometer.

Next, a fine movement actuator unit that generates a driving force between the X stage 20 and the fine movement stage 41 will be described with reference to FIG. FIG. 5 shows the X stage 20.
3 shows an exploded view of an actuator using a fine movement linear motor 203, an electromagnet 208, and the like provided between the actuator and a fine movement stage 41. FIG.

Below the fine movement stage 41, the above-described XY stage serving as a reference for applying a thrust or a suction force to the fine movement stage 41 is arranged.

Eight fine movement linear motor movers 204 are mounted on the lower surface of the fine movement stage 41. Each mover 204 has two sets of a two-pole magnet 274 and a yoke 275 magnetized in the thickness direction. The two magnets 274 and the yoke 275 are connected to each other by a side plate 276 to form a box-like structure.
5 face each other in a non-contact manner.

The four movers 205Z of the eight movers 204 are arranged substantially at the center of the sides of the fine moving stage 41, and finely move the fine moving stage 41 with respect to the X stage 20 in the Z direction. Is formed. In the Z mover 205Z, the two-pole magnets 274Z are arranged along the Z direction, and interact with a current flowing through an elliptical coil 278Z of a Z stator 205Z having a linear portion perpendicular to the Z direction described later. As a result, a thrust in the Z direction is generated. This is Z
Named 1 to Z4 mover.

Of the remaining four movers 204X, two movers arranged at diagonal corners of the fine moving stage are for finely moving the fine moving stage 41 with respect to the X stage 20 in the X direction. An X mover is formed. In the X mover 204X, the two-pole magnets 274X are arranged along the X direction, and interact with a current flowing through an elliptic coil 278X of an X stator 205X having a linear portion perpendicular to the X direction described later. To generate a thrust in the X direction. These are named X1 and X2 movers.

The remaining two movers 204Y are also arranged at diagonal corners of fine movement stage 41,
Is formed to form a Y mover for fine-moving the X stage 20 in the Y direction. In the Y mover 204Y, the two-pole magnets 274 are arranged along the Y direction.
A thrust in the Y direction is generated by interacting with a current flowing through an elliptical coil 278Y of a Y stator 205Y having a linear portion perpendicular to the Y direction described later. These are named Y1 and Y2 movers.

At substantially the center of the lower surface of the fine movement stage 41, a cylindrical magnetic material support cylinder 280 is provided. Further, four arc-shaped magnetic blocks 207 are fixed to the outer peripheral portion of the magnetic support cylinder 280. Two of the arc-shaped magnetic blocks 207X are arranged along the X direction, and face in a non-contact manner with an E-shaped electromagnet 208X described later also arranged along the X direction.
A large attractive force in the X direction can be received from the shape electromagnet 208X. The arc-shaped magnetic substance blocks 207X arranged along the X direction are referred to as X1 and X2 blocks.

The remaining two arc-shaped magnetic blocks 207
Y is arranged along the Y direction, faces in a non-contact manner an E-shaped electromagnet 208Y described later also arranged along the Y direction, and receives a large attractive force in the Y direction from the E-shaped electromagnet 208Y. It has become. This arc-shaped magnetic block 207Y arranged along the Y direction is
1. Named as Y2 block.

A self-weight compensation spring 281 is disposed in a hollow portion of the cylindrical magnetic body support cylinder 280, and its upper end is connected to the center of the lower surface of the fine moving stage 41,
1 to support its own weight. Self-weight compensation spring 2
The spring 81 is designed to have a very small spring constant in the direction of its own weight and in the other five degrees of freedom.
Vibration transmission from the stage 20 to the fine movement stage 41 can be almost ignored.

The Z-coordinate of the line of action of the force generated by the X1X2 mover 204X substantially coincides. X1X2 mover 20
The Z coordinate of the line of action of the force generated by 4X is X1X2 mover 204X, Y1Y2 mover 204Y, Z1Z2Z3Z4
The Z coordinate of the center of gravity of the fine movement stage 41 including the mover 204Z, the magnetic material support cylinder 280, and the four arc-shaped magnetic material blocks 207 substantially coincides with each other. Therefore, due to the thrust in the X direction generated on the X1X2 mover 204X, the rotational force around the Y axis is almost completely reduced.
It does not act on.

The Z coordinate of the line of action of the force generated by the Y1Y2 mover 204Y substantially coincides. Y1Y2 mover 20
The Z coordinate of the line of action of the force generated by 4Y is X1X2 mover 204Y, Y1Y2 mover 204Y, Z1Z2Z3Z4
The Z coordinate of the center of gravity of the fine movement stage 41 including the mover 204Z, the magnetic material support cylinder 280, and the four arc-shaped magnetic material blocks 207 substantially coincides with each other. Therefore, the rotational force about the X axis is almost completely reduced by the thrust in the Y direction generated by the Y1Y2 mover 204Y.
It does not act on.

The Z-coordinate of the line of action of the suction force acting on the X1X2 block 207X substantially coincides. The Z coordinate of the line of action of the suction force acting on the X1X2 block 207X is X
1X2 mover 204X, Y1Y2 mover 204Y, Z1
Z2Z3Z4 mover 204Z and magnetic body support cylinder 280
And the Z-coordinate of the center of gravity of the fine movement stage 41 including the four arc-shaped magnetic blocks 207. Therefore, X acting on the X1X2 block 207X
The rotational force around the Y axis hardly acts on the fine movement stage 41 due to the suction force in the direction.

The X coordinate of the line of action of the attraction force acting on the X1X2 block 207X in the X direction is X1X2 mover 204X, Y1Y2 mover 204Y, Z1Z2Z3.
Z4 mover 204Z and magnetic body support cylinders 280 and 4
Stage 4 including two arc-shaped magnetic blocks 207
The X-coordinate of the center of gravity of one is approximately coincident. For this reason, the rotational force around the Z axis is almost completely reduced by the attraction force in the X direction acting on the X1X2 block.
It does not act on.

The Z coordinate of the line of action of the suction force acting on the Y1Y2 block 207Y substantially coincides. The Z coordinate of the line of action of the suction force acting on the Y1Y2 block 207Y is X
1X2 mover 204X, Y1Y2 mover 204Y, Z1
Z2Z3Z4 mover 204Z and magnetic body support cylinder 280
And the Z-coordinate of the center of gravity of the fine movement stage 41 including the four arc-shaped magnetic blocks 207. Therefore, Y acting on the Y1Y2 block 207Y
The rotational force around the X axis hardly acts on the fine movement stage 41 due to the suction force in the direction.

The X coordinate of the line of action of the attraction force acting on the Y1Y2 block 207Y in the Y direction is X1X2 mover 204X, Y1Y2 mover 204Y, Z1Z2Z3.
Z4 mover 204Z and magnetic body support cylinders 280 and 4
Stage 4 including two arc-shaped magnetic blocks 207
The X-coordinate of the center of gravity of one is approximately coincident. For this reason, the rotational force around the Z axis hardly acts on the fine movement stage 41 due to the suction force in the Y direction acting on the Y1Y2 block 207Y.

On the upper part of the X-stage top plate 21, the stators 205 of the eight fine-movement linear motors 203 for controlling the position of the fine-movement stage 41 in six axial directions, and the XY-direction acceleration are applied to the fine-movement stage 41. Electromagnetic support cylinder 283
E-shaped electromagnets 208 supported by the micro-movement stage 4
One end of a self-weight supporting spring for supporting the self-weight is fixed.

Each stator 205 has an oval coil 278.
Is supported by a coil fixing frame 579, and faces the linear motor movable element 204 fixed to the lower surface of the fine movement stage 41 in a non-contact manner.

The four stators 205Z of the eight stators 205 are arranged substantially at the center of the sides of the rectangular X-stage top plate 21, and move the fine movement stage 41 with respect to the X-stage 20 in the Z direction. To form a Z stator for fine movement driving. The Z stator 205Z is disposed so that the linear portion of the elliptical coil 278Z is perpendicular to the Z direction, and the two-pole magnet 274Z disposed along the Z direction of the Z mover 204Z has the Z direction. The thrust can be applied. These coils are referred to as Z1 to Z4 coils.

Two of the remaining four stators 2
05X is arranged at a diagonal corner of the rectangular X stage top plate 21 to form an X stator. In the X stator 205X, the two linear portions of the elliptical coil 278X are perpendicular to the X direction, and the two linear portions are arranged along the X direction. A thrust in the X direction can be applied to the two-pole magnet 274X arranged in the vertical direction. This coil is named X1X2 coil.

The remaining two stators 205Y are also rectangular Xs.
They are arranged at diagonal corners of the stage top plate 21 to form a Y stator. In the Y stator 205Y, the elliptical coil 27
The two linear portions 8Y are perpendicular to the Y direction, and the two linear portions are disposed along the Y direction. The two-pole magnet 204 disposed along the Y direction of the Y mover 204Y.
A Y-direction thrust can be applied to Y. This coil is referred to as a Y1Y2 coil.

The electromagnet support cylinder 283 is disposed substantially at the center of the rectangular X-stage top plate 21, and four E-shaped electromagnets 208 are provided inside the electromagnet support cylinder 283. The E-shaped electromagnet 208 includes a magnetic block 285 having a substantially E-shaped cross section when viewed from the Z direction, and a coil 286. The coil 285 is wound around a central projection of the letter E. The end surfaces of the three protrusions of the letter E are not straight lines but arcs. This E
The end faces of the three projections of the shaped electromagnet 208 face the arc-shaped magnetic block 207 fixed to the fine movement stage 41 in a non-contact manner through a gap of about several tens of microns or more, and a current flows through the coil. Arc-shaped magnetic block 2
A suction force is applied to 85.

Two of the four E-shaped electromagnets 208 have X
It is arranged along the X direction so as to face the 1X2 block 207X, and applies a suction force in the X direction and the −X direction to the X1X2 block 207X, respectively. This is named X1X2 electromagnet 208X.

The remaining two of the E-shaped electromagnets 208
It is arranged along the Y direction so as to face the 1Y2 block 207Y, and applies a suction force in the Y direction and the −Y direction to the Y1Y2 block 207Y, respectively. This is named Y1Y2 electromagnet 208Y.

Since the electromagnet 208 can generate only an attractive force, the electromagnet 208 that generates an attractive force in the positive direction and the electromagnet 208 that generates an attractive force in the negative direction are provided for the respective X and Y driving directions.

The opposing surfaces of the magnetic block 207 and the E-shaped electromagnet are cylindrical surfaces around the Z-axis, and the four magnetic blocks and the four E-shaped electromagnets 208 are mutually connected around the Z-axis (θx direction). It can rotate freely without touching. That is, the fine movement stage 41 and the X stage 20 can relatively move in the θx direction. Also,
Even when rotated in the θx direction, there is no change in the gap between the end face of the E-shaped electromagnet 208 and the magnetic block 207, and the attractive force generated by the electromagnet 208 does not change for the same current.

In this embodiment, the opposing surfaces of the four magnetic blocks and the four E-shaped electromagnets are cylindrical surfaces. However, the shape of the opposing surfaces is not limited to this. It may be shaped. Even if the opposing surfaces of the magnetic block and the electromagnet are spherical or bowl-shaped, they can rotate relative to each other in the three axes of rotation of θxθyθz. There is no change.

The arc-shaped magnetic block 207 and the E-shaped magnetic block 285 are formed by laminating thin plates electrically insulated between the layers, and an eddy current flows in the block due to a change in magnetic flux. And the attractive force of the E-shaped electromagnet 208 can be controlled up to a high frequency.

With the above configuration, thrusts in six axial directions can be given from the X stage 20 to the fine movement stage 41 by the linear motor, and a large attractive force in the XY directions can be given by the electromagnet 208.

It is not necessary to move a long stroke in the translation Z direction and the rotation θxθyθz direction, but it is necessary to apply a thrust or suction force over a long stroke in the XY direction. However, both the linear motor 203 and the electromagnet 208
The stroke in the Y direction is extremely short. On the other hand, X stage 2
0 has a long stroke in the XY directions. Therefore, while moving the X stage 20 in the XY directions,
By applying thrust and suction in the XY directions to 1
The XY-direction thrust and suction force are applied to the fine movement stage 41 over a long XY-direction length.

As an example, FIG. 6 shows a control block diagram in the case of performing an operation of moving a long distance only in the Y direction and holding the current position in the other five axis directions.

The movement target instructing means 221 outputs target values such as the position of the fine movement stage 41 in the six axial directions to the position profile generating means 222 and the acceleration profile generating means 223. The position profile generating means 222 determines the time and fine movement stage 4 based on the target value from the target instructing means 221.
The relationship with the position where 1 should be placed is generated in each of the six axial directions of the translation XYZ direction and the rotation θxθyθz direction. The acceleration profile generation unit 223 generates a relationship between time and acceleration to be generated for each of the two axes in the translation XY directions based on the target value from the target instruction unit 221. These profiles are given to the representative positions of the fine movement stage 41 assuming that the fine movement stage 41 is a rigid body. In general, the center of gravity of fine movement stage 41 is used as the representative position.

In other words, in the case of the present embodiment, the relationship between the time and the position of the center of gravity where the fine movement stage 41 should be and the rotation around the center of gravity is given by the position profile generating means 222. Is given by the acceleration profile generation means 223.

In the present embodiment, since a long-distance movement is performed only in the Y-axis direction, a position profile for moving to the target position only in the Y-axis is given, and a position profile of a fixed value is provided for the other axes so as to remain at the current position. Can be As for the acceleration profile, the acceleration / deceleration pattern accompanying the movement is given to the Y-axis by the acceleration profile generation means, and the X-axis without movement is always zero.

The position profile generating means 222 for the position of the center of gravity of the fine movement stage 41 in the six axial directions and the rotation around the center of gravity.
Output is a fine movement LM that controls the fine movement linear motor 203.
Input to the position servo system. The output of the center-of-gravity X-position profile generation means 222X and the output of the Y-position profile generation means 222Y are the long-range linear motor 21 of the XY stage that moves the X stage 20 in the XY directions.
The current of 0 is also input to the long distance LM position servo system 235 that performs feedback control.

X acceleration profile generating means 223X
And the output of the Y-acceleration profile generation means 223Y are input to a suction FF system 231 for feedforward controlling the suction force of the electromagnet 208.

The fine movement LM position servo system 225 is provided with a differentiator 2
41, a calculation unit 226, an output coordinate conversion unit 242, a fine movement current amplifier 227, and a fine movement stage position measurement system 228.
And an input coordinate conversion unit 243. Differentiator 241
Is the XYZθxθyθ of the center of gravity of the fine movement stage 41 output by the position profile generation means 222.
It outputs the deviation between the z position (target position) and the XYZθxθyθz position (measurement position) where the center of gravity of the fine movement stage 41 is actually located. The calculation unit 226 performs a control calculation represented by a PID or the like based on the deviation signal from the differentiator 241 and calculates drive commands for six axes. The output coordinate conversion unit 242
A calculation for distributing the drive commands for the axes to the X1X2Y1Y2Z1Z2Z3Z4 linear motor 203 is performed, and the result is output as an analog voltage. Fine movement current amplifier 227 outputs a current proportional to the analog output voltage to X1X2Y1Y2Z1.
It is supplied to the Z2Z3Z4 linear motor 203. The fine movement stage 41 position measurement system has the above-described measuring means provided with an interferometer or the like for measuring the position of XYZθxθyθz of the exposure point of the fine movement stage 41. The input coordinate conversion unit 243
Based on a signal from the fine movement stage position measurement system, the XYZθxθyθz position of the exposure point of the fine movement stage 41 is converted into the XYZθxθyθz position of the center of gravity of the fine movement stage 41.

The fine movement LM position servo system 225 is a normal position servo system using the output of the position profile generating means 222 as a command value when viewed from each axis. Power is received from the FF system 231. Further, as described above, the attracting force of the electromagnet 208 is configured so that no rotational force is generated on the fine movement stage 41 by matching the line of action with the center of gravity of the fine movement stage 41. Therefore, the fine movement linear motor 2
No. 03 generates only a small thrust for eliminating a slight positional deviation from the target position, so that a current that causes heat generation does not flow. In addition, the current of the linear motor can be limited by software or hardware so that even when the interlocking with the suction FF system 231 malfunctions, the current that causes heat generation can be prevented from flowing.

The suction FF system 231 includes a control system for generating a combined thrust in the X direction proportional to the output of the acceleration profile generating means 223 between the pair of X1X2 electromagnets 208X and the X1X2 block 207X, and a pair of XFFs. A control system is provided between the Y1Y2 electromagnet 208Y and the Y1Y2 block 207Y for generating a combined thrust in the Y direction in proportion to the output of the acceleration profile generating means 223. Each control system includes a correction unit 232, an adjustment unit 233, and two electromagnet current amplifiers 234 that independently drive the coils 286 of the pair of electromagnets 208.

The correcting means 232 corrects the non-linear relationship between the current of the electromagnet 208 and the thrust. In many cases, the correction unit 232 is a square root arithmetic unit that stores a code. Generally, the attractive force of an electromagnet is proportional to the square of the current of the electromagnet. The required force is the acceleration profile generation means 2
Since the force is proportional to the output of the acceleration profile generating means 223, if the square root of the output is taken as the current command, an attractive force proportional to the square of the square root of the output of the acceleration profile generating means 223 acts. That is, a suction force proportional to the output of the acceleration profile generation means 223 acts. Although the output of the acceleration profile generation means 223 includes a sign, the square root calculation is performed on the absolute value of the output, and after the calculation, a sign is added and the result is output to the adjustment means.

The adjusting means 233 includes a pair of electromagnets 2.
08 to adjust the attractive force acting between each of the electromagnets 208 and the magnetic body 207 to make the magnitude and the direction of the resultant force of both the magnets 207 desired. The electromagnet 208 can only exert a force for attracting the magnetic body 207 regardless of the direction of the current. Therefore, the magnetic body 207 is sandwiched between the pair of electromagnets 208, and each of the electromagnets 208 generates a force in the opposite direction to the magnetic body plate, and by adjusting the two forces, the resultant force acting on the magnetic body 207. The size and direction are controlled. Based on the sign of the output of the correction means 232,
Which of the pair of electromagnets 208 is to be supplied with a current is selected, a value proportional to the output of the correction means 232 is input to the current amplifier 234, and the current of the other electromagnet 208 is controlled to zero. Is the simplest configuration. When the output of the correction means 232 is zero, the current of both electromagnets 208 is controlled to zero. As a result, a thrust proportional to the magnitude of the output of the acceleration profile generating means 223 is applied to the magnetic body 207 from the pair of electromagnets 208 in a desired direction. Correction means 2
A bias current equal to the two electromagnets 208 may be allowed to flow when the output of 32 is zero. This has the effect of making the operating center of the BH curve of the electromagnet 208 a more linear relationship between the current, that is, the strength of the magnetic field and the magnetic flux density. In this case, the correcting means and the adjusting means are integrally operated to instruct the two electromagnets 208 with an appropriate current based on the acceleration profile output.

More specifically, the acceleration profile generating means 22
When the output of No. 3 is Va in the positive movement direction and the bias current is Ib, the coil current of the electromagnet 208 generating the attraction force in the positive movement direction is Ip, and the coil current of the electromagnet 208 generating the attraction force in the negative movement direction is Im. Then, there is an action of outputting Ip and Im that satisfy Va = K ((Ip−Ib) ^ 2- (Im−Ib) ^ 2) with respect to a predetermined proportionality constant K. The electromagnet 208 can obtain a large thrust with a small ampere turn, and heat generation hardly causes a problem.

While the vehicle is running at a constant speed, the current of the electromagnet 208 is controlled to zero. Therefore, disturbance such as floor vibration is not transmitted to the fine movement stage 41 through the electromagnet 208. In this state, the positioning of the fine movement stage 41 in the six axial directions is controlled with high accuracy using the fine movement linear motor.

In the present embodiment, since the stroke of the fine-movement linear motor and the electromagnet 208 connected to the fine-movement stage 41 is short, a force cannot be applied over a long distance as it is. Therefore, by moving the X stage 20 which is a reference for applying a force to the fine movement stage 41 in the XY directions and applying a thrust or suction force in the XY directions to the fine movement stage 41, the XY direction is applied to the fine movement stage 41 for a long time in the XY directions. Direction thrust and suction force are applied. To achieve this, the long distance LM
A position servo system and two Y linear motors and one X linear motor connected thereto are provided.

The long distance LM position servo system 235 has an X control system and a Y control system. The X control system controls the X position of the X stage 20 to follow the X position profile by one X linear motor. The Y control system consists of two Y
The Y position of the X stage 20 and the Y stage 10 is controlled by a linear motor based on the Y position profile.

The X and Y control systems of the long distance LM position servo system 235 include a position profile in the X or Y direction,
X in the X or Y direction measured by an interferometer beam applied to a reflecting mirror formed on the side surface of the stage top plate 21
A difference from the current position of the stage 20 is output, and a control operation represented by PID or the like is performed on this deviation signal, and X or Y
A direction acceleration command is calculated, and this is output to the X linear motor 210X or the Y linear motor 210Y via the X or Y linear motor current amplifier 537.

As a result, the Y linear motor 210Y includes the Y stage 10, the X stage 20, and the fine movement stage 41.
Generates a thrust to accelerate the total mass in the Y direction,
X linear motor 210X generates a thrust for accelerating the entire mass of X stage 20 and fine movement stage 41 in the X direction.

In this embodiment, the output of the acceleration profile generating means 222 is added to the output of the control arithmetic unit of the long-distance LM position servo system and input to the motor current amplifier. A command is issued to the linear motor 210 to prevent the position deviation from accumulating during acceleration.

In the present embodiment, the acceleration profile is given to the suction FF system 231 and the long-distance LM position servo system 235 in a feed-forward manner.
It may be provided to the M-position servo system 225 in a feed-forward manner. Alternatively, the acceleration profile may be generated not only in the XY directions but also in all six axes, and may be provided to the fine movement LM position servo system 225 in a feed-forward manner.

Even after the acceleration of the X stage 20 and the fine movement stage 41 is completed, the X stage 20 and the Y stage 10 move based on the X position and Y position profiles. After the acceleration is completed, the two Y linear motors and the one X linear motor only generate a reaction force of the thrust generated by the X1X2Y1Y2 fine movement linear motor.

As described above, according to the present embodiment, the X stage 20 and the Y stage 1 moved by the linear motor
The fine movement stage 41 is accelerated by the attraction force of the electromagnet 208 with respect to 0 and the X stage 20, and the fine movement stage 41
When the acceleration is completed, the electromagnet sets the current to zero to insulate the floor vibration, and the long-distance LM position servo system moves the X stage 20 and the Y stage 10 based on the X and Y position profiles. High precision, low heat generation, and high precision for the fine motion stage 41 are achieved by always performing high-precision position control with the fine motion linear motor in parallel with these operations while keeping the mover stator of the motor out of contact. Six-axis position control was achieved simultaneously.

In the present embodiment, the X stage 20 which is a reference for generating thrust of the electromagnet 208 and the fine movement linear motor is used.
Is measured independently of the position of the fine movement stage 41, and the position is controlled by a completely independent control system.

The independent measurement independent control of the position of the X stage 20 has the following advantages as compared with the control using a relative sensor.

A first advantage is that it is not necessary to use a relative position sensor, which is disadvantageous in mounting. X
When a relative position sensor that measures the relative position between the stage 20 and the fine movement stage 41 is provided, it must be fixed to the X stage 20 or the fine movement stage 41. If you try to fix it firmly so that the sensor mounting part does not vibrate,
The dimensions of the mounting portion increase, and there is a concern that interference with surrounding components and an increase in mass will occur. It is also necessary to mount a preamplifier nearby, which also puts pressure on the surrounding space and causes an increase in mass. In addition, the sensor cable is dragged by the X stage 20 and the fine movement stage 41, and the disturbance force due to the cable routing increases. That is, by making the measurement and control of the X stage 20 and the fine movement stage 41 of the present embodiment independent, the mass of the fine movement stage 41 can be reduced. This is advantageous for high-speed positioning of the fine movement stage 41. In addition, there is no cable routing, which is suitable for high-precision positioning.

The second advantage is that the computational load is reduced. This has to do with the implementation issues described above. When trying to measure the relative displacement only in the X and Y directions using a relative position sensor such as a gap sensor, it is difficult to dispose the sensor so that a position corresponding to the center of gravity of the fine movement stage 41 can be relatively measured from the X stage 20. is there. For example, in the present embodiment, there are the electromagnet 208 and the magnetic block near the center of gravity, and if a relative position sensor is provided, it must be arranged to avoid this. Then, the fine movement stage 41
A so-called Abbe error caused by the rotation of the sensor enters the relative sensor. In order to remove this error, the displacement in the XY directions is calculated from the value of θxθyθx of the result of the measurement of the center of gravity of the fine movement stage 41 and the amount of separation between the mounting position of the relative position sensor and the center of gravity of the fine movement stage 41, or By providing six relative position sensors and performing coordinate conversion, XY
For example, the displacement in the direction must be calculated, which increases the computational load. In the present embodiment, since the load of such calculation is reduced, it is very suitable for high-speed positioning.

A third advantage is that disturbances entering the control system of the X stage 20 and the fine movement stage 41 can be reduced. In the control method using the relative position sensor, the long distance LM
The disturbance entering the position servo system increases. In the control method using the relative position sensor, the position command to the long distance LM position servo system is always zero, and when the fine movement stage 41 and the X stage 20 are relatively displaced, it becomes a disturbance. That is, if the response of the fine movement stage 41 is delayed, the disturbance increases. Further, in the control method using the relative position sensor, the XY stage cannot be driven unless the fine movement LM servo of the fine movement stage 41 is effective. Therefore, in the control method using the relative position sensor, for example, it is not possible to move only the XY stage position for a test. On the other hand, in the independent measurement and independent control method of the present embodiment, an interferometer is used for measuring the position of the X stage 20, which only requires forming a mirror on the side surface of the X stage 20.

That is, the independent measurement independent control of the present embodiment does not increase the mass by pressing the space around the fine movement stage 41, routing the cable, or mounting the amplifier of the relative position sensor. Further, in the independent measurement independent control method of the present embodiment, since the rotation amount of the fine movement stage 41 does not mix with the XY position signal measured by the interferometer, there is no need to perform a complicated operation on the position signal. . Further, even if there is a response delay in the fine movement stage 41, it does not enter the long distance LM position servo system, so that unnecessary disturbance does not increase. The X stage 20 can be moved to an arbitrary position by giving a position command to the long distance LM position servo system without starting up the fine movement LM servo system of the fine movement stage 41.

In this embodiment, an example is shown in which eight fine-movement linear motors are used for fine-movement control of the fine-movement stage 41 in the six-axis direction. However, the present invention is not limited to this. It suffices if there are at least six actuators so that they can be output. Needless to say, the arrangement of the actuator is not limited to that of the present embodiment. Further, similarly to the above-described embodiment, a cooling device may be provided in the fine movement linear motor.

Since the electromagnet 208 can only generate an attractive force,
In the present embodiment, four electromagnets 208 are required to perform acceleration and deceleration in the XY directions. However, if the number of the electromagnets 208 is not taken into account in the XY directions, driving in the XY directions can be performed if there are at least three electromagnets 208. The electromagnet 208 is not limited to the E-shape as in the present embodiment, as long as it can generate an attractive force on the magnetic material when a current flows through the coil.

In the independent measurement independent control, the position of the X stage 20 is measured by an interferometer using the side mirror of the X stage 20. However, the present invention is not limited to this. An encoder may be provided to measure the position of the X stage 20.
Further, any sensor capable of measuring a long length can be used instead of the linear encoder.

In this embodiment, a linear motor is used to drive the X stage 20 in the XY direction for a long stroke. However, the present invention is not limited to this, and a ball screw, a piston, a robot arm, or the like may be used.

In this embodiment, the fine movement stage 41
The self-weight compensation spring is used for supporting the self-weight, but the present invention is not limited to this, and it is also possible to use a floating force by air, use a repulsive force of a magnet, or use an actuator that generates a force in the Z direction. good. As the actuator that generates a force in the Z direction, the above-described fine movement linear motor may be used. However, since the linear motor generates a large amount of heat, an actuator that generates a small amount of heat may be provided separately from the fine movement linear motor.

The XY stage on which the fine movement stage 41 is mounted is movably supported on the base 1 of the above embodiment. Further, similarly to the above-described embodiment, the base 1
Is fixed to the base mount 3 by bolting or the like. The fixing part 5 is mounted on the structural body frame 6 and fixes the structural body frame 6 by bolting or the like.

The base mounting table 3 can be smoothly moved in the X direction with respect to the base Y moving body 4 by the base X guide 3g. Further, the base Y moving body 4 can be smoothly moved in the Y direction with respect to the fixed portion 5 by the base Y guide 4g. The structure frame 6 is provided on the mount 7.

According to this embodiment, not only the acceleration / deceleration reaction force of the XY stage, but also the change in the center of gravity due to the movement of the XY stage, and the XY stage control reaction force do not act on the structure frame.

Further, according to the present embodiment, by adopting a configuration in which the behavior of the XY stage is not transmitted to the fine movement stage,
Even if the positioning of the XY stage is somewhat coarse, the effect can be made to have no effect on the fine movement stage.

<Embodiment 4> The form of the XY stage of the present invention is not limited to the above embodiment. For example, the effect can be exerted even in combination with the XY stage 10 'as shown in FIG.

Hereinafter, the XY stage 10 'of FIG. 7 will be briefly described.

The XY stage 10 'has an XY movable section 50,
It has an X bar 52x that moves only in the X direction, a Y bar 52y that moves only in the Y direction, and a guide unit 54.

On both sides of the X bar 52x, an x motion mechanism 53x is provided.
Has been fixed. The x movement mechanism 53x has a guide capable of smoothly moving in the X direction with respect to the guide unit 54x, and an actuator for applying a driving force to the guide unit 54x in the X direction. Similarly, a y movement mechanism 53y is fixed to both sides of the Y bar 52y. The y movement mechanism 53y has a guide capable of smoothly moving in the Y direction with respect to the guide unit 54y, and an actuator for applying a driving force to the guide unit 54y in the Y direction. In addition, the XY movable section 50
It is integral with the force support portion 51x and the Y force support portion 51y, and receives driving force by the X bar 52x and the Y bar 52y, respectively. The Z direction of the XY movable section 50 is supported by a static pressure bearing in a non-contact manner with respect to the base 1.

With the above configuration, the XY movable section 50 can freely move on the XY plane on the base 1.

The guide unit 54 is supported by the hydrostatic bearing pads attached to the lower surface thereof in specific contact with the structure frame upper surface 6u in the Z direction. Thus, the base XY stage 2 moves the XY stage on the structure frame upper surface 6u.
It can move smoothly in the direction. With this configuration, a function similar to that of the above-described base XY stage 2 is achieved. Also,
Similarly to the above-described base XY stage 2, a linear sensor or a two-dimensional sensor for measuring the positions in the X and Y directions and an actuator for applying a driving force in the X and Y directions are provided for the guide unit 54. May be.

According to this embodiment, the driving reaction force of the XY movable section can be canceled, and the positioning performance of the XY movable section can be improved.

<Embodiment 5> Next, an embodiment of a scanning exposure apparatus in which the positioning apparatus of the above-described embodiment is mounted as a wafer stage or a reticle stage will be described with reference to FIG.
This will be described with reference to FIG.

The lens barrel base 396 is supported from the floor or base 391 via a damper 398. In addition, lens barrel surface plate 3
96 supports the reticle surface plate 394 and also supports the projection optical system 397 located between the reticle stage 395 and the wafer stage 393.

The wafer stage is supported on a structure frame 6 supported from the floor or the base, and positions and positions a wafer. The reticle stage is supported on a reticle stage base supported by a lens barrel base, and is movable with a reticle on which a circuit pattern is formed. Exposure light for exposing a reticle mounted on the reticle stage 395 to a wafer on the wafer stage 393 is generated from an illumination optical system 399.

The wafer stage 393 is scanned in synchronization with the reticle stage 395. During scanning of the reticle stage 395 and the wafer stage 393, the positions of the two are continuously detected by the interferometer, and are fed back to the driving units of the reticle stage 395 and the wafer stage 393, respectively. As a result, both the scanning start positions can be accurately synchronized, and the scanning speed of the constant-speed scanning region can be controlled with high accuracy. The reticle pattern is exposed on the wafer while the two are scanning the projection optical system, and the circuit pattern is transferred.

In this embodiment, since the stage apparatus of the above-described embodiment is used as a wafer stage or a reticle stage, the wafer can be exposed without being affected by a reaction force or a change in the position of the center of gravity due to movement of the stage. And high-speed, high-precision exposure is possible.

In the present embodiment, the structure frame 6 and the lens barrel base 396 are supported independently of each other via the damper 398 in terms of vibration.
96 may be provided integrally, and this integrated structure may be supported by a damper.

Embodiment 6 Next, an embodiment of a method of manufacturing a semiconductor device using the above-described exposure apparatus will be described. FIG. 9 shows a manufacturing flow of a semiconductor device (a semiconductor chip such as an IC or an LSI, or a liquid crystal panel or a CCD). In step 1 (circuit design), the circuit of the semiconductor device is designed. Step 2 is a process for making a mask on the basis of the circuit pattern design. In step 3 (wafer manufacture), a wafer is manufactured using a material such as silicon. Step 4 (wafer process) is called a pre-process, and an actual circuit is formed on the wafer by lithography using the prepared mask and wafer.
Step 5 (assembly) is called a post-process, and step 1
This is a step of forming a semiconductor chip using the wafer produced in Step 4, and includes steps such as an assembly step (dicing and bonding) and a packaging step (chip encapsulation). In step 6 (inspection), inspections such as an operation confirmation test and a durability test of the semiconductor device manufactured in step 5 are performed. Through these steps, a semiconductor device is completed and shipped (step S7).

FIG. 10 shows a detailed flow of the wafer process. Step 11 (oxidation) oxidizes the wafer's surface. Step 12 (CVD) forms an insulating film on the wafer surface. Step 13 (electrode formation) forms electrodes on the wafer by vapor deposition. In step 14 (ion implantation), ions are implanted into the wafer. Step 1
In 5 (resist processing), a photosensitive agent is applied to the wafer. Step 16 (exposure) uses the above-described exposure apparatus to print and expose the circuit pattern of the mask onto the wafer. Step 17 (development) develops the exposed wafer. In step 18 (etching), portions other than the developed resist image are removed. In step 19 (resist stripping), unnecessary resist after etching is removed. By repeating these steps, multiple circuit patterns are formed on the wafer. By using the manufacturing method of this embodiment, it is possible to manufacture a highly integrated semiconductor device, which has been conventionally difficult to manufacture.

[0137]

According to the positioning apparatus according to the first aspect of the present invention, according to the present embodiment, the driving reaction force when driving the second moving body is canceled by the first moving body. Therefore, the base which is the basic structure is not largely vibrated. Also, since the total center of gravity of the first moving body and the second moving body mounted on the base does not move,
The variation in the posture of the base is reduced. When these effects act organically, the positioning accuracy of the second moving body on which the object is mounted can be significantly improved.

[Brief description of the drawings]

FIG. 1 is a schematic diagram of a positioning device according to a first embodiment.

FIG. 2 is an explanatory diagram of a basic operation of the positioning device according to the first embodiment.

FIG. 3 is a schematic diagram of a positioning device according to a second embodiment.

FIG. 4 is a schematic diagram of a fine movement stage used in a positioning device according to a third embodiment.

FIG. 5 is an exploded view of a fine movement stage used in the positioning device according to the third embodiment.

FIG. 6 is a control diagram of a positioning device according to a third embodiment.

FIG. 7 is a schematic diagram of a positioning device according to a fourth embodiment.

FIG. 8 is a schematic view of a scanning exposure apparatus according to a fifth embodiment.

FIG. 9 is a flowchart of a semiconductor device manufacturing method.

FIG. 10 is a wafer process flow diagram.

FIG. 11 is a schematic view of a conventional positioning device.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Base 2 Base XY stage 3 Base mounting base 4 Base Y movable base 5 Fixed part 6 Structure frame 8 Linear sensor 9 Actuator 10 XY stage 20 X stage 21 Top plate 25 Static pressure bearing 30 Y stage 35 Static pressure bearing 41 Fine movement stage 43 Actuator 45 Cooling mechanism 221 Target value indicating means 222 Position profile generating means 223 Acceleration profile generating means 225 Fine movement LM position servo system 226 Operation part 227 Fine movement current amplifier 228 Wafer top position measurement system 229 Wafer top side mirror 231 Suction FF system 232 Correction means 233 Adjustment means 234 Current amplifier for electromagnet 235 Long distance LM position servo system 237 Linear motor current amplifier 238 Stage position measuring instrument 239 X stage side mirror 241 Difference machine 242 Output Target conversion unit 243 Input coordinate conversion unit 250 Y yaw guide 251 Y stage 252 X yaw guide 253 Y slider large 254 Y slider small 255 Connecting plate 261 X stage 262 X stage side plate 263 X stage upper plate 264 X stage lower plate 271 Wafer chuck 272 depression 274 Magnet 275 Yoke 276 Side plate 278 Coil 279 Coil fixing frame 280 Magnetic body support cylinder 281 Self-weight compensation spring 283 Electromagnet support cylinder 285 E-shaped magnetic body 286 Coil 391 Floor / base 392 Stage base 393 Wafer stage 394 Reticle base 395 Reticle stage 396 Lens barrel base 397 Projection optical system 398 Damper 399 Illumination optics

Claims (13)

[Claims] A base having a reference plane; a first movable body movable on the reference plane; a second movable body movable on the reference plane; and the first movable body. And a driving device for generating a driving force between the first moving body and the second moving body, wherein the driving device generates a driving force between the first moving body and the second moving body. The positioning apparatus according to claim 1, wherein the first moving body moves in a direction opposite to the second moving body. 2. The first movable body has a second reference plane perpendicular to the reference plane, and the second movable body is movable along the second reference plane. The positioning device according to claim 1, wherein: 3. The second moving body includes a first stage and a second stage, wherein the first stage is movable in a first direction with respect to the second stage, and the second stage is Is movable in a second direction with respect to the first moving body.
The positioning device according to the above. 4. The apparatus according to claim 1, wherein the first moving body is supported by the base in a non-contact manner.
The positioning device according to any one of the above. 5. The apparatus according to claim 1, wherein the second moving body is supported by the base in a non-contact manner.
The positioning device according to any one of the above. 6. The positioning device according to claim 1, wherein the second moving body has a fine movement stage mounted thereon. 7. The positioning device according to claim 6, wherein the fine movement stage is movable in six axial directions with respect to the second moving body. 8. The positioning device according to claim 6, wherein a cooling mechanism is provided in an actuator that drives the fine movement stage. 9. The positioning device according to claim 6, wherein a force is applied to the fine movement stage by a linear motor from the second moving body. 10. The positioning apparatus according to claim 6, wherein a force is applied to the fine movement stage by an electromagnet from the second moving body. 11. The positioning device according to claim 1, wherein the base is supported by a mount. 12. An exposure apparatus comprising the positioning device according to claim 1. Description: 13. A device manufacturing method, wherein a device is manufactured using the exposure apparatus according to claim 12.